Ultrahigh dose rate electron beam dose control systems, methods, and related devices

Abstract

The invention discloses an ultrahigh-dose-rate electron beam dose control system and method and related equipment, and relates to the technical field of electron linear accelerators, and the system comprises a pulse generation module which is used for generating a pulse beam; the pulse monitoring module is used for monitoring the number of pulse beams and transmitting the number to the dose control module; the pulse beam sampling module is used for collecting the pulse beam dose and transmitting the pulse beam dose to the dose control module; the dosage control module is used for performing beam output control on the pulse beams according to the number of the pulse beams, the dosage of the pulse beams and a dosage scheme, and setting the dosage scheme through a dosage scheme setting module; by using pulse generation, independent monitoring, sampling and interrupting circuits, and dynamically adjusting the dose scheme and directly controlling the outgoing beam through the dose scheme, dose control accuracy and reliability at very high dose rates are ensured while providing higher safety and operational flexibility.

Description

Technical Field

[0001] The present invention relates to the technical field of electron linear accelerators, and in particular to an ultra-high dose rate electron beam dose control system, method and related equipment. Background Art

[0002] In the field of radiotherapy, ensuring the accuracy of treatment is always the top priority. Although precision radiotherapy technology has been widely used, it still faces a bottleneck, that is, it is limited by the normal tissue tolerance dose and it is difficult to achieve the best effect of tumor treatment. Flash radiotherapy (Flash-RT), as an emerging technology, uses ultra-high dose rate beams (UHDR) for irradiation, which is expected to significantly reduce radiation damage to normal tissues while maximizing the goal of tumor treatment.

[0003] At present, the dose rate used in conventional accelerator radiotherapy is generally 600cGy / min (i.e. 0.1Gy / s), and the dose sampling monitoring and interruption control are mainly carried out by ionization chambers. However, the dose rate of flash radiotherapy is much higher than this, up to more than 40Gy / s, which is hundreds of times the dose rate of ordinary treatment. During this treatment process, the dose is usually around 10 to 12Gy, and the beam time is extremely short, only a few tenths of a second. This results in a huge number of ion pairs generated per unit time in such a short period of time.

[0004] The accumulation of a large number of ions has caused a series of problems. On the one hand, the newly generated ion pairs are too dense, and the positive ions and electrons may recombine before reaching the electrode, resulting in a reduction in the amount of collected charge, which in turn makes the reading lower than the actual dose. On the other hand, the accumulation of a large number of ions in the ionization chamber changes the electric field distribution inside the ionization chamber and affects the migration path and speed of the ions to the electrode, which not only further reduces the collection efficiency, but may also cause nonlinear response characteristics, making the output current of the ionization chamber no longer proportional to the incident radiation dose. Ultimately, the flat-plate ionization chamber used in general accelerators cannot achieve linear response at ultra-high dose rates. After reaching the upper limit, its output current no longer increases with the increase of dose rate, that is, the current signal saturation phenomenon occurs, so it cannot be used for dose rate monitoring of ultra-high dose rate rays. Summary of the invention

[0005] Based on the above problems, the present invention provides an ultra-high dose rate electron beam dose control system, method and related equipment, which ensures the dose control accuracy and reliability at extremely high dose rates by using pulse generation, independent monitoring, sampling and interruption circuits, and dynamically adjusting the dose scheme and directly controlling the beam through the dose scheme, while providing higher safety and operational flexibility.

[0006] The purpose of the present invention is achieved by the following technical solutions:

[0007] In a first aspect, the present invention provides an ultra-high dose rate electron beam dose control system, the system comprising:

[0008] A pulse generating module, used for generating a pulse beam;

[0009] A pulse monitoring module, used for monitoring the number of pulse beams and transmitting the number to a dose control module;

[0010] A pulse beam sampling module, used for collecting pulse beam dose and transmitting it to the dose control module;

[0011] The dose control module is used to control the pulsed beam according to the number of pulsed beams, the pulsed beam dose and the dose scheme, wherein the beam control includes controlling the beam pulse period, frequency and pulse dose, and stopping the beam; wherein the dose scheme is set by the dose scheme setting module.

[0012] Preferably, the pulse generation module includes a high-voltage pulse modulator and an electron gun pulse beam modulator; the high-voltage pulse modulator generates pulsed high voltage, and the microwave source outputs pulse microwaves according to the pulsed high voltage; the electron gun pulse beam modulator is used to generate a pulsed electron beam;

[0013] The pulse monitoring module includes a first pulse monitoring unit and a second pulse monitoring unit, the first pulse monitoring unit is connected to the high voltage pulse modulator, and the second pulse monitoring unit is connected to the electron gun pulse beam modulator;

[0014] The first pulse monitoring unit and the second pulse monitoring unit synchronously sample the number of the pulse beams;

[0015] The pulse beam sampling module is synchronized with the pulse monitoring unit to perform pulse beam dose sampling.

[0016] Preferably, the system further comprises an interrupt circuit, the interrupt circuit comprising a first interrupt circuit and a second interrupt circuit; the first interrupt circuit is connected to the high voltage pulse modulator; the second interrupt circuit is connected to the electron gun pulse beam modulator;

[0017] The interruption circuit is used to synchronously interrupt the pulse beam modulator and the high-voltage pulse modulator of the electron gun to stop beam emission.

