A spectrometer based on a random spiral grating

By using a spectrometer based on a random spiral grating to modulate the amplitude and phase of the optical signal, and combining this with a heater to adjust the refractive index, the problem of balancing spectral resolution, range, and device size in the spectrometer was solved, achieving high-resolution and wide-bandwidth spectral recovery.

CN119958694BActive Publication Date: 2025-12-26HEFEI UNIV OF TECH
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Patent Information

Application Number
CN202510084218.8
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2025-01-20
Publication Date
2025-12-26
Estimated Expiration
2045-01-20

AI Technical Summary

Technical Problem

Existing spectrometers struggle to balance spectral resolution, spectral range, and device size, and suffer from manufacturing errors, noise interference, and high costs.

Method used

A spectrometer based on a random spiral grating is used to randomly modulate the amplitude and phase of the optical signal. Combined with non-uniform heating of the heater to adjust the refractive index, the spectrum is recovered using a compressed sensing algorithm.

Benefits of technology

It achieves a balance between spectral resolution and spectral range, miniaturizes device size, and possesses high resolution and large bandwidth, reduces cross-correlation between channels, and increases the number of signal sampling channels and reconstruction speed.

✦ Generated by Eureka AI based on patent content.

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Abstract

The application discloses a spectrometer based on a random spiral grating, wherein a device layer is an optical waveguide, the device layer comprises a random spiral grating, two groups of transmission waveguides and two groups of grating couplers; incident light is coupled into the first group of transmission waveguides through the first group of grating couplers, and then is transmitted to the random spiral grating from the first group of transmission waveguides; the amplitude-frequency response of the optical signal is randomly modulated through the random spiral grating; the application further comprises a heater; the random spiral grating is non-uniformly heated by the heater, so that the temperature of the random spiral grating is changed, and the phase-frequency response of the optical signal passing through the random spiral grating is randomly changed; finally, the obtained random optical signal is transmitted to the second group of grating couplers through the second group of transmission waveguides, and is coupled out from the second group of grating couplers; the application has the advantages of micron-level size, large bandwidth and super-high resolution.
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Description

TECHNICAL FIELD

[0001] The present application relates to the field of spectrometers, and particularly to a spectrometer based on a random spiral grating. BACKGROUND

[0002] A spectrometer is a scientific instrument used to measure the interaction of matter with radiation, such as light, and has been widely used in material analysis, biomedical research, color measurement, semiconductor detection, and other fields. Traditional spectrometers decompose input light into different wavelengths through a grating or prism and focus it on a detector to record the intensity of each wavelength of light, thereby achieving spectral measurement. Although this method can achieve high resolution, it greatly increases the cost of use due to its large size, high price, and high maintenance cost.

[0003] Silicon photonics technology has become an innovative direction in the field of spectrometers due to its small size, multi-functionality, high bandwidth, low power consumption, and other advantages. In particular, the compatibility of silicon-on-insulator (SOI) and complementary metal-oxide-semiconductor (CMOS) processes makes it easy to mass-produce. On-chip integrated spectrometers based on silicon photonics technology have wide application potential in various fields. For example, in the consumer electronics field, it can be integrated into a smart watch to achieve non-invasive blood glucose detection; in the military and security fields, it can be applied to portable chemical detection devices for rapid identification of potential threats; in the field of astronomical observation, it can be carried on satellites or spacecraft for planetary exploration or astronomical research.

[0004] Currently, several methods have been proposed to realize on-chip spectrometers. For example, the direct recovery method divides the incident signal into different wavelength bands and inputs it into a photodetector array to read the spectral signal. Although this method is direct, it requires the introduction of multiple detectors, thereby increasing the cost and requiring micro-ring resonators, which can lead to manufacturing errors and uncertainties. Fourier transform spectrometers are based on the principle of an interferometer, which decomposes and interferes light waves and converts the interference pattern into spectral information using Fourier transform. However, this method cannot balance high spectral resolution and small device size, and is easily disturbed by external noise, resulting in a decrease in signal-to-noise ratio. Moreover, it increases power consumption and occupies a large chip area.

