Ion implantation and magnetron sputtering composite coating equipment

Abstract

The invention discloses ion implantation and magnetron sputtering composite coating equipment which comprises an ion implantation chamber, a coating chamber, an annealing chamber, a vacuumizing mechanism, a plurality of groups of sample racks, a transmission mechanism, a driving mechanism and a plurality of turnover vehicles. According to the composite coating equipment, multiple procedures are integrated, continuous and stable production of workpieces is achieved, the machining quality of the workpieces is ensured, and the machining efficiency is greatly improved.

Description

Technical Field

[0001] The invention relates to the technical field of parts coating, and in particular to an ion implantation and magnetron sputtering composite coating device. Background Art

[0002] With the continuous development and progress of domestic science and technology, the light source of high-power lasers in vacuum environment is a key component of the national aerospace and laser industry, and its intelligent manufacturing equipment is particularly important. The existing manufacturing equipment is a single device, each completing different processes. The light source device is circulated in the atmosphere, which will produce different degrees of pollution, resulting in unstable quality of the final product and extremely low output. Based on the above reasons, it is particularly important to develop a device for continuous composite coating of optical devices in a vacuum environment. Summary of the invention

[0003] In view of the above-mentioned defects or deficiencies in the prior art, it is desired to provide an ion implantation and magnetron sputtering composite coating equipment that integrates multiple processes, realizes continuous and stable production of workpieces, ensures the processing quality of workpieces, and greatly improves processing efficiency.

[0004] The present invention provides an ion implantation and magnetron sputtering composite coating device, comprising:

[0005] An ion implantation chamber, one side of which is connected to an ion cleaning source and the other side of which is connected to an ion implantation source;

[0006] A coating chamber is connected to one end of the ion implantation chamber, and both sides of the coating chamber are connected to the magnetron sputtering coating machine respectively; an isolation gate valve is provided between the coating chamber and the ion implantation chamber;

[0007] An annealing chamber is arranged at one end of the coating chamber far from the ion implantation chamber and communicated with the coating chamber, and an annealing heating mechanism is arranged therein; a water-cooled gate valve is arranged between the annealing chamber and the coating chamber;

[0008] A vacuum pumping mechanism, wherein the ion implantation chamber, the coating chamber and the annealing chamber are respectively connected to the vacuum pumping mechanisms independently of each other;

[0009] A plurality of sample racks, each of which is provided with a vertical central axis, and a plurality of workpieces are arranged on the sample rack at the periphery of the central axis, and the sample rack is used to drive the plurality of workpieces to revolve around the central axis, and to drive each workpiece to rotate;

[0010] A transmission mechanism, wherein the ion implantation chamber, the coating chamber and the annealing chamber are respectively provided with the transmission mechanism, and is used to receive the sample rack and transmit the sample rack to the next process;

[0011] A driving mechanism, the tops of the ion implantation chamber, the coating chamber and the annealing chamber are respectively provided with the driving mechanism extending into the respective interiors, the driving mechanism is detachably connected to the sample holder, and is used to drive the workpiece to revolve and rotate simultaneously;

[0012] A plurality of turnover vehicles are used to transport the sample racks to the input end of the ion implantation chamber and receive the sample racks output from the annealing chamber.

[0013] Furthermore, the ion implantation chamber, the coating chamber and the annealing chamber are fixedly arranged on a frame; and the vacuum pumping mechanism is fixedly arranged in the frame.

[0014] Furthermore, an input sealing door is provided at one end of the ion implantation chamber away from the coating chamber; and an output sealing door is provided at one end of the annealing chamber away from the coating chamber.

[0015] Furthermore, the annealing heating mechanism includes electric heating plates respectively arranged on the top and both sides of the annealing chamber; and the inner wall of the annealing chamber is provided with a heat insulation plate.

[0016] Furthermore, the vacuum pumping mechanism includes a vacuum pump, and the vacuum pump is connected to the corresponding ion implantation chamber, coating chamber or annealing chamber through a high-pressure pipeline.

