A dual-layer inductively coupled plasma generating device
By using a double-layer air intake structure and a threaded connection for the plasma generator, the problems of complex structure and high cost of traditional ICP devices are solved, achieving simplicity and cost reduction, and improving the uniformity of plasma air intake and processing efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-27
- Publication Date
- 2026-03-20
AI Technical Summary
Traditional ICP generators are complex in structure, have low energy utilization efficiency, and poor airtightness, resulting in uneven plasma intake and limiting their application in optical component processing.
It adopts a dual-intake structure, using a middle layer tube and an outer layer tube to fix the base, lower connecting seat and other components. Simplified gas distribution and cooling are achieved through threaded connections and insulating protective sleeves, reducing the cost of the device.
It simplifies the disassembly and installation of plasma generators, reduces manufacturing costs, and improves processing efficiency through replaceable nozzles.
Smart Images

Figure CN119729982B_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The application belongs to the field of plasma generator, and particularly relates to a double-layer gas inlet type inductive coupled plasma generating device. BACKGROUND
[0002] The inductive coupled plasma technology is widely applied in the fields of material processing, surface treatment, semiconductor manufacturing and analytical instrument, etc. The traditional ICP generating device usually has problems of complex structure of the generator, low energy utilization efficiency, high device cost, etc., which limit its application in the high-efficiency and high-precision processing of optical elements. In the prior art, the structure of the generator usually adopts a three-layer gas inlet type structure, the structure is complex, the connection modes of different gas inlet pipes are different, the gas tightness is poor, the gas distribution in the plasma generating cavity is uneven, and the overall performance of the device is reduced. Therefore, a new type of inductive coupled plasma generating device which can effectively solve the above problems is urgently needed to improve the simplicity of the plasma, improve the connection mode of the plasma gas inlet pipe and adjust the gas distribution. SUMMARY
[0003] The technical problem to be solved by the application is to design a plasma generating device structure which can improve the simplicity and reduce the cost of the device.
[0004] To achieve the above-mentioned purpose, the application provides a double-layer gas inlet type inductive coupled plasma generating device, which comprises a middle layer pipe fixing base, an outer layer pipe fixing base, a lower connecting seat, a beam current cooling nozzle, a middle layer pipe gas inlet nozzle, an outer layer pipe gas inlet nozzle, a middle layer pipe, an outer layer pipe, a nozzle fixing bolt and a bolt insulation protective sleeve. The outer layer pipe gas inlet nozzle is connected with the outer layer pipe fixing base through threads, the gas inlet structure is a tangential gas inlet structure, and under the constraint of the inner wall of the outer layer pipe and the outer wall of the middle layer pipe fixing base, the gas realizes the cooling effect on the inner wall of the outer layer pipe. The middle layer pipe gas inlet nozzle is connected with the middle layer pipe fixing base through threads, the middle layer pipe is connected with the middle layer pipe bottom, and the gas directly enters the middle layer pipe. The middle layer pipe fixing base and the outer layer pipe fixing base are both provided with through holes, the lower connecting seat is provided with a threaded hole, and the above three components are connected through bolts. The beam current cooling nozzle is connected with the bottom of the outer layer pipe through the nozzle fixing bolt, and the outer surface of the connecting bolt is sleeved with the bolt insulation protective sleeve which is used for insulation.
[0005] Compared with the prior art, the technical scheme of the application has the following beneficial effects:
[0006] 1. The plasma generating device adopts a double-layer gas inlet mode, uses two gas inlet pipes, adopts three bases for connection, has a simple connection mode, simple manufacturing material, and a compact structure, can effectively reduce the disassembly and installation difficulty of the plasma generator, and effectively reduce the manufacturing cost.
[0007] 2. This plasma generator can be equipped with nozzles of different diameters as needed, and the threaded connection method can effectively improve the replaceability of the nozzles. Attached Figure Description
[0008] Figure 1 This is a schematic diagram of an inductively coupled plasma generator suitable for low power according to the present invention.
[0009] Figure 2 This is a cross-sectional view of the plasma generating apparatus of the present invention;
[0010] Figure 3 Diagram showing the base fixing process;
[0011] Figure 4 This is a schematic diagram of some parts.
