Glass ceramic with heat preservation, heat insulation and irradiation prevention properties and preparation method of glass ceramic

Abstract

The invention relates to the technical field of glass ceramic preparation, in particular to a preparation method of glass ceramic with heat preservation, heat insulation and anti-irradiation performance, which comprises the following steps: mixing Ce < 3 + > doped glass powder, cesium tungsten bronze nanoparticles and organosilicon acrylic resin to obtain slurry; coating the surface of a microcrystal panel with the slurry, and performing curing and heat treatment to obtain microcrystal glass containing a glass powder loose layer; and vitrifying the glass ceramic containing the glass powder loose layer to obtain the glass ceramic containing the functional layer. The transparent low-expansion glass ceramic integrating functions of heat preservation, heat insulation, radiation protection, impact resistance and the like is conveniently obtained by tightly combining and growing a thin glass layer with functions of radiation protection, heat preservation and heat insulation, which is subjected to surface modification by Ce < 3 + > and nano cesium tungsten bronze powder, on the surface of the glass ceramic.

Description

Technical Field

[0001] The present invention relates to the technical field of glass-ceramics preparation, and in particular to glass-ceramics having both thermal insulation and radiation protection properties and a preparation method thereof. Background Art

[0002] Glass-ceramics is a hard, dense and uniform composite material composed of a crystalline phase and a glass phase, which is formed by subjecting the base glass to a certain heat treatment process and controlling the nucleation and crystallization process. The scientific name of glass-ceramics is glass ceramics, which has the dual characteristics of glass and ceramics. Glass-ceramics has better light transmittance than ceramics and stronger toughness than glass. It can be used for building curtain walls and high-end interior decoration. It can also be used as a structural material in machinery, an insulating material in electronics and electrical engineering, a base material for large-scale integrated circuits, a chemical and anti-corrosion material, and a wear-resistant material for mining. There are many types of glass-ceramics. Among them, lithium aluminum silicon glass-ceramics, as an important branch of glass-ceramics, is widely used. Therefore, it has been studied a lot for many years.

[0003] Lithium aluminum silicon system low expansion glass-ceramics is a special glass material with both structural and functional properties. By strictly controlling the crystallization process, transparent glass-ceramics with β-quartz solid solution as the main crystal phase can be obtained. Since the thermal expansion coefficient of β-quartz solid solution is extremely low and its refractive index is very close to that of the glass body, the glass has a nearly zero thermal expansion coefficient and can maintain high transparency. In addition, this system of glass-ceramics also has the advantages of high strength, high temperature resistance, and impact resistance. Therefore, it is often more widely used in many fields such as laser gyroscope cavity materials for missile guidance, mirror blanks for high-energy observation equipment such as optical astronomical telescopes, high-precision gratings, radar antenna covers, and high-temperature observation windows.

[0004] Space is a complex environment with microgravity, high vacuum, large temperature difference (±200℃), and strong radiation. Various high-energy particles and electromagnetic radiation in space, including γ-rays, X-rays, ultraviolet rays, etc., are extremely damaging to various glass devices. When this kind of microcrystalline glass can be used in air and space equipment as satellite or spacecraft observation mirrors, most of the existing domestic technologies cannot well meet the requirements of this kind of glass to resist various particles and rays in space, so the application of low expansion window microcrystalline glass in the aerospace field is limited. Many literature reports show that the introduction of CeO2 into glass can improve the radiation resistance of glass. Patent CN105948516B discloses a method of adding CeO2 to the glass body component. On the one hand, CeO2 acts as a clarifier in the glass melting process. On the other hand, the introduction of CeO2 can make the glass have certain radiation resistance. However, the crystallization kinetics of lithium aluminum silicon system microcrystalline glass is very sensitive to the glass component. The literature Ceramics International, 31(1), 11-14 reported that adding CeO2 to the glass body will cause changes in the nucleation and crystallization behavior of the glass, which will accelerate the transformation of the glass phase to the β-quartz phase and the β-quartz phase to the spodumene phase to a certain extent, thereby causing changes in the mechanical and optical properties of the glass.

[0005] In addition, there is no air in space, and energy can only be transferred through radiation. Therefore, during the day, sunlight will directly shine on the surface of objects exposed to the universe, heating their surfaces and causing their temperature to rise, while at night, the surface of objects is no longer heated by sunlight and begins to emit thermal radiation to the surrounding universe, lowering its temperature over time. This huge temperature difference between day and night can easily cause operational failures of electromagnetic and other functional devices. At present, it is usually adopted to coat the glass surface with a thermal insulation film layer to make it have the function of heat preservation and heat insulation. At present, cesium tungsten bronze is the most commonly used thermal insulation coating on the market. However, in the harsh environment of space, the durability of the thermal insulation film layer is poor.

