Far-field super-resolution bifocus generation method and system

Abstract

The invention discloses a far-field super-resolution bifocus generation method and system, and relates to the technical field of far-field super-resolution focusing application, and the method comprises the steps: obtaining an incident light field, carrying out the optimization of the binary phase regulation of super-oscillation masks with different focal lengths based on an angular spectrum diffraction theory and a binary particle swarm optimization algorithm, and obtaining a far-field super-resolution bifocus. Boolean logic AND operation is carried out on the obtained different-focal-length single-focus focusing regulation and control phase distribution to obtain far-field super-resolution double-focus focusing super-oscillation mask binary phase distribution, a super-oscillation mask is generated according to the mapping relation between the far-field super-resolution double-focus focusing super-oscillation mask binary phase distribution and pixel point gray values of a picture loaded by a spatial light modulator, and a corresponding gray-scale map is obtained; and performing phase modulation on the incident light field by using the grey-scale map to obtain a focused light field and three-dimensional intensity distribution of the focused light field. According to the invention, a plurality of single-focus focusing regulation phases are converted into double-focus focusing regulation phases through Boolean logic AND operation, the generated double focuses can break through the diffraction limit, and the device is simple in structure and convenient to use and operate.

Description

Technical Field

[0001] The present application relates to the technical field of far-field super-resolution focusing applications, and in particular to a far-field super-resolution dual-focus generation method and system. Background Art

[0002] A bifocal lens has two focal points in the longitudinal or transverse direction and is widely used in optical tomography, optical communications, spectral analysis, and optical imaging.

[0003] The existing technology provides some methods for generating dual focal points. For example, a plasma metal film suitable for λ=740nm circularly polarized waves is designed by combining the geometric phase and propagation phase of titanium dioxide superatoms. The metal film is divided into multiple regions, each corresponding to a focus; a deep learning forward genetic algorithm is proposed to efficiently design the parameters of the metalens, and a dual-focus metalens is designed for a wavelength of 1.55μm, but the focal spot size is large, and the diffraction limit is not broken. In order to break the diffraction limit, relevant technicians used genetic algorithms to design a multi-focus super-oscillation lens for circularly polarized light with a wavelength of 532nm, and the half-height full width of the focal spot was close to λ / 3. The focus generated by the above report breaks the diffraction limit, but the above method relies on complex optimization algorithms and fitness functions, and the device processing is difficult.

[0004] As a component that modulates the light field distribution of light waves, spatial light modulators are often used in light field control research. However, the existing methods of using spatial light modulators to generate super-resolution dual-focus have problems such as complex optical path adjustment and difficult alignment and calibration.

[0005] Therefore, based on the above problems, it is urgent to provide a new far-field super-resolution dual-focus generation method. Summary of the invention

[0006] The purpose of this application is to provide a far-field super-resolution dual-focus generation method and system, which can enable the generated dual focus to break through the diffraction limit and has a simple structure and is easy to use and operate.

[0007] To achieve the above objectives, this application provides the following solutions:

[0008] In a first aspect, the present application provides a far-field super-resolution dual-focus generation method, wherein the far-field super-resolution dual-focus generation method comprises:

[0009] Obtaining the incident light field, the focus type of the target light field and the focusing parameters of the far-field super-resolution focusing; the focusing parameters include: focal length, peak intensity, focal spot half-height full width and sidelobe ratio;

[0010] According to the focusing parameters and the target light field focusing type, the binary phase control of the super-oscillating mask with different focal lengths is optimized based on the angular spectrum diffraction theory and the binary particle swarm optimization algorithm to obtain the phase distribution of single-focus focusing control with different focal lengths.

[0011] The Boolean logic "AND" operation is performed on the phase distribution of single-focus focusing control with different focal lengths to obtain the binary phase distribution of the far-field super-resolution dual-focus focusing super-oscillation mask;

[0012] According to the mapping relationship between the binary phase distribution of the far-field super-resolution dual-focus focusing super-oscillation mask and the grayscale value of the pixel point of the image loaded by the spatial light modulator, a super-oscillation mask is generated to obtain the corresponding grayscale image;

[0013] The incident light field is phase modulated using the grayscale image to obtain a focused light field;

[0014] According to the focused light field, a three-dimensional intensity distribution of the focused light field is obtained.

