Discharge arc condition and metal surface sputtering condition observation system and method

Abstract

The invention discloses an observation system for a discharge arc condition and a metal surface sputtering condition, and the system comprises an observation cavity which is provided with an observation window made of a potassium bromide lens, and is filled with inert gas; an impulse voltage generator is arranged outside the observation cavity and is used for applying high-voltage pulses to the anode and the cathode to generate impulse voltage, simulating an actual discharge environment and triggering an electric arc; a camera is arranged outside the observation cavity and used for capturing dynamic changes in the discharge arc and metal surface sputtering process. In the invention, the observation cavity is matched with the impulse voltage generator and the camera, the controller is used for setting the maximum value of the impulse voltage generator, an output signal is matched with the oscilloscope to obtain an impulse current waveform and trigger the camera to shoot, and the camera performs multiple times of transient exposure image superposition on a single schlieren image to obtain a single schlieren image. Time domain continuous observation of electric arc and metal sputtering conditions is realized, and accurate triggering and data recording are facilitated.

Description

Technical Field

[0001] The invention relates to the technical field of discharge and sputtering observation, and in particular to an observation system and method for discharge arc conditions and metal surface sputtering conditions. Background Art

[0002] In the field of high-voltage long-gap discharge channel observation, accurate observation of arc characteristics during discharge and its sputtering effect on metal surface has important scientific and engineering significance. Such observation is crucial for in-depth understanding of discharge mechanism, optimization of discharge equipment design, improvement of discharge stability and prediction of the impact of discharge on materials.

[0003] Traditional observation methods, such as high-speed photography, can provide a certain temporal resolution, but are limited in spatial resolution and synchronous triggering. Moreover, due to the high temperature and brightness of the discharge channel, conventional optical systems often have difficulty directly observing the details of the discharge channel, especially the thermodynamic structure and dynamic development process inside the discharge channel. Therefore, it is difficult to accurately observe the discharge arc and sputtering on the metal surface. Summary of the invention

[0004] The purpose of the present invention is to solve the above-mentioned background technical problems and to provide an observation system and method for discharge arc conditions and metal surface sputtering conditions.

[0005] The purpose of the present invention can be achieved by the following technical solutions:

[0006] An observation system for discharge arc conditions and metal surface sputtering conditions, comprising:

[0007] An observation cavity is provided with a positive electrode and a negative electrode, and the observation port of the observation cavity adopts an observation window made of potassium bromide lens, and the observation cavity is filled with inert gas; an impulse voltage generator is arranged outside the observation cavity, and the impulse voltage generator serves as an excitation source of the discharge arc, and is used to apply high-voltage pulses to the anode and the cathode to generate impulse voltage, simulate the actual discharge environment and trigger the arc; a camera and an oscilloscope are arranged outside the observation cavity, and the camera is used to capture the dynamic changes of the discharge arc and the sputtering process of the metal surface to obtain images and video data, and the oscilloscope is used to trigger the camera; the observation cavity cooperates with the impulse voltage generator and the camera to record the formation, development, and extinction process of the discharge arc and the sputtering phenomenon on the metal surface.

[0008] As a further solution of the present invention: it also includes a controller, which is used to control the voltage rise and fall and release of the impulse voltage generator. The controller is connected to a gas switch and sets the required voltage by controlling the gas switch.

[0009] As a further solution of the present invention: there is a discharge gap between the positive electrode and the negative electrode, and the discharge gap generates arc discharge under the action of a high voltage pulse. The discharge gap is used to control the initiation and propagation of the discharge and affect the discharge characteristics, and further affect the parameters of the plasma.

[0010] As a further solution of the present invention: the camera is connected to an oscilloscope, the oscilloscope is connected to the observation cavity, and the oscilloscope is used to measure the impulse current waveform and the maximum value of the impulse current generated by the discharge excitation.

[0011] As a further solution of the present invention: the impulse voltage generator is composed of a circuit of / μs, . / μs and / .μs, and the impulse voltage generator includes a contactor, an electric voltage regulator, a high-voltage power supply, a grounding switch, a bridge resistor, an inductor and a capacitor.

[0012] As a further solution of the present invention: the camera adopts a telephoto lens, and the telephoto lens is used to magnify the imaging of the arc to highlight the main body of the arc.

[0013] As a further solution of the present invention: the camera adopts a short-focus lens, and the short-focus lens is used to observe the interaction between the electric arc and the surrounding environment.

