Batch-type substrate processing apparatus

Abstract

The present invention relates to a batch-type substrate processing apparatus for preventing powder formation caused by condensation of a process gas on an inner circumferential surface of a gas inlet port, the batch-type substrate processing apparatus comprising: a reaction tube for providing a processing space, a plurality of substrates are accommodated in the processing space; an annular flange portion having a fluid passage provided therein and supporting the reaction tube; a first sealing member provided between the reaction tube and the flange portion; a refrigerant supply unit for supplying a refrigerant to the fluid passage; a gas supply duct for supplying a process gas to the processing space through the flange portion; a gas inlet port coupled to an outer end of the gas supply conduit; and a heater part for heating the gas inlet port.

Description

Technical Field

[0001] The present invention relates to a batch type substrate processing apparatus, and more particularly to a batch type substrate processing apparatus for preventing powder from being accumulated due to condensation of a process gas on an inner circumferential surface of a gas inlet port. Background Art

[0002] Generally, a substrate processing apparatus is an apparatus in which a substrate to be processed in a processing space is disposed so as to deposit reactive particles contained in a process gas injected into the processing space using a chemical vapor deposition (CVD) method or an atomic layer deposition (ALD) method. There are a single wafer type capable of performing a processing process on one substrate and a batch type capable of performing a processing process on a plurality of substrates at the same time.

[0003] The batch type substrate processing apparatus may include a vertical reaction tube, a flange portion supporting the reaction tube, and a sealing member interposed between the reaction tube and the flange portion to seal a space between the reaction tube and the flange portion.

[0004] Here, since the sealing member may be deformed and / or damaged due to the high process temperature, a fluid passage may be formed in the flange portion to allow the refrigerant to flow so as not to be deformed and / or damaged due to the high temperature.

[0005] Here, the gas supply pipeline that supplies the process gas to the processing space of the reaction tube by passing through the flange portion and / or by passing through the gas inlet port connected to the outer end of the gas supply pipeline can be thermally connected to the flange portion (for example, in contact with the flange portion), resulting in heat loss. In this case, the process gas inside the gas supply pipeline and / or the gas inlet port is condensed to produce powder, and then accumulates on the inner surface of the gas supply pipeline and / or the gas inlet port. Specifically, the sealing member cooled by the refrigerant of the fluid passage of the flange portion and the process gas can be in direct contact with each other, and therefore the powder may accumulate in a concentrated manner. The powder accumulated in this way becomes the main source of particles, which causes serious problems due to being supplied to the processing space together with the process gas, thereby deteriorating the quality of the film.

[0006] Therefore, there is a need for a configuration capable of preventing and / or suppressing accumulation of powder on the inner peripheral surface of the gas supply pipe and the inner peripheral surface of the gas inlet port and the coupling portion of the gas supply pipe and the gas inlet port.

[0007] (Patent Document 1) Korean Patent Publication No. 10-2007-0072777 Summary of the invention

[0008] Technical issues

[0009] The present invention provides a batch type substrate processing apparatus, which has a heater portion for heating a gas inlet port, wherein the gas inlet port is coupled to an outer end portion of a gas supply pipe, and the gas supply pipe supplies process gas through a flange portion, in which a fluid passage for a refrigerant is formed.

[0010] Technical Solutions

[0011] According to an embodiment of the present invention, a batch-type substrate processing apparatus may include: a reaction tube, configured to provide a processing space, in which a plurality of substrates are accommodated; an annular flange portion, provided with a fluid passage and configured to support the reaction tube; a first sealing member, disposed between the reaction tube and the flange portion; a refrigerant supply portion, configured to supply a refrigerant to the fluid passage; a gas supply pipe, configured to supply a process gas to the processing space through the flange portion; a gas inlet port, coupled to an outer end portion of the gas supply pipe; and a heater portion, configured to heat the gas inlet port.

[0012] The heater portion may include: a line heater extending in a circumferential direction of the flange portion; and a metal block embedded in the line heater and disposed to surround the gas inlet port.

[0013] The metal block may include: an upper block configured to cover an upper portion of the gas inlet port; and a lower block configured to cover a lower portion of the gas inlet port.

[0014] The pipeline heater may include: an upper heater disposed in the upper block; and a lower heater disposed in the lower block, wherein the upper block and the lower block may include heater insertion grooves, the upper heater and the lower heater are respectively inserted into the heater insertion grooves, and the metal block further includes an upper block top cover and a lower block top cover, the upper block top cover and the lower block top cover are configured to cover the heater insertion groove of the upper block and the heater insertion groove of the lower block, respectively.

[0015] The batch type substrate processing apparatus may further include: a temperature detection portion configured to detect a temperature of the heater portion; and a heating control portion configured to control a heating temperature of the heater portion according to the temperature detected by the temperature detection portion.

[0016] The gas supply pipe may be provided in plurality and pass through the flange portion in a radial direction, wherein the plurality of gas supply pipes may be arranged along a circumferential direction of the flange portion, and a length of the inline heater may be proportional to the number of gas supply pipes.

[0017] The temperature detection portion may include: a first temperature measuring member provided at a central portion of the heater portion in an extending direction of the line heater; and a second temperature measuring member spaced apart from the first temperature measuring member in the extending direction of the line heater and provided at an edge portion of the heater portion in the extending direction of the line heater.

[0018] The heating control portion may be configured to: control the heating temperature of the heater portion based on a first temperature of the heater portion measured from the first temperature measuring member; and control the heating temperature of the heater portion by reflecting the second temperature of the heater portion according to a difference between the first temperature of the heater portion and a second temperature of the heater portion measured from the second temperature measuring member.

[0019] The heating control portion may be configured to reflect the second temperature of the heater portion when the difference between the first temperature of the heater portion and the second temperature of the heater portion is greater than an allowable value.

[0020] An interval between the first temperature measuring member and the second temperature measuring member may be greater than an interval between the plurality of gas supply pipes.

[0021] The gas supply pipe may pass through the reaction tube in a radial direction, and the batch type substrate processing apparatus may further include: a second sealing member disposed between the reaction tube and the gas supply pipe; and a third sealing member disposed between the gas supply pipe and the gas inlet port.

[0022] The flange portion may be disposed outside the lower end portion of the reaction tube, the gas supply pipe may further pass through the flange portion in the radial direction, the second sealing member may be disposed between the reaction tube and the flange portion, the third sealing member may be disposed between the gas supply pipe and the flange portion, and the heater portion may be disposed outside the flange portion.

[0023] An inner diameter of the gas inlet port may be smaller than an inner diameter of the gas supply pipe.

