Multi-piece type slit valve gate

Abstract

A slit gate is disclosed. The slit valve gate includes a base portion configured to be coupled to a slit valve actuator. The slit valve gate further includes a sealing portion coupled to the base portion. The sealing portion is configured to establish a hermetic seal between the slit valve gate and a sealing surface of the slit valve opening. The slit valve gate further includes a clamping portion coupled to the base portion. The clamping portion at least partially retains a sealing portion between the clamping portion and the base portion.

Description

Technical Field

[0001] Embodiments of the present disclosure relate generally to the field of substrate processing systems, and particularly to a multi-piece slit valve gate. Background Art

[0002] Substrates are typically processed in vacuum processing systems. These systems include one or more chambers that each perform a substrate processing operation (such as etching, chemical vapor deposition, or physical vapor deposition), which may include heating or cooling of the substrate, and plasma to assist the process. Typically, the environment within such a processing chamber is maintained at a low sub-atmospheric pressure. Each chamber includes an inlet and outlet for evacuation equipment and process gas admission, and a slit controlled by a slit valve to receive the substrate. Such a processing chamber may be in communication with a substrate transfer chamber, and the substrate transfer chamber may also have a valve-controlled slit through which a substrate may be received from outside the system.

[0003] The slit valve that opens and closes the slit is typically housed in a port positioned between adjacent chambers. The port typically houses at least one gate coupled to an actuator for manipulating the gate. The actuator may be a pneumatic actuator including one or more pistons for moving the gate from an open position (in which the gate does not isolate one chamber from an adjacent chamber and the slit is open) to a closed position (in which the gate isolates one chamber from an adjacent chamber and the slit is closed), and vice versa. Summary of the invention

[0004] In certain embodiments, the present disclosure is directed to a slit valve gate, the slit valve gate comprising a base portion configured to be coupled to a slit valve actuator. The slit valve gate further comprises a sealing portion coupled to the base portion. The sealing portion is configured to establish an airtight seal between the slit valve gate and a sealing surface of a slit valve opening. The slit valve gate further comprises a clamping portion coupled to the base portion. The clamping portion at least partially holds the sealing portion between the clamping portion and the base portion.

[0005] In certain embodiments, the present disclosure is directed to a slit valve comprising a slit valve opening and a slit valve actuator. The slit valve further comprises a slit valve gate coupled to the slit valve actuator. The slit valve gate is configured to seal the slit valve opening in response to the slit valve actuator moving the slit valve gate to a closed position. The slit valve gate comprises a base portion. The slit valve gate is coupled to the slit valve actuator via the base portion. The slit valve gate further comprises a sealing portion coupled to the base portion. The sealing portion is configured to establish an airtight seal between the slit valve gate and a sealing surface of the slit valve opening in response to the slit valve actuator moving the slit valve gate to a closed position. The slit valve gate further comprises a clamping portion coupled to the base portion. The clamping portion at least partially retains the sealing portion between the clamping portion and the base portion.

[0006] In certain embodiments, the present disclosure is directed to a method. The method includes coupling a sealing portion of a slit valve gate to a base portion of the slit valve gate. The sealing portion is configured to establish an airtight seal between the slit valve gate and a sealing surface of a slit valve opening. The method further includes coupling a clamping portion of the slit valve gate to the base portion. Coupling the clamping portion to the base portion causes the clamping portion to at least partially retain the sealing portion between the clamping portion and the base portion. BRIEF DESCRIPTION OF THE DRAWINGS

[0007] The present disclosure is illustrated in the figures of the accompanying drawings by way of example and not limitation, wherein like reference numerals indicate similar elements. It should be noted that different references to "an" or "one" embodiment in the present disclosure do not necessarily refer to the same embodiment, and such references mean at least one embodiment.

[0008] Figure 1 A schematic top view of a wafer processing system according to an embodiment of the present disclosure is shown.

[0009] Figure 2 A simplified perspective view of a slit valve device is shown in accordance with an embodiment of the present disclosure.

[0010] Figure 3A A simplified perspective view of a slit valve gate according to an embodiment of the present disclosure is shown.

[0011] Figure 3B A simplified perspective view of an exploded slit valve gate is shown in accordance with an embodiment of the present disclosure.

[0012] FIG. 4A to FIG. 4B A cross-sectional view of a slit valve gate according to an embodiment of the present disclosure is illustrated.

