Distance adjusting device, spray header unit and semiconductor process equipment

Abstract

According to the distance adjusting device, the spray header unit and the semiconductor process equipment, the elastic distance adjusting part is additionally arranged between the bottom of the outer edge of the barrier plate of the spray header unit and the top of the outer edge of the spray header end plate, and the fastener is arranged in the middle of the elastic distance adjusting part in a penetrating mode; the fastener penetrates through the elastic distance adjusting component to fix the barrier plate and the spray head end plate together, and the elastic distance adjusting component and the fastener can be utilized to adjust the distance between the barrier plate and the spray head end plate, so that the flow velocity of a gas-phase film material flowing into a deposition chamber is adjusted, the uniformity of a film and the profile of the film are improved, and the uniformity of the gas-phase film material is improved. And the uniformity and the film quality of the film material during film forming are controllable.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor process equipment, and more specifically, to a distance adjustment device, a shower head unit and semiconductor process equipment. Background Art

[0002] Vapor deposition technology uses physical and chemical processes that occur in the gas phase to form a thin film on the substrate surface. Based on the physical or chemical changes that occur on the workpiece surface during vapor deposition, vapor deposition technology can be divided into physical vapor deposition (PVD) and chemical vapor deposition (CVD).

[0003] Whether it is chemical vapor deposition (CVD) or physical vapor deposition (PVD), it is necessary to vaporize one or more substances containing thin film elements (i.e., thin film materials) and deposit them on the surface of the substrate to generate a thin film with special properties. The main mechanism used for vapor deposition to form thin films in the vapor deposition equipment includes a deposition chamber and a showerhead unit for spraying vapor-phase thin film materials into the deposition chamber.

[0004] The shower head unit generally includes a top plate, a blocker plate and an end plate (showerhead) of the shower head from top to bottom; wherein the blocker plate is used to guide the gas-phase thin film material entering the shower head unit, so as to guide the gas-phase thin film material in the shower head unit out of the shower head and spray it into the deposition chamber to form a film on the substrate surface. The way of supplying the gas-phase thin film material to the deposition chamber is very important, because the fluid dynamics behavior has a great influence on the film quality of the gas-phase thin film material after film formation. The connection between the blocker plate and the end plate (showerhead) of the shower head unit currently used is a fixed connection, and the distance between the two is fixed and cannot be adjusted. Therefore, the flow rate of the gas-phase thin film material guided by the blocker plate to the deposition chamber cannot be changed, which has certain limitations on controlling the uniformity and film quality of the thin film material during film formation. Summary of the invention

[0005] In view of the above problems, the purpose of the present invention is to provide a distance adjustment device, a shower head unit and semiconductor process equipment to solve the problem in the related art that the baffle plate in the shower head unit and the shower head end plate are fixedly connected, resulting in that the distance between the baffle plate and the shower head end plate cannot be adjusted. Therefore, the flow rate of the gas-phase thin film material guided by the baffle plate into the deposition chamber is not variable, which has certain limitations on controlling the uniformity and film quality of the thin film material during film formation.

[0006] The present invention provides a distance adjusting device for a shower head unit, comprising an elastic distance adjusting component arranged between the outer edge bottom of a baffle plate of the shower head unit and the outer edge top of a shower head end plate, and a fastener passing through the middle of the elastic distance adjusting component; the fastener passes through the elastic distance adjusting component to fix the baffle plate and the shower head end plate together.

[0007] In addition, a preferred solution is that a through hole is provided on the blocking plate for the fastener to pass through, and a sealing member is provided in the through hole between the fastener and the blocking plate.

[0008] In addition, a preferred solution is that the sealing element is a sealing ring.

[0009] In addition, a preferred solution is that the fastener is a threaded fastener; the threaded fastener includes a threaded portion and a head with a diameter wider than the threaded portion, and the sealing member is sleeved on the outer periphery of the head in the through hole.

[0010] In addition, a preferred solution is that recesses are respectively provided at the bottom of the outer edge of the baffle plate; protrusions corresponding to and matching the positions of the recesses are respectively provided at the top of the outer edge of the sprinkler head end plate; and the elastic distance adjustment component is provided between the recesses and the protrusions.

[0011] In addition, a preferred solution is that the elastic distance-adjusting component is a bellows-shaped component.

