A device and method for uniform treatment of DBD powders based on resonance dispersion

Abstract

The application provides a DBD powder uniform treatment device and invention based on resonance dispersion, which is used for inorganic material powder and organic material powder, including nano magnesium oxide or cross-linked polyethylene powder, and is characterized in that a plurality of tungsten rod fixing holes are arranged on the inner wall of a quartz reactor, an upper seat ring cover is arranged on the upper part of the quartz reactor, a lower seat ring cover is arranged on the lower part of the quartz reactor, the tungsten rods are exposed from the two sides of the quartz reactor, are connected with an electric wire, an excitation power supply and a ground electrode, working gas and reactor medium enter the quartz reactor through a gas inlet, a lower fixed compression sheet is tightly connected with the upper surface of the upper seat ring cover, the lower surface of a compression device base is tightly connected with the upper surface of an excitation instrument, and the upper surface is tightly connected with the lower seat ring cover. The application makes the powder treatment effect better. When low-temperature plasma treatment is used, a vertical vibration structure is adopted, the upper and lower vibration is used, acoustic resonance is used, the powder treatment is more uniform, the whole treatment is more airtight, and the powder leakage problem is solved.

Description

Technical Field

[0001] The invention belongs to the field of powder uniform processing and relates to a DBD powder uniform processing device and method based on resonance dispersion. Background Art

[0002] Nanoparticles, due to their unique physical and chemical properties, have shown tremendous potential for application in many fields. Uniformly dispersing nanoparticles within a matrix can significantly improve material performance, leading to innovation and breakthroughs in diverse fields such as engineering, the environment, and energy. For example, nanoparticles can be used in coatings and structural materials to enhance their heat resistance and corrosion resistance, thereby extending their service life.

[0003] At the same time, in order to meet various demands for nanoparticles, it is crucial to uniformly treat the surface of the nanoparticles. Uniform dispersion can maximize the efficiency and effect of the surface treatment of nanoparticles, thereby improving the mechanical properties, thermal stability, chemical stability and other properties of the powder particles during use. In addition, the uniform dispersion treatment can also avoid the problem of uneven material properties caused by the aggregation of nanoparticles, ensuring the reliability and durability of the material. However, the use of traditional powder surface treatment methods often leads to problems such as poor powder surface modification effect, uneven powder during treatment and agglomeration, too long treatment time, overly complicated methods or large amounts of waste liquid generated. Therefore, it is necessary to improve the method of powder modification treatment to achieve the purpose of uniform powder treatment, high powder surface treatment efficiency and less environmental harm.

[0004] Traditional methods for powder surface treatment include chemical methods such as sol-gel and atomic layer deposition, as well as physical methods such as vibration dispersion. The sol-gel method uses a hydrolysis reaction or catalyst to synthesize a low-viscosity medium, known as a sol, which is then placed into the sol and stirred evenly. After drying, a gel film coats the surface of the particles. However, the coating process is difficult to control, resulting in poor conformal properties during the coating process and wastewater contamination. Atomic layer deposition is a chemical method in which precursors and reactants are sequentially pulsed into a chamber to react on the substrate surface. While this method can control the thickness of the film, the film growth on the coated nanoparticles is slow and the specific operation is complex and demanding, affecting production efficiency. The first two chemical methods pose environmental risks and complex operations, while physical methods are relatively simple. The main method is vibration dispersion. This method involves adding material particles to a target solution and then using vibration to disperse them to improve their dispersibility. Drying and forming are then performed. This method can effectively disperse material particles by utilizing the cavitation effect of vibration-generated sound waves. However, since it is a physical method, there is a risk of interface incompatibility when the properties of the treated particles and the modifier are too different, resulting in poor bonding strength of the nanoparticles coated with this method and easy detachment of the film. Summary of the Invention

[0005] 1. Technical problems to be solved:

[0006] How to improve the powder modification method to achieve the goals of uniform powder treatment, high powder surface treatment efficiency and less environmental harm.

