Liquid supply device, liquid supply method, and storage medium

Abstract

The invention provides a liquid supply apparatus, a liquid supply method, and a storage medium. A tank, a circulation line, a pump, and a supply line are provided. The circulation line includes a main line provided with a pump, and a first branch line and a second branch line branched from the main line. The first branch line is provided with a first heating mechanism, a first filter, and a first liquid discharge line, and is also provided with: a first branch circulation line that branches off from between the first heating mechanism and the first filter and returns the processing liquid conveyed from the tank to the tank; the first valve switches the outflow destination of the processing liquid between the first liquid discharge line and the first branch line. The second branch line is provided with a second heating mechanism, a second filter, and a second liquid discharge line, and is also provided with: a second branch circulation line that branches off from between the second heating mechanism and the second filter, and returns the processing liquid conveyed from the tank to the tank; the second valve switches the outflow destination of the processing liquid between the second liquid discharge line and the second branch line.

Description

Technical Field

[0001] The present disclosure relates to a liquid supply device, a liquid supply method and a storage medium. Background Art

[0002] Conventionally, there is known a liquid processing device that circulates a processing liquid for a substrate such as a semiconductor wafer (hereinafter also referred to as a wafer) in a circulation line and supplies the processing liquid to a liquid processing unit via a branch line branched from the circulation line. The circulation line of the liquid processing device is provided with a filter module (hereinafter also referred to as a filter) for removing foreign matter from the processing liquid and a temperature control unit for controlling the temperature of the processing liquid flowing in the circulation line (see Patent Document 1).

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: Japanese Patent Application Publication No. 2021-9956 Summary of the invention

[0006] Problem that the invention aims to solve

[0007] The present disclosure provides a technology capable of reducing contamination of a processing liquid in a circulation line.

[0008] Solutions for solving problems

[0009] A liquid supply device according to one embodiment of the present disclosure includes a tank, a circulation line, a pump, and a supply line. The tank stores a processing liquid. The circulation line returns the processing liquid transported from the tank to the tank. The pump is provided on the circulation line. The supply line is connected to the circulation line and is used to supply the processing liquid to a liquid processing unit that performs liquid processing on a substrate. The circulation line includes a main line provided with a pump, and a first branch line and a second branch line branching from the main line. The supply line includes a first supply line connected to the first branch line, and a second supply line connected to the second branch line. The first branch line includes, from upstream, a first heating mechanism, a first filter, and a first drainage line for discharging the processing liquid flowing in the first branch line, and the first branch line includes a first branch circulation line and a first valve, the first branch circulation line branches off between the first heating mechanism and the first filter, and is used to return the processing liquid transported from the tank to the tank, and the first valve is used to switch the outflow destination of the processing liquid between the first drainage line and the first branch line. The second branch line is provided with a second heating mechanism, a second filter, and a second drainage line for discharging the treatment liquid flowing in the second branch line in sequence from the upstream, and the second branch line is provided with a second branch circulation line and a second valve. The second branch circulation line branches off from between the second heating mechanism and the second filter and is used to return the treatment liquid transported from the tank to the tank. The second valve is used to switch the outflow destination of the treatment liquid between the second drainage line and the second branch line.

[0010] Effects of the Invention

[0011] According to the present disclosure, contamination of the processing liquid in the circulation line can be reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 It is a diagram showing a schematic configuration of a substrate processing system according to the first embodiment.

[0013] Figure 2 It is a schematic diagram showing the structure of the processing unit according to the first embodiment.

[0014] Figure 3 It is a diagram showing a schematic structure of a processing liquid supply source according to an embodiment.

[0015] Figure 4 It is a diagram showing an example of transition of the states of the pump, the first to fourth valves, the first heating mechanism, and the second heating mechanism.

[0016] Figure 5 This is a schematic diagram showing an example of the operation of the processing liquid supply source according to the first embodiment.

[0017] Figure 6 This is a schematic diagram showing an example of the operation of the processing liquid supply source according to the first embodiment.

[0018] Figure 7 This is a schematic diagram showing an example of the operation of the processing liquid supply source according to the first embodiment. DETAILED DESCRIPTION

[0019] Below, the liquid supply device, liquid supply method and storage medium for implementing the present disclosure are described in detail with reference to the accompanying drawings (hereinafter referred to as "embodiment"). In addition, the present disclosure is not limited by the embodiment. In addition, the various embodiments can be appropriately combined within the scope that does not cause contradictions in the processing content. In addition, in the following embodiments, the same reference numerals are marked on the same parts, and repeated descriptions are omitted.

[0020] In the embodiments shown below, expressions such as "certain", "orthogonal", "perpendicular" or "parallel" are sometimes used, but these expressions do not need to be strictly "certain", "orthogonal", "perpendicular" or "parallel". That is, the above expressions allow for deviations in manufacturing accuracy, setting accuracy, etc.

[0021] In the drawings referred to below, an orthogonal coordinate system is sometimes shown that defines mutually orthogonal X-axis, Y-axis, and Z-axis directions and sets the positive Z-axis direction as the vertically upward direction to facilitate understanding of the description.

[0022] Conventionally, there is known a liquid processing device that circulates a processing liquid for a substrate such as a semiconductor wafer (hereinafter also referred to as a wafer) in a circulation line and supplies the processing liquid to a liquid processing unit via a branch line branched from the circulation line. The circulation line of the liquid processing device is provided with a filter module (hereinafter also referred to as a filter) for removing foreign matter from the processing liquid and a temperature control unit for controlling the temperature of the processing liquid flowing in the circulation line.

