Display substrate and manufacturing method thereof, mask and display device

Abstract

The invention discloses a display substrate and a manufacturing method thereof, a mask plate and a display device. The display substrate comprises a substrate; the light-emitting structures are arranged in an array mode, each light-emitting structure comprises a first electrode and a light-emitting layer, and the first electrodes are located between the substrate and the light-emitting layers; the first face, away from the substrate, of the first electrode comprises a concave face, the concave face is located in a pixel area corresponding to the light-emitting structure, and the second face, close to the substrate, of the first electrode is a plane. The concave surface depths of the first electrodes arranged in the first direction are gradually increased; wherein the first direction is a direction in which one side of the array points to the other side opposite to the one side, and a power supply for supplying power to the first electrode is arranged on the other side, or the first direction is a direction in which the center of the array points to the power supply, and the power supply is arranged on one side and the other side of the array.

Description

Technical Field

[0001] The present disclosure relates to the field of display technology, and in particular to a display substrate and a manufacturing method thereof, a mask plate, and a display device. Background Art

[0002] Organic Light-Emitting Diode (OLED) display products are widely used in various display products due to their advantages such as low energy consumption, high brightness and good luminous efficiency.

[0003] However, OLED display products have problems with low luminous efficiency and uniformity. Summary of the invention

[0004] The embodiments of the present disclosure provide a display substrate and a manufacturing method thereof, a mask plate, and a display device, so as to solve the problem of low luminous efficiency and low luminous uniformity of OLED display products in the prior art.

[0005] In a first aspect, in order to solve the above technical problems, the present disclosure provides a display substrate, including:

[0006] substrate substrate;

[0007] A plurality of light-emitting structures arranged in an array, the light-emitting structure comprising a first electrode and a light-emitting layer, the first electrode being located between the base substrate and the light-emitting layer; a first surface of the first electrode away from the base substrate comprising a concave surface, the concave surface being located in a pixel region corresponding to the light-emitting structure, and a second surface of the first electrode close to the base substrate being a plane;

[0008] The concave depth of the first electrodes arranged along the first direction gradually increases; wherein the first direction is a direction from one side of the array to the other side opposite to the one side, and the power supply for powering the first electrodes is arranged on the other side, or the first direction is a direction from the center of the array to the power supply, and the power supply is arranged on one side and the other side of the array.

[0009] In a possible implementation manner, the first surface includes:

[0010] The concave surface and a sub-surface connected to the edge of the concave surface;

[0011] The sub-surface surrounds the concave surface and is parallel to the second surface.

[0012] In a possible implementation manner, the first surface further includes:

[0013] A transition surface is connected between the concave surface and the sub-surface to ensure a smooth transition between the concave surface and the sub-surface.

[0014] In a possible implementation manner, the concave surface comprises:

[0015] The bottom surface and the side surfaces surrounding the bottom surface, the bottom surface is a plane, the side surfaces are arc surfaces, and the bottom surface and the side surfaces are smoothly transitioned.

[0016] In a possible implementation manner, the longitudinal cross-sectional diagram of the concave surface includes:

[0017] A circular or elliptical arc.

[0018] In a possible implementation manner, resistance values ​​of the first resistors arranged along the first direction gradually increase.

[0019] In a possible implementation manner, the roughness of the concave surface is greater than or equal to 1 nm and less than or equal to 10 nm.

[0020] In a possible implementation manner, the display substrate further includes:

[0021] a driving circuit connected to the first electrode;

[0022] the power supply;

[0023] a power line connected between the voltage and the driving circuit; when the driving circuit drives the light-emitting structure to emit light, the power supply supplies power to the first electrode through the driving circuit and the power line;

[0024] The total resistance of each first electrode and the corresponding power line is within an error range of a preset resistance value.

[0025] In a second aspect, an embodiment of the present disclosure provides a mask, including:

[0026] A plurality of exposure structures are arranged in an array, wherein the exposure structure at least includes an exposure adjustment structure, wherein a transmission rate of light passing through the exposure adjustment structure gradually decreases or increases in a direction from a central area of ​​the exposure adjustment structure to an edge of the exposure adjustment structure; the exposure adjustment structure is used to form a concave surface of the first electrode in the display substrate as described in the first aspect.

[0027] In a possible implementation manner, the exposure adjustment structure includes:

[0028] An incident surface and an exit surface; light is incident on the exposure adjustment structure from the incident surface, and the light is exited from the exit surface;

[0029] At least one of the incident surface and the exit surface has a curved surface, and the end of the curved surface close to the central area is closest to the light source corresponding to the light, so that the light incident on the exposure adjustment structure is mainly focused on the photoresist covered by the central area.

[0030] In a possible implementation manner, both the exit surface and the incident surface have curved surfaces, and the exit surface is parallel to the incident surface;

[0031] Or, the incident surface is a plane, and the exit surface has a curved surface;

[0032] In a possible implementation manner, the incident surface has a curved surface, and the exit surface is a plane.

[0033] In a possible implementation manner, the exposure adjustment structure has a longitudinal cross-sectional shape of a rectangle;

[0034] In a direction from the central area of ​​the exposure adjustment structure to the edge of the exposure adjustment structure, the light transmittance of the exposure adjustment structure gradually decreases or increases.

[0035] In a possible implementation manner, the exposure structure further includes a full light shielding structure, and the full light shielding structure surrounds the exposure adjustment structure; wherein, when the longitudinal cross-sectional shape of the exposure adjustment structure is a rectangle, the light transmittance of the exposure adjustment structure gradually decreases in the direction from the central area of ​​the exposure adjustment structure to the edge of the exposure adjustment structure;

[0036] The mask also includes a fully light-transmitting structure, and the fully light-transmitting structure surrounds the exposure structure.

