A semiconductor reaction chamber

Abstract

The present invention belongs to the field of semiconductor manufacturing technology and discloses a semiconductor reaction chamber, comprising a shell for plasma etching of semiconductors, a sealing cover detachably mounted at the top opening of the shell, an electrostatic chuck disposed in the middle of the inner cavity of the shell, and a cleaning mechanism disposed between the electrostatic chuck and the inner cavity wall of the shell. The present invention achieves good cleaning uniformity through the coordinated design of the shell, the electrostatic chuck, and the cleaning mechanism, facilitates consistent cleaning effects on the upper and lower parts of the reaction chamber, and is less likely to cause particle residue, thereby helping to improve the yield rate of semiconductor manufacturing and improving the use effect and practicality of the equipment. It avoids the situation where the upper part of the reaction chamber is cleaned well while the lower part is cleaned poorly, resulting in poor cleaning uniformity, making it difficult for particles attached to the lower part of the reaction chamber to fall off, which easily affects the yield rate of semiconductor manufacturing and reduces the use effect and practicality of the equipment.

Description

Technical Field

[0001] The invention belongs to the technical field of semiconductor manufacturing, in particular to a semiconductor reaction chamber. Background Art

[0002] Semiconductor processing includes deposition processes such as chemical vapor deposition (CVD) of metal, dielectric, and semiconductor materials, etching of these layers, polishing of photoresist mask layers, etc. In the case of etching, plasma etching is generally used to etch metal, dielectric, and semiconductor materials, while a semiconductor reaction chamber is a device used to perform material deposition, etching, and other reactions on semiconductors under vacuum conditions.

[0003] In the prior art, a Chinese patent discloses a semiconductor device and a method for cleaning a reaction chamber of the semiconductor device (publication number: CN108878241B). Its main structure includes a reaction chamber for accommodating wafers to be processed. The semiconductor device also includes an air intake cleaning assembly located on the side wall of the reaction chamber and close to the top of the reaction chamber. The air intake cleaning assembly includes at least one nozzle, which can be extended and retracted along the radial direction of the reaction chamber to adjust the length of the nozzle extending into the interior of the reaction chamber to clean residues located at the top of the reaction chamber.

[0004] In actual use, the above patent uses nozzle jets to pre-clean the residues inside the reaction chamber, which can reduce the residues in the reaction chamber, effectively reduce the etching defects caused by the residues on the wafers to be processed, and improve the processing yield of the wafers to be processed. However, there are still corresponding disadvantages in actual use: the inner wall of the semiconductor reaction chamber is sprayed with an alumina ceramic coating to protect the inner wall of the semiconductor reaction chamber and reduce the damage caused by plasma etching. During plasma etching, it collides with the alumina ceramic coating, consumes the coating and produces oxide particles attached to the surface of the coating. When the above patent is used, since the nozzle position and angle are not easy to adjust, when the gas is sprayed for cleaning, the upper part of the reaction chamber is cleaned well, while the lower part is cleaned poorly, and the cleaning uniformity is poor, making it difficult for the particles attached to the lower part of the reaction chamber to fall off, which can easily affect the yield of semiconductor manufacturing and reduce the effect and practicality of the equipment. Summary of the Invention

[0005] Technical problems solved

[0006] In order to solve the problems raised in the above-mentioned background technology, the present invention provides a semiconductor reaction chamber, which has the advantages of convenient operation, good cleaning effect and uniformity, and good practicality. Through the coordinated design of structures such as the shell, electrostatic chuck, and cleaning mechanism, the cleaning uniformity is good, which makes it easy to make the cleaning effects of the upper and lower parts of the reaction chamber consistent, and is not easy to cause particle residue, which helps to improve the yield rate of semiconductor manufacturing and improves the practicality and use effect of the equipment.

[0007] Technical Solution

[0008] To achieve the above-mentioned object, the present invention provides the following technical solution: a semiconductor reaction chamber, comprising a housing for plasma etching a semiconductor, a sealing cover detachably mounted at an opening on the top of the housing, an electrostatic chuck disposed in the middle of an inner cavity of the housing, and a cleaning mechanism disposed between the electrostatic chuck and the inner cavity wall of the housing;

[0009] The cleaning mechanism includes an annular bottom plate circumferentially fixed between the inner ring wall of the shell and the outer ring of the electrostatic chuck, an annular connecting plate that moves up and down in the inner ring of the annular bottom plate, an annular top plate fixedly sleeved on the top of the outer ring wall of the annular connecting plate, an annular groove circumferentially arranged in the middle of the outer ring wall of the annular top plate, a sealing member arranged in the annular groove for sealing between the outer ring wall of the annular top plate and the inner ring wall of the shell, an annular airbag arranged between the annular bottom plate and the annular top plate, a group of bendable elastic plates circumferentially equidistantly arranged on the outside of the annular airbag, and the elastic The outer surface of the plate is provided with spray holes at equal intervals on a side away from the annular airbag, a connecting mechanism is provided below the annular top plate for connecting the sealing member and the elastic plate, an air inlet is provided on one side of the connecting mechanism for communicating with the inner cavity of the annular airbag, an annular base provided on the upper surface of the annular bottom plate is rotatably provided, a filter cavity is provided at the lower part of the elastic plate, an air inlet is provided on the side of the upper part of the inner cavity of the filter cavity away from the annular airbag, a filter screen for filtering oxide particles is provided on the other side of the inner cavity of the filter cavity, and a detection mechanism is provided at the lower part of the inner cavity of the filter cavity;

[0010] The cam is secured to the bottom of the housing, and the cam has a locking plate that locks the cam and locks the top of the housing, wherein the cam is secured to the bottom of the housing, wherein the cam is secured to the bottom of the housing.

