Curve mask manufacturing method, device and equipment and storage medium

Abstract

The invention relates to the field of semiconductor production, in particular to a curve mask manufacturing method, device and equipment and a storage medium, and the method comprises the steps: receiving a to-be-processed mask, and determining a to-be-processed curve pattern in the to-be-processed mask; traversing edge segments of the to-be-processed curve graph, and determining included angles between all adjacent edge segments; setting segmentation points on intersection points of the adjacent edge segments of which the included angles are smaller than a first preset angle, and taking the edge of the curve graph to be processed between the two adjacent segmentation points as a basic processing segment; and inserting a sub-resolution scattering strip into the curve graph to be processed along the basic processing section to obtain a finished curve mask. According to the method, the included angle between the adjacent edge segments is measured, the edge of the to-be-processed curve graph is segmented according to the size of the included angle, the basic processing segments are obtained, the sub-resolution scattering strips are positioned and inserted with the basic processing segments as the edges, and the universality is improved.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor production, and in particular to a method, device, equipment and storage medium for manufacturing a curved mask. Background Art

[0002] Photolithography is the core process in chip manufacturing. The nonlinear effects in the optical system, mask and photoresist system will cause transfer distortion from the design pattern to wafer manufacturing in the chip manufacturing process. The existing mask pattern optimization mainly simulates and optimizes the mask layout based on the objective function of EPE (edge ​​position error) or CD (critical dimension) through OPC (optical proximity correction) technology to minimize the pattern distortion caused by nonlinear effects such as optics in the semiconductor manufacturing process. Among the above technical means, resolution enhancement is an indispensable and important means.

[0003] In resolution enhancement technology, the placement of sub-resolution scattering strips (SRAF, Sub-Resolution Assistant Feature) is a method to enhance the resolution of chip layout. The size of the usually placed SARF is smaller than the resolution of the lithography machine, and will not be imaged on the silicon wafer during the actual lithography process exposure process, that is, the SRAF pattern will not be transferred to the actual silicon wafer surface, but placing a suitable SRAF around the design layout can increase the depth of focus during the lithography process exposure process and reduce the process variation bandwidth during the exposure process. At present, the technology of inserting SRAF in regular graphics (such as rectangles, hexagons, trapezoids, etc. in mask layouts) is relatively mature, but how to insert SRAF in curved graphics and how to automatically determine the insertion position of SRAF in curved graphics has always troubled technicians in this field.

[0004] Therefore, how to determine the insertion position of the SRAF in the curve graph of the mask layout and complete the automatic insertion of the SRAF is a problem that needs to be solved urgently by those skilled in the art. Summary of the invention

[0005] The purpose of the present invention is to provide a method, device, equipment and storage medium for making a curved mask, so as to solve the problem in the prior art that the insertion position of SRAF in the curved pattern of the mask cannot be determined and the automatic insertion of SRAF can be completed.

[0006] In order to solve the above technical problems, the present invention provides a method for manufacturing a curved mask, comprising:

[0007] Receiving a mask to be processed, and determining a curve graph to be processed in the mask to be processed;

[0008] Traversing the edge segments of the curve graph to be processed, and determining the angles between all adjacent edge segments;

[0009] Setting segmentation points at intersections of adjacent edge segments whose included angle is smaller than the first preset angle, and taking the edge of the to-be-processed curve figure between two adjacent segmentation points as a basic processing segment;

[0010] Sub-resolution scattering strips are inserted into the to-be-processed curve pattern along the basic processing section to obtain a finished curve mask.

[0011] Optionally, in the method for manufacturing a curved mask, the first preset angle ranges from 90 degrees to 150 degrees, including endpoint values.

[0012] Optionally, in the method for manufacturing the curved mask, inserting sub-resolution scattering strips into the to-be-processed curved graph along the basic processing segment comprises:

[0013] The basic processing segment is moved along a first vertical direction into the to-be-processed curve graph by a preset first distance and a preset second distance, respectively, to obtain a first scattering strip edge and a second scattering strip edge; the first vertical direction is a direction perpendicular to a straight line connecting two segmentation points of the basic processing segment;

[0014] End points corresponding to the edge of the first scattering strip and the edge of the second scattering strip are closed to obtain sub-resolution scattering strips.

