Gas supply system and method for chemical vapor deposition

Abstract

The invention provides a gas supply system and method for chemical vapor deposition, the gas supply system comprises a shell, a material source container and a bubbling device are arranged in the shell, chemical source liquid is contained in the material source container, the material source container is connected with the bubbling device through a liquid supply pipe network, and the bubbling device is connected with the liquid supply pipe network. The bubbling device is communicated with the outside of the shell through an air supply pipe network; an external gas inlet pipe network, a carrier gas inlet pipe network and a cleaning gas inlet pipe network are further arranged in the shell, the external gas inlet pipe network is communicated with the material source container and used for providing pressurized gas, the carrier gas inlet pipe network is communicated with the bubbling device and used for providing carrier gas, and the cleaning gas inlet pipe network is communicated with the external gas inlet pipe network and the carrier gas inlet pipe network and used for providing cleaning gas. The device is small in size and easy to operate, the liquid supplementing amount of the chemical source liquid can be accurately controlled, and the continuity and stability of chemical source supply are guaranteed.

Description

Technical Field

[0001] The invention belongs to the technical field of thin film deposition, relates to chemical vapor deposition technology, and in particular to a gas supply system and method for chemical vapor deposition. Background Art

[0002] The chemical source liquid precursor is the main material of the chemical vapor deposition process and is also the core material of epitaxial growth. During the thin film growth process, the chemical source liquid precursor needs to be introduced into the reaction chamber through the gas channel of the chemical vapor deposition equipment to form a thin film layer that meets the requirements. The chemical source liquid required in the existing equipment is stored in a dedicated chemical source liquid storage room, which takes up a lot of space in the factory and is too expensive. In addition, the pipeline from the storage room to the chemical vapor deposition equipment is too long, and the process of introducing the chemical source liquid cannot be accurately controlled, which greatly interferes with the liquid level stability and temperature stability of the chemical source liquid. In addition, the chemical source bottle, as a storage container for the reaction source liquid, is small in size and cannot meet the needs of long-term continuous process. The time-consuming maintenance or replacement of a new source bottle reduces the process efficiency.

[0003] CN218631952U discloses a liquid replenishing system for semiconductor equipment, comprising a main liquid replenishing tank, an auxiliary liquid replenishing tank, a liquid passing valve and a liquid supply device; the main liquid replenishing tank and the auxiliary liquid replenishing tank are both used to contain cooling liquid; the main liquid replenishing tank, the auxiliary liquid replenishing tank and the liquid supply device are all connected to the liquid passing valve; when the main liquid replenishing tank is connected to the liquid supply device, the auxiliary liquid replenishing tank is isolated from the liquid supply device; when the auxiliary liquid replenishing tank is connected to the liquid supply device, the main liquid replenishing tank is isolated from the liquid supply device; the liquid passing valve is used to control the cooling liquid in the main liquid replenishing tank and the auxiliary liquid replenishing tank to pass into the liquid supply device; or the liquid passing valve is used to control the cooling liquid in the liquid supply device to pass into the main liquid replenishing tank and the auxiliary liquid replenishing tank; the liquid supply device participates in forming a cooling liquid passage for a number of semiconductor equipment, and is used to supply cooling liquid to the a number of semiconductor equipment.

[0004] CN115094385A discloses a coating device containing a liquid supply system, including a supply system and a vacuum evaporation machine, wherein the supply system includes a liquid storage bottle, which is used to store liquid raw materials. The liquid storage bottle is sealed inside, and has an air inlet pipe and a liquid outlet pipe on the top of the liquid storage bottle, the air inlet pipe is connected to a high-pressure gas source, the air inlet pipe is higher than the liquid level of the liquid raw material, and the liquid outlet pipe is submerged in the bottom of the liquid raw material; a first valve, which is connected to the liquid outlet pipe through a conveying pipeline; a filter, which is connected to the first valve through a conveying pipeline; a liquid mass flow meter, which is connected to the filter through a conveying pipeline; a gas-liquid separator, which is connected to the liquid mass flow meter through a conveying pipeline; a second valve, which is connected to the gas-liquid separator and the vacuum evaporation machine through a conveying pipeline; and a heating device, which is arranged on the conveying pipeline.

[0005] However, existing gas supply equipment still has problems such as poor stability of chemical source liquid, low gas replenishment efficiency, and complicated chemical source maintenance or replacement operations, which not only affects the continuity of chemical source supply, but also easily causes leakage and serious safety accidents. Summary of the invention

[0006] In view of the shortcomings of the prior art, the purpose of the present invention is to provide a gas supply system and method for chemical vapor deposition. The system occupies a small area, is simple to operate, and is convenient for replacing chemical source liquid, thereby ensuring the continuity and stability of the chemical source supply. It can also accurately control the replenishment amount of the chemical source liquid and eliminate the influence of the replenishment on the liquid level stability.

[0007] To achieve this object, the present invention adopts the following technical solutions:

[0008] In the first aspect, the present invention provides a gas supply system for chemical vapor deposition, the gas supply system comprising a shell, wherein a material source container and a bubbling device are arranged inside the shell, the material source container contains a chemical source liquid, the material source container is connected to the bubbling device via a liquid supply pipeline network, the bubbling device is connected to the outside of the shell via a gas supply pipeline network, the material source container and the bubbling device are respectively provided with a first weighing and metering component and a second weighing and metering component at the bottom, and the bubbling device is also provided with a liquid level detection component; the shell is also provided with an external air intake pipeline network, a carrier gas intake pipeline network and a cleaning air intake pipeline network, the external air intake pipeline network is connected to the material source container for providing pressurized gas, the carrier gas intake pipeline network is connected to the bubbling device for providing carrier gas, and the cleaning air intake pipeline network is respectively connected to the external air intake pipeline network and the carrier gas intake pipeline network for providing cleaning gas.

[0009] The present invention stores the chemical source liquid in a material source container, and places the material source container at the front end of the foaming device to convert the chemical source liquid into a reaction gas and supply it to an external device. When the amount of the chemical source liquid in the foaming device is insufficient, the chemical source liquid can be transported to the foaming device from the material source container in small amounts and multiple times, which can effectively control the supply speed and amount of the chemical source liquid, making the chemical source liquid in the foaming device more stable and controllable; when the amount of the chemical source liquid in the material source container is insufficient, the supply of the chemical source liquid can be continued by simply replacing the material source container, which can effectively shorten the maintenance time.

[0010] As a preferred technical solution of the present invention, a first box body and a second box body are arranged inside the shell, the material source container is located in the first box body, and the foaming device is located in the second box body.

[0011] The present invention reduces the space occupied by the system, reduces the operating cost, and alleviates the burden of the user on chemical source liquid replacement and liquid replenishment operations.

[0012] Preferably, a cooling device is provided outside the shell, and the cooling device is cyclically connected to the foaming device.

