Display device

Abstract

The display quality is improved. A display device (11) is provided with: a first substrate (20), one main surface (20A) of which serves as a display surface (11DS); a second substrate (21) disposed so as to face the other main surface (20B) of the first substrate (20) on the opposite side from the display surface (11DS); and a conductive film (35) provided on the second main surface (20B) of the first substrate (20), the display surface (11DS) of the first substrate (20) being divided into a display region (AA) in which an image is displayed and a non-display region (NAA) in which no image is displayed, the conductive film (35) being disposed so as to overlap at least the display region (AA) and containing a synthetic resin material having light transmittance.

Description

Technical Field

[0001] The technology disclosed in this specification relates to a display device. Background Art

[0002] Conventionally, as an example of a display input device (display device), there is a device described in the following Patent Document 1. The display input device described in Patent Document 1 includes an antistatic film, which contains In, Zn, Sn, and O having light transmittance formed on a light transmittance substrate by magnetron sputtering. The antistatic film contains 21.2 atomic % of In, 5 to 55 atomic % of Zn, and 8 to 40 atomic % of Sn. Prior art literature Patent Literature

[0003] Patent Document 1: Japanese Patent Application Publication No. 2017-17959 Summary of the invention Technical Problems to be Solved by the Invention

[0004] The display input device described in the above-mentioned patent document 1 includes a first transparent substrate provided with TFT and a second transparent substrate provided with a touch sensor, and an antistatic film is provided on the outer surface of the second transparent substrate. Since the antistatic film is made of IZTO (Indium Zinc Tin Oxide), it has a higher refractive index than the second transparent substrate made of glass material. Therefore, there is the following problem: external light is easily reflected at the interface between the antistatic film and the second transparent substrate, and the contrast performance related to the displayed image caused by the reflected light is easily reduced.

[0005] The technology described in this specification is accomplished based on the above-mentioned circumstances, and its purpose is to improve display quality. Technical solutions for solving technical problems

[0006] (1) A display device related to the technology described in this specification comprises: a first substrate having one main surface serving as a display surface; a second substrate arranged opposite to the other main surface of the first substrate on the opposite side of the display surface; and a conductive film provided on the other main surface of the first substrate, wherein the display surface of the first substrate is divided into a display area for displaying an image and a non-display area for not displaying the image, and the conductive film comprises a synthetic resin material, wherein the synthetic resin material is arranged to overlap at least the display area and has light transmittance.

[0007] (2) In addition, the display device described above may be configured such that the sheet resistance of the conductive film is 1×10 7 Ω / □~1×10 9 Ω / □ range.

[0008] (3) In addition, the above-mentioned display device can also be based on the above-mentioned (2), and is provided with: a position detection electrode on the second substrate, which forms an electrostatic capacitance between it and a position input body for performing position input; and a position detection wiring, which is connected to the position detection electrode and transmits a position detection signal.

[0009] (4) In addition, in the display device according to any one of (1) to (3), the first substrate may be made of a glass material, and the refractive index of the conductive film may be in the range of 1.5 to 1.8.

[0010] (5) In addition, the above-mentioned display device may also be, based on any one of the above-mentioned (1) to (4), comprising: a frame-shaped sealing portion, which is arranged between the outer peripheral ends of the first substrate and the second substrate; an electrode, which is arranged on the second substrate and is located on the inner side of the sealing portion and is set to a ground potential; and a connecting portion, which is arranged between the first substrate and the second substrate and is located on the inner side of the sealing portion and is connected to the conductive film and the electrode, and the conductive film is located on the inner side of the sealing portion.

[0011] (6) In addition, in the display device according to any one of (1) to (5), the conductive film may include an insulating resin material as the synthetic resin material, and the insulating resin material may contain a conductive agent.

[0012] (7) In addition, in the display device described above in (6), the conductive film may include carbon nanotubes as the conductive agent.

[0013] (8) In addition, in the display device according to the above (6), the conductive film may include a transparent electrode material containing In (indium) as the conductive agent.

[0014] (9) In addition, in the display device according to any one of (1) to (5), the conductive film may include a conductive polymer material as the synthetic resin material.

[0015] (10) A display device related to the technology described in this specification comprises: a first substrate having one main surface as a display surface; a second substrate arranged opposite to the other main surface of the first substrate on the opposite side of the display surface; and a conductive film provided on at least one of the one main surface and the other main surface of the first substrate, wherein the display surface of the first substrate is divided into a display area for displaying an image and a non-display area for not displaying the image, the first substrate is made of a glass material, the conductive film is arranged to overlap at least the display area, has light transmittance, and has a sheet resistance of 1×10 7 Ω / □~1×10 9 The range of Ω / □ and the range of refractive index are 1.5 to 1.8. Beneficial Effects

[0016] According to the technology described in this specification, it is possible to improve the display quality. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a plan view showing a liquid crystal panel, a driver, a flexible substrate, and the like constituting the liquid crystal display device according to the first embodiment. Figure 2 This is a schematic cross-sectional view showing a liquid crystal panel, a driver, a flexible substrate, etc. according to the first embodiment. Figure 3 This is a circuit diagram showing the electrical configuration of an array substrate constituting the liquid crystal panel according to the first embodiment. Figure 4 In the liquid crystal panel of the first embodiment Figure 1 Cross-sectional view along line iv-iv. Figure 5 In the liquid crystal panel of the first embodiment Figure 1 vv line cross-section diagram. Figure 6 It is a top cross-sectional view of a liquid crystal panel showing a planar structure of an array substrate according to the first embodiment. Figure 7 This is a cross-sectional view of a conductive film including carbon nanotubes and provided on the counter substrate of the first embodiment. Figure 8 This is a cross-sectional view of a conductive film including a transparent electrode material and provided on the counter substrate of the first embodiment. Fig. 9 This is a graph showing the experimental results of Comparative Experiment 1 of the first embodiment. Fig.10 This is a graph showing the experimental results of the demonstration experiment 1 of the first embodiment. Fig.11 This is a graph showing the experimental results of the demonstration experiment 2 of the first embodiment. Fig.12 This is a table showing the experimental results of Comparative Experiment 2 of the first embodiment. Fig.13 This is a graph showing the experimental results of Comparative Experiment 2 of the first embodiment. Fig.14 is a liquid crystal panel according to the second embodiment. Figure 4 A cross-sectional view of the same cross-section. Fig.15 It is a cross-sectional view of a conductive film made of a conductive polymer and provided on a counter substrate according to a third embodiment. Fig.16 It is a schematic cross-sectional view showing a liquid crystal panel, a flexible substrate, a conductive film, etc. according to a fourth embodiment. DETAILED DESCRIPTION

[0018] <First Embodiment> pass Figures 1 to 13 The first embodiment is described. In this embodiment, a liquid crystal display device 10 having a display function and a touch panel function (position input function) is exemplified. In addition, the X-axis, Y-axis, and Z-axis are shown in a part of each drawing, and the directions of each axis are described in a manner as shown in each drawing. Figure 2 , Figure 4 and Figure 5 The upper side of the figures is set as the front side, and the lower side of these figures is set as the back side.

[0019] like Figure 1 As shown, the liquid crystal display device 10 at least includes: a liquid crystal panel (display device, display panel) 11, which is in a horizontally long square shape and can display images; and a backlight device (illumination device), which is an external light source that irradiates light for display to the liquid crystal panel 11. The backlight device is arranged on the inner side (back side) relative to the liquid crystal panel 11, and has a light source (such as LED, etc.) that emits white light (white light), an optical component that converts the light from the light source into planar light by giving an optical effect, etc. The main surface of the liquid crystal panel 11 facing the front side serves as a display surface 11DS. The display surface 11DS is divided into a central side portion as a display area AA for displaying an image, and a frame-shaped peripheral side portion surrounding the display area AA as a non-display area NAA for not displaying an image.

[0020] like Figure 1As shown, a circuit unit (gate circuit unit, peripheral circuit unit) 14 is provided in the non-display area NAA of the liquid crystal panel 11. A pair of circuit units 14 are arranged in a manner of sandwiching the display area AA from both sides in the X-axis direction. The circuit unit 14 is provided in a strip-shaped range extending along the Y-axis direction. The circuit unit 14 is used to supply a scanning signal to the gate wiring 26 described later, and is provided in a monolithic manner on the array substrate 21 described later. The circuit unit 14 is a GDM (Gate Driver Monolithic) circuit. The circuit unit 14 includes a shift register circuit that outputs a scanning signal at a predetermined timing, a buffer circuit for amplifying the scanning signal, and the like.