[0007] 2. Technical solution:

[0008] In order to solve the above problems, the present invention provides a DBD powder uniform processing device based on resonance dispersion, which is used for inorganic material powder and organic material powder, including nano magnesium oxide or cross-linked polyethylene powder, including a quartz reactor, wherein a plurality of tungsten rod fixing holes for fixing tungsten rods are provided in the shell of the quartz reactor, an upper ring cover is provided above the quartz reactor, and a lower ring cover is provided below the quartz reactor, and the tungsten rods are exposed from both sides of the quartz reactor, and wires are connected to the excitation power supply and the ground electrode through the upper ring cover hole in the upper ring cover and the lower ring cover hole in the lower ring cover respectively. The upper circular ring cover is provided with an air outlet and an air inlet, and the working gas and reactor medium enter the quartz reactor through the air inlet. The compressor includes a fixed compression plate, a compressor vertical rod and a compressor base. The upper part of the compressor vertical rod is connected to the fixed threaded plate, and the lower part is connected to the compressor base. The fixed threaded plate is provided with a threaded hole, and the screw head of the fixing screw passes through the threaded hole and is connected to the fixed compression plate located below the fixed threaded plate. The fixed compression plate is tightly connected to the upper surface of the upper circular ring cover, the lower surface of the compressor base is tightly connected to the upper surface of the exciter, and the upper surface is tightly connected to the lower circular ring cover.

[0009] The upper ring cover includes an upper ring cover boss, an upper ring groove, an upper ring outer cone and an upper ring middle cone. The upper ring cover boss has the same diameter as the inner circle of the inner wall of the quartz reactor. The upper ring groove leaves space for the exposed tungsten rod. The upper ring outer cone, the upper ring middle cone and the base of the quartz reactor are in contact to complete a hard connection.

[0010] The lower circular ring cover includes a lower circular ring cover boss, a lower circular ring outer cone, a lower circular ring groove and a lower circular ring middle cone. The lower circular ring cover boss and the inner circle diameter of the inner wall of the quartz reactor are the same. The lower circular ring groove leaves space for the exposed tungsten rod. The lower circular ring outer cone, the lower circular ring middle cone and the base of the quartz reactor are in contact to complete a hard connection.

[0011] The length of the tungsten rod fixing hole is smaller than the length of the quartz reactor.

[0012] It also includes a current coil, a high-voltage probe and an oscilloscope. The oscilloscope is used to collect voltage and current waveforms during the experiment. When measuring high-voltage signals, the high-voltage probe can directly measure the high-voltage signals. The current coil is used for current blocking, tuning and frequency selection.

[0013] The excitation power supply is a nanosecond pulse power supply.

[0014] The present invention also provides a method for uniformly processing DBD powder based on resonance dispersion, using the DBD powder uniformly processing device based on resonance dispersion, comprising the following steps:

[0015] Step S01: Tightly connect the base of the compressor and the vibration instrument, insert multiple tungsten rods into the tungsten rod mounting holes of the quartz reactor respectively, and pass the exposed parts of the tungsten rods through the upper ring cover hole in the upper ring cover and the lower ring cover hole in the lower ring cover through two lead wires to connect the excitation power supply and the ground electrode.

[0016] Step S02: Connect the lower ring cover and the quartz reactor to the corresponding positions, add the nanopowder to be processed into the quartz reactor, cover it with the upper ring cover, place the quartz reactor bottle on the pressing base, wait for the pressing to be tightened, and complete the installation of the quartz reactor bottle;

[0017] Step S03: Enter the gas supply phase.

[0018] Step S04: Tighten the clamp: Tighten the fixing screws to tightly connect the fixed clamping piece and the upper ring cover.

[0019] Step S05: Turn on the vibration instrument and adjust the vibration parameters of the vibration instrument so that the powder in the reactor vibrates along with the vibration instrument;

[0020] Step S06: While ensuring that the gas concentration in the device is high, enter the power debugging link, turn on the power and adjust the power parameters. When a stable discharge plasma is generated, keep the power parameters unchanged and stabilize the discharge to treat the nanopowder.

[0021] Step S07: After the processing is completed, the vibration instrument is turned off, the power is turned off, the reaction is completed, and then the air intake is stopped, and the entire reaction process is completed.

[0022] Flexible airtight tape is wrapped around the connection between the upper circular ring cover and the quartz reactor, and between the lower circular ring cover and the quartz reactor.

