Perovskite cell and method of making the same

Abstract

The application discloses a perovskite cell and a preparation method thereof. The perovskite cell comprises a substrate, a transparent conductive layer, a photoelectric conversion functional layer and a back electrode layer which are sequentially stacked along a first direction. The transparent conductive layer, the photoelectric conversion functional layer and the back electrode layer are all divided into at least two substructures which are connected in series. The perovskite cell further comprises an insulating column. The height of the insulating column penetrates the back electrode layer and part of the photoelectric conversion functional layer along the first direction. The surface of the insulating column away from the transparent conductive layer is arranged in a flush manner with the surface of the back electrode layer away from the transparent conductive layer. The perovskite cell provided by the embodiment of the application is of a flat structure at the position of the back electrode layer and does not contain a groove structure. Therefore, the sealing property of the packaging of the perovskite cell is higher, and the safety of use is better.

Description

Technical Field

[0001] This application relates to the field of solar cell technology, and more specifically, to a perovskite solar cell and its preparation method. Background Technology

[0002] Perovskite solar cells are a novel, high-efficiency, and low-cost photovoltaic power generation technology that utilizes perovskite structural materials as light-absorbing materials. Perovskite solar cells possess high photoelectric conversion efficiency and have broad application prospects in the photovoltaic field.

[0003] In the prior art, perovskite solar cells often contain groove-like structures after being divided into several sub-cells, which adversely affects the hermeticity of their encapsulation.

[0004] In view of this, a new technical solution is needed to solve the above-mentioned technical problems. Summary of the Invention

[0005] One objective of this application is to provide a new technical solution for perovskite solar cells and their preparation methods.

[0006] According to a first aspect of this application, a perovskite solar cell is provided, the perovskite solar cell comprising:

[0007] A substrate, a transparent conductive layer, a photoelectric conversion functional layer, and a back electrode layer are sequentially stacked along a first direction; wherein the transparent conductive layer, the photoelectric conversion functional layer, and the back electrode layer are each divided into at least two interconnected substructures.

[0008] An insulating pillar, along a first direction, extends through the back electrode layer and part of the photoelectric conversion functional layer; the surface of the insulating pillar away from the transparent conductive layer is flush with the surface of the back electrode layer away from the transparent conductive layer.

[0009] Optionally, the photoelectric conversion functional layer includes a first charge transport layer, a perovskite layer, and a second charge transport layer stacked sequentially along a first direction; the charge carriers transported by the first charge transport layer and the second charge transport layer have opposite polarities; wherein, the first charge transport layer is connected to the transparent conductive layer, and the second charge transport layer is connected to the back electrode layer; along the first direction, the height of the insulating pillar extends through the back electrode layer and the second charge transport layer.

[0010] Optionally, the perovskite solar cell further includes an isolation column and a conductive column;

[0011] Along the first direction, the height of the isolation pillar extends through the transparent conductive layer and the first charge transport layer; the height of the conductive pillar extends through the first charge transport layer and the perovskite layer.

[0012] Along the second direction, the isolation pillar, the conductive pillar, and the insulating pillar are arranged in sequence at intervals.

[0013] Optionally, the isolation column, the conductive column, and the insulating column are arranged in a column group at intervals along the second direction, and at least two columns are arranged at intervals along the second direction.

[0014] Optionally, the isolation column is made of perovskite.

[0015] Optionally, the width of the isolation pillar is smaller than the width of the conductive pillar; the material of the conductive pillar is the same as the material of the second charge transport layer.

[0016] Optionally, the first charge transport layer is an electron transport layer and the second charge transport layer is a hole transport layer; or, the first charge transport layer is a hole transport layer and the second charge transport layer is an electron transport layer.

[0017] According to a second aspect of this application, a method for preparing a perovskite solar cell as described in the first aspect is provided, the method comprising:

[0018] A substrate having a first surface is provided, and a transparent conductive layer having at least two substructures is formed on the first surface of the substrate;

[0019] A photoelectric conversion functional layer having at least two substructures is prepared on the surface of the transparent conductive layer away from the substrate, and a first sub-groove is formed in the portion of the photoelectric conversion functional layer away from the transparent conductive layer.