[0012] In addition, a preferred solution is that a plurality of elastic distance-adjusting components are evenly arranged along the circumferential direction on the outer edge of the blocking plate.

[0013] In addition, a preferred solution is that the heights of the plurality of elastic distance-adjusting components located at the bottom of the outer edge of the blocking plate are equal.

[0014] The present invention provides a shower head unit, comprising the distance adjusting device for the shower head unit as described above.

[0015] The present invention provides a semiconductor process equipment, comprising a shower head unit, wherein the distance adjustment device for the shower head unit as described above is arranged inside the shower head unit.

[0016] It can be seen from the above technical scheme that the distance adjusting device, the shower head unit and the semiconductor process equipment provided by the present invention, by adding an elastic distance adjusting component between the outer edge bottom of the baffle plate of the shower head unit and the outer edge top of the shower head end plate, and passing a fastener through the middle of the elastic distance adjusting component, the fastener passes through the elastic distance adjusting component to fix the baffle plate and the shower head end plate together, the elastic distance adjusting component and the fastener can be used to adjust the distance between the baffle plate and the shower head end plate, thereby adjusting the flow rate of the gas phase thin film material flowing into the deposition chamber, so as to improve the uniformity of the thin film and the cross-sectional profile of the thin film, so that the uniformity and film quality of the thin film material during film formation can be controlled.

[0017] In order to achieve the above and related purposes, one or more aspects of the present invention include the features that will be described in detail later. The following description and the accompanying drawings describe some exemplary aspects of the present invention in detail. However, these aspects indicate only some of the various ways in which the principles of the present invention can be used. In addition, the present invention is intended to include all these aspects and their equivalents. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] By referring to the following description in conjunction with the accompanying drawings, and with a more comprehensive understanding of the present invention, other objects and results of the present invention will become more apparent and easy to understand. In the accompanying drawings:

[0019] Figure 1 is a schematic diagram of the connection structure between the baffle plate and the shower head end plate according to an embodiment of the present invention;

[0020] Figure 2 is a schematic diagram of the connection details between the baffle plate and the shower head end plate according to an embodiment of the present invention;

[0021] Figure 3 It is a schematic diagram of the connection structure between the baffle plate and the shower head end plate in the related art.

[0022] In the accompanying drawings, 1-blocking plate, 2-sprinkler end plate, 3-elastic distance-adjusting component, 4-fastener, 5-distance between the blocking plate and the sprinkler end plate, 6-sealing member, 7-recess, 8-bump.

[0023] The same reference numerals throughout the drawings indicate similar or corresponding features or functions. DETAILED DESCRIPTION

[0024] In the following description, for the purpose of explanation, numerous specific details are set forth in order to provide a thorough understanding of one or more embodiments. However, it is apparent that these embodiments may also be implemented without these specific details.

[0025] In view of the above-mentioned related technology, since the baffle plate in the shower head unit and the shower head end plate are fixedly connected, the distance between the baffle plate and the shower head end plate cannot be adjusted. Therefore, the flow rate of the gas phase thin film material guided by the baffle plate into the deposition chamber cannot be changed, which has certain limitations on controlling the uniformity and film quality of the thin film material during film formation. A distance adjustment device, a shower head unit and semiconductor process equipment are proposed.

[0026] The specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0027] In order to illustrate the distance adjustment device, the shower head unit and the semiconductor process equipment provided by the present invention, Figure 1 The connecting structure between the baffle plate and the shower head end plate according to an embodiment of the present invention is shown; Figure 2 The connection details of the baffle plate and the shower head end plate according to an embodiment of the present invention are shown; Figure 3 The connecting structure between the baffle plate and the shower head end plate in the related art is shown.

[0028] like Figures 1 to 3 As shown together, the distance adjusting device for the sprinkler head unit provided by the present invention comprises an elastic distance adjusting component 3 arranged between the outer edge bottom of the baffle plate 1 of the sprinkler head unit and the outer edge top of the sprinkler head end plate 2, and a fastener 4 passing through the middle of the elastic distance adjusting component 3; the fastener 4 passes through the elastic distance adjusting component 3 to fix the baffle plate 1 and the sprinkler head end plate 2 together.