[0005] Therefore, there is an urgent need for an on-chip spectrometer that can balance spectral resolution, spectral range, device size, and have excellent reconfigurability to meet the needs of integration, low cost, and high performance. SUMMARY

[0006] The present application provides a spectrometer based on a random spiral grating to solve the problem that existing spectrometers cannot balance the three performance indicators of spectral resolution, spectral range, and device size.

[0007] In order to achieve the above object, the technical scheme adopted by the present application is:

[0008] A spectrum analyzer based on a random spiral grating, a device layer (50) is a light waveguide type device, the device layer (50) includes a random spiral grating (90), two groups of transmission waveguides (100), two groups of grating couplers (110);

[0009] The random spiral grating (90) is a Bragg grating, the shape of the Bragg grating is a spiral shape following an Archimedean spiral distribution, the grating characteristics of the Bragg grating are randomly distributed and changed along the grating length direction, and the two symmetrical sides of the spiral of the Bragg grating respectively have a periodically arranged random corrugated side wall structure;

[0010] The first group of grating couplers (110) is connected with one end of the random spiral grating (90) through the first group of transmission waveguides (100), and the second group of grating couplers is connected with the other end of the random spiral grating (90) through the second group of transmission waveguides; the incident light is coupled into the first group of transmission waveguides (100) through the first group of grating couplers (110), and then transmitted to the random spiral grating (90) by the first group of transmission waveguides (100); when the optical signal passes through the random spiral grating (90), the amplitude of the optical signal is randomly modulated by the random spiral grating (90), and an optical signal with randomly changed amplitude in the frequency domain is obtained;

[0011] Further comprising a heater (60), the heater (60) is used for non-uniformly heating the random spiral grating (90), so that the temperature of the random spiral grating (90) is non-uniformly changed, so as to change the refractive index of the random spiral grating (90), and then randomly modulate the phase of the optical signal passing through the random spiral grating (90), thereby obtaining an optical signal with randomly changed amplitude and phase in the frequency domain;

[0012] The optical signal with randomly changed amplitude and phase is transmitted to the second group of grating couplers through the second group of transmission waveguides, and is coupled out by the second group of grating couplers.

[0013] Further, the light waveguide forming the device layer (50) is made of silicon material or silicon-containing material.

[0014] Further, the effective refractive index of the random spiral grating (90) is 2.43, and the group refractive index is 4.2.

[0015] Further, the grating period of the random spiral grating (90) is between 0.15 μm and 0.2 μm, and the number of grating periods is between 5000 and 7000.

[0016] Further, the grating characteristics of the Bragg grating include grating coupling strength, grating period, grating apodization curve, and grating phase.

[0017] Further, the random corrugated sidewall structure is in a sinusoidal shape or a rectangular shape.

[0018] Further, the grating coupler (100) is a TE mode coupler.

[0019] Further, the heater (60) is made of metal material, the heater (60) is in a strip structure with multiple irregular bends, the heater (60) is arranged above the random spiral grating (90), a gap is reserved between two strip structures connected by each bend of the heater (60) for isolation, and a lower projection of the heater (60) fully or partially covers the random spiral grating (90), and the random spiral grating (90) is non-uniformly heated by the strip structure with multiple irregular bends of the heater (60).

[0020] Further, the device further comprises a substrate layer (10), a buried oxygen layer (20), an oxide undercladding layer (30), an oxide passivation layer (40), and an electrode (70), the buried oxygen layer (20) is arranged on the substrate layer (10), the device layer (50) is arranged on the buried oxygen layer (20), the oxide undercladding layer (30) is arranged on the buried oxygen layer (20) and covers the device layer (50), the heater (60) is arranged on the oxide undercladding layer (30) and above the random spiral grating (90), the oxide passivation layer (40) is arranged on the oxide undercladding layer (30) and covers the heater (60), and the electrode (70) is arranged on the oxide passivation layer (40) and exposed from the oxide passivation layer (40), and the electrode (70) is electrically connected to the heater (60) through a wire (80).