[0037] In a possible implementation manner, the first exposure structure further includes a full exposure structure, and the full exposure structure surrounds the exposure adjustment structure; wherein when the longitudinal cross-sectional shape of the exposure adjustment structure is a rectangle, the light transmittance of the exposure adjustment structure gradually increases in a direction from the central area of ​​the exposure adjustment structure to the edge of the exposure adjustment structure;

[0038] The mask also includes a full light-shielding structure, and the tube light-shielding structure surrounds the exposure structure.

[0039] In a third aspect, an embodiment of the present disclosure provides a method for manufacturing a display substrate, comprising:

[0040] Depositing a conductive layer on one side of the substrate;

[0041] forming a layer of photoresist on a side of the conductive layer away from the substrate;

[0042] Disposing a mask as described in the second aspect on the side of the photoresist away from the substrate, and patterning the photoresist using the mask so that the side of the photoresist away from the substrate has a plurality of concave surfaces arranged in an array;

[0043] Transferring the pattern of the photoresist including the plurality of concave surfaces to the conductive layer to obtain a plurality of first electrodes; the first surface of the first electrode away from the substrate substrate includes a concave surface, and the second surface of the first electrode close to the substrate substrate is a plane; the depth of the concave surfaces of the first electrodes arranged along the first direction gradually increases; wherein the first direction is a direction from one side of the array to the other side opposite to the one side, and the power supply for supplying power to the first electrodes is arranged on the other side, or the first direction is a direction from the center of the array to the power supply, and the power supply is arranged on one side and the other side of the array;

[0044] A light-emitting layer corresponding to each first electrode is formed on a side of the plurality of first electrodes away from the base substrate; wherein the light-emitting structure includes the first electrodes and the corresponding light-emitting layer.

[0045] In a fourth aspect, an embodiment of the present disclosure provides a display device, comprising the display substrate as described in the first aspect. BRIEF DESCRIPTION OF THE DRAWINGS

[0046] Figure 1 A schematic diagram of forming an anode in the related art;

[0047] Figure 2 A schematic diagram of the structure of a display substrate provided in an embodiment of the present disclosure;

[0048] Figure 3 A schematic structural diagram of another display substrate provided in an embodiment of the present disclosure;

[0049] Figure 4 A schematic diagram of the structure of a first electrode provided in an embodiment of the present disclosure;

[0050] Figure 5 A schematic diagram of the structure of another first electrode provided in an embodiment of the present disclosure;

[0051] Figure 6 A schematic diagram of the structure of another first electrode provided in an embodiment of the present disclosure;

[0052] Figure 7 A schematic diagram of the structure of another first electrode provided in an embodiment of the present disclosure;

[0053] Figure 8 A schematic structural diagram of another display substrate provided in an embodiment of the present disclosure;

[0054] Fig. 9 and Fig.10 A schematic structural diagram of another display substrate provided in an embodiment of the present disclosure;

[0055] Fig.11 and Fig.12A schematic diagram of the structure of a mask provided in an embodiment of the present disclosure;

[0056] Fig.13 and Fig.14 A schematic diagram of the structure of another mask provided in an embodiment of the present disclosure;

[0057] Fig.15 and Fig.16 A schematic diagram of the structure of another mask provided in an embodiment of the present disclosure;

[0058] Fig.17 and Fig.18 A schematic diagram of the structure of another mask provided in an embodiment of the present disclosure;

[0059] Fig.19 and Fig. 20 A schematic diagram of the structure of another mask provided in an embodiment of the present disclosure;

[0060] Fig.21 and Fig. 22 A schematic diagram of the structure of another mask provided in an embodiment of the present disclosure;

[0061] Fig.23 A schematic diagram of manufacturing a display substrate provided in an embodiment of the present disclosure. Description of the drawings:

[0063] Substrate 1', conductive layer 02', photoresist 3', anode 2', mask 4'

[0064] Base substrate 1, light emitting structure 2, first electrode 21, light emitting layer 22, first surface 21a, concave surface 21a1, second surface 21b, first direction X, sub-surface 21a2, transition surface 21a3, bottom surface 21a11, side surface 21a12, pixel definition layer 3, driving circuit 4, power supply 5, power supply line 6, second electrode 7, encapsulation layer 8;

[0065] Exposure structure A, exposure adjustment structure A1, incident surface a, exit surface b, full light shielding structure A2, full light transmitting structure B;

[0066] Conductive layer 021, photoresist 9. DETAILED DESCRIPTION

[0067] The embodiments of the present disclosure provide a display substrate and a manufacturing method thereof, a mask plate, and a display device, so as to solve the problem of low luminous efficiency and low luminous uniformity of OLED display products in the prior art.

[0068] It should be understood that the specific structural and functional details disclosed in the embodiments of the present disclosure are merely representative and are for the purpose of describing the exemplary embodiments of the present disclosure. However, the present disclosure can be specifically implemented in many alternative forms or combinations and should not be interpreted as being limited to the embodiments described herein.

[0069] In the description of the present disclosure, it should be understood that the terms "center", "lateral", "up", "down", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate positions or positional relationships based on the positions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present disclosure and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present disclosure. In addition, the terms "first" and "second" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present disclosure, unless otherwise specified, "multiple" means two or more. In addition, the term "including" and any variation thereof are intended to cover non-exclusive inclusions.

[0070] In order to make the above-mentioned purposes, features and advantages of the present disclosure more obvious and easy to understand, the present disclosure will be further described below with reference to the accompanying drawings and examples. However, the example embodiments can be implemented in various forms and should not be understood as being limited to the embodiments described herein; on the contrary, these embodiments are provided to make the present disclosure more comprehensive and complete, and to fully convey the concepts of the example embodiments to those skilled in the art. The same figure marks in the figures represent the same or similar structures, and thus their repeated descriptions will be omitted. The words expressing position and direction described in the present disclosure are all explained using the accompanying drawings as examples, but changes can be made as needed, and the changes made are all included in the scope of protection of the present disclosure. The drawings of the present disclosure are only used to illustrate the relative position relationship and do not represent the true proportion.

