Deplating wiping liquid and preparation method thereof as well as deplating process of NCVM (Non-Conductive Vacuum Metallization) film layer of plastic product

Abstract

The invention relates to a deplating wiping liquid, which is used for deplating a residual NCVM film layer after laser etching of a plastic product, and comprises the following components in percentage by mass: 4-8% of hydrochloric acid, 3-5% of an organic auxiliary agent and the balance of water, the organic auxiliary agent comprises at least one of ethanol, normal propyl alcohol and isopropyl alcohol. The invention also provides a preparation method of the deplating wiping liquid and a deplating process of an NCVM film layer of a plastic product.

Description

Technical Field

[0001] The invention relates to the technical field of deplating, and in particular to a deplating wiping liquid and a preparation method thereof, and a deplating process for an NCVM film layer of a plastic product. Background Art

[0002] With the need for brand building by enterprises, more and more products are showing their product value by designing iconic LOGO patterns, and electroplating LOGO on products is becoming increasingly popular.

[0003] The electroplated LOGO uses the NCVM coating process. NCVM (vacuum non-conductive electroplating) is a non-conductive vacuum metallization coating process that coats the product with metal and insulating compounds, giving it a metallic luster. After the product is NCVM coated, the NCVM coating in areas other than the LOGO pattern needs to be removed, so that the product has a metallic LOGO pattern. The processing flow of electroplated LOGO on plastic products is: product cleaning - spraying primer - electroplating NCVM - laser carving to remove the NCVM film layer in the non-LOGO area - non-LOGO area stripping - cleaning - inspection. Among them, if part of the NCVM film layer remains in the non-LOGO area after laser carving, it needs to be treated with a stripping wipe.

[0004] In the prior art, a single-component stripping wiping solution, such as a hydrochloric acid solution or a sodium hydroxide solution, is generally used. During the stripping process, there are problems such as uneven and incomplete stripping and low stripping efficiency, resulting in a low product yield. Summary of the invention

[0005] The purpose of the present invention is to provide a stripping wiping liquid and a preparation method thereof and a stripping process for NCVM film layer of a plastic product to solve the problems raised in the above background technology.

[0006] In order to achieve the above object, the present invention adopts the following technical solutions: A deplating wiping liquid is used to remove the NCVM film layer remaining on a plastic product after laser engraving. The deplating wiping liquid is composed of the following components by mass fraction: 4% to 8% hydrochloric acid, 3% to 5% organic additives, and the rest is water; the organic additives include at least one of ethanol, n-propanol, and isopropanol.

[0007] Furthermore, hydrochloric acid was of analytical grade.

[0008] Furthermore, the organic auxiliary agent is ethanol.

[0009] Furthermore, the ethanol is anhydrous ethanol of analytical grade.

[0010] A method for preparing the above-mentioned stripping wiping liquid comprises the following steps: (1) Add the organic additive calculated in proportion into the container; (2) Add water in proportion to the container and stir thoroughly; (3) Slowly add hydrochloric acid calculated in proportion to the container and stir thoroughly.

[0011] Furthermore, the hydrochloric acid in step (3) is drained with the aid of a glass rod, and after the hydrochloric acid is added, the glass rod is used to stir the mixture thoroughly.

[0012] A stripping process for a NCVM film layer of a plastic product comprises the following steps: (1) Remove the NCVM film layer in the area other than the LOGO pattern on the surface of the plastic product through laser engraving process; (2) Using the above-mentioned stripping wiping liquid to wipe and strip the NCVM film layer remaining on the surface of the non-LOGO area of ​​the plastic product; (3) Use anhydrous ethanol to wipe and clean plastic products; (4) Use white spirit to wipe and clean plastic products.

[0013] Furthermore, in step (2), the plastic product is wiped with a dust-free cloth; before wiping the stripping, a small amount of stripping wiping liquid is dipped into the dust-free cloth to wet the surface of the dust-free cloth.

[0014] Furthermore, in step (2) and step (3), different dust-free cloths are used to wipe the plastic product respectively.

[0015] Furthermore, step (2), step (3) and step (4) are all carried out at room temperature.