[0015] Optionally, the mapping relationship is a linear relationship, and when the phase adjustment is 0, the corresponding grayscale is 0, and when the phase adjustment is π, the corresponding grayscale is 128.

[0016] Optionally, obtaining a three-dimensional intensity distribution of the focused light field according to the focused light field specifically includes:

[0017] Amplifying the focused light field and determining an image of the amplified focused light field;

[0018] According to the image of the magnified focused light field, the center position of the focused spot is determined by using the centroid method;

[0019] Determine the light field intensity distribution curve along the radial direction according to the gray value of the image of the amplified focused light field;

[0020] Determine the key focusing parameters of the concentrated focal spot according to the peak intensity of the light field intensity distribution curve along the radial direction; the key focusing parameters of the concentrated focal spot include: the light field intensity corresponding to the focal spot center, the focal spot width and the sidelobe ratio;

[0021] The three-dimensional intensity distribution of the focused light field is obtained according to the key focusing parameters of the focused spot.

[0022] In a second aspect, the present application provides a far-field super-resolution dual-focus generation system for implementing the far-field super-resolution dual-focus generation method, wherein the far-field super-resolution dual-focus generation system comprises, in sequence: a laser, a linear polarizer, a quarter glass, a first reflector, a second reflector, a beam expander, a spatial light modulator, a zoom lens, a CMOS camera, and a computer; the computer is also connected to the spatial light modulator;

[0023] The laser is used to output a light beam;

[0024] The linear polarizer and the quarter glass are used to convert the light beam output by the laser into circularly polarized light;

[0025] The first reflector and the second reflector are used to change the transmission direction of the circularly polarized light path and input it into the beam expander;

[0026] The beam expander is used to amplify the diameter of the input circularly polarized light to obtain a uniform incident light field;

[0027] The computer is used to optimize the binary phase control of the super-oscillation mask with different focal lengths based on the angular spectrum diffraction theory and the binary particle swarm optimization algorithm according to the focusing parameters and the target light field focusing type, obtain the single focus focusing control phase distribution with different focal lengths, and perform Boolean logic "AND" operation on the single focus focusing control phase distribution with different focal lengths to obtain the binary phase distribution of the far-field super-resolution dual-focus focusing super-oscillation mask; generate the super-oscillation mask according to the mapping relationship between the binary phase distribution of the far-field super-resolution dual-focus focusing super-oscillation mask and the grayscale value of the pixel point of the picture loaded by the spatial light modulator, and obtain the corresponding grayscale image;

[0028] The spatial light modulator is used to perform phase modulation with the incident light field using the grayscale image to obtain a focused light field;

[0029] The zoom lens is used to amplify the focused light field;

[0030] The CMOS camera is used to scan and photograph the amplified focused light field, and send the scanned and photographed image to the computer;

[0031] The computer is used to obtain the three-dimensional intensity distribution of the focused light field according to the scanned image.

[0032] Optionally, the laser is a HeNe laser with a wavelength of 632.8 nm.

[0033] Optionally, the minimum output power of the laser is 10 mW, and the beam diameter is 0.68 mm.

[0034] Optionally, the spatial light modulator is a pure phase reflective spatial light modulator with a pixel pitch of 8 μm, a resolution of 1920*1080 pixels, and a phase level of 256.

[0035] Optionally, the magnification of the zoom lens is 2.5 times.

[0036] Optionally, the CMOS camera is in black and white.

[0037] Optionally, the resolution of the CMOS camera is 3840*2748 pixels, and the pixel size is 1.67 μm*1.67 μm.

