Exhaust pipeline semiconductor coating equipment with anti-blocking function

By adopting a combination of auxiliary structure and monitoring structure in the exhaust pipeline of semiconductor coating equipment, the problem of crystal blockage in the equipment pipeline is solved, efficient crystal cleaning and real-time monitoring are achieved, extending the service life of the equipment and improving operating efficiency.

CN119736598AActive Publication Date: 2025-04-01苏州国微纳半导体设备有限公司
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Patent Information

Application Number
CN202411882842.4
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-12-19
Publication Date
2025-04-01
Estimated Expiration
2044-12-19

AI Technical Summary

Technical Problem

The internal pipelines of semiconductor coating equipment are prone to crystallization and blockage, which affects the normal use and service life of the equipment.

Method used

A semiconductor coating equipment for exhaust pipes with anti-blocking function was designed, and a method of combining auxiliary structure and monitoring structure was adopted. The auxiliary structure includes a limit ring, ball, control wheel and belt, which is used to clean the crystallization in the pipeline; the monitoring structure monitors the thickness of the crystal layer in real time through infrared emitters and receivers, and triggers the alarm to promptly warning and position.

Benefits of technology

It effectively improves the removal capacity of crystallization in the pipeline, extends the service life of the equipment, reduces maintenance costs, and improves the operating efficiency and safety of the equipment through real-time monitoring and alarm systems.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention relates to the technical field of semiconductor coating equipment, and discloses exhaust pipeline semiconductor coating equipment with an anti-blocking function, which comprises a semiconductor coating machine, a plurality of exhaust pipes are arranged in the semiconductor coating machine, and the exhaust pipes are used for gas in and out of the semiconductor coating machine. The exhaust pipeline semiconductor coating equipment with the anti-blocking function comprises an exhaust pipe, the two sides of the exhaust pipe are provided with a connecting shell and a connecting base correspondingly, a cavity is formed in the connecting shell, one side of the connecting shell is provided with an auxiliary structure, and the auxiliary structure is provided with a monitoring structure. And the auxiliary structure is mainly used for cleaning crystals condensed in the pipeline through the moving ring after one section of the pipeline is detached and opened when the crystals in the pipeline are condensed to be thick, the cleaning efficiency is high, the cleaning speed is high, and the maintenance efficiency is improved.
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Description

Technical Field

[0001] The invention relates to the technical field of semiconductor coating equipment, and in particular to an exhaust pipe semiconductor coating equipment with an anti-clogging function. Background Art

[0002] In the patent application with application announcement number CN117512526A, it includes a coating cabinet, a clamping component arranged in the coating cabinet for fixing the semiconductor to be coated, a vacuum component arranged outside the coating cabinet for vacuumizing the coating cabinet, and an electron gun device arranged below the semiconductor to be coated; a cleaning component for cleaning the clamping component is arranged in the coating cabinet, and the cleaning component includes a linear guide rail arranged on the top of the coating cabinet, a cleaning rod arranged on the electric slider of the linear guide rail, and a cleaning bar arranged below the cleaning rod through a plurality of cleaning cylinders. The advantages are: first, the clamping component fixes the semiconductor to be coated in the inner cavity of the coating cabinet, and then the vacuum component draws the inner cavity of the coating cabinet to a vacuum state. The electron gun equipment is powered on and starts to heat the inner cavity of the coating cabinet. The electron gun equipment heats and evaporates the coating material by converting the kinetic energy of electrons into thermal energy. The coating material forms a beam and is adsorbed on the surface of the semiconductor to be coated. Finally, the electric slider on the linear guide rail drives the cleaning bar to move through the cleaning straight rod and the cleaning cylinder. The cleaning bar can clean the residual coating material on the surface of the fixture frame and the locking strip, thereby improving the problem of difficult cleaning of the coating material on the surface of the fixture body.

[0003] In the prior art including the above-mentioned patents, pipeline blockage of semiconductor coating equipment often comes from uneven temperature inside the pipeline, which leads to crystal deposition. Blockage in the exhaust main pipeline will affect the vacuum performance in the core cavity and directly affect the process quality; even more seriously, the gas in the cavity cannot be discharged after blockage, which will cause the risk of equipment damage. Summary of the invention

[0004] The problem to be solved by the present invention is that the internal pipelines of semiconductor coating equipment are prone to crystallization blockage, which affects the normal use and service life of the equipment.