[0016] Beneficial effects of the present invention: 1. The components of the stripping wiping solution are relatively simple, and the organic additives and hydrochloric acid are relatively cheap and easy to obtain, which can reduce the production cost; in addition, the toxicity and pollution of organic additives and hydrochloric acid are relatively low, and the harm to the environment is relatively small; 2. The preparation steps of the stripping wiping solution are relatively simple and can be prepared at room temperature, with low requirements on equipment configuration; 3. The deplating process is simple, the deplating is uniform and the deplating cleaning effect is good. Not only is the deplating efficiency high, but also the yield rate is high, which can reach more than 92%; 4. The stripping process of the NCVM film layer of plastic products does not require the use of an electrolytic process, which saves energy and plays a certain role in protecting the environment. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for use in the embodiments are briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without creative work.

[0018] Figure 1 Schematic diagram of the process of stripping the NCVM film layer of a plastic product. DETAILED DESCRIPTION

[0019] The specific implementation of the present invention is further described in detail below in conjunction with the accompanying drawings and examples. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0020] A deplating wiping liquid is used to remove the NCVM film layer remaining on a plastic product after laser engraving. The deplating wiping liquid is composed of the following components by mass fraction: 4% to 8% hydrochloric acid, 3% to 5% organic additives, and the rest is water; the organic additives include at least one of ethanol, n-propanol, and isopropanol.

[0021] The NCVM film layer includes indium oxide. The stripping wiping liquid provided by the present invention, which is composed of the above-mentioned specific components with specific contents, has a higher product yield when stripping the NCVM film layer remaining after laser engraving of the plastic product.

[0022] Furthermore, in the present invention, the hydrochloric acid is of analytical grade. In terms of mass fraction, the stripping wiping liquid provided by the present invention includes 4% to 8% of the hydrochloric acid, preferably 4%, 5%, 6%, 7%, 8%, which is not limited here. In a specific embodiment of the present invention, the hydrochloric acid is specifically 4%, 6%, 8%.

[0023] In the present invention, the organic auxiliary agent plays a role in promoting penetration and dissolution. The organic auxiliary agent can help dissolve some water-insoluble organic compounds or inorganic compounds in the NCVM film layer, which helps the stripping wiping liquid to better contact and penetrate into the tiny gap between the NCVM film layer and the substrate, thereby improving the stripping efficiency; in addition, the organic auxiliary agent also plays a cleaning role, which can help clean the surface of the substrate, remove residual NCVM film particles and the stripping wiping liquid components, and prepare for subsequent processes. In the present invention, the stripping wiping liquid provided by the present invention includes 3% to 5% of the organic auxiliary agent, preferably 3%, 3.5%, 4%, 4.5%, and 5%, which are not limited here. In a specific embodiment of the present invention, the hydrochloric acid is specifically 3%, 4%, and 5%.

[0024] Furthermore, in the present invention, the organic auxiliary agent is ethanol, and the ethanol is anhydrous ethanol of analytical grade.

[0025] The water can be conventional water, deionized water, ultrapure water, etc.

[0026] The stripping wiping liquid is preferably specifically composed of the following components: Hydrochloric acid 4%, anhydrous ethanol 5%, water 91%; Or hydrochloric acid 6%, anhydrous ethanol 4%, water 90%; Or hydrochloric acid 8%, anhydrous ethanol 3%, water 89%.

[0027] As described above, the components of the stripping wiping liquid are relatively simple, and the organic additives and the hydrochloric acid are relatively cheap and easily available, which can reduce production costs; in addition, the toxicity and pollution of the organic additives and the hydrochloric acid are relatively low, and the harm to the environment is relatively small.

[0028] The present invention provides a method for preparing the above-mentioned stripping wiping liquid, comprising the following steps: (1) Add the organic additive calculated in proportion into the container; (2) Add water in proportion to the container and stir thoroughly; (3) Slowly add hydrochloric acid in proportion to the container and stir thoroughly.

[0029] Furthermore, the hydrochloric acid in step (3) is drained with the aid of a glass rod. After the hydrochloric acid is added, the glass rod is used to stir the solution sufficiently to prevent the hydrochloric acid from releasing heat during the addition process.

[0030] As described above, the preparation steps of the stripping wiping liquid are relatively simple, and it is prepared at room temperature, with low requirements on equipment configuration.