[0023] In the circulation line, the circulation of the treatment liquid is sometimes stopped due to maintenance, etc. After the circulation is stopped, when the circulation of the treatment liquid is restarted, when the treatment liquid is heated by the temperature control unit, the filter is thermally expanded due to the influence of the temperature change of the treatment liquid. As a result, the particles captured by the filter may pass through the filter and contaminate the treatment liquid in the circulation line.

[0024] Therefore, it is desired to realize a technology that can overcome the above-mentioned problems and reduce the contamination of the processing liquid in the circulation line.

[0025] (First Embodiment)

[0026] <Overview of substrate processing system>

[0027] First, refer to Figure 1 A schematic configuration of a substrate processing system 1 according to the first embodiment will be described. Figure 1 It is a diagram showing a schematic configuration of a substrate processing system 1 according to the first embodiment.

[0028] like Figure 1 As shown, the substrate processing system 1 includes a loading / unloading station 2 and a processing station 3. The loading / unloading station 2 and the processing station 3 are provided adjacent to each other.

[0029] The loading / unloading station 2 includes a pod placement unit 11 and a transfer unit 12. The pod placement unit 11 holds a plurality of pods F that accommodate a plurality of substrates, in the embodiment, a plurality of semiconductor wafers W (hereinafter referred to as wafers W) in a horizontal state.

[0030] The conveying section 12 is disposed adjacent to the front-opening wafer pod loading section 11, and is provided with a substrate conveying device 13 and a delivery section 14 inside the conveying section 12. The substrate conveying device 13 is provided with a wafer holding mechanism for holding the wafer W. In addition, the substrate conveying device 13 is capable of moving in the horizontal direction and the vertical direction and rotating around the vertical axis, and the substrate conveying device 13 uses the wafer holding mechanism to convey the wafer W between the front-opening wafer pod F and the delivery section 14.

[0031] The processing station 3 is provided adjacent to the conveying unit 12. The processing station 3 includes a conveying unit 15 and a plurality of processing units 16. The plurality of processing units 16 are provided on both sides of the conveying unit 15 in a line.

[0032] A substrate transport device 17 is provided inside the transport section 15. The substrate transport device 17 includes a wafer holding mechanism for holding the wafer W. The substrate transport device 17 is movable in the horizontal direction and the vertical direction and can rotate around the vertical axis, and the substrate transport device 17 transports the wafer W between the interface 14 and the processing unit 16 using the wafer holding mechanism.

[0033] The processing unit 16 is an example of a liquid processing unit, and performs a predetermined liquid process on the wafer W transported by the substrate transport device 17 .

[0034] In addition, the substrate processing system 1 includes a control device 4. The control device 4 is, for example, a computer, and includes a control unit 18 and a storage unit 19. The storage unit 19 stores programs for controlling various processes performed in the substrate processing system 1. The control unit 18 controls the operation of the substrate processing system 1 by reading and executing the programs stored in the storage unit 19.

[0035] In addition, the program may be recorded in a computer-readable storage medium and installed from the storage medium to the storage unit 19 of the control device 4. Examples of computer-readable storage media include a hard disk (HD), a floppy disk (FD), a compact disk (CD), a magneto-optical disk (MO), and a memory card.

[0036] In the substrate processing system 1 configured as described above, first, the substrate transfer device 13 of the loading / unloading station 2 takes out the wafer W from the front-opening FOUP F placed on the front-opening FOUP placement portion 11, and places the taken-out wafer W on the delivery portion 14. The wafer W placed on the delivery portion 14 is taken out from the delivery portion 14 by the substrate transfer device 17 of the processing station 3 and is carried into the processing unit 16.

[0037] After the wafer W is carried into the processing unit 16 and processed by the processing unit 16, it is carried out from the processing unit 16 by the substrate transfer device 17 and placed in the delivery section 14. Then, the processed wafer W placed in the delivery section 14 is returned to the front-opening FOUP F of the front-opening FOUP placement section 11 by the substrate transfer device 13.

[0038] <Overview of Processing Unit>

[0039] Next, refer to Figure 2 The outline of the processing unit 16 will be described. Figure 2 1 is a schematic diagram showing the structure of the processing unit 16 according to the first embodiment. The processing unit 16 includes a chamber 20 , a substrate processing part 30 , a liquid supply part 40 , and a recovery cup 50 .

[0040] The chamber 20 accommodates a substrate processing unit 30, a liquid supply unit 40, and a recovery cup 50. A fan filter unit (FFU) 21 is provided on the top of the chamber 20. The FFU 21 is used to form a downward flow in the chamber 20.

[0041] The substrate processing unit 30 includes a holding unit 31, a support unit 32, and a driving unit 33, and performs liquid processing on the wafer W placed thereon. Figure 1 The support part 32 is a member extending in the vertical direction, and the base end of the support part 32 is rotatably supported by the driving part 33, and the front end of the support part 32 supports the holding part 31 to be horizontal. The driving part 33 rotates the support part 32 around the vertical axis.

[0042] The substrate processing unit 30 rotates the support column 32 by using the driving unit 33 to rotate the support column 32, thereby rotating the holding unit 31 supported by the support column 32. Thus, the wafer W held by the holding unit 31 rotates.

[0043] The liquid supply unit 40 supplies the processing liquid to the wafer W. The liquid supply unit 40 is connected to the processing liquid supply source 70. The liquid supply unit 40 includes a plurality of nozzles. The plurality of nozzles are provided, for example, corresponding to a plurality of types of processing liquids. In addition, the plurality of nozzles spray the plurality of types of processing liquids supplied from the plurality of processing liquid supply sources 70 to the wafer W.

[0044] The recovery cup 50 is arranged to surround the holding part 31 and collects the processing liquid scattered from the wafer W due to the rotation of the holding part 31. A drain port 51 is formed at the bottom of the recovery cup 50, and the processing liquid collected by the recovery cup 50 is discharged to the outside of the processing unit 16 from the drain port 51.