[0012] The attached figures are labeled as follows: 1-Connecting plate; 2-Middle layer tube fixing base; 3-Outer layer tube fixing base; 4-Lower connecting seat; 5-Bolt insulating protective sleeve; 6-Nozzle fixing bolt; 7-Beam cooling nozzle; 8-Middle layer tube air inlet; Middle layer tube air inlet structure 8-1; 9-Outer layer tube air inlet; Outer layer tube air inlet structure 9-1; 10-Middle layer tube; 11-Outer layer tube; 12-Nozzle sealing ring; 13-Base fixing bolt. Detailed Implementation
[0013] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the invention. Furthermore, the technical features involved in the various embodiments of this invention described below can be combined with each other as long as they do not conflict with each other. To achieve the above objectives, this invention adopts the following technical solution.
[0014] This invention provides a dual-inlet inductively coupled plasma generator, such as... Figure 1 and Figure 2 As shown, it includes a connecting plate 1, a middle tube fixing base 2, an outer tube fixing base 3, a lower connecting seat 4, a bolt insulating protective sleeve 5, a nozzle fixing bolt 6, a beam cooling nozzle 7, a middle tube air inlet 8, an outer tube air inlet 9, a middle tube 10, an outer tube 11, a nozzle sealing ring 12, and a base fixing bolt 13.
[0015] The outer tube air inlet 9 is connected to the outer tube fixing base 3 by threads, such as Figure 2As shown, the outer tube gas inlet structure 9-1 is a tangential gas inlet structure, and under the constraint of the inner wall of the outer tube 11 and the outer wall of the middle tube fixing base 2, the gas realizes the cooling effect on the inner wall of the outer tube 11; the middle tube gas inlet nozzle 8 is connected with the middle tube fixing base 2 through threads, the middle tube 10 is connected with the middle tube fixing base 2, and the gas directly enters the middle tube 10 through the middle tube gas inlet structure 8-1; the middle tube fixing base 2 and the outer tube fixing base 3 are both provided with through holes as shown, and the lower connecting seat 4 is provided with threaded holes, and the above three components are connected through bolts; Figure 3 The beam cooling nozzle 7 is connected with the bottom of the outer tube 11 through the nozzle fixing bolt 6, and the bolt insulation protective sleeve 5 for insulation is sleeved outside the nozzle fixing bolt 6;
[0016] Further, the middle tube fixing base 2, the outer tube fixing base 3 and the lower connecting seat 4 are made of polytetrafluoroethylene material, which avoids conduction with the induction coil and is easy to process the structure.
[0017] Further, the middle tube fixing base 2, the outer tube fixing base 3 and the lower connecting seat 4 are provided with fixed-position threaded holes for connection and matching, and the base fixing bolt 13 is inserted into the threaded hole to realize the connection of the three.
[0018] Further, the middle tube 10 is made of corundum material, and the middle tube 10 is divided into upper and lower ends, the lower end has a larger radius than the upper end, the gas flow rate is improved, and the gas is fully cooled to the outer tube 11.
[0019] Further, the upper end of the beam cooling nozzle 7 has a larger diameter than the outer diameter of the outer tube 11, and the upper end is provided with a graphite nozzle sealing ring 12 for sealing.
[0020] Further, the beam cooling nozzle 7 is made of alumina material, and the diameter of the outlet section can be adjusted according to different needs.
[0021] Further, the outer tube gas inlet nozzle 9 and the inner tube gas inlet nozzle 8 are standard quick-release gas nozzles, and the size can be selected as needed.
[0022] The specific connection mode of the double-layer gas inlet type induction coupled plasma generating device is as shown in the figure Figure 4 The specific installation sequence of the generating device is: first, the middle tube fixing base 2, the outer tube fixing base 3 and the lower connecting seat 4 are connected according to Figure 3The middle layer pipe 10 and the outer layer pipe 11 are inserted in turn by means of bolt fixation, and after the basic installation is completed, the plasma generating device is connected with the plasma matcher by means of the connecting plate 1, then the induction coil is installed outside the outer layer pipe 11, finally the beam current cooling nozzle 7 is installed at the bottom of the outer layer pipe 11, since the beam current cooling nozzle 7 is provided with the graphite nozzle sealing ring 12, the cooperation between the beam current cooling nozzle 7 and the outer layer pipe 11 can be ensured, then the nozzle fixing bolt 6, the connecting nut and the bolt insulation protection sleeve 5 are installed, and the installation of the generating device is completed.