[0013] The cooling device of the present invention is used to control the operating temperature of the bubbling device, thereby ensuring the temperature uniformity during the bubbling operation and making the flow rate of the reaction gas more uniform.

[0014] Preferably, the shell is further provided with a first gas detection component, the first box body is provided with a second gas detection component, and the second box body is provided with a third gas detection component.

[0015] The present invention detects whether dangerous gas leaks in the shell, the first box body and the second box body, thereby realizing leak detection and troubleshooting of system operation and ensuring the safety of chemical source liquid supply.

[0016] Preferably, the volume of the material source container is 0.3 to 1.5 times the volume of the foaming device, for example, it can be 0.3 times, 0.33 times, 0.4 times, 0.5 times, 0.6 times, 0.8 times, 1 times, 1.1 times, 1.2 times, 1.3 times, 1.4 times or 1.5 times, but is not limited to the listed values, and other unlisted values ​​within this numerical range are also applicable.

[0017] In the present invention, when the volume of the material source container is too small, the number of times the material source container needs to be replaced increases, which may easily cause gas leakage and pose a safety hazard; when the volume of the material source container is too large, as its weight increases, the difficulty of replacing the material source container increases, thereby reducing work efficiency.

[0018] As a preferred technical solution of the present invention, the liquid supply network includes a liquid replenishment pipeline, one end of which extends into the material source container and is located below the liquid level of the chemical source liquid, and the other end of the liquid replenishment pipeline is connected to the bubbling device.

[0019] The liquid replenishing pipeline is provided with a first manual valve, a first pneumatic valve, a second pneumatic valve and a second manual valve in sequence along the flow direction of the chemical source liquid.

[0020] As a preferred technical solution of the present invention, the gas supply network includes a gas outlet main pipe, a gas supply branch pipe and a detection branch pipe. One end of the gas outlet main pipe extends into the bubbling device, and the other end is respectively connected to the gas supply branch pipe and the detection branch pipe. The ends of the gas supply branch pipe and the detection branch pipe away from the gas outlet main pipe are respectively and independently connected to the outside of the shell.

[0021] The gas outlet main pipe is provided with a third manual valve, the gas supply branch pipe is provided with a third pneumatic valve and a fourth manual valve in sequence along the gas flow direction, and the detection branch pipe is provided with a fifth manual valve.

[0022] The gas supply branch pipe of the present invention is used to provide reaction gas to the reaction zone of the chemical vapor deposition equipment outside the shell, and the detection branch pipe is used to transport the reaction gas to the detection equipment outside the shell for gas detection.

[0023] As a preferred technical solution of the present invention, the external air intake network includes a first air intake main pipe, one end of which extends into the material source container and is located above the liquid level of the chemical source liquid, and the other end is connected to the outside of the shell.

[0024] A sixth manual valve, a first filter, a fourth pneumatic valve, a first pressure regulating valve, a flow detection component, a first one-way valve, a fifth pneumatic valve and a seventh manual valve are sequentially arranged on the first intake main pipe along the flow direction of the pressurized gas.

[0025] Preferably, the pipe section of the first air intake main pipe located between the fifth pneumatic valve and the seventh manual valve is connected to the cleaning air intake pipe network.

[0026] As a preferred technical solution of the present invention, the carrier gas inlet pipe network includes a second inlet main pipe, one end of which extends into the bubbling device and the other end of which is connected to the outside of the shell.

[0027] An eighth manual valve, a second one-way valve, a second filter, a sixth pneumatic valve, a second pressure regulating valve, a first pressure detection assembly, a seventh pneumatic valve and a ninth manual valve are sequentially arranged on the second air inlet main pipe along the flow direction of the carrier gas.

[0028] Preferably, the pipe section of the second air intake main pipe located between the first pressure detection assembly and the seventh pneumatic valve is connected to the cleaning air intake network.

[0029] Preferably, a second pressure detection component is provided on the foaming device.

[0030] The present invention detects the gas pressure in the foaming device to prevent the danger of explosion caused by excessive pressure in the foaming device.

[0031] As a preferred technical solution of the present invention, the cleaning air intake network includes a cleaning main pipe, a first cleaning branch pipe and a second cleaning branch pipe. One end of the cleaning main pipe is connected to the outside of the shell, and the other end is respectively connected to the first cleaning branch pipe and the second cleaning branch pipe. The end of the first cleaning branch pipe away from the cleaning main pipe is respectively connected to the external air intake network and the liquid supply network, and the end of the second cleaning branch pipe away from the cleaning main pipe is connected to the carrier gas intake network.

[0032] Preferably, the tenth manual valve, the third filter, the eighth pneumatic valve and the third pressure regulating valve are sequentially arranged on the cleaning main pipe along the flow direction of the cleaning gas, the third one-way valve, the ninth pneumatic valve and the tenth pneumatic valve are sequentially arranged on the first cleaning branch pipe along the flow direction of the cleaning gas, and the fourth one-way valve and the eleventh pneumatic valve are sequentially arranged on the second cleaning branch pipe along the flow direction of the cleaning gas.

[0033] The cleaning air inlet pipe network in the present invention is used for pipe network cleaning operations when the chemical source liquid is replaced or replenished after the chemical vapor deposition equipment has completed work. At the same time, when the system detects that dangerous gas leaks in the shell, the first box or the second box, the cleaning gas can enter the shell through the cleaning main pipe to clean the corresponding pipe network.

[0034] As a preferred technical solution of the present invention, the shell is also provided with an air extraction pipeline, and the air extraction pipeline is externally connected to a vacuum extraction device.

[0035] Preferably, a temperature sensing component and a negative pressure detection component are also provided on the shell.

[0036] The present invention continuously evacuates the shell through an external vacuum pumping device, and when gas leakage occurs in the shell, the gas can also be extracted to the outside of the shell through the exhaust pipe and discharged after post-processing, thereby improving the safety of system operation.

[0037] As a preferred technical solution of the present invention, the material source container includes at least two fluid replenishment bottles arranged in parallel, and at least two of the fluid replenishment bottles are independently connected to the bubbling device, the external air intake network and the cleaning air intake network.

[0038] In a second aspect, the present invention provides a gas supply method for chemical vapor deposition, wherein the gas supply method adopts the gas supply system for chemical vapor deposition described in the first aspect, and the gas supply method includes a liquid replenishment process and a source replacement process.

[0039] The liquid replenishment process specifically includes: using an external air inlet network to introduce pressurized gas into a material source container, transporting the chemical source liquid to a bubbling device through a liquid supply network to form a reaction gas, and then transporting the reaction gas into a reaction area of ​​a chemical vapor deposition device through a gas supply network.

