Preparation method of low-emissivity coated tempered glass

Abstract

This invention discloses a method for preparing low-emissivity coated tempered glass, including sintering a target material, glass dehumidification and degassing pretreatment, coating treatment, and tempering treatment. A composite metal film layer is laminated onto a tempered glass substrate to produce tempered coated glass with three layers of metallic silver film. In this method, after coating a common glass substrate with a composite metal film layer, tempering treatment is performed. The reflection, interference, and refraction of light by each metal film layer after tempering treatment result in the glass exhibiting a light green (French green) hue under sunlight, offering good decorative and energy-saving effects. It also features high visible light transmittance, low outdoor visible light reflectance, low solar energy transmittance, and high solar energy reflectance. When made into insulated glass, it provides better light control, heat insulation, and other energy-saving effects, making buildings more integrated with nature. Suitable for near-zero energy buildings, it enables buildings to meet the requirements of the national standard "General Specification for Building Energy Conservation and Renewable Energy Utilization".

Description

Technical Field

[0001] This invention relates to a tempered low-emissivity coated glass and its preparation method, particularly to a tempered low-emissivity coated glass for near-zero energy buildings and its preparation method, belonging to the field of glass production and processing. Background Technology

[0002] Coated glass, also known as reflective glass, is glass with one or more layers of metal, alloy, or metal compound film coated on its surface to alter its optical properties and meet specific requirements. Coated glass can be categorized according to its characteristics, including heat-reflective glass, low-emissivity (Low-E) glass, and conductive film glass.

[0003] There are many methods for producing coated glass, such as vacuum magnetron sputtering, vacuum evaporation, chemical vapor deposition (CVD), and sol-gel methods. Magnetron sputtering coated glass utilizes magnetron sputtering technology to design and manufacture multi-layered complex film systems, depositing various colors on white glass substrates. The films exhibit good corrosion and wear resistance, making it the most widely used technology in production. Vacuum evaporation coated glass lags behind magnetron sputtering coated glass in terms of both variety and quality and has been gradually replaced by vacuum sputtering. Chemical vapor deposition (CVD) involves introducing reactive gases onto a heated glass surface during the float glass production line, where they decompose and uniformly deposit onto the glass surface to form a coated glass. This method requires less equipment investment, is easy to control, produces low-cost products with good chemical stability, and can be thermally processed, making it one of the most promising production methods. The sol-gel method for producing coated glass is simple and stable, but its drawback is that the product has a high light transmittance and poor decorative properties.

[0004] Magnetron sputtering is currently the most widely used, stable, high-performance (emissivity E value ≤ 0.12), and diverse glass coating process in the world, with relatively low energy requirements. Because this process does not require integration with float glass production lines, float glass production and glass coating processes can be carried out separately, effectively reducing the need for glass processing companies to repeatedly build float glass production lines, and decreasing carbon dioxide emissions and related energy consumption. Currently, the most commonly used heat-reflective and low-emissivity glasses are primarily produced using vacuum magnetron sputtering and chemical vapor deposition methods.

[0005] The principle of magnetron sputtering coating is to apply an orthogonal magnetic field and an electric field between the target electrode (cathode) and the anode. A high-vacuum chamber is filled with the required inert gas (usually Ar). A permanent magnet forms a magnetic field of 250–350 Gauss on the target material surface, which, together with the high-voltage electric field, forms an orthogonal electromagnetic field. Under the influence of the electric field, the Ar gas ionizes into positive ions and electrons. A certain negative high voltage is applied to the target. Electrons emitted from the target electrode are more likely to ionize due to the magnetic field and the working gas, forming a high-density plasma near the cathode. Ar ions are accelerated towards the target surface under the influence of the Lorentz force, bombarding the target surface at high speed. The atoms sputtered from the target detach from the target surface with high kinetic energy and fly towards the glass substrate, where they are deposited as a film.

[0006] Currently, the most widely used heat-reflective and low-emissivity glass is produced primarily using vacuum magnetron sputtering and chemical vapor deposition (CVD) methods. Internationally renowned manufacturers of vacuum magnetron sputtering equipment include BOC (USA) and Leybold (Germany); manufacturers of CVD equipment include Pilkington (UK). Currently, my country has hundreds of coated glass manufacturers. Among the more influential vacuum magnetron sputtering manufacturers are China Southern Glass Group and Shanghai Sunshine Coated Glass Co., Ltd., while CVD manufacturers include Shandong Lanxing Glass Co., Ltd. and Yangtze River Float Glass Co., Ltd.

[0007] Currently, low-emissivity (LEE) coated glass has evolved from single-silver Low-E glass to triple-silver Low-E glass. The technological advancements in triple-silver LEE coated glass, including improved functionality and off-site heat treatment, have made significant contributions to the widespread adoption of energy-efficient glass / buildings and improved human living comfort. However, the light-to-heat ratio (LTR) of existing coated glass is insufficient for use in zero-energy buildings. The LRR of solar control coated glass is 0.5-0.9; single-silver Low-E glass has an LRR of 1.1-1.3; and double-silver Low-E glass has an LRR of 1.4-1.7, exhibiting relatively poor energy efficiency. While existing triple-silver Low-E glass can achieve an LRR of 1.7-2.1, it faces the technical challenge of not being able to undergo off-site tempering treatment.

[0008] The tempered low-emissivity glass of this invention can adjust the light-to-heat ratio, achieving a high light-to-heat ratio of over 2.2 (visible light transmittance ÷ total solar transmittance ≈ light-to-heat ratio LSG); it solves the current problem of buildings needing both high transmittance and low shading, and appropriately lowers the heat transfer coefficient to meet the national standard requirements for large curtain wall glass.

[0009] The tempered low-emissivity coated glass of the present invention can be tempered and heat-treated in a different location, and the processed glass can be large in size with high production efficiency, thus solving the technical problem that existing triple-silver low-emissivity coated glass cannot be tempered in a different location.

[0010] This invention utilizes specific nickel-chromium, silicon-aluminum, zinc-aluminum oxide, silver, zinc-tin oxide, and zirconium oxide as sputtering targets to produce high-quality tempered low-emissivity coated glass. The glass exhibits vibrant colors, is easily adjustable, boasts stable quality, and high production efficiency. Furthermore, the tempered low-emissivity coated glass produced by this invention exhibits a high reflectance ratio for mid- and far-infrared rays in the wavelength range of 4.5–25 micrometers, significantly reducing building energy consumption compared to existing triple-silver Low-E glass. This results in savings on air conditioning costs in summer and heating costs in winter. The product also features low outdoor reflectivity, producing soft light, far below the national standard requirement of less than 16%. It is particularly suitable for high-rise and super high-rise buildings in various regions, environments, and scenarios where there is a need to reduce outdoor visible light reflection and "light pollution." It does not cause strong reflected light stimulation to the human eye (especially drivers), avoiding alternating accidents and is suitable for long-term use. This product is promoted by the Ministry of Industry and Information Technology of my country.

[0011] Buildings using the triple silver low-emissivity coated glass of this invention meet the requirements of the national standard GB55015-2021 "General Specification for Building Energy Conservation and Renewable Energy Utilization" and comply with building energy conservation requirements.

[0012] Solar reflectivity, shading coefficient, and total solar transmittance are all factors to consider. Solar reflectivity + absorptivity + transmittance = 100%. The lower the solar transmittance, the less outdoor heat enters the room, resulting in lower summer cooling costs. The higher the indoor solar reflectivity, the better it can retain the cool air from the air conditioner in summer and the heat from the heating system in winter, preventing it from dissipating to the outside through the glass.

[0013] Different coating structures result in different colors and properties of coated glass. The tempered low-emissivity coated glass of this invention has a reasonable film structure design and a scientifically designed film thickness. The reflective layer (the second and third silver layers) has a reasonable position and thickness, which not only serves the purpose of reflection but also ensures that the tempered low-emissivity coated glass of this invention reflects heat relatively gently in the tempering furnace during the tempering process. The film layer remains intact under tempering stability without being damaged, allowing for large-format tempering of coated glass in different locations. Summary of the Invention

[0014] The primary objective of this invention is to address the technical shortcomings of existing triple-silver coated glass in failing to meet the requirements for near-zero energy buildings. This invention provides a method for preparing low-emissivity coated tempered glass. The low-emissivity coated tempered glass prepared by this method has three silver film layers and is designed for use in near-zero energy buildings. The prepared low-emissivity coated tempered glass is light green (French green), achieving near-zero energy building requirements by reducing building heating and cooling demands, improving energy system efficiency, and meeting ultra-low energy consumption requirements and standards. Buildings using the tempered coated glass prepared by this invention meet the requirements of the national standard GB55015-2021 "General Specification for Building Energy Conservation and Renewable Energy Utilization," thus complying with building energy conservation requirements.

[0015] To achieve the objectives of this invention, a method for preparing low-emissivity coated tempered glass is provided, comprising the following steps performed in sequence:

[0016] 1) Sintered target material

[0017] The target materials, namely silicon-aluminum alloy, zinc oxide-aluminum alloy, nickel-chromium alloy, silver, zinc oxide-tin, and zirconium oxide, are sintered onto the target positions in the vacuum sputtering chamber of the glass coating machine for later use.

[0018] 2) Glass pretreatment

[0019] The glass substrate to be coated is placed in a vacuum state to perform dehumidification and degassing treatment, thereby reducing the moisture and gas deposited on the glass surface and obtaining a dehumidified and degassed glass substrate.

[0020] 3) Coating treatment

[0021] A dehumidified and degassed glass substrate is fed into the vacuum magnetron sputtering chamber of a glass coating machine, which is equipped with targets for silicon-aluminum alloy, zinc-aluminum oxide, nickel-chromium alloy, silver, zinc-tin oxide, and zirconium oxide, respectively. The following coating processes are sequentially applied to the surface of the dehumidified and degassed glass substrate: first silicon-aluminum film layer; second zinc-aluminum oxide film layer; third nickel-chromium alloy film layer; fourth silver film layer; fifth nickel-chromium alloy film layer; sixth zinc-aluminum oxide film layer; seventh silicon-aluminum film layer; eighth zinc-aluminum oxide film layer; ninth nickel-chromium alloy film layer; tenth silver film layer; eleventh nickel-chromium gold film layer; twelfth zinc-aluminum oxide film layer; thirteenth silicon-aluminum film layer; fourteenth zinc-tin oxide film layer; fifteenth silicon-aluminum film layer; sixteenth zinc-aluminum oxide film layer; seventeenth nickel-chromium alloy film layer; eighteenth silver film layer; nineteenth nickel-chromium alloy film layer; twentieth zinc-aluminum oxide film layer; twenty-first silicon-aluminum film layer; and twenty-second zirconium oxide film layer.

[0022] 4) Tempering treatment

[0023] The coated glass is sent into a tempering furnace for tempering to produce tempered low-emissivity coated glass.

[0024] In step 1), the silicon-aluminum alloy is selected with a sintering purity of ≥99.90% and a density of ≥2.19 g / cm³. 3 The alloy comprises a silicon-aluminum alloy with a relative density ≥93% and a melting point of 1370℃, containing 8-12±2wt% Al and the remainder being Si; the zinc oxide-aluminum alloy has a selective sintering purity ≥99.90%, a theoretical density of 5.56 ((ZnO)-2wt%(Al2O3)), a target density ≥5.50 g / cm3, a relative density ≥99%, and is composed of 2wt% Al2O3 and 98wt% ZnO; the silver has a selective sintering purity ≥99.99% and a theoretical density ≥10.49 g / cm3. 3 The target material density is ≥10.28 g / cm³. 3 The silver metal has a relative density ≥98% and a melting point of 960℃; the nickel-chromium alloy has a sintering purity ≥99.7%, a theoretical density of 8.49 g / cm³ (Ni-20%Cr), and a target material density ≥8.5 g / cm³. 3 A nickel-chromium alloy with a relative density ≥98% and a melting point of 1420℃, wherein the Cr content is 20±1wt% and the remainder is Ni; the zinc-tin oxide alloy is selected with a sintering purity ≥99.9%, a Sn content of (50±2)wt% and the remainder being Sn, and a density ≥7.1g / cm³. 3 A zinc-tin oxide alloy with a melting point of 360℃; the zirconium oxide target material has a purity of ≥99.9% and a density of ≥5.35 g / cm³. 3 Its melting point is 2300℃.

[0025] Specifically, the sintering time for the silicon-aluminum alloy is 90 min; the sintering time for the nickel-chromium alloy is 90 min; the sintering time for the silver is 60 min; the sintering time for the zinc-aluminum oxide alloy is 60 min; the sintering time for the zinc-tin oxide alloy is 90 min; and the sintering time for the cadmium oxide is 90 min.

[0026] In particular, the target materials silicon-aluminum alloy, zinc oxide-aluminum alloy, silver, nickel-chromium alloy, zinc oxide-tin alloy, and zirconium oxide respectively meet the requirements of the national industry standard JC / T2068-2011 for silicon-aluminum targets, zinc oxide-aluminum alloy, silver, nickel-chromium alloy, zinc oxide-tin alloy, and zirconium oxide.

[0027] In this invention, the zinc oxide tin alloy film is used to absorb the reflected brightness of the third silver layer (i.e., the eighteenth silver film layer) and adjust the color of the coated glass.

[0028] In step 2), the dehumidification and degassing treatment involves reducing the moisture and gas deposited on the glass surface by processing the glass to be coated in two stages, thereby obtaining the dehumidified and degassed glass.

[0029] In particular, the absolute pressure in the first treatment stage of the dehumidification and degassing process is higher than the absolute pressure in the second treatment stage.

[0030] In particular, the absolute pressure during the first treatment stage is 5.0–6.0 × 10⁻⁶. －2 mbar; the absolute pressure during the second treatment stage is 3.0–6.0 × 10 mbar. -5 mbar.

[0031] In particular, the processing temperature of the first processing stage is -135 to -145°C, and the glass processing speed is 2.0-10 m / min, preferably 3.0-8.0 m / min, and more preferably 5 m / min; the processing temperature of the second processing stage is 80-100°C, and the glass processing speed is 2.0-10.0 m / min, preferably 3.0-8.0 m / min, and more preferably 5 m / min.

[0032] In particular, the processing time of the first dehumidification and degassing treatment stage is 15-60s, preferably 20-40s, and more preferably 20-30s; the processing time of the second dehumidification and degassing treatment stage is 15-60s, preferably 20-40s, and more preferably 20-30s.

[0033] In particular, in step 2), the glass substrate is first cleaned with deionized water and then placed under vacuum to perform the dehumidification and degassing treatment, thereby reducing the water and gas deposited on the glass surface and obtaining a dehumidified and degassed glass substrate.

