Anti-peeping structure, manufacturing method thereof, display panel and display device

Abstract

The invention discloses a peep-proof structure, a manufacturing method of the peep-proof structure, a display panel and a display device. The peep-proof structure comprises a first electrode layer, an electrochromic layer and a second electrode layer. The first electrode layer is a continuous film layer, the electrochromism layer comprises a plurality of electrochromism blocks arranged at intervals, and the electrochromism blocks are arranged on one side of the first electrode layer; the second electrode layer comprises a plurality of second sub-electrodes arranged at intervals, the second sub-electrodes are arranged on the sides, away from the first electrode layer, of the electrochromic blocks, and the second sub-electrodes, the electrochromic blocks corresponding to the second sub-electrodes and the first electrode layer form sub peep-proof structures. According to the scheme, dynamic partition peep prevention can be achieved, meanwhile, the preparation process is simplified, and the preparation cost is reduced.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to an anti-peeping structure and a manufacturing method thereof, a display panel and a display device. Background Art

[0002] Organic Light Emitting Diode (OLED) has been widely used in various consumer electronic products such as mobile phones, televisions, laptops, desktop computers, etc. due to its advantages such as high image quality, power saving, thin body and wide application range, becoming the mainstream in display panels.

[0003] As personal privacy protection becomes more and more important, some existing OLED display products have strict control over the direction of light emission, so it is necessary to integrate anti-peeping structures into display products. However, it is difficult for existing anti-peeping display products to achieve dynamic anti-peeping. Summary of the invention

[0004] The main technical problem solved by the present application is to provide an anti-peeping structure that can achieve dynamic partition anti-peeping while reducing the preparation cost.

[0005] In order to solve the above technical problems, a technical solution adopted in the present application is: to provide an anti-peeping structure, including a first electrode layer, an electrochromic layer and a second electrode layer; the first electrode layer is a continuous film layer; the electrochromic layer includes a plurality of electrochromic blocks arranged at intervals, and the electrochromic blocks are arranged on one side of the first electrode layer; the second electrode layer includes a plurality of second sub-electrodes arranged at intervals, and the second sub-electrodes are arranged on the side of the electrochromic block away from the first electrode layer, and the second sub-electrode and the corresponding electrochromic block, and the first electrode layer form the sub-anti-peeping structure.

[0006] Preferably, the orthographic projection of the second sub-electrode on the first electrode layer covers the orthographic projection of the electrochromic block on the first electrode layer.

[0007] Preferably, the orthographic projection of a surface of the electrochromic block on one side away from the first electrode layer on the first electrode layer covers the orthographic projection of a surface of the electrochromic block on one side close to the first electrode layer on the first electrode layer.

[0008] Preferably, in the direction from the second electrode layer to the first electrode layer, the width of the electrochromic block gradually narrows.

[0009] Preferably, the cross section of the electrochromic block is in an inverted trapezoidal shape, wherein the cross section is perpendicular to the first electrode layer.

[0010] Preferably, the thickness of the electrochromic block is greater than or equal to 1 μm.

[0011] Preferably, the material of the electrochromic layer includes an organic material, and the materials of the first electrode layer and the second electrode layer include an inorganic material.

[0012] Preferably, the electrochromic block includes a light-transmitting state and a light-shielding state.

[0013] Preferably, the material of the electrochromic layer includes polythiophenes and their derivatives, viologens and the like.

[0014] Preferably, the material of the first electrode layer includes a transparent material; and / or the material of the second electrode layer includes a transparent material.

[0015] Preferably, the material of the first electrode is the same as that of the second electrode.

[0016] In order to solve the above technical problems, another technical solution adopted by the present application is: providing a display panel, including a substrate, a light-emitting layer, a plurality of anti-peeping structures as described above, and a plurality of driving circuits. The light-emitting layer is arranged on one side of the substrate, and the light-emitting layer includes a plurality of light-emitting units arranged at intervals; the anti-peeping structure is arranged on the side of the light-emitting layer away from the substrate, and at least part of the orthographic projection of the light-emitting unit on the substrate is staggered with the orthographic projection of the sub-anti-peeping structure on the substrate; the plurality of driving circuits are electrically connected to the sub-anti-peeping structures respectively, and are used to apply voltage to the sub-anti-peeping structures to make the corresponding electrochromic blocks change color.

