A reaction force measurement system and method

By using damping measurement devices, stiffness measurement devices, and reaction force measurement devices, the influence of reaction force during the movement of the aperture and mask stage was resolved, thereby improving the stability and accuracy of the exposure device and providing a precise method for calculating and adjusting the reaction force.

CN119880220BActive Publication Date: 2025-11-14HARBIN INST OF TECH
View PDF 2 Cites 0 Cited by

Patent Information

Application Number
CN202510059790.9
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2025-01-15
Publication Date
2025-11-14
Estimated Expiration
2045-01-15

AI Technical Summary

Technical Problem

In the prior art, the reaction force generated when the aperture and the mask stage move synchronously with high precision and high acceleration affects the stability of the exposure device. Existing dampers can only reduce vibration but cannot eliminate it, resulting in a decrease in the accuracy of the exposure device.

Method used

By employing damping measurement devices, stiffness measurement devices, and reaction force measurement devices, and through components such as dampers, aperture assemblies, and grating rulers, damping parameters, overall stiffness, and reaction force are measured and calculated, providing a precise basis for reaction force calculation, which is used to adjust the operating status of the exposure device.

Benefits of technology

It improves the operational stability and accuracy of the exposure device. By precisely adjusting the reaction force, it reduces the vibration impact caused by the reaction force and enhances the overall performance of the exposure device.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN119880220B_ABST
    Figure CN119880220B_ABST
Patent Text Reader

Abstract

This invention relates to the field of measuring device technology, and provides a reaction force measuring system and method. The system's damping measuring device includes a first damper, a force sensor, an electric cylinder, and a support base; the stiffness measuring device includes a first air-bearing guide rail, a first aperture assembly, a second aperture assembly, a second damper, a first grating ruler, and a first support frame; the reaction force measuring device includes a second air-bearing guide rail, a third aperture assembly, a fourth aperture assembly, a third damper, a second support frame, a second grating ruler, and a damping adapter plate. This invention effectively measures the reaction force of a high-speed bidirectional motion mechanism, facilitating reaction force adjustment and effectively improving the stability of the exposure device.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] This invention relates to the field of measuring device technology, and more specifically, to a reaction force measuring system and method. Background Technology

[0002] With the rapid development of communication technology, computer technology and sensing technology, the semiconductor industry has ushered in a period of vigorous development. Chip manufacturing processes are also constantly evolving and innovating. As a key piece of equipment in the chip manufacturing process, the exposure device's production precision and efficiency directly affect the overall progress of the semiconductor chip industry.

[0003] The exposure apparatus is a crucial tool for projecting design patterns onto silicon wafers, determining the final structure of the chip and forming the core of semiconductor chip technology. The high-speed bidirectional motion mechanism is a key component of the exposure apparatus's illumination system, including the aperture and mask stage. However, during step-scanning, the aperture moves synchronously with the mask stage with high precision and acceleration. The frame connected to the aperture does not move synchronously, generating a reaction force that affects the overall stability of the exposure apparatus system. Therefore, it is necessary to measure this reaction force in order to implement appropriate measures to eliminate its impact on the stability of the exposure apparatus. Summary of the Invention

[0004] The problem addressed by this invention is how to measure the reaction force applied to the frame when the aperture and mask stage move.

[0005] To address the above problems, the present invention provides a reaction force measurement system and method.

[0006] In a first aspect, the present invention provides a reaction force measurement system, including a damping measurement device, a stiffness measurement device, and a reaction force measurement device that are connected in communication.

[0007] The damping measuring device includes a first damper, a force sensor, an electric cylinder, and a support base. The support base is used to be installed on the foundation. The electric cylinder is installed on the support base. The telescopic end of the electric cylinder is connected to one end of the force sensor, and the other end of the force sensor is connected to the first damper.

[0008] The stiffness measuring device includes a first air-bearing guide rail, a first aperture assembly, a second aperture assembly, a second damper, a first grating ruler, and a first support frame. The two first support frames are respectively disposed at both ends of the first air-bearing guide rail and are used to connect with the frame. The first aperture assembly and the second aperture assembly are disposed on the first air-bearing guide rail and are used to slide along the first air-bearing guide rail. The second damper is disposed on the end face of the first air-bearing guide rail facing the frame. The first grating ruler is disposed on the first air-bearing guide rail.

[0009] The reaction force measuring device includes a second air-bearing guide rail, a third aperture assembly, a fourth aperture assembly, a third damper, a second support frame, a second grating ruler, and a damping adapter plate. The two second support frames are respectively disposed at both ends of the second air-bearing guide rail and are used to connect with the frame. The third aperture assembly and the fourth aperture assembly are disposed on the second air-bearing guide rail and are used to slide along the second air-bearing guide rail. The third damper is disposed on the end face of the second air-bearing guide rail facing the frame. One end of the damping adapter plate is connected to the third damper, and the other end is used to connect with the frame. The second grating ruler is disposed on the second air-bearing guide rail.

[0010] The first damper, the second damper, and the third damper are the same; the first aperture assembly and the third aperture assembly are the same; and the second aperture assembly and the fourth aperture assembly are the same.

[0011] Optionally, the damping measuring device further includes a damping guide rail, a damping fixing plate, a first adapter plate, and a damping slider;

[0012] The damping slider is slidably mounted on the damping guide rail, the damping fixing plate is mounted on the damping slider, the fixed end of the first damper is mounted on the damping fixing plate, and the movable end of the first damper is connected to the force sensor through the first adapter plate.

[0013] Optionally, the damping fixing plate includes a first long plate and a second short plate. One end face of the first long plate is used to connect with the end face of the damping slider away from the foundation, and the other end face is provided with the second short plate and the first damper. The end face of the second short plate away from the support is connected to the first damper.