[0029] In the process of performing vapor deposition on a substrate using a vapor deposition device, it is necessary to first vaporize one or several substances containing thin film elements into a gas-phase single substance or a gas-phase compound, and then transport them to the interior of a shower head unit of the vapor phase device through a pipeline. The shower head unit includes a top plate, a blocker plate (Blocker plate) and a shower head end plate (End plate (Showerhead)) from top to bottom. The blocker plate can guide the gas-phase thin film material entering the shower head unit to the deposition chamber. Inside the deposition chamber, the gas-phase thin film material forms a thin film on the substrate through physical changes or chemical reactions. The flow rate of the gas-phase thin film material entering the deposition chamber has a great influence on the film quality of the film formed on the surface of the substrate in the deposition chamber. At present, in the related art, since the blocker plate 1 and the shower head end plate 2 are directly fixed together (for example, welded together, fixed together only by fasteners) (such as Figure 3 As shown), the distance 5 between the blocking plate 1 and the shower head end plate 2 is fixed, and the flow rate of the fluid flowing through the shower head unit cannot be adjusted, which has certain limitations in controlling the uniformity and film quality of the gas phase thin film material.

[0030] In view of the above-mentioned defects existing in the related art, the present invention improves the connection method between the baffle plate 1 and the shower head end plate 2 inside the shower head unit. By adding an elastic distance adjustment component 3 between the outer edge bottom of the baffle plate 1 of the shower head unit and the outer edge top of the shower head end plate 2, and inserting a fastener 4 in the middle of the elastic distance adjustment component 3, the fastener 4 passes through the elastic distance adjustment component 3 to fix the baffle plate 1 and the shower head end plate 2 together, the elastic distance adjustment component 3 and the fastener 4 can be used to adjust the distance 5 between the baffle plate 1 and the shower head end plate 2, thereby adjusting the flow rate of the gas phase thin film material flowing into the deposition chamber, so as to improve the uniformity of the thin film and the cross-sectional profile of the thin film, so that the uniformity and film quality of the thin film material during film formation can be controlled.

[0031] As a preferred solution of the present invention, a through hole is provided on the blocking plate 1 for the fastener 4 to pass through, and a sealing member 6 is provided between the fastener 4 and the blocking plate 1 in the through hole.

[0032] In the technical solution of the present invention, the fastener 4 is a columnar structure, which can be inserted from the top of the baffle plate 1. By setting a through hole on the baffle plate 1, the fastener 4 is inserted from the top of the baffle plate 1 into the through hole, and the lower end of the fastener 4 is fixed inside the shower head end plate 2. In order to prevent the fastener 4 from penetrating into the baffle plate 1 and causing the gas phase film material to leak out, a seal 6 is provided between the outer periphery of the part of the fastener 4 located inside the baffle plate 1 and the baffle plate 1. The seal 6 can be made of sealing rubber, sealing plastic, sealant and other materials, which are not particularly limited here, as long as it can prevent the gas phase film material from leaking out from the baffle plate 1.

[0033] As a preferred solution of the present invention, the sealing member 6 is a sealing ring.

[0034] The sealing ring 6 is preferably an annular structure made of sealing rubber, which can be sleeved on the outer circumference of the upper part of the fastener 4.

[0035] As a preferred solution of the present invention, the fastener 4 is a threaded fastener; the threaded fastener includes a threaded portion and a head with a diameter wider than the threaded portion, and the seal 6 is sleeved on the outer circumference of the head in the through hole.

[0036] The fastener 4 can be a screw or a bolt. When it is a screw, it includes a threaded portion and a head with a diameter wider than the threaded portion. The head includes a top and a connecting portion connected to the threaded portion. The seal 6 is preferably sleeved on the outer periphery of the connecting portion, and the connecting portion is inclined. Figure 2As shown, it can also be arranged in a step-like manner, which is not particularly limited. Of course, other similar mechanical fasteners can also be used instead, which is not particularly limited in the present invention. When bolts are used as fasteners, the sealing ring can be sleeved on the outer periphery of the head of the bolt, and the outer wall of the sealing ring 6 contacts the inner wall of the through hole of the bolt in the blocking plate 1, thereby forming a seal between the inner wall of the through hole and the bolt, preventing the gas phase film material in the gap 5 between the blocking plate 1 and the spray head end plate 2 from leaking out through the through hole.

