Production process for drawing semiconductor-grade quartz plate by using continuous melting furnace for ultra-pure quartz sand

Abstract

The invention relates to the technical field of quartz plate production, and discloses a production process of a semiconductor-grade quartz plate drawn by a continuous melting furnace for ultra-pure quartz sand, which comprises the following steps: step 1, placing quartz sand and auxiliary materials in an inner cavity of a mounting shell; and 2, starting a transmission unit to drive a stirring rod to stir the placed quartz sand and the auxiliary material, and heating the quartz sand and the auxiliary material at the same time. According to the device, the stirring rod can be controlled to rotate and vertically move downwards through the circle of the transmission unit, so that the stirring rod enters the lower mold to stir placed quartz sand and materials, and when stirring is completed, the transmission unit is reversely started to enable a threaded sleeve in the transmission unit to move to a certain position, and the stirring rod is driven to rotate. And at the moment, the driving plate can horizontally move in the lower die through cooperation of the transmission unit and the driving unit, so that the extruded and stirred quartz sand and materials are discharged from the rectangular notch, and the quartz plate is preliminarily formed.

Description

Technical Field

[0001] The invention belongs to the technical field of quartz plate production, and in particular relates to a production process for drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high-purity quartz sand. Background Art

[0002] In the semiconductor industry, quartz plates, as an important basic material, are widely used in integrated circuit manufacturing, semiconductor device packaging and other fields. The requirements for semiconductor-grade quartz plates are extremely high, requiring them to have ultra-high purity, low impurity content, good optical properties and thermal stability.

[0003] However, after the existing quartz sand is stirred, it is often necessary to control the pulling device separately to pull the stirred quartz sand out of the groove, so as to initially form a quartz sand plate. However, when the existing pulling device pulls the quartz sand, when it is hit by the quartz sand that is not completely melted, it is easy to fluctuate, resulting in uneven thickness of the pulled quartz sand plate.

[0004] In view of this, the present invention is proposed. Summary of the invention

[0005] In order to solve the above technical problems, the basic concept of the technical solution adopted by the present invention is: A production process for drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand, comprising the following steps: Step 1: Place quartz sand and auxiliary materials into the inner cavity of the installation shell; Step 2: By starting the transmission unit, the stirring rod can be driven to stir the placed quartz sand and auxiliary materials and heat the quartz sand and auxiliary materials at the same time; Step 3: At the same time, the transmission unit can drive the driving unit to operate, and when the transmission unit moves to a certain position, it can drive the driving plate to move, thereby squeezing the stirred quartz sand and auxiliary materials so that they can be squeezed out from the rectangular notch opened at the lower mold, thereby initially forming a quartz plate; The installation unit comprises an installation shell, a placement shell is fixedly installed on one side wall of the installation shell, a sliding door is arranged on the front side of the placement shell, a lower mold is arranged in the inner cavity of the placement shell, two mutually symmetrical support rods are fixedly installed at the bottom of the lower mold, the bottoms of the two support rods are fixedly connected to the bottom of the inner cavity of the installation shell, and a rectangular notch is opened on one side wall of the lower mold; The driving unit comprises a rotating disk, a circular notch is provided in the rotating disk, a second circular slide groove is provided on the side wall of the rotating disk, a guide slider is slidably installed in the inner cavity of the second circular slide groove, a fixing plate is fixedly installed above the guide slider, a movable rod is movably installed on one side wall of the fixing plate, a mounting plate is movably installed on the other end of the movable rod, a first guide rod is fixedly installed on both side walls of the mounting plate, a second guide rod is fixedly connected to the two side walls opposite to each other above the first guide rod, the two second guide rods are symmetrical to each other, a driving plate is fixedly connected to the one side wall opposite to the two second guide rods, and the driving plate is sealed and arranged in the inner cavity of the lower mold; The transmission unit comprises a driving assembly and a plurality of stirring rods. The driving assembly is used to drive the stirring rods to rotate. The driving assembly can also be used to drive the turntable to rotate.

[0006] As a preferred embodiment of the present invention, the driving assembly includes a servo motor, which is installed above the mounting shell, and a rotating rod is fixedly installed at the output end of the servo motor, and a driving gear is fixedly connected to the end of the rotating rod away from the servo motor, and a driven gear is meshingly installed on one side wall of the driving gear, and a rotating rod is fixedly passed through the middle of the driven gear, and the upper part of the rotating rod is rotatably connected to the upper part of the inner cavity of the mounting shell.