[0015] Optionally, in the method for manufacturing the curved mask, closing the endpoints corresponding to the edge of the first scattering strip and the edge of the second scattering strip to obtain the sub-resolution scattering strip comprises:

[0016] The end points corresponding to the edge of the first scattering strip and the edge of the second scattering strip are closed by using a straight line segment extending along the first vertical direction to obtain a sub-resolution scattering strip.

[0017] Optionally, in the method for manufacturing the curved mask, after obtaining the sub-resolution scattering strips, the method further comprises:

[0018] Determine the distances from the two ends of the sub-resolution scattering strip to the nearest edge of the to-be-processed curve figure along the end point connection direction as the extension spacing; the end point connection direction is the straight line connection direction between the two segmentation points of the basic processing segment;

[0019] Determining whether the extension spacing is less than a preset minimum allowable spacing;

[0020] When the extension spacing is smaller than the minimum allowable spacing, the sub-resolution scattering strips are shortened in length and / or translated in position so that two extension spacings corresponding to the sub-resolution scattering strips are adjusted to be no smaller than the minimum allowable spacing.

[0021] Optionally, in the method for manufacturing the curved mask, after obtaining the sub-resolution scattering strips, the method further comprises:

[0022] Determine the length of the sub-resolution scattering strip in the direction of the line connecting the end points as the major axis length;

[0023] Determining whether the length of the major axis exceeds a preset longest allowable side length;

[0024] When the length of the major axis exceeds the longest allowed side length, the sub-resolution scattering strip is divided into a plurality of scattering sub-strips, so that the length of each scattering sub-strip in the direction of the end point connection line does not exceed the longest allowed side length.

[0025] Optionally, in the method for manufacturing the curved mask, dividing the sub-resolution scattering strip into a plurality of scattering sub-strips comprises:

[0026] The sub-resolution scattering strip is cut into two scattering sub-strips at the midpoint in the direction of the end point connection line.

[0027] A device for manufacturing a curved mask, comprising:

[0028] A receiving module, used for receiving a mask to be processed and determining a curve graph to be processed in the mask to be processed;

[0029] An angle module, used for traversing the edge segments of the curve graph to be processed and determining the angles between all adjacent edge segments;

[0030] A segmentation module, used for setting segmentation points at the intersections of adjacent edge segments whose included angle is smaller than the first preset angle, and taking the edge of the to-be-processed curve figure between two adjacent segmentation points as a basic processing segment;

[0031] The scattering strip insertion module is used to insert sub-resolution scattering strips into the to-be-processed curve pattern along the basic processing section to obtain a finished curve mask.

[0032] A curved mask manufacturing device, comprising:

[0033] Memory for storing computer programs;

[0034] A processor is used to implement the steps of any of the above-mentioned methods for making a curved mask when executing the computer program.

[0035] A computer-readable storage medium stores a computer program, and when the computer program is executed by a processor, the steps of any one of the above-mentioned methods for making a curved mask are implemented.

[0036] The method for making a curved mask provided by the present invention comprises the following steps: receiving a mask to be processed and determining a curved graphic to be processed in the mask to be processed; traversing the edge segments of the curved graphic to be processed and determining the angles between all adjacent edge segments; setting segmentation points at the intersections of adjacent edge segments whose angles are smaller than a first preset angle, and taking the edge of the curved graphic to be processed between two adjacent segmentation points as a basic processing segment; and inserting sub-resolution scattering strips into the curved graphic to be processed along the basic processing segment to obtain a finished curved mask.

[0037] The present invention measures the angle between adjacent edge segments, and divides the edge of the to-be-processed curve figure according to the size of the angle, obtains a plurality of the basic processing segments, and uses the basic processing segments as edge positioning and inserts the sub-resolution scattering strips, thereby realizing the insertion of sub-resolution scattering strips in the to-be-processed curve figure with irregular edges, increasing the focal depth during the exposure process of the photolithography process, reducing the process variation bandwidth during the exposure process, and greatly improving the versatility of the present invention while improving the quality of subsequent photolithography imaging. The present invention also provides a manufacturing device, equipment and storage medium for a curve mask having the above-mentioned beneficial effects. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] In order to more clearly illustrate the embodiments of the present invention or the technical solutions of the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0039] Figure 1 A schematic flow chart of a specific implementation of a method for manufacturing a curved mask provided by the present invention;

[0040] Figure 2 A schematic diagram of the process structure of a specific implementation of the method for manufacturing a curved mask provided by the present invention;