[0017] Preferably, the first electrode layer is located on a side of the electrochromic layer close to the substrate.

[0018] In order to solve the above technical problem, another technical solution adopted by the present application is: to provide a display device, comprising the display panel described in any embodiment.

[0019] To solve the above technical problems, another technical solution adopted in the present application is: a method for manufacturing an anti-peeping structure, comprising: forming a first electrode layer, the first electrode layer being a continuous film layer; forming an electrochromic layer on one side of the first electrode layer; forming a second electrode layer on the side of the electrochromic layer away from the first electrode layer; wherein the electrochromic layer comprises a plurality of electrochromic blocks arranged at intervals, the second electrode layer comprises a plurality of second sub-electrodes arranged at intervals, the second sub-electrodes and the corresponding electrochromic blocks, and the first electrode layer form the sub-anti-peeping structure.

[0020] Preferably, the step of forming a second electrode layer on the side of the electrochromic layer away from the first electrode layer includes: forming an entire electrochromic material layer on one side of the first electrode layer; forming an entire second electrode material layer on the side of the electrochromic material layer away from the first electrode layer; forming a patterned photoresist on the side of the second electrode material layer away from the first electrode layer; etching the second electrode material layer using the patterned photoresist as a mask to form the second electrode layer including the second sub-electrodes arranged at intervals; etching the electrochromic material layer using the second sub-electrode as a mask to form an electrochromic layer including a plurality of the electrochromic blocks arranged at intervals.

[0021] Preferably, the step of etching the electrochromic material layer using the second sub-electrode as a mask to form an electrochromic layer including a plurality of electrochromic blocks arranged at intervals further comprises: simultaneously removing the patterned photoresist.

[0022] Preferably, the second sub-electrode is formed by wet etching, and / or the electrochromic block is formed by dry etching.

[0023] The beneficial effect of the present application is that, different from the prior art, the anti-peeping structure provided by the present application includes a plurality of sub-anti-peeping structures arranged at intervals. Since each sub-anti-peeping structure has an independent electrochromic block and a second sub-electrode, each sub-anti-peeping structure can be individually controlled by a driving circuit to achieve partitioned anti-peeping. When the driving circuit applies a voltage to the second sub-electrode and the first electrode layer of part or all of the sub-anti-peeping structures, the transparency of the electrochromic block of this part is reduced, for example, it becomes completely black, reducing the transmittance of light, while the sub-anti-peeping structure without voltage applied maintains a high transparency, allowing light to pass through the sub-anti-peeping structure with a high transmittance, thereby realizing dynamic real-time anti-peeping area, and control of the anti-peeping state. The discolored sub-anti-peeping structure narrows the emission angle of the light. After the light passes through the discolored sub-anti-peeping structure, the picture of this part of the display area has a narrower viewing angle. Users within the range of the viewing angle can clearly see the display picture, while users outside the range of the viewing angle cannot see the display picture, thereby achieving anti-peeping. At the same time, the first electrode layer is a continuous film layer, which does not require graphics, is easy to form, simplifies the preparation process, and can reduce the preparation cost. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 It is a structural schematic diagram of an implementation method of an anti-peeping structure of the present application;

[0025] Figure 2 is a schematic structural diagram of an embodiment of a display panel of the present application;

[0026] Figure 3 It is a structural schematic diagram of another embodiment of the anti-peeping structure of the present application;

[0027] Figure 4 is a schematic structural diagram of another embodiment of a display panel of the present application;

[0028] Figure 5 It is a flow chart of an implementation method of a method for manufacturing an anti-peeping structure of the present application;

[0029] Figure 6a-6e It is a structural schematic diagram of each step of the anti-peeping structure of the present application;

[0030] Figure 7 yes Figure 5 Schematic diagram of the process of step S120 in an implementation manner. DETAILED DESCRIPTION

[0031] In order to make the purpose, technical solution and effect of the present application clearer and more specific, the present application is further described in detail with reference to the accompanying drawings and examples. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in the field without creative work are within the scope of protection of the present application.