[0023] The specific method of step S03 is: the working gas is argon, helium or nitrogen, and the gas flow is detected in real time by a flow meter. After ventilation for a period of time, when the corresponding ventilated Ar gas in the quartz reactor reaches the set concentration, the entire device is then connected, and then the high-pressure gas cylinder is opened, and the Ar and the reaction medium generated by the bubbling device can be introduced into the quartz reactor together.

[0024] The voltage adjustment range of the nanosecond pulse power supply is 500 V-30 kV, the frequency adjustment range is 500 Hz-20 kHz, the pre-ventilation flow rate adjustment range is 10 mL / min-1 L / min, the pre-ventilation time is 1 min-5 min, the particle powder processing diameter range is between 10 nm-200 μm, the vibration frequency range of the exciter is between 58 Hz-62 Hz, and the excitation force can be adjusted according to the actual weight of the entire device, and the excitation force range is between 20 N-800 N.

[0025] 3. Beneficial effects:

[0026] The application aims at the problem of insufficient interface combination in traditional physical treatment, uses plasma to excite the surface active groups of powder, so that the powder treatment effect is better. In view of the problem of a large amount of waste liquid and environmental pollution in chemical treatment, the low-temperature plasma treatment has the characteristics of no pollution, so that the whole treatment process is more environmentally friendly. At the same time, the device structure adopts a vertical vibration structure, in view of the problem of uneven treatment effect of the traditional coaxial DBD part in powder treatment, a vibration table is added to vibrate up and down, uses acoustic resonance to make the powder treatment more uniform, and the whole treatment is more airtight, solves the problem of powder leakage BRIEF DESCRIPTION OF DRAWINGS

[0027] Figure 1 It is a whole structure schematic diagram of the DBD powder uniform treatment device based on resonance dispersion.

[0028] Figure 2 It is a schematic diagram of plasma vibration treatment of nano-powder material.

[0029] Figure 3 It is a schematic diagram of the reactor part of the plasma device involved in the application.

[0030] Figure 4 It is a schematic diagram of the electrode part of the device.

[0031] Figure 5 It is a schematic diagram of the upper seat ring cover device.

[0032] Figure 6 It is a schematic diagram of the lower seat ring cover device.

[0033] Figure 7 It is a schematic diagram of the compactor device.

[0034] Figure 8 It is a schematic diagram of the method flow of DBD treatment of nano-powder.

[0035] Explanation of Reference Numerals: 1. High-pressure gas cylinder; 2. Bubble device; 3. One-way valve; 4. Flowmeter; 5. Gas mixing chamber; 6. Vibration generator; 7. Upper ring cover; 701. Gas inlet; 702. Gas outlet; 703. Upper ring cover boss; 704. Upper ring groove; 705. Upper ring outer cone; 706. Upper ring cover hole; 707. Upper ring middle cone; 8. Lower ring cover; 801. Lower ring cover boss; 802. Lower ring outer cone; 803. Lower ring groove; 804. Lower ring middle cone; 805. Lower ring cover hole; 9. Fixing screw; 10. Fixing threaded plate; 11. Fixing pressing plate; 12. Compressor vertical rod; 13. Tungsten rod; 14. Quartz reactor; 1401. Inner wall of the quartz reactor; 1402. Tungsten rod fixing hole; 1403. Quartz reactor shell; 15. Compressor base; 16. Current coil; 17. Excitation power supply; 18. High-voltage probe; 19. Oscilloscope. DETAILED DESCRIPTION

[0036] The present invention is described in detail below with reference to the accompanying drawings and embodiments.

[0037] like Figure 2 As shown, a DBD powder uniform processing device based on resonance dispersion is used for inorganic material powder and organic material powder, including nano magnesium oxide or cross-linked polyethylene powder, and includes a quartz reactor 14.

[0038] The quartz reactor 14 is made of quartz glass. The main advantage of quartz glass is that it can effectively prevent surface barrier discharge from converting into arc discharge.

[0039] The quartz reactor housing 1403 is provided with a plurality of tungsten rod fixing holes 1402 for fixing the tungsten rod 13 . An upper circular ring cover 7 is provided above the quartz reactor 14 , and a lower circular ring cover 8 is provided below the quartz reactor 14 .