[0024] Beneficial Effects

[0025] In a batch-type substrate processing apparatus according to an embodiment of the present invention, a fluid passage may be provided in the flange portion to prevent thermal deformation and / or damage of a first sealing member provided between the reaction tube and the flange portion, thereby heating the gas inlet port through the heater portion when the refrigerant flows, and thereby preventing and / or suppressing accumulation of powder on the inner circumferential surface of the gas supply pipe and the inner circumferential surface of the gas inlet port and at the coupling portion between the gas supply pipe and the gas inlet port due to the concentration of the process gas.

[0026] Here, the heater section may be composed of a line heater extending in the circumferential direction of the flange section and a metal block, the line heater being built in the metal block to maintain the internal temperature of each of the gas inlet port and / or the gas supply pipe at a temperature at which the process gas is not condensed (for example, 150° C. or higher). In addition, even when the gas supply pipe is provided in a plurality of sections, the heater section may be provided in proportion to the number of the gas supply pipes, and the internal temperature of each gas supply pipe and the gas inlet port may be uniformly maintained at a temperature at which the process gas is not condensed by the heater section (or the line heater) extending in the circumferential direction of the flange section.

[0027] Here, the temperature of the heater part is detected by the temperature detection part, and the heating temperature of the heater part is controlled to control the gas inlet port to a desired temperature. In addition, the temperature detection part may be composed of a first temperature measuring member provided at a central portion in an extending direction of the line heater of the heater part and a second temperature measuring member provided at an edge portion in an extending direction of the line heater, so as to control the plurality of gas inlet ports to a uniform temperature by reflecting the second temperature of the heater part measured from the second temperature measuring member according to a difference between the second temperature of the heater part and the first temperature of the heater part while controlling the heating temperature of the heater part based on the first temperature of the heater part measured from the first temperature measuring member. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 is a schematic perspective view of a batch type substrate processing apparatus according to an embodiment of the present invention.

[0029] Figure 2 is an exploded perspective view of a heater portion according to an embodiment of the present invention.

[0030] Figure 3 is a conceptual diagram for explaining a coupling structure of a gas inlet port and a heater portion according to an embodiment of the present invention. DETAILED DESCRIPTION

[0031] Specific embodiments will be described in more detail below with reference to the accompanying drawings. However, the present invention can be implemented in different forms and should not be construed as being limited to the embodiments described herein. Specifically, these embodiments are provided to make the present disclosure thorough and complete, and will fully convey the scope of the present invention to those skilled in the art. In the description, the same reference numerals are used to identify the same elements. In the various figures, the sizes of the layers and regions are exaggerated for clarity of illustration. The same reference numerals always refer to the same elements.

[0032] Figure 1 is a schematic perspective view of a batch type substrate processing apparatus according to an embodiment of the present invention.

[0033] Reference Figure 1 According to an embodiment of the present invention, a batch type substrate processing apparatus (100) may include: a reaction tube (110) providing a processing space in which a plurality of substrates are accommodated; an annular flange portion (120) provided with a fluid passage (121a and 121b) and supporting the reaction tube (110); a first sealing member (131) provided between the reaction tube (110) and the flange portion (120); a refrigerant supply portion (140) supplying a refrigerant to the fluid passage (121a and 121b); a gas supply pipe (150) supplying a process gas to the processing space through the flange portion (120); a gas inlet port (160) coupled to an outer end portion of the gas supply pipe (150); and a heater portion (170) heating the gas inlet port (160).

[0034] The reaction tube (110) may be made of a heat-resistant material (e.g., quartz or ceramic), has a cylindrical shape with a closed upper portion and an open lower portion, and may provide a processing space in which a plurality of substrates are accommodated to be processed in the processing space. The processing space of the reaction tube (110) accommodates a substrate boat and is a space in which an actual processing process (e.g., a deposition process) is performed, and the plurality of substrates are stacked in the substrate boat in the longitudinal direction of the reaction tube (110).

[0035] Here, the substrate boat can be configured to support the substrate (10) and can be configured so that the multiple substrates (10) are loaded in the longitudinal direction (i.e., the upward direction and the downward direction) of the process tube (110), and a plurality of unit processing spaces in which the multiple substrates (10) are individually processed can be defined in the substrate boat.

[0036] The flange portion (120) may be provided in a ring shape at the lower end of the reaction tube (110) along the circumference of the reaction tube (110) to support the reaction tube (110), and may be made of metal such as stainless steel (SUS), and a first sealing member (131) such as an O-ring may be provided at a portion where the flange portion (120) and the reaction tube (110) contact each other to prevent the process gas from leaking between the reaction tube (110) and the flange portion (120). Here, the flange portion (120) may form a concentric circle with the reaction tube (110).

[0037] Here, the fluid passages (121a and 121b) may be provided in the flange portion (120), and the refrigerant may flow into the fluid passages (121a and 121b) to cool the first sealing member (131) in contact with the flange portion (120), thereby preventing and / or suppressing thermal deformation and / or damage of the first sealing member (131). For example, the fluid passages (121a and 121b) may be provided inside the flange portion (120).

[0038] The first sealing member (131) may be disposed between the reaction tube (110) and the flange portion (120) to block a gap between the reaction tube (110) and the flange portion (120), thereby preventing the process gas from leaking out of the processing space.

[0039] Here, the first sealing member (131) may be an O-ring or the like and may be provided in a ring shape along the circumference of the reaction tube (110). Since the substrate treatment process may be performed at a high temperature of 600° C. or higher, heat may be transferred from the reaction tube (110) due to the high process temperature (or handling temperature), thereby causing deformation and / or damage.

[0040] The refrigerant supply part (140) can supply a refrigerant such as cooling water to the fluid passages (121a and 121b) and can allow the refrigerant to flow through the fluid passages (121a and 121b), so that the first sealing member (131) is not deformed and / or damaged due to high temperature, and the refrigerant can cool the first sealing member (131) by exchanging heat with the first sealing member (131) through the flange part (120). Here, since the flange part (120) is made of a metal having excellent thermal conductivity, heat exchange between the refrigerant and the first sealing member (131) can be effectively performed, and thus (fast) heat exchange between the first sealing member (131) and the flange part (120) and (fast) heat exchange between the flange part (120) and the refrigerant can be effectively performed due to the excellent thermal conductivity, (fast) heat exchange between the refrigerant and the first sealing member (131) can be substantially performed due to the excellent thermal conductivity, and the first sealing member (131) can be effectively cooled.

[0041] Here, the fluid passages (121a and 121b) may extend along the circumferential direction of the flange portion (120) and may be arranged along the shape of the first sealing member (131) so that the first sealing member (131) is effectively and uniformly cooled as a whole. For example, when the first sealing member (131) has a ring shape, the fluid passages (121a and 121b) may be arranged so that the refrigerant circulates along the circumferential direction of the flange portion (120).