[0013] Figure 5 The present invention is a flowchart of a method for manufacturing a slit valve gate according to an embodiment of the present disclosure. DETAILED DESCRIPTION

[0014] Semiconductor substrates and other substrates are typically processed in vacuum processing chambers and transferred between one or more chambers through a slit controlled by a slit valve assembly. These slit valve assemblies typically include at least one gate coupled to an actuator for manipulating the gate. The actuator may be a full-stroke pneumatic actuator including one or more pistons for moving the gate from an open position (in which the gate does not isolate one chamber from an adjacent chamber) to a closed position (in which the gate isolates one chamber from an adjacent chamber), and vice versa. Other types of actuators may also be used.

[0015] The slit valve assembly typically includes a seal bonded to a base portion of the gate. Traditionally, the seal is over-molded to the base portion. The seal of a conventional slit valve gate cannot therefore be easily replaced. When the seal of a conventional slit valve gate fails, the entire gate assembly is replaced. In addition, because of the over-molded nature of the conventional slit valve gate seal, it is difficult to add a protective coating to the slit valve gate. For example, in order to apply a protective coating to a conventional slit valve gate, the sealing surface of the bonded seal is masked. Masking the bonded seal adds complexity and expense to the process of manufacturing the slit valve gate.

[0016] The present disclosure relates to a multi-piece slit valve gate, which includes a base portion, a sealing portion and a clamping portion. In some embodiments, the slit valve gate is configured to be coupled to a slit valve actuator via the base portion. The sealing portion of the slit valve gate (e.g., a seal, an elastomeric seal, etc.) is coupled to the base portion. When the actuator moves the slit valve gate to a closed position (e.g., moves the slit valve gate to cover and seal the slit valve opening), the seal is configured to establish an airtight seal between the slit valve gate and the slit valve opening. The seal thereby seals the slit valve opening. The seal is held in the base portion by a clamping portion. The clamping portion is coupled to the base portion (e.g., by one or more mechanical fasteners). The seal is held between the clamping portion and the base portion. In some embodiments, the clamping portion includes a flange that holds the seal in a groove formed by the clamping portion and the base portion.

[0017] By providing a multi-piece slit valve gate of the present disclosure, many advances can be achieved. For example, unlike conventional slit valve gates, multiple pieces of the slit valve gate described herein (e.g., a base portion, a clamping portion, etc.) can be individually coated with a protective coating. This allows a protective coating to be applied to components of the slit valve gate, thereby optimizing resistance to harmful gases or environments to which the slit valve gate is exposed. The protective coating can be applied without a mask for coating a conventional slit valve gate. In addition, unlike the seals of conventional slit valve gates, the sealing portions of the slit valve gate described herein can be replaced individually (e.g., the seals can be replaced without replacing the remainder of the slit valve gate). This allows less equipment downtime and less expense when compared to conventional slit valve gates. In addition, the slit valve gate described herein can provide increased sealing capabilities when compared to conventional slit valve gates. As an example, a multi-piece slit valve gate may better prevent contaminants from entering or exiting, at least in part because the seal portion may be replaced once it begins to degrade compared to a conventional slit valve gate, thereby providing a better environment for substrate processing and reducing material consumption (e.g., gas, etc.).

[0018] Figure 1 A schematic top view of a substrate processing system 100 according to an embodiment of the present disclosure is shown. According to embodiments described herein, the substrate processing system 100 may include a factory interface 162 (also referred to as an "equipment front end module (EFEM)"), a mainframe 150 (also referred to as a transfer chamber), one or more processing chambers 155, and one or more load lock chambers 156. The mainframe 150 may be connected to the factory interface 162 via the one or more load lock chambers 156. A substrate carrier 164 may be removably connected to a front wall of the factory interface 162. The factory interface 162 may include a factory interface robot 161 for moving substrates 101 (shown in phantom for illustrative purposes) and / or other objects (such as process accessory rings, etc.) between the substrate carrier 164 and the load lock chamber 156. For example, the factory interface 162 may include one or more load ports, each of which may receive a substrate carrier 164. The overhead track (OHT) may lower a front opening unified pod (FOUP) onto the load port. The factory interface robot 161 may pick up the substrate 101 from the FOUP, and may optionally align the substrate 101 in an aligner (not shown). Subsequently, the factory interface robot 161 may place the substrate 101 in a load lock chamber 156. Thereafter, the host robot 150 (located in the host 150) may pick up the substrate 101 from at least one of the load lock chambers 156, and deliver the substrate 101 to at least one of the one or more processing chambers 155.

[0019] As the manufacturing process proceeds, the factory interface robot 161 and the host robot 150, working in tandem, may move the substrate 101 and / or other objects between the substrate carrier 164 and the process chamber 155. Various electronic device manufacturing processes (e.g., semiconductor device manufacturing processes such as, for example, oxidation, film deposition, etching, thermal treatment, degassing, cooling, etc.) may occur within the process chamber 155.

