Double-sided chamfering equipment

Abstract

The invention provides double-sided chamfering equipment, and belongs to the technical field of production and processing equipment. The first transferring piece is arranged on the working table top and comprises a first limiting part capable of moving in the horizontal direction, and the first limiting part is used for being detachably connected with the first chamfering face; the second transferring piece is arranged on the working table top and comprises a second limiting part capable of moving in the horizontal direction, and the second limiting part is used for being detachably connected with the second chamfering face; the number of the chamfering pieces is two, and the two chamfering pieces are arranged on the working table top, can move on the working table top in a three-dimensional mode and are used for conducting chamfering machining on the first chamfering face and the second chamfering face correspondingly; the double-sided chamfering machine has the advantage that double-sided chamfering machining of a machined part can be achieved through the double-sided chamfering machine.

Description

Technical Field

[0001] The invention belongs to the technical field of production and processing equipment, and in particular relates to a double-sided chamfering equipment. Background Art

[0002] Chamfering a workpiece refers to a method of forming a bevel or rounded shape by cutting or trimming the edge or corner of the workpiece. The purpose of this process is to improve the safety, durability and appearance of the workpiece and improve its functionality. Chamfering the workpiece can reduce the risk of injury caused by sharp edges or corners, eliminate stress concentration and extend the service life of the workpiece, while improving the appearance and aesthetics of the product. In addition, chamfering can also improve the matching accuracy and assembly performance of the workpiece, reduce fluid resistance, and improve the circulation effect. Therefore, chamfering of workpieces is an important process widely used to meet the requirements of safety, durability, appearance and functionality in various industries. Most of the existing chamfering machines are single-sided chamfering machines, which can only chamfer one side. For products that need to be chamfered on both sides, it is necessary to process one side first and then adjust the change of surface to process the other side, which greatly increases the operation time and labor costs. Summary of the invention

[0003] The purpose of the present invention is to solve the above problems in the prior art and to provide a device that can achieve double-sided chamfering of a workpiece.

[0004] The object of the present invention can be achieved by the following technical solutions: A double-sided chamfering device is used for chamfering a workpiece, wherein the workpiece includes a first chamfered surface and a second chamfered surface, comprising:

[0005] Work surfaces;

[0006] A first transfer member disposed on the work surface, the first transfer member comprising a first limit portion movable in a horizontal direction, the first limit portion being used for detachably connecting with the first chamfered surface;

[0007] A second transfer member disposed on the work surface, the second transfer member comprising a second limit portion movable in a horizontal direction, the second limit portion being used for being detachably connected to the second chamfered surface;

[0008] There are two chamfering pieces, which are arranged on the work surface and can realize three-dimensional movement on the work surface, and the two chamfering pieces are used to chamfer the first chamfered surface and the second chamfered surface respectively;

[0009] Among them, when the first limiting portion is connected to the first chamfered surface, the chamfering member chamfers the second chamfered surface, and when the chamfering of the second chamfered surface is completed, the second limiting portion is connected to the second chamfered surface, and the chamfering member chamfers the first chamfered surface.

[0010] In the above-mentioned double-sided chamfering equipment, a first air hole is arranged on the first limiting part, and a second air hole is arranged on the second limiting part, and both the first air hole and the second air hole can generate negative pressure gas and ejected gas, and the first limiting part and the second limiting part move in a straight line direction, and the straight line movement directions of the first limiting part and the second limiting part are parallel; wherein, when the workpiece is connected to the first limiting part, the first air hole generates negative pressure gas; when the chamfering process of the second chamfered surface is completed, the first air hole generates ejected gas, and the second limiting part generates negative pressure gas to receive the workpiece.

[0011] In the above-mentioned double-sided chamfering equipment, the first limiting part includes a first limiting block, and the first limiting block is provided with a first limiting groove. When the workpiece is placed in the first limiting groove, the edge surface of the workpiece at least abuts against the two side groove walls of the first limiting groove.

