Wastewater treatment device for semiconductor production and processing

Abstract

The invention relates to the technical field of wastewater treatment, in particular to a wastewater treatment device for semiconductor production and processing, which comprises a treatment box, the upper part of the treatment box is a filter chamber, the lower part of the treatment box is a settling chamber, the bottom of the filter chamber is provided with a screen plate, the side wall of the filter chamber is provided with a drain outlet, and the outside of the drain outlet is provided with a plugging mechanism. A push plate is arranged in the filtering chamber and is in sliding connection with the side wall and the bottom of the filtering chamber, the push plate is connected with a pushing mechanism, the pushing mechanism is used for pushing the push plate, the bottom of the settling chamber is in sliding connection with a settling box, the settling box penetrates through the bottom of the settling chamber, and a water outlet pipe is arranged on the side wall of the settling box. A valve is arranged on the water outlet pipe, a fixing mechanism is arranged on the side wall of the settling chamber, and the fixing mechanism is used for fixing the settling box; the problem that in the prior art, a screen needs to be cleaned manually is solved, the purpose of automatic cleaning is achieved, and manpower is saved.

Description

Technical Field

[0001] The invention relates to the technical field of wastewater treatment, in particular to a wastewater treatment device for semiconductor production and processing. Background Art

[0002] Semiconductor refers to materials whose electrical conductivity at room temperature is between that of conductors and insulators. Semiconductors are used in integrated circuits, consumer electronics, communication systems, photovoltaic power generation, lighting, high-power power conversion and other fields. For example, a diode is a device made of semiconductors.

[0003] The process of semiconductor production and processing will produce wastewater, the main pollutant in the wastewater is fluoride. In the existing technology, when treating semiconductor wastewater, most of the impurities in the wastewater are first filtered through a mesh plate, and then the fluoride in the wastewater is removed by a treatment agent (such as CH-87 fluorine removal resin). However, when the mesh plate filters the wastewater, impurities will accumulate on the surface of the mesh plate, which requires manual cleaning, wasting manpower. Summary of the invention

[0004] The object of the present invention is to provide a wastewater treatment device for semiconductor production and processing to solve the problems raised in the above-mentioned background technology.

[0005] To achieve the above object, the present invention provides the following technical solutions: A wastewater treatment device for semiconductor production and processing comprises a treatment box, the upper part of the treatment box is a filter chamber, and the lower part of the treatment box is a sedimentation chamber, wherein a mesh plate is installed at the bottom of the filter chamber, a sewage outlet is provided on the side wall of the filter chamber, and a sealing mechanism is installed outside the sewage outlet, and the sealing mechanism is used to seal the sewage outlet, the inside of the filter chamber is provided with a push plate, the push plate is slidably connected to the side wall and the bottom of the filter chamber, wherein the push plate is connected to a pushing mechanism, and the pushing mechanism is used to push the push plate, the bottom of the sedimentation chamber is slidably connected to a sedimentation box, the sedimentation box passes through the bottom of the sedimentation chamber, an outlet pipe is provided on the side wall of the sedimentation box, a valve is provided on the outlet pipe, a fixing mechanism is provided on the side wall of the sedimentation chamber, and the fixing mechanism is used to fix the sedimentation box, a rotating rod passes through the inside of the sedimentation chamber, and a plurality of stirring rods are provided on the rotating rod, a motor is installed on one of the outer walls of the sedimentation chamber, the output end of the motor is fixedly connected to one end of the rotating rod, and an addition port is provided at the top of the sedimentation chamber.

[0006] Preferably: the blocking mechanism includes a sealing plate arranged outside the sewage outlet, the upper end of the side wall of the sealing plate is fixed with symmetrically distributed transmission rods, the side wall of the filter chamber is fixed with symmetrically distributed fixed blocks, the transmission rods are rotatably connected to the fixed blocks, and a limit assembly is provided outside the filter chamber, which is used to limit the rotation of the sealing plate.

[0007] Preferably: the limiting assembly includes a limiting plate that is abutted against the sealing plate, a connecting plate is fixedly connected to the top of the limiting plate, the connecting plate is connected to the top of the filter chamber through an elastic component, the elastic component is used for elastic support of the connecting plate, wherein a trapezoidal plate is fixed to the bottom of the connecting plate, the trapezoidal plate passes through the top of the filter chamber and is slidably connected to the top of the filter chamber.

