Liquid supply device, liquid supply method, and storage medium

Abstract

The invention provides a liquid supply apparatus, a liquid supply method, and a storage medium, which can reduce pollution of processing liquid in a circulation line. A liquid supply apparatus includes a processing liquid line, a heating mechanism, a filter, a liquid discharge line, a first temperature sensor, and a control unit. The processing liquid line supplies a processing liquid to a liquid processing unit that performs liquid processing on a substrate. The heating mechanism is provided in the processing liquid line and heats the processing liquid flowing through the processing liquid line. The filter is provided at a position on the downstream side of the heating mechanism in the processing liquid line. The liquid discharge line is provided at a position downstream of the filter in the processing liquid line, and discharges the processing liquid flowing through the processing liquid line. The first temperature sensor is disposed at a position of the filter, the processing liquid line between the filter and the liquid discharge line, or the liquid discharge line, and detects the temperature of the filter, the processing liquid line, the liquid discharge line, or the processing liquid. The control unit determines whether or not to discharge the processing liquid from the liquid discharge line on the basis of the detection result of the first temperature sensor.

Description

Technical Field

[0001] The present disclosure relates to a liquid supply device, a liquid supply method and a storage medium. Background Art

[0002] Conventionally, there is known a liquid processing device that circulates a processing liquid for a substrate such as a semiconductor wafer (hereinafter also referred to as a wafer) in a circulation line and supplies the processing liquid to a processing unit via a branch line branched from the circulation line. A filter that removes foreign matter from the processing liquid is provided in the circulation line of the liquid processing device (see Patent Document 1).

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: Japanese Patent Application Publication No. 2019-41039 Summary of the invention

[0006] Problem that the invention aims to solve

[0007] The present disclosure provides a technology capable of reducing contamination of a processing liquid in a circulation line.

[0008] Solutions for solving problems

[0009] A liquid supply device according to one embodiment of the present disclosure includes a processing liquid line, a heating mechanism, a filter, a drainage line, a first temperature sensor, and a control unit. The processing liquid line supplies processing liquid to a liquid processing unit that performs liquid processing on a substrate. The heating mechanism is disposed in the processing liquid line to heat the processing liquid flowing in the processing liquid line. The filter is disposed in a position on the downstream side of the heating mechanism in the processing liquid line. The drainage line is disposed in a position on the downstream side of the filter in the processing liquid line to discharge the processing liquid flowing in the processing liquid line. The first temperature sensor is disposed in the filter, a position of the processing liquid line between the filter and the drainage line, or the drainage line to detect the temperature of the filter, the processing liquid line, the drainage line, or the processing liquid. The control unit decides whether to discharge the processing liquid from the drainage line based on the detection result of the first temperature sensor.

[0010] Effects of the Invention

[0011] According to the present disclosure, contamination of the processing liquid in the circulation line can be reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] Figure 1 It is a diagram showing a schematic configuration of a substrate processing system according to the first embodiment.

[0013] Figure 2 It is a schematic diagram showing the structure of the processing unit according to the first embodiment.

[0014] Figure 3 It is a diagram showing a schematic structure of a processing liquid supply source according to an embodiment.

[0015] Figure 4 It is a diagram showing an example of transition of the states of the pump, the first to fourth valves, the first heating mechanism, and the second heating mechanism.

[0016] Figure 5 This is a schematic diagram showing an example of the operation of the processing liquid supply source according to the first embodiment.

[0017] Figure 6 This is a schematic diagram showing an example of the operation of the processing liquid supply source according to the first embodiment.

[0018] Figure 7 This is a schematic diagram showing an example of the operation of the processing liquid supply source according to the first embodiment.

[0019] Figure 8 It is a diagram showing a schematic structure of a processing liquid supply source according to a second embodiment.

[0020] Fig. 9 It is a diagram showing a schematic structure of a processing liquid supply source according to a third embodiment.

[0021] Fig.10 It is a diagram showing an example of transition of the states of the pump, the first to fourth valves, the seventh valve, the eighth valve, the first heating mechanism, and the second heating mechanism.

[0022] Fig.11 This is a schematic diagram showing an example of the operation of the processing liquid supply source according to the third embodiment.

[0023] Fig.12 This is a schematic diagram showing an example of the operation of the processing liquid supply source according to the third embodiment.

[0024] Fig.13 This is a schematic diagram showing an example of the operation of the processing liquid supply source according to the third embodiment.

[0025] Fig.14 This is a schematic diagram showing an example of the operation of the processing liquid supply source according to the third embodiment.

[0026] Fig.15 It is a diagram showing a schematic structure of a processing liquid supply source according to a fifth embodiment.

[0027] Fig.16 It is a diagram showing a schematic structure of a processing liquid supply source according to a sixth embodiment. DETAILED DESCRIPTION

[0028] Below, the liquid supply device, liquid supply method and storage medium for implementing the present disclosure are described in detail with reference to the accompanying drawings (hereinafter referred to as "embodiment"). In addition, the present disclosure is not limited by the embodiment. In addition, the various embodiments can be appropriately combined within the scope that does not cause contradictions in the processing content. In addition, in the following embodiments, the same reference numerals are marked on the same parts, and repeated descriptions are omitted.

[0029] In the embodiments shown below, expressions such as "certain", "orthogonal", "perpendicular" or "parallel" are sometimes used, but these expressions do not need to be strictly "certain", "orthogonal", "perpendicular" or "parallel". That is, the above expressions allow for deviations in manufacturing accuracy, setting accuracy, etc.

[0030] In addition, in the drawings referred to below, an orthogonal coordinate system is sometimes shown in which mutually orthogonal X-axis direction, Y-axis direction and Z-axis direction are defined and the positive direction of the Z-axis is set as the vertical upward direction to make the description easier to understand. In addition, the rotation direction with the vertical axis as the rotation center is sometimes referred to as the θ direction.

[0031] In the past, there is a known liquid processing device that circulates a processing liquid for a substrate such as a semiconductor wafer (hereinafter also referred to as a wafer) in a circulation line, and supplies the processing liquid to a processing unit via a branch line branched from the circulation line. A filter is provided in the circulation line of the liquid processing device to remove foreign matter from the processing liquid. In addition, there is a known technology that heats the processing liquid flowing in the circulation line to a desired temperature by a heating mechanism.

[0032] In the circulation line, the circulation of the treatment liquid is sometimes stopped due to maintenance, etc. After the circulation is stopped, when the circulation of the treatment liquid is restarted, when the treatment liquid is heated by the heating mechanism, the filter is thermally expanded due to the influence of the temperature change of the treatment liquid. As a result, the particles captured by the filter may pass through the filter and the treatment liquid in the circulation line may be contaminated.

[0033] Therefore, it is desired to realize a technology that can overcome the above-mentioned problems and reduce the contamination of the processing liquid in the circulation line.

[0034] (First Embodiment)

[0035] <Overview of substrate processing system>

[0036] First, refer to Figure 1 A schematic configuration of a substrate processing system 1 according to the first embodiment will be described. Figure 1 It is a diagram showing a schematic configuration of a substrate processing system 1 according to the first embodiment.

[0037] like Figure 1As shown, the substrate processing system 1 includes a loading / unloading station 2 and a processing station 3. The loading / unloading station 2 and the processing station 3 are provided adjacent to each other.

[0038] The loading / unloading station 2 includes a pod placement unit 11 and a transfer unit 12. The pod placement unit 11 holds a plurality of pods F that accommodate a plurality of substrates, in the embodiment, a plurality of semiconductor wafers W (hereinafter referred to as wafers W) in a horizontal state.

[0039] The conveying section 12 is disposed adjacent to the front-opening wafer pod loading section 11, and is provided with a substrate conveying device 13 and a delivery section 14 inside the conveying section 12. The substrate conveying device 13 is provided with a wafer holding mechanism for holding the wafer W. In addition, the substrate conveying device 13 is capable of moving in the horizontal direction and the vertical direction and rotating around the vertical axis, and the substrate conveying device 13 uses the wafer holding mechanism to convey the wafer W between the front-opening wafer pod F and the delivery section 14.

[0040] The processing station 3 is provided adjacent to the conveying unit 12. The processing station 3 includes a conveying unit 15 and a plurality of processing units 16. The plurality of processing units 16 are provided on both sides of the conveying unit 15 in a line.

[0041] A substrate transport device 17 is provided inside the transport section 15. The substrate transport device 17 includes a wafer holding mechanism for holding the wafer W. The substrate transport device 17 is movable in the horizontal direction and the vertical direction and can rotate around the vertical axis, and the substrate transport device 17 transports the wafer W between the interface 14 and the processing unit 16 using the wafer holding mechanism.

[0042] The processing unit 16 is an example of a liquid processing unit, and performs a predetermined liquid process on the wafer W transported by the substrate transport device 17 .

[0043] In addition, the substrate processing system 1 includes a control device 4. The control device 4 is, for example, a computer, and includes a control unit 18 and a storage unit 19. The storage unit 19 stores programs for controlling various processes performed in the substrate processing system 1. The control unit 18 controls the operation of the substrate processing system 1 by reading and executing the programs stored in the storage unit 19.

[0044] In addition, the program may be recorded in a computer-readable storage medium and installed from the storage medium to the storage unit 19 of the control device 4. Examples of computer-readable storage media include a hard disk (HD), a floppy disk (FD), a compact disk (CD), a magneto-optical disk (MO), and a memory card.