[0071] It should be noted that specific details are described in the following description to facilitate a full understanding of the present disclosure. However, the present disclosure can be implemented in a variety of other ways different from those described herein, and those skilled in the art can make similar generalizations without violating the connotation of the present disclosure. Therefore, the present disclosure is not limited to the specific implementation methods disclosed below. The subsequent description of the specification is a preferred implementation method for implementing the present disclosure, but the description is for the purpose of illustrating the general principles of the present disclosure and is not intended to limit the scope of the present disclosure. The scope of protection of the present disclosure shall be determined by the definition of the attached claims.

[0072] In OLED display panels, the function of the anode is to act as a hole injection layer. In OLED, the anode is responsible for injecting positive charges (holes) into the device, thereby promoting the recombination of electrons and holes in the electroluminescence process, thereby generating photons.

[0073] See also Figure 1 FIG. 1 is a schematic diagram of forming an anode in the related art.

[0074] S11, depositing a conductive layer 02' on one side of the substrate 1', coating a photoresist 3' on the side of the conductive layer 02' away from the substrate 1', and transferring the pattern of the mask 4' to the photoresist 3';

[0075] S12, patterning the conductive layer 02' to transfer the pattern of the photoresist 3' to the conductive layer 02', thereby obtaining a plurality of anodes 2'.

[0076] The inventor discovered that: Figure 1 The flat surface of the anode 2' away from the substrate 1' is one of the reasons for the low luminous efficiency of the OLED light-emitting device; and the power supply lines corresponding to different OLEDs in the OLED display panel are of different lengths, resulting in inconsistent voltage drops of different OLEDs, making the luminous uniformity of the OLED display panel poor.

[0077] In order to solve the above problems, the embodiments of the present disclosure provide a display substrate and a manufacturing method thereof, a mask plate, and a display device, which are described in detail below with reference to the accompanying drawings.

[0078] See also Figure 2 A schematic diagram of a display substrate provided in an embodiment of the present disclosure, the display substrate comprising:

[0079] Base substrate 1;

[0080] A plurality of light-emitting structures 2 are arranged in an array, the light-emitting structure 2 comprises a first electrode 21 and a light-emitting layer 22, the first electrode 21 is located between the base substrate 1 and the light-emitting layer 22; a first surface 21a of the first electrode 21 away from the base substrate 1 comprises a concave surface 21a1, the concave surface 21a1 is located in a pixel region (not shown) corresponding to the light-emitting structure 2, and a second surface 21b of the first electrode 21 close to the base substrate 1 is a plane;

[0081] The depth of the concave surface 21a1 of the first electrode 21 arranged along the first direction X gradually increases; wherein the first direction X is a direction from one side of the array to the other side opposite to the one side of the array, and the power source ( Figure 2 (not shown) is arranged on the other side, or the first direction X is the center of the array pointing to the power source ( Figure 2The first direction X is the direction from one side of the array to the other side of the array (not shown), and the power supply is arranged on one side and the other side of the array. If the power supply is arranged on one side of the array (that is, the light emitting structure 2 adopts single-side power supply), the first direction X is the direction from one side of the array to the opposite other side; if the power supply is arranged on both sides of the array (that is, the light emitting structure 2 adopts double-side power supply), the first direction X is the direction from the center of the array to the power supply.

[0082] The first electrode 21 may be made of a conductive material, which may be indium tin oxide (ITO) or a metal material. When the first electrode 21 is made of a metal material, the first electrode 21 may be used to reflect the light emitted by the light-emitting layer 22 to improve the optical properties of the light-emitting structure 2, increase the effective angle of the emitted light, and optimize the refraction and reflection of light, thereby improving the brightness and viewing angle characteristics of the light-emitting structure 21.

[0083] like Figure 2 As shown, the depths of the concave surfaces 21a1 corresponding to the three first electrodes 21 arranged along the first direction X are h1, h2, and h3, respectively, h1>h2>h3. Figure 2 It can be seen that, since the second surface 21b of the first resistor 21 is a plane, the depth of the concave surface 21a1 of the first electrode 21 arranged along the first direction X can be gradually increased, so that the cross-sectional area of ​​the first electrode 21 arranged along the first direction X is gradually reduced, thereby gradually increasing the resistance of the first electrode 21 arranged in the first direction X, so that the voltage drop from the power supply to each first electrode 21 can be made consistent, thereby improving the light uniformity of the display substrate;

[0084] If the first electrode 21 is made of a metal material, such as Figure 3 As shown is a schematic diagram of the structure of another display substrate provided in an embodiment of the present disclosure, when the depth of the concave surface 21a1 of each first resistor 21 is the same, the resistance of the first electrodes 21 with the same depth of the concave surfaces 21a1 arranged along the first direction X can be gradually increased by changing the film layer structure of the first electrode 21, so that the voltage drop from the power supply to each first electrode 21 tends to be consistent.

[0085] Of course, the resistance of the first electrodes 21 with the same depth of the concave surfaces 21a1 arranged along the first direction X can be gradually increased by changing the depth of the concave surfaces 21a1 of the first electrode 21 and the film structure of the first electrode 21 at the same time. In this way, the depth of the depression of the first electrode 21 with the largest resistance can be reduced, thereby improving the flatness of the display substrate.