[0006] Therefore, there is an urgent need to provide a microcrystalline glass with a durable thermal insulation film layer that can be used under harsh conditions in space. Summary of the invention

[0007] In view of the shortcomings of the prior art mentioned above, the object of the present invention is to provide a microcrystalline glass having both thermal insulation and radiation protection properties and a preparation method thereof, so as to solve the problem of poor durability of the thermal insulation film layer of the microcrystalline glass containing a thermal insulation film layer in the prior art when the microcrystalline glass containing a thermal insulation film layer is used in space.

[0008] To achieve the above objectives and other related objectives, the present invention is achieved through the following technical solutions.

[0009] The first aspect of the present invention is to provide a method for preparing glass-ceramics having both thermal insulation and radiation protection properties, the preparation method comprising the following steps:

[0010] (1) Ce-doped 3+ glass powder, cesium tungsten bronze nanoparticles and silicone acrylic resin are mixed to obtain a slurry;

[0011] (2) coating the slurry obtained in step (1) on the surface of the microcrystalline panel, curing, and heat treating to obtain a microcrystalline glass containing a loose layer of glass powder;

[0012] (3) vitrifying the microcrystalline glass containing the loose layer of glass powder obtained in step (2) to obtain a microcrystalline glass containing a functional layer.

[0013] The second aspect of the present invention is to provide a microcrystalline glass having both thermal insulation and radiation protection properties, which is prepared by the above-mentioned preparation method.

[0014] As described above, the microcrystalline glass having both thermal insulation and radiation protection properties and the preparation method thereof of the present invention have the following beneficial effects:

[0015] (1) The present invention proposes a new process for preparing microcrystalline glass with both thermal insulation and radiation protection properties, in which a layer of Ce is closely grown on the surface of the microcrystalline glass. 3+ The radiation-proof and thermal insulation functional glass thin layer modified by the surface of nano-cesium tungsten bronze powder can obtain a transparent low-expansion microcrystalline glass with thermal insulation, radiation protection, impact resistance and other functions.

[0016] (2) The microcrystalline glass of the present invention comprises a microcrystalline panel layer and a radiation protection, heat insulation and thermal insulation functional glass thin layer. The functional glass thin layer is prepared by coating glass micropowder slurry and vitrifying at high temperature. The bonding force between the functional glass thin layer and the microcrystalline glass is strong, and the functional layer is not easy to age and fall off. At the same time, the Ce in the functional glass thin layer is 3+ There is a certain adjustment range for the content of nano-cesium tungsten bronze powder, which can meet the needs of different application scenarios. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It shows a production process flow chart of a microcrystalline glass with both thermal insulation and radiation protection properties. DETAILED DESCRIPTION

[0018] In order to make the purpose of the invention, technical solutions and beneficial technical effects of the present invention clearer, the present invention is further described in detail below in conjunction with embodiments. People familiar with this technology can easily understand other advantages and effects of the present invention from the contents disclosed in this specification.

[0019] The first aspect of the present invention is to provide a method for preparing glass-ceramics having both thermal insulation and radiation protection properties, the preparation method comprising the following steps:

[0020] (1) Ce-doped 3+ glass powder, cesium tungsten bronze nanoparticles and silicone acrylic resin are mixed to obtain a slurry;

[0021] (2) coating the slurry obtained in step (1) on the surface of the microcrystalline panel, curing, and heat treating to obtain a microcrystalline glass containing a loose layer of glass powder;

[0022] (3) vitrifying the microcrystalline glass containing the loose layer of glass powder obtained in step (2) to obtain a microcrystalline glass containing a functional layer.

[0023] The present invention grows a layer of Ce on the surface of the microcrystalline glass in close combination. 3+ The radiation-proof and thermal insulation functional glass thin layer modified by the surface of nano-cesium tungsten bronze powder can realize transparent low-expansion microcrystalline glass with the functions of thermal insulation, radiation protection and impact resistance.

[0024] The present invention has no particular limitation on the source of the organosilicon acrylic resin, and a commercially available organosilicon acrylic resin commonly used by those skilled in the art can be used. Specifically, the manufacturer of the organosilicon acrylic resin of the present invention is Wanhua Chemical Group Co., Ltd.