[0021] Further, the substrate layer (10) is made of silicon material, and the buried oxygen layer (20), the oxide undercladding layer (30), and the oxide passivation layer (40) are all made of silicon oxide material.

[0022] In the spectrometer, the light signal is coupled into the first transmission waveguide through the first grating coupler, transmitted to the random spiral grating, subjected to specific random modulation on the amplitude-frequency response of the light signal by the random spiral grating, transmitted to the second grating coupler through the second transmission waveguide, and coupled out by the second grating coupler to the photodetector for light power reading, and finally the recovery of the light spectrum of the input light signal of the spectrometer is realized through signal processing.

[0023] The grating coupler is used for coupling of input and output of the light signal, and the transmission waveguide is used for connecting the grating coupler and the random spiral grating. The random spiral grating is used for random modulation on the amplitude of the passing light signal based on the structure thereof, and the heater is used for random modulation on the phase of the light signal passing through the random spiral grating through non-uniform heating of the random spiral grating.

[0024] By applying different voltages to the electrodes to precisely control the temperature of the heater, random changes in the refractive index of the random spiral grating are caused, which causes random changes in the phase of the light signal passing through the random spiral grating. This phase randomization design can effectively reduce the cross-correlation between different channels. In combination with the random modulation of the light signal amplitude by the random spiral grating itself, random light signals that are not correlated between multiple channels can be obtained. Through the collection of random light signals and data processing based on the compression sensing algorithm, the recovery of unknown input light signals can be realized. Through the adjustment of the temperature, multiple signal sampling channels can be formed. This dynamic adjustment can greatly expand the number of signal sampling channels of the spectrometer based on a single device, and the process can be completed in a very short time.

[0025] The present application can solve the problem of balancing the three performance indicators of spectral resolution, spectral range and device size in the on-chip spectrometer in the prior art, and has the advantages of micron-level size, large bandwidth and ultra-high resolution. BRIEF DESCRIPTION OF DRAWINGS

[0026] Figure 1 is a lateral sectional view of the structure of an embodiment of the present application.

[0027] Figure 2 is a top view of the internal structure of an embodiment of the present application.

[0028] Figure 3 is a partial enlarged view of a random spiral grating in an embodiment of the present application.

[0029] Figure 4 is a transmission spectrum graph of a random spiral grating in an embodiment of the present application near 1550 nm wavelength.

[0030] Figure 5 is Figure 4 a partial enlarged view of the autocorrelation half-wave half-width of the transmission spectrum graph.

[0031] Figure 6 is a flowchart of the method of reading the input spectrum in an embodiment of the present application. DETAILED DESCRIPTION

[0032] The present application will be further described below in conjunction with the drawings and embodiments.

[0033] As shown in Figure 1 , Figure 2 , the present embodiment discloses a spectrometer based on a random spiral grating, which comprises a substrate layer 10, a buried oxygen layer 20, an oxide underclad layer 30, an oxide passivation layer 40, a device layer 50, a heater 60 and an electrode 70.

[0034] The buried oxygen layer 20 is arranged on the substrate layer 10, the device layer 50 is arranged on the buried oxygen layer 20, the oxide undercladding layer 30 is arranged on the buried oxygen layer 20 and covers the device layer 50, the heater 60 is arranged on the oxide undercladding layer 30, the oxide passivation layer 40 is arranged on the oxide undercladding layer 30 and covers the heater 60, the electrode 70 is arranged in the oxide passivation layer 40, and the electrode 70 is wholly or partially exposed from the oxide passivation layer 40, the electrode 70 is electrically connected with the heater 60 through the wire 80, and the electrode 70 is also connected with an external power supply.

