Alignment detection method and device for different masks based on large glass plate

Abstract

The invention discloses an alignment detection method and device for different masks based on large-plate glass, and the method comprises the steps: setting a plurality of exposure regions on a layout of the large-plate glass, obtaining the size parameters of the plurality of exposure regions, and designing a first mask by using a second mask; extracting a first alignment coordinate design value table of the first mask used first and a second alignment coordinate design value table of the second mask used later; and according to the size parameters, calculating an alignment coordinate theoretical value table of the first mask by using the second alignment coordinate design value table, and comparing the alignment coordinate theoretical value table with the first alignment coordinate design value table to determine whether alignment marks in the first alignment coordinate design value table are compatible. According to the invention, a lot of manpower and material resources are saved, and the working efficiency is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of mask alignment detection for large plate glass, and in particular to a method and device for detecting alignment of different masks based on large plate glass. Background Art

[0002] The photolithography mask (also known as the mask, in English MaskReticle), referred to as the mask, is a graphic master used in the photolithography process commonly used in micro-nano processing technology. The mask pattern structure is formed on the transparent substrate by an opaque light-shielding film, and then the graphic information is transferred to the product substrate through the exposure process. The mask to be processed is composed of a glass / quartz substrate, a chrome layer and a photoresist layer. Its graphic structure can be obtained through plate making technology, and the commonly used processing equipment is direct writing photolithography equipment, such as laser direct writing photolithography machine, electron beam photolithography machine, etc. Masks are widely used, and masks are needed in fields involving photolithography. In the display panel industry, first, a TFT array substrate needs to be formed on a glass substrate by etching. Since the structures of the various film layers are different when forming the TFT array substrate, multiple masks are required for exposure to complete the process. Since the cost of masks is generally high, the correctness of the mask layout design in the early stage is particularly important.

[0003] When using masks in large-plate glass production, different machines need to grab different alignment marks for alignment. Therefore, during the design, the masks corresponding to different machines need to be compatible with the alignment marks of other machines to facilitate grabbing and use by other machines.

[0004] However, when used in other machines, it is necessary to confirm and check the positions and quantities of the alignment marks of all the mask plates used for the large plate glass, which is inefficient and consumes a lot of manpower and material resources. Summary of the invention

[0005] When a large glass plate of an existing display panel is subjected to multiple exposures, the positions and quantities of the alignment marks of multiple different mask plates used need to be checked and confirmed, which results in very low work efficiency and consumes a large amount of manpower and material resources.

[0006] In view of the above problems, a method and device for alignment detection of different masks based on large-plate glass are proposed. The size parameters of the exposure area on the large-plate glass are obtained by calculation, and the alignment coordinate design value tables of two different first masks and second masks are extracted. The alignment coordinate theoretical value table of the first mask is calculated according to the above size parameters, the second mask and the conversion relationship. The coordinate values ​​and quantities on the alignment coordinate design value table and the alignment coordinate theoretical value table are automatically compared to verify whether the values ​​and quantities of the compatibility alignment coordinates of the second mask are correct, which saves a lot of manpower and material resources and improves work efficiency.

[0007] In a first aspect, a method for detecting alignment of different masks based on a large plate of glass comprises: Step 100, setting a plurality of exposure areas on a layout of a large plate glass, obtaining size parameters of the plurality of exposure areas, and designing a first mask using a second mask; Step 200, extracting a first alignment coordinate design value table of the first mask used first and a second alignment coordinate design value table of the second mask used later, wherein the alignment mark in the first alignment coordinate design value table is used to be compatible with the alignment mark in the second alignment coordinate design value table to facilitate machine grabbing, and the outline size of the first mask is larger than the outline size of the second mask; Step 300: Calculate the alignment coordinate theoretical value table of the first mask according to the size parameters and using the second alignment coordinate design value table, and compare the alignment coordinate theoretical value table with the first alignment coordinate design value table to determine whether the alignment marks in the first alignment coordinate design value table are compatible.