[0017] Furthermore, the sample rack is provided with at least 6 groups;

[0018] The sample rack comprises a bottom plate, the central axis is rotatably arranged on the bottom plate through a first bearing seat, a gear ring is fixedly arranged on the bottom plate at the outer periphery of the central axis, rollers are respectively arranged on both sides of the bottom plate, and at least two groups of rollers are arranged on each side, and a support plate is fixedly arranged on the top of the central axis;

[0019] A transmission seat coaxial with the central axis is fixedly arranged on the top surface of the support plate, a positioning groove is provided on the top of the rotating seat, a plurality of slots are provided on the outer periphery of the top of the transmission seat, a plurality of rotation shafts are evenly distributed on the support plate on the outer periphery of the transmission seat, the rotation shaft is rotatably connected to the support plate through a second bearing seat near the bottom end, the bottom end of the rotation shaft passes through the support plate and is fixedly sleeved with a rotation gear meshing with the gear ring, the workpiece is detachably sleeved on the rotation shaft, and a nut is threadedly connected to the top end of the rotation shaft;

[0020] A rack seat is fixedly arranged on the bottom surface of the base plate, and an embedding groove is provided on the bottom surface of the rack seat along the transmission direction of the sample rack, a rack is embedded in the embedding groove so as to slide up and down, a plurality of long holes are provided on the rack along its length direction, and the long diameter of the long hole is arranged in the vertical direction, and corresponding limiting pins passing through the long holes are fixedly arranged in the rack seat, and a plurality of springs are arranged at the top of the rack in the embedding groove.

[0021] Furthermore, a first protective cover is fixedly provided on the outer side of the roller; a V-shaped groove is provided on the roller on at least one side of the base plate; a second protective cover is fixedly provided on the top surface of the support plate and located on the inner side of several of the rotating shafts, and an avoidance hole is provided on the second protective cover above the transmission seat.

[0022] Furthermore, the transmission mechanism includes two first guide rails arranged in parallel, the top of the first guide rails is in an inverted V shape corresponding to the V-shaped groove on the roller, a driving gear meshing with the rack is arranged between the two first guide rails, and a first motor driven to rotate by a first reducer is arranged on one side of the driving gear.

[0023] Furthermore, the driving mechanism includes a mounting frame, a z-axis module is fixedly provided on one side of the mounting frame, a sliding plate is transmission-connected to one side of the z-axis module, a frame plate is fixedly provided on the outer side of the sliding plate, a second motor and a second reducer are transmission-connected fixedly provided on the frame plate, a driving shaft transmission-connected to the second reducer is provided on the bottom surface of the frame plate, a connecting seat is fixedly provided on the bottom end of the driving shaft, a positioning pin matching the positioning groove is fixedly provided on the bottom of the connecting seat, and a card block matching the card slot is fixedly provided on the bottom of the connecting seat at the periphery of the positioning pin.

[0024] Furthermore, at least four turnover carts are provided, and the turnover carts include a frame, a universal wheel is provided at the bottom of the frame, and two parallel second guide rails are provided at the top, and the top of the second guide rail is in an inverted V shape corresponding to the V-shaped groove on the roller, and handrails are fixedly provided on both sides of the top of the frame, and blocks are provided at both ends of the sample rack on the second guide rail, and the blocks are rotatably connected to the frame.

[0025] Compared with the prior art, the beneficial effects of the present invention are:

[0026] (1) The composite coating equipment of the present invention is provided with an ion implantation chamber, a coating chamber and an annealing chamber which are connected in sequence and separated by a gate valve. After the workpiece is installed on the sample rack, it enters the evacuated ion implantation chamber, the coating chamber and the annealing chamber in sequence and completes the corresponding treatment, thus realizing the continuous processing of the workpiece in a vacuum environment and avoiding the problem that the workpiece is exposed to air when it turns between the various processes and affects the coating quality of the workpiece. The present application integrates the various processes of workpiece coating processing together and separates them by a gate valve, thereby ensuring the processing quality of the workpiece;

[0027] (2) The composite coating equipment of the present invention is provided with a sample rack and a driving mechanism. After the workpiece enters the ion implantation chamber, coating chamber or annealing chamber along with the sample rack, it can be driven by the driving mechanism to realize simultaneous revolution and rotation of the workpiece, thereby ensuring the uniformity of the coating on the workpiece and the processing quality of the workpiece;

[0028] (3) The composite coating equipment of the present invention is provided with a sample rack, a transmission mechanism and a turnover vehicle. After the workpiece is installed on the sample rack, the transmission mechanism realizes the automatic conversion between various processes; the turnover vehicle improves the convenience of loading and unloading the workpiece. Multiple groups of sample racks and multiple turnover vehicles are configured, so that workpieces can be processed in related processes in the ion implantation chamber, coating chamber and annealing chamber at the same time, and the placement, loading, unloading and removal of workpieces do not affect each other, which improves the smoothness of the workpiece coating processing and greatly improves the processing efficiency.