[0035] In the embodiment, a silicon-on-insulator (SOI) structure is adopted as a basic architecture for compatibility with the existing mature chip industry chain. The substrate layer 10 is made of silicon material, and the substrate layer 10 provides physical support for the whole chip and ensures compatibility with the silicon-based process. The buried oxygen layer 20, the oxide undercladding layer 30 and the oxide passivation layer 40 are all made of silicon oxide material, which is used to provide electrical isolation between devices, prevent leakage current, and improve the thermal stability and reliability of the device. In the embodiment, the thickness of the substrate layer 10 is 725 μm, the thickness of the buried oxygen layer 20 is 2 μm, the thickness of the oxide undercladding layer 30 is 2.2 μm, and the thickness of the oxide passivation layer 40 is 0.3 μm.

[0036] In the embodiment, the device layer 50 is made of silicon material, or contains silicon material, or is a mixture of silicon material and silicon-containing material, and the silicon-containing material is preferably silicon nitride (SiN) material. By adopting the device layer 50 made of silicon nitride material, the embodiment can further expand its application scenarios and be suitable for a wider spectral range while maintaining low loss and high stability.

[0037] In the embodiment, the device layer 50 includes a random spiral grating 90, two groups of transmission waveguides 100 and two groups of grating couplers 110. The device layer 50 is exposed on the device layer 50 according to the device shape pattern by 100 keV electron beam lithography (EBL), and then etched by inductively coupled plasma-induced reactive ion etching (RIE) process. The thickness of the device layer 50 is 220 nm.

[0038] In the device layer 50, the random spiral grating 90 is a Bragg grating, the shape of the Bragg grating is a spiral shape following an Archimedean spiral distribution, the grating characteristics of the Bragg grating are randomly distributed and changed along the grating length direction, and the two symmetrical sides of the spiral of the Bragg grating respectively have periodically arranged random corrugated sidewall structures, and the shape of the random corrugated sidewall structure is sinusoidal or rectangular.

[0039] The grating characteristics of the Bragg grating include grating coupling strength, grating period, grating apodization curve, and grating phase. The random purpose of the grating apodization curve is to realize the randomness of the grating phase and strength. The apodization includes but is not limited to random apodization of ripple width, random apodization of duty cycle, transverse phase delay apodization, and period phase random apodization.

[0040] The grating coupler 110 has a fan shape, and the grating coupler 110 adopts a subwavelength grating design to realize efficient light coupling, and the light signal incidence angle of the grating coupler 110 is 8 degrees.

[0041] The first group of grating couplers 110 are connected to one end of the random spiral grating 90 through the first group of transmission waveguides 100, and the second group of grating couplers are connected to the other end of the random spiral grating 90 through the second group of transmission waveguides. The incident light is coupled into the first group of transmission waveguides 100 through the first group of grating couplers 110, and then transmitted to the random spiral grating 90 by the first group of transmission waveguides 100. When the light signal passes through the random spiral grating 90, the random spiral grating 90 randomly modulates the amplitude of the light signal, so that the amplitude of the light signal in the frequency domain changes randomly.

[0042] In this embodiment, in the manufacturing process of the heater 60 and the electrode 70, a titanium tungsten (Ti / W) thin film is deposited on the oxide undercladding layer 30 as the heater 60 by using an electron beam evaporation method, and an aluminum thin film is deposited in the oxide passivation layer 40 as the electrode 70 by using an electron beam evaporation method.

[0043] The heater 60 is arranged above the random spiral grating 90. The shape of the heater 60 is a strip structure with multiple irregular bends. The two sections of the strip structure connected by each bend of the heater 60 are isolated from each other by leaving a gap between them. The lower projection of the heater 60 fully or partially covers the random spiral grating 90. The random spiral grating 90 is non-uniformly heated by the multiple irregular bends of the strip structure of the heater 60. The thickness of the heater 60 is 200 nm, and the thickness of the electrode 70 is 700 nm.