[0008] In conjunction with the alignment detection method for different masks based on large plate glass according to the first aspect of the present invention, in a first possible implementation manner, step 100 includes: Step 110, arranging a plurality of exposure areas on the layout of the large plate glass at intervals; Step 120, calculating the lateral width and longitudinal width of the exposure area and the lateral spacing and longitudinal spacing between the exposure areas to obtain the size parameters.

[0009] In combination with the first possible implementation manner and the second possible implementation manner of the present invention, step 100 further includes: Step 130, obtaining two second mask plates; Step 140: Arrange the two masks in a transverse manner with an interval therebetween to obtain the first mask.

[0010] In combination with the second possible implementation manner and the third possible implementation manner of the present invention, step 200 includes: Step 210, taking the second exposure center of the second mask as the second coordinate origin; Step 220, setting a plurality of second alignment marks at specified positions of the second mask respectively; Step 230: Calculate the coordinate values ​​of the plurality of second alignment marks according to the second coordinate origin, and generate a second alignment coordinate design value table.

[0011] In combination with the third possible implementation manner and the fourth possible implementation manner of the present invention, step 220 includes: Step 221, setting three alignment marks at equal intervals on the left edge of the second mask; Step 222: set three alignment marks at equal intervals on the right edge of the second mask.

[0012] In combination with the fourth possible implementation manner and the fifth possible implementation manner of the present invention, step 200 further includes: Step 240, taking the first exposure center of the first mask as the first coordinate origin; Step 250, setting a plurality of first alignment marks at specified positions of the first mask respectively; Step 260: Calculate the coordinate values ​​of the plurality of first alignment marks according to the first coordinate origin, and generate a first alignment coordinate design value table.

[0013] In combination with the fifth possible implementation manner and the sixth possible implementation manner of the present invention, step 300 includes: Step 310, according to the formula: The horizontal coordinate of the second mask on the left side in the first mask = the corresponding horizontal coordinate in the second mask - horizontal width / 2 - horizontal spacing / 2, and the horizontal coordinate of the second mask on the left side in the first mask is calculated; Step 320, obtaining the ordinate corresponding to the second mask on the left side; Step 330 : Obtain the coordinates of the second mask on the left side of the first mask according to the abscissa of the first mask and the ordinate corresponding to the second mask.

[0014] In combination with the sixth possible implementation manner and the seventh possible implementation manner of the present invention, step 300 further includes: Step 340, according to the formula: The horizontal coordinate of the second mask on the right side of the first mask = the corresponding horizontal coordinate in the second mask + horizontal width / 2 + horizontal spacing / 2, and the horizontal coordinate of the second mask on the right side of the first mask is calculated; Step 350, obtaining the ordinate corresponding to the second mask on the right side; Step 360: Obtain the coordinates of the second mask on the right side of the first mask according to the abscissa of the first mask and the ordinate corresponding to the second mask.

[0015] In a second aspect, a device for detecting alignment of different masks based on large plate glass comprises: An acquisition module is used to set a plurality of exposure areas on a layout of a large plate glass, obtain size parameters of the plurality of exposure areas, and design a first mask using a second mask; An extraction module is used to extract a first alignment coordinate design value table of the first mask used first and a second alignment coordinate design value table of the second mask used later, wherein the alignment mark in the first alignment coordinate design value table is used to be compatible with the alignment mark in the second alignment coordinate design value table to facilitate machine grabbing, and the outline size of the first mask is larger than the outline size of the second mask; A verification module is used to calculate the alignment coordinate theoretical value table of the first mask according to the size parameters and using the second alignment coordinate design value table, and compare the alignment coordinate theoretical value table with the first alignment coordinate design value table to determine whether the alignment marks in the first alignment coordinate design value table are compatible.