[0014] Optionally, the damping center of the first damper, the measurement center of the force sensor, and the force application center of the electric cylinder are on the same horizontal straight line.

[0015] Optionally, the support base includes a front seat and a rear seat, the electric cylinder body is disposed between the front seat and the rear seat, and the front seat has a through hole, through which the telescopic end of the electric cylinder passes and is connected to the force sensor.

[0016] Optionally, the stiffness measuring device further includes a first cover plate, which is disposed on the first air-bearing guide rail, and a first gap is left between the first cover plate and the first air-bearing guide rail.

[0017] The reaction force measuring device also includes a second cover plate, which is disposed on the second air flotation guide rail, and a second gap is left between the second cover plate and the second air flotation guide rail.

[0018] Optionally, the first aperture assembly includes a first slider, a first driving member, and a first aperture plate. The first driving member includes a first stator coil and a first mover magnet assembly connected together. The first slider is slidably disposed on the first air-bearing guide rail. The first stator coil is disposed between the first cover plate and the first air-bearing guide rail. The output end of the first mover magnet assembly extends from the first gap and is connected to one end of the first slider facing the gap between the first cover plate and the first air-bearing guide rail. The first aperture plate is disposed at one end of the first slider away from the gap between the first cover plate and the first air-bearing guide rail. The first driving member is used to drive the first slider to move the first aperture plate along the first air-bearing guide rail.

[0019] The second, third, and fourth aperture components have the same structure as the first aperture component.

[0020] Optionally, the stiffness measuring device further includes a first reading head and a second adapter plate. The first reading head is disposed on the first grating ruler, and one end of the second adapter plate is connected to the first reading head, while the other end is used to connect to the frame.

[0021] The reaction force measuring device also includes a second reading head and a third adapter plate. The second reading head is mounted on the second grating ruler. One end of the third adapter plate is connected to the second reading head, and the other end is used to connect to the frame.

[0022] Secondly, the present invention provides a reaction force measurement method, based on the reaction force measurement system described above, the method comprising:

[0023] The damping measuring device is installed on the foundation, and the electric cylinder is controlled to operate according to the preset electric cylinder parameters. The damping parameters are obtained based on the preset electric cylinder parameters and the readings of the force sensor.

[0024] The stiffness measuring device is installed on the frame, and the first aperture assembly and the second aperture assembly are driven to run according to the preset driving parameters. The overall stiffness is obtained according to the preset driving parameters and the first overall displacement obtained by the first grating ruler.

[0025] The reaction force measuring device is installed on the frame, and the third and fourth aperture components are driven to run according to the preset driving parameters. Based on the dynamic motion equilibrium equation, the reaction force is obtained according to the preset driving parameters, the second overall displacement and the overall velocity obtained by the second grating ruler.

[0026] Optionally, the reaction force obtained based on the preset driving parameters, the second overall displacement obtained using the second grating ruler, and the overall velocity is expressed by the following formula:

[0027] F反 =cv2+ks2,

[0028] Among them, F 反 Let represent the reaction force, c represent the damping parameter, k represent the overall stiffness, s2 represent the second overall displacement, and v2 represent the first derivative of the second overall displacement s2 with respect to the running time.

[0029] The beneficial effects of the reaction force measurement system and method of the present invention are as follows: In the damping measurement device, the support base is set on the foundation (which can be a frame, the ground, or a table; it should be noted that if it is installed on a frame, the damping measurement device needs to be removed after testing), and the electric cylinder is set on the support base to fix the electric cylinder. The telescopic end of the electric cylinder and the first damper are respectively connected to both ends of the force sensor. During use, the damping parameters of the first damper can be calculated based on the operating parameters of the electric cylinder and the readings of the force sensor, providing a calculation basis for subsequent reaction force calculation. In the stiffness measurement device, the first aperture assembly and the second aperture assembly are set on the first air-bearing guide rail and can slide along the first air-bearing guide rail to simulate the operating state of a high-speed bidirectional motion mechanism. The first support frame is set at both ends of the first air-bearing guide rail and is set on the frame of the exposure system, so that there is a certain gap between the bottom surface of the first air-bearing guide rail and the frame, providing installation space for the second damper to be set on the bottom surface of the first air-bearing guide rail. The first grating ruler is mounted on the first air-bearing guide rail. In use, the stiffness measuring device should first be installed on the frame of the exposure system. The first and second aperture assemblies are driven to slide back and forth on the first air-bearing guide rail to simulate the actual movement of a high-speed bidirectional motion mechanism. The second damper reduces vibration to a certain extent. Based on the operating parameters of the first and second aperture assemblies, and the first overall displacement read from the first grating ruler, the overall stiffness is obtained, providing a basis for subsequent reaction force calculations. Then, to further calculate the reaction force, the stiffness measuring device can be removed from the frame. Some structures and functions of the reaction force measuring device are the same as those of the stiffness measuring device, and will not be described in detail here. The difference is that in the reaction force measuring device, the third damper is connected to the frame via a damping connecting plate, so that the third damper can reduce the reaction force generated by the frame to a certain extent. In use, the reaction force measuring device should first be installed on the frame. The third and fourth aperture components slide back and forth on the second air-bearing guide rail. Based on the operating parameters of the third and fourth aperture components, the second overall displacement read by the second grating ruler, the damping parameters obtained by the damping measuring device, and the overall stiffness obtained by the stiffness measuring device, the precise reaction force generated under this working condition can be obtained. In subsequent processing, the reaction force can be precisely adjusted to eliminate its influence on the operation of the exposure device and increase the stability and accuracy of the exposure device. Attached Figure Description