[0020] After processing in at least one of the one or more processor chambers 155 is completed, the processed substrate 101 may be picked up by the host robot 150 and transferred to at least one of the load lock chambers 156. At least one of the load lock chambers 156 may pump the pressure of the at least one to atmospheric pressure, and then the processed substrate 101 is picked up and placed back into the FOUP by the factory interface robot 161. After all substrates from the substrate carrier 164 are processed, the OHT (not shown) may pick up the FOUP and put the FOUP down with different tools according to the designed manufacturing process.

[0021] The substrates 101 and / or other objects are transferred between one station to an adjacent station (e.g., between the mainframe 150 and the processing chamber 155, between the load lock chamber 156 and the mainframe, between the factory interface 162 and the load lock chamber 156, and the like) via at least one gate that is part of a slit valve assembly that may be received in the port 175. Figure 2 The slit valve assembly according to certain embodiments is further described in detail. Each slit valve (or gate) can be transformed from a closed position to an open position, and vice versa. In the closed position, the slit valve (or gate) isolates a station from an adjacent station. In the open position, the slit valve (or gate) does not isolate a station from an adjacent station, and an object can be transferred from one station to an adjacent station through the open gaps on two opposite sides of the port 175. The slit valve may include a multi-piece gate as described in some embodiments herein (e.g., the gate may include a sealing portion coupled to a base portion).

[0022] As used herein, the term "station" refers to a chamber in which objects (such as wafers) transferred through a wafer processing system can be temporarily stored. A station as used herein can be separated from other parts of the substrate processing system using at least one gate.

[0023] Figure 2 A simplified perspective view of a slit valve device according to an embodiment of the present disclosure is shown. The slit valve device may include a Figure 11. The slit valve assembly 200 in the port 175 is shown in FIG. 2. In certain embodiments, the slit valve apparatus includes a plurality of slit valve assemblies, each of which is received in one of the ports 175.

[0024] In some embodiments, the slit valve assembly 200 includes at least one gate 210 configured to transition between an open position and a closed position (e.g., Figure 2 ). The slit valve assembly 200 may further include a slit valve control mechanism including at least one actuator 215 coupled to the gate 210 via a movable member. The actuator 215 may be configured to apply a force to the gate 210. In some embodiments, the actuator 215 is a pneumatic actuator configured to pneumatically move the gate 210 from an open position to a closed position, or vice versa. In some embodiments, the actuator 215 is an electric actuator, a mechanical actuator, or other types of actuators.

[0025] In the closed position (e.g. Figure 2 270 ), the slit valve gate 210 may seal the opening formed in the surface 270. The opening formed in the surface 270 may be a slit valve opening as described herein. The sealing portion of the gate 210 may interface with the sealing surface of the surface 270 to establish an airtight seal. In some embodiments, when the actuator 215 moves the gate 210 to the closed position, the sealing portion may be elastically deformed. The elastic deformation of the sealing portion may establish an airtight seal as described herein. The airtight seal may prevent contaminants or gases from passing through the slit valve opening.

[0026] Figure 3A A simplified perspective view of a slit valve gate 300 is shown in accordance with an embodiment of the present disclosure. Figure 3B A simplified perspective view of an exploded slit valve gate 300 according to an embodiment of the present disclosure is shown. In some embodiments, the slit valve gate 300 includes a base portion 310, a sealing portion 320 (e.g., a seal), and / or a clamping portion 330. In many embodiments, the slit valve gate 300 is configured to be coupled to a slit valve actuator (e.g., Figure 2 In some examples, the base portion 310 can be configured to be coupled to the actuator via a mounting interface 312 (e.g., directly or indirectly via a movable member). In some embodiments, the mounting interface 312 is or includes a hole and / or groove formed in the base portion 310.

[0027] The base portion may include a lip 316 around the groove 315. The groove 315 may be configured to receive the clamping portion 330. In some embodiments, the base portion 310 forms a plurality of holes 314 through which fasteners 340 may pass to secure (e.g., fasten, etc.) the clamping portion 330 to the base portion 310. In some embodiments, each of the holes 314 is surrounded by a seal (e.g., an O-ring seal) to seal the hole 314. The clamping portion 330 may form a corresponding hole (e.g., corresponding to the hole 314) to receive the fastener 340. In some embodiments, the clamping portion 330 is coupled to the base portion 310 via one or more fasteners 340. In some embodiments, the fastener 340 is a screw, a bolt, or another threaded fastener. In certain embodiments, the clamping portion 330 is coupled to the base portion 310 via a welded joint, a soldered joint, and / or a brazed joint.

