First-stage and second-stage switchable test structure of hardness and silicon removal reaction tank

Abstract

The invention discloses a first-stage and second-stage switchable test structure of a hardness and silicon removal reaction tank. Comprising a first-stage silicon removal tank, a first-stage hardness removal tank, a second-stage silicon removal high-density sedimentation tank, a second-stage hardness removal high-density sedimentation tank, a silicon removal water production tank, a hardness removal water production tank, a water inlet pipeline, a first-stage silicon removal water delivery pipeline, a first-stage hardness removal water delivery pipeline, a second-stage silicon removal water delivery pipeline and a second-stage hardness removal water delivery pipeline. The water inlet pipeline is used for conveying to-be-treated wastewater to the first-stage silicon removal tank or the first-stage hardness removal tank; the first-stage silicon removal water delivery pipeline is used for delivering wastewater to the first-stage hardness removal tank or the second-stage silicon removal high-density sedimentation tank; the first-stage hardness removal water conveying pipeline is used for conveying wastewater to the first-stage silicon removal tank or the second-stage hardness removal high-density sedimentation tank; the second-stage silicon removal water conveying pipeline is used for conveying produced water to the first-stage hardness removal tank or a preset water storage point; the second-stage hardness removal water conveying pipeline is used for conveying produced water to the first-stage silicon removal tank or a preset water storage point. According to the method, the optimal reaction sequence of primary / secondary hardness and silicon removal can be tested, and the operation is simple.

Description

Technical Field

[0001] The invention relates to the technical field of wastewater treatment, and in particular to a primary and secondary switchable testing structure of a hardness and silicon removal reaction pool. Background Art

[0002] At present, a large amount of industrial wastewater is generated in industrial production. The wastewater may contain a large amount of metal ions, organic matter, calcium-magnesium-silicon scaling factors, suspended solids, etc. Therefore, removing hardness and silicon from industrial wastewater is of great significance for protecting the environment, improving the recycling rate of water resources, and ensuring the stable operation of industrial equipment.

[0003] De-hardening (softening): refers to the removal of calcium ions (Ca 2+ ) and magnesium ions (Mg 2+ ), these two ions are the main components that cause water hardness. Hard water has many effects on industrial production and domestic water use. For example, in heat exchange systems, hard water can cause scaling, reduce thermal efficiency, and increase equipment maintenance costs. Common methods for removing hardness include: ion exchange (replacing calcium and magnesium ions in water through ion exchange resins), chemical precipitation (adding reagents (such as lime, soda ash, etc.) to water to form insoluble precipitates for calcium and magnesium ions to be removed), and distillation (evaporating water and condensing it for recovery to remove all dissolved solids in the water, including hardness ions).

[0004] Silicon removal: refers to the removal of silicate and its salts from water. Although the content of silicate in water is not high, when the water is heated, silicate will form insoluble silica scale, which is hard and difficult to remove. It will form deposits in boilers, heat exchangers and other equipment, reducing thermal efficiency and even causing equipment damage. Common silicon removal methods include: chemical coagulation method (adding coagulants to water to make silicate form flocculent precipitation), ion exchange method (using specific ion exchange resins to remove silicate ions in water), pretreatment and reverse osmosis method (removing silicon content in water through pretreatment (such as acid addition to adjust pH value) and reverse osmosis membrane technology).

[0005] However, for different industrial wastewaters, the concentrations of calcium and magnesium ions and calcium, magnesium and silicon scaling factors are not the same. Therefore, different industrial wastewaters require different reagent reaction amounts. For example, for industrial wastewaters with relatively higher calcium and magnesium ions, it is necessary to increase the amount of reagents and extend the time for the reagents to react with the wastewater. The treatment volume of industrial wastewater is very large. Adding too much reagent will greatly increase the cost, and too little will affect the effect of hardness and silicon removal. In addition, in order to improve the effect of hardness and silicon removal, a primary and secondary reaction tank and a sedimentation tank can be set, wherein the optimal hardness and silicon removal order corresponding to each industrial wastewater will also be different, such as first-level silicon removal and then secondary silicon removal, then first-level hardness removal and then secondary hardness removal, or first-level silicon removal and then first-level hardness removal, and then secondary silicon removal and secondary hardness removal, etc. Therefore, the reaction order for each industrial wastewater needs to be tested to find the best reaction order to ensure the wastewater treatment efficiency and reduce the treatment cost. However, there is no test structure in this regard in the prior art.

