Annular cylindrical workpiece, polishing pressure plate, polishing equipment and polishing surface type control method

Abstract

The invention discloses an annular cylindrical workpiece, a polishing pressure plate, polishing equipment and a polishing surface type control method.The polishing pressure plate comprises an expansion cavity, the expansion cavity is used for being arranged between a supporting plate and a polishing plate, and one end of the expansion cavity is used for being connected with a pressure control source; the pressure control source changes an output load according to the axial length of the outer side cavity wall of the expansion cavity, the flexural rigidity of the outer side cavity wall, the wall thickness of the outer side cavity wall, the elastic modulus of the outer side cavity wall and the Poisson's ratio so as to change the deflection of the outer side cavity wall; and the outer side cavity wall of the expansion cavity is used for transmitting torque to the polishing disc when the deflection is increased, so that the polishing surface type of the polishing disc is deformed. The technical effects that the control difficulty of the polishing surface type is reduced, and meanwhile the control accuracy of the polishing surface type is improved are achieved.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor polishing, and in particular to an annular cylindrical workpiece, a polishing platen, a polishing device and a polishing surface shape control method. Background Art

[0002] The polishing platen is used for polishing semiconductor materials. Since the surface of the semiconductor material has different surface shapes, and the surface shape of the semiconductor material may also change during the polishing process. Therefore, in order to make the polishing end face of the polishing platen fit better on the surface of the wafer, the polishing surface shape of the polishing end face should be able to be adjusted. In the related art, the adjustment process of the polishing surface shape is generally to transfer external force to the polishing plate to cause the polishing plate to deform and thus change the polishing surface shape. For example, a rigid structure can be set on the upper edge of the polishing plate, and the edge of the polishing plate is pushed downward by the rigid structure to cause the deformation of the polishing plate. Although this type of structure can adjust the polishing surface shape, there are problems of high control difficulty and inaccurate adjustment of the polishing surface shape. Summary of the invention

[0003] The main purpose of the present invention is to provide an annular cylindrical workpiece, a polishing platen, a polishing device and a polishing surface shape control method to solve the problem in the related art that the structural control of adjusting the polishing surface shape is difficult and it is difficult to accurately adjust the polishing surface shape to the target polishing surface shape.

[0004] In order to achieve the above object, the present invention provides an annular cylindrical workpiece, comprising: An annular expansion chamber, one end of which is used to connect to a pressure control source, which changes the output load according to the axial length of the outer wall of the expansion chamber, the bending stiffness of the outer wall, the wall thickness of the outer wall, the elastic modulus of the outer wall and the Poisson's ratio to change the deflection of the outer wall. The outer wall of the expansion chamber is used to transmit torque to the polishing disk when the deflection increases, so that the polishing surface of the polishing disk is deformed.

[0005] Furthermore, both ends of the outer cavity wall are simply supported structures, and the corresponding relationship between the deflection of the outer cavity wall and the output load of the pressure control source is: ; in, is the deflection of the outer cavity wall, is the output load, is the axial position of each point on the outer cavity wall, is the axial length of the outer cavity wall, is the bending stiffness of the outer cavity wall, is the wall thickness of the outer cavity wall, , ,E is the elastic modulus of the outer cavity wall, is the Poisson's ratio of the outer cavity wall.

[0006] According to another aspect of the present invention, a polishing surface profile control method is provided, which uses the above-mentioned annular cylindrical workpiece to control the polishing surface profile of a polishing disc, comprising: Acquire a mapping relationship between the output load and the polishing surface type, wherein the mapping relationship is determined according to a corresponding relationship between the output load and the outer cavity wall deflection and a corresponding relationship between the outer cavity wall deflection and the polishing surface type; According to the mapping relationship, the output load of the pressure control source is adjusted to change the deflection of the outer cavity wall, thereby changing the polishing surface shape of the polishing end face to meet the target polishing surface shape.

[0007] Furthermore, the corresponding relationship between the outer cavity wall deflection and the polishing surface shape is determined in the following manner: Finite element simulation analysis is performed on the polishing plate to determine the corresponding relationship between the outer cavity wall deflection and the polishing surface shape.

[0008] Furthermore, the polishing surface shape control method also includes: Obtaining the current output load of the pressure control source; According to the mapping relationship, the current polishing surface type is determined.

[0009] According to another aspect of the present invention, there is provided a polishing platen, which uses the above-mentioned polishing surface shape control method to control the polishing surface shape, and the polishing platen comprises: Support plates, polishing plates and fulcrums; The two ends of the fulcrum member are respectively connected to the first end of the support plate and the polishing plate; an expansion cavity is provided between the support plate and the second end of the polishing plate away from the polishing end surface, and the fulcrum member is located between the polishing end surface and the second end of the polishing plate; The pressure in the expansion chamber is controlled to cause the outer chamber wall to deform, so that the outer chamber wall transmits torque through the second end of the polishing plate, and the second end of the polishing plate transmits torque to the polishing end face of the polishing plate through the fulcrum member, and the polishing surface of the polishing plate is deformed under the action of the torque.

[0010] Further, the fulcrum member includes a first connecting plate, a second connecting plate and a fulcrum plate, the first connecting plate and the second connecting plate are respectively connected to the first ends of the supporting plate and the polishing plate, and the fulcrum plate is connected between the first connecting plate and the second connecting plate; When the outer cavity wall is deformed by controlling the pressure in the expansion cavity, the first connecting plate, the second connecting plate and the fulcrum plate are elastically deformed under the action of the moment to change the angle between the first connecting plate and the second connecting plate.

[0011] Furthermore, the polishing surface of the polishing disc is convex inside and concave outside when it is not deformed.

[0012] Furthermore, the polishing platen also includes a first annular member, which is disposed between the supporting plate and the second end of the polishing plate, and the expansion chamber is located between the first annular member and the supporting plate.

[0013] Further, the first annular member includes a first sealing portion, a first thin-walled portion, and a second sealing portion which are connected in sequence, and the expansion chamber is provided between the first thin-walled portion and the supporting disk; The first sealing portion and the second sealing portion are used to seal the expansion cavity.

[0014] Furthermore, the polishing platen further comprises a second annular member, wherein the second annular member is located between the first annular member and the supporting plate; The expansion chamber is located between the inner ring side of the first ring member and the outer ring side of the second ring member.

[0015] Further, the first annular member comprises a third sealing portion, a second thin-walled portion and a fourth sealing portion which are connected in sequence, and the expansion chamber is provided between the second thin-walled portion and the supporting disk; The third sealing portion and the fourth sealing portion are used to seal the expansion chamber.

[0016] Furthermore, the outer ring side of the second annular member has a protruding fifth sealing portion, and the third sealing portion and the fifth sealing portion are attached to each other and sealedly connected; The outer ring side of the support disk has a first connecting protrusion, the fourth sealing portion is arranged on the first connecting protrusion, and the fourth sealing portion is in contact with and sealedly connected to the lower end surface of the second annular member.

[0017] Furthermore, a second connecting protrusion protruding toward the first annular member is provided on the inner ring side of the polishing disc, and the second connecting protrusion is in contact with the second thin-walled portion.

[0018] Furthermore, there is a spacing between the upper end surface of the second connecting protrusion and the lower end surface of the third sealing portion, and between the lower end surface of the second connecting protrusion and the upper end surface of the first connecting protrusion, and the movement space of the second connecting protrusion is provided by the spacing.

[0019] According to another aspect of the present invention, there is provided a polishing device comprising the above-mentioned polishing platen.