[0007] As a preferred embodiment of the present invention, a threaded rod is fixedly installed at the bottom of the rotating rod, a threaded sleeve is meshedly installed on the threaded rod, a circular through hole is opened in the middle of the rotating rod and the threaded rod, and a positioning rod is provided in the inner cavity of the circular through hole.

[0008] As a preferred embodiment of the present invention, the top end of the positioning rod is fixedly connected to the top of the inner cavity of the mounting shell, a connecting plate is fixedly installed at the bottom of the positioning rod, both ends of the connecting plate are fixedly connected to the first telescopic rod, and the top of the first telescopic rod is fixedly connected to the bottom of the threaded sleeve.

[0009] As a preferred embodiment of the present invention, a circular cylinder is fixedly installed at the bottom of the threaded sleeve, and a plurality of first circular slide grooves equidistantly distributed are opened on the side wall of the circular cylinder. Two symmetrical movable sliders are slidably installed in the inner cavity of each of the first circular slide grooves, and each of the movable sliders is fixedly connected to a stirring rod at one end away from the first circular slide groove, and a connecting rod is fixedly installed between each of the stirring rods, and a second telescopic rod is fixedly installed above the upper stirring rod.

[0010] As a preferred embodiment of the present invention, a fixing rod is fixedly installed above each of the two second telescopic rods, the two fixing rods are symmetrical to each other, and opposite ends of the two fixing rods are fixedly connected to the rotating rod.

[0011] As a preferred embodiment of the present invention, two opposite side walls of the two first telescopic rods are fixedly mounted with mounting rods, arc-shaped plates are fixedly mounted between two of the four mounting rods, and the two arc-shaped plates are symmetrical to each other.

[0012] As a preferred embodiment of the present invention, the inner cavities of the two rectangular tubes are both slidably provided with rectangular plug-in rods, the tops of the two rectangular plug-in rods are fixedly connected with return springs, the other ends of the two return springs are respectively fixedly connected to the tops of the inner cavities of the rectangular tubes, the bottom ends of the two rectangular plug-in rods are both fixedly connected with limit rods, and the bottoms of the two limit rods are fixedly connected with turntables.

[0013] As a preferred embodiment of the present invention, a first sliding mechanism is provided on one side wall of the guide slider, the first sliding mechanism includes a first sliding groove, the first sliding groove is opened on the inner wall of the mounting shell, a first slider is slidably installed in the inner cavity of the first sliding groove, and a side wall of the first slider away from the first sliding groove is fixedly connected to the guide slider.

[0014] As a preferred embodiment of the present invention, a second sliding mechanism is arranged on the opposite sides of the lower mold, and the second sliding mechanism includes two second sliding grooves, and the two second sliding grooves are respectively opened on the opposite side walls of the lower mold, and the two second sliding grooves are both slidably installed with second sliders in the inner cavities, and the two second sliders are respectively fixedly connected to the first guide rod on one side wall away from the second sliding groove.

[0015] Compared with the prior art, the present invention has the following beneficial effects: The present invention can control the stirring rod to rotate and move vertically downward through the circular shape of the transmission unit, so as to enter the lower mold to stir the placed quartz sand and materials. When the stirring is completed, the transmission unit is started in reverse so that the threaded sleeve in the transmission unit moves to a certain position. At this time, the driving plate can be moved horizontally in the lower mold through the cooperation of the transmission unit and the driving unit, so as to squeeze the stirred quartz sand and materials out from the rectangular groove, so as to preliminarily form a quartz plate. Moreover, through the second sliding mechanism in the starting unit, the horizontal movement can be always maintained.