[0038] According to the specific embodiments provided in this application, this application has the following technical effects:

[0039] The present application provides a far-field super-resolution dual-focus generation method and system, by obtaining the incident light field, the focus type of the target light field and the focus parameters of the far-field super-resolution focusing; according to the focus parameters and the focus type of the target light field, the binary phase control of the super-oscillation mask of different focal lengths is optimized based on the angular spectrum diffraction theory and the binary particle swarm optimization algorithm; and the Boolean logic "AND" operation is performed on the focus control phase distribution of the single focus with different focal lengths to obtain the binary phase distribution of the super-oscillation mask of the far-field super-resolution dual-focus focusing; multiple single focus focus control phases are converted into dual focus focus control phases through the Boolean logic "AND" operation. The design method is simple and efficient, and different focal positions can be designed according to actual needs. According to the method provided in the present application, when the circularly polarized light of λ=632.8nm is incident, the diffraction limit is broken and super-resolution focusing is achieved. The present application can make the generated dual focus break the diffraction limit. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0041] Figure 1 A flow chart of a far-field super-resolution dual-focus generation method provided in an embodiment of the present application;

[0042] Figure 2 A schematic diagram of the process of obtaining a grayscale image;

[0043] Figure 3 A schematic diagram of the structure of a far-field super-resolution dual-focus generation system provided in an embodiment of the present application;

[0044] Figure 4 is the phase distribution diagram of the super-oscillation mask;

[0045] Figure 5 To load the grayscale image of the spatial light modulator, Figure 5 Part (a) is the overall picture of the grayscale image loaded into the spatial light modulator. Figure 5 Part (b) is a local enlarged view of the grayscale image);

[0046] Figure 6It is the light field intensity distribution diagram of the propagation plane of single focus focusing and dual focus focusing and the dual focus focusing parameter curve diagram;

[0047] Figure 7 It is the super-resolution dual-focus focusing XY plane light field intensity distribution diagram and the X-axis and Y-axis intensity distribution curves.

[0049] 1-Laser, 2-Linear polarizer, 3-Quarter glass, 4-First reflector, 5-Second reflector, 6-Beam expander, 7-Spatial light modulator, 8-Zoom lens, 9-CMOS camera, 10-Computer. DETAILED DESCRIPTION

[0050] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0051] In order to make the above-mentioned objects, features and advantages of the present application more obvious and easy to understand, the present application is further described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0052] In an exemplary embodiment, Figure 1 As shown, the present application provides a far-field super-resolution dual-focus generation method, the method comprising:

[0053] S101, acquiring focusing parameters of an incident light field, a target light field focusing type and far-field super-resolution focusing; the focusing parameters include: focal length, peak intensity, focal spot half-height full width and sidelobe ratio.

[0054] S102, according to the focusing parameters and the target light field focusing type, the binary phase control of the super oscillation mask with different focal lengths is optimized based on the angular spectrum diffraction theory (ASM) and the binary particle swarm optimization (BPSO) algorithm to obtain the focusing control phase distribution of single focus with different focal lengths.

[0055] The optimization design process of the control phase first gives the focusing parameters of the super-oscillation mask, and uses the binary particle swarm algorithm to initialize the control phase distribution of the super-oscillation mask. Each time the control phase distribution is updated, the angular spectrum diffraction theory is used to calculate the diffraction focused light field on the focal plane until the design requirements are met, and the control phase distribution of the super-oscillation mask and the focused light field at the focal length are obtained.

[0056] S103, performing Boolean logic “AND” operation on the phase distribution of single-focus focusing control with different focal lengths to obtain the binary phase distribution of the far-field super-resolution dual-focus focusing super-oscillation mask.

[0057] S104, generating a super oscillation mask according to the mapping relationship between the binary phase distribution of the far-field super-resolution dual-focus focusing super oscillation mask and the grayscale value of the pixel point of the image loaded into the spatial light modulator, and obtaining a corresponding grayscale image.

[0058] Specifically, the mapping relationship between the binary phase (0-2π) distribution of the far-field super-resolution dual-focus focusing super-oscillation mask and the pixel grayscale value (0-255) of the image loaded by the spatial light modulator is a linear relationship. When the phase control is 0, the corresponding grayscale is 0, and when the phase control is π, the corresponding grayscale is 128.

[0059] S105, performing phase modulation on the incident light field using the grayscale image to obtain a focused light field.

[0060] S106, obtaining a three-dimensional intensity distribution of the focused light field according to the focused light field.

[0061] S106 specifically includes:

[0062] S1061, amplify the focused light field and determine an image of the amplified focused light field.

[0063] S1062, according to the image of the magnified focused light field, the center position of the focused spot in the image is determined by the centroid method. The higher the gray value in the captured image, the higher the intensity of the position, thereby drawing a light field intensity distribution curve along the radial direction.