[0018] Preferably, the dose control module receives the pulse monitoring module signal and the pulse beam sampling signal, processes the pulse monitoring module signal and the pulse beam sampling signal, converts the electrical signal into a digital signal, and thus obtains the beam dose; the dose control module receives the dose scheme of the dose scheme setting module, and controls the beam dose according to the dose scheme; if the actual accumulated beam dose reaches the preset dose, an interrupt signal is sent to the interrupt circuit.

[0019] Preferably, the dosage scheme includes a pulse dose, a number of output pulses, and a pulse frequency; and the method for obtaining the dosage scheme includes:

[0020] Determine the number of pulses by presetting the dose and pulse dose;

[0021] According to the number of pulses, it is determined whether to directly output the dosage scheme, or to perform pulse adjustment and output an incomplete dynamic dosage scheme. The pulse adjustment includes a first adjustment and a second adjustment. The first adjustment is to adjust the pulse dose; the second adjustment is to adjust the pulse frequency.

[0022] Preferably, determining whether to directly output the dosage scheme, or to perform pulse adjustment and output an incomplete dynamic dosage scheme according to the number of pulses comprises:

[0023] If the number of pulses is an integer, the dosage regimen is directly output;

[0024] If the number of pulses is not an integer, a first adjustment is made to make the number of pulses an integer, and it is determined whether the average dose rate meets the target dose rate range; based on the determination result, it is determined whether to directly output the first adjusted dose scheme or continue to adjust the pulse setting, wherein the average dose rate is the product of the pulse dose and the pulse frequency.

[0025] Preferably, the step of determining whether to directly output the first adjusted dosage regimen or continue to adjust the pulse setting according to the determination result comprises:

[0026] If the average dose rate satisfies the target dose rate range, outputting a first adjusted dose regimen;

[0027] If the average dose rate does not meet the target dose rate range, a second adjustment is performed to make the number of pulses an integer, and it is determined again whether the average dose rate meets the target dose rate range; if so, a second adjusted dose plan is output;

[0028] If not, an incomplete dynamic dosage regimen is output.

[0029] Preferably, the incomplete dynamic dosage regimen comprises:

[0030] By the second adjustment, a second adjusted pulse number N2 is obtained;

[0031] Output the first N2-1 pulse beams according to the pulse dose adjusted for the second time;

[0032] The N2th pulse dose is dynamically adjusted so that the N2th pulse dose is the difference between the preset dose and the total dose of the first N2-1 pulse beams.

[0033] In a second aspect, the present invention provides an ultra-high dose rate electron beam dose control method, the method comprising:

[0034] Obtaining a dosage regimen by presetting a dosage; the dosage regimen includes a pulse dosage, a number of output pulses, and a pulse frequency;

[0035] According to the dosage scheme, the pulsed beam is controlled by a dosage control unit, and the beam control includes controlling the pulse period, frequency and pulse dosage of the beam, and stopping the beam.

[0036] Preferably, the step of obtaining a dosage regimen by presetting a dosage comprises:

[0037] Determine the number of pulses by presetting the dose and pulse dose;

[0038] According to the number of pulses, it is determined whether to directly output the dosage scheme, or to perform pulse adjustment and output an incomplete dynamic dosage scheme. The pulse adjustment includes a first adjustment and a second adjustment. The first adjustment is to adjust the pulse dose; the second adjustment is to adjust the pulse frequency.

[0039] Preferably, the step of determining whether to directly output the dosage regimen, or to perform pulse adjustment and output an incomplete dynamic dosage regimen according to the number of pulses comprises:

[0040] If the number of pulses is an integer, the dosage regimen is directly output;

[0041] If the number of pulses is not an integer, a first adjustment is made to make the number of pulses an integer, and it is determined whether the average dose rate meets the target dose rate range; based on the determination result, it is determined whether to directly output the first adjusted dose scheme or continue to adjust the pulse setting, wherein the average dose rate is the product of the pulse dose and the pulse frequency.

[0042] Preferably, the step of determining whether to directly output the first adjusted dosage regimen or continue to adjust the pulse setting according to the determination result comprises:

[0043] If the average dose rate satisfies the target dose rate range, outputting a first adjusted dose regimen;

[0044] If the average dose rate does not meet the target dose rate range, a second adjustment is performed to make the number of pulses an integer, and it is determined again whether the average dose rate meets the target dose rate range; if so, a second adjusted dose plan is output;

[0045] If not, an incomplete dynamic dosage regimen is output.

[0046] Preferably, the incomplete dynamic dosage regimen comprises:

[0047] By the second adjustment, a second adjusted pulse number N2 is obtained;

[0048] Output the first N2-1 pulse beams according to the pulse dose adjusted for the second time;

[0049] The N2th pulse dose is dynamically adjusted so that the N2th pulse dose is the difference between the preset dose and the total dose of the first N2-1 pulse beams.

[0050] In a third aspect, the present invention provides a treatment system, the system comprising:

[0051] Radiotherapy devices, used to deliver radiation therapy to patients according to treatment plans;

[0052] Any ultra-high dose rate electron beam dose control system of the present invention is used to control the particle beam dose of radiotherapy.

[0053] In a fourth aspect, the present invention provides an electronic device, comprising a memory and a processor, wherein the memory stores a computer program, and the processor implements the steps of the aforementioned method of the present invention or the functions of the apparatus of the present invention when executing the computer program.