[0029] It should be understood that the contents described in the summary of the invention are not intended to limit the key or important features of the embodiments of the present invention, nor are they intended to limit the scope of the present invention. Other features of the present invention will become easily understood through the following description. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Other features, objects and advantages of the present invention will become more apparent from the detailed description of non-limiting embodiments made with reference to the following drawings:

[0031] Figure 1 It is a schematic diagram of the structure of ion implantation and magnetron sputtering composite coating equipment;

[0032] Figure 2 is a schematic diagram of the structure of the sample rack;

[0033] Figure 3 is a schematic diagram of the cross-sectional structure of the sample holder;

[0034] Figure 4 It is a schematic diagram of the distribution structure of the transmission mechanism, the driving mechanism and the sample rack;

[0035] Figure 5 This is a schematic diagram of the structure of the turnover vehicle and sample rack.

[0036] Numbers in the figure: 1, ion implantation chamber; 2, coating chamber; 3, annealing chamber; 4, vacuum pumping mechanism; 5, sample rack; 6, transmission mechanism; 7, driving mechanism; 8, turnover vehicle; 9, rack; 10, workpiece;

[0037] 11. Ion cleaning source; 12. Ion implantation source;

[0038] 21. Isolation gate valve;

[0039] 31. Water-cooled gate valve;

[0040] 51. Central axis; 52. Bottom plate; 53. First bearing seat; 54. Gear ring; 55. Roller; 56. Support plate; 57. Transmission seat; 58. Positioning groove; 59. Clamping groove; 510. Rotation shaft; 511. Second bearing seat; 512. Rotation gear; 513. Nut; 514. Rack seat; 515. Embedded groove; 516. Rack; 517. Long hole; 518. Limit pin; 519. Spring; 520. First shield; 521. V-shaped groove; 522. Second shield; 523. Avoidance hole;

[0041] 61. first guide rail; 62. driving gear; 63. first reducer; 64. first motor;

[0042] 71. mounting frame; 72. z-axis module; 73. sliding plate; 74. frame plate; 75. second motor; 76. second reducer; 77. drive shaft; 78. connecting seat; 79. positioning pin; 710. clamping block;

[0043] 81. Frame; 82. Universal wheel; 83. Second guide rail; 84. Handrail; 85. Stopper. DETAILED DESCRIPTION

[0044] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are only used to explain the relevant invention, rather than to limit the invention. It should also be noted that, for ease of description, only the parts related to the invention are shown in the accompanying drawings.

[0045] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the accompanying drawings and in combination with the embodiments.

[0046] Please refer to Figure 1 to Figure 5 , an embodiment of the present invention provides an ion implantation and magnetron sputtering composite coating device, comprising:

[0047] An ion implantation chamber 1, one side of which is connected to an ion cleaning source 11, and the other side of which is connected to an ion implantation source 12;

[0048] The coating chamber 2 is connected to one end of the ion implantation chamber 1, and both sides thereof are connected to the magnetron sputtering coating machine respectively; an isolation gate valve 21 is provided between the coating chamber 2 and the ion implantation chamber 1;

[0049] The annealing chamber 3 is connected to the coating chamber 2 and is located at one end away from the ion implantation chamber 1, and an annealing heating mechanism is arranged therein; a water-cooled gate valve 31 is arranged between the annealing chamber 3 and the coating chamber 2;

[0050] Vacuum pumping mechanism 4, the ion implantation chamber 1, the coating chamber 2 and the annealing chamber 3 are respectively connected to vacuum pumping mechanisms 4 that are independent of each other;

[0051] A plurality of sample racks 5, each of which is provided with a vertical central axis 51, and a plurality of workpieces 10 are arranged on the sample rack 5 at the periphery of the central axis 51, and the sample rack 5 is used to drive the plurality of workpieces 10 to revolve around the central axis 51 as an axis, and to drive each workpiece 10 to rotate;

[0052] A transmission mechanism 6 is provided in each of the ion implantation chamber 1, the coating chamber 2 and the annealing chamber 3, and is used to receive the sample rack 5 and transmit the sample rack 5 to the next process;

[0053] The driving mechanism 7 is provided on the top of the ion implantation chamber 1, the coating chamber 2 and the annealing chamber 3. The driving mechanism 7 is extended into the respective interiors. The driving mechanism 7 is detachably connected to the sample holder 5 and is used to drive the workpiece 10 to revolve and rotate at the same time.