[0021] Regarding the liquid crystal panel 11, in addition to Figure 1 In addition, refer to Figure 2 For detailed description. Figure 1 as well as Figure 2 As shown, the liquid crystal panel 11 is formed by bonding a pair of substrates 20 and 21. The front side (front side) of the pair of substrates 20 and 21 is set as the relative substrate (first substrate, CF substrate) 20, and the back side (back side) is set as the array substrate (second substrate) 21. The relative substrate 20 and the array substrate 21 are both formed by stacking various films on the inner side of the glass substrate (substrate) 20GS, 21GS composed of glass material. As the glass material used for each glass substrate 20GS, 21GS, for example, alkali-free glass is used. The first main surface (one main surface) 20A on the outer side (front side) of the pair of main surfaces 20A and 20B on the front and back of the relative substrate 20 constitutes the above-mentioned display surface 11DS. The second main surface (the other main surface) 20B on the inner side (back side) of the pair of main surfaces 20A and 20B on the front and back of the relative substrate 20 is opposite to the main surface on the inner side (front side) of the array substrate 21. A liquid crystal layer (medium layer) 22 is sandwiched between the second main surface 20B on the inner side of the relative substrate 20 and the main surface on the inner side of the array substrate 21. The liquid crystal layer 22 contains a substance, namely, liquid crystal molecules, whose optical properties change as an electric field is applied. A sealing portion 23 for sealing the liquid crystal layer 22 is provided between the outer peripheral ends of a pair of substrates 20 and 21. The sealing portion 23 is composed of a photocurable resin material, a thermosetting resin material, etc., and is formed into a square frame shape (endless ring shape) in a manner of surrounding the liquid crystal layer 22. The sealing portion 23 is partially overlapped with the outer peripheral side in the non-display area NAA. In addition, polarizing plates 15 are respectively attached to the outer surface sides of the two substrates 20 and 21.

[0022] like Figure 1 and Figure 2As shown, the short side dimension of the relative substrate 20 is shorter than the short side dimension of the array substrate 21. The relative substrate 20 is bonded to the array substrate 21 in a manner that one end in the short side direction (Y-axis direction) is aligned with the array substrate 21. Therefore, the other end in the short side direction of the array substrate 21 becomes an exposed portion 21A that protrudes laterally relative to the relative substrate 20 and is exposed. The entire area of ​​the exposed portion 21A is a non-display area NAA, on which a driver (signal supply unit) 12 and a flexible substrate 13 for supplying various signals for the display function and touch panel function described below are installed.

[0023] Figure 1 and Figure 2 The driver 12 shown is composed of an LSI chip having a driving circuit inside. The driver 12 is mounted on the exposed portion 21A of the array substrate 21 by COG (Chip On Glass). The driver 12 processes various signals transmitted by the flexible substrate 13. The driver 12 supplies various signals (such as image signals, touch signals, etc.) to the wiring of the display area AA (specifically, the source wiring 27 and the touch wiring 30 described later). The flexible substrate 13 is configured to form a plurality of wiring patterns on a base material composed of an insulating and flexible synthetic resin material (such as a polyimide resin, etc.). As shown in FIG. Figure 1 and Figure 2 As shown, one end of the flexible substrate 13 is connected to the exposed portion 21A of the array substrate 21, and the other end is connected to an external circuit substrate (control substrate, etc.). The flexible substrate 13 is connected to the end of the exposed portion 21A on the side opposite to the display area AA side in the Y-axis direction relative to the driver 12.

[0024] The liquid crystal panel 11 of this embodiment has both a display function for displaying an image and a touch panel function for detecting the position (input position) of a user input based on the displayed image. In the liquid crystal panel 11, a touch panel pattern for performing the touch panel function is integrated (embedded). The touch panel pattern is a so-called projected electrostatic capacitance method, and its detection method is a self-capacitance method. Figure 1As shown, the touch panel pattern is composed of a plurality of touch electrodes (position detection electrodes) 29 arranged in a matrix on the panel surface of the liquid crystal panel 11. The touch electrodes 29 are arranged in the display area AA of the liquid crystal panel 11. Therefore, the display area AA of the liquid crystal panel 11 is roughly consistent with the touch area (position input area) that can detect the input position, and the non-display area NAA is roughly consistent with the non-touch area (non-position input area) that cannot detect the input position. Furthermore, if a finger (position input body) as a conductor is brought close to the surface (display surface 11DS) of the liquid crystal panel 11 in order to perform position input based on the image of the display area AA of the liquid crystal panel 11 visually recognized by the user, an electrostatic capacitance is formed between the finger and the touch electrode 29. As a result, the electrostatic capacitance detected by the touch electrode 29 located near the finger changes as the finger approaches, and is different from the touch electrode 29 far away from the finger, so the input position can be detected based on this. In addition, in addition to Figure 1 In addition to the illustration, the specific number of touch electrodes 29 can be appropriately changed. The touch electrode 29 is roughly square when viewed from above, and the size of one side is about several mm. Therefore, the size of the touch electrode 29 when viewed from above is much larger than the pixel described later, and is configured to span the range of multiple pixels in the X-axis direction and the Y-axis direction respectively.

[0025] Next, use Figure 3 The structure of the display area AA in the array substrate 21 is described. Figure 3 As shown, at least TFT (transistor, switch element) 24 and pixel electrode 25 are provided on the inner side of display area AA of array substrate 21. Multiple TFT24 and multiple pixel electrodes 25 are arranged at intervals along the X-axis direction and the Y-axis direction and arranged in a matrix (row and column shape). Gate wiring (scanning wiring) 26 and source wiring (image wiring, signal wiring) 27 that are orthogonal (crossed) to each other are arranged around these TFT24 and pixel electrodes 25. Gate wiring 26 extends along the X-axis direction. Source wiring 27 extends along the Y-axis direction. TFT24 has a gate 24A connected to gate wiring 26, a source 24B connected to source wiring 27, a drain 24C connected to pixel electrode 25, and a semiconductor portion 24D connected to source 24B and drain 24C. Then, TFT24 is driven based on a scan signal supplied to gate 24A by gate wiring 26. Then, the potential of the image signal (data signal) supplied from the driver 12 to the source 24B through the source wiring 27 is supplied to the drain 24C via the semiconductor portion 24D. As a result, the pixel electrode 25 is charged to the potential of the image signal. The pixel electrode 25 is arranged in a region surrounded by the gate wiring 26 and the source wiring 27, and has a planar shape, for example, in a substantially rectangular shape.

[0026] like Figure 3As shown, a common electrode (electrode) 28 is formed on the inner surface side of the display area AA of the array substrate 21 in a form overlapping with all the pixel electrodes 25. The common electrode 28 extends over substantially the entire area of ​​the display area AA. The common electrode 28 constitutes the aforementioned touch electrode 29. The common electrode 28 has a separation slit separating adjacent touch electrodes 29. Through the separation slit, the common electrode 28 is composed of a plurality of touch electrodes 29 that are divided into a checkerboard shape and electrically independent of each other.

[0027] like Figure 3 As shown, a plurality of touch wirings (position detection wirings) 30 connected to a plurality of touch electrodes 29 are provided on the inner surface side of the display area AA of the array substrate 21. The touch wiring 30 extends along the Y-axis direction and is parallel to the source wiring 27. A plurality of touch wirings 30 are respectively connected to a plurality of touch electrodes 29. A common signal (reference potential signal) related to the display function and a touch signal (position detection signal) related to the touch function are supplied from the driver 12 to the touch wiring 30 at different timings (time sharing). The timing for supplying the common signal from the driver 12 to the touch wiring 30 is during the display period, and the timing for supplying the touch signal from the driver 12 to the touch wiring 30 is during the sensing period (position detection period). During the display period, since a common signal is supplied to all touch wirings 30, all touch electrodes 29 become a reference potential and function as a common electrode 28.

[0028] like Figure 4As shown, a pixel circuit unit 31 and an orientation film are provided on the inner surface side of the display area AA of the array substrate 21. In addition, the orientation film is omitted from the illustration. The pixel circuit unit 31 is composed of the above-mentioned TFT24, gate wiring 26 and source wiring 27, etc., and has the function of supplying a predetermined potential to a plurality of pixel electrodes 25 at a predetermined timing. The common electrode 28 is located at a lower layer side than the pixel electrode 25. Thus, in the array substrate 21 of the present embodiment, the "upper electrode" as the electrode located on the upper layer side of the pixel electrode 25 and the common electrode 28 is the pixel electrode 25, and the "lower electrode" as the electrode located on the lower layer side is the common electrode 28. An insulating film 32 is provided between the pixel electrode 25 and the common electrode 28. A plurality of slits 25A are respectively formed in the plurality of pixel electrodes 25. A common potential signal as a common potential (reference potential) is supplied to the common electrode 28 through the pixel circuit unit 31. When the pixel electrode 25 is charged to a potential based on the image signal transmitted to the source wiring 27 as the TFT 24 is driven based on the scanning signal transmitted by the gate wiring 26, a potential difference is generated between the pixel electrode 25 and the common electrode 28. Therefore, between the opening edge of the slit 25A in the pixel electrode 25 and the common electrode 28, in addition to the component along the main surface of the array substrate 21, a fringe electric field (inclined electric field) containing a component in the normal direction relative to the main surface of the array substrate 21 is also generated. Therefore, by utilizing this fringe electric field, the orientation state of the liquid crystal molecules contained in the liquid crystal layer 22 can be controlled, and a specified display can be performed based on the orientation state of the liquid crystal molecules. That is, the operation mode of the liquid crystal panel 11 of this embodiment is set to FFS (Fringe Field Switching) mode.