[0016] In conjunction with the alignment detection device for different masks based on large plate glass according to the second aspect of the present invention, in a first possible implementation manner, the acquisition module includes: A first acquisition unit is used to arrange multiple exposure areas on the layout of the large plate glass at intervals to acquire the layout of the large plate glass; A calculation unit, used for calculating the lateral width and longitudinal width of the exposure area and the lateral interval and longitudinal interval between the exposure areas to obtain the size parameters; The second acquisition unit is used to use two second mask plates to arrange the two mask plates in a horizontal manner with an interval therebetween to acquire the first mask plate.

[0017] The method and device for detecting alignment of different masks based on large glass plates described in the present invention are implemented. By calculating and acquiring the size parameters of the exposure area on the large glass plate, the alignment coordinate design value tables of two different first masks and second masks are extracted, and the alignment coordinate theoretical value table of the first mask is calculated according to the above size parameters, the second mask and the conversion relationship. The coordinate values ​​and quantities on the alignment coordinate design value table and the alignment coordinate theoretical value table are automatically compared to verify whether the values ​​and quantities of the compatibility alignment coordinates of the second mask plate are correct, thereby saving a lot of manpower and material resources and improving work efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0019] Figure 1 It is a schematic diagram of the exposure area layout of the large plate glass in this application; Figure 2 is a schematic structural diagram of the first mask in this application; Figure 3 is a schematic structural diagram of the second mask in this application; Figure 4 is a second alignment coordinate design value table of the second mask in this application; Figure 5 is a first alignment coordinate design value table of the first mask in this application; Figure 6 is a table of theoretical values ​​of alignment coordinates of the first mask in this application; Figure 7 This is a schematic flow chart of a first specific embodiment of a method for detecting alignment of different masks based on large plate glass in the present application; Figure 8 yes Figure 7 A schematic flow chart of a specific embodiment of step 100; Fig. 9 yes Figure 8 A schematic flow chart of a specific embodiment after step 120; Fig.10 yes Figure 7 A schematic flow chart of a specific embodiment of step 200; Fig.11 yes Fig.10 A schematic flow chart of a specific embodiment of step 220; Fig.12 yes Fig.10 A schematic flow chart of a specific embodiment after step 230; Fig.13 yes Figure 7 A schematic flow chart of a specific embodiment of step 300; Fig.14 yes Fig.13 A schematic flow chart of a specific embodiment after step 330; Fig.15 It is a structural schematic diagram of a device for detecting alignment of different masks based on large plate glass in the present application. DETAILED DESCRIPTION

[0020] The following will be combined with the accompanying drawings in the invention to clearly and completely describe the technical solutions in the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments in the present invention, other embodiments obtained by ordinary technicians in this field without creative work are all within the scope of protection of the present invention.

[0021] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art of the present invention. The terms used herein in the specification of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention. The term "and / or" used herein includes any and all combinations of one or more related listed items.

[0022] It should be noted that when an element is referred to as being "fixed to" or "disposed on" another element, it can be directly on the other element or indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or indirectly connected to the other element.

[0023] It should be understood that the orientation or position relationship indicated by terms such as "length", "width", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside" and "outside" are based on the orientation or position relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0024] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of the features. In the description of this application, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0025] When a large glass plate of an existing display panel is subjected to multiple exposures, the positions and quantities of the alignment marks of multiple different mask plates used need to be checked and confirmed, which results in very low work efficiency and consumes a large amount of manpower and material resources.

[0026] In view of the above problems, a method and device for detecting the alignment of different masks based on large plate glass are proposed.

[0027] In the first aspect, a method for detecting the alignment of different masks based on large plate glass is provided. Figure 7 , Figure 7 This is a schematic flow chart of a first specific embodiment of a method for detecting alignment of different masks based on large plate glass in the present application, including: Step 100: setting a plurality of exposure areas on a layout of a large plate of glass, obtaining size parameters of the plurality of exposure areas, and designing a first mask using a second mask.