[0041] Figure 3 A schematic flow chart of another specific implementation of the method for manufacturing a curved mask provided by the present invention;

[0042] Figure 4-1 and Figure 4-2 A schematic diagram of the process structure of another specific implementation of the method for manufacturing a curved mask provided by the present invention;

[0043] Figure 5 A schematic diagram of a process structure of another specific implementation of the method for manufacturing a curved mask provided by the present invention;

[0044] Figure 6 A schematic flow chart of another specific implementation of the method for manufacturing a curved mask provided by the present invention;

[0045] Figure 7 A schematic diagram of a process structure of another specific implementation of the method for manufacturing a curved mask provided by the present invention;

[0046] Figure 8 A schematic structural diagram of a specific implementation of the device for making a curved mask provided by the present invention.

[0047] Reference numerals:

[0048] 100-receiving module; 200-angle module; 300-segmentation module; 400-scattering strip insertion module. DETAILED DESCRIPTION

[0049] In order to enable those skilled in the art to better understand the scheme of the present invention, the present invention is further described in detail below in conjunction with the accompanying drawings and specific implementation methods. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0050] The core of the present invention is to provide a method for making a curved mask. A flow chart of a specific implementation method is shown in FIG. Figure 1 As shown, it is called specific implementation mode 1, including:

[0051] S101: receiving a mask to be processed, and determining a curve graph to be processed in the mask to be processed.

[0052] The curve graph to be processed is a graph with irregular edges, which can be referred to Figure 2 , Figure 2 That is, a curve figure with irregular edges to be processed.

[0053] S102: traverse the edge segments of the curve graph to be processed, and determine the angles between all adjacent edge segments.

[0054] During the OPC process, the edge of the curve graph to be processed will be divided into a number of straight line segments. This step is to determine the angle between adjacent straight line segments (which can be considered to be an angle less than 180 degrees).

[0055] S103: setting segmentation points at intersections of adjacent edge segments whose included angles are smaller than the first preset angle, and taking the edge of the to-be-processed curve figure between two adjacent segmentation points as a basic processing segment.

[0056] If it is an edge segment of a curve with a small turning radius, the angle between adjacent edge segments should be larger, the smoother and closer to 180 degrees, on the contrary, the smaller the angle, the more it indicates that the curve figure to be processed here has a turning point. The present invention presets the first preset angle. When the angle between adjacent edge segments is less than the first preset angle, it can be regarded as the turning point of the curve figure to be processed, or the curve figure to be processed can be regarded as a polygon, and this is the vertex angle of the polygon. Please refer to Figure 2 , Figure 2 A is used to mark the four segmentation points of the curve graph to be processed.

[0057] Preferably, the range of the first preset angle is 90 degrees to 150 degrees, including endpoint values, such as any one of 90.0 degrees, 102.8 degrees or 150.0 degrees. The above range is the optimal range after a large number of theoretical calculations and actual tests. Within the above range, the angle is not too small to ignore the corners of the figure, nor is it too large to increase the corners, which greatly increases the amount of calculation.

[0058] S104: inserting sub-resolution scattering strips into the to-be-processed curve pattern along the basic processing segment to obtain a finished curve mask.

[0059] The sub-resolution scattering strip may be a strip-shaped scattering strip arranged inside the curve graph to be processed along the extension direction of the sub-resolution scattering strip. It may be a rectangular scattering strip or a parallelogram scattering strip. An appropriate scattering strip shape may be selected according to actual conditions. The present invention does not limit this, but the basic processing segment must be regarded as an edge of the graph and inserted into the sub-resolution scattering strip.

[0060] The method for making a curved mask provided by the present invention receives a mask to be processed and determines the curved figure to be processed in the mask to be processed; traverses the edge segments of the curved figure to be processed and determines the angles between all adjacent edge segments; sets segmentation points at the intersections of adjacent edge segments whose angles are less than a first preset angle, and uses the edge of the curved figure to be processed between two adjacent segmentation points as a basic processing segment; inserts sub-resolution scattering strips into the curved figure to be processed along the basic processing segment to obtain a finished curved mask. The present invention measures the angle between adjacent edge segments, and divides the edge of the curved figure to be processed according to the size of the angle to obtain a plurality of basic processing segments, and uses the basic processing segments as edge positioning and inserts the sub-resolution scattering strips, thereby realizing the insertion of sub-resolution scattering strips in the curved figure to be processed with irregular edges, increasing the focal depth during the exposure process of the photolithography process, and reducing the process variation bandwidth during the exposure process, while improving the quality of subsequent photolithography imaging, greatly improving the versatility of the present invention.