[0025] The present invention has no special limitation on the source of cesium tungsten bronze nanoparticles, and cesium tungsten bronze nanoparticles commonly used by those skilled in the art can be used. Specifically, the particle size of the cesium tungsten bronze nanoparticles is ≤100nm, and specifically, the particle size can be 50-60nm, 60-80nm, or 80-95nm; the manufacturer of the cesium tungsten bronze nanoparticles of the present invention is Xi'an Qiyue Biotechnology Co., Ltd.

[0026] The present invention has no special limitation on the source of the microcrystalline panel, and the microcrystalline panel commonly used by those skilled in the art can be used. It can be commercially available or can be homemade using existing technology. Specifically, the preparation method of the microcrystalline panel of the present invention includes the following steps: Prepare according to the existing mature microcrystalline glass casting method. Weigh the weight percentage of 60-70% SiO2, 2-6% Li2O, 19-25% Al2O3, 0-3% K2O, 0-3% Na2O, 0-4% ZrO2, 0-3% TiO2, 0-4% P2O5, 0-1% Sb2O3 and put them into a platinum crucible, melt, stir, clarify and other operations at 1550-1650°C, and finally cast the glass liquid into a preheated mold to form it. The formed glass is quickly transferred to an annealing furnace and heated at the glass transition temperature (T g) and then cool down naturally after annealing. Subsequently, the glass is subjected to segmented precision heat treatment, and the nucleation temperature of the basic glass heat treatment is controlled to be higher than the glass transition temperature (T g )50℃~100℃, the nucleation time is 1~6h, and the crystallization temperature is controlled at the crystallization starting temperature (T x ), the crystallization time is 0.5 to 1 h, and finally microcrystalline glass is obtained.

[0027] The present invention has no particular limitation on the source of the glass powder, and the glass powder commonly used by those skilled in the art may be used.

[0028] In some embodiments of the present invention, the coating in step (2) is a single-side coating.

[0029] In some embodiments of the present invention, the Ce-doped 3+ The glass powder includes the following components by weight: 60-75 parts of SiO2, 0-5 parts of Li2O, 5-10 parts of Al2O3, 0-5 parts of K2O, 0-8 parts of Na2O, 0-20 parts of B2O3, 0.2-2 parts of CeO2, and 0-0.3 parts of Sb2O3. Cerium dioxide can play a clarifying role and reduce the generation of glass defects; at the same time, using cerium dioxide as a space anti-radiation agent enhances the ability of the finished glass to cope with the strong radiation of various high-energy particles, electrons, protons, etc. in space, so that the window glass products do not need to be processed again. The composition of the glass powder is close to that of lithium aluminum silicon microcrystalline glass, so the functional layer glass has a strong bonding force with the microcrystalline glass substrate and is not easy to fall off.

[0030] In some embodiments of the present invention, the Ce-doped 3+ The glass powder includes the following components in parts by weight: 60-68 parts of SiO2, 0-3 parts of Li2O, 5-7.6 parts of Al2O3, 0-4.2 parts of K2O, 0-6 parts of Na2O, 0-18.2 parts of B2O3, 0.2-1 parts of CeO2, and 0-0.2 parts of Sb2O3.

[0031] In some embodiments of the present invention, the Ce-doped 3+ The glass powder includes the following components in parts by weight: 68-75 parts of SiO2, 3-5 parts of Li2O, 7.6-10 parts of Al2O3, 4.2-5 parts of K2O, 6-8 parts of Na2O, 18.2-20 parts of B2O3, 1-2 parts of CeO2, and 0.2-0.3 parts of Sb2O3.

[0032] In some embodiments of the present invention, the Ce-doped 3+The glass powder includes the following components in parts by weight: 60.2 parts of SiO2, 3.29 parts of Li2O, 7.6 parts of Al2O3, 4.2 parts of K2O, 6 parts of Na2O, 18.2 parts of B2O3, 1 part of CeO2, and 0.23 parts of Sb2O3.

[0033] In some embodiments of the present invention, the Ce-doped 3+ The glass powder includes the following components in parts by weight: 75 parts of SiO2, 2 parts of Li2O3, 9 parts of Al2O3, 3 parts of K2O, 4 parts of Na2O, 10 parts of B2O3, 0.5 parts of CeO2, and 0.3 parts of Sb2O3.

