Support device and substrate annealing equipment

Abstract

This application discloses a support device and a substrate annealing apparatus. A support device for supporting a carrier disk on a base includes a first support member and a second support member movably connected; the first support member is fixedly connected to one of the base and the carrier disk, and the second support member is fixedly connected to the other of the base and the carrier disk. The first and second support members are configured to be relatively movable in the radial direction of the carrier disk, so that the carrier disk has radial deformation space. This design not only effectively supports the carrier disk on the base but also allows the carrier disk to have a certain radial deformation space. When the carrier disk expands due to heat, it can expand freely within the radial deformation space, thus reducing thermal stress caused by constrained expansion, thereby reducing the risk of damage to the carrier disk and extending its service life.

Description

Technical Field

[0001] This application relates to the field of semiconductor manufacturing equipment, and in particular to a support device and substrate annealing equipment. Background Technology

[0002] In existing VLSI manufacturing, electrochemical copper plating is typically used to realize the metal interconnects inside the chip. However, after electrochemical copper plating, an annealing process is required to ensure that the plated copper layer achieves stable physical properties, eliminates residual stress, stabilizes dimensions, refines grains, adjusts the microstructure, and forms a stable crystal lattice structure.

[0003] The annealing process takes place in an annealing chamber. The annealing chamber includes a hot plate located inside the chamber for heating the substrate. The hot plate typically requires support feet for mounting and securing within the chamber. One end of each support foot is fixedly connected to the hot plate, and the other end is fixedly connected to the chamber base. During heating, the hot plate expands due to heat, with the radial expansion being the most significant. Because the hot plate is fixed inside the chamber by the support feet, this expansion is constrained, generating thermal stress that can damage the hot plate, rendering it unusable and significantly reducing its lifespan.

[0004] Therefore, the problem of the hot plate's lifespan being reduced due to thermal expansion has become a technical issue that needs attention. Summary of the Invention

[0005] In view of the shortcomings of the prior art described above, the purpose of this application is to provide a support device for supporting a bearing plate on a base, so as to solve the problem that the existing support devices are difficult to adapt to the thermal expansion of the bearing plate, resulting in a reduction in the service life of the bearing plate.

[0006] To achieve the above and other related objectives, one aspect of this application provides a support device for supporting a carrier disk on a base, comprising a first support member and a second support member movably connected thereto; the first support member is fixedly connected to one of the base and the carrier disk, and the second support member is fixedly connected to the other of the base and the carrier disk, wherein the first support member and the second support member are configured to be relatively movable in the radial direction of the carrier disk, so that the carrier disk has a radial deformation space.

[0007] In some embodiments, the second support includes a channel extending radially along the bearing disk; the first support includes a channel mating member configured to be at least partially located within the channel; wherein the channel and the channel mating member are movable relative to each other in the radial direction of the bearing disk.

[0008] In some embodiments, the channel further includes at least one pair of first protrusions that are close to each other, the first protrusions extending from the sidewall of the channel into the interior space of the channel; the channel mating member includes a first groove corresponding to the first protrusion; wherein the first protrusion engages with the first groove, and the second protrusion engages with the second groove.

[0009] In some embodiments, the channel mating member includes at least one pair of mutually spaced second protrusions extending from the channel mating member toward the sidewall of the channel; the channel includes a second groove corresponding to the second protrusions; wherein the second protrusions and the second grooves engage with each other.

[0010] In some embodiments, a protrusion is further included, which is disposed between the first support member and the second support member to reduce the contact area between the first support member and the second support member.

[0011] Another aspect of this application proposes a substrate annealing apparatus, including an annealing chamber, a substrate heating plate, and the aforementioned support device, wherein the substrate heating plate is located inside the annealing chamber, the substrate heating plate is the bearing plate, and the cavity base of the annealing chamber is the base.