[0064] S1063, determining key focusing parameters of the concentrated focal spot according to the peak intensity of the light field intensity distribution curve along the radial direction; the key focusing parameters of the concentrated focal spot include: light field intensity corresponding to the focal spot center, focal spot width and sidelobe ratio.

[0065] S1064, obtaining a three-dimensional intensity distribution of the focused light field according to the key focusing parameters of the focused focal spot.

[0066] In an exemplary embodiment, Figure 2 As shown in the figure, the grayscale image generation process is:

[0067] Step 1: Set the target light field focusing type and the main parameters of far-field super-resolution focusing to provide a fitness function for subsequent iterative optimization. This application uses the target function as the fitness function, including focal length, peak intensity, focal spot half-height full width and sidelobe ratio. The definition formula of the fitness function is:

[0068] Fitness=ω1|ΔI peak |+ω2|ΔFWHM|+ω3|ΔSR|.

[0069] Where ω1, ω2 and ω3 correspond to the weight coefficients of peak intensity, half-maximum full width and sidelobe ratio respectively; ΔI peak , ΔFWHM and ΔSR are the differences between the peak intensity, full width at half maximum and sidelobe ratio calculated by the optimal particle (device) in each iteration and the target set values.

[0070] Step 2: After establishing the fitness function of the optimized design, set the incident light field type to circularly polarized beam.

[0071] Step 3: To implement binary control of the phase within the range of 0 to 1 in this application, the light field control type is set to binary phase type.

[0072] Step 4: First design the single focus focusing phase distribution, and use the angular spectrum diffraction theory and particle swarm optimization algorithm to optimize the control phase of single focus with different focal lengths (f1, f2).

[0073] Step 5: Perform a logical “AND” operation on the single-focus focusing phase distribution to obtain a dual-focus focusing phase distribution.

[0074] Step 6: Generate a super-oscillation mask based on the mapping relationship between the phase control of the spatial light modulator and the grayscale value of the pixel of the loaded image to obtain the corresponding grayscale image.

[0075] like Figure 3 As shown, based on a far-field super-resolution dual-focus generation method provided by the present application, the present application provides a far-field super-resolution dual-focus generation system, which comprises in sequence: a laser 1, a linear polarizer 2, a quarter glass plate 3, a first reflector 4, a second reflector 5, a beam expander 6, a spatial light modulator 7, a zoom lens 8, a CMOS camera 9 and a computer 10, and the computer 10 is also connected to the spatial light modulator 7.

[0076] The laser 1 is used to output a light beam; the linear polarizer 2 and the quarter glass 3 are used to convert the light beam output by the laser 1 into circularly polarized light; the first reflector 4 and the second reflector 5 are used to change the transmission direction of the circularly polarized light path and input it to the beam expander 6; the beam expander 6 is used to amplify the diameter of the input circularly polarized light to obtain a uniform incident light field; the computer 10 is used to optimize the binary phase control of the super oscillation mask with different focal lengths based on the angular spectrum diffraction theory and the binary particle swarm optimization algorithm according to the focusing parameters and the target light field focusing type, to obtain the phase distribution of the single focus focusing control with different focal lengths, and to perform a Boolean logic "and" operation on the phase distribution of the single focus focusing control with different focal lengths to obtain the far Field super-resolution dual-focus focusing super-oscillation mask binary phase distribution; according to the mapping relationship between the binary phase distribution of the far-field super-resolution dual-focus focusing super-oscillation mask and the grayscale value of the pixel point of the picture loaded by the spatial light modulator 7, a super-oscillation mask is generated to obtain a corresponding grayscale image; the spatial light modulator 7 is used to use the grayscale image to perform phase modulation with the incident light field, interfere at the focal length f, form a far-field super-resolution dual-focus focusing, and obtain a focused light field; the zoom lens 8 is used to amplify the focused light field; the CMOS camera 9 is used to scan and shoot the amplified focused light field, and send the scanned and shot image to the computer 10; the computer 10 is used to obtain the three-dimensional intensity distribution of the focused light field according to the scanned and shot image.

[0077] Specifically, the laser 1 is a HeNe laser with a wavelength of 632.8 nm, a minimum output power of the laser 1 is 10 mW, and a beam diameter is 0.68 mm.