[0006] In view of this, it is necessary to provide a first-level and second-level switchable test structure for a hardness and silicon removal reaction pool to overcome the above-mentioned defects. Summary of the invention

[0007] The purpose of the present invention is to provide a first-level and second-level switchable test structure for a hardness and silicon removal reaction tank, aiming to solve the problem of how to obtain the best silicon and hardness removal reaction sequence for each industrial wastewater, ensure the wastewater treatment effect, and reduce the treatment cost.

[0008] In order to achieve the above object, the present invention provides a first-level and second-level switchable test structure of a hardness removal and silicon removal reaction pool, comprising:

[0009] Primary silicon removal tank, primary hardness removal tank, secondary silicon removal high-density sedimentation tank, secondary hardness removal high-density sedimentation tank;

[0010] A desiliconization water production tank, the desiliconization water production tank is used to receive the produced water discharged from the secondary desiliconization high-density sedimentation tank;

[0011] A hardness removal water production tank, the hardness removal water production tank is used to receive the produced water discharged from the secondary hardness removal high-density sedimentation tank;

[0012] A water inlet pipeline, the water inlet pipeline is used to transport the wastewater to be treated to the primary desiliconization tank or the primary dehardness removal tank;

[0013] A primary desiliconization water pipeline, the primary desiliconization water pipeline is used to transport the wastewater treated in the primary desiliconization tank to the primary hardness removal tank or the secondary desiliconization high-density sedimentation tank;

[0014] A primary hardness removal water delivery pipeline, the primary hardness removal water delivery pipeline is used to transport the wastewater treated in the primary hardness removal tank to the primary silicon removal tank or the secondary hardness removal high-density sedimentation tank;

[0015] A secondary desiliconization water delivery pipeline, the secondary desiliconization water delivery pipeline is used to deliver the produced water from the desiliconization water production tank to the primary dehardness removal tank or a predetermined water storage point;

[0016] A secondary desiliconization water delivery pipeline is used to deliver the produced water from the desiliconization water production tank to the primary desiliconization pool or a predetermined water storage point.

[0017] In a preferred embodiment, the water inlet pipeline includes a water inlet main line and a first water inlet branch and a second water inlet branch both connected to the water inlet main line; the first water inlet branch is connected to the primary silicon removal tank, and the second water inlet branch is connected to the primary hardness removal tank; the water inlet main line is provided with a water inlet pump, and the water inlet pump is used to pump the untreated wastewater in the water inlet main line into the first water inlet branch and the second water inlet branch.

[0018] In a preferred embodiment, the water inlet trunk is provided with a water inlet pump bypass arranged in parallel with the water inlet pump; the water inlet pump bypass is used to return part of the untreated wastewater pumped out by the water inlet pump to the front end of the water inlet trunk when the water inlet pump is running.

[0019] In a preferred embodiment, the first-level desiliconization water supply pipeline includes a first-level desiliconization trunk line connected to the first-level desiliconization tank at one end, a first-level desiliconization branch line and a second-level desiliconization branch line both connected to the first-level desiliconization trunk line away from the first-level desiliconization tank; the first-level desiliconization branch line is connected to the first-level hardness removal tank at one end away from the first-level desiliconization trunk line, and the second-level desiliconization branch line is connected to the second-level desiliconization high-density sedimentation tank at one end away from the first-level desiliconization trunk line; the first-level desiliconization trunk line is provided with a desiliconization pump, and the desiliconization pump is used to pump out the wastewater treated in the first-level desiliconization tank.

[0020] In a preferred embodiment, the first-level hardness removal water supply pipeline includes a first-level hardness removal main line connected to the first-level hardness removal tank at one end, a first-level hardness removal branch line and a second-level hardness removal branch line both connected to the first-level hardness removal main line away from the first-level hardness removal tank; the first-level hardness removal branch line is connected to the first-level silicon removal tank at one end away from the first-level hardness removal main line, and the second-level hardness removal branch line is connected to the second-level hardness removal high-density sedimentation tank at one end away from the first-level hardness removal main line; the first-level hardness removal main line is provided with a hardness removal pump, and the hardness removal pump is used to pump out the wastewater treated in the first-level hardness removal tank.

