Base support device

Abstract

The invention relates to a base supporting device. A processing machine (susceptor support device) is provided with: a susceptor having an upper surface constituting a horizontal plane including an X direction and a Y direction; first support parts provided on both ends of the base in the X direction, respectively, and supporting the base in the Z direction; a second support part which is disposed between both end sides of the base supported by the first support part, supports the base in the Z direction, and is capable of adjusting a support position at which the base is supported in the Z direction; a deflection detection unit that detects the amount of deflection of the base in the Z direction; and a deflection control unit that controls the second support unit, in which the deflection control unit controls the second support unit so that the upper surface is parallel to the X direction on the basis of the deflection amount detected by the deflection detection unit.

Description

Technical Field

[0001] The present invention relates to a base support device for suppressing deflection of a base on which an object is placed. Background Art

[0002] Conventionally, when measuring or processing an object, the object is placed on a base or on a stage (including a moving stage) provided on the base, and the measurement process or the processing process is performed.

[0003] For example, in the device described in Document 1 (Japanese Patent Application Laid-Open No. 2014-85504), a linear guide extending in the Y direction is arranged on the upper surface of a stage plate arranged via a vibration suppression unit, and a first stage is movably supported on the linear guide.

[0004] In the device described in Document 1, the platform plate (base) is supported via a vibration suppression portion provided at the end of the platform plate. However, the plate may bend due to the temperature difference between the upper surface and the lower surface (floor surface side) of the plate, or due to the device installation environment. In particular, when rails are arranged on the plate and the platform moves on the rails, the rails may bend due to the above-mentioned deflection, thereby hindering the smooth movement of the platform. Summary of the invention

[0005] An object of the present invention is to provide a base support device capable of suppressing deflection of a base.

[0006] The base support device involved in one embodiment of the present invention comprises: a base, which has an upper surface forming a horizontal plane, and the horizontal plane includes a first direction and a second direction orthogonal to the first direction; a first support part, which is respectively arranged at the two end sides of the base in the first direction, and supports the base in a third direction orthogonal to the first direction and the second direction; a second support part, which is arranged between the two end sides of the base supported by the first support part, supports the base in the third direction, and can adjust the support position of the base in the third direction; a deflection detection part, which detects the deflection amount of the base in the third direction; and a deflection control part, which controls the second support part, wherein the deflection control part controls the second support part based on the deflection amount detected by the deflection detection part so that the upper surface is parallel to the first direction.

[0007] Thus, by controlling the support position of the second support portion according to the deflection of the base, the deflection of the base can be minimized, thereby suppressing the deflection of the base.

[0008] In the base support device of this embodiment, it is preferred that the second support part is an active vibration isolation table, which includes: an air damper, which supports the base through air pressure; and an air pressure adjustment part, which adjusts the air pressure of the air damper, and the deflection control part controls the air pressure adjustment part based on the deflection amount to adjust the air pressure.

[0009] Thus, by providing the active vibration isolating table using the air damper as the second supporting portion, the supporting position of the second supporting portion with respect to the base can be easily and accurately adjusted by adjusting the air pressure.

[0010] In the base support device of this aspect, it is preferable that the second support portion is provided at a position corresponding to the center of gravity of the base.

[0011] When the base is bent due to its own weight or the temperature difference between the upper and lower parts of the base, the part with the largest bending amount is the position corresponding to the center of gravity. Therefore, by providing the second support part at the position corresponding to the center of gravity, the bending of the base can be effectively suppressed.

[0012] In the base support device of this embodiment, it can also be set to the following structure, and further comprises: a rail, which is arranged on the upper surface and extends along the first direction; a workbench, which can move along the first direction on the rail; a workbench position detection unit, which detects the position of the workbench in the first direction; and a support moving unit, which moves the second support unit relative to the base along the first direction, and the support moving unit moves the second support unit to a position corresponding to the workbench according to the movement of the workbench in the first direction.

[0013] This effectively suppresses the deflection of the table of the base, thereby suppressing the increase in the moving load of the table caused by the deflection of the rail, and enables the table to move smoothly.

[0014] In the base support device of this embodiment, there is also: a first temperature sensor, which measures the temperature of the upper surface; and a second temperature sensor, which measures the temperature of the lower surface of the base on the side opposite to the upper surface. The deflection detection unit detects the deflection amount based on first deflection data obtained by correlating the temperature difference between the upper surface and the lower surface with the deflection amount of the base, and the temperature measured by the first temperature sensor and the second temperature sensor.

[0015] Thus, the amount of deflection of the susceptor caused by the temperature difference between the upper and lower surfaces of the susceptor can be easily and quickly detected, and the deflection of the susceptor can be effectively suppressed.

[0016] In the base support device of this embodiment, it can also be set to the following structure, and further comprises: a rail, which is arranged on the upper surface and extends along the first direction; a workbench, which can move along the first direction on the rail; and a workbench position detection unit, which detects the position of the workbench in the first direction, and the deflection detection unit detects the deflection amount based on second deflection data obtained by correlating the position of the workbench in the first direction with the deflection amount of the base when the workbench moves in the first direction along the rail.

[0017] When the position of the workbench on the rail changes, the deflection state of the base changes according to the position of the workbench, but in this method, the deflection amount corresponding to the position of the workbench can be easily and quickly detected by pre-maintaining the position of the workbench and the deflection amount as the second deflection data. Thus, the deflection of the base caused by the movement of the workbench can be suppressed.