[0028] In some embodiments, the base portion 310 forms an alignment groove 318 to receive a corresponding alignment pin 334 of the clamp portion 330. In some embodiments, the clamp portion 330 includes one or more alignment pins 334 protruding from a surface of the clamp portion 330. In some examples, the clamp portion 330 includes a first alignment pin 334 near the first distal end and a second alignment pin 334 near the second distal end. The alignment pins 334 and the alignment groove 318 can be used to align the clamp portion 330 relative to the base portion 310 when the clamp portion 330 is coupled to the base portion 310. Each of the alignment pins 334 can fit into a corresponding groove (e.g., alignment groove 318) formed in the base portion 310. In other embodiments, the base portion 310 can include one or more alignment pins, and the clamp portion 330 can include one or more grooves aligned with the alignment pins to align the clamp portion to the base portion.

[0029] In some embodiments, the clamping portion 330 is configured to hold the sealing portion 320. The flange 332 (e.g., the flange of the clamping portion 330) and the lip 316 (e.g., the lip of the base portion 310) can hold the sealing portion 320. The flange 332 can extend from the surface of the clamping portion 330 around the outer periphery of the clamping portion 330. In some embodiments, when the clamping portion 330 is coupled to the base portion 310, the flange 332 and the lip 316 can generally form a groove to hold the sealing portion 320. In some embodiments, the lip 316 and the flange 332 together form a dovetail groove, as described below. In other embodiments, the lip 316 and the flange 332 can together form a groove having other cross-sectional shapes, such as an inverted T-shaped groove, an L-shaped groove, a hemispherical groove, a circular groove, etc.

[0030] In some embodiments, the sealing portion 320 is an elastomeric seal. The sealing portion 320 can be made of a material such as rubber, silicone, plastic, expanded foam, fluoroelastomer, or another suitable polymer and / or elastomer. The sealing portion 320 can have a cross-sectional profile as described below (e.g., see FIG. 4A to FIG. 4B ). In some embodiments, the sealing portion 320 may have a circular profile (e.g., similar to an O-ring). Alternatively, the sealing portion 320 may have other cross-sectional profiles, such as an inverted T-shape, an L-shape, a hemispherical shape, a circle, and the like. In some embodiments, the sealing portion 320 may be hollow (e.g., may form an internal cavity). Including an internal cavity in the sealing portion 320 may cause the sealing portion 320 to be more flexible when compared to a seal that does not include an internal cavity (e.g., solid). In some embodiments, the sealing portion 320 may be at least partially compressed when pushed against a sealing surface (e.g., when an actuator moves the slit valve gate 300 to a closed position), and may form an airtight seal. In some embodiments, the sealing portion 320 may substantially fill a groove (e.g., a dovetail groove) formed by the clamping portion 330 and the base portion 310.

[0031] In some embodiments, the base portion 310 and / or the clamping portion 330 are made of a material selected from the group including: aluminum, steel alloys, stainless steel, nickel alloys, titanium, ceramics, and / or plastics. The base portion 310 and the clamping portion 330 may be made of different materials. In some examples, the base portion 310 may be made of aluminum, while the clamping portion 330 is made of stainless steel. The material of the base portion 310 and / or the material of the clamping portion 330 may be selected based on a specific coating to be applied to each of the components, and / or based on the environment to which each of the components may be exposed (e.g., a corrosive environment, a plasma environment, etc.). The material of the base portion 310 and / or the material of the clamping portion 330 may be selected to have complementary thermal expansion coefficients. In some examples, the base portion 310 is made of a material having a thermal expansion coefficient similar to (e.g., substantially similar to) that of the material of the clamping portion 330. In some embodiments, at least one surface of the base portion 310 and / or at least one surface of the clamping portion 330 is polished. In some embodiments, the surface of the base portion 310 and / or the surface of the clamping portion is electropolished.

[0032] In some embodiments, the base portion 310 and / or the clamping portion 330 include a coating (e.g., a protective coating). The coating may cover at least one surface of the base portion 310 and / or at least one surface of the clamping portion 330. In some embodiments, the coating is a corrosion-resistant protective coating and / or a plasma-resistant protective coating. In some embodiments, the coating is a nickel-plated coating and / or an anodized coating. The coating may be an electroplated coating. In some embodiments, the coating is an oxidized coating. The coating may be selectively applied to either the base portion 310 or the clamping portion 330. In some embodiments, the base portion 310 includes a first coating, and the clamping portion 330 includes a second coating. In some embodiments, the first coating may be different from the second coating. The coating may be optimized for the environment in which the slit valve gate operates.