[0014] As a further solution of the present invention: the shooting frame number of the camera is 300,000 frames, the object distance of the camera is set to 1800 mm, and the image distance is set to 49.2 mm.

[0015] As a further solution of the present invention: the camera is equipped with a filter outside, and the filter wavelength of the filter is 380nm ~ 600nm.

[0016] A method for observing discharge arc conditions and metal surface sputtering conditions, using the system, comprising:

[0017] The maximum value of the impulse voltage generator is set by the controller, and the output signal thereof cooperates with the oscilloscope to obtain the impulse current waveform. The trigger condition is preset to trigger the camera to shoot. The camera superimposes multiple transient exposure images on a single schlieren image. During each transient exposure, the arc is distinguished by the degree of grayscale change, thereby realizing continuous time domain observation of the arc and metal sputtering. After gradually increasing the voltage, the voltage is released, and the camera is triggered by the oscilloscope to shoot, record the impulse current waveform, and verify the accuracy of the waveform.

[0018] Beneficial effects of the present invention:

[0019] (1) In the present invention, the observation chamber cooperates with the impulse voltage generator and the camera, and the maximum value of the impulse voltage generator is set by the controller. The output signal cooperates with the oscilloscope to obtain the impulse current waveform and trigger the camera to shoot. The camera superimposes multiple transient exposure images on a single schlieren image to achieve time-domain continuous observation of the arc and metal sputtering, which is convenient for precise triggering and data recording.

[0020] (2) In the present invention, the voltage is released after being increased step by step, and an oscilloscope is used to trigger a camera to take pictures, record the impulse current waveform, verify the waveform accuracy, and ensure the accuracy and reliability of the experimental data.

[0021] (3) In the present invention, it is convenient for researchers to observe and record in detail the formation, development and extinction process of the discharge arc and the sputtering phenomenon on the metal surface under different voltage, current and environmental conditions. By analyzing the data captured by the camera, the physical mechanism of the discharge process can be deeply understood, which provides a scientific basis for the development of discharge protection technology and the improvement of metal surface treatment technology. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] The present invention will be further described below in conjunction with the accompanying drawings.

[0023] Figure 1 It is a structural schematic diagram of an observation system for discharge arc conditions and metal surface sputtering conditions of the present invention;

[0024] Figure 2 It is a flow chart of the method for observing the discharge arc condition and the metal surface sputtering condition of the present invention;

[0025] Figure 3 It is a synchronous timing diagram of the observation system of the discharge arc condition and the metal surface sputtering condition of the present invention.

[0026] In the figure:

[0027] 1. Controller; 2. Gas switch; 3. Impulse voltage generator; 4. Observation chamber; 5. Observation window; 6. Camera; 7. Oscilloscope. DETAILED DESCRIPTION

[0028] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0029] See also Figure 1As shown, the present invention is an observation system for discharge arc conditions and metal surface sputtering conditions, comprising: an observation chamber 4, in which a positive electrode and a negative electrode are arranged. There is a discharge gap between the positive electrode and the negative electrode, and the discharge gap can generate arc discharge under the action of a high voltage pulse. The discharge gap is used to control the initiation and propagation of the discharge and affect the discharge characteristics, further affect the parameters of the plasma, and directly affect the sputtering efficiency and the quality of the deposited film.

[0030] Among them, the observation port of the observation cavity 4 adopts an observation window 5 made of potassium bromide lenses. The potassium bromide lenses can make the observed internal conditions of the cavity clearer and can reduce the interference caused by the physical properties of the metal or environmental factors. From an optical perspective, the observation window 5 made of potassium bromide lenses is convenient for observing and analyzing the details of the discharge process. The observation cavity 4 is filled with an inert gas. In this embodiment, the inert gas is argon. The observation cavity filled with argon gas serves as a closed and controllable environment, which can ensure that the discharge arc and sputtering process are carried out under stable and safe conditions, and simulate the discharge conditions of the gas discharge tube, as well as the gas pressure and gas conditions of the gas discharge tube. In addition, argon gas can reduce oxidation during the discharge process.

[0031] An impulse voltage generator 3 is arranged outside the observation chamber 4. The impulse voltage generator 3 serves as an excitation source for the discharge arc and is used to apply a high voltage pulse (i.e., a pulse signal) to the anode and cathode to generate an impulse voltage, simulate the actual discharge environment, and trigger an arc. The impulse voltage generator 3 is composed of 8 / 20μs, 2.5 / 50μs, and 2 / 15.5μs loops, and the impulse voltage generator 3 includes a contactor, an electric voltage regulator, a high voltage power supply, a grounding switch, a bridge resistor, an inductor, and a capacitor. The 8 / 20μs impulse voltage generator 3 can generate a voltage pulse of at least 20kV, so that the discharge gap can be discharged to a greater extent.