[0030] Figure 1This is a schematic diagram of the reaction force measurement system according to an embodiment of the present invention;

[0031] Figure 2 This is a schematic diagram of the damping measurement device according to an embodiment of the present invention;

[0032] Figure 3 This is a schematic diagram of the stiffness measuring device according to an embodiment of the present invention. Figure 1 ;

[0033] Figure 4 This is a schematic diagram of the stiffness measuring device according to an embodiment of the present invention. Figure 2 ;

[0034] Figure 5 This is a top view of the stiffness measuring device according to an embodiment of the present invention;

[0035] Figure 6 This is a schematic diagram of the reaction force measuring device according to an embodiment of the present invention. Figure 1 ;

[0036] Figure 7 This is a schematic diagram of the reaction force measuring device according to an embodiment of the present invention. Figure 2 ;

[0037] Figure 8 This is a top view of the reaction force measuring device according to an embodiment of the present invention;

[0038] Figure 9 This is a schematic flowchart of the reaction force measurement method according to an embodiment of the present invention.

[0039] Explanation of reference numerals in the attached figures:

[0040] 1-Damping measuring device; 11-First damper; 12-Force sensor; 13-Electric cylinder; 14-Support base; 141-Front seat; 142-Rear seat; 15-Damping guide rail; 16-Damping fixing plate; 161-First long plate; 162-Second short plate; 17-First adapter plate; 18-Damping slider;

[0041] 2-Stiffness measuring device; 21-First air-bearing guide rail; 22-First aperture assembly; 221-First slider; 223-First aperture plate; 23-Second aperture assembly; 231-Second slider; 233-Second aperture plate; 24-Second damper; 25-First grating ruler; 26-First support frame; 261-First flexible hinge; 262-First flexible adapter plate; 27-First cover plate; 28-First reading head; 29-Second adapter plate

[0042] 3-Reaction force measuring device; 31-Second air-bearing guide rail; 32-Third aperture assembly; 321-Third slider; 323-Third aperture plate; 33-Fourth aperture assembly; 331-Fourth slider; 333-Fourth aperture plate; 34-Third damper; 35-Second support frame; 351-Second flexible hinge; 352-Second flexible adapter plate; 36-Second grating ruler; 37-Damping adapter plate; 38-Second reading head; 39-Third adapter plate; 30-Second cover plate. Detailed Implementation

[0043] To make the above-mentioned objects, features, and advantages of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Although some embodiments of the present invention are shown in the drawings, it should be understood that the present invention can be implemented in various forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided to provide a more thorough and complete understanding of the present invention. It should be understood that the accompanying drawings and embodiments of the present invention are for illustrative purposes only and are not intended to limit the scope of protection of the present invention.

[0044] In the attached diagram, the Z-axis represents the vertical direction, i.e., up and down, with the positive direction of the Z-axis representing upward and the negative direction representing downward. The X-axis represents the horizontal direction and is designated as front and back, with the positive direction of the X-axis representing the front and the negative direction representing the back. The Y-axis represents the left and right position, with the positive direction of the Y-axis representing the left and the negative direction representing the right. It should be noted that the aforementioned representations of the Z, Y, and X axes are merely for the convenience of describing the invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the invention.

[0045] The term "comprising" and its variations as used herein are open-ended, meaning "including but not limited to"; the term "based on" means "at least partially based on"; the term "one embodiment" means "at least one embodiment"; the term "another embodiment" means "at least one additional embodiment"; the term "some embodiments" means "at least some embodiments"; and the term "optionally" means "optional embodiments". Definitions of other terms will be given in the following description. It should be noted that the concepts of "first," "second," etc., mentioned in this invention are used only to distinguish different devices, modules, or units, and are not intended to limit the order of functions performed by these devices, modules, or units or their interdependencies.

[0046] It should be noted that the terms "a" and "a plurality of" used in this invention are illustrative rather than restrictive. Those skilled in the art should understand that, unless otherwise expressly indicated in the context, they should be understood as "one or more".

[0047] In related technologies, during step scanning, the aperture moves synchronously with the mask stage at high precision and high acceleration, generating a reaction force with the frame. When this reaction force is large, it can cause strong vibrations in structures such as the mask stage or aperture, affecting the stability of the exposure apparatus. Existing technologies typically incorporate dampers to reduce the vibrations generated by the movement of the aperture and mask stage. However, dampers can only reduce, not eliminate, the vibrations. Even a small reaction force can cause minute vibrations in structures such as the mask stage, aperture, or frame. Since exposure apparatuses require high precision during operation, even minor vibrations can reduce the accuracy of the exposure apparatus.

[0048] To address the problems existing in the aforementioned related technologies, this embodiment provides a reaction force measurement system and method.

[0049] like Figures 1 to 8 As shown, an embodiment of the present invention provides a reaction force measurement system, such as... Figure 1 As shown, the system includes a damping measurement device 1, a stiffness measurement device 2, and a reaction force measurement device 3, all connected via communication. The damping measurement device 1 is used to obtain damping parameters based on the damping system velocity and damping force values ​​acquired after startup. The stiffness measurement device 2 is used to obtain the overall stiffness based on the first overall displacement and driving current acquired after startup. The reaction force measurement device 3 is used to obtain the reaction force of the variable aperture system on the frame based on the second overall displacement, driving current, damping parameters, and overall stiffness acquired after startup. It should be noted that after operating the damping measurement device 1, stiffness measurement device 2, and reaction force measurement device 3, reaction force calculation is required based on the relevant operating data generated by these three devices. This can be done manually by the operator, or as described above. Figure 1 As shown, a controller is added to communicate with the damping measuring device 1, the stiffness measuring device 2, and the reaction force measuring device 3 respectively, so as to realize the intelligent calculation of the reaction force.