[0044] In this embodiment, when the heater 60 works, the random spiral grating 90 is non-uniformly heated, so that the temperature distribution of the random spiral grating 90 changes randomly, thereby randomly changing the refractive index distribution. As a result, the phase of the light signal between channels changes randomly at different voltages. The random change of the phase further increases the randomness of the spectrum, effectively reduces the correlation of the light signals between channels, and thus obtains the light signal with randomly changed phase in the frequency domain. At the same time, combined with the random modulation of the random spiral grating 90 on the amplitude of the light signal in the frequency domain, the final result is a multi-channel random light signal with randomly changed amplitude and phase in the frequency domain, which is not correlated with each other.

[0045] The mutually uncorrelated multi-channel random light signals are transmitted to the second set of grating couplers through a second set of transmission waveguides and coupled out by the second set of grating couplers.

[0046] In operation, after pre-calibration by scanning the random spiral grating 90, the required spectral signals are coupled into the random spiral grating 90 through the first grating coupler 110, while a sequentially changing voltage is applied to the electrode 70. In cooperation with the external power meter, the optical power output by the second grating coupler is read and saved in sequence, and the required basic data for recovering the unknown incident spectrum are obtained.

[0047] It is understood that the present embodiment is not limited to Figure 2 It is understood that the present embodiment is not limited to

[0048] Figure 3 A partial enlarged view of the random spiral grating 90 of the present embodiment is shown. Figure 3 The main parameters of the random spiral grating include grating strength 120 and grating period 130. The random spiral grating 90 of the present embodiment is designed and optimized based on the coupled mode theory and the transfer matrix method.

[0049] Specifically, the optical signal in the transmission process can be decomposed into two basic components: light intensity and phase. In order to achieve the randomness of the target spectrum, the physical properties of the grating (such as grating strength 120, grating period 130, number of grating periods, etc.) are modeled by the coupled mode theory, and the transmission spectrum of the grating is calculated by combining the transfer matrix method. By iteratively optimizing the grating parameters, the amplitude of the transmission spectrum exhibits the desired random variation characteristics in the frequency domain. Finally, the combination of grating parameters that optimizes the randomness of the transmission spectrum amplitude is selected, and the design of the random spiral grating is completed.

[0050] In order to maintain the optimal grating randomness and not affect the extinction ratio, the effective refractive index of the random spiral grating 90 in the present embodiment is 2.43, and the group refractive index is 4.2. In the present embodiment, the random spiral grating 90 is set to have a grating strength 120 of 30 nm to 50 nm, a grating period 130 of 0.15 μm to 0.2 μm, a number of grating periods of 5000 to 7000, and an average width of 0.5 μm.

[0051] As Figure 4 shown, is the transmission spectrum of the random spiral grating 90 of the present embodiment. As Figure 5 shown, is the Figure 4 autocorrelation data of the transmission spectrum. From Figure 5 the autocorrelation data of the transmission spectrum, it can be seen that the full width at half maximum is 0.084 nm, which directly reflects the degree of disorder of the transmission spectrum.

[0052] The spectral reconstruction process of the present embodiment is based on the compressed sensing algorithm. The spectral resolution and quality after reconstruction are mainly affected by the transmission spectrum characteristics of the random spiral grating 90, which is positively correlated with the disorder of the transmission spectrum of the random spiral grating 90 and negatively correlated with the full width at half maximum (FWHM). By realizing a high randomness of the transmission spectrum and a low full width at half maximum, the present embodiment significantly improves the high-resolution reconstruction capability of the spectrometer.