[0032] The observation system for the discharge arc condition and the metal surface sputtering condition also includes a controller 1, which includes but is not limited to a computer device. The controller 1 is connected to the impulse voltage generator 3, and the controller 1 is used to control the voltage rise and fall and release of the impulse voltage generator 3. The controller 1 is also connected to the gas switch 2, and the required voltage is set by controlling the gas switch 2 to conveniently and effectively control the impulse voltage source of the experiment. Specifically, the gas switch 2 controls the opening and closing of the high-voltage switch of the impulse voltage generator 3, that is, by manually controlling the air intake and outlet of the gas switch 2, the high-voltage switch can be quickly opened and closed, thereby accurately controlling the generation and application of high-voltage pulses. This design is crucial to ensure the accuracy and reliability of the discharge experiment.

[0033] A camera 6 is arranged outside the observation cavity 4, and the camera 6 is used to capture the dynamic changes in the discharge arc and the metal surface sputtering process to obtain images and video data. The camera 6 adopts a high-speed camera, which is a device that can capture video images at a high frame rate and is commonly used in the fields of scientific research, industrial detection, sports analysis, and film shooting. In the field of observing the discharge arc and the metal surface sputtering, the commonly used high-speed camera models include but are not limited to Phantom v2512, Ol ympus i-SPEED 7, Photron FASTCAM NOVA, and IDT i-SPEED 3. The camera 6 is connected to an oscilloscope 7, which is connected to the observation cavity 4. The oscilloscope 7 is used to measure the impulse current waveform and the maximum impulse current generated by the discharge excitation, and trigger the camera 6.

[0034] In this embodiment, the camera 6 is triggered by the signal of the impulse current and operates under the longest exposure condition corresponding to the shooting frequency to shoot the arc between the electrodes and the metal sputtering on the electrode surface. Under the appropriate number of frames, a single-frame Schlieren image is obtained, and the Schlieren image is superimposed by multiple transient exposure images. The appropriate number of frames (frame rate) is jointly determined by the experimental objectives, time characteristics and the performance of the camera 6. The frame rate can be preliminarily estimated by analyzing the discharge time scale, the dynamic change characteristics of the Schlieren, and the gas disturbance speed, and the setting can be optimized in combination with actual tests. Ultimately, the selected frame rate should ensure that the temporal resolution and spatial resolution of the Schlieren image meet the experimental requirements, while ensuring that the performance of the camera 6 can support the corresponding parameters. The following table is a reference for suitable frame rates in some common experiments:

[0035] Table 1 Suitable frame rates in common experiments

[0036] Experiment Type Time scale Suitable frame rate range Microsecond arc discharge 1μs-100μs 10,000fps-1,000,000fps Plasma expansion observation 100μs-1ms 1,000fps-10,000fps Gas dynamic disturbance 1ms-10ms 500fps-2,000fps Slow gas field evolution >10ms <500fps

[0037] As can be seen from the above table, in the microsecond arc discharge experiment, the shooting frame rate of the camera 6 is generally between 10,000 and 1,000,000 frames. In the present application, the shooting frame number of the camera 6 can be 300,000 frames, the object distance of the camera 6 is set to 1,800 mm, and the image distance is set to 49.2 mm. The camera 6 is equipped with a filter, and the filter wavelength of the filter is 380 nm to 600 nm.

[0038] Furthermore, the camera 6 can use a telephoto lens or a short-focus lens, which needs to be determined according to specific observation requirements and experimental conditions. The telephoto lens can magnify distant objects and then magnify the imaging of the arc, so that the observer can clearly see the details of the arc, such as the shape and color changes of the arc. Due to its narrow viewing angle, the telephoto lens can provide a shallow depth of field, which helps to highlight the main body of the arc and blur the background, thereby improving the contrast and clarity of the image. The short-focus lens can provide a wider viewing angle and is suitable for situations where a larger area needs to be observed, such as global observation of the entire discharge device or sputtering process. The short-focus lens can capture more environmental information and help understand the interaction between the discharge arc and the surrounding environment, such as the impact of the arc on the surrounding materials. If the experimental site is limited or it is necessary to observe the local details of the arc, a telephoto lens is more suitable; if it is necessary to observe the interaction between the arc and the entire discharge system, a short-focus lens is more suitable. In addition, it is also necessary to consider parameters such as the aperture size, shutter speed, and sensitivity of the lens.