[0061] On the basis of the first specific implementation mode, the method for inserting the sub-resolution scattering strip is further limited to obtain the second specific implementation mode, and the corresponding flow chart is as follows: Figure 3 As shown, including:

[0062] S201: receiving a mask to be processed, and determining a curve graph to be processed in the mask to be processed.

[0063] S202: traverse the edge segments of the curve graph to be processed, and determine the angles between all adjacent edge segments.

[0064] S203: setting segmentation points at intersections of adjacent edge segments whose included angles are smaller than the first preset angle, and taking the edge of the to-be-processed curve figure between two adjacent segmentation points as a basic processing segment.

[0065] S204: Move the basic processing segment along a first vertical direction into the to-be-processed curve graph by a preset first distance and a preset second distance respectively to obtain a first scattering strip edge and a second scattering strip edge; the first vertical direction is a direction perpendicular to a straight line connecting two segmentation points of the basic processing segment.

[0066] You can refer to Figure 4-1 and Figure 4-2 , Figure 4-1 In the figure, two segmentation points of the basic processing segment are connected by a solid line, and the first vertical direction is represented by a dotted line. Figure 4-2 The first distance and the second distance are marked in FIG. 1 , and the difference between the first distance and the second distance is the width of the sub-resolution scattering strip. Figure 4-2In FIG. 5 , D1 is used to represent the first distance, D2 is used to represent the second distance, and w is used to represent the width of the sub-resolution scattering strip.

[0067] S205: closing the end points corresponding to the edge of the first scattering strip and the edge of the second scattering strip to obtain sub-resolution scattering strips and a finished curved mask.

[0068] The two segmentation points of the basic processing segment can be called the first segmentation point and the second segmentation point, respectively. The "closing the endpoints corresponding to the first scattering strip edge and the second scattering strip edge" means connecting and closing the endpoints of the first scattering strip edge and the second scattering strip edge close to the first segmentation point, and connecting and closing the endpoints of the first scattering strip edge and the second scattering strip edge close to the second segmentation point. The connection and closing method of the two end points on the same side can be selected according to actual conditions, such as connecting and closing with a straight line segment, or connecting and closing with a semicircular arc, or connecting and closing with other irregular line segments, which is not limited in the present invention.

[0069] The difference between this specific implementation and the above specific implementation is that this specific implementation specifically provides a positioning setting method for the sub-resolution scattering strips, and the remaining steps are the same as the above specific implementation, which will not be elaborated here.

[0070] In this specific embodiment, a specific means for setting and inserting the sub-resolution scattering strip is provided, that is, the basic processing segment is translated twice into the interior of the curve figure to be processed to obtain two edges of the sub-resolution scattering strip. The shape trend of the sub-resolution scattering strip obtained in this way is consistent with the edge trend and shape of the curve figure to be processed, which can greatly reduce the amount of calculation during actual lithography, reduce the process difficulty, and improve the lithography quality.

[0071] As a preferred implementation, the end points corresponding to the edge of the first scattering strip and the edge of the second scattering strip are closed to obtain the sub-resolution scattering strip, which includes:

[0072] The end points corresponding to the edge of the first scattering strip and the edge of the second scattering strip are closed by using a straight line segment extending along the first vertical direction to obtain a sub-resolution scattering strip.

[0073] In this preferred embodiment, the end points corresponding to the edge of the first scattering strip and the edge of the second scattering strip are directly sealed by a straight line segment along the first vertical direction, which is simple, fast and has high processing efficiency. Of course, other edge sealing methods can also be used, and the present invention is not limited here.

[0074] Furthermore, after obtaining the sub-resolution scattering strips, the method further includes:

[0075] A1: respectively determine the distances from the two ends of the sub-resolution scattering strip along the end point connection direction to the nearest edge of the curve figure to be processed as the extension spacing; the end point connection direction is the straight line connection direction between the two segmentation points of the basic processing segment.

[0076] For reference Figure 5 , Figure 5 In the figure, L1 and L2 are used to represent the extension spacings corresponding to the two ends of the sub-resolution scattering strip.

[0077] A2: Determine whether the extension spacing is less than a preset minimum allowable spacing.

