A jet structure with optical access and a jet system

Abstract

This invention discloses a jet structure and jet system with an optical access channel, including an air inlet connector and a gas nozzle, wherein the air inlet connector and the gas nozzle are interconnected; the gas nozzle has an optical access channel, a central air inlet path, and an edge air inlet path, the optical access channel being located at the center of the gas nozzle and extending vertically downward, the central air inlet path including a central gas equalization structure and a central air inlet hole connecting to the central gas equalization structure, and the edge air inlet path including an edge gas equalization hole and an edge air inlet hole connecting to the edge gas equalization hole; a sealing element is provided between the air inlet connector and the gas nozzle to independently seal the optical access channel, the central air inlet path, and the edge air inlet path. This air inlet structure can independently control either of the two air inlets, thereby effectively controlling the uniformity of the air inlet, adjusting the air inlet ratio, reducing the risk of arc discharge, and reducing gas deposition and particle generation.

Description

Technical Field

[0001] This invention relates to the field of semiconductor technology, and more particularly to process gas jetting structures in semiconductor processing equipment such as plasma processing chambers. This invention also relates to jetting systems incorporating the aforementioned jetting structures. Background Technology

[0002] Plasma processing chambers are used when etching and depositing materials onto wafers. In practice, process gas nozzles are typically installed through the opening in the dielectric window at the top of the plasma processing chamber. The central hole on the upper surface of the plasma processing chamber mates with the gas nozzles to inject process gas into the interior of the chamber. Therefore, the nozzle's inlet structure has a significant impact on ensuring the uniformity of etching and deposition.

[0003] In etching equipment, most nozzles employ a dual-inlet system, with one intake path at the center and the other at the edge. To ensure uniform airflow and prevent arcing that could cause wafer defects, most nozzles have separate intake paths at the center and the edge to achieve a uniform airflow.

[0004] For example, some nozzles eliminate the central air inlet, using it as an optical access channel to allow light to enter and exit the process chamber. This type of nozzle, with its bowl-shaped gas distribution structure in the center, poses a risk of arc discharge.

[0005] Other nozzles have an optical access channel in the middle that does not allow gas to pass through, and the edges have two air intakes: one at the edge center and one at the edge periphery. The middle part does not allow gas to enter, and the optical access channel in the middle does not allow gas to pass through, which makes it easy for deposits to accumulate and cannot be cleaned, resulting in particulate contamination.

[0006] Some nozzles also feature dual-path air inlets at the edges and an inner cavity with an optical access path. This inner cavity has an access area configured to flow process gas and transmit an optical access signal with the desired signal-to-noise ratio. A diaphragm housed within the inner cavity divides the access area into at least two independent through-holes, each extending parallel to the optical path pointing towards the optical access window. Each of these two through-holes is configured to cooperate with the other through-holes to flow the process gas and transmit the desired optical access signal through the optical access window, resulting in an exceptionally complex structure.

[0007] It is evident that in related technologies, the air intake structure of the nozzle is always a two-way air intake, namely, central air intake and edge air intake or edge-center air intake and edge-peripheral air intake. The performance in terms of air intake uniformity and air distribution regulation is very limited, which will have an adverse effect on the uniformity of etching and deposition. Summary of the Invention

[0008] The purpose of this invention is to provide a jet structure with an optical access channel. This jet structure can not only effectively monitor the conditions inside the process chamber through the optical access channel, but also effectively control the uniformity of the intake air, reduce the risk of arc discharge, and reduce gas deposition and particle generation.

[0009] The purpose of this invention is to provide a jet system having the aforementioned jet structure with an optical access channel.

[0010] To achieve the above objectives, the present invention provides a jet structure with an optical access channel, comprising an air inlet connector and a gas nozzle, wherein the air inlet connector is connected to the gas nozzle; the gas nozzle is provided with an optical access channel, a central air inlet path, and an edge air inlet path, wherein the optical access channel is located at the center of the gas nozzle and extends downward in a vertical direction, the central air inlet path includes a central air distribution structure and a central air inlet hole communicating with the central air distribution structure, and the edge air inlet path includes an edge air distribution hole and an edge air inlet hole communicating with the edge air distribution hole; a sealing member is provided between the air inlet connector and the gas nozzle to independently seal the optical access channel, the central air inlet path, and the edge air inlet path.