[0028] In the embodiments of the present application, Figure 1 , Figure 1 It is a schematic diagram of the exposure area layout of the large plate glass in this application; it is aimed at the situation where the large plate glass has multiple exposure areas and two or even more different masks are needed to complete the array substrate structure. Preferably, as Figure 8 , Figure 8 yes Figure 7 A flow chart of a specific embodiment of step 100 in the figure; step 100 includes: step 110, setting multiple exposure areas on a layout of a large plate glass at intervals from each other; step 120, calculating the lateral width and longitudinal width of the exposure area and the lateral spacing and longitudinal spacing between the exposure areas to obtain size parameters.

[0029] In this embodiment, the size parameters may be used to calculate a table of alignment mark coordinate values ​​that indicates that the first mask is compatible with the second mask.

[0030] In the embodiment of the present application, the size parameters of the first mask and the second mask are different, such as Fig. 9 , Fig. 9 yes Figure 8 A schematic flow chart of a specific embodiment after step 120 in FIG. 1 ; step 100 further includes: step 130, obtaining two second mask plates; step 140, arranging the two mask plates laterally at intervals to obtain a first mask plate.

[0031] In the embodiments of the present application, Figure 2 , Figure 2 It is a structural schematic diagram of the first mask in the present application; the first mask is a mask that is used first in sequence. First, the first mask is used for exposure to obtain the exposure pattern of the corresponding film layer, and then the second mask is used for exposure to obtain the exposure pattern of the next film layer. However, due to the different size parameters of the first mask and the second mask, different machines need to grab different alignment marks for alignment when the masks are used in production. Therefore, when designing, the masks corresponding to different machines need to be compatible with the alignment marks of the masks of other machines. In this embodiment, when designing the alignment mark of the first mask, it is necessary to be compatible with the alignment mark of the second mask, that is, according to the parameters of the exposure area on the large plate glass and the alignment mark design value table of the second mask, the alignment mark coordinate value table of the first mask is converted.

[0032] Figure 1It is a layout diagram of large-plate glass, where the horizontal spacing Sx is the spacing between left and right adjacent exposure area Shots, the vertical spacing Sy is the spacing between upper and lower adjacent exposure area Shots, the horizontal width Px is the width of a single exposure area Shot in the x direction, and the vertical width Py is the width of a single exposure area Shot in the y direction; A1 / A2 / A3 / A4 / A5 / A6 in the second mask are schematic diagrams of the positions of the alignment marks required for the mask when in use; B1 / B2 / B3 / B4 / B5 / B6 / B11 / B22 / B33 / B44 / B55 / B66 in the first mask are schematic diagrams of the positions of the alignment marks required for the first mask A in the second mask B.

[0033] For mask A, four exposures are required to achieve effective graphics in all positions of the large plate, namely, exposure area Shot1→exposure area Shot2→exposure area Shot3→exposure area Shot4; for mask B, only two exposures are required, namely (exposure area Shot1+exposure area Shot2)→(exposure area Shot3+exposure area Shot4).

[0034] After using mask B to obtain the current layer pattern, if the subsequent film layer needs to use mask A, the position mark required by mask A is required at the shot position of the exposure area. Therefore, when designing mask B, it is necessary to design a compatible mask A position mark at the same time.

[0035] Step 200, extracting the first alignment coordinate design value table of the first mask used first and the second alignment coordinate design value table of the second mask used later, wherein the alignment mark in the first alignment coordinate design value table is used to be compatible with the alignment mark in the second alignment coordinate design value table to facilitate machine grabbing, and the outline size of the first mask is larger than the outline size of the second mask.