[0012] In the above-mentioned double-sided chamfering equipment, a support plate is further arranged on the work surface, and the bottom wall of the workpiece located in the first limiting groove abuts against the support plate.

[0013] In the above-mentioned double-sided chamfering equipment, a material moving part is provided on the first limit block, and the material moving part moves linearly along the length direction of the support plate. When the workpiece is chamfered, the material moving part abuts against the workpiece.

[0014] In the above-mentioned double-sided chamfering equipment, it also includes a feeding plate, the workpieces are linearly arranged on the feeding plate, and a lifting part moving along the arrangement direction of the workpieces is provided on the feeding plate, and the arrangement direction of the workpieces is perpendicular to the moving direction of the first limiting part.

[0015] In the above-mentioned double-sided chamfering equipment, a material blocking plate is arranged at the end of the feed plate, and a material blocking plate is also arranged on the feed plate along the arrangement direction of the workpieces. A discharge gap that can only accommodate one workpiece to be removed is formed between the material blocking plates.

[0016] In the above-mentioned double-sided chamfering equipment, a storage member is fixedly arranged on the work surface, and the storage member includes a baffle plate, which is located in the gas ejection direction of the second air hole, and a material receiving channel is arranged below the baffle plate.

[0017] In the above-mentioned double-sided chamfering equipment, a pushing part and a limiting plate that can move in a linear direction are arranged in the material receiving channel, the limiting plate is located at the end of the material receiving channel, and the pushing part is located in the material receiving channel. As the number of workpieces in the material receiving channel increases, the limiting plate gradually moves outward.

[0018] In the above-mentioned double-sided chamfering equipment, a conveyor belt is also arranged on the work surface, and the conveyor belt is located at the end of the material receiving channel. After the swinging of a row of workpieces is completed, the conveyor belt moves forward one working unit.

[0019] Compared with the prior art, the beneficial effects of the present invention are as follows: the first limiting portion is connected to the first chamfered surface of the chamfered part to fix the chamfered part, while exposing the second chamfered surface to the outside, and the chamfered part contacts the edge of the second chamfered surface to achieve chamfering of the second chamfered surface. After the second chamfered surface is processed, the processed second chamfered surface is fixed to the second limiting portion, and the chamfered part is separated from the connection with the first limiting portion, so that the first chamfered surface is exposed to the outside, thereby achieving processing of the first chamfered surface, so that the equipment in the present application can achieve double-sided chamfering of the workpiece. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is one of the three-dimensional structural schematic diagrams of the present invention;

[0021] Figure 2 This is the second schematic diagram of the three-dimensional structure of the present invention;

[0022] Figure 3 It is one of the partial structural schematic diagrams of the present invention;

[0023] Figure 4 It is one of the working state schematic diagrams of the present invention;

[0024] Figure 5 This is the second schematic diagram of the working state of the present invention;

[0025] Figure 6 This is the second schematic diagram of the local structure of the present invention.

[0026] In the figure, 100, work table; 200, first limiting part; 201, second limiting part; 202, first air hole; 203, first limiting block; 204, first limiting groove; 205, support plate; 206, material transfer column; 207, material transfer chute; 208, abutting groove wall; 209, chamfering piece; 300, feeding plate; 301, material lifting part; 302, material blocking plate; 303, material baffle plate; 400, baffle plate; 401, material pushing part; 402, limiting plate; 403, material receiving channel; 404, conveyor belt; 500, workpiece. DETAILED DESCRIPTION

[0027] The following are specific embodiments of the present invention and the accompanying drawings to further describe the technical solution of the present invention, but the present invention is not limited to these embodiments.

[0028] It should be noted that all directional indications in the embodiments of the present invention (such as up, down, left, right, front, back, etc.) are only used to explain the relative position relationship, movement status, etc. between the components under a certain specific posture (as shown in the accompanying drawings). If the specific posture changes, the directional indication will also change accordingly.