[0023] In the embodiment, the induction coil is sleeved outside the outer layer pipe 11, the induction coil is connected with the matcher, the radio frequency power supply inputs the alternating current power supply to the matcher, the induction coil generates the plasma excitation required excitation environment, the electric spark is applied to the plasma outer layer pipe, and finally the plasma jet is excited.
[0024] In the embodiment, the outer layer pipe inlet nozzle 9 is connected to the cooling gas such as helium and argon into the outer layer pipe 11, the middle layer pipe inlet nozzle 8 is connected to the reaction gas such as carbon tetrafluoride into the middle layer pipe 10, the flow of the cooling gas is controlled to be 10-20 L / min, the flow of the reaction gas is controlled to be 0-100 ml / min, the pressure of the cooling gas is controlled to be below 0.4 Mpa, and the pressure of the reaction gas is controlled to be below 0.4 Mpa.
[0025] In the embodiment, the beam current cooling nozzle 7 is used for the contraction of the plasma jet, and the resolution of the plasma is improved; different outlet diameters of the plasma nozzle can be replaced according to the processing requirement, the flow of the reaction gas and the cooling gas needs to be adjusted according to the different diameters of the plasma nozzle, and the stability of the plasma excitation state is ensured.
[0026] The above only describes the preferred embodiments of the present application, and it should be noted that the ordinary skilled in the art can make several improvements and replacements without departing from the technical principles of the present application, and these improvements and replacements should be regarded as the protection scope of the present application.
[0027] The above only describes the preferred embodiments of the present application, and it should be noted that the ordinary skilled in the art can make several improvements and replacements without departing from the technical principles of the present application, and these improvements and replacements should be regarded as the protection scope of the present application.
Claims
1. A dual-inlet inductively coupled plasma generator, characterized in that, include: The system comprises a middle layer tube fixing base, an outer layer tube fixing base, a lower connecting seat, a beam cooling nozzle, a middle layer tube air inlet, an outer layer tube air inlet, a middle layer tube, an outer layer tube, a nozzle fixing bolt, and a bolt insulating protective sleeve. The outer layer tube air inlet is threaded to the outer layer tube fixing base, and the air inlet structure is a tangential air inlet structure. Under the constraint of the inner wall of the outer layer tube and the outer wall of the middle layer tube fixing base, the gas achieves a cooling effect on the inner wall of the outer layer tube. The middle layer tube air inlet nozzle is threaded to the middle layer tube fixing base, and the middle layer tube is connected to the middle layer tube fixing base, allowing the gas to directly enter the middle layer tube. Both the middle layer tube fixing base and the outer layer tube fixing base have through holes, and the lower connecting seat has a threaded hole. The above three components are connected by bolts. The beam cooling nozzle is connected to the bottom of the outer layer tube by the nozzle fixing bolt, and the bolt insulating sleeve is fitted over the bolt for insulation. The upper diameter of the beam cooling nozzle is larger than the outer diameter of the outer tube, and the upper part is equipped with a graphite nozzle sealing ring for sealing.
2. The dual-inlet inductively coupled plasma generator according to claim 1, characterized in that, The middle tube fixing base, outer tube fixing base, and lower connecting base are all made of polytetrafluoroethylene.
3. The dual-inlet inductively coupled plasma generator according to claim 1, characterized in that, The middle layer tube is made of corundum and is divided into upper and lower ends, with the lower end having a larger radius than the upper end.
4. The dual-inlet inductively coupled plasma generator according to claim 1, characterized in that, The beam cooling nozzle is made of alumina, and the diameter of the outlet section can be adjusted according to different requirements.
5. The dual-inlet inductively coupled plasma generator according to claim 1, characterized in that, The outer tube air inlet and the inner tube air inlet are quick-release air inlets, and their sizes are selected as needed.
Citation Information
Patent Citations
ICP generating device with replaceable nozzle in plasma chemical etching equipment
CN106252191A