[0078] Specifically, the spatial light modulator 7 is a pure phase reflective spatial light modulator with a pixel pitch of 8 μm, a resolution of 1920*1080 pixels, and a phase level of 256.

[0079] Specifically, the magnification of the zoom lens 8 is 2.5 times.

[0080] Specifically, the color of the CMOS camera 9 is a black and white camera.

[0081] Specifically, the resolution of the CMOS camera 9 is 3840*2748 pixels, and the pixel size is 1.67 μm*1.67 μm.

[0082] The effect of this application is specifically described below through a specific embodiment:

[0083] In this embodiment, the structural parameters of the super-resolution dual-focus super-oscillation mask are: working wavelength λ=632.8nm, radius r=4000λ (2.531mm), focal length f1=280000λ (177.184mm), f2=300000λ (189.840mm). Figure 4 The phase distribution of the single-focus and dual-focus super-oscillation masks at radii 0-1000λ, 1000λ-2000λ, 2000λ-4000λ, and 3000λ-4000λ are shown respectively. The grayscale image corresponding to the dual-focus super-oscillation mask is shown in Figure 4 As shown, Figure 5 Part (a) is the grayscale image loaded into the spatial light modulator 7, Figure 5 Part (b) is a local enlarged image of the rectangular frame area. After the grayscale image is loaded into the spatial light modulator 7, different voltages are applied to the liquid crystal molecules on the spatial light modulator 7 according to different grayscale values, and the phase of the light field is regulated under the action of the electro-optical effect of the liquid crystal molecules.

[0084] Figure 6 They are the light field intensity distribution in the focal length propagation direction of single focus f1 focusing, single focus f2 focusing and dual focus f1f2 respectively. It can be seen that the dual focus is successfully obtained in the case of the present invention; Figure 6 Part (d) is the peak intensity and transverse half-height full width distribution curve in the propagation direction. The solid line is the experimental result, and the dotted line is the design result. Figure 6 It can be seen that the light field intensity obtained by the design and the experiment is consistent and super-resolution focusing is achieved.

[0085] Figure 7 is the experimental result of dual-focus focusing on XY plane, where: Figure 7 Part (a) and Figure 7 Part (b) shows the light field intensity distribution in the XY plane at f1=280000λ and the intensity distribution curves in the x-axis direction (solid line) and y-axis direction (dotted line). Figure 7 Part (c) and Figure 7 Part (d) shows the intensity distribution of the light field in the XY plane at f2 = 300000λ and the intensity distribution curves in the x-axis direction (solid line) and y-axis direction (dotted line). The FWHM corresponding to the x-axis direction x The FWHM in the y-axis direction is 20.068μm and 22.563μm. y The optical resolution is 18.913μm and 23.020μm, both lower than the diffraction limit (the diffraction limit at f1=280000 is 22.150μm, and the diffraction limit at f2=300000λ is 23.732μm), achieving far-field super-resolution dual-focus focusing.

[0086] The technical features of the above embodiments may be combined arbitrarily. To make the description concise, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0087] This article uses specific examples to illustrate the principles and implementation methods of this application. The description of the above embodiments is only used to help understand the method and core ideas of this application. At the same time, for those skilled in the art, according to the ideas of this application, there will be changes in the specific implementation methods and application scope. In summary, the content of this specification should not be understood as limiting this application.

Claims

1. A far-field super-resolution dual-focus generation method, characterized in that: The far-field super-resolution dual-focus generation method comprises: Obtaining the incident light field, the focus type of the target light field and the focusing parameters of the far-field super-resolution focusing; the focusing parameters include: focal length, peak intensity, focal spot half-height full width and sidelobe ratio; According to the focusing parameters and the target light field focusing type, the binary phase control of the super-oscillating mask with different focal lengths is optimized based on the angular spectrum diffraction theory and the binary particle swarm optimization algorithm to obtain the phase distribution of single-focus focusing control with different focal lengths. The Boolean logic "AND" operation is performed on the phase distribution of single-focus focusing control with different focal lengths to obtain the binary phase distribution of the far-field super-resolution dual-focus focusing super-oscillation mask; According to the mapping relationship between the binary phase distribution of the far-field super-resolution dual-focus focusing super-oscillation mask and the grayscale value of the pixel point of the image loaded by the spatial light modulator, a super-oscillation mask is generated to obtain the corresponding grayscale image; The incident light field is phase modulated using the grayscale image to obtain a focused light field; According to the focused light field, a three-dimensional intensity distribution of the focused light field is obtained.