[0020] A back electrode layer is prepared on the surface of the photoelectric conversion functional layer away from the transparent conductive layer, and a second sub-groove is formed in the back electrode layer, the second sub-groove being interconnected with the first sub-groove to form an insulating groove;

[0021] A first mask is provided on the back electrode layer, and the uncovered area of ​​the first mask corresponds to the insulating groove.

[0022] An insulating material is deposited on the back electrode layer on which the first mask is provided, and the insulating material fills the insulating trench and forms an insulating pillar.

[0023] Optionally, the step of preparing a transparent conductive layer having at least two substructures on the first surface of the substrate includes:

[0024] A second mask is disposed in a predetermined area on the first surface of the substrate;

[0025] A transparent conductive layer is formed on the substrate on which the second mask is disposed using a deposition method, and a first isolation trench penetrating the transparent conductive layer is formed corresponding to the shading area of ​​the second mask.

[0026] Optionally, the photoelectric conversion functional layer having at least two substructures is prepared on the surface of the transparent conductive layer away from the substrate, including:

[0027] A third mask is disposed in a predetermined area on the surface of the transparent conductive layer away from the substrate;

[0028] A first charge transport layer is formed on the transparent conductive layer on which the third mask is provided by deposition, and a second isolation trench and a first groove are formed respectively corresponding to the shielding area of ​​the third mask, which penetrate the first charge transport layer; wherein the second isolation trench and the first isolation trench are interconnected to form an isolation trench, and the first groove and the second isolation trench are arranged at intervals along the second direction;

[0029] A fourth mask is disposed in a predetermined area on the surface of the first charge transport layer away from the transparent conductive layer;

[0030] A perovskite layer is formed on the first charge transport layer on which the fourth mask is provided using a deposition method, and a second groove is formed corresponding to the shielding area of ​​the fourth mask, penetrating the perovskite layer. The second groove and the first groove are interconnected to form a conductive groove; at the same time, the isolation groove is filled with perovskite material to form an isolation pillar.

[0031] A fifth mask is disposed in a predetermined region on the surface of the perovskite layer away from the first charge transport layer;

[0032] A second charge transport layer is formed on the perovskite layer with the fifth mask by deposition, and a first sub-groove penetrating the second charge transport layer is formed corresponding to the shielding area of ​​the fifth mask; at the same time, the conductive groove is filled with the material of the second charge transport layer to form a conductive pillar.

[0033] Optionally, the back electrode layer is formed on the surface of the photoelectric conversion functional layer away from the transparent conductive layer, and a second sub-groove is formed through the back electrode layer, including:

[0034] A sixth mask is disposed in a predetermined region on the surface of the second charge transport layer away from the perovskite layer;

[0035] A back electrode layer is formed on the second charge transport layer on which the sixth mask is disposed by deposition, and a second sub-groove is formed corresponding to the shading area of ​​the sixth mask.

[0036] The perovskite solar cell provided in this application embodiment can achieve the following technical effects:

[0037] This perovskite solar cell has a flat structure at the back electrode layer, rather than a grooved structure. Therefore, the perovskite solar cell has a high degree of sealing and better safety in use.

[0038] Other features and advantages of this application will become clear from the following detailed description of exemplary embodiments with reference to the accompanying drawings. Attached Figure Description

[0039] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments of the present application and, together with their description, serve to explain the principles of the present application.

[0040] Figure 1 The diagram shown is a structural schematic of a perovskite solar cell according to this application.

[0041] Figure 2 The diagram shown is a schematic diagram of the current flow direction in a perovskite solar cell according to this application;

[0042] Figures 3a-3f The diagram shown is a schematic flow chart of a method for preparing a perovskite solar cell according to this application.

[0043] Figures 4a-4f The image shown is a schematic diagram of the mask used in the fabrication method of a perovskite solar cell according to this application.

[0044] Figure 5 The diagram shown is a schematic flow chart of a method for preparing a perovskite solar cell according to this application.