[0032] See also Figure 1 , Figure 1 It is a structural schematic diagram of an embodiment of an anti-peeping structure of the present application. The anti-peeping structure 10 includes a first electrode layer 11, an electrochromic layer 12, and a second electrode layer 13 which are sequentially stacked along a first direction Z. The first electrode layer 11 is a continuous film layer, that is, the first electrode layer 11 is a common electrode layer for all sub-anti-peeping structures 101. The electrochromic layer 12 includes a plurality of electrochromic blocks 121 arranged at intervals, and the electrochromic blocks 121 are arranged on one side of the first electrode layer 11; the second electrode layer 13 includes a plurality of second sub-electrodes 131 arranged at intervals, and the second sub-electrodes 131 are arranged on the side of the electrochromic blocks 121 away from the first electrode layer 11, and the second sub-electrodes 131 and the corresponding electrochromic blocks 121, and the first electrode layer 11 form a sub-anti-peeping structure 10. Specifically, the material of the first electrode layer 11 includes a transparent material, and the material of the second electrode layer 13 includes a transparent material. Optionally, the material of the first electrode is the same as the material of the second electrode, for example, the materials of both can be indium tin oxide ITO to ensure light transmittance.

[0033] The anti-peeping structure 10 provided in the present application includes a plurality of sub-anti-peeping structures 101 arranged at intervals. Since each sub-anti-peeping structure 101 has an independent electrochromic block and a second sub-electrode 131, each sub-anti-peeping structure 101 can be individually controlled by a driving circuit to achieve partitioned anti-peeping. When the driving circuit applies a voltage to the second sub-electrode 131 and the first electrode layer 11 of part or all of the sub-anti-peeping structures 101, the transparency of the electrochromic block 121 of this part is reduced, for example, it becomes completely black, reducing the transmittance of light, while the sub-anti-peeping structure 101 to which no voltage is applied maintains a high transparency, allowing light to pass through the sub-anti-peeping structure 101 with a high transmittance, thereby achieving dynamic real-time anti-peeping area and control of the anti-peeping state. The color-changing sub-privacy protection structure 101 narrows the light emission angle. After the light passes through the color-changing sub-privacy protection structure 101, the image in this part of the display area has a narrower viewing angle. Users within the viewing angle range (i.e. facing the display panel) can clearly see the display image, while users outside the viewing angle range (i.e. facing the display panel sideways) cannot see the display image, thus achieving privacy protection. At the same time, the first electrode layer 11 is a continuous film layer, which does not need to be patterned, is easy to form, simplifies the preparation process, and can reduce the preparation cost.

[0034] Optionally, continue to Figure 1 , the orthographic projection of the second sub-electrode 131 on the first electrode layer 11 covers the orthographic projection of the electrochromic block 121 on the first electrode layer 11. Preferably, the orthographic projection of the second sub-electrode 131 on the first electrode layer 11 completely overlaps with the orthographic projection of the electrochromic block 121. The above structure enables the second sub-electrode 131 to serve as a mask for the electrochromic layer 12, realize the preparation of the electrochromic block 121, and realize the graphical processing of the anti-peeping structure 10. The specific preparation process is shown below.

[0035] Optionally, the material of the electrochromic layer 12 includes an organic material, and the materials of the first electrode layer 11 and the second electrode layer 13 include an inorganic material. Specifically, the material of the electrochromic layer 12 includes polythiophenes and their derivatives, viologens, etc. The above materials are organic electrochromic materials, which facilitates the formation of a patterned electrochromic layer 12 by etching.

[0036] The anti-peeping structure 10 provided in the present application can be applied to a display panel, or can be formed separately on other structures, for example, formed on a glass panel, so as to be applied to a car light curtain or architectural glass to achieve anti-peeping.