[0020] On the one hand, the present invention adopts an annular cylindrical workpiece, which includes an annular expansion chamber, one end of which is used to connect to a pressure control source, and the pressure control source changes the output load according to the axial length of the outer cavity wall of the expansion chamber, the bending stiffness of the outer cavity wall, the wall thickness of the outer cavity wall, the elastic modulus of the outer cavity wall, and the Poisson's ratio to change the deflection of the outer cavity wall, and the outer cavity wall of the expansion chamber is used to transmit torque to the polishing disk when the deflection increases, so that the polishing surface of the polishing disk is deformed, so that the annular expansion chamber provides an annular outer cavity wall, and the output is controlled by The load can control the deflection of the outer cavity wall. When the deflection of the outer cavity wall increases, the torque can be evenly transmitted to the four sides of the polishing disk to change the polishing surface shape. The output load is adjusted according to the structural parameters of the outer cavity wall, and the deflection of the outer cavity wall can be accurately controlled to achieve the purpose of accurately controlling the polishing surface shape of the polishing disk, thereby achieving the technical effect of reducing the difficulty of controlling the polishing surface shape and improving the accuracy of controlling the polishing surface shape, thereby solving the problem of high difficulty in structural control of adjusting the polishing surface shape and difficulty in accurately adjusting the polishing surface shape to the target polishing surface shape in the related technology.

[0021] On the other hand, the present invention establishes a complete mapping relationship between the output load and the polishing surface type in the polishing surface type control method, and the relationship is established based on the outer cavity wall of the expansion cavity, so that the established mapping relationship is more accurate and can accurately adjust the output load of the pressure control source according to the target polishing surface type to achieve the target polishing surface type.

[0022] On the other hand, in the process of adjusting the polishing surface shape, the polishing pressure plate provided by the present invention only needs to change the output load of the pressure control source to change the pressure in the expansion chamber to cause the deflection of the outer cavity wall, and the torque is transmitted from the outer cavity wall to the second end of the polishing plate. The second end of the polishing plate transmits the torque to the polishing end face through the fulcrum member to cause the polishing surface shape to deform. Compared with the related technology that requires the cooperation of the inner and outer ring adjustment devices, it is also simpler to control. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] The accompanying drawings constituting a part of the present invention are used to provide a further understanding of the present invention, so that other features, purposes and advantages of the present invention become more obvious. The accompanying drawings of the exemplary embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation of the present invention. In the accompanying drawings: Figure 1 is a schematic diagram showing that the polishing surface of the polishing platen according to an embodiment of the present invention is unchanged; Figure 2 is a schematic diagram of the change of the polishing surface profile of the polishing platen according to an embodiment of the present invention; Figure 3 is a schematic front view of the structure of a polishing platen according to an embodiment of the present invention; Figure 4 yes Figure 3 Schematic diagram of the cross-sectional structure of AA; Figure 5 yes Figure 4 A schematic diagram of the enlarged structure of the local I in the middle; Figure 6 is a schematic cross-sectional view of a polishing platen according to another embodiment of the present invention; Figure 7 yes Figure 6 A schematic diagram of the enlarged structure of the local B in the middle; Figure 8 is a schematic diagram of a polishing surface profile control method according to an embodiment of the present invention; Fig. 9 is a schematic diagram of an annular columnar space formed by an expansion cavity according to an embodiment of the present invention; Fig.10 is a finite element simulation analysis process of a polishing disc according to an embodiment of the present invention; Fig.11 is a finite element simulation analysis process of a polishing disc according to an embodiment of the present invention; Among them, 1 supporting plate, 100 first connecting protrusion, 101 second limiting part, 102 mounting groove, 103 edge, 2 polishing plate, 200 second connecting protrusion, 201 third connecting protrusion, 3 fulcrum member, 30 first connecting plate, 31 fulcrum plate, 310 groove, 32 second connecting plate, 4 expansion chamber, 40 outer cavity wall, 5 pressure regulating channel, 6 anti-falling plate, 60 accommodating groove, 8 second annular member, 80 first limiting part, 81 fifth sealing part, 9 first annular member, 90 third sealing part, 91 fourth sealing part, 92 second thin-walled part, 93 first sealing part, 94 second sealing part, 95 first thin-walled part, 12 control chamber, 13 sealing ring. DETAILED DESCRIPTION

[0024] In order to enable those skilled in the art to better understand the scheme of the present invention, the technical scheme in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present invention.

[0025] It should be noted that the terms "first", "second", etc. in the specification and claims of the present invention and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence. It should be understood that the numbers used in this way can be interchanged under appropriate circumstances to facilitate the embodiments of the present invention described herein.

[0026] In the present invention, the directions or positional relationships indicated by the terms "upper", "lower", "inner", etc. are based on the directions or positional relationships shown in the drawings. These terms are mainly used to better describe the present invention and its embodiments, and are not used to limit the indicated devices, elements or components to have a specific direction, or to be constructed and operated in a specific direction.

[0027] In addition, some of the above terms may be used to express other meanings in addition to indicating orientation or positional relationship. For example, the term "on" may also be used to express a certain dependency or connection relationship in some cases. For those skilled in the art, the specific meanings of these terms in the present invention can be understood according to specific circumstances.

[0028] In addition, the terms "disposed", "provided with", "connected", "fixed" and the like should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection, or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be an internal connection between two devices, elements or components. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0029] In addition, the term "plurality" shall mean two or more.

[0030] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0031] To solve relevant technical problems, such as Figures 1 to 6 As shown, an embodiment of the present invention provides a polishing platen, comprising: a supporting plate 1, a polishing plate 2 and a fulcrum member 3; wherein, The two ends of the fulcrum member 3 are respectively connected to the first ends of the support plate 1 and the polishing plate 2; an expansion cavity 4 is provided between the support plate 1 and the second end of the polishing plate 2 away from the polishing end surface, and the fulcrum member 3 is located between the polishing end surface and the second end of the polishing plate 2; By controlling the pressure in the expansion chamber 4, the outer cavity wall 40 is deformed, the outer cavity wall 40 transmits torque through the second end of the polishing disk 2, and the second end of the polishing disk 2 transmits torque to the polishing end face of the polishing disk 2 through the fulcrum member 3. Under the action of the torque, the polishing surface of the polishing disk 2 is deformed.

[0032] In this embodiment, the polishing platen mainly includes a support plate 1, a polishing plate 2 and a fulcrum member 3, wherein the support plate 1 is a rigid structure. The lower surface of the polishing plate 2 serves as the polishing end surface, and the polishing plate 2 is a deformable plate that can produce a certain degree of deformation under the action of an external force. Specifically, the polishing plate 2 can adjust the overall polishing end surface from horizontal to an inwardly concave or outwardly convex structure under the action of an external force, or can adjust the overall polishing end surface from an outwardly convex structure to a horizontal or inwardly concave structure. During the polishing process, the polishing end surface can contact the surface of the workpiece to be polished (such as a wafer or a glass sheet) for extrusion and polishing of the workpiece to be polished.