[0037] As a preferred solution of the present invention, recesses 7 are respectively provided at the bottom of the outer edge of the baffle plate 1; protrusions 8 corresponding to and matching the positions of the recesses 7 are respectively provided at the top of the outer edge of the sprinkler head end plate 2; and the elastic distance adjustment component 3 is arranged between the recesses 7 and the protrusions 8.

[0038] like Figure 2 As shown, by providing the notch 7 at the bottom of the outer edge of the blocking plate 1 and the convex block 8 at the top of the outer edge of the shower head end plate 2, the contact between the outer wall of the convex block 8 and the inner wall of the notch 7 can further prevent the gas phase thin film material within the interval 5 between the blocking plate 1 and the shower head end plate 2 from leaking out. The notch 7 may be in the shape of a rectangular parallelepiped groove with an opening facing downward or a cylindrical groove with an opening facing downward, and the convex block 8 may be a rectangular parallelepiped convex block or a cylindrical convex block, which is not particularly limited in the present invention.

[0039] As a preferred solution of the present invention, the elastic distance-adjusting component 3 is a bellows-shaped component.

[0040] By arranging the bellows-shaped part between the baffle plate 1 and the shower head end plate 2, its elasticity can be utilized to adjust the size of the distance 5 between the baffle plate 1 and the shower head end plate 2 according to the needs of the deposition process, thereby adjusting the flow rate of the gas phase thin film material flowing into the deposition chamber to control the uniformity of the thin film formed on the substrate surface and the cross-sectional profile of the thin film.

[0041] As a preferred solution of the present invention, a plurality of elastic distance-adjusting components 3 are evenly arranged along the circumferential direction on the outer edge of the blocking plate 1 .

[0042] In order to ensure that the upper and lower surfaces of the distance 5 between the blocking plate 1 and the shower head end plate 2 are horizontal, the number of the elastic distance-adjusting components 3 is at least two, and the specific number can be adjusted accordingly according to actual conditions.

[0043] As a preferred solution of the present invention, the heights of the plurality of elastic distance-adjusting components 3 located at the bottom of the outer edge of the blocking plate 1 are equal.

[0044] This design can further ensure that the gap 5 is horizontal, which is more conducive to adjusting the flow rate of the gas-phase thin film material entering the shower head unit.

[0045] The shower head unit provided by the present invention includes a top plate, a blocker plate 1 (Blocker plate) and a shower head end plate 2 (End plate (Showerhead)) from top to bottom, and also includes an elastic distance-adjusting component 3 arranged between the outer edge bottom of the blocker plate 1 and the outer edge top of the shower head end plate 2 and a fastener 4 passing through the middle of the elastic distance-adjusting component 3; the fastener 4 passes through the elastic distance-adjusting component 3 to fix the blocker plate 1 and the shower head end plate 2 together.

[0046] The difference between the shower head unit provided by the present invention and the conventional shower head unit is at least the connection mode between the blocking plate 1 and the shower head end plate 2. Figure 3 As shown, the outer edge end of the baffle plate 1 of the shower head unit is directly fixed on the outer edge end of the shower head end plate 2. Therefore, the width of the interval 5 between the baffle plate 1 and the shower head end plate 2 cannot be adjusted. Therefore, the flow rate of the gas phase thin film material guided by the baffle plate 1 into the deposition chamber cannot be adjusted, which leads to the uniformity and cross-sectional profile of the thin film formed on the substrate being limited.

[0047] In this regard, Figure 1 and Figure 2 As shown, the shower head unit provided by the present invention adds an elastic distance adjustment component 3 and a fastener 4 between the outer edge bottom of the baffle plate 1 and the outer edge top of the shower head end plate 2, so that the width of the distance 5 between the baffle plate 1 and the shower head end plate 2 can be adjusted to adjust the flow rate of the gas phase thin film material flowing into the deposition chamber, improve the uniformity of the thin film and the cross-sectional profile of the thin film, and make the uniformity and film quality of the thin film material during film formation controllable.

[0048] The shower head unit provided by the present invention can be used in physical vapor deposition equipment as well as chemical vapor deposition equipment.

[0049] As a preferred solution of the present invention, a through hole is provided on the blocking plate 1 for the fastener 4 to pass through, and a sealing member 6 is provided between the fastener 4 and the blocking plate 1 in the through hole.