[0005] In order to solve the above technical problems, the technical solution of the present invention is: a semiconductor coating device with an exhaust pipeline having an anti-blocking function, comprising a semiconductor coating machine, wherein a plurality of exhaust pipes are arranged inside the semiconductor coating machine, wherein the exhaust pipes are used for the gas to enter and exit the semiconductor coating machine, and a connecting shell and a connecting seat are arranged on both sides of the exhaust pipe, wherein a cavity is opened inside the connecting shell, and an auxiliary structure is arranged on one side of the connecting shell, and a monitoring structure is arranged on the auxiliary structure; The auxiliary structure includes a limiting ring, the inner wall of which is fixedly connected to the bottom of the connecting shell cavity, there are two limiting rings which are symmetrically arranged in a semicircle, a plurality of balls are arranged in a circular array on the surface of the limiting ring, control wheels are rotatably provided on the top and bottom of the cavity, belts are provided on the surfaces of the control wheels and the limiting rings, and the two control wheels are connected by belt transmission.

[0006] Preferably, a fixing ring is fixedly provided on one side of the connecting shell, four sliding grooves are opened on one side of the fixing ring, a threaded rod is fixedly provided on one side of the control wheel, and one side of the threaded rod passes through the connecting shell and the fixing ring in sequence and extends to the outside of the fixing ring.

[0007] Preferably, toothed plates are fixedly provided on the front and back sides of the fixed ring, a movable ring is threadedly fitted on the threaded rod, and empty grooves are provided on the front and rear sides of one side of the movable ring, and the empty grooves are semicircular.

[0008] Preferably, the front and back sides of the movable ring are rotatably connected to a rotating shaft, a torque spring is provided inside the rotating shaft, a touch plate is provided on the front side of the rotating shaft, impact plates are provided on the top and bottom of the front side of the rotating shaft, and impact pins are fixed on both sides of the front side of the impact plate.

[0009] Preferably, a motor is provided at the top of the inner wall of the connecting shell, a power wheel is fixedly provided on the output shaft of the motor, a driven wheel is fixedly provided on one side of one of the control wheels, and the driven wheel is meshed with the power wheel.

[0010] Preferably, the monitoring structure comprises an infrared emitter, one side of the infrared emitter is slidably connected to the slide slot, and a limit screw is provided on the top of the infrared emitter, and the limit screw can control the infrared emitter to move up and down along the slide slot.

[0011] Preferably, an alarm is provided on the top of the connecting seat, a movable ring is fixedly provided on one side of the connecting seat, a clamping groove is provided on one side of the movable ring, and the clamping groove is adapted to the threaded rod.

[0012] Preferably, an infrared receiver is provided on one side of the movable ring, the infrared receiver and the infrared transmitter are used in conjunction with each other, and the infrared receiver is electrically connected to the alarm.

[0013] Preferably, flanges are provided on both sides of the exhaust pipe, auxiliary pipes are fixedly connected to both sides of the top of the exhaust pipe, and control valves are provided on both sides of the auxiliary pipe.

[0014] Compared with the prior art, the technical solution of the present invention has the following advantages: (1) The semiconductor coating machine is provided with an auxiliary structure and a monitoring structure, which can cooperate with each other to monitor and process the crystallization in the equipment pipeline. The auxiliary structure is mainly used when the crystals in the pipeline are thick. After the user disassembles a section of the pipeline and opens it, the crystals condensed inside the pipeline can be quickly cleaned through the moving ring. The cleaning efficiency is high and the speed is fast, which improves the maintenance efficiency. The movement of the moving ring is controlled by the cooperation of two threaded rods, and the two threaded rods are controlled to rotate by a motor, which reduces energy consumption and is more energy-saving and environmentally friendly. There are also impact plates on both sides of the moving ring. The impact plate itself is inclined and can be linked with the tooth plate during the movement of the moving ring, so that the impact plate will first rotate with the rotating shaft as the center to squeeze the crystals. Secondly, when it moves to the middle position of the tooth plate, the torque spring inside the rotating shaft will control the impact plate to rebound quickly and produce vibration and impact on the pipe wall, forming a dual-purpose plate to squeeze and crush the crystals while reducing the vibration to avoid the residual small crystals attached to the pipeline, further improving the crystal removal ability, making the semiconductor coating equipment run more smoothly and have a longer service life; (2) The monitoring structure monitors the thickness change of the crystal layer in the pipeline in real time through an infrared transmitter at one end and an infrared receiver at the other end. When there is no crystal layer or the crystal layer does not reach the thickness that affects the operation of the equipment, the straight infrared light generated by the infrared transmitter will be received by the infrared receiver. When the crystal layer is squeezed to a certain thickness, the crystal layer will block the straight infrared light. At this time, the infrared receiver will trigger the alarm after not receiving infrared light for a period of time. The user can get the first warning and quickly locate the clean pipeline according to the sound of the alarm, and quickly locate the crystal pipeline among several pipelines. The position of the infrared transmitter and the receiver can also be adjusted. The thickness of the crystal to be monitored can be adjusted according to actual needs. The movable ring at this end of the connector is snap-connected with the threaded rod and the toothed plate, and can be directly disassembled manually, allowing the user to drop the broken crystals directly to the outside of the equipment when cleaning the pipeline. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a schematic diagram of the overall structure of the semiconductor coating machine of the present invention; Figure 2 It is a schematic diagram of the internal structure of the semiconductor coating machine of the present invention; Figure 3 This is a schematic diagram of the exhaust pipe structure of the present invention; Figure 4 It is a schematic diagram of the auxiliary structure of the present invention; Figure 5 It is a right side schematic diagram of the motor structure of the present invention; Figure 6 It is a left side schematic diagram of the fixing ring structure of the present invention; Figure 7 This is a schematic diagram of the structure of the infrared transmitter of the present invention; Figure 8 This is an exploded schematic diagram of the auxiliary structure of the present invention; Fig. 9 This is an exploded schematic diagram of the mobile ring structure of the present invention; Fig.10 This is a schematic diagram of the structure of the mobile ring of the present invention; Fig.11 This is a schematic diagram of the impact plate structure of the present invention; Fig.12 It is a schematic diagram of the belt structure of the present invention; Fig.13 It is an enlarged schematic diagram of the structure at location A of the present invention.