[0045] In addition, an exhaust port 52 for exhausting the gas supplied from the FFU 21 to the outside of the processing unit 16 is formed at the bottom of the recovery cup 50 .

[0046] <Overview of Processing Liquid Supply Source>

[0047] Next, refer to Figure 3 A schematic structure of the processing liquid supply source 70 included in the substrate processing system 1 will be described. Figure 3 2 is a diagram showing a schematic configuration of a processing liquid supply source 70 according to the embodiment. The processing liquid supply source 70 is an example of a liquid supply device.

[0048] like Figure 3 As shown, the substrate processing system 1 includes a processing liquid supply source 70 that supplies processing liquid to the plurality of processing units 16. In the first embodiment, for example, a processing liquid supply source 70 is provided for each of the plurality of types of processing liquids. Figure 3A process liquid supply source 70 is shown.

[0049] like Figure 3 As shown, the treatment liquid supply source 70 includes a tank 80, a circulation line 90, and a pump 100. The tank 80 stores the treatment liquid. The treatment liquid is, for example, IPA (isopropyl alcohol). In addition, the treatment liquid of the present disclosure is not limited to IPA, and various types of chemical liquids can be applied.

[0050] The circulation line 90 returns the treatment liquid sent from the tank 80 to the tank 80. The circulation line 90 includes a main line 91 on the upstream side and a plurality of (two in this case) branch lines 92a and 92b (hereinafter also referred to as "first branch line 92a" and "second branch line 92b") on the downstream side.

[0051] In addition, below, in this specification, the last character of the figure mark provided for the component attached to the first branch line 92a is "a", and the last character of the figure mark provided for the component attached to the second branch line 92b is "b". The component attached to the first branch line 92a and the component attached to the second branch line 92b are the same as each other, or substantially the same as each other. In the case where it is not necessary to distinguish the component attached to the first branch line 92a and the component attached to the second branch line 92b from each other, the last characters "a" and "b" are sometimes deleted to express (for example, 93a and 93b are expressed as 93.).

[0052] The main line 91 is provided with a pump 100 . The pump 100 is used to form a circulation flow of the treatment liquid in the circulation line 90 .

[0053] The main line 91 branches into a first branch line 92a and a second branch line 92b at a branch (branch point) set at its downstream end, that is, on the downstream side of the pump 100. The treatment liquid flowing out of the tank 80 flows into the first branch line 92a and the second branch line 92b after passing through the main line 91, and returns to the tank 80 through the first branch line 92a and the second branch line 92b.

[0054] That is, in the processing liquid supply source 70 involved in the first embodiment, the processing liquid circulates in both the first branch line 92a and the second branch line 92b of the circulation line 90 by the driving force generated by the pump 100. Thus, compared with the case where pumps are provided separately in the first branch line 92a and the second branch line 92b, the number of pumps can be reduced, thereby reducing the cost of the processing liquid supply source.

[0055] The first branch line 92a includes a first heating mechanism 93a, a first flow meter 94a, a third valve 95a, a first filter 96a, a first circulation temperature sensor 97a, and a first valve 98a in order from the upstream side. The second branch line 92b includes a second heating mechanism 93b, a second flow meter 94b, a fourth valve 95b, a second filter 96b, a second circulation temperature sensor 97b, and a second valve 98b in order from the upstream side.

[0056] The heating mechanism 93 (the first heating mechanism 93a and the second heating mechanism 93b) heats the temperature of the processing liquid passing through the heating mechanism 93. The control unit 18 can adjust the temperature of the processing liquid by controlling the heating amount of the processing liquid in the heating mechanism 93. The first heating mechanism 93a and the second heating mechanism 93b include a plurality of heating modules arranged in parallel. The heating mechanism 93 is controlled by the control unit 18.

[0057] The number of heating modules belonging to one heating mechanism 93 can be determined by taking into account the temperature control capability required of the heating mechanism 93 and the allowable pressure drop in the heating mechanism 93. Figure 3 As shown, the first heating mechanism 93a and the second heating mechanism 93b are respectively composed of four heating modules arranged in parallel.

[0058] The flowmeter 94 (the first flowmeter 94a and the second flowmeter 94b) measures the flow rate of the circulation flow of the processing liquid formed in the circulation line 90. The measurement result of the flowmeter 94 is output to the control unit 18.

[0059] Valve 95 (third valve 95a, fourth valve 95b) switches the outflow destination of the treated liquid. Specifically, a first branch circulation line 105a connected to the tank 80 branches out from the third valve 95a. The first branch circulation line 105a returns the treated liquid transported from the tank 80 to the first branch line 92a to the tank 80. The third valve 95a switches the outflow destination of the treated liquid in the first branch line 92a between the first branch circulation line 105a and the first filter 96a. For example, when the control unit 18 controls the third valve 95a to set the outflow destination of the treated liquid to the first branch circulation line 105a, the treated liquid transported from the tank 80 returns to the tank 80 via the third valve 95a. In addition, for example, when the control unit 18 controls the third valve 95a to set the outflow destination of the treated liquid to the first filter 96a, the treated liquid transported from the tank 80 flows to the first filter 96a via the third valve 95a. In addition, the control unit 18 can also control the third valve 95a to allow the treatment liquid to flow out to both the first branch circulation line 105a and the first filter 96a.

[0060] The first branch circulation line 105a is provided with a first branch temperature sensor 102a for detecting the temperature of the treatment liquid flowing in the first branch circulation line 105a. The detection result of the first branch temperature sensor 102a is output to the control unit 18.