[0008] Preferably: the elastic component includes a sliding rod fixed on the top of the filter chamber and symmetrically distributed, the sliding rod passes through the connecting plate and is slidably connected to the connecting plate, wherein a first spring is provided outside the sliding rod, and both ends of the first spring are respectively fixedly connected to the connecting plate and the top of the filter chamber.

[0009] Preferably: the pushing mechanism includes a push rod fixedly connected to the push plate, the push rod passes through the side wall of the filter chamber and is slidably connected to the side wall of the filter chamber, wherein a wedge block is fixed to the end of the push rod, the wedge block is connected to the side wall of the filter chamber through a second spring, and the end of the rotating rod is connected to an extrusion assembly, which is used to extrude the wedge block, so that the wedge block drives the push plate to move through the push rod.

[0010] Preferably: the extrusion assembly includes a fixed plate fixedly connected to the outer wall of the processing box, a support rod passing through the inside of the fixed plate, the support rod and the fixed plate are slidably connected, wherein the upper end of the support rod is abutted against the wedge block, and a movable plate is fixed to the lower end of the support rod, and the movable plate is connected to the fixed plate through a third spring, and an extrusion plate for extruding the movable plate is fixed to the end of the rotating rod.

[0011] Preferably: the fixing mechanism includes pull plates arranged on both sides of the sedimentation box, the pull plates are connected to the side walls of the sedimentation box through a fourth spring, wherein the pull plates are fixed with symmetrically distributed blocks, the blocks penetrate the side walls of the sedimentation box and are slidably connected to the side walls of the sedimentation box, and the side walls of the sedimentation box are provided with symmetrically distributed grooves that are adapted to the blocks.

[0012] Compared with the prior art, the beneficial effects of the present invention are as follows: the present invention drives the stirring rod to rotate by the rotating rod, and the stirring rod stirs the treatment agent and the semiconductor wastewater, so that the fluoride in the semiconductor wastewater fully reacts with the treatment agent, effectively improving the defluorination effect and defluorination efficiency, and while the rotating rod rotates, the extrusion plate also squeezes the movable plate, and the movable plate squeezes the wedge block through the support rod, and the wedge block drives the push plate to move inside the filter chamber through the push rod. When the push plate moves to a certain extent, the push plate squeezes the inclined surface of the trapezoidal plate, and the trapezoidal plate drives the limit plate to move through the connecting plate, thereby releasing the pressure holding state of the limit plate on the sealing plate. At this time, the push plate can push the sealing plate through the impurities, so that the sealing plate flips outward, and then the push plate can push the impurities on the surface of the mesh plate out of the sewage outlet, which solves the problem of manual cleaning of the mesh plate in the prior art, achieves the purpose of automatic cleaning, and saves manpower. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 The overall structure of the embodiment of the present invention is shown in FIG. Figure 1 .

[0014] Figure 2 The overall structure of the embodiment of the present invention is shown in FIG. Figure 2 .

[0015] Figure 3 Schematic diagram of the internal structure of the processing box in an embodiment of the present invention.

[0016] Figure 4 It is a cross-sectional view of the internal structure of the processing box in an embodiment of the present invention.

[0017] Figure 5 Schematic diagram of the sealing plate connection structure in an embodiment of the present invention.

[0018] Figure 6 Schematic diagram of the trapezoidal plate connection structure in an embodiment of the present invention.

[0019] In the figure: 1-sedimentation box; 2-treatment box; 21-filtration chamber; 22-sedimentation chamber; 3-blocking mechanism; 31-sealing plate; 32-limiting plate; 33-connecting plate; 34-trapezoidal plate; 35-fixed block; 36-transmission rod; 37-sliding rod; 38-first spring; 4-pushing mechanism; 41-push rod; 42-second spring; 43-wedge block; 44-support rod; 45-fixed plate; 46-third spring; 47-movable plate; 48-extrusion plate; 5-fixing mechanism; 51-card slot; 52-pull plate; 53-card block; 54-fourth spring; 6-water inlet; 7-motor; 8-rotating rod; 9-stirring rod; 10-addition port; 11-water outlet; 12-drain outlet; 13-mesh plate; 14-push plate. DETAILED DESCRIPTION

[0020] In order to make the purpose, technical solution and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.

[0021] The specific implementation of the present invention is described in detail below in conjunction with specific embodiments.