[0042] The gas supply pipe (150) may supply the process gas to the processing space through the flange portion (120) and may at least partially pass through the flange portion (120). Here, one end (or inner end) of the gas supply pipe (150) may face the inside of the reaction tube (110) and may be disposed at the inside of the reaction tube (110), and the other end (or outer end) of the gas supply pipe (150) may face the outside of the reaction tube (110) and may be disposed at the outside of the reaction tube (110). Here, a nozzle (not shown) for injecting the process gas into the processing space may be disposed at the inner end (or one end) of the gas supply pipe (150), and a separate nozzle (not shown) may be connected (or coupled) to the inner end of the gas supply pipe (150), or the inner end of the gas supply pipe (150) may be disposed as a nozzle (not shown).

[0043] For example, when the flange portion (120) is disposed at the lower portion of the reaction tube (110), the inner end portion of the gas supply pipe (150) passing through the side wall of the flange portion (120) in the radial direction toward the center of the flange portion (120) may be bent to extend in the longitudinal direction (or upward direction) of the reaction tube (110) to be disposed at the inside of the reaction tube (110), and when the flange portion (120) is disposed at the outside of the reaction tube (110), the inner end portion of the gas supply pipe (150) passing through the side wall of the flange portion (120) in the radial direction may also pass through the side wall of the reaction tube (110) in the radial direction toward the center of the reaction tube (110) to be disposed at the inside of the reaction tube (110). Here, the gas supply pipe (150) may be made of metal such as stainless steel (SUS), but the material of the gas supply pipe (150) is not limited thereto and may vary.

[0044] The gas inlet port (160) may be coupled to an outer end (or the other end) of the gas supply pipe (150) and may be connected to a gas supply line (not shown) to introduce (introduce) a process gas supplied from a gas supply source (not shown) into the gas supply pipe (150) through the gas supply line (not shown). Here, a heating device (not shown) such as a heating jacket may be provided in the gas supply line (not shown) to prevent condensation of the process gas so that the process gas is supplied at a temperature (e.g., 150° C. or higher) at which the process gas is not condensed. Here, the gas inlet port (160) may be made of a metal such as stainless steel (SUS), and therefore, due to the thermal influence of the excellent thermal conductivity of the flange portion (120), heat loss due to the refrigerant used to cool the first sealing member (131) may occur.

[0045] For example, the gas inlet port (160) may be coupled to the outer end of the gas supply pipe (150) to protrude outward (in the radial direction) from the reaction tube (110) and / or the flange portion (120), and may also be in contact with the flange portion (120). When the gas inlet port (160) is in contact with the flange portion (120), the gas inlet port (160) may be thermally connected to the flange portion (120), and thus the heat of the gas inlet port (160) (i.e., the heat of the process gas in the gas inlet port) is (quickly) conducted to the refrigerant flowing through the fluid passages (121a and 121b) of the flange portion (120), thereby causing heat loss.

[0046] In this case, the process gas in the gas inlet port (160) may be condensed into powder and then accumulated on the inner surface of the gas inlet port (160), and the process gas may also be condensed to cause the powder to accumulate at the coupling (or connecting) portion between the gas inlet port (160) and the gas supply pipe (150). As explained above, the powder accumulated on the inner surface of the gas inlet port (160) and / or at the coupling portion of the gas inlet port (160) and the gas supply pipe (150) may be supplied to the processing space as particles together with the process gas, thereby causing a serious problem of deterioration in the quality of the thin film formed (or deposited) by the substrate processing process.

[0047] The heater portion (170) can heat the gas inlet port (160) and prevent heat loss from occurring in the gas inlet port (160) due to the flow of the refrigerant through the fluid passages (121a and 121b) of the flange portion (120), and prevent the process gas in the gas inlet port (160) from condensing and becoming powder due to the heat loss of the gas inlet port (160). Therefore, the conventional problem in which powder accumulates on the inner surface of the gas inlet port (160) and / or on the coupling portion of the gas inlet port (160) and the gas supply pipe (150) and is then supplied to the processing space together with the process gas to act as particles, thereby deteriorating the quality of the thin film in the substrate processing space can be solved. For example, the heater portion (170) can be disposed to surround the gas inlet port (160) to heat the gas inlet port (160) as a whole (uniformly).

[0048] Therefore, the batch type substrate processing apparatus (100) according to the present invention can provide fluid passages (121a and 121b) in the flange portion (120) to prevent thermal deformation and / or damage of the first sealing member (131) provided between the reaction tube (110) and the flange portion (120) for sealing the space between the reaction tube (110) and the flange portion (120), thereby heating the gas inlet port (160) by the heater portion (170) when the refrigerant flows, and thus can prevent powder from condensing (or losing heat) the process gas caused by the heat loss of the gas inlet port (160) and accumulating on the inner surface of the gas inlet port (160) and the coupling portion of the gas inlet port (160) and the gas supply pipe (150). Therefore, a serious problem of quality deterioration of a thin film in which powder is supplied to the processing space together with the process gas to act as particles in the substrate processing process can be solved.

[0049] Figure 2 is an exploded perspective view of a heater portion according to an embodiment of the present invention.

[0050] Reference Figure 2The heater portion (170) may include a pipeline heater (171) and a metal block (172), the pipeline heater (171) extending along the circumferential direction of the flange portion (120), the pipeline heater (171) being built in the metal block (172) and the metal block (172) being arranged to surround the gas inlet port (160). The pipeline heater (171) may extend along the circumferential direction of the flange portion (120) and may be arranged parallel to the fluid passages (121a and 121b) (or in parallel with the fluid passages 121a and 121b). For example, the pipeline heater (171) may have a curved shape along the circumferential direction of the annular flange portion (120). In this case, the fluid passages (121a and 121b) through which the refrigerant flows and the pipeline heater (171) can face each other, and thus the gas inlet port (160) affected by the refrigerant flowing through the fluid passages (121a and 121b) can be uniformly heated in the circumferential direction of the flange portion (120), and the linear cooling (or pipeline cooling) performed by the flow of the refrigerant along the fluid passages (121a and 121b) can be (thermally) offset by the linear heating (or pipeline heating) of the pipeline heater (171) at the gas inlet port (160).

[0051] In addition, the pipeline heater (171) can be arranged in parallel with the first sealing member (131), and thus the heat from the pipeline heater (171) can be evenly distributed without being concentrated on a portion of the first sealing member (131), and the pipeline heater (171) can be arranged farther from the first sealing member (131) than the fluid passages (121a and 121b), and thus the thermal influence of the pipeline heater (171) on the first sealing member (131) can be minimized (or can be prevented).