2. The far-field super-resolution dual-focus generation method according to claim 1, characterized in that: The mapping relationship is a linear relationship. When the phase control is 0, the corresponding grayscale is 0, and when the phase control is π, the corresponding grayscale is 128.

3. The far-field super-resolution dual-focus generation method according to claim 1, characterized in that: The step of obtaining a three-dimensional intensity distribution of the focused light field according to the focused light field specifically includes: Amplifying the focused light field and determining an image of the amplified focused light field; According to the image of the magnified focused light field, the center position of the focused spot is determined by using the centroid method; Determine the light field intensity distribution curve along the radial direction according to the gray value of the image of the amplified focused light field; Determine the key focusing parameters of the concentrated focal spot according to the peak intensity of the light field intensity distribution curve along the radial direction; the key focusing parameters of the concentrated focal spot include: the light field intensity corresponding to the focal spot center, the focal spot width and the sidelobe ratio; The three-dimensional intensity distribution of the focused light field is obtained according to the key focusing parameters of the focused spot.

4. A far-field super-resolution dual-focus generation system, used to implement the far-field super-resolution dual-focus generation method according to any one of claims 1 to 3, characterized in that: The far-field super-resolution dual-focus generation system comprises, in sequence: a laser, a linear polarizer, a quarter glass, a first reflector, a second reflector, a beam expander, a spatial light modulator, a zoom lens, a CMOS camera and a computer; the computer is also connected to the spatial light modulator; The laser is used to output a light beam; The linear polarizer and the quarter glass are used to convert the light beam output by the laser into circularly polarized light; The first reflector and the second reflector are used to change the transmission direction of the circularly polarized light path and input it into the beam expander; The beam expander is used to amplify the diameter of the input circularly polarized light to obtain a uniform incident light field; The computer is used to optimize the binary phase control of the super-oscillation mask with different focal lengths based on the angular spectrum diffraction theory and the binary particle swarm optimization algorithm according to the focusing parameters and the target light field focusing type, obtain the single focus focusing control phase distribution with different focal lengths, and perform Boolean logic "and" operation on the single focus focusing control phase distribution with different focal lengths to obtain the binary phase distribution of the far-field super-resolution dual-focus focusing super-oscillation mask; generate the super-oscillation mask according to the mapping relationship between the binary phase distribution of the far-field super-resolution dual-focus focusing super-oscillation mask and the grayscale value of the pixel point of the picture loaded by the spatial light modulator, and obtain the corresponding grayscale image; The spatial light modulator is used to perform phase modulation with the incident light field using the grayscale image to obtain a focused light field; The zoom lens is used to amplify the focused light field; The CMOS camera is used to scan and photograph the amplified focused light field, and send the scanned and photographed image to the computer; The computer is used to obtain the three-dimensional intensity distribution of the focused light field according to the scanned image.

5. The far-field super-resolution dual-focus generation system according to claim 4, characterized in that: The laser is a HeNe laser with a wavelength of 632.8 nm.

6. The far-field super-resolution dual-focus generation system according to claim 5, characterized in that: The minimum output power of the laser is 10 mW, and the beam diameter is 0.68 mm.

7. The far-field super-resolution dual-focus generation system according to claim 4, characterized in that: The spatial light modulator is a pure phase reflective spatial light modulator with a pixel pitch of 8 μm, a resolution of 1920*1080 pixels, and a phase level of 256.

8. The far-field super-resolution dual-focus generation system according to claim 4, characterized in that: The magnification of the zoom lens is 2.5 times.

9. The far-field super-resolution dual-focus generation system according to claim 4, characterized in that: The CMOS camera is a black and white camera.

10. The far-field super-resolution dual-focus generation system according to claim 9, characterized in that: The resolution of the CMOS camera is 3840*2748 pixels, and the pixel size is 1.67 μm*1.67 μm.

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