Continuous air-through etching apparatus and method of use

Abstract

The invention relates to the field of etching equipment and use methods, in particular to continuous hollow etching equipment and a use method, and the continuous hollow etching equipment comprises an etching workshop, an etching liquid storage barrel, a sealing cover, a rebounding piece, a filtering filler, a transmission belt, a telescopic cylinder and a clamping piece; the left end of the inner side of the etching workshop is fixedly connected with an etching liquid storage barrel used for containing a chemical solution. The upper end of the etching liquid storage barrel is provided with a sealing cover which is used for covering and can prevent reaction waste gas from overflowing in the etching process; the inner side of the sealing cover is clamped and connected with a filtering filler for adsorbing and filtering harmful substances in waste gas; when etching is carried out, the sealing cover can be driven to cover the etching liquid storage barrel, under the action of the filtering filler on the inner side of the sealing cover, the excellent adsorption and decomposition capacity on harmful substances in waste gas is achieved, the continuity of the etching procedure is improved by integrating etching, cleaning and drying, and the whole etching process is smoother and more efficient.

Description

Technical Field

[0001] The invention relates to the field of etching equipment and use methods, and in particular to continuous leakage etching equipment and use methods. Background Art

[0002] Etching holes is a technology that uses a specific process to form a concave-convex or hole-forming effect on the material. In the early stage, the corresponding mask plate needs to be made according to the design requirements. There will be a pattern corresponding to the final hole shape on the mask plate. Then the mask plate is closely fitted with the material to be etched, and then exposed. After exposure, the developer is used to remove the protective film of the area on the material that is illuminated by light (that is, the latent image area) to expose the part to be etched. This is the preparation work in the early stage of etching.

[0003] The existing etching process is to put the material into a chemical solution, and use the corrosive effect of the solution to corrode the exposed part of the material to form a leaking effect. After the etching is completed, the material is taken out of the solution and cleaned and dried separately. However, this operation, firstly, during the etching process, due to the corrosive effect of the chemical solution, waste gas including oxygen, nitrogen, fluoride, chloride, etc. will be generated. The direct emission of harmful gases will cause serious harm to the environment and human health. Secondly, in the existing process, after the etching is completed, the material needs to be taken out of the solution, and then cleaned and dried separately, which has poor continuity, increases the complexity of the process and labor costs, and causes the etched parts to be contaminated or damaged during the shipping process.

[0004] Therefore, in order to solve the problem that the waste gas generated by the etching is not properly handled and the continuity between etching and subsequent related processes is poor, a continuous leakage etching device and a method of use can be designed. Summary of the invention

[0005] In order to overcome the problem that the waste gas generated by the existing etching is not properly treated and the continuity between etching and subsequent related processes is poor.

[0006] The technical scheme of the present invention is: a continuous leakage etching device, comprising an etching workshop, an etching liquid storage barrel, a sealing cover, a rebound part, a filter filler, a transmission belt, a telescopic cylinder, a clamping part, a cleaning barrel, a hot air duct, and a stirring component; an etching liquid storage barrel for containing a chemical solution is fixedly connected to the left end of the inner side of the etching workshop; a sealing cover for covering the etching liquid storage barrel to block the overflow of reaction waste gas during the etching process is installed on the upper end; a filter filler for absorbing and filtering harmful substances in the waste gas is connected to the inner side of the sealing cover; a rebound part for driving the sealing cover to move up and down is arranged at the left end of the sealing cover; a plurality of etching parts are driven to move on the top of the etching workshop transmission belt; the outer surface of the transmission belt is equipped with telescopic cylinders which are equidistantly distributed and installed on the inner side of the support frame; the end of the piston rod of the telescopic cylinder is provided with a clamping piece for stably positioning the etching workpiece; a cleaning bucket is placed on the right end of the etching liquid storage bucket; a hot air duct is provided on the upper end of the cleaning bucket; a stirring assembly is installed on the inner sides of the etching liquid storage bucket and the cleaning bucket; the stirring assembly includes a rotating shaft; the inner sides of the etching liquid storage bucket and the cleaning bucket are both connected to the rotating shaft with bearings; the rotating shaft is located in the inner area of ​​the etching liquid storage bucket and the first stirring blade is installed; the rotating shaft is located in the inner area of ​​the cleaning bucket and the second stirring blade is installed; a driving gear is installed on the left end of the rotating shaft; and a long rack is meshed and connected to the front end of the driving gear.