[0029] like Figure 4As shown, a color filter 33 of three colors of blue (B), green (G) and red (R) is provided in the display area AA on the inner surface side of the relative substrate 20. A plurality of color filters 33 showing different colors are arranged adjacent to each other in the extension direction (X-axis direction) of the gate wiring 26. A plurality of color filters 33 showing different colors extend along the extension direction (approximately Y-axis direction) of the source wiring 27. In this way, a plurality of color filters 33 showing different colors are arranged in a stripe shape as a whole. These color filters 33 are arranged to overlap with each pixel electrode 25 on the array substrate 21 side when viewed from above, and together with the pixel electrode 25, constitute a pixel as a display unit. A plurality of color filters 33 showing different colors are arranged so that their boundaries (color boundaries) overlap with the source wiring 27. A light shielding portion (light shielding portion between pixels, black matrix) 34 located on the lower layer side of the color filter 33 is provided on the inner surface side of the relative substrate 20. The light shielding portion 34 is made of a light shielding material having excellent light shielding properties. The light shielding portion 34 can block light irradiated from a backlight device or the like. In the display area AA, the planar shape of the light shielding portion 34 is roughly lattice-shaped, separating adjacent pixel electrodes 25 (pixels). In the display area AA, the light shielding portion 34 is configured to overlap with at least the gate wiring 26 and the source wiring 27 on the side of the array substrate 21 when viewed from above. In the non-display area NAA, the light shielding portion 34 is configured in a substantially full-surface shape. In addition, an orientation film for orienting the liquid crystal molecules contained in the liquid crystal layer 22 is formed on the innermost surface (uppermost layer) of the two substrates 20 and 21 respectively.

[0030] And, if Figures 4 to 6 As shown in FIG. 1 , a conductive film (antistatic film) 35 is provided on the second main surface 20B of the counter substrate 20. Figure 6In the figure, the formation range of the conductive film 35 when viewed from above is illustrated in shaded form, and the outer shape of the display area AA is illustrated in a single-dot chain line. The conductive film 35 is arranged on the lower side (glass substrate 20GS side) relative to the color filter 33 and the light shielding portion 34. That is, the conductive film 35 is directly arranged on the second main surface 20B of the relative substrate 20. In the second main surface 20B of the relative substrate 20, the conductive film 35 is arranged to overlap with the inner peripheral part (the part on the display area AA side) in the non-display area NAA in addition to the entire area of ​​the display area AA in the display surface 11DS. That is, the formation range of the conductive film 35 when viewed from above is one circle larger than the display area AA and one circle smaller than the outer shape of the non-display area NAA. The conductive film 35 is located on the inner side of the sealing portion 23, and is arranged in a non-overlapping manner with the sealing portion 23. On the second main surface 20B, it is set to be a whole surface in the area closer to the inner peripheral side than the sealing portion 23. In addition, the size of the common electrode 28 of the array substrate 21 when viewed from above is smaller than that of the conductive film 35. That is, although the common electrode 28 is configured to overlap the entire display area AA in the display surface 11DS, it does not overlap the non-display area NAA. When the conductive film 35 is provided on the second main surface 20B of the relative substrate 20, for example, the conductive film 35 formed on the second main surface 20B in the form of a whole surface can be patterned by so-called photolithography, or the second main surface 20B can be selectively masked and a slit coater can be used, or printing can be performed using a printing method such as inkjet printing or gravure printing.

[0031] In this way, by providing the conductive film 35 on the relative substrate 20, it is not easy to generate electrification in the relative substrate 20 having the display surface 11DS where the user performs position input (touch operation). Moreover, the conductive film 35 is provided on the second main surface 20B of the relative substrate 20, so compared with the case where it is provided on the first main surface 20A as in the past, the degree of freedom of the material used is increased. In detail, assuming that the conductive film is provided on the first main surface 20A as in the past, the conductive film becomes exposed on the display surface 11DS, so it is necessary to use a material with high performance in moisture resistance, chemical stability and hardness as the conductive film. In this regard, the conductive film 35 of the present embodiment is provided on the second main surface 20B on the opposite side of the first main surface 20A, so the performance required for moisture resistance, chemical stability and hardness becomes lower, and as a result, the degree of freedom of selection of the material used for the conductive film 35 becomes higher.

[0032] In this embodiment, if Figure 4 and Figure 5 As shown, by providing the conductive film 35 on the second main surface 20B of the counter substrate 20, the conductive film 35 is made to include a synthetic resin material having light transmittance, with the view that the degree of freedom of selection of the material used in the conductive film 35 is increased. Figure 7 and Figure 8As shown in FIG. 1 , the conductive film 35 uses an insulating resin material 35A as a synthetic resin material. Specifically, the conductive film 35 uses an olefin resin material (e.g., a polyethylene resin material, a polypropylene resin material, etc.), a polyester resin material, etc. as the insulating resin material 35A. When a polyethylene resin material is used as the insulating resin material 35A, its refractive index is set to about 1.54. When a polypropylene resin material is used as the insulating resin material 35A, its refractive index is set to about 1.48. When a polyester resin material is used as the insulating resin material 35A, its refractive index is about 1.6.

[0033] In this way, since the conductive film 35 contains a synthetic resin material having light transmittance, that is, an insulating resin material 35A, it is possible to easily reduce the refractive index by selecting the type of the insulating resin material 35A, compared with a transparent electrode film using only a transparent electrode material as in the past. Specifically, in the existing transparent electrode film, the refractive index is about 2 to 2.1. In contrast, the refractive index of the insulating resin material 35A of the conductive film 35 of this embodiment is about 1.48 to 1.6, which is lower than in the past. In contrast, the glass substrate 20GS constituting the opposite substrate 20 is composed of a glass material, and its refractive index is set to about 1.52. In this way, the insulating resin material 35A of the conductive film 35 has a lower refractive index than in the past, so that the difference in refractive index between the conductive film 35 and the opposite substrate 20 can be alleviated. Therefore, the generation of reflected light at the interface between the conductive film 35 and the opposite substrate 20 can be suppressed. As a result, the display quality (contrast performance, etc.) of the image displayed in the display area AA overlapping the conductive film 35 can be improved.

[0034] In this embodiment, the conductive film 35 is formed by containing a conductive agent in an insulating resin material 35A. Figure 7 and Figure 8 As shown in FIG. 1 , the conductive film 35 uses carbon nanotubes 35B and a transparent electrode material 35C as a conductive agent. The carbon nanotubes 35B used as a conductive agent in the conductive film 35 are as shown in FIG. Figure 7As shown, the six-membered ring network (graphene sheet) made of carbon is a single-layer or multi-layer coaxial tubular substance with excellent electrical conductivity and thermal conductivity. The carbon nanotubes 35B are linear (elongated) in macroscopic terms, and are dispersed and matched in multiple numbers in the insulating resin material 35A, and are arranged in a state of crossing and contacting each other. Here, when the insulating resin material 35A contains a conductive agent, there is a tendency that the more the conductive agent is contained, the higher the refractive index of the conductive film 35. In this regard, the carbon nanotubes 35B have the characteristic that the refractive index of the conductive film 35 is not easy to increase even if the content increases, compared with the transparent electrode material 35C. Therefore, by using carbon nanotubes 35B as a conductive agent, it is possible to keep the refractive index of the conductive film 35 lower and to sufficiently reduce the sheet resistance of the conductive film 35. On the other hand, as Figure 8 As shown, the transparent electrode material 35C used as the conductive agent in the conductive film 35 is in the form of particles in the macroscopic view, and a plurality of them are dispersed and mixed in the insulating resin material 35A. The transparent electrode material 35C is, for example, ITO (Indium Tin Oxide), IZO (Indium Zinc Oxide), ITO (Indium Tin Silicon Oxide), etc. Thus, the transparent electrode material 35C contains at least In (indium). The transparent electrode material 35C has higher light transmittance than the carbon nanotube 35B.

[0035] Thus, the conductive film 35 has conductivity by making the insulating resin material 35A contain a conductive agent, thereby being able to appropriately exert an antistatic function. By selecting the type and content of the conductive agent contained in the insulating resin material 35A, the conductive performance of the conductive film 35, that is, the sheet resistance, can be adjusted. Specifically, the content of the conductive agent in the insulating resin material 35A is set so that the sheet resistance of the conductive film 35 is within 1×10 7 Ω / □~1×10 9Ω / □. In the case of using carbon nanotubes 35B as a conductive agent, in order to set the sheet resistance of the conductive film 35 to the above-mentioned numerical range, the content of carbon nanotubes 35B is set to, for example, about 3wt% (weight %). In the case of using transparent electrode material 35C as a conductive agent, in order to set the sheet resistance of the conductive film 35 to the above-mentioned numerical range, the content of transparent electrode material 35C is set to, for example, about 10wt%. In this way, the content of carbon nanotubes 35B can be less than the content of transparent electrode material 35C. Generally, there is a tendency that the more the content of the conductive agent, the lower the transmittance of the conductive film 35. Therefore, by using carbon nanotubes 35B as a conductive agent, the reduction in the transmittance of the conductive film 35 caused by the addition of the conductive agent can be suppressed. On the other hand, the content of transparent electrode material 35C is more than that of carbon nanotubes 35B. However, since transparent electrode material 35C has higher light transmittance than carbon nanotubes 35B, even if the content of transparent electrode material 35C increases, the light transmittance of the conductive film 35 is difficult to decrease. Therefore, by using the transparent electrode material 35C as the conductive agent, it is possible to sufficiently suppress a decrease in the light transmittance of the conductive film 35 due to the addition of the conductive agent.

