Mask plate, exposure method, display panel and display device

Abstract

The embodiment of the invention discloses a mask plate, an exposure method, a display panel and a display device. The mask plate is used for preparing the display substrate in a fractional exposure mode, the mask plate comprises at least two exposure areas, the at least two exposure areas comprise a first exposure area and a second exposure area, the first exposure area comprises a first mark pattern located on the first edge of the mask plate, and the second exposure area comprises a second mark pattern located on the second edge of the mask plate. The second exposure area comprises a second mark pattern located at a second edge of the mask plate, and the first edge and the second edge are oppositely arranged; during first exposure, exposure light irradiates the first exposure area, and a first mark corresponding to the first mark pattern is formed on the display substrate; and during the second exposure, moving the mask plate to enable the second mark pattern and the first mark to be nested. According to the embodiment of the invention, the monitoring design of the splicing area is realized by designing the first mark pattern and the second mark pattern, the splicing accuracy is improved, the product performance is improved, and the product competitiveness is enhanced.

Description

Technical Field

[0001] The embodiments of the present invention relate to display technology, and more particularly to a mask, an exposure method, a display panel and a display device. Background Art

[0002] With the development of display technology, there are more and more display panels with large sizes or special aspect ratios (such as vehicle-mounted displays). Due to the size limitation of the mask, when the exposure area of ​​the mask is smaller than the display area of ​​the display panel, the display panel can be prepared by splicing the masks and exposing them in batches.

[0003] However, in the prior art, when performing splicing and multiple exposure, the product yield is low and the product performance is poor due to the deviation of the splicing position. Summary of the invention

[0004] The embodiments of the present invention provide a mask, an exposure method, a display panel and a display device. The mask can be used to prepare a display substrate by multiple exposures. By designing a first marking pattern and a second marking pattern, a monitoring design of a splicing area can be implemented to improve the accuracy of splicing, improve product performance, and enhance product competitiveness.

[0005] In a first aspect, an embodiment of the present invention provides a mask plate for preparing a display substrate by a multiple exposure method, wherein the mask plate includes at least two exposure areas, wherein the at least two exposure areas include a first exposure area and a second exposure area, wherein the first exposure area includes a first mark pattern located at a first edge of the mask plate, and the second exposure area includes a second mark pattern located at a second edge of the mask plate, and the first edge and the second edge are arranged opposite to each other;

[0006] During the first exposure, the exposure light irradiates the first exposure area, and a first mark corresponding to the first mark pattern is formed on the display substrate; during the second exposure, the mask is moved so that the second mark pattern is nested with the first mark.

[0007] In a second aspect, an embodiment of the present invention further provides an exposure method, which is applicable to the mask described in the first aspect, and the exposure method comprises:

[0008] providing a substrate;

[0009] Aligning a first exposure region of the mask with a first to-be-exposed region of the substrate;

[0010] performing a first exposure to form a first mark on the substrate;

[0011] Moving the mask plate so that the second graphic mark and the first mark are nested and arranged, so that the second exposure area of ​​the mask plate corresponds to the second area to be exposed of the substrate;

[0012] performing a second exposure to form a second mark on the substrate;

[0013] The first area to be exposed and the second area to be exposed are arranged adjacent to each other, and the first mark and the second mark are arranged nested.

[0014] In a third aspect, an embodiment of the present invention further provides a mask plate for preparing a display substrate by a multiple exposure method, wherein the mask plate includes at least two sub-masks, and the at least two sub-masks include a first sub-mask plate and a second sub-mask plate, the first sub-mask plate includes a first area, the first area includes a first marking pattern, the second sub-mask plate includes a second area, and the second area includes a second marking pattern;

[0015] During the first exposure, the first sub-mask template corresponds to the display substrate, and the exposure light irradiates the first sub-mask template, and a first mark corresponding to the first mark pattern is formed on the display substrate; during the second exposure, the second sub-mask template corresponds to the display substrate, and the second mark pattern is nested with the first mark.

[0016] In a fourth aspect, an embodiment of the present invention further provides an exposure method, which is applicable to the mask described in the third aspect, and the exposure method comprises:

[0017] providing a substrate;

[0018] Aligning the first sub-mask with the first to-be-exposed area of ​​the substrate;

[0019] Performing a first exposure, wherein the exposure light irradiates the first sub-mask to form a first mark on the substrate;

[0020] Nesting a second graphic mark of a second sub-mask plate with the first mark so that the second sub-mask plate corresponds to a second area to be exposed on the substrate;

[0021] performing a second exposure, wherein the exposure light irradiates the second sub-mask to form a second mark on the substrate;

[0022] The first area to be exposed and the second area to be exposed are arranged adjacent to each other, and the first mark and the second mark are arranged nested.