[0052] The metal block (172) may be disposed to surround the gas inlet port (160), may be provided with a pipeline heater (171) located in the metal block (172), may extend along the extension direction of the pipeline heater (171), and may conduct the heat of the pipeline heater (171). That is, the metal block (172) may effectively and uniformly heat the gas inlet port (160) by heat conduction and may surround the gas inlet port (160) to uniformly heat the entire area. For example, the metal block (172) may be at least partially made of aluminum (Al), and the heat of the pipeline heater (171) may be quickly transferred (or conducted) by the high thermal conductivity of aluminum (Al) to effectively heat the gas inlet port (160).

[0053] Here, the metal block (172) may include an upper block (172a) covering an upper portion of the gas inlet port (160), and a lower block (172b) covering a lower portion of the gas inlet port (160). The upper block (172a) may cover an upper portion of the gas inlet port (160), the lower block (172b) may cover a lower portion of the gas inlet port (160), and the upper block (172a) and the lower block (172b) may surround the gas inlet port (160) from above and below.

[0054] For example, the upper block (172a) and the lower block (172b) may be formed symmetrically (vertically) and may be coupled to and separated from each other. The upper block (172a) and the lower block (172b) may be coupled to intersect each other from above and below, with the gas inlet port (160) therebetween to surround the gas inlet port (160), and the upper block (172a) and the lower block (172b) may also be separated from each other for maintenance, etc. Here, a coupling groove may be defined along the circumference of the gas inlet port (160) so that the gas inlet port (160) is at least partially inserted into and coupled to the upper block (172a) and the lower block (172b). Here, the circumference of the upper (half) portion of the gas inlet port (160) may be inserted into the coupling groove of the upper block (172a), and the circumference of the lower (half) portion of the gas inlet port (160) may be inserted into the coupling groove of the lower block (172b).

[0055] In the case where the metal block (172) is composed of an upper block (172a) and a lower block (172b), it is possible to facilitate mounting the heater portion (170) (i.e., mounting the metal block) to the gas inlet port (160), and in the case where a plurality of gas supply pipes (150) are respectively arranged along the circumference of the flange portion (120) in the radial direction by passing through the flange portion (120) in the radial direction, a plurality of gas inlet ports (160) respectively coupled to the plurality of gas supply pipes (150) can be surrounded (or covered) at the same time, and the plurality of gas inlet ports (160) can be heated together (integrally) at the same time. Therefore, the plurality of gas inlet ports (160) can be uniformly heated, and even if a minimum number (e.g., one or two) of inline heaters (171) are used, the plurality of gas inlet ports (160) can be effectively heated.

[0056] In the case where the metal block (172) is composed of a left block and a right block to surround the gas inlet port (160) at both sides of the gas inlet port (160), not only is it difficult to embed the line heater (171) extending along the circumferential direction of the flange portion (120), but also when trying to surround the plurality of gas inlet ports (160) (which are respectively coupled to the plurality of gas supply pipes 150 arranged along the circumferential direction of the flange portion 120) by passing through the flange portion (120) in the radial direction, the plurality of gas inlet ports (160) may not be surrounded all at once, and when trying to surround the plurality of gas inlet ports (160) all at once, the plurality of gas inlet ports (160) may not be surrounded individually. However, the upper block (172a) and the lower block (172b) can surround the plurality of gas inlet ports (160) at the same time when respectively surrounding the plurality of gas inlet ports (160).

[0057] In addition, when the metal block (172) is composed of a front block and a rear block to surround the gas inlet port (160) from the front and rear, the gas inlet port (160) must pass through both the front block and the rear block, and thus it is difficult for the front block and the rear block to contact (or be in close contact with) the gas inlet port (160), and the front block and the rear block may be formed asymmetrically due to different distances from the flange portion (120). However, the upper block (172a) and the lower block (172b) can be arranged in a (vertically) symmetrical manner by surrounding the gas inlet port (160) from above and below and being in close contact (or contact) with the gas inlet port (160).

[0058] Here, the pipeline heater (171) may include an upper heater (171a) disposed on an upper block (172a) and a lower heater (171b) disposed on a lower block (172b). The upper block (172a) and the lower block (172b) may be symmetrically (vertically) disposed, and thus the upper heater (171a) may be symmetrically disposed to the upper block (172a), and the lower heater (171b) may be symmetrically disposed to the lower block (172b). The upper heater (171a) and the lower heater (171b) may be symmetrically disposed at the same distance from the gas inlet port (160) and may be configured in the same number.

[0059] For example, one upper heater (171a) may be disposed in a curved shape in the upper block (172a), and one lower heater (171b) may be disposed in a curved shape in the lower block (172b). The upper heater (171a) and the lower heater (171b) may be parallel to each other and symmetrical with respect to the gas inlet port (160). The gas inlet port (160) may be uniformly and effectively heated by the upper heater (171a) and the lower heater (171b), and even when the plurality of gas inlet ports (160) are heated simultaneously, the plurality of gas inlet ports (160) may be effectively and uniformly heated.

[0060] In addition, the upper block (172a) and the lower block (172b) may include heater insertion grooves (172c) into which the upper heater (171a) and the lower heater (171b) are respectively inserted, and the metal block (172) may also include upper block top covers (173a) and lower block top covers (173b) that cover the heater insertion grooves (172c) of the upper block (172a) and the lower block (172b), respectively. The heater insertion grooves (172c) may be defined in the upper block (172a) and the lower block (172b), and the upper heater (171a) may be inserted into the heater insertion grooves (172c) of the upper block (172a) and the lower heater (171b) may be inserted into the heater insertion grooves (172c) of the lower block (172b). Therefore, even when each of the upper heater (171a) and the lower heater (171b) has a curved shape, the upper heater (171a) can be simply and easily embedded in the upper block (172a), and the lower heater (171b) can be embedded in the lower block (172b). The upper block (172a) and the lower block (172b) can be in contact with the upper heater (171a) and the lower heater (171b) and the gas inlet port (160), respectively, and thus can be made of aluminum (Al) to effectively transfer (or conduct) the heat of the upper heater (171a) and the lower heater (171b) to the gas inlet port (160) through high thermal conductivity.

[0061] Here, since the metal block (172) also includes an upper block top cover (173a) and a lower block top cover (173b), the upper block top cover (173a) can cover the heater insertion groove (172c) of the upper block (172a), so that the upper heater (171a) is embedded in the metal block (172) (i.e., embedded in the upper block) and the lower heater (171b) is embedded in the metal block (172) (i.e., embedded in the lower block), so that the heater insertion groove (172c) of the lower block top cover (173b) covers the heater insertion groove (172c). After the upper heater (171a) and the lower heater (171b) are respectively inserted into the heater insertion grooves (172c) of the upper block (172a) and the lower block (172b), the upper block top cover (173a) and the lower block top cover (173b) can prevent the upper heater (171a) from being separated from the lower heater (171b) by covering the heater insertion grooves (172c) of the upper block (172a) and the lower block (172b), and can play a role in protecting the upper heater (171a) and the lower heater (171b).