[0016] In the figure: 1. semiconductor coating machine; 2. exhaust pipe; 3. control valve; 4. auxiliary pipe; 5. flange; 6. connecting shell; 7. connecting seat; 8. monitoring structure; 801. infrared receiver; 802. movable ring; 803. limit screw; 804. infrared transmitter; 9. auxiliary structure; 901. threaded rod; 902. tooth plate; 903. fixed ring; 904. movable ring; 905. limit ring; 906. empty groove; 907. driven wheel; 908. belt; 909. ball; 910. control wheel; 911. impact plate; 912. rotating shaft; 913. touch plate; 10. motor; 11. power wheel; 12. alarm. DETAILED DESCRIPTION

[0017] In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.

[0018] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. "Include" or "comprise" and other similar words used in the present disclosure mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and other similar words are not limited to physical or mechanical connections, but may also include electrical connections, whether direct or indirect. "Up", "down", "left", "right", etc. are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0019] like Figures 1 to 13As shown, the semiconductor coating equipment of an exhaust pipeline with anti-clogging function provided by the present invention comprises a semiconductor coating machine 1, a plurality of exhaust pipes 2 are arranged inside the semiconductor coating machine 1, the exhaust pipes 2 are used for the gas to enter and exit the semiconductor coating machine 1, a connecting shell 6 and a connecting seat 7 are arranged on both sides of the exhaust pipe 2, a cavity is opened inside the connecting shell 6, an auxiliary structure 9 is arranged on one side of the connecting shell 6, and a monitoring structure 8 is arranged on the auxiliary structure 9; The auxiliary structure 9 includes a limiting ring 905, the inner wall of which is fixedly connected to the bottom of the cavity of the connecting shell 6. There are two limiting rings 905, which are symmetrically arranged in a semicircle. A plurality of balls 909 are arranged in a circular array on the surface of the limiting ring 905. Control wheels 910 are rotatably provided at the top and bottom of the cavity. Belts 908 are provided on the surfaces of the control wheels 910 and the limiting rings 905, and the two control wheels 910 are connected by the belts 908.

[0020] A fixing ring 903 is fixedly provided on one side of the connecting shell 6, and four sliding grooves are opened on one side of the fixing ring 903. A threaded rod 901 is fixedly provided on one side of the control wheel 910, and one side of the threaded rod 901 passes through the connecting shell 6 and the fixing ring 903 in sequence and extends to the outside of the fixing ring 903.

[0021] Tooth plates 902 are fixed on the front and back of the fixed ring 903, and a movable ring 904 is threadedly matched on the threaded rod 901. A slot 906 is provided on the front and back sides of one side of the movable ring 904. The slot 906 is semicircular in shape. The slot 906 can facilitate the infrared light emitted by the infrared transmitter 804 to avoid obstruction.

[0022] The front and back sides of the movable ring 904 are rotatably connected to a rotating shaft 912, a torque spring is provided inside the rotating shaft 912, a touch plate 913 is provided on the front side of the rotating shaft 912, impact plates 911 are provided on the top and bottom of the front side of the rotating shaft 912, and impact pins are fixed on both sides of the front side of the impact plate 911.