[0012] As described above, this application provides a support device and a substrate annealing apparatus, which have at least the following features:

[0013] Beneficial effects:

[0014] (1) It can not only effectively support the bearing plate on the base, but also allow the bearing plate to have a certain radial deformation space. When the bearing plate is heated and expands, it can expand freely within the radial deformation space, thus reducing the thermal stress caused by the constraint of expansion, thereby reducing the risk of damage to the bearing plate and extending the service life of the bearing plate;

[0015] (2) Through the mutual cooperation between the channel and the channel mating parts, the first support member and the second support member are configured to be relatively movable in the radial direction of the bearing plate and mutually constrained in other directions other than the radial direction of the bearing plate, thereby effectively improving the stability of the support device. Attached Figure Description

[0016] Figure 1a This is a schematic diagram of an exemplary annealing chamber;

[0017] Figure 1b This is a partial structural cross-sectional view of a heat plate in an exemplary annealing chamber;

[0018] Figure 2 This is a top view of the support plate of a support device applying an exemplary embodiment of this application;

[0019] Figure 3 and Figure 4 These are cross-sectional schematic diagrams of a support device according to an exemplary embodiment of this application from different perspectives;

[0020] Figure 5 and Figure 6 These are perspective views of a support device according to an exemplary embodiment of this application.

[0021] Figure 7 This is a cross-sectional perspective view of a support device according to an exemplary embodiment of this application;

[0022] Figure 8 This is a schematic diagram of the structure of a substrate annealing apparatus according to an exemplary embodiment of this application; and

[0023] Figure 9 This is a schematic diagram of the support device according to another embodiment of this application. Detailed Implementation

[0024] The following specific examples illustrate the implementation of this application. Those skilled in the art can easily understand other advantages and effects of this application from the content disclosed in this specification. This application can also be implemented or applied through other different specific embodiments, and the details in this specification can also be modified or adjusted based on different viewpoints and applications without departing from the spirit of this application.

[0025] It should be noted that the accompanying drawings are only schematic representations of the basic concept of this application. Although the drawings only show components related to this application and are not drawn according to the actual number, shape and size of the components, the shape, quantity and proportion of each component can be arbitrarily adjusted in actual implementation, and the layout of the components may also be more complex.

[0026] In the following description, when referring to the accompanying drawings, the same numbers in different drawings denote the same or similar elements unless otherwise indicated. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with this application. Rather, they are merely examples of apparatuses consistent with some aspects of this application as detailed in the appended claims.

[0027] The terminology used in this application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. The singular forms “a,” “the,” and “the” used in this application and the appended claims are also intended to include the plural forms unless the context clearly indicates otherwise. It should also be understood that the term “and / or” as used herein refers to and includes any or all possible combinations of one or more of the associated listed items.

[0028] In the description of this application, unless otherwise specified and limited, it should be noted that the terms "installation", "connection" and "linking" should be interpreted broadly. For example, they can refer to mechanical or electrical connections, or internal connections between two components. They can be direct connections or indirect connections through an intermediate medium. Those skilled in the art can understand the specific meaning of the above terms according to the specific circumstances.

[0029] It should be understood that although the terms first, second, third, etc., may be used in this application to describe various information, this information should not be limited to these terms. These terms are only used to distinguish information of the same type from one another.

[0030] In the description of this application, it should be understood that the terms "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., which may be used to indicate the orientation or positional relationship shown in the accompanying drawings, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0031] See Figure 1a and Figure 1b , Figure 1a A schematic diagram of an exemplary annealing chamber is shown; Figure 1b A partial structural cross-sectional view of a hot plate in an exemplary annealing chamber is shown. Figure 1a The annealing chamber 00 includes a hot plate 01 and a cold plate 02. The hot plate 01 is used to heat the substrate, and the cold plate 02 is used to cool the substrate. Both the hot plate 01 and the cold plate 02 are located within the annealing chamber 00, and typically require support feet 10 for mounting and securing within the chamber. Figure 1b One end of the support leg 10 is fixedly connected to the heating plate 01, and the other end is fixedly connected to the bottom 001 of the annealing chamber 00. During the heating process, the heating plate 01 will expand due to heat, and in the radial direction ( Figure 1b The deformation is most significant in the D1 direction. The support foot 10 constrains the expansion of the hot plate 01, preventing free expansion and generating thermal stress. This can lead to damage to the hot plate 01, for example, damage to the connection between the hot plate 01 and the support foot 10, or arching deformation of the hot plate 01.