[0029] like Figure 1-Figure 6 As shown, a double-sided chamfering device is used for chamfering a workpiece 500, the workpiece 500 includes a first chamfered surface and a second chamfered surface, including:

[0030] Work surface 100;

[0031] A first transfer member is disposed on the work surface 100, and the first transfer member includes a first limit portion 200 that can move in the horizontal direction, and the first limit portion 200 is used to be detachably connected to the first chamfered surface;

[0032] A second transfer member is disposed on the work surface 100, and the second transfer member includes a second limit portion 201 that can move in the horizontal direction, and the second limit portion 201 is used to be detachably connected to the second chamfered surface;

[0033] There are two chamfering pieces 209, which are arranged on the work surface 100 and can realize three-dimensional movement on the work surface 100, and the two chamfering pieces 209 are used to chamfer the first chamfered surface and the second chamfered surface respectively;

[0034] Among them, when the first limiting portion 200 is connected to the first chamfered surface, the chamfering piece 209 chamfers the second chamfered surface, and when the chamfering of the second chamfered surface is completed, the second limiting portion 201 is connected to the second chamfered surface, and the chamfering piece 209 chamfers the first chamfered surface.

[0035] In this embodiment, the first limiting portion 200 is connected to the first chamfered surface of the chamfered member 209 to fix the chamfered member 209 and expose the second chamfered surface to the outside. The chamfered member 209 contacts the edge of the second chamfered surface to achieve chamfering of the second chamfered surface. When the second chamfered surface is processed, the processed second chamfered surface is fixed to the second limiting portion 201, and the chamfered member 209 is separated from the connection with the first limiting portion 200, so that the first chamfered surface is exposed to the outside, thereby achieving processing of the first chamfered surface, so that the equipment in this application can achieve double-sided chamfering of the chamfered member 209.

[0036] It should be noted that there are two chamfering pieces 209 , and the two chamfering pieces 209 are configured to process the first chamfered surface and the second chamfered surface respectively, and the two chamfering pieces 209 can work independently.

[0037] Specifically, a first air hole 202 is provided on the first limiting portion 200, and a second air hole is provided on the second limiting portion 201. Both the first air hole 202 and the second air hole can generate negative pressure gas and ejected gas, and the first limiting portion 200 and the second limiting portion 201 move in a straight line direction, and the straight line movement directions of the first limiting portion 200 and the second limiting portion 201 are parallel; wherein, when the workpiece 500 is connected to the first limiting portion 200, the first air hole 202 generates negative pressure gas; when the chamfering process of the second chamfered surface is completed, the first air hole 202 generates ejected gas, and the second limiting portion 201 generates negative pressure gas to receive the workpiece 500.

[0038] In this embodiment, the first limiting portion 200 and the second limiting portion 201 have the same connection and fixing method for the workpiece 500, both of which achieve fixation of the workpiece 500 by generating negative pressure through air holes, which is fast and stable. When the first limiting portion 200 is connected to the first chamfered surface, the connectivity of the chamfered edge of the second chamfered surface will not be destroyed. Similarly, when the second limiting portion 201 is connected to the second chamfered surface, the connectivity of the chamfered edge of the first chamfered surface will not be destroyed.

[0039] Specifically, the first limiting portion 200 includes a first limiting block 203 , on which a first limiting groove 204 is provided. When the workpiece 500 is placed in the first limiting groove 204 , the edge surface of the workpiece 500 at least abuts against two side groove walls of the first limiting groove 204 .

[0040] In this embodiment, the first limiting portion 200 has the same structure as the second limiting portion 201, so only the structure of the first limiting portion 200 is described in detail in this application. The existence of the first air hole 202 on the first limiting portion 200 can generate negative pressure to adsorb and fix the workpiece 500, and the existence of the first limiting groove 204 on the side of the first limiting block 203 can limit the relative position of the workpiece 500 on the first limiting block 203. The edge surface of the workpiece 500 at least abuts against the two side walls of the first limiting groove 204, that is, the abutting connection between the workpiece 500 and the first limiting block 203 realizes the position positioning in the horizontal direction, and the abutting connection between the workpiece 500 and the groove wall of the first limiting groove 204 realizes the position positioning in the vertical direction.

