Gas analysis system and gas analysis method

Abstract

The invention belongs to the technical field of gas detection and analysis, and particularly relates to a gas analysis system and a gas analysis method. The gas analysis system comprises a process chamber, a sampling unit, a mass spectrometry unit, a vacuumizing unit and a calibration unit, the mass spectrometry unit comprises an analysis chamber, a gas analyzer and a first vacuum gauge, the analysis chamber is communicated with the process chamber through the sampling unit, the gas analyzer is communicated with the analysis chamber and used for analyzing components and concentration of gas in the analysis chamber, and the first vacuum gauge is connected to the analysis chamber and used for monitoring the vacuum degree of the analysis chamber; the vacuumizing unit is communicated with the analysis chamber, and the vacuumizing unit is used for sucking gas in the analysis chamber; the calibration unit comprises a standard gas source, the standard gas source is gas with known data, the data comprises components and concentration, and the standard gas source can be led to the analysis chamber. The gas analysis system in the technical scheme can be calibrated through the calibration unit, so that the accuracy of an analysis result is improved.

Description

Technical Field

[0001] The present invention belongs to the technical field of gas detection and analysis, and in particular relates to a gas analysis system and a gas analysis method. Background Art

[0002] In the field of industrial production, it is often necessary to analyze the gas composition, partial pressure and concentration of various process chambers to determine whether the gas content is within a reasonable range, and to provide timely feedback control to ensure the normal operation of industrial production.

[0003] For example, gas lasers are widely used in industry, and their working fluid is often a mixed gas. The working pressure range of the working fluid is relatively wide, such as 2 to 6 atmospheres. The performance of the gas laser is closely related to the composition and concentration of the working gas, as well as the content of polluting gases in the working fluid. It is necessary to analyze the gas composition and concentration in the gas laser discharge cavity in real time. For another example, deep ultraviolet lithography machines, extreme ultraviolet lithography machines, etc. contain many process chambers with different requirements, and the gas content in each cavity, such as H2O, SO2, O2 and C, needs to be closely monitored at all times. x H y The composition and partial pressure of the gas.

[0004] Therefore, it is necessary to provide a gas analysis system that can more accurately analyze the composition and concentration of the process chamber gas. Summary of the invention

[0005] The object of the present invention is to provide a gas analysis system capable of accurately analyzing the sampled gas in the process chamber, and this object is achieved through the following technical solutions:

[0006] A first aspect of the present invention provides a gas analysis system, comprising a process chamber, a sampling unit, a mass spectrometry unit, a vacuum unit and a calibration unit;

[0007] The mass spectrometry unit comprises an analysis chamber, a gas analyzer and a first vacuum gauge, wherein the analysis chamber is connected to the process chamber through the sampling unit, the gas analyzer is connected to the analysis chamber and is used to analyze the composition and concentration of the gas inside the analysis chamber, and the first vacuum gauge is connected to the analysis chamber and is used to monitor the vacuum degree of the analysis chamber;

[0008] The vacuum unit is in communication with the analysis chamber;

[0009] The calibration unit comprises a standard gas source, which is a gas with known data, wherein the data comprises composition and concentration, and the standard gas source can be connected to the analysis chamber.

[0010] By using the gas analysis system in the present technical solution, the accuracy of the monitoring elements in the system can be calibrated before analyzing the sampled gas. When calibrating, prepare a standard gas source in advance, evacuate the analysis chamber through a vacuum unit, and monitor the vacuum degree of the analysis chamber through a first vacuum gauge. After the vacuum degree of the analysis chamber reaches the requirement, introduce a standard gas source into the analysis chamber, and the gas analyzer analyzes the standard gas source to obtain the analysis result. Since the standard gas source uses a gas with known data (composition and concentration, etc.), by comparing the analysis result with the known data, it is possible to determine whether the analysis result is accurate. When the deviation of the analysis result exceeds the preset value, the parameters of the relevant devices are adjusted or the correction parameters for correcting the analysis result are obtained, so that accurate analysis results can be obtained when analyzing the sampled gas in the process chamber.

[0011] In addition, the gas analysis system of the present invention may also have the following additional technical features:

[0012] In some embodiments of the present invention, the sampling unit includes a sampling pipeline and a flow restrictor arranged on the sampling pipeline, the inlet of the sampling pipeline is connected to the process chamber, the outlet of the sampling pipeline is connected to the analysis chamber, and the flow restrictor is a capillary or a microporous structure or a fine-tuning valve, and the flow restrictor is used to limit the gas flow and control the gas flow state.