[0034] The mineral content in the deionized water is ≤5 μ / cm / m 2 The temperature is 35–40℃; the cleaning speed is 2.0–10.0 m / min, preferably 3.0–8.0 m / min, and more preferably 5 m / min.

[0035] In particular, it also includes drying the glass substrate after cleaning with deionized water at 20–50°C to remove water droplets from the glass surface, wherein the drying speed is 5 m / min.

[0036] In step 3), the thickness of the first silicon-aluminum alloy film is 50.0–80.0 nm; the thickness of the second zinc-aluminum oxide film is 10.0–30.0 nm; the thickness of the third nickel-chromium alloy film is 0.5–3.0 nm; the thickness of the fourth silver film is 8.0–15.0 nm; the thickness of the fifth nickel-chromium alloy film is 1.0–3.0 nm; the thickness of the sixth zinc-aluminum oxide film is 10.0–30.0 nm; the thickness of the seventh silicon-aluminum alloy film is 310.0–400.0 nm; the thickness of the eighth zinc-aluminum oxide film is 15.0–35.0 nm; the thickness of the ninth nickel-chromium alloy film is 1.0–5.0 nm; the thickness of the tenth silver film is 5.0–15.0 nm; the thickness of the eleventh nickel-chromium alloy film is 1.0–5.0 nm; and the thickness of the twelfth zinc-aluminum oxide film is 10.0–30.0 nm. The thickness of the gold film layer is 15.0–35.0 nm; the thickness of the thirteenth silicon-aluminum alloy film layer is 130.0–200.0 nm; the thickness of the fourteenth zinc-tin oxide alloy film layer is 15.0–40.0 nm; the thickness of the fifteenth silicon-aluminum alloy film layer is 100.0–200.0 nm; the thickness of the sixteenth zinc-aluminum oxide alloy film layer is 10.0–40.0 nm; the thickness of the seventeenth nickel-chromium alloy film layer is 0.5–5.0 nm; the thickness of the eighteenth silver film layer is 8.0–15.0 nm; the thickness of the nineteenth nickel-chromium alloy film layer is 1.0–3.0 nm; the thickness of the twentieth zinc-aluminum oxide alloy film layer is 10.0–30.0 nm; the thickness of the twenty-first silicon-aluminum alloy film layer is 170.0–200.0 nm; and the thickness of the twenty-second zirconium oxide alloy film layer is 10.0–50.0 nm.

[0037] Specifically, the thickness of the first silicon-aluminum alloy film is 55.0–65.0 nm; the thickness of the second zinc-aluminum oxide film is 18.0–22.0 nm; the thickness of the third nickel-chromium alloy film is 1.0–1.8 nm; the thickness of the fourth silver film is 10.0–13.0 nm; the thickness of the fifth nickel-chromium alloy film is 1.2–1.8 nm; and the thickness of the sixth zinc-aluminum oxide film is 18.0–25.0 nm.

[0038] The thickness of the seventh silicon-aluminum alloy film layer is 315.0–330.0 nm; the thickness of the eighth zinc-aluminum oxide film layer is 15.0–25.0 nm; the thickness of the ninth nickel-chromium alloy film layer is 2.0–3.0 nm; the thickness of the tenth silver film layer is 9–12.0 nm; the thickness of the eleventh nickel-chromium alloy film layer is 1.2–2.2 nm; and the thickness of the twelfth zinc-aluminum oxide film layer is 25.0–35.0 nm.

[0039] The thickness of the thirteenth silicon-aluminum alloy film is 145.0–160.0 nm; the thickness of the fourteenth zinc-tin oxide alloy film is 25.0–35.0 nm; the thickness of the fifteenth silicon-aluminum alloy film is 120.0–140.0 nm; the thickness of the sixteenth zinc-aluminum oxide alloy film is 18.0–25.0 nm; the thickness of the seventeenth nickel-chromium alloy film is 1.2–2.2 nm; the thickness of the eighteenth silver film is 10.0–13.0 nm; the thickness of the nineteenth nickel-chromium alloy film is 1.5–2.5 nm; the thickness of the twentieth zinc-aluminum oxide alloy film is 15.0–25.0 nm; the thickness of the twenty-first silicon-aluminum alloy film is 180.0–200.0 nm; and the thickness of the twenty-second zirconium oxide alloy film is 20.0–30.0 nm.

[0040] Specifically, the first silicon-aluminum alloy film layer is formed by two plating processes; the seventh silicon-aluminum alloy film layer is formed by six plating processes; the thirteenth silicon-aluminum alloy film layer is formed by four plating processes; the fifteenth silicon-aluminum alloy film layer is formed by two plating processes; the twenty-first silicon-aluminum alloy film layer is formed by four plating processes; the eighth zinc oxide-aluminum alloy film layer is formed by two plating processes; the twelfth zinc oxide-aluminum alloy film layer is formed by two plating processes; the fourteenth zinc oxide-tin alloy film layer is formed by two plating processes; and the twenty-second zirconium oxide film layer is formed by two plating processes.

[0041] In particular, the vacuum state during the coating process in step 3) is as follows: the absolute pressure inside the vacuum magnetron sputtering chamber is maintained at 2.0–4.0 × 10⁻⁶. -5 mbar, preferably 3.0 × 10 -5 mbar; the plating speed is 2 to 10 m / min, preferably 3 to 8.0 m / min, and more preferably 5 m / min; the plating temperature is 80 to 100℃.

[0042] In particular, the first silicon-aluminum alloy film layer is formed by two deposition processes; wherein: during the first deposition process, the vacuum magnetron sputtering voltage is 380.0–450.0V, preferably 410.0–435.0V; the current is 60.0–90.0A, preferably 70.0–80.0A; and the power is 20.0–50.0kW, preferably 25.0–35.0kW; during the second deposition process, the vacuum magnetron sputtering voltage is 390.0–450.0V, preferably 410.0–430.0V; the current is 60.0–95.0A, preferably 75.0–85.0A; and the power is 20.0–50.0kW, preferably 25.0–35.0kW.

[0043] In particular, the atmosphere in the vacuum magnetron sputtering chamber during the first and second deposition processes of the first silicon-aluminum alloy film layer is argon and nitrogen.

[0044] In particular, during the first coating process, the volume ratio of argon to nitrogen in the sputtering chamber was 2:3; during the second coating process, the volume ratio of argon to nitrogen in the sputtering chamber was also 2:3.

[0045] In particular, during the first coating process, the flow rate of argon gas is 400±5 sc / cm, preferably 400 sc / cm; the flow rate of nitrogen gas is 600±5 sc / cm, preferably 600 sc / cm; during the second coating process, the flow rate of argon gas is 400±5 sc / cm, preferably 400 sc / cm; the flow rate of nitrogen gas is 600±5 sc / cm, preferably 600 sc / cm.

[0046] In particular, during the coating process of the second zinc oxide aluminum alloy film layer in step 3), the magnetron sputtering voltage is 400.0-470.0V, preferably 420.0-440.0V; the current is 35.0-60.0A, preferably 45.0-55.0A; and the power is 10.0-30.0Kw, preferably 15.0-25.0Kw.

[0047] In particular, the atmosphere in the vacuum sputtering chamber during the deposition of the second zinc oxide aluminum alloy film is argon and oxygen.

[0048] In particular, the volume ratio of argon to oxygen in the atmosphere is 16:1.

[0049] In particular, the argon flow rate is 800±5 sc / cm, preferably 800 sc / cm, and the oxygen flow rate is 50±5 sc / cm, preferably 50 sc / cm.

[0050] In particular, during the deposition of the third nickel-chromium alloy film layer in step 3), the magnetron sputtering voltage is 260.0–310.0V, preferably 275.0–290.0V; the current is 3.0–10.0A, preferably 4.0–6.0A; and the power is 0.5–3.0kW, preferably 1.0–2.0kW.

[0051] In particular, the atmosphere in the vacuum sputtering chamber during the plating process of the third nickel-chromium alloy layer is argon.

[0052] In particular, the argon flow rate is 700±5 sc / cm, preferably 700 sc / cm.

[0053] In particular, during the deposition of the fourth silver film layer in step 3), the magnetron sputtering voltage is 350.0–400.0V, preferably 360.0–385.0V; the current is 20.0–40.0A, preferably 25.0–35.0A; and the power is 8.0–15.0kW, preferably 10.0–13.0kW.

[0054] In particular, the atmosphere in the vacuum sputtering chamber during the coating process of the fourth silver film layer is argon.

[0055] In particular, the flow rate of the argon gas is 600±5 sc / cm, preferably 600 sc / cm.

[0056] In particular, during the deposition of the fifth nickel-chromium alloy film layer in step 3), the magnetron sputtering voltage is 360.0–420.0V, preferably 380.0–400.0V; the current is 3.0–8.0A, preferably 3.5–5.0A; and the power is 0.5–3.0kW, preferably 1.2–2.0kW.

[0057] In particular, the atmosphere in the vacuum magnetron sputtering chamber during the deposition of the fifth nickel-chromium alloy film is argon.

[0058] In particular, the flow rate of the argon gas is 700±5 sc / cm, preferably 700 sc / cm.

[0059] In the coating process of this invention, the flow rate of the gas component is ±5 sc / cm.

[0060] In particular, during the deposition of the sixth zinc oxide aluminum alloy film layer in step 3), the magnetron sputtering voltage is 410.0–460.0V, preferably 425.0–450.0V; the current is 35.0–60.0A, preferably 42.0–50.0A; and the power is 12.0–35.0kW, preferably 18.5–25.0kW.

[0061] In particular, the atmosphere in the vacuum sputtering chamber during the coating process of the sixth zinc oxide aluminum alloy film is argon and oxygen.

[0062] In particular, the volume ratio of argon to oxygen in the atmosphere is 16:1.

[0063] In particular, the argon flow rate is 800 sc / cm and the oxygen flow rate is 50 sc / cm.

[0064] In particular, the seventh silicon-aluminum alloy film layer described in step 3) is deposited in six stages, wherein:

[0065] During the first coating process, the vacuum magnetron sputtering voltage is 610.0–680.0V, preferably 630.0–650.0V; the current is 100.0–150.0A, preferably 110.0–125.0A; and the power is 50.0–80.0kW, preferably 60.0–70.0kW.

[0066] During the second plating process, the vacuum magnetron sputtering voltage is 580.0–630.0V, preferably 600.0–615.0V; the current is 100.0–150.0A, preferably 115.0–130.0A; and the power is 50.0–80.0kW, preferably 60–75.0kW.

[0067] During the third plating process, the vacuum magnetron sputtering voltage is 460.0–510.0V, preferably 480.0–500.0V; the current is 130.0–170.0A, preferably 150.0–160.0A; and the power is 50.0–80.0kW, preferably 60.0–70.0kW.

[0068] During the fourth plating process, the vacuum magnetron sputtering voltage is 380.0–420.0V, preferably 390.0–410.0V; the current is 40.0–70.0A, preferably 50.0–60.0A; and the power is 10.0–40.0kW, preferably 15.0–30.0kW.

[0069] During the fifth coating process, the vacuum magnetron sputtering voltage is 480.0–530.0V, preferably 490.0–515.0V; the current is 120.0–160.0A, preferably 130.0–145.0A; and the power is 40.0–80.0kW, preferably 50.0–70.0kW.

[0070] During the sixth plating process, the vacuum magnetron sputtering voltage is 420.0–480.0V, preferably 440.0–460.0V; the current is 110.0–160.0A, preferably 120.0–145.0A; and the power is 30.0–80.0kW, preferably 40.0–60.0kW.

[0071] In this invention, the seventh silicon-aluminum film layer is relatively thick, and multiple coatings are used to improve coating efficiency. More importantly, the uniformity of the film layer is improved.

[0072] The function of the first silicon-aluminum film layer in this invention is to improve the adhesion between other film layers and the original glass sheet; the 21st silicon-aluminum film layer is a protective layer, which is used for protection during internal processing in the processing plant to prevent the coated glass from being scratched, damaged, or destroyed during subsequent processing; the functions of the middle 7th, 13th, and 15th silicon-aluminum film layers are to achieve adhesion with the 8th and 16th zinc oxide aluminum alloy film layers and the 14th zinc oxide tin alloy film layer (other materials do not adhere firmly to the zinc oxide aluminum alloy) and to adjust the color of the coated glass.

[0073] In particular, the atmosphere in the magnetron sputtering chamber during the deposition of the seventh silicon-aluminum alloy film is argon and nitrogen.

[0074] In particular, the volume ratio of argon to nitrogen in the atmosphere during the first and second coating processes of the seventh silicon-aluminum alloy film was 2.1:3.

[0075] In particular, the flow rate of argon is 420 sc / cm; the flow rate of nitrogen is 600 sc / cm.

[0076] In particular, during the third and sixth coating processes of the seventh silicon-aluminum alloy film, the volume ratio of argon to nitrogen in the atmosphere was 5:7.

[0077] In particular, the flow rate of argon is 500 sc / cm; the flow rate of nitrogen is 700 sc / cm.

[0078] In particular, during the fourth and fifth coating processes of the seventh silicon-aluminum alloy film, the volume ratio of argon to nitrogen in the atmosphere was 5:6.

[0079] In particular, the flow rate of argon is 500 sc / cm; the flow rate of nitrogen is 600 sc / cm.

[0080] In particular, the eighth zinc oxide aluminum alloy film layer described in step 3) is coated twice.

[0081] In the first plating process, the vacuum magnetron sputtering voltage is 410.0–460.0V, preferably 430.0–450.0V; the current is 20.0–40.0A, preferably 22.0–35.0A; and the power is 5.0–20.0kW, preferably 8.0–13.0kW. In the second plating process, the vacuum magnetron sputtering voltage is 41.0–460.0V, preferably 430.0–450.0V; the current is 20.0–40.0A, preferably 22.0–32.0A; and the power is 5.0–20.0kW, preferably 8.0–13.0kW.

[0082] In particular, the atmosphere in the magnetron sputtering chamber during the first and second coating processes of the eighth zinc oxide aluminum alloy film is argon and oxygen.

[0083] In particular, the volume ratio of argon to oxygen in the atmosphere is 16:1.

[0084] In particular, the argon flow rate is 800 sc / cm and the oxygen flow rate is 50 sc / cm.

[0085] In particular, during the deposition of the ninth nickel-chromium alloy film layer in step 3), the magnetron sputtering voltage is 260.0–320.0V, preferably 280.0–300.0V; the current is 5.0–15.0A, preferably 7.0–10.0A; and the power is 1.5–4.0kW, preferably 2.0–3.0kW.

[0086] In particular, the atmosphere in the magnetron sputtering chamber during the deposition of the ninth nickel-chromium alloy film is argon.