[0045] In the substrate processing system 1 configured as described above, first, the substrate transfer device 13 of the loading / unloading station 2 takes out the wafer W from the front-opening FOUP F placed on the front-opening FOUP placement portion 11, and places the taken-out wafer W on the delivery portion 14. The wafer W placed on the delivery portion 14 is taken out from the delivery portion 14 by the substrate transfer device 17 of the processing station 3 and is carried into the processing unit 16.

[0046] After the wafer W is carried into the processing unit 16 and processed by the processing unit 16, it is carried out from the processing unit 16 by the substrate transfer device 17 and placed in the delivery section 14. Then, the processed wafer W placed in the delivery section 14 is returned to the front-opening FOUP F of the front-opening FOUP placement section 11 by the substrate transfer device 13.

[0047] <Overview of Processing Unit>

[0048] Next, refer to Figure 2 The outline of the processing unit 16 will be described. Figure 2 1 is a schematic diagram showing the structure of the processing unit 16 according to the first embodiment. The processing unit 16 includes a chamber 20 , a substrate processing part 30 , a liquid supply part 40 , and a recovery cup 50 .

[0049] The chamber 20 accommodates a substrate processing unit 30, a liquid supply unit 40, and a recovery cup 50. A fan filter unit (FFU) 21 is provided on the top of the chamber 20. The FFU 21 is used to form a downward flow in the chamber 20.

[0050] The substrate processing unit 30 includes a holding unit 31, a support unit 32, and a driving unit 33, and performs liquid processing on the wafer W placed thereon. Figure 1 The support part 32 is a member extending in the vertical direction, and the base end of the support part 32 is rotatably supported by the driving part 33, and the front end of the support part 32 supports the holding part 31 to be horizontal. The driving part 33 rotates the support part 32 around the vertical axis.

[0051] The substrate processing unit 30 rotates the support column 32 by using the driving unit 33 to rotate the support column 32, thereby rotating the holding unit 31 supported by the support column 32. Thus, the wafer W held by the holding unit 31 rotates.

[0052] The liquid supply unit 40 supplies the processing liquid to the wafer W. The liquid supply unit 40 is connected to the processing liquid supply source 70. The liquid supply unit 40 includes a plurality of nozzles. The plurality of nozzles are provided, for example, corresponding to a plurality of types of processing liquids. In addition, the plurality of nozzles spray the plurality of types of processing liquids supplied from the plurality of processing liquid supply sources 70 to the wafer W.

[0053] The recovery cup 50 is arranged to surround the holding part 31 and collects the processing liquid scattered from the wafer W due to the rotation of the holding part 31. A drain port 51 is formed at the bottom of the recovery cup 50, and the processing liquid collected by the recovery cup 50 is discharged to the outside of the processing unit 16 from the drain port 51.

[0054] In addition, an exhaust port 52 for exhausting the gas supplied from the FFU 21 to the outside of the processing unit 16 is formed at the bottom of the recovery cup 50 .

[0055] <Overview of Processing Liquid Supply Source>

[0056] Next, refer to Figure 3 A schematic structure of the processing liquid supply source 70 included in the substrate processing system 1 will be described. Figure 3 2 is a diagram showing a schematic configuration of a processing liquid supply source 70 according to the embodiment. The processing liquid supply source 70 is an example of a liquid supply device.

[0057] like Figure 3 As shown, the substrate processing system 1 includes a processing liquid supply source 70 that supplies processing liquid to the plurality of processing units 16. In the first embodiment, for example, a processing liquid supply source 70 is provided for each of the plurality of types of processing liquids. Figure 3 A process liquid supply source 70 is shown.

[0058] like Figure 3 As shown, the treatment liquid supply source 70 includes a tank 80, a circulation line 90 (an example of a treatment liquid line), and a pump 100. The tank 80 stores the treatment liquid. The treatment liquid is, for example, IPA (isopropyl alcohol). In addition, the treatment liquid of the present disclosure is not limited to IPA, and various types of chemical liquids can be applied.

[0059] The circulation line 90 returns the treatment liquid sent from the tank 80 to the tank 80. The circulation line 90 includes a main line 91 on the upstream side and a plurality of (two in this case) branch lines 92a and 92b (hereinafter also referred to as "first branch line 92a" and "second branch line 92b") on the downstream side.

[0060] In addition, below, in this specification, the last character of the figure mark provided for the component attached to the first branch line 92a is "a", and the last character of the figure mark provided for the component attached to the second branch line 92b is "b". The component attached to the first branch line 92a and the component attached to the second branch line 92b are the same as each other, or substantially the same as each other. In the case where it is not necessary to distinguish the component attached to the first branch line 92a and the component attached to the second branch line 92b from each other, the last characters "a" and "b" are sometimes deleted to express (for example, 93a and 93b are expressed as 93.).

[0061] The main line 91 is provided with a pump 100 . The pump 100 is used to form a circulation flow of the treatment liquid in the circulation line 90 .

[0062] The main line 91 branches into a first branch line 92a and a second branch line 92b at a branch (branch point) set at its downstream end, that is, on the downstream side of the pump 100. The treatment liquid flowing out of the tank 80 flows into the first branch line 92a and the second branch line 92b after passing through the main line 91, and returns to the tank 80 through the first branch line 92a and the second branch line 92b.

[0063] That is, in the processing liquid supply source 70 involved in the first embodiment, the processing liquid circulates in both the first branch line 92a and the second branch line 92b of the circulation line 90 by the driving force generated by the pump 100. Thus, compared with the case where pumps are provided separately in the first branch line 92a and the second branch line 92b, the number of pumps can be reduced, thereby reducing the cost of the processing liquid supply source.

[0064] The first branch line 92a includes a first heating mechanism 93a, a first flow meter 94a, a third valve 95a, a first filter 96a, a first circulation temperature sensor 97a (an example of a first temperature sensor), and a first valve 98a in order from the upstream side. The second branch line 92b includes a second heating mechanism 93b, a second flow meter 94b, a fourth valve 95b, a second filter 96b, a second circulation temperature sensor 97b (an example of a first temperature sensor), and a second valve 98b in order from the upstream side.

[0065] The heating mechanism 93 (the first heating mechanism 93a and the second heating mechanism 93b) heats the temperature of the processing liquid passing through the heating mechanism 93. The control unit 18 can adjust the temperature of the processing liquid by controlling the heating amount of the processing liquid in the heating mechanism 93. The first heating mechanism 93a and the second heating mechanism 93b include a plurality of heating modules arranged in parallel. The heating mechanism 93 is controlled by the control unit 18.

[0066] The number of heating modules belonging to one heating mechanism 93 can be determined by taking into account the temperature control capability required of the heating mechanism 93 and the allowable pressure drop in the heating mechanism 93. Figure 3 As shown, the first heating mechanism 93a and the second heating mechanism 93b are respectively composed of four heating modules arranged in parallel.

[0067] The flowmeter 94 (the first flowmeter 94a and the second flowmeter 94b) measures the flow rate of the circulation flow of the processing liquid formed in the circulation line 90. The measurement result of the flowmeter 94 is output to the control unit 18.

[0068] Valve 95 (third valve 95a, fourth valve 95b) switches the outflow destination of the treated liquid. Specifically, a first branch circulation line 105a connected to the tank 80 branches out from the third valve 95a. The first branch circulation line 105a returns the treated liquid transported from the tank 80 to the first branch line 92a to the tank 80. The third valve 95a switches the outflow destination of the treated liquid in the first branch line 92a between the first branch circulation line 105a and the first filter 96a. For example, when the control unit 18 controls the third valve 95a to set the outflow destination of the treated liquid to the first branch circulation line 105a, the treated liquid transported from the tank 80 returns to the tank 80 via the third valve 95a. In addition, for example, when the control unit 18 controls the third valve 95a to set the outflow destination of the treated liquid to the first filter 96a, the treated liquid transported from the tank 80 flows to the first filter 96a via the third valve 95a. In addition, the control unit 18 can also control the third valve 95a to allow the treatment liquid to flow out to both the first branch circulation line 105a and the first filter 96a.

[0069] The first branch circulation line 105a is provided with a first branch temperature sensor 102a (an example of a second temperature sensor) for detecting the temperature of the treatment liquid flowing in the first branch circulation line 105a. The detection result of the first branch temperature sensor 102a is output to the control unit 18.

[0070] Similarly, a second branch circulation line 105b connected to the tank 80 is branched from the fourth valve 95b. The second branch circulation line 105b returns the treatment liquid transported from the tank 80 to the second branch line 92b to the tank 80. The fourth valve 95b switches the outflow destination of the treatment liquid in the second branch line 92b between the second branch circulation line 105b and the second filter 96b. For example, when the control unit 18 controls the fourth valve 95b to set the outflow destination of the treatment liquid to the second branch circulation line 105b, the treatment liquid transported from the tank 80 returns to the tank 80 via the fourth valve 95b. In addition, for example, when the control unit 18 controls the fourth valve 95b to set the outflow destination of the treatment liquid to the second filter 96b, the treatment liquid transported from the tank 80 flows to the second filter 96b via the fourth valve 95b. In addition, the control unit 18 can also control the fourth valve 95b to cause the treatment liquid to flow out to both the second branch circulation line 105b and the second filter 96b.

[0071] The second branch circulation line 105 b is provided with a second branch temperature sensor 102 b (an example of a second temperature sensor) for detecting the temperature of the processing liquid flowing in the second branch circulation line 105 b . The detection result of the second branch temperature sensor 102 b is output to the control unit 18 .