[0040] The electrodes are made of tungsten. During the experiment, the electrodes were required to have a strong electron emission capability, withstand high temperatures, exhibit high strength, minimize wear, have a long service life, and be easy to use under working conditions. Tungsten metal rods have advantages such as a high melting point of 3410°C, a high boiling point of 5900°C, a high strength of 850-1100 MPa, low thermal conductivity, and low volatility at high temperatures. Tungsten electrodes can be heated to very high temperatures when high voltage is applied, resulting in high electron emission and a high current density. Therefore, tungsten rods were chosen as electrodes.

[0041] In one embodiment, Figure 4 As shown, the tungsten rod 13 has a length of 101.1 mm and a diameter of 10 mm.

[0042] The tungsten rod 133 is exposed from both sides of the quartz reactor 14, and is connected to the excitation power supply 17 and the ground electrode through the upper ring cover hole 706 in the upper ring cover 7 and the lower ring cover hole 805 in the lower ring cover 8. The upper ring cover 7 has an air outlet 702 and an air inlet 701, and the working gas and reactor medium enter the quartz reactor 14 through the air inlet 701.

[0043] like Figure 7 As shown, the compressor includes a fixed compression plate 11, a compression vertical rod 12 and a compression base 15. The compression vertical rod 12 is connected to the fixed threaded plate 10 at the top and to the compression base 15 at the bottom. The fixed threaded plate 10 is provided with a threaded hole. The screw head of the fixing screw 9 passes through the threaded hole and is connected to the fixed compression plate 11 located below the fixed threaded plate 10. The fixed compression plate 11 is tightly connected to the upper surface of the upper seat ring cover 7. The lower surface of the compression base 15 is tightly connected to the upper surface of the vibrator 6, and the upper surface is tightly connected to the lower seat ring cover 8.

[0044] In one embodiment, the length of the vertical rod 12 of the compressor is 180 mm and the diameter is 10 mm. In addition, the diameter of the compressor base 15 is 156 mm. The space formed by this is convenient for the disassembly and placement of the plasma reactor part. The fixing screw 9, the fixed threaded piece 10 and the fixed compression piece 11 cooperate with each other. The fixed compression piece 11 and the fixing screw 9 are both movable, and the fixed threaded piece 10 is fixed to the top of the vertical rod 12 of the compressor. The three cooperate with each other to complete the fixation of the plasma reactor. The diameter and height of the fixed threaded piece 10 and the fixed compression piece 11 are the same, which are 156 mm and 10 mm respectively. The threaded hole diameter left by the fixed threaded piece 10 is 10 mm, which coincides with the screw head part of the fixing screw 9 for easy installation and completion of the compression operation.

[0045] The DBD powder uniform processing device based on resonance dispersion provided by the present invention, when the device is working, first closely connect the compactor base 15 and the vibrator 6 to facilitate the conduction of the excitation force when the vibrator 6 vibrates. Then connect the lower seat ring cover 8 and the plasma tube shell, and put the powder to be processed, then cover the upper seat ring cover 7, insert the fixed compactor plate 11 into the compactor vertical rod 12, adjust the appropriate position, and then precisely connect the fixed threaded plate 10 and the top of the compactor vertical rod 12, insert the fixing screw 9, and tighten it. Prepare to start work, the tungsten rod 13 acts as a high-voltage electrode and a low-voltage electrode respectively. After connecting to the excitation power supply, surface discharge will occur on the inner wall of the quartz reactor 14 to generate plasma to process the nanopowder. During the reaction process, the vibrator 6 will vibrate, causing the powder to be distributed on the inner wall of the quartz reactor 14. The entire process of the entire device is tightly connected together to facilitate the conduction of the excitation force.

[0046] The present invention uses the rapid up and down vibration of the exciter 6 to generate acoustic mixed resonance at a certain frequency, quickly causing the powder in the device to vibrate. This treatment can quickly disperse the powder in the plasma device and achieve a uniform treatment effect.

[0047] In one embodiment, Figure 3 As shown, the quartz reactor 14 includes a quartz reactor inner wall 1401 , a tungsten rod fixing hole 1402 and a quartz reactor outer shell 1403 .