[0054] A plurality of turnover vehicles 8 are used to transport the sample racks 5 to the input end of the ion implantation chamber 1 and receive the sample racks 5 output from the annealing chamber 3 .

[0055] In this embodiment, when the coating process of the workpiece 10 is performed, the sample rack 5 is first placed on the trolley 8, and then a plurality of workpieces 10 are placed on the sample rack 5. Then the trolley 8 is moved to the input end of the ion implantation chamber 1, the sample rack 5 is pushed into the ion implantation chamber 1, and the ion implantation chamber 1 is closed. Then the vacuuming mechanism 4 is used for vacuuming, and then the driving mechanism 7 is connected to the sample rack 5 in a transmission manner, and the sample rack 5 is driven to drive the workpiece 10 to revolve and rotate at the same time; then the ion cleaning source 11 is turned on to clean the surface of the workpiece, and then the ion implantation source 12 is turned on to implant metal ions into the surface of the workpiece 10, so as to improve the bonding strength between the coating and the workpiece 10.

[0056] Then, the isolation gate valve 21 is opened, and the sample rack 5 is transferred to the coating chamber 2 through the transfer mechanism 6, and then the isolation gate valve 21 is closed. Then, the driving mechanism 7 is connected to the sample rack 5, and the sample rack 5 is driven to drive the workpiece 10 to revolve and rotate at the same time; then, the magnetron sputtering coating machine is turned on to sputter coat the workpiece 10. At the same time, the new sample rack 5 is placed with the workpiece 10 and then sent to the ion implantation chamber 1 for cleaning and ion implantation.

[0057] Then open the water-cooled gate valve 31, transfer the sample rack 5 to the annealing chamber 3 through the transmission mechanism 6, and then close the water-cooled gate valve 31. Then connect the driving mechanism 7 to the sample rack 5, and drive the sample rack 5 to drive the workpiece 10 to revolve and rotate at the same time; then start the annealing heating mechanism to anneal the workpiece. At the same time, the workpiece 10 that has been cleaned and ion-implanted enters the coating chamber 2 with the sample rack 5 for sputtering coating processing; and the new sample rack 5 is placed with the workpiece 10 and sent to the ion implantation chamber 1 for cleaning and ion implantation.

[0058] After the workpiece 10 on the frontmost sample rack 5 has completed the annealing process, the annealing chamber 3 is depressurized and opened, and the sample rack 5 is output through the transmission mechanism 6. The turnover vehicle 8 receives the sample rack 5 and transports it to the storage place for unloading. After the workpiece 10 is cooled, it is unloaded from the sample rack 5.

[0059] The composite coating equipment of the present application realizes continuous processing of the workpiece 10 in a vacuum environment, avoids the problem that the workpiece 10 contacts the air when circulating between various processes and affects the coating quality of the workpiece, and ensures the processing quality of the workpiece; when the workpiece 10 is processed in each process, it is driven by the driving mechanism 7 to realize the simultaneous revolution and rotation of the workpiece 10, thereby ensuring the uniformity of the coating of the workpiece 10 and ensuring the processing quality of the workpiece 10; the transmission mechanism 6 and the turnover vehicle 8 cooperate to improve the smoothness of the coating processing of the workpiece 10, thereby greatly improving the processing efficiency.

[0060] In a preferred embodiment, if Figure 1 As shown, the ion implantation chamber 1, the coating chamber 2 and the annealing chamber 3 are fixedly arranged on the frame 9; the vacuum pumping mechanism 4 is fixedly arranged in the frame 9, and the equipment structure layout is compact and occupies little space.

[0061] In a preferred embodiment, an input sealing door (not shown in the figure) is provided at one end of the ion implantation chamber 1 away from the coating chamber 2. When opened, the sample rack 5 is allowed to enter, and when closed, the ion implantation chamber 1 is sealed to ensure a vacuum processing environment; an output sealing door (not shown in the figure) is provided at one end of the annealing chamber 3 away from the coating chamber. When opened, the sample rack 5 is allowed to be output, and when closed, the annealing chamber 3 is sealed to ensure a vacuum processing environment.