[0011] In one embodiment, the intermediate gas distribution structure is an annular gas distribution groove that surrounds the optical access channel in the circumferential direction.

[0012] In one embodiment, the intermediate gas distribution structure is a series of intermediate gas distribution holes distributed along the circumferential direction.

[0013] In one embodiment, the air inlet connector is provided with an optical device mounting part, a central air distribution groove and an edge air distribution groove. The central air distribution groove corresponds to the central air distribution structure, and the edge air distribution groove corresponds to the edge air distribution hole. The central air distribution groove and the edge air distribution groove are each provided with an independent air inlet.

[0014] In one embodiment, the air inlet of the intermediate air distribution groove is located on the side of the air inlet connector, extending inward and perpendicular to the intermediate air distribution groove.

[0015] In one embodiment, the air inlet of the edge air distribution groove is located on the side of the air inlet connector, extending inward and perpendicular to the middle air distribution groove.

[0016] In one embodiment, the optical device mounting portion is a threaded hole.

[0017] In one embodiment, the diameter of the threaded hole is larger than the diameter of the optical access channel.

[0018] In one embodiment, the central air intake port of the central air intake path is vertically downward.

[0019] In one embodiment, the intermediate air inlet is a stepped hole with an inner diameter that gradually decreases.

[0020] In one embodiment, the edge air inlet of the edge air inlet passage forms a set angle β with the center line of the gas nozzle.

[0021] In one embodiment, the angle β between the edge air inlet of the edge air inlet passage and the centerline of the gas nozzle is 30°-65°.

[0022] In one embodiment, the angle β between the edge air inlet of the edge air inlet passage and the centerline of the gas nozzle is 45°.

[0023] In one embodiment, the gas nozzle has a chamfered portion at its inner end and a stepped portion on its outer circumferential surface.

[0024] In one embodiment, the central air inlet is located on the lower end face of the gas nozzle, and the edge air inlet is located on the chamfered portion of the gas nozzle.

[0025] In one embodiment, the central air inlet is located on the lower end face of the gas nozzle, and the edge air inlet is located on the outer peripheral face of the gas nozzle.

[0026] In one embodiment, the diameter of the intermediate air inlet is less than 2 mm.

[0027] In one embodiment, the diameter of the edge air inlet is between 1 mm and 1.5 mm.

[0028] To achieve the other objective mentioned above, the present invention provides a jetting system, including a process gas chamber and a jetting structure disposed at a central hole on the upper surface of the process gas chamber, wherein the jetting structure is the jetting structure with an optical access channel as described in any of the above technical solutions.

[0029] In one embodiment, the intermediate air intake path is connected to the intermediate air intake flow control unit via a first air intake pipe, the edge air intake path is connected to the edge air intake flow control unit via a second air intake pipe, and the intermediate air intake flow control unit and the edge air intake flow control unit are connected to an air source.

[0030] The jet structure with an optical access channel provided by this invention mainly consists of an air intake connector and upper and lower gas nozzles. It has an optical access channel in the middle and two air intake channels around the optical access channel, namely the middle air intake channel and the edge air intake channel. The optical access channel can effectively monitor the situation in the process chamber. The two air intake channels are independently sealed and can be controlled separately, thereby effectively controlling the uniformity of air intake, adjusting the air intake ratio, reducing the risk of arc discharge, reducing gas deposition and particle generation, and thus improving the production quality of semiconductor chips. Moreover, the structure is simple and easy to maintain.

[0031] The jet system provided by the present invention is equipped with the jet structure having an optical access channel. Since the jet structure having an optical access channel has the above-mentioned technical effects, the jet system should also have the corresponding technical effects. Attached Figure Description

[0032] Figure 1 A schematic diagram of a jet structure with an optical access channel provided in an embodiment of the present invention;

[0033] Figure 2 for Figure 1 The diagram shows a gas nozzle installed in the center hole on the upper surface of the process gas chamber.

[0034] Figure 3 This is a schematic diagram of a jet system provided in an embodiment of the present invention.

[0035] In the picture:

[0036] 10. Air intake connector 11. Optical component mounting section 13. Central air distribution groove 131. First air inlet 15. Edge air distribution groove 151. Second air inlet 20. Gas nozzle 21. Optical access channel 23. Annular air distribution groove 24. Central air inlet hole 25. Edge air distribution hole 26. Edge air inlet hole 31. First sealing ring 32. Second sealing ring 33. Third sealing ring 70. Process chamber 71. Medium window 81. First air inlet pipe 82. Second air inlet pipe 91. Central air inlet flow control unit 92. Edge air inlet flow control unit 100. Air source Detailed Implementation

[0037] To enable those skilled in the art to better understand the present invention, the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.