[0053] Figure 6 is a flowchart of the method for reading the input spectrum by the spectrometer of the present embodiment, Figure 6 which shows the operation scheme of the on-chip spectrometer based on the random spiral grating. The operation scheme includes the following three main steps: 1) pre-calibration, 2) sampling, 3) spectral reconstruction, and the specific formula is:

[0054]

[0055] wherein S is the spectrum to be measured, T is the conversion matrix represented by the random spiral grating 90, I is the N* 1 optical power data matrix obtained by the photodetector. Herein, N represents the number of channels, M represents the length of the input signal.

[0056] In the pre-calibration step, first, the input spectrum is scanned step by step by the frequency-sweeping laser in cooperation with the optical power meter. At the same time, different voltages are applied to the phase modulator by the voltage source, so as to adjust the temperature of the heater 60 under different heating voltages. After each adjustment of the voltage, the spectral information under the corresponding conditions is collected, and the spectral transmission response of the random spiral grating 90 is recorded. Finally, a set of spectral data containing multiple modulation states is formed, which is called the pre-calibration matrix T N·M , which is used for subsequent spectral reconstruction and measurement processes.

[0057] In the sampling step, the to-be-measured spectral signal is first coupled into the on-chip waveguide through the grating coupler 110 and introduced into the random spiral grating 90. The random spiral grating 90 modulates the optical signal, causing the amplitude of the transmission spectrum to randomly change in the frequency domain. At this time, by applying different voltages to the heater 60, the corresponding temperature change is adjusted, causing the refractive index of the random spiral grating 90 to randomly change, further modulating the phase characteristics of the transmission spectrum. This design of random phase change can effectively reduce the cross-correlation between different channels, further improving the complexity of the pre-calibration matrix T N·M , and thereby improving the resolution of the spectrometer.

[0058] The optical signal is continuously adjusted during transmission under different tuning conditions, while the optical power meter collects the optical signal intensity under different voltages and converts it into an optical power matrix N×1 I N , where N is the number of sampling channels and also the number of voltages applied to the heater 60. The accumulated optical power matrix I N will be used for subsequent spectral reconstruction.

[0059] In the spectral reconstruction step, first, based on the pre-calibration matrix T N·M obtained in the pre-calibration step and the optical power matrix I N obtained in the sampling step, a compressed sensing algorithm combined with discrete cosine transform (DCT) is used for calculation. This algorithm can effectively solve the problem of underdetermined systems, especially when the dimension of the input signal is much larger than the number of channels.

[0060] The compressed sensing algorithm optimizes the solution of the underdetermined matrix S M·1 using sparse reconstruction technology, converts the original signal from the time domain to the frequency domain using DCT, thereby improving the compression capability of the data and the reconstruction accuracy of the signal. The advantage of this algorithm is that even with a small number of sampling points, the to-be-measured spectrum can still be recovered with high accuracy.

[0061] Finally, by solving the underdetermined matrix S M·1 , the input spectrum is reconstructed with high accuracy, and its complete spectral information is obtained. This process can be completed in a short time and can achieve accurate reconstruction of the input spectrum.

[0062] ​The preferred embodiments of the present application are described in detail above with reference to the accompanying drawings, and the embodiments described in the present application are merely a description of the preferred embodiments of the present application, and are not intended to limit the concept and scope of the present application. In the above specific embodiments, various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction, and such combination should also be considered as disclosed by the present disclosure, as long as it does not deviate from the concept of the present application. In order to avoid unnecessary repetition, the present application will not further describe various possible combinations.

[0063] The present application is not limited to the specific details described in the above embodiments, and various modifications and improvements to the technical solutions of the present application made by those skilled in the art within the scope of the technical concept of the present application and without departing from the design concept of the present application should fall within the protection scope of the present application. The technical content claimed by the present application has been fully recorded in the claims.