[0062] In a preferred embodiment, the annealing heating mechanism includes electric heating plates respectively arranged on the top and both sides of the annealing chamber 3 to perform annealing and heating treatment on the workpiece 10; the inner wall of the annealing chamber 3 is provided with a heat insulation plate to reduce heat loss and improve the efficiency of the electric heating plate.

[0063] In a preferred embodiment, if Figure 1 As shown, the vacuum pumping mechanism 4 includes a vacuum pump, which is connected to the corresponding ion implantation chamber 1, coating chamber 2 or annealing chamber 3 through a high-pressure pipeline. The ion implantation chamber 1, coating chamber 2 and annealing chamber 3 are respectively equipped with independent vacuum pumping mechanisms 4, so that the ion implantation chamber 1, coating chamber 2 and annealing chamber 3 can process the workpieces 10 therein at the same time.

[0064] In a preferred embodiment, if Figure 2 and Figure 3 As shown, the sample rack 5 is provided with at least 6 groups;

[0065] The sample rack 5 includes a bottom plate 52, a central shaft 51 is rotatably disposed on the bottom plate through a first bearing seat 53, a gear ring 54 is fixedly disposed on the bottom plate 52 at the periphery of the central shaft 51, rollers 55 are respectively disposed on both sides of the bottom plate 52, and at least two groups of rollers 55 are disposed on each side, and a support plate 56 is fixedly disposed on the top of the central shaft 51;

[0066] A transmission seat 57 coaxial with the central axis 51 is fixedly arranged on the top surface of the support plate 56, a positioning groove 58 is opened at the top of the rotation seat 57, and a plurality of slots 59 are opened on the outer periphery of the top of the transmission seat 57. A plurality of self-rotating shafts 510 are evenly distributed on the outer periphery of the transmission seat 57 on the support plate 56. The self-rotating shaft 510 is rotatably connected to the support plate 56 through a second bearing seat 511 near the bottom end. A self-rotating gear 512 meshing with the gear ring 54 is fixedly sleeved at the bottom end of the self-rotating shaft 510. The workpiece 10 is detachably sleeved on the self-rotating shaft 510, and a nut 513 is threadedly connected to the top end of the self-rotating shaft 510.

[0067] A rack seat 514 is fixedly provided on the bottom surface of the base plate 52, and a groove 515 is provided on the bottom surface of the rack seat 514 along the transmission direction of the sample rack 5, and a rack 516 is slidably embedded in the groove 515, and a plurality of long holes 517 are provided on the rack 516 along its length direction, and the long diameter of the long hole 517 is arranged in the vertical direction. A corresponding limiting pin 518 passing through the long hole 517 is fixedly provided in the rack seat 514, and a plurality of springs 519 are arranged at the top of the rack 516 in the groove 515.

[0068] In this embodiment, each production line is equipped with at least 6 groups of sample racks 5 to meet the minimum demand for the circulation of workpieces 10. Depending on the processing conditions, the sample racks 5 can be increased to 8 groups, 10 groups, or even more. The workpiece 10 is in the shape of a hollow cylinder and is fixed to the rotating shaft 510 by a nut 513. In some other embodiments, the fixing structure can be adaptively adjusted according to the different structures of the workpiece 10. When the workpiece 10 is placed, a protective cover can be used to cover the part that is not to be coated to ensure the accuracy of its processing part. The rack 516 adopts an elastic buffer structure, and the sample rack 5 can play a buffering and protective role when switching between different transmission mechanisms 6, thereby improving the structural safety of the sample rack 5.

[0069] When processing the workpiece 10, the drive mechanism 7 is connected with the transmission seat 57 by clamping; the inner diameter of the top of the positioning groove 58 gradually increases from bottom to top, and the width of the clamping groove 59 gradually increases from bottom to top, forming a guide structure to ensure accurate clamping with the driving end of the drive mechanism 7. The drive mechanism 7 drives the support plate 56 to rotate through the transmission seat 57, thereby driving each workpiece 10 to revolve around the central axis 51; while the workpiece 10 revolves, the self-rotating gear 512 cooperates with the gear ring 54 to drive the workpiece 10 to rotate. The structural design is ingenious, ensuring the processing quality of the workpiece 10.