[0018] In the base support device of this embodiment, it can also be set to the following structure, which also includes: a second deflection detection part, which detects the deflection amount of the base in the second direction as the second deflection amount; and a third support part, which is arranged between the two end sides of the base supported by the first support part, supports the base in the second direction, and can adjust the support position of the base in the second direction, and the deflection control part also controls the third support part based on the second deflection amount detected by the second deflection detection part so that the base is parallel to the first direction.

[0019] Thus, the second support portion can suppress deflection of the base in the third direction, and the third support portion can suppress deflection of the base in the second direction. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is a perspective view showing a schematic structure of the processing machine according to the first embodiment.

[0021] Figure 2 It is a side view of the base according to the first embodiment.

[0022] Figure 3 It is a top view of the base according to the first embodiment.

[0023] Figure 4 This is a block diagram showing a schematic configuration of a processing machine according to the first embodiment.

[0024] Figure 5 This is a flowchart showing a method of suppressing a base in a processing machine according to the first embodiment.

[0025] Figure 6 This is a block diagram showing a schematic structure of a base according to the second embodiment.

[0026] Figure 7 1 is a flowchart showing a method of suppressing a susceptor in the second embodiment.

[0027] Figure 8 This is a plan view showing a schematic structure of a base according to Modification 3. DETAILED DESCRIPTION

[0028] [First embodiment]

[0029] Next, a first embodiment of the present invention will be described.

[0030] Figure 1 It is a schematic perspective view of the processing machine 1 according to the first embodiment. The processing machine 1 is configured to include the base support device of the present invention. Figure 2 This is a schematic side view of the base 10 when viewed from the +Y side along the Y direction. Figure 3 It is a schematic plan view when the base 10 is viewed from the +Z side along the Z direction. Figure 4 2 is a block diagram showing a control structure of the processing machine 1 .

[0031] [Overall Structure of Processing Machine 1]

[0032] The processing machine 1 of the present embodiment includes a base 10, and first support parts 21 to 24 (see Figures 2 to 4 ) and the second supporting parts 25, 26 (refer to Figure 2 to Figure 4 ), the processing unit 30 and the controller 50 (refer to Figure 4 ).

[0033] In addition, in the present embodiment, a rail 11 is laid on the upper surface 10A of the base 10, and a processing object (not shown) is placed on a workbench 12 movably provided on the rail 11. Then, the workbench 12 on which the processing object is placed is moved to a predetermined position, and a processing unit 30 performs processing (for example, cutting, grinding, exposure, heating, etc.).

[0034] In addition, the structure of the processing unit 30 is not particularly limited, as long as it has a structure suitable for the processing to be performed, so detailed description is omitted here. In addition, in this embodiment, a processing machine 1 equipped with a base support device is shown as an example, but the base support device of the present invention is not limited to such a processing machine 1. For example, the base support device of the present invention can also be applied to a measuring device for measuring the shape, size, etc. of an object.

[0035] The base 10 is a so-called surface plate (Japanese: 定盤), which is a horizontal table with the upper surface 10A as a reference plane. As the material of the base 10, there is no particular limitation, and for example, stones such as cast iron and granite, ceramics, glass, etc. can be used.

[0036] The base 10 has an upper surface 10A that constitutes the reference plane of the processing machine 1. Here, in the present embodiment, it is assumed that the reference plane is an XY plane parallel to the X direction and the Y direction orthogonal to the X direction. In addition, the thickness direction of the base 10 is the vertical direction, which is the Z direction orthogonal to the X direction and the Y direction.

[0037] In addition, in the present embodiment, the base 10 has a shape with the X direction as the long side, and a rail 11 along the X direction is laid on the upper surface 10A. Moreover, a workbench 12 for placing the object to be processed is provided on the rail 11, and the workbench 12 is configured to be able to move in the X direction along the rail 11. In addition, a workbench drive unit 13 for moving the workbench 12 in the X direction along the rail 11 is provided on the base 10 (refer to Figure 4 ).

[0038] There is no particular limitation on the structure in which the workbench 12 is moved by the workbench drive unit 13. For example, although not shown in the figure, a structure in which the workbench 12 is moved along the rail 11 by transmitting the driving force of an actuator such as an electric motor to the axle provided on the workbench 12 can be exemplified. In addition, it can also be a structure in which the workbench 12 is moved along the rail 11 by supporting the workbench 12 with an air bearing and pushing the workbench 12 in the X direction or -X direction by the driving force of an actuator or the like.

[0039] The base 10 is supported by the first support portions 21 to 24. Specifically, as Figure 2 and Figure 3 shown, the first support portions 21 and 22 are arranged near the +X side corner portion in the X direction of the base 10 to support the base 10 in the Z direction. Similarly, the first support portions 23 and 24 are arranged near the -X side corner portion of the base 10 to support the base 10 in the Z direction. As the support positions in the X direction of each of the first support portions 21 to 24, Bessel points can be used, or Airy points can be used. In addition, in the present embodiment, an example of providing four first support portions 21 to 24 is shown, but for example, it can also be a structure in which the first support portions 21 and 22 are provided on the +X side and only the first support portion 23 is provided at the center portion in the Y direction on the -X side, or a structure in which only the first support portion 21 is provided at the center portion in the Y direction on the +X side and the first support portions 23 and 24 are provided on the -X side.