[0037] See also Figure 2 , Figure 2It is a structural schematic diagram of an embodiment of a display panel of the present application. The anti-peeping structure 10 in any of the above embodiments is applied to the display panel 100. The display panel 100 includes a substrate 20, an array layer 30, a light-emitting layer 40, an encapsulation layer 50 and an anti-peeping structure 10. The light-emitting layer 40 is arranged on the side of the array layer 30 away from the substrate 20, and the light-emitting layer 40 includes a plurality of light-emitting units 401 arranged at intervals, and the light-emitting layer 40 includes an anode, a light-emitting material layer and a cathode (not shown) stacked in sequence. The encapsulation layer 50 is arranged on the side of the light-emitting layer 40 away from the substrate 20, and the encapsulation layer 50 includes a first inorganic encapsulation layer 501, an organic encapsulation layer 502 and a second inorganic encapsulation layer 503 stacked in sequence along a first direction Z. The anti-peeping structure 10 is arranged on the side of the encapsulation layer 50 away from the substrate 20, and the orthographic projection of the light-emitting unit 401 on the substrate 20 is staggered with the orthographic projection of the sub-anti-peeping structure 101 on the substrate 20. Optionally, the orthographic projection of the light-emitting unit 401 on the substrate 20 is spaced from the orthographic projection of the sub-peeping structure 101 on the substrate 20. The array layer 30 has a plurality of driving circuits (not shown), each of which is electrically connected to the first electrode layer 11 and the second sub-electrode 131 of the sub-peeping structure 101, and is used to apply a voltage to the sub-peeping structure 101 to change the color of the corresponding electrochromic block 121. The driving circuit can be electrically connected to one or more TFT switches, and electrically connected to the electrochromic layer 12 through the TFT switch to realize whether to provide a working voltage signal to the electrochromic layer 12.

[0038] The present application achieves narrowing of the viewing angle of the display panel 100 by setting a sub-anti-peeping structure 101 between the light-emitting units 401, while ensuring that light can effectively pass through the anti-peeping structure 10 within the viewing angle range, so that users within the range can clearly see the display image.

[0039] See also Figure 3 and Figure 4 , Figure 3 This is a structural diagram of another embodiment of the anti-peeping structure of the present application. Figure 4 It is a schematic diagram of the structure of another embodiment of the display panel of the present application. In this embodiment, the orthographic projection of the surface of the side of the electrochromic block 12 away from the first electrode layer 11 on the first electrode layer 11 covers the orthographic projection of the surface of the side of the electrochromic block 12 close to the first electrode layer 11 on the first electrode layer 11, that is, the electrochromic block 12 is a structure that is wide at the top and narrow at the bottom. Furthermore, in the direction in which the second electrode layer 13 points to the first electrode layer 11, the width of the electrochromic block 121 gradually narrows. Specifically, the cross-section of the electrochromic block 121 is an inverted trapezoid, and the thickness of the electrochromic block 121 is greater than or equal to 1μm (specifically 1.0μm, 1.5μm, etc.).

[0040] like Figure 4As shown by arrow A in , when the electrochromic block 12 is in a light-transmitting state, the light emitted from the light-emitting unit 401 leaves the encapsulation layer 50, enters the air, and then enters the electrochromic block 12. Since the refractive index of the electrochromic block 12 is usually greater than the refractive index of the air, when the light emission angle is large, it is refracted on the side of the electrochromic block 12 (i.e., the interface with the air), and the emission angle is smaller than the incident angle, thereby achieving the focusing of the light. Figure 4 As shown by arrow B in FIG. 1 , light with a smaller emission angle directly passes through the space between the electrochromic blocks 12 and is emitted directly. Figure 4 As shown by the arrow C in FIG. 1 , when the electrochromic block 12 is in the light-shielding state, the light emitted from the light-emitting unit 401 leaves the encapsulation layer 50 and enters the air, and is then absorbed by the electrochromic block 12 to achieve anti-peeping.

[0041] The present application also provides a display device, including the display panel 100 in any embodiment. The display device can be a mobile phone, a tablet computer, a wearable smart device, etc.

[0042] See also Figure 5 and Figure 6a-6e , Figure 5 It is a flow chart of an implementation method of a method for manufacturing an anti-peeping structure of the present application. Figure 6a-6e It is a structural schematic diagram of each step of the anti-peeping structure of the present application.