[0061] Similarly, a second branch circulation line 105b connected to the tank 80 is branched from the fourth valve 95b. The second branch circulation line 105b returns the treatment liquid transported from the tank 80 to the second branch line 92b to the tank 80. The fourth valve 95b switches the outflow destination of the treatment liquid in the second branch line 92b between the second branch circulation line 105b and the second filter 96b. For example, when the control unit 18 controls the fourth valve 95b to set the outflow destination of the treatment liquid to the second branch circulation line 105b, the treatment liquid transported from the tank 80 returns to the tank 80 via the fourth valve 95b. In addition, for example, when the control unit 18 controls the fourth valve 95b to set the outflow destination of the treatment liquid to the second filter 96b, the treatment liquid transported from the tank 80 flows to the second filter 96b via the fourth valve 95b. In addition, the control unit 18 can also control the fourth valve 95b to cause the treatment liquid to flow out to both the second branch circulation line 105b and the second filter 96b.

[0062] The second branch circulation line 105b is provided with a second branch temperature sensor 102b for detecting the temperature of the treatment liquid flowing in the second branch circulation line 105b. The detection result of the second branch temperature sensor 102b is output to the control unit 18.

[0063] As described above, the treatment liquid supply source 70 according to the first embodiment includes the first branch circulation line 105a and the second branch circulation line 105b. Thus, in the process of restarting the circulation flow of the treatment liquid in the circulation line 90 after the circulation of the treatment liquid is stopped due to maintenance, the treatment liquid can be heated while forming the circulation flow of the treatment liquid flowing through the first branch circulation line 105a or the second branch circulation line 105b, thereby heating the treatment liquid without passing through the filter 96.

[0064] Therefore, according to the first embodiment, contamination caused by particles passing through the filter 96 as the temperature of the processing liquid increases can be reduced. In addition, in the first embodiment, since the processing liquid does not flow through the filter 96 that captures particles, contamination of the processing liquid during the temperature increase process can be reduced.

[0065] The filter 96 (the first filter 96a and the second filter 96b) removes pollutants such as particles contained in the treatment liquid passing through the filter 96. The first filter 96a and the second filter 96b may include a plurality of filter modules arranged in parallel. The number of filter modules belonging to one filter 96 can be determined in consideration of the filtering capacity required for the filter 96 and the pressure drop allowed in the filter 96. In the first embodiment, as Figure 3 As shown, the first filter 96a and the second filter 96b are respectively composed of two filter modules arranged in parallel.

[0066] The circulation temperature sensor 97 (the first circulation temperature sensor 97a and the second circulation temperature sensor 97b) detects the temperature of the processing liquid flowing in the circulation line 90. The detection result of the circulation temperature sensor 97 is output to the control unit 18.

[0067] In addition, the circulation temperature sensor 97 does not necessarily need to detect the temperature of the treatment liquid flowing in the circulation line 90. For example, the circulation temperature sensor 97 may be provided on the filter 96, the circulation line 90 (the first branch line 92a, the second branch line 92b), or the drainage line 99 to detect the temperature of the filter 96, the circulation line 90, or the drainage line 99.

[0068] In addition, although the example of including two temperature sensors, the first circulation temperature sensor 97a and the second circulation temperature sensor 97b, is shown here, the present invention is not limited to this, and only one of the two temperature sensors may be included.

[0069] The valve 98 (first valve 98a, second valve 98b) switches the outflow destination of the treatment liquid. Specifically, a first drainage line 99a connected to the discharge portion DR branches out from the first valve 98a. The first drainage line 99a is used to discharge the treatment liquid flowing in the first branch line 92a. The first valve 98a switches the outflow destination of the treatment liquid in the first branch line 92a between the first drainage line 99a and the first branch line 92a. For example, in a case where the control unit 18 controls the first valve 98a to set the outflow destination of the treatment liquid to the first drainage line 99a, the treatment liquid transported from the tank 80 is discharged via the first valve 98a. In addition, for example, in a case where the control unit 18 controls the first valve 98a to set the outflow destination of the treatment liquid to the first branch line 92a, the treatment liquid transported from the tank 80 flows in the first branch line 92a via the first valve 98a. In addition, the control unit 18 can also control the first valve 98a to allow the processing liquid to flow out to both the first branch line 92a and the first drain line 99a.

[0070] Similarly, a second drainage line 99b connected to the discharge portion DR is branched from the second valve 98b. The second drainage line 99b is used to discharge the treatment liquid flowing in the second branch line 92b. The second valve 98b switches the outflow destination of the treatment liquid in the second branch line 92b between the second drainage line 99b and the second branch line 92b. For example, when the control unit 18 controls the second valve 98b to set the outflow destination of the treatment liquid to the second drainage line 99b, the treatment liquid transported from the tank 80 is discharged via the second valve 98b. In addition, for example, when the control unit 18 controls the second valve 98b to set the outflow destination of the treatment liquid to the second branch line 92b, the treatment liquid transported from the tank 80 flows in the second branch line 92b via the second valve 98b. In addition, the control unit 18 can also control the second valve 98b to cause the treatment liquid to flow out to both the second branch line 92b and the second drainage line 99b.

[0071] A plurality of first supply lines 110a are connected to the first branch line 92a at a position downstream of the first valve 98a. One end of the first supply line 110a is connected to the first branch line 92a, and the other end is connected to the processing unit 16. The first supply line 110a supplies the processing liquid flowing in the first branch line 92a to the processing unit 16. A fifth valve 107a for opening and closing the first supply line 110a is provided in the middle of the first supply line 110a.

[0072] A plurality of second supply lines 110b are connected to the second branch line 92b at a position downstream of the second valve 98b. One end of the second supply line 110b is connected to the second branch line 92b, and the other end is connected to the processing unit 16. The second supply line 110b supplies the processing liquid flowing in the second branch line 92b to the processing unit 16. A sixth valve 107b for opening and closing the second supply line 110b is provided in the middle of the second supply line 110b.