[0078] The minimum allowable spacing can be set according to actual needs, and the present invention is not limited to a specific range.

[0079] A3: When the extension spacing is smaller than the minimum allowable spacing, the sub-resolution scattering strip is shortened in length and / or the position is shifted so that the two extension spacings corresponding to the sub-resolution scattering strip are adjusted to be no smaller than the minimum allowable spacing.

[0080] In this preferred embodiment, it is further examined whether the end point of the sub-resolution scattering strip is too close to the edge of the curve figure to be processed. If the end point of the sub-resolution scattering strip is too close to the edge of the curve figure to be processed, it may cause the edge of the curve figure to be processed to be missing corners or pattern damage in the subsequent photolithography process. This preferred method greatly improves the finished product yield of the subsequent photolithography.

[0081] Since the distance between the sub-resolution scattering strip and the edge of the curve figure to be processed in the first vertical direction is the first distance, as long as there is no problem with the preset value of the first distance, there is no need to check whether the sub-resolution scattering strip is too close to the edge of the curve figure to be processed in the first vertical direction.

[0082] On the basis of the second specific implementation mode, after the sub-resolution scattering strip is set, the sub-resolution scattering strip is further checked to obtain the third specific implementation mode, and the corresponding flow chart is as follows: Figure 6 As shown, including:

[0083] S301: receiving a mask to be processed, and determining a curve graph to be processed in the mask to be processed.

[0084] S302: traverse the edge segments of the curve graph to be processed, and determine the angles between all adjacent edge segments.

[0085] S303: setting segmentation points at intersections of adjacent edge segments whose included angles are smaller than the first preset angle, and taking the edge of the to-be-processed curve figure between two adjacent segmentation points as a basic processing segment.

[0086] S304: Move the basic processing segment along a first vertical direction into the to-be-processed curve graph by a preset first distance and a preset second distance respectively, to obtain a first scattering strip edge and a second scattering strip edge; the first vertical direction is a direction perpendicular to a straight line connecting two segmentation points of the basic processing segment.

[0087] S305: closing the endpoints corresponding to the edge of the first scattering strip and the edge of the second scattering strip to obtain a sub-resolution scattering strip.

[0088] S306: Determine the length of the sub-resolution scattering strip in the direction of the line connecting the end points as the major axis length.

[0089] S307: Determine whether the length of the major axis exceeds a preset maximum allowable side length.

[0090] S308: When the length of the major axis exceeds the longest allowable side length, the sub-resolution scattering strip is divided into multiple scattering sub-strips, so that the length of each scattering sub-strip in the direction of the end point connection line does not exceed the longest allowable side length, to obtain a finished curved mask.

[0091] The difference between this specific implementation and the above specific implementation is that this specific implementation specifically provides a positioning setting method for the sub-resolution scattering strips, and the remaining steps are the same as the above specific implementation, which will not be elaborated here.

[0092] For reference Figure 7 , Figure 7 The direction of the endpoint connection is marked by a double-headed arrow. If the major axis length of the sub-resolution scattering strip in the direction of the endpoint connection is too long, the uncontrollability of the process will be greatly increased and the process accuracy will be reduced. Therefore, in this preferred embodiment, the overly long sub-resolution scattering strip is interrupted to form a plurality of scattering sub-strips with a length less than the longest allowable side length, thereby increasing the depth of focus during the exposure process of the lithography process, reducing the process variation bandwidth during the exposure process, improving the lithography imaging quality, and reducing the process difficulty, thereby improving the yield of finished products.

[0093] Furthermore, the sub-resolution scattering strip is divided into a plurality of scattering sub-strips, including:

[0094] The sub-resolution scattering strip is cut into two scattering sub-strips at the midpoint in the direction of the end point connection line.

[0095] In this preferred embodiment, the sub-resolution scattering strip is directly cut off at the midpoint in the direction of the endpoint connection line to form two scattering sub-strips. Since the length of the sub-resolution scattering strip in the direction of the endpoint connection line is basically impossible to reach twice the longest allowed side length, there is no need to worry that the truncated scattering sub-strip still exceeds the longest allowed side length, thereby greatly reducing the calculation difficulty and improving processing efficiency.

[0096] The following is an introduction to a curved mask manufacturing device provided by an embodiment of the present invention. The curved mask manufacturing device described below and the curved mask manufacturing method described above can be referred to each other.