[0013] In some embodiments of the present invention, a main valve is provided on the sampling pipeline, the main valve is located upstream of the flow restrictor, and the main valve is used to control the on-off of the sampling pipeline, the calibration unit includes a first calibration pipeline, the standard gas source includes a first gas source, and the first gas source is nitrogen, argon, helium, hydrocarbon gas or a mixed gas;

[0014] The outlet of the first calibration pipeline is connected to the sampling pipeline and is located between the main valve and the flow restrictor. The first gas source can pass through the first calibration pipeline to the flow restrictor and then pass through the flow restrictor to the analysis chamber.

[0015] In some embodiments of the present invention, the calibration unit further includes a second calibration pipeline, the standard gas source further includes a second gas source, and the second gas source is nitrogen, argon, helium, hydrocarbon gas or a mixed gas;

[0016] The outlet of the second calibration pipeline is in communication with the analysis chamber, and the second gas source can flow to the analysis chamber through the second calibration pipeline.

[0017] In some embodiments of the present invention, the vacuum unit includes a main pump and a fore-stage pump. The main pump is connected to the analysis chamber and is used to pump gas from the analysis chamber. The fore-stage pump is connected to the main pump and is used to pump gas discharged from the main pump.

[0018] In some embodiments of the present invention, the gas analysis system further comprises a baking device, and the baking device is used to heat the analysis chamber.

[0019] In some embodiments of the present invention, the vacuum unit further includes a fore-stage pump, the fore-stage pump is connected to the main pump, and the fore-stage pump is used to suck the gas discharged by the main pump.

[0020] In some embodiments of the present invention, the gas analysis system also includes a gas processing unit, which includes a gas processing pipeline and a third gas source. The outlet of the gas processing pipeline is connected to the main pump, and the third gas source leads to the main pump through the gas processing pipeline. The gas processing unit is used to neutralize or dilute the gas entering the main pump.

[0021] In some embodiments of the present invention, the sampling unit includes a first sampling channel, a second sampling channel and a third sampling channel arranged in parallel, the first sampling channel is provided with a first valve and a first flow limiter, the first flow limiter is arranged downstream of the first valve, the second sampling channel is provided with a second valve and a second flow limiter, the second flow limiter is arranged downstream of the second valve, and the third sampling channel is provided with a third valve, the first flow limiter and the second flow limiter are used to limit the gas flow rate and control the gas flow state, and the first valve, the second valve and the third valve are opened or closed according to the gas pressure of the sampling gas.

[0022] In a second aspect of the present invention, a gas analysis method is provided, using the above-mentioned gas analysis system, the gas analysis method comprising calibrating the gas analysis system:

[0023] The analysis chamber is evacuated by the vacuum pumping unit until the vacuum degree monitored by the first vacuum gauge is lower than a first preset vacuum degree;

[0024] After the vacuum degree obtained by the first vacuum gauge reaches a first preset vacuum degree, the standard gas source is introduced into the analysis chamber, and the analysis result of the standard gas source is obtained by the gas analyzer;

[0025] Calculating the deviation between the analysis result of the standard gas source and the known data of the standard gas source;

[0026] When the deviation is greater than a preset value, a correction coefficient for correcting the analysis result is calculated, or the parameters of the gas analyzer are adjusted to make the deviation less than the preset value.

[0027] In some embodiments of the present invention, the gas analysis method further comprises the following steps:

[0028] The analysis chamber is evacuated by the vacuum pumping unit until the vacuum degree monitored by the first vacuum gauge is lower than the first preset vacuum degree;

[0029] The sampling gas in the process chamber is transported to the analysis chamber through the sampling unit, and the analysis result of the sampling gas is obtained through the gas analyzer;

[0030] The sampling gas is stopped from being delivered to the analysis chamber, and the analysis chamber is evacuated by the vacuum pumping unit until the vacuum degree monitored by the first vacuum gauge is lower than the first preset vacuum degree. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] Various other advantages and benefits will become apparent to those of ordinary skill in the art by reading the detailed description of the preferred embodiments below. The accompanying drawings are only for the purpose of illustrating the preferred embodiments and are not to be considered as limiting the present invention. Moreover, the same reference numerals are used throughout the accompanying drawings to represent the same components. In the accompanying drawings:

[0032] Figure 1 The structure diagram of the gas analysis system according to the embodiment of the present invention is schematically shown;

[0033] Figure 2 A partial structural diagram of a gas analysis system according to an embodiment of the present invention is schematically shown;

[0034] Figure 3 The process of the gas analysis method according to the embodiment of the present invention is schematically shown. Figure 1 ;

[0035] Figure 4 The process of the gas analysis method according to the embodiment of the present invention is schematically shown. Figure 2 ;.