[0073] In addition, Figure 3 , an example is shown in which three first supply lines 110a are connected to the first branch line 92a, but the number of first supply lines 110a connected to the first branch line 92a is not limited to three. Similarly, the number of second supply lines 110b connected to the second branch line 92b is not limited to three.

[0074] In addition, here, the first valve 98a, the second valve 98b, the third valve 95a, and the fourth valve 95b are examples of switching valves for switching the outflow destination of the treatment liquid, but the first valve 98a, the second valve 98b, the third valve 95a, and the fourth valve 95b do not necessarily need to be switching valves. For example, the first valve 98a may be composed of two opening and closing valves, namely, an opening and closing valve provided in the first drainage line 99a and an opening and closing valve provided in the first branch line 92a at a position downstream of the first drainage line 99a. The second valve 98b, the third valve 95a, and the fourth valve 95b are the same.

[0075] Next, refer to Figure 4 An example of the operation of the substrate processing system 1 according to the first embodiment will be described. Figure 4 This is a diagram showing an example of transition of the states of the pump 100 , the first valve 98 a to the fourth valve 95 b , the first heating mechanism 93 a , and the second heating mechanism 93 b . Figure 5 to Figure 7 It is a schematic diagram showing an example of the operation of the processing liquid supply source 70 according to the first embodiment. Figure 4 The processing shown is an example of an operation when the circulation of the processing liquid in the circulation line 90 is restarted after the circulation of the processing liquid in the circulation line 90 is stopped due to maintenance or the like.

[0076] First, the control unit 18 activates the stopped pump 100 to deliver the treatment liquid from the tank 80 to the circulation line 90 (time T1). In addition, at the same time, the control unit 18 controls the third valve 95a to allow the treatment liquid to flow into the first branch circulation line 105a. Thus, the treatment liquid delivered from the tank 80 circulates in a manner that it flows through the third valve 95a in the first branch circulation line 105a and returns to the tank 80.

[0077] Next, the control unit 18 closes the third valve 95a to stop the outflow of the treatment liquid to the first branch circulation line 105a (time T2). In addition, at the same time, the control unit 18 controls the fourth valve 95b to allow the treatment liquid to flow into the second branch circulation line 105b. Thus, the treatment liquid transported from the tank 80 circulates in a manner that it flows in the second branch circulation line 105b via the fourth valve 95b and returns to the tank 80.

[0078] Next, the control unit 18 controls the third valve 95a to allow the treatment liquid to flow into the first branch circulation line 105a (time T3). As a result, the treatment liquid delivered from the tank 80 circulates in the first branch circulation line 105a and the second branch circulation line 105b and returns to the tank 80 (refer to Figure 5 ).

[0079] Next, the control unit 18 determines whether the circulation flow rate of the treatment liquid flowing in the first branch circulation line 105a and the second branch circulation line 105b has stabilized based on the measured values ​​of the first flow meter 94a and the second flow meter 94b. Specifically, when the measured value of the first flow meter 94a converges within a preset threshold range, the control unit 18 determines that the circulation flow rate of the treatment liquid has stabilized, and starts heating by the first heating mechanism 93a. Similarly, when the measured value of the second flow meter 94b converges within a preset threshold range, the control unit 18 determines that the circulation flow rate of the treatment liquid in the second branch line 92b has stabilized, and starts heating by the second heating mechanism 93b. For example, Figure 4 As shown, the control unit 18 activates the second heating mechanism 93b after the measured value of the second flow meter 94b converges within the threshold range (time T4). Thereafter, the control unit 18 activates the first heating mechanism 93a after the measured value of the first flow meter 94a converges within the threshold range (time T5).

[0080] Next, the control unit 18 determines whether the temperature of the treatment liquid flowing in the first branch circulation line 105a and the second branch circulation line 105b has stabilized based on the detection results of the first branch temperature sensor 102a and the second branch temperature sensor 102b. Specifically, the control unit 18 determines that the temperature of the treatment liquid in the first branch circulation line 105a has stabilized when the measured value of the first branch temperature sensor 102a converges within a preset threshold range within a preset monitoring time width. Similarly, the control unit 18 determines that the temperature of the treatment liquid in the second branch circulation line 105b has stabilized when the measured value of the second branch temperature sensor 102b converges within a preset threshold range within a preset monitoring time width.

[0081] When the temperature of the treatment liquid in the first branch line 92a and the second branch line 92b is stabilized, the control unit 18 controls the first valve 98a to the fourth valve 95b to circulate the treatment liquid in the first branch circulation line 105a and the second branch circulation line 105b while allowing the treatment liquid to flow to the drainage line 99. Figure 4 As shown, after the measured values ​​of the first branch temperature sensor 102a and the second branch temperature sensor 102b converge within a preset threshold range within a preset monitoring time width, the control unit 18 controls the third valve 95a and the fourth valve 95b to allow the treated liquid to flow toward both the filter 96 and the branch circulation line 105 (time T6).

[0082] At the same time, the control unit 18 controls the first valve 98a and the second valve 98b to allow the treated liquid to flow into the first drainage line 99a and the second drainage line 99b. As a result, the treated liquid delivered from the tank 80 circulates in the first branch circulation line 105a or the second branch circulation line 105b and returns to the tank 80, while flowing through the first filter 96a and the second filter 96b and being discharged from the drainage line 99 (see Figure 6 ).

[0083] Next, the control unit 18 determines whether to discharge the processing liquid from the liquid discharge line 99 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b. Specifically, when the measured values ​​of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b are greater than the threshold value, the control unit 18 controls the first valve 98a to the fourth valve 95b to switch the outflow destination of the processing liquid from the liquid discharge line 99 to the supply line 110.