[0045] Explanation of reference numerals in the attached figures:

[0046] 1. Perovskite solar cell; 10. Substrate; 11. Transparent conductive layer; 12. First charge transport layer; 13. Perovskite layer; 14. Second charge transport layer; 15. Back electrode layer; 16. Insulating pillar; 17. Isolating pillar; 18. Conductive pillar; 101. First sub-groove; 102. Second sub-groove; 103. First isolation groove; 104. Second isolation groove; 105. First recess; 106. Second recess;

[0047] 21. First mask; 211. First blocking block; 210. First gap; 22. Second mask; 221. Second blocking block; 220. Second gap; 23. Third mask; 231. Third blocking block a; 232. Third blocking block b; 230. Third gap a; 233. Third gap b; 24. Fourth mask; 241. Fourth blocking block; 240. Fourth gap; 25. Fifth mask; 251. Fifth blocking block; 250. Fifth gap; 26. Sixth mask; 261. Sixth blocking block; 260. Sixth gap. Detailed Implementation

[0048] Various exemplary embodiments of the present application will now be described in detail with reference to the accompanying drawings. It should be noted that, unless otherwise specifically stated, the relative arrangement, numerical expressions, and values ​​of the components and steps set forth in these embodiments do not limit the scope of the present application.

[0049] The following description of at least one exemplary embodiment is merely illustrative and is in no way intended to limit the scope of this application and its application or use.

[0050] Techniques, methods, and equipment known to those skilled in the art may not be discussed in detail, but where appropriate, such techniques, methods, and equipment should be considered part of the specification.

[0051] In all the examples shown and discussed herein, any specific values ​​should be interpreted as merely exemplary and not as limitations. Therefore, other examples of exemplary embodiments may have different values.

[0052] It should be noted that similar labels and letters in the following figures indicate similar items; therefore, once an item is defined in one figure, it does not need to be discussed further in subsequent figures.

[0053] Reference Figure 1 As shown, according to one embodiment of this application, a perovskite solar cell 1 is provided. The perovskite solar cell 1 includes a substrate 10, a transparent conductive layer 11, a photoelectric conversion functional layer and a back electrode layer 15, which are sequentially stacked along a first direction; wherein the transparent conductive layer 11, the photoelectric conversion functional layer and the back electrode layer 15 are each divided into at least two substructures connected in series.

[0054] It also includes an insulating post 16, which extends through the back electrode layer 15 and part of the photoelectric conversion functional layer along a first direction; the surface of the insulating post 16 away from the transparent conductive layer 11 is flush with the surface of the back electrode layer 15 away from the transparent conductive layer 11.

[0055] In the perovskite solar cell 1 provided in this application embodiment, it includes a substrate 10, a transparent conductive layer 11, a photoelectric conversion functional layer, and a back electrode layer 15 sequentially stacked along a first direction. The perovskite solar cell 1 is divided into several sub-cells connected in series, and each sub-cell is separated by an insulating post 16. Since the surface of the insulating post 16 away from the transparent conductive layer 11 in the perovskite solar cell 1 provided in this application embodiment is flush with the surface of the back electrode layer 15 away from the transparent conductive layer 11, that is, although each sub-cell is separated at the position of the back electrode layer 15, the perovskite solar cell 1 is still a flat structure at the position of the back electrode layer 15 and does not contain a groove structure. Therefore, the perovskite solar cell 1 has high sealing performance and better safety in use.

[0056] Reference Figure 1 As shown, in one embodiment, the photoelectric conversion functional layer includes a first charge transport layer 12, a perovskite layer 13, and a second charge transport layer 14 stacked sequentially along a first direction; the charge carriers transported by the first charge transport layer 12 and the second charge transport layer 14 have opposite polarities; wherein, the first charge transport layer 12 is connected to the transparent conductive layer 11, and the second charge transport layer 14 is connected to the back electrode layer 15; along the first direction, the height of the insulating pillar 16 extends through the back electrode layer 15 and the second charge transport layer 14.