[0087] In particular, the flow rate of the argon gas is 700 sc / cm.

[0088] In particular, during the deposition of the tenth silver film layer in step 3), the magnetron sputtering voltage is 410.0–480.0V, preferably 440.0–460.0V; the current is 15.0–40.0A, preferably 20.0–30.0A; and the power is 5.0–15.0kW, preferably 8.0–11.0kW.

[0089] In particular, the atmosphere in the sputtering chamber during the coating process of the tenth silver film layer is argon.

[0090] In particular, the flow rate of the argon gas is 500 sc / cm.

[0091] In particular, during the plating process of the eleventh nickel-chromium alloy layer in step 3), the magnetron sputtering voltage is 350.0–400.0V, preferably 370.0–390.0V; the current is 3.0–8.0A, preferably 4.0–5.0A; and the power is 0.5–5.0Kw, preferably 1.2–2.5Kw.

[0092] In particular, the atmosphere in the sputtering chamber during the plating process of the eleventh nickel-chromium alloy layer is argon.

[0093] In particular, the argon flow rate is 600 sc / cm.

[0094] In particular, the twelfth zinc oxide aluminum alloy film layer described in step 3) is coated twice.

[0095] In the first plating process, the vacuum magnetron sputtering voltage is 430.0–490.0V, preferably 460.0–475.0V; the current is 28.0–50.0A, preferably 32.0–40.0A; and the power is 10.0–25.0kW, preferably 13.0–18.0kW. In the second plating process, the vacuum magnetron sputtering voltage is 450.0–500.0V, preferably 465.0–480.0V; the current is 30.0–50.0A, preferably 33.0–40.0A; and the power is 10.0–30.0kW, preferably 13.0–20.0kW.

[0096] In particular, the atmosphere in the sputtering chamber during the first and second coating processes of the twelfth zinc oxide aluminum alloy film was argon and oxygen.

[0097] In particular, the volume ratio of argon to oxygen in the atmosphere is 16:1.

[0098] In particular, the argon flow rate is 800 sc / cm and the oxygen flow rate is 50 sc / cm.

[0099] In particular, the thirteenth silicon-aluminum alloy film layer described in step 3) is coated in four stages.

[0100] In the first coating process, the vacuum magnetron sputtering voltage is 440.0–490.0V, preferably 450.0–470.0V; the current is 110.0–150.0A, preferably 125.0–140.0A; and the power is 40.0–70.0kW, preferably 50.0–60.0kW.

[0101] During the second plating process, the vacuum magnetron sputtering voltage is 380.0–430.0V, preferably 390.0–410.0V; the current is 50.0–90.0A, preferably 60.0–75.0A; and the power is 15.0–40.0kW, preferably 20.0–30.0kW.

[0102] During the third plating process, the vacuum magnetron sputtering voltage is 450.0–490.0V, preferably 465.0–485.0V; the current is 110.0–140.0A, preferably 120.0–130.0A; and the power is 40.0–70.0kW, preferably 50.0–60.0kW.

[0103] During the fourth plating process, the vacuum magnetron sputtering voltage is 390.0–450.0V, preferably 405.0–425.0V; the current is 50.0–80.0A, preferably 60.0–70.0A; and the power is 15.0–35.0kW, preferably 22.0–28.0kW.

[0104] In particular, the atmosphere used in the first, second, third, and fourth coating processes of the thirteenth silicon-aluminum alloy film layer was argon and nitrogen.

[0105] In particular, during the first coating process of the thirteenth silicon-aluminum alloy film, the volume ratio of argon to nitrogen in the atmosphere was 2.4:3.

[0106] In particular, the flow rate of argon is 480 sc / cm; the flow rate of nitrogen is 600 sc / cm.

[0107] In particular, the volume ratio of argon to nitrogen gas during the second and fourth coating processes of the thirteenth silicon-aluminum alloy film is 1:1.

[0108] In particular, the flow rate of the argon gas is 500 sc / cm; the flow rate of the nitrogen gas is 500 sc / cm.

[0109] In particular, during the third coating process of the thirteenth silicon-aluminum alloy film, the volume ratio of argon to nitrogen in the atmosphere was 4.7:6.

[0110] In particular, the flow rate of argon is 470 sc / cm; the flow rate of nitrogen is 600 sc / cm.

[0111] In particular, the zinc oxide tin alloy film layer described in step 3) is plated in two stages.

[0112] In the first plating process, the vacuum magnetron sputtering voltage is 300.0–360.0V, preferably 320.0–350.0V; the current is 40.0–70.0A, preferably 45.0–55.0A; and the power is 10.0–25.0kW, preferably 13.0–18.0kW. In the second plating process, the vacuum magnetron sputtering voltage is 310.0–360.0V, preferably 325.0–340.0V; the current is 35.0–60.0A, preferably 48.0–55.0A; and the power is 10.0–30.0kW, preferably 13.0–25.0kW.

[0113] In particular, the atmosphere in the sputtering chamber during the first and second coating processes of the fourteenth zinc oxide tin alloy film is argon.

[0114] In particular, the argon flow rate is 800 sc / cm.

[0115] In particular, the fifteenth silicon-aluminum alloy film layer described in step 3) is coated twice, wherein:

[0116] During the first coating process, the vacuum magnetron sputtering voltage is 450.0–510.0V, preferably 480.0–490.0V; the current is 130.0–180.0A, preferably 150.0–160.0A; and the power is 60.0–80.0kW, preferably 62.0–70.0kW.

[0117] During the second plating process, the vacuum magnetron sputtering voltage is 500.0–530.0V, preferably 510.0–520.0V; the current is 130.0–170.0A, preferably 140.0–155.0A; and the power is 50.0–80.0kW, preferably 60.0–70.0kW.

[0118] In particular, the atmosphere in the magnetron sputtering chamber during the first and second coating processes of the fifteenth silicon-aluminum alloy film layer was argon and nitrogen.

[0119] In particular, the volume ratio of argon to nitrogen in the atmosphere is 5:5.8.

[0120] In particular, the flow rate of argon is 500 sc / cm; the flow rate of nitrogen is 580 sc / cm.

[0121] In particular, during the deposition of the sixteenth zinc oxide aluminum alloy film layer in step 3), the magnetron sputtering voltage is 480.0–530.0V, preferably 490.0–510.0V; the current is 40.0–60.0A, preferably 42.0–50.0A; and the power is 15.0–30.0Kw, preferably 18.0–25.0Kw.

[0122] In particular, the atmosphere in the sputtering chamber during the coating process of the sixteenth zinc oxide aluminum alloy film is argon and oxygen.

[0123] In particular, the volume ratio of argon to oxygen in the atmosphere is 16:1.

[0124] In particular, the argon flow rate is 800 sc / cm and the oxygen flow rate is 50 sc / cm.

[0125] In particular, during the plating process of the seventeenth nickel-chromium alloy layer described in step 3), the magnetron sputtering voltage is 320.0–380.0V, preferably 340.0–360.0V; the current is 2.0–8.0A, preferably 4.0–6.0A; and the power is 0.5–4.0Kw, preferably 1.2–2.5Kw.

[0126] In particular, the atmosphere in the vacuum sputtering chamber during the plating process of the seventeenth nickel-chromium alloy layer is argon.

[0127] In particular, the argon flow rate is 750 sc / cm.

[0128] In particular, during the deposition process of the eighteenth silver film layer in step 3), the magnetron sputtering voltage is 390.0–450.0V, preferably 410.0–430.0V; the current is 15.0–40.0A, preferably 25.0–30.0A; and the power is 8.0–20.0kW, preferably 10.0–13.0kW.

[0129] In particular, the atmosphere in the vacuum sputtering chamber during the coating process of the eighteenth silver film layer is argon.

[0130] In particular, the flow rate of the argon gas is 600 sc / cm.

[0131] In particular, during the plating process of the nineteenth nickel-chromium alloy layer described in step 3), the magnetron sputtering voltage is 360.0–400.0V, preferably 370.0–380.0V; the current is 3.0–10.0A, preferably 5.0–7.0A; and the power is 1.0–5.0Kw, preferably 1.5–3.0Kw.

[0132] In particular, the atmosphere in the sputtering chamber during the plating process of the nineteenth nickel-chromium alloy layer is argon.

[0133] In particular, the argon flow rate is 750 sc / cm.

[0134] In particular, during the deposition of the second zinc oxide aluminum alloy film in step 3), the magnetron sputtering voltage is 460.0–510.0V, preferably 470.0–490.0V; the current is 40.0–60.0A, preferably 45.0–50.0A; and the power is 15.0–35.0Kw, preferably 18.0–25.0Kw.

[0135] In particular, the atmosphere in the sputtering chamber during the coating process of the 20th zinc oxide aluminum alloy film is a mixture of argon and oxygen.

[0136] In particular, the volume ratio of argon to oxygen in the atmosphere is 15.3:1.

[0137] In particular, the argon flow rate is 765 sc / cm and the oxygen flow rate is 50 sc / cm.

[0138] In particular, in step 3), the 21st silicon-aluminum alloy film layer is coated in four stages.

[0139] In the first coating process, the vacuum magnetron sputtering voltage is 450.0–500.0V, preferably 460.0–480.0V; the current is 90.0–130.0A, preferably 105.0–115.0A; and the power is 30.0–60.0kW, preferably 40.0–50.0kW.

[0140] During the second plating process, the vacuum magnetron sputtering voltage is 420.0–480.0V, preferably 440.0–460.0V; the current is 90.0–130.0A, preferably 105.0–118.0A; and the power is 30.0–60.0kW, preferably 40.0–50.0kW.

[0141] During the third plating process, the vacuum magnetron sputtering voltage is 420.0–480.0V, preferably 445.0–465.0V; the current is 90.0–130.0A, preferably 100.0–115.0A; and the power is 30.0–65.0kW, preferably 40.0–50.0kW.

[0142] During the fourth plating process, the vacuum magnetron sputtering voltage is 420.0–480.0V, preferably 445.0–460.0V; the current is 100.0–130.0A, preferably 110.0–120.0A; and the power is 30.0–60.0kW, preferably 40.0–50.0kW.

[0143] In particular, the atmosphere used in the first, second, third, and fourth coating processes of the twenty-first silicon-aluminum alloy film layer was argon and nitrogen.

[0144] In particular, the volume ratio of argon to nitrogen in the atmosphere during the first, second, third, and fourth coating processes of the twenty-first silicon-aluminum alloy film layer is 2:3.

[0145] In particular, the flow rate of argon is 400 sc / cm; the flow rate of nitrogen is 600 sc / cm.

[0146] In particular, in step 3), the second zirconium oxide film layer is coated twice.

[0147] In the first plating process, the vacuum magnetron sputtering voltage is 400.0–450.0V, preferably 420.0–430.0V; the current is 30.0–50.0A, preferably 35.0–45.0A; and the power is 10.0–30.0kW, preferably 12.0–15.0kW. In the second plating process, the vacuum magnetron sputtering voltage is 400.0–460.0V, preferably 420.0–440.0V; the current is 30.0–60.0A, preferably 35.0–45.0A; and the power is 10.0–30.0kW, preferably 12.0–15.0kW.

[0148] In particular, the atmosphere in the magnetron sputtering chamber during the first and second coating processes of the 22nd zirconium oxide film was argon and oxygen.

[0149] In particular, the volume ratio of argon to oxygen in the atmosphere is 16:1.

[0150] In particular, the flow rate of argon is 800 sc / cm; the flow rate of nitrogen is 50 sc / cm.

[0151] In particular, it also includes step 3A) buffering treatment, in which the coated glass is transported from the vacuum magnetron sputtering chamber to the pressure buffer chamber, the pressure in the buffer chamber is gradually increased until it reaches atmospheric pressure, and the temperature in the buffer chamber is reduced to 20-35°C.

[0152] Before tempering, the coated glass is buffered by transporting it from the vacuum magnetron sputtering chamber to the pressure buffer chamber, gradually increasing the pressure in the buffer chamber until it reaches atmospheric pressure, and then lowering the temperature in the buffer chamber to room temperature (usually 20-35°C) before the tempering process is carried out.

[0153] In step 4), the heating time during the tempering process is controlled to be 400-500 seconds; the temperature of the tempering furnace is 630-710°C; and the temperature of the upper part of the glass in the furnace is 650-695°C and the lower part is 630-680°C.

[0154] In particular, during the tempering process described in step 4), the quenching air pressure during the rapid cooling and quenching of the glass is controlled to be greater than 2500 Pa; and the cooling air pressure after quenching is controlled to be 1000-2000 Pa.

[0155] In particular, during the tempering process described in step 4), the heating time is controlled to be 400-500 s, preferably 400-460 s;

[0156] Before the coated glass enters the tempering furnace for tempering, it needs to be preheated in a preheating furnace. The temperature in the preheating furnace is 430-500℃, preferably 450-475℃; the convection ratio of the hot air in the upper and lower parts of the preheating furnace is 80-100%; the hot air temperature in the preheating furnace is 430-500℃, preferably 450-475℃; and the glass preheating time is 200-250s, preferably 200-230s.

[0157] The temperature of the heating furnace is 630-710℃, preferably 630-680℃; the temperature of the upper part of the glass in the heating furnace is 650-695℃, and the temperature of the lower part is 630-680℃; the heating time in the heating furnace is 200-250s, preferably 200-230s.

[0158] After heat treatment, the glass is subjected to rapid cooling, i.e., quenching. The rapid cooling air pressure is greater than 2500 Pa, preferably 2500-3800 Pa; the quenching speed is 350-500 mm / s; the cooling air pressure is 1000-2000 Pa, preferably 1200-1800 Pa; the air grid is corrected to 40-50 mm; the height from the upper air nozzle to the upper surface of the glass is 25-40 mm, preferably 30 mm; and the height from the lower air nozzle to the lower surface of the glass is 30-45 mm, preferably 35 mm.

[0159] In particular, the tempering process can be performed at a different location or at the same location.

[0160] After the glass exits the tempering furnace, a blower is used to rapidly cool the glass, creating stress, which is a quenching process. The quenching air pressure during this process is greater than 2500 Pa, preferably 2500–3800 Pa. After quenching, conventional cooling air is used to lower the glass temperature to room temperature, with a cooling air pressure of 1000–2000 Pa, preferably 1200–1800 Pa.

[0161] Another aspect of the present invention provides a low-emissivity coated tempered glass prepared according to any of the above methods, wherein the transmittance color value of the monolithic low-emissivity coated tempered glass is 80 ≤ L. * ≤90, -10≤a * ≤-5, -5≤b * ≤3; Reflected color value 25≤L * ≤40, -5≤a * ≤3, -10≤b * ≤0.