[0036] Thus, the sheet resistance of the conductive film 35 is set to 1×10 7 Ω / □ or more, so it is assumed that the sheet resistance is less than 1×10 7 Compared with the case of 1×10 Ω / □, the electric field generated by the touch electrode 29 is less likely to be shielded by the conductive film 35 when detecting the input position. As a result, the signal strength of the touch signal transmitted by the touch wiring 30 is less likely to decrease, so the touch sensitivity (position detection sensitivity) is maintained well. On the other hand, since the sheet resistance of the conductive film 35 is 1×10 9 Ω / □ or less, assuming that the sheet resistance is higher than 1×10 9 Compared with the case of Ω / □, the antistatic function of the conductive film 35 can be fully exerted.

[0037] The refractive index of the conductive film 35 formed by containing a conductive agent (carbon nanotubes 35B, transparent electrode material 35C) in the insulating resin material 35A is about 1.5 to 1.8. Specifically, for example, when an olefin resin material is used as the insulating resin material 35A and carbon nanotubes 35B are used as the conductive agent, the refractive index of the conductive film 35 is about 1.6. In addition, for example, when a polyethylene resin material is used as the insulating resin material 35A and ITO, a transparent electrode material 35C, is used as the conductive agent, the refractive index of the conductive film 35 is about 1.7. In addition, for example, when a polyester resin material is used as the insulating resin material 35A and ITO, a transparent electrode material 35C, is used as the conductive agent, the refractive index of the conductive film 35 is about 1.8. Therefore, according to the conductive film 35 of this embodiment, the difference in refractive index with the glass substrate 20GS constituting the counter substrate 20 is sufficiently alleviated compared with the conventional transparent electrode film (refractive index of about 2 to 2.1), so that the generation of reflected light at the interface between the conductive film 35 and the counter substrate 20 can be suppressed. In particular, the refractive index of the conductive film 35 is set to 1.8 or less, so that the difference in refractive index between the conductive film 35 and the glass substrate 20GS constituting the counter substrate 20 is sufficiently alleviated, which is suitable for reducing the amount of reflected light. As a result, the display quality of the image displayed in the display area AA can be improved. In addition, the refractive index of the conductive film 35 is set to 1.5 or more, so that sufficient freedom is obtained in selecting the type of insulating resin material 35 used in the conductive film 35.

[0038] In addition, if Figure 4 and Figure 5 As shown, a connection portion 36 connected to the conductive film 35 and the common electrode 28 is provided between the relative substrate 20 and the array substrate 21. The connection portion 36 is composed of a substrate 36A and a plurality of conductive particles 36B, the substrate 36A is composed of a photocurable resin material, a thermosetting resin material, etc., and the plurality of conductive particles 36B are dispersed and matched in the substrate 36A. The substrate 36A of the connection portion 36 can be the same material as the sealing portion 23, so that it is useful to enable the sealing portion 23 and the connection portion 36 to be coated and cured in the same process during manufacturing. The conductive particles 36B are formed by, for example, applying a conductive plating treatment such as gold plating on the surface of the particles made of synthetic resin. The particle size of the conductive particles 36B is set to a value close to the cell gap of the liquid crystal panel 11, for example, in the range of 4μm to 8μm. The content of the conductive particles 36B in the substrate 36A is, for example, about 0.5wt%. The formation range of the connection portion 36 in a plan view and the content of the conductive particles 36B are adjusted so that the connection resistance of the connection portion 36 is, for example, 1 KΩ or less.

[0039] like Figure 6As shown, the connection portion 36 is arranged on the inner side of the sealing portion 23, that is, the inner peripheral part in the non-display area NAA. The connection portion 36 is overlapped with the outer end of the conductive film 35 and the grounding electrode 39 described later. A plurality of connection portions 36 are arranged at intervals along the circumferential direction of the sealing portion 23. Specifically, two connection portions 36 are arranged near each of the two ends in the X-axis direction of the liquid crystal panel 11, and are arranged at intervals in the Y-axis direction. The planar shape of these four connection portions 36 is an elongated square extending along the Y-axis direction, and is arranged near the corners of the four corners of the non-display area NAA. One connection portion 36 is arranged near the end of the liquid crystal panel 11 on the opposite side of the driver 12 and the flexible substrate 13 in the Y-axis direction, and is arranged near the center in the X-axis direction. The planar shape of the connection portion 36 is an elongated square extending along the X-axis direction. In this way, a plurality of connection portions 36 extend along the circumferential direction of the sealing portion 23. The grounding electrode 39 is provided on the array substrate 21. The ground electrode 39 is located between the sealing portion 23 and the common electrode 28 in a manner overlapping with all the connection portions 36, and is arranged to extend in the circumferential direction of the sealing portion 23. The ground electrode 39 is in a "コ" shape when viewed from above, and is arranged outside at intervals with respect to the three sides of the common electrode 28 (display area AA) except for one side on the driver 12 side. Both ends of the ground electrode 39 in its own extension direction are respectively led outward from the sealing portion 23 and arranged in the exposed portion 21A. The portion of the ground electrode 39 arranged in the exposed portion 21A is connected to a terminal provided by the flexible substrate 13. The ground electrode 39 is maintained at a ground potential by the flexible substrate 13.

[0040] like Figure 4 and Figure 5As shown, in the non-display area NAA, the light shielding portion 34 is substantially in the entire surface, and an opening portion 34A is provided at a position overlapping with the connecting portion 36. As a result, the portion overlapping with the opening portion 34A in the conductive film 35 located on the lower layer side relative to the light shielding portion 34 on the relative substrate 20 becomes exposed. The portion of the conductive film 35 exposed through the opening portion 34A is in contact with the conductive particles 36B constituting the connecting portion 36. On the other hand, the grounding electrode 39 provided in the array substrate 21 is composed of a metal film and a transparent electrode film located on the lower layer side than the insulating film 32. Specifically, the grounding electrode 39 can also be composed of the same transparent electrode film as the common electrode 28, for example. Moreover, the insulating film 32 cuts off the portion overlapping with the non-display area NAA (at least the portion overlapping with the connecting portion 36). As a result, the grounding electrode 39 located on the lower layer side relative to the insulating film 32 in the array substrate 21 becomes exposed. The portion of the grounding electrode 39 that is not covered by the insulating film 32 and exposed is in contact with the conductive particles 36B constituting the connecting portion 36. In this way, the connection portion 36 is connected to the conductive film 35 and the ground electrode 39, so that the conductive film 35 and the ground electrode 39 can be at the same potential. Therefore, the conductive film 35 can always be set to a ground potential suitable for static elimination. In addition, since the conductive film 35, the connection portion 36, and the ground electrode 39 are all arranged inside the frame-shaped sealing portion 23, it is difficult for moisture existing outside the sealing portion 23 to penetrate into the conductive film 35.

[0041] Next, in order to verify the superiority of the liquid crystal panel 11 of the present embodiment, the following comparative experiment 1 was conducted. In comparative experiment 1, the light reflectance of each liquid crystal panel of the following embodiment 1, comparative example 1 and reference example when irradiated with external light was obtained. Embodiment 1 is a liquid crystal panel 11 of the structure described previously in this paragraph, and is provided with a conductive film 35 using an olefin resin material as an insulating resin material 35A and a carbon nanotube 35B as a conductive agent. The film thickness of the conductive film 35 of embodiment 1 is about 100nm, and the content of the carbon nanotube 35B is about 3wt%. Comparative example 1 is a liquid crystal panel of a structure in which a transparent electrode film is provided on the first main surface 20A of the relative substrate 20 in the same manner as in the past. The transparent electrode film of comparative example 1 uses ITSO as a transparent electrode material, and its film thickness is about 20nm. The reference example is different from the structure of embodiment 1 and comparative example 1 in that the conductive film 35 and the transparent electrode film are not provided on the relative substrate 20. In addition, an antireflection film for preventing reflection of light is provided on the outermost main surface of each of the liquid crystal panels of Example 1, Comparative Example 1, and Reference Example.

