Inner hole cleaning device and inner hole cleaning method for rotary target material

Abstract

The invention relates to an inner hole cleaning device and method for a rotary target material. The inner hole cleaning device comprises a product fixing mechanism and a polishing mechanism. The product fixing mechanism comprises a product cart, a placing platform is arranged on the product cart, and a supporting assembly used for supporting the rotating target material is arranged on the placing platform; the polishing mechanism comprises a polishing cart, a polishing device fixing platform is arranged on the polishing cart, and a pneumatic polishing device is arranged on the polishing device fixing platform; and a polishing head of the pneumatic polishing device and an inner hole of the rotary target material are coaxially arranged. According to the method, oxides and oil stains on the inner wall of the rotating target material can be quickly and effectively removed, the problem that deep hole cleaning is difficult to achieve through a traditional cleaning method is solved, and the cleaning efficiency and the cleaning quality are improved.

Description

Technical Field

[0001] The invention relates to the technical field of target material processing, and in particular to an inner hole cleaning device and an inner hole cleaning method of a rotating target material. Background Art

[0002] In the field of sputtering target preparation technology, rotating targets are widely used due to their high efficiency and uniform sputtering performance. During the coating process, the rotating target can rotate around the fixed magnetron sputtering equipment to achieve 360° uniform etching of the target surface, thereby ensuring the uniformity and stability of the coating and improving the yield rate. However, during the manufacturing and use of rotating targets, the cleaning of foreign matter in the inner hole is an important issue that affects the sputtering effect of the target.

[0003] For example, it is extremely difficult to clean the inner wall of a copper rotating target with a depth of more than 3m. Due to long-term exposure to air or residues from the processing process, the inner wall of the copper rotating target often shows obvious oxidation, and impurities such as oil stains may also adhere to the inner wall. These oxides and oil stains will not only affect the sputtering performance of the target and reduce the coating quality, but may also damage the sputtering equipment.

[0004] At present, the traditional cleaning method generally adopts manual wiping or simple mechanical cleaning, but it is difficult to achieve the ideal cleaning effect. Manual wiping is not only inefficient, but also difficult to ensure the uniformity and thoroughness of cleaning; while simple mechanical devices may not be able to adapt to the deep hole structure and lead to incomplete cleaning.

[0005] Therefore, providing an inner hole cleaning device and an inner hole cleaning method for a rotating target material is a technical problem that needs to be solved in the current field. Summary of the invention

[0006] In view of the shortcomings of the prior art, the purpose of the present invention is to provide an inner hole cleaning device and an inner hole cleaning method for a rotating target material. Compared with the prior art, the present invention can quickly and effectively remove oxides and oil stains on the inner wall of the rotating target material, solves the problem that traditional cleaning methods are difficult to achieve deep hole cleaning, and improves cleaning efficiency and cleaning quality.

[0007] In order to achieve the purpose of the invention, the present invention adopts the following technical solutions:

[0008] In a first aspect, the present invention provides an inner hole cleaning device for a rotating target material, the inner hole cleaning device comprising a product fixing mechanism and a polishing mechanism;

[0009] The product fixing mechanism comprises a product cart, on which a placement platform is provided, and on which a support assembly for supporting a rotating target is provided;

[0010] The polishing mechanism comprises a polishing cart, on which a polishing device fixing platform is provided, and on which a pneumatic polishing device is provided;

[0011] The polishing head of the pneumatic polishing device is coaxially arranged with the inner hole of the rotating target material.

[0012] In the present invention, by arranging the polishing head of the pneumatic polishing device to be coaxial with the inner hole of the rotating target material, it can be ensured that the polishing head can accurately enter and act on the inner hole of the target material, thereby achieving an accurate and uniform polishing effect. The pneumatic polishing device uses the power generated by compressed air to drive the polishing head to perform rotational polishing on the inner hole of the target material. By arranging a product cart and a polishing cart, flexibility can be increased, and movement and conversion between different workstations can be facilitated.

[0013] Preferably, the number of the support components is at least 2, for example, 2, 3 or 4, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0014] Preferably, the support assemblies are arranged at intervals along the axial direction of the rotating target.