[0033] The polishing disc 2 is installed at the lower part of the supporting disc 1. Specifically, in this embodiment, a concave structure is formed in the middle part of the polishing disc 2, and the lower part of the supporting disc 1 extends into the concave structure. The polishing disc 2 and the supporting disc 1 are connected by a fulcrum member 3, and the fulcrum member 3 is located between the polishing end face of the polishing disc 2 and the second end of the polishing disc 2. When the second end of the polishing disc 2 is subjected to a torque, the fulcrum member 3 acts as a fulcrum, so that the torque of the second end of the polishing disc 2 can be transmitted to the polishing end face, so that the polishing end face is deformed. In one embodiment, the fulcrum member 3 can be set as an annular structure and surround the outer ring of the supporting disc 1, and the upper and lower ends of the fulcrum member 3 are respectively connected to the supporting disc 1 and the polishing disc 2. In another embodiment, the fulcrum member 3 can also be set as a plurality of fulcrum members 3, and the plurality of fulcrum members 3 are distributed along the circumference of the outer ring of the supporting disc 1. The plurality of fulcrum members 3 can be arranged at intervals or can be closely fitted to each other.

[0034] Due to the setting of the fulcrum member 3, not only the support plate and the polishing plate 2 do not need to be connected by the expansion chamber 4, but also the expansion chamber 4 can be set only between the second end of the polishing plate 2 and the support plate 1. The expansion chamber 4 has an outer chamber wall 40. When the pressure in the expansion chamber 4 increases, the outer chamber wall 40 of the expansion chamber 4 expands and bulges outward, thereby transmitting a torque to the second end of the polishing plate 2. After the second end of the polishing plate 2 is subjected to the torque, due to the existence of the fulcrum member 3, the second end of the polishing plate 2 can transmit the torque to the polishing end face of the polishing plate 2, so that the polishing end face is deformed, thereby changing the polishing surface shape of the polishing end face.

[0035] It can be seen that, on the one hand, after the fulcrum member 3 is used as a connecting member between the support plate 1 and the polishing plate 2, the expansion chamber 4 does not need to play the role of connecting the support plate 1 and the polishing plate 2, so that the arrangement position of the expansion chamber 4 is more flexible and the structural setting of the expansion chamber 4 is simpler.

[0036] At the same time, since the fulcrum member 3 is located between the polishing end face and the second end of the polishing plate 2, the expansion chamber 4 can be arranged at a single position, for example, only at a position close to the outer ring on the polishing pressure plate. In the process of adjusting the polishing surface shape, it is only necessary to adjust the pressure in the expansion chamber 4 to deform the outer cavity wall 40 of the expansion chamber 4, and the torque is transmitted from the outer cavity wall 40 to the second end of the polishing plate 2. The second end of the polishing plate 2 transmits the torque to the polishing end face through the fulcrum member 3 to deform the polishing surface shape. Compared with the related art that requires the cooperation of the inner and outer ring adjustment devices, the control is also simpler; On the other hand, when the expansion chamber 4 does not need to serve the function of connecting the support plate 1 and the polishing plate 2, the installation and disassembly of the expansion chamber 4 is also simpler. Moreover, since the adjustment process of the polishing surface type is essentially the process of controlling the expansion of the outer cavity wall 40 of the expansion chamber 4, after the expansion chamber 4 is easy to install and disassemble, it is easier to meet the adjustment requirements of different polishing surface types by replacing the expansion chamber 4.

[0037] In one embodiment, Figures 4 to 7 As shown, there is a certain distance between the edge of the support plate 1 and the second end of the polishing plate 2 to form a control chamber 12, and the range included in the control chamber 12 includes the area between the outer ring side of the support plate 1 and the inner ring side of the second end of the polishing plate 2. A separate expansion chamber 4 is provided in the control chamber 12. In one embodiment, the expansion chamber 4 is an airbag provided in the control chamber 12, and the outer chamber wall 40 is the outer wall of the airbag.

[0038] In another embodiment, if Figure 4 and Figure 5 As shown, two opposite annular members may be arranged in the control chamber 12, and the expansion chamber 4 is arranged between the two annular members. Figure 6 and Figure 7 As shown, an annular member may be arranged in the control chamber 12, and the expansion chamber 4 is arranged between the annular member and the support plate 1. In this embodiment, there is no limitation on the specific arrangement of the expansion chamber 4, as long as a separate and expandable cavity can be arranged in the control chamber 12.

[0039] Depending on the specific configuration of the expansion chamber 4, it may have one or more walls that can expand. Figure 1 As shown, in this embodiment, the outer wall 40 of the expansion chamber 4 corresponds to the second end of the polishing disc 2. When the pressure in the expansion chamber 4 increases, the outer wall 40 can expand, and when the pressure in the expansion chamber 4 decreases, the outer wall 40 can shrink. The outer wall 40 of the expansion chamber 4 and the second end of the polishing disc 2 can fit each other, and of course, there can be a certain distance between them.

[0040] When the outer wall 40 of the expansion chamber 4 fits against the polishing disc 2, the expansion of the outer wall 40 can push the polishing disc 2 to deform outward. When the outer wall 40 contracts, additional force is required to drive the polishing disc 2 to deform inward. The force can come from the elastic force of the polishing disc 2 itself, or from the fulcrum member 3 with elastic force, or through other structures with elastic restoring force to pull the polishing disc 2 to deform inward.

[0041] When there is a certain distance between the outer wall 40 of the expansion cavity 4 and the polishing disk 2, the distance should be smaller than the maximum expansion degree that the outer wall 40 can achieve, so that the outer wall 40 can push the polishing disk 2 to deform before expanding to the maximum extent.

[0042] In this embodiment, the expansion and contraction of the outer wall 40 of the expansion chamber 4 is controlled by controlling the pressure in the expansion chamber 4. In one embodiment, a gas with a certain pressure can be introduced into the expansion chamber 4 to control the pressure in the expansion chamber 4. In another embodiment, a liquid with a certain pressure (such as high-pressure oil) can be introduced into the expansion chamber 4 to control the pressure in the expansion chamber 4. In both embodiments, an external pressure control source is required. For this purpose, Figure 4 and Figure 5 As shown, the polishing platen in this embodiment further includes a pressure regulating channel 5, which can be provided on the support plate 1. The first end of the pressure regulating channel 5 is connected to the expansion chamber 4, and the second end is used to connect to the pressure control source, and the pressure in the expansion chamber 4 is controlled by the pressure control source, thereby controlling the expansion and contraction of the outer cavity wall 40 of the expansion chamber 4, and then the outer cavity wall 40 drives the polishing end surface to deform, and finally adjusts the polishing surface shape of the polishing plate 2.

[0043] In this embodiment, the adjustment process of the polishing surface shape is that the pressure in the expansion chamber 4 increases, causing the outer chamber wall 40 to expand outward and push the second end of the polishing disc 2, and the polishing end surface of the polishing disc 2 is deformed under the action of the fulcrum member 3, and the center point of the deformation of the polishing end surface is the center of the circle of the polishing end surface. Therefore, in order to smoothly control the deformation of the polishing disc 2, as Figure 5 As shown, the expansion cavity 4 can be arranged at a position close to the edge of the polishing plate 2, and the fulcrum member 3 is arranged at a position relatively close to the center of the polishing end surface. In other words, in this embodiment, the vertical distance between the outer cavity wall 40 of the expansion cavity 4 and the center of the polishing end surface is greater than the vertical distance between the fulcrum member 3 and the center of the polishing end surface.

[0044] In one embodiment, the present invention provides an annular cylindrical workpiece, comprising: An annular expansion chamber 4 is used to be arranged between the support plate 1 and the polishing plate 2. One end of the expansion chamber 4 is used to connect to a pressure control source. The pressure control source changes the output load according to the axial length of the outer cavity wall 40 of the expansion chamber 4, the bending stiffness of the outer cavity wall 40, the wall thickness of the outer cavity wall 40, the elastic modulus of the outer cavity wall 40 and the Poisson's ratio to change the deflection of the outer cavity wall 40. The outer cavity wall 40 of the expansion chamber 4 is used to transmit torque to the polishing plate 2 when the deflection increases, so that the polishing surface of the polishing plate 2 is deformed.