[0162] In particular, the transmittance color value of the monolithic low-emissivity coated tempered glass is 85≤L. * ≤87, -8≤a *≤-6, -1≤b * ≤1; Reflected color value 30≤L * ≤33, -3≤a * ≤1, -7≤b * ≤-5.

[0163] 1. The low-emissivity coated tempered glass prepared by this invention for near-zero energy buildings is light green (French green). It is produced by sequentially depositing 22 layers of composite metal film onto the glass surface under vacuum conditions via magnetron sputtering, followed by tempering. The composite metal film on the surface of the prepared tempered coated glass appears light green (French green) under outdoor sunlight. Using inexpensive silicon-aluminum alloy, zinc-aluminum alloy, nickel-chromium alloy, silver, zinc-tin alloy, and zirconium oxide as target materials and ordinary colorless transparent float glass substrates, the production cost of the prepared triple-silver tempered low-emissivity coated glass is low, which is conducive to the widespread use of triple-silver tempered low-emissivity glass and beneficial to energy conservation and emission reduction in buildings.

[0164] The tempered low-emissivity coated glass prepared by the method of this invention is a functional triple-silver tempered low-emissivity coated glass, which has the following advantages and benefits compared with the prior art:

[0165] 1. The low-emissivity coated tempered glass prepared by this invention for near-zero energy buildings is light green (French green). It is produced by sequentially depositing 22 layers of composite metal film onto the glass surface under vacuum conditions via magnetron sputtering, followed by tempering. The composite metal film on the surface of the prepared tempered coated glass appears light green (French green) under outdoor sunlight. Using inexpensive silicon-aluminum alloy, zinc-aluminum alloy, nickel-chromium alloy, silver, zinc-tin alloy, and zirconium oxide as target materials and ordinary colorless transparent float glass substrates, the production cost of the prepared triple-silver tempered low-emissivity coated glass is low, which is conducive to the widespread use of triple-silver tempered low-emissivity glass and beneficial to energy conservation and emission reduction in buildings.

[0166] The metallic silver film layer of the coated glass prepared by this invention is a functional layer, whose main function is to reduce emissivity, adjust color and transmittance. When the thickness of each silver layer is different, the color of the glass will change. Each film layer of the coated glass of this invention absorbs and reflects heat, and the heat absorption and reflection of each film layer are different. They work together to affect the color, optical and thermal properties and glass quality of the coated glass product. After reflection and interference from the three functional silver film layers, the coated glass of this invention is light green (French green).

[0167] The color of the prepared coated glass does not change much when viewed from the front and the side. However, due to the interference of the multiple silver film layers in the coated glass, the colors of the front and sides are affected, especially on the sides where the interference is greatest, resulting in a noticeable difference between the side and front colors. This invention uses a zinc oxide tin film layer to absorb the reflection of the third silver layer, minimizing the interference of the third silver layer on the color and thus satisfying the coordination between product performance and color. Furthermore, this invention uses other film layers to adjust the color of the coated glass, avoiding the reddish or bluish tint caused by the reflection and interference of the silver film layers.

[0168] In the coated tempered glass prepared by the method of the present invention, a zinc oxide tin film is deposited between the second and third silver film layers, which plays a role in absorption, blocking and bonding; it absorbs the reflection of the silver film layer and reduces the interference of the functional film layer silver film layer on the glass color.

[0169] 2. The tempered low-emissivity coated glass prepared by this invention has a light green (French green) reflective color, which is currently favored by designers and owners in the architecture and other industries. Its main visual physical parameter is a transmittance color value of 80 ≤ L. * ≤90, -10≤a * ≤-5, -5≤b * ≤3; Reflected color value 25≤L * ≤40, -5≤a * ≤3, -10≤b * ≤0. Outdoors, it appears as a light green (French green), which is vibrant, bright, and beautiful, and can be widely used in various buildings, providing excellent decorative effects.

[0170] 3. The high-quality, low-emissivity coated tempered glass prepared by this invention conforms to the optical performance technical parameters of GB / T18915.1-2013.

[0171] The standard "Coated Glass Part 2: Low Emissivity Coated Glass" significantly improves visible light transmittance, with a maximum color index variation of less than 1.2%; and has high color uniformity, less than 2.0 CIELAB.

[0172] 4. The low-emissivity coated tempered glass prepared by this invention can be made into conventional insulated glass (taking a 6-triple silver tempered low-emissivity coated glass + 12-Ar + 6-glass (clear glass) structure as an example), which is suitable for creating a bright and comfortable indoor and outdoor light environment; the visible light transmittance is greater than 61%, the outdoor visible light reflectance is less than 11.5%; the solar energy transmittance is less than 26%; the total solar energy transmittance is less than 29%; and the outdoor solar energy reflectance is greater than 40%, with obvious energy-saving effect.

[0173] The heat transfer coefficient of the low-emissivity coated tempered glass prepared by this invention is less than 1.336 W / m in winter.2 K; below 1.228 W / m² in summer 2 • K; Shading coefficient (Sc) less than 0.33; Relative heat gain less than 232 W / m 2 It has good thermal performance, effectively blocks sunlight heat from radiating into the room, has good energy-saving performance, reduces cooling energy consumption, and has better light control and energy-saving effect.

[0174] 5. The triple-glazed double-cavity insulated glass (with a structure of 6-triple silver tempered low-emissivity coated glass + 12-Ar + 6-glass (clear glass) + 12-Ar + 6-glass (clear glass)) made using the low-emissivity coated tempered glass prepared according to this invention has a visible light transmittance greater than 56%; outdoor visible light reflectance less than 15%; solar energy transmittance less than 23%; and outdoor solar energy reflectance greater than 41%. It is suitable for creating a bright and comfortable indoor and outdoor lighting environment. Meanwhile, its heat transfer coefficient is less than 1.017 W / m² in winter. 2 K, below 1.009 W / m in summer 2 • K; Shading coefficient (Sc) less than 0.3; Total solar transmittance less than 26%; Relative heat gain less than 195 W / m 2 It has good thermal performance, effectively blocks sunlight heat from radiating into the room, has good energy-saving performance, reduces cooling energy consumption, and has better light control and energy-saving effect.

[0175] The low-emissivity coated tempered glass of the present invention for near-zero energy buildings can meet the standards and requirements for glass performance in GB 55015-2021 "General Specification for Energy Conservation and Renewable Energy Utilization in Buildings".

[0176] 6. The method of this invention can be used to prepare high-quality low-emissivity coated tempered glass. During the preparation process, the thickness of each coating layer can be changed to obtain triple silver low-emissivity coated glass with different optical and thermal properties. Different types of insulated glass can also be made to meet different market demands.

[0177] 7. The method for preparing low-emissivity coated tempered glass according to the present invention achieves color change on colorless transparent white glass, which is low-cost, convenient and reliable.

[0178] In the process of preparing coated tempered glass using the method of this invention, the first silicon-aluminum layer, laminated on the tempered glass substrate, ensures tight adhesion to the original glass sheet; the second zinc-aluminum oxide film layer acts as a base layer, adjusting transmittance; the third nickel-chromium film layer adjusts brightness and protects the silver film layer; the three silver film layers work together to achieve the desired light green outdoor color and a neutral indoor color, while also harmonizing the lateral colors of the three silver layers. In this invention, the thicknesses of the first and third silver layers are basically the same, and the thickness of the second silver layer is less than that of the first silver layer. The thickness deviation between the first and third silver layers is controlled within 0.5 nm, and the difference in thickness between the second silver layer and the first and third silver layers is between 1.5 and 2.6 nm. The front color of the glass is light green (French green), and the color deviation between the front and side reflections is within ±1 Lab*. If the allowable thickness deviation of the first and third silver layers exceeds 1 nm, the color deviation between the front and side reflections exceeds the national standard range (greater than 2.5 Lab). * The zinc oxide tin oxide of this invention absorbs the reflection of the third layer of silver, reducing interference; the silicon aluminum oxide and zirconium oxide on the top layer of the film are the top protective layer, mainly protecting each film layer from scratches during processing. Attached Figure Description

[0179] Figure 1 This is a cross-sectional schematic diagram of the low-emissivity coated tempered glass prepared by the method of the present invention.

[0180] Explanation of reference numerals in the attached figures:

[0181] 1. Tempered glass substrate; 2. First silicon-aluminum alloy film layer; 3. Second zinc oxide-aluminum alloy film layer; 4. Third nickel-chromium alloy film layer; 5. Fourth silver film layer; 6. Fifth nickel-chromium alloy film layer; 7. Sixth zinc oxide-aluminum alloy film layer; 8. Seventh silicon-aluminum alloy film layer; 9. Eighth zinc oxide-aluminum alloy film layer; 10. Ninth nickel-chromium alloy film layer; 11. Tenth silver film layer; 12. Eleventh nickel-chromium alloy film layer; 13. Twelfth zinc oxide-aluminum alloy film layer; 14. Thirteenth silicon-aluminum alloy film layer; 15. Fourteenth zinc oxide-tin alloy film; 16. Fifteenth silicon-aluminum alloy film; 17. Sixteenth zinc oxide-aluminum alloy film; 18. Seventeenth nickel-chromium alloy film; 19. Eighteenth silver film; 20. Nineteenth nickel-chromium alloy film; 21. Twentieth zinc oxide-aluminum alloy film; 22. Twenty-first silicon-aluminum alloy film; 23. Twenty-second zirconium oxide film. Detailed Implementation

[0182] The present invention will be further illustrated below by way of embodiments, and the advantages and features of the present invention will become clearer as the description proceeds. However, these embodiments are merely exemplary and do not constitute any limitation on the scope of the present invention. Those skilled in the art should understand that modifications or substitutions can be made to the details and form of the technical solutions of the present invention without departing from the spirit and scope of the present invention, but all such modifications and substitutions fall within the protection scope of the present invention.

[0183] like Figure 1The high-quality, low-emissivity coated tempered glass of the present invention for near-zero energy buildings comprises, in sequence, a tempered glass substrate 1, a first silicon-aluminum alloy film layer 2; a second zinc oxide-aluminum alloy film layer 3; a third nickel-chromium alloy film layer 4; a fourth silver film layer 5; a fifth nickel-chromium alloy film layer 6; a sixth zinc oxide-aluminum alloy film layer 7; a seventh silicon-aluminum alloy film layer 8; an eighth zinc oxide-aluminum alloy film layer 9; a ninth nickel-chromium alloy film layer 10; a tenth silver film layer 11; an eleventh nickel-chromium alloy film layer 12; a twelfth zinc oxide-aluminum alloy film layer 13; a thirteenth silicon-aluminum alloy film layer 14; a fourteenth zinc oxide-tin alloy film 15; a fifteenth silicon-aluminum alloy film 16; a sixteenth zinc oxide-aluminum alloy film 17; a seventeenth nickel-chromium alloy film 18; an eighteenth silver film 19; and a nineteenth nickel-chromium alloy film 20. The film comprises: a 20th zinc oxide aluminum alloy film; a 21st silicon aluminum alloy film; and a 22nd zirconium oxide film; wherein: the thickness of the first silicon aluminum alloy film layer is 50.0–80.0 nm, preferably 55.0–65.0 nm, more preferably 60–61 nm; the thickness of the second zinc oxide aluminum alloy film layer is 10.0–30.0 nm, preferably 18.0–22.0 nm, more preferably 20–20.2 nm; the thickness of the third nickel-chromium alloy layer is 0.5–3.0 nm, preferably 1.0–1.8 nm, more preferably 1.4–1.5 nm; and the thickness of the fourth silver film layer is 8.0–15.0 nm, preferably 10.0–13.0 nm, more preferably 10.0–13.0 nm, more preferably 10.0–15 ... The thickness of the fifth nickel-chromium alloy film is preferably 11.8-12 nm; the thickness of the sixth zinc oxide aluminum alloy film is 1.0-3.0 nm, preferably 1.2-1.8 nm, and more preferably 1.5 nm; the thickness of the seventh silicon aluminum alloy film is 310.0-400.0 nm, preferably 315.0-330.0 nm, and more preferably 323.5-325.5 nm; the thickness of the eighth zinc oxide aluminum alloy film is 15.0-35.0 nm, preferably 15.0-25.0 nm, and more preferably 20 nm; the thickness of the ninth nickel-chromium alloy film is... The thickness of the layers is 1.0–5.0 nm, preferably 2.0–3.0 nm, and more preferably 2.5–2.6 nm; the thickness of the tenth silver film layer is 5.0–15.0 nm, preferably 9–12.0 nm, and more preferably 9.6–9.8 nm; the thickness of the eleventh nickel-chromium alloy film layer is 1.0–5.0 nm, preferably 1.2–2.2 nm, and more preferably 1.7–1.8 nm; the thickness of the twelfth zinc oxide-aluminum alloy film layer is 15.0–35.0 nm, preferably 25.0–35.0 nm, and more preferably 30 nm; the thickness of the thirteenth silicon-aluminum alloy film layer is 130.0–200.0 nm, preferably 145.0–160 nm.The thickness of the fourteenth zinc oxide tin alloy film layer is 15.0–40.0 nm, preferably 25.0–35.0 nm, and more preferably 30.4–32 nm; the thickness of the fifteenth silicon aluminum alloy film layer is 100.0–200.0 nm, preferably 120.0–140.0 nm, and more preferably 130 nm; the thickness of the sixteenth zinc oxide aluminum alloy film layer is 10.0–40.0 nm, preferably 18.0–25.0 nm, and more preferably 20–20.2 nm; the thickness of the seventeenth nickel chromium alloy film layer is 0.5–5.0 nm, preferably 1.2–2.2 nm, and more preferably 1.6–1.7 nm; the thickness of the eighteenth silver film layer is 8.0–15.0 nm, preferably 154–156 nm. The thickness of the nineteenth nickel-chromium alloy film is 10.0–13.0 nm, more preferably 11.8 nm; the thickness of the twentieth zinc oxide-aluminum alloy film is 10.0–30.0 nm, more preferably 15.0–25.0 nm, more preferably 20–20.2 nm; the thickness of the twentieth silicon-aluminum alloy film is 170.0–200.0 nm, more preferably 180.0–200.0 nm, more preferably 180.0–190.0 nm, more preferably 182–186 nm; the thickness of the twelfth zirconium oxide alloy film is 10.0–50.0 nm, more preferably 22.0–30.0 nm, more preferably 26–26.4 nm.