[0015] Preferably, a through hole is provided inside the supporting assembly, and the rotating target passes through the through hole.

[0016] In the present invention, a buffer material such as support cotton is generally provided between the support assembly and the rotating target material to avoid damage to the outer wall of the target material.

[0017] Preferably, the pneumatic polishing device comprises a polishing head, a pneumatic motor and a gas pipe; the polishing head is connected to the power output end of the pneumatic motor, and the outlet of the gas pipe is connected to the air inlet of the pneumatic motor; the polishing head, the pneumatic motor and the gas pipe are all coaxially arranged along the axial direction of the inner hole of the rotating target material.

[0018] Preferably, the pneumatic polishing device is arranged on a sliding mechanism of a fixed platform of the polishing device.

[0019] Preferably, the sliding mechanism includes a fixed guide block, a guide rail and a guide slider; one end of the gas pipe close to the rotating target is fixed in the fixed guide block, and the other end is fixed in the guide slider; the fixed guide block and the guide rail are fixed on the fixed platform of the polishing device, the extension direction of the guide rail is parallel to the axial direction of the gas pipe, and the guide slider is slidably set on the guide rail.

[0020] In the present invention, through the setting of the sliding mechanism, the problem that traditional cleaning methods are difficult to achieve deep hole cleaning can be effectively solved, wherein the fixed guide block is used to guide and fix one end of the gas pipe, and the guide slide rail provides a track for the sliding of the guide slider, ensuring that the guide slider can move smoothly in a direction parallel to the axial direction of the inner hole of the rotating target material. The guide slider is installed on the guide slide rail and can slide along the slide rail, thereby driving the gas pipe and the polishing head to slide.

[0021] Preferably, the grinding particle size of the polishing head is 320-600 mesh, for example, it can be 320 mesh, 400 mesh, 500 mesh or 600 mesh, but it is not limited to the listed values, and other values ​​not listed within the numerical range are also applicable.

[0022] In a second aspect, the present invention provides a method for cleaning the inner hole of a rotating target, wherein the inner hole cleaning method adopts the inner hole cleaning device of the rotating target described in the first aspect of the present invention;

[0023] The inner hole cleaning method comprises the following steps:

[0024] The supporting assembly is used to fix the rotating target material on the placing platform of the product cart, the pneumatic polishing device is arranged on the polishing device fixing platform of the polishing cart, and the polishing head of the pneumatic polishing device is inserted into the inner hole of the rotating target material for polishing to obtain the target material with the inner hole cleaned.

[0025] The inner hole cleaning method provided by the present invention can improve the polishing efficiency and ensure the polishing quality by adopting the inner hole cleaning device.

[0026] Preferably, the air pressure of the pneumatic polishing device is 0.4-0.8 MPa, for example, it can be 0.4 MPa, 0.45 MPa, 0.5 MPa, 0.55 MPa, 0.6 MPa, 0.65 MPa, 0.7 MPa, 0.75 MPa or 0.8 MPa, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0027] In the present invention, by preferably controlling the air pressure of the pneumatic polishing device, the contact force between the polishing head and the inner hole of the rotating target can be controlled to avoid the situation where the pressure is too low to remove dirt from the inner hole, resulting in substandard surface roughness, and to avoid the situation where the pressure is too high to damage the inner hole, which in turn increases the surface roughness.

[0028] Preferably, the rotation speed of the pneumatic polishing device is 700-900r / min, for example, it can be 700r / min, 720r / min, 740r / min, 760r / min, 780r / min, 800r / min, 820r / min, 840r / min, 860r / min, 880r / min or 900r / min, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0029] In the present invention, by optimally controlling the rotation speed of the pneumatic polishing device, the surface roughness of the inner hole can be further reduced and the processing efficiency can be improved.

[0030] Preferably, the inner hole cleaning method comprises the following steps:

[0031] The rotating target is passed through the through hole of the support assembly and fixedly mounted on the placement platform of the product cart.