[0040] The source replacement process specifically includes: cutting off the delivery of the chemical source liquid, using the cleaning air intake network to introduce cleaning gas into the material source container for cleaning, after the cleaning is completed, disconnecting the connection between the material source container and the external air intake network, and then replacing the material source container.

[0041] The system refers to an equipment system, a device system or a production device.

[0042] Compared with the prior art, the present invention has the following beneficial effects:

[0043] The present invention provides a gas supply system and method for chemical vapor deposition. Through optimized design, a gas supply device and a pipeline network are integrated in a unified shell, which significantly reduces the system footprint; at the same time, a material source container containing a chemical source liquid is arranged at the front end of a bubbling device to ensure the stability of the liquid level in the bubbling device, thereby achieving gas supply continuity, and in combination with an external air intake pipeline network, a carrier gas intake pipeline network and a cleaning air intake pipeline network, the supply amount of the chemical source liquid can be accurately controlled, so that the replacement and replenishment operations of the chemical source liquid are simple and convenient, the maintenance time of the chemical source liquid is shortened, thereby reducing the cost of using the chemical source liquid and improving work efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0044] Figure 1 A schematic structural diagram of a gas supply system for chemical vapor deposition provided in Embodiment 1 of the present invention.

[0045] Figure 2 A schematic diagram of the structure of a liquid supply network and a gas supply network provided in Example 1 of the present invention.

[0046] Figure 3 A schematic diagram of the structure of an external air intake network provided in Example 1 of the present invention.

[0047] Figure 4 A schematic diagram of the structure of a carrier gas inlet network provided in Example 1 of the present invention.

[0048] Figure 5 A schematic structural diagram of a cleaning air intake network provided in Embodiment 1 of the present invention.

[0049] Among them, 100-shell; 101-first gas detection component; 102-temperature sensor component; 103-negative pressure detection component; 200-first box; 201-second gas detection component; 300-second box; 301-third gas detection component; 400-material source container; 500-bubbling device; 600-cooling device; 401-first weighing and metering component; 501-second weighing and metering component; 502-liquid level detection component.

[0050] 1-first air inlet main pipe; 2-liquid replenishment pipe; 3-first cleaning branch pipe; 4-cleaning main pipe; 5-second cleaning branch pipe; 6-air outlet main pipe; 7-air supply branch pipe; 8-detection branch pipe; 9-second air inlet main pipe; 10-air extraction pipe; 11-liquid inlet pipe; 12-liquid outlet pipe.

[0051] K1-first manual valve; K2-second manual valve; K3-third manual valve; K4-fourth manual valve; K5-fifth manual valve; K6-sixth manual valve; K7-seventh manual valve; K8-eighth manual valve; K9-ninth manual valve; K10-tenth manual valve; P1-first pneumatic valve; P2-second pneumatic valve; P3-third pneumatic valve; P4-fourth pneumatic valve; P5-fifth pneumatic valve; P6-sixth pneumatic valve; P7-seventh pneumatic valve; P8-eighth pneumatic valve; P9-ninth pneumatic valve; P10-tenth pneumatic valve; P11-eleventh pneumatic valve; S1-first diaphragm valve; S2-second diaphragm valve.

[0052] 11-first filter; 91-second filter; 41-third filter; 12-first one-way valve; 92-second one-way valve; 32-third one-way valve; 52-fourth one-way valve; 13-first pressure regulating valve; 93-second pressure regulating valve; 43-third pressure regulating valve; 14-flow detection component; 94-first pressure detection component; 95-second pressure detection component. DETAILED DESCRIPTION

[0053] It should be understood that, in the description of the present invention, the terms "center", "upper", "lower", "front", "back", "left", "right", "top", "bottom", "inside", "outside", etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", etc. are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", etc. may explicitly or implicitly include one or more of the features. In the description of the present invention, unless otherwise specified, "multiple" means two or more.

[0054] It should be noted that in the description of the present invention, unless otherwise clearly specified and limited, the terms "disposed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood by specific circumstances.

[0055] Those skilled in the art should understand that the present invention necessarily includes necessary pipelines, conventional valves and general pump equipment for realizing a complete process, but the above content does not belong to the main inventive point of the present invention. Those skilled in the art can add layouts on their own based on the process flow and equipment structure selection, and the present invention does not make special requirements and specific limitations on this.

[0056] The technical solution of the present invention is further described below with reference to the accompanying drawings and through specific implementation methods.

[0057] The chemical source liquid of traditional chemical vapor deposition equipment is stored in a special storage room. Since the delivery pipeline between the special storage room and the bubble generating device is long, it is easy to interfere with the liquid level stability and temperature stability of the chemical source liquid, resulting in uncontrollable supply of the chemical source liquid. In addition, the replacement and replenishment operations of the chemical source liquid are complicated, which is not conducive to the continuity of the chemical source liquid supply.

[0058] In a specific embodiment, the present invention provides a gas supply system for chemical vapor deposition, including a shell, wherein a material source container and a bubbling device are arranged inside the shell. The material source container contains a chemical source liquid, and the material source container is connected to the bubbling device through a liquid supply pipeline network, and is used to send the chemical source liquid into the bubbling device for bubbling treatment to form a reaction gas. The bubbling device is connected to the outside of the shell through a gas supply pipeline network, and is used to transport the reaction gas to the corresponding equipment outside the shell. A first weighing and metering component is arranged at the bottom of the material source container, which is used to weigh the material source container online. When insufficient weight is detected, the material source container is replaced to replenish the chemical source liquid to ensure sufficient supply of the chemical source liquid in the bubbling device. A second weighing and metering component is arranged at the bottom of the bubbling device, which is used to weigh the bubbling device online. When insufficient weight is detected, the chemical source liquid in the material source container is replenished into the bubbling device through the liquid supply pipeline network. The foaming device is also provided with a liquid level detection component for detecting the liquid level of the chemical source liquid in the foaming device. When the liquid level is detected to be insufficient, the chemical source liquid in the material source container is promptly replenished into the foaming device through the liquid supply network. The shell is also provided with an external air intake network, a carrier gas intake network and a cleaning air intake network. The external air intake network is connected to the material source container and is used to provide pressurized gas. By increasing the cavity pressure in the material source container, the chemical source liquid is squeezed into the liquid supply network pipe and then sent to the foaming device. The carrier gas intake network is connected to the foaming device and is used to provide carrier gas for foaming treatment to generate reaction gas. The cleaning air intake network is respectively connected to the external air intake network and the carrier gas intake network, and is used to provide cleaning gas for cleaning the network in the shell.

[0059] In some embodiments, the shell is also provided with an exhaust pipe, and the exhaust pipe is externally connected to a vacuum pumping device for continuously vacuuming the shell to maintain a negative pressure inside the shell. Dangerous gases in the shell can also be discharged through the exhaust pipe to improve operational safety.