[0050] In the technical solution of the present invention, the fastener 4 is a columnar structure, which can be inserted from the top of the baffle plate 1. By setting a through hole on the baffle plate 1, the fastener 4 is inserted from the top of the baffle plate 1 into the through hole, and the lower end of the fastener 4 is fixed inside the shower head end plate 2. In order to prevent the fastener 4 from penetrating into the baffle plate 1 and causing the gas phase film material to leak out, a seal 6 is provided between the outer periphery of the part of the fastener 4 located inside the baffle plate 1 and the baffle plate 1. The seal 6 can be made of sealing rubber, sealing plastic, sealant and other materials, which are not particularly limited here, as long as it can prevent the gas phase film material from leaking out from the baffle plate 1 through the through hole.

[0051] As a preferred solution of the present invention, the sealing member 6 is a sealing ring.

[0052] The sealing ring 6 is preferably an annular structure made of sealing rubber, which can be sleeved on the outer circumference of the upper part of the fastener.

[0053] As a preferred solution of the present invention, the fastener 4 is a threaded fastener; the threaded fastener includes a threaded portion and a head with a diameter wider than the threaded portion, and the seal 6 is sleeved on the outer circumference of the head in the through hole.

[0054] The fastener 4 can be a screw or bolt structure. When it is a screw, it includes a threaded portion and a head with a diameter wider than the threaded portion. The head includes a top and a connecting portion connected to the threaded portion. The seal 6 is preferably sleeved on the outer periphery of the connecting portion, and the connecting portion is inclined. Figure 2 As shown, it can also be arranged in steps, which is not particularly limited. Of course, other similar mechanical fasteners can also be used instead, which is not particularly limited in the present invention. When a bolt is used as a fastener, a sealing ring can be sleeved on the outer periphery of the head of the bolt, and the outer wall of the sealing ring 6 contacts the inner wall of the through hole of the bolt in the blocking plate 1, thereby forming a seal between the inner wall of the through hole and the bolt, preventing the gas phase film material in the interval 5 from leaking out through the through hole.

[0055] As a preferred solution of the present invention, recesses 7 are respectively provided at the bottom of the outer edge of the baffle plate 1; protrusions 8 corresponding to and matching the positions of the recesses 7 are respectively provided at the top of the outer edge of the sprinkler head end plate 2; and the elastic distance adjustment component 3 is arranged between the recesses 7 and the protrusions 8.

[0056] like Figure 2 As shown, by providing the notch 7 at the bottom of the outer edge of the blocking plate 1 and the convex block 8 at the top of the outer edge of the shower head end plate 2, the contact between the outer wall of the convex block 8 and the inner wall of the notch 7 can further prevent the gas phase film material within the interval 5 between the blocking plate 1 and the shower head end plate 2 from leaking out. The notch 7 is in the shape of a rectangular parallelepiped groove with the lower opening facing downward or a cylindrical groove with the opening facing downward, and the convex block 8 is correspondingly a rectangular parallelepiped convex block or a cylindrical convex block, which is not particularly limited in the present invention.

[0057] As a preferred solution of the present invention, the elastic distance-adjusting component 3 is a bellows-shaped component.

[0058] By arranging the bellows-shaped part between the baffle plate 1 and the shower head end plate 2, its elasticity can be utilized to adjust the size of the distance 5 between the baffle plate 1 and the shower head end plate 2 according to the needs of the deposition process, thereby adjusting the flow rate of the gas phase thin film material flowing into the deposition chamber to control the uniformity of the thin film formed on the substrate surface and the cross-sectional profile of the thin film.

[0059] As a preferred solution of the present invention, a plurality of elastic distance-adjusting components 3 are evenly arranged along the circumferential direction on the outer edge of the blocking plate 1 .

[0060] In order to ensure that the upper and lower surfaces of the distance 5 between the blocking plate 1 and the shower head end plate 2 are horizontal, the number of the elastic distance-adjusting components 3 is at least two, and the specific number can be adjusted accordingly according to actual conditions.

[0061] As a preferred solution of the present invention, the heights of the plurality of elastic distance-adjusting components 3 located at the bottom of the outer edge of the blocking plate 1 are equal.

[0062] This design can further ensure that the gap 5 is horizontal, which is more conducive to adjusting the flow rate of the gas-phase thin film material entering the shower head unit.