[0036] like Fig.10 , Fig.10 yes Figure 7 A flow chart of a specific embodiment of step 200; preferably, as Figure 3 , Figure 3 is a schematic diagram of the structure of the second mask in the present application; step 200 includes: step 210, taking the second exposure center of the second mask as the second coordinate origin (0,0); step 220, setting a plurality of second alignment marks (A1 / A2 / A3 / A4 / A5 / A6) at the specified positions of the second mask respectively; step 230, calculating the coordinate values ​​of the plurality of second alignment marks (A1 / A2 / A3 / A4 / A5 / A6) according to the second coordinate origin (0,0), and generating a second alignment coordinate design value table, such as Figure 4 , Figure 4 It is a second alignment coordinate design value table of the second mask in this application.

[0037] Preferably, if Fig.11 , Fig.11 yes Fig.10 A flow chart of a specific embodiment of step 220 in FIG. 2 ; step 220 includes: step 221, setting three alignment marks at equal intervals on the left edge of the second mask; step 222, setting three alignment marks at equal intervals on the right edge of the second mask. In this embodiment, six alignment marks are designed on the second mask, which are respectively at the four corners and the midpoints of the two side frames. When the second mask is implemented as a rectangular pattern, the center of the rectangular pattern can be used as the coordinate origin (0,0) for reading and calculation.

[0038] like Fig.12 , Fig.12 yes Fig.10 A schematic diagram of a specific embodiment flow chart after step 230 in FIG. 1 ; preferably, as Figure 5 , Figure 5 It is the first alignment coordinate design value table of the first mask in the present application; step 200 also includes: step 240, taking the first exposure center of the first mask as the first coordinate origin (0,0); step 250, setting multiple first alignment marks (B1 / B2 / B3 / B4 / B5 / B6 / B11 / B22 / B33 / B44 / B55 / B66) at the specified positions of the first mask respectively; step 260, according to the first coordinate origin (0,0), calculating the coordinate values ​​of multiple first alignment marks (B1 / B2 / B3 / B4 / B5 / B6 / B11 / B22 / B33 / B44 / B55 / B66), and generating a first alignment coordinate design value table.

[0039] In this embodiment, the first mask is formed by two second masks arranged at regular intervals, and thus has twelve alignment marks.

[0040] In this embodiment, the second alignment coordinate design value table is read by algorithm calculation. By determining its coordinate origin (0,0), the coordinate value of each alignment mark can be read to generate the second alignment coordinate design value table.

[0041] Step 300: Calculate the theoretical value table of the alignment coordinates of the first mask according to the size parameters and using the second alignment coordinate design value table, such as Figure 6 , Figure 6 It is the alignment coordinate theoretical value table of the first mask in the present application. The alignment coordinate theoretical value table is compared with the first alignment coordinate design value table to determine whether the alignment marks in the first alignment coordinate design value table are compatible.

[0042] Preferably, if Fig.13 , Fig.13 yes Figure 7A flowchart of a specific embodiment of step 300 in the embodiment; step 300 includes: step 310, according to the formula: the horizontal coordinate of the second mask on the left side in the first mask (referring to the horizontal coordinate corresponding to the alignment mark B1 / B2 / B3 / B4 / B5 / B6) = the corresponding horizontal coordinate in the second mask - horizontal width / 2-horizontal spacing / 2, calculate the horizontal coordinate of the second mask on the left side in the first mask; step 320, obtain the vertical coordinate corresponding to the second mask on the left side; step 330, according to the horizontal coordinate of the first mask and the vertical coordinate mark corresponding to the second mask, obtain the coordinate of the second mask on the left side in the first mask.

[0043] Preferably, if Fig.14 , Fig.14 yes Fig.13 A flowchart of a specific embodiment after step 330 in the figure; step 300 also includes: step 340, according to the formula: the horizontal coordinate of the second mask on the right side in the first mask (referring to the horizontal coordinate corresponding to the alignment mark B11 / B22 / B33 / B44 / B55 / B66) = the corresponding horizontal coordinate in the second mask + horizontal width / 2+horizontal spacing / 2, calculate the horizontal coordinate of the second mask on the right side in the first mask; step 350, obtain the vertical coordinate corresponding to the second mask on the right side; step 360, according to the horizontal coordinate of the first mask and the vertical coordinate mark corresponding to the second mask, obtain the coordinate of the second mask on the right side in the first mask. By calculating and obtaining the size parameters of the exposure area on the large glass plate, the alignment coordinate design value tables of two different first and second mask plates are extracted, and the alignment coordinate theoretical value table of the first mask is calculated according to the above size parameters, the second mask plate and the conversion relationship. The coordinate values ​​and quantities on the alignment coordinate design value table and the alignment coordinate theoretical value table are automatically compared to verify whether the values ​​and quantities of the compatibility alignment coordinates of the second mask plate are correct, which saves a lot of manpower and material resources and improves work efficiency.