[0032] The pneumatic polishing device is fixed on the polishing device fixed platform of the polishing cart through a sliding mechanism, the polishing head is inserted into the inner hole of the rotating target material, and the polishing head is driven to slide in the inner hole of the rotating target material by moving the guide slider, thereby polishing the inner hole of the rotating target material.

[0033] Preferably, the moving speed of the guide slider is 0.2-0.4m / min, for example, it can be 0.2m / min, 0.22m / min, 0.24m / min, 0.26m / min, 0.28m / min, 0.3m / min, 0.32m / min, 0.34m / min, 0.36m / min, 0.38m / min or 0.4m / min, but is not limited to the listed values, and other unlisted values ​​within the numerical range are also applicable.

[0034] In the present invention, by preferably controlling the moving speed of the guide slider, it is possible to avoid moving too fast and resulting in poor cleaning effect, while avoiding moving too slowly and resulting in low processing efficiency and uneven polishing effect.

[0035] Compared with the prior art, the present invention has the following beneficial effects:

[0036] (1) The inner hole cleaning device provided by the present invention can quickly and effectively remove oxides and oil stains on the inner wall of the rotating target, thereby improving the cleaning efficiency and cleaning quality.

[0037] (2) The inner hole cleaning device provided by the present invention adopts a polishing method in which a guide slider drives the polishing head to slide in the inner hole of a rotating target material through an optimally designed sliding mechanism, which can effectively solve the problem that traditional cleaning methods are difficult to achieve deep hole cleaning.

[0038] (3) The inner hole cleaning method provided by the present invention can accurately control the polishing effect and reduce the surface roughness of the inner hole by controlling the polishing process conditions. The surface roughness of the inner hole can be reduced to below 1.8 μm. Under better conditions, it can be reduced to below 1.0 μm, and the polishing efficiency is improved to ensure the polishing quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] Figure 1 is a schematic structural diagram of an inner hole cleaning device provided in Example 1 of the present invention;

[0040] Among them, 1-product cart; 2-placing platform; 3-support assembly; 4-rotating target; 5-polishing cart; 6-polishing device fixed platform; 7-polishing head; 8-pneumatic motor; 9-gas pipe; 10-fixed guide block; 11-guide slide rail; 12-guide slider. DETAILED DESCRIPTION

[0041] The technical solution of the present invention is further described below by specific implementation methods. It should be understood by those skilled in the art that the embodiments are only to help understand the present invention and should not be regarded as specific limitations of the present invention.

[0042] Example 1

[0043] This embodiment provides a device for cleaning the inner hole of a rotating target. Figure 1 As shown, the inner hole cleaning device includes a product fixing mechanism and a polishing mechanism;

[0044] The product fixing mechanism comprises a product cart 1, on which a placing platform 2 is arranged, on which a supporting assembly 3 for supporting a rotating target 4 is arranged, wherein the number of the supporting assemblies 3 is 2 and the supporting assemblies 3 are arranged at intervals along the axial direction of the rotating target 4, and a through hole is arranged inside the supporting assembly 3, through which the rotating target 4 passes;

[0045] The polishing mechanism includes a polishing trolley 5, on which a polishing device fixed platform 6 is provided, and the polishing device fixed platform 6 is provided with a pneumatic polishing device through a sliding mechanism. The pneumatic polishing device includes a 400-mesh polishing head 7, an air motor 8 and a gas pipe 9, the polishing head 7 is connected to the power output end of the air motor 8, the outlet of the gas pipe 9 is connected to the air inlet of the air motor 8, the polishing head 7, the air motor 8 and the gas pipe 9 are all coaxially arranged along the axial direction of the inner hole of the rotating target material 4, the sliding mechanism includes a fixed guide block 10, a guide slide rail 11 and a guide slider 12, one end of the gas pipe 9 close to the rotating target material 4 is fixedly arranged in the fixed guide block 10, and the other end is fixedly arranged in the guide slider 12, the fixed guide block 10 and the guide slide rail 11 are fixedly arranged on the fixed platform 6 of the polishing device, the extension direction of the guide slide rail 11 is parallel to the axial direction of the gas pipe 9, and the guide slider 12 is slidably arranged on the guide slide rail 11.