[0043] Step S110: forming a first electrode layer 11, such as Figure 6a The first electrode layer 11 can be deposited and formed on various substrates (not shown). For example, the first electrode layer 11 can be formed on a glass substrate, or on a Figure 2 The encapsulation layer 50 of the display panel 100 is shown. The first electrode layer 11 is a whole continuous film layer, and patterned electrodes, such as first sub-electrodes arranged at intervals, can also be formed by etching after the whole film layer is formed.

[0044] Step S120: forming an electrochromic layer 12 on one side of the first electrode layer 11. The electrochromic layer 12 is formed on the side of the first electrode layer 11 away from the substrate, and the electrochromic material may be first coated on the first electrode layer 11 and then cured by UV or heating.

[0045] Step S130: forming a second electrode layer 13 on the side of the electrochromic layer 12 away from the first electrode layer 11. The second electrode layer 13 is deposited on the electrochromic layer 12, and the film layer may be patterned.

[0046] The electrochromic layer 12 includes a plurality of electrochromic blocks 121 disposed at intervals, the second electrode layer 13 includes a plurality of second sub-electrodes 131 disposed at intervals, and the second sub-electrodes 131 and the corresponding electrochromic blocks 121 and the first electrode layer 11 form a sub-peeping structure 101. Optionally, in the direction in which the second electrode layer 13 points to the first electrode layer 11, the width of the electrochromic block 121 gradually narrows and is in an inverted trapezoidal shape. The electrochromic block 121 may be formed before step S130 or after step S130.

[0047] Optionally, see Figure 7 and Figure 6a-6e , Figure 7 yes Figure 5 Schematic diagram of a flow chart of an implementation method of step S120 in FIG. Step S120 includes:

[0048] Step S121: forming an entire electrochromic material layer 120 on one side of the first electrode layer 11, such as Figure 6b shown.

[0049] Step S122: forming a second electrode material layer 130 on the entire side of the electrochromic material layer 120 away from the first electrode layer 11, such as Figure 6c shown.

[0050] Step S123: forming a patterned photoresist 14 on the side of the second electrode material layer 130 away from the first electrode layer 11, such as Figure 6d As shown. Optionally, when the anti-peep structure 10 is disposed on the display panel 100, the photoresist 14 may be disposed correspondingly between the light-emitting units 401, and at least a portion of the orthographic projection of the photoresist 14 on the substrate 20 is staggered from the orthographic projection of the light-emitting unit 401 on the substrate 20. Optionally, the orthographic projection of the photoresist 14 on the substrate 20 is spaced from the orthographic projection of the light-emitting unit 401 on the substrate 20. Specifically, a photoresist material layer of the entire surface may be first formed on the second electrode material layer 130, and then a plurality of spaced photoresists 14 may be formed by etching.

[0051] Step S124: etching the second electrode material layer 130 using the patterned photoresist 14 as a mask to form a second electrode layer 13 including second sub-electrodes 131 arranged at intervals. That is, the second electrode material layer 130 corresponding to the area between the photoresists 14 is removed by etching, and the second electrode material layer 130 under the photoresist 14 is retained. Specifically, the second sub-electrodes 131 can be formed by wet etching.

[0052] Step S125: using the second sub-electrode 131 as a mask to etch the electrochromic material layer 120, to form an electrochromic layer 12 including a plurality of electrochromic blocks 121 arranged at intervals, to form a Figure 1Specifically, the electrochromic block 121 is formed by dry etching. Since both the electrochromic material and the photoresist 14 are organic materials, this step can remove the electrochromic material and the photoresist 14 at the same time.

[0053] The above are only implementation methods of the present application, and are not intended to limit the patent scope of the present application. Any equivalent structure or equivalent process transformation made using the contents of the present application specification and drawings, or directly or indirectly applied in other related technical fields, are also included in the patent protection scope of the present application.