[0054] In a fifth aspect, the present invention provides a computer-readable storage medium, wherein the storage medium stores computer instructions. When a computer reads the computer instructions, the computer executes the steps of the aforementioned method of the present invention.

[0055] Compared with the prior art, the beneficial effects of the present invention include at least: the present invention uses a dose scheme module to accurately divide the preset dose, and provides two output modes: a conventional dose scheme and an incomplete dynamic adjustment scheme; not only does it make the dose distribution more flexible, but it also adjusts the dose output according to the actual situation, ensuring that the dose control during the treatment process is both reliable and stable. During the dose output process, the output dose of the medical accelerator is monitored in real time by the dose detection unit and compared with the cumulative pulse dose. If necessary, the system can dynamically adjust the final pulse dose (Dplast) to ensure that the total dose reaches the preset value accurately. This mechanism improves the accuracy of dose measurement and the reliability of the system. The interrupt circuit of the electron gun pulse beam modulator and the interrupt circuit of the high-voltage pulse modulator work independently, and the two are isolated from each other and will not affect each other. At the same time, the two separate monitoring systems work synchronously, providing an additional layer of safety protection and enhancing the safety of the entire system. The interrupt circuit uses high-speed optical coupling technology, which can perform switching operations at a speed of up to 1Mbit / s, and its response time can be as short as 1 microsecond (μs). This high-speed response characteristic ensures that the system can respond quickly when it is necessary to stop the beam immediately, thereby further improving the safety and reliability of the system. The required number of pulses can be automatically calculated based on the preset dose, and necessary adjustments can be made based on whether the actual number of pulses is an integer. If the average dose rate does not meet the target range, it will continue to adjust until it meets the requirements or adopt an incomplete dynamic dose plan, ensuring the flexibility and adaptability of the treatment plan. BRIEF DESCRIPTION OF THE DRAWINGS

[0056] Figure 1 2 is a schematic diagram of the structure of an ultra-high dose rate electronic beam dose control system according to an embodiment of the present invention;

[0057] Figure 2 1 is a schematic diagram of the working process of an ultra-high dose rate electron beam dose control system according to an embodiment of the present invention;

[0058] Figure 3 is a schematic diagram of an ultra-high dose rate electron beam dose control method according to an embodiment of the present invention;

[0059] Figure 4 It is a schematic flow chart of an ultra-high dose rate electron beam dose control method according to an embodiment of the present invention. DETAILED DESCRIPTION

[0060] Example embodiments will now be described more fully with reference to the accompanying drawings. However, example embodiments can be implemented in a variety of forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided to make the present invention more comprehensive and complete and to fully convey the concepts of example embodiments to those skilled in the art. The same reference numerals in the figures represent the same or similar structures, and thus their repeated description will be omitted.

[0061] The words expressing positions and directions described in the present invention are all explained with reference to the accompanying drawings as examples, but they can be changed as needed, and all such changes are included in the protection scope of the present invention.

[0062] See attached Figure 1 Some embodiments of the present invention provide a schematic diagram of an ultra-high dose rate electron beam dose control system, the system comprising:

[0063] A pulse generating module, used for generating a pulse beam;

[0064] A pulse monitoring module, used for monitoring the number of pulse beams and transmitting the number to a dose control module;

[0065] A pulse beam sampling module, used for collecting pulse beam dose and transmitting it to the dose control module;

[0066] The dose control module is used to control the pulse beam according to the number of pulse beams, the pulse beam dose and the dose scheme, wherein the beam control includes controlling the beam pulse period, frequency and pulse dose, and stopping the beam; wherein the dose scheme is set by the dose scheme setting module (dose scheme CPU).

[0067] The working principle of the above technical solution is as follows: the pulse generation module is the source of the pulse beam generated by the system, which starts the entire dose control process. The pulse monitoring module closely tracks the pulse beam generated by the pulse generation module, monitors the number of pulse beams in real time, and accurately counts each generated pulse beam. The monitored pulse beam quantity information will be transmitted to the dose control module in a timely manner, providing key data support for the dose control module to perform subsequent beam control.

[0068] The pulse beam sampling module collects the dose carried by each pulse beam during the generation and transmission of the pulse beam. The module uses a specific detector or sampling device to measure the dose of the pulse beam passing through at a certain time interval or trigger mechanism. The collected pulse beam dose data will also be transmitted to the dose control module as an important basis for the dose control module to judge and adjust the beam output situation. The dose control module is the core decision-making unit of the entire system. It receives the pulse beam quantity information from the pulse monitoring module, the pulse beam dose information from the pulse beam sampling module, and the dose scheme pre-set by the dose scheme setting module. The dose control module controls the pulse beam output based on these input information. Specifically, it can compare and analyze the actual number and dose of pulse beams with the target value in the dose scheme; if it is found that the actual situation deviates from the dose scheme, the dose control module will change the number and dose of pulse beams output per unit time by adjusting the period and frequency of the pulse beam to make it closer to the target set by the dose scheme. For example, when the actual dose is lower than the target dose, the frequency of the pulse beam may be appropriately increased to increase the dose output per unit time; conversely, when the actual dose is too high, the frequency is reduced. When the actual accumulated pulse beam dose reaches the target dose set by the dose plan, the dose control module will issue a command to stop beam output to ensure that the output dose accurately meets the preset requirements, thereby achieving precise control of the ultra-high dose rate electron beam dose.