[0086] By setting the first surface 21a of the first electrode 21 away from the base substrate 1 to include a concave surface 21a1, the effective contact area between the light-emitting layer 22 and the first electrode 21 can be increased, and the contact area between the electrons and holes in the light-emitting structure 2 can be increased, thereby increasing the probability and efficiency of recombination. Since the structure fully considers the physical process of carrier transmission and recombination inside the light-emitting structure 2, the performance of the light-emitting structure 2 can be comprehensively improved. And since a larger contact area helps to improve the efficiency of electron injection, the voltage loss during the current injection process can be reduced, and the energy efficiency ratio of the light-emitting structure 2 can be improved. The depth of the concave surface 21a1 of the first electrode 21 arranged along the first direction X is set to gradually increase; wherein the first direction X is a direction from one side of the array to the other side opposite to the other side, and a power source ( Figure 2 (not shown) is arranged on the other side, or the first direction X is the center of the array pointing to the power source ( Figure 2 The direction of the array (not shown) and the power supply is set on one side and the other side of the array. Under the control of the same driving data, the voltage drop from the power supply in the display substrate to each first electrode 21 can be made consistent, thereby improving the light uniformity of the display substrate. Compared with the redundant wiring set in the related art to improve the light uniformity, the redundant wiring can be effectively reduced, thereby reducing the area occupied by the redundant wiring and realizing a narrow frame design. In addition, since the first surface 21a of the first electrode 21 is designed with only one concave surface 21a1, the flatness of the film layer formed on the first surface 21a side is higher than that of a plurality of concave surfaces 21a1.

[0087] like Figure 2 As shown, the first surface 21a of the first electrode 21 can be entirely a concave surface 21a1, but in the process of manufacturing the concave surface 21a1, the edge of the concave surface 21a1 is prone to over-engraving, which will cause the depth of the concave surface 21a1 to be reduced, and the structure of the edge of the concave surface 21a1 is unstable, which is not conducive to the subsequent process manufacturing.

[0088] See also Figure 4 A schematic diagram of the structure of a first electrode provided in an embodiment of the present disclosure. The first surface 21a of the first electrode 21 includes:

[0089] A concave surface 21a1 and a sub-surface 21a2 connected to an edge of the concave surface 21a1;

[0090] The sub-surface 21a2 surrounds the concave surface 21a1 and is parallel to the second surface 21b.

[0091] like Figure 4As shown, the first surface 21a may include not only a concave surface 21a1, but also a sub-surface 21a2 surrounding the edge of the concave surface 21a1 and connected to the edge of the concave surface 21a1, and the sub-surface 21a2 is parallel to the second surface 21b. Since the second surface 21b is a plane, the sub-surface 21a2 is also a plane. In this way, the width of the edge of the concave surface 21a1 can be increased, so that the edge position of the concave surface 21a1 maintains structural stability, and when etching the concave surface 21a1, even if the edge of the concave surface 21a1 is over-engraved, the depth of the concave surface 21a1 will not be reduced, so that the structure of the first electrode 21 can meet the design indicators.

[0092] See also Figure 5 This is a schematic diagram of another structure of a first electrode provided in an embodiment of the present disclosure, wherein the first surface 21a further includes:

[0093] The transition surface 21a3 is connected between the concave surface 21a1 and the sub-surface 21a2, so that the concave surface 21a1 and the sub-surface 21a2 have a smooth transition.

[0094] By setting a transition surface 21a3 between the concave surface 21a1 and the sub-surface 21a2 to achieve a smooth transition between the concave surface 21a1 and the sub-surface 21a2, it is possible to avoid the appearance of a tip in the first surface 21a due to the setting of the concave surface 21a1 on the first surface 21a, prevent the current density from being concentrated at the tip position, thereby improving the uniformity of the current density of the first electrode 21 and reducing the heat generated by the first electrode 21.

[0095] Please continue to see Figure 4 , the longitudinal section of the concave surface 21a1 is an elliptical arc; Figure 6 FIG. 2 is a schematic diagram of the structure of another first electrode provided in an embodiment of the present disclosure, wherein the longitudinal section of the concave surface 21 a 1 may also be an arc.

[0096] By setting the longitudinal cross-sectional shape of the concave surface 21 a 1 to an elliptical arc or a circular arc, the curvature of the concave surface 21 a 1 can be continuously changed, so that the current density on the concave surface 21 a 1 is evenly distributed, thereby improving the light emission uniformity of the light emitting structure 2 .

[0097] See also Figure 7 This is a schematic diagram of another structure of a first electrode provided in an embodiment of the present disclosure, wherein the concave surface 21a1 in the first surface 21a includes:

[0098] The bottom surface 21a11 and the side surface 21a12 surrounding the bottom surface 21a11 are plane surfaces, and the side surface 21a12 are arc surfaces 21a12 , and the bottom surface 21a11 and the side surface 21a12 are smoothly transitioned.

[0099] By setting the bottom surface 21a11 of the concave surface 21a1 as a plane, setting the side surface 21a12 connected to the bottom surface 21a11 as a curved surface 21a12, and making a smooth transition between the side surfaces of the bottom surface 21a11, not only can the curvature of the concave surface 21a1 be continuously changed, but also the surface area of ​​the concave surface 21a1 can be increased while reducing the depth of the concave surface 21a1, thereby improving the luminous efficiency and luminous uniformity of the light-emitting structure 2, and improving the flatness of other film layers formed on the concave surface 21a1.

[0100] See also Figure 8 A schematic diagram of the structure of another display substrate provided in an embodiment of the present disclosure, wherein the display substrate further comprises:

[0101] A pixel definition layer 3, wherein the pixel definition layer 3 is disposed in a gap between adjacent first electrodes 21;

[0102] The second electrode 7 is located on a side of the light emitting layer 22 away from the base substrate 1;

[0103] The encapsulation layer 8 is located on a side of the light emitting layer 22 away from the base substrate 1 .