Claims

1. A privacy protection structure, characterized in that: include: A first electrode layer, wherein the first electrode layer is a continuous film layer; The electrochromic layer comprises a plurality of electrochromic blocks arranged at intervals, wherein the electrochromic blocks are arranged on one side of the first electrode layer; The second electrode layer includes a plurality of second sub-electrodes arranged at intervals, the second sub-electrodes are arranged on a side of the electrochromic block away from the first electrode layer, and the second sub-electrodes and the corresponding electrochromic blocks and the first electrode layer form the sub-peeping structure.

2. The anti-peeping structure according to claim 1, characterized in that: The orthographic projection of the second sub-electrode on the first electrode layer covers the orthographic projection of the electrochromic block on the first electrode layer.

3. The anti-peeping structure according to claim 1, characterized in that: The orthographic projection of the surface of the electrochromic block on the side away from the first electrode layer on the first electrode layer covers the orthographic projection of the surface of the electrochromic block on the side close to the first electrode layer on the first electrode layer; Preferably, in the direction from the second electrode layer to the first electrode layer, the width of the electrochromic block gradually narrows; Preferably, the cross section of the electrochromic block is in an inverted trapezoidal shape, wherein the cross section is perpendicular to the first electrode layer; Preferably, the thickness of the electrochromic block is greater than or equal to 1 μm.

4. The anti-peeping structure according to claim 1, characterized in that: The material of the electrochromic layer includes an organic material, and the materials of the first electrode layer and the second electrode layer include an inorganic material; Preferably, the electrochromic block includes a light-transmitting state and a light-shielding state; Preferably, the material of the electrochromic layer includes polythiophenes and their derivatives, viologens and the like.

5. The anti-peeping structure according to claim 1, characterized in that: The material of the first electrode layer includes a transparent material; and / or, The material of the second electrode layer includes a transparent material; Preferably, the material of the first electrode is the same as that of the second electrode.

6. A display panel, characterized in that: include: substrate; A light-emitting layer is arranged on one side of the substrate, and the light-emitting layer includes a plurality of light-emitting units arranged at intervals; A plurality of the anti-peeping structures according to any one of claims 1 to 4 are arranged on a side of the light-emitting layer away from the substrate, and at least a portion of the orthographic projection of the light-emitting unit on the substrate is staggered with the orthographic projection of the sub-anti-peeping structure on the substrate; A plurality of driving circuits, respectively electrically connected to the sub-peeping protection structures, for applying voltage to the sub-peeping protection structures to cause the corresponding electrochromic blocks to change color; Preferably, the first electrode layer is located on a side of the electrochromic layer close to the substrate.

7. A display device, characterized in that: Comprising the display panel as claimed in claim 6.

8. A method for manufacturing an anti-peeping structure, characterized in that: forming a first electrode layer, wherein the first electrode layer is a continuous film layer; forming an electrochromic layer on one side of the first electrode layer; forming a second electrode layer on a side of the electrochromic layer away from the first electrode layer; The electrochromic layer includes a plurality of electrochromic blocks arranged at intervals, the second electrode layer includes a plurality of second sub-electrodes arranged at intervals, and the second sub-electrodes and the corresponding electrochromic blocks and the first electrode layer form the sub-peeping structure.

9. The manufacturing method according to claim 8, characterized in that: The step of forming a second electrode layer on a side of the electrochromic layer away from the first electrode layer comprises: Forming a whole-surface electrochromic material layer on one side of the first electrode layer; forming a second electrode material layer on the entire surface of the electrochromic material layer on a side away from the first electrode layer; forming a patterned photoresist on a side of the second electrode material layer facing away from the first electrode layer; Etching the second electrode material layer using the patterned photoresist as a mask to form the second electrode layer including the second sub-electrodes arranged at intervals; Using the second sub-electrode as a mask, etching the electrochromic material layer to form an electrochromic layer including a plurality of electrochromic blocks arranged at intervals; Preferably, the step of etching the electrochromic material layer using the second sub-electrode as a mask to form an electrochromic layer including a plurality of electrochromic blocks arranged at intervals further comprises: simultaneously removing the patterned photoresist.

10. The manufacturing method according to claim 9, characterized in that: The second sub-electrode is formed by wet etching, and / or, The electrochromic blocks are formed by dry etching.

Images