[0097] Figure 8 The structural block diagram of the device for making a curved mask provided by the embodiment of the present invention is shown in FIG. Figure 8 The manufacturing device of the curved mask may include:

[0098] The receiving module 100 is used to receive a mask to be processed and determine a curve graph to be processed in the mask to be processed;

[0099] An angle module 200, used to traverse the edge segments of the curve graph to be processed and determine the angles between all adjacent edge segments;

[0100] A segmentation module 300, configured to set segmentation points at intersections of adjacent edge segments whose included angle is smaller than the first preset angle, and to use the edge of the to-be-processed curve figure between two adjacent segmentation points as a basic processing segment;

[0101] The scattering strip inserting module 400 is used to insert sub-resolution scattering strips into the to-be-processed curve pattern along the basic processing segment to obtain a finished curve mask.

[0102] As a preferred implementation, the scattering strip insertion module 400 comprises:

[0103] a moving unit, used to move the basic processing segment along a first vertical direction into the to-be-processed curve graph by a preset first distance and a preset second distance, respectively, to obtain a first scattering strip edge and a second scattering strip edge; the first vertical direction is a direction perpendicular to a straight line connecting two segmentation points of the basic processing segment;

[0104] The closing unit is used to close the end points corresponding to the edge of the first scattering strip and the edge of the second scattering strip to obtain a sub-resolution scattering strip.

[0105] As a preferred implementation, the scattering strip insertion module 400 includes:

[0106] The straight line closing unit is used to close the end points corresponding to the edge of the first scattering strip and the edge of the second scattering strip by using the straight line segment extending along the first vertical direction to obtain the sub-resolution scattering strip.

[0107] As a preferred implementation, the scattering strip insertion module 400 further includes:

[0108] A spacing determination unit is used to respectively determine the distances from the two ends of the sub-resolution scattering strip to the nearest edge of the to-be-processed curve figure along the end point connection direction as the extension spacing; the end point connection direction is the straight line connection direction between the two segmentation points of the basic processing segment;

[0109] A spacing judgment unit, used to judge whether the extended spacing is less than a preset minimum allowable spacing;

[0110] The spacing adjustment unit is used to adjust the two extension spacings corresponding to the sub-resolution scattering strips to be not less than the minimum allowable spacing by shortening the length and / or translating the position of the sub-resolution scattering strips when the extension spacing is less than the minimum allowable spacing.

[0111] As a preferred implementation, the scattering strip insertion module 400 further includes:

[0112] A length determination unit, used to determine the length of the sub-resolution scattering strip in the direction of the line connecting the end points as the major axis length;

[0113] A length judgment unit, used to judge whether the length of the major axis exceeds a preset longest allowable side length;

[0114] The length truncation unit is used to divide the sub-resolution scattering strip into multiple scattering sub-strips when the length of the major axis exceeds the longest allowed side length, so that the length of each scattering sub-strip in the direction of the end point connection line does not exceed the longest allowed side length.

[0115] As a preferred implementation, the scattering strip insertion module 400 comprises:

[0116] A midpoint truncation unit is used to truncate the sub-resolution scattering strip into two scattering sub-strips at the midpoint in the direction of the end point connection line.

[0117] The manufacturing device of the curved mask provided by the present invention comprises a receiving module 100, which is used to receive a mask to be processed and determine the curved figure to be processed in the mask to be processed; an angle module 200, which is used to traverse the edge segments of the curved figure to be processed and determine the angles between all adjacent edge segments; a segmentation module 300, which is used to set segmentation points at the intersections of adjacent edge segments whose angles are less than a first preset angle, and use the edge of the curved figure to be processed between two adjacent segmentation points as a basic processing segment; and a scattering strip insertion module 400, which is used to insert sub-resolution scattering strips into the curved figure to be processed along the basic processing segment to obtain a finished curved mask. The present invention measures the angle between adjacent edge segments, and divides the edge of the to-be-processed curve figure according to the size of the angle to obtain a plurality of the basic processing segments, and uses the basic processing segments as edge positioning and inserts the sub-resolution scattering strips, thereby realizing the insertion of sub-resolution scattering strips in the to-be-processed curve figure with irregular edges, increasing the focal depth during the exposure process of the lithography process, reducing the process variation bandwidth during the exposure process, and greatly improving the versatility of the present invention while improving the subsequent lithography imaging quality.