[0041] It is worth mentioning that the first limiting groove 204 is an open groove.

[0042] It should be noted that the first limiting block 203 is detachably connected to the work surface 100 , so that the first limiting block 203 adapted to the workpiece 500 of different shapes can be replaced.

[0043] Further preferably, a support plate 205 is further provided on the work surface 100 , and the bottom wall of the workpiece 500 located in the first limiting groove 204 abuts against the support plate 205 .

[0044] like Figure 1 As shown, as an optional solution, the support plate 205 is located below the first limit block 203, and the first limit block 203 can move linearly relative to the support plate 205. The support plate 205 is used to support the workpiece 500 in the horizontal direction, and the first limit groove 204 includes an abutment groove wall 208 located in the vertical direction, and an abutment groove wall 208 inclined to the abutment groove wall 208 in the vertical direction. The adsorption force generated by the first air hole 202 ensures that the workpiece 500 and the first limit block 203 will not separate. Then, the workpiece 500 is moved toward the abutment groove wall 208 in the vertical direction. Under the contact guiding action of the support plate 205 and the inclined abutment groove wall 208, when the workpiece 500 abuts against the abutment groove wall 208 in the vertical direction, it indicates that the position of the workpiece 500 has been placed at the specified position.

[0045] It is worth mentioning that the support plate 205 includes two integrally arranged support segments, both of which can be connected with the workpiece 500 to support the workpiece 500, and the length extension directions of the two support segments are parallel but not located in the same straight line direction.

[0046] Further preferably, a material moving portion is provided on the first limit block 203 , and the material moving portion moves linearly along the length direction of the support plate 205 , and when the workpiece 500 is chamfered, the material moving portion abuts against the workpiece 500 .

[0047] In this embodiment, the material moving part includes a material moving drive cylinder fixedly arranged on the first limit block 203, and a material moving column 206 is arranged on the driving shaft of the material moving drive cylinder. The material moving column 206 extends out through the material moving chute 207 on the first limit block 203. The material moving column 206 is located at the opening of the first limit groove 204. When the workpiece 500 is adsorbed on the first limit block 203, the material moving column 206 moves against the workpiece 500 and moves toward the direction of the vertically arranged abutment groove wall 208.

[0048] It should be noted that the opening direction of the first limiting groove 204 is opposite to the opening direction of the second limiting groove. Figure 5 As shown, the first limit block 203 ejects jet gas toward the workpiece 500, and the second limit block generates negative pressure gas, so as to move the workpiece 500 from the first limit block 203 to the second limit block. When the workpiece 500 moves from the first limit block 203 to the second limit block, the workpiece 500 is located in the second limit groove, but there is a gap between the workpiece 500 and the groove wall of the second limit groove. Subsequently, the material moving part is used to push the workpiece 500 to move until it is against the groove wall of the second limit groove.

[0049] Preferably, a feed plate 300 is further included, on which the workpieces 500 are linearly arranged, and a feed lift portion 301 is provided on the feed plate 300 for moving along the arrangement direction of the workpieces 500 , wherein the arrangement direction of the workpieces 500 is perpendicular to the moving direction of the first limiting portion 200 .

[0050] Further preferably, a material blocking plate 302 is provided at the end of the feed plate 300, and a material baffle plate 303 is also provided on the feed plate 300 along the arrangement direction of the workpieces 500, and a discharge gap that can only accommodate one workpiece 500 to be removed is formed between the material blocking plate 302 and the material baffle plate 303.