[0036] The reference numerals in the accompanying drawings represent the following:

[0037] 100. Process chamber;

[0038] 200, sampling unit; 210, sampling pipeline; 211, flow limiter; 212, main valve; 220, first sampling channel; 221, first valve; 222, first flow limiter; 230, second sampling channel; 231, second valve; 232, second flow limiter; 240, third sampling channel; 241, third valve; 250, third vacuum gauge;

[0039] 300, mass spectrometry unit; 310, analysis chamber; 320, gas analyzer; 330, first vacuum gauge; 340, baking device;

[0040] 400, vacuum unit; 410, main pump; 411, main switch valve; 420, front stage pump; 421, front stage switch valve; 422, second vacuum gauge;

[0041] 500, calibration unit; 510, first calibration pipeline; 511, first gas source; 512, first switch valve; 513, first regulating valve; 520, second calibration pipeline; 521, second gas source; 522, second switch valve; 523, second regulating valve;

[0042] 600, gas processing unit; 610, gas processing pipeline; 611, third gas source; 612, third switch valve; 613, third regulating valve. DETAILED DESCRIPTION

[0043] The exemplary embodiments of the present disclosure will be described in more detail below with reference to the accompanying drawings. Although the exemplary embodiments of the present disclosure are shown in the accompanying drawings, it should be understood that the present disclosure can be implemented in various forms and should not be limited by the embodiments described herein. On the contrary, these embodiments are provided in order to enable a more thorough understanding of the present disclosure and to fully convey the scope of the present disclosure to those skilled in the art.

[0044] It should be understood that the terms used herein are only for the purpose of describing specific example embodiments and are not intended to be limiting. Unless the context clearly indicates otherwise, the singular forms "one", "an" and "said" as used herein may also be meant to include plural forms. The terms "include", "comprise", "contain", and "have" are inclusive, and therefore specify the existence of stated features, steps, operations, elements and / or parts, but do not exclude the existence or addition of one or more other features, steps, operations, elements, parts, and / or combinations thereof. The method steps, processes, and operations described herein are not interpreted as necessarily requiring them to be performed in the specific order described or illustrated, unless the execution order is clearly indicated. It should also be understood that additional or alternative steps may be used.

[0045] Although the terms first, second, third, etc. can be used in the text to describe multiple elements, components, regions, layers and / or sections, these elements, components, regions, layers and / or sections should not be limited by these terms. These terms can only be used to distinguish an element, component, region, layer or section from another region, layer or section. Unless the context clearly indicates, terms such as "first", "second" and other numerical terms do not imply order or sequence when used in the text. Therefore, the first element, component, region, layer or section discussed below can be referred to as the second element, component, region, layer or section without departing from the teaching of the example embodiments.

[0046] For ease of description, spatial relative terms may be used herein to describe the relationship of one element or feature relative to another element or feature as shown in the figure, such as "inside", "outside", "inner side", "outer side", "below", "below", "above", "above", etc. Such spatial relative terms are intended to include different orientations of the device in use or operation in addition to the orientation depicted in the figure. For example, if the device in the figure is turned over, then the elements described as "below other elements or features" or "below other elements or features" will subsequently be oriented as "above other elements or features" or "above other elements or features". Therefore, the example term "below..." can include both above and below orientations.

[0047] Figure 1 The structure diagram of the gas analysis system according to the embodiment of the present invention is schematically shown. Figure 1 and Figure 2 As shown, the present invention proposes a gas analysis system, including a process chamber 100, a sampling unit 200, a mass spectrometry unit 300, a vacuum unit 400 and a calibration unit 500; the mass spectrometry unit 300 includes an analysis chamber 310, a gas analyzer 320 and a first vacuum gauge 330, the analysis chamber 310 is connected to the process chamber 100 through the sampling unit 200, the gas analyzer 320 is connected to the analysis chamber 310, and is used to analyze the composition and concentration of the gas inside the analysis chamber 310, the first vacuum gauge 330 is connected to the analysis chamber 310, and is used to monitor the vacuum degree of the analysis chamber 310; the vacuum unit 400 is connected to the analysis chamber 310, and the vacuum unit 400 is used to suck the gas in the analysis chamber 310; the calibration unit 500 includes a standard gas source, the standard gas source is a gas with known data, the data includes composition and concentration, and the standard gas source can lead to the analysis chamber 310.

[0048] By using the gas analysis system in the present technical solution, the accuracy of the monitoring elements in the system can be calibrated before analyzing the sampled gas. When calibrating, a standard gas source is prepared in advance, the analysis chamber 310 is evacuated by the vacuum unit 400, and the vacuum degree of the analysis chamber 310 is monitored by the first vacuum gauge 330. After the vacuum degree of the analysis chamber 310 reaches the requirement, the standard gas source is introduced into the analysis chamber 310, and the gas analyzer 320 analyzes the standard gas source to obtain the analysis result. Since the standard gas source uses a gas with known data (composition and concentration, etc.), the analysis result can be compared with the known data to determine whether the analysis result is accurate. When the deviation of the analysis result exceeds the preset value, the parameters of the relevant device are adjusted or the correction parameters for correcting the analysis result are obtained, so that when analyzing the sampled gas in the process chamber, accurate analysis results can be obtained.