[0011] In the above technical solution, preferably, the sealing member includes an annular mounting groove circumferentially provided in the middle of the outer ring wall of the annular top plate, an annular elastic sheet arranged in the inner cavity of the annular mounting groove, and an elastic sealing ring fixedly sleeved on the outer ring of the annular elastic sheet;

[0012] The upper and lower sides of the elastic sealing ring are respectively fitted with the upper and lower sides of the inner cavity of the annular mounting groove, and the outer ring wall of the elastic sealing ring is movably connected to the inner cavity wall of the shell.

[0013] In the above technical solution, preferably, the connecting mechanism includes an annular connecting shell circumferentially arranged below the annular top plate, a connecting rod vertically fixedly mounted on the top surface of the annular connecting shell, an annular impeller rotating in the inner cavity of the annular connecting shell, and a limiting member arranged at the lower part of the annular top plate for fixing the connecting rod;

[0014] Among them, the outer ring wall of the annular impeller penetrates to the outside of the inner cavity of the annular connecting shell, and the outer ring wall of the annular impeller is fixedly connected to the upper part of the outer surface of the elastic plate, and the top end of the connecting rod penetrates into the inner cavity of the annular mounting groove and is fixedly connected to the bottom surface of the annular elastic sheet.

[0015] In the above technical solution, preferably, a compression spring is movably sleeved on the upper outer surface of the connecting rod, and the upper and lower ends of the compression spring are fixedly connected to the bottom surface of the inner cavity of the annular mounting groove and the bottom surface of the annular elastic sheet respectively.

[0016] In the above technical solution, preferably, the limiting member includes a group of mounting channels equidistantly spaced circumferentially at the lower portion of the outer ring wall of the annular top plate, a compression spring rod being transversely fixedly mounted on a side of the inner cavity of the mounting channel away from the inner cavity wall of the shell, a cross bar fixed to the output end of the compression spring, a limiting hole provided on one side of the cross bar, and a limiting groove provided in the middle portion of the outer surface of the connecting rod away from the inner cavity wall of the shell;

[0017] The inner cavity of the limiting hole is movably connected to the outer surface of the connecting rod, and the inner cavity of the limiting hole is movably connected to the inner cavity of the limiting groove, and one end of the cross bar is movably connected to the inner ring wall of the convex ring.

[0018] In the above technical solution, preferably, the air inlet member includes a group of air outlet holes equidistantly arranged on the top surface of the annular airbag in the circumferential direction, an air outlet valve at the lower part of the inner cavity of the air outlet hole, and a connecting pipe moving up and down at the upper part of the inner cavity of the air outlet hole;

[0019] The outer surface of the connecting pipe fits the inner cavity of the air outlet, the air outlet end surface of the connecting pipe is fixedly connected to the inner wall of the annular connecting shell, and the inner cavity of the connecting pipe is connected to the inner cavity of the annular connecting shell.

[0020] In the above technical solution, preferably, the air outlet valve includes a vertical rod vertically arranged in the inner cavity of the air outlet hole, a connecting ring fixedly sleeved on the lower part of the vertical rod, an exhaust hole provided at the bottom end of the vertical rod, two diversion holes symmetrically provided on the left and right sides of the middle of the outer surface of the vertical rod and connected to the exhaust hole, a docking plate slidably sleeved on the upper part of the outer surface of the vertical rod, and two spring seats symmetrically vertically provided on the left and right sides of the upper surface of the connecting ring;

[0021] The output end of the spring seat is fixedly connected to the bottom surface of the docking plate, and the upper surface of the docking plate is movably connected to the bottom end of the connecting pipe.

[0022] In the above technical solution, preferably, the detection mechanism includes a resistance rod vertically fixedly installed on the bottom surface of the filter cavity, a sliding resistance ring slidably sleeved on the outer surface of the resistance rod, a material supporting shell fixedly sleeved on the outer surface of the sliding resistance ring, and a resistance detection signal transmitter fixed on the bottom surface of the inner cavity of the filter cavity;

[0023] Among them, the outer wall of the material supporting shell is in contact with the inner cavity of the filter cavity, the resistance rod and the sliding resistance ring are electrically connected to the resistance detection signal transmitter, and the bottom surface of the material supporting shell is connected to the bottom surface of the inner cavity of the filter cavity through two symmetrically arranged spring push rods.