[0039] The observation chamber 4 cooperates with the impulse voltage generator 3 and the camera 6 to record the formation, development and extinction process of the discharge arc and the sputtering phenomenon on the metal surface.

[0040] During the sputtering process, discharges, or arcs, occur on the target surface. This arc can disrupt the deposition process and affect the coating quality. The occurrence of arcs is affected by a variety of factors, including vacuum conditions, the type of sputtering process, and the presence of a magnetic field. In magnetron sputtering, a magnetic field is used to enhance the ionization of the inert gas and control the movement of electrons, thereby increasing the sputtering rate. However, the presence of a magnetic field can also affect the stability of the arc. Potassium bromide lenses can effectively reduce the impact of external factors on the camera 6's capture of the experimental results.

[0041] In this embodiment, the impulse voltage signal generated by the impulse voltage generator 3 is used to simultaneously trigger the oscilloscope 7 and the camera 6. The arc and metal sputtering frames generated are not greater than the shooting frames of the camera 6. The shooting speed of the camera 6 is adjusted and black balance is performed. Under appropriate conditions, the arc channel and the sputtering phenomenon caused by the first electric shock on the metal surface are photographed. The potassium bromide lens is used to significantly improve the observation clarity of the discharge arc and the sputtering phenomenon on the metal surface by utilizing its high light transmittance and thermal shock resistance. And by adjusting the impulse voltage generator 3, the required voltage pulse can be accurately generated, and the positive and negative electrodes of the electrodes in the observation cavity 4 are connected correspondingly, ensuring the stability and repeatability of the discharge process.

[0042] The inert gas filled in the observation cavity 4 can reduce oxidation during the discharge process, thereby improving the observation clarity.

[0043] By adjusting the parameters and position of camera 6, higher quality images of the discharge arc and metal surface sputtering can be captured, improving the imaging quality, which plays an important role in subsequent data analysis and understanding of physical mechanisms.

[0044] See also Figure 1-Figure 2 As shown, a method for observing discharge arc conditions and metal surface sputtering conditions, using a discharge arc condition and metal surface sputtering condition observation system, comprising:

[0045] The controller 1 sets the maximum value of the impulse voltage generator 3, and the output signal cooperates with the oscilloscope 7 to obtain the impulse current waveform. The trigger condition is preset to trigger the camera 6 to shoot. The camera 6 superimposes multiple transient exposure images on a single schlieren image. During each transient exposure, the arc is distinguished by the degree of grayscale change, so as to achieve time-domain continuous observation of the arc and metal sputtering. Then, the voltage is released after increasing the voltage step by step, and the camera 6 is triggered by the oscilloscope 7 to shoot, record the impulse current waveform, and verify the waveform accuracy.

[0046] The specific steps include:

[0047] S1. Install the camera 6. For the observation cavity 4, replace the ceramic piece at the observation window of the cavity 4 to be tested with a potassium bromide lens, place the metal surface to be observed in the observation cavity 4, and install the 8 / 20μs impulse voltage generator 3.

[0048] Specifically, first fix the camera 6 on a tripod and adjust it to an appropriate position so as to align it with the inside of the observation chamber 4. Connect the 8 / 20us impulse voltage generator 3 to the power supply and controller 1, and ensure that all electrical connections meet safety standards. Install a potassium bromide lens in the observation chamber 4, replace the original ceramic window, and ensure that the lens is firmly installed without dust and bubbles. Fix the metal surface sample to be observed in an appropriate position in the chamber and ensure that it does not move during the discharge process. Connect the argon source and check the sealing of the observation chamber 4 to ensure that no gas leakage occurs during the inflation process.

[0049] S2. Adjust the 8 / 20us impulse voltage generator 3 to generate the required voltage pulse, and connect the positive and negative electrodes of the impulse voltage generator to the positive and negative electrodes of the electrodes in the observation cavity 4 accordingly.

[0050] S3. Use a flow meter to inject argon gas into the observation cavity 4, and use a vacuum pump to increase the pressure.

[0051] In this step, the gas filling system connected to the argon gas source is started through the user interface to inject argon gas into the observation cavity 4 until a predetermined gas pressure level is reached.