[0104] Since most of the thickness of the light-emitting layer 22 is located in the concave surface 21a1 of the first electrode 21, the pixel definition layer 3 is set in the gap between adjacent first electrodes 21, and the pixel definition layer 3 is higher than the height of the first electrode 21. This can minimize the thickness of the display substrate and facilitate lightweight design.

[0105] In some embodiments, the roughness of the concave surface 21 a 1 is greater than or equal to 1 nm and less than or equal to 10 nm.

[0106] The concave surface 21a1 of the first electrode 21 is formed by using a photolithography process, so that the roughness of the first electrode 21 can be greater than or equal to 1nm and less than or equal to 10nm, which can improve the smoothness of the concave surface 21a1, so that the current is evenly distributed on the concave surface 21a1. Therefore, in the present disclosure, the roughness of the concave surface 21a1 is set to be greater than or equal to 1nm and less than or equal to 10nm, and the concave surface 21a1 of the first electrode 21 can be formed by using a photolithography process, so that compared with other etching processes, the surface of the concave surface 21a1 can be smoother and the curvature continuity is higher.

[0107] In some embodiments, the curvature of the concave surface 21 a 1 changes continuously, so that the current density of the concave surface 21 a 1 can be evenly distributed.

[0108] See also Fig. 9 and Fig.10 A schematic diagram of the structure of another display substrate provided in an embodiment of the present disclosure. The display substrate further includes:

[0109] A driving circuit 4 connected to the first electrode 21;

[0110] Power supply 5;

[0111] The power line 6 is connected between the power source 5 and the driving circuit 4; when the driving circuit 4 drives the light-emitting structure 2 to emit light, the power source 5 supplies power to the first electrode 21 through the driving circuit 4 and the power line 6;

[0112] The total resistance of each first electrode 21 and the corresponding power line 6 is within the error range of the preset resistance value.

[0113] The power supply 5 is usually provided by a scanning circuit (not shown), and can be a positive power supply or a negative power supply, which is specifically determined by the type of driving transistor used in the driving circuit 4 and is not limited here.

[0114] like Fig. 9 As shown, if the display substrate adopts unilateral driving, that is, the scanning circuit (not shown) is located on one side of the plurality of first electrodes 21 arranged in an array, the location of the power supply 5 for supplying power to the first electrode 21 is the location of the scanning circuit, so the resistance of the first electrode 21 closest to the power supply 5 is the largest, the resistance of the first electrode 21 farthest from the power supply 5 is the smallest, and the resistance of the first electrodes 21 arranged along the first direction X gradually increases. Since the length of the power line 6 corresponding to the first electrode 21 arranged along the first direction X is gradually reduced, the resistance of the corresponding power line 6 is gradually reduced, so that the total resistance of each first electrode 21 arranged along the first direction X and the corresponding power line 6 are within the error range of the preset resistance value (that is, each total resistance is approximately the same), so that under the same brightness data, the voltage drop of each light-emitting structure 2 in the display substrate can be made approximately the same, thereby improving the uniformity of the brightness of the display substrate.

[0115] like Fig.10 As shown, if the display substrate adopts bilateral driving, power sources 5 are provided on both sides of the multiple first electrodes 21 arranged in an array, so the resistance of the first electrode 21 located closest to the center line OO' of the display substrate is the smallest, the resistance of the first electrodes 21 on both sides is the largest, and the resistance of the first electrodes 21 arranged along the first direction X gradually increases. Since the length of the power line 6 corresponding to the first electrodes 21 arranged along the first direction X is gradually reduced, the resistance of the corresponding voltage line is gradually reduced, so that the total resistance of each first electrode 21 arranged along the first direction X and the corresponding power line 6 is within the error range of the preset resistance value, so that under the same brightness data, the voltage drop of each light-emitting structure 2 in the display substrate can be made substantially the same, thereby improving the uniformity of the brightness of the display substrate.

[0116] It should be noted that the total resistances are all within the error range of the preset resistance value and can be regarded as being roughly the same; Fig. 9 and Fig.10 The power source 5 in the figure is only used to illustrate its relative position relationship with the plurality of first electrodes 21 .

[0117] Based on the same inventive concept, the present disclosure provides a mask, see Fig.11 and Fig.12 A schematic structural diagram of a mask provided in an embodiment of the present disclosure, the mask comprising:

[0118] A plurality of exposure structures A are arranged in an array, and the exposure structure A at least includes an exposure adjustment structure A1. In a direction Y from a central area of ​​the exposure adjustment structure A1 to an edge of the exposure adjustment structure A1, a pass rate of light passing through the exposure adjustment structure A1 gradually decreases or increases; the exposure adjustment structure A1 is used to form a concave surface of the first electrode in the display substrate as described above.

[0119] like Fig.11 As shown, the longitudinal section pattern of the exposure adjustment structure A1 can be a convex pattern, so that the exposure adjustment structure A1 can play the role of a convex lens, and then in the direction Y from the central area of ​​the exposure adjustment structure A1 to the edge of the exposure adjustment structure A1, the passing rate of light through the exposure adjustment structure A1 gradually decreases or increases, so as to form a concave surface in the area where the photoresist covered by the exposure adjustment structure A1 is located, so that the pattern of the photoresist can be transferred to the first electrode to form a first electrode with a concave surface. The longitudinal section pattern of the exposure adjustment structure A1 in the mask is set as a convex pattern, so that the concave surface of the prepared first electrode can be smoother and the curvature change continuously; the longitudinal section pattern of the exposure adjustment structure A1 can also be as follows Fig.12 In the rectangle shown, in the direction Y from the central area of ​​the exposure adjustment structure A1 to the edge of the exposure adjustment structure A1, the light transmittance of the exposure adjustment structure A1 gradually decreases, so that by controlling the light transmittance of different areas of the exposure adjustment structure A1, a concave surface is formed in the area where the photoresist covered by the exposure adjustment structure A1 is located, so that the pattern of the photoresist can be transferred to the first electrode to form a first electrode with a concave surface. In addition, this design of controlling the exposure amount provides greater flexibility for the design of the exposure adjustment structure A1 with different light transmittances, and can be quickly adjusted according to different design requirements, thereby shortening the design cycle.