[0040] These first support portions 21 to 24 are active vibration isolation tables.

[0041] For example, as Figure 4 As shown, each first support part 21 to 24 as an active vibration isolation table is equipped with an air damper 40A, which is constructed to include a cylinder 41 connected to the base 10, a piston 42 inserted into the cylinder 41, and an air pressure adjustment part 43 (electric pneumatic regulator) for adjusting the air pressure in the cylinder 41.

[0042] In addition, in this embodiment, a vibration detection sensor 44 is provided on the base 10 or the floor surface, and the first support parts 21 to 24 are controlled by the controller 50 based on the vibration detection sensor 44 (see Figure 4 ) performs feedback control on the air pressure adjusted by the air pressure adjustment unit 43. Thus, by controlling each of the first support parts 21 to 24 so as to cancel the vibration of the base 10, the vibration of the base 10 is suppressed.

[0043] The base 10 is further supported by second support portions 25 and 26 disposed between the first support portions 21 and 22 on the +X side and the first support portions 23 and 24 on the −X side.

[0044] These second supporting parts 25 and 26 are equivalent to the second supporting parts of the present invention. Figure 2 As shown, the second support parts 25 and 26 are provided at positions corresponding to the position of the center of gravity G of the base 10 when viewed from the Y direction. In addition, in the present embodiment, an example is shown in which two second support parts 25 and 26 are arranged so as to sandwich the base 10 in the Y direction, but a structure in which a single second support part is provided at a position corresponding to the center of gravity G of the base 10 may also be provided. Alternatively, a structure in which three or more second support parts are provided may also be provided.

[0045] The second support parts 25 and 26 are constituted by active vibration isolating tables similarly to the first support parts 21 to 24. For example, the second support parts 25 and 26 are provided with air dampers 40B, and the air dampers 40B are constituted by cylinders 45, pistons 46, and air pressure adjustment parts 47. Here, the first support parts 21 to 24 are feedback-controlled based on the vibration applied to the base 10, and the second support parts 25 and 26 are driven based on the deflection amount (straightness) of the base 10.

[0046] For example, in the present embodiment, temperature sensors 48A and 48B are provided on the upper surface 10A and the lower surface 10B of the base 10, respectively (see Figure 4 ). The controller 50 calculates the amount of deflection of the base 10 based on the temperature difference between the upper surface 10A and the lower surface 10B of the base 10, and performs feedback control on the gas pressure adjustment unit 47 of the second support parts 25 and 26 based on the deflection. Thus, the deflection of the base 10 is suppressed by controlling each of the second support parts 25 and 26 in a manner that eliminates the deflection of the base 10.

[0047] The controller 50 is a device for controlling the processing machine 1, for example, Figure 4 As shown, the structure includes a storage unit 51 composed of a memory, etc., an operation processing unit 52 composed of a CPU, etc. In this embodiment, an example in which only one controller 50 is provided is shown, but a controller for controlling the processing unit 30, a controller for controlling the first supporting units 21 to 24, and a controller for controlling the second supporting units 25 and 26 may be separately provided.

[0048] The storage unit 51 stores various programs and various data for controlling the processing machine 1. In addition, in the present embodiment, first deflection data indicating the relationship between the temperature difference between the upper surface 10A and the lower surface 10B of the base 10 and the deflection amount of the base 10 corresponding to the temperature difference is stored as various data recorded in the storage unit 51. In addition, the storage unit 51 stores air pressure control data indicating the control pressure of the air pressure adjustment unit 47 of the second support parts 25 and 26 corresponding to the deflection amount.

[0049] The processing unit 52 functions as a table movement control unit 521 , a table position detection unit 522 , a processing control unit 523 , a vibration suppression unit 524 , a deflection detection unit 525 , and a deflection suppression unit 526 by reading and executing various programs stored in the storage unit 51 .

[0050] The stage movement control unit 521 controls the stage driving unit 13 to move the stage 12 in the X direction.

[0051] The table position detection unit 522 measures the position in the X direction of the table 12 driven by the table driving unit 13. The position of the table 12 may be calculated based on the driving amount of the table driving unit 13, or a detection sensor for detecting the position of the table 12 may be provided on the base 10. As such a detection sensor, for example, a laser length measuring instrument may be exemplified, which measures the position of the table 12 by separating a laser beam emitted from a laser light source into a measurement light and a reference light, irradiating the measurement light to a retroreflector provided at a predetermined position of the table 12, and receiving interference light between the measurement light and the reference light reflected by the retroreflector.

[0052] The processing control unit 523 controls the processing unit 30 to perform processing on the object to be processed.

[0053] The vibration suppression unit 524 controls the driving of the first support units 21 to 24. That is, the vibration suppression unit 524 performs feedback control on the air pressure adjustment unit 43 of the first support units 21 to 24 based on the vibration detected by the vibration detection sensor 44, thereby suppressing the vibration of the base 10. In addition, here, an example is shown in which the calculation processing unit 52 reads and executes the program recorded in the storage unit 51 to function as the vibration suppression unit 524, but it can also be set to be configured as a feedback circuit as a hardware structure.