[0069] In some embodiments, the pulse generation module includes a high-voltage pulse modulator and an electron gun pulse beam modulator; the high-voltage pulse modulator generates pulsed high voltage, and the microwave source outputs pulse microwaves according to the pulsed high voltage; the electron gun pulse beam modulator is used to generate a pulsed electron beam;

[0070] The pulse monitoring module includes a first pulse monitoring unit and a second pulse monitoring unit, the first pulse monitoring unit is connected to the high voltage pulse modulator, and the second pulse monitoring unit is connected to the electron gun pulse beam modulator;

[0071] The first pulse monitoring unit and the second pulse monitoring unit synchronously sample the number of the pulse beams;

[0072] The pulse beam sampling module is synchronized with the pulse monitoring unit to perform pulse beam dose sampling.

[0073] In some embodiments, the system further comprises an interruption circuit, the interruption circuit comprising a first interruption circuit and a second interruption circuit; the first interruption circuit is connected to the high voltage pulse modulator; the second interruption circuit is connected to the electron gun pulse beam modulator;

[0074] The interruption circuit is used to synchronously interrupt the pulse beam modulator and the high-voltage pulse modulator of the electron gun to stop beam emission.

[0075] In some embodiments, the interrupt circuit is a high-speed optical coupling structure, and the switch response time can be as short as 1 microsecond (μs).

[0076] In some embodiments, the dose control module receives a pulse monitoring module signal and a pulse beam sampling signal, processes the pulse monitoring module signal and the pulse beam sampling signal, and converts the electrical signal into a digital signal to obtain a beam dose. The dose control module receives a dose scheme from the dose scheme setting module, and controls the beam dose according to the dose scheme. If the actual accumulated beam dose reaches a preset dose, an interrupt signal is sent to the interrupt circuit.

[0077] In some embodiments, the pulse beam sampling point is located directly below the pulse beam and is perpendicular to the moving direction of the pulse beam.

[0078] The working principle of the above technical solution is as follows: the pulse generating module includes a high-voltage pulse modulator and an electron gun pulse beam modulator. For example, the high-voltage pulse modulator generates a pulsed microwave with a repetition period of 6 milliseconds (ms) and a frequency set to 2856 megahertz (MHz). The electron gun pulse beam modulator responds to the pulse generated by the high-voltage pulse modulator and starts to generate a corresponding pulse electron beam. Two independently working pulse monitoring units (the first pulse monitoring unit is connected to the high-voltage pulse modulator, and the second pulse monitoring unit is connected to the electron gun pulse beam modulator) synchronously sample the number of pulse beams and transmit the data to the dose control module; the pulse beam sampling module is located on the pulse beam path and operates synchronously with the pulse monitoring module to collect the actual dose information of each pulse and send the data to the dose control module. The sampling point is located directly below the pulse beam and perpendicular to the direction of beam travel to ensure the accuracy of the sampling.

[0079] The dose control module receives data from the pulse monitoring module and the pulse beam sampling module, converts it into digital signal processing, calculates the actual cumulative beam dose, adjusts the beam parameters according to the preset dose plan, such as controlling the pulse period and frequency and deciding whether to stop beam emission, accumulates the number of pulses and pulse beam current to obtain the actual beam dose and displays the value. When the dose reaches the preset dose, the first interrupt circuit changes the voltage signal of the high-speed optocoupler, thereby interrupting the electron gun pulse beam modulator, and at the same time, the second interrupt circuit changes the voltage signal of the high-speed optocoupler, thereby interrupting the high-voltage pulse modulator.

[0080] The effect of the above technical solution is that the dose scheme setting module can accurately calculate the number of pulses required according to the preset dose, and adjust the dose of each pulse to ensure that the total dose reaches the preset value accurately. The pulse monitoring module and the pulse beam sampling module work synchronously, collecting and transmitting the number and dose information of the pulse beam in real time to the dose control module, so that the system can respond and adjust the beam parameters in time to ensure the accuracy of the dose output.

[0081] The system contains two independently working interrupt circuits (the first interrupt circuit is connected to the high-voltage pulse modulator, and the second interrupt circuit is connected to the electron gun pulse beam modulator), ensuring that when the beam needs to be stopped immediately, the operation of the two key components can be quickly and reliably interrupted, thereby preventing excessive radiation and ensuring the safety of patients and operators. The interrupt circuit adopts a high-speed optical coupling structure, and the switch response time can be as short as 1 microsecond (μs), which greatly improves the response speed and reliability of the system and further enhances the safety performance.

[0082] The dose control module can dynamically adjust the beam parameters, including pulse period and frequency, according to the actual number of pulse beams and dose, to meet different treatment needs and target dose rate ranges. For situations where the average dose rate cannot reach the target through simple adjustments, the system provides an incomplete dynamic dose plan, allowing special adjustments to the last pulse dose to ensure that the total dose is accurate. The dose control module receives electrical signals from the pulse monitoring module and the pulse beam sampling module, and converts them into digital signals for processing, which improves the speed and accuracy of data processing. The pulse beam sampling module operates synchronously with the pulse monitoring unit to ensure the accuracy and consistency of sampling and avoid data errors caused by asynchrony. The pulse beam sampling point is located directly below the pulse beam and perpendicular to the direction of travel of the pulse beam. This spatial layout design ensures the accuracy and representativeness of the sampling and reduces the impact of external factors on the sampling results.