[0072] As described above, the treatment liquid supply source 70 according to the first embodiment includes the first branch circulation line 105a and the second branch circulation line 105b. Thus, in the process of restarting the circulation flow of the treatment liquid in the circulation line 90 after the circulation of the treatment liquid is stopped due to maintenance, the treatment liquid can be heated while forming the circulation flow of the treatment liquid flowing through the first branch circulation line 105a or the second branch circulation line 105b, thereby heating the treatment liquid without passing through the filter 96.

[0073] Therefore, according to the first embodiment, contamination caused by particles passing through the filter 96 as the temperature of the processing liquid increases can be reduced. In addition, in the first embodiment, since the processing liquid does not flow through the filter 96 that captures particles, contamination of the processing liquid during the temperature increase process can be reduced.

[0074] The filter 96 (the first filter 96a and the second filter 96b) removes pollutants such as particles contained in the treatment liquid passing through the filter 96. The first filter 96a and the second filter 96b may include a plurality of filter modules arranged in parallel. The number of filter modules belonging to one filter 96 can be determined in consideration of the filtering capacity required for the filter 96 and the pressure drop allowed in the filter 96. In the first embodiment, as Figure 3 As shown, the first filter 96a and the second filter 96b are respectively composed of two filter modules arranged in parallel.

[0075] The circulation temperature sensor 97 (the first circulation temperature sensor 97a and the second circulation temperature sensor 97b) detects the temperature of the processing liquid flowing in the circulation line 90. The detection result of the circulation temperature sensor 97 is output to the control unit 18.

[0076] In addition, the circulation temperature sensor 97 does not necessarily need to detect the temperature of the treatment liquid flowing in the circulation line 90. For example, the circulation temperature sensor 97 may be provided on the filter 96, the circulation line 90 (the first branch line 92a, the second branch line 92b), or the drainage line 99 to detect the temperature of the filter 96, the circulation line 90, or the drainage line 99.

[0077] In addition, although the example of including two temperature sensors, the first circulation temperature sensor 97a and the second circulation temperature sensor 97b, is shown here, the present invention is not limited to this, and only one of the two temperature sensors may be included.

[0078] The valve 98 (first valve 98a, second valve 98b) switches the outflow destination of the treatment liquid. Specifically, a first drainage line 99a connected to the discharge portion DR branches out from the first valve 98a. The first drainage line 99a is used to discharge the treatment liquid flowing in the first branch line 92a. The first valve 98a switches the outflow destination of the treatment liquid in the first branch line 92a between the first drainage line 99a and the first branch line 92a. For example, in a case where the control unit 18 controls the first valve 98a to set the outflow destination of the treatment liquid to the first drainage line 99a, the treatment liquid transported from the tank 80 is discharged via the first valve 98a. In addition, for example, in a case where the control unit 18 controls the first valve 98a to set the outflow destination of the treatment liquid to the first branch line 92a, the treatment liquid transported from the tank 80 flows in the first branch line 92a via the first valve 98a. In addition, the control unit 18 can also control the first valve 98a to allow the processing liquid to flow out to both the first branch line 92a and the first drain line 99a.

[0079] Similarly, a second drainage line 99b connected to the discharge portion DR is branched from the second valve 98b. The second drainage line 99b is used to discharge the treatment liquid flowing in the second branch line 92b. The second valve 98b switches the outflow destination of the treatment liquid in the second branch line 92b between the second drainage line 99b and the second branch line 92b. For example, when the control unit 18 controls the second valve 98b to set the outflow destination of the treatment liquid to the second drainage line 99b, the treatment liquid transported from the tank 80 is discharged via the second valve 98b. In addition, for example, when the control unit 18 controls the second valve 98b to set the outflow destination of the treatment liquid to the second branch line 92b, the treatment liquid transported from the tank 80 flows in the second branch line 92b via the second valve 98b. In addition, the control unit 18 can also control the second valve 98b to cause the treatment liquid to flow out to both the second branch line 92b and the second drainage line 99b.

[0080] A plurality of first supply lines 110a are connected to the first branch line 92a at a position downstream of the first valve 98a. One end of the first supply line 110a is connected to the first branch line 92a, and the other end is connected to the processing unit 16. The first supply line 110a supplies the processing liquid flowing in the first branch line 92a to the processing unit 16. A fifth valve 107a for opening and closing the first supply line 110a is provided in the middle of the first supply line 110a.

[0081] A plurality of second supply lines 110b are connected to the second branch line 92b at a position downstream of the second valve 98b. One end of the second supply line 110b is connected to the second branch line 92b, and the other end is connected to the processing unit 16. The second supply line 110b supplies the processing liquid flowing in the second branch line 92b to the processing unit 16. A sixth valve 107b for opening and closing the second supply line 110b is provided in the middle of the second supply line 110b.

[0082] In addition, Figure 3 , an example is shown in which three first supply lines 110a are connected to the first branch line 92a, but the number of first supply lines 110a connected to the first branch line 92a is not limited to three. Similarly, the number of second supply lines 110b connected to the second branch line 92b is not limited to three.

[0083] In addition, here, the first valve 98a, the second valve 98b, the third valve 95a, and the fourth valve 95b are examples of switching valves for switching the outflow destination of the treatment liquid, but the first valve 98a, the second valve 98b, the third valve 95a, and the fourth valve 95b do not necessarily need to be switching valves. For example, the first valve 98a may be composed of two opening and closing valves, namely, an opening and closing valve provided in the first drainage line 99a and an opening and closing valve provided in the first branch line 92a at a position downstream of the first drainage line 99a. The second valve 98b, the third valve 95a, and the fourth valve 95b are the same.

[0084] In the substrate processing system 1 constructed as described above, in the process of circulating the processing liquid in the circulation line 90 again after the circulation of the processing liquid has been stopped due to maintenance, etc., first, a certain amount of the processing liquid is initially discharged from the drainage line 99 (hereinafter referred to as "initial discard"), thereby allowing contaminants such as particles captured by the filter 96 to be discharged together with the processing liquid.

[0085] Here, if the amount of the processing liquid discharged in the initial discard (hereinafter referred to as “initial discard amount”) is unclear, there is a possibility that the processing liquid is discharged from the liquid discharge line 99 more than necessary.

[0086] In view of this, the inventors of the present application have discovered the correlation between the temperature of the processing liquid flowing in the drainage line 99 and the amount of contaminants such as particles contained in the processing liquid (hereinafter referred to as “particle amount”).

[0087] Specifically, the inventors of the present application found that the temperature of the treatment liquid flowing in the drainage line 99 increases with the increase in the initial discarded volume, and the temperature stabilizes when the initial discarded volume reaches a certain amount. Specifically, the inventors of the present application measured the temperature of the treatment liquid when the initial discarded volume reached 2L, 4L, 8L, 12L, and 24L, respectively. As a result, the temperature of the treatment liquid when the initial discarded volume reached 2L was about 45°C, and the temperature of the treatment liquid when the initial discarded volume reached 4L was about 54°C. In contrast, after the initial discarded volume exceeded 4L, the temperature of the treatment liquid hardly changed.

[0088] In addition, the inventors of the present application measured the amount of particulate matter when the initial discarded volume reached 2 L, 4 L, 8 L, 12 L, and 24 L. As a result, the amount of particulate matter in the initial discarded volume 2 L was greater than that in the initial discarded volumes 4 L, 8 L, 12 L, and 24 L, while the amount of particulate matter in the initial discarded volumes 4 L, 8 L, 12 L, and 24 L were all at the same level.

[0089] According to these results, in the substrate processing system 1 involved in the first embodiment, it is set to determine whether to discharge the processing liquid flowing in the circulation line 90 from the drainage line 99 based on the temperature of the processing liquid flowing in the circulation line 90. By performing this determination, the initial discard amount can be optimized. That is, the initial discard can be ended at a stage where the amount of particles has sufficiently decreased, so the contamination of the processing liquid in the circulation line 90 can be appropriately suppressed. In addition, by ending the initial discard at the time when the change in the amount of particles is no longer observed, the useless discharge of the processing liquid can be suppressed. The details of the determination process will be described later.

[0090] Next, refer to Figure 4 An example of the operation of the substrate processing system 1 according to the first embodiment will be described. Figure 4 This is a diagram showing an example of transition of the states of the pump 100 , the first valve 98 a to the fourth valve 95 b , the first heating mechanism 93 a , and the second heating mechanism 93 b . Figure 5 to Figure 7 It is a schematic diagram showing an example of the operation of the processing liquid supply source 70 according to the first embodiment. Figure 4 The processing shown is an example of an operation when the circulation of the processing liquid in the circulation line 90 is restarted after the circulation of the processing liquid in the circulation line 90 is stopped due to maintenance or the like.

[0091] First, the control unit 18 activates the stopped pump 100 to deliver the treatment liquid from the tank 80 to the circulation line 90 (time T1). In addition, at the same time, the control unit 18 controls the third valve 95a to allow the treatment liquid to flow into the first branch circulation line 105a. Thus, the treatment liquid delivered from the tank 80 circulates in a manner that it flows through the third valve 95a in the first branch circulation line 105a and returns to the tank 80.

[0092] Next, the control unit 18 closes the third valve 95a to stop the outflow of the treatment liquid to the first branch circulation line 105a (time T2). In addition, at the same time, the control unit 18 controls the fourth valve 95b to allow the treatment liquid to flow into the second branch circulation line 105b. Thus, the treatment liquid transported from the tank 80 circulates in a manner that it flows in the second branch circulation line 105b via the fourth valve 95b and returns to the tank 80.