[0031] In addition, the present invention also provides a stripping process for the NCVM film layer of a plastic product, comprising the following steps: (1) Remove the NCVM film layer in the area other than the LOGO pattern on the surface of the plastic product through the laser engraving process; the specific parameters of the laser engraving stripping are set as follows:

[0032] (2) Using the above-mentioned deplating wiping liquid to wipe and deplating the NCVM film layer remaining on the surface of the non-LOGO area of ​​the plastic product for 1 minute; (3) Wiping and cleaning the plastic product with anhydrous ethanol; (4) Use white spirit to wipe and clean the plastic product.

[0033] Furthermore, in step (2), the plastic product is wiped with a dust-free cloth; before wiping the stripping, a small amount of the stripping wiping liquid is dipped into the dust-free cloth to wet the surface of the dust-free cloth.

[0034] Furthermore, in step (2) and step (3), different dust-free cloths are used to wipe the plastic product respectively.

[0035] Furthermore, the wiping in step (2), step (3) and step (4) is all performed at room temperature.

[0036] In order to further illustrate the present invention, a stripping wiping liquid and a preparation method thereof and a stripping process of a NCVM film layer of a plastic product provided by the present invention are described in detail below in conjunction with embodiments, but they should not be construed as limiting the scope of protection of the present invention.

[0037] Embodiment 1: The deplating wiping solution is specifically composed of the following components: 4% hydrochloric acid, 5% anhydrous ethanol, and 91% water; After removing the NCVM film layer in the area other than the LOGO pattern on the surface of the plastic product through the laser engraving process, the NCVM film layer remaining on the surface of the non-LOGO area of ​​the plastic product is wiped and de-plated for 1 minute using the de-plating wiping liquid, and then the plastic product is wiped and cleaned with anhydrous ethanol, and then the plastic product is wiped and cleaned with white spirit.

[0038] Embodiment 2: The deplating wiping solution is specifically composed of the following components: 6% hydrochloric acid, 4% anhydrous ethanol, and 90% water; After removing the NCVM film layer in the area other than the LOGO pattern on the surface of the plastic product through the laser engraving process, the NCVM film layer remaining on the surface of the non-LOGO area of ​​the plastic product is wiped and de-plated for 1 minute using the de-plating wiping liquid, and then the plastic product is wiped and cleaned with anhydrous ethanol, and then the plastic product is wiped and cleaned with white spirit.

[0039] Embodiment 3: The deplating wiping solution is specifically composed of the following components: 8% hydrochloric acid, 3% anhydrous ethanol, and 89% water; After removing the NCVM film layer in the area other than the LOGO pattern on the surface of the plastic product through the laser engraving process, the NCVM film layer remaining on the surface of the non-LOGO area of ​​the plastic product is wiped and de-plated for 1 minute using the de-plating wiping liquid, and then the plastic product is wiped and cleaned with anhydrous ethanol, and then the plastic product is wiped and cleaned with white spirit.

[0040] Comparative Example 1: The deplating wiping solution is specifically composed of the following components: 4% hydrochloric acid, 10% anhydrous ethanol, and 86% water; After removing the NCVM film layer in the area other than the LOGO pattern on the surface of the plastic product through the laser engraving process, the NCVM film layer remaining on the surface of the non-LOGO area of ​​the plastic product is wiped and de-plated for 1 minute using the de-plating wiping liquid, and then the plastic product is wiped and cleaned with anhydrous ethanol, and then the plastic product is wiped and cleaned with white spirit.

[0041] Comparative Example 2: The deplating wiping solution specifically consists of the following components: 4% hydrochloric acid and 96% water; After removing the NCVM film layer in the area other than the LOGO pattern on the surface of the plastic product through the laser engraving process, the NCVM film layer remaining on the surface of the non-LOGO area of ​​the plastic product is wiped and de-plated for 1 minute using the de-plating wiping liquid, and then the plastic product is wiped and cleaned with anhydrous ethanol, and then the plastic product is wiped and cleaned with white spirit.

[0042] The performance test results of the stripping wiping liquid prepared in Examples 1 to 3 of the present invention and Comparative Examples 1 to 2 are as follows:

[0043] As can be seen from the above table, the present invention provides the deplating wiping liquid, and the deplating wiping liquid of the present invention is used to deplating the NCVM film layer remaining on the surface of the non-LOGO area of ​​the plastic product. The deplating process is simple, the deplating is uniform, and the deplating cleaning effect is good. Not only is the deplating efficiency high, but also the yield rate is high, which can reach more than 92%.