[0021] In a preferred embodiment, the first-level silicon removal main line is provided with a silicon removal pump bypass arranged in parallel with the silicon removal pump; the silicon removal pump bypass is used to return part of the wastewater pumped out by the silicon removal pump to the front end of the first-level silicon removal main line when the silicon removal pump is running; the first-level hardness removal main line is provided with a hardness removal pump bypass arranged in parallel with the hardness removal pump; the hardness removal pump bypass is used to return part of the wastewater pumped out by the hardness removal pump to the front end of the first-level hardness removal main line when the hardness removal pump is running.

[0022] In a preferred embodiment, the secondary desiliconization water supply pipeline includes a secondary desiliconization trunk line connected to the desiliconization water production tank at one end, a first secondary desiliconization branch line and a second secondary desiliconization branch line both connected to the secondary desiliconization trunk line away from the side of the desiliconization water production tank; the first secondary desiliconization branch line is connected to the primary hardness removal pool at one end away from the secondary desiliconization trunk line, and the second secondary desiliconization branch line is used to be connected to a predetermined water storage point at one end away from the secondary desiliconization trunk line; the secondary desiliconization trunk line is provided with a desiliconization water production pump, and the desiliconization water production pump is used to pump out the water in the desiliconization water production tank.

[0023] In a preferred embodiment, the secondary hardness removal water supply pipeline includes a secondary hardness removal main line connected to the hardness removal water production tank at one end, a first secondary hardness removal branch and a second secondary hardness removal branch both connected to the secondary hardness removal main line away from the hardness removal water production tank; the first secondary hardness removal branch is connected to the first silicon removal pool at one end away from the secondary hardness removal main line, and the second secondary hardness removal branch is used to be connected to a predetermined water storage point at one end away from the secondary hardness removal main line; the secondary hardness removal main line is provided with a hardness removal water production pump, and the hardness removal water production pump is used to pump out the water in the hardness removal water production tank.

[0024] In a preferred embodiment, the secondary silicon removal main circuit is provided with a silicon removal water production pump bypass arranged in parallel with the silicon removal water production pump; the silicon removal water production pump bypass is used to return part of the water pumped out by the silicon removal water production pump to the silicon removal water production tank when the silicon removal water production pump is running; the secondary hardness removal main circuit is provided with a hardness removal water production pump bypass arranged in parallel with the hardness removal water production pump; the hardness removal water production pump bypass is used to return part of the water pumped out by the hardness removal water production pump to the hardness removal water production tank when the hardness removal water production pump is running.

[0025] In a preferred embodiment, a silicon removal water production pipeline is provided between the secondary silicon removal high-density sedimentation tank and the silicon removal water production tank, and the water overflowing from the secondary silicon removal high-density sedimentation tank after the reaction enters the silicon removal water production tank through the silicon removal water production pipeline; a hardness removal water production pipeline is provided between the secondary hardness removal high-density sedimentation tank and the hardness removal water production tank, and the water overflowing from the secondary hardness removal high-density sedimentation tank after the reaction enters the hardness removal water production tank through the hardness removal water production pipeline.

[0026] The first- and second-level switchable test structure of the hardness and silicon removal reaction tank provided by the present invention switches the flow direction of wastewater in the first-level silicon removal tank, the first-level hardness removal tank, the second-level silicon removal high-density sedimentation tank, the second-level hardness removal high-density sedimentation tank, the silicon removal water production tank, and the hardness removal water production tank through the water inlet pipeline, the first-level / secondary silicon removal water supply pipeline, and the first-level / secondary hardness removal water supply pipeline, thereby testing the optimal reaction sequence of the first-level / secondary hardness and silicon removal, and the operation is simple. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required for use in the embodiments are briefly introduced below. It should be understood that the following drawings only show certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other related drawings can be obtained based on these drawings without creative work.

[0028] Figure 1 It is a pipeline schematic diagram of a first-level and second-level switchable test structure of a hardness and silicon removal reaction tank in an exemplary embodiment.