[0093] Next, the control unit 18 controls the third valve 95a to allow the treatment liquid to flow into the first branch circulation line 105a (time T3). As a result, the treatment liquid delivered from the tank 80 circulates in the first branch circulation line 105a and the second branch circulation line 105b and returns to the tank 80 (refer to Figure 5 ).

[0094] Next, the control unit 18 determines whether the circulation flow rate of the treatment liquid flowing in the first branch circulation line 105a and the second branch circulation line 105b has stabilized based on the measured values ​​of the first flow meter 94a and the second flow meter 94b. Specifically, when the measured value of the first flow meter 94a converges within a preset threshold range, the control unit 18 determines that the circulation flow rate of the treatment liquid has stabilized, and starts heating by the first heating mechanism 93a. Similarly, when the measured value of the second flow meter 94b converges within a preset threshold range, the control unit 18 determines that the circulation flow rate of the treatment liquid in the second branch line 92b has stabilized, and starts heating by the second heating mechanism 93b. For example, Figure 4 As shown, the control unit 18 activates the second heating mechanism 93b after the measured value of the second flow meter 94b converges within the threshold range (time T4). Thereafter, the control unit 18 activates the first heating mechanism 93a after the measured value of the first flow meter 94a converges within the threshold range (time T5).

[0095] Next, the control unit 18 determines whether the temperature of the treatment liquid flowing in the first branch circulation line 105a and the second branch circulation line 105b has stabilized based on the detection results of the first branch temperature sensor 102a and the second branch temperature sensor 102b. Specifically, the control unit 18 determines that the temperature of the treatment liquid in the first branch circulation line 105a has stabilized when the measured value of the first branch temperature sensor 102a converges within a preset threshold range within a preset monitoring time width. Similarly, the control unit 18 determines that the temperature of the treatment liquid in the second branch circulation line 105b has stabilized when the measured value of the second branch temperature sensor 102b converges within a preset threshold range within a preset monitoring time width.

[0096] When the temperature of the treatment liquid in the first branch line 92a and the second branch line 92b is stabilized, the control unit 18 controls the first valve 98a to the fourth valve 95b to circulate the treatment liquid in the first branch circulation line 105a and the second branch circulation line 105b while allowing the treatment liquid to flow to the drainage line 99. Figure 4 As shown, after the measured values ​​of the first branch temperature sensor 102a and the second branch temperature sensor 102b converge within a preset threshold range within a preset monitoring time width, the control unit 18 controls the third valve 95a and the fourth valve 95b to allow the treated liquid to flow toward both the filter 96 and the branch circulation line 105 (time T6).

[0097] At the same time, the control unit 18 controls the first valve 98a and the second valve 98b to allow the treated liquid to flow into the first drainage line 99a and the second drainage line 99b. As a result, the treated liquid delivered from the tank 80 circulates in the first branch circulation line 105a or the second branch circulation line 105b and returns to the tank 80, while flowing through the first filter 96a and the second filter 96b and being discharged from the drainage line 99 (see Figure 6 ).

[0098] Next, the control unit 18 determines whether to discharge the processing liquid from the liquid discharge line 99 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b. Specifically, when the measured values ​​of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b are greater than the threshold value, the control unit 18 controls the first valve 98a to the fourth valve 95b to switch the outflow destination of the processing liquid from the liquid discharge line 99 to the supply line 110.

[0099] For example, Figure 4 As shown, when the measured values ​​of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b are both above the threshold value, the control unit 18 controls the third valve 95a and the fourth valve 95b to switch the outflow destination of the treatment liquid to the filter 96 (time T7). At the same time, the control unit 18 controls the first valve 98a and the second valve 98b to switch the outflow destination of the treatment liquid to the supply line 110. As a result, the treatment liquid transported from the tank 80 flows through the first branch line 92a and the second branch line 92b and returns to the tank 80 (refer to Figure 7 ). In addition, when the fifth valve 107 a or the sixth valve 107 b is opened, the processing liquid is supplied from the supply line 110 to the processing unit 16 .

[0100] In this way, the control unit 18 determines whether to discharge the processing liquid from the drain line 99 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b. Specifically, the control unit 18 controls the first valve 98a and the second valve 98b to switch the outflow destination of the processing liquid from the drain line 99 to the supply line 110 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b when the temperature of the processing liquid flowing in the circulation line 90 is above the threshold.

[0101] In addition, here, an example is shown in which the outflow destination of the treatment liquid is switched from the drainage line 99 to the supply line 110 when the temperature of the treatment liquid flowing in the circulation line 90 is above the threshold, but it is not limited to this. For example, it can also be set that when the temperature of the treatment liquid flowing in the circulation line 90 is above the threshold, the drainage of the treatment liquid continues until a predetermined specified time has passed. Specifically, when the temperature of the treatment liquid flowing in the circulation line 90 is above the threshold, the control unit 18 controls the first valve 98a and the second valve 98b to switch the outflow destination of the treatment liquid to the drainage line 99 and the supply line 110. As a result, the treatment liquid transported from the tank 80 is discharged from the drainage line 99 by a certain amount while flowing in the branch line 92. Afterwards, the control unit 18 switches the supply destination of the treatment liquid to the supply line 110 when a specified time has passed.

[0102] After the discharge of the treatment liquid heated by the heating mechanism 93 begins (time T6), the temperature of the treatment liquid flowing in the circulation line 90 gradually increases. Afterwards, since the temperature of the treatment liquid becomes above the threshold, most of the particles captured by the filter 96 flow out. As a result, the possibility of contaminating the circulation line 90 is reduced. By stopping the discharge at this time point (time T7) and starting the circulation of the treatment liquid in the circulation line 90, the amount of the discharged treatment liquid can be suppressed to a minimum. In other words, the control unit 18 can control whether to discharge the treatment liquid based on the temperature of the treatment liquid flowing in the circulation line 90, so that the amount of the discharged treatment liquid is an appropriate amount.

[0103] Furthermore, the control unit 18 controls the pump 100, the first heating mechanism 93a, and the second heating mechanism 93b to heat the processing liquid while circulating the processing liquid in the first branch circulation line 105a and the second branch circulation line 105b (time T5 to time T7).

[0104] By controlling the control unit 18 to heat the treatment liquid while circulating it in the first branch circulation line 105a and the second branch circulation line 105b, the treatment liquid can be efficiently heated in a short time compared to the case where the treatment liquid is heated while circulating it in the entire circulation line 90.

[0105] In addition, when the control unit 18 determines that the temperature of the treatment liquid flowing in the first branch circulation line 105a and the second branch circulation line 105b has stabilized based on the detection results of the first branch temperature sensor 102a and the second branch temperature sensor 102b, it controls the pump 100 to transport the treatment liquid to the filter 96 (time T6). Thus, the treatment liquid can be transported to the circulation line 90 after the temperature of the treatment liquid is stabilized.

[0106] In addition, the control unit 18 controls the pump 100, the first valve 98a and the second valve 98b to transport the treated liquid circulating in the first branch circulation line 105a and the second branch circulation line 105b to the first filter 96a and the second filter 96b, and makes the treated liquid passing through the first filter 96a and the second filter 96b flow to the first drainage line 99a and the second drainage line 99b for drainage (time T6 to time T7).

[0107] Thus, when particles captured by the first filter 96 a and the second filter 96 b pass through due to a change in temperature of the processing liquid, the processing liquid can be discharged, thereby reducing contamination of the processing liquid in the circulation line 90 with particles.

[0108] In addition, after the measured value measured by the first flow meter 94a and the measured value measured by the second flow meter 94b respectively converge to the threshold range, the control unit 18 controls the third valve 95a to switch the outflow destination of the treated liquid in the first branch circulation line 105a from the first branch circulation line 105a to the first filter 96a, and controls the fourth valve 95b to switch the outflow destination of the treated liquid in the second branch circulation line 105b from the second branch circulation line 105b to the second filter 96b. Thus, the treated liquid can be transported to the first filter 96a and the second filter 96b after the flow rate of the treated liquid is stabilized (time T4, time T5).

[0109] In addition, the control unit 18 starts the delivery of the treatment liquid to the second branch circulation line 105b (time T2) after starting the delivery of the treatment liquid to the first branch circulation line 105a (time T1). By delivering the treatment liquid one by one like this, it is easier to be in a full liquid state compared to the situation where both sides are delivered at the same time.

[0110] In addition, after the treatment liquid is discharged from the first drain line 99a and the second drain line 99b, the control unit 18 controls the first valve 98a and the second valve 98b to transfer the treatment liquid to the first branch line 92a and the second branch line 92b so that the treatment liquid returns to the tank 80 (time T7). In this way, it is possible to reduce the particles captured by the filter 96 from flowing into the tank 80 and contaminating the tank 80.

[0111] In addition, the control unit 18 circulates the processing liquid in the first branch circulation line 105a and the second branch circulation line 105b (time T6 to time T7) while circulating the processing liquid in the circulation line 90. Thus, it is possible to suppress the processing liquid from being stagnant in the first branch circulation line 105a and the second branch circulation line 105b during the circulation of the processing liquid in the circulation line 90.

[0112] As described above, the control unit 18 determines whether to discharge the processing liquid from the drain line 99 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b. This can reduce contamination of the processing liquid flowing in the circulation line 90 and optimize the amount of the discharged processing liquid.