[0032] To address at least some or all of the aforementioned problems, one aspect of this application provides a support device for supporting a bearing plate on a base. See also... Figures 2 to 4 , Figure 2 This is a top view schematic diagram of the support plate of a support device applying an exemplary embodiment of this application. Figure 3 and Figure 4These are cross-sectional schematic diagrams of a support device according to an exemplary embodiment of this application from different perspectives.

[0033] The support device 2 includes a first support member 21 and a second support member 22. The first support member 21 is fixedly connected to one of the bearing plate 1 and the base 3, and the second support member 22 is fixedly connected to the other of the bearing plate 1 and the base 3. The first support member 21 and the second support member 22 are configured to be relatively movable in the radial direction (D1 direction) of the bearing plate 1, so that the bearing plate 1 has radial deformation space. This design not only effectively supports the bearing plate 1 on the base 3, but also allows the bearing plate 1 to have a certain radial deformation space. When the bearing plate 1 expands due to heat, it can expand freely within the radial deformation space, thus reducing the thermal stress caused by constrained expansion, thereby reducing the risk of damage to the bearing plate 1 and extending its service life.

[0034] Combination Figure 2 and Figure 3 In one specific example, the support plate 1 is horizontally placed on the base 3, and the first support member 21 and the second support member 22 are located between the support plate 1 and the base 3. Exemplarily, three support devices 2 are provided between the support plate 1 and the base 3, located near the radial edge of the support plate 1 and evenly distributed along the circumference of the support plate 1 to achieve stable support for the support plate 1. In other embodiments, the number of support devices 2 may be more than three. Exemplarily, the first support member 21 is fixedly connected to the support plate 1 by a first screw 12, and the second support member 22 is fixedly connected to the base 3 by a second screw 32. It should be understood that the first screw 12 and the second screw 32 are merely exemplary connectors, and the first support member 21 and the support plate 1, and the second support member 22 and the base 3, may also be fixedly connected in any other possible manner.

[0035] The first support member 21 is located at the lower part of the support plate 1 and extends downward from the support plate 1, cooperating with the second support member 22 on the base 3. In other possible embodiments, the first support member 21 may also be located at the upper part or side of the support plate 1, extending downward from the upper part or side of the support plate 1, cooperating with the second support member 22 on the base 3. It should be understood that in other embodiments, the first support member 21 may be fixedly connected to the base 3, and the second support member 22 may be fixedly connected to the support plate 1.

[0036] See Figure 5 and Figure 6 and combined Figure 3 and Figure 4 , Figure 5 and Figure 6This is a perspective view of a support device according to an exemplary embodiment of this application. In some embodiments, the second support member 22 includes a channel 221 extending along the radial direction (D1 direction) of the support plate 1. The first support member 21 includes a channel mating member 211. The channel mating member 211 is configured to be at least partially located within the channel 221, wherein the channel 221 and the channel mating member 211 are relatively movable in the radial direction of the support plate 1. The channel 221 and the channel mating member 211 cooperate with each other such that the first support member 21 and the second support member 22 are configured to be relatively movable in the radial direction of the support plate 1 and mutually constrained in directions other than the radial direction of the support plate 1.