[0060] Furthermore, the shell is also provided with a first gas detection component, a temperature sensor component and a negative pressure detection component. The first gas detection component is used to detect whether there is a dangerous gas leak in the shell. If a dangerous gas leak is detected, the valves on the dangerous gas pipelines in the shell are closed, and the valves on the cleaning air intake network are opened to clean the network in the shell. After the negative pressure in the shell completely extracts the dangerous gas, the dangerous gas pipeline is checked for leaks. The temperature sensor component is used to detect the temperature in the shell to prevent the dangerous gas in the shell from leaking and causing the temperature to be too high, thereby causing explosions, dangerous reactions and the like. The negative pressure detection component is used to detect the negative pressure in the shell. If the negative pressure in the shell is insufficient, the staff needs to check whether there is any crack or damage between the exhaust pipe and the shell, and run the system again when the negative pressure returns to normal.

[0061] In some embodiments, a first box and a second box are disposed inside the housing. The material source container is located in the first box, and the foaming device is located in the second box. Preferably, the volume of the material source container is 0.3 to 1.5 times the volume of the foaming device.

[0062] Furthermore, a second gas detection component is provided in the first box body to detect whether a gas leak occurs in the first box body. When the second gas detection component detects a dangerous gas leak, the valves on the dangerous gas pipelines in the first box body are closed, and the valves on the cleaning air intake network are opened to clean the network. After the dangerous gas is completely extracted by the negative pressure in the shell body, the dangerous gas pipelines are checked for leaks. A third gas detection component is provided in the second box body to detect whether a gas leak occurs in the second box body. When the third gas detection component detects a dangerous gas leak, the valves on the dangerous gas pipelines in the second box body are closed, and the valves on the cleaning air intake network are opened to clean the network. After the dangerous gas is completely extracted by the negative pressure in the shell body, the dangerous gas pipelines are checked for leaks.

[0063] In some embodiments, the material source container includes at least two rehydration bottles arranged in parallel, and at least two of the rehydration bottles are independently connected to the bubbling device, the external air intake network, and the cleaning air intake network. The present invention can set a plurality of parallel rehydration bottles as rehydration containers for chemical source liquids according to actual needs, and each rehydration bottle is equipped with an independent pipe network and valve group. The liquid supply network can be provided with a plurality of universal connectors and valve groups to independently connect the parallel rehydration bottles to the bubbling device. The external air intake network can be provided with a plurality of universal connectors and valve groups to independently inject pressurized gas into different rehydration bottles. The cleaning air intake network can also be provided with a plurality of universal connectors and valve groups to connect to a plurality of parallel rehydration bottles. When one of the refilling bottles is opened, the other refilling bottles are in a closed state. After the chemical source liquid in the opened refilling bottle is completely used up, the refilling bottle is closed and replaced and refilled, and any other refilling bottles are opened at the same time to continuously provide sufficient chemical source liquid to the foaming device, which greatly reduces the risk of operation stopping due to insufficient chemical source liquid in the foaming device and improves the practicability of the refilling bottles.

[0064] In some embodiments, a cooling device is provided on the outside of the shell, and the cooling device is circulatedly connected to the bubbling device to provide cooling water to the bubbling device, thereby controlling the temperature of the bubbling device. Specifically, the cooling device is circulatedly connected to the bubbling device through a liquid inlet pipe and a liquid outlet pipe, the inlet of the liquid inlet pipe is connected to the outlet end of the cooling device, the liquid inlet pipe passes through the shell and the second box body in sequence, and is connected to the water inlet end of the bubbling device; the inlet of the liquid outlet pipe is connected to the water outlet end of the bubbling device, the liquid outlet pipe passes through the second box body and the shell in sequence, and is connected to the inlet end of the cooling device. Furthermore, the first diaphragm valve and the second diaphragm valve are respectively provided on the liquid inlet pipe and the liquid outlet pipe to control the opening and closing of the cooling water. After the cooling water is set at a constant temperature by the cooling device, it passes through the liquid inlet pipe and the first diaphragm valve to the bubbling device, providing a uniform and stable temperature for the bubbling device; the temperature of the cooling water changes after passing through the bubbling device, and then it passes through the liquid outlet pipe and the second diaphragm valve to return to the cooling device to stabilize the temperature again; when the system is working, the first diaphragm valve and the second diaphragm valve must be opened at the same time to ensure the smooth flow of the liquid inlet pipe and the liquid outlet pipe.

[0065] It should also be noted that the cooling device of the present invention must include a chiller, necessary pipelines, conventional valves and general pump equipment for realizing a complete process. Those skilled in the art can add layouts on their own based on the process flow and equipment structure selection. The present invention does not make special requirements and specific limitations on this.

[0066] In some embodiments, the liquid supply network includes a liquid replenishment pipeline, one end of which extends into the material source container and is located below the liquid level of the chemical source liquid, and the other end of the liquid replenishment pipeline is connected to the foaming device and is located in the cavity above the liquid level of the chemical source liquid in the foaming device. The liquid replenishment pipeline is provided with a first manual valve, a first pneumatic valve, a second pneumatic valve and a second manual valve in sequence along the flow direction of the chemical source liquid. The first manual valve is provided on the pipe section of the liquid replenishment pipeline located inside the first box body, and the chemical source liquid enters the liquid replenishment pipeline through the first manual valve. When the material source container needs to be replaced, the first manual valve should be closed to disconnect the material source container from the liquid replenishment pipeline. The first pneumatic valve is provided on the pipe section of the liquid replenishment pipeline located outside the first box body, and is closed when the pipeline is cleaned, and opened again after the cleaning is completed. The second pneumatic valve is provided on the pipe section of the liquid replenishment pipeline located outside the second box body, and is used to switch the connection between the liquid replenishment pipeline and the foaming device. The second manual valve is arranged on the pipe section of the liquid replenishing pipe located inside the second box body. When the material source container needs to be replaced, the second manual valve is closed to disconnect the connection between the foaming device and the material source container.

[0067] In some embodiments, the gas supply network includes a gas outlet main pipe, a gas supply branch pipe and a detection branch pipe. The gas outlet main pipe serves as the main pipeline for transporting the reaction gas, one end of which passes through the second box and extends into the bubbling device, and the other end is connected to the gas supply branch pipe and the detection branch pipe respectively, and the ends of the gas supply branch pipe and the detection branch pipe away from the gas outlet main pipe are independently connected to the outside of the shell. The gas supply branch pipe is a branch pipe for the reaction gas to the reaction zone, and the detection branch pipe is a branch pipe for the reaction gas to the detection device. A third manual valve is provided on the gas outlet main pipe, which is provided on the pipe section of the gas outlet main pipe located inside the second box. The third manual valve is a safety manual valve, which is opened when the system is working to ensure that the reaction gas flows into the gas outlet main pipe, and is closed when the system stops running. The third pneumatic valve and the fourth manual valve are sequentially arranged on the gas supply branch pipe along the gas flow direction, which are used to control the opening and closing of the reaction gas into the reaction zone when the system is running. The fourth manual valve is opened before the system is operated to ensure smooth transportation of the reaction gas, and the fourth manual valve is closed when the system is shut down to ensure that the reaction gas does not flow. The detection branch pipe is provided with a fifth manual valve. When gas detection is required, the fifth manual valve is opened to collect gas, and when it is not required, the fifth manual valve is closed.