[0057] In this specific example, the perovskite solar cell 1 includes a substrate 10, a transparent conductive layer 11, a first charge transport layer 12, a perovskite layer 13, a second charge transport layer 14, and a back electrode layer 15, which are sequentially stacked along a first direction; wherein the charge carriers transported by the first charge transport layer 12 and the second charge transport layer 14 have opposite polarities; specifically, the first charge transport layer 12 is an electron transport layer and the second charge transport layer 14 is a hole transport layer; or, the first charge transport layer 12 is a hole transport layer and the second charge transport layer 14 is an electron transport layer.

[0058] The substrate is the supporting structure of the perovskite solar cell, and it is usually made of materials with high light transmittance, good stability and mechanical strength. The main function of the substrate is to provide a flat and stable base so that other cell structure layers can be built on it. Common substrate materials include glass, flexible polymers and so on.

[0059] The transparent conductive layer sits atop the substrate, its primary function being to transmit current. Additionally, it protects the perovskite layer from corrosion by external moisture and gases, thus improving the battery's stability. It needs to possess good light transmittance and conductivity to ensure that sunlight can pass through and reach the perovskite layer, while simultaneously collecting the generated current.

[0060] The primary function of the hole transport layer is to facilitate the transport of photogenerated holes (i.e., atoms or molecules lacking electrons) from the perovskite layer while blocking the reverse flow of electrons. This function helps reduce charge recombination (the process of electrons and holes recombining), thereby improving the photoelectric conversion efficiency of the battery. Hole transport layers typically employ semiconductor materials with excellent hole transport properties.

[0061] The perovskite layer is the core component of a perovskite solar cell, primarily responsible for absorbing solar energy and generating electron-hole pairs. When sunlight shines on the perovskite layer, photons are absorbed and excite electrons to transition from the valence band to the conduction band, leaving holes behind. These electrons and holes are then separated and transported to the corresponding electrode layers, thereby generating current.

[0062] The main function of the electron transport layer is to facilitate the transport of photogenerated electrons from the perovskite layer and block the reverse flow of holes, thereby helping to reduce charge recombination and improve the photoelectric conversion efficiency of the battery. The electron transport layer usually uses materials with high electron mobility and stability to ensure that electrons can be transported efficiently.

[0063] The back electrode layer is located at the bottom of the battery. Its main function is to collect holes (or electrons in some inversion structures) that are transported from the perovskite layer through the hole transport layer and transport them to the external circuit. The back electrode layer is usually made of a metal or alloy with high conductivity.

[0064] In summary, the layers in a perovskite solar cell work together to achieve efficient photoelectric conversion. The transparent conductive layer and the back electrode layer are responsible for collecting and discharging current, while the hole transport layer and the electron transport layer are responsible for promoting charge separation and transport. The perovskite layer is the core of the entire cell, responsible for absorbing sunlight and generating electron-hole pairs.

[0065] Furthermore, the structure of the perovskite battery 1 provided in this application embodiment avoids direct contact between the back electrode layer 15 and the perovskite layer 13, and the perovskite layer 13 is completely isolated by the electron transport layer and the hole transport layer, rather than being exposed to the atmospheric environment, thereby improving the stability of the battery.

[0066] Reference Figure 1 As shown, in one embodiment, the perovskite solar cell further includes an isolation pillar 17 and a conductive pillar 18;

[0067] Along the first direction, the height of the isolation pillar 17 extends through the transparent conductive layer 11 and the first charge transport layer 12; the height of the conductive pillar 18 extends through the first charge transport layer 12 and the perovskite layer 13.

[0068] Along the second direction, the isolation post 17, the conductive post 18 and the insulating post 16 are arranged at intervals in sequence.

[0069] In this specific example, the arrangement of the isolation post 17, the conductive post 18, and the insulating post 16 ensures that the current can flow according to... Figure 2 The flow proceeds in the predetermined direction shown. The isolation pillar 17 separates each sub-cell at the transparent conductive layer 11 and the first charge transport layer 12, the insulating pillar 16 separates each sub-cell at the back electrode layer 15 and the second charge transport layer 14, and the conductive pillar 18 realizes the series connection of each sub-cell and the flow of current.

[0070] The isolation pillar 17, conductive pillar 18 and insulating pillar 16 each occupy only two film layers, which helps to reduce the processing difficulty of the perovskite solar cell 1 and helps to save material costs.