[0063] The semiconductor process equipment provided by the present invention includes a shower head unit, an elastic distance adjusting component 3 between the outer edge bottom of a baffle plate 1 of the shower head unit and the outer edge top of a shower head end plate 2, and a fastener 4 passing through the middle of the elastic distance adjusting component 3; the fastener 4 passes through the elastic distance adjusting component 3 to fix the baffle plate 1 and the shower head end plate 2 together.

[0064] The semiconductor process equipment provided by the present invention is different from the semiconductor process equipment in the related art in that the connection method between the blocking plate 1 in the shower head unit and the shower head end plate 2 is the same as the other methods. Figure 3 As shown, the outer edge end of the baffle plate 1 of the showerhead unit is welded and fixed to the outer edge end of the showerhead end plate 2, so the width of the interval 5 between the baffle plate 1 and the showerhead end plate 2 cannot be adjusted. Therefore, the flow rate of the gas phase thin film material guided by the baffle plate 1 into the deposition chamber cannot be adjusted, which results in the uniformity and cross-sectional profile of the film formed on the substrate being limited and cannot be flexibly adjusted according to the process requirements during the deposition process. In this regard, Figure 1 and Figure 2 As shown, the shower head unit provided by the present invention adds elastic distance adjustment components 3 and fasteners 4 between the two ends of the baffle plate 1 and the two ends of the shower head end plate 2, so that the width of the distance 5 between the baffle plate 1 and the shower head end plate 2 can be adjusted to adjust the flow rate of the gas phase thin film material flowing into the deposition chamber, improve the uniformity of the thin film and the cross-sectional profile of the thin film, and make the uniformity and film quality of the thin film material during film formation controllable.

[0065] As a preferred solution of the present invention, a through hole is provided on the blocking plate 1 for the fastener 4 to pass through, and a sealing member 6 is provided between the fastener 4 and the blocking plate 1 in the through hole.

[0066] In the technical solution of the present invention, the fastener 4 is a columnar structure, which can be inserted from the top of the baffle plate 1. By setting a through hole on the baffle plate 1, the fastener 4 is inserted from the top of the baffle plate 1 into the through hole, and the lower end of the fastener 4 is fixed inside the shower head end plate 2. In order to prevent the fastener 4 from penetrating into the baffle plate 1 and causing the gas phase film material to leak out, a seal 6 is provided between the outer periphery of the part of the fastener 4 located inside the baffle plate 1 and the baffle plate 1. The seal 6 can be made of sealing rubber, sealing plastic, sealant and other materials, which are not particularly limited here, as long as it can prevent the gas phase film material from leaking out from the baffle plate 1 through the through hole.

[0067] As a preferred solution of the present invention, the sealing member 6 is a sealing ring.

[0068] The sealing ring 6 is preferably an annular structure made of sealing rubber, which can be sleeved on the outer circumference of the upper part of the fastener.

[0069] As a preferred solution of the present invention, the fastener 4 is a threaded fastener; the threaded fastener includes a threaded portion and a head with a diameter wider than the threaded portion, and the seal 6 is sleeved on the outer circumference of the head in the through hole.

[0070] The fastener 4 can be a screw or bolt structure. When it is a screw, it includes a threaded portion and a head with a diameter wider than the threaded portion. The head includes a top and a connecting portion connected to the threaded portion. The seal 6 is preferably sleeved on the outer periphery of the connecting portion, and the connecting portion is inclined. Figure 2 As shown, it can also be arranged in steps, which is not particularly limited. Of course, other similar mechanical fasteners can also be used instead, which is not particularly limited in the present invention. When a bolt is used as a fastener, a sealing ring can be sleeved on the outer periphery of the head of the bolt, and the outer wall of the sealing ring 6 contacts the inner wall of the through hole of the bolt in the blocking plate 1, thereby forming a seal between the inner wall of the through hole and the bolt, preventing the gas phase film material in the interval 5 from leaking out through the through hole.

[0071] As a preferred solution of the present invention, recesses 7 are respectively provided at the bottom of the outer edge of the baffle plate 1; protrusions 8 corresponding to and matching the positions of the recesses 7 are respectively provided at the top of the outer edge of the sprinkler head end plate 2; and the elastic distance adjustment component 3 is arranged between the recesses 7 and the protrusions 8.

