Laser multi-beam etching control method, device and equipment for pole piece scribing

Abstract

The present invention relates to the field of optical control technology, and discloses a laser multi-beam etching control method, device and equipment for pole piece scribing, wherein the method comprises: by obtaining etching specifications and etching materials, based on preset laser transmission length, etching length and etching path, confirming the installation position of the lens group, controlling the optical path system to position each transflective lens according to the installation position of the lens group, and correspondingly arranging a collimating focusing group on the lower side of each transflective lens, determining the etching speed of the focusing head in each collimating focusing group based on the etching depth width and the etching properties corresponding to the etching material, controlling each focusing head to etch the target material at the corresponding etching speed, and providing contactless processing, with small etching line width while ensuring high stability and accuracy, and being compatible with large-format pole piece products, the processing format and pole piece scribing width are no longer limited by the focusing field lens, and the production efficiency is ensured while reducing the cost and the later maintenance cost.

Description

Technical Field

[0001] The present invention relates to the field of optical control technology, and in particular to a laser multi-beam etching control method, device and equipment for pole piece scribing. Background Art

[0002] With the upgrading and continuous exploration of supercharging technology for new energy vehicles, the requirements for battery energy density, charging speed, cycle life and other performance are constantly increasing. Etching and scratching on the surface of the negative electrode of the battery can improve the pore structure of the electrode material, increase the wettability of the electrolyte, and improve the embedding efficiency of lithium ions, which can effectively improve the charging and discharging efficiency and cycle life of the battery.

[0003] Currently, there are two ways to etch and scribing power battery pole pieces, one is mechanical scribing, and the other is traditional laser scribing. Specifically, in the mechanical scribing method: a mechanical device, such as a device with a sharp scribing needle, is used to scratch the surface of the pole piece material along a preset trajectory, thereby forming scratches or grooves on the pole piece, and the scribing operation is achieved through physical contact and mechanical force. The disadvantage of this method is that the accuracy is difficult to guarantee, it is easy to cause damage to the pole piece, and the efficiency is low. In the traditional laser scribing method, a high-energy laser beam is focused on the surface of the pole piece, causing the pole piece material to evaporate, melt or gasify instantly, thereby forming the desired scribing pattern on the pole piece. The traditional laser scribing method can achieve complex scribing patterns and fine scribing dimensions at high speed and non-contact;

[0004] The disadvantage of the traditional laser marking method is that the equipment cost is high. Laser marking equipment requires high-power lasers, precision optical systems and control systems, etc., with high equipment costs and large investments. Conventional batteries are large in size, such as a length range of 395mm-900mm. Since the requirement for the marking width is relatively small, about 80-130μm, and the fixed width is basically 170mm, in order to adapt to the one-time forming of large-size pole pieces, multi-head lasers need to be used for splicing. The cost is greatly increased, and it is difficult to ensure the splicing accuracy, and it is not conducive to the wiring of automated equipment, which ultimately affects the marking effect. Summary of the invention

[0005] The embodiments of the present invention provide a laser multi-beam etching control method, device and equipment for pole piece scribing to solve the problems of high cost of laser scribing using high-power lasers, precision optical systems and control systems, the need for multi-head lasers for splicing, the difficulty in ensuring splicing accuracy, and the inconvenience of wiring of automated equipment, which ultimately affects the scribing effect.

[0006] A laser multi-beam etching control method for pole piece scribing, comprising:

[0007] Obtaining etching specifications and etching materials, wherein the etching specifications include etching depth and width, etching length and etching path;

[0008] Based on the preset laser transmission length, etching length and etching path, confirm the installation position of the lens group;

[0009] The optical path control system positions each transflective lens according to the installation position of the lens group, and a collimating and focusing group is correspondingly arranged on the lower side of each transflective lens;

[0010] Determine the etching speed of the focusing head in each collimation and focusing group based on the etching depth width and the material etching properties corresponding to the etching material;

[0011] According to the etching path, each focusing head is controlled to etch the target material at a corresponding etching speed.

[0012] A laser multi-beam etching control device for pole piece scribing, comprising:

[0013] An etching specification acquisition module is used to acquire etching specifications and etching materials, wherein the etching specifications include etching depth width, etching length and etching path;

[0014] An installation position confirmation module is used to confirm the installation position of the lens group based on the preset laser transmission length, etching length and etching path;

[0015] A collimation and focusing group setting module is used to control the optical path system to position each transflective lens according to the lens group installation position, and to set a collimation and focusing group correspondingly on the lower side of each transflective lens;

[0016] An etching speed determination module, used to determine the etching speed of the focusing head in each collimating and focusing group based on the etching depth width and the material etching properties corresponding to the etching material;

[0017] The target material etching module is used to control each focusing head to etch the target material at a corresponding etching speed according to the etching path.

[0018] An electronic device comprises a memory, a processor and a computer program stored in the memory and executable on the processor, wherein the processor implements the above-mentioned laser etching control method for the surface of a battery electrode when executing the computer program.

[0019] The above-mentioned laser multi-beam etching control method, device and equipment for pole piece marking can adopt the laser multi-beam etching method with only a single laser, couple out multi-beam processing materials through a special optical path structure, provide contactless processing, and have a small etching line width while ensuring high stability and accuracy, and are compatible with large-format pole piece products. The processing format and pole piece marking width are no longer limited by the focusing field lens, thereby reducing the cost and the subsequent maintenance cost of high-precision multi-beam laser marking equipment, while ensuring the etching effect; avoiding the problems of ordinary laser multi-head galvanometer scanning or splicing marking, and the low precision and stability of the splicing points; the software integration is high, the control process is simple, and the overall structure of the equipment is compact; through the combination of the optical path system light guide mirror group and the focusing mirror group in the material surface marking process method, a high-speed and stable marking method is achieved for pole pieces of different sizes, which is easier to adapt to the automated line, thereby improving production efficiency and finished product yield and stability. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings required for use in the description of the embodiments of the present invention will be briefly introduced below. Obviously, the accompanying drawings in the following description are only some embodiments of the present invention. For ordinary technicians in this field, other accompanying drawings can be obtained based on these accompanying drawings without paying creative labor.

[0021] Figure 1 Illustration of the marking problems that traditional marking methods can easily cause on the surface of battery electrodes;

[0022] Figure 2 A flow chart of a laser multi-beam etching control method for pole piece scribing according to an embodiment of the present invention is shown;

[0023] Figure 3 A schematic diagram of the structure of a laser multi-beam etching control device for pole piece scribing provided in an embodiment of the present invention is shown;

[0024] Figure 4 The working principle and adjustment method of the laser multi-beam proportional transflective lens focusing group in the embodiment of the present invention are described;

[0025] Figure 5 A schematic diagram of an electronic device according to an embodiment of the present invention is shown. DETAILED DESCRIPTION

[0026] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0027] At present, there are two ways to etch and mark power battery pole pieces, one is mechanical marking and the other is traditional laser marking. In the mechanical marking method: a mechanical device, such as a device with a sharp marking needle, is used to mark the surface of the pole piece material according to a preset trajectory, thereby forming scratches or grooves on the pole piece, and the marking operation is achieved through physical contact and mechanical force. The disadvantages of this method are: 1. The accuracy is difficult to guarantee: the accuracy of mechanical marking is greatly affected by factors such as the accuracy of the mechanical device, the degree of wear of the marking needle, and vibration during operation. It is easy to have problems such as uneven marking and inconsistent line width, which affects the performance consistency of the battery; 2. It is easy to cause damage to the pole piece: when the marking needle is moving on the surface of the pole piece, it will produce a certain amount of pressure and friction on the pole piece material, which may cause scratches and other damage to the surface of the pole piece.