[0048] In one embodiment, the diameter of the inner wall 1401 of the quartz reactor is 63.5 mm.

[0049] In one embodiment, the tungsten rod fixing holes 1402 are staggered holes punched on the reactor wall near the inner wall for mounting and fixing the tungsten rod 13 as an electrode. The length of the holes is 96.1 mm, while the length of the entire reactor is 101.1 mm, leaving a 5 mm margin. The advantage of this is that if the hole length is 101.1 mm, the entire inner wall of the reactor will be in the plasma area, which may damage the bosses of the upper ring cover 7 and the lower ring cover 8. Secondly, space is left for the tungsten rod 13 to protrude, thereby facilitating the connection of external wires. With this design, plasma will be generated in an area of ​​approximately 90 mm in length, which is a large area and has high energy utilization efficiency. Third, the target mixing volume ratio of a good vibration mixer is 0.8 to 1, so it is appropriate to design the device with a slightly smaller bottom area and a slightly larger length. At the same time, considering the size of the vibration instrument, the overall circular base diameter should be between 50mm and 65mm, so 63.5mm is the ideal size. At the same time, the overall reactor height is 101.1mm, of which the effective height is about 90mm, which meets the ideal ratio of 0.8:1 when vibrating and mixing during filling, leaving a certain amount of space surplus. Then there is part 1403, whose outer wall diameter is 100mm. This part is mainly responsible for the conduction of the exciting force. It contacts the outer and inner cones of the upper and lower circular ring covers 7 and 8, receives the conduction of the exciting force, and causes the whole to vibrate.

[0050] In one embodiment, Figure 5 As shown, the upper ring cover 7 includes an upper ring cover boss 703, an upper ring groove 704, an upper ring outer cone 705, and an upper ring inner cone 707. It also has an air outlet 702 and an air inlet 701, with diameters of 4 mm and 6 mm, respectively. Placing the air outlet 702 and air inlet 701 on the same side ensures the integrity of the plasma discharge while preventing powder leakage during powder collection, thus ensuring the airtightness of the device.

[0051] In order to facilitate the insertion of the quartz reactor 14, the corresponding diameter of the upper ring cover boss 703 is 63.5mm, which corresponds to the inner diameter of the inner wall of the quartz reactor 14. The inner diameter of the upper ring groove 704 is 67.80mm, the outer diameter is 89mm, and the groove depth is 10mm. The purpose of this design is to leave space for the exposed tungsten rod 13 to be connected to the external wires. The purpose of the upper ring outer cone 705 and the upper ring middle cone 707 is to contact the base of the quartz reactor 14 to complete the hard connection and withstand large vibration loads. The inner diameters are 89mm and 63.5mm, and the outer diameters are 100mm and 67.8mm respectively. The main design purpose of the upper ring cover hole 706 is to facilitate the lead-out of the tungsten rod wires to facilitate connection with the high-voltage electrode.

[0052] In one embodiment, Figure 6 As shown, the lower seat circular ring cover 8 includes a lower seat circular ring cover boss 801 , a lower seat circular ring outer cone 802 , a lower seat circular ring groove 803 and a lower seat circular ring middle cone 804 .

[0053] The lower seat circular ring cover boss 801 is designed to facilitate insertion into the quartz reactor 14 , and its corresponding diameter is 63.5 mm, which corresponds to the inner diameter of the inner wall of the quartz reactor 14 .

[0054] The inner diameter of the lower ring groove 803 is 67.80 mm, the outer diameter is 89 mm, and the groove depth is 10 mm. The purpose of this design is to leave space for the exposed tungsten rod 13 to facilitate connection with external wires.

[0055] The outer cone 802 and the middle cone 804 of the lower ring are designed to contact the base of the quartz reactor 14 to complete a hard connection and withstand a large vibration load. The inner diameters are 89 mm and 63.5 mm respectively, and the outer diameters are 100 mm and 67.8 mm respectively.

[0056] The hole 805 in the lower ring cover is for facilitating the extraction of the tungsten rod wires for connection to the high-voltage electrode. The lower ring cover 8 is similar to the upper ring cover 7, differing only in that it lacks an air inlet or outlet. This is because the lower ring cover 8 serves as the vibrating base for the entire plasma bottle, where powder needs to be stored to prevent leakage and facilitate handling.