[0044] In addition, the stripping process of the NCVM film layer of the plastic product does not require the use of an electrolytic process, which saves energy and plays a certain role in protecting the environment.

[0045] In the accompanying drawings, the sizes and relative sizes of layers and regions are exaggerated for clarity. It should be understood that when an element, such as a layer, region, or substrate, is referred to as being "formed on," "disposed on," or "located on" another element, the element may be disposed directly on the other element, or there may be intervening elements. Conversely, when an element is referred to as being "formed directly on" or "disposed directly on" another element, there are no intervening elements.

[0046] In this document, unless otherwise specified or limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms can be understood according to specific circumstances.

[0047] In this document, the directions or positional relationships indicated by terms such as "up", "down", "front", "back", "left", "right", "top", "bottom", "inside", "outside", "vertical", and "horizontal" are based on the directions or positional relationships shown in the accompanying drawings and are only for the clarity of the technical solution and the convenience of description, and therefore should not be understood as limitations on this application.

[0048] In this document, the ordinal adjectives “first”, “second”, etc. used to describe elements are only used to distinguish elements with similar attributes, and do not mean that the elements described in this way must follow a given order, or time, space, level or other limitations.

[0049] As used herein, unless otherwise specified, “plurality” or “several” means two or more.

[0050] In this document, the terms "comprises," "comprising," or any other variations thereof, are intended to cover a non-exclusive inclusion of elements other than those listed and may also include additional elements not expressly listed.

[0051] The above is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Any person skilled in the art can easily think of changes or substitutions within the technical scope disclosed by the present invention, which should be included in the protection scope of the present invention. Therefore, the protection scope of the present invention should be based on the protection scope of the claims.

Claims

1. A stripping wiping liquid, used to remove the NCVM film layer remaining after laser engraving of plastic products, characterized in that: The stripping wiping solution is composed of the following components by mass fraction: 4% to 8% hydrochloric acid, 3% to 5% organic additive, and the rest is water; The organic auxiliary agent includes at least one of ethanol, n-propanol and isopropanol.

2. The stripping wiping liquid according to claim 1, characterized in that: The hydrochloric acid used was of analytical grade.

3. The stripping wiping liquid according to claim 2, characterized in that: The organic auxiliary agent is ethanol.

4. The stripping wiping liquid according to claim 3, characterized in that: The ethanol is anhydrous ethanol of analytical grade.

5. A method for preparing the stripping wiping liquid according to any one of claims 1 to 4, characterized in that: The following steps are involved: (1) Add the organic additive calculated in proportion into the container; (2) Add water in proportion to the container and stir thoroughly; (3) Slowly add hydrochloric acid in proportion to the container and stir thoroughly.

6. The method for preparing the stripping wiping liquid according to claim 5, characterized in that: The hydrochloric acid in step (3) is drained with the aid of a glass rod. After the hydrochloric acid is added, the glass rod is used to stir the solution thoroughly.

7. A stripping process for NCVM film layer of plastic products, characterized in that: The following steps are involved: (1) Remove the NCVM film layer in the area other than the LOGO pattern on the surface of the plastic product through laser engraving process; (2) using the stripping wiping liquid as claimed in any one of claims 1 to 4 to strip the NCVM film layer remaining on the surface of the non-LOGO area of ​​the plastic product; (3) Wiping and cleaning the plastic product with anhydrous ethanol; (4) Use white spirit to wipe and clean the plastic product.

8. The stripping process of the NCVM film layer of a plastic product as claimed in claim 7, characterized in that: In the step (2), the plastic product is wiped with a dust-free cloth; before wiping and stripping, a small amount of the stripping wiping liquid is dipped into the dust-free cloth to wet the surface of the dust-free cloth.

9. The stripping process of the NCVM film layer of a plastic product as claimed in claim 7, characterized in that: In step (2) and step (3), different dust-free cloths are used to wipe the plastic product respectively.

10. The stripping process of the NCVM film layer of a plastic product as claimed in claim 7, characterized in that: The step (2), the step (3) and the step (4) are all carried out at room temperature.

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