[0052] In S2 and S3, it is necessary to open controller 1 and input the experimental parameters, including voltage level, pulse duration, and argon pressure.

[0053] S4. Adjust the parameters and position of the camera 6. The parameters of the camera 6 include exposure time, frame rate and resolution to meet the specific requirements of the experiment.

[0054] S5, gradually increasing the voltage and then releasing it, using the oscilloscope 7 to trigger the camera 6 to take pictures, record the impact current waveform, and verify the accuracy of the waveform.

[0055] Specifically, the voltage of the impulse voltage generator is gradually increased by the controller 1 until the voltage level required for the experiment is reached. After reaching the predetermined voltage, the voltage is released, and the camera 6 is triggered to shoot and record the impulse current waveform.

[0056] The data analysis implementation method for the captured arc and metal surface sputtering has the following steps: Use the data processing unit to store the image data captured by the camera 6 and perform preliminary image processing. View and analyze the observation results through the user interface, including the shape, duration, and brightness change of the discharge arc. Use image analysis software to further analyze the images of the discharge arc and metal surface sputtering to extract key parameters in the discharge process. For the identification of metal surface damage, it is necessary to combine the material part, use an electron microscope to observe the specific damage location and analyze the damage results in combination with the specific electrode material.

[0057] See also Figure 3 The following is a synchronous timing diagram of the observation system used in this embodiment. The signal connection is as follows:

[0058] Voltage and time settings: First, the required voltage level and pulse duration are set through the controller 1. These parameters will be used to configure the impulse voltage generator 3 to generate the required voltage pulse.

[0059] Connection of oscilloscope 7: Connect oscilloscope 7 to controller 1 to monitor and record the impulse current waveform and the maximum value of the impulse current generated by the discharge excitation. Oscilloscope 7 will provide an accurate time reference to ensure that camera 6 can capture the image of the discharge arc at the right moment.

[0060] Trigger signal of oscilloscope 7: The trigger signal output from oscilloscope 7 is used to synchronize the exposure of camera 6. This signal ensures that camera 6 starts shooting when the voltage pulse reaches the peak value, capturing the best moment of the discharge arc.

[0061] Connection of exposure clock signal: Camera 6 receives a signal from an exposure clock (external device) to control its exposure time. This signal determines the exposure time of camera 6 and is crucial for capturing the rapidly occurring discharge arc phenomenon.

[0062] During use, synchronous triggering is required, that is, synchronization between the oscilloscope 7 and the camera 6 is ensured. When the oscilloscope 7 detects a current pulse, a trigger signal is sent to the camera 6, so that the camera 6 starts to expose when the discharge occurs.

[0063] Control of time resolution: By adjusting the delay of the trigger signal, the exposure timing of the camera 6 can be controlled to match the specific moment when the discharge arc occurs. This requires precise time control to ensure that the camera captures the most critical part of the discharge process.

[0064] The method for observing the discharge arc and metal surface sputtering is to use the controller 1 to set the maximum value of the impulse voltage generator 3, and the output signal thereof cooperates with the oscilloscope 7 to obtain the impulse current waveform, and preset trigger conditions to trigger the camera 6 to shoot. The camera 6 superimposes multiple transient exposure images on a single schlieren image. During each transient exposure, the arc is distinguished by the degree of grayscale change, so as to achieve time-domain continuous observation of the arc and metal sputtering, so that accurate triggering and data recording can be achieved. After gradually increasing the voltage, the voltage is released, and the oscilloscope 7 is used to trigger the camera 6 to shoot, record the impulse current waveform, verify the waveform accuracy, and ensure the accuracy and reliability of the experimental data.

[0065] The design of the observation system for the discharge arc and metal surface sputtering can facilitate researchers to observe and record in detail the formation, development and extinction process of the discharge arc and the sputtering phenomenon on the metal surface under different voltage, current and environmental conditions. By analyzing the data captured by the camera 6, the physical mechanism of the discharge process can be deeply understood, providing a scientific basis for the development of discharge protection technology and the improvement of metal surface treatment technology.

[0066] Some observation methods that use highly sensitive detectors and cameras, combined with specific optical system designs, can improve the accuracy and resolution of observations to a certain extent. However, these methods often require complex equipment and high costs, and still have certain limitations in practical applications. The observation system and method for discharge arc conditions and metal surface sputtering conditions provided in this application can provide high spatial resolution and good synchronous triggering capabilities while maintaining high temporal resolution, so as to achieve accurate observation of discharge arcs and metal surface sputtering conditions. Compared with the above method, it can also further reduce costs.