[0049] Optionally, the process chamber 100 is a container for sampling gas, such as a discharge chamber of an excimer laser, a vacuum chamber of an extreme ultraviolet lithography machine, etc., and may also be other high-pressure, normal-pressure and vacuum containers.

[0050] Optionally, the analysis chamber 310 may be made of stainless steel or aluminum alloy. The gas analyzer 320 may be a time-of-flight mass spectrometer, a quadrupole mass spectrometer, an ion trap mass spectrometer or other gas analyzers.

[0051] Furthermore, the gas analysis system further includes a baking device 340 , and the baking device 340 is used to heat the analysis chamber 310 .

[0052] After the analysis of the sampled gas is completed, the analysis chamber 310 is baked at high temperature by the baking device 340 to remove the sampled gas adsorbed on the inner wall of the analysis chamber 310, thereby obtaining a good system background and improving the accuracy of the gas analysis.

[0053] The first vacuum gauge 330 can measure the vacuum degree of the analysis chamber 310. The gas analysis system also includes a control unit, and the first vacuum gauge 330 is connected to the control unit by signal, so as to transmit data to the control unit. The first vacuum gauge 330 can be a thermoelectric vacuum gauge, an ionization vacuum gauge or a capillary vacuum gauge.

[0054] Optionally, the standard gas source may be nitrogen, argon, helium, hydrocarbon gas or a mixed gas, etc.

[0055] Further, the sampling unit 200 includes a sampling pipeline 210 and a flow restrictor 211 disposed on the sampling pipeline 210. The inlet of the sampling pipeline 210 is connected to the process chamber 100, and the outlet of the sampling pipeline 210 is connected to the analysis chamber 310. The flow restrictor 211 is used to limit the gas flow rate and control the gas flow state. Optionally, the flow restrictor 211 preferably adopts a capillary or microporous structure, and a fine-tuning valve or the like may also be selected.

[0056] It can be understood that one end of the sampling line 210 is connected to the process chamber 100 for sampling at the target position, and the other end of the sampling line 210 is connected to the analysis chamber 310, so that the sampled gas is delivered to the designated position of the analysis chamber 310, especially to the vicinity of the ion source of the gas analyzer 320 or inside the ion source. Optionally, after the analysis of the sampled gas is completed, the baking device 340 can be used to bake the analysis line at high temperature to remove the sampled gas adsorbed on the inner wall of the analysis line, so as to obtain a good system background and improve the accuracy of the gas analysis. Furthermore, in order to reduce the device background as much as possible, the material of the sampling line 210 is preferably stainless steel or quartz glass, and silicon-based materials or other materials can also be used.

[0057] In the present technical solution, the flow restrictor 211 is used to limit the gas flow rate to control the gas inlet flow rate and vacuum pressure of the analysis chamber 310 on the one hand, and to control the flow state of the gas on the other hand to achieve non-destructive sampling.

[0058] Furthermore, a main valve 212 is provided on the sampling pipeline 210, and the main valve 212 is located upstream of the flow restrictor 211. The main valve 212 is used to control the on-off of the sampling pipeline 210. The calibration unit 500 includes a first calibration pipeline 510, and the standard gas source includes a first gas source 511. The first gas source 511 is nitrogen, argon, helium, hydrocarbon gas or a mixed gas; the outlet of the first calibration pipeline 510 is connected to the sampling pipeline 210 and is located between the main valve 212 and the flow restrictor 211. The first gas source 511 can pass through the first calibration pipeline 510 to the flow restrictor 211, and pass through the flow restrictor 211 to the analysis chamber 310.