[0062] For example, each of the upper block cap (173a) and the lower block cap (173b) may be made of aluminum (Al) for close coupling (or contact) with the upper block (172a) and the lower block (172b), but is not limited thereto, and may be made of an insulating material to prevent heat of the upper heater (171a) and the lower heater (171b) from being dissipated to the outside (or to the opposite side of the gas inlet port).

[0063] Therefore, since the heater portion (170) is composed of a line heater (171) extending in the circumferential direction of the flange portion (120) and a metal block (172) in which the line heater (171) is embedded, the batch type substrate processing apparatus (100) according to the present invention can be arranged to surround the gas inlet port (160), thereby preventing heat loss of the gas inlet port (160) and maintaining the internal temperature of the gas inlet port (160) at a temperature at which the process gas is not condensed.

[0064] According to the present invention, the batch type substrate processing device (100) may also include a temperature detection unit (180) and a heating control unit (175), wherein the temperature detection unit (180) detects the temperature of the heater unit (170), and the heating control unit (175) controls the heating temperature of the heater unit (170) according to the temperature detected by the temperature detection unit (180).

[0065] The temperature detection unit (180) can detect the temperature of the heater unit (170) (for example, the temperature of the pipeline heater), and the (internal) temperature of the gas inlet port (160) can be known from the detected temperature of the heater unit (170). Here, the heating temperature of the heater unit (170) can be the (heating) temperature set in the heating control unit (175).

[0066] The heating control unit (175) can control the heating temperature of the heater unit (170) according to the temperature detected by the temperature detection unit (180), and adjust the heating temperature of the heater unit (170) according to the detected temperature of the heater unit (170) (i.e., the (internal) temperature of the identified gas inlet port (160)) to maintain the internal temperature of the gas inlet port (160) at a temperature at which the process gas is not condensed (e.g., 150°C to 170°C).

[0067] Therefore, the power (or fuel) consumption for the heat generation (or heating) of the heater portion (170) can be reduced (or the power (or fuel) consumption can be minimized) without affecting the cooling of the first sealing member (131) through the flange portion (120) due to the heating of the heater portion (170).

[0068] A plurality of gas supply pipes (150) may be provided and may pass through the flange portion (120) in a radial direction (or thickness direction), and the plurality of gas supply pipes (150) may be provided along the circumferential direction of the flange portion (120). A plurality of gas supply pipes (150) may be provided, and each of the plurality of gas supply pipes (150) may pass through the flange portion (120) in a radial direction, and the plurality of gas supply pipes (150) may be provided along the circumferential direction of the flange portion (120) and in parallel with the radial direction. A gas inlet port (160) may be coupled to an outer end portion of each of the plurality of gas supply pipes (150), and different gases may be supplied to each of the gas supply pipes (150), or the same gas may be supplied to the gas supply pipes (150). Here, the plurality of gas inlet ports (160) respectively coupled to the plurality of gas supply pipes (150) may be heated by a heater portion (170) to prevent condensation of (process) gas.

[0069] Here, the length of the inline heater (171) may be proportional to the number of gas supply pipes (150) and may become longer as the number of gas supply pipes (150) increases. That is, the length of the inline heater (171) may be proportional to the number of gas inlet ports (160), the number of gas inlet ports (160) increases to the same number as the number of gas supply pipes (150), and the inline heater (171) may heat the plurality of gas inlet ports (160) at the same time. Therefore, regardless of the number of gas supply pipes (150) (i.e., the number of gas inlet ports), the plurality of gas inlet ports (160) may be uniformly heated.

[0070] Therefore, in the batch type substrate processing apparatus (100) according to the present invention, even when a plurality of gas supply pipes (150) are provided, the heater portion (170) can be configured in proportion to the number of gas supply pipes (150), and the internal temperature of the plurality of gas inlet ports (160) can be made uniform by means of a pipeline heater (171) extending in the circumferential direction of the flange portion (120), and the internal temperature of each gas inlet port (160) can be maintained at a temperature at which the process gas is not condensed.

[0071] Here, the temperature detection part (180) may include a first temperature measuring member (181) and a second temperature measuring member (182), the first temperature measuring member (181) being disposed at a central portion of the line heater (171) in an extending direction of the heater part (170), and the second temperature measuring member (182) being disposed at an edge portion of the line heater (171) in an extending direction of the heater part (170) and spaced apart from the first temperature measuring member (181) in the extending direction of the line heater (171). The first temperature measuring member (181) may be disposed at a central portion of the line heater (171) in an extending direction of the heater part (170) to measure a first temperature of the heater part (170), and the first temperature of the heater part (170) may be a representative temperature of the heater part (170) (or representative temperatures measured in a similar manner in several portions).

[0072] The second temperature measuring member (182) may be spaced apart from the first temperature measuring member (181) in the extension direction of the line heater (171) and may be disposed at an edge portion of the line heater (171) in the extension direction of the heater portion (170) to measure a second temperature of the heater portion (170), and the second temperature of the heater portion (170) may be a specific temperature of the heater portion (170) (or a specific temperature that only appears at a specific portion). Here, the second temperature measuring member (182) may be provided in plurality and may be symmetrically disposed at both sides of the first temperature measuring member (181), but since the temperature characteristics are symmetrically displayed according to the extension direction position of the line heater (171), (only) one second temperature measuring member (182) may be disposed at either side of the first temperature measuring member (181).

[0073] For example, the first temperature measuring member (181) and the second temperature measuring member (182) may be thermocouples (T / C), but are not limited thereto, and the temperature of the heater member (170) (ie, the first temperature and the second temperature) may be measured in various ways.

[0074] The heating control part (175) may control the heating temperature of the heater part (170) based on the first temperature of the heater part (170) measured from the first temperature measuring member (181), and may control the heating temperature of the heater part (170) by reflecting the second temperature of the heater part (170) based on the difference between the first temperature of the heater part (170) and the second temperature of the heater part (170) measured from the second temperature measuring member (182). The heating control part (175) may control the heating temperature of the heater part (170) based on the first temperature of the heater part (170) measured from the first temperature measuring member (181), and may control the heating temperature of the heater part (170) based on the first temperature of the heater part (170), the first temperature being a representative temperature of the heater part (170). Since the representative temperature of the heater portion (170) is measured at most positions (or portions), the representative temperature can be considered as the actual temperature of the heater portion (170), and the heating temperature of the heater portion (170) can be controlled based on the first temperature of the heater portion (170).