[0034] In some embodiments of the present invention, the thickness of the glass powder loose layer in step (2) is 100-300 μm; specifically, the thickness may be 100-150 μm, 150-250 μm, 250-300 μm; typically but not limitingly, for example, 100 μm, 150 μm, 250 μm, 300 μm. If the glass powder loose layer is too thin, it will be difficult to obtain a dense functional glass layer with a certain thickness after vitrification, and better radiation resistance and heat insulation performance cannot be obtained. However, when the loose layer is too thick, the functional layer obtained after vitrification is also relatively thick. Since cesium tungsten bronze and CeO2 both have color rendering properties, a thicker functional glass layer will affect the visible light transmittance of the microcrystalline glass. Therefore, the thickness of the glass powder loose layer must be reasonably controlled.

[0035] In some embodiments of the present invention, the curing temperature in step (2) is 20-30°C, specifically, the temperature can be 20-25°C, 25-30°C; typically but not limitatively, for example, 20°C, 25°C, 30°C; the curing time is 2-5h; specifically, the curing time can be 2-3h, 3-5h, typically but not limitatively, for example, 2h, 3h, 5h.

[0036] In some embodiments of the present invention, the thickness of the microcrystalline panel in step (2) is 1-3 mm; specifically, the thickness of the microcrystalline panel may be 1-2 mm, 2-3 mm; typically but not limitingly, for example, 1 mm, 2 mm, 3 mm.

[0037] In some embodiments of the present invention, the temperature of the heat treatment in step (2) is 400-500°C; the time of the heat treatment is 20-30h. Specifically, the temperature of the heat treatment can be 400-450°C, 450-500°C, typically but not limiting, for example, 400°C, 450°C, 500°C; the time of the heat treatment can be 20-25h, 25-30h, typically but not limiting, for example, 20h, 25h, 30h.

[0038] In some embodiments of the present invention, the Ce-doped 3+ The mass volume ratio of glass powder, cesium tungsten bronze nanoparticles and silicone acrylic resin is 10-15g:0.3-0.8g:1-6ml. Specifically, the mass volume ratio can be 10-12g:0.3-0.5g:1-3ml, 12-15g:0.5-0.8g:3-6ml; typically but not limiting, for example, 10g:0.3g:1ml, 12g:0.5g:3ml, 15g:0.8g:6ml.

[0039] In some embodiments of the present invention, the glass transition temperature in step (3) is 1000-1100°C; the glass transition time is 0.5-2min. Specifically, the glass transition temperature can be 1000-1050°C, 1050-1100°C; typical but non-limiting examples are 1000°C, 1050°C, and 1100°C. When the flame temperature is too high, the base microcrystalline glass will be deformed. If the flame temperature is too low, such as 700-950°C, the glass powder is not easy to vitrify, and a long heating time is required. If it is in this temperature range for a long time, it is easy to cause the glass powder to crystallize during the glass transition process, and it will also cause the internal grains of the base microcrystalline glass to grow and even a crystal phase transition, thereby affecting the transparency of the base glass. The glass transition temperature can be 0.5-1min, 1-2min; typical but non-limiting examples are 0.5min, 1min, and 2min.

[0040] In some embodiments of the present invention, the Ce-doped 3+ The preparation method of glass powder comprises the following steps: weighing and grinding silicon oxide, aluminum oxide and cerium oxide, melting to obtain glass liquid, water quenching, drying, crushing and grinding, screening to obtain glass powder.

[0041] In some embodiments of the present invention, sodium oxide is also added during the preparation of the glass powder.

[0042] In some embodiments of the present invention, boron oxide is also added during the preparation of the glass powder.

[0043] In some embodiments of the present invention, antimony oxide is also added during the preparation of the glass powder.

[0044] In some embodiments of the present invention, potassium oxide is also added during the preparation of the glass powder.

[0045] In some embodiments of the present invention, lithium oxide is also added during the preparation of the glass powder.

[0046] In some embodiments of the present invention, the melting temperature of the glass powder during preparation is 1350-1550°C, and the melting time is 2-3h; specifically, the melting temperature of the glass powder during preparation may be 1350-1400°C, 1400-1550°C; typically but not limitatively, for example, 1350°C, 1400°C, 1550°C; the melting time may be 2-2.5h, 2.5-3h, typically but not limitatively, for example, 2h, 2.5h, 3h.