[0118] The curved mask manufacturing device of the present embodiment is used to implement the aforementioned curved mask manufacturing method. Therefore, the specific implementation method of the curved mask manufacturing device can be seen in the embodiment part of the curved mask manufacturing method in the previous text. For example, the receiving module 100, the angle module 200, the segmentation module 300, and the scattering strip insertion module 400 are respectively used to implement steps S101, S102, S103 and S104 in the aforementioned curved mask manufacturing method. Therefore, its specific implementation method can refer to the description of the corresponding various parts of the embodiment, which will not be repeated here.

[0119] The present invention also provides a curved mask manufacturing device, comprising:

[0120] Memory for storing computer programs;

[0121] A processor is used to implement the steps of any of the above-mentioned methods for making a curved mask when executing the computer program. The method for making a curved mask provided by the present invention receives a mask to be processed and determines the curved graph to be processed in the mask to be processed; traverses the edge segments of the curved graph to be processed and determines the angles between all adjacent edge segments; sets segmentation points at the intersections of adjacent edge segments whose angles are less than a first preset angle, and uses the edge of the curved graph to be processed between two adjacent segmentation points as a basic processing segment; inserts sub-resolution scattering strips into the curved graph to be processed along the basic processing segment to obtain a finished curved mask. The present invention measures the angle between adjacent edge segments, and divides the edge of the curved graph to be processed according to the size of the angle to obtain a plurality of basic processing segments, and uses the basic processing segments as edge positioning and inserts the sub-resolution scattering strips, thereby realizing the insertion of sub-resolution scattering strips in the curved graph to be processed with irregular edges, increasing the focal depth during the exposure process of the photolithography process, and reducing the process variation bandwidth during the exposure process, while improving the quality of subsequent photolithography imaging, greatly improving the versatility of the present invention.

[0122] The present invention also provides a computer-readable storage medium, on which a computer program is stored, and when the computer program is executed by a processor, the steps of any of the above-mentioned methods for making a curved mask are implemented. The method for making a curved mask provided by the present invention receives a mask to be processed, and determines the curved graphic to be processed in the mask to be processed; traverses the edge segments of the curved graphic to be processed, and determines the angles between all adjacent edge segments; sets segmentation points at the intersections of adjacent edge segments whose angles are less than a first preset angle, and uses the edge of the curved graphic to be processed between two adjacent segmentation points as a basic processing segment; inserts sub-resolution scattering strips into the curved graphic to be processed along the basic processing segment to obtain a finished curved mask. The present invention measures the angle between adjacent edge segments, and divides the edge of the to-be-processed curve figure according to the size of the angle to obtain a plurality of the basic processing segments, and uses the basic processing segments as edge positioning and inserts the sub-resolution scattering strips, thereby realizing the insertion of sub-resolution scattering strips in the to-be-processed curve figure with irregular edges, increasing the focal depth during the exposure process of the lithography process, reducing the process variation bandwidth during the exposure process, and greatly improving the versatility of the present invention while improving the subsequent lithography imaging quality.

[0123] In this specification, each embodiment is described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the embodiments can be referred to each other. For the device disclosed in the embodiment, since it corresponds to the method disclosed in the embodiment, the description is relatively simple, and the relevant parts can be referred to the method part.

[0124] It should be noted that, in this specification, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "comprise", "include" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, an element defined by the statement "comprises a ..." does not exclude the presence of other identical elements in the process, method, article or device including the element.

[0125] Professionals may further appreciate that the units and algorithm steps of each example described in conjunction with the embodiments disclosed herein can be implemented in electronic hardware, computer software, or a combination of the two. In order to clearly illustrate the interchangeability of hardware and software, the composition and steps of each example have been generally described in the above description according to function. Whether these functions are performed in hardware or software depends on the specific application and design constraints of the technical solution. Professionals and technicians may use different methods to implement the described functions for each specific application, but such implementation should not be considered to be beyond the scope of the present invention.

[0126] The steps of the method or algorithm described in conjunction with the embodiments disclosed herein may be implemented directly using hardware, a software module executed by a processor, or a combination of the two. The software module may be placed in a random access memory (RAM), a memory, a read-only memory (ROM), an electrically programmable ROM, an electrically erasable programmable ROM, a register, a hard disk, a removable disk, a CD-ROM, or any other form of storage medium known in the art.