[0084] For example, Figure 4 As shown, when the measured values ​​of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b are both above the threshold value, the control unit 18 controls the third valve 95a and the fourth valve 95b to switch the outflow destination of the treatment liquid to the filter 96 (time T7). At the same time, the control unit 18 controls the first valve 98a and the second valve 98b to switch the outflow destination of the treatment liquid to the supply line 110. As a result, the treatment liquid transported from the tank 80 flows through the first branch line 92a and the second branch line 92b and returns to the tank 80 (refer to Figure 7 ). In addition, when the fifth valve 107 a or the sixth valve 107 b is opened, the processing liquid is supplied from the supply line 110 to the processing unit 16 .

[0085] In this way, the control unit 18 determines whether to discharge the processing liquid from the drain line 99 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b. Specifically, the control unit 18 controls the first valve 98a and the second valve 98b to switch the outflow destination of the processing liquid from the drain line 99 to the supply line 110 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b when the temperature of the processing liquid flowing in the circulation line 90 is above the threshold.

[0086] In addition, here, an example is shown in which the outflow destination of the treatment liquid is switched from the drainage line 99 to the supply line 110 when the temperature of the treatment liquid flowing in the circulation line 90 is above the threshold, but it is not limited to this. For example, it can also be set that when the temperature of the treatment liquid flowing in the circulation line 90 is above the threshold, the drainage of the treatment liquid continues until a predetermined specified time has passed. Specifically, when the temperature of the treatment liquid flowing in the circulation line 90 is above the threshold, the control unit 18 controls the first valve 98a and the second valve 98b to switch the outflow destination of the treatment liquid to the drainage line 99 and the supply line 110. As a result, the treatment liquid transported from the tank 80 is discharged from the drainage line 99 by a certain amount while flowing in the branch line 92. Afterwards, the control unit 18 switches the supply destination of the treatment liquid to the supply line 110 when a specified time has passed.

[0087] After the treatment liquid heated by the heating mechanism 93 is discharged (time T6), the temperature of the treatment liquid flowing in the circulation line 90 gradually increases. After that, since the temperature of the treatment liquid becomes above the threshold, most of the particles captured by the filter 96 flow out. As a result, the possibility of contaminating the circulation line 90 is reduced. By stopping the discharge at this time point (time T7) and starting the circulation of the treatment liquid in the circulation line 90, the amount of the discharged treatment liquid can be suppressed to a minimum.

[0088] Furthermore, the control unit 18 controls the pump 100, the first heating mechanism 93a, and the second heating mechanism 93b to heat the processing liquid while circulating the processing liquid in the first branch circulation line 105a and the second branch circulation line 105b (time T5 to time T7).

[0089] By controlling the control unit 18 to heat the treatment liquid while circulating it in the first branch circulation line 105a and the second branch circulation line 105b, the treatment liquid can be efficiently heated in a short time compared to the case where the treatment liquid is heated while circulating it in the entire circulation line 90.

[0090] In addition, when the control unit 18 determines that the temperature of the treatment liquid flowing in the first branch circulation line 105a and the second branch circulation line 105b has stabilized based on the detection results of the first branch temperature sensor 102a and the second branch temperature sensor 102b, it controls the pump 100 to transport the treatment liquid to the filter 96 (time T6). Thus, the treatment liquid can be transported to the circulation line 90 after the temperature of the treatment liquid is stabilized.

[0091] In addition, the control unit 18 controls the pump 100, the first valve 98a and the second valve 98b to transport the treated liquid circulating in the first branch circulation line 105a and the second branch circulation line 105b to the first filter 96a and the second filter 96b, and makes the treated liquid passing through the first filter 96a and the second filter 96b flow to the first drainage line 99a and the second drainage line 99b for drainage (time T6 to time T7).

[0092] Thus, when particles captured by the first filter 96 a and the second filter 96 b pass through due to a change in temperature of the processing liquid, the processing liquid can be discharged, thereby reducing contamination of the processing liquid in the circulation line 90 with particles.

[0093] In addition, after the measured value measured by the first flow meter 94a and the measured value measured by the second flow meter 94b respectively converge to the threshold range, the control unit 18 controls the third valve 95a to switch the outflow destination of the treated liquid in the first branch circulation line 105a from the first branch circulation line 105a to the first filter 96a, and controls the fourth valve 95b to switch the outflow destination of the treated liquid in the second branch circulation line 105b from the second branch circulation line 105b to the second filter 96b. Thus, the treated liquid can be transported to the first filter 96a and the second filter 96b after the flow rate of the treated liquid is stabilized (time T4, time T5).

[0094] In addition, the control unit 18 starts the delivery of the treatment liquid to the second branch circulation line 105b (time T2) after starting the delivery of the treatment liquid to the first branch circulation line 105a (time T1). By delivering the treatment liquid one by one like this, it is easier to be in a full liquid state compared to the situation where both sides are delivered at the same time.

[0095] In addition, after the treatment liquid is discharged from the first drain line 99a and the second drain line 99b, the control unit 18 controls the first valve 98a and the second valve 98b to transfer the treatment liquid to the first branch line 92a and the second branch line 92b so that the treatment liquid returns to the tank 80 (time T7). In this way, it is possible to reduce the particles captured by the filter 96 from flowing into the tank 80 and contaminating the tank 80.

[0096] In addition, the control unit 18 circulates the processing liquid in the first branch circulation line 105a and the second branch circulation line 105b (time T6 to time T7) while circulating the processing liquid in the circulation line 90. Thus, it is possible to suppress the processing liquid from being stagnant in the first branch circulation line 105a and the second branch circulation line 105b during the circulation of the processing liquid in the circulation line 90.