[0023] In a fifth aspect, an embodiment of the present invention further provides a display panel, comprising a display substrate and a first mark and a second mark located on at least one side of the display substrate, wherein the first mark and the second mark are nested and formed by exposure to the mask described in the first aspect or the third aspect.

[0024] In a sixth aspect, an embodiment of the present invention further provides a display device, comprising the display panel described in the fifth aspect.

[0025] A mask provided by an embodiment of the present invention is used for preparing a display substrate by a multiple exposure method. The mask includes at least two exposure areas, the at least two exposure areas include a first exposure area and a second exposure area, the first exposure area includes a first mark pattern located at a first edge of the mask, the second exposure area includes a second mark pattern located at a second edge of the mask, and the first edge and the second edge are arranged relative to each other; during the first exposure, the first exposure area of ​​the mask is arranged to correspond to a first area to be exposed on the display substrate, and the exposure light irradiates the first exposure area to form a corresponding exposure pattern in the first area to be exposed, and a first mark corresponding to the first mark pattern is formed on the display substrate; during the second exposure, the mask is moved so that the second mark pattern is nested with the first mark, so that the second exposure area of ​​the mask is accurately aligned with the second area to be exposed on the display substrate, so as to solve the problem that the product size exceeds the size of the mask due to the limitation of the mask and cannot meet the single mask exposure molding requirements, and the monitoring design of the splicing area is realized by designing the first mark pattern and the second mark pattern, so as to improve the accuracy of splicing, improve product performance, and enhance product competitiveness. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 A schematic diagram of the structure of a display substrate during an exposure process;

[0027] Figure 2 A schematic structural diagram of a mask provided by an embodiment of the present invention;

[0028] Figure 3 A schematic structural diagram of another mask provided by an embodiment of the present invention;

[0029] Figure 4 A schematic diagram of a mask state during multiple exposure provided by an embodiment of the present invention;

[0030] Figure 5 A schematic diagram of a local structure of a mask template during splicing provided by an embodiment of the present invention;

[0031] Figure 6 A schematic diagram of a local structure of another mask template during splicing provided by an embodiment of the present invention;

[0032] Figure 7 A schematic diagram of a partial structure of a display substrate provided by an embodiment of the present invention;

[0033] Figure 8 A schematic diagram of the structure during the second exposure provided by an embodiment of the present invention;

[0034] Fig. 9A schematic structural diagram of a display substrate after second exposure provided by an embodiment of the present invention;

[0035] Fig.10 A schematic diagram of the shapes of a first mark and a second mark provided in an embodiment of the present invention;

[0036] Fig.11 A schematic diagram of the shapes of another first mark and a second mark provided in an embodiment of the present invention;

[0037] Fig.12 A schematic diagram of the shapes of another first mark and a second mark provided in an embodiment of the present invention;

[0038] Fig.13 A schematic diagram of the shapes of another first mark and a second mark provided in an embodiment of the present invention;

[0039] Fig.14 A schematic diagram of the shapes of another first mark and a second mark provided in an embodiment of the present invention;

[0040] Fig.15 A schematic flow chart of an exposure method provided by an embodiment of the present invention;

[0041] Fig.16 A schematic diagram of a structure before the first exposure provided by an embodiment of the present invention;

[0042] Fig.17 A schematic structural diagram of a mask provided by an embodiment of the present invention;

[0043] Fig.18 A schematic diagram of another structure during the second exposure provided by an embodiment of the present invention;

[0044] Fig.19 A schematic structural diagram of another display substrate after second exposure provided by an embodiment of the present invention;

[0045] Fig. 20 A schematic flow chart of another exposure method provided by an embodiment of the present invention;

[0046] Fig.21 A schematic diagram of another structure before first exposure provided by an embodiment of the present invention;

[0047] Fig. 22 A schematic diagram of the structure of a display panel provided by an embodiment of the present invention;

[0048] Fig.23 A schematic diagram of the structure of another display panel provided by an embodiment of the present invention;

[0049] Fig.24A schematic structural diagram of a display device provided by an embodiment of the present invention. DETAILED DESCRIPTION

[0050] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It is to be understood that the specific embodiments described herein are only used to explain the present invention, rather than to limit the present invention. It should also be noted that, for ease of description, only parts related to the present invention, rather than all structures, are shown in the accompanying drawings.