[0023] A motor 10 is disposed at the top of the inner wall of the connecting shell 6 , and a power wheel 11 is fixedly disposed on the output shaft of the motor 10 . A driven wheel 907 is fixedly disposed on one side of one of the control wheels 910 , and the driven wheel 907 is meshed with the power wheel 11 .

[0024] The monitoring structure 8 includes an infrared emitter 804, one side of which is slidably connected to the slide slot, and a limit screw 803 is provided on the top of the infrared emitter 804, which can control the infrared emitter 804 to move up and down along the slide slot.

[0025] An alarm 12 is provided on the top of the connecting seat 7 , and a movable ring 802 is fixedly provided on one side of the connecting seat 7 . A clamping groove is provided on one side of the movable ring 802 , and the clamping groove is adapted to the threaded rod 901 .

[0026] An infrared receiver 801 is disposed on one side of the movable ring 802 . The infrared receiver 801 cooperates with an infrared transmitter 804 . The infrared receiver 801 is electrically connected to the alarm 12 .

[0027] Flanges 5 are provided on both sides of the exhaust pipe 2 , and auxiliary pipes 4 are fixedly connected to both sides of the top of the exhaust pipe 2 . Control valves 3 are provided on both sides of the auxiliary pipe 4 .

[0028] The working principle and use process of the present invention: After the semiconductor coating machine 1 has been running for a long time, crystallization will occur inside the pipeline due to uneven temperature of the internal pipeline. When the crystal layer is thick, it will affect the normal use of the semiconductor coating machine 1. In addition, there are many internal pipelines in the semiconductor coating machine 1 and the main body of the equipment is the pipeline, so the crystallization in the pipeline will directly or indirectly affect the normal use and service life of the equipment. When the user installs the exhaust pipe 2 inside the semiconductor coating machine 1, the user must adjust the crystal thickness according to the size and installation position of the exhaust pipe 2. When monitoring the thickness, the limit screw 803 can be rotated. The limit screw 803 drives the infrared transmitter 804 to move along the slide groove. Similarly, the infrared receiver 801 on the other side is also moved. Use the same method to adjust to the appropriate position. After adjustment, turn on the infrared transmitter 804. The infrared transmitter 804 will emit a straight infrared light which will be received by the infrared receiver 801. After debugging, the device can be installed inside the exhaust pipe 2. First, place the connecting shell 6 and the auxiliary structure 9 on one side of it in the exhaust pipe 2. Then install the connecting seat 7 from another section, so that the connecting seat 7 is connected to the threaded rod 901 and the tooth plate 902. Then the semiconductor coating machine 1 can be used normally. As the use time increases, the crystal gradually becomes thicker. When the thickness of the crystal grows to block the conduction of infrared rays, the infrared receiver 801 will trigger the alarm 12 to sound if it does not receive an infrared signal for a period of time, so that the user can To clean the crystals, the user can quickly locate the position of the alarm pipe according to the alarm sound, and after determining the position, remove one end of the exhaust pipe 2, and start the motor 10 after removal. The motor 10 controls the driven wheel 907 to rotate through the power wheel 11, and the driven wheel 907 drives one of the control wheels 910 to rotate. The control wheel 910 controls the other control wheel 910 to rotate through the belt 908. The rotation of the two control wheels 910 can drive the two threaded rods 901 to rotate. At this time, the moving ring 904 on the threaded rod 901 will move along the inner wall of the pipe to push and clean the crystals on the inner wall of the pipe. While the moving ring 904 moves, the touch plates 913, the impact plates 911 and the rotating shaft 912 on the front and back sides of the moving ring are all inclined. When the touch plate 913 passes through the tooth block on the tooth plate 902, it will drive the rotating shaft 912 to rotate and squeeze the torque spring through squeezing, so that the impact plate 911 becomes parallel to the tooth plate 902. At this time, the impact needle at the front end of the impact plate 911 will squeeze the crystal to break it. When it passes through the tooth block on the tooth plate 902 and reaches the gap position, the torque spring will control the rotating shaft 912 to quickly return to the initial position. The rebound force will control the rear end of the impact plate 911 to hit the inner wall of the pipe, shaking off the tiny crystal fragments until the moving ring 904 moves to the tail of the pipe, remove the connecting seat 7, collect the crystals in the pipe, and after collecting, flip the motor 10 to let the moving ring 904 return to the initial position, and then re-adjust the infrared transmitter 804.