[0097] As described above, the treatment liquid supply source 70 involved in the first embodiment includes the first branch circulation line 105a and the second branch circulation line 105b. Thus, in the process of restarting the circulation flow of the treatment liquid in the circulation line 90 after stopping the circulation of the treatment liquid due to maintenance, etc., the treatment liquid can be heated while forming the circulation flow of the treatment liquid flowing through the first branch circulation line 105a or the second branch circulation line 105b, so that the treatment liquid can be heated without flowing through the filter 96.

[0098] Therefore, according to the first embodiment, it is possible to reduce contamination caused by particles that pass through the filter 96 as the temperature of the treatment liquid increases.

[0099] In addition, here, an example is shown in which the processing liquid in which the temperature is increased is discharged to the discharge portion DR via the liquid discharge line 99 to form a circulation flow of the processing liquid flowing through the circulation line 90, but the present disclosure is not limited to this example.

[0100] For example, the control unit 18 may also repeat the following processing before starting the circulation of the treatment liquid in the circulation line 90: after heating the treatment liquid while circulating it in the first branch circulation line 105a and the second branch circulation line 105b (time T4, time T5), the treatment liquid circulating in the first branch circulation line 105a and the second branch circulation line 105b is transported to the filter 96, and the treatment liquid is made to flow to the drainage line 99 for drainage (time T6 to time T7).

[0101] This allows more particles captured by the filter 96 to flow to the downstream side, and thus it is possible to further reduce contamination of the treatment liquid in the circulation line 90 .

[0102] (Second Embodiment)

[0103] In the first embodiment described above, an example is shown in which the determination of whether to proceed to the next process is performed based on the detection results of a plurality of temperature sensors. However, it is not necessary to perform the determination process based on the results of the temperature sensors.

[0104] Specifically, in Figure 4 At time T7, the control unit 18 determines whether to discharge the processing liquid from the liquid discharge line 99 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b, but is not limited to this example. For example, it can also be set that after the control unit 18 starts to discharge the processing liquid from the liquid discharge line 99, after a preset time has passed, the outflow destination of the processing liquid is switched to the supply line 110.

[0105] In addition, for example, the processing liquid supply source 70 may be provided with a flow meter between the valve 95 and the drainage line 99. Specifically, the processing liquid supply source 70 may be provided with a flow meter between the third valve 95a and the first drainage line 99a. In addition, the processing liquid supply source 70 may be provided with a flow meter between the fourth valve 95b and the second drainage line 99b. In this case, the control unit 18 may switch the outflow destination of the processing liquid to the supply line 110 after the measured value of the flow meter converges within the threshold range after the processing liquid starts to be discharged from the drainage line 99.

[0106] It should be understood that the embodiments disclosed herein are illustrative in all respects and are not restrictive. In fact, the above embodiments can be implemented in a variety of ways. In addition, the above embodiments can also be omitted, replaced, and changed in various ways without departing from the attached claims and their gist.

[0107] Furthermore, the present disclosure can take the following structures.

[0108] (1) A liquid supply device comprising:

[0109] a tank storing a treatment fluid;

[0110] a circulation line for returning the treatment liquid delivered from the tank to the tank;

[0111] a pump disposed in the circulation line; and

[0112] a supply line connected to the circulation line and used to supply the processing liquid to a liquid processing unit for performing liquid processing on a substrate,

[0113] The circulation line includes a main line provided with the pump, and a first branch line and a second branch line branched from the main line.

[0114] The supply line includes a first supply line connected to the first branch line and a second supply line connected to the second branch line.

[0115] The first branch line includes, from upstream, a first heating mechanism, a first filter, and a first drainage line for discharging the treatment liquid flowing in the first branch line, and the first branch line includes a first branch circulation line and a first valve. The first branch circulation line branches off from between the first heating mechanism and the first filter and is used to return the treatment liquid transported from the tank to the tank. The first valve is used to switch the outflow destination of the treatment liquid between the first drainage line and the first branch line.

[0116] The second branch line includes, from upstream, a second heating mechanism, a second filter, and a second drainage line for discharging the treatment liquid flowing in the second branch line, and the second branch line includes a second branch circulation line and a second valve. The second branch circulation line branches off from between the second heating mechanism and the second filter and is used to return the treatment liquid transported from the tank to the tank. The second valve is used to switch the outflow destination of the treatment liquid between the second drainage line and the second branch line.

[0117] (2) The liquid supply device according to (1), wherein:

[0118] It also has a control unit.

[0119] The control unit controls the pump, the first heating mechanism, and the second heating mechanism to heat the processing liquid while circulating the processing liquid through the first branch circulation line and the second branch circulation line.

[0120] (3) The liquid supply device according to (2), wherein:

[0121] The control unit controls the pump, the first valve, and the second valve to transport the treated liquid circulating in the first branch circulation line and the second branch circulation line to the first filter and the second filter, and makes the treated liquid passing through the first filter and the second filter flow to the first drainage line and the second drainage line for drainage.

[0122] (4) The liquid supply device according to (2) or (3), further comprising:

[0123] A first flow meter, which is arranged between the first heating mechanism and the first branch circulation line;

[0124] a second flow meter, which is disposed between the second heating mechanism and the second branch circulation line;

[0125] a third valve that switches an outflow destination of the treated liquid in the first branch line between the first branch circulation line and the first filter; and

[0126] a fourth valve that switches the outflow destination of the treated liquid in the second branch line between the second branch circulation line and the second filter,

[0127] After the measured values ​​measured by the first flow meter and the measured values ​​measured by the second flow meter respectively converge within the threshold range, the control unit controls the third valve to switch the outflow destination of the treated liquid in the first branch circulation line from the first branch circulation line to the first filter, and controls the fourth valve to switch the outflow destination of the treated liquid in the second branch circulation line from the second branch circulation line to the second filter.