[0184] Example 1

[0185] 1. Target sintering

[0186] In target chambers 1-39 (magnetron sputtering chambers) of a vacuum magnetron sputtering coating machine, pre-pressed target materials are sintered onto their respective target positions, wherein:

[0187] Silicon-aluminum alloy targets were sintered on target sites in magnetron sputtering chambers 1-2, 8-13, 21-24, 27-28, and 34-37. The sintering purity of the silicon-aluminum alloy targets was ≥99.5%, and the density was ≥2.1 g / cm³. 3 The melting point is 580℃, the Al content is 8-12±2wt%, and the remainder is Si; the sintering time of the silicon-aluminum alloy is 90min.

[0188] Zinc oxide aluminum targets were sintered on the target sites in magnetron sputtering chambers 3, 7, 14-15, 19-20, 29, and 33. The sintering purity of the zinc oxide aluminum targets was ≥99.90%, and the theoretical density was 5.56 g / cm³. 3((ZnO)-2wt%(Al2O3)), target density ≥5.50g / cm³ 3 The relative density is ≥99%, and it is composed of 2wt% Al2O3 and 98wt% ZnO; the sintering time of the zinc oxide aluminum alloy is 60min.

[0189] Nickel-chromium alloy targets were sintered on target sites in magnetron sputtering chambers 4, 6, 16, 18, 30, and 32. The sintering purity of the nickel-chromium alloy targets was ≥99.7%, the theoretical density was 8.49 g / cm³ (Ni-20%Cr), and the target density was ≥8.5 g / cm³. 3 The alloy has a relative density of ≥98%, a melting point of 1420℃, a Cr content of 20±1wt%, and the remainder being Ni; the sintering time for the nickel-chromium alloy is 90min.

[0190] Silver targets were sintered on target sites in magnetron sputtering chambers 5, 17, and 31. The sintering purity of the silver targets was ≥99.99%, and the theoretical density was ≥10.49 g / cm³. 3 The target material density is ≥10.28 g / cm³. 3 Relative density ≥98%, melting point 960℃; sintering time for silver is 60min;

[0191] Zinc oxide tin targets were sintered on the target sites in magnetron sputtering chambers 25-26. The sintering purity of the zinc oxide tin targets was ≥99.9%, with a Sn content of (50±2)wt%, the remainder being Sn, and a density of ≥7.1 g / cm³. 3 A zinc oxide tin alloy with a melting point of 360℃; the sintering time of the zinc oxide tin alloy is 90 min;

[0192] Zirconia targets were sintered on the target sites in magnetron sputtering chambers 38-39. The sintering purity of the zirconia targets was ≥99.9%, and the density was ≥5.35 g / cm³. 3 The melting point is 2300℃; the sintering time of zirconia is 90min.

[0193] The silicon-aluminum alloy used in this invention meets the composition requirements for silicon-aluminum targets in the national standard JC / T2068-2011; the nickel-chromium alloy meets the composition requirements for nickel-chromium targets in the national standard JC / T2068-2011; the zinc-aluminum oxide alloy meets the composition requirements for zinc-aluminum oxide targets in the national standard JC / T2068-2011; the silver meets the composition requirements for silver targets in the national industry standard JC / T2068-2011; the zinc-tin oxide alloy meets the composition requirements for zinc-tin oxide alloy targets in the national industry standard JC / T2068-2011; and the zirconium oxide meets the composition requirements for zirconium oxide targets in the national industry standard JC / T2068-2011.

[0194] 2. Cleaning the glass

[0195] 2A) Place a 6.0mm thick float glass sheet in a glass coating and cleaning machine (manufactured by GTA GmbH, Germany, model: GTA01-M), using a temperature of 37℃ and a mineral content ≤5μ / cm / m 2 The water was cleaned with deionized water at a speed of 5 m / min.

[0196] In addition to using float glass sheets with a thickness of 6mm, glass sheets of other thicknesses are also suitable for this invention. Using deionized water to clean the glass not only removes oil and other impurities from the glass surface but also avoids the problem of introducing other metal ions that occurs when using tap water.

[0197] 2B) The cleaned float glass is dried at 20-50°C at a drying rate of 5 m / min to remove water droplets from the glass surface and obtain a dry glass sheet.

[0198] 3. Dehumidification and degassing treatment

[0199] 3A) The dry glass sheet is conveyed to the first vacuum chamber of the vacuum magnetron sputtering coating machine via a conveyor roller. The dry glass sheet undergoes a first dehumidification and degassing treatment, which lasts for 30 seconds at a speed of 5 m / min. The temperature of this first dehumidification and degassing treatment is -140℃, and the absolute pressure is 5.0 × 10⁻⁶. －2 Below mbar;

[0200] 3B) The dried glass sheet, after the first dehumidification and degassing treatment, is transported to the second vacuum chamber for a second dehumidification and degassing treatment, which lasts for 30 seconds; the transmission speed is 5 m / min; the temperature for the second dehumidification and degassing treatment is 20–60℃, and the absolute pressure is 3.5 × 10⁻⁶. -5 Glass to be coated is produced at a bar below mbar;

[0201] In this invention, a glass transmission speed of 5 m / min is used as an example for illustration. Glass transmission speeds of 2 to 10 m / min are also applicable to this invention.

[0202] 4. Coating treatment

[0203] 4A) Turn on the power to the sputtering chamber of the vacuum magnetron sputtering coating machine to heat it up, so that the temperature inside the sputtering chamber (including the first to 39th target chambers) reaches 20-60℃, and the absolute pressure decreases to 2.0-4.0×10⁻⁶. -5 Below mbar (absolute pressure in this embodiment of the invention is 3.0 × 10⁻⁶ mbar) -5 (The following is an example of mbar), the glass to be coated is subjected to magnetron sputtering coating treatment sequentially from the first target chamber to the 39th target chamber;

[0204] 4B) The glass to be coated, after undergoing two dehumidification and degassing processes, is sequentially fed into target chambers 5 to 39 of the coating sputtering chamber at a conveying speed of 5 m / min for coating treatment, resulting in coated glass. The process parameters are shown in Table 1, where:

[0205] The glass substrate to be coated undergoes a first coating process in the first target chamber, namely, the first coating process of the first silicon-aluminum alloy film. The magnetron sputtering process conditions for the first coating are shown in Table 1. Metal atoms of the silicon-aluminum alloy target material sintered on the target site in the first target chamber are sputtered from the surface of the target material and deposited on the surface of the float glass substrate. The thickness of the alloy film layer of the first coating is controlled to be 30.0 nm to obtain the first coated glass.

[0206] The first coated glass undergoes a second coating process in the second target chamber, namely, a second coating process of the first silicon-aluminum alloy film. The magnetron sputtering process conditions for the second coating are shown in Table 1. Metal atoms of the silicon-aluminum alloy target material sintered on the target site in the second target chamber are sputtered from the surface of the target material and deposited on the surface of the first coated glass. The thickness of the alloy film layer in the second coating is controlled to be 30.0 nm, thus obtaining the second coated glass. At this point, the coating of the first silicon-aluminum alloy film layer is completed, and the thickness of the first silicon-aluminum alloy film layer is 60 nm.

[0207] The second coated glass undergoes a third coating process in the third target chamber, namely, the deposition of a second zinc oxide aluminum alloy film. The magnetron sputtering process conditions for the third deposition are shown in Table 1. Metal atoms from the zinc oxide aluminum alloy target material sintered on the target site in the third target chamber are sputtered from the surface of the target material and deposited on the surface of the second coated glass. The thickness of the alloy film layer in the third deposition is controlled to be 20.0 nm, thus obtaining the third coated glass. At this point, the deposition of the second zinc oxide aluminum alloy film layer is completed, and the thickness of the second zinc oxide aluminum alloy film layer is 20 nm.

[0208] The third coated glass undergoes a fourth coating process in the fourth target chamber, namely, the deposition of a third nickel-chromium alloy film. The magnetron sputtering process conditions for the fourth deposition are shown in Table 1. Metal atoms from the nickel-chromium alloy target material sintered on the target site in the fourth target chamber are sputtered from the surface of the target material and deposited on the surface of the third coated glass. The thickness of the alloy film layer in the fourth deposition is controlled to be 1.40 nm, thus obtaining the fourth coated glass. At this point, the deposition of the third nickel-chromium alloy film layer is completed, and the thickness of the third nickel-chromium alloy film layer is 1.4 nm.

[0209] The fourth coated glass undergoes a fifth coating process in the fifth target chamber, namely, the deposition of the fourth silver film. The magnetron sputtering process conditions for the fifth deposition are shown in Table 1. Metal atoms from the silver target material sintered on the target site in the fifth target chamber are sputtered from the surface of the target material and deposited on the surface of the fourth coated glass. The thickness of the metal film layer in the fifth deposition is controlled to be 11.80 nm, thus obtaining the fifth coated glass. At this point, the deposition of the fourth silver film layer is completed, and the thickness of the fourth silver film layer is 11.80 nm.

[0210] The fifth coated glass undergoes a sixth coating process in the sixth target chamber, namely, the deposition of the fifth nickel-chromium alloy film. The magnetron sputtering process conditions for the sixth deposition are shown in Table 1. Metal atoms from the nickel-chromium alloy target material sintered on the target site in the sixth target chamber are sputtered from the surface of the target material and deposited on the surface of the fifth coated glass. The thickness of the alloy film layer in the sixth deposition is controlled to be 1.50 nm, thus obtaining the sixth coated glass. At this point, the deposition of the fifth nickel-chromium alloy film layer is completed, and the thickness of the fifth nickel-chromium alloy film layer is 1.50 nm.

[0211] The sixth coated glass undergoes a seventh coating process in the seventh target chamber, namely, the deposition of a sixth zinc oxide aluminum alloy film. The magnetron sputtering process conditions for the seventh deposition are shown in Table 1. Metal atoms from the zinc oxide aluminum alloy target material sintered on the target site in the seventh target chamber are sputtered from the surface of the target material and deposited on the surface of the sixth coated glass. The thickness of the alloy film layer in the seventh deposition is controlled to be 20.0 nm, thus obtaining the seventh coated glass. At this point, the deposition of the sixth zinc oxide aluminum alloy film layer is completed, and the thickness of the sixth zinc oxide aluminum alloy film layer is 20.0 nm.

[0212] The seventh coated glass undergoes an eighth coating process in the eighth target chamber, which is the first coating process of the seventh silicon-aluminum alloy film. The magnetron sputtering process conditions for the eighth coating are shown in Table 1. Metal atoms of the silicon-aluminum alloy target material sintered on the target site in the eighth target chamber are sputtered from the surface of the target material and deposited on the surface of the seventh coated glass. The thickness of the alloy film layer in the eighth coating is controlled to be 65.0 nm to obtain the eighth coated glass.

[0213] The eighth coated glass undergoes a ninth coating process in the ninth target chamber, which is the second coating process of the seventh silicon-aluminum alloy film. The magnetron sputtering process conditions for the ninth coating are shown in Table 1. Metal atoms of the silicon-aluminum alloy target material sintered on the target site in the ninth target chamber are sputtered from the surface of the target material and deposited on the surface of the eighth coated glass. The thickness of the alloy film layer in the ninth coating is controlled to be 65.0 nm to obtain the ninth coated glass.

[0214] The ninth coated glass undergoes a tenth coating process in the tenth target chamber, which is the third coating process of the seventh silicon-aluminum alloy film. The magnetron sputtering process conditions for the tenth coating are shown in Table 1. Metal atoms of the silicon-aluminum alloy target material sintered on the target site in the tenth target chamber are sputtered from the surface of the target material and deposited on the surface of the ninth coated glass. The thickness of the alloy film layer in the tenth coating is controlled to be 63.5 nm, thus obtaining the tenth coated glass.

[0215] The tenth coated glass undergoes an eleventh coating process in the eleventh target chamber, which is the fourth coating process of the seventh silicon-aluminum alloy film. The magnetron sputtering process conditions for the eleventh coating are shown in Table 1. Metal atoms of the silicon-aluminum alloy target material sintered on the target site in the eleventh target chamber are sputtered from the surface of the target material and deposited on the surface of the tenth coated glass. The thickness of the alloy film layer of the eleventh coating is controlled to be 20.0 nm to obtain the eleventh coated glass.

[0216] The eleventh coated glass undergoes a twelfth coating process in the 12th target chamber, which is the fifth coating process of the seventh silicon-aluminum alloy film. The magnetron sputtering process conditions for the twelfth coating are shown in Table 1. Metal atoms from the silicon-aluminum alloy target material sintered on the target site in the 12th target chamber are sputtered from the surface of the target material and deposited on the surface of the eleventh coated glass. The thickness of the alloy film layer of the twelfth coating is controlled to be 60.0 nm to obtain the twelfth coated glass.

[0217] The twelfth coated glass undergoes its thirteenth coating process in the 13th target chamber, which is the sixth coating process of the seventh silicon-aluminum alloy film. The magnetron sputtering process conditions for the thirteenth coating are shown in Table 1. Metal atoms from the silicon-aluminum alloy target material sintered on the target site in the 13th target chamber are sputtered from the surface of the target material and deposited on the surface of the twelfth coated glass. The thickness of the alloy film layer for the thirteenth coating is controlled to be 50.0 nm, thus obtaining the thirteenth coated glass. At this point, the coating of the seventh silicon-aluminum alloy film layer is completed, and the thickness of the seventh silicon-aluminum alloy film layer is 323.5 nm.

[0218] The thirteenth coated glass undergoes its fourteenth coating process in the 14th target chamber, which is the first coating process of the eighth zinc oxide aluminum alloy film. The magnetron sputtering process conditions for the fourteenth coating are shown in Table 1. Metal atoms from the zinc oxide aluminum alloy target material sintered on the target site in the 14th target chamber are sputtered from the surface of the target material and deposited on the surface of the thirteenth coated glass. The thickness of the alloy film layer in the fourteenth coating is controlled to be 10.0 nm, thus obtaining the fourteenth coated glass.

[0219] The fourteenth coated glass undergoes its fifteenth coating process in the 15th target chamber, which is the second coating process of the eighth zinc oxide aluminum alloy film. The magnetron sputtering process conditions for the fifteenth coating are shown in Table 1. Metal atoms from the zinc oxide aluminum alloy target material sintered on the target site in the 15th target chamber are sputtered from the surface of the target material and deposited on the surface of the fourteenth coated glass. The thickness of the alloy film layer in the fifteenth coating is controlled to be 10.0 nm, thus obtaining the fifteenth coated glass. At this point, the coating of the eighth zinc oxide aluminum alloy film layer is completed, and the thickness of the eighth zinc oxide aluminum alloy film layer is 20 nm.