[0075] In addition, the heating control part (175) may reflect the second temperature of the heater part (170) according to the difference between the second temperature of the heater part (170) measured by the second temperature measuring member (182) and the first temperature of the heater part (170) when performing heating temperature control on the heater part (170). If the difference between the first temperature of the heater part (170) and the second temperature of the heater part (170) is not large and is therefore ignored, the second temperature of the heater part (170) may not be reflected. If the difference between the first temperature of the heater part (170) and the second temperature of the heater part (170) is large so that a specific temperature of the heater part (170) has an influence, the heating temperature of the heater part (170) may be controlled by reflecting the second temperature of the heater part (170). Since the specific temperature of the heater section (170) is measured only at a small number of specific positions (or portions), the heating temperature of the heater section (170) can be controlled by reflecting the second temperature of the heater section (170) to the first temperature of the heater section (170) based on the difference between the first temperature of the heater section (170) and the second temperature of the heater section (170).

[0076] For example, the heating temperature of the heater part (170) to be changed can be determined mainly based on the first temperature of the heater part (170), and the heating temperature of the heater part (170) to be changed can be assisted by reflecting the second temperature of the heater part (170) according to the size of the difference between the first temperature of the heater part (170) and the second temperature of the heater part (170).

[0077] Here, when the difference between the first temperature of the heater section (170) and the second temperature of the heater section (170) is greater than the allowable value, the heating control section (175) may reflect the second temperature of the heater section (170). If the difference between the first temperature of the heater section (170) and the second temperature of the heater section (170) is less than or equal to the second temperature, the second temperature (or specific temperature) of the heater section (170) may be at a negligible level, and thus the heating control section (175) may control the heating temperature of the heater section (170) based (only) on the first temperature of the heater section (170) without reflecting the second temperature of the heater section (170). In addition, when the difference between the first temperature of the heater section (170) and the second temperature of the heater section (170) is greater than the allowable value, the second temperature (or specific temperature) of the heater section (170) may have the effect of partially causing the temperature (or part) to be lower than the temperature at which the process gas is not condensed, and thus the heating control section (175) may control the heating temperature of the heater section (170) by reflecting the second temperature of the heater section (170) (reflecting the second temperature of the heater section 170 to the first temperature of the heater section). That is, when the difference between the first temperature of the heater section (170) and the second temperature of the heater section (170) is large, the second temperature of the heater section (170) may be reflected when the heating temperature of the heater section (170) is controlled, and the heating temperature of the heater section (170) may be assisted in being corrected by reflecting the second temperature of the heater section (170) to the heating temperature of the heater section (170) determined mainly based on the first temperature of the heater section (170).

[0078] The interval between the first temperature measuring member (181) and the second temperature measuring member (182) (in the circumferential direction of the flange portion) may be greater than the interval between the plurality of gas supply pipes (150) (in the circumferential direction of the flange portion). Here, the plurality of gas supply pipes (150) may be arranged at equal intervals in the circumferential direction of the flange portion (120). Since the specific temperature of the heater portion (170) is (mainly) generated at both ends of the pipeline heater (171) in the extension direction, if the interval between the first temperature measuring member (181) and the second temperature measuring member (182) is set to be smaller than the interval between the plurality of gas supply pipes (150), the second temperature measuring member (182) may not measure the specific temperature of the heater portion (170), and the specific temperature of the heater portion (170) may not be reflected when the heating temperature control of the heater portion (170) is performed. In addition, the second temperature of the heater part (170) measured by the second temperature measuring member (182) that measures the representative temperature of the heater part (170) rather than the specific temperature of the heater part (170) may not differ too much from the first temperature of the heater part (170), and therefore the second temperature of the heater part (170) may not even be reflected when the heating temperature control of the heater part (170) is performed.

[0079] However, the interval between the first temperature measuring member (181) and the second temperature measuring member (182) may be greater than the interval between the plurality of gas supply pipes (150), the second temperature measuring member (182) may measure the temperature at one of the two ends of the line heater (171) in the extension direction and may measure the specific temperature of the heater portion (170), and thus may reflect the specific temperature of the heater portion (170) when performing heating temperature control on the heater portion (170).

[0080] Therefore, the batch type substrate processing apparatus (100) according to the present invention can detect the temperature of the heater section (170) through the temperature detection section (180) to control the heating temperature of the heater section (170), thereby controlling the gas inlet port (160) to a desired temperature. In addition, the temperature detection section (180) can be composed of a first temperature measuring member (181) provided at a central portion of the line heater (171) in the extending direction of the heater section (170) and a second temperature measuring member (182) provided at an edge portion in the extending direction of the line heater (171), and thus the heating temperature of the heater section (170) can be controlled based on the first temperature of the heater section (170) measured from the first temperature measuring member (181), and the second temperature of the heater section (170) can be reflected according to the difference between the second temperature of the heater section (170) measured from the second temperature measuring member (182) and the first temperature of the heater section (170), so as to control the plurality of gas inlet ports (160) to a uniform temperature.

[0081] Figure 3 is a conceptual diagram for explaining a coupling structure of a gas inlet port and a heater portion according to an embodiment of the present invention.

[0082] Reference Figure 3 , the gas supply pipe (150) may pass through the reaction tube (110) in a radial direction and supply the process gas to the processing space in the reaction tube (110). Here, the flange portion (120) may be provided at the outside of the reaction tube (110), and thus the inner end portion of the gas supply pipe (150) may pass through both the side wall of the flange portion (120) and the side wall of the reaction tube (110) toward the center of the reaction tube (110) in the radial direction.

[0083] The batch type substrate processing apparatus (100) according to the present invention may further include a second sealing member (132) disposed between the reaction tube (110) and the gas supply pipe (150), and a third sealing member (133) disposed between the gas supply pipe (150) and the gas inlet port (160).

[0084] A second sealing member (132) may be disposed between the reaction tube (110) and the gas supply pipe (150) to seal the space between the reaction tube (110) and the gas supply pipe (150) and to block the space between the reaction tube (110) and the gas supply pipe (150), thereby preventing the process gas from leaking between the reaction tube (110) and the gas supply pipe (150).

[0085] For example, the second sealing member (132) may be an O-ring or the like and may be disposed in a ring shape around the gas supply pipe (150). The second sealing member (132) may also be deformed and / or damaged due to high process temperatures.

[0086] A third sealing member (133) may be disposed between the gas supply pipe (150) and the gas inlet port (160) to seal the space between the gas supply pipe (150) and the gas inlet port (160) and to block the space between the gas supply pipe (150) and the gas inlet port (160), thereby preventing the process gas from leaking between the gas supply pipe (150) and the gas inlet port (160).

[0087] For example, the third sealing member (133) may also be an O-ring or the like, and may be disposed in a ring shape around the gas supply pipe (150). The third sealing member (133) may also be deformed and / or damaged due to high process temperatures.