[0128] (5) The liquid supply device according to any one of (2) to (4), wherein:

[0129] The control unit starts conveying the processing liquid to the second branch circulation line after starting conveying the processing liquid to the first branch circulation line.

[0130] (6) The liquid supply device according to (3), wherein:

[0131] After the processing liquid is discharged from the first and second drainage lines, the control unit controls the first and second valves to transfer the processing liquid to the first and second branch lines to return the processing liquid to the tank.

[0132] (7) A liquid supply method, comprising the following steps in the liquid supply device according to (1):

[0133] heating the processing liquid while circulating the processing liquid in the first branch circulation line; and

[0134] The processing liquid is heated while circulating the processing liquid in the second branch circulation line.

[0135] (8) The liquid supply method according to (7), further comprising the following steps:

[0136] The treated liquid circulating in the first branch circulation line is sent to the first filter, and the treated liquid passing through the first filter is made to flow to the first drainage line for drainage; and

[0137] The treated liquid circulating in the second branch circulation line is sent to the second filter, and the treated liquid having passed through the second filter is caused to flow to the second drainage line for drainage.

[0138] (9) A storage medium which is a computer-readable storage medium storing a program which operates on a computer to control a liquid supply device,

[0139] When the program is executed, the computer controls the liquid supply device to perform the liquid supply method according to (7) or (8).

[0140] Description of Reference Numerals

[0141] W: wafer; 1: substrate processing system; 16: processing unit (an example of a liquid processing unit); 18: control unit; 30: substrate processing unit; 70: processing liquid supply source (an example of a liquid supply device); 80: tank; 90: circulation line; 100: pump; 92a: first branch line; 92b: second branch line; 93: heating mechanism; 96: filter; 99: drainage line; 110: supply line.

Claims

1. A liquid supply device, comprising: a tank storing a treatment fluid; a circulation line for returning the treatment liquid delivered from the tank to the tank; a pump disposed in the circulation line; and a supply line connected to the circulation line and used to supply the processing liquid to a liquid processing unit for performing liquid processing on a substrate, in, The circulation line includes a main line provided with the pump, and a first branch line and a second branch line branching from the main line. The supply line includes a first supply line connected to the first branch line and a second supply line connected to the second branch line. The first branch line includes, from upstream, a first heating mechanism, a first filter, and a first drainage line for discharging the treatment liquid flowing in the first branch line, and the first branch line includes a first branch circulation line and a first valve. The first branch circulation line branches off from between the first heating mechanism and the first filter and is used to return the treatment liquid transported from the tank to the tank. The first valve is used to switch the outflow destination of the treatment liquid between the first drainage line and the first branch line. The second branch line includes, from upstream, a second heating mechanism, a second filter, and a second drainage line for discharging the treatment liquid flowing in the second branch line, and the second branch line includes a second branch circulation line and a second valve. The second branch circulation line branches off from between the second heating mechanism and the second filter and is used to return the treatment liquid transported from the tank to the tank. The second valve is used to switch the outflow destination of the treatment liquid between the second drainage line and the second branch line.

2. The liquid supply device according to claim 1, wherein: It also has a control unit. The control unit controls the pump, the first heating mechanism, and the second heating mechanism to heat the processing liquid while circulating the processing liquid through the first branch circulation line and the second branch circulation line.

3. The liquid supply device according to claim 2, wherein: The control unit controls the pump, the first valve, and the second valve to transport the treated liquid circulating in the first branch circulation line and the second branch circulation line to the first filter and the second filter, and makes the treated liquid passing through the first filter and the second filter flow to the first drainage line and the second drainage line for drainage.

4. The liquid supply device according to claim 2, further comprising: A first flow meter, which is arranged between the first heating mechanism and the first branch circulation line; a second flow meter, which is disposed between the second heating mechanism and the second branch circulation line; a third valve that switches an outflow destination of the treated liquid in the first branch line between the first branch circulation line and the first filter; as well as a fourth valve that switches the outflow destination of the treated liquid in the second branch line between the second branch circulation line and the second filter, After the measured values ​​measured by the first flow meter and the measured values ​​measured by the second flow meter converge to the threshold range respectively, the control unit controls the third valve to switch the outflow destination of the treatment liquid in the first branch line from the first branch circulation line to the first filter, and controls the fourth valve to switch the outflow destination of the treatment liquid in the second branch line from the second branch circulation line to the second filter.

5. The liquid supply device according to claim 2, wherein: The control unit starts conveying the processing liquid to the second branch circulation line after starting conveying the processing liquid to the first branch circulation line.

6. The liquid supply device according to claim 3, wherein: After the processing liquid is discharged from the first and second drainage lines, the control unit controls the first and second valves to transfer the processing liquid to the first and second branch lines to return the processing liquid to the tank.

7. A liquid supply method, comprising the following steps in the liquid supply device according to claim 1: heating the processing liquid while circulating the processing liquid in the first branch circulation line; and The processing liquid is heated while circulating the processing liquid in the second branch circulation line.

8. The liquid supply method according to claim 7, further comprising the following steps: The treated liquid circulating in the first branch circulation line is sent to the first filter, and the treated liquid passing through the first filter is made to flow to the first drainage line for drainage; and The treated liquid circulating in the second branch circulation line is sent to the second filter, and the treated liquid having passed through the second filter is caused to flow to the second drainage line for drainage.

9. A storage medium, which is a computer-readable storage medium storing a program that operates on a computer to control a liquid supply device, When the program is executed, the computer controls the liquid supply device to perform the liquid supply method according to claim 7 or 8.

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