[0068] In some embodiments, the external air intake network includes a first air intake main pipe, one end of which passes through the first box, extends into the material source container, and is located above the liquid level of the chemical source liquid, and the other end is connected to the outside of the shell, and is used to connect the air supply pipeline or air supply source located outside the shell and providing pressurized gas, and deliver the pressurized gas to the cavity of the material source container, and increase the cavity pressure so that the chemical source liquid is injected into the bubbling device. The pressurized gas can be hydrogen commonly used in the art. The sixth manual valve 1, the first filter, the fourth pneumatic valve, the first pressure regulating valve, the flow detection component, the first check valve, the fifth pneumatic valve and the seventh manual valve are sequentially arranged on the first air intake main pipe along the flow direction of the pressurized gas. The sixth manual valve is a manual control valve of the first air intake main pipe, which can manually control the opening and closing of the first air intake main pipe. When the system is turned off, the sixth manual valve is manually closed to reduce the risk of gas leakage in the first air intake main pipe; when the system is running, the sixth manual valve is manually opened to allow the pressurized gas to enter the first air intake main pipe. The first filter is located after the sixth manual valve and is used to filter impurities in the pressurized gas to prevent impurities from mixing and contaminating subsequent pipelines, valve groups or chemical source liquids. The fourth pneumatic valve is located after the first filter and is used to control the opening and closing of the fluid replenishment work during the fluid replenishment process. The first pressure regulating valve is used to adjust the pressure of the pressurized gas to avoid the problem that the fluid replenishment amount is uncontrollable due to excessive air pressure, or the fluid replenishment speed is too slow due to too low air pressure. The flow detection component is used to adjust the gas flow entering the material source container, thereby accurately controlling the fluid replenishment amount. The first one-way valve can prevent the gas in the first air intake main pipe from flowing back when the fluid replenishment is stopped. Furthermore, the pipe section of the first air intake main pipe located between the fifth pneumatic valve and the seventh manual valve is connected to the cleaning air intake pipe network. The fifth pneumatic valve is set on the pipe section of the first air intake main pipe located outside the first box. When the pipe network is cleaned, the fifth pneumatic valve is closed, and when it is not necessary to clean, the fifth pneumatic valve is opened. The seventh manual valve is arranged on the pipe section of the first air inlet main pipe located inside the first box body. When the material source container needs to be replaced, the seventh manual valve should be closed to disconnect the material source container from the first air inlet main pipe.

[0069] In some embodiments, the carrier gas inlet network includes a second inlet main pipe, one end of which passes through the second housing and extends into the bubbling device, and the other end is connected to the outside of the housing, and is used to connect to a gas supply pipeline or a gas supply source located outside the housing and providing carrier gas, so as to deliver the carrier gas to the bubbling device. The carrier gas can be hydrogen commonly used in the art. The eighth manual valve, the second one-way valve, the second filter, the sixth pneumatic valve, the second pressure regulating valve, the first pressure detection component, the seventh pneumatic valve and the ninth manual valve are sequentially arranged on the second inlet main pipe along the flow direction of the carrier gas. The eighth manual valve is a manual control valve of the second inlet main pipe, which can manually control the opening and closing of the second inlet main pipe. When the system is turned off, the eighth manual valve is manually closed to reduce the risk of gas leakage in the second inlet main pipe; when the system is running, the eighth manual valve is manually opened to allow the external carrier gas to enter the second inlet main pipe. The second one-way valve is used to prevent the gas in the second inlet main pipe from flowing back. The second filter is used to filter impurities contained in the carrier gas to prevent impurities from mixing and contaminating subsequent pipelines, valve groups or chemical source liquids. The sixth pneumatic valve is used to switch the opening and closing of the second air inlet main pipe. The second pressure regulating valve is used to adjust the pressure of the carrier gas to prevent the amount of carrier gas from being uncontrollable due to excessive air pressure, or the speed of introducing carrier gas from being too slow due to too low air pressure. The first pressure detection component is used to detect the pressure of the carrier gas in the second air inlet main pipe. Furthermore, the pipe section of the second air inlet main pipe located between the first pressure detection component and the seventh pneumatic valve is connected to the cleaning air inlet network. The seventh pneumatic valve is arranged on the pipe section of the second air inlet main pipe located outside the second box body, and is used to switch the opening and closing of the cleaning gas. The ninth manual valve is arranged on the pipe section of the second air inlet main pipe located inside the second box body. When the system is shut down, the ninth manual valve is closed, and the foaming device can be disconnected from the second air inlet main pipe, thereby improving the operation safety.

[0070] Furthermore, the foaming device is provided with a second pressure detection component for detecting the air pressure in the foaming device to prevent the risk of explosion due to excessive pressure.

[0071] In some embodiments, the cleaning air intake network includes a cleaning main pipe, a first cleaning branch pipe and a second cleaning branch pipe. One end of the cleaning main pipe is connected to the outside of the shell, and is used to connect the gas supply pipeline or gas supply source located outside the shell and providing cleaning gas. The other end of the cleaning main pipe is connected to the first cleaning branch pipe and the second cleaning branch pipe respectively. The end of the first cleaning branch pipe away from the cleaning main pipe is connected to the external air intake pipe network and the liquid supply pipe network respectively, and the end of the second cleaning branch pipe away from the cleaning main pipe is connected to the carrier gas intake pipe network, which can realize the cleaning treatment of the pipe network when the material source container is replaced. The cleaning main pipe is provided with a tenth manual valve, a third filter, an eighth pneumatic valve and a third pressure regulating valve in sequence along the flow direction of the cleaning gas. The tenth manual valve is closed when the system is working to prevent the cleaning gas from entering the pipeline and affecting the reaction gas of the bubbling device. The tenth manual valve is opened when cleaning is required. The third filter is used to filter impurities brought from the outside by the cleaning gas to prevent impurities from mixing into the subsequent pipeline, valve group or chemical source liquid. The eighth pneumatic valve is used to switch the opening and closing of the cleaning gas during the cleaning process. The third pressure regulating valve is used to adjust the pressure of the cleaning gas to avoid damage to the interface due to excessive pressure in the cleaning main pipe.