[0042] In Comparative Experiment 1, the amount of reflected light generated by irradiating external light to each liquid crystal panel of Example 1, Comparative Example 1, and Reference Example was measured, and the percentage of the ratio of the measured amount of reflected light divided by the amount of irradiated external light was calculated as the light reflectance. In Comparative Experiment 1, the light reflectance was calculated for each main body of reflected light for Example 1, Comparative Example 1, and Reference Example. The main body of reflected light includes a light shielding portion, an anti-reflection film, and a conductive film 35 or a transparent electrode film. The experimental results of Comparative Experiment 1 are shown in FIG. Fig. 9 shown. Fig. 9 A bar graph is shown with the vertical axis representing light reflectance (unit: "%), which respectively represents the light reflectance of Example 1, Comparative Example 1, and Reference Example. Fig. 9 In FIG. 1 , the light reflectance of the light shielding portion, the light reflectance of the antireflection film, and the light reflectance of the conductive film 35 or the transparent electrode film are respectively shown as different shades.

[0043] The experimental results of comparative experiment 1 are explained. Fig. 9 In any one of Example 1, Comparative Example 1 and Reference Example, the light reflectivity of the shading portion is 0.5%, and the light reflectivity of the anti-reflection film is 0.15%. In contrast, in Comparative Example 1, the light reflectivity of the transparent electrode film is 0.55%, and in Example 1, the light reflectivity of the conductive film 35 is 0.02%. In addition, since the reference example does not have either the conductive film 35 or the transparent electrode film, the light reflectivity of the conductive film 35 or the transparent electrode film is 0%. Moreover, the light reflectivity of the entire Comparative Example 1 is 1.2%, while the light reflectivity of the entire Example 1 is 0.67%. In addition, the light reflectivity of the entire Reference Example is 0.65%. Thus, the light reflectivity of Example 1 is as low as half of that of Comparative Example 1, which is close to the value of the Reference Example. In Example 1, it can be said that by adopting a structure in which the conductive film 35 is provided on the second main surface 20A of the relative substrate 20, the reflection of external light in the liquid crystal panel 11 can be appropriately suppressed.

[0044] Next, a demonstration experiment 1 was conducted to obtain insights into the relationship between the sheet resistance of the conductive film 35 and the signal strength of the touch signal. In the demonstration experiment 1, with respect to the embodiment 1 described in the above-mentioned comparative experiment 1, a conductive film 35 having a sheet resistance of 1×10 5 Ω / □、1×10 6 Ω / □、3×10 6 Ω / □、7×10 6 Ω / □、1×10 7 Ω / □、3×10 7 Ω / □、1×10 8 Ω / □、1×10 9 Ω / □、1×10 10 Ω / □、1×1011 Ω / □、1×10 12 Ω / □、1×10 13 In the experimental experiment 1, the liquid crystal panels 11 having the conductive films 35 as the sheet resistors were prepared, and the signal strength of the touch signal detected in each liquid crystal panel 11 was measured. The experimental results of the experimental experiment 1 are shown in FIG. Fig.10 shown. Fig.10 The horizontal axis is the sheet resistance of the conductive film 35 (unit is "Ω / □"), and the vertical axis is the signal strength of the touch signal (unitless), and the signal strength of each sheet resistance is plotted. The signal strength is a relative value with the maximum value of the signal strength of the detected touch signal as a reference (1.0).

[0045] The experimental results of empirical experiment 1 are explained. Fig.10 It is known that if the sheet resistance of the conductive film 35 is less than 1×10 7 Ω / □, there is a tendency for the signal strength to decrease sharply. In particular, if the sheet resistance of the conductive film 35 is less than 7×10 6 Ω / □, the rate of change of signal strength becomes higher, at 3×10 6 Ω / □ or less, the signal strength becomes less than 0.2. In this way, if the signal strength is reduced, the touch sensitivity is poor, so it is difficult to properly detect the input position. In this way, the signal strength is reduced because the conductivity of the conductive film 35 is high, so the electric field generated from the touch electrode 29 during touch detection is shielded by the conductive film 35. On the other hand, if the sheet resistance of the conductive film 35 is 1×10 7 Ω / □ or more, the signal strength becomes 0.9 or more, and it can be said that sufficient touch sensitivity can be obtained. Furthermore, if the sheet resistance of the conductive film 35 is 3×10 7 Ω / □ or more, the signal strength is roughly stable at 1.0, and a higher touch sensitivity can be obtained. 7 Ω / □ or more, the conductivity of the conductive film 35 will not become too high, so it is estimated that the electric field generated by the touch electrode 29 during touch detection is difficult to be shielded by the conductive film 35, and as a result, the signal strength of the touch signal is as high as 0.9 or more. Thus, a sufficiently high touch sensitivity can be obtained, so that the input position can be appropriately detected.

[0046] Next, a demonstration experiment 2 was conducted to obtain an understanding of the relationship between the sheet resistance of the conductive film 35 and the disappearance time of the unevenness caused by charging. In the demonstration experiment 2, with respect to the embodiment 1 described in the above-mentioned comparative experiment 1, a conductive film 35 having a sheet resistance of 1×10 5 Ω / □、1×106 Ω / □、1×10 7 Ω / □、1×10 8 Ω / □、1×10 9 Ω / □、1×10 10 Ω / □、1×10 11 Ω / □、1×10 12 Ω / □、1×10 13 Ω / □ conductive film 35. In the empirical experiment 2, liquid crystal panels 11 having conductive films 35 as the above-mentioned sheet resistors were prepared respectively, and in the state where the entire screen of each liquid crystal panel 11 was displayed in black, an electrostatic tester (discharge gun) was used to discharge (charge) at a specified position on the display surface 11DS. In the empirical experiment 2, as an electrostatic tester, "ESS-S3011" manufactured by Noise Research Institute Co., Ltd. (Japanese: Noise Research Institute Co., Ltd.) was used, and the output voltage was set to ±20KV during discharge. In the empirical experiment 2, the time from the discharge to the disappearance of the white "uneven charging" generated at the discharge site in the display area AA was measured as the "disappearance time". The experimental results of the empirical experiment 2 are as follows. Fig.11 express. Fig.11 The graph has the sheet resistance of the conductive film 35 (unit: Ω / □) on the horizontal axis and the disappearance time (unit: s (seconds)) required to eliminate uneven charging on the vertical axis. The disappearance time in each sheet resistance is plotted.

[0047] The experimental results of empirical experiment 2 are explained. Fig.11 It is known that if the sheet resistance of the conductive film 35 exceeds 1×10 9 Ω / □, the disappearance time tends to be gradually prolonged. In particular, if the sheet resistance of the conductive film 35 exceeds 1×10 11 Ω / □, the rate of change of the disappearance time increases sharply. 11 When the Ω / □ is above, the disappearance time is more than 20s. 12 When the disappearance time is greater than 10 Ω / □, the disappearance time is greater than 40 s. If the disappearance time is greater than 20 s, the residual time of the charge unevenness is too long, so the display quality is reduced. The reason why the disappearance time is so long is that the sheet resistance of the conductive film 35 is too high, so the antistatic function of the conductive film 35 is impaired. On the other hand, if the sheet resistance of the conductive film 35 is 1×10 11 Ω / □ or less, the disappearance time is shorter than 20s, and the deterioration of display quality caused by residual charging unevenness is suppressed. 11 Ω / □ or less, the rate of change of the disappearance time decreases, and the disappearance time gradually becomes shorter. If it becomes 1×10 10Ω / □ or less, the disappearance time becomes close to 1 s. Also, if the sheet resistance of the conductive film 35 is 1×10 9 Ω / □ or less, the disappearance time is less than 1 second and is stable, so it can be said that the conductive film 35 fully exerts the antistatic function. That is, if the sheet resistance of the conductive film 35 becomes 1×10 9 If the value is less than Ω / □, even if uneven charging occurs, it can be instantly eliminated by the conductive film 35, so that excellent display quality can be obtained.

[0048] Next, in addition to the embodiment 1, comparative example 1 and reference example described in the comparative experiment 1, the embodiments 2, 3 and comparative example 2 in which the configurations of the conductive film 35 and the transparent electrode film provided in the embodiment 1 and comparative example 1 are changed are prepared, and the refractive index of each conductive film 35, the transparent electrode film, etc. is obtained, and the light reflectivity when the external light is irradiated to each liquid crystal panel is obtained. The embodiment 2 is the same as the embodiment 1 except that the conductive film 35 is provided with a polyethylene resin material as the insulating resin material 35A and the transparent electrode material 35C, i.e., ITO, is used as the conductive agent. The film thickness of the conductive film 35 provided in the embodiment 2 is about 600nm, and the content of the transparent electrode material 35C, i.e., ITO, is about 10wt%. The embodiment 3 is the same as the embodiment 1 except that the conductive film 35 is provided with a polyester resin material as the insulating resin material 35A and the transparent electrode material 35C, i.e., ITO, is used as the conductive agent. The film thickness of the conductive film 35 provided in the embodiment 3 is about 600nm, and the content of the transparent electrode material 35C, i.e., ITO, is about 10wt%. Comparative Example 2 is a liquid crystal panel having a structure in which a transparent electrode film is provided on the first main surface 20A of the counter substrate 20, similarly to Comparative Example 1. The transparent electrode film provided in Comparative Example 2 uses ITO as a transparent electrode material, and its film thickness is about 20 nm. In addition, an anti-reflection film for preventing light reflection is provided on the outermost main surface of each liquid crystal panel of Examples 1 to 3, Comparative Examples 1 and 2, and the reference example.