[0038] In this document, terms such as "upper," "lower," "inner," and "outer" are established based on the positional relationships shown in the accompanying drawings. Depending on the drawings, the corresponding positional relationships may also change. Therefore, they should not be interpreted as an absolute limitation on the scope of protection. Moreover, relational terms such as "first" and "second" are only used to distinguish one component from another that has the same name, and do not necessarily require or imply any such actual relationship or order between these components.

[0039] In etching equipment, process gases need to be sprayed onto the wafer during the relevant processes. The applicant found in the research that the etching rate at the edge and the center is usually different during this process. Therefore, it is necessary to spray gas into different areas such as the center and edge of the wafer separately. After the process is executed, the chamber needs to be plasma cleaned, which requires spraying gas from multiple directions, including the sides and downwards. Although traditional air inlet nozzles are designed to spray gas into the center and the edge, the position of the air inlet is fixed and cannot be controlled in sections. It is impossible to control the downward or side spraying separately, and it is impossible to control the airflow sprayed towards the edge and center of the wafer separately. This results in different uniformity performance of the etching equipment when using different processes, and it is difficult to achieve greater improvement in uniformity.

[0040] Please refer to Figure 1 , Figure 1 A schematic diagram of a jet structure with an optical access channel provided in an embodiment of the present invention;

[0041] As shown in the figure, in one specific embodiment, the multi-zone jet intake structure provided by the present invention mainly consists of two parts: an intake connector 10 and a gas nozzle 20. The intake connector 10 is located at the upper part, and the gas nozzle 20 is located at the lower part. The two are connected to each other and sealed. The intake path is two paths, namely the middle intake path and the edge intake path.

[0042] The gas nozzle 20 has an optical access channel 21 extending vertically downward at its center. The central air intake route consists of an annular uniform gas groove 23 and a central air intake hole 24. The central air intake hole 24 is connected to the lower end of the annular uniform gas groove 23. In order to obtain a better uniform gas effect, the central air intake holes 24 are arranged in a ring and there are multiple of them, which are independent of each other. The edge air intake route consists of an edge uniform gas hole 25 and an edge air intake hole 26. The edge uniform gas hole 25 and the edge air intake hole 26 are arranged in a ring and there are multiple of them, which are independent of each other.

[0043] In other embodiments, annularly distributed central air distribution holes can be used instead of annular air distribution grooves 23, which can also achieve the function of air intake and the effect of air distribution.

[0044] In this embodiment, the diameter of the central air inlet 24 is less than 2 mm, and the diameter of the edge air inlet 26 is between 1 mm and 1.5 mm.

[0045] The outer circumferential surface of the gas nozzle 20 is provided with a step to limit the position during installation. The inner end of the gas nozzle 20 is also provided with a chamfered part. The middle air inlet 24 is located on the lower end face of the gas nozzle 20 and extends vertically downward, and is a stepped hole with a gradually decreasing inner diameter. The edge air inlet 26 is located on the chamfered part of the gas nozzle 20 and extends downward at an angle.

[0046] The air intake connector 10 is provided with an optical device mounting part 11, a middle air equalization groove 13 and an edge air equalization groove 15. The optical device mounting part 11 is a threaded hole for mounting an optical access window (not shown in the figure), which is connected to the optical access channel 21 and has a diameter larger than the optical access channel 21. The middle air equalization groove 13 is connected to the annular air equalization groove 23, and the edge air equalization groove 15 is connected to the edge air equalization hole 25. The middle air equalization groove 13 is provided with an independent first air inlet 131, and the edge air equalization groove 15 is provided with an independent second air inlet 151. The two air paths can achieve independent air intake.

[0047] The first air inlet 131 of the middle air distribution groove 13 is located on the side of the air intake connector 10, extending inward and perpendicular to the middle air distribution groove 13. The second air inlet 151 of the edge air distribution groove 15 is located on the side of the air intake connector 10, extending inward and perpendicular to the middle air distribution groove 15. The first air inlet 131 and the second air inlet 151 are offset by a certain distance in the circumferential direction.