[0045] Specifically, since the polishing disc 2 and the supporting disc 1 are annular structures, in order to enable the outer cavity wall 40 of the expansion cavity 4 to uniformly transmit torque to the second end of the polishing disc 2, an annular cylindrical workpiece is used in this embodiment, and the annular cylindrical workpiece can be arranged between the supporting disc 1 and the polishing disc 2 in the circumference. In other words, the annular cylindrical workpiece can be arranged on the outer ring side of the supporting disc 1 and the inner ring side of the polishing disc 2. The annular cylindrical workpiece includes an annular expansion cavity 4. Similarly, the expansion cavity 4 is also located between the supporting disc 1 and the polishing disc 2 in the circumference, that is, the expansion cavity 4 is arranged around the supporting disc 1 between the second end of the polishing disc 2 and the supporting disc 1. Since the expansion cavity 4 is connected to a pressure control source, when the output load of the pressure control source increases, the pressure in the expansion cavity 4 increases, and the deflection of the outer cavity wall 40 of the expansion cavity 4 increases, thereby uniformly transmitting torque to the circumference of the second end of the polishing disc 2, so that the polishing end surface can be uniformly deformed.

[0046] The control process of the polishing surface type is to change the deflection of the outer cavity wall 40 by controlling the output load of the pressure control source, thereby driving the polishing end surface of the polishing disc 2 to deform, and then changing the polishing surface type. Under the same output load, the outer cavity wall 40 with different structural parameters produces different deflection changes, resulting in different changes in the polishing surface type. Therefore, in this embodiment, in order to achieve precise control of the polishing surface type, the pressure control source changes the output load according to the structural parameters of the outer cavity wall 40 to change the deflection of the outer cavity wall 40. In this embodiment, the structural parameters include the position where the deflection of the outer cavity wall 40 is the largest, the axial length of the outer cavity wall 40, the bending stiffness of the outer cavity wall 40, the wall thickness of the outer cavity wall 40, the elastic modulus of the outer cavity wall 40, and the Poisson's ratio.

[0047] The present embodiment achieves the goal of providing an annular outer cavity wall 40 by the annular expansion cavity 4, and the deflection of the outer cavity wall 40 can be controlled by controlling the output load. When the deflection of the outer cavity wall 40 increases, the torque can be evenly transmitted to the four sides of the polishing disk 2 to change the polishing surface shape. The output load is adjusted according to the structural parameters of the outer cavity wall 40, and the deflection of the outer cavity wall 40 can be accurately controlled to accurately control the polishing surface shape of the polishing disk 2, thereby achieving the technical effect of reducing the difficulty of controlling the polishing surface shape and improving the accuracy of controlling the polishing surface shape, thereby solving the problem of high difficulty in structural control of adjusting the polishing surface shape and difficulty in accurately adjusting the polishing surface shape to the target polishing surface shape in the related technology.

[0048] In a specific embodiment, both ends of the outer cavity wall 40 are simply supported structures, and the corresponding relationship between the deflection of the outer cavity wall 40 and the output load of the pressure control source is: ; in, is the deflection of the outer cavity wall 40, is the output load, is the axial position of each point of the outer cavity wall 40, is the axial length of the outer cavity wall 40, is the bending stiffness of the outer cavity wall 40, is the wall thickness of the outer cavity wall 40, , , E is the elastic modulus of the outer cavity wall 40, is the Poisson's ratio of the outer cavity wall 40.

[0049] During the polishing process, the output load of the pressure control source can be controlled based on the relationship between the deflection of the outer cavity wall 40 and the output load, so that the outer cavity wall 40 produces corresponding deflection, and then the polishing disk 2 produces corresponding deformation to meet the target polishing surface shape.

[0050] Since the polishing disc 2 and the support disc 1 are connected via the fulcrum member 3, the pressure on the support disc 1 during the polishing process needs to be transmitted to the polishing disc 2 via the fulcrum member 3, so the fulcrum member 3 needs to have a certain rigidity. At the same time, since the polishing disc 2 will be deformed during the polishing surface adjustment process, and the fulcrum member 3 connected to the polishing disc 2 will also be deformed to a certain extent as a fulcrum, the fulcrum member 3 also needs to have a certain degree of elasticity.

[0051] In one embodiment, Figure 5As shown, the fulcrum member 3 includes a first connecting plate 30, a second connecting plate 32 and a fulcrum plate 31. The first connecting plate 30 and the second connecting plate 32 are respectively connected to the first ends of the support plate 1 and the polishing plate 2. The fulcrum plate 31 is connected between the first connecting plate 30 and the second connecting plate 32. When the outer cavity wall 40 is deformed by controlling the pressure in the expansion chamber 4, the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 are elastically deformed under the action of the torque to change the angle between the first connecting plate 30 and the second connecting plate 32.

[0052] Specifically, in the present embodiment, the fulcrum member 3 not only serves to connect the polishing disk 2 and the support disk 1, but also serves to use its own elastic force to pull the polishing disk 2 inwardly to deform during the contraction of the outer wall 40 of the expansion chamber 4. The first connecting plate 30 at the upper end of the fulcrum member 3 is fixedly connected to the support disk 1. The first connecting plate 30 is a roughly plate-shaped structure with a relatively large contact area, thereby improving the connection stability between the fulcrum member 3 and the support disk 1. Similarly, the second connecting plate 32 at the lower end of the fulcrum member 3 is fixedly connected to the first end of the polishing disk 2. The second connecting plate 32 is a roughly plate-shaped structure that can also improve the connection stability between the fulcrum member 3 and the polishing disk 2. The first connecting plate 30 and the support disk 1 can be fixed by welding or bolting, and the second connecting plate 32 and the polishing disk 2 can be fixed by welding or bolting.

[0053] The middle part of the fulcrum member 3 is a fulcrum plate 31, and the upper and lower ends of the fulcrum plate 31 are fixedly connected to the first connecting plate 30 and the second connecting plate 32 respectively. In a more specific embodiment, the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 can be an integrally formed structure, so as to have higher structural strength. When the pressure in the expansion chamber 4 increases, the outer cavity wall 40 of the expansion chamber 4 expands and applies a torque to the second end of the polishing disk 2 (that is, a torque is applied to the area on the polishing disk 2 located above the fulcrum member 3). Under the action of this torque, the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 produce elastic deformation to bend outward, and the polishing end surface of the polishing disk 2 (that is, the area on the polishing disk 2 located below the fulcrum member 3) is deformed synchronously to change the polishing surface shape. When the pressure in the expansion chamber 4 decreases, the outer cavity wall 40 of the expansion chamber 4 contracts. At this time, the torque applied by the expansion chamber 4 to the second end of the polishing disk 2 decreases, and the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 rebound under the action of their own elastic force. The polishing end surface of the polishing disk 2 is deformed synchronously and the polishing surface shape is changed in the opposite direction.

[0054] In one embodiment, the fulcrum member 3 can be provided in multiple numbers and distributed along the circumference. In order to make the support plate 1 and the polishing plate 2 bear force uniformly, the fulcrum member 3 is preferably provided in an annular shape, that is, the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 are all annular.

[0055] In a preferred embodiment, Figure 5 As shown, the connection shape of the first connection plate 30, the second connection plate 32 and the fulcrum plate 31 is an I-beam shape, so as to provide a relatively stable supporting connection effect.