[0029] Reference numeral 100 in the figure, a first-level and second-level switchable test structure of a hardness and silicon removal reaction tank;

[0030] 10. Primary silicon removal tank; 20. Primary hardness removal tank; 30. Secondary silicon removal high-density sedimentation tank; 40. Secondary hardness removal high-density sedimentation tank; 50. Silicon removal water production tank; 60. Hardness removal water production tank;

[0031] 101. Silicon removal water production pipeline; 102. Hardness removal water production pipeline;

[0032] 201, water inlet main line; 202, first water inlet branch line; 203, second water inlet branch line; 204, water inlet pump; 205, water inlet pump bypass;

[0033] 301, primary desiliconization trunk line; 302, first primary desiliconization branch line; 303, second primary desiliconization branch line; 304, desiliconization pump; 305, desiliconization pump bypass;

[0034] 401, primary hardness removal main line; 402, first primary hardness removal branch line; 403, second primary hardness removal branch line; 404, hardness removal pump; 405, hardness removal pump bypass;

[0035] 501, secondary desiliconization trunk line; 502, first and second desiliconization branch line; 503, second and second desiliconization branch line; 504, desiliconization water production pump; 505, desiliconization water production pump bypass;

[0036] 601, secondary hard water removal main line; 602, first and second hard water removal branch lines; 603, second and second hard water removal branch lines; 604, hard water removal pump; 605, hard water removal pump bypass. DETAILED DESCRIPTION

[0037] In order to make the purpose, technical solution and beneficial technical effect of the present invention clearer, the present invention is further described in detail below in conjunction with the accompanying drawings and specific implementation methods. It should be understood that the specific implementation methods described in this specification are only for explaining the present invention, not for limiting the present invention.

[0038] It should also be understood that the terms used in this specification of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention. As used in the specification of the present invention and the appended claims, unless the context clearly indicates otherwise, the singular forms "a", "an" and "the" are intended to include plural forms.

[0039] It should be further understood that the term "and / or" used in the present description and the appended claims refers to any and all possible combinations of one or more of the associated listed items, and includes these combinations.

[0040] In an embodiment of the present invention, a primary and secondary switchable test structure 100 of a hardness and silicon removal reaction tank is provided, which is used to test the best or better reaction sequence for silicon and hardness removal of target industrial wastewater.

[0041] like Figure 1 As shown, the first-level and second-level switchable test structure 100 of the hardness removal and silicon removal reaction tank includes: a first-level silicon removal tank 10, a first-level hardness removal tank 20, a second-level silicon removal high-density sedimentation tank 30, a second-level hardness removal high-density sedimentation tank 40, a silicon removal water production tank 50, a hardness removal water production tank 60, a water inlet pipeline, a first-level silicon removal water supply pipeline, a first-level hardness removal water supply pipeline, a second-level silicon removal water supply pipeline, and a second-level hardness removal water supply pipeline. Among them, the first-level silicon removal tank 10 is used to perform a preliminary reaction on silicate and its salts in the wastewater. The first-level hardness removal tank 20 is used to perform a preliminary reaction on calcium and magnesium ions in the wastewater. The second-level silicon removal high-density sedimentation tank 30 is used to mix, flocculate, and precipitate silicates and preliminary reaction products in the wastewater. The second-level hardness removal high-density sedimentation tank 40 is used to mix, flocculate, and precipitate calcium and magnesium ions and preliminary reaction products in the wastewater.

[0042] Specifically, the desiliconization water production tank 50 is used to receive the produced water discharged from the secondary desiliconization high-density sedimentation tank 30 ; the dehardness water production tank 60 is used to receive the produced water discharged from the secondary dehardness water production tank 40 .

[0043] Among them, a silicon removal water production pipeline 101 is provided between the secondary silicon removal high-density sedimentation tank 30 and the silicon removal water production tank 50, and the water overflowing from the secondary silicon removal high-density sedimentation tank 30 after the reaction enters the silicon removal water production tank 50 through the silicon removal water production pipeline 101. A hardness removal water production pipeline 102 is provided between the secondary hardness removal high-density sedimentation tank 40 and the hardness removal water production tank 60, and the water overflowing from the secondary hardness removal high-density sedimentation tank 40 after the reaction enters the hardness removal water production tank 60 through the hardness removal water production pipeline 102.