[0048] A sealing element is provided between the air intake connector 10 and the gas nozzle 20 to independently seal the optical access channel, the middle air intake path and the edge air intake path.

[0049] Specifically, between the mating surfaces of the air intake connector 10 and the gas nozzle 20, a first sealing ring 31 is provided between the optical access channel and the middle air intake path, a second sealing ring 32 is provided between the middle air intake path and the edge air intake path, and a third sealing ring 33 is provided on the outside of the edge air intake path. By providing three sealing rings, the optical access channel, the middle air intake path and the edge air intake path are sealed independently.

[0050] The edge air inlet 26 of the edge air inlet path forms a set angle β with the center line of the gas nozzle 20. Depending on the equipment and process requirements, this angle β can be controlled between 30° and 65°. In this embodiment, the value of angle β is 45°.

[0051] Please refer to Figure 2 , Figure 2 for Figure 1 The diagram shows a gas nozzle installed in the center hole on the upper surface of the process gas chamber.

[0052] In use, the top of the process chamber 70 is equipped with a sealed medium window 71, and the gas nozzle 20 is installed in the annular groove at the center of the medium window 71 and sealed with a sealing ring. The central hole on the upper surface of the process chamber 70 cooperates with the gas nozzle 20 with two air inlets to deliver process gas to the plasma center processing chamber in two directions for etching or deposition.

[0053] As shown by the arrows in the figure, the above-mentioned air intake structure allows for control of the etching rate towards the wafer center and edge regions during relevant processes by adjusting the air intake flow rates in the central and edge air intake paths, thereby addressing issues such as uniformity. In plasma cleaning chamber mode, adjusting the air intake flow rate in the edge air intake path direction allows for appropriate cleaning of deposits generated after different processes on the dielectric window 71, top cover, etc., while adjusting the air intake flow rate in the central air intake path direction cleans deposits generated on the lower electrode, sidewalls, etc., within the chamber.

[0054] Both air intakes enter the process chamber through a uniform air distribution groove, and the two air intake channels are independently sealed. Either air intake path can be controlled independently, and the air intake ratio is adjustable. This can effectively control the uniformity of air intake, reduce the risk of arc discharge, reduce gas deposition and particle generation, and the structure is simple and easy to maintain.

[0055] The above embodiments are merely preferred embodiments of the present invention and are not limited thereto. Based on these, targeted adjustments can be made according to actual needs to obtain different implementation methods. For example, the angle of the edge air inlet 26 can be adjusted accordingly, or the edge air inlet 26 can be located on the outer peripheral surface of the gas nozzle 20, etc. Since there are many possible implementation methods, they will not be described one by one here.

[0056] Please refer to Figure 3 , Figure 3 This is a schematic diagram of a jet system provided in an embodiment of the present invention.

[0057] In addition to the above-mentioned jet structure, the present invention provides a jet system, which mainly consists of a process gas chamber 70 and an air intake structure provided in the center hole on the upper surface of the process gas chamber 70, wherein the air intake structure is the jet structure with an optical access channel described above.

[0058] The intermediate air intake path is connected to the intermediate air intake flow control unit 91 through the first air intake pipe 81, and the edge air intake path is connected to the edge air intake flow control unit 92 through the second air intake pipe 82. The intermediate air intake flow control unit 91 and the edge air intake flow control unit 92 are respectively connected to the air source 100. During operation, the air source 100 can be connected to different jet hole groups of the gas nozzle 20 to realize jetting in different directions of different hole groups, and realize jetting on / off and flow regulation of different jet hole groups.

[0059] Of course, the intermediate air intake flow control unit 91 and the edge air intake flow control unit 92 can also be integrated into a single control unit, which can control both air intakes simultaneously.

[0060] For details regarding the remaining structure of the jet system, please refer to existing technologies; these details will not be elaborated upon here.

[0061] The jet structure and jet system with optical access channel provided by the present invention have been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of the present invention, and the descriptions of the embodiments above are only for the purpose of helping to understand the core ideas of the present invention. It should be noted that those skilled in the art can make several improvements and modifications to the present invention without departing from the principles of the present invention, and these improvements and modifications also fall within the protection scope of the claims of the present invention.