[0072] like Figure 2As shown, by providing the notch 7 at the bottom of the outer edge of the blocking plate 1 and the convex block 8 at the top of the outer edge of the shower head end plate 2, the installation between the blocking plate 1 and the shower head end plate 2 is more convenient by utilizing the contact between the outer wall of the convex block 8 and the inner wall of the notch 7, and the leakage of the gas phase thin film material within the interval 5 between the blocking plate 1 and the shower head end plate 2 can be further prevented. Among them, the shape of the notch 7 is a notch in the shape of a rectangular parallelepiped groove with the lower opening facing downward or a cylindrical groove-shaped notch with the opening facing downward, and the convex block 8 is a corresponding rectangular parallelepiped convex block or a cylindrical convex block, which is not particularly limited in the present invention.

[0073] As a preferred solution of the present invention, the elastic distance-adjusting component 3 is a bellows-shaped component.

[0074] By arranging the bellows-shaped part between the baffle plate 1 and the shower head end plate 2, its elasticity can be utilized to adjust the size of the distance 5 between the baffle plate 1 and the shower head end plate 2 according to the needs of the deposition process, thereby adjusting the flow rate of the gas phase thin film material flowing into the deposition chamber to control the uniformity of the thin film formed on the substrate surface and the cross-sectional profile of the thin film.

[0075] As a preferred solution of the present invention, a plurality of elastic distance-adjusting components 3 are evenly arranged along the circumferential direction on the outer edge of the blocking plate 1 .

[0076] In order to ensure that the upper and lower surfaces of the distance 5 between the blocking plate 1 and the shower head end plate 2 are horizontal, the number of the elastic distance-adjusting components 3 is at least two, and the specific number can be adjusted accordingly according to actual conditions.

[0077] As a preferred solution of the present invention, the heights of the plurality of elastic distance-adjusting components 3 located at the bottom of the outer edge of the blocking plate 1 are equal.

[0078] This design can further ensure that the gap 5 is horizontal, which is more conducive to adjusting the flow rate of the gas-phase thin film material entering the shower head unit.

[0079] The method of using the distance adjustment device for the shower head unit provided by the present invention in the vapor deposition process is as follows:

[0080] In the deposition process of the preset number of times, the distance 5 between the blocking plate 1 and the shower head end plate 2 is adjusted by the fastener 4 and the elastic distance adjustment component 3. After the distance 5 between the blocking plate 1 and the shower head end plate 2 reaches the preset size, the vapor deposition process is started.

[0081] In the vapor deposition process, that is, the process of depositing the vapor phase thin film material onto the substrate surface, it can generally be divided into multiple deposition processes, such as the first deposition process, the second deposition process, the third deposition process, etc. In the related art, since the blocking plate 1 and the shower head end plate 2 are directly fixed together, the distance 5 between the blocking plate 1 and the shower head end plate 2 cannot be adjusted, and the distance 5 between the blocking plate 1 and the shower head end plate 2 has an important influence on the flow rate of the vapor phase thin film material directed from the shower head unit to the deposition chamber, so it is easy to cause the uniformity of the thin film deposited on the substrate and the thin film profile to be uncontrollable. In this regard, the present invention improves the connection method between the baffle plate 1 and the shower head end plate 2, that is, an elastic distance adjusting component 3 is added between the outer edge bottom of the baffle plate 1 of the shower head unit and the outer edge top of the shower head end plate 2, and a fastener 4 is passed through the middle of the elastic distance adjusting component 3, and the fastener 4 passes through the elastic distance adjusting component 3 to fix the baffle plate 1 and the shower head end plate 2 together. The elastic distance adjusting component 3 and the fastener 4 can be used to adjust the distance 5 between the baffle plate 1 and the shower head end plate 2. Before the start of each or every few deposition processes, the distance 5 between the baffle plate 1 and the shower head end plate 2 is adjusted, so that during the deposition process, the flow rate of the gas phase thin film material flowing into the deposition chamber can be flexibly adjusted as needed, so as to improve the uniformity of the thin film on the substrate of the finished product and the cross-sectional profile of the thin film, so that the uniformity and film quality of the thin film material during film formation can be controlled.