[0220] The fifteenth coated glass undergoes its sixteenth coating process in the 16th target chamber, namely, the coating of the ninth nickel-chromium alloy film. The magnetron sputtering process conditions for the sixteenth coating are shown in Table 1. Metal atoms from the nickel-chromium alloy target material sintered on the target site in the 16th target chamber are sputtered from the surface of the target material and deposited on the surface of the fifteenth coated glass. The thickness of the alloy film layer in the sixteenth coating is controlled to be 2.5 nm, thus obtaining the sixteenth coated glass. At this point, the coating of the ninth nickel-chromium alloy film layer is completed, and the thickness of the ninth nickel-chromium alloy film layer is 2.5 nm.

[0221] The sixteenth coated glass undergoes its seventeenth coating process in the 17th target chamber, namely, the coating of the tenth silver film. The magnetron sputtering process conditions for the seventeenth coating are shown in Table 1. Metal atoms from the silver target material sintered on the target site in the 17th target chamber are sputtered from the surface of the target material and deposited on the surface of the sixteenth coated glass. The thickness of the metal film layer in the seventeenth coating is controlled to be 9.6 nm, thus obtaining the seventeenth coated glass. At this point, the coating of the tenth silver film layer is completed, and the thickness of the tenth silver film layer is 9.6 nm.

[0222] The seventeenth coated glass undergoes its eighteenth coating process in the 18th target chamber, namely, the deposition of the eleventh nickel-chromium alloy film. The magnetron sputtering process conditions for the eighteenth deposition are shown in Table 1. Metal atoms from the nickel-chromium alloy target material sintered on the target site in the 18th target chamber are sputtered from the surface of the target material and deposited on the surface of the seventeenth coated glass. The thickness of the alloy film layer in the eighteenth deposition is controlled to be 1.7 nm, thus obtaining the eighteenth coated glass. At this point, the deposition of the eleventh nickel-chromium alloy film layer is completed, and the thickness of the eleventh nickel-chromium alloy film layer is 1.7 nm.

[0223] The eighteenth coated glass undergoes its nineteenth coating process in the 19th target chamber, which is the first coating process of the twelfth zinc oxide aluminum alloy film. The magnetron sputtering process conditions for the nineteenth coating are shown in Table 1. Metal atoms from the zinc oxide aluminum alloy target material sintered on the target site in the 19th target chamber are sputtered from the surface of the target material and deposited on the surface of the eighteenth coated glass. The thickness of the alloy film layer in the nineteenth coating is controlled to be 15.0 nm, thus obtaining the nineteenth coated glass.

[0224] The nineteenth coated glass undergoes its twentieth coating process in the 20th target chamber, which is the second coating process of the twelfth zinc oxide aluminum alloy film. The magnetron sputtering process conditions for the twentieth coating are shown in Table 1. Metal atoms from the zinc oxide aluminum alloy target material sintered on the target site in the 20th target chamber are sputtered from the surface of the target material and deposited on the surface of the nineteenth coated glass. The thickness of the alloy film layer in the twentieth coating is controlled to be 15.0 nm, thus obtaining the twentieth coated glass. At this point, the coating of the twelfth zinc oxide aluminum alloy film layer is completed, and the thickness of the twelfth zinc oxide aluminum alloy film layer is 30.0 nm.

[0225] The 20th coated glass undergoes its 21st coating process in the 21st target chamber, which is the first coating process of the 13th silicon-aluminum alloy film. The magnetron sputtering process conditions for the 21st coating are shown in Table 1. Metal atoms from the silicon-aluminum alloy target material sintered on the target site in the 21st target chamber are sputtered from the surface of the target material and deposited on the surface of the 20th coated glass. The thickness of the alloy film layer in the 21st coating is controlled to be 52.0 nm, thus obtaining the 21st coated glass.

[0226] The 21st coated glass undergoes a 22nd coating process in the 22nd target chamber, which is the second coating process of the 13th silicon-aluminum alloy film. The magnetron sputtering process conditions for the 22nd coating are shown in Table 1. Metal atoms from the silicon-aluminum alloy target material sintered on the target site in the 22nd target chamber are sputtered from the surface of the target material and deposited on the surface of the 21st coated glass. The thickness of the alloy film layer in the 22nd coating is controlled to be 25.0 nm, thus obtaining the 22nd coated glass.

[0227] The 22nd coated glass undergoes the 23rd coating process in the 23rd target chamber, which is the third coating process of the 13th silicon-aluminum alloy film. The magnetron sputtering process conditions for the 23rd coating are shown in Table 1. Metal atoms of the silicon-aluminum alloy target material sintered on the target site in the 23rd target chamber are sputtered from the surface of the target material and deposited on the surface of the 22nd coated glass. The thickness of the alloy film layer in the 23rd coating is controlled to be 52.0 nm, thus obtaining the 23rd coated glass.

[0228] The 23rd coated glass undergoes its 24th coating process in the 24th target chamber, which is the fourth coating process for the 13th silicon-aluminum alloy film. The magnetron sputtering process conditions for the 24th coating are shown in Table 1. Metal atoms from the silicon-aluminum alloy target material sintered on the target site in the 24th target chamber are sputtered from the surface of the target material and deposited on the surface of the 23rd coated glass. The thickness of the alloy film layer in the 24th coating is controlled to be 25.0 nm, thus obtaining the 24th coated glass. At this point, the coating of the 13th silicon-aluminum alloy film layer is completed, and the thickness of the 13th silicon-aluminum alloy film layer is 154 nm.

[0229] The 24th coated glass undergoes its 25th coating process in the 25th target chamber, which is the first coating process of the 14th zinc oxide tin alloy film. The magnetron sputtering process conditions for the 25th coating are shown in Table 1. Metal atoms from the zinc oxide tin alloy target material sintered on the target site in the 25th target chamber are sputtered from the surface of the target material and deposited on the surface of the 24th coated glass. The thickness of the alloy film layer in the 25th coating is controlled to be 16.0 nm, thus obtaining the 25th coated glass.

[0230] The 25th coated glass undergoes its 26th coating process in the 26th target chamber, which is the second coating process of the 14th zinc oxide tin alloy film. The magnetron sputtering process conditions for the 26th coating are shown in Table 1. Metal atoms from the zinc oxide tin alloy target material sintered on the target site in the 26th target chamber are sputtered from the surface of the target material and deposited on the surface of the 25th coated glass. The thickness of the alloy film layer in the 25th coating is controlled to be 16.0 nm, thus obtaining the 26th coated glass. At this point, the coating of the 14th zinc oxide tin alloy film layer is completed, and the thickness of the 14th zinc oxide tin alloy film layer is 32.0 nm.

[0231] In this invention, the zinc oxide tin film layer plays a role in absorption, blocking, and adhesion in the coating of the glass. Without the zinc oxide tin layer, the coated glass of this invention cannot be tempered. The outdoor reflective color of the glass changes greatly and the brightness is high. Zinc oxide tin can improve the adhesion function of the third silver functional film layer, block far-infrared rays, enhance the function of the third silver film, absorb the reflective brightness of the nickel-chromium layer, and coordinate the color of the coated glass.

[0232] The 26th coated glass undergoes the 27th coating process in the 27th target chamber, which is the first coating process of the 15th silicon-aluminum alloy film. The magnetron sputtering process conditions for the 27th coating are shown in Table 1. Metal atoms of the silicon-aluminum alloy target material sintered on the target site in the 27th target chamber are sputtered from the surface of the target material and deposited on the surface of the 26th coated glass. The thickness of the alloy film layer in the 27th coating is controlled to be 65.0 nm, thus obtaining the 27th coated glass.

[0233] The 27th coated glass undergoes its 28th coating process in the 28th target chamber, which is the second coating process of the 15th silicon-aluminum alloy film. The magnetron sputtering process conditions for the 28th coating are shown in Table 1. Metal atoms from the silicon-aluminum alloy target material sintered on the target site in the 28th target chamber are sputtered from the surface of the target material and deposited on the surface of the 27th coated glass. The thickness of the alloy film layer in the 28th coating is controlled to be 65.0 nm, thus obtaining the 28th coated glass. At this point, the coating of the 15th silicon-aluminum alloy film layer is completed, and the thickness of the 15th silicon-aluminum alloy film layer is 130.0 nm.

[0234] The 28th coated glass undergoes its 29th coating process in the 29th target chamber, namely, the coating of the 16th zinc oxide aluminum alloy film. The magnetron sputtering process conditions for the 29th coating are shown in Table 1. Metal atoms from the zinc oxide aluminum alloy target material sintered on the target site in the 29th target chamber are sputtered from the surface of the target material and deposited on the surface of the 28th coated glass. The thickness of the alloy film layer in the 29th coating is controlled to be 20.0 nm, thus obtaining the 29th coated glass. At this point, the coating of the 16th zinc oxide aluminum alloy film layer is completed, and the thickness of the 16th zinc oxide aluminum alloy film layer is 20.0 nm.

[0235] The 29th coated glass undergoes its 30th coating process in the 30th target chamber, namely, the deposition of the 17th nickel-chromium alloy film. The magnetron sputtering process conditions for the 30th deposition are shown in Table 1. Metal atoms from the nickel-chromium alloy target material sintered on the target site in the 30th target chamber are sputtered from the surface of the target material and deposited on the surface of the 29th coated glass. The thickness of the alloy film layer in the 30th deposition is controlled to be 1.6 nm, thus obtaining the 30th coated glass. At this point, the deposition of the 17th nickel-chromium alloy film layer is completed, and the thickness of the 17th nickel-chromium alloy film layer is 1.6 nm.

[0236] The 30th coated glass undergoes its 31st coating process in target chamber 31, namely, the deposition of the 18th silver film. The magnetron sputtering process conditions for the 31st deposition are shown in Table 1. Metal atoms from the silver target material sintered on the target site in target chamber 31 are sputtered from the surface of the target material and deposited on the surface of the 30th coated glass. The thickness of the metal film layer in the 31st deposition is controlled to be 11.8 nm, thus obtaining the 31st coated glass. At this point, the deposition of the 18th silver film layer is completed, and the thickness of the 18th silver film layer is 11.8 nm.

[0237] The 31st coated glass undergoes its 32nd coating process in target chamber 32, namely, the deposition of the 19th nickel-chromium alloy film. The magnetron sputtering process conditions for the 32nd deposition are shown in Table 1. Metal atoms from the nickel-chromium alloy target material sintered on the target site in target chamber 32 are sputtered from the target material surface and deposited on the surface of the 31st coated glass. The thickness of the alloy film layer in the 32nd deposition is controlled to be 2.1 nm, thus obtaining the 32nd coated glass. At this point, the deposition of the 19th nickel-chromium alloy film layer is completed, and the thickness of the 19th nickel-chromium alloy film layer is 2.1 nm.

[0238] The 32nd coated glass undergoes its 33rd coating process in the 33rd target chamber, namely, the deposition of the 20th zinc oxide aluminum alloy film. The magnetron sputtering process conditions for the 33rd deposition are shown in Table 1. Metal atoms from the zinc oxide aluminum alloy target material sintered on the target site in the 33rd target chamber are sputtered from the surface of the target material and deposited on the surface of the 32nd coated glass. The thickness of the alloy film layer in the 33rd deposition is controlled to be 20.0 nm, thus obtaining the 33rd coated glass. At this point, the deposition of the 20th zinc oxide aluminum alloy film layer is completed, and the thickness of the 20th zinc oxide aluminum alloy film layer is 20.0 nm.

[0239] The 33rd coated glass undergoes its 34th coating process in the 34th target chamber, which is the first coating process of the 21st silicon-aluminum alloy film. The magnetron sputtering process conditions for the 34th coating are shown in Table 1. Metal atoms from the silicon-aluminum alloy target material sintered on the target site in the 34th target chamber are sputtered from the surface of the target material and deposited on the surface of the 33rd coated glass. The thickness of the alloy film layer in the 34th coating is controlled to be 46.0 nm, thus obtaining the 34th coated glass.

[0240] The 34th coated glass undergoes its 35th coating process in target chamber 35, which is the second coating process of the 21st silicon-aluminum alloy film. The magnetron sputtering process conditions for the 35th coating are shown in Table 1. Metal atoms from the silicon-aluminum alloy target material sintered on the target site in target chamber 35 are sputtered from the surface of the target material and deposited on the surface of the 34th coated glass substrate. The thickness of the alloy film layer in the 35th coating is controlled to be 46.0 nm, thus obtaining the 35th coated glass.

[0241] The 35th coated glass undergoes its 36th coating process in the 36th target chamber, which is the third coating process of the 21st silicon-aluminum alloy film. The magnetron sputtering process conditions for the 36th coating are shown in Table 1. Metal atoms from the silicon-aluminum alloy target material sintered on the target site in the 36th target chamber are sputtered from the surface of the target material and deposited on the surface of the 35th coated glass. The thickness of the alloy film layer in the 36th coating is controlled to be 45.0 nm, thus obtaining the 36th coated glass.

[0242] The 36th coated glass undergoes its 37th coating process in target chamber 37, which is the fourth coating process for the 21st silicon-aluminum alloy film. The magnetron sputtering process conditions for the 37th coating are shown in Table 1. Metal atoms from the silicon-aluminum alloy target material sintered on the target site in target chamber 37 are sputtered from the surface of the target material and deposited on the surface of the 36th coated glass. The thickness of the alloy film layer in the 37th coating is controlled to be 45.0 nm, thus obtaining the 37th coated glass. At this point, the coating of the 21st silicon-aluminum alloy film layer is completed, and the thickness of the 21st silicon-aluminum alloy film layer is 182 nm.

[0243] The 37th coated glass undergoes its 38th coating process in target chamber 38, which is the first coating process of the 22nd zirconia film. The magnetron sputtering process conditions for the 38th coating are shown in Table 1. Metal atoms from the zirconia target material sintered on the target site in target chamber 38 are sputtered from the surface of the target material and deposited on the surface of the 37th coated glass. The thickness of the alloy film layer in the 38th coating is controlled to be 13.0 nm, thus obtaining the 38th coated glass.

[0244] The 38th coated glass undergoes its 39th coating process in target chamber 39, which is the second coating process of the 22nd zirconia film. The magnetron sputtering process conditions for the 39th coating are shown in Table 1. Metal atoms from the zirconia target material sintered on the target site in target chamber 39 are sputtered from the surface of the target material and deposited on the surface of the 38th coated glass. The thickness of the alloy film layer in the 39th coating is controlled to be 13.0 nm, thus obtaining the 39th coated glass. At this point, the 22nd zirconia film coating is completed, and the thickness of the 22nd zirconia film layer is 26.0 nm.