[0072] The end of the first cleaning branch pipe away from the cleaning main pipe is connected to the first air intake main pipe and the liquid replenishment pipe respectively. The third one-way valve, the ninth pneumatic valve and the tenth pneumatic valve are arranged on the first cleaning branch pipe in sequence along the flow direction of the cleaning gas. Specifically, the outlet of the first cleaning branch pipe is connected to the pipe section of the first air intake main pipe between the fifth pneumatic valve and the seventh manual valve. The pipe section of the first cleaning branch pipe between the ninth pneumatic valve and the tenth pneumatic valve is connected to the pipe section of the liquid replenishment pipe between the first manual valve and the first pneumatic valve. The third one-way valve can prevent the residual gas in the first air intake main pipe from flowing back after the ninth pneumatic valve is opened. The ninth pneumatic valve is used to switch the opening and closing of the cleaning gas entering the first air intake main pipe and the liquid replenishment pipe during cleaning. The tenth pneumatic valve is used to switch the opening and closing of the cleaning gas entering the first air intake main pipe during cleaning.

[0073] The second cleaning branch pipe is provided with a fourth one-way valve and an eleventh pneumatic valve in sequence along the flow direction of the cleaning gas. Specifically, the outlet of the second cleaning branch pipe is connected to the pipe section of the second air intake main pipe between the first pressure detection component and the seventh pneumatic valve. The fourth one-way valve can prevent the residual carrier gas in the second air intake main pipe from flowing back after the eleventh pneumatic valve is opened. The eleventh pneumatic valve is used to switch the opening and closing of the cleaning gas entering the second air intake main pipe during cleaning.

[0074] When the gas supply system provided by the present invention is in operation, the first manual valve, the second manual valve, the third manual valve, the fourth manual valve, the sixth manual valve, the seventh manual valve, the eighth manual valve and the ninth manual valve need to be opened. When liquid replenishment is required, the first pneumatic valve, the second pneumatic valve, the fourth pneumatic valve and the fifth pneumatic valve are opened, and the pressurized gas is injected into the first air inlet main pipe, and enters the material source container after pressure and flow control by the first pressure regulating valve and the flow detection component, so as to force the chemical source liquid into the bubbler. The carrier gas is injected into the shell through the second air inlet main pipe, and the sixth pneumatic valve and the seventh pneumatic valve are opened. The carrier gas enters the bubbler after pressure control by the second pressure regulating valve, and is mixed with the chemical source liquid to form a reaction gas in a gas-liquid mixture state, and then the third pneumatic valve is opened to transport the reaction gas to the reaction area of ​​the chemical vapor deposition equipment.

[0075] When the gas supply system provided by the present invention needs to replace the material source container, it is necessary to close the sixth manual valve, the fourth manual valve, the eighth manual valve, the first manual valve, the second manual valve, the third manual valve, the ninth manual valve and the seventh manual valve, and then open the tenth manual valve, the first manual valve and the seventh manual valve. After using the cleaning gas to clean the first air intake main pipe and the liquid replenishing pipe, close the seventh manual valve and the first manual valve again, disconnect the material source container from the first air intake main pipe and the liquid replenishing pipe respectively, and then replace the material source container.

[0076] It should be noted that the gas supply system of the present invention is also provided with necessary connecting pipelines and switch control valves. The present invention does not make special limitations on this. Technical personnel in this field need to reasonably adjust, add or delete according to actual production needs. It should be clear that new technical solutions generated by deleting some unnecessary connecting pipelines and switch control valves, or replacing single-function switch control valves with multi-function integrated control valves, or using an automatic control system in which an external device is electrically connected to the switch control valve to control the opening of the corresponding valve, etc., which are common and well-known conventional technical means for technical personnel in this field, also fall within the scope of disclosure and protection of the present invention.

[0077] In another specific embodiment, the present invention provides a gas supply method for chemical vapor deposition, the gas supply method adopts the gas supply system for chemical vapor deposition described in a specific embodiment, and the gas supply method includes a liquid replenishment process and a source replacement process.

[0078] The liquid replenishment process specifically includes: using an external air inlet network to introduce pressurized gas into a material source container, transporting the chemical source liquid to a bubbling device through a liquid supply network to form a reaction gas, and then transporting the reaction gas into a reaction area of ​​a chemical vapor deposition device through a gas supply network.

[0079] The source replacement process specifically includes: cutting off the delivery of the chemical source liquid, using the cleaning air intake network to introduce cleaning gas into the material source container for cleaning, after the cleaning is completed, disconnecting the connection between the material source container and the external air intake network, and then replacing the material source container.

[0080] Example 1

[0081] This embodiment provides a gas supply system for chemical vapor deposition, such as Figure 1 As shown, the housing 100 includes a first box 200 and a second box 300. A material source container 400 is disposed in the first box 200, and a chemical source liquid is contained in the material source container 400. A first weighing and metering component 401 is disposed at the bottom of the material source container 400. A bubbling device 500 is disposed in the second box 300, and a second weighing and metering component 501 is disposed at the bottom of the bubbling device 500, and a liquid level detection component 502 and a second pressure detection component 95 are also disposed in the bubbling device 500. The volume of the material source container 400 is 0.5 times the volume of the bubbling device 500.

[0082] like Figure 1 and Figure 2 As shown, the shell 100 is provided with an exhaust pipe 10, and the exhaust pipe 10 is externally connected to a vacuum pumping device for continuous vacuuming. The shell 100 is also provided with a first gas detection component 101, a temperature sensor component 102 and a negative pressure detection component 103, which are respectively used to detect the leakage of dangerous gases, temperature and negative pressure in the shell 100. The first box 200 is provided with a second gas detection component 201, which is used to detect the leakage of dangerous gases in the first box 200. The second box 300 is provided with a third gas detection component 301, which is used to detect the leakage of dangerous gases in the second box 300. As shown Figure 2As shown, the material source container 400 is connected to the bubbling device 500 through the liquid supply network. The liquid supply network includes a liquid replenishment pipeline 2, one end of which penetrates the first box 200 and then extends into the material source container 400, and is located below the liquid level of the chemical source liquid. The other end of the liquid replenishment pipeline 2 penetrates the second box 300 and extends into the bubbling device 500, and is used to transport the chemical source liquid to the bubbling device 500. The first manual valve K1, the first pneumatic valve P1, the second pneumatic valve P2 and the second manual valve K2 are sequentially arranged on the liquid replenishment pipeline 2 along the flow direction of the chemical source liquid. The bubbling device 500 is connected to the outside of the housing 100 through the air supply network. The air supply network includes an air outlet main pipe 6, an air supply branch pipe 7 and a detection branch pipe 8. One end of the air outlet main pipe 6 penetrates the second box 300 and extends into the bubbling device 500, and the other end of the air outlet main pipe 6 is connected to the air supply branch pipe 7 and the detection branch pipe 8 respectively. One end of the gas supply branch pipe 7 away from the gas outlet main pipe 6 is connected to the outside of the shell 100, and is used to connect to the reaction zone of the chemical vapor deposition equipment. One end of the detection branch pipe 8 away from the gas outlet main pipe 6 is connected to the outside of the shell 100, and is used to connect to the detection equipment. The gas outlet main pipe 6 is provided with a third manual valve K3, and the third manual valve K3 is arranged on the pipe section of the gas outlet main pipe 6 located inside the second box body 300. The third pneumatic valve P3 and the fourth manual valve K4 are sequentially arranged on the gas supply branch pipe 7 along the flow direction of the reaction gas. The detection branch pipe 8 is provided with a fifth manual valve K5. Figure 1 As shown, a cooling device 600 is also provided outside the housing 100, and the cooling device 600 is cyclically connected to the bubbling device 500 through a liquid inlet pipe 11 and a liquid outlet pipe 12, and a first diaphragm valve S1 and a second diaphragm valve S2 are respectively provided on the liquid inlet pipe 11 and the liquid outlet pipe 12.