[0050] The damping measuring device 1 includes a first damper 11, a force sensor 12, an electric cylinder 13, and a support base 14. The support base 14 is used to be installed on the foundation. The electric cylinder 13 is installed on the support base 14. The telescopic end of the electric cylinder 13 is connected to one end of the force sensor 12, and the other end of the force sensor 12 is connected to the first damper 11.

[0051] Specifically, such as Figure 2As shown, the support base 14 is set on the foundation, which can be the frame of the exposure system, the ground, or a table. The electric cylinder 13 is set on the support base 14. The telescopic end of the electric cylinder 13 and the first damper 11 are respectively connected to the two ends of the force sensor 12. When in use, the electric cylinder 13 is operated according to the preset operating parameters (such as the rotation speed of the electric cylinder 13, the push rod speed, and the speed corresponding to each revolution). When the electric cylinder 13 operates, the telescopic end extends and applies pressure to the force sensor 12. The first damper 11 reduces the vibration generated during operation to a certain extent. At this time, the damping parameters of the first damper 11 are calculated based on the operating parameters of the electric cylinder 13 and the reading of the force sensor 12, providing a calculation basis for subsequent reaction force calculation.

[0052] The stiffness measuring device 2 includes a first air-bearing guide rail 21, a first aperture assembly 22, a second aperture assembly 23, a second damper 24, a first grating ruler 25, and a first support frame 26. The two first support frames 26 are respectively disposed at both ends of the first air-bearing guide rail 21 and are used to connect with the frame. The first aperture assembly 22 and the second aperture assembly 23 are disposed on the first air-bearing guide rail 21 and are used to slide along the first air-bearing guide rail 21. The second damper 24 is disposed on the end face of the first air-bearing guide rail 21 facing the frame. The first grating ruler 25 is disposed on the first air-bearing guide rail 21.

[0053] Specifically, such as Figures 3 to 5 As shown, the first aperture assembly 22 and the second aperture assembly 23 are mounted on the first air-bearing guide rail 21 and can slide along the first air-bearing guide rail 21 in the positive and negative directions of the X-axis. There are typically two first support frames 26, located at both ends of the first air-bearing guide rail 21 and mounted on the frame of the exposure system, creating a certain gap between the bottom surface of the first air-bearing guide rail 21 and the frame. The fixed end of the second damper 24 is located on the bottom surface of the first air-bearing guide rail 21, i.e., the end face facing the frame (the end face in the negative direction of the Z-axis). The first grating ruler 25 is mounted on the first air-bearing guide rail 21, for example, on the rear end face of the first air-bearing guide rail 21. In use, the first aperture assembly 22 and the second aperture assembly 23 are driven to slide back and forth on the first air-bearing guide rail 21 according to the preset operating parameters, generating a certain vibration. The second damper 24 reduces the vibration to a certain extent. The first grating ruler 25 is used to display the displacement of the first aperture assembly 22 and the second aperture assembly 23 to obtain the first overall displacement. The overall stiffness is obtained according to the preset operating parameters (such as driving current) and the first overall displacement, providing a calculation basis for subsequent reaction force calculation.

[0054] It should be noted that, as Figure 3 As shown, the first support frame 26 may include a first flexible hinge 261 and a first flexible adapter plate 262. The first flexible hinge 261 is fixed to the constraint hinge on the frame through the first flexible adapter plate 262.

[0055] It should be noted that the first air flotation guide rail 21 can be a split type or an integral type. When the first air flotation guide rail 21 is a split type, it can be composed of a first air flotation plate and a second air flotation plate.

[0056] The reaction force measuring device 3 includes a second air-bearing guide rail 31, a third aperture assembly 32, a fourth aperture assembly 33, a third damper 34, a second support frame 35, a second grating ruler 36, and a damping adapter plate 37. The two second support frames 35 are respectively disposed at both ends of the second air-bearing guide rail 31 and are used to connect with the frame. The third aperture assembly 32 and the fourth aperture assembly 33 are disposed on the second air-bearing guide rail 31 and are used to slide along the second air-bearing guide rail 31. The third damper 34 is disposed on the end face of the second air-bearing guide rail facing the frame. One end of the damping adapter plate 37 is connected to the third damper 34, and the other end is used to connect with the frame. The second grating ruler 36 is disposed on the second air-bearing guide rail 31.

[0057] Specifically, such as Figures 6 to 8 As shown, the structure of the reaction force measuring device 3 is the same as that of the stiffness measuring device 2, and will not be described again here. Compared with the stiffness measuring device 2, the reaction force measuring device 3 has a damping transition plate 37 between the movable end of the third damper 34 and the frame, so that the third damper 34 can reduce the reaction force generated by the frame to a certain extent. In use, the third aperture assembly 32 and the fourth aperture assembly 33 are driven to slide back and forth on the second air-bearing guide rail 31 according to the preset operating parameters, generating a certain vibration. The third damper 34 reduces the vibration to a certain extent, and also reduces the reaction force of the frame to a certain extent. The second grating ruler 35 is used to display the displacement of the third aperture assembly 32 and the fourth aperture assembly 33 to obtain the second overall displacement. The reaction force is obtained according to the preset operating parameters (such as driving current and operating speed) and the second overall displacement.

[0058] It should be noted that, as Figure 6 As shown, the second support frame 35 may include a second flexible hinge 351 and a second flexible adapter plate 352. The second flexible hinge 351 is fixed to a constraint hinge on the foundation through the second flexible adapter plate 352.