[0070] In a preferred embodiment, if Figure 2 and Figure 3 As shown, a first protective cover 520 is fixedly provided on the outer side of the roller 55 to protect the roller 55 so as to ensure the smooth movement of the sample rack 5; a V-shaped groove 521 is provided on the roller 55 on at least one side of the bottom plate 52 to guide the movement of the sample rack 5 and improve the accuracy of the movement of the sample rack 5; a second protective cover 522 is fixedly provided on the top surface of the support plate 56 and located inside the plurality of rotating shafts 510 to protect the structure inside the workpiece 10; an avoidance hole 523 is provided on the second protective cover 522 and located above the transmission seat 57 so as not to affect the transmission connection between the drive mechanism 7 and the transmission seat 57.

[0071] In a preferred embodiment, if Figure 1 and Figure 4 As shown, the transmission mechanism 6 includes two first guide rails 61 arranged in parallel, the top of the first guide rail 61 corresponds to the V-shaped groove 521 on the roller 55 and is in an inverted V shape, a driving gear 62 meshing with the rack 516 is arranged between the two first guide rails 61, and a first motor 64 driven to rotate by a first reducer 63 is arranged on one side of the driving gear 62.

[0072] In this embodiment, the first motor 64 drives the driving gear 62 to rotate through the first reducer 63, and drives the sample rack 5 to move on the first guide rail 61 through the rack 516, with stable driving and large output torque. The number of driving gears 62 can be set according to the distance between two adjacent groups of transmission mechanisms 6 to meet the requirements of smooth transmission of the sample rack 5. The transmission mechanism 6 realizes the automatic flow of the workpiece 10 between various processes, thereby improving the processing efficiency of the workpiece 10.

[0073] In a preferred embodiment, if Figure 1 and Figure 4 As shown, the driving mechanism 7 includes a mounting frame 71, a z-axis module 72 is fixedly provided on one side of the mounting frame 71, a sliding plate 73 is transmission-connected to one side of the z-axis module 72, a frame plate 74 is fixedly provided on the outer side of the sliding plate 73, a second motor 75 and a second reducer 76 are fixedly provided on the frame plate 74 for transmission connection, a driving shaft 77 transmission-connected to the second reducer 76 is provided on the bottom surface of the frame plate 74, a connecting seat 78 is fixedly provided on the bottom end of the driving shaft 77, a positioning pin 79 matching the positioning slot 58 is fixedly provided on the bottom of the connecting seat 78, and a card block 710 matching the card slot 59 is fixedly provided on the outer periphery of the positioning pin 79 at the bottom of the connecting seat 78.

[0074] In this embodiment, the driving mechanism 7 is installed on the top of the ion implantation chamber 1, the coating chamber 2 or the annealing chamber 3 through the mounting frame 71, and the driving shaft 77 extends into the corresponding ion implantation chamber 1, the coating chamber 2 or the annealing chamber 3. When the sample rack 5 is driven, the z-axis module 72 drives the driving shaft 77 downward through the frame plate 74, and first the positioning pin 79 is inserted into the positioning groove 58, and then each card block 710 is respectively inserted into the corresponding card groove 59, completing the transmission connection. At this time, the second motor 75 drives the connecting seat 78 to rotate through the second reducer 76, thereby driving the workpiece 10 to revolve and rotate, ensuring the uniformity of the coating of the workpiece 10.

[0075] In a preferred embodiment, if Figure 1 and Figure 5 As shown, at least four turnover carts 8 are provided, and the turnover carts 8 include a frame 81. A universal wheel 82 is provided at the bottom of the frame 81, and two parallel second guide rails 83 are provided at the top. The top of the second guide rail 83 corresponds to the V-shaped groove 521 on the roller 55 and is in an inverted V shape. Handrails 84 are fixedly provided on both sides of the top of the frame 81, and blocks 85 are provided at both ends of the sample rack 5 on the second guide rail 83, and the blocks 85 are rotatably connected to the frame 81.

[0076] In this embodiment, the sample rack 5 can be moved along the second guide rail 83 on the carriage 81 to facilitate loading and unloading. The sample rack 5 on the second guide rail 83 can be limited by the stopper 85 to prevent the sample rack 5 from slipping during transportation. After being transported to the right place, the stopper 85 is rotated to one side to avoid the sample rack 5, so that the sample rack 5 can be loaded and unloaded smoothly.