[0056] In order to facilitate elastic bending of the fulcrum plate 31 , in this embodiment, grooves 310 are provided on both the inner and outer sides of the fulcrum plate 31 , and the grooves 310 may be arc-shaped grooves.

[0057] Since in the present invention, the change of the polishing surface type is achieved by controlling the pressure change in the expansion chamber 4, when the pressure in the expansion chamber 4 increases, the polishing end face of the polishing disc 2 is deformed outward by the outer wall 40 of the expansion chamber 4. When the pressure in the expansion chamber 4 decreases, the polishing end face of the polishing disc 2 needs to be deformed inward by its own elastic force or the elastic force of the fulcrum member 3. In other words, in the present invention, the outer wall 40 of the expansion chamber 4 cannot actively drive the polishing end face to deform inward. Therefore, in order to increase the adjustment range of the polishing surface type, in this embodiment, when the pressure in the expansion chamber 4 is normal pressure, the polishing surface type of the polishing end face is convex inside and concave outside. On the basis of this polishing surface type, when the pressure in the expansion chamber 4 increases, the polishing surface type can be changed from convex inside and concave outside to flat shape, and then from flat shape to concave inside and convex outside.

[0058] In one embodiment of the polishing platen, Figure 6 and Figure 7 As shown, the polishing platen also includes a first annular member 9 , which is disposed between the supporting plate 1 and the second end of the polishing plate 2 , and the expansion chamber 4 is located between the first annular member 9 and the supporting plate 1 .

[0059] Specifically, in this embodiment, the first annular member 9 can be sleeved and fixed on the outer ring side of the support disk 1, and there is a gap between the inner ring side of the first annular member 9 and the outer ring side of the support disk 1, and the gap is used as the expansion chamber 4, and the vertical side wall of the first annular member 9 is used as the outer chamber wall 40. The upper end of the first annular member 9 is sealed with the upper end of the support disk 1, and the lower end of the first annular member 9 is sealed with the lower end of the support disk 1. A pressure regulating channel 5 is provided on the support disk 1, and the pressure regulating channel 5 is connected to the expansion chamber 4. The external pressure control source controls the pressure in the expansion chamber 4 through the pressure regulating channel 5, thereby controlling the expansion and contraction of the outer chamber wall 40.

[0060] To facilitate the sealed connection between the first annular member 9 and the support plate 1 and the elastic deformation of the outer cavity wall 40 on the first annular member 9, the first annular member 9 in this embodiment includes a first sealing portion 93, a first thin-walled portion 95 and a second sealing portion 94 connected in sequence, and the expansion cavity 4 is arranged between the first thin-walled portion 95 and the support plate 1; the first sealing portion 93 and the second sealing portion 94 are used to seal the expansion cavity 4.

[0061] Specifically, in this embodiment, the first sealing portion 93 includes a plane at the upper end of the first annular member 9, and the second sealing portion 94 includes a plane at the lower end of the first annular member 9. The support plate 1 is provided with edge planes corresponding to the first sealing portion 93 and the second sealing portion 94. After installation, the first sealing portion 93 fits with the edge plane at the upper portion of the support plate 1, and the second sealing portion 94 fits with the edge plane at the lower portion of the support plate 1 to achieve sealing. To further improve the sealing performance, a sealing ring 13 can be provided between the first sealing portion 93 and the support plate 1, and similarly, a sealing ring 13 can also be provided between the second sealing portion 94 and the support plate 1.

[0062] In the present invention, since the deformation of the polishing disc 2 is driven by the expansion of the vertical side wall of the first annular member 9, the vertical side wall on the first annular member 9 corresponding to the expansion chamber 4 needs to be easy to expand and contract. To this end, the first annular member 9 in this embodiment also includes a first thin-walled portion 95 located between the first sealing portion 93 and the second sealing portion 94, and the expansion chamber 4 is located between the first thin-walled portion 95 and the outer ring side of the support disc 1, and the first thin-walled portion 95 serves as the outer cavity wall 40 of the expansion chamber 4. The wall of the first thin-walled portion 95 is thinner, so it is easier to deform when the pressure of the expansion chamber 4 changes. The first sealing portion 93 and the second sealing portion 94 are components that play a sealing role, and will not be deformed during the expansion and contraction of the expansion chamber 4, so their thickness can be set to be thicker to ensure sufficient sealing performance.

[0063] Since the first annular member 9 is sleeved on the supporting plate 1, in order to achieve sealing by using the first sealing portion 93 and the second sealing portion 94, in this embodiment, the upper end of the first annular member 9 is folded outward to form the first sealing portion 93, and the lower end of the first annular member 9 is folded inward to form the second sealing portion 94; the upper edge of the supporting plate 1 has an outwardly protruding edge 103, and the first sealing portion 93 is sealed with the lower end surface of the edge 103; the lower edge of the supporting plate 1 has a mounting groove 102, and the second sealing portion 94 is arranged in the mounting groove 102 and sealed with the upper end surface of the mounting groove 102.

[0064] Specifically, in this embodiment, the edge 103 at the upper portion of the support plate 1 corresponds to the first sealing portion 93 and fits tightly to form a seal, and the second sealing portion 94 is located in the mounting groove 102 at the lower portion of the support plate 1, and the upper surface of the second sealing portion 94 corresponds to the upper end surface of the mounting groove 102 and fits tightly to form a seal. A sealing ring 13 may be provided between the first sealing portion 93 and the lower end surface of the edge 103 to improve the sealing performance, and a sealing ring 13 may be provided between the second sealing portion 94 and the upper end surface of the mounting groove 102 to improve the sealing performance.

[0065] Based on the above implementation, Figure 7As shown, in order to support the first annular member 9 , a portion of the second sealing portion 94 is disposed on the fulcrum member 3 , specifically on the first connecting plate 30 of the fulcrum member 3 , and the second sealing portion 94 is pressed and fixed in the mounting groove 102 by the first connecting plate 30 .

[0066] In the above embodiment, the expansion chamber 4 is located between the first annular member 9 and the support plate 1, and the structure of the expansion chamber 4 is limited by the structure of the support plate 1. Therefore, in order to make the expansion chamber 4 more flexibly arranged, in another embodiment, as Figure 4 and Figure 5 As shown, the polishing platen also includes a second annular member 8, which is located between the first annular member 9 and the supporting plate 1; the expansion chamber 4 is located between the inner ring side of the first annular member 9 and the outer ring side of the second annular member 8.

[0067] Specifically, in the present embodiment, the expansion chamber 4 is located between the first annular member 9 and the second annular member 8, and the structural form of the expansion chamber 4 is only limited by the structures of the first annular member 9 and the second annular member 8. The first annular member 9 and the second annular member 8 are replaceable parts, and the structure of the expansion chamber 4 can be adjusted by replacing different first annular members 9 or second annular members 8, thereby making the setting of the expansion chamber 4 more flexible.

[0068] In this embodiment, the first annular member 9 and the second annular member 8 are connected in an outer-inner sleeve relationship, and there is a certain gap between the vertical side walls of the first annular member 9 and the second annular member 8, and the gap is used as the expansion chamber 4. Therefore, the vertical side wall of the first annular member 9 also serves as the outer cavity wall 40 of the expansion chamber 4. In the process of applying pressure to the expansion chamber 4, the second annular member 8 is closely attached to the support plate 1, and the vertical side wall of the first annular member 9, as the outer cavity wall 40, expands and applies a torque to the second end of the polishing plate 2.