[0127] The above is a detailed introduction to the method, device, equipment and storage medium for making the curved mask provided by the present invention. This article uses specific examples to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only used to help understand the method and core ideas of the present invention. It should be pointed out that for ordinary technicians in this technical field, without departing from the principles of the present invention, the present invention can also be improved and modified, and these improvements and modifications also fall within the scope of protection of the present invention.

Claims

1. A method for making a curved mask, characterized in that: include: Receiving a mask to be processed, and determining a curve graph to be processed in the mask to be processed; Traversing the edge segments of the curve graph to be processed, and determining the angles between all adjacent edge segments; Setting segmentation points at intersections of adjacent edge segments whose included angle is smaller than the first preset angle, and taking the edge of the to-be-processed curve figure between two adjacent segmentation points as a basic processing segment; Sub-resolution scattering strips are inserted into the to-be-processed curve pattern along the basic processing section to obtain a finished curve mask.

2. The method for making a curved mask according to claim 1, wherein: The first preset angle ranges from 90 degrees to 150 degrees, including endpoint values.

3. The method for making a curved mask according to claim 1, wherein: Inserting a sub-resolution scattering strip into the to-be-processed curve graph along the basic processing segment comprises: The basic processing segment is moved along a first vertical direction into the to-be-processed curve graph by a preset first distance and a preset second distance, respectively, to obtain a first scattering strip edge and a second scattering strip edge; the first vertical direction is a direction perpendicular to a straight line connecting two segmentation points of the basic processing segment; End points corresponding to the edge of the first scattering strip and the edge of the second scattering strip are closed to obtain sub-resolution scattering strips.

4. The method for making a curved mask according to claim 3, wherein: Closing the endpoints corresponding to the edge of the first scattering strip and the edge of the second scattering strip to obtain a sub-resolution scattering strip comprises: The end points corresponding to the edge of the first scattering strip and the edge of the second scattering strip are closed by using a straight line segment extending along the first vertical direction to obtain a sub-resolution scattering strip.

5. The method for making a curved mask according to claim 3, wherein: After obtaining the sub-resolution scattering strips, the method further includes: Determine the distances from the two ends of the sub-resolution scattering strip to the nearest edge of the to-be-processed curve figure along the end point connection direction as the extension spacing; the end point connection direction is the straight line connection direction between the two segmentation points of the basic processing segment; Determining whether the extension spacing is less than a preset minimum allowable spacing; When the extension spacing is smaller than the minimum allowable spacing, the sub-resolution scattering strips are shortened in length and / or translated in position so that two extension spacings corresponding to the sub-resolution scattering strips are adjusted to be no smaller than the minimum allowable spacing.

6. The method for making a curved mask according to claim 3, wherein: After obtaining the sub-resolution scattering strips, the method further includes: Determine the length of the sub-resolution scattering strip in the direction of the line connecting the end points as the major axis length; Determining whether the length of the major axis exceeds a preset longest allowable side length; When the length of the major axis exceeds the longest allowed side length, the sub-resolution scattering strip is divided into a plurality of scattering sub-strips, so that the length of each scattering sub-strip in the direction of the end point connection line does not exceed the longest allowed side length.

7. The method for manufacturing a curved mask according to claim 6, wherein: The sub-resolution scattering strip is divided into a plurality of scattering sub-strips, comprising: The sub-resolution scattering strip is cut into two scattering sub-strips at the midpoint in the direction of the end point connection line.

8. A device for making a curved mask, characterized in that: include: A receiving module, used for receiving a mask to be processed and determining a curve graph to be processed in the mask to be processed; An angle module, used for traversing the edge segments of the curve graph to be processed and determining the angles between all adjacent edge segments; A segmentation module, used for setting segmentation points at the intersections of adjacent edge segments whose included angle is smaller than the first preset angle, and taking the edge of the to-be-processed curve figure between two adjacent segmentation points as a basic processing segment; The scattering strip insertion module is used to insert sub-resolution scattering strips into the to-be-processed curve pattern along the basic processing section to obtain a finished curve mask.

9. A curved mask manufacturing device, characterized in that: include: Memory for storing computer programs; A processor, configured to implement the steps of the method for manufacturing a curved mask as claimed in any one of claims 1 to 7 when executing the computer program.

10. A computer-readable storage medium, characterized in that: The computer-readable storage medium stores a computer program, and when the computer program is executed by a processor, the steps of the method for manufacturing a curved mask according to any one of claims 1 to 7 are implemented.

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