[0016] The specific implementation modes of the present invention are further described in detail below in conjunction with the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In the attached picture: Figure 1 It is a three-dimensional structural schematic diagram of a production process for drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high-purity quartz sand; Figure 2 The cross-sectional structure schematic diagram is a production process for drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand; Figure 3 A production process for drawing semiconductor-grade quartz plates from ultra-high purity quartz sand using a continuous melting furnace Figure 2 The enlarged structural diagram at A in the middle; Figure 4 A schematic diagram of the inner cavity structure of an installation shell for a production process of drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand; Figure 5 A schematic diagram of the internal cavity of the installation shell of a production process for drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high-purity quartz sand; Figure 6 It is a schematic diagram of the partial structure of the transmission unit of a production process for drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high-purity quartz sand; Figure 7 A schematic diagram of the partial structure of a driving unit of a production process for drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand; Figure 8 The schematic diagram of the inner cavity structure of a rectangular tube is a production process for drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand.

[0018] In the figure: 100, installation unit; 101, installation housing; 1011, placement housing; 1012, sliding door; 102, lower mold; 1021, rectangular notch; 1022, support rod; 200, transmission unit; 201, servo motor; 2011, rotating rod; 2012, driving gear; 2013, driven gear; 202, rotating rod; 2021, threaded rod; 2022, threaded sleeve; 2023, circular through hole; 2024, positioning rod; 2025, connecting plate; 2026, first telescopic rod; 203, circular cylinder; 2031, first circular slide groove; 2032, moving slider; 2033, stirring rod; 2034, connecting rod; 204, second telescopic rod; 2041, fixing rod; 2042, mounting rod; 2043, arc plate; 2044, rectangular cylinder; 2045, limiting rod; 2046, rectangular plug rod; 2047, reset spring; 300, driving unit; 301, turntable; 3011, second circular slide groove; 3012, guide slider; 3013, first slide groove; 3014, first slider; 3015, circular notch; 302, fixed plate; 3021, movable rod; 3022, mounting plate; 3023, first guide rod; 3024, second slide groove; 3025, second slider; 3026, second guide rod; 303, driving plate. DETAILED DESCRIPTION

[0019] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. The following embodiments are used to illustrate the present invention.

[0020] Embodiment 1:

[0021] like Figures 1 to 8 As shown, a production process for drawing semiconductor-grade quartz plates using a continuous melting furnace with ultra-high purity quartz sand includes the following steps: Step 1: Place quartz sand and auxiliary materials into the inner cavity of the installation shell 101; Step 2: By starting the transmission unit 200, the stirring rod 2033 can be driven to stir the placed quartz sand and auxiliary materials and heat the quartz sand and auxiliary materials; Step 3: The transmission unit 200 can drive the driving unit 300 to operate at the same time, and when the transmission unit 200 moves to a certain position, it can drive the driving plate 303 to move, thereby squeezing the stirred quartz sand and auxiliary materials so that they can be squeezed out from the rectangular notch 1021 opened at the lower mold 102, thereby initially forming a quartz plate; The installation unit 100 includes an installation shell 101, a placement shell 1011 is fixedly installed on one side wall of the installation shell 101, a sliding door 1012 is arranged on the front side of the placement shell 1011, a lower mold 102 is arranged in the inner cavity of the placement shell 1011, two mutually symmetrical support rods 1022 are fixedly installed at the bottom of the lower mold 102, the bottoms of the two support rods 1022 are fixedly connected to the bottom of the inner cavity of the installation shell 101, and a rectangular notch 1021 is provided on one side wall of the lower mold 102; the driving unit 300 includes a turntable 301, a circular notch 3015 is provided in the turntable 301, a second circular slide groove 3011 is provided on the side wall of the turntable 301, a guide slider 3012 is slidably installed in the inner cavity of the second circular slide groove 3011, and the guide slider 3012 is on the guide slider 3012 A fixed plate 302 is fixedly installed on the side, a movable rod 3021 is movably installed on one side wall of the fixed plate 302, a mounting plate 3022 is movably installed on the other end of the movable rod 3021, first guide rods 3023 are fixedly installed on both side walls of the mounting plate 3022, second guide rods 3026 are fixedly connected to the two side walls opposite to each other above the first guide rod 3023, the two second guide rods 3026 are symmetrical to each other, and a driving plate 303 is fixedly connected to the side wall opposite to the two second guide rods 3026, and the driving plate 303 is sealed in the inner cavity of the lower mold 102; the transmission unit 200 includes a driving assembly and a plurality of stirring rods 2033, the driving assembly is used to drive the stirring rods 2033 to rotate, and the driving assembly can also be used to drive the turntable 301 to rotate. The circular shape of the transmission unit 200 can control the stirring rod 2033 to rotate and move vertically downward, so as to enter the lower mold 102 to stir the placed quartz sand and materials. When the stirring is completed, the transmission unit 200 is started in reverse so that the threaded sleeve 2022 in the transmission unit 200 moves to a certain position. At this time, the transmission unit 200 and the driving unit 300 can cooperate to allow the driving plate 303 to move horizontally in the lower mold 102, so as to squeeze the stirred quartz sand and materials out from the rectangular notch 1021, thereby initially forming a quartz plate.