[0113] In addition, here, an example is shown in which the processing liquid in which the temperature is increased is discharged to the discharge portion DR via the liquid discharge line 99 to form a circulation flow of the processing liquid flowing through the circulation line 90, but the present disclosure is not limited to this example.

[0114] For example, the control unit 18 may also repeat the following processing before starting the circulation of the treatment liquid in the circulation line 90: after heating the treatment liquid while circulating it in the first branch circulation line 105a and the second branch circulation line 105b (time T4, time T5), the treatment liquid circulating in the first branch circulation line 105a and the second branch circulation line 105b is transported to the filter 96, and the treatment liquid is made to flow to the drainage line 99 for drainage (time T6 to time T7).

[0115] This allows more particles captured by the filter 96 to flow to the downstream side, and thus it is possible to further reduce contamination of the treatment liquid in the circulation line 90 .

[0116] (Second Embodiment)

[0117] Figure 8 2 is a diagram showing a schematic structure of the processing liquid supply source 70 according to the second embodiment. In the first embodiment, the circulation line 90 is branched into the first branch line 92a and the second branch line 92b, but the present invention is not limited thereto. The circulation line 90 may not have branch lines.

[0118] like Figure 8 As shown, the processing liquid supply source 70 includes a circulation line 90 for returning the processing liquid sent from the tank 80 to the tank 80. The circulation line 90 includes a pump 100, a heating mechanism 93c, a flow meter 94c, a valve 95c, a filter 96c, a circulation temperature sensor 97c, and a valve 98c in order from the upstream.

[0119] A branch circulation line 105c connected to the tank 80 branches from the valve 95c. A branch temperature sensor 102c for detecting the temperature of the treatment liquid flowing in the branch circulation line 105c is provided in the branch circulation line 105c. A drain line 99c connected to the discharge portion DR branches from the valve 98c.

[0120] In this case as well, Figure 4 At time T7, the control unit 18 determines whether to discharge the treatment liquid from the liquid discharge line 99c based on the detection result of the circulation temperature sensor 97c. Specifically, when the measured value of the circulation temperature sensor 97c is above the threshold value, the control unit 18 controls the valves 98c and 95c to switch the outflow destination of the treatment liquid from the liquid discharge line 99c to the supply line 110c. In this way, the amount of the discharged treatment liquid can be optimized while reducing the contamination of the treatment liquid flowing in the circulation line 90.

[0121] (Third Embodiment)

[0122] Fig. 9 1 is a diagram showing a schematic structure of a processing liquid supply source 70 according to a third embodiment. The processing liquid supply source 70 according to the third embodiment differs from the processing liquid supply source 70 according to the first embodiment in that it has a cleaning liquid supply unit 120 and a new liquid supply unit 130. Therefore, in the following examples, the same reference numerals are given to the same parts as those in the embodiments already described, and detailed descriptions are omitted.

[0123] The cleaning liquid supply unit 120 supplies the cleaning liquid of the filter 96 to the tank 80. The cleaning liquid supply unit 120 includes a cleaning liquid supply source 121 and a seventh valve 122. The cleaning liquid of the filter 96 is supplied to the tank 80 from the cleaning liquid supply source 121. The cleaning liquid is, for example, DIW (Deionized Water). The seventh valve 122 is an on-off valve provided in the flow path of the cleaning liquid supplied from the cleaning liquid supply source 121. For example, when the control unit 18 controls the cleaning liquid supply unit 120 to open the seventh valve 122, the cleaning liquid supplied from the cleaning liquid supply source 121 is transported to the tank 80 via the seventh valve 122. In addition, when the control unit 18 controls the cleaning liquid supply unit 120 to close the seventh valve 122, the cleaning liquid is not transported from the cleaning liquid supply source 121 to the tank 80.

[0124] The new liquid supply unit 130 supplies new liquid of the treatment liquid to the tank 80. The new liquid supply unit 130 includes a new liquid supply source 131 and an eighth valve 132. The new liquid of the treatment liquid is supplied to the tank 80 from the new liquid supply source 131. The eighth valve 132 is an on-off valve provided in the flow path of the new liquid of the treatment liquid supplied from the new liquid supply source 131. For example, when the control unit 18 controls the new liquid supply unit 130 to open the eighth valve 132, the new liquid of the treatment liquid supplied from the new liquid supply source 131 is transported to the tank 80 via the eighth valve 132. In addition, when the control unit 18 controls the new liquid supply unit 130 to close the eighth valve 132, the new liquid of the treatment liquid is not transported from the new liquid supply source 131 to the tank 80.

[0125] Next, refer to Fig.10 An example of the operation of the substrate processing system 1 according to the third embodiment will be described. Fig.10 1 is a diagram showing an example of the transition of the states of the pump 100, the first valve 98a to the fourth valve 95b, the seventh valve 122, the eighth valve 132, the first heating mechanism 93a, and the second heating mechanism 93b. Fig.10 An example of transition of the state of each structure when the filter 96 is replaced with a new one after the circulation of the processing liquid in the circulation line 90 is stopped and the replaced filter 96 is cleaned is shown. Figure 11 to Figure 14 It is a schematic diagram showing an example of the operation of the processing liquid supply source 70 according to the third embodiment.

[0126] First, the control unit 18 controls the seventh valve 122 to start supplying the cleaning liquid to the tank 80 (time T8).

[0127] Next, the control unit 18 activates the stopped pump 100 to deliver the cleaning liquid from the tank 80 to the circulation line 90 (time T9). In addition, the control unit 18 controls the third valve 95a and the fourth valve 95b to allow the cleaning liquid to flow into the first branch circulation line 105a and the second branch circulation line 105b. In addition, the control unit 18 activates the first heating mechanism 93a and the second heating mechanism 93b. As a result, the cleaning liquid supplied from the cleaning liquid supply source 121 to the tank 80 is heated while circulating in a manner such that it flows through the first branch circulation line 105a and the second branch circulation line 105b via the third valve 95a and the fourth valve 95b and returns to the tank 80 (refer to Fig.11 ).

[0128] Next, the control unit 18 determines whether the temperature of the cleaning fluid flowing in the first branch circulation line 105a and the second branch circulation line 105b has stabilized based on the detection results of the first branch temperature sensor 102a and the second branch temperature sensor 102b. Specifically, the control unit 18 determines that the temperature of the cleaning fluid in the first branch circulation line 105a has stabilized when the measured value of the first branch temperature sensor 102a converges within a preset threshold range within a preset monitoring time width. Similarly, the control unit 18 determines that the temperature of the cleaning fluid in the second branch circulation line 105b has stabilized when the measured value of the second branch temperature sensor 102b converges within a preset threshold range within a preset monitoring time width.

[0129] When the temperature of the cleaning liquid in the first branch line 92a and the second branch line 92b is stabilized, the control unit 18 controls the first valve 98a to the fourth valve 95b to circulate the treatment liquid in the first branch circulation line 105a and the second branch circulation line 105b while allowing the treatment liquid to flow to the drainage line 99. Fig.10 As shown, after the measured values ​​of the first branch temperature sensor 102a and the second branch temperature sensor 102b converge within a preset threshold range within a preset monitoring time width, the control unit 18 controls the third valve 95a and the fourth valve 95b to allow the cleaning liquid to flow toward the filter 96 and the branch circulation line 105 (time T10).

[0130] At the same time, the control unit 18 controls the first valve 98a and the second valve 98b to allow the cleaning liquid to flow into the first drainage line 99a and the second drainage line 99b. As a result, the cleaning liquid delivered from the tank 80 circulates in the first branch circulation line 105a or the second branch circulation line 105b and returns to the tank 80, while flowing through the first filter 96a and the second filter 96b and being discharged from the drainage line 99 (see Fig.12 ). After that, the control unit 18 controls the seventh valve 122 to stop supplying the cleaning liquid to the tank 80 (time T11). In addition, the control unit 18 stops the operation of the first heating mechanism 93a and the second heating mechanism 93b. As a result, the cleaning liquid in the tank 80 gradually decreases as it flows through the first filter 96a and the second filter 96b and is discharged from the drain line 99, and finally all the cleaning liquid in the tank 80 is discharged.

[0131] Next, the control unit 18 controls the eighth valve 132 to supply new liquid of the treatment liquid to the tank 80 (time T12). In addition, the control unit 18 controls the third valve 95a and the fourth valve 95b to allow the treatment liquid to flow into the first branch circulation line 105a and the second branch circulation line 105b. In addition, the control unit 18 activates the first heating mechanism 93a and the second heating mechanism 93b. As a result, the treatment liquid supplied to the tank 80 from the new liquid supply source 131 is heated while circulating in a manner such that it flows through the first branch circulation line 105a and the second branch circulation line 105b via the third valve 95a and the fourth valve 95b and returns to the tank 80 (refer to Fig.13 ).

[0132] Next, the control unit 18 determines whether the temperature of the treatment liquid flowing in the first branch circulation line 105a and the second branch circulation line 105b has stabilized based on the detection results of the first branch temperature sensor 102a and the second branch temperature sensor 102b.

[0133] When the temperature of the treatment liquid in the first branch line 92a and the second branch line 92b is stabilized, the control unit 18 controls the first valve 98a to the fourth valve 95b to circulate the treatment liquid in the first branch circulation line 105a and the second branch circulation line 105b while allowing the treatment liquid to flow to the drainage line 99. Fig.10 As shown, after the measured values ​​of the first branch temperature sensor 102a and the second branch temperature sensor 102b converge within a preset threshold range within a preset monitoring time width, the control unit 18 controls the third valve 95a and the fourth valve 95b to allow the treated liquid to flow toward the filter 96 and the branch circulation line 105 (time T13).