[0083] In some embodiments, in an ultra-high dose rate electron beam dose control system, the dose scheme includes a pulse dose, a number of output pulses, and a pulse frequency; and the method for obtaining the dose scheme includes:

[0084] Determine the number of pulses by presetting the dose and pulse dose;

[0085] According to the number of pulses, it is determined whether to directly output the dosage scheme, or to perform pulse adjustment and output an incomplete dynamic dosage scheme. The pulse adjustment includes a first adjustment and a second adjustment. The first adjustment is to adjust the pulse dose; the second adjustment is to adjust the pulse frequency.

[0086] The working principle of the above technical solution is: in the ultra-high dose rate electronic beam dose control system, the method of obtaining the dose plan is a key step, which ensures that the system can accurately adjust and output the pulse dose according to the preset treatment requirements (i.e. the preset dose). The details are as follows:

[0087] The total dose is pre-set according to the specific conditions of the patient; it can be determined based on the default settings of the accelerator or the previous successful treatment plan, and the number of pulses required is calculated based on the preset dose and the pulse dose, wherein the number of pulses = preset dose / pulse dose;

[0088] For example, under given conditions, if the preset dose is 12 Gy and the pulse dose is 0.36 Gy / Pulse, the number of pulses required is: number of pulses = 12 / 0.36 ≈ 33.33;

[0089] Since the number of pulses must be an integer in actual operation, the calculation results need to be evaluated and the appropriate treatment method is selected according to the following conditions: If the calculated number of pulses is exactly an integer, it can be directly executed according to this scheme without further adjustment. If the number of pulses is not an integer, adjustments need to be made to ensure that the number of all pulses is an integer. The adjustment is divided into two stages:

[0090] First adjustment (adjusting pulse dose): by adjusting the dose of each pulse, the total number of pulses becomes an integer. For example, the pulse dose is adjusted from 0.36 Gy / Pulse to 0.3 Gy / Pulse, so that the number of pulses becomes 40 integer pulses.

[0091] Second adjustment (adjusting pulse frequency): If the target dose rate cannot be met by adjusting the pulse dose alone, the average dose rate can also be adjusted by changing the pulse frequency, which helps to ensure that the final average dose rate reaches the expected target value. Once the appropriate adjustment measures are determined, the final dose plan will be generated and sent to the pulse control unit for execution according to the plan. For non-integer pulse numbers, an incomplete dynamic dose plan is used, in which the dose of the last pulse is specially adjusted to ensure that the total dose reaches the preset value accurately.

[0092] Control the high-voltage pulse modulator to start working, and adjust the microwave frequency to the specified value (such as 2856MHz) after stabilization for a period of time, activate the electron gun beam modulator, and start generating pulsed electron beams according to the dosage plan. Use a dosimeter (such as PTWUNIDOS Romeo) to test the dose under specific conditions to ensure that the dose output meets expectations.

[0093] In summary, the dosage scheme acquisition method provided by the present invention can flexibly adapt to different treatment needs, and by finely adjusting the pulse dose and cycle, the dosage accuracy and safety during radiotherapy are guaranteed, thereby improving the treatment effect.

[0094] In some embodiments, determining whether to directly output the dosage scheme, or to perform pulse adjustment and output an incomplete dynamic dosage scheme according to the number of pulses includes:

[0095] If the number of pulses is an integer, the dosage regimen is directly output;

[0096] If the number of pulses is not an integer, a first adjustment is made to make the number of pulses an integer, and it is determined whether the average dose rate meets the target dose rate range; based on the determination result, it is determined whether to directly output the first adjusted dose scheme or continue to adjust the pulse setting, wherein the average dose rate is the product of the pulse dose and the pulse frequency.

[0097] In some embodiments, the step of determining whether to directly output the first adjusted dosage regimen or continue to adjust the pulse setting according to the determination result comprises:

[0098] If the average dose rate satisfies the target dose rate range, outputting a first adjusted dose regimen;

[0099] If the average dose rate does not meet the target dose rate range, a second adjustment is performed to make the number of pulses an integer, and it is determined again whether the average dose rate meets the target dose rate range; if so, a second adjusted dose plan is output;

[0100] If not, an incomplete dynamic dosage regimen is output.

[0101] In some embodiments, the incomplete dynamic dosage regimen comprises:

[0102] By the second adjustment, a second adjusted pulse number N2 is obtained;

[0103] Output the first N2-1 pulse beams according to the pulse dose adjusted for the second time;

[0104] The N2th pulse dose is dynamically adjusted so that the N2th pulse dose is the difference between the preset dose and the total dose of the first N2-1 pulse beams.

[0105] The working principle of the above technical solution is: when the number of pulses is not an integer, the control program is used to calculate and adjust the pulse dose rate so that the pre-made dose can be divided according to the pulse integer. For example, under given conditions, if the preset dose is 12Gy and the pulse dose is 0.36Gy / Pulse, the number of pulses required is 33.33, which is a non-integer value. At this time, the pulse dose can be adjusted to 0.3Gy / Pulse, so that the number of pulses becomes 40 integer pulses, and at the same time, the adjusted average dose rate is compared to see if it meets the target dose rate range; the average dose rate calculation formula is:

[0106] Average dose rate = pulse dose × pulse frequency

[0107] If the adjusted average dose rate meets the target range, such as the flash therapy dose rate requirement is greater than 40 Gy / s or the specific dose rate requirement is within a certain range such as 60 Gy / s to 80 Gy / s, the first adjusted dose plan is directly output.