[0028] like Figure 1 As shown in the figure, the traditional scribing method is easy to cause the tearing of graphene and copper foil on the surface of the battery pole piece, resulting in poor formation effect and burrs on the material surface; or the scribing width of more than 200μm does not meet the requirements, and the thermal impact is large. These damages may affect the conductivity and electrochemical properties of the pole piece, reduce the cycle life and safety of the battery; 3. Low efficiency: The speed of mechanical scribing is relatively slow, especially for large-scale production of power battery pole pieces, the efficiency of mechanical scribing is difficult to meet production needs.

[0029] The laser multi-beam etching control method for pole piece scribing provided in an embodiment of the present invention is applied in a laser multi-beam etching control system for pole piece scribing, and the laser multi-beam etching control system for pole piece scribing includes a control terminal and a server, wherein the control terminal communicates with the server through a network. The control terminal refers to a program corresponding to the server and providing interactive control services for the control terminal. The server can be implemented as an independent server or a server cluster composed of multiple servers.

[0030] The laser cutting method provided in the embodiment of the present invention can be applied to the electrical negative electrode materials of power batteries. The characteristics of the negative electrode plate material are as follows: 1. Good lithium ion embedding and extraction capabilities, which can reversibly absorb and release lithium ions during the charge and discharge process to achieve normal charge and discharge functions of the battery. 2. Low electrode potential: provides a higher battery voltage and increases the energy density of the battery. 3. High specific capacity: can store more lithium ions, thereby increasing the capacity of the battery. 4. Good conductivity: ensures that electrons can be transmitted quickly, reduces internal resistance, and improves the charge and discharge efficiency of the battery. 5. Structural stability: During the lithium ion embedding and extraction process, the structure can be kept relatively stable, preventing the material from breaking and pulverizing, and ensuring the cycle life of the battery. 6. Safety: not prone to thermal runaway, short circuit and other safety issues. Common battery negative electrode materials include graphite, silicon-based materials, etc.

[0031] In one embodiment, if Figure 2 As shown, a laser multi-beam etching control method for pole piece scribing is provided, which specifically includes the following steps:

[0032] S110. Obtain etching specifications and etching materials, where the etching specifications include etching depth and width, etching length, and etching path.

[0033] S120. Based on the preset laser transmission length, etching length and etching path, confirm the installation position of the lens group.

[0034] S130. Control the optical path system to position each transflective lens according to the installation position of the lens group, and set a collimating and focusing group correspondingly at the lower side of each transflective lens.

[0035] S140. Determine the etching speed of the focusing head in each collimation and focusing group based on the etching depth width and the material etching properties corresponding to the etching material.

[0036] S150. According to the etching path, control each focusing head to etch the target material at a corresponding etching speed.

[0037] Specifically, first of all, the key step is to obtain the etching specifications and etching materials. The etching depth, width, length and path in the etching specifications can be accurately determined through pre-designed drawings, digital models or user-customized requirements. The determination of etching materials is also crucial. Different materials such as metals, semiconductors, ceramics, etc. have very different physical and chemical properties. A series of preliminary tests such as component analysis and hardness testing are required for material samples to fully understand their characteristics and provide a basis for the setting of subsequent etching parameters.

[0038] Next, the lens group installation position is determined based on the preset laser transmission length, the obtained etching length and etching path. Preferably, the minimum number of lens groups can be determined according to the maximum effective stroke of each laser group, that is, the minimum number of transflective lenses that can complete the entire etching length can be determined. The lens group is a structural combination including at least two adjacent groups that can etch the material with the light reflected by the laser emitted by the laser along a straight line.

[0039] When setting up the actual operating environment, considering that the laser emitted by the laser has fixed initial characteristics, the laser transmission length of each lens group is based on the parameters of the laser device itself and the basic architecture of the optical path system. Using optical simulation software, the etching length and path data are imported, combined with the preset laser transmission length of each lens group, and the three-dimensional coordinate position of the lens group in the optical path system is calculated through geometric optical algorithms to ensure that the laser can be efficiently transmitted along the predetermined etching path, including light transmission in two ways: penetration and reflection, to avoid energy loss and optical path deviation.

[0040] After completing the confirmation of the position of the lens group, that is, the installation position of the reflector in each lens group, the control optical path system positions each transflective lens according to the installation position of each lens group. This process requires a high-precision mechanical adjustment device, such as an electric translation stage with nanometer-level precision, with a position feedback sensor, to monitor the installation progress of the transflective lens in real time to ensure its accurate setting. At the same time, a collimation and focusing group is set on the lower side of each transflective lens. The structural design of the collimation and focusing group is customized according to the laser wavelength, spot characteristics and required etching accuracy to ensure that the laser can be effectively collimated and focused after passing through the transflective lens to meet the etching process requirements.

[0041] Then, based on the previously measured etching depth and width and the material etching properties corresponding to the etching material, the etching speed of the focusing head in each collimated focusing group is determined. The material etching properties cover key parameters such as the material's absorption rate of the laser, melting point, boiling point, and thermal conductivity. Taking common metal etching as an example, if the material is copper, its high thermal conductivity and relatively low melting point require the focusing head to use a relatively high etching speed to quickly remove a large amount of material at the beginning of etching to avoid excessive melting and deformation of the material due to heat accumulation; as the etching depth approaches the target value, the etching speed is gradually reduced to finely control the etching depth and ensure etching accuracy. By establishing an etching material property database and combining it with real-time monitoring of etching status feedback, an intelligent algorithm is used to dynamically adjust the etching speed.

[0042] Finally, according to the established etching path, each focusing head is controlled to etch the target material at the corresponding etching speed. During the etching process, relying on a high-precision motion control system, it is ensured that the target material moves accurately in the XY plane according to the preset etching path. At the same time, the etching depth is monitored in real time in the Z-axis direction, and coordinated with the etching speed of the focusing head. By real-time acquisition of optical signals, plasma emission spectra and other data during the etching process, a closed-loop control system is used to instantly correct the etching parameters to ensure the stability and consistency of the etching quality and meet the high-precision requirements of the etching process. The effects of laser multi-beam pole piece surface scribing and etching provided by this embodiment include neat images, no burrs, and narrow line widths.