[0057] like Figure 1 As shown, the device also includes a current coil 16, a high-voltage probe 18, and an oscilloscope 19. The oscilloscope 19 is used to collect voltage and current waveforms during the experiment for discharge characteristic analysis. When measuring high-voltage signals, the high-voltage probe 18 provides a certain degree of isolation, allowing direct measurement of the high-voltage signal. The current coil 16 has two main functions: current blocking and tuning and frequency selection.

[0058] The proposed resonant dispersion-based DBD powder uniformization device utilizes atmospheric low-temperature plasma to treat nanopowder materials. This method excites the surface of the treated nanomaterial, disrupting or reorganizing surface chemical bonds to form new chemical bonds and surface structures. This facilitates effective modification of the nanopowder material.

[0059] Compared with the traditional coaxial DBD, the method adopts the means of vibration dispersion. At a certain frequency, acoustic resonance mixing occurs, so that a micro-mixing field is generated in the plasma device, the powder is evenly dispersed, and the effect of uniform powder processing is improved.

[0060] The present invention also provides a method for uniformly processing DBD powder based on resonance dispersion, using the DBD powder uniformly processing device based on resonance dispersion, such as Figure 8 The following steps are involved:

[0061] Step S01: Tightly connect the compressor base 15 and the vibrator 6 to facilitate the conduction of the exciting force, insert 20 tungsten rods 13 into the corresponding holes of the quartz reactor 14 respectively, and connect the exposed parts of the tungsten rods 13 to the wire parts, and pass two lead wires through the upper ring cover 7 and the lower ring cover 8 corresponding to the upper ring cover hole 706 and the lower ring cover hole 805 to wait for the connection of the overall circuit.

[0062] In step S02, the lower ring cover 8 and the quartz reactor 14 are connected to each other. At this time, the nanopowder to be processed can be added to the quartz reactor 14. Then, the upper ring cover 7 is covered and the plasma reactor bottle is placed on the pressing device base 15. Wait for the pressing device to be tightened, and the installation of the plasma treatment reactor bottle is completed.

[0063] In one embodiment, flexible airtight tape may be wrapped around the connection points between the upper annular cover 7 and the quartz reactor 14 and the lower annular cover 8 and the quartz reactor 14 to increase the airtightness of the entire device.

[0064] In step S03, the gas supply phase can be entered. In this phase, high-purity Ar is used as the working gas, and the gas flow rate is monitored in real time by flow meter 4. After a period of ventilation, which should ensure a high Ar concentration in the quartz reactor 14, the entire device is connected, and the high-pressure gas cylinder 1 is opened to allow Ar and the reaction medium to be introduced into the reaction device.

[0065] Step S04: After a period of time, since this vibration mixing requires a sealed operation, the fixing screws 9 need to be tightened quickly to tightly connect the fixed pressing piece 11 and the upper ring cover 7. The installation part of the device is now completed.

[0066] Step S05: Turn on the vibration exciter 6 and adjust the vibration parameters of the vibration exciter so that the powder in the reactor vibrates along with the vibration exciter.

[0067] Step S06: While maintaining a high gas concentration in the device, the power supply is debugged. First, the power supply is turned on and the power supply parameters are adjusted. When a large, high-intensity, and stable discharge plasma is generated, the power supply parameters are kept unchanged to stabilize the discharge and process the nanopowder.

[0068] Step S07: After the processing is completed, the vibration instrument is turned off, the power is turned off, the reaction is ended, and then the air intake is stopped, and the entire reaction process is ended.

[0069] In one embodiment, a high-pressure gas cylinder 1 and a bubbling device 2 are filled with a working gas and a reaction medium. The working gas can be selected according to specific needs. The reaction medium is mostly a solution and can be flexibly selected according to the powder processing requirements. When the device is in operation, the gas cylinder is opened, and the gas blows the reaction gas into the reaction device along the gas pipe. The one-way valve 3 prevents the airflow from flowing back during operation. The flow meter 4 detects the airflow rate during the operation state in real time. For gaseous media, it is directly mixed with the working gas through the mixing chamber 5 and then introduced into the discharge area. For liquid media, it is brought into the discharge area by the working gas. The ratio of the reaction medium and the working gas is adjusted by the flow meter 4.