[0245] The process involves several key components: a first silicon-aluminum alloy film layer forms a strong bond with the glass surface, laying the foundation for the glass's color formation; a zinc oxide-aluminum alloy film layer deposited on top of the silicon-aluminum alloy film layer acts as an adhesive; the first silicon-aluminum alloy layer and the third nickel-chromium alloy layer, located on either side of the zinc oxide-aluminum film layer, synergistically regulate visible light transmittance and mitigate the increased visible light reflectance caused by the nickel-chromium alloy layer; the nickel-chromium alloy film layer protects the silver layer, enhances its adhesion to the zinc oxide-aluminum film layer, prevents oxidation of the silver layer during prolonged use, thus maintaining the stability of the glass color; and the silver layer serves as a functional layer, with the first, second, and third silver layers together reducing the overall planar resistivity and emissivity of the film layer, while also regulating the film layer's color and performance (i.e., reducing...). The shading coefficient increases infrared reflectivity, improves total visible light transmittance, and enhances heat insulation performance. The zinc oxide aluminum film layer regulates the light transmittance of the film layer. Moreover, zinc oxide aluminum has high light transmittance and good conductivity, which can reduce the refractive index of other materials. It also has high infrared reflectivity and high ultraviolet absorption. The zinc oxide tin film layer is the reflective absorption layer of the coated glass of this invention, which regulates the effect of the third silver film layer on the reflected color of the product and reduces the interference of the third silver film layer on the product color. The silicon aluminum alloy film layer is mainly a protective layer and also has a light interference effect. Zirconia is the top hard protective layer, which mainly plays a protective role in the subsequent deep processing of the product (such as tempering, cutting, edge grinding, cleaning, and making insulated glass). The combined effect of the films of this invention makes the product appear light green (French green).

[0246] The coated glass of this invention has high infrared reflectivity, which improves the infrared reflectivity of the glass and reduces the heat entering the room through the glass. The glass of this invention has good heat insulation and heat preservation effects, and the higher the reflectivity, the less the glass absorbs, resulting in less glass breakage. The zinc oxide aluminum film layer in the glass of this invention adjusts the visible light transmittance, and the zinc oxide tin film layer absorbs the reflectivity of the third silver film, thus adjusting the color of the front and side of the glass.

[0247] In this invention, the silicon-aluminum alloy film is formed by multiple coatings; the zinc oxide-aluminum alloy film is formed by multiple coatings; the zinc oxide-tin alloy film is formed by two coatings; and the zirconium oxide film is formed by two coatings. This not only increases the thickness of the glass coating, adjusts the color, and protects the film, but also improves the production efficiency (speed) of the sputtering process while ensuring the coating thickness, improves the uniformity and flatness of the film coating, reduces the scattering of light by the film, and avoids discoloration.

[0248] The process parameters for the coating treatment in Example 1 are shown in Table 1.

[0249] Table 1. Process parameters for coating treatment in Example 1

[0250]

[0251]

[0252] 5. Buffering

[0253] The 38th coated glass is transported from the magnetron sputtering chamber to the pressure buffer chamber. The pressure in the buffer chamber is gradually increased and the temperature in the buffer chamber is gradually decreased. When the pressure in the buffer chamber finally reaches atmospheric pressure and the temperature in the buffer chamber reaches room temperature, the 38th coated glass is discharged and stored in the warehouse, thus obtaining the coating.

[0254] The low-emissivity coated glass of this invention is a triple-silver Low-E glass with high visible light transmittance, clear glass, and a light green color (French green); it has a low shading coefficient; moreover, the visible light transmittance of triple-silver glass can be adjusted according to the thickness of the silver film layer, thereby reducing the shading coefficient and improving the problems of low visible light transmittance and high shading coefficient of double-silver and single-silver coated glass products.

[0255] 6. Tempering treatment

[0256] The pre-coated glass sample, after buffering, is placed on a fully automatic glass cutting machine and cut into the required dimensions. The cutting machine pressure is set to ≥6 bar, and the cutting wheel angle is selected between 135° and 155°. The cut glass is then edge-ground and cleaned (water conductivity ≤20μ / cm / m). 2 After processing, the glass is sent to a tempering furnace for tempering to produce tempered coated glass. The heat treatment parameters of the tempering furnace (taking a glass thickness of 6mm as an example) are shown in Table 1A.

[0257] Table 1A Process parameters for glass tempering treatment

[0258]

[0259] The coated glass prepared by this invention can be tempered (in-situ and off-site tempering). The tempered glass has high visible light transmittance, is clear, and has a light green color (French green); it has a low shading coefficient and a high light-to-heat ratio.

[0260] 7. Preparation of conventional insulating glass

[0261] The tempered low-emissivity coated glass, after tempering treatment, is made into an insulated glass with a structure of 6 (i.e., 6mm) - triple silver tempered low-emissivity coated glass (glass) + 12 (i.e., 12mm) - Air + 6 (i.e., 6mm) - glass (clear glass).

[0262] 8. Preparation of triple-glazed, two-cavity insulating glass

[0263] The tempered low-emissivity coated glass prepared after tempering is made into a triple-glazed, two-cavity insulated glass with a structure of 6 (i.e., 6mm) - triple silver tempered low-emissivity coated glass (glass) + 12 (i.e., 12mm) - Air + 6 (i.e., 6mm) - glass (clear glass) + 12 - Air + 6 - glass (clear glass).

[0264] This invention uses conventional insulated glass with a structural thickness of 6-triple silver tempered low-emissivity coated glass + 12-air + 6-glass (clear glass) and triple-glazed double-cavity insulated glass with a structural thickness of 6-triple silver tempered low-emissivity coated glass + 12-air + 6-glass (clear glass) + 12-air + 6-glass (clear glass) as examples for illustration. Insulated glass with other thicknesses and structures is also applicable to this invention.

[0265] Example 2

[0266] 1. Target sintering

[0267] Same as Example 1.

[0268] 2. Cleaning the glass

[0269] Except for the temperature of the deionized water used for cleaning being 35°C, the cleaning speed being 3m / min, and the drying temperature being 45°C, everything else is the same as in Example 1.

[0270] 3. Dehumidification and degassing treatment

[0271] Except for the first dehumidification and degassing treatment, which is conducted at a temperature of -135℃ and an absolute pressure of 6.0×10⁻⁶, the temperature is different. －2Below mbar; the temperature for the second dehumidification and degassing treatment is 80℃, and the absolute pressure is 6.0×10. －5 Except for mbar and below, the rest is the same as in Example 1.

[0272] 4. Coating treatment

[0273] Except for the coating process parameters, which are different from those in Example 1, the rest are the same as in Example 1, where the coating process parameters are shown in Table 2.

[0274] Table 2. Process parameters for coating treatment in Example 2

[0275]

[0276]

[0277] 5. Buffering

[0278] Same as Example 1.

[0279] 6. Tempering treatment

[0280] Except for the tempering process parameters shown in Table 1A, the rest are the same as in Example 1.

[0281] 7. To manufacture insulated glass

[0282] Same as Example 1.

[0283] 8. Preparation of triple-glazed, two-cavity insulating glass

[0284] Same as Example 1.

[0285] Example 3

[0286] 1. Target sintering

[0287] Same as Example 1.

[0288] 2. Cleaning the glass

[0289] Except for the temperature of the deionized water used for cleaning being 40°C, the cleaning speed being 8m / min, and the drying temperature being 55°C, everything else is the same as in Example 1;

[0290] 3. Dehumidification and degassing treatment

[0291] Except for the first dehumidification and degassing treatment at a temperature of -145℃, the second dehumidification and degassing treatment is at a temperature of 100℃, with an absolute pressure of 3.0×10⁻⁶. －5 Apart from mbar, everything else is the same as in Example 1.

[0292] 4. Coating treatment

[0293] Except for the coating process parameters, which are different from those in Example 1, the rest are the same as in Example 1, where the coating process parameters are shown in Table 3.

[0294] Table 3. Process parameters for coating treatment in Example 3

[0295]

[0296]

[0297] 5. Buffering

[0298] Same as Example 1.

[0299] 6. Tempering treatment

[0300] Except for the tempering process parameters shown in Table 1A, the rest are the same as in Example 1.

[0301] 7. To manufacture insulated glass

[0302] Same as Example 1.

[0303] 8. Preparation of triple-glazed, two-cavity insulating glass

[0304] Same as Example 1.

[0305] Compare with Example 1

[0306] The pretreated float glass from Examples 1-3 was tempered, and the tempered glass was used as Control Example 1.

[0307] Compare with Example 2

[0308] The pretreated float glass sheets from Examples 1-3 were tempered to produce insulated glass with a structure of 6-glass (tempered clear glass) + 12 Air + 6-glass (clear glass) as control example 2.

[0309] Compare with Example 3

[0310] Except for the fact that the twenty-fourth coated glass is directly sent into the 27th and 28th target chambers for two silicon-aluminum alloy film coating treatments, i.e. the fourteenth zinc oxide tin film coating treatment is not performed, the rest is the same as in Example 1.

[0311] Because of the absence of the fourteenth zinc oxide tin film layer, uneven heating during the heat treatment process caused the entire triple silver Low-E film layer to be "burnt" by high temperature, resulting in large-area "film detachment" and significant changes in the color uniformity of the product. Consequently, the product development failed and could not be applied to actual construction projects.

[0312] Compare with Example 4

[0313] Except for the fact that the twenty-fourth coated glass is directly sent into the twenty-ninth target chamber for a single zinc oxide aluminum alloy coating process, i.e. the fourteenth zinc oxide tin coating process and the fifteenth silicon aluminum coating process are not performed, the rest is the same as in Example 1.

[0314] Because it lacks the fourteenth zinc oxide tin film layer and the fifteenth silicon aluminum film layer, the film layer is easily scratched during the product's processing (cutting, edge grinding, cleaning processes). During heat treatment, uneven heating can cause the entire triple silver Low-E film layer to be "burnt" by high temperature, resulting in large-area "film detachment" and significant changes in the product's color uniformity. This can lead to product development failure and prevent its application in actual construction projects.

[0315] Test Example 1: Color, Abrasion Resistance, and Emissivity Test

[0316] According to GB / T2680-2021 "Determination of Visible Light Transmittance, Direct Solar Transmittance, Total Solar Transmittance, Ultraviolet Transmittance and Related Parameters of Architectural Glass" and GB / T 18915.2-2013 "Coated Glass Part 2: Low Emissivity Coated Glass", the color parameters of the single-pane tempered glass and conventional insulated glass prepared in Examples 1-3 and Comparative Examples 3-4 were measured, and the color parameters of the single-pane glass of Comparative Example 1 and the insulated glass of Comparative Example 2 were measured. The measurement results are shown in Tables 4 and 4A.

[0317] Table 4. Results of Measurement of Performance Parameters of Conventional Insulating Glass

[0318]

[0319] Table 4A Results of Performance Parameter Measurement for Single-Piece Tempered Glass

[0320]

[0321]

[0322] The transmittance color value of the triple silver low-emissivity coated monolayer tempered glass prepared by this invention is 80≤L. * ≤90, -10≤a * ≤-5, -5≤b * ≤3(85≤L * ≤87, -8≤a * ≤-6, -1≤b * ≤1); Reflection color value 25≤L * ≤40, -5≤a * ≤3, -10≤b * ≤0(30≤L * ≤33, -3≤a * ≤1, -7≤b *≤-5). Outdoors, it appears light green (French green), vibrant, bright, and beautiful, making it widely applicable in various buildings. Tempered clear glass has a transmittance color value of: L. * 95.8, a * -1.27, b * It is 0.05.

[0323] The coated tempered glass products prepared in Examples 1-3 have a cool color tone, which is more neutral when people see it at night or in dark weather, resulting in a good visual effect. In contrast, the color of Control Example 3 is green and the color of Control Example 4 is purplish-red, resulting in a poor visual effect.

[0324] The double-glazed single-cavity insulated glass prepared from the triple-silver low-emissivity coated tempered glass of this invention has the following main visual physical parameters: a transmittance color value of 80 ≤ L. * ≤90, -10≤a * ≤-5, -5≤b * ≤3(82≤L * ≤85, -8≤a * ≤-6, -1≤b * ≤1); Reflection color value 25≤L * ≤41, -5≤a * ≤3, -10≤b * ≤0(25≤L * ≤40, -5≤a * ≤-2, -6≤b * It has a light green color (French green) outdoors, which is colorful, bright and beautiful, and can be widely used in various buildings.

[0325] Example 1: Outdoor reflective color is light green (French green), with a soft hue; indoor reflective color is a neutral cool tone. Example 2: Outdoor reflective color is light green (French green), with a relatively soft hue; indoor reflective color is a neutral color with a slight greenish cool tone. Example 3: Outdoor reflective color is light green (French green), with a relatively soft hue; indoor reflective color is a neutral color with a slight reddish cool tone. The relative color difference of Examples 1, 2, and 3 is <0.5Lab*, the outdoor reflective color is light green (French green), and the indoor reflective color is a neutral cool tone. In Control Example 3, due to the absence of the fourteenth zinc oxide tin film layer, the outdoor reflective color of the glass is bluish-purple, and the indoor reflective color is bluish-green, which is not a popular color. In Control Example 4, due to the absence of the fourteenth zinc oxide tin film layer and the fifteenth silicon aluminum film layer, the glass not only has a purplish-red outdoor color, but also loses its top protective layer during processing, resulting in a very low yield and essentially a failed coating process.

[0326] Test Example 2 Optical Performance Test

[0327] The optical properties of the insulated glass prepared in Examples 1-3, the single-layer clear glass of Comparative Example 1, and the insulated glass prepared in Comparative Examples 2-4 were measured in accordance with GB / T2680-2021 "Determination of visible light transmittance, direct solar transmittance, total solar transmittance, ultraviolet transmittance and related window glass parameters of architectural glass". The test results are shown in Tables 5 and 5A.

[0328] Table 5. Optical performance test results of conventional insulated glass

[0329]

[0330] Table 5A Optical Performance Test Results of Triple-Glass Double-Cavity Insulating Glass

[0331]

[0332] The results of the measurements in Tables 5 and 5A are as follows:

[0333] 1. The present invention uses a conventional insulated glass made of high-quality low-emissivity coated tempered glass for near-zero energy buildings (taking a structure of 6-silver low-emissivity coated glass + 12-Ar + 6-glass (clear glass) as an example) with a visible light transmittance greater than 61% and a visible light outdoor reflectance less than 11.5%.

[0334] This invention relates to a triple-glazed, double-cavity insulated glass unit (taking a structure of 6-layer triple-silver tempered low-emissivity coated glass + 12-Ar + 6-glass (plain glass) + 12-Ar + 6-glass (plain glass) as an example) made from high-quality, low-emissivity coated tempered glass used in near-zero energy buildings after heat treatment. The visible light transmittance is greater than 56%, and the outdoor visible light reflectance is less than 15%, lower than the requirement of less than or equal to 30% specified in GB / T18091-2015 "Photothermal Performance of Glass Curtain Walls," indicating that the coated glass of this invention avoids outdoor "light pollution."