[0043] The above-mentioned laser multi-beam etching control method for pole piece scribing can replace the traditional laser processing method. The traditional laser processing method requires complex equipment consisting of multiple sets of lasers, multiple sets of galvanometers and field mirrors, which has high expenditure costs, high debugging labor costs, instability and high subsequent maintenance costs.

[0044] The method provided in this embodiment can adopt the laser multi-beam etching method, which only requires a single laser. Multi-beam processing materials are coupled out through a special optical path structure to provide contactless processing. The etching line width is small while ensuring high stability and accuracy, and is compatible with large-format pole piece products. The processing format and pole piece scribing width are no longer limited by the focusing field lens, thereby reducing the cost and the maintenance cost of high-precision multi-beam laser scribing equipment in the later stage, while ensuring the etching effect; avoiding the problems of low precision and low stability of splicing points caused by ordinary laser multi-head galvanometer scanning or splicing scribing; the software integration is high, the control process is simple, and the overall structure of the equipment is compact; through the combination of the optical path system light guide mirror group and the focusing mirror group in the material surface scribing process method, a high-speed and stable scribing method is achieved for pole pieces of different sizes, which is easier to adapt to the automated line, thereby improving production efficiency and finished product yield and stability.

[0045] In a specific embodiment provided by the present application, before step S130, that is, before controlling the optical path system to position each transflective lens according to the lens group installation position, the following steps are specifically included:

[0046] S210. Determine the lens transmittance of each lens group according to the number of lens groups and the installation positions of the lens groups.

[0047] Specifically, as mentioned above, the etching specifications and etching materials are accurately obtained. The etching depth, width, length and path in the etching specifications are confirmed through pre-designed drawings, digital models or user-customized requirements. Taking the manufacture of optical devices as an example, the etching path is closely designed around the optical path of the device, and the accuracy of the etching length is controlled at the nanoscale to ensure optical performance; the etching depth and width are set based on the requirements of different optical functional layers and are optimized through repeated optical simulations. Based on the preset laser transmission length, the obtained etching length and etching path, the installation position of the lens group is confirmed. When setting up the actual operating environment, in view of the inherent characteristics of the laser source, the preset laser transmission length is based on the equipment parameters and the optical path system architecture. With the help of professional optical simulation software, the etching-related data is imported, combined with the preset values, and the three-dimensional coordinates of the lens group are calculated using geometric optical algorithms.

[0048] After the position of the lens group is confirmed, the transmittance of each lens group is determined according to the number of lens groups and the installation position of the lens group. Assuming that there are four lens groups in the system, the transmittance of the lens is determined by the number of lenses and the arrangement position, and the rule of 90% to 80% to 70% to 60% and so on is followed. Considering that the first lens group closest to the laser source has the highest laser energy intensity, in order to avoid energy overload and subsequent damage to the optical path components, its lens transmittance is set to 90%. This group of lenses can use high-quality, low-absorption loss optical materials, and achieve precise transmittance control through fine coating process; the transmittance of the second lens group located in the middle of the optical path is set to 80%. At this time, according to the light field distribution characteristics of its position, the curvature, thickness and coating parameters of the lens are adjusted to further shape the light beam while ensuring a certain light intensity transmission; the transmittance of the third lens group is set to 70%; the transmittance of the fourth lens group is set to 60%; it is mainly used to finely control the light energy density entering the etching area to adapt it to the etching requirements of the target material. The design of this group of lenses focuses more on the optimization of the uniformity of the light spot.

[0049] The control optical path system positions each transflective lens according to the calculated lens group installation position. This relies on high-precision mechanical adjustment devices, such as the use of an electric translation stage with nanometer-level precision, combined with advanced position feedback sensors, to monitor the installation process of the transflective lens in real time to ensure accurate positioning. At the same time, a collimation and focusing group is set on the lower side of each transflective lens. The collimation and focusing group is customized according to the laser wavelength, spot characteristics and etching accuracy to ensure that the laser is effectively collimated and focused after passing through the transflective lens, which meets the etching process standards.

[0050] Then, based on the previously measured etching depth and width and the corresponding material etching properties of the etching material, the etching speed of the focusing head in each collimating and focusing group is determined. Taking the etching of the negative electrode material of the power battery as an example, the focusing head uses a lower etching speed at the beginning of etching, and uses pulsed laser to gradually break the chemical bonds of the material. As the etching depth increases and the internal stress of the material changes, the etching speed is fine-tuned with the help of intelligent algorithms based on the real-time monitoring of the etching state feedback to ensure that the etching depth and width are accurately met.

[0051] Finally, according to the established etching path, each focusing head is controlled to etch the target material at the corresponding etching speed. The etching process relies on a high-precision motion control system to ensure that the target material moves accurately along the preset path in the XY plane. At the same time, the Z axis monitors the etching depth in real time and coordinates the etching speed control of the focusing head. By real-time collection of etching optical signals, plasma emission spectra and other data, the closed-loop control system is used to instantly correct the etching parameters to ensure stable and consistent etching quality.

[0052] In a specific embodiment provided by the present application, in step S150, each focusing head is controlled to etch the target material at a corresponding etching speed, which specifically includes the following steps:

[0053] S310. Control the laser assembly to output a laser beam to the current transflective lens of the lens group.

[0054] S320. According to the reflectivity set by the lens group, the laser beam partially reflected by the laser beam is reflected as the current reflected laser beam to the collimating and focusing group corresponding to the current transflective lens.

[0055] S330. According to the projection rate set by the lens group, the partially transmitted laser beam of the laser beam is used as the current projection laser beam to penetrate to the next transflective lens adjacent to the current transflective lens.

[0056] S340. According to the etching path, the current focusing head in the collimating and focusing group etches the target material using the current reflected laser beam.

[0057] S350. Control the next transflective lens to repeat the steps of reflecting the laser beam partially reflected by the laser beam as the current reflected laser beam to the collimating and focusing group corresponding to the current transflective lens, and according to the projection rate set by the lens group, using the partially transmitted laser beam of the laser beam as the current projected laser beam to penetrate to the next transflective lens adjacent to the current transflective lens. According to the etching path, the current focusing head in the collimating and focusing group etches the target material using the current reflected laser beam until all the focusing heads in the collimating and focusing group have completed the etching of the target material.

[0058] Specifically, before starting the entire laser etching process, the equipment needs to be fully debugged and calibrated. First, ensure that the laser components, including the laser and fiber connectors, are in the best performance state, that all connection parts are tight and stable, without looseness or leakage, and that the laser's output power, wavelength and other key parameters are accurately adjusted to the preset process requirements. At the same time, fine-tune the lens group, accurately set the reflectivity and projection rate of each transflective lens based on the target material characteristics, the required etching accuracy and depth, and repeatedly check with professional optical testing instruments to ensure that the optical performance of the lens group is stable and reliable.