[0059] According to the different air pressures of the process chamber 100, the main valve 212 can be a pressure reducing valve, a ball valve, a needle valve, a bellows stop valve or a combination of multiple valves that can realize the on-off of the sampling pipeline 210. When the main valve 212 is opened, the sampling gas inside the process chamber 100 can enter the inside of the analysis chamber 310 through the sampling pipeline 210. When the main valve 212 is closed, the sampling gas cannot be transported. It can be understood that the function of the first calibration pipeline 510 is to transport the first gas source 511. The first calibration pipeline 510 is provided with a first switch valve 512 and a first regulating valve 513. The first switch valve 512 is used to control the on-off of the first calibration pipeline 510, and the first regulating valve 513 is used to control the flow rate of the first gas source 511. By transporting the first gas source 511 to the analysis chamber 310, the accuracy of the restrictor 211 and the gas analyzer 320 can be tested. During calibration, the main valve 212 is closed, and the analysis chamber 310 is evacuated through the vacuum unit 400. When the first vacuum gauge 330 detects that the vacuum degree of the analysis chamber 310 meets the preset vacuum degree, the first gas source 511 is delivered to the sampling pipeline 210 through the first calibration pipeline 510. Then, the first gas source 511 passes through the flow limiter 211 and enters the interior of the analysis chamber 310. The gas analyzer 320 on the analysis chamber 310 analyzes the first gas source 511. Since the data of the first gas source 511 is known, by comparing the analysis result of the first gas source 511 with the known data, it can be determined whether the accuracy of the flow limiter 211 and the gas analyzer 320 meets the requirements. It is understandable that when the analysis result of the first gas source 511 and the known data deviation of the first gas source 511 exceed the preset value, it means that the accuracy of one of the restrictor 211 or the gas analyzer 320 is low, or the accuracy of both does not meet the requirements. At this time, both can be adjusted separately, or further tested by a standard gas source. Optionally, the preset value can be ±5%, ±3% or ±2%, etc., depending on the specific test requirements.

[0060] Exemplarily, the calibration unit 500 also includes a second calibration line 520, and the standard gas source also includes a second gas source 521, and the second gas source 521 is nitrogen, argon, helium, hydrocarbon gas or a mixed gas; the outlet of the second calibration line 520 is connected to the analysis chamber 310, and the second gas source 521 can be connected to the analysis chamber 310 through the second calibration line 520.

[0061] It can be understood that the function of the second calibration pipeline 520 is to deliver the second gas source 521. Optionally, a second switch valve 522 and a second regulating valve 523 are provided on the second calibration pipeline 520. The second switch valve 522 is used to control the on-off of the second calibration pipeline 520, and the second regulating valve 523 is used to control the flow rate of the second gas source 521. By delivering the second gas source 521 to the analysis chamber 310, the accuracy of the gas analyzer 320 can be tested. When the calibration is performed, the main valve 212 is closed, and the analysis chamber 310 is evacuated through the vacuum unit 400. When the first vacuum gauge 330 monitors that the vacuum degree of the analysis chamber 310 meets the preset vacuum degree, the second gas source 521 is delivered to the analysis chamber 310 through the second calibration pipeline 520. Then, the gas analyzer 320 on the analysis chamber 310 analyzes the second gas source 521. Since the data of the second gas source 521 is known, by comparing the analysis result with the known data, it can be determined whether the accuracy of the gas analyzer 320 meets the requirements. It can be understood that when the deviation between the analysis result of the second gas source 521 and the known data of the second gas source 521 exceeds the preset value, it means that the accuracy of the gas analyzer 320 is low, and at this time, the gas analyzer 320 needs to be adjusted. The composition and concentration of the first gas source 511 and the second gas source 521 can be the same or different, and are not specifically limited here.

[0062] Furthermore, the vacuum unit 400 includes a main pump 410 and a front pump 420. The main pump 410 is connected to the analysis chamber 310 and is used to pump gas from the analysis chamber 310. The front pump 420 is connected to the main pump 410 and is used to pump gas discharged from the main pump 410.

[0063] It is understandable that before starting to deliver the sample gas or standard gas, the vacuum unit 400 is required to evacuate the analysis chamber 310 so that the vacuum degree of the analysis chamber 310 is lower than the preset vacuum degree to ensure the accuracy of the analysis result. After the analysis is completed, the vacuum unit 400 is also required to evacuate the analysis chamber 310 so that the vacuum degree of the analysis chamber 310 is lower than the preset vacuum degree to ensure a good system background. Exemplarily, the preset vacuum degree can be 0.0001Pa. Optionally, the main pump 410 can be a molecular pump, an ion pump, a Roots pump, a screw pump, a vortex dry pump, etc.

[0064] Optionally, a main switch valve 411 is provided between the main pump 410 and the analysis chamber 310. The main switch valve 411 is used to control the on-off of the pipeline. When the main pump 410 needs to be started, the main switch valve 411 is opened, and when the main pump 410 is not needed to work, the main switch valve 411 is closed.

[0065] The fore-stage pump 420 is used to provide fore-stage vacuum for the main pump 410. The setting of the fore-stage pump 420 can ensure that the system operates more stably and efficiently. Optionally, a fore-stage switch valve 421 is provided between the fore-stage pump 420 and the main pump 410, and the fore-stage switch valve 421 is used to control the on-off of the pipeline. Optionally, a second vacuum gauge 422 is provided between the fore-stage switch valve 421 and the fore-stage pump 420, and the second vacuum gauge 422 is used to measure the vacuum degree inside the pipeline. Optionally, the fore-stage pump 420 can be a molecular pump, an ion pump, a Roots pump, a screw pump, a vortex dry pump, etc.