[0054] The deflection detection unit 525 detects the deflection amount of the susceptor 10. In the present embodiment, the deflection detection unit 525 detects the deflection of the susceptor 10 based on the temperature difference between the upper surface 10A and the lower surface 10B of the susceptor 10. The deflection detection unit 525 calculates the temperature difference between the upper surface temperature measured by the temperature sensor 48A provided on the upper surface 10A of the susceptor 10 and the lower surface temperature measured by the temperature sensor 48B provided on the lower surface 10B of the susceptor 10.

[0055] In addition, the deflection detection unit 525 reads out the deflection amount of the base 10 corresponding to the calculated temperature difference by referring to the first deflection data stored in the storage unit 51. In addition, as the first deflection data, the deflection amount corresponding to the temperature difference may be recorded, and the deflection amount corresponding to the combination of the upper surface temperature and the lower surface temperature may be stored.

[0056] The deflection suppressing portion 526 performs feedback control on the gas pressure adjusting portion 47 of the second supporting portions 25 and 26 based on the detected deflection amount to suppress the deflection of the base 10 .

[0057] In addition, in the present embodiment, the operation processing unit 52 as a hardware structure is an example in which the operation processing unit 52 performs the functions as the worktable movement control unit 521, the worktable position detection unit 522, the processing control unit 523, the vibration suppression unit 524, the deflection detection unit 525 and the deflection suppression unit 526 by reading the software program stored in the storage unit 51, but each of these functional structures can also be composed of circuits having corresponding functions.

[0058] [Method for suppressing deflection of base 10 in processing machine 1]

[0059] Next, a method of suppressing the deflection of the base 10 in the processing machine 1 according to the present embodiment will be described.

[0060] Figure 5 This is a flowchart related to the assembly of the base 10 of this embodiment.

[0061] First, the assembly of the base 10 will be described.

[0062] In this embodiment, when installing the processing machine 1, first, the first supports 21 to 24 are assembled to support the base 10 (step S1). For example, the controller 50 controls the air pressure regulator 43 of the first supports 21 to 24 to maintain the base 10 horizontally.

[0063] Then, the deflection of the base 10 at this time is measured as the deflection (geometric accuracy δd) caused by the weight of the base 10, and recorded in the storage unit 51 (step S2). In addition, thereafter, the vibration of the base 10 is suppressed by feedback control of the air pressure adjustment unit 43 of the first support parts 21 to 24 by the vibration suppression unit 524 based on the signal value output from the vibration detection sensor 44.

[0064] Next, the deflection suppression control of the base 10 will be described.

[0065] The base 10 set up as described above uses the upper surface 10A as the reference plane of the processing machine 1, so it is necessary to maintain the upper surface 10A horizontal. For example, in the case where there is a temperature difference between the temperature of the upper surface 10A and the temperature of the lower surface 10B of the base 10, the base 10 bends in the Z direction due to the difference in the amount of expansion and contraction caused by thermal expansion of the upper surface 10A and the amount of expansion and contraction caused by thermal expansion of the lower surface 10B. In particular, in the case where the rail 11 is laid on the upper surface 10A as in the present embodiment, if the base 10 bends in the Z direction, the rail 11 on the upper surface 10A also bends, and the moving load of the workbench 12 moving on the rail 11 increases, or becomes unable to move.

[0066] In contrast, in this embodiment, as described above, the deflection suppressing unit 526 of the controller 50 controls the gas pressure adjusting unit 47 of the second supporting units 25 and 26 to suppress the deflection δ due to the deadweight when assembling the base 10, thereby minimizing the deflection in the Z direction.

[0067] When the deflection in the Z direction of the base 10 is set to δ, the deflection caused by the temperature difference between the upper surface temperature and the lower surface temperature of the base 10 is set to δS, the deflection caused by the reaction force Fr generated by the supply pressure (control pressure Ps) to the cylinder body 45 of the second support part 25, 26 is set to δFr, and the deflection caused by the change of the reaction force Fr caused by the change of atmospheric pressure P0 is set to δP0, δ is expressed by the following formula.

[0068] [Number 1]

[0069] δ=δd-(δS+δFr+δP0)···(1)

[0070] Here, in equation (1), δFr+δP0 is determined by the control pressure Ps adjusted by the air pressure adjustment unit 47 (electropneumatic regulator). Therefore, when δ(PS)=δFs+δP0 is replaced and the deflection δ=0, the following equation (2) is derived from equation (1).

[0071] [Number 2]

[0072] δ(PS)=δd-δS···(2)

[0073] In the present embodiment, δS can be obtained based on the first deflection data stored in the storage unit 51 .

[0074] That is, the deflection detection unit 525 first monitors the temperatures (upper surface temperature, lower surface temperature) of the upper surface 10A and the lower surface 10B of the susceptor 10 using the temperature sensors 48A and 48B (step S3 ).

[0075] Then, the deflection detection unit 525 refers to the first deflection data stored in the storage unit 51, and reads out the deflection amount δS corresponding to the temperature difference between the upper surface temperature and the lower surface temperature (step S4). In addition, as described above, the first deflection data may also store the deflection amount δS corresponding to the combination of the upper surface temperature and the lower surface temperature. In this case, it is sufficient to read out the deflection amount δS corresponding to the combination of the upper surface temperature and the lower surface temperature.