[0059] Enter the etching process and start executing step S310. The control system accurately drives the laser component to operate. The laser generates a high-intensity laser beam according to the instructions. The laser beam is efficiently transmitted through the optical fiber connector and accurately output to the current transflective lens of the lens group. In this process, the high-precision beam alignment system is used to monitor and correct the laser beam path in real time to ensure that the laser beam is vertically and accurately incident on the center area of ​​the current transflective lens, minimizing energy loss and scattering.

[0060] Then, step S320 is executed. After the laser beam reaches the current transflective lens, the lens reflects a specific proportion of the laser beam according to the preset reflectivity. This part of the reflected laser beam, that is, the current reflected laser beam, is accurately reflected to the corresponding collimation and focusing group under the guidance of the precise optical path design of the lens group. The collimation and focusing group is equipped with high-precision optical collimation and focusing elements to organize and converge the incident reflected laser beam, so that its energy is highly concentrated, ready for subsequent etching of the target material.

[0061] Then, step S330 is executed. According to the projection rate set by the lens group, the other part of the laser beam, that is, the currently projected laser beam, can penetrate the current transflective lens and penetrate to the next transflective lens adjacent to the current transflective lens with minimal energy dispersion. During this process, the optical transmission channel is kept at a high cleanliness level throughout the entire process, and dust particles are prevented from scattering, absorbing, and other adverse effects on the laser beam by means of inert gas purging, etc., to ensure that the projected laser beam can reach the next lens node completely and efficiently.

[0062] Arriving at step S340, according to the pre-planned etching path, the current focusing head in the collimation and focusing group receives the current reflected laser beam after reflection, collimation and focusing. The focusing head accurately adjusts the focal length, spot size and other parameters according to the instructions issued by the control system to adapt it to the surface of the target material, and then starts the etching process. During etching, the focusing head moves at a stable speed and precise trajectory, focusing the high-energy-density laser beam on the surface of the target material, and etches the target material according to the established pattern and depth requirements through physical and chemical effects such as ablation and vaporization. During the process, the etching status data, such as etching depth, material surface temperature, etc., are fed back in real time so that the system can dynamically adjust the etching parameters.

[0063] Finally, step S350 is executed. After the etching operation of the current focusing head is completed, the control system switches to the next transflective lens in an orderly manner and repeats the operation process from S320 to S340. The next transflective lens reflects part of the laser beam again according to the set reflectivity, and transmits the remaining part to the next transflective lens according to the projection rate. The current focusing head in the corresponding collimating and focusing group continues to etch the target material using the reflected laser beam. This cycle is repeated until all the focusing heads in the collimating and focusing group complete the etching task of the target material in sequence according to the etching path, realizing high-precision, large-area, and complex pattern laser etching processing, ensuring that product quality and production efficiency meet the expected goals.

[0064] During the entire laser etching process, each link is equipped with safety monitoring and protection devices, such as laser energy overload protection, optical path abnormality alarm, smoke emission monitoring, etc., to fully ensure the stable operation of the equipment, the safety of operators and the compliance of the production environment with regulatory requirements.

[0065] In a specific embodiment provided by the present application, before step S240, that is, before the current focusing head in the collimating and focusing group uses the current reflected laser beam to etch the target material, the following steps are specifically included:

[0066] S410. Start the side air blowing device, and control the air outlet of the side air blowing device to blow along the running direction of the target material at a preset angle, wherein the air outlet of the side air blowing device is set between the collimating focusing group and the target material.

[0067] S420. The laser scribing process is prone to dust and heat. The pole piece material will evaporate, melt or gasify, generating a large amount of dust and exhaust gas. These dust and exhaust gases need to be effectively collected and treated, otherwise they will cause harm to the environment and the health of operators. The heat generated during the laser scribing process may have a certain impact on the performance of the pole piece material, which requires strict control and monitoring.

[0068] Specifically, in an actual production environment, when it is necessary to perform laser scribing operations on the target material, especially the pole piece material, first execute step S410. Before starting the side-blowing device, it is necessary to ensure that the various components of the device are firmly connected and in normal working condition, and its air outlet is accurately positioned between the collimating focusing group and the target material. This position setting is based on an accurate analysis of the dust and heat-affected area generated after the laser acts on the target material, and is intended to effectively intervene when dust and hot air are just generated. The preset angle is determined based on multiple factors such as the characteristics of the target material, the laser power, and the operating speed of the production line. For example, for pole piece materials with a loose texture that are prone to flying dust, combined with commonly used medium-power lasers and conventional production line speeds, the preset angle can be set at 30°--45° to ensure that the blown airflow can effectively blow away the dust, and will not interfere with the laser optical path or cause excessive displacement of the pole piece material due to excessive wind force. After startup, the side-blowing device operates stably at a preset angle. The airflow from the air outlet continues to blow sideways along the running direction of the target material, blowing the dust particles generated at the moment of laser scribing away from the surface of the material to prevent them from adhering and accumulating in large quantities and affecting subsequent processing and product quality.

[0069] Continue to execute step S420. In view of the inevitable dust and heat problems in the laser scribing process, for dust collection and treatment, dust hoods are reasonably arranged around the laser processing area. The opening shape and size of the dust hood are adapted to the laser action area and the diffusion range of the side-blowing air flow to ensure that the dust brought out by the side-blowing air can be captured to the maximum extent. The dust hood is connected to professional dust purification equipment through a pipe, such as a high-efficiency bag dust collector or an electrostatic precipitator, which uses its powerful filtering and adsorption ability to separate and collect dust particles from the airflow to prevent dust from spilling into the workshop environment.

[0070] For waste gas treatment, a special waste gas purification device is installed, which is filled with adsorption media such as activated carbon and molecular sieves to adsorb harmful substances in the waste gas generated by the evaporation, melting or gasification of the electrode material caused by the laser, such as organic volatiles. The gas after adsorption and purification meets the emission standards and is discharged into the outdoor atmosphere.

[0071] In addition, in order to strictly control and monitor the impact of heat generated by laser scribing on the performance of pole piece materials, high-precision temperature sensors are deployed on the surface and key points inside the pole piece material. The sensors collect temperature data in real time and transmit it to the control system. The control system makes a comparative judgment based on the preset temperature threshold of the pole piece material. Once the temperature is detected to be close to or exceeds the threshold, the laser power, side blowing air flow rate and other parameters are immediately adjusted to ensure that the performance of the pole piece material is not damaged and to ensure that the entire laser scribing process is continuously advanced in an efficient, stable and environmentally friendly manner.

[0072] In a specific embodiment provided by the present application, in step S120, based on the preset laser transmission length, etching length and etching path, the installation position of the lens assembly is determined, which specifically includes the following steps:

[0073] S510. Obtain the effective conduction length of each transflective lens.

[0074] S520. The lens group installation position is based on the etching length and each effective conduction length, and the optimal lens arrangement sequence is obtained as the lens group installation position.