[0022] In one embodiment, see Figure 1 , Figure 2 , Figure 3 and Figure 4A semiconductor production and processing wastewater treatment device includes a treatment box 2, the upper part of the treatment box 2 is a filter chamber 21, the lower part of the treatment box 2 is a sedimentation chamber 22, wherein a mesh plate 13 is installed at the bottom of the filter chamber 21, a sewage outlet 12 is provided on the side wall of the filter chamber 21, and a blocking mechanism 3 is installed outside the sewage outlet 12, and the blocking mechanism 3 is used to block the sewage outlet 12, and a push plate 14 is provided inside the filter chamber 21, and the push plate 14 is slidably connected to the side wall and the bottom of the filter chamber 21, wherein the push plate 14 is connected to a pushing mechanism 4, and the pushing mechanism 4 is used to push the push plate 14. A sedimentation box 1 is slidably connected to the bottom of the sedimentation chamber 22, and the sedimentation box 1 passes through the bottom of the sedimentation chamber 22. A water outlet pipe 11 is provided on the side wall of the sedimentation chamber 1, and a valve is provided on the water outlet pipe 11. A fixing mechanism 5 is provided on the side wall of the sedimentation chamber 22, and the fixing mechanism 5 is used to fix the sedimentation box 1. A rotating rod 8 passes through the inside of the sedimentation chamber 22, and a plurality of stirring rods 9 are provided on the rotating rod 8. A motor 7 is installed on one of the outer walls of the sedimentation chamber 22, and the output end of the motor 7 is fixedly connected to one end of the rotating rod 8. An addition port 10 is provided on the top of the sedimentation chamber 22.

[0023] In this embodiment, when the device treats semiconductor wastewater, the wastewater is poured into the filter chamber 21 through the water inlet 6, and the impurities in the semiconductor wastewater are preliminarily filtered through the mesh plate 13 inside the filter chamber 21. The filtered wastewater passes through the mesh plate 13 and enters the sedimentation chamber 22. Then, the treatment agent is added to the sedimentation chamber 22 through the addition port 10 at the top of the sedimentation chamber 22 (the treatment agent can be CH-87 defluorination resin, which is used to remove fluoride in the wastewater. It is a prior art and will not be described in detail here). At the same time, the motor 7 is started, and the motor 7 drives the rotating rod 8 to rotate, and the rotating rod 8 drives the stirring rod 9 to move in a circle, thereby stirring the treatment agent and the semiconductor wastewater, so that the fluoride in the semiconductor wastewater fully reacts with the treatment agent, thereby improving the defluorination effect and defluorination efficiency. In addition, while the rotating rod 8 rotates, it also pushes the push plate 14 through the pushing mechanism 4, so that the push plate 14 moves inside the filter chamber 21. While the push plate 14 moves, the impurities on the surface of the mesh plate 13 are pushed to the sewage discharge port. The push plate 14 is pushed in the direction of the sewage outlet 12, and on the other hand, the blocking mechanism 3 no longer blocks the sewage outlet 12, so that the sewage outlet 12 is in an open state. As the push plate 14 continues to move, the push plate 14 can push the impurities on the surface of the mesh plate 13 out of the sewage outlet 12, thereby achieving the purpose of automatic cleaning. There is no need to manually clean the impurities on the surface of the mesh plate 13, which saves manpower. After the stirring rod 9 stirs the semiconductor wastewater and the treatment agent for a period of time, the motor 7 stops running, and the semiconductor wastewater is allowed to stand for treatment. After standing for a period of time, the valve on the outlet pipe 11 is opened, and the treated semiconductor wastewater is directly discharged from the outlet pipe 11, and the precipitate generated by the reaction is accumulated at the bottom of the sedimentation box 1. After the wastewater is discharged, the fixing mechanism 5 releases the fixation of the sedimentation box 1, and the sedimentation box 1 is taken out from the sedimentation chamber 22, so that the staff can recover the precipitate inside the sedimentation chamber 22. In order to prevent impurities from falling directly on the surface of the motor 7, a baffle can be set above the motor 7.

[0024] See also Figure 2 , Figure 3 , Figure 4 and Figure 5 The blocking mechanism 3 includes a sealing plate 31 arranged outside the sewage outlet 12, and a symmetrically distributed transmission rod 36 is fixed to the upper end of the side wall of the sealing plate 31, and a symmetrically distributed fixed block 35 is fixed on the side wall of the filter chamber 21, and the transmission rod 36 is rotatably connected to the fixed block 35, wherein a limit assembly is provided outside the filter chamber 21, and the limit assembly is used to limit the rotation of the sealing plate 31; When filtering wastewater, the sealing plate 31 is tightly fitted with the outer wall of the filter chamber 21 under the action of the limiting assembly, thereby blocking the sewage outlet 12, thereby ensuring the sealing performance of the filter chamber 21. After the mesh plate 13 has finished filtering the semiconductor wastewater, the pushing mechanism 4 pushes the push plate 14. When the push plate 14 moves, the limiting assembly automatically releases the limit on the sealing plate 31. As the push plate 14 continues to move, the push plate 14 can push the sealing plate 31 through the impurities, causing the sealing plate 31 to flip outward. At this time, the push plate 14 can push the impurities on the surface of the mesh plate 13 out from the sewage outlet 12, thereby achieving the purpose of automatic cleaning.