[0059] It should also be noted that the first damper 11, the second damper 24, and the third damper 34 are the same type of damper, with identical parameters and properties. Alternatively, the same damper can be used to sequentially install on the damping measuring device 1, the stiffness measuring device 2, and the reaction force measuring device 3 for measurement, to ensure the accuracy of the acquired data and calculation results. Similarly, the first grating ruler 25 and the second grating ruler 36 are also the same type, as are the first aperture assembly 22, the second aperture assembly 23, the third aperture assembly 32, and the fourth aperture assembly 33, all with the same operating parameters.

[0060] In this embodiment, in the damping measuring device 1, the support base 14 is set on the foundation (which can be a frame, the ground, or a table; it should be noted that if it is installed on a frame, the damping measuring device 1 needs to be removed after testing). The electric cylinder 13 is set on the support base 14 to fix the electric cylinder 13. The telescopic end of the electric cylinder 13 and the first damper 11 are respectively connected to both ends of the force sensor 12. During use, the damping parameters of the first damper 11 can be calculated based on the operating parameters of the electric cylinder 13 and the readings of the force sensor 12, providing a calculation basis for subsequent reaction force calculation. In the stiffness measuring device 2, the first aperture assembly 22 and the second aperture assembly 23 are set on the first air-bearing guide rail 21 and can slide along the first air-bearing guide rail to simulate the operating state of a high-speed bidirectional motion mechanism. The first support frame 26 is set at both ends of the first air-bearing guide rail 21 and is set on the frame of the exposure system, so that there is a certain gap between the bottom surface of the first air-bearing guide rail 21 and the frame, providing installation space for the second damper 24 to be set on the bottom surface of the first air-bearing guide rail 21. The first grating ruler 25 is mounted on the first air-bearing guide rail 21. In use, the stiffness measuring device 2 should first be installed on the frame of the exposure system. The first aperture assembly 22 and the second aperture assembly 23 are driven to slide back and forth on the first air-bearing guide rail 21 to simulate the actual movement of the high-speed bidirectional motion mechanism. The second damper 24 reduces vibration to a certain extent. Based on the operating parameters of the first aperture assembly 22 and the second aperture assembly 23, and the first overall displacement read from the first grating ruler 25, the overall stiffness is obtained, providing a basis for subsequent reaction force calculation. Then, to further calculate the reaction force, the stiffness measuring device 2 can be removed from the frame. The reaction force measuring device 3 has some structures and functions similar to the stiffness measuring device 2, and will not be described in detail here. The difference is that in the reaction force measuring device 3, the third damper 34 is connected to the frame through a damping connecting plate 37, so that the third damper 34 can reduce the reaction force generated by the frame to a certain extent. In use, the reaction force measuring device 3 should first be installed on the frame. The third aperture assembly 32 and the fourth aperture assembly 33 slide back and forth on the second air-bearing guide rail 31. Based on the operating parameters of the third aperture assembly 32 and the fourth aperture assembly 33, the second overall displacement read by the second grating ruler 35, the damping parameters obtained by the damping measuring device 1, and the overall stiffness obtained by the stiffness measuring device 2, the precise reaction force generated under this working condition can be obtained. In subsequent processing, the reaction force can be precisely adjusted to eliminate its influence on the operation of the exposure device and increase the stability and accuracy of the exposure device.

[0061] Optionally, the damping measuring device 1 further includes a damping guide rail 15, a damping fixing plate 16, a first adapter plate 17, and a damping slider 18;

[0062] The damping slider 18 is slidably disposed on the damping guide rail 15, the damping fixing plate 16 is disposed on the damping slider 18, the fixed end of the first damper 11 is disposed on the damping fixing plate 16, and the movable end of the first damper 11 is connected to the force sensor 12 through the first adapter plate 17.

[0063] Optionally, the damping center of the first damper 11, the measurement center of the force sensor 12, and the force application center of the electric cylinder 13 are on the same horizontal straight line.

[0064] Specifically, such as Figure 2 As shown, to ensure that the telescopic end of the electric cylinder 13 is not obstructed when it extends, a damping guide rail 15, a damping fixing plate 16, a first adapter plate 17, and a damping slider 18 are provided. The damping slider 18 is slidably mounted on the damping guide rail 15. The fixed end of the first damper 11 is mounted on the damping slider 18 through the damping fixing plate 16. The movable end of the first damper 11 is connected to the force sensor 12 through the first adapter plate 17. When the telescopic end of the electric cylinder 13 extends, the first damper 11 can slide on the damping guide rail 15 to avoid jamming and damage to the electric cylinder 13 or the first damper 11.

[0065] Optionally, the damping fixing plate 16 includes a first long plate 161 and a second short plate 162. One end face of the first long plate 161 is used to connect with the end face of the damping slider 18 away from the foundation, and the other end face is provided with the second short plate 162 and the first damper 11. The end face of the second short plate 162 away from the support seat 14 is connected to the first damper 11.

[0066] Specifically, such as Figure 2 As shown, the damping fixing plate 16 is used to fix the first damper 11 and ensure that the first damper 11 is retracted to the initial position when the electric cylinder 13 retracts. Thus, the first long plate 161 is set on the damping slider 18 and the first damper 11 is fixed on the first long plate 161 to increase the connection stability between the first damper 11 and the damping slider 18. The second short plate 162 is set at the end of the first long plate 161 near the electric cylinder 13, and the end face of the second short plate 162 away from the electric cylinder 13 abuts against the first damper 11. When the electric cylinder 13 retracts, the first damper 11 applies the retraction force of the electric cylinder 13 to the second short plate 162 to drive the damping slider 18 to slide to the initial position on the damping guide rail 15.