[0071] Reference Figure 1 As shown, in one embodiment, the isolation column 17, the conductive column 18 and the insulating column 16 are arranged in a column group at intervals along the second direction, and the column group is arranged at least twice at intervals along the second direction.

[0072] In this specific example, the column group is formed by the isolation column 17, the conductive column 18 and the insulating column 16 arranged at intervals along the second direction, and the column group is arranged at least twice at intervals along the second direction; thereby forming at least three sub-cells connected in series.

[0073] Reference Figure 1 As shown, in one embodiment, the isolation pillar 17 is made of perovskite.

[0074] Reference Figure 1 As shown, in one embodiment, the width of the isolation pillar 17 is smaller than the width of the conductive pillar 18; the material of the conductive pillar 18 is the same as the material of the second charge transport layer 14.

[0075] In this specific example, isolation pillars 17, made of the same material, are formed simultaneously with the deposition of the perovskite layer 13; and conductive pillars 18, also made of the same material, are formed simultaneously with the deposition of the second charge transport layer 14. Narrower isolation pillars 17 are more advantageous in reducing dead zone area.

[0076] Reference Figures 3a to 4f as well as Figure 5 As shown, according to another embodiment of this application, a method for preparing the perovskite solar cell as described above is provided, the method comprising:

[0077] A substrate 10 having a first surface is provided, and a transparent conductive layer 11 having at least two substructures is formed on the first surface of the substrate 10.

[0078] A photoelectric conversion functional layer having at least two substructures is prepared on the surface of the transparent conductive layer 11 away from the substrate 10, and a first sub-groove 101 is formed in the portion of the photoelectric conversion functional layer away from the transparent conductive layer 11.

[0079] A back electrode layer 15 is prepared on the surface of the photoelectric conversion functional layer away from the transparent conductive layer 11, and a second sub-groove 102 is formed in the back electrode layer 15, the second sub-groove 102 being interconnected with the first sub-groove 101 to form an insulating groove.

[0080] A first mask 21 is provided on the back electrode layer 15, and the uncovered area of ​​the first mask 21 corresponds to the insulating trench. An insulating material is deposited on the back electrode layer 15 on which the first mask 21 is provided, and the insulating material fills the insulating trench and forms an insulating pillar 16.

[0081] In the perovskite solar cell fabrication method provided in this application embodiment, when depositing insulating material on the back electrode layer 15, a first mask 21 is used to assist the deposition process, so that the insulating material is completely deposited and filled into the insulating trench and forms the insulating pillar 16; the insulating material will not be deposited in other areas of the back electrode layer 15 except for the insulating trench.

[0082] The first mask 21 includes at least two spaced-apart first blocking blocks 211, with a first gap 210 between adjacent first blocking blocks 211. The first gap 210 constitutes an uncovered area of ​​the first mask 21. The width of the first blocking block 211 is much larger than the width of the first gap 210. The width of the first gap 210 corresponds to the width of the insulating groove.

[0083] The perovskite battery 1 prepared by the method provided in this application does not contain a groove structure, but has a flat structure at the position of the back electrode layer 15. Therefore, the perovskite battery 1 has a high sealing performance and better safety in use.

[0084] Reference Figure 3a , Figure 4b As shown, in one embodiment, the fabrication of a transparent conductive layer 11 having at least two substructures on the first surface of the substrate 10 includes:

[0085] A second mask 22 is disposed in a predetermined area on the first surface of the substrate 10;

[0086] A transparent conductive layer 11 is formed on the substrate 10 on which the second mask 22 is provided by deposition, and a first isolation trench 103 is formed through the transparent conductive layer 11 corresponding to the shielding area of ​​the second mask 22.

[0087] In this specific example, a second mask 22 is used in the process of preparing the transparent conductive layer 11, thereby forming a first isolation groove 103 that divides the transparent conductive layer 11 while forming the transparent conductive layer 11, avoiding the possibility of damage to the transparent conductive layer 11 by laser etching.