[0025] See also Figure 5 and Figure 6 The limiting assembly includes a limiting plate 32 that is in contact with the sealing plate 31, a connecting plate 33 is fixedly connected to the top of the limiting plate 32, and the connecting plate 33 is connected to the top of the filter chamber 21 through an elastic component, and the elastic component is used for elastic support of the connecting plate 33, wherein a trapezoidal plate 34 is fixed to the bottom of the connecting plate 33, and the trapezoidal plate 34 passes through the top of the filter chamber 21 and is slidably connected to the top of the filter chamber 21; When the push plate 14 moves to a certain position inside the filter chamber 21, it squeezes the inclined surface of the trapezoidal plate 34, causing the trapezoidal plate 34 to move toward the outside of the filter chamber 21. While the trapezoidal plate 34 moves, it drives the limiting plate 32 to move upward through the connecting plate 33, thereby releasing the pressing state of the limiting plate 32 on the sealing plate 31. At this time, as the push plate 14 continues to move, the push plate 14 can push the sealing plate 31 through the impurities, causing the sealing plate 31 to flip outward. When the impurities are cleaned, the push plate 14 moves in the opposite direction and no longer squeezes the trapezoidal plate 34. The connecting plate 33 automatically resets under the action of the elastic component, thereby driving the limiting plate 32 to move downward. While the limiting plate 32 moves downward, it squeezes the sealing plate 31, so that the sealing plate 31 is tightly fitted with the outer wall of the filter chamber 21, thereby blocking the sewage outlet 12.

[0026] See also Figure 6 The elastic component includes a sliding rod 37 fixed to the top of the filter chamber 21 and symmetrically distributed, the sliding rod 37 passes through the connecting plate 33 and is slidably connected to the connecting plate 33, wherein a first spring 38 is provided outside the sliding rod 37, and the two ends of the first spring 38 are respectively fixedly connected to the connecting plate 33 and the top of the filter chamber 21; When the push plate 14 no longer squeezes the trapezoidal plate 34 , the connecting plate 33 can automatically reset under the action of the first spring 38 , wherein the slide bar 37 can limit the connecting plate 33 , thereby effectively improving the stability of the connecting plate 33 and the limiting plate 32 when moving.

[0027] See also Figure 1The pushing mechanism 4 includes a push rod 41 fixedly connected to the push plate 14, the push rod 41 penetrates the side wall of the filter chamber 21 and is slidably connected to the side wall of the filter chamber 21, wherein a wedge block 43 is fixed to the end of the push rod 41, and the wedge block 43 is connected to the side wall of the filter chamber 21 through a second spring 42, and an extrusion assembly is connected to the end of the rotating rod 8, and the extrusion assembly is used to squeeze the wedge block 43, so that the wedge block 43 drives the push plate 14 to move through the push rod 41; As the rotating rod 8 rotates, the inclined surface of the wedge block 43 is squeezed by the squeezing assembly. After the wedge block 43 is squeezed, the push plate 14 is driven to move inside the filter chamber 21 through the push rod 41, thereby pushing the impurities inside the filter chamber 21 out of the sewage outlet 12. When the squeezing assembly no longer squeezes the wedge block 43, the wedge block 43 automatically resets under the action of the second spring 42, thereby driving the push plate 14 to automatically reset.

[0028] See also Figure 1 The extrusion assembly includes a fixed plate 45 fixedly connected to the outer wall of the processing box 2, a support rod 44 is passed through the fixed plate 45, and the support rod 44 is slidably connected to the fixed plate 45, wherein the upper end of the support rod 44 is in contact with the wedge block 43, and a movable plate 47 is fixed to the lower end of the support rod 44, and the movable plate 47 is connected to the fixed plate 45 through a third spring 46, and an extrusion plate 48 for extruding the movable plate 47 is fixed to the end of the rotating rod 8; When the rotating rod 8 rotates, it drives the squeezing plate 48 to rotate. When the squeezing plate 48 rotates to a certain extent, the squeezing plate 48 squeezes the movable plate 47, so that the movable plate 47 drives the support rod 44 to move upward. When the support rod 44 moves upward, it squeezes the wedge block 43, so that the wedge block 43 drives the push plate 14 to move through the push rod 41. When the squeezing degree of the squeezing plate 48 on the movable plate 47 decreases, the squeezing plate 48 gradually returns to its original position under the action of the third spring 46, thereby driving the support rod 44 to move downward.