[0067] Optionally, the support base 14 includes a front base 141 and a rear base 142, with the electric cylinder 13 body disposed between the front base 141 and the rear base 142 to clamp the electric cylinder 13 between them, ensuring the stability of the electric cylinder 13. Furthermore, a through hole is provided on the front base 141, through which the telescopic end of the electric cylinder 13 passes and connects to the force sensor 12.

[0068] Optionally, the stiffness measuring device 2 further includes a first cover plate 27, which is disposed on the first air flotation guide rail 21, and a first gap is left between the first cover plate 27 and the first air flotation guide rail 21 to provide space for the installation and sliding of the first aperture assembly 22 and the second aperture assembly 23, and the first cover plate 27 can provide protection for the first aperture assembly 22, the second aperture assembly 23 and the first air flotation guide rail 21.

[0069] The reaction force measuring device 3 also includes a second cover plate 30, which is disposed on the second air flotation guide rail 31, and a second gap is left between the second cover plate 30 and the second air flotation guide rail 31 to provide space for the installation and sliding of the third aperture assembly 32 and the fourth aperture assembly 33. The second cover plate 30 can also protect the third aperture assembly 32, the fourth aperture assembly 33 and the second air flotation guide rail 31.

[0070] Optionally, the first aperture assembly 22 includes a first slider 221, a first driving member, and a first aperture plate 223. The first driving member includes a first stator coil and a first mover magnet assembly connected together. The first slider 221 is slidably disposed on the first air bearing guide rail 21. The first stator coil is disposed between the first cover plate 27 and the first air bearing guide rail 21. The output end of the first mover magnet assembly extends from the first gap and is connected to one end of the first slider 221 facing the gap between the first cover plate 27 and the first air bearing guide rail 21. The first aperture plate 223 is disposed at one end of the first slider 221 away from the gap between the first cover plate 27 and the first air bearing guide rail 21. The first driving member is used to drive the first slider 221 to drive the first aperture plate 223 to slide along the first air bearing guide rail 21.

[0071] The second aperture assembly 23 includes a second slider 231, a second driving member, and a second aperture plate 233. The second driving member includes a second stator coil and a second mover magnet assembly connected to each other. The second slider 231 is disposed on the first air bearing guide rail 21. The second stator coil is disposed between the first cover plate 27 and the first air bearing guide rail 21. The second mover magnet assembly is disposed at one end of the second slider 231 facing the gap between the first cover plate 27 and the first air bearing guide rail 21. The second aperture plate 233 is disposed at one end of the second slider 231 away from the gap between the first cover plate 27 and the first air bearing guide rail 21. The second driving member is used to drive the second slider 231 to move the second aperture plate 233 along the first air bearing guide rail 21.

[0072] The third aperture assembly 32 includes a third slider 321, a third driving member, and a third aperture plate 323. The third driving member includes a third stator coil and a third mover magnet assembly connected together. The third slider 321 is disposed on the second air-bearing guide rail 31. The third stator coil is disposed between the second cover plate 30 and the second air-bearing guide rail 31. The third mover magnet assembly is disposed at one end of the third slider 321 facing the gap between the second cover plate 30 and the second air-bearing guide rail 31. The third aperture plate 323 is disposed at one end of the third slider 321 away from the gap between the second cover plate 30 and the second air-bearing guide rail 31. The third driving member is used to drive the third slider 321 to move the third aperture plate 323 along the second air-bearing guide rail 31.

[0073] The fourth aperture assembly 33 includes a fourth slider 331, a fourth driving member, and a fourth aperture plate 333. The fourth driving member includes a fourth stator coil and a fourth mover magnet assembly connected together. The fourth slider 331 is disposed on the second air-bearing guide rail 31. The fourth stator coil is disposed between the second cover plate 30 and the second air-bearing guide rail 31. The fourth mover magnet assembly is disposed at one end of the fourth slider 331 facing the gap between the second cover plate 30 and the second air-bearing guide rail 31. The fourth aperture plate 333 is disposed at one end of the fourth slider 331 away from the gap between the second cover plate 30 and the second air-bearing guide rail 31. The fourth driving member is used to drive the fourth slider 331 to move the fourth aperture plate 333 along the second air-bearing guide rail 31.

[0074] Specifically, such as Figure 5 and Figure 6As shown, the first slider 221 is located at the first end of the first air buoyancy guide rail 21, i.e., the end facing the positive X-axis. The second slider 231 is located on the first air buoyancy guide rail 21, and the distance between the second slider 231 and the first slider 221 is the minimum aperture spacing. This defines the direction from the first end to the second end of the first air buoyancy guide rail 21 as the positive X-axis direction, and the direction from the second end to the first end of the first air buoyancy guide rail 21 as the negative X-axis direction. The third slider 321 and the fourth slider 331 have the same structure as the first slider 221 and the second slider 231, and will not be described in detail here.

[0075] It should be noted that a connecting through hole is provided on the first cover plate 27. An externally mounted motor can be electrically connected to the first stator coil and the second stator coil through this connecting through hole. When driving the first aperture assembly 22 and the second aperture assembly 23, the motor energizes the first stator coil and the second stator coil, generating magnetic force due to magnetic induction, thereby achieving electromagnetic coupling drive. The second cover plate 30, the third aperture assembly 32, and the fourth aperture assembly 33 have the same structure as the first cover plate 27, the first aperture assembly 22, and the second aperture assembly 23, and will not be described further here.