[0049] In Comparative Experiment 2, the refractive indexes of the conductive film 35 and the transparent electrode film of Examples 1 to 3 and Comparative Examples 1 and 2 were measured, and the refractive index of the glass substrate 20GS of the relative substrate 20 of the reference example was measured. In Comparative Experiment 2, as in Comparative Experiment 1, the amount of reflected light generated by irradiating the liquid crystal panels of Examples 1 to 3, Comparative Examples 1 and 2, and the reference example with external light was measured, and the percentage of the ratio of the measured amount of reflected light divided by the amount of irradiated external light was calculated as the light reflectivity. Furthermore, in Comparative Experiment 2, the light reflectivity of the reference example (0.65%) was subtracted from the light reflectivity of each of Examples 1 to 3, Comparative Examples 1 and 2, and the reference example, to calculate the difference in light reflectivity. The difference in light reflectivity is the increase in light reflectivity caused by the provision of the conductive film 35 and the transparent electrode film. The experimental results of Comparative Experiment 2 are as follows. Fig.12 and Fig.13 shown. Fig.12 This is a table showing the refractive index, light reflectance and difference value in Examples 1 to 3, Comparative Examples 1 and 2, and Reference Example, respectively. Fig.13 In FIG. 1 , the reference example is the refractive index of the glass substrate 20GS, and therefore its numerical value (1.52) is enclosed in parentheses. Fig.13 The horizontal axis is a graph showing the refractive index and the vertical axis is a difference value of light reflectivity (unit: "%), and Examples 1 to 3, Comparative Examples 1 and 2, and Reference Example are plotted respectively.

[0050] The experimental results of comparative experiment 2 are used to illustrate this. Fig.12 The refractive index of the conductive film 35 of Example 1 is "1.6", the refractive index of the conductive film 35 of Example 2 is "1.7", the refractive index of the conductive film 35 of Example 3 is "1.8", the refractive index of the transparent electrode film of Comparative Example 1 is "1.98", and the refractive index of the transparent electrode film of Comparative Example 2 is "2.08". The difference in refractive index between Example 1 and the reference example (glass substrate 20GS) is "0.08", the difference in refractive index between Example 2 and the reference example is "0.18", the difference in refractive index between Example 3 and the reference example is "0.28", the difference in refractive index between Comparative Example 1 and the reference example is "0.46", and the difference in refractive index between Comparative Example 2 and the reference example is "0.56". In this way, the difference in refractive index with the reference example is the smallest in Example 1 and the largest in Comparative Example 2. On the other hand, the light reflectivity of the conductive film 35 of Example 1 is "0.67%", the light reflectivity of the conductive film 35 of Example 2 is "0.73%, the light reflectivity of the conductive film 35 of Example 3 is "0.89%, the light reflectivity of the transparent electrode film of Comparative Example 1 is "1.2%, and the light reflectivity of the transparent electrode film of Comparative Example 2 is "1.57%. The difference in light reflectivity of Example 1 with respect to the reference example is "0.02%, the difference in light reflectivity of Example 2 with respect to the reference example is "0.08%, the difference in light reflectivity of Example 3 with respect to the reference example is "0.24%, the difference in light reflectivity of Comparative Example 1 with respect to the reference example is "0.55%, and the difference in light reflectivity of Comparative Example 2 with respect to the reference example is "0.92%. Thus, the difference in light reflectivity with respect to the reference example is the smallest in Example 1 and the largest in Comparative Example 2.

[0051] according to Fig.13It can be seen that there is a tendency that the higher the refractive index is than "1.52" of the reference example, the higher the difference value of the light reflectivity is, and the greater the difference in refractive index from the reference example, the higher the rate of change of the difference value of the light reflectivity is. In particular, when the refractive index exceeds 1.8, there is a tendency that the rate of change of the difference value of the light reflectivity becomes rapidly higher, and the difference value of the light reflectivity of Comparative Example 1 is more than twice that of Example 3, and the difference value of the light reflectivity of Comparative Example 2 is less than 4 times that of Example 3. In other words, it can be said that the difference value of the light reflectivity in Example 3 is less than half of that in Comparative Example 1, and the reflection of external light can be appropriately suppressed. The difference value of the light reflectivity of Examples 1 and 2 is further lower than that of Example 3, and becomes a value less than 0.1%. Therefore, by setting the refractive index of the conductive film 35 to the range of 1.5 to 1.8 (the difference in the refractive index with the glass substrate 20GS is in the range of -0.02 to 0.28), the difference value of the light reflectivity can be suppressed to less than half of that in Comparative Example 1, which can be said to be preferable in terms of reflecting external light. Furthermore, by setting the refractive index of the conductive film 35 to the range of 1.5 to 1.7 (the difference from the refractive index of the glass substrate 20GS is in the range of -0.02 to 0.18), the difference in light reflectivity can be suppressed to less than 0.1%, which is more preferable in terms of reflecting external light.

[0052] Based on the experimental results of the comparative experiments 1 and 2 and the empirical experiments 1 and 2 described so far, it can be said that the sheet resistance of the conductive film 35 is preferably in the range of 1×10 7 Ω / □~1×10 9 Ω / □, and the refractive index is preferably in the range of 1.5 to 1.8 (more preferably in the range of 1.5 to 1.7). 7 Ω / □ or more, the electric field from the touch electrode 29 can be less likely to be shielded by the conductive film 35, and the touch panel function is less likely to be damaged. By making the sheet resistance of the conductive film 35 1×10 9 When the refractive index of the conductive film 35 is less than 1.8, the antistatic function of the conductive film 35 can be properly exerted, and it is difficult to cause poor display caused by long-term residual uneven charging. By setting the refractive index of the conductive film 35 to be less than 1.8, the difference in refractive index between the conductive film 35 and the glass substrate 20GS of the counter substrate 20 can be sufficiently alleviated, which is preferable in achieving a reduction in the amount of reflected light. By setting the refractive index of the conductive film 35 to be greater than 1.5, sufficient freedom can be obtained in selecting the type of insulating resin material 35 used in the conductive film 35.

[0053] As described above, the liquid crystal panel (display device) 11 of the present embodiment includes: a relative substrate (first substrate) 20, whose first principal surface (one principal surface) 20A is a display surface 11DS; an array substrate (second substrate) 21, which is arranged opposite to the second principal surface (another principal surface) 20B on the opposite side of the display surface 11DS in the relative substrate 20; and a conductive film 35, which is arranged on the second principal surface 20B of the relative substrate 20, and the display surface 11DS of the relative substrate 20 is divided into a display area AA for displaying an image and a non-display area NAA for not displaying an image, and the conductive film 35 is at least overlapped with respect to the display area AA and contains a light-transmitting synthetic resin material.

[0054] By providing a conductive film 35 on the relative substrate 20, it is possible to make it difficult for the relative substrate 20, whose first main surface 20A becomes the display surface 11DS, to be charged. The conductive film 35 is provided on the second main surface 20B of the relative substrate 20, so compared with the case where it is assumed to be provided on the first main surface 20A, the degree of freedom of the material used becomes higher. In addition, since the conductive film 35 includes a synthetic resin material having light transmittance, it is easy to reduce the refractive index compared with the case where only a transparent electrode material such as IZTO (Indium Zinc Tin Oxide) is used. Therefore, the difference in the refractive index between the conductive film 35 and the relative substrate 20 can be alleviated, and the generation of reflected light on the interface between the conductive film 35 and the relative substrate 20 can be suppressed. As a result, it is possible to improve the display quality of the image displayed in the display area AA overlapping with the conductive film 35.

[0055] In addition, the sheet resistance of the conductive film 35 is 1×10 7 Ω / □~1×10 9 Ω / □. Since the sheet resistance of the conductive film 35 is within 1×10 7 Ω / □ or more, it is possible to suppress the shielding of the electric field by the conductive film 35. As a result, it is difficult for the liquid crystal panel 11 to have a functional degradation caused by electric field shielding. Since the sheet resistance of the conductive film 35 is 1×10 9 Ω / □ or less, so the antistatic function of the conductive film 35 can be fully exerted.

[0056] In addition, the array substrate 21 is provided with: a touch electrode (position detection electrode) 29 that forms an electrostatic capacitance with a position input body for position input; and a touch wiring (position detection wiring) 30 that is connected to the touch electrode 29 and transmits a position detection signal. 7 Ω / □ or more, so when detecting the input position, the electric field generated by the touch electrode 29 is not easily shielded by the conductive film 35. As a result, the signal strength of the position detection signal transmitted by the touch wiring 30 is not easily reduced, so the position detection sensitivity is well maintained.