[0075] Specifically, after completing the basic debugging of the laser etching equipment and becoming familiar with the basic etching process in the early stage, enter the key steps related to the optimization configuration of the lens group. First, execute step S510. To obtain the effective conduction length of each transflective lens, it is necessary to rely on the reflectivity and transmittance data that have been accurately measured and set. Using optical simulation software combined with a precise algorithm model, the physical size of the lens is used as the basic parameter, and the reflectivity and transmittance are substituted into it for calculation. For example, assuming that the physical length of a transflective lens is L, its reflectivity is R, and its transmittance is T, according to the law of conservation of energy and the principle of light propagation, the effective conduction length calculation formula can be approximated as: effective conduction length = L×(R+T). By applying this method to each transflective lens in the lens group for calculation in turn, the effective conduction length value of each transflective lens under the current process setting is accurately obtained. These values ​​will serve as the key basis for the subsequent optimization of the lens group installation layout.

[0076] Continue to execute step S520. The etching length required for the target material is known. This data is usually accurately determined based on product design drawings and process specification documents. The obtained etching length is combined with the effective conduction length of each transflective lens calculated previously, and an intelligent optimization algorithm is used to explore the optimal lens arrangement order. For example, a genetic algorithm is used to treat each possible lens arrangement order as an "individual", and the optimization goals are to meet the etching length requirements, the minimum number of lenses used, and the lowest optical path transmission loss, etc., and set it as a "fitness function". After the algorithm is started, among the many randomly generated lens arrangement "individuals", it continuously evolves through operations such as crossover and mutation, and selects the lens arrangement order that best meets the optimization goal, that is, the optimal lens arrangement order. This order is used as the final installation position of the lens group to ensure that during the entire laser etching process, the lens group can guide the laser beam in the most efficient way, achieve accurate, energy-saving and high-quality etching effects, and improve the efficiency and stability of the entire laser etching process.

[0077] During this process, each step of calculation, simulation and algorithm operation results need to be strictly verified and reviewed to prevent errors in lens assembly installation due to data errors or algorithm loopholes, which in turn affect the normal progress of laser etching. At the same time, all parameter settings and intermediate results in the optimization process should be recorded and archived to provide strong data support for subsequent process improvements, equipment maintenance and troubleshooting.

[0078] The method provided in this embodiment can adopt the laser multi-beam etching method, which only requires a single laser. Multi-beam processing materials are coupled out through a special optical path structure to provide contactless processing. The etching line width is small while ensuring high stability and accuracy, and is compatible with large-format pole piece products. The processing format and pole piece scribing width are no longer limited by the focusing field lens, thereby reducing the cost and the maintenance cost of high-precision multi-beam laser scribing equipment in the later stage, while ensuring the etching effect; avoiding the problems of low precision and low stability of splicing points caused by ordinary laser multi-head galvanometer scanning or splicing scribing; the software integration is high, the control process is simple, and the overall structure of the equipment is compact; through the combination of the optical path system light guide mirror group and the focusing mirror group in the material surface scribing process method, a high-speed and stable scribing method is achieved for pole pieces of different sizes, which is easier to adapt to the automated line, thereby improving production efficiency and finished product yield and stability.

[0079] It should be understood that the order of execution of the steps in the above embodiment does not necessarily mean the order of execution. The execution order of each process should be determined by its function and internal logic, and should not constitute any limitation on the implementation process of the embodiment of the present invention.

[0080] In one embodiment, a laser multi-beam etching control device for pole piece scribing is provided, such as Figure 3As shown, the laser multi-beam etching control device for pole piece scribing corresponds one to one with the laser multi-beam etching control method for pole piece scribing in the above embodiment. The laser multi-beam etching control device for pole piece scribing includes: a control system, a laser optical path system and a laser base module. The control system is electrically connected to the laser optical path system and the laser base module respectively. The laser optical path system includes a laser and a lens group. The laser base module includes a multi-head focusing system, a blowing system, a processing platform and a conveying device. Among them, the functional modules of the control system are detailed as follows:

[0081] The etching specification acquisition module is used to obtain etching specifications and etching materials. The etching specifications include etching depth and width, etching length and etching path.

[0082] The installation position confirmation module is used to confirm the installation position of the lens group based on the preset laser transmission length, etching length and etching path.

[0083] The collimation and focusing group setting module is used to control the optical path system to position each transflective lens according to the lens group installation position, and to set the collimation and focusing group correspondingly at the lower side of each transflective lens.

[0084] The etching speed determination module is used to determine the etching speed of the focusing head in each collimating and focusing group based on the etching depth width and the material etching properties corresponding to the etching material.

[0085] The target material etching module is used to control each focusing head to etch the target material at a corresponding etching speed according to the etching path.

[0086] Specifically, the infrared wavelength provided in this embodiment is a continuous 1064nm wavelength infrared high-power laser multi-beam etching control device for pole piece scribing, and the inner cavity of the laser optical path system includes multiple sets of proportional transflective lenses and a multi-head focusing system. The multi-head focusing system is composed of a special collimator and a focusing lens with a focal length of F=125mm, and the laser base module includes a processing platform and a battery pole piece conveying device.

[0087] like Figure 4 As shown, the laser outputs a 25μm diameter beam to the QBH (Quarterback-Hardening) head, and then the first transflective lens of the optical path system, which can be a coupling lens, reflects part of the laser to the focusing head. The focusing head (F100 / F125) finally focuses a 31μm light spot on the surface of the material for etching. The optical path system involved in the above example has an inner cavity composed of four groups of transflective lenses and four groups of focusing heads. The surface of the material is four lines. At this time, according to the number of etching line segments on the pole piece, the lens groups can be combined and adjusted at will. Figure 4The distances of a, b, and c in the image can be adjusted. At this time, lenses with different transmittances can be customized according to the number of lenses, and the scribing speed can also be adjusted to ensure the number of etched segments.

[0088] This embodiment adopts the above optical path system, which can transmit a high-power laser beam along multiple proportional transflective lenses to the collimating and focusing head, and finally focus the laser on the surface of the material to etch a groove of a certain depth, which is matched according to the line width and number of line segments required by the product, that is, the size of the focused light spot and the line width of the marking are controlled by the collimator and focusing lens of the focusing head.

[0089] In a specific embodiment provided by the present application, the laser multi-beam etching control device for pole piece scribing further includes:

[0090] A side air blowing device, wherein an air outlet of the side air blowing device is arranged between the collimating and focusing group and the target material.

[0091] Specifically, after completing the optimization configuration process related to the lens group, the deployment and debugging of the side blowing device begins to ensure that it can work in coordination with the entire laser etching system to achieve optimal performance. First of all, the physical installation of the side blowing device is crucial. According to the overall layout of the laser etching equipment and the spatial relationship between the collimating and focusing group and the target material, select a suitable mounting bracket and fixing method. The bracket must have high strength and shock resistance to ensure the stability of the side blowing device during the operation of the equipment and avoid the position deviation of the air outlet due to vibration. Using high-precision positioning tools, the side blowing device is accurately installed so that its air outlet is accurately set between the collimating and focusing group and the target material. The vertical distance between the air outlet and the surface of the target material is determined according to the characteristics of the target material, the laser power and the desired dust dispersing effect, generally within the range of 5-15 cm. For example, for target materials with a relatively smooth surface and weak dust adhesion, the distance can be appropriately adjusted to 5-10 cm; for materials with a rough surface and prone to large dust particles, the distance should be kept at 10-15 cm.