[0007] Preferably, an air hole is provided at the upper end of the sealing cover; the filter filler includes a solid activated carbon adsorbent for adsorbing most of the harmful gases in the exhaust gas; an ultrafiltration membrane for intercepting fluoride ions in the harmful gas is arranged on the upper end of the solid activated carbon adsorbent; a molecular sieve for separating nitrogen oxides in the harmful gas is installed on the upper end of the ultrafiltration membrane.

[0008] Preferably, the resilient member comprises a support column; a long movable groove is provided on the inner side of the support column; a return spring is provided on the outer side of the sliding rod of the movable groove; a movable seat is slidably connected to the outer side of the sliding rod of the movable groove; and the return spring is located at the lower end of the movable seat.

[0009] Preferably, a sealing edge matching the sealing cover is provided at the upper end of the etching liquid storage barrel; an escape groove for evading the clamping member is provided on the inner side of the sealing cover; and blocks are fixedly connected to both the front and rear ends of the clamping member.

[0010] Preferably, the hot air duct adopts an annular structure; a hot air blower is provided at the right end of the hot air duct; air outlets are distributed in a ring shape on the inside of the hot air duct; an elastic sleeve for supporting the hot air duct is provided between the hot air duct and the cleaning bucket; a push block matching the position of the block is fixedly connected to the inside of the hot air duct.

[0011] Preferably, the driving gear is welded to the left end of the etching liquid storage barrel through a fixed frame; a limiting structure is provided at the connection between the long rack and the fixed frame; and the upper end of the long rack is connected to the bottom end of the movable seat.

[0012] Preferably, the clamping member adopts a bidirectional clamping structure; a limiting frame is welded to the clamping end of the clamping member; and a textured anti-slip pad is fixedly connected to the inner wall of the limiting frame.

[0013] A continuous leak etching device and a method of use, comprising the continuous leak etching device described above, and the steps are as follows:

[0014] Step 1: Preparation: inject an appropriate amount of chemical etching solution into the etching solution storage barrel, inject clean water or cleaning solution into the cleaning barrel, snap the filter filler into the inner side of the sealing cover, turn on the hot air blower, and provide hot air to the air outlet through the hot air duct;

[0015] Step 2: Etching, the metal piece is transported to one end of the transmission belt by mechanical or manual means, the clamping piece on the outside of the transmission belt stably clamps the metal piece to be etched, the transmission belt drives the metal piece to be etched to move to the upper end of the etching liquid storage barrel, stays for 2-3 minutes according to the predetermined program, the telescopic cylinder drives the metal piece to be etched to move downward, the etched piece enters the etching liquid storage barrel for etching, the clamping piece will pass through the avoidance groove of the sealing cover during the downward movement, and the push blocks before and after the clamping piece drive the sealing cover to move downward under the action of the rebound piece, until the sealing cover covers the etching liquid storage barrel to ensure that the reaction waste gas will not overflow during the etching process;

[0016] When the resilient member moves, the movable seat slides up and down in the movable groove inside the support column, and the long rack at the lower end is linked to move up and down, and the rotating shaft is driven to rotate through the meshing connection between the driving gear and the long rack, thereby driving the first stirring blade to stir the solution in the etching liquid storage barrel to ensure uniform etching;

[0017] Step 3: Cleaning. When the etched part is finished being etched, it is moved out of the etching liquid storage barrel by the telescopic cylinder, and driven by the transmission belt into the cleaning barrel process. It stays for 2-3 minutes according to the predetermined program. The telescopic cylinder drives the etched part to move down, and the etched part enters the cleaning barrel for soaking and washing. After the cleaning is completed, the etched part is moved out of the cleaning barrel and dried by the hot air provided by the hot air duct;

[0018] Similarly, when the rotating shaft rotates, it can also drive the second stirring blade to stir the cleaning liquid in the cleaning bucket to ensure that the residual solution on the surface of the etched part is cleaned

[0019] Step 4: Unloading. When the etching machine moves to the other end of the etching workshop along with the transmission belt, the clamping parts release the clamping parts to allow the etched parts to be unloaded.