[0044] In this embodiment, the water inlet pipeline is used to transport the wastewater to be treated to the primary desiliconization tank 10 or the primary dehardness removal tank 20 .

[0045] The water inlet pipeline includes a water inlet trunk 201 and a first water inlet branch 202 and a second water inlet branch 203 connected to the water inlet trunk 201. The first water inlet branch 202 is connected to the primary desiliconization tank 10. The second water inlet branch 203 is connected to the primary desiliconization tank 20.

[0046] The water inlet trunk 201 is provided with a water inlet pump 204, which is used to pump the untreated wastewater in the water inlet trunk 201 into the first water inlet branch 202 and the second water inlet branch 203, thereby transporting the untreated wastewater to the primary desiliconization tank 10 or the primary dehardness tank 20.

[0047] Furthermore, the water inlet trunk 201 is provided with a water inlet pump bypass 205 arranged in parallel with the water inlet pump 204. The water inlet pump bypass 205 is used to return part of the wastewater to be treated pumped out by the water inlet pump 204 to the front end of the water inlet trunk 201 when the water inlet pump 204 is running, so that the water inlet pump 204 can run at full rated power and avoid damage to the water inlet pump 204 due to pressure buildup.

[0048] In this embodiment, the primary desiliconization water pipeline is used to transport the wastewater treated in the primary desiliconization tank 10 to the primary dehardness removal tank 20 or the secondary desiliconization high-density sedimentation tank 30 .

[0049] Specifically, the primary desiliconization water delivery pipeline includes a primary desiliconization trunk 301 connected to the primary desiliconization tank 10 at one end, a first primary desiliconization branch 302 and a second primary desiliconization branch 303 both connected to the primary desiliconization trunk 301 away from the primary desiliconization tank 10. The end of the first primary desiliconization branch 302 away from the primary desiliconization trunk 301 is connected to the primary hardness removal tank 20, and the end of the second primary desiliconization branch 303 away from the primary desiliconization trunk 301 is connected to the secondary desiliconization high-density sedimentation tank 30. The primary desiliconization trunk 301 is provided with a desiliconization pump 304, which is used to pump out the wastewater treated by the primary desiliconization tank 10, so that it can be pumped into the primary hardness removal tank 20 or the secondary desiliconization high-density sedimentation tank 30.

[0050] Similarly, the primary hardness removal water pipeline is used to transport the wastewater treated in the primary hardness removal tank 20 to the primary silicon removal tank 10 or the secondary hardness removal high-density sedimentation tank 40 .

[0051] Specifically, the primary hardness removal water delivery pipeline includes a primary hardness removal trunk 401 whose one end is connected to the primary hardness removal tank 20, a first primary hardness removal branch 402 and a second primary hardness removal branch 403, both of which are connected to the primary hardness removal trunk 401 away from the primary hardness removal tank 20. The end of the first primary hardness removal branch 402 away from the primary hardness removal trunk 401 is connected to the primary silicon removal tank 10, and the end of the second primary hardness removal branch 403 away from the primary hardness removal trunk 401 is connected to the secondary hardness removal high-density sedimentation tank 40. The primary hardness removal trunk 401 is provided with a hardness removal pump 404, which is used to pump out the wastewater treated in the primary hardness removal tank 20, so that it can be pumped into the primary silicon removal tank 10 or the secondary hardness removal high-density sedimentation tank 40.

[0052] Furthermore, the primary desiliconization trunk 301 is provided with a desiliconization pump bypass 305 arranged in parallel with the desiliconization pump 304. The desiliconization pump bypass 305 is used to return part of the wastewater pumped out by the desiliconization pump 304 to the front end of the primary desiliconization trunk 301 when the desiliconization pump 304 is running, so as to avoid the desiliconization pump 304 from being damaged due to pressure buildup. The primary de-hardening trunk 401 is provided with a de-hardening pump bypass 405 arranged in parallel with the de-hardening pump 404. The de-hardening pump bypass 405 is used to return part of the wastewater pumped out by the de-hardening pump 404 to the front end of the primary de-hardening trunk 401 when the de-hardening pump 404 is running, so as to avoid the de-hardening pump 404 from being damaged due to pressure buildup.