[0092] After the machinery is installed in place, the airflow parameters of the side-blowing device are debugged. According to the particle size distribution and generation rate of the dust generated during the laser etching process, combined with the tolerance of the target material to the impact of the airflow, the wind speed and air volume of the air outlet are adjusted. This process uses a professional wind speed and air volume tester to monitor the airflow parameters at the air outlet in real time. For the case where the dust particles are fine and the amount generated is large, the wind speed is appropriately increased, generally controlled at 10-15 meters per second, to ensure that the dust can be blown away in time; at the same time, the air volume is increased accordingly to ensure that the blown air flow can cover the key areas of the target material affected by the laser. The air volume adjustment range can be determined according to the size of the air outlet and the overall space of the equipment. For example, for the common small side-blowing device outlet (area of ​​about 20-30 square centimeters), the air volume can be set at 200-300 liters per minute.

[0093] Further optimize the coordinated control of the side-blowing device and the laser etching process. Connect the side-blowing device to the overall control system of the equipment so that its start, stop, and airflow parameter adjustment can be precisely synchronized with the operation of key components such as laser components, lens groups, and collimation and focusing groups. In the short preheating stage before the start of laser etching, the side-blowing device gently blows the surface of the target material at a lower wind speed (such as 3-5 m / s) in advance to remove possible residual impurities and avoid affecting the etching quality during the etching process; when the laser etching officially starts, it immediately switches to the preset working wind speed and air volume to blow away the dust generated by the laser action in real time; once the etching process is over, the side-blowing device continues to operate for a period of time (usually 10 to 20 seconds) to thoroughly remove the dust remaining in the target material and surrounding areas to prevent secondary attachment of dust.

[0094] At the same time, in order to ensure the long-term stable operation of the side-blowing device, it is regularly maintained. At regular production cycles (such as every 100 hours of operation), check whether the air outlet is blocked. If there is dust accumulation, use professional cleaning tools to clean it; check the fan and other power components to ensure that their speed is stable and there is no abnormal noise. If necessary, add lubricating oil or replace worn parts; calibrate the sensors, regulating valves and other components of the airflow control system to ensure accurate measurement and control of airflow parameters, so that the side-blowing device is always in the best working state, providing reliable dust prevention and control for the laser etching process, and improving product quality and the cleanliness of the production environment.

[0095] In a specific embodiment provided in the present application, the laser multi-beam etching control device for pole piece scribing: the laser in the laser optical path system adopts a single-module continuous laser with a power greater than 6000W.

[0096] Specifically, the laser power is recommended to be >6000w single-module continuous laser. The power range is selected according to the number of lines to be drawn, which is suitable for the adaptation of different lasers. The glass transflective lenses of the focusing system need to be specially customized with different transmittances and reflectivities. When building a laser multi-beam etching control device for pole piece marking, first focus on the selection and adaptation of the laser in the core component - the laser optical path system. In view of the process requirements, a single-module continuous laser greater than 6000w is selected. This type of laser has the significant advantages of high power and stable output, and can meet the stringent requirements of pole piece materials for marking depth, accuracy and processing efficiency.

[0097] During the laser installation process, we rely on high-precision mechanical bases and shock-absorbing platforms to ensure that the laser maintains extremely high stability during operation and avoid problems such as optical path deviation caused by vibration. Professional optical alignment instruments are used to finely calibrate the laser output port to ensure that the laser beam can accurately enter the subsequent optical path transmission link. At the same time, in order to cope with the large amount of heat generated by high-power operation, an efficient cooling system is equipped, such as a water cooling device. The cooling water flow rate is precisely controlled according to the heat generation power of the laser, generally maintained at 10-20 liters / minute, to ensure that the laser operating temperature is stably maintained in an appropriate temperature range, usually 20℃-30℃, to prevent laser power attenuation or equipment failure due to overheating.

[0098] Entering the optical transmission part, the high-energy laser beam output from the laser first passes through a special beam expander. The beam expander is accurately selected and parameterized according to the spot size and energy distribution characteristics required for pole piece scribing, and the original laser beam diameter is expanded to a suitable ratio, such as 5-10 times, to reduce the energy density gradient of the laser beam, making the subsequent beam more uniform and stable during transmission and beam splitting.

[0099] The laser beam then reaches a beam splitting element, such as a diffraction grating or prism splitter system. These elements are used to accurately decompose a single laser beam into multiple sub-beams that meet the requirements of the pole piece scribing process. The number of sub-beams, spacing, and energy distribution ratio are determined by precise optical simulation software based on factors such as the size specifications of the pole piece and the complexity of the scribing pattern. For example, for conventional-sized pole pieces, when there are many scribing lines and the pattern is fine, the laser beam can be divided into 8-16 sub-beams, and the energy difference between each sub-beam is controlled within ±5%, ensuring a uniform and consistent scribing effect on the pole piece surface.

[0100] After the beam splitting is completed, each sub-beam enters an independent collimated and focused optical path, which is closely related to the side-blowing device and target material mentioned earlier. The lens elements in the collimation and focusing group are optimized according to the wavelength and energy characteristics of the sub-beams, and each sub-beam is precisely collimated and focused, so that it forms an extremely small and highly energy-concentrated light spot when it reaches the surface of the pole piece. The spot diameter is usually controlled at 10-50 microns, which meets the micron-level scribing accuracy requirements of the pole piece. At this time, the side-blowing device operates according to established rules, and the airflow blown out of its air outlet acts precisely on the laser-irradiated area of ​​the pole piece, and promptly blows away the dust generated by the laser scribing to prevent the dust from adversely affecting the optical path transmission and the quality of the pole piece. The wind speed and air volume control of the air outlet cooperate with the laser optical path system to ensure that the entire etching process is stable and efficient.

[0101] In order to achieve precise control of the entire laser multi-beam etching process, a control system is introduced. The system collects key parameters such as the output power of the laser, the energy distribution of each sub-beam, the surface temperature of the pole piece, and the operating status of the equipment in real time, and performs data analysis and processing through a built-in intelligent algorithm. Once any parameter is detected to deviate from the preset process range, such as the laser power fluctuation exceeding ±3% and the abnormal increase in the surface temperature of the pole piece, the control system will immediately automatically adjust the laser drive current, cooling water flow rate, side blowing device airflow parameters, etc. to ensure that the etching process is always in the best state, to ensure the quality consistency and stability of the pole piece marking, and to meet the large-scale, high-precision pole piece production needs.