[0051] In this embodiment, a feed plate 300 is provided on the work surface 100, and baffle plates 303 are provided on both sides of the feed plate 300. A feed channel is formed between the two baffle plates 303 and the feed plate 300. A row of workpieces 500 are provided in the feed channel, and a blocking plate 302 is provided at the end of the feed plate 300. The blocking plate 302 can abut against and connect with the upper end of the workpiece 500 to block it. During the working process, Figure 4 As shown, the first limit block 203 first moves to the loading position, and the first air hole 202 on the first limit block 203 generates negative pressure to move a workpiece 500 in the feeding channel out of the feeding channel. After that, the moving part moves to push the workpiece 500 adsorbed on the first limit block 203 to the specified position.

[0052] It should be noted that after the first workpiece 500 is removed, the lifting portion 301 remains stationary, and when the first limit block 203 moves to the loading position again, the lifting portion 301 will push the workpiece 500 to move again, so that the workpiece 500 at the outermost end of the feeding channel is against the blocking plate 302.

[0053] like Figure 6 As shown, as a preference, a storage member is fixedly provided on the work surface 100 , and the storage member includes a baffle 400 , the baffle 400 is located in the gas ejection direction of the second air hole, and a material receiving channel 403 is provided below the baffle 400 .

[0054] In this embodiment, after the chamfering surface processing of the workpiece 500 is completed, the workpiece 500 needs to be moved out from the second limit block. At this time, the second air hole on the second limit block will generate gas spraying on the workpiece 500, and the workpiece 500 will be sprayed out from the second limit block. In order to ensure that the falling position of the workpiece 500 remains unchanged, a baffle 400 is provided on the work table 100. The second air hole sprays the workpiece 500 in the direction of the baffle 400, and the workpiece 500 collides with the baffle 400 and then falls down.

[0055] Further preferably, a pushing portion 401 and a limiting plate 402 that can move in a linear direction are provided in the material receiving channel 403, the limiting plate 402 is located at the end of the material receiving channel 403, and the pushing portion 401 is located in the material receiving channel 403. As the number of workpieces 500 in the material receiving channel 403 increases, the limiting plate 402 gradually moves outward.

[0056] In this embodiment, a gap is provided between the limit plate 402 and the pushing portion 401 to form a limit space for accommodating the workpiece 500. After the workpiece 500 falls into the limit space, the pushing portion 401 pushes the workpiece 500 toward the limit plate 402 until it abuts against the limit plate 402, and then the pushing portion 401 is reset. Before the next workpiece 500 falls or before the pushing portion 401 moves, the limit plate 402 moves outward by the length of the workpiece 500, and then the pushing portion extends out and abuts against the workpiece 500 that falls into the limit space, and pushes it toward the limit plate 402 until the previously fallen workpiece 500 abuts against the limit plate 402, and so on, to complete the linear arrangement of the workpieces 500.

[0057] Further preferably, a conveyor belt 404 is also provided on the work surface 100 . The conveyor belt 404 is located at the end of the material receiving channel 403 . After the swinging of a row of workpieces 500 is completed, the conveyor belt 404 moves forward by one working unit.

[0058] In this embodiment, there is a height difference between the conveyor belt 404 and the receiving channel 403 in the vertical direction, and the bottom surface of the receiving channel 403 is located above the surface of the conveyor belt 404. Then, when the pushing part 401 moves the workpiece 500 toward the limit plate 402, the workpiece 500 will fall from the receiving channel 403 onto the conveyor belt 404.

[0059] It should be noted that, in the present application, a plurality of sensors are provided to provide a reference for the position of the workpiece 500 and the sequential control of the processing steps.

[0060] It should be noted that in the present invention, descriptions such as "first", "second", "one", etc. are only used for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In the description of the present invention, the meaning of "multiple" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined. The terms "connected", "fixed", etc. should be understood in a broad sense. For example, "fixed" can be a fixed connection, a detachable connection, or an integral whole; it can be a mechanical connection or an electrical connection; it can be directly connected or indirectly connected through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to the specific circumstances.

[0061] In addition, the technical solutions between the various embodiments of the present invention can be combined with each other, but it must be based on the fact that ordinary technicians in the field can implement it. When the combination of technical solutions is contradictory or cannot be implemented, it should be deemed that such combination of technical solutions does not exist and is not within the scope of protection required by the present invention.