[0033] In some embodiments, the coating is deposited using techniques such as atomic layer deposition (ALD), ion assisted deposition (IAD), plasma spray (PS), low pressure plasma spray (LPPS), chemical vapor deposition (CVD), plasma spray chemical vapor deposition (PS-CVD), sputtering, and combinations thereof, or other techniques suitable for forming conformal coatings or modifications of the above techniques. In some embodiments, the coating comprises a ceramic material that is resistant to corrosion by process gases or reactive species. For example, in some embodiments, the coating may comprise a plasma resistant ceramic coating comprising a rare earth ceramic selected from Y2O3, YZrO, Y x Zr y O z 、YZrOF、Y3Al5O 12 、Y4Al2O9、YF3、Y x O y F z 、YOF、Er2O3、Er3Al5O 12 、ErF3、E x O y F z , ErOF, La2O3, Lu2O3, Sc2O3, ScF3, ScOF, Gd2O3, Sm2O3, Dy2O3, Y2O3-ZrO2 solid solution, ceramics containing Y2Al4O9 and Y2O3-ZrO2 solid solution, an amorphous phase containing a mixture of Al2O3 and Y2O3, or a combination of the above.

[0034] In some embodiments, the coating comprises Al2O3. In one embodiment, the coating comprises Al2O3 deposited by atomic layer deposition (ALD).

[0035] In some embodiments, the coating is substantially uniform in thickness, conformal to the underlying surface being coated, non-porous, non-cracked, acts as a diffusion barrier to metallic contaminants, and has high purity (e.g., greater than about 99% pure, or greater than about 99.95% pure). In certain embodiments, ALD can be advantageously used to coat the entire dimensions of the sensor component. In some embodiments, the coating is resistant to cracking and / or delamination at various temperatures (such as up to 350°C).

[0036] In certain embodiments, the coating may have a uniform thickness that varies less than about + / - 20%, varies less than about + / - 10%, or varies less than about + / - 5% in thickness when the coating thickness at one location is compared to the coating thickness at another location (or when the coating thickness at one location is compared to an average thickness of the coating, or when the standard deviation of the coating thickness across several locations is assessed).

[0037] In certain embodiments, the coating can be conformal to the underlying surface being coated, including underlying surface features and / or complex geometries and / or coated portions having high aspect ratios. For example, the coating can conformally and uniformly coat portions having high aspect ratios, such as length:width (L:W) or length:diameter (L:D) ranging from about 2:1 to about 500:1, from about 5:1 to about 300:1, from about 10:1 to about 150:1, from about 15:1 to about 100:1, or from about 20:1 to about 50:1.

[0038] In certain embodiments, the coating can be very dense and have very low porosity, such as less than about 1%, less than about 0.5%, less than about 0.1% porosity, or no porosity (0% porosity). In certain embodiments, the coating can have a crack-free microstructure, be gas-tight, and have a high dielectric breakdown resistance.

[0039] In certain embodiments, the coating can be deposited at low deposition temperatures, for example, deposition temperatures as high as 350° C., which can allow the coating to be used with a variety of materials.

[0040] FIG. 4A to FIG. 4B A cross-sectional view of a slit valve gate according to an embodiment of the present disclosure is illustrated. Figure 4A The slit valve gate 400A is shown in a closed position. Figure 4B A detailed view of the groove 436 of the slit valve gate 400B can be shown. FIG. 4A to FIG. 4B Some of the features in FIG. 4A to FIG. 4B those same properties, functions and / or structures in.

[0041] See also Figure 4A , the clamping portion 430 and the base portion 410 of the slit valve gate 400A can hold the sealing portion 420. The sealing portion 420 can abut the sealing surface 470 surrounding the slit valve opening 472 (e.g., when the slit valve gate 400A is in the closed position). The sealing portion 420 can establish an airtight seal in response to the slit valve gate 400A moving to the closed position (e.g., by an actuator). In some embodiments, the base portion 410 can correspond to FIG. 3A to FIG. 3B The base portion 310, the sealing portion 420 may correspond to FIG. 3A to FIG. 3B The sealing portion 320 and / or the clamping portion 430 may correspond to FIG. 3A to FIG. 3B The clamping portion 330 is provided.

[0042] See also Figure 4B , a flange 432 extending from a surface of the clamping portion 430 can hold the sealing portion 420 in the groove 436 together with the lip 416 of the base portion 410. In some embodiments, when the clamping portion 430 is coupled to the base portion 410, the clamping portion 430 and the base portion 410 generally form a groove (e.g., groove 436). In some examples, the base portion 410 forms a first portion of the groove 436, and the clamping portion 430 forms a second portion of the groove 436. In some examples, the flange 432 forms a portion of the groove 436 (e.g., a first wall), and the lip 416 forms another portion of the groove 436 (e.g., an opposing second wall). The groove 436 can be a dovetail groove, such as Figure 4B The groove 436 may be shaped as shown in FIG. 4 and described herein, or the groove 436 may have another cross-sectional shape as described herein. The sealing portion 420 may generally conform to the groove 436 .