[0020] Beneficial effects of the present invention:

[0021] The present invention can drive the sealing cover to cover the etching liquid storage barrel when etching is performed. This design effectively prevents the leakage of harmful gases and volatile substances that may be generated during the etching process. Under the action of the filtering filler on the inner side of the sealing cover, it has excellent adsorption and decomposition capabilities for harmful substances in the exhaust gas. By integrating etching, cleaning and drying, and using a rotating belt in conjunction with a clamping piece, the etched parts can flow seamlessly between different processes without manual intervention, thereby improving the continuity of the etching process and making the entire etching process smoother and more efficient. By adding a synchronously rotating stirring component to the inner side of the etching liquid storage barrel and the cleaning barrel, it can ensure that the etching liquid and the cleaning liquid are evenly distributed in the barrel, avoiding the problem of uneven etching caused by uneven solution concentration. At the same time, in the cleaning stage, the rotation of the stirring component can also effectively flush the surface of the etched parts, ensuring that the residual solution is thoroughly cleaned, thereby improving the quality and consistency of the etched parts. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 Shown is a three-dimensional structural schematic diagram of the etching device and the use method of the present invention;

[0023] Figure 2 Shown is a schematic diagram of the internal three-dimensional structure of the etching device and the method of use of the present invention;

[0024] Figure 3 Shown is a schematic diagram of the structure of the stirring assembly of the etching device and the use method of the present invention;

[0025] Figure 4 Shown is a partially enlarged schematic diagram of the etching device and the method of use of the present invention;

[0026] Figure 5 Shown is a schematic diagram of the separation structure of the sealing cover and the filter filler of the etching device and the use method of the present invention;

[0027] Figure 6 Shown is a schematic diagram of the clamping structure of the etching equipment and the use method of the present invention.

[0028] Explanation of the accompanying drawings: 1. Etching workshop; 2. Etching liquid storage barrel; 3. Sealing cover; 4. Rebound part; 5. Filter filler; 6. Transmission belt; 7. Telescopic cylinder; 8. Clamping part; 9. Cleaning barrel; 10. Hot air duct; 1101. Rotating shaft; 1102. First stirring blade; 1103. Second stirring blade; 1104. Driving gear; 1105. Fixed frame; 1106. Long rack; 11. Solid activated carbon adsorbent; 12. Ultrafiltration membrane; 13. Molecular sieve; 14. Support column; 15. Moving groove; 16. Reset spring; 17. Moving seat; 18. Avoidance groove; 19. Block; 20. Elastic sleeve; 21. Push block; 22. Limit frame; 23. Anti-slip pad. DETAILED DESCRIPTION

[0029] The present invention will be further described below in conjunction with the accompanying drawings and embodiments.

[0030] See also Figure 1-6 The present invention provides an embodiment: a continuous leakage etching device, comprising an etching workshop 1, an etching liquid storage barrel 2, a sealing cover 3, a rebound part 4, a filtering filler 5, a transmission belt 6, a telescopic cylinder 7, a clamping part 8, a cleaning barrel 9, a hot air duct 10, and a stirring component; an etching liquid storage barrel 2 for containing chemical solution is fixedly connected to the left end of the inner side of the etching workshop 1; a sealing cover 3 for covering the etching liquid storage barrel 2 is installed on the upper end to block the overflow of reaction waste gas during etching; a filtering filler 5 for absorbing and filtering harmful substances in waste gas is connected to the inner side of the sealing cover 3; a rebound part 4 for driving the sealing cover 3 to move up and down is arranged on the left end; a transmission belt 6 for driving multiple etching parts to move is installed on the top of the etching workshop 1; telescopic cylinders 7 equidistantly installed on the inner side of the support frame are installed on the outer surface of the transmission belt 6; a piston rod end of the telescopic cylinder 7 is provided with a filter for stabilizing the positioning of the etching The cleaning bucket 9 is placed at the right end of the etching liquid storage bucket 2; a hot air duct 10 is arranged at the upper end of the cleaning bucket 9; stirring components are installed on the inner sides of the etching liquid storage bucket 2 and the cleaning bucket 9; the stirring component includes a rotating shaft 1101; the inner sides of the etching liquid storage bucket 2 and the cleaning bucket 9 are both connected with the rotating shaft 1101 with bearings; the rotating shaft 1101 is located in the inner area of ​​the etching liquid storage bucket 2 and is installed with a first stirring blade 1102; the rotating shaft 1101 is located in the inner area of ​​the cleaning bucket 9 and is installed with a second stirring blade 1103; a driving gear 1104 is installed at the left end of the rotating shaft 1101; a long rack 1106 is meshed and connected at the front end of the driving gear 1104; the driving gear 1104 is welded to the left end of the etching liquid storage bucket 2 through a fixing frame 1105; a limited position structure is arranged at the connection between the long rack 1106 and the fixing frame 1105; the upper end of the long rack 1106 is connected to the bottom end of the moving seat 17.