[0066] Furthermore, the gas analysis system also includes a gas processing unit 600, which includes a gas processing pipeline 610 and a third gas source 611. The outlet of the gas processing pipeline 610 is connected to the main pump 410, and the third gas source 611 is connected to the main pump 410 through the gas processing pipeline 610. The gas processing unit 600 is used to neutralize or dilute the gas entering the main pump 410.

[0067] According to the characteristics of the sampled gas, the third gas source 611 should be an inert gas such as nitrogen or argon that can dilute the sampled gas, or a gas that reacts with the sampled gas for neutralization. Optionally, a third switch valve 612 and a third regulating valve 613 are provided on the gas processing pipeline 610, the third switch valve 612 is used to control the on-off of the gas processing pipeline 610, and the third regulating valve 613 is used to control the flow rate of the sampled gas in the gas processing pipeline 610.

[0068] Further, Figure 2 Schematically shows a partial structural diagram of a gas analysis system according to an embodiment of the present invention. Figure 2 The sampling unit 200 includes a first sampling channel 220, a second sampling channel 230 and a third sampling channel 240 arranged in parallel. The first sampling channel 220 is provided with a first valve 221 and a first flow restrictor 222, and the first flow restrictor 222 is arranged downstream of the first valve 221. The second sampling channel 230 is provided with a second valve 231 and a second flow restrictor 232, and the second flow restrictor 232 is arranged downstream of the second valve 231. The third sampling channel 240 is provided with a third valve 241. The first flow restrictor 222 and the second flow restrictor 232 are used to limit the gas flow rate and control the gas flow state. The first valve 221, the second valve 231 and the third valve 241 are opened or closed according to the gas pressure of the sampled gas.

[0069] When the pressure of the sampled gas meets the use conditions of the gas analyzer 320, the third sampling channel 240 is used to transport the sampled gas to the analysis chamber 310. The first restrictor 222 and the second restrictor 232 are set to face different process gas pressures. When the pressure of the sampled gas in the process chamber 100 meets the use conditions of the gas analyzer 320, the second sampling channel 230 or the third sampling channel 240 is used for transportation according to the pressure of the sampled gas.

[0070] Optionally, a third vacuum gauge 250 is provided at the front end of the sampling channel, and the air pressure at the front end of the sampling channel is obtained by the third vacuum gauge 250, so as to better select the sampling channel. Optionally, the third vacuum gauge 250, the first valve 221, the second valve 231, and the third valve 241 are all connected to the control unit signal, and the third vacuum gauge 250 transmits the measured air pressure value to the control unit, and the control unit controls each valve to open or close according to the air pressure at the front end of the sampling channel and the preset air pressure value of each sampling channel. Exemplarily, when the working gas pressure of the gas analyzer 320 is lower than 0.01Pa, if the third vacuum gauge 250 measures that the pressure of the sampling gas is lower than 0.01Pa, the third valve 241 is opened, the first valve 221 and the second valve 231 remain closed, and the sampling gas is transported to the analysis chamber 310 through the third sampling channel 240; if the third vacuum gauge 250 measures that the pressure of the sampling gas is greater than 0.01Pa and less than 10Pa, the second valve 231 is opened, the first valve 221 and the third valve 241 remain closed, and the sampling gas is transported to the analysis chamber 310 through the second sampling channel 230; if the third vacuum gauge 250 measures that the pressure of the sampling gas is greater than 10Pa and less than 100Pa, the first valve 221 is opened, the second valve 231 and the third valve 241 remain closed, and the sampling gas is transported to the analysis chamber 310 through the first sampling channel 220. It is understandable that, according to specific work requirements, only the third sampling channel 240 can be set, or the second sampling channel 230 and the third sampling channel 240 can be set at the same time, or more than three sampling channels can be set, and the opening conditions of the valves on each sampling channel are set according to specific needs.

[0071] Further, Figure 3 The process of the gas analysis method according to the embodiment of the present invention is schematically shown. Figure 1 See also Figure 3 The technical solution also provides a gas analysis method, using the above-mentioned gas analysis system, the gas analysis method includes calibrating the gas analysis system:

[0072] The analysis chamber 310 is evacuated by the vacuum unit 400 until the vacuum degree monitored by the first vacuum gauge 330 is lower than the first preset vacuum degree;

[0073] After the vacuum degree obtained by the first vacuum gauge 330 reaches the first preset vacuum degree, the standard gas source is introduced into the analysis chamber 310, and the analysis result of the standard gas source is obtained by the gas analyzer 320;

[0074] Calculate the deviation between the analysis result of the standard gas source and the known data of the standard gas source;

[0075] When the deviation is greater than a preset value, a correction factor for correcting the analysis result is calculated, or the parameters of the gas analyzer are adjusted to make the deviation less than the preset value.