[0069] Similarly, in this embodiment, the expansion cavity 4 needs to be in a sealed cavity. When the expansion cavity 4 is formed by the first annular member 9 and the second annular member 8, the first annular member 9 and the second annular member 8 should be sealed in the area outside the gap. Specifically, in this embodiment, a groove can be provided on the vertical side wall of the first annular member 9 or the second annular member 8, and the areas outside the groove fit each other, so that the expansion cavity 4 is formed by the gap generated by the groove, and the other areas are sealed after being closely fitted.

[0070] In order to realize the pressure control of the expansion chamber 4, a pressure regulating channel 5 is provided on the second annular member 8 in this embodiment, and the pressure regulating channel 5 is connected to the expansion chamber 4 and the pressure control source. Of course, the pressure regulating channel 5 can also be provided on the second annular member 8 and the support plate 1 at the same time, and the two channels are connected, the pressure regulating channel 5 on the second annular member 8 is directly connected to the expansion chamber 4, and the pressure regulating channel 5 on the support plate 1 is directly connected to the pressure control source. In order to avoid additional processing of the support plate 1, in this embodiment, it is preferred that the pressure regulating channel 5 is only provided on the second annular member 8.

[0071] Similarly, in order to achieve sealing of the upper and lower ends of the expansion chamber 4, as Figure 6 As shown, in this embodiment, the first annular member 9 includes a third sealing portion 90, a second thin-walled portion 92 and a fourth sealing portion 91 which are connected in sequence, and the expansion chamber 4 is arranged between the second thin-walled portion 92 and the supporting plate 1; the third sealing portion 90 and the fourth sealing portion 91 are used to seal the expansion chamber 4.

[0072] Specifically, in this embodiment, the third sealing portion 90 includes a plane at the upper end of the first annular member 9, and the fourth sealing portion 91 includes a plane at the lower end of the first annular member 9. The third sealing portion 90 is tightly fitted with the upper end of the second annular member 8, and the second sealing portion 94 is tightly fitted with the lower end of the second annular member 8 to achieve sealing. To further improve the sealing performance, a sealing ring 13 can be provided between the third sealing portion 90 and the upper end of the second annular member 8, and similarly, a sealing ring 13 can also be provided between the fourth sealing portion 91 and the lower end of the second annular member 8.

[0073] In the present invention, since the deformation of the polishing disc 2 is driven by the expansion deformation of the first annular member 9, the vertical side wall on the first annular member 9 corresponding to the expansion chamber 4 needs to be easy to expand and contract. To this end, the first annular member 9 in this embodiment also includes a second thin-walled portion 92 located between the third sealing portion 90 and the fourth sealing portion 91, the second thin-walled portion 92 is in contact with the inner ring side of the first annular member 9, the expansion chamber 4 is located between the second thin-walled portion 92 and the outer ring side of the second annular member 8, and the first thin-walled portion 95 serves as the outer cavity wall 40 of the expansion chamber 4. The wall of the first thin-walled portion 95 is thinner, so it is easier to deform when the pressure of the expansion chamber 4 changes. The third sealing portion 90 and the fourth sealing portion 91 are components that play a sealing role, and will not be deformed during the expansion and contraction of the expansion chamber 4, so their thickness can be set to be thicker to ensure sufficient sealing performance.

[0074] In addition, since the wall of the second thin-walled portion 92 is relatively thin, in order to allow a gap to exist between the second thin-walled portion 92 and the second annular member 8 to serve as an expansion chamber 4, in this embodiment, it is preferred to form a groove corresponding to the second thin-walled portion 92 on the outer ring side of the second annular member 8, thereby forming a gap between the groove and the second thin-walled portion 92.

[0075] In the present invention, the first annular member 9 and the second annular member 8 are in a sleeve connection relationship. During installation, the first annular member 9 can be sleeved on the outside of the second annular member 8. On this basis, in order to achieve sealing by using the third sealing portion 90 and the fourth sealing portion 91, as shown in FIG. Figure 5 As shown, in this embodiment, the upper end of the first ring member 9 is folded outward to form a third sealing portion 90, and the lower end of the first ring member 9 is folded inward to form a fourth sealing portion 91. The outer ring side of the second ring member 8 has a protruding fifth sealing portion 81, and the third sealing portion 90 and the fifth sealing portion 81 are attached to each other and sealed; the outer ring side of the support plate 1 has a first connecting protrusion 100, and the fourth sealing portion 91 is arranged on the first connecting protrusion 100, and the fourth sealing portion 91 is attached to the lower end surface of the second ring member 8 and sealed.

[0076] Specifically, in this embodiment, the fifth sealing portion 81 corresponds to and fits tightly with the third sealing portion 90 to form a seal, and a sealing ring 13 may be provided between the fifth sealing portion 81 and the third sealing portion 90 to increase the sealing performance. The lower end surface of the second ring member 8 corresponds to and fits tightly with the fourth sealing portion 91 to form a seal, and a sealing ring 13 may be provided between the lower end surface of the second ring member 8 and the fourth sealing portion 91 to increase the sealing performance. At the same time, the lower surface of the fourth sealing portion 91 corresponds to and fits tightly with the first connecting protrusion 100, and the first connecting protrusion 100 serves as a supporting base for the first ring member 9. Since the polishing disc 2 is located outside the first annular member 9, after the upper end of the first annular member 9 is folded outward to form the third sealing portion 90, in order to make the second thin-walled portion 92 on the first annular member 9 fit with the polishing disc 2, Figure 6 As shown, in this embodiment, a second connecting protrusion 200 is provided on the inner ring side of the polishing disc 2, and the second connecting protrusion 200 protrudes toward the second thin-walled portion 92, and the second connecting protrusion 200 fits the second thin-walled portion 92. In order to increase the force-bearing area, the vertical size of the second connecting protrusion 200 is close to that of the second thin-walled portion 92.

[0077] To avoid interference during the deformation of the polishing disk 2, in this embodiment, there is a spacing between the upper end surface of the second connecting protrusion 200 and the lower end surface of the third sealing portion 90, and between the lower end surface of the second connecting protrusion 200 and the upper end surface of the first connecting protrusion 100, so that the second connecting protrusion 200 is provided with movement space through the spacing.

[0078] In other words, in this embodiment, during the deformation of the polishing disk 2, the second connecting protrusion 200 will produce a certain angle of deflection. During the deflection of the second connecting protrusion 200, the upper end of the second connecting protrusion 200 does not contact the third sealing portion 90, and the lower end of the second connecting protrusion 200 does not contact the first connecting protrusion 100, thereby avoiding interference with the deflection of the second connecting protrusion 200, which in turn causes interference with the deformation of the polishing disk 2.

[0079] In order to facilitate the installation of the fulcrum member 3, in this embodiment, a third connecting protrusion 201 is provided on the inner ring side of the polishing disc 2, and the third connecting protrusion 201 is located below the first connecting protrusion 100; The upper end of the fulcrum member 3 is connected to the lower end surface of the first connecting protrusion 100 , and the lower end of the fulcrum member 3 is connected to the third connecting protrusion 201 .

[0080] Specifically, in this embodiment, the first connection protrusion 100 corresponds to the third connection protrusion 201, and the fulcrum member 3 is installed between the first connection protrusion 100 and the third connection protrusion 201. Specifically, the first connection plate 30 of the fulcrum member 3 is fixedly connected to the first connection protrusion 100, and the second connection plate 32 of the fulcrum member 3 is fixedly connected to the second connection protrusion 200. It can be understood that the structure of the third connection protrusion 201 should also meet the requirement of not interfering with the support plate 1 during the deformation process of the polishing plate 2.