[0134] At the same time, the control unit 18 controls the first valve 98a and the second valve 98b to allow the treated liquid to flow into the first drainage line 99a and the second drainage line 99b. As a result, the treated liquid delivered from the tank 80 circulates in the first branch circulation line 105a or the second branch circulation line 105b and returns to the tank 80, while flowing through the first filter 96a and the second filter 96b and being discharged from the drainage line 99 (see Fig.14 ).

[0135] Next, the control unit 18 determines whether to discharge the processing liquid from the liquid discharge line 99 based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b. Specifically, when the measured values ​​of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b are greater than the threshold value, the control unit 18 controls the first valve 98a to the fourth valve 95b to switch the outflow destination of the processing liquid from the liquid discharge line 99 to the supply line 110.

[0136] For example, Fig.10 As shown, when the measured values ​​of both the first circulation temperature sensor 97a and the second circulation temperature sensor 97b are above the threshold value, the control unit 18 controls the third valve 95a and the fourth valve 95b to switch the outflow destination of the treatment liquid to the filter 96 (time T14). At the same time, the control unit 18 controls the first valve 98a and the second valve 98b to switch the outflow destination of the treatment liquid to the supply line 110. In addition, the control unit 18 controls the eighth valve 132 to stop supplying the treatment liquid to the tank 80. As a result, the treatment liquid transported from the tank 80 flows in the first branch line 92a and the second branch line 92b and returns to the tank 80. In addition, when the fifth valve 107a or the sixth valve 107b is opened, the treatment liquid is supplied from the supply line 110 to the processing unit 16.

[0137] In this way, the control unit 18 delivers the cleaning liquid having a temperature above a predetermined temperature to the filter 96. Specifically, when the control unit 18 determines that the temperature of the cleaning liquid circulating in the branch circulation line 105 has stabilized based on the detection results of the first circulation temperature sensor 97a and the second circulation temperature sensor 97b, the control unit 18 controls the pump 100 to deliver the cleaning liquid to the filter 96 (time T10).

[0138] By supplying the cleaning liquid having a temperature not lower than a predetermined temperature to the filter 96 , it is possible to remove particles adhering to the replaced filter 96 , for example, particles adhering during the replacement operation.

[0139] Furthermore, the control unit 18 controls the first valve 98a and the second valve 98b so that the cleaning liquid sent to the filter 96 flows to the drain line 99 at a predetermined temperature or higher and for a predetermined time to be drained (time T10).

[0140] Thus, when particles attached to the first filter 96 a and the second filter 96 b pass through, the cleaning liquid can be discharged, so that contamination of the circulation line 90 with particles can be reduced.

[0141] Furthermore, after the control unit 18 allows the cleaning liquid delivered to the filter 96 to flow toward the drain line 99 for drainage, the control unit 18 controls the cleaning liquid supply unit 120 to stop supplying the cleaning liquid to the tank 80 and controls the new liquid supply unit 130 to start supplying new treatment liquid to the tank 80 (time T10 to time T12).

[0142] By supplying new treatment liquid and causing it to flow into the circulation line 90 in this manner, new particles are less likely to adhere to the filter 96 cleaned with the cleaning liquid.

[0143] In addition, after the control unit 18 controls the seventh valve 122 to start supplying the cleaning liquid to the tank 80, it controls the pump 100, the first heating mechanism 93a and the second heating mechanism 93b to heat the cleaning liquid while circulating the cleaning liquid in the first branch circulation line 105a and the second branch circulation line 105b (time T8 to time T10).

[0144] By controlling the control unit 18 to heat the cleaning liquid while circulating it in the first branch circulation line 105a and the second branch circulation line 105b, the cleaning liquid can be efficiently heated in a shorter time compared to the case where the cleaning liquid is heated while circulating it in the entire circulation line 90.

[0145] In addition, the temperature of the cleaning liquid delivered to the filter 96 may be higher than the temperature of the treatment liquid delivered to the filter 96. Specifically, the lower limit value of the threshold range used when determining whether the temperature of the cleaning liquid has stabilized may be greater than the lower limit value of the threshold range used when determining whether the temperature of the treatment liquid has stabilized. By setting the threshold range in this way, the temperature of the cleaning liquid delivered to the filter 96 is higher than the temperature of the treatment liquid delivered to the filter 96.

[0146] In addition, if Fig. 9 As shown, the processing liquid supply source 70 according to the third embodiment may further include a water concentration meter 150 (a first water concentration meter 150a and a second water concentration meter 150b). The water concentration meter 150 is provided in the circulation line 90 to measure the water concentration of the liquid flowing in the circulation line 90.

[0147] The control unit 18 can confirm the ratio of the cleaning liquid in the liquid flowing in the circulation line 90 based on the measurement result of the water concentration meter 150. Thus, the degree of replacement of the cleaning liquid with the processing liquid in the liquid flowing in the circulation line 90 can be confirmed.

[0148] In addition, here, an example in which two moisture concentration meters, the first moisture concentration meter 150 a and the second moisture concentration meter 150 b are provided is shown, but the present invention is not limited to this, and only one of the two moisture concentration meters may be provided.

[0149] By supplying high temperature cleaning liquid to the filter 96 in this way, the filter 96 expands thermally, so that the particles captured by the filter 96 easily pass through the filter 96. The particles that pass through the filter 96 can be discharged to the drain line 99 together with the cleaning liquid, so that the contamination of the circulation line 90 by particles can be reduced.

[0150] As described above, the control unit 18 supplies the cleaning liquid having a temperature not lower than a predetermined temperature to the filter 96. Thus, particles attached to the replaced filter 96, for example, particles attached during the replacement operation, can be removed.

[0151] In addition, here, the example in which the filter 96 cleaned with the cleaning liquid is a new filter after replacement is described, but the cleaned filter 96 is not limited to this. For example, the filter 96 may also be a filter that is contaminated due to use. By cleaning the filter that is contaminated due to use with a cleaning liquid at a predetermined temperature or higher, particles attached due to use can be removed. In addition, compared with the case of using an external device to clean the filter, the filter can be cleaned at a low price and easily.

[0152] Furthermore, by using the branch circulation line 105 to clean the filter, the filter can be cleaned in a shorter time and the amount of cleaning liquid used can be reduced compared to the case where the filter is cleaned using the entire circulation line 90 .

[0153] (Fourth Embodiment)

[0154] In the first embodiment described above, it is shown that Figure 4 The example of switching the outflow destination of the processing liquid from the discharge line 99 to the supply line 110 when the temperature of the processing liquid flowing in the circulation line 90 is above the threshold at time T7 is not limited thereto. For example, it is also possible to set the processing liquid to continue to be discharged until a predetermined time has passed when the temperature of the processing liquid flowing in the circulation line 90 is above the threshold.

[0155] Sometimes, the circulation flow rate of the treatment liquid flowing in the circulation line 90 increases due to the switching of the outflow destination of the treatment liquid from the discharge line 99 to the supply line 110. Specifically, when the treatment liquid is circulated only in the branch circulation line 105 while being heated, the circulation flow rate is adjusted to be less than the prescribed circulation flow rate so that the temperature of the treatment liquid is stabilized. Thereafter, when the outflow destination of the treatment liquid is switched from the discharge line 99 to the supply line 110, the circulation flow rate of the treatment liquid is adjusted to be greater than the prescribed circulation flow rate. In such a case, the circulation flow rate of the treatment liquid flowing in the circulation line 90 increases. When the circulation flow rate of the treatment liquid flowing in the circulation line 90 increases, the particles captured by the filter 96 pass through the filter 96, and thus the treatment liquid in the circulation line 90 may be contaminated.

[0156] Therefore, as described above, when the temperature of the treatment liquid flowing in the circulation line 90 is above the threshold value, the discharge of the treatment liquid is continued until a predetermined time has passed. Specifically, when the temperature of the treatment liquid flowing in the circulation line 90 is above the threshold value, the control unit 18 controls the first valve 98a and the second valve 98b to switch the outflow destination of the treatment liquid to the drainage line 99 and the supply line 110. As a result, while the treatment liquid transported from the tank 80 flows in the branch line 92, a certain amount is discharged from the drainage line 99. Thereafter, the control unit 18 switches the outflow destination of the treatment liquid from the drainage line 99 and the supply line 110 to the supply line 110, for example, when a predetermined time has passed.

[0157] Thus, when particles captured by the first filter 96a and the second filter 96b pass through due to a change in the circulation flow rate of the processing liquid, the processing liquid can be discharged, thereby reducing contamination of the processing liquid in the circulation line 90 by particles.

[0158] (Fifth Embodiment)

[0159] Fig.15 1 is a diagram showing a schematic structure of a treatment liquid supply source 70 according to a fifth embodiment. The treatment liquid supply source 70 according to the fifth embodiment differs from the treatment liquid supply source 70 according to the first embodiment in that it includes a valve 160 , a liquid feed line 170 , and a valve 171 .