[0088] The flange portion (120) may be disposed outside the lower end portion of the reaction tube (110), and the gas supply pipe (150) may further extend through the flange portion (120) to the reaction tube (110) in the radial direction to pass through (both) the flange portion (120) and the reaction tube (110). That is, the flange portion (120) may be disposed outside the lower end portion of the reaction tube (110), and in addition, the gas supply pipe (150) may pass through both the side wall of the flange portion (120) and the side wall of the reaction tube (110) toward the center of the reaction tube (110) in the radial direction, and the inner end portion of the gas supply pipe (150) may be disposed inside the reaction tube (110).

[0089] For example, the reaction tube (110) may have a protrusion protruding outward (or in a radial direction) along the circumference of the reaction tube (110) at the lower end, the flange portion (120) may be disposed to surround the protrusion outside the protrusion of the reaction tube (110), and the gas supply pipe (150) may pass through the side wall of the flange portion (120) in the radial direction to reach the protrusion, and thus the inner end portion may pass through the protrusion and be disposed inside the reaction tube (110). Here, the flange portion (120) may be composed of a lower flange and an upper fixing ring. The lower flange may support the reaction tube (110) at the lower portion of the reaction tube (110) (i.e., the lower portion of the protrusion), and the upper fixing ring may press the protrusion from the upper side to allow the reaction tube (110) and the lower flange (i.e., the protrusion and the lower flange) to be in close contact with the first sealing member (131). Therefore, the space between the reaction tube (110) and the lower flange may be sealed (or may be sealed).

[0090] Here, the plurality of fluid passages (121a and 121b) may be provided in the flange portion (120). Here, one fluid passage (121b) may be provided for cooling the first sealing member (131), and another fluid passage (121a) may be provided for cooling the second sealing member (132) and the third sealing member (133). Here, one of the fluid passages (121b) may cool the second sealing member (132) and the third sealing member (133), and another fluid passage (121a) may cool the first sealing member (131). In addition, one fluid passage (121a) may be provided in the upper fixing ring, and another fluid passage (121b) may be provided in the lower flange. Refrigerant may be introduced through one fluid passage (121a) and discharged through another fluid passage (121b).

[0091] Here, the second sealing member (132) may be disposed between the reaction tube (110) and the flange portion (120) and sandwiched between the gas supply pipe (150) and the reaction tube (110) and the flange portion (120), and the third sealing member (133) may be disposed between the gas supply pipe (150) and the flange portion (120) and sandwiched between the gas inlet port (160) and the gas supply pipe (150) and the flange portion (120). The second sealing member (132) can be sandwiched between the gas supply pipe (150) and the reaction tube (110) to prevent leakage of process gas between the reaction tube (110) and the gas supply pipe (150), and can also be sandwiched between the gas supply pipe (150) and the flange portion (120) to prevent direct contact between the gas supply pipe (150) and the flange portion (120), thereby suppressing or preventing heat loss of the gas supply pipe (150) caused by the flow of refrigerant in the fluid passages (121a and 121b) of the flange portion (120).

[0092] The third sealing member (133) can be sandwiched between the gas inlet port (160) and the gas supply pipe (150) to prevent the process gas from leaking between the gas supply pipe (150) and the gas inlet port (160), and can also be sandwiched between the gas supply pipe (150) and the flange portion (120) to effectively prevent direct contact between the gas supply pipe (150) and the flange portion (120), thereby effectively suppressing or preventing heat loss of the gas supply pipe (150) caused by the refrigerant flowing through the fluid passages (121a and 121b) of the flange portion (120).

[0093] In addition, the second sealing member (132) and the third sealing member (133) can not only perform double sealing (or sealing) between the reaction tube (110) and the gas supply pipe (150), but also perform double sealing between the flange portion (120) and the gas supply pipe (150), so as to effectively prevent the process gas from leaking (or being discharged) to the outside due to leakage from the processing space between the reaction tube (110) and the gas supply pipe (150) and / or between the flange portion (120) and the gas supply pipe (150).

[0094] Here, the heater part (170) may be disposed outside the flange part (120). Since the first sealing member (131), the second sealing member (132) and the third sealing member (133) are disposed (or arranged) at the inner side (and / or the inner part) of the flange part (120), the heater part (170) may be disposed outside the flange part (120) so as not to have a thermal effect on the first sealing member (131), the second sealing member (132) and the third sealing member (133), and may be disposed farther from the first sealing member (131), the second sealing member (132) and the third sealing member (133) than the fluid passages (121a and 121b). In addition, the heater part (170) may effectively heat the gas inlet port (160) by surrounding the gas inlet port (160) at the outside of the flange part (120) and being in close contact with the gas inlet port (160) (or being bonded to the gas inlet port 160). Here, the heater portion (170) may be in contact with the outside of the flange portion (120) or may be spaced apart from the flange portion (120), but may preferably be spaced apart from the flange portion (120) while in contact with the gas inlet port (160) so as to effectively heat the gas inlet port (160) without being thermally affected by the flange portion (120). The third sealing member (133) may also be interposed between the gas inlet port (160) and the flange portion (120) to separate the gas inlet port (160) from the flange portion (120), thereby suppressing (or minimizing) heat loss in the gas supply pipe (150) due to the refrigerant flowing through the fluid passages (121a and 121b) of the flange portion (120).

[0095] The inner diameter of the gas inlet port (160) may be smaller than the inner diameter of the gas supply pipe (150). When the inner diameter of the gas inlet port (160) is small, the process gas inside the gas inlet port (160) can be effectively heated by heating the gas inlet port (160), and since the internal pressure of the gas inlet port (160) is relatively high, the process gas can diffuse into the inside of the gas supply pipe (150) having a larger inner diameter and a relatively lower pressure to quickly pass through the portion (or section) corresponding to the flange portion (120) of the gas supply pipe (150), thereby preventing the condensation of the process gas inside the gas supply pipe (150) and preventing the powder from accumulating on the inner surface of the gas supply pipe (150) due to the condensation of the process gas. Here, the portion corresponding to the flange portion (120) of the gas supply pipe (150) may be a portion (section) of the outer end portion of the gas supply pipe (150). Since the inner diameter of the gas supply pipe (150) is large, the process gas that quickly passes through the gas supply pipe (150) can be prevented and / or inhibited from contacting the inner surface of the gas supply pipe (150), so as to prevent and / or inhibit condensation of the process gas and / or accumulation of powder on the inner surface of the gas supply pipe (150).

[0096] The batch type substrate processing apparatus (100) of the present invention may further include an exhaust section (190), and the exhaust section (190) is used to exhaust the interior of the reaction tube (110).

[0097] The exhaust unit (190) can exhaust the interior of the reaction tube (110) and can be used to exhaust process residues in the processing space to the outside. The exhaust unit (190) can be composed of an exhaust nozzle extending in the longitudinal direction of the reaction tube (110), an exhaust line connected to the exhaust nozzle, an exhaust port, and an exhaust pump. The exhaust nozzle can be provided with a plurality of exhaust holes arranged in a vertical direction to respectively correspond to the unit processing spaces of the substrate boat.