Claims

1. A jet structure with an optical access channel, characterized in that, It includes an air inlet connector (10) and a gas nozzle (20), the air inlet connector (10) and the gas nozzle (20) being interconnected; the gas nozzle (20) is provided with an optical access channel (21), a central air inlet path and an edge air inlet path, the optical access channel being located at the center of the gas nozzle (20) and extending downward in the vertical direction, the central air inlet path including a central air distribution structure and a central air inlet hole (24) connecting the central air distribution structure, the edge air inlet path including an edge air distribution hole (25) and an edge air inlet hole (26) connecting the edge air distribution hole (27). 26); A sealing element is provided between the air inlet connector (10) and the gas nozzle (20) to independently seal the optical access channel (21), the middle air inlet path and the edge air inlet path; the air inlet connector (10) is provided with an optical device mounting part (11), a middle air equalization groove (13) and an edge air equalization groove (15), the middle air equalization groove (13) corresponds to the middle air equalization structure, the edge air equalization groove (15) corresponds to the edge air equalization hole (25), and the middle air equalization groove (13) and the edge air equalization groove (15) are respectively provided with independent air inlets.

2. The jet structure with an optical access channel according to claim 1, characterized in that, The intermediate gas distribution structure is an annular gas distribution groove (23) that surrounds the optical access channel (21) in the circumferential direction.

3. The jet structure with an optical access channel according to claim 1, characterized in that, The intermediate air distribution structure consists of intermediate air distribution holes distributed along the circumferential direction.

4. The jet structure with an optical access channel according to claim 1, characterized in that, The air inlet of the intermediate air distribution groove (13) is located on the side of the air inlet connector (10), extending inward and perpendicular to the intermediate air distribution groove (13).

5. The jet structure with an optical access channel according to claim 1, characterized in that, The air inlet of the edge air distribution groove (15) is located on the side of the air inlet connector (10), and extends inward and is perpendicular to the middle air distribution groove (13).

6. The jet structure with an optical access channel according to claim 1, characterized in that, The mounting part for the optical device is a threaded hole.

7. The jet structure with an optical access channel according to claim 6, characterized in that, The diameter of the threaded hole is larger than the diameter of the optical access channel (21).

8. The jet structure with an optical access channel according to claim 1, characterized in that, The intermediate air intake hole (24) of the intermediate air intake path is vertically downward.

9. The jet structure with an optical access channel according to claim 8, characterized in that, The intermediate air inlet (24) is a stepped hole with an inner diameter that gradually decreases.

10. The jet structure with an optical access channel according to claim 1, characterized in that, The edge air inlet (26) of the edge air inlet path forms a set angle β with the center line of the gas nozzle (20).

11. The jet structure with an optical access channel according to claim 10, characterized in that, The angle β between the edge air inlet (26) of the edge air inlet path and the center line of the gas nozzle (20) is 30°-65°.

12. The jet structure with an optical access channel according to claim 11, characterized in that, The angle β between the edge air inlet (26) of the edge air inlet path and the center line of the gas nozzle (20) is 45°.

13. The jet structure with an optical access channel according to claim 1, characterized in that, The gas nozzle (20) has a chamfered part at its inner end and a stepped part on its outer circumference.

14. The jet structure with an optical access channel according to claim 13, characterized in that, The central air inlet (24) is located on the lower end face of the gas nozzle (20), and the edge air inlet (26) is located on the chamfered part of the gas nozzle (20).

15. The jet structure with an optical access channel according to claim 13, characterized in that, The intermediate air inlet (24) is located on the lower end face of the gas nozzle (20), and the edge air inlet (26) is located on the outer peripheral surface of the gas nozzle (20).

16. The jet structure with an optical access channel according to any one of claims 1 to 15, characterized in that, The diameter of the intermediate air inlet (24) is less than 2 mm.

17. The jet structure with an optical access channel according to any one of claims 1 to 15, characterized in that, The diameter of the edge air inlet (26) is between 1 mm and 1.5 mm.

18. A jet system, comprising a process gas chamber and a jet structure disposed at a central hole on the upper surface of the process gas chamber, characterized in that, The jet structure is the jet structure with an optical access channel as described in any one of claims 1 to 17.

19. The jet system according to claim 18, characterized in that, The intermediate air intake path is connected to the intermediate air intake flow control unit (91) through the first air intake pipe (81), and the edge air intake path is connected to the edge air intake flow control unit (92) through the second air intake pipe (82). The intermediate air intake flow control unit (91) and the edge air intake flow control unit (92) are connected to the air source.

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