[0031] See also Figure 3 In this embodiment, the hot air duct 10 adopts an annular structure; a hot air blower is provided at the right end of the hot air duct 10; air outlets are distributed in an annular manner on the inner side of the hot air duct 10; an elastic sleeve 20 for supporting the hot air duct 10 is provided between the hot air duct 10 and the cleaning barrel 9; a push block 21 matching the position of the stop block 19 is fixedly connected to the inner side of the hot air duct 10.

[0032] See also Figure 4 In this embodiment, the rebound member 4 includes a support column 14; a long moving groove 15 is opened on the inner side of the support column 14; a return spring 16 is arranged on the outer side of the sliding rod of the moving groove 15; a moving seat 17 is slidably connected to the outer side of the sliding rod of the moving groove 15; and the return spring 16 is located at the lower end of the moving seat 17.

[0033] See also Figure 5 In this embodiment, an air hole is provided at the upper end of the sealing cover 3; the filter filler 5 includes a solid activated carbon adsorbent 11 for adsorbing most of the harmful gases in the exhaust gas; an ultrafiltration membrane 12 for intercepting fluoride ions in the harmful gas is arranged at the upper end of the solid activated carbon adsorbent 11; a molecular sieve 13 for separating nitrogen oxides in the harmful gas is installed at the upper end of the ultrafiltration membrane 12.

[0034] See also Figure 6 In this embodiment, a sealing edge matching the sealing cover 3 is provided at the upper end of the etching liquid storage barrel 2; an avoidance groove 18 for avoiding the clamping member 8 is provided on the inner side of the sealing cover 3; blocks 19 are fixedly connected to both the front and rear ends of the clamping member 8, and the clamping member 8 adopts a bidirectional clamping structure; a limiting frame 22 is welded to the clamping end of the clamping member 8; and a non-slip pad 23 with patterns is fixedly connected to the inner wall of the limiting frame 22.

[0035] The method of using the continuous leak etching equipment is as follows:

[0036] Step 1: Preparation work, inject an appropriate amount of chemical etching solution into the etching solution storage barrel 2, inject clean water or cleaning liquid into the cleaning barrel 9, and connect the filter filler 5 to the inner side of the sealing cover 3. The filter filler 5 is mainly composed of a solid activated carbon adsorbent 11 that absorbs most of the harmful gases in the exhaust gas, an ultrafiltration membrane 12 that intercepts fluoride ions in the harmful gas, and a molecular sieve 13 that separates nitrogen oxides in the harmful gas. Turn on the hot air blower to provide hot air to the air outlet through the hot air duct 10;

[0037] Step 2: Etching, the metal piece is transported to one end of the transmission belt 6 by mechanical or manual means, the clamping piece 8 on the outside of the transmission belt 6 stably clamps the metal piece to be etched, the transmission belt 6 drives the metal piece to be etched to move to the upper end of the etching liquid storage barrel 2, stays for 2-3 minutes according to a predetermined procedure, the telescopic cylinder 7 drives the metal piece to be etched to move downward, the etched piece enters the etching liquid storage barrel 2 for etching, the clamping piece 8 passes through the avoidance groove 18 of the sealing cover 3 during the downward movement, and the push blocks 21 before and after the clamping piece 8 drive the sealing cover 3 to move downward under the action of the rebound piece 4, until the sealing cover 3 covers the etching liquid storage barrel 2 to ensure that the reaction waste gas does not overflow during the etching process;