[0108] If the average dose rate after the first adjustment does not meet the target dose rate range, a second adjustment is required, that is, adjusting the pulse frequency to change the average dose rate. This step is intended to ensure that the final average dose rate reaches the expected target value and to check again whether the adjusted average dose rate meets the target range.

[0109] If the adjusted average dose rate satisfies the target dose rate range, outputting a second adjusted dose plan;

[0110] If the adjusted average dose rate still does not meet the target dose rate range, an incomplete dynamic dose plan is selected for output.

[0111] If the average dose rate cannot reach the target through the above two adjustment methods, an incomplete dynamic dose scheme is used. This scheme includes the following steps:

[0112] Obtaining the adjusted pulse number N2: obtaining a new pulse number N2 through the second adjustment.

[0113] The first N2-1 pulses are output according to the pulse dose adjusted for the second time.

[0114] The N2th pulse dose is specially adjusted to be equal to the preset total dose minus the total dose of the first N2-1 pulse beams, thus ensuring that the total dose reaches the preset value accurately.

[0115] The effect of the above technical solution is: by ensuring that the number of pulses is an integer, the dose error caused by non-integer pulses is avoided, and the accuracy of dose output is improved. For non-integer pulses, the system can ensure that the final output dose accurately reaches the preset value through the first adjustment (adjusting the pulse dose) and the second adjustment (adjusting the pulse frequency), especially the application of the incomplete dynamic dose scheme, which further ensures the accuracy of the final output pulse dose. The dose scheme is flexibly adjusted according to the actual situation, including adjusting the pulse dose and cycle to adapt to different treatment needs and target dose rate ranges. According to whether the average dose rate meets the target dose rate range, the most suitable dose scheme is automatically selected for output, which improves the adaptive ability of the system. After each adjustment, the system will check whether the average dose rate meets the target range to ensure the safety of the treatment process. If any adjusted dose scheme does not meet the requirements, the system will not adopt the scheme, but continue to look for a more suitable solution. When the dose reaches the preset value, the interrupt circuit will be triggered immediately to stop the beam, prevent excessive radiation, and ensure the safety of patients and operators; by finely adjusting the dose size and frequency of each pulse, the dose distribution is more uniform, reducing damage to normal tissues, and maximizing the effect of tumor treatment.

[0116] The present invention provides an ultra-high dose rate electron beam dose control method, the method comprising:

[0117] Obtaining a dosage regimen by presetting a dosage; the dosage regimen includes a pulse dosage, a number of output pulses, and a pulse frequency;

[0118] According to the dosage scheme, the pulsed beam is controlled by a dosage control unit, and the beam control includes controlling the pulse period, frequency and pulse dosage of the beam, and stopping the beam.

[0119] In some embodiments, the step of obtaining a dosage regimen by presetting a dosage comprises:

[0120] Determine the number of pulses by presetting the dose and pulse dose;

[0121] According to the number of pulses, it is determined whether to directly output the dosage scheme, or to perform pulse adjustment and output an incomplete dynamic dosage scheme. The pulse adjustment includes a first adjustment and a second adjustment. The first adjustment is to adjust the pulse dose; the second adjustment is to adjust the pulse frequency.

[0122] In some embodiments, the step of determining whether to directly output the dosage regimen, or to perform pulse adjustment and output an incomplete dynamic dosage regimen according to the number of pulses comprises:

[0123] If the number of pulses is an integer, the dosage regimen is directly output;

[0124] If the number of pulses is not an integer, a first adjustment is made to make the number of pulses an integer, and it is determined whether the average dose rate meets the target dose rate range; based on the determination result, it is determined whether to directly output the first adjusted dose scheme or continue to adjust the pulse setting, wherein the average dose rate is the product of the pulse dose and the pulse frequency.

[0125] In some embodiments, the step of determining whether to directly output the first adjusted dosage regimen or continue to adjust the pulse setting according to the determination result comprises:

[0126] If the average dose rate satisfies the target dose rate range, outputting a first adjusted dose regimen;

[0127] If the average dose rate does not meet the target dose rate range, a second adjustment is performed to make the number of pulses an integer, and it is determined again whether the average dose rate meets the target dose rate range; if so, a second adjusted dose plan is output;

[0128] If not, an incomplete dynamic dosage regimen is output.

[0129] In some embodiments, the incomplete dynamic dosage regimen comprises:

[0130] By the second adjustment, a second adjusted pulse number N2 is obtained;

[0131] Output the first N2-1 pulse beams according to the pulse dose adjusted for the second time;

[0132] The N2th pulse dose is dynamically adjusted so that the N2th pulse dose is the difference between the preset dose and the total dose of the first N2-1 pulse beams.

[0133] The working principle and effect of the above technical solution are the same as the principle and effect of the dosage scheme acquisition method in the system embodiment of the present invention, and will not be described in detail here.