[0076] Then, the deflection suppression unit 526 obtains the deflection δ (PS) to be controlled by the air pressure regulating unit 47 based on the formula (2), and calculates the control pressure PS corresponding to the deflection δ (PS) (step S5). For example, the deflection suppression unit 526 reads the control pressure PS corresponding to the deflection amount δ (PS) from the air pressure control data stored in the storage unit 51. Then, the deflection suppression unit 526 controls the air pressure regulating unit 47 of the second support parts 25 and 26 according to the control pressure PS (step S6).

[0077] Thus, the second support parts 25 and 26 are driven so as to reduce the deflection caused by the temperature change of the susceptor 10 , thereby suppressing the deflection of the susceptor 10 .

[0078] [Effects of this embodiment]

[0079] The processing machine 1 (base support device) of the present embodiment includes a base 10, first support parts 21 to 24, second support parts 25 and 26, and a controller 50. The base 10 has an upper surface 10A constituting a horizontal plane including an X direction and a Y direction. The first support parts 21 to 24 are respectively provided at both ends of the base 10 in the X direction, and support the base 10 in the Z direction. The second support parts 25 and 26 are arranged between both ends of the base 10 supported by the first support parts 21 to 24, support the base 10 in the Z direction, and adjust the support position of the base 10 in the Z direction. The controller 50 functions as a deflection detection part 525 that detects the deflection amount of the base 10 in the Z direction, and a deflection suppression part 526 that controls the second support parts 25 and 26, and the deflection suppression part 526 controls the second support parts 25 and 26 based on the deflection amount detected by the deflection detection part 525 so that the upper surface 10A of the base 10 is parallel to the X direction.

[0080] Thus, the deflection of the base 10 can be suppressed, and even when the rails 11 are laid on the base 10 and the table 12 is moved along the rails 11 , the movement of the table 12 can be suppressed from being hindered by the deflection of the rails 11 .

[0081] In the processing machine 1 of this embodiment, the second supporting parts 25 and 26 are active vibration isolating tables, which include: an air damper 40B, which supports the base 10 by air pressure; and an air pressure adjusting part 47, which adjusts the air pressure of the air damper 40B, and the deflection suppression part 526 controls the air pressure adjusting part 47 based on the deflection amount.

[0082] By using active vibration isolating tables using the air dampers 40B as the second support parts 25 and 26 , the support positions of the second support parts 25 and 26 on the base 10 can be easily and accurately adjusted by adjusting the air pressure.

[0083] In the processing machine 1 of the present embodiment, the second support parts 25 and 26 are provided at positions corresponding to the center of gravity of the base 10 .

[0084] When the base 10 is bent due to the weight of the base 10 and the temperature difference between the upper surface 10A and the lower surface 10B, the portion with the largest amount of bending is the position corresponding to the center of gravity. In this embodiment, by providing the second support parts 25 and 26 at the position corresponding to the center of gravity of the base 10, the bending of the base 10 can be effectively suppressed.

[0085] In this embodiment, there are provided a first temperature sensor 48A for measuring the temperature of the upper surface 10A of the susceptor 10 and a second temperature sensor 48B for measuring the temperature of the lower surface 10B of the susceptor 10. Furthermore, the deflection detection unit 525 detects the deflection amount based on the first deflection data obtained by associating the temperature difference between the upper surface 10A and the lower surface 10B with the deflection amount of the susceptor 10, and the temperatures measured by the first temperature sensor 48A and the second temperature sensor 48B.

[0086] Thus, the amount of deflection of susceptor 10 caused by the temperature difference between upper surface 10A and lower surface 10B of susceptor 10 can be easily and quickly detected, and deflection of susceptor 10 caused by the temperature difference between upper surface 10A and lower surface 10B of susceptor 10 can be effectively suppressed.

[0087] [Second embodiment]

[0088] Next, a second embodiment will be described.

[0089] In the first embodiment described above, an example of suppressing the deflection caused by the temperature difference between the upper surface temperature and the lower surface temperature of the base 10 is shown. However, the base 10 sometimes deflects due to the weight of the workbench 12 moving on the rail 11. In the second embodiment, the difference from the first embodiment described above is that the deflection corresponding to the movement of the workbench 12 is also suppressed.

[0090] Figure 6 1A is a block diagram showing a schematic configuration of a processing machine 1A as a base support device according to the present embodiment. Note that the same reference numerals are given to the configurations that have already been described, and descriptions thereof will be omitted.

[0091] In addition to the configuration of the processing machine 1 of the first embodiment, the processing machine 1A of the present embodiment further includes a support moving portion 60 that moves the second support portions 25 and 26 in the X direction.

[0092] The supporting movable portion 60 may include, for example, a rail laid on a floor surface along the X direction, a pedestal movable on the rail, and an actuator that moves the pedestal in the X direction. In this case, the second supporting portions 25 and 26 can be moved by placing the second supporting portions 25 and 26 on the pedestal and moving the pedestal by the actuator.

[0093] When the second supports 25 and 26 are moved, for example, the air pressure of the air pressure regulator 47 of the second supports 25 and 26 is reduced to release the support of the base 10 by the second supports 25 and 26, and the second supports 25 and 26 are moved by driving the actuator.

[0094] The controller 50 of this embodiment includes a storage unit 51 and a processing unit 52, similarly to the first embodiment. In this embodiment, the storage unit 51 stores second deflection data indicating the relationship between the position of the table 12 in the X direction and the deflection amount of the base 10 in the Z direction.