[0077] When the trolley 8 receives the sample rack 5 output from the annealing chamber 3, the block 85 at the proximal end is in the avoidance position, and the block 85 at the distal end is in the limit position. After the sample rack 5 enters the second guide rail 83 by inertia, it is stopped by the block 85, and the block 85 at the proximal end is rotated to limit the sample rack 5 on the second guide rail 83, which is convenient to operate and highly safe.

[0078] Preferably, positioning components are respectively provided at both ends of the frame 81 and the rack 9, using two positioning rods and two matching positioning guide sleeves, which are respectively installed on the frame 81 and the rack 9 to ensure that the second guide rail 83 is aligned with the first guide rail 61 to ensure accurate transportation of the sample rack 5.

[0079] In the description of this specification, the terms "connection", "installation", "fixation" and the like should be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a direct connection or an indirect connection through an intermediate medium. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0080] In the description of this specification, the description of the terms "one embodiment", "some embodiments", etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner.

[0081] The above are only preferred embodiments of the present application and are not intended to limit the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. An ion implantation and magnetron sputtering composite coating device, characterized in that: include: An ion implantation chamber (1), one side of which is connected to an ion cleaning source (11) and the other side of which is connected to an ion implantation source (12); A coating chamber (2) is arranged at one end of the ion implantation chamber (1) and is connected to the magnetron sputtering coating machine on both sides; an isolation gate valve (21) is arranged between the coating chamber (2) and the ion implantation chamber (1); An annealing chamber (3) is arranged in communication with the coating chamber (1) at one end away from the ion implantation chamber (1), and an annealing heating mechanism is arranged therein; a water-cooled gate valve (31) is arranged between the annealing chamber (3) and the coating chamber (2); A vacuum pumping mechanism (4), wherein the ion implantation chamber (1), the coating chamber (2) and the annealing chamber (3) are respectively connected to the vacuum pumping mechanism (4) which is independent of each other; A plurality of sample racks (5), each of which is provided with a vertical central axis (51), a plurality of workpieces (10) being arranged on the sample rack (5) at the periphery of the central axis (51), and the sample rack (5) being used to drive the plurality of workpieces (10) to revolve around the central axis (51) and to drive each workpiece (5) to rotate; A transmission mechanism (6), wherein the ion implantation chamber (1), the coating chamber (2) and the annealing chamber (3) are respectively provided with the transmission mechanism (6), and are used to receive the sample rack (5) and transmit the sample rack (5) to the next process; A driving mechanism (7), the tops of the ion implantation chamber (1), the coating chamber (2) and the annealing chamber (3) are respectively provided with the driving mechanism (7) extending into the respective interiors, the driving mechanism (7) being detachably connected to the sample holder (5) for driving the workpiece (10) to revolve and rotate simultaneously; A plurality of turnover vehicles (8) are used to transport the sample racks (5) to the input end of the ion implantation chamber (1) and to receive the sample racks (5) output from the annealing chamber (3).

2. The ion implantation and magnetron sputtering composite coating equipment according to claim 1, characterized in that: The ion implantation chamber (1), the coating chamber (2) and the annealing chamber (3) are fixedly arranged on a frame (9); and the vacuum pumping mechanism (4) is fixedly arranged in the frame (9).

3. The ion implantation and magnetron sputtering composite coating equipment according to claim 1, characterized in that: An input sealing door is provided at one end of the ion implantation chamber (1) away from the coating chamber (1); and an output sealing door is provided at one end of the annealing chamber (3) away from the coating chamber (2).

4. The ion implantation and magnetron sputtering composite coating equipment according to claim 1, characterized in that: The annealing heating mechanism comprises electric heating plates respectively arranged at the top and both sides of the annealing chamber (3); the inner wall of the annealing chamber (3) is provided with a heat insulation plate.

5. The ion implantation and magnetron sputtering composite coating equipment according to claim 1, characterized in that: The vacuum pumping mechanism (4) comprises a vacuum pump, and the vacuum pump is connected to the corresponding ion implantation chamber (1), coating chamber (2) or annealing chamber (3) through a high-pressure pipeline.