[0335] 2. The conventional insulated glass made from the near-zero energy consumption building low-emissivity coated tempered glass of this invention (taking the structure of 6-triple silver tempered low-emissivity coated glass + 12-Ar + 6-glass (clear glass) as an example) has a solar energy transmittance of less than 26%, which is much lower than that of ordinary single-pane clear glass and insulated glass made from ordinary glass. This indicates that the triple silver low-emissivity coated glass of this invention effectively controls the entry of sunlight and reduces the large amount of heat contained in sunlight entering the room; and the solar energy absorption rate is higher than 34%.

[0336] The triple-glazed double-cavity insulated glass (6-layer triple-silver tempered low-emissivity coated glass + 12-Ar + 6-glass (clear glass) + 12-Ar + 6-glass (clear glass)) made from the near-zero energy building low-emissivity coated tempered glass of this invention has a solar transmittance of less than 23%, which is much lower than that of ordinary single-pane clear glass and insulated glass made from ordinary glass. This indicates that the triple-silver tempered low-emissivity coated glass of this invention effectively controls the entry of sunlight and reduces the large amount of heat contained in sunlight entering the room. Furthermore, the solar energy absorption rate is higher than 35.9%, which is significantly higher than that of ordinary glass and insulated glass made from ordinary glass. This indicates that the coated tempered glass of this invention has a strong ability to maintain the indoor and outdoor light and heat environment through its own thermal regulation.

[0337] 3. The ultraviolet K transmittance, ISO transmittance and transmittance of the insulated glass made from the near-zero energy consumption building low-emissivity coated tempered glass of the present invention are significantly lower than those of ordinary glass and insulated glass made from ordinary glass. Ultraviolet rays have strong bactericidal and fading functions. The lower the transmittance, the stronger the ability of the coated glass of the present invention to block ultraviolet rays, thus avoiding damage to indoor items by ultraviolet rays.

[0338] 4. The optical performance technical parameters of the near-zero energy consumption building low-emissivity coated tempered glass of the present invention conform to the standard of GB / T18915.2-2013 "Coated Glass Part 2: Low-emissivity Coated Glass". The maximum allowable deviation of visible light transmittance is small, far below the national standard of 2.0%, reaching a maximum allowable deviation of less than 0.5%; the color uniformity is high, less than 2.0 CIELAB.

[0339] Therefore, the near-zero energy consumption low-emissivity coated tempered glass for buildings and the insulated glass made therefrom are more conducive to creating a bright and comfortable indoor and outdoor lighting environment. They effectively solve the problem of high transmittance and high shading characteristics of single-silver low-emissivity coated glass, resulting in better performance when used in insulated glass. Furthermore, they solve the technical problem that existing triple-silver coated glass cannot be tempered in different locations, and the problem that existing triple-silver tempered coated glass requires tempering before coating.

[0340] Test Example 3 Thermal Performance Test

[0341] The thermal properties of the glasses prepared in Examples 1-3 and Comparative Examples 1-4 were measured.

[0342] The measurements were taken in accordance with the national standard GB / T2680-2021 "Determination of Visible Light Transmittance, Direct Solar Transmittance, Total Solar Transmittance, Ultraviolet Transmittance and Related Parameters of Architectural Glass" and calculated using the WINDOW7.8 window and curtain wall thermal performance simulation software.

[0343] The test conditions were as follows: winter night: outdoor temperature -18℃, indoor temperature 21℃, wind speed 5.5m / s, no sunlight; summer day: outdoor temperature 32℃, indoor temperature 24℃, wind speed 2.8m / s, solar radiation intensity 783w / ㎡. The measurement results are shown in Tables 6 and 6A.

[0344] Table 6. Test results of thermal performance of conventional insulated glass.

[0345]

[0346] Table 6A Thermal Performance Test Results of Triple-Glass Double-Cavity Insulating Glass

[0347]

[0348] The results of the measurements in Table 6 are as follows:

[0349] 1. The heat transfer coefficient K value of the insulated glass made from the near-zero energy consumption building low-emissivity coated tempered glass of the present invention is lower than that of ordinary tempered single-pane glass and insulated glass made from ordinary tempered glass, whether in summer daytime or winter nighttime. This indicates that the solar control coated glass prepared by the present invention can reduce heat transfer due to temperature difference.

[0350] 2. The triple-glazed, double-cavity insulated glass made from the near-zero energy consumption low-emissivity coated tempered glass of this invention has a shading coefficient of less than 0.3 and a total solar transmittance of less than 25.6%. The shading coefficient of conventional insulated glass is less than 0.33 and the total solar transmittance is less than 28.5%. Whether it is triple-glazed, double-cavity or double-glazed, single-cavity insulated glass, the shading coefficients are significantly lower than those of ordinary tempered glass and insulated glass made from ordinary tempered glass. The shading coefficient and total solar transmittance are important reference factors in building energy conservation calculations. The smaller the value, the better the performance in blocking solar radiation. Therefore, the triple-silver tempered low-emissivity coated glass that can be heat-treated in different locations according to this invention and the insulated glass made from it can effectively prevent solar energy from entering the room and being converted into heat energy, thereby reducing cooling energy consumption.

[0351] 3. The relative heat increase of the triple-glazed, double-cavity insulated glass made of the near-zero energy building low-emissivity coated tempered glass of this invention is less than 195 W / m. 2 The relative heat gain is significantly lower than that of ordinary tempered glass and insulated glass made from ordinary tempered glass. The relative heat gain is the sum of heat gained and lost through the glass, taking into account the effects of temperature difference heat transfer and solar radiation on the indoor environment. The smaller the relative heat gain, the less heat enters the room through the glass, which is more conducive to reducing cooling energy consumption. The small relative heat gain of the triple silver tempered low-emissivity coated glass of the present invention indicates that the low-emissivity coated glass prepared by the present invention, which can be heat-treated in different locations, has a good energy-saving effect.

[0352] In summary, the near-zero energy consumption low-emissivity coated tempered glass for buildings of the present invention is more effective than ordinary glass and its insulated glass in preventing heat from entering the room, reducing cooling energy consumption, and achieving the goal of energy conservation and environmental protection. The effect is even better when it is made into insulated glass.

[0353] In summary, the near-zero energy consumption low-emissivity coated tempered glass for buildings of the present invention, compared with the experimental example, not only has a beautiful appearance and bright colors, and has a decorative effect, but also helps to create a comfortable and pleasant light and heat environment, and has a more ideal effect when made into triple-glazed double-cavity insulated glass.

Claims

1. A method for preparing low-emissivity coated tempered glass, characterized in that, The steps are performed in the following order: 1) Sintered target material The target materials, namely silicon-aluminum alloy, zinc-aluminum alloy, nickel-chromium alloy, silver, zinc-tin alloy, and zirconium oxide, are sintered onto the target positions in the vacuum magnetron sputtering chamber of the glass coating machine for later use. 2) Glass pretreatment The glass substrate to be coated is placed in a vacuum state and dehumidified and degassed to reduce the moisture and gas deposited on the glass surface, thus obtaining a dehumidified and degassed glass substrate. 3) Coating treatment A dehumidified and degassed glass substrate is fed into the vacuum magnetron sputtering chamber of a glass coating machine, which is equipped with targets for silicon-aluminum alloy, zinc-aluminum alloy, nickel-chromium alloy, silver, zinc-tin alloy, and zirconium oxide, respectively. The following layers are sequentially applied to the surface of the dehumidified and degassed glass substrate: first silicon-aluminum alloy layer; second zinc-aluminum alloy layer; third nickel-chromium alloy layer; fourth silver layer; fifth nickel-chromium alloy layer; sixth zinc-aluminum alloy layer; seventh silicon-aluminum alloy layer; eighth zinc-aluminum alloy layer; ninth nickel-chromium alloy layer; tenth silver layer; eleventh nickel-chromium alloy layer; twelfth zinc-aluminum alloy layer; and thirteenth silicon-aluminum alloy layer. The coating process includes: a fourteenth zinc oxide tin alloy film layer; a fifteenth silicon aluminum alloy film layer; a sixteenth zinc oxide aluminum alloy film layer; a seventeenth nickel-chromium alloy film layer; an eighteenth silver film layer; a nineteenth nickel-chromium alloy film layer; a twentieth zinc oxide aluminum alloy film layer; a twenty-first silicon aluminum alloy film layer; and a twenty-second zirconium oxide film layer. The thickness of the twelfth zinc oxide aluminum alloy film layer is 15.0–35.0 nm; the thickness of the fourteenth zinc oxide tin alloy film layer is 15–40 nm; the thickness of the nineteenth nickel-chromium alloy film layer is 1–3 nm; and the thickness of the twenty-first silicon aluminum alloy film layer is 170.0–200.0 nm. 4) Tempering treatment The coated glass is sent into a tempering furnace for tempering to produce tempered low-emissivity coated glass.

2. The preparation method according to claim 1, characterized in that, In step 3), the thickness of the first silicon-aluminum alloy film is 50.0–80.0 nm; the thickness of the second zinc-aluminum oxide film is 10.0–30.0 nm; the thickness of the third nickel-chromium alloy film is 0.5–3.0 nm; the thickness of the fourth silver film is 8.0–15.0 nm; the thickness of the fifth nickel-chromium alloy film is 1.0–3.0 nm; the thickness of the sixth zinc-aluminum oxide film is 10.0–30.0 nm; the thickness of the seventh silicon-aluminum alloy film is 310.0–400.0 nm; the thickness of the eighth zinc-aluminum oxide film is 15.0–35.0 nm; and the thickness of the ninth nickel-chromium alloy film is 1.0–5.0 nm. The thickness of the tenth silver film layer is 5.0–15.0 nm; the thickness of the eleventh nickel-chromium alloy film layer is 1.0–5.0 nm; the thickness of the thirteenth silicon-aluminum alloy film layer is 130.0–200.0 nm; the thickness of the fifteenth silicon-aluminum alloy film layer is 100.0–200.0 nm; the thickness of the sixteenth zinc oxide-aluminum alloy film layer is 10.0–40.0 nm; the thickness of the seventeenth nickel-chromium alloy film layer is 0.5–5.0 nm; the thickness of the eighteenth silver film layer is 8.0–15.0 nm; the thickness of the twentieth zinc oxide-aluminum alloy film layer is 10.0–30.0 nm; and the thickness of the twentieth zirconium oxide film layer is 10.0–50.0 nm.

3. The preparation method according to claim 1, characterized in that, In step 3), the thickness of the first silicon-aluminum alloy film is 55.0–65.0 nm; the thickness of the second zinc-aluminum oxide film is 18.0–22.0 nm; the thickness of the third nickel-chromium alloy film is 1.0–1.8 nm; the thickness of the fourth silver film is 10.0–13.0 nm; the thickness of the fifth nickel-chromium alloy film is 1.2–1.8 nm; the thickness of the sixth zinc-aluminum oxide film is 18.0–25.0 nm; the thickness of the seventh silicon-aluminum alloy film is 315.0–330.0 nm; the thickness of the eighth zinc-aluminum oxide film is 15.0–25.0 nm; the thickness of the ninth nickel-chromium alloy film is 2.0–3.0 nm; the thickness of the tenth silver film is 9–12.0 nm; the thickness of the eleventh nickel-chromium alloy film is 1.2–2.2 nm; and the thickness of the twelfth zinc-aluminum oxide film is… The thickness of the film layer is 25.0–35.0 nm; the thickness of the thirteenth silicon-aluminum alloy film layer is 145.0–160.0 nm; the thickness of the fourteenth zinc-tin oxide film layer is 25.0–35.0 nm; the thickness of the fifteenth silicon-aluminum alloy film layer is 120.0–140.0 nm; the thickness of the sixteenth zinc-aluminum oxide film layer is 18.0–25.0 nm; the thickness of the seventeenth nickel-chromium alloy film layer is 1.2–2.2 nm; the thickness of the eighteenth silver film layer is 10.0–13.0 nm; the thickness of the nineteenth nickel-chromium alloy film layer is 1.5–2.5 nm; the thickness of the twentieth zinc-aluminum oxide film layer is 15.0–25.0 nm; the thickness of the twenty-first silicon-aluminum alloy film layer is 180.0–200.0 nm; and the thickness of the twenty-second zirconium oxide film layer is 22.0–30.0 nm.

4. The preparation method according to claim 1, characterized in that, In step 3), the first silicon-aluminum alloy film layer is formed by two plating processes; the seventh silicon-aluminum alloy film layer is formed by six plating processes; the thirteenth silicon-aluminum alloy film layer is formed by four plating processes; the fifteenth silicon-aluminum alloy film layer is formed by two plating processes; the twenty-first silicon-aluminum alloy film layer is formed by four plating processes; the eighth zinc oxide-aluminum alloy film layer is formed by two plating processes; the twelfth zinc oxide-aluminum alloy film layer is formed by two plating processes; the fourteenth zinc oxide-tin alloy film layer is formed by two plating processes; and the twenty-second zirconium oxide film layer is formed by two plating processes.

5. The preparation method according to any one of claims 1-4, characterized in that, The dehumidification and degassing treatment described in step 2) involves reducing the moisture and gas deposited on the surface of the glass substrate in two processing stages to obtain the dehumidified and degassed glass substrate.

6. The preparation method according to claim 5, characterized in that, The absolute pressure in the first treatment stage of the dehumidification and degassing process is higher than the absolute pressure in the second treatment stage.

7. The preparation method according to claim 6, characterized in that, The absolute pressure during the first treatment stage is 5.0–6.0 × 10⁻⁶. －2 mbar; the absolute pressure during the second treatment stage is 3.0–6.0 × 10 mbar. -5 mbar.

8. The preparation method according to any one of claims 1-3, characterized in that, In step 4), the heating time during the tempering process is controlled to be 400-500 seconds; the temperature of the tempering furnace is 630-710°C; and the temperature of the upper part of the glass in the furnace is 650-695°C and the lower part is 630-680°C.

9. The preparation method according to any one of claims 1-3, characterized in that, In step 4), the cooling air pressure during the glass quenching process is controlled to be greater than 2500 Pa; and the cooling air pressure after quenching is controlled to be 1000-2000 Pa.

10. A low-emissivity coated tempered glass prepared according to the method described in any one of claims 1-9, characterized in that, The transmittance color value of a single piece of tempered low-emissivity coated glass is 80≤L. * ≤90, -10≤a * ≤-5, -5≤b * ≤3; Reflected color value 25≤L * ≤41, -5≤a * ≤3, -10≤b * ≤0.

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