[0024] In the above technical solution, preferably, a rotation groove is opened circumferentially on the upper surface of the annular bottom plate, the outer surface of the annular base is movably connected to the inner cavity of the rotation groove, and a group of ventilation holes are opened circumferentially and equidistantly on one side of the bottom surface of the inner cavity of the rotation groove, and a ventilation pipe is connected to the left side of the lower part of the inner cavity of the shell.

[0025] In the above technical solution, preferably, a nozzle is fixedly installed on the middle of the sealing cover, a vacuum connecting pipe is fixedly installed on the left side of the sealing cover, and an exhaust pipe is fixedly installed on the right side of the sealing cover.

[0026] Beneficial effects

[0027] Compared with the prior art, the present invention has the following beneficial effects:

[0028] 1. The present invention adopts the coordinated design of the shell, the electrostatic chuck, the cleaning mechanism and other structures, and drives the annular top plate to move upward through the electric telescopic rod. During the movement, the annular top plate can stretch the annular airbag, so that the annular airbag absorbs air and expands. At the same time, when the annular top plate moves upward, it can drive the elastic plate to stretch to a vertical state to squeeze the annular airbag, so that the air pressure in the annular airbag increases. When the annular top plate moves upward to the opening of the shell, the elastic plate drives the seal to move through the connecting mechanism, and the seal can block the gap between the outer ring wall of the annular top plate and the inner cavity wall of the shell. At the same time, the connecting mechanism drives the air inlet piece to move, and the compressed air in the annular airbag can be transported to the spray hole opened on the elastic plate for spraying out through the air inlet piece. At the same time, in the process of transporting the air in the annular airbag to the nozzle hole, the elastic plate can be driven to move circumferentially through the connecting mechanism under the impact of the airflow, which is convenient for comprehensively cleaning the oxide particles attached to the inner cavity wall of the shell. When the electric telescopic rod drives the annular top plate to move downward, the annular airbag can be squeezed in the vertical direction, so that the nozzle hole can continuously spray air to clean the attached oxide particles. At the same time, the downward movement of the annular top plate drives the seal to move to scrape off the oxide particles attached to the inner cavity wall of the shell. The cleaning is uniform, which makes it easy to make the cleaning effect of the upper and lower parts of the reaction chamber consistent, and it is not easy to cause particle residue, which helps to improve the yield rate of semiconductor manufacturing and improve the use effect and practicality of the equipment.

[0029] 2. The present invention adopts the coordinated design of the annular bottom plate, the seal, the annular connecting plate, the annular top plate, the shell and other structures. The annular bottom plate and the seal, the annular connecting plate and the annular top plate can form a closed space with the inner cavity wall of the shell, so that when cleaning oxide particles, the splashing of particles can be avoided to contaminate and damage the electrostatic chuck.

[0030] 2. The present invention adopts the coordinated design of the elastic plate, filter chamber, filter screen, detection mechanism and other structures. The ejected gas is discharged through the vent hole. At the same time, the gas drives the fallen particles into the filter chamber. The particles can be filtered and blocked by the filter screen. The filtered particles fall into the support shell. As the number of particles gathered in the support shell increases, the support shell can be driven downward under gravity. The support shell drives the sliding resistance ring to slide downward on the resistance rod. The detected resistance value can be transmitted to the external operating system through the resistance detection signal transmitter for the operator to analyze the loss of the coating on the wall of the reaction chamber, so that the operator can maintain and replace the reaction chamber in time. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] Figure 1 It is a schematic diagram of the structure of the present invention;

[0032] Figure 2 It is a partial cross-sectional structural diagram of the housing, sealing cover, cleaning mechanism, and electrostatic chuck of the present invention;

[0033] Figure 3 It is a structural schematic diagram of the cleaning mechanism of the present invention;

[0034] Figure 4 for Figure 3 An enlarged schematic diagram of portion A is shown;

[0035] Figure 5 It is a partial structural exploded view of the cleaning mechanism of the present invention;

[0036] Figure 6 This is an exploded view of the structure of the annular top plate, annular groove, annular elastic sheet, elastic sealing ring, and limiting member of the present invention;

[0037] Figure 7 It is a schematic diagram of a partial top view and cross-section of the annular airbag, elastic plate, impeller, and connecting shell of the present invention;

[0038] Figure 8 This is a schematic structural diagram of the elastic plate and the annular base of the present invention;

[0039] Figure 9 It is a partial cross-sectional structural diagram of the annular bottom plate, annular base, and elastic plate of the present invention;

[0040] Figure 10 for Figure 9 An enlarged schematic diagram of portion B is shown;

[0041] Figure 11 Schematic diagram of the structure of the limiter of the present invention;

[0042] Figure 12 It is a structural schematic diagram of the air outlet valve of the present invention;.