[0102] Finally, the entire laser multi-beam etching control device is regularly maintained. In addition to routine inspection, cleaning, and calibration of key components such as lasers, cooling systems, and optical elements, it is also necessary to use professional optical power meters, spectrum analyzers, and other testing equipment to conduct in-depth testing of the laser optical path system to ensure that indicators such as optical path transmission efficiency and beam quality are maintained at a high standard level for a long time. A reasonable maintenance cycle is formulated every 500 hours of operation or based on actual production conditions to ensure the reliability and durability of the equipment, reduce production costs, and improve production efficiency.

[0103] In a specific embodiment provided by the present application, the laser multi-beam etching control device for pole piece scribing: each transflective lens in the lens group in the laser optical path system is hung on a six-direction adjustable position mechanism.

[0104] Specifically, based on the above-mentioned laser multi-beam etching control device for pole piece scribing, the configuration and adjustment function of the lens group are further optimized. The lens group in the laser optical path system plays a key role in beam guidance and distribution, and each transflective lens is hung on a six-way adjustable position mechanism, which greatly facilitates the precise adjustment of the optical path and the optimization of process adaptability.

[0105] First, design and manufacture a six-way adjustable position mechanism. This mechanism uses a high-precision mechanical structure combination, usually composed of multiple sets of precision guide rails, lead screws and rotating joints, with the ability to adjust the translation along the three coordinate axes of X, Y, and Z, as well as the freedom of rotation adjustment around these three axes, so as to achieve all-round position and posture control of the transflective lens. For example, in the X-axis direction, the pitch of the lead screw is as fine as 0.1 mm. With the high-precision displacement sensor, it can achieve a minimum precise displacement adjustment of 0.01 mm to meet the needs of fine-tuning the lateral position of the lens in the optical path; in the rotation direction around the Z axis, a high-precision harmonic reducer is used to achieve a fine angle adjustment of 0.1° to ensure that the lens angle can accurately adapt to the incident angle requirements of the laser beam.

[0106] During the installation of the transflective lens, each lens is mounted firmly and detachably on the end effector of the six-way adjustable mechanism. The specially designed flexible buffer fixture is used to ensure the rigid connection of the lens after installation, prevent loosening and displacement under the vibration of the equipment operation, and avoid damage to the lens caused by rigid contact. After the installation is completed, the initial position of the lens can be easily adjusted through the manual fine-tuning knob or electric drive unit of the mechanism, so that the lens is roughly located near the theoretical optical path, in preparation for subsequent fine calibration.

[0107] In the initial optical path construction stage, the optical path of the lens group is preliminarily tested with the help of professional optical testing instruments, such as beam analyzers and interferometers. According to the beam deviation information fed back by the test, the transflective lens is finely adjusted using a six-way adjustable mechanism. If the laser beam is found to be offset in the vertical direction at a certain lens, the lens is accurately moved by adjusting the translation function of the mechanism in the Y-axis direction to return the beam to the center of the ideal optical path; when there is a deviation between the incident angle of the beam and the design angle of the lens, the rotation adjustment function around the corresponding coordinate axis is used to slightly rotate the lens until the incident angle meets the optical design requirements, ensuring that the beam is efficiently and accurately transmitted within the lens group, reducing energy loss and scattering.

[0108] As the requirements for the pole piece scribing process change, such as replacing pole pieces of different materials, thicknesses, or different scribing pattern complexities, the optical path of the lens group needs to be adapted accordingly. At this time, the flexible adjustment characteristics of the six-way adjustable mechanism are used again to quickly adjust the position and posture of the lens. For situations where it is necessary to change the beam splitting ratio and the reflection and transmission path to meet the energy distribution requirements of the new pole piece, the optical path layout of the lens group is re-optimized through multi-axis coordinated adjustment, without the need for large-scale disassembly and reorganization of the entire optical path system, which greatly improves the process adaptability and production efficiency of the equipment.

[0109] In addition, to ensure the long-term stable operation of the six-way adjustable mechanism, regular maintenance is required. At regular production cycles, such as every 200 hours of operation, the moving parts such as guide rails and screws are cleaned and lubricated, and the accuracy of feedback components such as displacement sensors and rotary encoders is checked. If there is any deviation, it is calibrated in time to ensure that the mechanism always maintains high-precision adjustment performance, providing reliable guarantee for the precise optical path control of the lens group, thereby improving the stability and flexibility of the entire laser multi-beam etching control device in the pole piece scribing process.

[0110] The device provided in this embodiment can adopt the laser multi-beam etching method, which only requires a single laser, couples out multi-beam processing materials through a special optical path structure, provides non-contact processing, and has a small etching line width while ensuring high stability and accuracy, and is compatible with large-format pole pieces. The processing format and pole piece scribing width are no longer limited by the focusing field lens, which reduces the cost and the maintenance cost of high-precision multi-beam laser scribing equipment in the later stage, while ensuring the etching effect; avoids the problems of low precision and low stability of the splicing points caused by ordinary laser multi-head galvanometer scanning or splicing scribing; the software is highly integrated, the control process is simple, and the overall structure of the equipment is compact; through the combination of the optical path system light guide mirror group and the focusing mirror group on the material surface scribing process method, a high-speed and stable scribing method is achieved for pole pieces of different sizes, which is easier to adapt to the automated line, thereby improving production efficiency and finished product yield and stability:

[0111] High precision: The focusing accuracy of the laser beam can reach the micron level, which can achieve very fine scribing on the pole piece, ensuring that the width and depth of the scribing are uniform and consistent, thereby improving the performance consistency of the battery.

[0112] Fast speed: Laser scribing has a fast speed and can complete the scribing of a large number of electrodes in a short time to meet the needs of large-scale production.

[0113] High flexibility: Laser scribing can achieve various complex scribing patterns, such as straight lines, curves, grids, etc. by controlling the parameters and scanning path of the laser to meet the needs of different battery designs.

[0114] For the specific definition of the laser multi-beam etching control device for pole piece scribing, please refer to the definition of the laser multi-beam etching control method for pole piece scribing mentioned above, which will not be repeated here. Each module in the above-mentioned laser multi-beam etching control device for pole piece scribing can be implemented in whole or in part by software, hardware and a combination thereof. The above-mentioned modules can be embedded in or independent of the processor in the electronic device in the form of hardware, or can be stored in the memory of the electronic device in the form of software, so that the processor can call and execute the operations corresponding to the above modules.

[0115] In one embodiment, an electronic device is provided. The electronic device may be a server, and its internal structure diagram may be as shown in FIG. Figure 5As shown. The electronic device includes a processor, a memory, a network interface and a database connected via a system bus. Among them, the processor of the electronic device is used to provide computing and control capabilities. The memory of the electronic device includes a non-volatile medium and an internal memory. The non-volatile medium stores an operating system, a computer program and a database. The internal memory provides an environment for the operation of the operating system and the computer program in the non-volatile medium. The database of the electronic device is used for data related to the laser multi-beam etching control method for pole piece scribing. The network interface of the electronic device is used to communicate with an external terminal through a network connection. When the computer program is executed by the processor, a laser multi-beam etching control method for pole piece scribing is implemented.