[0081] like Figure 5 As shown, in order to facilitate the positioning of the first ring member 9, in this embodiment, a first limiting portion 80 is provided on the outer ring side of the supporting plate 1, and a second limiting portion 101 is provided on the inner ring side of the second ring member 8. The second limiting portion 101 is installed on the first limiting portion 80 so that the first limiting portion 80 limits the second limiting portion 101 vertically.

[0082] Specifically, the second ring member 8 is sleeved on the support plate 1, and the first limiting portion 80 and the second limiting portion 101 are abutted against each other up and down to achieve the vertical limitation of the second ring member 8. In one embodiment, the first limiting portion 80 includes a limiting groove 310, and the second limiting portion 101 includes a limiting protrusion, and the limiting protrusion overlaps in the limiting groove 310. In this embodiment, the limiting groove 310 is an annular groove formed on the upper edge of the support plate 1, and the limiting protrusion is an annular protrusion formed on the inner ring side of the second ring member 8. When the second ring member 8 is sleeved on the support plate 1, the limiting protrusion is installed in the limiting groove 310, so as to limit the vertical position of the second ring member 8.

[0083] To prevent the polishing disc 2 from falling off vertically, Figure 5 As shown, the polishing pressure plate in this embodiment also includes an anti-falling plate 6, which is connected to the polishing plate 2 through a connecting piece, and the polishing plate 2 is vertically limited by the connecting piece.

[0084] Specifically, in the present embodiment, the anti-falling plate 6 is arranged at the upper end of the polishing plate 2, and the connecting piece may be a connecting bolt. After the anti-falling plate 6 is connected to the polishing plate 2 through the connecting piece, it can be deformed along with the polishing plate 2.

[0085] like Figure 5 As shown, when the polishing platen includes a first ring-shaped member 9 and a second ring-shaped member 8, in order to avoid interference with the deformation of the polishing plate 2, a receiving groove 60 is provided at the lower end of the anti-fall plate 6, and the upper part of the first ring-shaped member 9 is located in the receiving groove 60, and there is a gap between the upper part of the first ring-shaped member 9 and the receiving groove 60 in the horizontal and vertical directions, so that the anti-fall plate 6 does not interfere with the first ring-shaped member 9 when the polishing plate 2 is deformed.

[0086] According to another aspect of the present invention, there is provided a semiconductor polishing device, comprising the above-mentioned polishing platen.

[0087] According to another aspect of the present invention, Figure 8 As shown, a method for controlling the polishing surface type of a polishing platen is provided. In this embodiment, the polishing surface type refers to the shape presented by the polishing end face of the polishing plate 2. In the actual polishing process, the polishing surface type includes a polishing end face that is a horizontal plane, a polishing end face that is a concave curved surface, and a polishing end face that is a convex curved surface. Among them, the polishing end face that is a concave curved surface and the polishing end face that is a convex curved surface belong to special polishing surface types. According to different polishing processes, the degree of concavity and convexity of the polishing end face are different, so that there are still a variety of polishing surface types based on concave and convex. In addition, it should be noted that the polishing end face that is a concave curved surface means that the middle part of the polishing end face is concave inward, and the other parts are at a certain angle to the horizontal plane. The polishing end face that is a convex curved surface means that the middle part of the polishing end face is convex outward, and the other parts are at a certain angle to the horizontal plane.

[0088] The polishing surface profile adjustment process of the polishing platen can be summarized as adjusting the pressure in the expansion chamber 4 to cause the outer cavity wall 40 of the expansion chamber 4 to expand and deform to varying degrees. During the expansion and deformation process of the outer cavity wall 40, the outer cavity wall 40 transmits torque through the polishing plate 2, thereby causing the polishing end surface of the polishing plate 2 to deform to change the polishing surface profile.

[0089] Specifically, in order to achieve precise control of the polishing surface shape, the polishing surface shape control method in this embodiment includes the following steps: S10, obtaining a mapping relationship between the output load and the polishing surface type, wherein the mapping relationship is determined according to a corresponding relationship between the output load and the deflection of the outer cavity wall 40, and a corresponding relationship between the deflection of the outer cavity wall 40 and the polishing surface type; From the perspective of the force transmission path, the output load of the pressure control source first acts on the expansion chamber 4, and directly acts on the outer wall 40 of the expansion chamber 4, causing the outer wall 40 to produce a deflection change, and the magnitude of the output load determines the deflection of the outer wall 40. In the process of the outer wall 40 producing a deflection change, the outer wall 40 can transmit a torque to the polishing disc 2, causing the polishing end surface to deform, thereby changing the polishing surface shape.

[0090] Therefore, it is necessary to first determine the corresponding relationship between the output load of the pressure control source and the deflection of the outer cavity wall 40. In one embodiment, the corresponding relationship between the output load and the deflection of the outer cavity wall 40 can be obtained by structural analysis and calculation of the polishing platen, which will not be described in detail here. In another embodiment, the corresponding relationship can be obtained by simulation analysis by software.

[0091] According to the above content, the deflection of the outer cavity wall 40 directly determines the deformation degree of the polishing plate 2, that is, directly determines the polishing surface type, so it is also necessary to determine the corresponding relationship between the deflection of the outer cavity wall 40 and the polishing surface type of the polishing end face. In this embodiment, similarly, the corresponding relationship can be obtained by structural analysis and calculation of the polishing platen, or by simulation analysis through software.

[0092] Since the polishing surface type is changed mainly by controlling the output load of the pressure control source in the polishing surface type control process, it is necessary to determine the relationship between the output load and the polishing surface type. In this embodiment, after determining the corresponding relationship between the output load and the deflection of the outer cavity wall 40, and the corresponding relationship between the deflection of the outer cavity wall 40 and the polishing surface type, the mapping relationship between the output load and the polishing surface type can be derived according to logic, and the relationship between the output load of the pressure control source and the polishing surface type of the polishing end face can be expressed through the mapping relationship.

[0093] S20, adjusting the output load of the pressure control source according to the mapping relationship, changing the deflection of the outer cavity wall 40, and further changing the inclination angle of the polishing end face to meet the target polishing surface shape.

[0094] Specifically, before adjusting the polishing surface type, the target polishing surface type needs to be determined. The target polishing surface type can be a polishing surface type set manually, or it can be a polishing surface type that the polishing platen needs to achieve during the polishing process according to preset conditions and rules. In terms of structural parameters, the inclination angle of the polishing end face can be used to represent the corresponding polishing surface type. Therefore, when determining the target polishing surface type, the inclination angle of the polishing end face under the target polishing surface type can be determined. According to the mapping relationship between the output load and the polishing surface type, the target output load can be determined after determining the target polishing surface type. At this time, the output load of the pressure control source can be adjusted to the target output load, so that the polishing end face is deformed to meet the target polishing surface type, and the adjustment of the polishing surface type is completed.

[0095] In one embodiment, the expansion chamber 4 is connected to a pressure control source through a specific channel, which can be provided on the support plate 1 or on a member forming the expansion chamber 4. The pressure control source can be a gas pressure control source or a hydraulic pressure control source.

[0096] In one embodiment, the polishing surface control method of the present invention is applied to the polishing platen of the above embodiment. According to the structural description of the polishing platen, the expansion cavity 4 is substantially as follows: Fig. 9 The annular cylindrical space shown, therefore, this embodiment provides a corresponding relationship between the output load of a pressure control source and the deflection of the outer cavity wall 40: ; in, is the deflection of the outer cavity wall, is the load, is the axial position of each point on the outer cavity wall, is the axial length of the outer cavity wall, is the bending stiffness of the outer cavity wall, is the wall thickness of the outer cavity wall, , , E is the elastic modulus of the outer cavity wall, is Poisson's ratio.