[0043] In the figure: 1. Shell; 2. Sealing cover; 3. Electrostatic chuck; 4. Cleaning mechanism; 41. Annular bottom plate; 42. Annular connecting plate; 43. Annular top plate; 44. Annular groove; 45. Annular airbag; 46. Elastic plate; 47. Spray hole; 48. Filter chamber; 49. Air inlet; 410. Filter screen; 411. Annular base; 5. Sealing member; 51. Annular mounting groove; 52. Annular elastic sheet; 53. Elastic sealing ring; 6. Connecting mechanism; 61. Connecting shell; 62. Connecting rod; 63. Impeller; 7. Air inlet member; 71. Air outlet; 72. Air outlet valve; 73. Connecting pipe; 8. Detection mechanism; 81. Resistance rod; 82. Sliding resistance ring; 83. Support shell; 84. Resistance detection signal transmitter; 9. Docking ring; 10. Electric telescopic rod; 11. Limiting member. DETAILED DESCRIPTION

[0044] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0045] like Figures 1 to 12 As shown, the present invention provides a semiconductor reaction chamber, comprising a housing 1 for plasma etching of semiconductors, a sealing cover 2 detachably mounted at the top opening of the housing 1, an electrostatic chuck 3 disposed in the middle of the inner cavity of the housing 1, and a cleaning mechanism 4 disposed between the electrostatic chuck 3 and the inner cavity wall of the housing 1;

[0046] The cleaning mechanism 4 includes an annular bottom plate 41 fixed circumferentially between the inner ring wall of the shell 1 and the outer ring of the electrostatic chuck 3, an annular connecting plate 42 that moves up and down in the inner ring of the annular bottom plate 41, an annular top plate 43 fixedly sleeved on the top of the outer ring wall of the annular connecting plate 42, an annular groove 44 circumferentially opened in the middle of the outer ring wall of the annular top plate 43, a sealing member 5 arranged in the annular groove 44 for sealing between the outer ring wall of the annular top plate 43 and the inner ring wall of the shell 1, an annular airbag 45 arranged between the annular bottom plate 41 and the annular top plate 43, a group of bendable elastic plates 46 circumferentially equidistantly arranged on the outside of the annular airbag 45, and the elastic plates 46. Spray holes 47 are equidistantly formed on the side of the outer surface away from the annular airbag 45. A connecting mechanism 6 is provided below the annular top plate 43 for connecting the sealing member 5 and the elastic plate 46. An air inlet member 7 is provided on one side of the connecting mechanism 6 for communicating with the inner cavity of the annular airbag 45. An annular base 411 is rotatably provided on the upper surface of the annular bottom plate 41. A filter chamber 48 is provided below the elastic plate 46. An air inlet 49 is provided on the upper side of the inner cavity of the filter chamber 48 away from the annular airbag 45. A filter screen 410 for filtering oxide particles is provided on the other side of the inner cavity of the filter chamber 48. A detection mechanism 8 is provided at the lower part of the inner cavity of the filter chamber 48.

[0047] Among them, the bottom end of the elastic plate 46 is fixedly connected to the upper surface of the annular base 411, and a docking ring 9 is circumferentially provided between the outer ring of the annular top plate 43 and the inner cavity of the shell 1. The outer ring wall of the docking ring 9 is fixedly connected to the inner cavity of the shell 1. The upper and lower parts of the annular airbag 45 are fixedly connected to the bottom surface of the annular top plate 43 and the upper surface of the annular bottom plate 41 through the fixing ring respectively. The bottom of the annular airbag 45 is connected to a one-way air intake valve, and one side of the elastic plate 46 is movably connected to the outer surface of the annular airbag 45. A group of electric telescopic rods 10 are vertically fixedly installed on the bottom surface of the annular bottom plate 41 at equal intervals in the circumference. The output shaft end of the electric telescopic rod 10 passes through the annular shaped bottom plate 41, and the output shaft end face of the electric telescopic rod 10 is fixedly connected to the bottom surface of the annular top plate 43, the inner cavity of the shell 1 is circumferentially fixedly installed with a convex ring, the inner ring wall of the convex ring is movably connected to the outer ring wall of the annular top plate 43, the middle part of the sealing cover 2 is fixedly installed with a nozzle, the left side of the sealing cover 2 is fixedly installed with a vacuum docking pipe, the right side of the sealing cover 2 is fixedly installed with an exhaust pipe, the upper surface of the annular bottom plate 41 is circumferentially provided with a rotating groove, the outer surface of the annular base 411 is movably connected to the inner cavity of the rotating groove, and a group of vent holes are equidistantly provided on one side of the bottom surface of the inner cavity of the rotating groove, and a vent pipe is connected to the left side of the lower part of the inner cavity of the shell 1.