[0088] The second mask 22 includes at least two spaced second blocking blocks 221, with a second gap 220 between adjacent second blocking blocks 221. The second blocking blocks 221 constitute the blocking area of ​​the second mask 22. The width of the second blocking blocks 221 is much smaller than the width of the second gap 220. The width of the second blocking blocks 221 corresponds to the width of the first isolation groove 103, and the height of the second blocking blocks 221 corresponds to the thickness of the transparent conductive layer 11.

[0089] Reference Figures 3b-4e As shown, in one embodiment, the fabrication of a photoelectric conversion functional layer having at least two substructures on the surface of the transparent conductive layer 11 away from the substrate 10 includes:

[0090] A third mask 23 is provided in a predetermined area on the surface of the transparent conductive layer 11 away from the substrate 10;

[0091] A first charge transport layer 12 is formed on the transparent conductive layer 11 on which the third mask 23 is disposed by deposition, and a second isolation trench 104 and a first groove 105 are formed respectively corresponding to the shielding area of ​​the third mask 23, which penetrate the first charge transport layer 12; wherein the second isolation trench 104 and the first isolation trench 103 are interconnected to form an isolation trench, and the first groove 105 and the second isolation trench 104 are arranged at intervals along the second direction;

[0092] A fourth mask 24 is provided in a predetermined area on the surface of the first charge transport layer 12 that is away from the transparent conductive layer 11;

[0093] A perovskite layer 13 is formed on the first charge transport layer 12 on which the fourth mask 24 is disposed by deposition, and a second groove 106 is formed corresponding to the shielding area of ​​the fourth mask 24, penetrating the perovskite layer 13. The second groove 106 and the first groove 105 are interconnected to form a conductive groove; at the same time, the isolation groove is filled with perovskite material to form an isolation pillar 17.

[0094] A fifth mask 25 is provided in a predetermined area on the surface of the perovskite layer 13 away from the first charge transport layer 12;

[0095] A second charge transport layer 14 is formed on the perovskite layer 13 on which the fifth mask 25 is disposed by deposition, and a first sub-groove 101 is formed through the second charge transport layer 14 corresponding to the shielding area of ​​the fifth mask 25; at the same time, the conductive groove is filled with the material of the second charge transport layer 14 to form a conductive pillar 18.

[0096] In this specific example, the third mask 23 includes at least two spaced-apart blocking block groups, each of which includes two spaced-apart third blocking blocks a231 and b232. The third blocking blocks a231 and b232 constitute two blocking areas of the third mask 23. The third blocking block a231 corresponds to the second isolation groove 104, and the third blocking block b232 corresponds to the first groove 105.

[0097] There is a third gap a230 between two adjacent blocking block groups, and a third gap b233 between the third blocking block a231 and the third blocking block b232. The width of the third gap a230 is much larger than the width of the third blocking block a231, the third blocking block b232 and the third gap b233. The width of the third blocking block a231 corresponds to the width of the second isolation groove 104, and the width of the third gap b233 corresponds to the width of the first groove 105. The height of the third blocking block a231 and the height of the third blocking block b232 correspond to the thickness of the first charge transport layer 12.

[0098] The fourth mask 24 includes at least two spaced fourth blocking blocks 241, with a fourth gap 240 between adjacent fourth blocking blocks 241. The fourth blocking blocks 241 constitute the blocking area of ​​the fourth mask 24. The width of the fourth blocking blocks 241 is much smaller than the width of the fourth gap 240. The width of the fourth blocking blocks 241 corresponds to the width of the second groove 106, and the height of the fourth blocking blocks 241 corresponds to the thickness of the perovskite layer 13.

[0099] The fifth mask 25 includes at least two spaced fifth blocking blocks 251, with a fifth gap 250 between adjacent fifth blocking blocks 251. The fifth blocking blocks 251 constitute the blocking area of ​​the fifth mask 25. The width of the fifth blocking block 251 is much smaller than the width of the fifth gap 250. The width of the fifth blocking block 251 corresponds to the width of the first sub-slot 101, and the height of the fifth blocking block 251 corresponds to the thickness of the second charge transport layer 14.