[0160] The valve 160 (the ninth valve 160a, the tenth valve 160b) is located in the branch line 92 at a position downstream of the connection portion with the supply line 110. The valve 160 switches the outflow destination of the treatment liquid. Specifically, the third drainage line 161a connected to the discharge portion DR is branched from the ninth valve 160a. The third drainage line 161a discharges the treatment liquid flowing in the first branch line 92a. The ninth valve 160a switches the outflow destination of the treatment liquid in the first branch line 92a between the third drainage line 161a and the first branch line 92a. Similarly, the fourth drainage line 161b connected to the discharge portion DR is branched from the tenth valve 160b. The fourth drainage line 161b discharges the treatment liquid flowing in the second branch line 92b. The tenth valve 160b switches the outflow destination of the treatment liquid in the second branch line 92b between the fourth drainage line 161b and the second branch line 92b.

[0161] The infusion line 170 (the first infusion line 170a and the second infusion line 170b) returns the treatment liquid supplied to the treatment unit 16 to the tank 80. The infusion line 170 is provided with a valve 171 (the eleventh valve 171a and the twelfth valve 171b). The valve 171 switches the outflow destination of the treatment liquid. Specifically, the fifth drainage line 172a connected to the discharge part DR is branched from the eleventh valve 171a. The fifth drainage line 172a discharges the treatment liquid flowing in the first infusion line 170a. The eleventh valve 171a switches the outflow destination of the treatment liquid in the first infusion line 170a between the fifth drainage line 172a and the first infusion line 170a. Similarly, the sixth drainage line 172b connected to the discharge part DR is branched from the twelfth valve 171b. The sixth drainage line 172b discharges the treatment liquid flowing in the second infusion line 170b. The twelfth valve 171 b switches the outflow destination of the treatment liquid in the second liquid infusion line 170 b between the sixth liquid discharge line 172 b and the second liquid infusion line 170 b .

[0162] As described above, the treatment liquid supply source 70 according to the fifth embodiment can discharge the treatment liquid retained for a long time in the branch line 92 or the infusion line 170 by having the valve 160 or the valve 171. Specifically, in the process of re-circulating the treatment liquid in the circulation line 90 after the circulation of the treatment liquid has been stopped due to maintenance, the control unit 18 controls the valve 160 or the valve 171 to switch the outflow destination of the treatment liquid to the third drainage line 161a to the sixth drainage line 172b and maintain it for a certain period of time. As a result, the treatment liquid retained for a long time can be discharged without returning to the tank 80, so that the tank 80 or the circulation line 90 is not easily contaminated by the retained treatment liquid.

[0163] (Sixth Embodiment)

[0164] Fig.16 1 is a diagram showing a schematic structure of a treatment liquid supply source 70 according to a sixth embodiment. The treatment liquid supply source 70 according to the sixth embodiment differs from the treatment liquid supply source 70 according to the first embodiment in that the treatment liquid supply source 70 has a valve 180 and a filter tank 182, and that the treatment liquid is supplied to the filter tank 182 via a valve 98.

[0165] The valve 180 is located in the main line 91 at a position downstream of the pump 100. The valve 180 switches the outflow destination of the treated liquid. Specifically, a filter line 181 connected to a filter tank 182 is branched from the valve 180a. The filter line 181 is used to transport the treated liquid flowing in the main line 91 to the filter tank 182. The valve 180a switches the outflow destination of the treated liquid in the main line 91 between the filter line 181 and the main line 91.

[0166] The valve 98 (first valve 98a, second valve 98b) switches the outflow destination of the treated liquid. Specifically, a first drain line 99a connected to the filter tank 182 is branched from the first valve 98a. The first drain line 99a is used to transport the treated liquid flowing in the first branch line 92a to the filter tank 182. Similarly, a second drain line 99b connected to the filter tank 182 is branched from the second valve 98b. The second drain line 99b is used to transport the treated liquid flowing in the first branch line 92a to the filter tank 182.

[0167] The filter tank 182 removes pollutants and the like contained in the sent processing liquid by a filter material etc. The processing liquid from which the pollutants and the like have been removed by the filter tank 182 is caused to flow toward the supply line 183 and is sent to the tank 80 .

[0168] As described above, the treatment liquid supply source 70 according to the sixth embodiment includes the filter tank 182, and can filter the treatment liquid flowing in the drainage line 99 or the circulation line 90, and return it to the tank 80 and the circulation line 90 for reuse. Therefore, the drainage amount of the treatment liquid can be reduced.

[0169] Furthermore, the present disclosure can take the following structures.

[0170] (1) A liquid supply device comprising:

[0171] a processing liquid line that supplies a processing liquid to a liquid processing section that performs liquid processing on a substrate;

[0172] A heating mechanism, which is disposed in the treatment liquid line and heats the treatment liquid flowing in the treatment liquid line;

[0173] a filter disposed at a position downstream of the heating mechanism in the treatment liquid line;

[0174] a liquid discharge line disposed at a position downstream of the filter in the treatment liquid line and used for discharging the treatment liquid flowing in the treatment liquid line;

[0175] a first temperature sensor disposed at the filter, a position of the treatment liquid line between the filter and the drainage line, or the drainage line, to detect a temperature of the filter, the treatment liquid line, the drainage line, or the treatment liquid; and

[0176] Control Department,

[0177] The control unit determines whether to discharge the processing liquid from the liquid discharge line based on the detection result of the first temperature sensor.

[0178] (2) The liquid supply device according to (1), wherein:

[0179] A tank for storing the treatment liquid is also provided.

[0180] The treatment liquid line has:

[0181] a circulation line that returns the treatment liquid conveyed from the tank to the tank;

[0182] a pump for forming a circulation flow of the treatment liquid in the circulation line; and

[0183] a branch circulation line branching from between the heating mechanism and the filter and used to return the treatment liquid delivered from the tank to the tank,

[0184] The control unit controls the pump and the heating mechanism before starting the circulation of the processing liquid in the circulation line to heat the processing liquid while circulating the processing liquid in the branch circulation line.

[0185] (3) The liquid supply device according to (2), wherein:

[0186] A second temperature sensor is further provided, the second temperature sensor being provided in the branch circulation line and detecting the temperature of the processing liquid flowing in the branch circulation line.

[0187] The control unit controls the pump to send the processing liquid to the filter when determining that the temperature of the processing liquid circulating in the branch circulation line has stabilized based on the detection result of the second temperature sensor.

[0188] (4) The liquid supply device according to (3), comprising:

[0189] a supply line branched from a position on the downstream side of the liquid discharge line in the circulation line and configured to supply the treatment liquid to the liquid treatment section; and

[0190] a valve for switching an outflow destination of the treatment liquid between the discharge line and the supply line in the circulation line,

[0191] The control unit controls the valve to allow the treated liquid sent to the filter to flow toward the drain line for drainage.

[0192] (5) The liquid supply device according to any one of (2) to (4), wherein:

[0193] The control unit repeats the following processing before starting the circulation of the treatment liquid in the circulation line: after heating the treatment liquid while circulating it in the branch circulation line, the treatment liquid circulating in the branch circulation line is transported to the filter, and the treatment liquid transported to the filter is made to flow to the drainage line for drainage.

[0194] (6) The liquid supply device according to (4), wherein:

[0195] Based on the detection result of the first temperature sensor, the control unit controls the valve to switch the outflow destination of the processing liquid from the drainage line to the supply line when the temperature of the filter, the processing liquid line, the drainage line or the processing liquid is above a threshold.

[0196] (7) The liquid supply device according to (4), wherein:

[0197] Based on the detection result of the first temperature sensor, the control unit controls the valve to switch the outflow destination of the processing liquid from the drainage line to the supply line and the drainage line when the temperature of the filter, the processing liquid line, the drainage line or the processing liquid is above a threshold.

[0198] (8) The liquid supply device according to (7), wherein:

[0199] The control unit switches the outflow destination of the processing liquid from the supply line and the drain line to the supply line after switching the outflow destination of the processing liquid from the drain line to the supply line and the drain line.

[0200] (9) The liquid supply device according to (2), wherein:

[0201] The control unit circulates the processing liquid in the branch circulation line while circulating the processing liquid in the circulation line.

[0202] (10) A liquid supply device comprising:

[0203] a processing liquid line that supplies a processing liquid to a liquid processing section that performs liquid processing on a substrate;

[0204] A heating mechanism, which is disposed in the treatment liquid line and heats the treatment liquid flowing in the treatment liquid line;

[0205] a filter disposed at a position downstream of the heating mechanism in the treatment liquid line;

[0206] a liquid discharge line disposed at a position downstream of the filter in the treatment liquid line and used for discharging the treatment liquid flowing in the treatment liquid line;

[0207] a tank storing the treatment liquid;

[0208] a cleaning liquid supply unit that supplies the cleaning liquid of the filter to the tank; and

[0209] Control Department,

[0210] Wherein, the processing liquid line has:

[0211] a circulation line that returns the treatment liquid conveyed from the tank to the tank;

[0212] a pump for forming a circulation flow of the treatment liquid in the circulation line; and

[0213] a branch circulation line branching from between the heating mechanism and the filter and used to return the treatment liquid delivered from the tank to the tank,

[0214] After controlling the cleaning liquid supply unit to start supplying the cleaning liquid to the tank, the control unit controls the pump and the heating mechanism to heat the cleaning liquid while circulating the cleaning liquid in the branch circulation line.

[0215] (11) The liquid supply device according to (10), wherein:

[0216] A second temperature sensor is further provided, the second temperature sensor being provided in the branch circulation line and detecting the temperature of the cleaning liquid flowing in the branch circulation line.

[0217] The control unit controls the pump to send the cleaning fluid to the filter when determining that the temperature of the cleaning fluid circulating in the branch circulation line has stabilized based on the detection result of the second temperature sensor.