[0029] See also Figure 3 The fixing mechanism 5 includes a pull plate 52 arranged on both sides of the sedimentation box 1, and the pull plate 52 is connected to the side wall of the sedimentation box 1 through a fourth spring 54, wherein the pull plate 52 is fixed with a symmetrically distributed clamping block 53, the clamping block 53 penetrates the side wall of the sedimentation box 1 and is slidably connected to the side wall of the sedimentation box 1, and the side wall of the sedimentation box 1 is provided with a symmetrically distributed clamping groove 51 adapted to the clamping block 53; When the waste water in the sedimentation box 1 is completely discharged, the pull plate 52 is pulled, and the pull plate 52 drives the block 53 to move outward, thereby moving the block 53 to the outside of the slot 51. Without the support of the slot 51, the staff can move the sedimentation box 1 downward, thereby moving the sedimentation box 1 to the outside of the sedimentation chamber 22, so as to facilitate the staff to recycle the sediment inside the sedimentation box 1. When the sediment is cleaned up, the staff can move the sedimentation box 1 to the inside of the sedimentation chamber 22. When the slot 51 on the side wall of the sedimentation box 1 is aligned with the block 53, the staff releases the pull plate 52, and the pull plate 52 automatically resets under the action of the fourth spring 54, thereby driving the block 53 to move to the inside of the slot 51, thereby achieving the fixation of the sedimentation box 1.

[0030] Working principle: When the device treats semiconductor wastewater, the wastewater is poured into the filter chamber 21 through the water inlet 6, and the impurities in the semiconductor wastewater are initially filtered through the mesh plate 13 inside the filter chamber 21. The filtered wastewater passes through the mesh plate 13 and enters the sedimentation chamber 22. At this time, the treatment agent is added to the sedimentation chamber 22 through the addition port 10 on the top of the sedimentation chamber 22. At the same time, the motor 7 drives the rotating rod 8 to rotate, and the rotating rod 8 drives the stirring rod 9 to move in a circle, thereby stirring the treatment agent and the semiconductor wastewater, so that the fluoride in the semiconductor wastewater fully reacts with the treatment agent, effectively The defluorination effect and defluorination efficiency are improved. In addition, the rotation of the rotating rod 8 also drives the extrusion plate 48 to rotate. When the extrusion plate 48 rotates to a certain extent, the extrusion plate 48 squeezes the movable plate 47, so that the movable plate 47 drives the support rod 44 to move upward. The support rod 44 moves upward and squeezes the wedge block 43, so that the wedge block 43 drives the push plate 14 to move through the push rod 41. The push plate 14 moves to push the impurities on the surface of the mesh plate 13 toward the sewage outlet 12. When the push plate 14 moves to a certain extent, the push plate 14 squeezes the inclined surface of the trapezoidal plate 34, so that the trapezoidal plate 34 The push plate 14 moves toward the outside of the filter chamber 21, and the trapezoidal plate 34 moves while driving the limit plate 32 to move upward through the connecting plate 33, thereby releasing the pressure of the limit plate 32 on the sealing plate 31. As the push plate 14 continues to move, the push plate 14 can push the sealing plate 31 through the impurities, so that the sealing plate 31 flips outward, and then the push plate 14 can push the impurities on the surface of the mesh plate 13 out of the sewage outlet 12, achieving the purpose of automatic cleaning, without the need to manually clean the impurities on the surface of the mesh plate 13, saving manpower, and after the stirring rod 9 stirs the semiconductor wastewater and the treatment agent for a period of time, the motor 7 stops. The rotating rod 8 is driven to rotate, and the semiconductor wastewater is allowed to stand for static treatment at the same time. After standing for a period of time, the valve on the outlet pipe 11 is opened, and the treated semiconductor wastewater is directly discharged from the outlet pipe 11, while the precipitate generated by the reaction is accumulated at the bottom of the sedimentation box 1. After the wastewater is discharged, the pull plate 52 is pulled, and the pull plate 52 drives the card block 53 to move outward, thereby moving the card block 53 to the outside of the card slot 51. Without the support of the card slot 51, the staff can move the sedimentation box 1 downward, thereby moving the sedimentation box 1 to the outside of the sedimentation chamber 22, so that the staff can recycle the precipitate inside the sedimentation box 1.