Claims

1. A spectrometer based on a random spiral grating, characterized in that, The device layer (50) is a light waveguide type device, and the device layer (50) comprises a random spiral grating (90), two groups of transmission waveguides (100), and two groups of grating couplers (110); The random spiral grating (90) is a Bragg grating, the shape of the Bragg grating is a spiral shape following an Archimedean spiral distribution, the grating characteristics of the Bragg grating are randomly distributed and changed along the length direction of the grating, and the two symmetrical sides of the spiral of the Bragg grating respectively have periodically arranged random corrugated side wall structures; The first group of grating couplers (110) is connected with one end of the random spiral grating (90) through the first group of transmission waveguides (100), and the second group of grating couplers is connected with the other end of the random spiral grating (90) through the second group of transmission waveguides; incident light is coupled into the first group of transmission waveguides (100) through the first group of grating couplers (110), and then transmitted to the random spiral grating (90) by the first group of transmission waveguides (100); when the optical signal passes through the random spiral grating (90), the amplitude of the optical signal is randomly modulated by the random spiral grating (90), and an optical signal with randomly changed amplitude in the frequency domain is obtained; It also comprises a heater (60) for non-uniformly heating the random spiral grating (90), so as to change the refractive index of the random spiral grating (90) by non-uniformly changing the temperature of the random spiral grating (90), and then randomly modulate the phase of the optical signal passing through the random spiral grating (90), thereby obtaining an optical signal with randomly changed amplitude and phase in the frequency domain; The optical signal with randomly changed amplitude and phase is transmitted to the second group of grating couplers through the second group of transmission waveguides, and coupled out by the second group of grating couplers.

2. The optical spectrometer based on a random spiral grating according to claim 1, characterized in that, The light waveguide forming the device layer (50) is made of silicon material or silicon-containing material.

3. The optical spectrometer based on a random spiral grating according to claim 1, characterized in that, The effective refractive index of the random spiral grating (90) is 2.43, and the group refractive index is 4.

2.

4. The optical spectrometer based on a random spiral grating according to claim 1, characterized in that, The grating period of the random spiral grating (90) is between 0.15 μm and 0.2 μm, and the number of grating periods is between 5000 and 7000.

5. The optical spectrometer based on a random spiral grating according to claim 1, wherein, The grating characteristics of the Bragg grating include grating coupling strength, grating period, grating apodization curve, and grating phase.

6. The spectrometer based on a random spiral grating according to claim 1, characterized in that, The shape of the random corrugated side wall structure is sinusoidal or rectangular.

7. The spectrometer based on a random spiral grating according to claim 1, characterized in that, The grating coupler (110) is a TE mode coupler.

8. The spectrometer based on a random spiral grating according to claim 1, characterized in that, The heater (60) is made of metal material, the shape of the heater (60) is a multi-channel irregular curved strip structure, the heater (60) is arranged above the random spiral grating (90), a gap is reserved between the two strip structures connected by each curved channel of the heater (60) to isolate each other, and the lower projection of the heater (60) fully or partially covers the random spiral grating (90), and the random spiral grating (90) is non-uniformly heated by the multi-channel irregular curved strip structure of the heater (60).

9. The spectrometer based on a random spiral grating according to any one of claims 1-8, characterized in that, It also includes a substrate layer (10), a buried oxygen layer (20), an oxide underlayer (30), an oxide passivation layer (40), an electrode (70), the buried oxygen layer (20) is arranged on the substrate layer (10), the device layer (50) is arranged on the buried oxygen layer (20), the oxide underlayer (30) is arranged on the buried oxygen layer (20) and covers the device layer (50), the heater (60) is arranged on the oxide underlayer (30) and located above the random spiral grating (90), the oxide passivation layer (40) is arranged on the oxide underlayer (30) and covers the heater (60), the electrode (70) is arranged on the oxide passivation layer (40) and exposed from the oxide passivation layer (40), and the electrode (70) is electrically connected with the heater (60) through a wire (80).

10. The optical spectrometer based on a random spiral grating according to claim 9, characterized in that, The material of the substrate layer (10) is silicon material, and the materials of the buried oxygen layer (20), the oxide underlayer (30) and the oxide passivation layer (40) are all silicon oxide material.

Citation Information

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