[0048] When in use, the annular top plate 43 is driven to move upward by the electric telescopic rod 10. During the movement, the annular top plate 43 can stretch the annular airbag 45, causing the annular airbag 45 to inhale air and expand. At the same time, when the annular top plate 43 moves upward, it can drive the elastic plate 46 to stretch to a vertical state to squeeze the annular airbag 45, thereby increasing the air pressure in the annular airbag 45. When the annular top plate 43 moves upward to the opening of the shell 1, the elastic plate 46 drives the seal 5 to move through the connecting mechanism 6. The seal 5 can block the gap between the outer ring wall of the annular top plate 43 and the inner cavity wall of the shell 1. At the same time, the connecting mechanism 6 drives the air inlet member 7 to move, and the compressed air in the annular airbag 45 can be transported to the spray hole 47 opened on the elastic plate 46 for spraying out. During the process of transporting the air in the annular airbag 45 to the nozzle hole 47, the elastic plate 46 can be driven to move circumferentially through the connecting mechanism 6 under the impact of the airflow, which is convenient for comprehensively cleaning the oxide particles attached to the inner cavity wall of the shell 1. When the electric telescopic rod 10 drives the annular top plate 43 to move downward, the annular airbag 45 can be squeezed in the vertical direction, so that the nozzle hole 47 can continuously spray to clean the attached oxide particles. At the same time, the downward movement of the annular top plate 43 drives the seal 5 to move to scrape off the oxide particles attached to the inner cavity wall of the shell 1. The cleaning is uniform, which makes it easy to ensure that the cleaning effect of the upper and lower parts of the reaction chamber is consistent, and it is not easy to cause particle residue, which helps to improve the yield rate of semiconductor manufacturing and improve the use effect and practicality of the equipment.

[0049] It should be noted that the annular bottom plate 41 and the seal 5 together with the annular connecting plate 42 and the annular top plate 43 can form a closed space with the inner cavity wall of the shell 1, which can prevent the splashing of particles from contaminating and damaging the electrostatic chuck 3 when cleaning oxide particles.

[0050] It is worth noting that when the nozzle 47 sprays air to clean the attached particles, the ejected gas is discharged through the vent, and at the same time the gas drives the fallen particles into the filter chamber 48, and the particles can be filtered and blocked by the filter mesh 410. The filtered particles are collected and detected by the detection mechanism 8. The collected particles will cause the detected resistance value to change under the action of gravity. The operator can analyze the loss of the coating on the wall of the reaction chamber according to the resistance value, which is convenient for the operator to maintain and replace the reaction chamber in time.

[0051] like Figure 4 and Figure 6 As shown, the sealing member 5 includes an annular mounting groove 51 circumferentially provided in the middle of the outer wall of the annular top plate 43, an annular elastic sheet 52 disposed in the inner cavity of the annular mounting groove 51, and an elastic sealing ring 53 fixedly sleeved on the outer ring of the annular elastic sheet 52;

[0052] The upper and lower sides of the elastic sealing ring 53 are respectively fitted with the upper and lower sides of the inner cavity of the annular mounting groove 51 , and the outer ring wall of the elastic sealing ring 53 is movably connected to the inner cavity wall of the housing 1 .

[0053] During use, when the annular top plate 43 rises to the opening of the shell 1, the elastic plate 46 is at the maximum expansion angle, and the elastic plate 46 pulls the annular elastic sheet 52 to move downward near the center position through the connecting mechanism 6, so that the bottom surface of the annular elastic sheet 52 is subjected to force, so that the edge thereof stretches outward, thereby expanding the elastic sealing ring 53, and enabling the outer ring of the elastic sealing ring 53 to extend to the outside of the inner cavity of the annular mounting groove 51 and fit the inner cavity wall of the shell 1.

[0054] like Figure 4 and Figure 11 As shown, the connecting mechanism 6 includes an annular connecting shell 61 circumferentially arranged below the annular top plate 43, a connecting rod 62 vertically fixedly mounted on the top surface of the annular connecting shell 61, an annular impeller 63 rotating in the inner cavity of the annular connecting shell 61, and a stopper 11 arranged at the lower part of the annular top plate 43 for fixing the connecting rod 62;

[0055] Among them, the outer ring wall of the annular impeller 63 penetrates to the outside of the inner cavity of the annular connecting shell 61, and the outer ring wall of the annular impeller 63 is fixedly connected to the upper outer surface of the elastic plate 46, the top end of the connecting rod 62 penetrates into the inner cavity of the annular mounting groove 51 and is fixedly connected to the bottom surface of the annular elastic sheet 52, and a compression spring is movably sleeved on the upper outer surface of the connecting rod 62, and the upper and lower ends of the compression spring are respectively fixedly connected to the inner cavity bottom surface of the annular mounting groove 51 and the bottom surface of the annular elastic sheet 52, and the limiting member 11 includes a group of mounting channels equidistantly circumferentially at the lower part of the outer ring wall of the annular top plate 43, a compression spring rod is fixedly installed laterally on the side of the inner cavity of the mounting channel away from the inner cavity wall of the shell 1, a cross bar fixed to the output end of the compression spring, a limiting hole provided on one side of the cross bar, and a limiting groove provided on the middle part of the outer surface of the connecting rod 62 away from the inner cavity wall of the shell 1;

[0056] The inner cavity of the limiting hole is movably connected to the outer surface of the connecting rod 62, and the inner cavity of the limiting hole is movably connected to the inner cavity of the limiting groove, and one end of the cross bar is movably connected to the inner ring wall of the convex ring.