[0044] In the second aspect, a device for detecting the alignment of different masks based on large plate glass, such as Fig.15 , Fig.15 This is a schematic diagram of the structure of a device for detecting alignment of different masks based on large glass in this application. It includes: An acquisition module 401 is used to set a plurality of exposure areas on a layout of a large plate glass, obtain size parameters of the plurality of exposure areas, and design a first mask using a second mask; The extraction module 402 is used to extract the first alignment coordinate design value table of the first mask used first and the second alignment coordinate design value table of the second mask used later, wherein the alignment mark in the first alignment coordinate design value table is used to be compatible with the alignment mark in the second alignment coordinate design value table to facilitate machine grabbing, and the outline size of the first mask is larger than the outline size of the second mask; The checking module 403 is used to calculate the alignment coordinate theoretical value table of the first mask according to the size parameters and using the second alignment coordinate design value table, and compare the alignment coordinate theoretical value table with the first alignment coordinate design value table to determine whether the alignment marks in the first alignment coordinate design value table are compatible.

[0045] Furthermore, the acquisition module includes a first acquisition unit, which is used to arrange multiple exposure areas at intervals from each other on the layout of the large glass plate to obtain the layout of the large glass plate; a calculation unit, which is used to calculate the horizontal width, vertical width of the exposure area and the horizontal and vertical intervals between the exposure areas to obtain size parameters; and a second acquisition unit, which is used to use two second mask plates to arrange the two mask plates at intervals from each other to obtain the first mask plate.

[0046] The present invention implements a method and device for detecting alignment of different masks based on large-plate glass. By calculating and acquiring the size parameters of the exposure area on the large-plate glass, the alignment coordinate design value tables of two different first masks and second masks are extracted, and the alignment coordinate theoretical value table of the first mask is calculated according to the above-mentioned size parameters, the second mask and the conversion relationship. The coordinate values ​​and quantities on the alignment coordinate design value table and the alignment coordinate theoretical value table are automatically compared to verify whether the values ​​and quantities of the compatibility alignment coordinates of the second mask are correct, thereby saving a lot of manpower and material resources and improving work efficiency.

[0047] The above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A method for detecting the alignment of different masks based on large plate glass, characterized in that: include: Step 100, setting a plurality of exposure areas on a layout of a large plate glass, obtaining size parameters of the plurality of exposure areas, and designing a first mask using a second mask; Step 200, extracting a first alignment coordinate design value table of the first mask used first and a second alignment coordinate design value table of the second mask used later, wherein the alignment mark in the first alignment coordinate design value table is used to be compatible with the alignment mark in the second alignment coordinate design value table to facilitate machine grabbing, and the outline size of the first mask is larger than the outline size of the second mask; Step 300: Calculate the alignment coordinate theoretical value table of the first mask according to the size parameters and using the second alignment coordinate design value table, and compare the alignment coordinate theoretical value table with the first alignment coordinate design value table to determine whether the alignment marks in the first alignment coordinate design value table are compatible.

2. The alignment detection method of different masks based on large plate glass according to claim 1, characterized in that: The step 100 comprises: Step 110, arranging a plurality of exposure areas on the layout of the large plate glass at intervals; Step 120, calculating the lateral width and longitudinal width of the exposure area and the lateral spacing and longitudinal spacing between the exposure areas to obtain the size parameters.