[0037] Combination Figures 2 to 6 For ease of description, the directions D1 are labeled "front" and "rear". "Front" refers to the direction pointing towards the center of the support plate 1 in the D1 direction, and "rear" refers to the direction pointing towards the edge of the support plate 1 in the D1 direction. In a specific example, the main structure of the channel 221 includes two opposing sidewalls 2210, which extend along the radial direction (D1 direction) of the support plate 1, forming the internal space of the channel 221 between the two sidewalls 2210. Exemplarily, in some embodiments, the channel 221 includes at least one pair of mutually close first protrusions 2211, which extend from the sidewalls 2210 of the channel 221 into the internal space of the channel 221. Figure 4 As shown, in a specific example, the first protrusion 2211 is located at the upper end of the sidewall 2210, and a slot 2212 of the channel 221 is formed between the two first protrusions 2211. The lower end of the channel fitting 211 extends through the slot 2212 into the interior space of the channel 221. The channel fitting 211 includes a first groove 2111 corresponding to the first protrusion 2211. To clearly show the position and structure of the first groove 2111, in Figure 4 In this design, the outline of the first groove 2111 is thickened. The first protrusion 2211 engages with the first groove 2111, causing the channel mating member 211 and the channel 221 to mutually constrain each other in directions other than the extension direction (D1 direction) of the channel 221. It should be understood that the position of the first protrusion 2211 is not limited to this; in other embodiments, the first protrusion 2211 can also be located at other positions between the upper and lower ends of the sidewall 2210.

[0038] Optionally, see Figure 9 , Figure 9This is a schematic diagram of the support device according to another embodiment of this application. In some embodiments, the channel mating member 211 includes at least a pair of mutually spaced second protrusions 2116, and the sidewall 2210 includes a second groove 2216 corresponding to the second protrusions 2116. The second protrusions 2116 and the second grooves 2216 engage with each other, such that the channel mating member 211 and the channel 221 are mutually constrained in directions other than the extending direction of the channel 221. Furthermore, in some embodiments, a first protrusion 2211 and a first groove 2111, and a second protrusion 2116 and a second groove 2216 may be included simultaneously. The first protrusion 2211 and the first groove 2111 engage with each other, and the second protrusion 2116 and the second groove 2216 engage with each other, such that the channel mating member 211 and the channel 221 are mutually constrained in directions other than the extending direction of the channel 221.

[0039] Preferably, such as Figure 4 As shown, in some embodiments, the first protrusion 2211 has a chamfer 22110. This design reduces the contact area between the first protrusion 2211 and the groove mating member 211, thereby reducing the friction between the groove mating member 211 and the first protrusion 2211 during movement. In other embodiments, the area where the chamfer 22110 is located can also be designed to be rounded. Similarly, in embodiments having a second protrusion 2116 and a second groove 2216, the second protrusion 2116 can also have a chamfer or be rounded.

[0040] In some embodiments, the second support 22 further includes a support base 2200, which is located on the rear side of the channel 221. For example... Figure 5 and Figure 6 As shown, in some embodiments, the channel 221 further includes a front wall 2214, located at the front end of the channel 221, connecting the two side walls 2210 of the channel 221. The front end is the end of the channel 221 closer to the center of the support plate 1. By providing a front wall 2214 connecting the two side walls 2210 of the channel 221, the structure of the channel 221 can be made more stable. Exemplarily, the support base 2200 is provided with a second screw hole adapted to the second screw 32. The second screw 32 passes through the second screw hole and extends to the base 3 to achieve a fixed connection between the second support member 22 and the base 3. Combined with... Figure 2 and Figure 6The support base 2200 includes an extension 2201 that extends into the interior space of the channel 221. A positioning part is provided on the extension 2201 for positioning between the second support member 22 and the base 3. Exemplarily, the bottom of the support base 2200 extends into the interior space of the channel 221 to form the extension 2201, and a positioning part, such as a positioning pin 2202, is provided on the extension 2201. When the second support member 22 is installed on the base 3, the positioning pin 2202 serves a positioning function and also strengthens the connection between the two.

[0041] In addition, in some embodiments, the sidewall 2210 of the channel 221 includes an inclined portion 2215, which is located at the front end of the channel 221 and tilts backward from top to bottom, thereby reducing the space occupied by the sidewall 2210.