[0046] This embodiment also provides an inner hole cleaning method using the inner hole cleaning device, the inner hole cleaning method comprising the following steps:

[0047] The rotating target 4 is passed through the through hole of the supporting assembly 3, so as to be fixedly arranged on the placing platform 2 of the product cart 1.

[0048] The pneumatic polishing device is fixed on the polishing device fixed platform 6 of the polishing cart 5 through a sliding mechanism, the polishing head 7 is inserted into the inner hole of the rotating target material 4, and the polishing head 7 is driven to slide in the inner hole of the rotating target material 4 by moving the guide slider 12. The moving speed of the guide slider 12 is 0.3m / min, so that the inner hole of the rotating target material 4 is polished to obtain a target material with the inner hole cleaned. The air pressure of the pneumatic polishing device is 0.6MPa, and the rotation speed of the pneumatic polishing device is 800r / min.

[0049] Example 2

[0050] This embodiment provides an inner hole cleaning device for a rotating target material, the inner hole cleaning device comprising a product fixing mechanism and a polishing mechanism;

[0051] The product fixing mechanism comprises a product cart, on which a placing platform is arranged, on which a supporting assembly for supporting a rotating target is arranged, the number of the supporting assemblies is 2 and they are arranged at intervals along the axial direction of the rotating target, a through hole is arranged inside the supporting assembly, and the rotating target passes through the through hole;

[0052] The polishing mechanism includes a polishing cart, on which a polishing device fixed platform is provided, and the polishing device fixed platform is provided with a pneumatic polishing device through a sliding mechanism, and the pneumatic polishing device includes a 320-mesh polishing head, a pneumatic motor and a gas pipe, the polishing head is connected to the power output end of the pneumatic motor, the outlet of the gas pipe is connected to the air inlet of the pneumatic motor, the polishing head, the pneumatic motor and the gas pipe are all coaxially arranged along the axial direction of the inner hole of the rotating target material, the sliding mechanism includes a fixed guide block, a guide slide rail and a guide slider, one end of the gas pipe close to the rotating target material is fixedly arranged in the fixed guide block, and the other end is fixedly arranged in the guide slider, the fixed guide block and the guide slide rail are fixedly arranged on the fixed platform of the polishing device, the extension direction of the guide slide rail is parallel to the axial direction of the gas pipe, and the guide slider is slidably arranged on the guide slide rail.

[0053] This embodiment also provides an inner hole cleaning method using the inner hole cleaning device, the inner hole cleaning method comprising the following steps:

[0054] The rotating target is passed through the through hole of the support assembly and fixedly mounted on the placement platform of the product cart.

[0055] The pneumatic polishing device is fixed on the polishing device fixed platform of the polishing cart through a sliding mechanism, the polishing head is inserted into the inner hole of the rotating target material, and the polishing head is driven to slide in the inner hole of the rotating target material by moving the guide slider. The moving speed of the guide slider is 0.2m / min, so that the inner hole of the rotating target material is polished to obtain the target material with the inner hole cleaned. The air pressure of the pneumatic polishing device is 0.8MPa, and the rotation speed of the pneumatic polishing device is 700r / min.

[0056] Example 3

[0057] This embodiment provides an inner hole cleaning device for a rotating target material, the inner hole cleaning device comprising a product fixing mechanism and a polishing mechanism;

[0058] The product fixing mechanism comprises a product cart, on which a placing platform is arranged, on which a supporting assembly for supporting a rotating target is arranged, the number of the supporting assemblies is 2 and they are arranged at intervals along the axial direction of the rotating target, a through hole is arranged inside the supporting assembly, and the rotating target passes through the through hole;

[0059] The polishing mechanism includes a polishing cart, on which a polishing device fixed platform is provided, and the polishing device fixed platform is provided with a pneumatic polishing device through a sliding mechanism, and the pneumatic polishing device includes a 600-mesh polishing head, a pneumatic motor and a gas pipe, the polishing head is connected to the power output end of the pneumatic motor, the outlet of the gas pipe is connected to the air inlet of the pneumatic motor, the polishing head, the pneumatic motor and the gas pipe are all coaxially arranged along the axial direction of the inner hole of the rotating target material, the sliding mechanism includes a fixed guide block, a guide slide rail and a guide slider, one end of the gas pipe close to the rotating target material is fixedly arranged in the fixed guide block, and the other end is fixedly arranged in the guide slider, the fixed guide block and the guide slide rail are fixedly arranged on the fixed platform of the polishing device, the extension direction of the guide slide rail is parallel to the axial direction of the gas pipe, and the guide slider is slidably arranged on the guide slide rail.