[0051] The terms used in the embodiments of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention. It should be noted that the directional words such as "upper", "lower", "left", "right" and the like described in the embodiments of the present invention are described at the angles shown in the accompanying drawings and should not be understood as limitations on the embodiments of the present invention. In addition, in the context, it is also necessary to understand that when it is mentioned that an element is formed "on" or "under" another element, it can not only be directly formed "on" or "under" another element, but also indirectly formed "on" or "under" another element through an intermediate element. The terms "first", "second" and the like are only used for descriptive purposes and do not indicate any order, quantity or importance, but are only used to distinguish different components. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to the specific circumstances.

[0052] Figure 1 is a schematic diagram of the structure of a display substrate during the exposure process, referring to Figure 1 Since the size of the display substrate 2 in the x direction is larger than the size of the mask plate 1 in the x direction, the display substrate 2 is prepared by splicing the mask plates for exposure. During the first exposure, the mask plate 1 (shown by the solid line) corresponds to the left side of the display substrate 2. During the second exposure, the mask plate 1 (shown by the dotted line) corresponds to the right side of the display substrate 2. The display substrate 2 is prepared by the double exposure process. However, since the mask plates are prone to alignment errors during splicing exposure, the performance of the display substrate is poor.

[0053] In order to solve the above problems, an embodiment of the present invention provides a mask plate for preparing a display substrate by a multiple exposure method, the mask plate includes at least two exposure areas, the at least two exposure areas include a first exposure area and a second exposure area, the first exposure area includes a first mark pattern located at a first edge of the mask plate, the second exposure area includes a second mark pattern located at a second edge of the mask plate, and the first edge and the second edge are arranged relative to each other; during the first exposure, the exposure light irradiates the first exposure area, and a first mark corresponding to the first mark pattern is formed on the display substrate; during the second exposure, the mask plate is moved so that the second mark pattern is nested with the first mark.

[0054] The mask provided by the embodiment of the present invention, during the first exposure, sets the first exposure area of ​​the mask to correspond to the first area to be exposed of the display substrate, and the exposure light irradiates the first exposure area to form a corresponding exposure pattern in the first area to be exposed, and forms a first mark corresponding to the first mark pattern on the display substrate; during the second exposure, the mask is moved so that the second mark pattern is nested with the first mark, so as to achieve precise alignment of the second exposure area of ​​the mask and the second area to be exposed of the display substrate, thereby solving the problem that the product size exceeds the size of the mask due to the limitation of the mask and cannot meet the requirements of single mask exposure molding, and the monitoring design of the splicing area is realized by designing the first mark pattern and the second mark pattern, thereby improving the accuracy of splicing, improving product performance, and enhancing product competitiveness.