[0082] Among them, the gas phase film material is, for example, gasified TEOS. TEOS is tetraethoxysilane, also known as tetraethyl silicate, an organic compound, a colorless liquid, mainly used as electrical insulation material, coating, optical glass treatment agent, and also used in organic synthesis. In the vapor deposition process, the liquid TEOS precursor is thermally decomposed under vacuum, and after being gasified, it is used as a gas phase film material and transported to the shower head unit through a pipeline, and in the shower head unit, it is introduced into the deposition chamber through a blocking plate, and film is formed on the surface of the substrate. Of course, the gas phase film material in the present invention can also be other materials, which are not particularly limited.

[0083] The distance adjustment device provided by the present invention can be used in the process of physical vapor deposition (PVD) and can also be used in the process of chemical vapor deposition (CVD), preferably used in plasma enhanced chemical vapor deposition (PECVD). In addition, the distance adjustment device of the present invention can also be used in other semiconductor process equipment such as etching devices.

[0084] It can be seen from the above specific embodiments that the distance adjusting device, the shower head unit and the semiconductor process equipment provided by the present invention, by adding an elastic distance adjusting component between the outer edge bottom of the baffle plate of the shower head unit and the outer edge top of the shower head end plate, and passing a fastener through the middle of the elastic distance adjusting component, the fastener passes through the elastic distance adjusting component to fix the baffle plate and the shower head end plate together, the elastic distance adjusting component and the fastener can be used to adjust the distance between the baffle plate and the shower head end plate, thereby adjusting the flow rate of the gas phase thin film material flowing into the deposition chamber, so as to improve the uniformity of the thin film and the cross-sectional profile of the thin film, so that the uniformity and film quality of the thin film material during film formation can be controlled.

[0085] As described above with reference to the accompanying drawings, the distance adjustment device, the shower head unit and the semiconductor process equipment proposed in the present invention are described by way of example. However, those skilled in the art should understand that various improvements can be made to the distance adjustment device, the shower head unit and the semiconductor process equipment proposed in the present invention without departing from the content of the present invention. Therefore, the protection scope of the present invention should be determined by the content of the attached claims.

Claims

1. A distance adjustment device for a sprinkler head unit, characterized in that: It includes an elastic distance-adjusting component arranged between the outer edge bottom of the baffle plate of the sprinkler head unit and the outer edge top of the sprinkler head end plate, and a fastener penetrating through the middle of the elastic distance-adjusting component; the fastener passes through the elastic distance-adjusting component to fix the baffle plate and the sprinkler head end plate together.

2. The distance adjustment device for a sprinkler head unit according to claim 1, characterized in that: The blocking plate is provided with a through hole for the fastener to pass through, and a sealing member is provided between the fastener and the blocking plate in the through hole.

3. The distance adjustment device for a sprinkler head unit according to claim 2, characterized in that: The sealing member is a sealing ring.

4. The distance adjustment device for a sprinkler head unit according to claim 3, characterized in that: The fastener is a threaded fastener; the threaded fastener comprises a threaded portion and a head portion whose diameter is wider than that of the threaded portion, and the sealing member is sleeved on the outer circumference of the head portion in the through hole.

5. The distance adjustment device for a sprinkler head unit according to claim 1, characterized in that: The bottom of the outer edge of the blocking plate is respectively provided with a notch; the top of the outer edge of the spray head end plate is respectively provided with a convex block corresponding to and matching the position of the notch; the elastic distance adjustment component is arranged between the notch and the convex block.

6. The distance adjustment device for a sprinkler head unit according to claim 1, characterized in that: The elastic distance-adjusting component is a bellows-shaped component.

7. The distance adjustment device for a sprinkler head unit according to claim 1, characterized in that: A plurality of elastic distance-adjusting components are evenly arranged along the circumferential direction on the outer edge of the blocking plate.

8. The distance adjustment device for a sprinkler head unit according to claim 7, characterized in that: The heights of the plurality of elastic distance-adjusting components located at the bottom of the outer edge of the blocking plate are equal.

9. A shower head unit, characterized in that: The invention comprises a distance adjusting device for a sprinkler head unit as claimed in any one of claims 1 to 8.

10. A semiconductor process equipment, comprising a shower head unit, characterized in that: A distance adjustment device for a shower head unit as claimed in any one of claims 1 to 8 is arranged inside the shower head unit.

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