[0076] Optionally, the first preset vacuum degree may be 0.001 Pa, and the preset value may be ±5%, or may be determined according to specific detection requirements.

[0077] It is understandable that when the deviation between the analysis result of the standard gas source and the known data of the standard gas source exceeds a preset value, the accuracy of one or more of the detection elements through which the standard gas source passes does not meet the use requirements and needs to be adjusted.

[0078] In one embodiment, introducing the standard gas source into the analysis chamber 310 includes:

[0079] First, the second gas source 521 is transported to the inside of the analysis chamber 310 through the second calibration pipeline 520, and the analysis result of the second gas source 521 in the analysis chamber 310 is obtained through the gas analyzer 320, and the analysis result of the second gas source 521 is compared with the known data of the first gas source 511. When the deviation between the analysis result of the second gas source 521 and the known data of the second gas source 521 is lower than the preset value, it is determined that the gas analyzer 320 meets the accuracy requirement. In this case, there is no need to adjust the gas analyzer 320. However, when the deviation between the analysis result of the second gas source 521 and the known data of the second gas source 521 is higher than the preset value, it is determined that the gas analyzer 320 does not meet the accuracy requirement, and it is necessary to calculate the correction coefficient for correcting the analysis result, or adjust the parameters of the gas analyzer 320 so that the deviation is less than the preset value.

[0080] After the accuracy of the gas analyzer 320 meets the requirements, it is further confirmed whether the restrictor 211 meets the accuracy requirements. Specifically, the first gas source 511 is transported to the sampling pipeline 210 through the first calibration pipeline 510, and the first gas source 511 enters the interior of the analysis chamber 310 through the restrictor 211, and the analysis result of the first gas source 511 in the analysis chamber 310 is obtained through the gas analyzer 320, and the analysis result of the first gas source 511 is compared with the known data of the first gas source 511. When the deviation between the analysis result of the first gas source 511 and the known data of the first gas source 511 is lower than the preset value, it is determined that the restrictor 211 meets the accuracy requirements. In this case, there is no need to adjust the restrictor 211. When the deviation between the analysis result of the first gas source 511 and the known data of the first gas source 511 is higher than the preset value, it is determined that the restrictor 211 does not meet the accuracy requirements. In this case, the parameters of the restrictor 211 need to be adjusted.

[0081] Further, Figure 4 The flow chart of the gas analysis method according to the embodiment of the present invention is schematically shown. Figure 4 , the gas analysis method further comprises the following steps:

[0082] The analysis chamber 310 is evacuated by the vacuum unit 400 until the vacuum degree monitored by the first vacuum gauge 330 is lower than the first preset vacuum degree;

[0083] The sampled gas in the process chamber 100 is transported to the analysis chamber 310 through the sampling unit 200, and the analysis result of the sampled gas is obtained through the gas analyzer 320;

[0084] The supply of the sampling gas to the analysis chamber 310 is stopped, and the analysis chamber 310 is evacuated by the vacuum pumping unit 400 until the vacuum degree monitored by the first vacuum gauge 330 is lower than the first preset vacuum degree.

[0085] The above are only preferred specific embodiments of the present invention, but the protection scope of the present invention is not limited thereto. Any changes or substitutions that can be easily thought of by a person skilled in the art within the technical scope disclosed by the present invention should be included in the protection scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.

Claims

1. A gas analysis system, characterized in that: It comprises a process chamber (100), a sampling unit (200), a mass spectrometry unit (300), a vacuum unit (400) and a calibration unit (500); The mass spectrometry analysis unit (300) comprises an analysis chamber (310), a gas analyzer (320) and a first vacuum gauge (330); the analysis chamber (310) is connected to the process chamber (100) via the sampling unit (200); the gas analyzer (320) is connected to the analysis chamber (310) and is used to analyze the composition and concentration of the gas inside the analysis chamber (310); the first vacuum gauge (330) is connected to the analysis chamber (310) and is used to monitor the vacuum degree of the analysis chamber (310); The vacuum pumping unit (400) is in communication with the analysis chamber (310), and the vacuum pumping unit (400) is used to pump gas from the analysis chamber (310); The calibration unit (500) comprises a standard gas source, which is a gas with known data, wherein the data comprises composition and concentration, and the standard gas source can be connected to the analysis chamber (310).