[0043] In some embodiments, the sealing portion 420 has an approximately trapezoidal cross section. In some embodiments, the sealing portion 420 has an approximately triangular cross section. In some embodiments, the sealing portion 420 has an approximately T-shaped cross section. In some embodiments, the sealing portion 420 has a circular (e.g., substantially circular) cross section. The cross section of the sealing portion 420 may have a substantially rounded corner. In some embodiments, the cross section of the sealing portion 420 may include two shoulders 421A. The rounded portion 421B may protrude from the shoulder 421A. When the slit valve gate moves to the closed position, the rounded portion 421B may contact the sealing surface 470. The sealing portion 420 may substantially fill the groove formed by the base portion 410 and the clamping portion 430 (e.g., the groove formed by the lip 416 and the flange 432), and may include a portion protruding above the surface of the clamping portion 430. In some examples, the cross-sectional shape of the sealing portion 420 conforms (substantially conforms) to the groove 436 formed by the base portion 410 and the clamping portion 430 .

[0044] Figure 5 Flow chart of a method 500 for manufacturing a slit valve gate according to an embodiment of the present disclosure. In some embodiments, the method 500 may be performed by a machine (e.g., an assembly machine, a robotic machine, etc.) and / or by a technician (e.g., a user, an engineer, an assembler, a person, etc.). In some embodiments, the method 500 is performed by and / or caused to be performed by a processing logic, the processing logic including hardware (e.g., a circuit system, a dedicated logic, a programmable logic, a microcode, a processing device, etc.), software (such as instructions running on a processing device, a general-purpose computer system, or a dedicated machine), firmware, microcode, or a combination of the above.

[0045] For simplicity of illustration, method 500 is depicted and described as a series of operations. However, operations according to the present disclosure may occur in various orders and / or concurrently and with other operations not presented and described herein. In addition, in some embodiments, not all of the operations shown are performed to implement method 500 according to the disclosed subject matter. In addition, those skilled in the art will understand and appreciate that method 500 may alternatively be represented as a series of interrelated states via a state diagram or events.

[0046] At block 510, a sealing portion (e.g., a seal) of a slit valve gate is coupled to (or inserted into or placed against) a base portion of a slit valve gate (e.g., as described herein). The sealing portion may correspond to FIG. 3A to FIG. 3B The sealing portion 320 and / or FIG. 4A to FIG. 4BIn some embodiments, the seal is inserted into a groove (e.g., a portion of a groove) formed by the base portion. In some embodiments, the seal can be inserted into a groove formed by a substrate portion (e.g., a portion of a groove). FIG. 3A to FIG. 4B The lip of the outer periphery of the base portion 310) (e.g., Figure 3B Before coupling the sealing portion to the base portion, the surface of the base portion may be coated with a protective coating.

[0047] At block 520, a clamping portion of the slit valve gate is coupled to a base portion. FIG. 3A to FIG. 3B The clamping portion 330 of the embodiment may be provided by one or more fasteners (e.g., Figure 3B The fastener 340) is coupled to the base portion (e.g., FIG. 3A to FIG. 3B In some embodiments, the clamping portion can be coupled to the base portion via a joint such as a welded joint, a brazed joint, and / or a soldered joint. In some embodiments, the clamping portion is coupled to the base portion via an adhesive. In some embodiments, one or more alignment pins (e.g., Figure 3B The alignment pin 334) is aligned with the corresponding alignment hole (e.g., Figure 3B In some embodiments, the clamping portion fits into a groove formed in the base portion (e.g., Figure 3B The surface of the clamping portion may be coated with a protective coating before coupling the clamping portion to the base portion. Coupling the clamping portion to the base portion may secure the sealing portion between the lip of the base portion and the lip of the clamping portion, such that a portion of the sealing portion protrudes above the clamping portion, thereby providing a sealing surface.

[0048] At block 530, a protective coating may be deposited on one or more of the base portion or the clamping portion. In some embodiments, the protective coating is deposited prior to coupling the clamping portion to the base portion and / or prior to coupling the sealing portion to the base portion.