[0022] like Figure 1 to Figure 2 and Figures 4 to 6 As shown, in a specific embodiment, the driving assembly includes a servo motor 201, which is installed above the mounting housing 101, and a rotating rod 2011 is fixedly installed at the output end of the servo motor 201, and a driving gear 2012 is fixedly connected to one end of the rotating rod 2011 away from the servo motor 201, and a driven gear 2013 is meshedly installed on one side wall of the driving gear 2012, and a rotating rod 202 is fixedly passed through the middle of the driven gear 2013, and the upper part of the rotating rod 202 is rotatably connected to the upper part of the inner cavity of the mounting housing 101. In this configuration, the installation position and components of the driving assembly are determined.

[0023] like Figure 2 and Figures 4 to 6As shown, further, a threaded rod 2021 is fixedly installed at the bottom of the rotating rod 202, a threaded sleeve 2022 is meshedly installed on the threaded rod 2021, and a circular through hole 2023 is opened between the rotating rod 202 and the threaded rod 2021, and a positioning rod 2024 is set in the inner cavity of the circular through hole 2023. In this configuration, the connection relationship between the threaded rod 2021 and the rotating rod 202 and the opening position of the circular through hole 2023 are missing.

[0024] like Figure 2 and Figures 4 to 7 As shown, further, the top of the positioning rod 2024 is fixedly connected to the upper part of the inner cavity of the installation housing 101, and a connecting plate 2025 is fixedly installed at the bottom of the positioning rod 2024. Both ends of the connecting plate 2025 are fixedly connected to the first telescopic rod 2026, and the upper part of the first telescopic rod 2026 is fixedly connected to the bottom of the threaded sleeve 2022. In this configuration, the connection relationship between the positioning rod, the first telescopic rod 2026 and the threaded sleeve 2022 is determined, so that the threaded sleeve 2022 can be ensured to move vertically downward.

[0025] Embodiment 2:

[0026] The difference between the above embodiment and this embodiment is that: Figure 2 and Figures 4 to 6 As shown, a production process for drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high-purity quartz sand, a circular cylinder 203 is fixedly installed at the bottom of the threaded sleeve 2022, and a plurality of first circular chutes 2031 are arranged at equal intervals on the side wall of the circular cylinder 203, and two mutually symmetrical movable sliders 2032 are slidably installed in the inner cavity of each first circular chutes 2031, and a stirring rod 2033 is fixedly connected to one end of each movable slider 2032 away from the first circular chutes 2031, and a connecting rod 2034 is fixedly installed between each stirring rod 2033, and a second telescopic rod 204 is fixedly installed above the upper stirring rod 2033. In this setting, the installation position and connection relationship of the stirring rod 2033 are determined.

[0027] like Figure 2 and Figures 4 to 6 As shown, in a specific embodiment, a fixed rod 2041 is fixedly installed above each of the two second telescopic rods 204, the two fixed rods 2041 are symmetrical to each other, and opposite ends of the two fixed rods 2041 are fixedly connected to the rotating rod 202. In this configuration, the installation position and connection relationship of the second telescopic rod 204 are determined, ensuring that when the rotating rod 202 rotates, the fixed rod 2041 can be driven to rotate, thereby driving the second telescopic rod 204 to rotate.

[0028] like Figure 2 and Figures 4 to 6As shown, further, the two opposite side walls of the two first telescopic rods 2026 are fixedly mounted with mounting rods 2042, and arc plates 2043 are fixedly mounted between the four mounting rods 2042, and the two arc plates 2043 are symmetrical to each other. In this configuration, the mounting position and components of the arc plates 2043 are determined.