[0029] The above embodiments are only exemplary embodiments of the present invention and are not intended to limit the present invention. The protection scope of the present invention is defined by the claims. Those skilled in the art may make various modifications or equivalent substitutions to the present invention within the essence and protection scope of the present invention, and such modifications or equivalent substitutions shall also be deemed to fall within the protection scope of the present invention.

Claims

1. An exhaust pipe semiconductor coating device with anti-clogging function, comprising a semiconductor coating machine, characterized in that: The semiconductor coating machine (1) is provided with a plurality of exhaust pipes (2) inside, the exhaust pipes (2) are used for gas to enter and exit the semiconductor coating machine (1), a connecting shell (6) and a connecting seat (7) are provided on both sides of the exhaust pipe (2), a cavity is provided inside the connecting shell (6), an auxiliary structure (9) is provided on one side of the connecting shell (6), and a monitoring structure (8) is provided on the auxiliary structure (9); The auxiliary structure (9) comprises a limiting ring (905), the inner wall of which is fixedly connected to the bottom of the cavity of the connection shell (6), the limiting rings (905) are two in number and are symmetrically arranged in a semicircular shape, a plurality of balls (909) are arranged in a circular array on the surface of the limiting ring (905), control wheels (910) are rotatably provided at the top and bottom of the cavity, belts (908) are provided on the surfaces of the control wheels (910) and the limiting rings (905), and the two control wheels (910) are connected in transmission via the belts (908).

2. The semiconductor coating equipment for exhaust pipes with anti-clogging function according to claim 1, characterized in that: A fixing ring (903) is fixedly provided on one side of the connection shell (6), four sliding grooves are provided on one side of the fixing ring (903), a threaded rod (901) is fixedly provided on one side of the control wheel (910), and one side of the threaded rod (901) passes through the connection shell (6) and the fixing ring (903) in sequence and extends to the outside of the fixing ring (903).

3. The semiconductor coating equipment for exhaust pipes with anti-clogging function according to claim 2, characterized in that: The front and back sides of the fixed ring (903) are both fixedly provided with toothed plates (902); the threaded rod (901) is threadedly matched with a movable ring (904); and the front and back sides of one side of the movable ring (904) are both provided with empty grooves (906); the empty grooves (906) are in the shape of a semicircular arc.

4. The semiconductor coating equipment for exhaust pipes with anti-clogging function according to claim 3 is characterized in that: The front and back sides of the movable ring (904) are rotatably connected to a rotating shaft (912), a torque spring is provided inside the rotating shaft (912), a touch plate (913) is provided on the front side of the rotating shaft (912), an impact plate (911) is provided on the top and bottom of the front side of the rotating shaft (912), and impact pins are fixedly provided on both sides of the front side of the impact plate (911).

5. The semiconductor coating equipment for exhaust pipes with anti-clogging function according to claim 1, characterized in that: A motor (10) is provided at the top of the inner wall of the connecting shell (6), and a power wheel (11) is fixedly provided on the output shaft of the motor (10), wherein a driven wheel (907) is fixedly provided on one side of one of the control wheels (910), and the driven wheel (907) is meshed with the power wheel (11).

6. The semiconductor coating equipment for exhaust pipes with anti-clogging function according to claim 1, characterized in that: The monitoring structure (8) comprises an infrared emitter (804), one side of the infrared emitter (804) is slidably connected to the slide groove, and a limit screw (803) is provided on the top of the infrared emitter (804), and the limit screw (803) can control the infrared emitter (804) to move up and down along the slide groove.

7. The semiconductor coating equipment for exhaust pipes with anti-clogging function according to claim 1, characterized in that: An alarm (12) is provided on the top of the connecting seat (7), a movable ring (802) is fixedly provided on one side of the connecting seat (7), and a clamping groove is provided on one side of the movable ring (802), and the clamping groove is adapted to fit the threaded rod (901).

8. The semiconductor coating equipment for exhaust pipes with anti-clogging function according to claim 7, characterized in that: An infrared receiver (801) is provided on one side of the movable ring (802), the infrared receiver (801) and the infrared transmitter (804) are used in conjunction with each other, and the infrared receiver (801) is electrically connected to the alarm (12).

9. The semiconductor coating equipment for exhaust pipes with anti-clogging function according to claim 1, characterized in that: Flanges (5) are provided on both sides of the exhaust pipe (2), auxiliary pipes (4) are fixedly connected to both sides of the top of the exhaust pipe (2), and control valves (3) are provided on both sides of the auxiliary pipe (4).

Citation Information

Patent Citations

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