[0042] Preferably, in some embodiments, the support device 2 further includes a protrusion 23 disposed on the contact surface between the first support member 21 and the second support member 22, for reducing the contact area between the first support member 21 and the second support member 22, thereby reducing friction between the first support member 21 and the second support member 22 during relative movement. More preferably, see [reference needed]. Figure 5 The protrusion 23 is disposed on the upper surface of the first protrusion 2211 and is a strip-shaped protrusion extending along the D1 direction. This changes the surface contact between the upper surface of the first protrusion 2211 and the first groove 2111 into a line contact, reducing the contact area between them. The protrusion 23 is preferably disposed on the upper surface of the first protrusion 2211 because, on the one hand, it is more convenient to process the protrusion 23 on the upper surface of the first protrusion 2211; on the other hand, in this example, the groove mating part 211 is vertically arranged, and the pressure between the upper surface of the first protrusion 2211 and the first groove 2111 is relatively large. When the first support 21 and the second support 22 move relative to each other, the friction on the contact surface is relatively large, so it is more necessary to reduce friction.

[0043] See below. Figure 7 and combined Figures 3 to 6 The channel mating member 211 in an exemplary embodiment of this application is further described. Figure 7 This is a cross-sectional perspective view of a support device according to an exemplary embodiment of this application.

[0044] In a specific example, the channel mating member 211 includes a first mating member 211a and a second mating member 211b, and a first groove 2111 is formed between the first mating member 211a and the second mating member 211b (see reference). Figure 4The first groove 2111 is located in the channel 221. One end of the first mating member 211a is fixedly connected to the carrier plate 1, and the other end is connected to the second mating member 211b. Exemplarily, the first mating member 211a is located above the second mating member 211b. A first screw 12 passes through the second mating member 211b and the first mating member 211a and connects to the carrier plate 1, connecting the first mating member 211a and the second mating member 211b as a single unit and fixing them to the carrier plate 1. In some embodiments, due to the provision of the forearm 2214 and the support seat 2200 located on the rear side, both ends of the channel 221 are closed. Therefore, configuring the channel mating members 211 as detachable first mating members 211a and second mating members 211b facilitates the assembly of the channel 221 and the channel mating members 211. During assembly, the first mating part 211a can enter the internal space of the channel 221 from above, and the second mating part 211b can enter the internal space of the channel 221 from below, and are connected by the first screw 12.

[0045] Preferably, the upper end of the first mating part 211a has a first protrusion 21100, which is embedded in the carrier plate 1 to play a role in installation and positioning, and can strengthen the connection between the first mating part 211a and the carrier plate 1.

[0046] Furthermore, in some embodiments, the second mating member 211b includes a second protrusion 21111, which is located at one end of the second mating member 211b near the first mating member 211a and is located on at least one side of the first mating member 211a in the D1 direction, abutting against the first mating member 211a. This design can strengthen the connection between the first mating member 211a and the second mating member 211b. Figure 3 and Figure 7 As shown, in one specific example, the second protrusion 21111 is located at the upper end of the second mating member 211b and at the front side of the second mating member 211b in the D1 direction. In this example, the second mating member 211b exhibits an asymmetrical shape in the D1 direction, with its rear side recessed forward compared to the first mating member 211a. This design aims to reduce the space occupied by the second mating member 211b and facilitate installation. In other embodiments, the second protrusion 21111 may also be located on both the front and rear sides of the second mating member 211b, with the second mating member 211b exhibiting a symmetrical shape in the D1 direction. In these embodiments, the second mating member 211b includes... Figure 3 and Figure 7 The structure is indicated by a dashed box X. It should be understood that in some embodiments, the channel mating component 211 can also be an integrally formed part, that is, the first mating component 211a and the second mating component 211b are integrally formed to form a non-removable whole.

[0047] Preferably, in some embodiments, the support device 2 further includes a heat insulation element located at the portion of the support device 2 that contacts the carrier plate 1. For example, in Figures 3 to 7 In the illustrated embodiment, the first mating component 211a is a heat insulation component, made of heat-insulating material, such as ceramics, which have good heat resistance and low thermal conductivity. When the carrier plate 1 needs to be heated, the heat insulation material can reduce heat loss from the carrier plate 1 and prevent components located below the carrier plate 1 from being damaged by heat.