[0083] The housing 100 is also provided with an external air intake network, a carrier air intake network and a cleaning air intake network. Figure 3 As shown, the external air intake network includes a first air intake main pipe 1. One end of the first air intake main pipe 1 penetrates through the first box body 200 and extends into the material source container 400, and is located above the level of the chemical source liquid. The other end of the first air intake main pipe 1 is connected to the outside of the shell 100, and is used to connect to a gas supply source that provides pressurized gas to inject pressurized gas, which may be hydrogen, into the material source container 400. The first air intake main pipe 1 is provided with a sixth manual valve K6, a first filter 11, a fourth pneumatic valve P4, a first pressure regulating valve 13, a flow detection component 14, a first non-return valve 12, a fifth pneumatic valve P5 and a seventh manual valve K7 in sequence along the flow direction of the pressurized gas. Figure 4As shown, the carrier gas intake network includes a second intake main pipe 9, one end of which passes through the second housing 300 and extends below the level of the chemical source liquid in the bubbling device 500. The other end of the second intake main pipe 9 is connected to the outside of the housing 100 and is used to connect to a gas supply source for providing carrier gas so as to inject the carrier gas, which may be hydrogen, into the bubbling device 500. An eighth manual valve K8, a second one-way valve 92, a second filter 91, a sixth pneumatic valve P6, a second pressure regulating valve 93, a first pressure detection assembly 94, a seventh pneumatic valve P7 and a ninth manual valve K9 are sequentially arranged on the second intake main pipe 9 along the flow direction of the carrier gas. Figure 5 As shown, the cleaning air intake network includes a cleaning main pipe 4, a first cleaning branch pipe 3 and a second cleaning branch pipe 5. One end of the cleaning main pipe 4 is connected to the outside of the housing 100, and is used to connect to the gas supply source for providing cleaning gas, and the other end of the cleaning main pipe 4 is connected to the first cleaning branch pipe 3 and the second cleaning branch pipe 5 respectively. The end of the first cleaning branch pipe 3 away from the cleaning main pipe 4 is connected to the first air intake main pipe 1 and the liquid replenishment pipeline 2 respectively, and the end of the second cleaning branch pipe 5 away from the cleaning main pipe 4 is connected to the second air intake main pipe 9. The cleaning main pipe 4 is provided with a tenth manual valve K10, a third filter 41, an eighth pneumatic valve P8 and a third pressure regulating valve 43 in sequence along the flow direction of the cleaning gas. The first cleaning branch pipe 3 is provided with a third one-way valve 32, a ninth pneumatic valve P9 and a tenth pneumatic valve P10 in sequence along the flow direction of the cleaning gas. The outlet of the first cleaning branch pipe 3 is connected to the pipe section of the first air intake main pipe 1 between the fifth pneumatic valve P5 and the seventh manual valve K7. The pipe section of the first cleaning branch pipe 3 between the ninth pneumatic valve P9 and the tenth pneumatic valve P10 is connected to the pipe section of the liquid replenishing pipeline 2 between the first manual valve K1 and the first pneumatic valve P1. The fourth check valve 52 and the eleventh pneumatic valve P11 are sequentially arranged on the second cleaning branch pipe 5 along the flow direction of the cleaning gas, and the outlet of the second cleaning branch pipe 5 is connected to the pipe section of the second air intake main pipe 9 between the first pressure detection component 94 and the seventh pneumatic valve P7.

[0084] During the operation of the gas supply system of this embodiment, the first manual valve K1, the second manual valve K2, the third manual valve K3, the fourth manual valve K4, the sixth manual valve K6, the seventh manual valve K7, the eighth manual valve K8 and the ninth manual valve K9 need to be opened. When liquid replenishment is required, the first pneumatic valve P1, the second pneumatic valve P2, the fourth pneumatic valve P4 and the fifth pneumatic valve P5 are opened, and the remaining pneumatic valves are ensured to be in a closed state, and the pressurized gas is injected into the first air intake main pipe 1, and enters the material source container 400 after pressure and flow control by the first pressure regulating valve 13 and the flow detection component 14, so as to inject the chemical source liquid into the bubbling device 500. After the liquid replenishment is completed, the carrier gas is injected into the housing 100 through the second air intake main pipe 9, and the sixth pneumatic valve P6 and the seventh pneumatic valve P7 are opened. The carrier gas enters the bubbling device 500 after pressure control by the second pressure regulating valve 93, and mixes with the chemical source liquid to form a reaction gas in a gas-liquid mixture state. Then, the third pneumatic valve P3 is opened to deliver the reaction gas to the reaction area of ​​the chemical vapor deposition equipment.

[0085] When the gas supply system of this embodiment needs to replace the material source container 400, the first manual valve K1, the second manual valve K2, the third manual valve K3, the fourth manual valve K4, the sixth manual valve K6, the seventh manual valve K7, the eighth manual valve K8 and the ninth manual valve K9 need to be closed first to keep the system in a stagnant state. Then, the first manual valve K1, the seventh manual valve K7 and the tenth manual valve K10 are opened, and after the first air intake main pipe 1 and the liquid replenishing pipe 2 are cleaned with cleaning gas, the first manual valve K1 and the seventh manual valve K7 are closed again, and the material source container 400 is disconnected from the first air intake main pipe 1 and the liquid replenishing pipe 2 respectively, and the material source container 400 can be replaced.

[0086] Example 2

[0087] This embodiment provides a gas supply system for chemical vapor deposition, which differs from Embodiment 1 in that: the material source container includes a plurality of replenishment bottles arranged in parallel as replenishment containers for the chemical source liquid, and each replenishment bottle is equipped with an independent pipe network and valve group to independently connect the bubbling device, the external air intake pipe network and the cleaning air intake pipe network, and the rest of the structure is the same as Embodiment 1.