[0031] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A semiconductor production and processing wastewater treatment device, comprising a treatment box; characterized in that: The upper part of the treatment box is a filter chamber, and the lower part of the treatment box is a sedimentation chamber, wherein a mesh plate is installed at the bottom of the filter chamber, a sewage outlet is provided on the side wall of the filter chamber, and a sealing mechanism is installed outside the sewage outlet, and the sealing mechanism is used to seal the sewage outlet. A push plate is provided inside the filter chamber, and the push plate is slidably connected to the side wall and the bottom of the filter chamber, wherein the push plate is connected to a pushing mechanism, and the pushing mechanism is used to push the push plate. A sedimentation box is slidably connected to the bottom of the sedimentation chamber, and the sedimentation box runs through the bottom of the sedimentation chamber, and an outlet pipe is provided on the side wall of the sedimentation box, and a valve is provided on the outlet pipe. A fixing mechanism is provided on the side wall of the sedimentation chamber, and the fixing mechanism is used to fix the sedimentation box. A rotating rod runs through the inside of the sedimentation chamber, and a plurality of stirring rods are provided on the rotating rod. A motor is installed on one of the outer walls of the sedimentation chamber, and the output end of the motor is fixedly connected to one end of the rotating rod. An addition port is provided at the top of the sedimentation chamber.

2. A semiconductor production and processing wastewater treatment device according to claim 1, characterized in that: The blocking mechanism includes a sealing plate arranged outside the sewage outlet, and symmetrically distributed transmission rods are fixed to the upper end of the side wall of the sealing plate. Symmetrically distributed fixed blocks are fixed on the side wall of the filter chamber, and the transmission rods are rotatably connected to the fixed blocks. A limit assembly is provided outside the filter chamber, and the limit assembly is used to limit the rotation of the sealing plate.

3. A semiconductor production and processing wastewater treatment device according to claim 2, characterized in that: The limiting assembly includes a limiting plate that is abutted against the sealing plate, a connecting plate is fixedly connected to the top of the limiting plate, the connecting plate is connected to the top of the filter chamber through an elastic component, the elastic component is used for elastic support of the connecting plate, wherein a trapezoidal plate is fixed to the bottom of the connecting plate, the trapezoidal plate passes through the top of the filter chamber and is slidably connected to the top of the filter chamber.

4. A semiconductor production and processing wastewater treatment device according to claim 3, characterized in that: The elastic component includes a sliding rod fixed on the top of the filter chamber and symmetrically distributed, the sliding rod passes through the connecting plate and is slidably connected to the connecting plate, wherein a first spring is arranged outside the sliding rod, and the two ends of the first spring are respectively fixedly connected to the connecting plate and the top of the filter chamber.

5. A semiconductor production and processing wastewater treatment device according to claim 1, characterized in that: The pushing mechanism includes a push rod fixedly connected to the push plate, the push rod passes through the side wall of the filter chamber and is slidably connected to the side wall of the filter chamber, wherein a wedge block is fixed to the end of the push rod, the wedge block is connected to the side wall of the filter chamber through a second spring, and the end of the rotating rod is connected to an extrusion assembly, which is used to extrude the wedge block, so that the wedge block drives the push plate to move through the push rod.

6. A semiconductor production and processing wastewater treatment device according to claim 5, characterized in that: The extrusion assembly includes a fixed plate fixedly connected to the outer wall of the processing box, a support rod passing through the inside of the fixed plate, the support rod and the fixed plate are slidably connected, wherein the upper end of the support rod is abutted against the wedge block, and a movable plate is fixed to the lower end of the support rod, and the movable plate is connected to the fixed plate through a third spring, and an extrusion plate for extruding the movable plate is fixed to the end of the rotating rod.

7. A semiconductor production and processing wastewater treatment device according to claim 1, characterized in that: The fixing mechanism includes pull plates arranged on both sides of the sedimentation box, which are connected to the side walls of the sedimentation box through a fourth spring, wherein the pull plates are fixed with symmetrically distributed blocks, which penetrate the side walls of the sedimentation box and are slidably connected to the side walls of the sedimentation box, and the side walls of the sedimentation box are provided with symmetrically distributed grooves that are adapted to the blocks.

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