[0120] See also Fig.13 and Fig.14 This is a schematic diagram of the structure of another mask provided by an embodiment of the present disclosure. The amount of light passing through the central area of ​​the exposure adjustment structure A1 is evenly distributed, so that the photoresist covered by the central area can be etched into a plane.

[0121] In the direction Y from the central area of ​​the exposure adjusting structure A1 to the edge of the exposure adjusting structure A1, the pass rate of light through the exposure adjusting structure A1 gradually decreases, and a positive photoresist is used; in the direction Y from the central area of ​​the exposure adjusting structure A1 to the edge of the exposure adjusting structure A1, the pass rate of light through the exposure adjusting structure A1 gradually increases, and a negative photoresist is used, so that a photoresist with a concave surface can be formed.

[0122] It should be noted that Fig.11 and Fig.12 The center line of the exposure adjustment structure A1 (ie, the dot-dash line shown in the figure) is regarded as the central area of ​​the exposure adjustment structure A1.

[0123] In the embodiment provided by the present invention, by pointing the exposure adjustment structure A1 in the mask in the direction Y of the edge of the exposure adjustment structure A1 from the central area of ​​the exposure adjustment structure A1, the pass rate of light passing through the exposure adjustment structure A1 is gradually reduced or increased, so that the shape of the concave surface of the first electrode can be accurately controlled, and the optical interference and blur that may occur in the traditional method can be avoided, thereby ensuring the consistency of each exposure, thereby improving the uniformity of the final product; and this mask design can realize a complex concave surface structure in one photolithography, reducing the process steps and improving the production efficiency.

[0124] See also Fig.15 and Fig.16 A schematic diagram of another mask structure provided by an embodiment of the present disclosure, an exposure adjustment structure A1, includes:

[0125] Incident surface a and exit surface b; light is incident on the exposure adjustment structure A1 from the incident surface a, and the light is exited from the exit surface b;

[0126] At least one of the incident surface a and the exit surface b has a curved surface, and the end of the curved surface close to the central area is closest to the light source (not shown) corresponding to the light, so that the light incident on the exposure adjustment structure A1 is mainly focused on the photoresist (not shown) covered by the central area.

[0127] like Fig.11 As shown, both the exit surface b and the incident surface a have curved surfaces, and the exit surface b is parallel to the incident surface a;

[0128] like Fig.15 As shown, the incident surface a is a plane, and the exit surface b has a curved surface;

[0129] like Fig.16 As shown, the incident surface a has a curved surface, and the exit surface b is a flat surface.

[0130] Figure 11-Figure 15 The corresponding mask uses positive photoresist. Fig.16The photoresist used for the corresponding mask is a negative photoresist.

[0131] In the embodiment provided by the present invention, by making at least one of the incident surface a and the exit surface b of the exposure adjustment structure A1 have a curved surface, and the end of the curved surface close to the central area is closest to the light source corresponding to the light, the exposure adjustment structure A1 can be made into a convex structure, so that a specific concave surface can be directly formed in the photoresist. This scheme can be used to more accurately design the curvature and depth of the concave surface of the first anode.

[0132] See also Fig.17 and Fig.18 A schematic diagram of the structure of another mask provided in an embodiment of the present disclosure.

[0133] like Fig.17 As shown, when the corresponding photoresist used in the mask is positive photoresist and the longitudinal section pattern of the exposure adjustment structure A1 is a convex pattern, the height of the convexities of the exposure adjustment structure A1 arranged in the first direction X gradually decreases, so that the resistance of the corresponding first electrode can be changed. Fig.17 The heights of the three exposure adjustment structures A1 arranged in the first direction are h'1, h'2, h'3, h'1 <h'2<h'3。

[0134] The corresponding photoresist used in the mask is positive photoresist, and the longitudinal section of the exposure adjustment structure A1 is rectangular. The light transmittance of the exposure adjustment structure A1 arranged in the first direction X gradually decreases, so that the resistance of the corresponding first electrode can be changed.

[0135] like Fig.18 As shown, when the corresponding photoresist used in the mask is a negative photoresist and the longitudinal section pattern of the exposure adjustment structure A1 is a convex pattern, the height of the convexities of the exposure adjustment structure A1 arranged in the first direction X gradually increases, which can change the resistance of the corresponding first electrode. Fig.18 The heights of the three exposure adjustment structures A1 arranged in the first direction are h'3, h'2, h'1, h'1 respectively. <h'2<h'3。

[0136] The corresponding photoresist used in the mask is negative photoresist, and the longitudinal section of the exposure adjustment structure A1 is rectangular. The light transmittance of the exposure adjustment structure A1 arranged in the first direction X gradually increases, which can change the resistance of the corresponding first electrode.

[0137] It should be noted that Fig.17 and Fig.18 Only one exposure adjustment structure A1 corresponding to the positive photoresist and the negative photoresist is shown in the figure. The exposure adjustment structure A1 that can be used for the positive photoresist in the present disclosure and the figure with a convex longitudinal cross-sectional figure can refer to Fig.17The exposure adjustment structure A1 that can be used for negative photoresist in the present disclosure, and the longitudinal cross-sectional pattern is a convex pattern can refer to Fig.18 The bulge height can be set by

[0138] See also Fig.19 and Fig. 20 A schematic diagram of the structure of another mask provided in an embodiment of the present disclosure.