[0060] This embodiment also provides an inner hole cleaning method using the inner hole cleaning device, the inner hole cleaning method comprising the following steps:

[0061] The rotating target is passed through the through hole of the support assembly and fixedly mounted on the placement platform of the product cart.

[0062] The pneumatic polishing device is fixed on the polishing device fixed platform of the polishing cart through a sliding mechanism, the polishing head is inserted into the inner hole of the rotating target material, and the polishing head is driven to slide in the inner hole of the rotating target material by moving the guide slider. The moving speed of the guide slider is 0.4m / min, so that the inner hole of the rotating target material is polished to obtain the target material with the inner hole cleaned. The air pressure of the pneumatic polishing device is 0.4MPa, and the rotation speed of the pneumatic polishing device is 900r / min.

[0063] Example 4

[0064] This embodiment provides an inner hole cleaning device for a rotating target material, which is different from the embodiment 1 only in that the grinding particle size of the polishing head is 120 meshes.

[0065] Example 5

[0066] This embodiment provides a method for cleaning the inner hole of a rotating target material. The only difference compared with the embodiment 1 is that the air pressure of the pneumatic polishing device is 0.2 MPa.

[0067] Example 6

[0068] This embodiment provides a method for cleaning the inner hole of a rotating target material. The only difference compared with the embodiment 1 is that the air pressure of the pneumatic polishing device is 0.9 MPa.

[0069] Example 7

[0070] This embodiment provides a method for cleaning the inner hole of a rotating target material. The only difference compared with the embodiment 1 is that the rotation speed of the pneumatic polishing device is 500 r / min.

[0071] Example 8

[0072] This embodiment provides a method for cleaning the inner hole of a rotating target material. The only difference compared with the embodiment 1 is that the rotation speed of the pneumatic polishing device is 1000 r / min.

[0073] Example 9

[0074] This embodiment provides a method for cleaning the inner hole of a rotating target material. The only difference compared with the embodiment 1 is that the moving speed of the guide slider is 0.1 m / min.

[0075] Example 10

[0076] This embodiment provides a method for cleaning the inner hole of a rotating target material. The only difference compared with the embodiment 1 is that the moving speed of the guide slider is 0.8 m / min.

[0077] Comparative Example 1

[0078] This comparative example provides an inner hole cleaning device for a rotating target material, which is different from Example 1 only in that the angle between the axial direction of the polishing head of the pneumatic polishing device and the axial direction of the inner hole of the rotating target material is 15°.

[0079] The surface roughness of the inner hole surface of the cleaned target materials in Examples 1-10 and Comparative Example 1 was measured using a surface roughness meter. The results are shown in Table 1.

[0080] Table 1

[0081]

[0082]

[0083] From the data in Table 1, we can see the following points:

[0084] (1) It can be seen from the data of Examples 1-10 that the inner hole cleaning device and inner hole cleaning method provided by the present invention can reduce the surface roughness of the inner hole to below 1.8 μm, and under optimal conditions, it can be reduced to below 1.0 μm.

[0085] (2) A comprehensive comparison of the data of Example 1 and Example 4 shows that the present invention can further reduce the surface roughness by optimally controlling the abrasive particle size of the polishing head.

[0086] (3) It can be seen from the data of Examples 1 and 5-10 that the present invention can further reduce the surface roughness and achieve a good polishing effect by optimally controlling the process parameters such as the air pressure, rotation speed and moving speed of the guide slider of the pneumatic polishing device.