[0134] An embodiment of the present invention provides a treatment system, the system comprising:

[0135] Radiotherapy devices, used to deliver radiation therapy to patients according to treatment plans;

[0136] Ultra-high dose rate electron beam dose control system is used to control the particle beam dose of radiotherapy.

[0137] An embodiment of the present invention further provides an electronic device, comprising a memory and a processor, wherein the memory stores a computer program, and when the processor executes the computer program, the steps of any one of the methods described in the embodiments of the present invention or the functions of the device described in the embodiments of the present invention are implemented.

[0138] An embodiment of the present invention further provides a computer-readable storage medium, which is used to store a computer program. When the computer program is executed, the steps of the method in the embodiment of the present invention are implemented. The specific implementation method is consistent with the implementation method and the technical effect achieved recorded in the above method embodiment, and some contents will not be repeated here.

[0139] In the present invention, a readable storage medium may be any tangible medium containing or storing a program that may be used by or in combination with an instruction execution system, device, or device. A program product may employ any combination of one or more readable media. A readable medium may be a readable signal medium or a readable storage medium. A readable storage medium may be, for example, but not limited to, an electrical, magnetic, optical, electromagnetic, infrared, or semiconductor system, device, or device, or any combination of the above. More specific examples (a non-exhaustive list) of readable storage media include: an electrical connection with one or more wires, a portable disk, a hard disk, a random access memory (RAM), a read-only memory (ROM), an erasable programmable read-only memory (EPROM or flash memory), an optical fiber, a portable compact disk read-only memory (CD-ROM), an optical storage device, a magnetic storage device, or any suitable combination of the above.

[0140] Computer-readable storage media may include data signals propagated in baseband or as part of a carrier wave, wherein readable program codes are carried. Such propagated data signals may take various forms, including but not limited to electromagnetic signals, optical signals, or any suitable combination of the above. The readable storage medium may also be any readable medium, which may send, propagate, or transmit a program for use by an instruction execution system, an apparatus, or a device or for use in combination with it. The program code contained on the readable storage medium may be transmitted by any suitable medium, including but not limited to wireless, wired, optical cable, RF, etc., or any suitable combination of the above. The program code for performing the operation of the present invention may be written in any combination of one or more programming languages, including object-oriented programming languages ​​such as Java, C++, etc., and also conventional procedural programming languages ​​such as C language or similar programming languages. The program code may be executed entirely on a user computing device, partially on an associated device, as an independent software package, partially on a user computing device, partially on a remote computing device, or entirely on a remote computing device or server. Where a remote computing device is involved, the remote computing device may be connected to the user computing device through any type of network, including a local area network (LAN) or a wide area network (WAN), or may be connected to an external computing device (e.g., through the Internet using an Internet service provider).

[0141] Although the embodiments of the present invention have been shown and described above, it is to be understood that the above embodiments are exemplary and are not to be construed as limitations on the present invention. A person skilled in the art may change, modify, substitute and modify the above embodiments within the scope of the invention without departing from the principles and purpose of the present invention. All such changes should fall within the scope of protection of the claims of the present invention.

Claims

1. Ultra-high dose rate electronic beam dose control system, characterized in that: The system comprises: A pulse generating module, used for generating a pulse beam; A pulse monitoring module, used for monitoring the number of pulse beams and transmitting the number to a dose control module; A pulse beam sampling module, used for collecting pulse beam dose and transmitting it to the dose control module; The dose control module is used to control the pulsed beam according to the number of pulsed beams, the pulsed beam dose and the dose scheme, wherein the beam control includes controlling the beam pulse period, frequency and pulse dose, and stopping the beam; wherein the dose scheme is set by the dose scheme setting module.

2. The ultra-high dose rate electron beam dose control system according to claim 1, characterized in that: The pulse generation module includes a high-voltage pulse modulator and an electron gun pulse beam modulator; the high-voltage pulse modulator generates pulsed high voltage, and the microwave source outputs pulsed microwaves according to the pulsed high voltage; The electron gun pulse beam modulator is used to generate a pulse electron beam; The pulse monitoring module includes a first pulse monitoring unit and a second pulse monitoring unit, the first pulse monitoring unit is connected to the high voltage pulse modulator, and the second pulse monitoring unit is connected to the electron gun pulse beam modulator; The first pulse monitoring unit and the second pulse monitoring unit synchronously sample the number of the pulse beams; The pulse beam sampling module is synchronized with the pulse monitoring unit to perform pulse beam dose sampling.

3. The ultra-high dose rate electron beam dose control system according to claim 1, characterized in that: The system further comprises an interruption circuit, wherein the interruption circuit comprises a first interruption circuit and a second interruption circuit; the first interruption circuit is connected to the high-voltage pulse modulator; The second interrupt circuit is connected to the electron gun pulse beam modulator; The interruption circuit is used to synchronously interrupt the pulse beam modulator and the high-voltage pulse modulator of the electron gun to stop beam emission.

4. The ultra-high dose rate electron beam dose control system according to claim 3, characterized in that: The dose control module receives the pulse monitoring module signal and the pulse beam sampling signal, processes the pulse monitoring module signal and the pulse beam sampling signal, converts the electrical signal into a digital signal, and thus obtains the beam dose. The dose control module receives the dose scheme of the dose scheme setting module, and controls the beam dose according to the dose scheme. If the actual accumulated beam dose reaches the preset dose, an interrupt signal is sent to the interrupt circuit.