[0047] In some embodiments of the present invention, the drying temperature during the preparation of the glass powder is 90-110°C, and the drying time is 20-30h; specifically, the drying temperature may be 90-100°C, 100-110°C, typically but not limitatively, for example, 90°C, 100°C, 110°C; the drying time may be 20-24h, 24-30h; typically but not limitatively, for example, 20h, 24h, 30h.

[0048] In some embodiments of the present invention, the particle size of the glass powder is ≤10 μm. If the particle size of the glass powder is too large, the slurry configuration will be uneven, thereby affecting the effect of subsequent coating.

[0049] The second aspect of the present invention is to provide a microcrystalline glass having both thermal insulation and radiation protection properties, which is prepared by the above-mentioned preparation method.

[0050] In some embodiments of the present invention, the microcrystalline glass includes a microcrystalline panel and a functional layer located on the surface of the microcrystalline panel and having the functions of thermal insulation and radiation protection. Preferably, the thickness of the functional layer is 50-150 μm.

[0051] The present invention is further described below by way of examples, but the scope of the present invention is not limited thereto.

[0052] When the embodiment gives a numerical range, it should be understood that, unless otherwise specified in the present invention, the two endpoints of each numerical range and any numerical value between the two endpoints can be selected. Unless otherwise defined, all technical and scientific terms used in the present invention have the same meaning as those generally understood by those skilled in the art. If specific conditions are not specified in the embodiment, they are carried out according to conventional conditions or conditions recommended by the manufacturer. If the manufacturer is not specified for all reagents or instruments, they are conventional products that can be purchased commercially. In addition to the specific methods, equipment, and materials used in the embodiments, according to the grasp of the prior art by those skilled in the art and the record of the present invention, any method, equipment, and material of the prior art similar or equivalent to the method, equipment, and material in the embodiments of the present invention can also be used to realize the present invention.

[0053] The preparation method of the microcrystalline panel of the present invention comprises the following steps: weighing 60-70% SiO2, 2-6% Li2O, 19-25% Al2O3, 0-3% K2O, 0-3% Na2O, 0-4% ZrO2, 0-3% TiO2, 0-4% P2O5, and 0-1% Sb2O3 in weight percentage and putting them into a platinum crucible, melting, stirring, clarifying, and the like at 1550-1650°C, and finally casting the glass liquid into a preheated mold for forming. The formed glass is quickly transferred to an annealing furnace, annealed near the glass transition temperature (Tg), and cooled naturally after the annealing is completed. Subsequently, the glass is subjected to segmented precision heat treatment. The nucleation temperature of the basic glass heat treatment is controlled between 50°C and 100°C higher than the glass transition temperature (Tg), the nucleation time is 1 to 6 hours, the crystallization temperature is controlled near the crystallization starting temperature (Tx), the crystallization time is 0.5 to 1 hour, and finally a microcrystalline panel is obtained.

[0054] Example

[0055] Example 1

[0056] This embodiment provides a method for preparing microcrystalline glass with both thermal insulation and radiation protection properties, such as Figure 1 As shown, the following steps are included:

[0057] (1) Weigh 60.2g SiO2, 7.6g Al2O3, 3.29g Li2CO3, 18.2g B2O3, 4.2g K2O, 6.0g Na2O, 0.23g Sb2O3, and 1.0g CeO2, grind them thoroughly, stir and mix them, melt them at 1450°C for 2h, quench them with water, and dry them at 100°C for 24h. Then, crush, grind and sieve them to obtain glass powder with a particle size of less than 10μm. Mix glass powder, cesium tungsten bronze nanoparticles and silicone acrylic resin in a mass volume ratio of 10g:0.5g:6ml, stir them continuously to make them evenly dispersed, and prepare them into slurry;

[0058] (2) The slurry prepared in step (1) is uniformly coated on the surface of the microcrystalline panel. After drying and curing, the microcrystalline panel coated with glass powder is placed in a high-temperature furnace at 450° C. for 24 hours to obtain a microcrystalline glass containing a loose layer of glass powder; the thickness of the loose layer of glass powder is 200 μm;

[0059] (3) placing one side of the glass powder loose layer of the microcrystalline glass obtained in step (2) in a high temperature flame of 1000° C. for rapid and uniform moving heating, and using a rapid heating and quenching process to quickly collapse the glass powder loose layer and achieve vitrification, thereby obtaining a microcrystalline glass containing a functional layer. The thickness of the functional layer is 90 μm.