[0038] When the resilient member 4 moves, the movable seat 17 slides up and down in the movable groove 15 inside the support column 14, and the long rack 1106 at the lower end moves up and down in linkage, and the rotating shaft 1101 is driven to rotate through the meshing connection between the driving gear 1104 and the long rack 1106, thereby driving the first stirring blade 1102 to stir the solution in the etching solution storage barrel 2 to ensure uniform etching;

[0039] Step 3: Cleaning. When the etching workpiece is finished, it is moved out of the etching liquid storage barrel 2 by the telescopic cylinder 7, and driven by the transmission belt 6 to enter the cleaning barrel 9 process. It stays for 2-3 minutes according to the predetermined program. The telescopic cylinder 7 drives the etching workpiece to move down, and the etching workpiece enters the cleaning barrel 9 for soaking and washing. After the cleaning is completed, the etching workpiece is moved out of the cleaning barrel 9 and dried by the hot air provided by the hot air duct 10;

[0040] Similarly, when the rotating shaft 1101 rotates, it can also drive the second stirring blade 1103 to stir the cleaning liquid in the cleaning bucket 9 to ensure that the residual solution on the surface of the etched part is cleaned.

[0041] Step 4: unloading. When the etching machine moves to the other end of the etching workshop 1 along with the transmission belt 6, the clamping member 8 releases the clamping to allow the etched part to be unloaded.

Claims

1. A continuous leak etching apparatus, comprising an etching workshop (1); characterized in that: The etching liquid storage barrel (2), a sealing cover (3), a rebound member (4), a filter filler (5), a transmission belt (6), a telescopic cylinder (7), a clamping member (8), a cleaning barrel (9), a hot air duct (10), and a stirring assembly are also included; an etching liquid storage barrel (2) for storing a chemical solution is fixedly connected to the left end of the inner side of the etching workshop (1); a sealing cover (3) for covering the etching liquid storage barrel (2) is installed on the upper end thereof and is used to block the overflow of reaction waste gas during the etching process; a filter filler (5) for absorbing and filtering harmful substances in the waste gas is connected to the inner side of the sealing cover (3); a rebound member (4) for driving the sealing cover (3) to move up and down is arranged at the left end thereof; a transmission belt (6) for driving a plurality of etching parts to move is installed at the top of the etching workshop (1); telescopic rollers (6) for driving the etching parts to move are installed on the outer surface of the transmission belt (6) and are equidistantly distributed and installed on the inner side of the support frame; The invention relates to a cylinder (7); a clamping member (8) for stably positioning an etching piece is arranged at the piston rod end of the telescopic cylinder (7); a cleaning bucket (9) is placed at the right end of the etching liquid storage bucket (2); a hot air duct (10) is arranged at the upper end of the cleaning bucket (9); a stirring assembly is installed inside the etching liquid storage bucket (2) and the cleaning bucket (9); the stirring assembly comprises a rotating shaft (1101); the rotating shaft (1101) is connected to the inner side of the etching liquid storage bucket (2) and the cleaning bucket (9) by a bearing; a first stirring blade (1102) is installed in the area of ​​the rotating shaft (1101) located inside the etching liquid storage bucket (2); a second stirring blade (1103) is installed in the area of ​​the rotating shaft (1101) located inside the cleaning bucket (9); a driving gear (1104) is installed at the left end of the rotating shaft (1101); and a long rack (1106) is meshedly connected to the front end of the driving gear (1104).

2. The continuous leak etching device according to claim 1, characterized in that: An air hole is provided at the upper end of the sealing cover (3); the filter filler (5) includes a solid activated carbon adsorbent (11) for adsorbing most of the harmful gases in the exhaust gas; an ultrafiltration membrane (12) for intercepting fluoride ions in the harmful gases is arranged at the upper end of the solid activated carbon adsorbent (11); and a molecular sieve (13) for separating nitrogen oxides in the harmful gases is installed at the upper end of the ultrafiltration membrane (12).

3. The continuous leak etching device according to claim 1, characterized in that: The resilient member (4) comprises a support column (14); a long strip-shaped moving groove (15) is provided inside the support column (14); a return spring (16) is provided outside a sliding rod of the moving groove (15); a moving seat (17) is slidably connected to the outside of the sliding rod of the moving groove (15); and the return spring (16) is located at the lower end of the moving seat (17).