[0076] Optionally, the stiffness measuring device 2 further includes a first reading head 28 and a second adapter plate 29. The first reading head 28 is disposed on the first grating ruler 25. One end of the second adapter plate 29 is connected to the first reading head 28, and the other end is used to connect to the frame to ensure the installation stability of the first grating ruler 25.

[0077] The reaction force measuring device 3 also includes a second reading head 38 and a third adapter plate 39. The second reading head 38 is disposed on the second grating ruler 36. One end of the third adapter plate 39 is connected to the second reading head 38, and the other end is used to connect to the frame to ensure the installation stability of the second grating ruler 36.

[0078] like Figure 9 As shown, an embodiment of the present invention provides a reaction force measurement method based on a reaction force measurement system. The method includes:

[0079] Step S1: Install the damping measuring device 1 on the foundation, control the electric cylinder 13 to operate according to the preset electric cylinder parameters, and obtain the damping parameters based on the preset electric cylinder parameters and the reading of the force sensor 12.

[0080] Specifically, the preset electric cylinder parameters include the push rod speed, the set electric cylinder speed, and the corresponding speed per revolution. First, the push rod speed of electric cylinder 13 is obtained based on the preset electric cylinder parameters, which can be expressed by the formula: v = nv r Where v represents the push rod speed, n represents the set electric cylinder speed, and v rThis indicates the speed corresponding to each revolution. Then, the damping force reading from the force sensor is obtained. Based on the push rod speed and the damping force reading, the damping parameters of the first damper 11 are obtained, expressed by the formula: c = F 力 / v, where c is the damping parameter, F 力 This is the reading of the damping force.

[0081] Step S2: Install the stiffness measuring device 2 on the frame, drive the first aperture assembly 22 and the second aperture assembly 23 according to the preset driving parameters, and obtain the overall stiffness according to the preset driving parameters and the first overall displacement obtained by the first grating ruler 25.

[0082] Specifically, the preset drive parameters include the first motor current, the motor thrust constant, etc. First, the first motor thrust is obtained based on the preset drive parameters, expressed by the formula: F 1电 =Pi1, where F 1电 Let P represent the thrust of the first motor, i1 represent the thrust constant of the motor, and i1 represent the current of the first motor. Then, obtain the reading of the first grating ruler 25. For example, the first overall displacement can be obtained directly using the first reading head 28. Based on the first motor thrust and the first overall displacement, the overall stiffness can be obtained, expressed by the formula: k = F. 1电 / s1, where k represents the overall stiffness and s1 represents the first overall displacement.

[0083] Step S3: Install the reaction force measuring device 3 on the frame, drive the third aperture assembly 32 and the fourth aperture assembly 33 to run according to the preset driving parameters, and obtain the reaction force based on the dynamic motion equilibrium equation, according to the preset driving parameters, and using the second overall displacement and overall velocity obtained by the second grating ruler 36.

[0084] Specifically, the preset drive parameters include the second motor current, motor thrust constant, etc. First, the thrust of the second motor is obtained based on the preset drive parameters, which is expressed by the formula: F 2电 =Pi1, where F 2电 Let P represent the thrust of the second motor, P represent the motor thrust constant, and i2 represent the current of the second motor. It should be noted that, ideally, the current of the second motor should be equal to the current of the first motor, meaning the preset driving parameters applied to the first aperture assembly 22, the second aperture assembly 23, the third aperture assembly 32, and the fourth aperture assembly 33 should be the same. Based on the dynamic equilibrium equation, i.e., ma2 + cv2 + ks2 = Freaction, where m is the overall mass of the system, c is the damping parameter of the damper, k is the overall stiffness of the system, a2 is the overall acceleration of the system, v2 is the overall velocity of the system, and s2 is the overall displacement of the system, the simplex measurement formula for the reaction force measurement system in this embodiment is established: Freaction 反 =cv² + ks², thus obtaining the reaction force. Where, F 反Let represent the reaction force, c represent the damping parameter, k represent the overall stiffness, s2 represent the second overall displacement, and v2 represent the first derivative of the second overall displacement s2 with respect to the running time.

[0085] The beneficial effects of the reaction force measurement method in this embodiment compared to the prior art are the same as those of the reaction force measurement system described above, and will not be repeated here.

[0086] While the present invention has been disclosed above, its scope of protection is not limited thereto. Those skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention, and all such changes and modifications will fall within the scope of protection of the present invention.

Claims

1. A reaction force measurement system, characterized in that, It includes a damping measuring device (1) with communication connection, a stiffness measuring device (2) and a reaction force measuring device (3); The damping measuring device (1) includes a first damper (11), a force sensor (12), an electric cylinder (13), and a support base (14). The support base (14) is used to be installed on the foundation. The electric cylinder (13) is installed on the support base (14). The telescopic end of the electric cylinder (13) is connected to one end of the force sensor (12), and the other end of the force sensor (12) is connected to the first damper (11). The stiffness measuring device (2) includes a first air-bearing guide rail (21), a first aperture assembly (22), a second aperture assembly (23), a second damper (24), a first grating ruler (25), and a first support frame (26). The two first support frames (26) are respectively disposed at both ends of the first air-bearing guide rail (21) and are used to connect with the frame. The first aperture assembly (22) and the second aperture assembly (23) are disposed on the first air-bearing guide rail (21) and are used to slide along the first air-bearing guide rail (21). The second damper (24) is disposed on the end face of the first air-bearing guide rail (21) facing the frame. The first grating ruler (25) is disposed on the first air-bearing guide rail (21). The reaction force measuring device (3) includes a second air-bearing guide rail (31), a third aperture assembly (32), a fourth aperture assembly (33), a third damper (34), a second support frame (35), a second grating ruler (36), and a damping adapter plate (37). The two second support frames (35) are respectively set at both ends of the second air-bearing guide rail (31) and are used to connect with the frame. The third aperture assembly (32) and the fourth aperture assembly (33) are set on the second air-bearing guide rail (31) and are used to slide along the second air-bearing guide rail (31). The third damper (34) is used to be set on the end face of the second air-bearing guide rail facing the frame. One end of the damping adapter plate (37) is connected to the third damper (34), and the other end is used to connect with the frame. The second grating ruler (36) is set on the second air-bearing guide rail (31). The first damper (11), the second damper (24) and the third damper (34) are the same, the first aperture assembly (22) and the third aperture assembly (32) are the same, and the second aperture assembly (23) and the fourth aperture assembly (33) are the same.