[0088] During the application of this embodiment, when one of the rehydration bottles is opened, the other rehydration bottles are in a closed state. After the chemical source liquid in the rehydration bottle to be opened is completely used up, the rehydration bottle is closed and replaced and refilled, and any other rehydration bottle is opened at the same time to continuously provide sufficient chemical source liquid to the foaming device, thereby greatly reducing the risk of operation stopping due to insufficient chemical source liquid in the foaming device.

[0089] The applicant declares that the above is only a specific implementation mode of the present invention, but the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily thought of by those skilled in the art within the technical scope disclosed by the present invention shall fall within the protection scope and disclosure scope of the present invention.

Claims

1. A gas supply system for chemical vapor deposition, characterized in that: The gas supply system comprises a shell, a material source container and a bubbling device are arranged inside the shell, the material source container contains a chemical source liquid, the material source container is connected to the bubbling device through a liquid supply pipe network, the bubbling device is connected to the outside of the shell through the gas supply pipe network, the bottom of the material source container and the bubbling device are respectively provided with a first weighing and metering component and a second weighing and metering component, and the bubbling device is also provided with a liquid level detection component; The shell is also provided with an external air intake network, a carrier gas intake network and a cleaning air intake network. The external air intake network is connected to the material source container for providing pressurized gas, the carrier gas intake network is connected to the bubbling device for providing carrier gas, and the cleaning air intake network is respectively connected to the external air intake network and the carrier gas intake network for providing cleaning gas.

2. The gas supply system for chemical vapor deposition according to claim 1, characterized in that: A first box body and a second box body are arranged inside the housing, the material source container is located in the first box body, and the foaming device is located in the second box body; Preferably, a cooling device is provided outside the housing, and the cooling device is cyclically connected to the foaming device; Preferably, the housing is further provided with a first gas detection component, the first box body is provided with a second gas detection component, and the second box body is provided with a third gas detection component; Preferably, the volume of the material source container is 0.3 to 1.5 times the volume of the foaming device.

3. The gas supply system for chemical vapor deposition according to claim 1, characterized in that: The liquid supply network includes a liquid replenishing pipeline, one end of which extends into the material source container and is located below the liquid level of the chemical source liquid, and the other end of which is connected to the bubbling device; The liquid replenishing pipeline is provided with a first manual valve, a first pneumatic valve, a second pneumatic valve and a second manual valve in sequence along the flow direction of the chemical source liquid.

4. The gas supply system for chemical vapor deposition according to claim 1, characterized in that: The gas supply network includes a gas outlet main pipe, a gas supply branch pipe and a detection branch pipe, one end of the gas outlet main pipe extends into the bubbling device, and the other end is connected to the gas supply branch pipe and the detection branch pipe respectively, and the ends of the gas supply branch pipe and the detection branch pipe away from the gas outlet main pipe are independently connected to the outside of the shell; The gas outlet main pipe is provided with a third manual valve, the gas supply branch pipe is provided with a third pneumatic valve and a fourth manual valve in sequence along the gas flow direction, and the detection branch pipe is provided with a fifth manual valve.

5. The gas supply system for chemical vapor deposition according to claim 1, characterized in that: The external air intake network includes a first air intake main pipe, one end of which extends into the material source container and is located above the level of the chemical source liquid, and the other end of which is connected to the outside of the shell; The first air intake main pipe is provided with a sixth manual valve, a first filter, a fourth pneumatic valve, a first pressure regulating valve, a flow detection component, a first non-return valve, a fifth pneumatic valve and a seventh manual valve in sequence along the flow direction of the pressurized gas; Preferably, the pipe section of the first air intake main pipe located between the fifth pneumatic valve and the seventh manual valve is connected to the cleaning air intake pipe network.

6. The gas supply system for chemical vapor deposition according to claim 5, characterized in that: The carrier gas inlet pipe network includes a second inlet main pipe, one end of which extends into the bubbling device and the other end of which is connected to the outside of the shell; An eighth manual valve, a second one-way valve, a second filter, a sixth pneumatic valve, a second pressure regulating valve, a first pressure detection assembly, a seventh pneumatic valve and a ninth manual valve are sequentially arranged on the second air inlet main pipe along the flow direction of the carrier gas; Preferably, the pipe section of the second air intake main pipe located between the first pressure detection assembly and the seventh pneumatic valve is connected to the cleaning air intake pipe network; Preferably, a second pressure detection component is provided on the foaming device.

7. The gas supply system for chemical vapor deposition according to claim 6, characterized in that: The cleaning air intake network includes a cleaning main pipe, a first cleaning branch pipe and a second cleaning branch pipe, one end of the cleaning main pipe is connected to the outside of the shell, and the other end is respectively connected to the first cleaning branch pipe and the second cleaning branch pipe, one end of the first cleaning branch pipe away from the cleaning main pipe is respectively connected to the external air intake network and the liquid supply network, and one end of the second cleaning branch pipe away from the cleaning main pipe is connected to the carrier gas intake network; Preferably, the tenth manual valve, the third filter, the eighth pneumatic valve and the third pressure regulating valve are sequentially arranged on the cleaning main pipe along the flow direction of the cleaning gas, the third one-way valve, the ninth pneumatic valve and the tenth pneumatic valve are sequentially arranged on the first cleaning branch pipe along the flow direction of the cleaning gas, and the fourth one-way valve and the eleventh pneumatic valve are sequentially arranged on the second cleaning branch pipe along the flow direction of the cleaning gas.

8. The gas supply system for chemical vapor deposition according to claim 1, characterized in that: The housing is also provided with an air extraction pipeline, and the air extraction pipeline is externally connected to a vacuum extraction device; Preferably, a temperature sensing component and a negative pressure detection component are also provided on the shell.

9. The gas supply system for chemical vapor deposition according to claim 1, characterized in that: The material source container includes at least two liquid replenishing bottles arranged in parallel, and the at least two liquid replenishing bottles are independently connected to the foaming device, the external air intake pipe network and the cleaning air intake pipe network.

10. A gas supply method for chemical vapor deposition, characterized in that: The gas supply method adopts the gas supply system for chemical vapor deposition according to any one of claims 1 to 9, and the gas supply method includes a liquid replenishment process and a source replacement process; The liquid replenishment process specifically includes: using an external air inlet network to introduce pressurized gas into a material source container, transporting the chemical source liquid to a bubbling device through a liquid supply network to form a reaction gas, and then transporting the reaction gas to a reaction zone of a chemical vapor deposition device through a gas supply network; The source replacement process specifically includes: cutting off the delivery of the chemical source liquid, using the cleaning air intake network to introduce cleaning gas into the material source container for cleaning, after the cleaning is completed, disconnecting the connection between the material source container and the external air intake network, and then replacing the material source container.

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