[0098] Here, the process gas may include one or more gases and may include a source gas and a reaction gas that reacts with the source gas to produce a thin film material. For example, when the thin film material to be deposited on the substrate is silicon nitride, the source gas may include a silicon-containing gas (e.g., dichlorosilane (SiH2Cl2, abbreviated as DCS)), and the reaction gas may include a nitrogen-containing gas (e.g., NH3, N2O, or NO).

[0099] The batch type substrate processing apparatus (100) of the present invention may further include a heating top cover (not shown) surrounding the reaction tube (110) to heat the plurality of substrates. In addition, the substrate boat may be rotated by a rotating device connected to the lower portion of the substrate boat to ensure uniformity of processing.

[0100] As described above, according to the present invention, the fluid passage can be provided in the flange portion to prevent thermal deformation and / or damage of the first sealing member provided between the reaction tube and the flange portion, so that the gas inlet port is heated by the heater portion when the refrigerant flows, and thus the powder can be prevented and / or inhibited from accumulating on the inner circumferential surface of the gas supply pipe and the inner circumferential surface of the gas inlet port and the coupling portion of the gas supply pipe and the gas inlet port due to the concentration of the process gas. Here, the heater portion can be composed of a pipeline heater extending in the circumferential direction of the flange portion and a metal block, and the pipeline heater is constructed in the metal block to maintain the internal temperature of each of the gas inlet port and / or the gas supply pipe at a temperature at which the process gas is not condensed. In addition, even when the gas supply pipe is provided as a plurality of portions, the heater portion can be provided in proportion to the number of the gas supply pipes, and the internal temperature of each gas supply pipe and the gas inlet port can be uniformly maintained at a temperature at which the process gas is not condensed by the heater portion extending in the circumferential direction of the flange portion. Here, the temperature of the heater part is detected by the temperature detection part, and the heating temperature of the heater part is controlled to control the gas inlet port to a desired temperature. In addition, the temperature detection part may be composed of a first temperature measuring member provided at a central portion in an extending direction of the line heater of the heater part and a second temperature measuring member provided at an edge portion in an extending direction of the line heater, so as to control the plurality of gas inlet ports to a uniform temperature by reflecting the second temperature of the heater part measured from the second temperature measuring member according to a difference between the second temperature of the heater part and the first temperature of the heater part while controlling the heating temperature of the heater part based on the first temperature of the heater part measured from the first temperature measuring member.

[0101] Although the preferred embodiments of the present invention have been described with reference to a number of exemplary embodiments of the present invention, the embodiments of the present invention are not limited to the aforementioned embodiments, and it should be understood that many other modifications and embodiments can be designed by those skilled in the art, and the modifications and embodiments will fall within the spirit and scope of the principles of the present disclosure. Therefore, the true protection scope of the present invention should be determined by the technical scope of the attached claims.

Claims

1. A batch substrate processing apparatus, comprising: A reaction tube configured to provide a processing space in which a plurality of substrates are accommodated; an annular flange portion provided with a fluid passage and configured to support the reaction tube; a first sealing member disposed between the reaction tube and the flange portion; a refrigerant supply portion configured to supply refrigerant to the fluid passage; a gas supply pipe configured to supply a process gas to the processing space through the flange portion; a gas inlet port coupled to an outer end of the gas supply conduit; as well as The heater unit is configured to heat the gas inlet port.

2. The batch type substrate processing apparatus according to claim 1, wherein the heater section comprises: a pipeline heater extending along the circumferential direction of the flange portion; as well as A metal block is embedded in the inline heater and is disposed to surround the gas inlet port.

3. The batch type substrate processing apparatus according to claim 2, wherein the metal block comprises: an upper block configured to cover an upper portion of the gas inlet port; as well as A lower block is configured to cover a lower portion of the gas inlet port.

4. The batch type substrate processing apparatus according to claim 3, wherein the line heater comprises: an upper heater disposed in the upper block; as well as a lower heater, disposed in the lower block, wherein the upper block and the lower block include heater insertion grooves, the upper heater and the lower heater are respectively inserted into the heater insertion grooves, and The metal block further includes an upper block top cover and a lower block top cover configured to cover the heater insertion groove of the upper block and the heater insertion groove of the lower block, respectively.

5. The batch type substrate processing apparatus according to claim 2, further comprising: a temperature detection unit configured to detect a temperature of the heater unit; as well as A heating control section is configured to control a heating temperature of the heater section according to the temperature detected by the temperature detection section.

6. The batch type substrate processing apparatus according to claim 4, wherein the gas supply pipe is provided in plural and passes through the flange portion in a radial direction, wherein the plurality of gas supply pipes are arranged along the circumferential direction of the flange portion, and The length of the inline heater is proportional to the number of the gas supply pipes.

7. The batch type substrate processing apparatus according to claim 6, wherein the temperature detection section comprises: a first temperature measuring member provided at a central portion of the heater portion in an extending direction of the inline heater; as well as A second temperature measuring member is spaced apart from the first temperature measuring member in the extending direction of the inline heater and is provided at an edge portion of the heater portion in the extending direction of the inline heater.

8. The batch type substrate processing apparatus according to claim 7, wherein the heating control section is configured to: controlling the heating temperature of the heater portion based on a first temperature of the heater portion measured from the first temperature measuring member; and The heating temperature of the heater portion is controlled by reflecting the second temperature of the heater portion according to a difference between the first temperature of the heater portion and the second temperature of the heater portion measured from the second temperature measuring member. 9 . The batch type substrate processing apparatus according to claim 8 , wherein the heating control section is configured to reflect the second temperature of the heater section when the difference between the first temperature of the heater section and the second temperature of the heater section is larger than an allowable value. 10 . The batch type substrate processing apparatus according to claim 7 , wherein an interval between the first temperature measuring member and the second temperature measuring member is larger than an interval between the plurality of gas supply pipes.

11. The batch type substrate processing apparatus according to claim 1, wherein the gas supply pipe passes through the reaction tube in a radial direction, and The batch type substrate processing apparatus further comprises: a second sealing member disposed between the reaction tube and the gas supply pipe; as well as A third sealing member is provided between the gas supply pipe and the gas inlet port.

12. The batch type substrate processing apparatus according to claim 11, wherein the flange portion is provided outside the lower end portion of the reaction tube, The gas supply pipe further passes through the flange portion in the radial direction, The second sealing member is provided between the reaction tube and the flange portion, The third sealing member is provided between the gas supply pipe and the flange portion, and The heater portion is provided outside the flange portion. 13 . The batch type substrate processing apparatus according to claim 12 , wherein an inner diameter of the gas inlet port is smaller than an inner diameter of the gas supply pipe.

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