[0218] (12) The liquid supply device according to (11), comprising:

[0219] a supply line branched from a position on the downstream side of the liquid discharge line in the circulation line and configured to supply the treatment liquid to the liquid treatment section; and

[0220] a valve that switches an outflow destination of the treatment liquid between the discharge line and the supply line in the circulation line,

[0221] The control unit controls the valve so that the cleaning liquid sent to the filter flows to the drain line at a predetermined temperature or higher and for a predetermined time to be drained.

[0222] (13) The liquid supply device according to (12), wherein:

[0223] It also includes a new liquid supply unit for supplying new liquid of the treatment liquid to the tank,

[0224] After the cleaning liquid sent to the filter flows toward the drain line for drainage, the control unit controls the cleaning liquid supply unit to stop supplying the cleaning liquid to the tank and controls the new liquid supply unit to start supplying new liquid of the treatment liquid to the tank.

[0225] (14) The liquid supply device according to (11), wherein:

[0226] The temperature of the cleaning liquid sent to the filter is higher than the temperature of the treatment liquid sent to the filter.

[0227] (15) A liquid supply method, comprising the following steps in the liquid supply device according to (1):

[0228] Using the first temperature sensor to detect the temperature of the filter, the process liquid line, the drain line, or the process liquid; and

[0229] Based on the detection result of the first temperature sensor, it is determined whether to discharge the processing liquid from the liquid discharge line.

[0230] (16) A liquid supply method, comprising the following steps in the liquid supply device according to (1):

[0231] Using the first temperature sensor to detect the temperature of the filter, the process liquid line, the drain line, or the process liquid; and

[0232] When the temperature of the filter, the processing liquid line, the drain line, or the processing liquid is equal to or higher than a threshold value based on the detection result of the first temperature sensor, the processing liquid flowing in the processing liquid line is supplied to the liquid processing unit.

[0233] (17) A storage medium which is a computer-readable storage medium storing a program which operates on a computer to control a liquid supply device,

[0234] When the program is executed, the computer controls the liquid supply device to perform the liquid supply method according to (15) or (16).

[0235] It should be understood that the embodiments disclosed herein are illustrative in all respects and are not restrictive. In fact, the above embodiments can be implemented in a variety of ways. In addition, the above embodiments can also be omitted, replaced, and changed in various ways without departing from the attached claims and their gist.

[0236] Description of Reference Numerals

[0237] W: wafer; 1: substrate processing system; 16: processing unit (an example of a liquid processing unit); 18: control unit; 30: substrate processing unit; 70: processing liquid supply source (an example of a liquid supply device); 80: tank; 90: circulation line; 100: pump; 92a: first branch line; 92b: second branch line; 93: heating mechanism; 96: filter; 97a: first circulation temperature sensor; 97b: second circulation temperature sensor; 99: drainage line; 110: supply line; 120: cleaning liquid supply unit; 130: new liquid supply unit.

Claims

1. A liquid supply device, comprising: a processing liquid line that supplies a processing liquid to a liquid processing section that performs liquid processing on a substrate; A heating mechanism, which is disposed in the treatment liquid line and heats the treatment liquid flowing in the treatment liquid line; a filter disposed at a position downstream of the heating mechanism in the treatment liquid line; a liquid discharge line disposed at a position downstream of the filter in the treatment liquid line and used for discharging the treatment liquid flowing in the treatment liquid line; A first temperature sensor is disposed on the filter, a position of the treatment liquid line between the filter and the drainage line, or the drainage line to detect the temperature of the filter, the treatment liquid line, the drainage line, or the treatment liquid; as well as Control Department, The control unit determines whether to discharge the processing liquid from the liquid discharge line based on the detection result of the first temperature sensor.

2. The liquid supply device according to claim 1, wherein: A tank for storing the treatment liquid is also provided. The treatment liquid line has: a circulation line that returns the treatment liquid conveyed from the tank to the tank; a pump for forming a circulation flow of the treatment liquid in the circulation line; and a branch circulation line branching from between the heating mechanism and the filter and used to return the treatment liquid delivered from the tank to the tank, The control unit controls the pump and the heating mechanism before starting the circulation of the processing liquid in the circulation line to heat the processing liquid while circulating the processing liquid in the branch circulation line.

3. The liquid supply device according to claim 2, wherein: A second temperature sensor is further provided, the second temperature sensor being provided in the branch circulation line and detecting the temperature of the processing liquid flowing in the branch circulation line. The control unit controls the pump to send the processing liquid to the filter when determining that the temperature of the processing liquid circulating in the branch circulation line has stabilized based on the detection result of the second temperature sensor.

4. The liquid supply device according to claim 3, comprising: a supply line branched from a position on the downstream side of the liquid discharge line in the circulation line and configured to supply the treatment liquid to the liquid treatment section; and a valve for switching an outflow destination of the treatment liquid between the discharge line and the supply line in the circulation line, The control unit controls the valve to allow the treated liquid sent to the filter to flow toward the drain line for drainage.

5. The liquid supply device according to claim 4, wherein: The control unit repeats the following processing before starting the circulation of the treatment liquid in the circulation line: after heating the treatment liquid while circulating it in the branch circulation line, the treatment liquid circulating in the branch circulation line is transported to the filter, and the treatment liquid transported to the filter is made to flow to the drainage line for drainage.

6. The liquid supply device according to claim 4, wherein: Based on the detection result of the first temperature sensor, the control unit controls the valve to switch the outflow destination of the processing liquid from the drainage line to the supply line when the temperature of the filter, the processing liquid line, the drainage line or the processing liquid is above a threshold.

7. The liquid supply device according to claim 4, wherein: Based on the detection result of the first temperature sensor, the control unit controls the valve to switch the outflow destination of the processing liquid from the drainage line to the supply line and the drainage line when the temperature of the filter, the processing liquid line, the drainage line or the processing liquid is above a threshold.

8. The liquid supply device according to claim 7, wherein: The control unit switches the outflow destination of the processing liquid from the supply line and the drain line to the supply line after switching the outflow destination of the processing liquid from the drain line to the supply line and the drain line.

9. The liquid supply device according to claim 2, wherein: The control unit circulates the processing liquid in the branch circulation line while circulating the processing liquid in the circulation line.

10. A liquid supply device comprising: a processing liquid line that supplies a processing liquid to a liquid processing section that performs liquid processing on a substrate; A heating mechanism, which is disposed in the treatment liquid line and heats the treatment liquid flowing in the treatment liquid line; a filter disposed at a position downstream of the heating mechanism in the treatment liquid line; a liquid discharge line disposed at a position downstream of the filter in the treatment liquid line and used for discharging the treatment liquid flowing in the treatment liquid line; a tank storing the treatment liquid; a cleaning liquid supply unit that supplies the cleaning liquid of the filter to the tank; and Control Department, Wherein, the processing liquid line has: a circulation line that returns the treatment liquid conveyed from the tank to the tank; a pump for forming a circulation flow of the treatment liquid in the circulation line; and a branch circulation line branching from between the heating mechanism and the filter and used to return the treatment liquid delivered from the tank to the tank, After controlling the cleaning liquid supply unit to start supplying the cleaning liquid to the tank, the control unit controls the pump and the heating mechanism to heat the cleaning liquid while circulating the cleaning liquid in the branch circulation line.

11. The liquid supply device according to claim 10, wherein: A second temperature sensor is further provided, the second temperature sensor being provided in the branch circulation line and detecting the temperature of the cleaning liquid flowing in the branch circulation line. The control unit controls the pump to send the cleaning fluid to the filter when determining that the temperature of the cleaning fluid circulating in the branch circulation line has stabilized based on the detection result of the second temperature sensor.

12. The liquid supply device according to claim 11, comprising: a supply line branched from a position on the downstream side of the liquid discharge line in the circulation line and configured to supply the treatment liquid to the liquid treatment section; and a valve that switches an outflow destination of the treatment liquid between the discharge line and the supply line in the circulation line, in, The control unit controls the valve so that the cleaning liquid sent to the filter flows to the drain line at a predetermined temperature or higher and for a predetermined time to be drained.

13. The liquid supply device according to claim 12, wherein: It also includes a new liquid supply unit for supplying new liquid of the treatment liquid to the tank, After the cleaning liquid sent to the filter flows toward the drain line for drainage, the control unit controls the cleaning liquid supply unit to stop supplying the cleaning liquid to the tank and controls the new liquid supply unit to start supplying new liquid of the treatment liquid to the tank.

14. The liquid supply device according to claim 11, wherein: The temperature of the cleaning liquid sent to the filter is higher than the temperature of the treatment liquid sent to the filter.

15. A liquid supply method, comprising the following steps in the liquid supply device according to claim 1: Using the first temperature sensor to detect the temperature of the filter, the process liquid line, the drain line, or the process liquid; and Based on the detection result of the first temperature sensor, it is determined whether to discharge the processing liquid from the liquid discharge line.

16. A liquid supply method, comprising the following steps in the liquid supply device according to claim 1: Using the first temperature sensor to detect the temperature of the filter, the process liquid line, the drain line, or the process liquid; and When the temperature of the filter, the processing liquid line, the drain line, or the processing liquid is equal to or higher than a threshold value based on the detection result of the first temperature sensor, the processing liquid flowing in the processing liquid line is supplied to the liquid processing unit.

17. A computer-readable storage medium storing a program that operates on a computer to control a liquid supply device, When the program is executed, the computer controls the liquid supply device to perform the liquid supply method according to claim 15 or 16.

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