[0100] Reference Figure 3e , Figure 4fAs shown, in one embodiment, a back electrode layer 15 is formed on the surface of the photoelectric conversion functional layer away from the transparent conductive layer 11, and a second sub-groove 102 is formed through the back electrode layer 15, including:

[0101] A sixth mask 26 is provided in a predetermined area on the surface of the second charge transport layer 14 away from the perovskite layer 13;

[0102] A back electrode layer 15 is formed on the second charge transport layer 14 on which the sixth mask 26 is disposed by deposition, and a second sub-groove 102 is formed corresponding to the shading area of ​​the sixth mask 26.

[0103] In this specific example, the sixth mask 26 includes at least two spaced-apart sixth blocking blocks 261, with a sixth gap 260 between adjacent sixth blocking blocks 261. The sixth blocking blocks 261 constitute the blocking area of ​​the sixth mask 26. The width of the sixth blocking block 261 is much smaller than the width of the sixth gap 260. The width of the sixth blocking block 261 corresponds to the width of the second sub-groove 102, and the height of the sixth blocking block 261 corresponds to the thickness of the back electrode layer 15.

[0104] In summary, the perovskite solar cell fabrication method provided in this application utilizes masks to control the connection or disconnection of corresponding film layers, preventing damage to the film layers and thus increasing series resistance. Furthermore, it offers high precision and consistency; it eliminates the need for additional etching or cleaning steps, improving production efficiency. Mask technology allows for precise control of the location and shape of material deposition, thereby improving the manufacturing precision of the solar cell assembly. In addition, mask technology can optimize the structural design of the solar cell assembly, such as by precisely controlling the thickness and position of each layer to optimize carrier transport and light absorption efficiency. Moreover, precise material deposition reduces unnecessary material waste, further lowering manufacturing costs.

[0105] While specific embodiments of this application have been described in detail by way of examples, those skilled in the art should understand that the above examples are for illustrative purposes only and are not intended to limit the scope of this application. Those skilled in the art should understand that modifications can be made to the above embodiments without departing from the scope and spirit of this application. The scope of this application is defined by the appended claims.

Claims

1. A perovskite solar cell, characterized in that, The perovskite solar cell includes: A substrate (10), a transparent conductive layer (11), a photoelectric conversion functional layer and a back electrode layer (15) are stacked sequentially along a first direction; wherein the transparent conductive layer (11), the photoelectric conversion functional layer and the back electrode layer (15) are each divided into at least two interconnected substructures. An insulating pillar (16) is provided along a first direction, the height of which extends through the back electrode layer (15) and part of the photoelectric conversion functional layer; the surface of the insulating pillar (16) away from the transparent conductive layer (11) is flush with the surface of the back electrode layer (15) away from the transparent conductive layer (11). The photoelectric conversion functional layer includes a first charge transport layer (12), a perovskite layer (13), and a second charge transport layer (14) stacked sequentially along a first direction; wherein the first charge transport layer (12) is connected to the transparent conductive layer (11), and the second charge transport layer (14) is connected to the back electrode layer (15). The perovskite solar cell further includes an insulating pillar (17) and a conductive pillar (18); along a first direction, the height of the insulating pillar (16) extends through the back electrode layer (15) and the second charge transport layer (14); the height of the insulating pillar (17) extends through the transparent conductive layer (11) and the first charge transport layer (12); the height of the conductive pillar (18) extends through the first charge transport layer (12) and the perovskite layer (13); along a second direction, the insulating pillar (17), the conductive pillar (18), and the insulating pillar (16) are arranged at intervals in sequence; The width of the isolation post (17) is smaller than the width of the conductive post (18).

2. The perovskite solar cell according to claim 1, characterized in that, The charge carriers transported by the first charge transport layer (12) and the second charge transport layer (14) have opposite polarities.

3. The perovskite solar cell according to claim 1, characterized in that, The isolation column (17), the conductive column (18) and the insulating column (16) are arranged in a column group at intervals along the second direction, and at least two columns are arranged at intervals along the second direction.

4. The perovskite solar cell according to claim 1, characterized in that, The isolation column (17) is made of perovskite.