[0057] In addition, the relative substrate 20 is made of a glass material, and the refractive index of the conductive film 35 is in the range of 1.5 to 1.8. The refractive index of the relative substrate 20 made of a glass material is approximately about 1.5. In this regard, since the refractive index of the conductive film 35 is below 1.8, the difference in refractive index between the conductive film 35 and the relative substrate 20 can be sufficiently alleviated, which is preferable in achieving a reduction in the amount of reflected light. In addition, since the refractive index of the conductive film 35 is above 1.5, sufficient freedom is obtained in selecting the type of synthetic resin material used in the conductive film 35.

[0058] In addition, it is provided with: a frame-shaped sealing portion 23, which is arranged between the outer peripheral ends of the relative substrate 20 and the array substrate 21; a grounding electrode (electrode) 39, which is arranged inside the sealing portion 23 in the array substrate 21 and becomes a grounding potential; and a connecting portion 36, which is arranged between the relative substrate 20 and the array substrate 21, and is located inside the sealing portion 23, and is connected to the conductive film 35 and the grounding electrode 39, and the conductive film 35 is arranged inside the sealing portion 23. The conductive film 35 is connected to the grounding electrode 39 through the connecting portion 36, so as to maintain the grounding potential. Since the conductive film 35, the connecting portion 36 and the grounding electrode 39 are all arranged inside the frame-shaped sealing portion 23, it is difficult for moisture existing outside the sealing portion 23 to penetrate into the conductive film 35.

[0059] In addition, the conductive film 35 has an insulating resin material 35A as a synthetic resin material, and a conductive agent is contained in the insulating resin material 35A. By selecting the type of the insulating resin material 35A, the refractive index of the conductive film 35 can be adjusted, which is preferable in terms of alleviating the difference in refractive index between the conductive film 35 and the counter substrate 20. By selecting the type and content of the conductive agent, the sheet resistance of the conductive film 35 can be adjusted, which is preferable in terms of preventing the function from being degraded due to electric field shielding caused by the conductive film 35 or exerting an antistatic function.

[0060] In addition, the conductive film 35 includes carbon nanotubes 35B as a conductive agent. Since the carbon nanotubes 35B are contained in the insulating resin material 35A as a conductive agent, the refractive index of the conductive film 35 is unlikely to increase due to the inclusion of the carbon nanotubes 35B. As a result, the refractive index of the conductive film 35 can be kept low, and the sheet resistance of the conductive film 35 can be sufficiently reduced.

[0061] Furthermore, the conductive film 35 includes a transparent electrode material 35C containing In (indium) as a conductive agent. Since the transparent electrode material 35C containing In as a conductive agent is included in the insulating resin material 35A, the conductive film 35 can maintain high light transmittance.

[0062] <Second Embodiment> pass Fig.14 A second embodiment will be described. In this second embodiment, a case where the arrangement of the conductive film 135 is changed will be described. In addition, regarding the same structure, operation, and effect as those of the first embodiment, repeated description will be omitted.

[0063] like Fig.14 As shown in FIG. 1 , the conductive film 135 of the present embodiment is disposed on the second main surface 120B of the counter substrate 120, on the upper layer side of the color filter 133. The conductive film 135 is also located on the upper layer side relative to the light shielding portion 134. In the present embodiment, the light shielding portion 134 is not interposed between the conductive film 135 and the connecting portion 136. Therefore, the opening 34A (see FIG. 1 ) as described in the first embodiment is not formed at the position overlapping the connecting portion 136 in the light shielding portion 134. Figure 4 ). Therefore, the light shielding performance of the light shielding portion 134 is fully utilized in the non-display area NAA, which is more suitable for improving the display quality.

[0064] <Third Embodiment> use Fig.15 The third embodiment is described. In the third embodiment, the configuration of the conductive film 235 is changed from the first embodiment. The repeated description of the same structure, function, and effect as the first embodiment is omitted.

[0065] like Fig.15 As shown in FIG. 1 , the conductive film 235 of this embodiment has a conductive polymer material 235D as a synthetic resin material. Even if the conductive polymer material 235D does not contain a conductive agent, it has the property of exhibiting conductivity. As the conductive polymer material 235D, for example, a polyacetylene resin material, a polythiophene resin material, etc. can be used. According to this embodiment, the conductive film 35 contains a conductive agent in the insulating resin material 35A as in the first embodiment (see FIG. 1 ). Figure 7 and Figure 8 ) compared to the conductive film 235, there is no need to include a conductive agent in the conductive film 235. Therefore, the refractive index of the conductive film 235 can be kept low, and the light transmittance of the conductive film 235 can be kept high.

[0066] As described above, according to this embodiment, the conductive film 235 includes the conductive polymer material 235D as the synthetic resin material. Figure 7 and Figure 8 ) compared to the conductive film 235, the conductive film 235 does not need to contain a conductive agent, and therefore the refractive index of the conductive film 235 can be kept low and the light transmittance of the conductive film 235 can be kept high.

[0067] <Fourth Embodiment> pass Fig.16 A fourth embodiment will be described. In the fourth embodiment, the arrangement of the conductive film 335 is changed from the first embodiment. The same structure, operation, and effect as those of the first embodiment will be omitted from repeated description.

[0068] like Fig.16 As shown, the conductive film 335 of this embodiment is provided on the first main surface 320 (display surface 311DS) of the counter substrate 320. The conductive film 335 is arranged between the first main surface 320 of the counter substrate 320 and the polarizing plate 315 on the front side. The conductive film 335 is arranged to overlap the inner peripheral part of the non-display area NAA in addition to the entire area of ​​the display area AA in the display surface 311DS. A connection electrode 37 maintained at a ground potential is provided on the exposed portion 321A of the array substrate 321. The connection electrode 37 is composed of a metal film constituting the gate wiring 26 and the source wiring 27. The connection electrode 37 is connected to the ground potential of the driver 12 or the flexible substrate 313. The connection electrode 37 is arranged at a position closer to the counter substrate 320 than the flexible substrate 313 in the Y-axis direction in the exposed portion 321A. A conductive paste portion (connecting component) 38 is provided in the exposed portion 321A of the relative substrate 320 and the array substrate 321 in a form spanning the two 320 and 321A. The conductive paste portion 38 has a portion (first connecting portion) arranged on the first main surface 320 of the relative substrate 320 and connected to the conductive film 335, and a portion (second connecting portion) arranged on the exposed portion 321A of the array substrate 321 and connected to the connecting electrode 37. The conductive paste portion 38 is composed of a conductive paste containing a metal material such as a silver paste, and the degree of freedom of shape during formation becomes high. Therefore, the conductive paste portion 38 can easily exceed the step difference in thickness of the relative substrate 320 between the conductive film 335 and the connecting electrode 37, and the connection reliability is excellent.

[0069] The conductive film 335 is similar to the first embodiment, and is composed of an insulating resin material 35A containing a conductive agent (see Figure 7 and Figure 8 ). The conductive film 335 uses an olefin resin material, a polyester resin material, or the like as the insulating resin material 35A. The refractive index of the olefin resin material and the polyester resin material is as described in the first embodiment. In the conductive film 335, carbon nanotubes 35B and a transparent electrode material 35C are used as a conductive agent. The carbon nanotubes 35B and the transparent electrode material 35C are as described in the first embodiment.

[0070] The conductive film 335 is the same as that in the first embodiment, and the sheet resistance is 1×10 7 Ω / □~1×10 9Ω / □, and the refractive index is in the range of 1.5 to 1.8 (more preferably in the range of 1.5 to 1.7). 7 Ω / □ or more, the electric field from the touch electrode 29 is less likely to be shielded by the conductive film 335, and the touch panel function is less likely to be damaged. By making the sheet resistance of the conductive film 335 1×10 9 Ω / □ or less, the antistatic function of the conductive film 335 can be properly exerted, and it is difficult to cause display defects caused by long-term residual uneven charging. By setting the refractive index of the conductive film 335 to be 1.8 or less, the difference in refractive index between the conductive film 335 and the glass substrate 320GS of the counter substrate 320 can be sufficiently alleviated, which is suitable for reducing the amount of reflected light. By setting the refractive index of the conductive film 335 to be 1.5 or more, sufficient freedom can be obtained in selecting the type of insulating resin material 35 used in the conductive film 335.

[0071] As described above, the liquid crystal panel 311 of the present embodiment comprises: a relative substrate 320, whose first main surface 320A serves as a display surface 311DS; an array substrate 321, which is arranged opposite to a second main surface 320B on the opposite side of the relative substrate 320 to the display surface 311DS; and a conductive film 335, which is arranged on at least one of the first main surface 320A and the second main surface 320B in the relative substrate 320, the display surface 311DS in the relative substrate 320 is divided into a display area AA for displaying an image and a non-display area NAA for not displaying an image, the relative substrate 320 is made of a glass material, the conductive film 335 is arranged to overlap at least the display area AA, has light transmittance, and has a sheet resistance of 1×10 7 Ω / □~1×10 9 The range of Ω / □ and the range of refractive index are 1.5 to 1.8.