[0029] like Figure 2 and Figures 4 to 8 As shown, further, the bottom of the two arc plates 2043 are fixedly connected to the rectangular tube 2044, the inner cavity of the two rectangular tubes 2044 are slidably provided with rectangular plug rods 2046, the upper part of the two rectangular plug rods 2046 are fixedly connected to the return spring 2047, the other ends of the two return springs 2047 are respectively fixedly connected to the upper part of the inner cavity of the rectangular tube 2044, the lower ends of the two rectangular plug rods 2046 are fixedly connected to the limit rod 2045, and the bottom of the two limit rods 2045 are fixedly connected to the turntable 301. In this setting, when the first slider 3014 is located at the bottom of the first slide groove 3013, the turntable 301 can only rotate and cannot move vertically downward. At this time, because the rectangular tube 2044 moves downward, but the rectangular plug rod 2046 is immobile, because the return spring 2047 can be squeezed by the rectangular tube 2044, thereby ensuring that the rectangular tube 2044 can move downward and rotate.

[0030] Embodiment 3:

[0031] The difference between the above embodiment and this embodiment is that: Figures 2 to 7 As shown, a production process for drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand, a first sliding mechanism is arranged on one side wall of a guide slider 3012, the first sliding mechanism comprises a first slide groove 3013, the first slide groove 3013 is arranged on the inner wall of the mounting housing 101, a first slider 3014 is slidably mounted in the inner cavity of the first slide groove 3013, and a side wall of the first slider 3014 away from the first slide groove 3013 is fixedly connected to the guide slider 3012. In this setting, the installation position and components of the first sliding mechanism are determined.

[0032] like Figure 2 and Figures 4 to 7 As shown, in a specific embodiment, the lower mold 102 is provided with a second sliding mechanism on two opposite sides, and the second sliding mechanism includes two second slide grooves 3024, which are respectively provided on two opposite side walls of the lower mold 102, and the inner cavities of the two second slide grooves 3024 are both slidably provided with second sliders 3025, and the two second sliders 3025 are respectively fixedly connected to the first guide rod 3023 away from one side wall of the second slide groove 3024. In this configuration, the installation position and components of the second sliding mechanism are determined.

[0033] The implementation principle of the production process of drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand in this embodiment is as follows: First, the staff opens the sliding door to place the quartz sand and auxiliary materials. When placing, the staff starts the servo motor 201, so that the servo motor 201 can run. When the servo motor 201 runs, it can drive the rotating rod 2011 to rotate. When the rotating rod 2011 rotates, it can drive the driving gear 2012 to rotate. When the driving gear 212 rotates, it can drive the driven gear 2013 to rotate. When the driven gear 2013 rotates, it can drive the rotating rod 202 to rotate. When the rotating rod 202 rotates, it can drive the threaded rod 2021 to rotate. When the threaded rod 2021 rotates, it can drive the threaded sleeve 2022 with the assistance of the first telescopic rod 2026, the connecting plate 2025 and the positioning rod 2024, so that the threaded sleeve 2022 can move vertically downward; When the threaded sleeve 2022 moves vertically downward, it will be able to drive the circular cylinder 203 to move vertically downward. When the circular cylinder 203 moves vertically downward, it will be able to drive the first circular slide groove 2031 and the movable slide block 2032 to move vertically downward. When the movable slide block 2032 moves downward, it will be able to drive the stirring rod 2033 to move vertically downward. When the stirring rod 2033 moves vertically downward, it will be able to drive the stirring rod 2033 to rotate through the second telescopic rod 204 and the fixed rod 2041 above (because the fixed rod 2041 and the rotating rod 202 are fixedly connected, so it can drive the fixed rod 2041 to rotate). Because the stirring rod 2033 is fixedly connected to the movable slide block 2032, the movable slide block 2032 can slide on the first circular slide groove 2031, so that the stirring rod 2033 can rotate and move vertically at the same time; When the second telescopic rod 204 moves and rotates, it can drive the installation rod 2042 to rotate and move downward, and when the installation rod 2042 rotates and moves, it can drive the arc plate 2043 to rotate and move, so that the rectangular tube 2044, the rectangular plug rod 2046 and the limit rod 2045 can be driven to rotate and move through the arc plate 2043. Therefore, the rotating disk 301 can be driven to rotate and move; When the threaded sleeve 2022 moves downward to a certain position, the rotating disk 301 can drive the guide slider 3012 to move vertically downward with the assistance of the first slide groove 3013 and the first slider 3014 through the rotation and vertical downward movement of the rotating disk 301. When the guide slider 3012 moves vertically downward, the movable rod 3021 can pull the mounting plate 3022 to drive the driving plate 303 to move horizontally with the assistance of the first guide rod 3023, the second guide rod 3026, the second slide groove 3024 and the second slider 3025, so that the driving plate 303 can be reset. When the driving plate 303 is reset, the quartz sand and auxiliary materials are placed on the lower mold 102, and the servo motor 201 is started, which is the above operation (wherein the first slider 3014 is located at the bottom of the first slide groove 3013, so that the turntable 301 can only rotate and cannot move vertically downward, and at this time, because the rectangular cylinder 2044 is moving downward, but the rectangular plug rod 2046 is stationary, because the rectangular cylinder 2044 can squeeze the reset spring 2047, thereby ensuring that the rectangular cylinder 2044 can move downward and rotate), the stirring rod 2033 can be used to move vertically downward. The servo motor 201 is in a moving and rotating state, so it can enter the inner cavity of the lower mold 102, thereby stirring the placed materials and quartz sand (wherein the inner cavity of the installation shell 101 has a heating component). When the stirring is completed, the servo motor 201 is started in reverse until the servo motor 201 drives the threaded sleeve 2022 back to the above-mentioned position for placing quartz sand and auxiliary materials. At this time, when the threaded sleeve 2022 continues to move upward, the driving plate 303 will be able to extrude the quartz plate raw material formed after heating and stirring in the lower mold 102. At this time, the raw material can be squeezed out from the rectangular notch 1021, thereby the quartz plate can be preliminarily formed.