[0049] Coatings (e.g., metal layers, electrode layers, dielectric layers, dielectric sleeves, etc.) according to embodiments described herein may be formed using a deposition process selected from chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition (PECVD), physical vapor deposition (PVD), plasma enhanced physical vapor deposition (PEPVD), and atomic layer deposition (ALD). CVD is a well-known technique for depositing pure metal coatings. In a typical CVD process, a substrate is exposed to at least one volatile precursor under ultra-high vacuum conditions. The at least one precursor reacts or decomposes on the surface of the substrate to form a film. The reaction chamber is then purged with an inert gas flowing through the reaction chamber. In a PECVD process, a chemical reaction is initiated by generating a plasma of a reactive precursor gas. In an ALD process, a thin film layer is grown by repeatedly exposing the surface of the substrate to pulses of gaseous chemical precursors, which chemically react with the surface one at a time in a self-limiting manner. CVD and ALD are non-line-of-sight processes that can be used to coat high aspect ratio features. PVD processes also occur under vacuum conditions and typically involve sputtering and / or evaporation of target materials to form gases that deposit and / or react on the substrate surface. PVD (typically, including evaporation, plasma spraying, etc.) is a line-of-sight process. In a PEPVD process (typically, including ion-assisted deposition, ion-assisted evaporation deposition, ion-assisted sputtering deposition, ion plating, etc.), plasma or high-energy ions are generated to react with the deposition material (such as an ion beam) from the PVD process and involve sputtering or evaporation of the target material. PEPVD is a line-of-sight process, but can be modified to a non-line-of-sight process in cases where the substrate is biased during the deposition process. Compared to ALD, PVD and PEPVD can deposit relatively thick coatings (up to about 500 μm thick, or up to about 250 μm thick, or from about 5 μm to about 250 μm thick) at relatively low deposition temperatures (<200° C.).

[0050] In some embodiments, the coating is deposited using one or more of ALD, IAD, LPPS, CVD, PS-CVD, or sputtering. In some embodiments, the coating comprises a rare earth ceramic selected from Y2O3, YZrO, Y x Zr y O z 、YZrOF、Y3Al5O 12、Y4Al2O9、YF3、Y x O y F z 、YOF、Er2O3、Er3Al5O 12 、ErF3、E x O y F z , ErOF, La2O3, Lu2O3, Sc2O3, ScF3, ScOF, Gd2O3, Sm2O3, Dy2O3, Y2O3-ZrO2 solid solution, ceramics containing Y2Al4O9 and Y2O3-ZrO2 solid solution, or combinations thereof. In some embodiments, the coating comprises Al2O3. In some embodiments, the coating comprises Al2O3 deposited by ALD. In some embodiments, the coating comprises a plurality of layers. In some embodiments, the coating has a thickness of about 10 nanometers to about 500 nanometers, or any sub-range or single value between about 10 nanometers and about 500 nanometers.

[0051] In the foregoing description, many specific details (such as specific materials, dimensions, process parameters, etc.) are set forth to provide a thorough understanding of the present disclosure. Specific features, structures, materials, or characteristics may be combined in any suitable manner in one or more embodiments. The words "example" or "exemplary" are used herein to mean used as examples, examples, or illustrations. Any aspect or design described herein as "example" or "exemplary" need not be interpreted as being preferred or superior to other aspects or designs. Rather, the use of the words "example" or "exemplary" is intended only to represent concepts in a specific manner. As used in the present disclosure, the term "or" is intended to mean an inclusive "or" rather than an exclusive "or". That is, unless otherwise specified or clear from the context, "X includes A or B" is intended to mean any natural inclusion arrangement. That is, if X includes A; X includes B; or X includes both A and B, then "X includes A or B" is satisfied in any of the above cases. References to "one embodiment", "some embodiments" or "one embodiment" throughout the specification mean that specific features, structures, or characteristics described in conjunction with the embodiment are included in at least one embodiment. Thus, the appearances of the phrases "one embodiment," "some embodiments," or "an embodiment" in various places throughout this specification are not necessarily all referring to the same embodiment.

[0052] The embodiments of the present disclosure have been described with reference to specific exemplary embodiments of the present disclosure. Accordingly, the description and drawings are to be regarded as illustrative rather than restrictive. Various modifications of the present disclosure, in addition to those shown and described herein, will become apparent to those skilled in the art and are intended to fall within the scope of the appended claims.

[0053] As used herein, the singular forms "a," "an," and "the" include the plural forms unless the context clearly dictates otherwise. Thus, for example, reference to "a wafer" includes a single wafer as well as two or more wafers, and so forth.

[0054] As used herein, the term "about" in relation to a measured amount refers to the normal variation of the measured amount as would be expected by a person of ordinary skill in making the measurements and exercising a degree of care commensurate with the precision of the measurement objective and the measuring equipment. In certain embodiments, the term "about" includes ±10% of the stated number, such that "about 10" would include from 9 to 11.