[0060] Example 2

[0061] This embodiment provides a method for preparing microcrystalline glass with both thermal insulation and radiation protection properties, which is different from the embodiment 1 in that the thickness of the loose layer of glass powder in step (2) is 300 μm. The thickness of the functional layer of the prepared microcrystalline glass is 130 μm.

[0062] The microcrystalline glass functional layer prepared in this embodiment is not easy to age, has good thermal insulation performance and good durability.

[0063] The above embodiments are merely illustrative of the principles and effects of the present invention, and are not intended to limit the present invention. Anyone familiar with the art may modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by a person of ordinary skill in the art without departing from the spirit and technical concept disclosed by the present invention shall still be covered by the claims of the present invention.

Claims

1. A method for preparing glass-ceramics having both thermal insulation and radiation protection properties, characterized in that: The preparation method comprises the following steps: (1) Ce-doped 3+ glass powder, cesium tungsten bronze nanoparticles and silicone acrylic resin are mixed to obtain a slurry; (2) coating the slurry obtained in step (1) on the surface of the microcrystalline panel, curing, and heat treating to obtain a microcrystalline glass containing a loose layer of glass powder; (3) vitrifying the microcrystalline glass containing the loose layer of glass powder obtained in step (2) to obtain a microcrystalline glass containing a functional layer.

2. The method for preparing a glass-ceramic having both thermal insulation and radiation protection properties according to claim 1, characterized in that: The Ce-doped 3+ The glass powder includes the following components in parts by weight: 60-75 parts of SiO2, 0-5 parts of Li2O, 5-10 parts of Al2O3, 0-5 parts of K2O, 0-8 parts of Na2O, 0-20 parts of B2O3, 0.2-2 parts of CeO2, and 0-0.3 parts of Sb2O3.

3. The method for preparing a glass-ceramic having both thermal insulation and radiation protection properties according to claim 1, characterized in that: The particle size of the cesium tungsten bronze nanoparticles is ≤100nm.

4. The method for preparing a glass-ceramic having both thermal insulation and radiation protection properties according to claim 1, characterized in that: The step (2) further includes one or more of the following features: 21) In step (2), the thickness of the loose layer of glass powder is 100-300 μm; 22) In step (2), the curing temperature is 20-30°C and the curing time is 2-5h; 23) The thickness of the microcrystalline panel in step (2) is 1-3 mm; 24) The heat treatment temperature in step (2) is 400-500°C and the heat treatment time is 20-30h.

5. The method for preparing glass-ceramics having both thermal insulation and radiation protection properties according to claim 1, characterized in that: The Ce-doped 3+ The mass volume ratio of glass powder, cesium tungsten bronze nanoparticles and silicone acrylic resin is 10-15g:0.3-0.8g:1-6ml.

6. The method for preparing glass-ceramics having both thermal insulation and radiation protection properties according to claim 1, characterized in that: In the step (3), the glass transition temperature is 1000-1100° C. and the glass transition time is 0.5-2 min.

7. The method for preparing glass-ceramics having both thermal insulation and radiation protection properties according to claim 1, characterized in that: The Ce-doped 3+ The preparation method of glass powder comprises the following steps: weighing and grinding silicon oxide, aluminum oxide and cerium oxide, melting to obtain glass liquid, water quenching, drying, crushing and grinding, screening to obtain glass powder.

8. The method for preparing glass-ceramics having both thermal insulation and radiation protection properties according to claim 7, characterized in that: Also includes one or more of the following specialties: A1) sodium oxide is also added during the preparation of the glass powder; A2) Boron oxide is also added during the preparation of the glass powder; A3) Antimony oxide is also added during the preparation of the glass powder; A4) Potassium oxide is also added during the preparation of the glass powder; A5) lithium oxide is also added during the preparation of the glass powder; A6) The glass powder is prepared at a melting temperature of 1350-1550° C. and a melting time of 2-3 h; A7) The glass powder is prepared at a drying temperature of 90-110° C. and a drying time of 20-30 h; A8) The particle size of the glass powder is ≤10 μm.

9. A glass-ceramic having both thermal insulation and radiation protection properties, characterized in that: The method is prepared according to any one of claims 1 to 8.

10. The microcrystalline glass having both thermal insulation and radiation protection properties according to claim 9, characterized in that: It comprises a microcrystalline panel and a functional layer located on the surface of the microcrystalline panel and having the functions of thermal insulation and radiation protection. Preferably, the thickness of the functional layer is 50-150 μm.

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