[0072] By providing a conductive film 335 on the relative substrate 320, it is possible to make it difficult for the relative substrate 320 whose first main surface 320A becomes the display surface 311DS to be charged. Here, the refractive index of the relative substrate 320 formed of a glass material is approximately 1.5. In this regard, since the refractive index of the conductive film 335 is set to be less than 1.8, the difference in refractive index between the conductive film 335 and the relative substrate 320 can be sufficiently alleviated. Thus, since the generation of reflected light on the interface between the conductive film 335 and the relative substrate 320 can be suppressed, the display quality of the image displayed in the display area AA overlapping with the conductive film 335 can be improved. In addition, since the refractive index of the conductive film 335 is greater than 1.5, sufficient freedom can be obtained in selecting the material used in the conductive film 335. In addition, since the sheet resistance of the conductive film 335 is 1×10 7Ω / □ or more, the electric field shielding of the conductive film 335 can be suppressed. As a result, the function degradation caused by electric field shielding is unlikely to occur in the liquid crystal panel 311. Since the sheet resistance of the conductive film 335 is 1×10 9 Ω / □ or less, so the antistatic function of the conductive film 335 can be fully exerted.

[0073] <Other Implementation Methods> The technology disclosed in this specification is not limited to the embodiments illustrated in the above description and drawings, and for example, the following embodiments are also included in the technical scope.

[0074] (1) The sheet resistance of the conductive films 35, 135, 235, and 335 may also be lower than 1×10 7 Ω / □. In addition, the sheet resistance of the conductive films 35, 135, 235, and 335 may be higher than 1×10 9 Ω / □.

[0075] (2) The refractive index of the conductive film 35, 135, 235, 335 may be lower than 1.5. The refractive index of the conductive film 35, 135, 235, 335 may be higher than 1.8.

[0076] (3) A glass material having a refractive index other than 1.52 may be used as the glass material of the glass substrates 20GS and 320GS of the counter substrates 20, 120, and 320. In this case, the preferred numerical range of the refractive index of the conductive films 35, 135, 235, and 335 may be changed to other than "1.5 to 1.8".

[0077] (4) In the configurations described in the first to third embodiments, the conductive films 35 , 135 , and 235 may be arranged so as to be located on the upper side of the light shielding portion 34 and on the lower side of the color filter 33 .

[0078] (5) In the configurations described in the first to third embodiments, the number of connections 36 and 136 in the liquid crystal panel 11 , their planar arrangement, and their planar formation range (planar shape) may be changed as appropriate other than those shown in the drawings.

[0079] (6) In the configurations described in the first to third embodiments, the material used for the base material 36A of the connection portion 36 , 136 may be different from the material of the sealing portion 23 .

[0080] (7) In the configurations described in the first embodiment, the second embodiment, and the fourth embodiment, the specific type of the insulating resin material 35A constituting the conductive films 35 , 135 , and 335 can be appropriately changed in addition to the above.

[0081] (8) In the configurations described in the first, second and fourth embodiments, the conductive agent contained in the conductive films 35, 135 and 335 may be appropriately changed in addition to the above, and may be, for example, ZnO crystals, granular carbon, metal particles, etc.

[0082] (9) In the configuration described in the third embodiment, the specific type of the conductive polymer material 235D constituting the conductive film 235 can be changed as appropriate in addition to the above.

[0083] (10) In the configuration described in the fourth embodiment, the conductive film 335 may be arranged over the entire display surface 311DS, and may be arranged to overlap the entire display area AA and the entire non-display area NAA.

[0084] (11) The structure described in the third embodiment (conductive film 235 composed of conductive polymer 235D) can also be applied to the structure described in the fourth embodiment.

[0085] (12) An overcoat film for planarization may also be provided on the counter substrate 20, 120, 320. The overcoat film may be arranged, for example, on the upper layer side of the color filter 33. In the configurations described in the first to third embodiments, the conductive film 35, 135, 235 may be arranged between the overcoat film and the color filter 33, or may be arranged to be on the upper layer side of the overcoat film.

[0086] (13) Alternatively, the liquid crystal panel 11 or 311 may be configured such that the array substrate 21 or 321 is located on the front side and the counter substrate 20, 120 or 320 is located on the back side (backlight device side). In this case, the array substrate 21 or 321 has a display surface, and therefore, the conductive film 35, 135, 235 or 335 may be provided on the array substrate 21 or 321.

[0087] (14) The color filter 33 may be provided on the array substrate 21 or 321. That is, the liquid crystal panel 11 or 311 may have a COA (Color Filter On Array) structure.

[0088] (15) The number of colors of the color filter 33 may be four or more. The additional color filter 33 may be a yellow color filter that emits yellow light, a transparent color filter that transmits light in all wavelength regions, or the like.

[0089] (16) The upper electrode of the pixel electrode 25 and the common electrode 28, that is, the "upper electrode", may be the common electrode 28, and the lower electrode, that is, the "lower electrode", may be the pixel electrode 25. In this case, the common electrode 28 as the "upper electrode" has a slit.

[0090] (17) The touch panel pattern may be a mutual capacitance method in addition to a self-capacitance method.

[0091] (18) The liquid crystal panel 11 or 311 may not have a touch panel pattern (touch panel function). In this case, the common electrode 28 has a non-divided structure, the touch electrode 29 is not formed, and the touch wiring 30 is not formed.

[0092] (19) The display mode of the liquid crystal panel 11, 311 may be a VA mode, an IPS mode, or the like in addition to the FFS mode.

[0093] (20) The liquid crystal panel 11 or 311 may be a reflective type or a semi-transmissive type in addition to a transmissive type. When the liquid crystal panel 11 or 311 is a reflective type, the backlight device can be omitted.

[0094] (21) A display panel other than the liquid crystal panel 11 or 311 (such as an organic EL display panel) may also be used. Description of Reference Numerals

[0095] 11, 311…liquid crystal panel (display device); 11DS, 311DS…display surface; 20, 120, 320…counter substrate (first substrate); 20A, 320A…first principal surface (one principal surface); 20B…second principal surface (another principal surface); 21, 321…array substrate (second substrate); 23…sealing portion; 29…touch electrode (position detection electrode); 30…touch wiring (position detection wiring); 35, 135, 235, 335…conductive film; 35A…insulating resin material; 35B…carbon nanotube; 35C…transparent electrode material; 36, 136…connecting portion; 39…ground electrode (electrode); 235D…conductive polymer; AA…display area; NAA…non-display area.

Claims

1. A display device, characterized in that: It has: A first substrate, one main surface of which serves as a display surface; A second substrate disposed opposite to the other main surface of the first substrate on the opposite side to the display surface; and a conductive film provided on the other main surface of the first substrate, In the first substrate, the display surface is divided into a display area for displaying an image and a non-display area for not displaying the image. The conductive film includes a synthetic resin material, and the synthetic resin material is arranged to overlap at least the display area and has light translucency.

2. The display device according to claim 1, characterized in that The sheet resistance of the conductive film is 1×10 7 Ω / □~1×10 9 Ω / □ range.

3. The display device according to claim 2, characterized in that: The second substrate is provided with: a position detection electrode that forms an electrostatic capacitance with a position input body that performs position input; and The position detection wiring is connected to the position detection electrode and transmits a position detection signal.

4. The display device according to any one of claims 1 to 3, characterized in that: The first substrate is made of glass material. The refractive index of the conductive film is in the range of 1.5 to 1.

8.

5. The display device according to any one of claims 1 to 3, characterized in that: have: a frame-shaped sealing portion provided between the outer peripheral ends of the first substrate and the second substrate; an electrode disposed on the second substrate and located inside the sealing portion and set to a ground potential; as well as a connecting portion, which is disposed between the first substrate and the second substrate, is located inside the sealing portion, and is connected to the conductive film and the electrode, The conductive film is provided inside the sealing portion.

6. The display device according to any one of claims 1 to 3, characterized in that: The conductive film includes an insulating resin material as the synthetic resin material, and a conductive agent is contained in the insulating resin material.

7. The display device according to claim 6, characterized in that: The conductive film has carbon nanotubes as the conductive agent.

8. The display device according to claim 6, characterized in that: The conductive film has a transparent electrode material containing indium as the conductive agent.

9. The display device according to any one of claims 1 to 3, characterized in that: The conductive film includes a conductive polymer material as the synthetic resin material.

10. A display device, characterized in that: It has: A first substrate, one main surface of which serves as a display surface; A second substrate disposed opposite to the other main surface of the first substrate on the opposite side to the display surface; and a conductive film provided on at least one of the one main surface and the other main surface of the first substrate, In the first substrate, the display surface is divided into a display area for displaying an image and a non-display area for not displaying the image. The first substrate is made of glass material. The conductive film is configured to overlap at least the display area and has light transmittance, and the sheet resistance is 1×10 7 Ω / □~1×10 9 The range of Ω / □ and the range of refractive index are 1.5 to 1.8.

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