5. The perovskite solar cell according to claim 1, characterized in that, The conductive pillar (18) is made of the same material as the second charge transport layer (14).

6. The perovskite solar cell according to claim 2, characterized in that, The first charge transport layer (12) is an electron transport layer and the second charge transport layer (14) is a hole transport layer; or, the first charge transport layer (12) is a hole transport layer and the second charge transport layer (14) is an electron transport layer.

7. A method for preparing a perovskite solar cell as described in any one of claims 1-6, characterized in that, The preparation method includes: A substrate (10) having a first surface is provided, and a transparent conductive layer (11) having at least two substructures is prepared on the first surface of the substrate (10). A photoelectric conversion functional layer having at least two substructures is prepared on the surface of the transparent conductive layer (11) away from the substrate (10), and a first sub-groove (101) is formed in the portion of the photoelectric conversion functional layer away from the transparent conductive layer (11). A back electrode layer (15) is prepared on the surface of the photoelectric conversion functional layer away from the transparent conductive layer (11), and a second sub-groove (102) is formed through the back electrode layer (15). The second sub-groove (102) and the first sub-groove (101) are interconnected to form an insulating groove. A first mask (21) is provided on the back electrode layer (15), and the uncovered area of ​​the first mask (21) corresponds to the insulating groove. An insulating material is deposited on the back electrode layer (15) on which the first mask (21) is provided, and the insulating material fills the insulating trench and forms an insulating pillar (16).

8. The preparation method according to claim 7, characterized in that, The preparation of a transparent conductive layer (11) having at least two substructures on the first surface of the substrate (10) includes: A second mask (22) is disposed in a predetermined area on the first surface of the substrate (10). A transparent conductive layer (11) is formed on the substrate (10) on which the second mask (22) is provided by deposition, and a first isolation trench (103) is formed through the transparent conductive layer (11) corresponding to the shielding area of ​​the second mask (22).

9. The preparation method according to claim 8, characterized in that, The preparation of a photoelectric conversion functional layer having at least two substructures on the surface of the transparent conductive layer (11) away from the substrate (10) includes: A third mask (23) is provided in a predetermined area on the surface of the transparent conductive layer (11) away from the substrate (10). A first charge transport layer (12) is formed on the transparent conductive layer (11) on which the third mask (23) is provided by deposition, and a second isolation trench (104) and a first groove (105) are formed respectively corresponding to the shielding area of ​​the third mask (23) to penetrate the first charge transport layer (12); wherein the second isolation trench (104) and the first isolation trench (103) are interconnected to form an isolation trench, and the first groove (105) and the second isolation trench (104) are arranged at intervals along the second direction; A fourth mask (24) is provided in a predetermined area on the surface of the first charge transport layer (12) away from the transparent conductive layer (11). A perovskite layer (13) is formed on the first charge transport layer (12) on which the fourth mask (24) is provided by deposition, and a second groove (106) is formed through the perovskite layer (13) corresponding to the shielding area of ​​the fourth mask (24). The second groove (106) and the first groove (105) are interconnected to form a conductive groove; at the same time, the isolation groove is filled with perovskite material to form an isolation pillar (17). A fifth mask (25) is provided in a predetermined area on the surface of the perovskite layer (13) away from the first charge transport layer (12). A second charge transport layer (14) is formed on the perovskite layer (13) on which the fifth mask (25) is provided by deposition, and a first sub-groove (101) is formed through the second charge transport layer (14) corresponding to the shielding area of ​​the fifth mask (25); at the same time, the through groove is filled with the material of the second charge transport layer (14) to form a conductive pillar (18).

10. The preparation method according to claim 9, characterized in that, A back electrode layer (15) is prepared on the surface of the photoelectric conversion functional layer away from the transparent conductive layer (11), and a second sub-groove (102) is formed through the back electrode layer (15), including: A sixth mask (26) is provided in a predetermined area on the surface of the second charge transport layer (14) away from the perovskite layer (13). A back electrode layer (15) is formed on the second charge transport layer (14) on which the sixth mask (26) is provided by deposition, and a second sub-groove (102) is formed corresponding to the shading area of ​​the sixth mask (26).

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