[0070] In one embodiment, the device uses two power sources: a nanosecond pulse power supply with adjustable parameters and an AC power supply. The voltage adjustment range of the nanosecond pulse power supply is 500 V-30 kV, preferably in the range of 5 kV-10 kV; frequency adjustment range is 500 Hz-20 kHz, preferably in the range of 1 kHz-5 kHz. The AC power supply output voltage and frequency are consistent with the nanosecond pulse power supply to ensure the same period.

[0071] In one embodiment, the plasma discharge gas introduced into the device can be argon, helium, nitrogen or other gases, and argon is preferred for this device.

[0072] In one embodiment, the ventilation flow rate can be adjusted within a range of 10 mL / min-1 L / min, preferably in the range of 100 mL / min-500 mL / min, pre-ventilation time can be 1 min-5 min, preferably 2 min.

[0073] In practice, this device can process various inorganic material powders and organic material powders, including but not limited to nano magnesium oxide and cross-linked polyethylene powder, wherein the particle powder processing diameter range is 10 nm-200 The diameter of the processed powder is preferably between 20 nm.

[0074] In one embodiment, the parameters of the vibration instrument also need to be adjusted, and the vibration frequency can be selected in the range of 58 Hz-62 Hz, the preferred vibration frequency is 60 Hz.

[0075] In one embodiment, the magnitude of the excitation force can be adjusted according to the actual weight of the entire device, and the range of the excitation force is 20 N-800 N, the preferred exciting force is 500 N.

[0076] The present invention utilizes atmospheric low-temperature plasma to treat nanopowder materials. This method can excite the surface of the treated nanomaterial, thereby destroying or reorganizing the chemical bonds on the surface, forming new chemical bonds and surface structures. This is more conducive to achieving an effective modification effect on the nanopowder material.

Claims

1. A DBD powder uniform processing device based on resonance dispersion, used for inorganic material powder and organic material powder, including nano magnesium oxide or cross-linked polyethylene powder, characterized by: The invention comprises a quartz reactor (14), wherein a plurality of tungsten rod fixing holes (1402) for fixing a tungsten rod (13) are provided on a quartz reactor shell (1403), an upper ring cover (7) is provided above the quartz reactor (14), and a lower ring cover (8) is provided below the quartz reactor (14), wherein the tungsten rod (13) is exposed from both sides of the quartz reactor (14), and is connected to an excitation power supply (17) and a ground electrode through an upper ring cover hole (706) in the upper ring cover (7) and a lower ring cover hole (805) in the lower ring cover (8), respectively; the upper ring cover (7) has an air outlet (702) and an air inlet (701), and a working gas and a reactor medium are introduced into the reactor through the air inlet ( 701) enters the quartz reactor (14), the compressor includes a fixed compression plate (11), a compression rod (12) and a compression base (15), the compression rod (12) is connected to the fixed threaded plate (10) at the top and to the compression base (15) at the bottom, the fixed threaded plate (10) is provided with a threaded hole, the screw head of the fixing screw (9) passes through the threaded hole and is connected to the fixed compression plate (11) located below the fixed threaded plate (10), the fixed compression plate (11) is tightly connected to the upper surface of the upper seat ring cover (7), the lower surface of the compression base (15) is tightly connected to the upper surface of the exciter (6), and the upper surface is tightly connected to the lower seat ring cover (8).

2. The DBD powder uniform processing device based on resonance dispersion according to claim 1, characterized in that: The upper ring cover (7) includes an upper ring cover boss (703), an upper ring groove (704), an upper ring outer cone (705) and an upper ring middle cone (707). The upper ring cover boss (703) has an inner diameter equal to that of the inner circle of the inner wall of the quartz reactor (14). The upper ring groove (704) leaves a space for the exposed tungsten rod (13). The upper ring outer cone (705), the upper ring middle cone (707) and the base of the quartz reactor (14) are in contact to complete a hard connection.