[0057] During use, when the elastic plate 46 is at the maximum expansion angle, the annular connecting shell 61 can be driven to move downward by the annular impeller 63. The movement of the annular connecting shell 61 drives the connecting rod 62 to drive the annular elastic sheet 52 to move downward, thereby expanding the elastic sealing ring 53. At the same time, the downward movement of the annular connecting shell 61 can drive the air inlet part 7 to discharge the air in the annular airbag 45. After the air is discharged, it enters the annular connecting shell 61 and can push the annular impeller 63 to rotate. The annular impeller 63 can drive the elastic plate 46 to move circumferentially to perform jet cleaning on the particles attached to the inner wall of the shell 1.

[0058] like Figure 4 and Figure 12 As shown, the air inlet member 7 includes a group of air outlet holes 71 equidistantly arranged on the top surface of the annular airbag 45 in the circumferential direction, an air outlet valve 72 at the lower part of the inner cavity of the air outlet hole 71, and a connecting pipe 73 that moves up and down at the upper part of the inner cavity of the air outlet hole 71;

[0059] Among them, the outer surface of the connecting pipe 73 is in contact with the inner cavity of the air outlet hole 71, the air outlet end surface of the connecting pipe 73 is fixedly connected to the inner ring wall of the annular connecting shell 61, and the inner cavity of the connecting pipe 73 is connected to the inner cavity of the annular connecting shell 61. The air outlet valve 72 includes a vertical rod vertically arranged in the inner cavity of the air outlet hole 71, a connecting ring fixedly sleeved on the lower part of the vertical rod, an exhaust hole provided at the bottom end of the vertical rod, two diversion holes symmetrically provided on the left and right sides of the middle part of the outer surface of the vertical rod and connected to the exhaust hole, a docking plate slidably sleeved on the upper part of the outer surface of the vertical rod, and two spring seats symmetrically arranged vertically on the left and right sides of the upper surface of the connecting ring;

[0060] The output end of the spring seat is fixedly connected to the bottom surface of the docking plate, and the upper surface of the docking plate is movably connected to the bottom end of the connecting pipe 73.

[0061] During use, when the annular connecting shell 61 moves downward, it can drive the connecting tube 73 to move downward in the air outlet 71, and the connecting tube 73 can push the docking plate to move downward to the bottom of the diversion hole, so that the air in the annular airbag 45 can enter the connecting tube 73 after passing through the exhaust hole and the diversion hole, making it easier to discharge the air in the annular airbag 45.

[0062] like Figure 10 As shown, the detection mechanism 8 includes a resistance rod 81 vertically fixedly mounted on the bottom surface of the filter cavity 48, a sliding resistance ring 82 slidably mounted on the outer surface of the resistance rod 81, a material support shell 83 fixedly mounted on the outer surface of the sliding resistance ring 82, and a resistance detection signal transmitter 84 fixed to the bottom surface of the inner cavity of the filter cavity 48;

[0063] Among them, the outer wall of the supporting shell 83 fits with the inner cavity of the filter cavity 48, the resistance rod 81 and the sliding resistance ring 82 are electrically connected to the resistance detection signal transmitter 84, and the bottom surface of the supporting shell 83 is connected to the inner cavity bottom surface of the filter cavity 48 through two symmetrically arranged spring push rods.

[0064] During use, the ejected gas is discharged through the vent, and at the same time, the gas drives the fallen particles into the filter chamber 48, and the particles can be filtered and blocked by the filter mesh 410. The filtered particles fall into the support shell 83. As the number of particles gathered in the support shell 83 increases, the support shell 83 can be driven downward under gravity, and the support shell 83 drives the sliding resistance ring 82 to slide downward on the resistance rod 81. The detected resistance value can be transmitted to the external operating system through the resistance detection signal transmitter 84, so that the operator can analyze the loss of the coating on the wall of the reaction chamber, so that the operator can maintain and replace the reaction chamber in time.

[0065] The working principle and use process of the present invention:

[0066] When in use, the annular top plate 43 is first driven to move upward by the electric telescopic rod 10. During the movement, the annular top plate 43 can stretch the annular airbag 45, so that the annular airbag 45 inhales air and expands. At the same time, when the annular top plate 43 moves upward, it can drive the elastic plate 46 to stretch to a vertical state to squeeze the annular airbag 45, so that the air pressure in the annular airbag 45 increases. When the annular top plate 43 moves upward to the opening of the shell 1, the elastic plate 46 is at the maximum expansion angle, which can drive the annular impeller 63 to expand the annular airbag 45. The annular connecting shell 61 moves downward, and the annular connecting shell 61 moves to drive the connecting rod 62 to drive the annular elastic sheet 52 to move downward, thereby expanding the elastic sealing ring 53, so that the elastic sealing ring 53 can block the gap between the outer ring wall of the annular top plate 43 and the inner wall of the shell 1. At the same time, when the annular connecting shell 61 moves downward, it can drive the connecting pipe 73 to move downward in the air outlet 71, and the connecting pipe 73 can push the docking plate to move downward to the bottom of the diverter hole, so that the air in the annular airbag 45 can enter the annular airbag 45 through the exhaust hole and the diverter hole. In the connecting pipe 73, the air in the connecting pipe 73 is discharged and enters the annular connecting shell 61, which can drive the annular impeller 63 to rotate. The annular impeller 63 can drive the elastic plate 46 to move circumferentially to spray and clean the particles attached to the inner wall of the shell 1. In the process of the annular top plate 43 moving downward, under the action of the limiter 11, the elastic sealing ring 53 can be driven to move to scrape off the oxide particles attached to the inner wall of the shell 1. The cleaning is uniform, and the ejected gas is discharged through the vent hole. At the same time, the gas drives the falling particles into The particles enter the filter chamber 48, and the filter screen 410 can filter and block the particles. The filtered particles fall into the support shell 83. As the number of particles accumulated in the support shell 83 increases, the support shell 83 can be driven downward by gravity, and the support shell 83 drives the sliding resistance ring 82 to slide downward on the resistance rod 81. The resistance detection signal transmitter 84 can transmit the detected resistance value to the external operating system for the operator to analyze the loss of the coating on the wall of the reaction chamber, so that the operator can maintain and replace the reaction chamber in time.