2. The reaction force measurement system according to claim 1, characterized in that, The damping measuring device (1) also includes a damping guide rail (15), a damping fixing plate (16), a first adapter plate (17), and a damping slider (18); The damping slider (18) is slidably disposed on the damping guide rail (15), the damping fixing plate (16) is disposed on the damping slider (18), the fixed end of the first damper (11) is disposed on the damping fixing plate (16), and the movable end of the first damper (11) is connected to the force sensor (12) through the first adapter plate (17).

3. The reaction force measurement system according to claim 2, characterized in that, The damping fixing plate (16) includes a first long plate (161) and a second short plate (162). One end face of the first long plate (161) is used to connect with the end face of the damping slider (18) away from the foundation. The other end face is provided with the second short plate (162) and the first damper (11). The end face of the second short plate (162) away from the support base (14) is connected to the first damper (11).

4. The reaction force measurement system according to claim 1, characterized in that, The damping center of the first damper (11), the measuring center of the force sensor (12), and the force application center of the electric cylinder (13) are on the same horizontal straight line.

5. The reaction force measurement system according to claim 1, characterized in that, The support base (14) includes a front seat (141) and a rear seat (142). The body of the electric cylinder (13) is disposed between the front seat (141) and the rear seat (142). A through hole is provided on the front seat (141). The telescopic end of the electric cylinder (13) passes through the through hole and is connected to the force sensor (12).

6. The reaction force measurement system according to claim 1, characterized in that, The stiffness measuring device (2) further includes a first cover plate (27), which is disposed on the first air-bearing guide rail (21), and a first gap is left between the first cover plate (27) and the first air-bearing guide rail (21). The reaction force measuring device (3) further includes a second cover plate (30), which is disposed on the second air flotation guide rail (31), and a second gap is left between the second cover plate (30) and the second air flotation guide rail (31).

7. The reaction force measurement system according to claim 6, characterized in that, The first aperture assembly (22) includes a first slider (221), a first driving member, and a first aperture plate (223). The first driving member includes a first stator coil and a first mover magnet assembly connected together. The first slider (221) is slidably disposed on the first air-bearing guide rail (21). The first stator coil is disposed between the first cover plate (27) and the first air-bearing guide rail (21). The output end of the first mover magnet assembly extends out from the first gap and is connected to one end of the first slider (221) facing the gap between the first cover plate (27) and the first air-bearing guide rail (21). The first aperture plate (223) is disposed at one end of the first slider (221) away from the gap between the first cover plate (27) and the first air-bearing guide rail (21). The first driving member is used to drive the first slider (221) to drive the first aperture plate (223) to slide along the first air-bearing guide rail (21). The second aperture assembly (23), the third aperture assembly (32), and the fourth aperture assembly (33) have the same structure as the first aperture assembly (22).

8. The reaction force measurement system according to claim 1, characterized in that, The stiffness measuring device (2) further includes a first reading head (28) and a second adapter plate (29). The first reading head (28) is disposed on the first grating ruler (25). One end of the second adapter plate (29) is connected to the first reading head (28), and the other end is used to connect to the frame. The reaction force measuring device (3) further includes a second reading head (38) and a third adapter plate (39). The second reading head (38) is mounted on the second grating ruler (36). One end of the third adapter plate (39) is connected to the second reading head (38), and the other end is used to connect to the frame.

9. A method for measuring reaction force, characterized in that, Based on the reaction force measurement system according to any one of claims 1-7, the method includes: The damping measuring device (1) is installed on the foundation, and the electric cylinder (13) is controlled to run according to the preset electric cylinder parameters. The damping parameters are obtained according to the preset electric cylinder parameters and the reading of the force sensor (12). The stiffness measuring device (2) is installed on the frame, and the first aperture assembly (22) and the second aperture assembly (23) are driven to run according to the preset driving parameters. The overall stiffness is obtained according to the preset driving parameters and the first overall displacement obtained by using the first grating ruler (25). The reaction force measuring device (3) is installed on the frame, and the third aperture assembly (32) and the fourth aperture assembly (33) are driven to run according to the preset driving parameters. Based on the dynamic motion equilibrium equation, the reaction force is obtained according to the preset driving parameters, the second overall displacement and the overall velocity obtained by the second grating ruler (36).

10. The reaction force measurement method according to claim 9, characterized in that, The reaction force obtained based on the preset driving parameters, the second overall displacement, and the overall velocity obtained using the second grating ruler (36) is expressed by the following formula: F 反 =cv2+ks2, Among them, F 反 Let represent the reaction force, c represent the damping parameter, k represent the overall stiffness, s2 represent the second overall displacement, and v2 represent the first derivative of the second overall displacement s2 with respect to the running time.

Citation Information

Patent Citations

  • Lifting device for counterforce-type roller braking check-out bench

    CN104819853A

  • Micro-Newton-level flying insect contact reaction force test system without interference in test process

    CN113280961A