5. The ultra-high dose rate electron beam dose control system according to claim 1, characterized in that: The dosage regimen includes pulse dosage, number of output pulses, and pulse frequency; The method for obtaining the dosage regimen includes: Determine the number of pulses by presetting the dose and pulse dose; According to the number of pulses, it is determined whether to directly output the dosage scheme, or to perform pulse adjustment and output an incomplete dynamic dosage scheme. The pulse adjustment includes a first adjustment and a second adjustment. The first adjustment is to adjust the pulse dose; the second adjustment is to adjust the pulse frequency.

6. The ultra-high dose rate electron beam dose control system according to claim 5, characterized in that: The step of determining whether to directly output the dosage scheme, or to perform pulse adjustment and output an incomplete dynamic dosage scheme according to the number of pulses includes: If the number of pulses is an integer, the dosage regimen is directly output; If the number of pulses is not an integer, a first adjustment is made to make the number of pulses an integer, and it is determined whether the average dose rate meets the target dose rate range; based on the determination result, it is determined whether to directly output the first adjusted dose scheme or continue to adjust the pulse setting, wherein the average dose rate is the product of the pulse dose and the pulse frequency.

7. The ultra-high dose rate electron beam dose control system according to claim 6, characterized in that: The step of determining whether to directly output the first adjusted dosage regimen or continue to adjust the pulse setting according to the determination result comprises: If the average dose rate satisfies the target dose rate range, outputting a first adjusted dose regimen; If the average dose rate does not meet the target dose rate range, a second adjustment is performed to make the number of pulses an integer, and it is determined again whether the average dose rate meets the target dose rate range; if so, a second adjusted dose plan is output; If not, an incomplete dynamic dosage regimen is output.

8. The ultra-high dose rate electron beam dose control system according to claim 5, characterized in that: The incomplete dynamic dosage regimen includes: By the second adjustment, a second adjusted pulse number N2 is obtained; Output the first N2-1 pulse beams according to the pulse dose adjusted for the second time; The N2th pulse dose is dynamically adjusted so that the N2th pulse dose is the difference between the preset dose and the total dose of the first N2-1 pulse beams.

9. Ultra-high dose rate electron beam dose control method, characterized in that: The method comprises: Obtaining a dosage regimen by presetting a dosage; the dosage regimen includes a pulse dosage, a number of output pulses, and a pulse frequency; According to the dosage scheme, the pulsed beam is controlled by a dosage control unit, and the beam control includes controlling the pulse period, frequency and pulse dosage of the beam, and stopping the beam.

10. The ultra-high dose rate electron beam dose control method according to claim 9, characterized in that: The method of obtaining a dosage regimen by presetting a dosage comprises: Determine the number of pulses by presetting the dose and pulse dose; According to the number of pulses, it is determined whether to directly output the dosage scheme, or to perform pulse adjustment and output an incomplete dynamic dosage scheme. The pulse adjustment includes a first adjustment and a second adjustment. The first adjustment is to adjust the pulse dose; the second adjustment is to adjust the pulse frequency.

11. The ultra-high dose rate electron beam dose control method according to claim 10, characterized in that: The step of determining whether to directly output the dosage scheme, or to perform pulse adjustment and output an incomplete dynamic dosage scheme according to the number of pulses comprises: If the number of pulses is an integer, the dosage regimen is directly output; If the number of pulses is not an integer, a first adjustment is made to make the number of pulses an integer, and it is determined whether the average dose rate meets the target dose rate range; based on the determination result, it is determined whether to directly output the first adjusted dose scheme or continue to adjust the pulse setting, wherein the average dose rate is the product of the pulse dose and the pulse frequency.

12. The ultra-high dose rate electron beam dose control method according to claim 11, characterized in that: The step of determining whether to directly output the first adjusted dosage regimen or continue to adjust the pulse setting according to the determination result comprises: If the average dose rate satisfies the target dose rate range, outputting a first adjusted dose regimen; If the average dose rate does not meet the target dose rate range, a second adjustment is performed to make the number of pulses an integer, and it is determined again whether the average dose rate meets the target dose rate range; if so, a second adjusted dose plan is output; If not, an incomplete dynamic dosage regimen is output.

13. The ultra-high dose rate electron beam dose control method according to claim 9, characterized in that: The incomplete dynamic dosage regimen includes: By the second adjustment, a second adjusted pulse number N2 is obtained; Output the first N2-1 pulse beams according to the pulse dose adjusted for the second time; The N2th pulse dose is dynamically adjusted so that the N2th pulse dose is the difference between the preset dose and the total dose of the first N2-1 pulse beams.

14. A treatment system, characterized in that: The system comprises: Radiotherapy devices, used to deliver radiation therapy to patients according to treatment plans; The ultra-high dose rate electron beam dose control system according to any one of claims 1 to 8 is used to control the particle beam dose of radiotherapy.

15. An electronic device, characterized in that: The electronic device includes a memory and a processor, the memory stores a computer program, and the processor implements the function of the system of any one of claims 1-8 or executes the steps of any one of the methods of claims 9-13 when implementing the computer program.

16. A computer-readable storage medium, characterized in that: The storage medium stores computer instructions. When a computer reads the computer instructions, the computer implements the functions of the system according to any one of claims 1 to 8 or executes the steps of the method according to any one of claims 9 to 13.

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