2. The gas analysis system according to claim 1, characterized in that: The sampling unit (200) comprises a sampling pipeline (210) and a flow restrictor (211) arranged on the sampling pipeline (210); the inlet of the sampling pipeline (210) is connected to the process chamber (100); the outlet of the sampling pipeline (210) is connected to the analysis chamber (310); the flow restrictor (211) is a capillary or a microporous structure or a fine-tuning valve; the flow restrictor (211) is used to limit the gas flow rate and control the gas flow state.

3. The gas analysis system according to claim 2, characterized in that: The sampling pipeline (210) is provided with a main valve (212), the main valve (212) is located upstream of the flow restrictor (211), and the main valve (212) is used to control the on-off of the sampling pipeline (210). The calibration unit (500) comprises a first calibration pipeline (510), and the standard gas source comprises a first gas source (511), and the first gas source (511) is nitrogen, argon, helium, hydrocarbon gas or a mixed gas. The outlet of the first calibration pipeline (510) is connected to the sampling pipeline (210) and is located between the main valve (212) and the flow restrictor (211); the first gas source (511) can pass through the first calibration pipeline (510) to the flow restrictor (211), and pass through the flow restrictor (211) to the analysis chamber (310).

4. The gas analysis system according to any one of claims 1 to 3, characterized in that: The calibration unit (500) further comprises a second calibration pipeline (520), the standard gas source further comprises a second gas source (521), and the second gas source (521) is nitrogen, argon, helium, hydrocarbon gas or a mixed gas; The outlet of the second calibration pipeline (520) is in communication with the analysis chamber (310), and the second gas source (521) can flow into the analysis chamber (310) through the second calibration pipeline (520).

5. The gas analysis system according to any one of claims 1 to 3, characterized in that: The vacuum pump (400) includes a main pump (410) and a front pump (420). The main pump (410) is connected to the analysis chamber (310) and is used to pump gas from the analysis chamber (310). The front pump (420) is connected to the main pump (410) and is used to pump gas discharged from the main pump (410).

6. The gas analysis system according to claim 1, characterized in that: The gas analysis system further comprises a baking device (340), wherein the baking device (340) is used to heat the analysis chamber (310).

7. The gas analysis system according to claim 5, characterized in that: The gas analysis system further comprises a gas processing unit (600), wherein the gas processing unit (600) comprises a gas processing pipeline (610) and a third gas source (611), wherein the outlet of the gas processing pipeline (610) is connected to the main pump (410), and the third gas source (611) is connected to the main pump (410) through the gas processing pipeline (610), and the gas processing unit (600) is used for neutralizing or diluting the gas entering the main pump (410).

8. The gas analysis system according to any one of claims 1 to 3, characterized in that: The sampling unit (200) comprises a first sampling channel (220), a second sampling channel (230) and a third sampling channel (240) which are arranged in parallel. The first sampling channel (220) is provided with a first valve (221) and a first flow restrictor (222), and the first flow restrictor (222) is arranged downstream of the first valve (221). The second sampling channel (230) is provided with a second valve (231) and a second flow restrictor (232), and the second flow restrictor (232) is arranged downstream of the second valve (231). The third sampling channel (240) is provided with a third valve (241). The first flow restrictor (222) and the second flow restrictor (232) are used to limit the gas flow rate and control the gas flow state. The first valve (221), the second valve (231) and the third valve (241) are opened or closed according to the gas pressure of the sampled gas.

9. A gas analysis method, characterized in that: Using the gas analysis system according to any one of claims 1 to 8, the gas analysis method comprises calibrating the gas analysis system: The analysis chamber (310) is evacuated by the evacuation unit (400) until the vacuum degree monitored by the first vacuum gauge (330) is lower than a first preset vacuum degree; After the vacuum degree obtained by the first vacuum gauge (330) reaches a first preset vacuum degree, the standard gas source is introduced into the analysis chamber (310), and the analysis result of the standard gas source is obtained through the gas analyzer (320); Calculating the deviation between the analysis result of the standard gas source and the known data of the standard gas source; When the deviation is greater than a preset value, a correction coefficient for correcting the analysis result is calculated, or a parameter of the gas analyzer (320) is adjusted so that the deviation is less than the preset value.

10. The gas analysis method according to claim 9, characterized in that: The gas analysis method further comprises the following steps: The analysis chamber (310) is evacuated by the evacuation unit (400) until the vacuum degree monitored by the first vacuum gauge (330) is lower than the first preset vacuum degree; The sampled gas in the process chamber (100) is transported to the analysis chamber (310) through the sampling unit (200), and the analysis result of the sampled gas is obtained through the gas analyzer (320); The supply of the sampling gas to the analysis chamber (310) is stopped, and the analysis chamber (310) is evacuated by the vacuum pumping unit (400) until the vacuum degree monitored by the first vacuum gauge (330) is lower than the first preset vacuum degree.

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