[0053] In this embodiment, the secondary desiliconization water delivery pipeline is used to deliver the water produced by the desiliconization water production tank 50 to the primary dehardness pool 20 or a predetermined water storage point. The predetermined water storage point can be a reserved water point, a fiber ball filter, etc.

[0054] Specifically, the secondary desiliconization water delivery pipeline includes a secondary desiliconization trunk 501, one end of which is connected to the desiliconization water production tank 50, and a first secondary desiliconization branch 502 and a second secondary desiliconization branch 503, both of which are connected to the secondary desiliconization trunk 501 away from the side of the desiliconization water production tank 50. The end of the first secondary desiliconization branch 502 away from the secondary desiliconization trunk 501 is connected to the primary hardness removal tank 20, and the end of the second secondary desiliconization branch 503 away from the secondary desiliconization trunk 501 is used to communicate with a predetermined water storage point. The secondary desiliconization trunk 501 is provided with a desiliconization water production pump 504, which is used to pump out the water produced in the desiliconization water production tank 50, so as to pump it into the primary hardness removal tank 20 or directly discharge it to a predetermined water storage point outside.

[0055] In this embodiment, the secondary de-hardening water delivery pipeline is used to deliver the water produced by the de-hardening water production tank 60 to the primary de-siliconization pool 10 or a predetermined water storage point. The predetermined water storage point can be a reserved water point, a fiber ball filter, etc.

[0056] Specifically, the secondary hardness removal water delivery pipeline includes a secondary hardness removal trunk 601 whose one end is connected to the hardness removal water production tank 60, and a first secondary hardness removal branch 602 and a second secondary hardness removal branch 603, both of which are connected to the secondary hardness removal trunk 601 away from the hardness removal water production tank 60. The first secondary hardness removal branch 602 is connected to the primary silicon removal pool 10 at one end away from the secondary hardness removal trunk 601, and the second secondary hardness removal branch 603 is used to be connected to a predetermined water storage point at one end away from the secondary hardness removal trunk 601. The secondary hardness removal trunk 601 is provided with a hardness removal water production pump 604, which is used to pump out the water produced in the hardness removal water production tank 60, thereby pumping it into the primary silicon removal pool 10 or directly discharging it to a predetermined water storage point outside.

[0057] Furthermore, the secondary desiliconization main circuit 501 is provided with a desiliconization water pump bypass 505 arranged in parallel with the desiliconization water pump 504. The desiliconization water pump bypass 505 is used to return part of the produced water pumped out by the desiliconization water pump 504 to the desiliconization water tank 50 when the desiliconization water pump 504 is running, so as to avoid the desiliconization water pump 504 from being damaged due to pressure buildup. The secondary de-hardening main circuit 601 is provided with a de-hardening water pump bypass 605 arranged in parallel with the de-hardening water pump 604. The de-hardening water pump bypass 605 is used to return part of the produced water pumped out by the de-hardening water pump 604 to the de-hardening water tank 60 when the de-hardening water pump 604 is running, so as to avoid the de-hardening water pump 604 from being damaged due to pressure buildup.

[0058] It should be noted that each trunk line, branch line, and bypass line described in the present invention is provided with a corresponding valve structure for controlling the on-off of its own pipeline.

[0059] For example, if the process of first-stage silicon removal and then second-stage silicon removal, and then first-stage hardness removal and then second-stage hardness removal is as follows: the wastewater to be treated passes through the water inlet main line 201, the first water inlet branch line 202, the first-stage silicon removal tank 10, the first-stage silicon removal main line 301, the second-stage silicon removal branch line 303, the second-stage silicon removal high-density sedimentation tank 30, the silicon removal water production pipeline 101, the silicon removal water production tank 50, the second-stage silicon removal main line 501, the first and second-stage silicon removal branches 502, the first-stage hardness removal tank 20, the first-stage hardness removal main line 401, the second-stage hardness removal branch line 403, the second-stage hardness removal high-density sedimentation tank 40, the hardness removal water production pipeline 102, and the hardness removal water production tank 60 in sequence;