4. The continuous leak etching device according to claim 1, characterized in that: The upper end of the etching liquid storage barrel (2) is provided with a sealing edge matching the sealing cover (3); the inner side of the sealing cover (3) is provided with an escape groove (18) for evading the clamping member (8); and the front and rear ends of the clamping member (8) are fixedly connected with stoppers (19).

5. The continuous leak etching device according to claim 4, characterized in that: The hot air duct (10) adopts an annular structure; a hot air blower is provided at the right end of the hot air duct (10); air outlets are distributed in an annular pattern inside the hot air duct (10); an elastic sleeve (20) for supporting the hot air duct (10) is provided between the hot air duct (10) and the cleaning bucket (9); and a push block (21) matching the position of the stop block (19) is fixedly connected to the inside of the hot air duct (10).

6. The continuous leak etching device according to claim 3, characterized in that: The driving gear (1104) is welded to the left end of the etching liquid storage barrel (2) through a fixing frame (1105); a limiting structure is provided at the connection between the long rack (1106) and the fixing frame (1105); and the upper end of the long rack (1106) is connected to the bottom end of the moving seat (17).

7. The continuous leak etching device according to claim 1, characterized in that: The clamping member (8) adopts a bidirectional clamping structure; a limit frame (22) is welded to the clamping end of the clamping member (8); and a textured anti-slip pad (23) is fixedly connected to the inner wall of the limit frame (22).

8. Continuous leak etching equipment and method of use, characterized in that The method comprises the continuous leak etching device according to claim 1, wherein the steps are as follows: Step 1: Preparation work, inject an appropriate amount of chemical etching solution into the etching solution storage barrel (2), inject clean water or cleaning solution into the cleaning barrel (9), snap-fit ​​the filter filler (5) to the inner side of the sealing cover (3), turn on the hot air blower, and provide hot air to the air outlet through the hot air duct (10); Step 2: Etching, the metal piece is transported to one end of the transmission belt (6) by mechanical or manual means, the clamping piece (8) outside the transmission belt (6) stably clamps the metal piece to be etched, the transmission belt (6) drives the metal piece to be etched to move to the upper end of the etching liquid storage barrel (2), stays for 2-3 minutes according to a predetermined program, the telescopic cylinder (7) drives the metal piece to be etched to move downward, the etched piece enters the etching liquid storage barrel (2) for etching, the clamping piece (8) passes through the avoidance groove (18) of the sealing cover (3) during the downward movement, and the push blocks (21) before and after the clamping piece (8) drive the sealing cover (3) to move downward under the action of the rebound piece (4), until the sealing cover (3) covers the etching liquid storage barrel (2) to ensure that the reaction waste gas will not overflow during the etching process; When the resilient member (4) moves, the movable seat (17) slides up and down in the movable groove (15) inside the support column (14), and the long rack (1106) at the lower end moves up and down in linkage, and the rotating shaft (1101) is driven to rotate through the meshing connection between the driving gear (1104) and the long rack (1106), thereby driving the first stirring blade (1102) to stir the solution in the etching solution storage barrel (2) to ensure uniform etching; Step 3: cleaning. When the etching workpiece is finished, the etching workpiece is moved out of the etching liquid storage barrel (2) by the telescopic cylinder (7), and the transmission belt (6) drives the etching workpiece into the cleaning barrel (9). The etching workpiece stays for 2-3 minutes according to the predetermined program. The telescopic cylinder (7) drives the etching workpiece to move downward, and the etching workpiece enters the cleaning barrel (9) for soaking and washing. After the cleaning is completed, the etching workpiece is moved out of the cleaning barrel (9) and dried by the hot air provided by the hot air duct (10); Similarly, when the rotating shaft (1101) rotates, it can also drive the second stirring blade (1103) to stir the cleaning liquid in the cleaning bucket (9), ensuring that the residual solution on the surface of the etched part is cleaned. Step 4: unloading. When the etching machine moves to the other end of the etching workshop (1) along with the transmission belt (6), the clamping member (8) releases the clamping and allows the etched part to be unloaded.

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