[0095] The operation processing unit 52 reads and executes various programs stored in the storage unit 51, and thereby functions as a worktable movement control unit 521, a worktable position detection unit 522, a processing control unit 523, a vibration suppression unit 524, and a deflection suppression unit 526, and also functions as a support movement control unit 527, in the same way as the first embodiment.

[0096] The support movement control unit 527 moves the second support parts 25 and 26 according to the moving destination of the workbench 12. Regarding the moving position of the second support parts 25 and 26 corresponding to the moving position of the workbench 12, for example, the second support parts 25 and 26 are moved to the position in the X direction of the center of gravity of the workbench 12. In addition, the movable range of the second support parts 25 and 26 is between the first support parts 21 and 22 and the first support parts 23 and 24. In other words, the range from the -X side end point where the second support parts 25 and 26 are adjacent to the first support parts 23 and 24 to the +X side end point where the second support parts 25 and 26 are adjacent to the first support parts 21 and 22 is the movable range. Therefore, for example, when the center of gravity of the workbench 12 is located at a position closer to the -X side than the movable range of the second support parts 25 and 26, the second support parts 25 and 26 are moved to the -X side end point of the movable range. When the center of gravity of the table 12 is located closer to the +X side than the movable range of the second support parts 25 and 26, the second support parts 25 and 26 are moved to the +X side end point of the movable range. When the center of gravity of the table 12 is between the -X side end point and the +X side end point, the second support parts 25 and 26 are moved so that the center of gravity position of the table 12 coincides with the support center (center of gravity) of the second support parts 25 and 26.

[0097] Furthermore, the deflection suppressing unit 526 of the present embodiment detects the deflection amount based on the second deflection data in accordance with the movement of the table 12 , and controls the air pressure adjusting unit 47 of the second supporting units 25 and 26 .

[0098] Thus, in the present embodiment, the deflection suppressing portion 526 can perform feedback control so as to suppress the deflection of the base 10 caused by the movement of the stage 12 .

[0099] [Method for suppressing deflection of base 10]

[0100] Next, a method of suppressing the deflection of the base 10 in the processing machine 1A according to the present embodiment will be described.

[0101] Figure 7 : is a flowchart showing the deflection suppression control according to the present embodiment.

[0102] First, similarly to the first embodiment, steps S1 and S2 are performed to assemble the base 10 and measure the geometric accuracy δd of the base 10 .

[0103] Afterwards, the table movement control unit 521 controls the table driving unit 13 based on a predetermined processing program or a manually input command, so as to move the table 12 in the X direction (step S11). Then, the table position detection unit 522 measures the position of the table 12 in the X direction after the movement (step S12).

[0104] Next, the deflection suppressing unit 526 reads the deflection amount δP(X) of the base 10 corresponding to the table position measured in step S12 from the second deflection data stored in the storage unit 51 (step S13 ).

[0105] Here, when the deflection of the base 10 in the Z direction is set to δ, the deflection of the base 10 caused by the moving position X of the workbench 12 is set to δP(X), the deflection caused by the reaction force Fr generated by the supply pressure (control pressure Ps) of the cylinder 45 to the second support part 25, 26 is set to δFr, and the deflection caused by the change of the reaction force Fr generated by the change of atmospheric pressure P0 is set to δP0, δ is expressed by the following formula (3).

[0106] [Number 3]

[0107] δ=δd-(δP(X)+δFr+δP0)···(1)

[0108] As in the first embodiment, in equation (3), δFr+δP0 is determined by the control pressure Ps adjusted by the air pressure adjustment unit 47 (electropneumatic regulator). Therefore, when δ(PS)=δFs+δP0 is replaced and the deflection δ=0, the following equation (4) is derived from equation (3).

[0109] [Number 4]

[0110] δ(PS)=δd-δP(X)···(4)

[0111] The deflection suppressing unit 526 obtains the deflection δ (PS) to be controlled by the air pressure regulating unit 47 based on the formula (4), and calculates the control pressure PS corresponding to the deflection δ (PS) (step S14). For example, the deflection suppressing unit 526 reads the control pressure PS corresponding to the deflection δ (PS) from the air pressure control data stored in the storage unit 51, and implements step S6 in the same manner as the first embodiment to control the air pressure regulating unit 47 of the second support parts 25 and 26.

[0112] Thus, the second support parts 25 and 26 are driven so as to reduce the deflection of the base 10 caused by the movement of the table 12 , thereby suppressing the deflection of the base 10 .

[0113] [Effects of this embodiment]

[0114] The processing machine 1A in this embodiment achieves the same operational effects as those of the first embodiment.

[0115] In addition, the processing machine 1A of the present embodiment includes: a rail 11, which is provided on the upper surface 10A of the base 10 and extends in the X direction; a table 12, which can move in the X direction on the rail 11; and a support moving part 60, which moves the second support parts 25 and 26 relative to the base 10 in the X direction. In addition, the controller 50 also functions as a table position detection part 522 to detect the position of the table 12 in the X direction. Moreover, the support moving part 60 moves the second support parts 25 and 26 to the position corresponding to the table 12 according to the movement of the table 12 in the X direction under the control of the support movement control part 527 of the controller 50.