[0055] Unless otherwise indicated herein, the description of the numerical ranges herein is intended only to be used as a shorthand method of individually referring to each individual value falling within the range, and each individual value is incorporated into the specification as if it were individually recited herein. Unless otherwise indicated herein or clearly contradicted by context, all methods described herein can be performed in any suitable order. Any and all examples provided herein, or the use of exemplary language (e.g., "such as") are intended only to illustrate certain materials and methods and are not intended to limit the scope. Any language in the specification should not be interpreted as indicating that any non-claimed element is essential to the practice of the disclosed materials and methods.

Claims

1. A slit valve, comprising: a base portion configured to be coupled to a slit valve actuator; a sealing portion coupled to the base portion, wherein the sealing portion is configured to establish an airtight seal between the slit valve gate and a sealing surface of a slit valve opening; and A clamping portion is coupled to the base portion, wherein the clamping portion at least partially retains the sealing portion between the clamping portion and the base portion.

2. The slit valve gate according to claim 1, further comprising: A plurality of mechanical fasteners secure the clamp portion to the base portion.

3. The slit valve gate of claim 1, wherein the clamping portion is coupled to the base portion by a welding joint, a soldering joint, or a brazing joint.

4. The slit valve gate of claim 1, wherein the clamping portion includes an alignment pin protruding from a face of the clamping portion, and wherein the alignment pin fits into a corresponding groove formed in the base portion.

5. The slit valve gate of claim 1, wherein one or more of the base portion or the clamping portion comprises a material selected from the group consisting of: aluminum, stainless steel, titanium, ceramic, and plastic.

6. The slit valve gate of claim 1, wherein one or more of the base portion or the clamping portion is coated with a protective coating.

7. The slit valve gate of claim 1, wherein the clamping portion includes a flange around a periphery of the clamping portion, wherein the clamping portion and the base portion form a groove, and wherein the flange at least partially retains the sealing portion in the groove.

8. The slit valve gate of claim 7, wherein the groove is a dovetail groove, and wherein a first portion of the dovetail groove is formed by the clamping portion and a second portion of the dovetail groove is formed by the base portion.

9. The slit valve gate of claim 8, wherein the sealing portion comprises a cross-sectional shape conforming to the dovetail groove.

10. A slit valve, comprising: Slit valve opening; a slit valve actuator; and a slit valve gate coupled to the slit valve actuator, wherein the slit valve gate is configured to seal the slit valve opening in response to the slit valve actuator moving the slit valve gate to a closed position, wherein the slit valve gate comprises: a base portion, wherein the slit valve gate is coupled to the slit valve actuator via the base portion; a sealing portion coupled to the base portion, wherein the sealing portion is configured to establish an airtight seal between the slit valve gate and a sealing surface of the slit valve opening in response to the slit valve actuator moving the slit valve gate to the closed position; and A clamping portion is coupled to the base portion, wherein the clamping portion at least partially retains the sealing portion between the clamping portion and the base portion.

11. The slit valve of claim 10, further comprising: A plurality of mechanical fasteners secure the clamp portion to the base portion.

12. The slit valve of claim 10, wherein the clamping portion includes an alignment pin protruding from a face of the clamping portion, and wherein the alignment pin fits into a corresponding groove formed in the base portion.

13. The slit valve of claim 10, wherein one or more of the base portion or the clamping portion comprises a material selected from the group consisting of: aluminum, stainless steel, titanium, ceramic, or plastic.

14. The slit valve of claim 10, wherein one or more of the base portion or the clamping portion is coated with a protective coating.

15. The slit valve of claim 10, wherein the clamping portion includes a flange around a periphery of the clamping portion, wherein the clamping portion and the base portion form a groove, and wherein the flange at least partially retains the sealing portion in the groove.

16. The slit valve of claim 15, wherein the groove is a dovetail groove, and wherein a first portion of the dovetail groove is formed by the clamping portion and a second portion of the dovetail groove is formed by the base portion.

17. The slit valve of claim 16, wherein the sealing portion comprises a cross-sectional shape conforming to the dovetail groove.

18. A method comprising the following steps: coupling a sealing portion of a slit valve gate to a base portion of the slit valve gate, wherein the sealing portion is configured to establish an airtight seal between the slit valve gate and a sealing surface of a slit valve opening; and A clamping portion of the slit valve gate is coupled to the base portion, wherein the coupling of the clamping portion to the base portion causes the clamping portion to at least partially retain the sealing portion between the clamping portion and the base portion.

19. The method of claim 18, further comprising the steps of: A protective coating is deposited on one or more of the base portion or the clamping portion.

20. A method as claimed in claim 18, wherein the clamping portion includes a flange around the periphery of the clamping portion, wherein the clamping portion and the base portion form a groove in response to coupling the clamping portion to the base portion, and wherein the flange at least partially retains the sealing portion in the groove in response to coupling the clamping portion to the base portion.

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