[0139] The exposure structure A also includes a full light shielding structure A2, which surrounds the exposure adjustment structure A1; wherein, when the longitudinal section of the exposure adjustment structure A1 is a rectangle, the light transmittance of the exposure adjustment structure A1 gradually decreases in the direction from the central area of ​​the exposure adjustment structure A1 to the edge of the exposure adjustment structure A1;

[0140] The mask also includes a fully transparent structure B (area shown by dotted lines), which surrounds the exposure structure A. The fully exposed structure A can be set as an opening so that light can pass through the fully transparent structure B completely.

[0141] Fig.19 and Fig. 20 The photoresist used in the corresponding mask is a positive photoresist. By arranging a full light shielding structure A2 surrounding the exposure adjustment structure A1 in the exposure structure A, the structural stability of the concave edge of the photoresist can be increased.

[0142] See also Fig.21 and Fig. 22 A schematic diagram of the structure of another mask provided in an embodiment of the present disclosure.

[0143] The first exposure structure A also includes a full exposure structure A, and the full exposure structure A surrounds the exposure adjustment structure A1; wherein, when the longitudinal cross-sectional shape of the exposure adjustment structure A1 is a rectangle, the light transmittance of the exposure adjustment structure A1 gradually increases in the direction from the central area of ​​the exposure adjustment structure A1 to the edge of the exposure adjustment structure A1;

[0144] The mask also includes a full light-shielding structure A2, which surrounds the exposure structure A.

[0145] Fig.21 and Fig. 22 The photoresist used in the corresponding mask is a negative photoresist. By arranging a full exposure structure A surrounding the exposure adjustment structure A1 in the exposure structure A, the structural stability of the concave edge of the photoresist can be increased.

[0146] Based on the same inventive concept, the present disclosure provides a method for manufacturing a display substrate, see Fig.23 A schematic diagram of manufacturing a display substrate provided in an embodiment of the present disclosure includes:

[0147] S21: depositing a conductive layer 021 on one side of the substrate 1;

[0148] S22: forming a layer of photoresist on a side of the conductive layer 021 away from the substrate 1;

[0149] S23: placing the above mask on the side of the photoresist 9 away from the base substrate 1, and patterning the photoresist using the mask so that the side of the photoresist away from the base substrate 1 has a plurality of concave surfaces 21a1 arranged in an array;

[0150] S24: Transferring the pattern of the photoresist 9 including a plurality of concave surfaces 21a1 to the conductive layer 021 to obtain a plurality of first electrodes 21; the first surface 21a of the first electrode 21 away from the substrate 1 includes the concave surface 21a1, and the second surface 21b of the first electrode 21 close to the substrate 1 is a plane; the depth of the concave surfaces 21a1 of the first electrodes 21 arranged along the first direction X gradually increases; wherein the first direction X is a direction from one side of the array to the other side opposite to the one side of the array, and a power source (not shown) for powering the first electrodes 21 is set on the other side, or the first direction X is a direction from the center of the array to the power source (not shown), and the power source is set on one side and the other side of the array

[0151] When transferring the pattern of the photoresist 9 to the conductive layer 021, the etching rate used can be controlled between tens of nanometers and hundreds of nanometers per minute, so that thinner photoresists can be removed faster and thicker photoresists can be removed slower, so that the pattern of the first electrode 21 is consistent with that of the photoresist 9. The etching time can be within 3 to 10 minutes, so that while ensuring the removal of thicker photoresists, over-etching of the first electrode can be avoided, so that the pattern of the photoresist 9 can be accurately transferred to the first electrode.

[0152] S25 : forming a light-emitting layer 22 corresponding to each first electrode 21 on a side of the plurality of first electrodes 21 away from the base substrate 1 ; wherein the light-emitting structure 2 includes the first electrode 21 and the corresponding light-emitting layer 22 .

[0153] Fig.23 So it is adopted Fig.11 Taking the mask shown in the figure as an example to manufacture the first electrode 21, the corresponding photoresist used is a positive photoresist. When other masks are used to manufacture the first electrode 21, the manufacturing process is similar and will not be repeated here.

[0154] Based on the same inventive concept, an embodiment of the present disclosure provides a display device, which includes the display substrate as described above.

[0155] The display substrate may be a display panel; the display substrate may also be a light-emitting structure array arranged opposite to a silicon-based backplane. The arrangement of power lines corresponding to the power lines in the silicon-based backplane that provide power to the first electrode in the display substrate may refer to the arrangement of power lines in the aforementioned display substrate and will not be repeated here.

[0156] The display device can be a display device such as a monitor, a display screen, a television, or a mobile device such as a mobile phone, a tablet computer, a notebook, a personal digital assistant (PDA), a car computer, or a wearable device. The display device includes a frame, a display panel arranged in the frame, a circuit board, a display driver IC, and other electronic accessories.

[0157] The display substrate may be an organic light emitting diode (OLED) display panel, a quantum dot light emitting diode (QLED) display panel, a micro light emitting diode (Micro LED) display panel, etc., and the present disclosure does not make any specific limitation on this.

[0158] Although the preferred embodiments of the present disclosure have been described, those skilled in the art may make additional changes and modifications to these embodiments once they have learned the basic creative concept. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments and all changes and modifications falling within the scope of the present disclosure.

[0159] Obviously, those skilled in the art can make various changes and modifications to the present disclosure without departing from the spirit and scope of the present disclosure. Thus, if these modifications and variations of the present disclosure fall within the scope of the claims of the present disclosure and their equivalents, the present disclosure is also intended to include these modifications and variations.