[0087] (4) It can be seen from the data of Example 1 and Comparative Example 1 that the present invention can ensure that the polishing head can accurately enter and act on the inner hole of the target material by controlling the polishing head of the pneumatic polishing device to be coaxial with the inner hole of the rotating target material, thereby achieving a good polishing effect and reducing the surface roughness.

[0088] In summary, the present invention can quickly and effectively remove oxides and oil stains on the inner wall of the rotating target, solves the problem that traditional cleaning methods are difficult to achieve deep hole cleaning, and improves cleaning efficiency and cleaning quality.

[0089] The applicant declares that the above is only a specific implementation mode of the present invention, but the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily thought of by those skilled in the art within the technical scope disclosed by the present invention shall fall within the protection scope and disclosure scope of the present invention.

Claims

1. A device for cleaning the inner hole of a rotating target, characterized in that: The inner hole cleaning device includes a product fixing mechanism and a polishing mechanism; The product fixing mechanism comprises a product cart, on which a placement platform is provided, and on which a support assembly for supporting a rotating target is provided; The polishing mechanism comprises a polishing cart, on which a polishing device fixing platform is provided, and on which a pneumatic polishing device is provided; The polishing head of the pneumatic polishing device is coaxially arranged with the inner hole of the rotating target material.

2. The inner hole cleaning device according to claim 1, characterized in that: The number of the support components is at least 2; Preferably, the support assemblies are arranged at intervals along the axial direction of the rotating target; Preferably, a through hole is provided inside the supporting assembly, and the rotating target passes through the through hole.

3. The inner hole cleaning device according to claim 1 or 2, characterized in that: The pneumatic polishing device comprises a polishing head, a pneumatic motor and a gas pipe; The polishing head is connected to the power output end of the pneumatic motor, and the outlet of the gas pipe is connected to the air inlet of the pneumatic motor; The polishing head, the pneumatic motor and the gas pipe are all coaxially arranged along the axial direction of the inner hole of the rotating target material.

4. The inner hole cleaning device according to any one of claims 1 to 3, characterized in that: The pneumatic polishing device is arranged on a sliding mechanism of a fixed platform of the polishing device.

5. The inner hole cleaning device according to claim 4, characterized in that: The sliding mechanism comprises a fixed guide block, a guide rail and a guide slide block; One end of the gas pipe close to the rotating target is fixedly arranged in the fixed guide block, and the other end is fixedly arranged in the guide slider; The fixed guide block and the guide rail are fixedly arranged on the fixed platform of the polishing device, the extension direction of the guide rail is parallel to the axial direction of the gas pipe, and the guide slider is slidably arranged on the guide rail.

6. The inner hole cleaning device according to any one of claims 1 to 5, characterized in that: The grinding particle size of the polishing head is 320-600 meshes.

7. A method for cleaning the inner hole of a rotating target, characterized in that: The inner hole cleaning method adopts the inner hole cleaning device of the rotating target material according to any one of claims 1 to 6; The inner hole cleaning method comprises the following steps: The supporting assembly is used to fix the rotating target material on the placing platform of the product cart, the pneumatic polishing device is arranged on the polishing device fixing platform of the polishing cart, and the polishing head of the pneumatic polishing device is inserted into the inner hole of the rotating target material for polishing to obtain the target material with the inner hole cleaned.

8. The inner hole cleaning method according to claim 7, characterized in that: The air pressure of the pneumatic polishing device is 0.4-0.8MPa; Preferably, the rotation speed of the pneumatic polishing device is 700-900r / min.

9. The inner hole cleaning method according to claim 7 or 8, characterized in that: The inner hole cleaning method comprises the following steps: The rotating target is passed through the through hole of the support assembly and fixedly mounted on the placement platform of the product cart. The pneumatic polishing device is fixed on the polishing device fixed platform of the polishing cart through a sliding mechanism, the polishing head is inserted into the inner hole of the rotating target material, and the polishing head is driven to slide in the inner hole of the rotating target material by moving the guide slider, thereby polishing the inner hole of the rotating target material.

10. The inner hole cleaning method according to claim 9, characterized in that: The moving speed of the guide sliding block is 0.2-0.4 m / min.

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