[0048] Another aspect of this application proposes a substrate annealing apparatus. (See also...) Figure 8 , Figure 8 This is a schematic diagram of the structure of a substrate annealing apparatus according to an exemplary embodiment of this application. The substrate annealing apparatus 80 includes an annealing chamber 800, a substrate heating plate 801, and a support device 802, with the substrate heating plate 801 located within the annealing chamber 800. For details regarding the specific structure of the support device 802, please refer to... Figures 2 to 7 The support device 2 in the middle will not be described in detail here. See reference... Figures 2 to 7 In the illustrated embodiment, the substrate heating plate 801 is a carrier plate 1, the cavity base 803 of the annealing cavity 800 is a base 3, and the substrate heating plate 801 is supported on the cavity base 803 of the annealing cavity 800 by a support device 802.

[0049] During the heating process of the substrate by the substrate heating plate 801, even if the substrate heating plate 801 expands due to heat, it can still have a certain deformation space in the radial direction, avoiding thermal stress caused by the constraint of expansion, which would lead to damage to the substrate heating plate 801. This can extend the service life of the substrate heating plate 801.

[0050] In addition, the substrate annealing apparatus 80 also includes a substrate cooling plate 804, which is located within the annealing chamber 800 and near the substrate heating plate 801. In the substrate annealing process, the substrate is first placed on the substrate heating plate 801 for heating, and then the heated substrate is placed on the substrate cooling plate 804 for cooling. It should be understood that the substrate cooling plate 804 does not have the problem of thermal expansion, therefore it can be cooled using conventional support feet (e.g., ...). Figure 1b The support foot 100 is mounted on the cavity base 803, or it can be mounted on the cavity base 803 via the support device 802.

[0051] The above embodiments are merely illustrative of the principles and effects of this application and are not intended to limit this application. Any person skilled in the art can modify or adjust the above embodiments without departing from the spirit and scope of this application. Therefore, all equivalent modifications or adjustments made by those skilled in the art without departing from the spirit and technical concept disclosed in this application should still be covered by the claims of this application.

Claims

1. A support device for supporting a bearing plate on a base, characterized in that, Includes a first support member and a second support member that are movably connected; The first support member is fixedly connected to one of the base and the bearing plate, and the second support member is fixedly connected to the other of the base and the bearing plate. The first support member and the second support member are configured to be movable relative to each other in the radial direction of the bearing disk, so that the bearing disk has a radial deformation space. The second support member includes a channel that extends radially along the bearing plate; The first support member includes a channel mating member configured to be at least partially located within the channel; The channel and the channel mating component are movable relative to each other in the radial direction of the bearing plate.

2. The support device according to claim 1, characterized in that, The channel further includes at least one pair of first protrusions that are close to each other, the first protrusions extending from the sidewall of the channel into the interior space of the channel; the channel mating component includes a first groove corresponding to the first protrusions; The first protrusion engages with the first groove.

3. The support device according to claim 1 or 2, characterized in that, The channel fitting includes at least one pair of mutually spaced second protrusions, the second protrusions extending from the channel fitting toward the sidewall of the channel; the channel includes a second groove corresponding to the second protrusions; The second protrusion engages with the second groove.

4. The support device according to claim 2, characterized in that, The first protrusion has a chamfer or a rounded edge.

5. The support device according to claim 3, characterized in that, The second protrusion has a chamfer or rounding.

6. The support device according to claim 1, characterized in that, The channel also includes a front wall, which is located at the front end of the channel and connects the two side walls of the channel. The front end is the end of the channel closer to the center of the support plate.

7. The support device according to claim 1, characterized in that, The channel fitting includes a first fitting and a second fitting. One end of the first fitting is fixedly connected to the bearing plate, and the other end is connected to the second fitting.

8. The support device according to claim 1, characterized in that, It also includes a protrusion disposed between the first support member and the second support member to reduce the contact area between the first support member and the second support member.

9. The support device according to claim 1, characterized in that, It also includes a heat insulation component located at the point where the support device contacts the bearing plate.

10. A substrate annealing apparatus, characterized in that, It includes an annealing chamber, a substrate heating plate, and a support device as described in any one of claims 1 to 9, wherein the substrate heating plate is located inside the annealing chamber, the substrate heating plate is the bearing plate, and the cavity base of the annealing chamber is the base.

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