[0067] The above is a detailed description of an embodiment of the present invention, but the content is only a preferred embodiment of the present invention and cannot be considered to limit the scope of implementation of the present invention. All equivalent changes and improvements made according to the scope of application of the present invention should still fall within the scope of the claims of the present invention.

Claims

1. An observation system for discharge arc conditions and metal surface sputtering conditions, characterized in that: include: An observation cavity (4), wherein a positive electrode and a negative electrode are arranged in the observation cavity (4), and an observation port of the observation cavity (4) is an observation window (5) made of a potassium bromide lens, and the observation cavity (4) is filled with an inert gas; An impulse voltage generator (3) is arranged outside the observation cavity (4), and the impulse voltage generator (3) serves as an excitation source for the discharge arc and is used to apply high-voltage pulses to the anode and cathode to generate an impulse voltage, simulate an actual discharge environment, and initiate an arc; A camera (6) and an oscilloscope (7) are arranged outside the observation cavity (4); the camera (6) is used to capture dynamic changes in the discharge arc and the metal surface during sputtering to obtain images and video data; and the oscilloscope (7) is used to trigger the camera (6); The observation cavity (4) cooperates with the impulse voltage generator (3) and the camera (6) to record the formation, development and extinction process of the discharge arc and the sputtering phenomenon on the metal surface.

2. The observation system for discharge arc conditions and metal surface sputtering conditions according to claim 1, characterized in that: It also includes a controller (1), which is used to control the voltage rise and fall and release of the impulse voltage generator (3). The controller (1) is connected to the gas switch (2) and controls the gas switch (2) to set the required voltage.

3. The observation system for discharge arc conditions and metal surface sputtering conditions according to claim 1, characterized in that: There is a discharge gap between the positive electrode and the negative electrode. The discharge gap generates arc discharge under the action of a high voltage pulse. The discharge gap is used to control the start and propagation of the discharge and affect the discharge characteristics, and further affect the parameters of the plasma.

4. The observation system for discharge arc conditions and metal surface sputtering conditions according to claim 1, characterized in that: The camera (6) is connected to an oscilloscope (7), which is connected to the observation cavity (4). The oscilloscope (7) is used to measure the impulse current waveform and the maximum impulse current value generated by the discharge excitation.

5. The observation system for discharge arc conditions and metal surface sputtering conditions according to claim 1, characterized in that: The impulse voltage generator (3) is composed of 8 / 20μs, 2.5 / 50μs and 2 / 15.5μs loops, and includes a contactor, an electric voltage regulator, a high-voltage power supply, a grounding switch, a bridge resistor, an inductor and a capacitor.

6. The observation system for discharge arc conditions and metal surface sputtering conditions according to claim 1, characterized in that: The camera (6) adopts a telephoto lens, which is used to magnify the image of the arc to highlight the main body of the arc.

7. The observation system for discharge arc conditions and metal surface sputtering conditions according to claim 1, characterized in that: The camera (6) adopts a short-focus lens, and the short-focus lens is used to observe the interaction between the electric arc and the surrounding environment.

8. The observation system for discharge arc conditions and metal surface sputtering conditions according to claim 1, characterized in that: The shooting frame number of the camera (6) is 300,000 frames, the object distance of the camera (6) is set to 1,800 mm, and the image distance is set to 49.2 mm.

9. The observation system for discharge arc conditions and metal surface sputtering conditions according to claim 1, characterized in that: The camera (6) is externally provided with a filter, and the filter wavelength of the filter is 380nm to 600nm.

10. A method for observing discharge arc conditions and metal surface sputtering conditions, using the system according to any one of claims 1 to 9, characterized in that: include: The maximum value of the impulse voltage generator (3) is set by a controller (1), and the signal outputted by the impulse voltage generator cooperates with an oscilloscope (7) to obtain an impulse current waveform, and a trigger condition is preset to trigger a camera (6) to shoot. The camera (6) superimposes multiple transient exposure images on a single schlieren image. During each transient exposure, the arc is distinguished by the degree of grayscale change, thereby achieving continuous time-domain observation of the arc and metal sputtering conditions; After the voltage is gradually increased, it is released, and an oscilloscope (7) is used to trigger a camera (6) to take pictures, record the impact current waveform, and verify the accuracy of the waveform.

Images