Claims

1. A production process for drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand, characterized in that: The method comprises the following steps: Step 1: placing quartz sand and auxiliary materials into the inner cavity of the installation shell (101); Step 2: Starting the transmission unit (200) can drive the stirring rod (2033) to stir the placed quartz sand and auxiliary materials and heat the quartz sand and auxiliary materials; Step 3: The transmission unit (200) can drive the driving unit (300) to operate, and when the transmission unit (200) moves to a certain position, it can drive the driving plate (303) to move, thereby squeezing the stirred quartz sand and auxiliary materials so that they can be squeezed out from the rectangular notch (1021) opened at the lower mold (102), thereby initially forming a quartz plate; The installation unit (100) comprises an installation shell (101), a placement shell (1011) is fixedly installed on one side wall of the installation shell (101), a sliding door (1012) is arranged on the front side of the placement shell (1011), a lower mold (102) is arranged in the inner cavity of the placement shell (1011), two mutually symmetrical support rods (1022) are fixedly installed on the bottom of the lower mold (102), the bottoms of the two support rods (1022) are fixedly connected to the bottom of the inner cavity of the installation shell (101), and a rectangular notch (1021) is opened on one side wall of the lower mold (102); The driving unit (300) comprises a rotating disk (301), a circular notch (3015) is provided in the rotating disk (301), a second circular slide groove (3011) is provided on the side wall of the rotating disk (301), a guide slider (3012) is slidably mounted in the inner cavity of the second circular slide groove (3011), a fixed plate (302) is fixedly mounted above the guide slider (3012), a movable rod (3021) is movably mounted on a side wall of the fixed plate (302), and the movable rod (3021) is movably mounted on the inner wall of the fixed plate (302). 1) A mounting plate (3022) is movably mounted on the other end, first guide rods (3023) are fixedly mounted on both side walls of the mounting plate (3022), second guide rods (3026) are fixedly connected to the two side walls above the first guide rods (3023), the two second guide rods (3026) are symmetrical to each other, and a driving plate (303) is fixedly connected to the side walls opposite to the two second guide rods (3026), and the driving plate (303) is sealed and arranged in the inner cavity of the lower mold (102); The transmission unit (200) comprises a driving assembly and a plurality of stirring rods (2033); the driving assembly is used to drive the stirring rods (2033) to rotate; the driving assembly can also be used to drive the rotating disk (301) to rotate.