[0116] In one embodiment, an electronic device is provided, including a memory, a processor, and a computer program stored in the memory and executable on the processor. When the processor executes the computer program, the laser multi-beam etching control method for pole piece scribing of the above embodiment is implemented, such as Figure 2 Alternatively, when the processor executes the computer program, the functions of the modules / units of the laser multi-beam etching control device for pole piece scribing in the above embodiment are realized, which will not be described here to avoid repetition.

[0117] Those skilled in the art can clearly understand that for the convenience and simplicity of description, only the division of the above-mentioned functional units and modules is used as an example. In actual applications, the above-mentioned functions can be distributed and completed by different functional units and modules as needed, that is, the internal structure of the device can be divided into different functional units or modules to complete all or part of the functions described above.

[0118] The above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit the same. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that the technical solutions described in the aforementioned embodiments may still be modified, or some of the technical features may be replaced by equivalents. Such modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention, and should be included in the protection scope of the present invention.

Claims

1. A laser multi-beam etching control method for pole piece scribing, characterized in that: include: Obtaining etching specifications and etching materials, wherein the etching specifications include etching depth and width, etching length and etching path; Based on the preset laser transmission length, the etching length and the etching path, confirming the installation position of the lens group, including: obtaining the effective transmission length of each transflective lens; the lens group installation position is based on the etching length and each of the effective transmission lengths, obtaining the optimal lens arrangement sequence as the lens group installation position; According to the number of lens groups and the installation positions of the lens groups, the lens transmittance of each lens group is determined. There are four lens groups in the system. The lens transmittance is determined according to the number of lenses and the arrangement positions. The first lens group closest to the laser source is set to 90%, and the transmittances of each subsequent adjacent lens group are set to 80%, 70% and 60% respectively. According to the light field distribution characteristics of each lens group, the curvature, thickness and coating parameters of the lens are adjusted, and the light beam is shaped. Controlling the optical path system to position each transflective lens according to the lens group installation position, and correspondingly arranging a collimating and focusing group on the lower side of each transflective lens; Determining an etching speed of a focusing head in each of the collimating and focusing groups based on the etching depth width and the material etching properties corresponding to the etching material; According to the etching path, each of the focusing heads is controlled to etch the target material at a corresponding etching speed, The method comprises: controlling a laser assembly to output a laser beam to a current transflective lens of a lens group; reflecting a laser beam partially reflected by the laser beam as a current reflected laser beam to a collimating and focusing group corresponding to the current transflective lens according to a reflectivity set by the lens group; penetrating a partially transmitted laser beam of the laser beam as a current projected laser beam to a next transflective lens adjacent to the current transflective lens according to a projection rate set by the lens group; according to the etching path, a current focusing head in the collimating and focusing group etches the target material using the current reflected laser beam; controlling the next transflective lens to repeatedly perform the steps of reflecting a laser beam partially reflected by the laser beam as a current reflected laser beam to a collimating and focusing group corresponding to the current transflective lens, penetrating a partially transmitted laser beam of the laser beam as a current projected laser beam to a next transflective lens adjacent to the current transflective lens according to a projection rate set by the lens group; according to the etching path, a current focusing head in the collimating and focusing group etches the target material using the current reflected laser beam, until all focusing heads in the collimating and focusing group have completed etching the target material.

2. The laser multi-beam etching control method for pole piece scribing according to claim 1, characterized in that: Before the current focusing head in the collimating and focusing group etches the target material using the current reflected laser beam, the method further includes: The side blowing device is started, and the air outlet of the side blowing device is controlled to perform side blowing along the running direction of the target material at a preset angle, wherein the air outlet of the side blowing device is arranged between the collimating focusing group and the target material.

3. A laser multi-beam etching control device for pole piece scribing, characterized in that: include: Control system, laser optical path system and laser base module, wherein the control system includes: An etching specification acquisition module, used to acquire etching specifications and etching materials, wherein the etching specifications include etching depth and width, etching length and etching path; The installation position confirmation module is used to confirm the installation position of the lens group based on the preset laser transmission length, the etching length and the etching path, including: obtaining the effective transmission length of each transflective lens; the lens group installation position is based on the etching length and each of the effective transmission lengths, and obtaining the optimal lens arrangement sequence as the lens group installation position; A collimation and focusing group setting module is used to determine the lens transmittance of each lens group according to the number of lens groups and the installation position of the lens groups, wherein there are four lens groups in the system, and the lens transmittance is determined according to the number of lenses and the arrangement position, and the first lens group closest to the laser source is set to 90%, and the transmittances of each subsequent adjacent lens group are set to 80%, 70% and 60% respectively; according to the light field distribution characteristics of the position of each lens group, the curvature, thickness and coating parameters of the lens are adjusted, and the light beam is shaped; the optical path system is controlled to position each transflective lens according to the installation position of the lens group, and a collimation and focusing group is correspondingly set at the lower side of each transflective lens; An etching speed determination module, used to determine the etching speed of each focusing head in the collimation and focusing group based on the etching depth width and the material etching properties corresponding to the etching material; The target material etching module is used to control each of the focusing heads to etch the target material at a corresponding etching speed according to the etching path, including: controlling the laser assembly to output a laser beam to the current transflective lens of the lens group; according to the reflectivity set by the lens group, reflecting the laser beam partially reflected by the laser beam as the current reflected laser beam to the collimating and focusing group corresponding to the current transflective lens; according to the projection rate set by the lens group, using the partially transmitted laser beam of the laser beam as the current projected laser beam to penetrate to the next transflective lens adjacent to the current transflective lens; according to the etching path, the current focusing head in the collimating and focusing group adopts the The target material is etched by the current reflected laser beam; the next transflective lens is controlled to repeatedly perform the step of reflecting the laser beam partially reflected by the laser beam as the current reflected laser beam to the collimating and focusing group corresponding to the current transflective lens, and according to the projection rate set by the lens group, the partially transmitted laser beam of the laser beam is used as the current projection laser beam to penetrate to the next transflective lens adjacent to the current transflective lens; according to the etching path, the current focusing head in the collimating and focusing group etches the target material with the current reflected laser beam until all the focusing heads in the collimating and focusing group have completed the etching of the target material.

4. The laser multi-beam etching control device for pole piece scribing according to claim 3, characterized in that: Also includes: A side air blowing device, wherein an air outlet of the side air blowing device is arranged between the collimating and focusing group and the target material.

5. The laser multi-beam etching control device for pole piece scribing according to claim 3, characterized in that: The laser in the laser optical path system adopts a single-module continuous laser with a power greater than 6000W.

6. The laser multi-beam etching control device for pole piece scribing according to claim 3, characterized in that: Each transflective lens in the lens group in the laser optical path system is hung on a six-direction adjustable position mechanism.

7. An electronic device comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, characterized in that: When the processor executes the computer program, the laser multi-beam etching control method for pole piece scribing as described in any one of claims 1 to 2 is implemented.

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