[0097] In one embodiment, the correspondence between the outer cavity wall deflection and the polishing surface shape is determined in the following manner: like Fig.10 and Fig.11 As shown, the polishing platen is subjected to finite element simulation analysis to determine the correspondence between the deflection at the maximum deflection of the outer cavity wall 40 and the polishing surface type of the polishing plate 2. Since the structure and connection relationship of the polishing plate 2 itself are complex, the relationship can be obtained by finite element simulation analysis. Specifically, a simulation model of the polishing platen can be established, and the deflection change of the outer cavity wall 40 is controlled in the simulation software to make the polishing end surface of the polishing plate 2 have different inclination angles. After multiple simulations, the deflection change value and the inclination angle value are established to finally obtain the correspondence between the deflection and the polishing surface type.

[0098] In one embodiment, the polishing surface profile control method further includes: Obtaining the current output load of the pressure control source; According to the mapping relationship, the polishing surface type of the current polishing end face is determined.

[0099] Specifically, in this embodiment, the output load can be obtained by a corresponding pressure sensor, and the corresponding sensor can be arranged at the output end of the pressure control source or in the expansion chamber 4. Since the mapping relationship between the output load and the inclination angle can be obtained according to the above embodiment, the inclination angle can be determined based on the mapping relationship after the output load of the pressure control source is obtained, and then the polishing surface type is determined. In actual control, based on the mapping relationship, the output load that the pressure control source should output can be obtained according to the target polishing surface type, and the output load currently output by the pressure control source can be obtained according to the current polishing surface type. The output load is increased or decreased according to the difference between the two, so as to obtain the target polishing surface type.

[0100] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A ring-shaped cylindrical workpiece, characterized in that: include: An annular expansion chamber, one end of which is used to connect to a pressure control source, which changes the output load according to the axial length of the outer wall of the expansion chamber, the bending stiffness of the outer wall, the wall thickness of the outer wall, the elastic modulus of the outer wall and the Poisson's ratio to change the deflection of the outer wall. The outer wall of the expansion chamber is used to transmit torque to the polishing disk when the deflection increases, so that the polishing surface of the polishing disk is deformed.

2. The annular cylindrical workpiece according to claim 1, characterized in that: The two ends of the outer cavity wall are simply supported structures, and the corresponding relationship between the deflection of the outer cavity wall and the output load of the pressure control source is: ； in, is the deflection of the outer cavity wall, is the output load, is the axial position of each point on the outer cavity wall, is the axial length of the outer cavity wall, is the bending stiffness of the outer cavity wall, is the wall thickness of the outer cavity wall, , , E is the elastic modulus of the outer cavity wall, is the Poisson's ratio of the outer cavity wall.

3. A polishing surface control method, characterized in that: The polishing surface of the polishing disc controlled by the annular cylindrical workpiece according to claim 1 or 2 comprises: Acquire a mapping relationship between the output load and the polishing surface type, wherein the mapping relationship is determined according to a corresponding relationship between the output load and the deflection of the outer cavity wall and a corresponding relationship between the deflection of the outer cavity wall and the polishing surface type; According to the mapping relationship, the output load of the pressure control source is adjusted to change the deflection of the outer cavity wall, thereby changing the polishing surface shape to meet the target polishing surface shape.

4. The polishing surface profile control method according to claim 3, characterized in that: The corresponding relationship between the outer cavity wall deflection and the polishing surface shape is determined in the following manner: Finite element simulation analysis is performed on the polishing platen to determine the corresponding relationship between the outer cavity wall deflection and the polishing surface shape.

5. The polishing surface profile control method according to claim 3, characterized in that: The polishing surface type control method also includes: Obtaining the current output load of the pressure control source; According to the mapping relationship, the current polishing surface type is determined.

6. A polishing platen, which controls the polishing surface shape by using the polishing surface shape control method according to any one of claims 3 to 5, the polishing platen comprising: Support plates, polishing plates and fulcrums; The two ends of the fulcrum member are respectively connected to the first end of the support plate and the polishing plate; an expansion cavity is provided between the support plate and the second end of the polishing plate away from the polishing end surface, and the fulcrum member is located between the polishing end surface and the second end of the polishing plate; The pressure in the expansion chamber is controlled to cause the outer chamber wall to deform, so that the outer chamber wall transmits torque through the second end of the polishing plate, and the second end of the polishing plate transmits torque to the polishing end face of the polishing plate through the fulcrum member, and the polishing surface of the polishing plate is deformed under the action of the torque.

7. The polishing platen according to claim 6, characterized in that: The fulcrum member comprises a first connecting plate, a second connecting plate and a fulcrum plate, the first connecting plate and the second connecting plate are respectively connected to the first ends of the supporting plate and the polishing plate, and the fulcrum plate is connected between the first connecting plate and the second connecting plate; When the outer cavity wall is deformed by controlling the pressure in the expansion cavity, the first connecting plate, the second connecting plate and the fulcrum plate are elastically deformed under the action of the moment to change the angle between the first connecting plate and the second connecting plate.

8. The polishing platen according to claim 6, characterized in that: The polishing surface of the polishing disc is convex inside and concave outside when it is not deformed.

9. The polishing platen according to claim 6, characterized in that: The polishing platen also includes a first annular member, which is disposed between the supporting plate and the second end of the polishing plate, and the expansion chamber is located between the first annular member and the supporting plate.

10. The polishing platen according to claim 9, characterized in that: The first annular member comprises a first sealing portion, a first thin-walled portion and a second sealing portion which are connected in sequence, and the expansion chamber is provided between the first thin-walled portion and the supporting disk; The first sealing portion and the second sealing portion are used to seal the expansion cavity.

11. The polishing platen according to claim 9, characterized in that: The polishing platen further comprises a second annular member, wherein the second annular member is located between the first annular member and the supporting plate; The expansion chamber is located between the inner ring side of the first ring member and the outer ring side of the second ring member.

12. The polishing platen according to claim 11, characterized in that: The first annular member comprises a third sealing portion, a second thin-walled portion and a fourth sealing portion which are connected in sequence, and the expansion chamber is provided between the second thin-walled portion and the supporting disk; The third sealing portion and the fourth sealing portion are used to seal the expansion chamber.

13. The polishing platen according to claim 12, characterized in that: The outer ring side of the second annular member has a protruding fifth sealing portion, and the third sealing portion and the fifth sealing portion are in contact with each other and are sealed and connected; The outer ring side of the support disk has a first connecting protrusion, the fourth sealing portion is arranged on the first connecting protrusion, and the fourth sealing portion is in contact with and sealedly connected to the lower end surface of the second annular member.

14. The polishing platen according to claim 13, characterized in that: The inner ring side of the polishing disc is provided with a second connecting protrusion protruding toward the first annular member, and the second connecting protrusion is in contact with the second thin-walled portion.

15. The polishing platen according to claim 14, characterized in that: There is a distance between the upper end surface of the second connecting protrusion and the lower end surface of the third sealing portion, and between the lower end surface of the second connecting protrusion and the upper end surface of the first connecting protrusion, and the distance provides movement space for the second connecting protrusion.

16. A polishing device, characterized in that: Comprising a polishing platen as described in any one of claims 6 to 15.

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