3. The alignment detection method of different masks based on large plate glass according to claim 2, characterized in that: The step 100 further includes: Step 130, obtaining two second mask plates; Step 140: Arrange the two masks in a transverse manner with an interval therebetween to obtain the first mask.

4. The alignment detection method of different masks based on large plate glass according to claim 3 is characterized in that: The step 200 comprises: Step 210, taking the second exposure center of the second mask as the second coordinate origin; Step 220, setting a plurality of second alignment marks at specified positions of the second mask respectively; Step 230: Calculate the coordinate values ​​of the plurality of second alignment marks according to the second coordinate origin, and generate a second alignment coordinate design value table.

5. The alignment detection method of different masks based on large plate glass according to claim 4, characterized in that: The step 220 includes: Step 221, setting three alignment marks at equal intervals on the left edge of the second mask; Step 222: set three alignment marks at equal intervals on the right edge of the second mask.

6. The alignment detection method of different masks based on large plate glass according to claim 5, characterized in that: The step 200 further includes: Step 240, taking the first exposure center of the first mask as the first coordinate origin; Step 250, setting a plurality of first alignment marks at specified positions of the first mask respectively; Step 260: Calculate the coordinate values ​​of the plurality of first alignment marks according to the first coordinate origin, and generate a first alignment coordinate design value table.

7. The alignment detection method of different masks based on large plate glass according to claim 6, characterized in that: The step 300 includes: Step 310, according to the formula: the horizontal coordinate of the second mask on the left side in the first mask = the corresponding horizontal coordinate in the second mask - horizontal width / 2 - horizontal spacing / 2, calculate the horizontal coordinate of the second mask on the left side in the first mask; Step 320, obtaining the vertical coordinate corresponding to the second mask on the left side; Step 330 : Obtain the coordinates of the second mask on the left side of the first mask according to the abscissa of the first mask and the ordinate corresponding to the second mask.

8. The alignment detection method of different masks based on large plate glass according to claim 7, characterized in that: The step 300 further includes: Step 340, according to the formula: the horizontal coordinate of the second mask on the right side in the first mask = the corresponding horizontal coordinate in the second mask + horizontal width / 2 + horizontal spacing / 2, calculate the horizontal coordinate of the second mask on the right side in the first mask; Step 350, obtaining the ordinate corresponding to the second mask on the right side; Step 360: Obtain the coordinates of the second mask on the right side of the first mask according to the abscissa of the first mask and the ordinate corresponding to the second mask.

9. A device for detecting the alignment of different masks based on large plate glass, characterized in that: include: An acquisition module is used to set a plurality of exposure areas on a layout of a large plate glass, obtain size parameters of the plurality of exposure areas, and design a first mask using a second mask; An extraction module is used to extract a first alignment coordinate design value table of the first mask used first and a second alignment coordinate design value table of the second mask used later, wherein the alignment mark in the first alignment coordinate design value table is used to be compatible with the alignment mark in the second alignment coordinate design value table to facilitate machine grabbing, and the outline size of the first mask is larger than the outline size of the second mask; A verification module is used to calculate the alignment coordinate theoretical value table of the first mask according to the size parameters and using the second alignment coordinate design value table, and compare the alignment coordinate theoretical value table with the first alignment coordinate design value table to determine whether the alignment marks in the first alignment coordinate design value table are compatible.

10. The alignment detection device for different masks based on large plate glass according to claim 9, characterized in that: The acquisition module comprises: A first acquisition unit is used to arrange multiple exposure areas on the layout of the large plate glass at intervals to acquire the layout of the large plate glass; A calculation unit, used for calculating the lateral width and longitudinal width of the exposure area and the lateral interval and longitudinal interval between the exposure areas to obtain the size parameters; The second acquisition unit is used to use two second mask plates to arrange the two mask plates in a horizontal manner with an interval therebetween to acquire the first mask plate.

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