[0116] That is, in this embodiment, the second support parts 25 and 26 are moved to positions corresponding to the center of gravity of the workbench 12. Thus, the deflection at the position of the workbench 12 of the base 10 can be effectively suppressed. Therefore, the increase in the moving load of the workbench 12 caused by the deflection of the rail 11 can be suppressed, so that the workbench 12 can be moved smoothly.

[0117] In this embodiment, the deflection detection unit 525 detects the deflection amount based on the second deflection data obtained by correlating the position of the table 12 in the X direction with the deflection amount of the base 10 when the table 12 moves in the X direction along the rail 11 .

[0118] When the position of the workbench 12 on the rail 11 changes as in the present embodiment, the bending state of the base 10 sometimes changes according to the position of the workbench 12. Therefore, by pre-maintaining the position of the workbench 12 and the bending amount as the second bending data, the bending amount corresponding to the position of the workbench 12 can be easily and quickly detected, thereby suppressing the bending of the base 10 caused by the movement of the workbench 12.

[0119] [Modifications]

[0120] In addition, the present invention is not limited to the above-mentioned embodiment, and includes the following modifications within the scope that can achieve the object of the present invention.

[0121] [Modification 1]

[0122] In the above-mentioned first embodiment, a structure for correcting the deflection of the base 10 caused by the temperature difference between the upper surface 10A and the lower surface 10B of the base 10 based on the first deflection data is described, and in the second embodiment, a structure for correcting the deflection of the base 10 caused by the movement of the workbench 12 when the workbench 12 moves on the rail 11 laid on the upper surface 10A of the base 10 based on the second deflection data is described.

[0123] On the other hand, the deflection of the susceptor 10 may be suppressed based on both the temperature of the susceptor 10 and the movement of the stage 12. That is, the first embodiment and the second embodiment may be combined to suppress the deflection of the susceptor 10 using both the first deflection data and the second deflection data.

[0124] In this case, for example, the control pressure PS of the second support parts 25 and 26 can be calculated by transforming equation (2) or equation (4) into the following equation (5) using δS detected based on the first deflection data and δP(X) detected based on the second deflection data.

[0125] [Number 5]

[0126] δ(PS)=δd-δS-δP(X)···(5)

[0127] Alternatively, the deflection amount of the susceptor 10 corresponding to each X position of the table 12 may be recorded as the second deflection data for each temperature difference between the upper surface 10A and the lower surface 10B of the table 12 .

[0128] [Modification 2]

[0129] In the second embodiment described above, the configuration in which the second support parts 25 and 26 move in the X direction according to the movement of the table 12 is exemplified, but the present invention is not limited thereto.

[0130] For example, in the second embodiment, the second support parts 25 and 26 may be fixed at positions corresponding to the center of gravity of the base, as in the first embodiment. Although the overall bending state of the base 10 changes according to the movement of the workbench 12, the largest bending portion of the base 10 is near the center of gravity. By supporting the center of gravity with the second support parts 25 and 26 and controlling the bending to be smaller, the overall bending of the base 10 can be suppressed.

[0131] On the other hand, in the first embodiment, as in the second embodiment, the second support parts 25 and 26 may be moved to the position of the table 12. Even in this case, the deflection at the position of the table 12 can be appropriately suppressed, and the table 12 can be moved smoothly.

[0132] [Variation 3]

[0133] In the first and second embodiments described above, the configuration in which the deflection of the base 10 in the Z direction is suppressed by the second support portions 25 and 26 supporting the base 10 in the Z direction is exemplified.

[0134] On the other hand, a configuration may be adopted in which the deflection of the base 10 in the Y direction is corrected by a third support portion provided in the Y direction of the base 10 .

[0135] Figure 8 It is a schematic plan view of the base 10 according to the third modification.

[0136] Figure 8 The illustrated base 10 is supported in the Z direction by the first supporting portions 21 to 24 and the second supporting portions 25 and 26 , similarly to the first embodiment, and the deflection of the base 10 in the Z direction is suppressed by the second supporting portions 25 and 26 .

[0137] In addition, Figure 8 The base 10 is provided with a third support portion 71 that supports the base 10 in the Y direction between both end sides of the base 10 where the first support portions 21 to 24 are provided (between the position where the first support portions 21 and 22 are provided and the position where the first support portions 23 and 24 are provided). A pair of third support portions 71 is provided so as to sandwich the base 10 in the Y direction.

[0138] The third support part 71 is an active vibration isolation platform similar to the first support parts 21 to 24 and the second support parts 25 and 26, and has an air damper and an air pressure adjustment part. The air pressure of the air damper is controlled by the air pressure adjustment part to move the position of the support base 10 of the third support part 71 in the Y direction.

[0139] In addition, the controller 50 of this example also functions as a second deflection detection unit to detect the deflection of the base 10 in the Y direction. As a method for detecting the deflection of the base 10 in the Y direction, for example, temperature sensors (third temperature sensor, fourth temperature sensor) are respectively provided on the +Y side and -Y side of the base 10. Moreover, third deflection data indicating the deflection of the base 10 in the Y direction corresponding to the temperature difference between the +Y side and -Y side of the base 10 is pre-stored in the storage unit 51. Thus, the deflection of the base 10 in the Y direction is detected based on the temperatures of the +Y side and -Y side measured by the temperature sensors.