6. The ion implantation and magnetron sputtering composite coating equipment according to claim 1, characterized in that: The sample rack (5) is provided with at least 6 groups; The sample rack (5) comprises a bottom plate (52), the central axis (51) is rotatably arranged on the bottom plate (52) via a first bearing seat (53), a gear ring (54) is fixedly arranged on the bottom plate (52) at the outer periphery of the central axis (51), rollers (55) are respectively arranged on both sides of the bottom plate (52), and at least two groups of the rollers (55) are arranged on each side, and a support plate (56) is fixedly arranged on the top of the central axis (51); A transmission seat (57) coaxial with the central axis (51) is fixedly arranged on the top surface of the support plate (56); a positioning groove (58) is provided at the top of the rotation seat (57); a plurality of slots (59) are provided on the outer periphery of the top of the transmission seat (57); a plurality of self-rotating shafts (510) are evenly distributed on the support plate (56) and located on the outer periphery of the transmission seat (57); the self-rotating shaft (510) is rotatably connected to the support plate (56) through a second bearing seat (511) near the bottom end; the bottom end of the self-rotating shaft (510) passes through the support plate (56) and is fixedly sleeved with a self-rotating gear (512) meshing with the gear ring (54); the workpiece (10) is detachably sleeved on the self-rotating shaft (510); and a nut (513) is threadedly connected to the top of the self-rotating shaft (510); A rack seat (514) is fixedly arranged on the bottom surface of the bottom plate (52), and an embedding groove (515) is provided on the bottom surface of the rack seat (514) along the transmission direction of the sample rack (5), and a rack (516) is embedded in the embedding groove (515) so as to slide up and down. A plurality of long holes (517) are provided on the rack (516) along its length direction, and the long diameter of the long hole (517) is arranged in the vertical direction. A corresponding limiting pin (518) passing through the long hole (517) is fixedly arranged in the rack seat (514), and a plurality of springs (519) are arranged at the top of the rack (516) in the embedding groove (515).

7. The ion implantation and magnetron sputtering composite coating equipment according to claim 6, characterized in that: A first protective cover (520) is fixedly provided on the outer side of the roller (55); a V-shaped groove (521) is provided on the roller (55) on at least one side of the bottom plate (52); a second protective cover (522) is fixedly provided on the top surface of the support plate (52) and located on the inner side of the plurality of rotating shafts (510); and an avoidance hole (523) is provided on the second protective cover (522) and located above the transmission seat (57).

8. The ion implantation and magnetron sputtering composite coating equipment according to claim 7, characterized in that: The transmission mechanism (6) comprises two first guide rails (61) arranged in parallel, the top of the first guide rail (61) corresponding to the V-shaped groove (521) on the roller (55) presenting an inverted V shape, a driving gear (62) meshing with the rack (516) being arranged between the two first guide rails (61), and a first motor (64) driven to rotate via a first reducer (63) being arranged on one side of the driving gear (62).

9. The ion implantation and magnetron sputtering composite coating equipment according to claim 6, characterized in that: The driving mechanism (7) comprises a mounting frame (71), a z-axis module (72) is fixedly arranged on one side of the mounting frame (71), a sliding plate (73) is transmission-connected to one side of the z-axis module (72), a frame plate (74) is fixedly arranged on the outer side of the sliding plate (73), a second motor (75) and a second reducer (76) which are transmission-connected are fixedly arranged on the frame plate (74), a driving shaft (77) which is transmission-connected to the second reducer (76) is arranged on the bottom surface of the frame plate (74), a connecting seat (78) is fixedly arranged at the bottom end of the driving shaft (77), a positioning pin (79) which matches the positioning groove (58) is fixedly arranged on the bottom of the connecting seat (78), and a clamping block (710) which matches the clamping groove (59) is fixedly arranged on the outer periphery of the positioning pin (79) at the bottom of the connecting seat (78).

10. The ion implantation and magnetron sputtering composite coating equipment according to claim 7, characterized in that: At least four of the turnover vehicles (8) are provided. The turnover vehicles (8) include a frame (81). A universal wheel (82) is provided at the bottom of the frame (81). Two parallel second guide rails (83) are provided at the top. The top of the second guide rail (83) is in an inverted V shape corresponding to the V-shaped groove (521) on the roller (55). Handrails (84) are fixedly provided on both sides of the top of the frame (81). Stoppers (85) are provided at both ends of the sample rack (5) on the second guide rail (83). The stoppers (85) are rotatably connected to the frame (81).

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