Claims

1. A display substrate, wherein: include: substrate substrate; A plurality of light-emitting structures arranged in an array, the light-emitting structure comprising a first electrode and a light-emitting layer, the first electrode being located between the base substrate and the light-emitting layer; a first surface of the first electrode away from the base substrate comprising a concave surface, the concave surface being located in a pixel region corresponding to the light-emitting structure, and a second surface of the first electrode close to the base substrate being a plane; The concave depth of the first electrodes arranged along the first direction gradually increases; wherein the first direction is a direction from one side of the array to the other side opposite to the one side, and a power supply for powering the first electrodes is arranged on the other side, or the first direction is a direction from the center of the array to the power supply, and the power supply is arranged on one side and the other side of the array.

2. The display substrate according to claim 1, wherein: The first side includes: The concave surface and a sub-surface connected to the edge of the concave surface; The sub-surface surrounds the concave surface and is parallel to the second surface.

3. The display substrate according to claim 2, wherein: The first side also includes: A transition surface is connected between the concave surface and the sub-surface to ensure a smooth transition between the concave surface and the sub-surface.

4. The display substrate according to any one of claims 1 to 3, wherein: The concave surface comprises: The bottom surface and the side surfaces surrounding the bottom surface, the bottom surface is a plane, the side surfaces are arc surfaces, and the bottom surface and the side surfaces are smoothly transitioned.

5. The display substrate according to any one of claims 1 to 3, wherein: The longitudinal section of the concave surface comprises: A circular or elliptical arc.

6. The display substrate according to any one of claims 1 to 5, wherein: The resistance values ​​of the first resistors arranged along the first direction gradually increase.

7. The display substrate according to any one of claims 1 to 6, wherein: The roughness of the concave surface is greater than or equal to 1 nm and less than or equal to 10 nm.

8. The display substrate according to any one of claims 1 to 7, wherein: The display substrate further comprises: a driving circuit connected to the first electrode; the power supply; a power line connected between the voltage and the driving circuit; when the driving circuit drives the light-emitting structure to emit light, the power supply supplies power to the first electrode through the driving circuit and the power line; The total resistance of each first electrode and the corresponding power line is within an error range of a preset resistance value.

9. A mask, wherein: include: A plurality of exposure structures are arranged in an array, wherein the exposure structure at least includes an exposure adjustment structure, wherein a transmission rate of light passing through the exposure adjustment structure gradually decreases or increases in a direction from a central area of ​​the exposure adjustment structure to an edge of the exposure adjustment structure; the exposure adjustment structure is used to form a concave surface of a first electrode in a display substrate as described in any one of claims 1 to 8.

10. The mask according to claim 9, wherein: The exposure adjustment structure comprises: An incident surface and an exit surface; light is incident on the exposure adjustment structure from the incident surface, and the light is exited from the exit surface; At least one of the incident surface and the exit surface has a curved surface, and the end of the curved surface close to the central area is closest to the light source corresponding to the light, so that the light incident on the exposure adjustment structure is mainly focused on the photoresist covered by the central area.

11. The mask according to claim 10, wherein: The exit surface and the incident surface both have arc surfaces, and the exit surface is parallel to the incident surface; Alternatively, the incident surface is a plane, and the exit surface has a curved surface.

12. The mask according to claim 10, wherein: The incident surface has a curved surface, and the exit surface is a flat surface.

13. The mask according to claim 9, wherein: The longitudinal section of the exposure adjustment structure is a rectangle; In a direction from the central area of ​​the exposure adjustment structure to the edge of the exposure adjustment structure, the light transmittance of the exposure adjustment structure gradually decreases or increases.

14. The mask according to claim 11 or 13, wherein: The exposure structure further comprises a full light shielding structure, and the full light shielding structure surrounds the exposure adjustment structure; wherein, when the longitudinal cross-sectional shape of the exposure adjustment structure is a rectangle, the light transmittance of the exposure adjustment structure gradually decreases in the direction from the central area of ​​the exposure adjustment structure to the edge of the exposure adjustment structure; The mask also includes a fully light-transmitting structure, and the fully light-transmitting structure surrounds the exposure structure.

15. The mask according to claim 12 or 13, wherein: The first exposure structure further includes a full exposure structure, and the full exposure structure surrounds the exposure adjustment structure; wherein, when the longitudinal cross-sectional shape of the exposure adjustment structure is a rectangle, the light transmittance of the exposure adjustment structure gradually increases in the direction from the central area of ​​the exposure adjustment structure to the edge of the exposure adjustment structure; The mask also includes a full light-shielding structure, and the tube light-shielding structure surrounds the exposure structure.

16. A method for manufacturing a display substrate, wherein: include: Depositing a conductive layer on one side of the substrate; forming a layer of photoresist on a side of the conductive layer away from the substrate; Disposing a mask as claimed in any one of claims 9 to 15 on a side of the photoresist away from the substrate, and patterning the photoresist using the mask so that the side of the photoresist away from the substrate has a plurality of concave surfaces arranged in an array; Transferring the pattern of the photoresist including the plurality of concave surfaces to the conductive layer to obtain a plurality of first electrodes; the first surface of the first electrode away from the substrate substrate includes a concave surface, and the second surface of the first electrode close to the substrate substrate is a plane; the depth of the concave surfaces of the first electrodes arranged along the first direction gradually increases; wherein the first direction is a direction from one side of the array to the other side opposite to the one side, and the power supply for supplying power to the first electrodes is arranged on the other side, or the first direction is a direction from the center of the array to the power supply, and the power supply is arranged on one side and the other side of the array; A light-emitting layer corresponding to each first electrode is formed on a side of the plurality of first electrodes away from the base substrate; wherein the light-emitting structure includes the first electrodes and the corresponding light-emitting layer.

17. A display device, wherein: Comprising the display substrate as claimed in any one of claims 1 to 8.

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