[0060] For another example, if the first level hardness removal and then the first level silicon removal are performed, and then the second level silicon removal and then the first level hardness removal and the second level hardness removal are performed, the process is as follows: the wastewater to be treated passes through the water inlet main line 201, the second water inlet branch line 203, the first level hardness removal tank 20, the first level hardness removal main line 401, the first level hardness removal branch line 402, the first level silicon removal tank 10, the first level silicon removal main line 301, the second level silicon removal branch line 303, the second level silicon removal high-density sedimentation tank 30, the silicon removal water production pipeline 101, the silicon removal water production tank 50, the second level silicon removal main line 501, the first and second level silicon removal branches 502, the first level hardness removal tank 20, the first level hardness removal main line 401, the second level hardness removal branch line 403, the second level hardness removal high-density sedimentation tank 40, the hardness removal water production pipeline 102, and the hardness removal water production tank 60.

[0061] Of course, the combination of test processes is not limited to the above exemplary embodiments, and will not be listed one by one here.

[0062] In summary, the first- and second-level switchable test structure 100 of the hardness and silicon removal reaction tank provided by the present invention switches the flow direction of wastewater in the first-level silicon removal tank 10, the first-level silicon removal tank 20, the second-level silicon removal high-density sedimentation tank 30, the second-level hardness removal high-density sedimentation tank 40, the silicon removal water production tank 50, and the hardness removal water production tank 60 through the water inlet pipeline, the first-level / secondary silicon removal water supply pipeline, and the first-level / secondary hardness removal water supply pipeline, thereby testing the optimal reaction sequence of the first-level / secondary hardness and silicon removal, and the operation is simple.

[0063] The present invention is not limited to what is described in the specification and implementation modes, and therefore additional advantages and modifications can be easily realized by those skilled in the art. Therefore, without departing from the spirit and scope of the general concept defined by the claims and their equivalents, the present invention is not limited to the specific details, representative devices, and illustrative examples shown and described herein.

Claims

1. A one-stage and two-stage switchable test structure for a hardness and silicon removal reaction pool, characterized in that: include: Primary silicon removal tank, primary hardness removal tank, secondary silicon removal high-density sedimentation tank, secondary hardness removal high-density sedimentation tank; A desiliconization water production tank, the desiliconization water production tank is used to receive the produced water discharged from the secondary desiliconization high-density sedimentation tank; A hardness removal water production tank, the hardness removal water production tank is used to receive the produced water discharged from the secondary hardness removal high-density sedimentation tank; A water inlet pipeline, the water inlet pipeline is used to transport the wastewater to be treated to the primary desiliconization tank or the primary dehardness removal tank; A primary desiliconization water pipeline, the primary desiliconization water pipeline is used to transport the wastewater treated in the primary desiliconization tank to the primary hardness removal tank or the secondary desiliconization high-density sedimentation tank; A primary hardness removal water delivery pipeline, the primary hardness removal water delivery pipeline is used to transport the wastewater treated in the primary hardness removal tank to the primary silicon removal tank or the secondary hardness removal high-density sedimentation tank; A secondary desiliconization water delivery pipeline, the secondary desiliconization water delivery pipeline is used to deliver the produced water from the desiliconization water production tank to the primary dehardness removal tank or a predetermined water storage point; A secondary desiliconization water delivery pipeline is used to deliver the produced water from the desiliconization water production tank to the primary desiliconization pool or a predetermined water storage point.

2. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 1, characterized in that: The water inlet pipeline includes a water inlet main line and a first water inlet branch and a second water inlet branch both connected to the water inlet main line; the first water inlet branch is connected to the primary silicon removal tank, and the second water inlet branch is connected to the primary hardness removal tank; the water inlet main line is provided with a water inlet pump, and the water inlet pump is used to pump the untreated wastewater in the water inlet main line into the first water inlet branch and the second water inlet branch.

3. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 2, characterized in that: The water inlet trunk is provided with a water inlet pump bypass arranged in parallel with the water inlet pump; the water inlet pump bypass is used to return part of the untreated wastewater pumped out by the water inlet pump to the front end of the water inlet trunk when the water inlet pump is running.

4. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 1, characterized in that: The first-level desiliconization water supply pipeline includes a first-level desiliconization trunk line connected to the first-level desiliconization tank at one end, a first-level desiliconization branch line and a second-level desiliconization branch line both connected to the first-level desiliconization trunk line away from the first-level desiliconization tank; the first-level desiliconization branch line is connected to the first-level hardness removal tank at one end away from the first-level desiliconization trunk line, and the second-level desiliconization branch line is connected to the second-level desiliconization high-density sedimentation tank at one end away from the first-level desiliconization trunk line; the first-level desiliconization trunk line is provided with a desiliconization pump, and the desiliconization pump is used to pump out the wastewater treated in the first-level desiliconization tank.

5. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 4, characterized in that: The first-level hardness removal water supply pipeline includes a first-level hardness removal main line connected to the first-level hardness removal pool at one end, a first-level hardness removal branch line and a second-level hardness removal branch line both connected to the first-level hardness removal main line away from the first-level hardness removal pool; the first-level hardness removal branch line is connected to the first-level silicon removal pool at one end away from the first-level hardness removal main line, and the second-level hardness removal branch line is connected to the second-level hardness removal high-density sedimentation pool at one end away from the first-level hardness removal main line; the first-level hardness removal main line is provided with a hardness removal pump, and the hardness removal pump is used to pump out the wastewater treated in the first-level hardness removal pool.

6. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 5, characterized in that: The first-level silicon removal main line is provided with a silicon removal pump bypass arranged in parallel with the silicon removal pump; the silicon removal pump bypass is used to return part of the wastewater pumped out by the silicon removal pump to the front end of the first-level silicon removal main line when the silicon removal pump is running; the first-level hardness removal main line is provided with a hardness removal pump bypass arranged in parallel with the hardness removal pump; the hardness removal pump bypass is used to return part of the wastewater pumped out by the hardness removal pump to the front end of the first-level hardness removal main line when the hardness removal pump is running.

7. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 1, characterized in that: The secondary desiliconization water delivery pipeline includes a secondary desiliconization trunk line whose one end is connected to the desiliconization water production tank, a first secondary desiliconization branch line and a second secondary desiliconization branch line both connected to the secondary desiliconization trunk line away from the desiliconization water production tank; One end of the first secondary desiliconization branch away from the secondary desiliconization trunk line is connected to the first hardness removal tank, and one end of the second secondary desiliconization branch away from the secondary desiliconization trunk line is used to connect with a predetermined water storage point; the secondary desiliconization trunk line is provided with a desiliconization water production pump, and the desiliconization water production pump is used to pump out the water in the desiliconization water production tank.

8. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 7, characterized in that: The secondary hardness removal water supply pipeline includes a secondary hardness removal main line connected to the hardness removal water production tank at one end, a first secondary hardness removal branch and a second secondary hardness removal branch, both of which are connected to the secondary hardness removal main line away from the side of the hardness removal water production tank; the first secondary hardness removal branch is connected to the first silicon removal pool at one end away from the secondary hardness removal main line, and the second secondary hardness removal branch is used to be connected to a predetermined water storage point at one end away from the secondary hardness removal main line; the secondary hardness removal main line is provided with a hardness removal water production pump, and the hardness removal water production pump is used to pump out the water in the hardness removal water production tank.

9. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 8, characterized in that: The secondary desiliconization main line is provided with a desiliconization water production pump bypass arranged in parallel with the desiliconization water production pump; the desiliconization water production pump bypass is used to return part of the water pumped out by the desiliconization water production pump to the desiliconization water production tank when the desiliconization water production pump is running; the secondary dehardness main line is provided with a dehardness water production pump bypass arranged in parallel with the dehardness water production pump; the dehardness water production pump bypass is used to return part of the water pumped out by the dehardness water production pump to the dehardness water production tank when the dehardness water production pump is running.

10. The one-stage and two-stage switchable test structure of the hardness and silicon removal reaction pool according to claim 1, characterized in that: A silicon removal water production pipeline is provided between the secondary silicon removal high-density sedimentation tank and the silicon removal water production tank, and the water overflowing from the secondary silicon removal high-density sedimentation tank after the reaction enters the silicon removal water production tank through the silicon removal water production pipeline; a hardness removal water production pipeline is provided between the secondary hardness removal high-density sedimentation tank and the hardness removal water production tank, and the water overflowing from the secondary hardness removal high-density sedimentation tank after the reaction enters the hardness removal water production tank through the hardness removal water production pipeline.

Images