[0140] In addition, the deflection suppression portion 526 suppresses the deflection of the base 10 in the Z direction, similarly to the first or second embodiment, and controls the third support portion 71 based on the deflection in the Y direction detected by the second deflection detection portion to suppress the deflection of the base 10 in the Y direction.

[0141] Thus, in the base 10 according to the third modification, it is possible to suppress the deflection in the Y direction in addition to suppressing the deflection in the Z direction.

[0142] For example, when the base 10 is bent to bulge toward the +Y side, the air pressure of the air damper arranged on the third support part 71 on the -Y side is reduced to reduce the pressing force on the base 10, and the base 10 is pushed toward the -Y side by pressurizing the air pressure of the air damper arranged on the third support part 71 on the +Y side.

[0143] In addition, as the third support portion 71, for example, as in the second embodiment, it can also be set to a structure that can move in the X direction according to the position of the workbench 12. In this case, the deflection of the rail 11 at the position of the workbench 12 can be effectively suppressed, so that the movement of the workbench 12 can be smoother.

[0144] [Variation 4]

[0145] In the first and second embodiments, the susceptor 10 is exemplified in which the first direction is the X direction, the second direction is the Y direction, and the X direction is the long side. However, the present invention is not limited thereto.

[0146] For example, the base 10 may have the same or substantially the same length in the X direction and the Y direction.

[0147] In this case, it is preferable to provide the second support portion not only in the center portion in the X direction but also in the center portion in the Y direction to suppress the deflection of the base 10 .

[0148] In the second embodiment, the rail 11 is laid along the X direction as the long side direction and the workbench 12 is movable in the X direction, but it can also be a structure that can move in both the X direction and the Y direction. In this case, it is preferred that the second support portion is also movable in the X direction and the Y direction.

[0149] [Variation 5]

[0150] In the above embodiment, an example is shown in which active vibration isolating tables are used as the first supporting parts 21 to 24, but the present invention is not limited thereto. For example, the first supporting parts 21 to 24 may be formed of passive vibration isolating tables, or supporting members without vibration isolating functions may be used.

[0151] [Variation 6]

[0152] In the above embodiment, the second support parts 25 and 26 are shown as an example of being composed of an active vibration isolation table having an air damper 40B, but the present invention is not limited thereto. For example, a structure may be provided in which the support point of the base 10 is changed by moving the support shaft of the support base 10 forward and backward by the driving force of a motor or the like.

[0153] [Variation 7]

[0154] In the above-mentioned embodiment, the processing machine 1, 1A is exemplified as the base supporting device, but as mentioned above, the base supporting device of the present invention can also be applied to any device having a base 10 that constitutes a horizontal reference plane, for example, it can also be applied to a measuring device that measures the shape, length, etc. of a measurement object placed on the base 10.

Claims

1. A base support device, comprising: a base having an upper surface forming a horizontal plane, the horizontal plane including a first direction and a second direction orthogonal to the first direction; first supporting parts, which are respectively provided at both end sides of the base in the first direction, and support the base in a third direction orthogonal to the first direction and the second direction; A second support portion, which is disposed between both ends of the base supported by the first support portion, supports the base in the third direction, and is capable of adjusting a support position of the base in the third direction; a deflection detection unit configured to detect a deflection amount of the base in the third direction; as well as a deflection control portion that controls the second support portion, The deflection control unit controls the second support unit based on the deflection amount detected by the deflection detection unit so that the upper surface is parallel to the first direction.

2. The base support device according to claim 1, wherein: The second support part is an active vibration isolating platform, which includes: an air damper that supports the base by air pressure; and an air pressure adjusting part that adjusts the air pressure of the air damper. The deflection control unit controls the air pressure adjustment unit based on the deflection amount to adjust the air pressure.

3. The base support device according to claim 1, wherein: The second support portion is disposed at a position corresponding to the center of gravity of the base.

4. The base support device according to claim 1, further comprising: A rail, which is arranged on the upper surface and extends along the first direction; a workbench capable of moving along the first direction on the rail; a workbench position detection unit, which detects the position of the workbench in the first direction; as well as a support moving portion that moves the second support portion relative to the base along the first direction, The support moving portion moves the second support portion to a position corresponding to the worktable according to the movement of the worktable in the first direction.

5. The base support device according to claim 1, further comprising: a first temperature sensor that measures the temperature of the upper surface; and a second temperature sensor for measuring the temperature of a lower surface of the base on the side opposite to the upper surface, The deflection detection unit detects the deflection amount based on first deflection data obtained by associating a temperature difference between the upper surface and the lower surface with the deflection amount of the base, and temperatures measured by the first temperature sensor and the second temperature sensor.

6. The base support device according to claim 1, further comprising: A rail, which is arranged on the upper surface and extends along the first direction; a workbench movable on the rails along the first direction; and a workbench position detection unit, which detects the position of the workbench in the first direction, The deflection detection unit detects the deflection amount based on second deflection data obtained by correlating the position of the table in the first direction with the deflection amount of the base when the table moves in the first direction along the rail.

7. The base support device according to claim 1, further comprising: a second deflection detection section that detects a deflection amount of the base in the second direction as a second deflection amount; and a third support portion, which is disposed between both ends of the base supported by the first support portion, supports the base in the second direction, and is capable of adjusting a support position of the base in the second direction; The deflection control section further controls the third support section based on the second deflection amount detected by the second deflection detection section so that the base is parallel to the first direction.

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