[0067] It should be noted that, in this document, relational terms such as first and second, etc., are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "comprises," "comprising," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that includes a list of elements includes not only those elements but also other elements not explicitly listed, or elements inherent to such process, method, article, or apparatus.

[0068] While embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions, and variations may be made to these embodiments without departing from the principles and spirit of the invention, and that the scope of the invention is defined by the appended claims and their equivalents.

Claims

1. A semiconductor reaction chamber, characterized in that: The invention comprises a housing (1) for plasma etching of semiconductors, a sealing cover (2) detachably mounted at the top opening of the housing (1), an electrostatic chuck (3) arranged in the middle of the inner cavity of the housing (1), and a cleaning mechanism (4) arranged between the electrostatic chuck (3) and the inner cavity wall of the housing (1); The cleaning mechanism (4) includes an annular bottom plate (41) fixed circumferentially between the inner ring wall of the housing (1) and the outer ring of the electrostatic chuck (3), an annular connecting plate (42) that moves up and down in the inner ring of the annular bottom plate (41), an annular top plate (43) fixedly sleeved on the top of the outer ring wall of the annular connecting plate (42), an annular groove (44) circumferentially provided in the middle of the outer ring wall of the annular top plate (43), a sealing member (5) provided in the annular groove (44) for sealing between the outer ring wall of the annular top plate (43) and the inner ring wall of the housing (1), an annular airbag (45) provided between the annular bottom plate (41) and the annular top plate (43), a group of bendable elastic plates (46) circumferentially equidistantly provided on the outside of the annular airbag (45), and the elastic plates (46) The outer surface of the annular airbag (45) is provided with spray holes (47) at equal distances on one side thereof, a connecting mechanism (6) is provided below the annular top plate (43) for connecting the sealing member (5) and the elastic plate (46), an air inlet member (7) is provided on one side of the connecting mechanism (6) for communicating with the inner cavity of the annular airbag (45), an annular base (411) is rotatably provided on the upper surface of the annular bottom plate (41), a filter chamber (48) is provided at the lower part of the elastic plate (46), an air inlet (49) is provided at the upper part of the inner cavity of the filter chamber (48) away from the annular airbag (45), a filter screen (410) for filtering oxide particles is provided on the other side of the inner cavity of the filter chamber (48), and a detection mechanism (8) is provided at the lower part of the inner cavity of the filter chamber (48); The bottom end of the elastic plate (46) is fixedly connected to the upper surface of the annular base (411), a docking ring (9) is circumferentially arranged between the outer ring of the annular top plate (43) and the inner cavity of the shell (1), and the outer ring wall of the docking ring (9) is fixedly connected to the inner cavity of the shell (1). The upper and lower parts of the annular airbag (45) are respectively fixedly connected to the bottom surface of the annular top plate (43) and the upper surface of the annular bottom plate (41) through fixing rings. The bottom of the annular airbag (45) is connected to a one-way air inlet valve. One side of the plate (46) is movably connected to the outer surface of the annular airbag (45); a group of electric telescopic rods (10) are fixedly installed vertically and equidistantly on the bottom surface of the annular bottom plate (41); the output shaft end of the electric telescopic rod (10) passes through the top of the annular bottom plate (41), and the output shaft end face of the electric telescopic rod (10) is fixedly connected to the bottom surface of the annular top plate (43); a convex ring is fixedly installed on the inner cavity of the shell (1); the inner ring wall of the convex ring is movably connected to the outer ring wall of the annular top plate (43).

2. The semiconductor reaction chamber according to claim 1, wherein: The sealing member (5) comprises an annular mounting groove (51) circumferentially provided in the middle of the outer wall of the annular top plate (43), an annular elastic sheet (52) arranged in the inner cavity of the annular mounting groove (51), and an elastic sealing ring (53) fixedly sleeved on the outer ring of the annular elastic sheet (52); The upper and lower sides of the elastic sealing ring (53) are respectively fitted with the upper and lower sides of the inner cavity of the annular mounting groove (51), and the outer ring wall of the elastic sealing ring (53) is movably connected to the inner cavity wall of the housing (1).