2. The production process of drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand according to claim 1, characterized in that: The driving assembly comprises a servo motor (201), the servo motor (201) being mounted above the mounting housing (101), a rotating rod (2011) being fixedly mounted on the output end of the servo motor (201), a driving gear (212) being fixedly connected to one end of the rotating rod (2011) away from the servo motor (201), a driven gear (213) being meshingly mounted on a side wall of the driving gear (2012), a rotating rod (202) being fixedly penetrated through the middle of the driven gear (2013), and the rotating rod (202) being rotatably connected to the upper part of the inner cavity of the mounting housing (101).

3. The production process of drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand according to claim 2, characterized in that: A threaded rod (2021) is fixedly mounted on the bottom of the rotating rod (202), a threaded sleeve (2022) is meshingly mounted on the threaded rod (2021), a circular through hole (2023) is provided between the rotating rod (202) and the threaded rod (2021), and a positioning rod (2024) is provided in the inner cavity of the circular through hole (2023).

4. The production process of drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand according to claim 3, characterized in that: The top end of the positioning rod (2024) is fixedly connected to the top of the inner cavity of the installation shell (101), and a connecting plate (2025) is fixedly installed on the bottom of the positioning rod (2024). Both ends of the connecting plate (2025) are fixedly connected to the first telescopic rod (2026), and the top of the first telescopic rod (2026) is fixedly connected to the bottom of the threaded sleeve (2022).

5. The production process of drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand according to claim 2, characterized in that: A circular cylinder (203) is also fixedly installed at the bottom of the threaded sleeve (2022), and a plurality of first circular slide grooves (2031) are provided on the side wall of the circular cylinder (203) and are evenly distributed. Two mutually symmetrical movable sliders (2032) are slidably installed in the inner cavity of each of the first circular slide grooves (2031), and a stirring rod (2033) is fixedly connected to one end of each movable slider (2032) away from the first circular slide groove (2031), and a connecting rod (2034) is fixedly installed between each of the stirring rods (2033), and a second telescopic rod (204) is fixedly installed above the upper stirring rod (2033).

6. The production process of drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand according to claim 5, characterized in that: A fixing rod (2041) is fixedly mounted above each of the two second telescopic rods (204); the two fixing rods (2041) are symmetrical to each other, and opposite ends of the two fixing rods (2041) are fixedly connected to the rotating rod (211).

7. The production process of drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand according to claim 4, characterized in that: Mounting rods (2042) are fixedly mounted on opposite side walls of the two first telescopic rods (2026), and arc-shaped plates (2043) are fixedly mounted between two of the four mounting rods (2042), and the two arc-shaped plates (2043) are symmetrical to each other.

8. The production process of drawing semiconductor-grade quartz plates using a continuous melting furnace using ultra-high purity quartz sand according to claim 7, characterized in that: The bottoms of the two arc-shaped plates (2043) are fixedly connected to a rectangular tube (2044); the inner cavities of the two rectangular tubes (2044) are slidably provided with rectangular plug rods (2046); the tops of the two rectangular plug rods (2046) are fixedly connected to return springs (2047); the other ends of the two return springs (2047) are respectively fixedly connected to the tops of the inner cavities of the rectangular tubes (2044); the bottoms of the two rectangular plug rods (2046) are fixedly connected to limit rods (2045); and the bottoms of the two limit rods (2045) are fixedly connected to a rotating disk (301).

9. The production process of drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand according to claim 1, characterized in that: A first sliding mechanism is provided on one side wall of the guide slider (3012), the first sliding mechanism comprising a first sliding groove (3013), the first sliding groove (3013) being opened on the inner wall of the mounting shell (101), a first slider (3014) being slidably mounted in the inner cavity of the first sliding groove (3013), and a side wall of the first slider (3014) away from the first sliding groove (3013) being fixedly connected to the guide slider (3012).

10. The production process of drawing semiconductor-grade quartz plates using a continuous melting furnace for ultra-high purity quartz sand according to claim 1, characterized in that: The lower mold (102) is provided with a second sliding mechanism on two opposite sides, and the second sliding mechanism includes two second sliding grooves (3024). The two second sliding grooves (3024) are respectively opened on the two opposite side walls of the lower mold (102), and the inner cavities of the two second sliding grooves (3024) are both slidably installed with second sliding blocks (3025). The two second sliding blocks (3025) are respectively fixedly connected to the first guide rod (3023) at one side wall away from the second sliding groove (3024).

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