3. The DBD powder uniform processing device based on resonance dispersion according to claim 1, characterized in that: The lower ring cover (8) includes a lower ring cover boss (801), a lower ring outer cone (802), a lower ring groove (803) and a lower ring middle cone (804). The lower ring cover boss (801) and the inner diameter of the inner wall of the quartz reactor (14) are the same. The lower ring groove (803) leaves a space distance for the exposed tungsten rod (13). The lower ring outer cone (802), the lower ring middle cone (804) and the base of the quartz reactor (14) are in contact to complete a hard connection.

4. The DBD powder uniform processing device based on resonance dispersion according to any one of claims 1 to 3, characterized in that: The length of the tungsten rod fixing hole (1402) is smaller than the length of the quartz reactor (14).

5. The DBD powder uniform processing device based on resonance dispersion according to any one of claims 1 to 3, characterized in that: It also includes a current coil (16), a high-voltage probe (18) and an oscilloscope (19). The oscilloscope (19) is used to collect voltage and current waveforms during the experiment. When measuring a high-voltage signal, the high-voltage probe (18) can directly measure the high-voltage signal. The current coil (16) is used for current blocking, tuning and frequency selection.

6. The DBD powder uniform processing device based on resonance dispersion according to any one of claims 1 to 3, characterized in that: The excitation power supply (17) is a nanosecond pulse power supply.

7. A method for uniformly processing DBD powder based on resonance dispersion, using the DBD powder uniformly processing device based on resonance dispersion according to any one of claims 1 to 6, characterized in that: The following steps are involved: Step S01: tightly connect the pressing device base (15) and the exciter (6), insert a plurality of tungsten rods (13) into the tungsten rod fixing holes (1402) of the quartz reactor (14), and pass the exposed parts of the tungsten rods (13) through the upper ring cover hole (706) in the upper ring cover (7) and the lower ring cover hole (805) in the lower ring cover (8) through two lead wires to connect the excitation power supply (17) and the ground electrode; Step S02: Connect the lower ring cover (8) and the quartz reactor (14) accordingly, add the nanopowder to be processed into the quartz reactor (14), cover it with the upper ring cover (7), place the quartz reactor (14) bottle on the pressing device base (15), wait for the pressing device to be pressed, and complete the installation of the quartz reactor (14) bottle; Step S03: Entering the gas supply phase; Step S04: tightening the pressing device: tighten the fixing screw (9) to tightly connect the fixed pressing piece (11) and the upper ring cover (7); Step S05: Turn on the vibration instrument (6), adjust the vibration parameters of the vibration instrument, and the powder in the reactor vibrates along with the vibration instrument; Step S06: While ensuring that the gas concentration in the device is high, enter the power debugging phase, turn on the power and adjust the power parameters. When a stable discharge plasma is generated, keep the power parameters unchanged and stabilize the discharge to treat the nanopowder. Step S07: After the processing is completed, the vibration instrument is turned off, the power is turned off, the reaction is completed, and then the air intake is stopped, and the entire reaction process is completed.

8. The method for uniformly treating DBD powder based on resonance dispersion according to claim 7, characterized in that: Flexible airtight tape is wrapped around the connection between the upper circular ring cover (7) and the quartz reactor (14) and the lower circular ring cover (8) and the quartz reactor (14).

9. The method for uniformly treating DBD powder based on resonance dispersion according to claim 7, wherein: The specific method of step S03 is as follows: the working gas is argon, helium or nitrogen, and the gas flow rate is detected in real time by the flow meter (4). After ventilation for a period of time, when the corresponding ventilation Ar gas in the quartz reactor (14) reaches the set concentration, the entire device is then connected, and then the high-pressure gas cylinder (1) is opened, and the working gas and the reaction medium generated by the bubbling device (2) are introduced into the quartz reactor (14) together.

10. The method for uniformly treating DBD powder based on resonance dispersion according to claim 7, wherein: The voltage adjustment range of the nanosecond pulse power supply is 500 V-30 kV, the frequency adjustment range is 500 Hz-20 kHz, the pre-ventilation flow rate adjustment range is 10 mL / min-1 L / min, the pre-ventilation time is 1 min-5 min, the particle powder processing diameter range is between 10 nm-200 μm, the vibration frequency range of the exciter is between 58 Hz-62 Hz, and the excitation force can be adjusted according to the actual weight of the entire device, and the excitation force range is between 20 N-800 N.

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