3. The semiconductor reaction chamber according to claim 2, wherein: The connecting mechanism (6) comprises an annular connecting shell (61) circumferentially arranged below the annular top plate (43), a connecting rod (62) vertically fixedly mounted on the top surface of the annular connecting shell (61), an annular impeller (63) rotating in the inner cavity of the annular connecting shell (61), and a limiting member (11) arranged at the bottom of the annular top plate (43) for fixing the connecting rod (62); The outer ring wall of the annular impeller (63) penetrates to the outside of the inner cavity of the annular connecting shell (61), and the outer ring wall of the annular impeller (63) is fixedly connected to the upper portion of the outer surface of the elastic plate (46), and the top end of the connecting rod (62) penetrates into the inner cavity of the annular mounting groove (51) and is fixedly connected to the bottom surface of the annular elastic sheet (52).

4. The semiconductor reaction chamber according to claim 3, wherein: A compression spring is movably sleeved on the upper portion of the outer surface of the connecting rod (62), and the upper and lower ends of the compression spring are fixedly connected to the inner cavity bottom surface of the annular mounting groove (51) and the bottom surface of the annular elastic sheet (52) respectively.

5. The semiconductor reaction chamber according to claim 3, wherein: The limiting member (11) includes a group of mounting channels equidistantly arranged in the circumferential direction on the lower portion of the outer wall of the annular top plate (43), a compression spring rod being fixedly installed transversely on a side of the inner cavity of the mounting channel away from the inner cavity wall of the shell (1), a cross bar fixed to the output end of the compression spring, a limiting hole provided on one side of the cross bar, and a limiting groove provided in the middle of the outer surface of the connecting rod (62) away from the inner cavity wall of the shell (1); The inner cavity of the limiting hole is movably connected to the outer surface of the connecting rod (62), and the inner cavity of the limiting hole is movably connected to the inner cavity of the limiting groove, and one end of the cross bar is movably connected to the inner ring wall of the convex ring.

6. The semiconductor reaction chamber according to claim 3, wherein: The air inlet member (7) comprises a group of air outlet holes (71) equidistantly arranged on the top surface of the annular airbag (45) in the circumferential direction, an air outlet valve (72) at the lower part of the inner cavity of the air outlet hole (71), and a connecting pipe (73) that moves up and down at the upper part of the inner cavity of the air outlet hole (71); The outer surface of the connecting tube (73) is fitted with the inner cavity of the air outlet (71), the air outlet end surface of the connecting tube (73) is fixedly connected to the inner wall of the annular connecting shell (61), and the inner cavity of the connecting tube (73) is connected to the inner cavity of the annular connecting shell (61).

7. The semiconductor reaction chamber according to claim 6, characterized in that: The air outlet valve (72) includes a vertical rod vertically arranged in the inner cavity of the air outlet hole (71), a connecting ring fixedly sleeved on the lower part of the vertical rod, an exhaust hole provided at the bottom end of the vertical rod, two diversion holes symmetrically provided on the left and right sides of the middle of the outer surface of the vertical rod and connected to the exhaust hole, a docking plate slidably sleeved on the upper part of the outer surface of the vertical rod, and two spring seats symmetrically arranged vertically on the left and right sides of the upper surface of the connecting ring; The output end of the spring seat is fixedly connected to the bottom surface of the docking plate, and the upper surface of the docking plate is movably connected to the bottom end of the connecting pipe (73).

8. The semiconductor reaction chamber according to claim 1, wherein: The detection mechanism (8) comprises a resistance rod (81) vertically fixedly mounted on the bottom surface of the filter cavity (48), a sliding resistance ring (82) slidably sleeved on the outer surface of the resistance rod (81), a material support shell (83) fixedly sleeved on the outer surface of the sliding resistance ring (82), and a resistance detection signal transmitter (84) fixed on the bottom surface of the inner cavity of the filter cavity (48); The outer wall of the support shell (83) is in contact with the inner cavity of the filter cavity (48), the resistance rod (81) and the sliding resistance ring (82) are both electrically connected to the resistance detection signal transmitter (84), and the bottom surface of the support shell (83) is connected to the bottom surface of the inner cavity of the filter cavity (48) through two symmetrically arranged spring push rods.

9. The semiconductor reaction chamber according to claim 1, wherein: A rotation groove is provided on the upper surface of the annular bottom plate (41) in a circumferential direction, the outer surface of the annular base (411) is movably connected to the inner cavity of the rotation groove, and a group of vent holes are provided on one side of the inner cavity bottom surface of the rotation groove at equal intervals in a circumferential direction, and a ventilation pipe is connected to the left side of the lower inner cavity of the shell (1).

10. The semiconductor reaction chamber according to claim 1, wherein: A nozzle is fixedly mounted on the middle of the sealing cover (2), a vacuum butt joint is fixedly mounted on the left side of the sealing cover (2), and an exhaust pipe is fixedly mounted on the right side of the sealing cover (2).

Images