[0062] The specific embodiments described herein are merely examples of the spirit of the present invention. Those skilled in the art may make various modifications or additions to the specific embodiments described or replace them in similar ways, but they will not deviate from the spirit of the present invention or exceed the scope defined by the appended claims.

Claims

1. A double-sided chamfering device, used for chamfering a workpiece, wherein the workpiece comprises a first chamfered surface and a second chamfered surface, characterized in that: include: Work surfaces; A first transfer member disposed on the work surface, the first transfer member comprising a first limit portion movable in a horizontal direction, the first limit portion being used for detachably connecting with the first chamfered surface; A second transfer member disposed on the work surface, the second transfer member comprising a second limit portion movable in a horizontal direction, the second limit portion being used for being detachably connected to the second chamfered surface; There are two chamfering pieces, which are arranged on the work surface and can realize three-dimensional movement on the work surface, and the two chamfering pieces are used to chamfer the first chamfered surface and the second chamfered surface respectively; Among them, when the first limiting portion is connected to the first chamfered surface, the chamfering member chamfers the second chamfered surface, and when the chamfering of the second chamfered surface is completed, the second limiting portion is connected to the second chamfered surface, and the chamfering member chamfers the first chamfered surface.

2. A double-sided chamfering device according to claim 1, characterized in that: A first air hole is provided on the first limiting part, and a second air hole is provided on the second limiting part. Both the first air hole and the second air hole can generate negative pressure air and ejected air, and the first limiting part and the second limiting part move in a straight line direction, and the straight line movement directions of the first limiting part and the second limiting part are parallel; wherein, when the workpiece is connected to the first limiting part, the first air hole generates negative pressure air; when the chamfering process of the second chamfered surface is completed, the first air hole generates ejected air, and the second limiting part generates negative pressure air to receive the workpiece.

3. The double-sided chamfering device according to claim 1, characterized in that: The first limiting portion includes a first limiting block, and a first limiting groove is arranged on the first limiting block. When the workpiece is placed in the first limiting groove, the edge surface of the workpiece at least abuts against two side groove walls of the first limiting groove.

4. The double-sided chamfering device according to claim 1, characterized in that: A support plate is also provided on the work surface, and the bottom wall of the workpiece located in the first limiting groove abuts against the support plate.

5. The double-sided chamfering device according to claim 4, characterized in that: The first limit block is provided with a material moving part, and the material moving part moves linearly along the length direction of the support plate. When the workpiece is chamfered, the material moving part abuts against the workpiece.

6. The double-sided chamfering device according to claim 1, characterized in that: It also includes a feeding plate, on which the workpieces are linearly arranged. The feeding plate is provided with a lifting part that moves along the arrangement direction of the workpieces, and the arrangement direction of the workpieces is perpendicular to the movement direction of the first limiting part.

7. The double-sided chamfering device according to claim 6, characterized in that: A material blocking plate is arranged at the end of the feed plate, and a material blocking plate is also arranged on the feed plate along the arrangement direction of the workpieces. A material discharge gap that can only accommodate one workpiece to be moved out is formed between the material blocking plates.

8. The double-sided chamfering device according to claim 1, characterized in that: A storage member is fixedly arranged on the work surface, and the storage member includes a baffle plate, the baffle plate is located in the gas ejection direction of the second air hole, and a material receiving channel is arranged below the baffle plate.

9. The double-sided chamfering device according to claim 8, characterized in that: The material receiving channel is provided with a pushing portion and a limiting plate which can move in a linear direction. The limiting plate is located at the end of the material receiving channel, and the pushing portion is located in the material receiving channel. As the number of workpieces in the material receiving channel increases, the limiting plate gradually moves outward.

10. The double-sided chamfering device according to claim 9, characterized in that: A conveyor belt is also provided on the work surface and is located at the end of the material receiving passage. After the swinging of a row of workpieces is completed, the conveyor belt moves forward by one working unit.

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