[0055] The above is the core idea of ​​an embodiment of the present invention. The following describes a specific embodiment of the present invention in conjunction with the accompanying drawings. For example, taking the mask having two exposure areas as an example, Figure 2 A schematic diagram of the structure of a mask provided by an embodiment of the present invention, Figure 3 A schematic diagram of another mask structure provided by an embodiment of the present invention, referring to Figure 2 and Figure 3 The mask plate 10 includes a first exposure area 11 and a second exposure area 12. The first exposure area 11 includes a first marking pattern S1 ( Figure 2 and Figure 3 Schematically showing two first marking patterns S1 located on both sides of the first exposure area 11, which is not a limitation of the embodiment of the present invention), the second exposure area 12 includes a second marking pattern S2 located at the second edge of the mask, Figure 2 It is schematically shown that the first exposure area 11 and the second exposure area 12 are arranged up and down. When exposing, the first exposure area 11 and the second exposure area are spliced, and the first edge is the right edge of the mask plate, and the second edge is the left edge of the mask plate. Figure 3 Schematically showing that the first exposure area 11 and the second exposure area 12 are arranged on the left and right, and the first exposure area 11 and the second exposure area 12 are spliced ​​during exposure, at which time the first edge can be the upper edge of the mask plate, and the second edge can be the lower edge of the mask plate. During the first exposure, the first exposure area 11 is aligned with the lower half of the display substrate, and during the second exposure, the second exposure area is aligned with the upper half of the display substrate. In the following embodiments, the first exposure area 11 and the second exposure area 12 are arranged up and down, and the marking pattern includes two groups as an example for description. Figure 4 A schematic diagram of a mask state during multiple exposure provided by an embodiment of the present invention, referring to Figure 4 , during the first exposure, the mask is located at Figure 4In the solid line area, the exposure light irradiates the first exposure area 11. During the second exposure, the mask is moved so that the mask is located at Figure 4 In the middle dotted area, the first exposure area 11 and the second exposure area 12 are spliced. Figure 5 A schematic diagram of a local structure of a mask template splicing according to an embodiment of the present invention is provided. Figure 6 A schematic diagram of a local structure of another mask template splicing according to an embodiment of the present invention is provided. Figure 7 A partial structural diagram of a display substrate provided by an embodiment of the present invention, referring to Figure 5 The mask includes a splicing area 101 and a non-splicing area 102. The splicing area 101 is designed to be patterned along the splicing direction and does not include the exposure pattern. The width of the patterned area is d 1 Ensure at least 15 μm width (including 5 μm double exposure area, which can be adjusted according to the exposure machine capability). For the non-joined area 102, its width d 2 It can be designed according to the actual width, for example, it can be 5μm. Figure 6 , Figure 6 1 shows a line exposure pattern. For the splicing area 101, the line width depression compensation can be set to 0.3 μm to 0.6 μm. Figure 7 , the graphics can be designed to be dispersed in the splicing area. For the splicing area 101, the distance d between the graphics formed by two adjacent exposures can be set 3 The distance d between two adjacent exposed patterns in the non-joined area 101 is 25 μm. 4 is 10μm. Figure 8 A schematic diagram of the structure of the second exposure provided by an embodiment of the present invention, Fig. 9 A schematic diagram of a structure of a display substrate after second exposure provided by an embodiment of the present invention, referring to Figure 8 , a first mark 201 corresponding to the first mark pattern during the first exposure is formed on the display substrate 20, and during the second exposure, the second mark pattern S2 of the mask plate 10 is nested with the first mark 201. Before exposure, by checking the relative position relationship between the second mark pattern S2 and the first mark 201, it can be confirmed whether the mask plate 10 has moved to the desired position. Figure 8 and Fig. 9 Optionally, during the second exposure, the exposure light irradiates the second exposure area 12 , and a second mark 202 nested in the first mark 201 is formed on the display substrate 20 .

[0056] It can be understood that, in a specific implementation, positive photoresist or negative photoresist can be used for exposure. When positive photoresist is used, the photoresist in the opaque area of ​​the mask that is not exposed is retained, and the marking pattern is the same as the corresponding mark. The embodiments of the present invention all take the marking pattern of the mask and the corresponding mark of the display substrate as an example. In other embodiments, negative photoresist can be used, and the photoresist in the opaque area of ​​the mask that is not exposed is removed. At this time, the marking pattern is complementary to the corresponding mark.

[0057] Continue to refer Figure 2 or Figure 3 Optionally, the first exposure region 11 includes a first graphic region 111, and the first graphic region 111 includes a plurality of first exposure graphics ( Figure 2 and Figure 3 ), the second exposure region 12 includes a second graphic region 121, and the second graphic region 121 includes a plurality of second exposure graphics ( Figure 2 and Figure 3 not shown).

[0058] The first exposure area 11 and the second exposure area 12 both correspond to the display area of ​​the display substrate during exposure, and are provided with a plurality of exposure patterns corresponding to the display area structure. Optionally, the first exposure pattern and the second exposure pattern are the same or different. The shape and number of the specific exposure patterns can be designed according to the structure of the actual display substrate, and the embodiment of the present invention is not limited thereto.

[0059] Continue to refer Figure 2 or Figure 3 Optionally, the first mark graphic S1 is located in an edge area outside the first graphic area 111 , and the second mark graphic S2 is located in an edge area outside the second graphic area 121 .

[0060] It can be understood that the first graphic area 111 and the second graphic area 121 correspond to the display area of ​​the display substrate, the exposure graphics in the first graphic area 111 and the second graphic area 121 correspond to the structure of the display area, and the marking graphics of the mask plate and the corresponding marks are used to realize the alignment of the mask plate during exposure, and have no effect on the display. Therefore, the first mark graphic S1 is designed to be located in the edge area outside the first graphic area 111, and the corresponding first mark is located in the non-display area of ​​the display substrate. The second mark graphic S2 is located in the edge area outside the second graphic area 121, and the corresponding second mark is located in the non-display area of ​​the display substrate, and the first mark and the second mark are nested.

[0061] Continue to refer Fig. 9 Optionally, a projection of the first mark 201 on the plane where the display substrate 20 is located does not overlap with a projection of the second mark 202 on the plane where the display substrate 20 is located, and the second mark 202 at least partially surrounds the first mark 201 .

[0062] The first mark 201 and the second mark 202 are formed during the first exposure and the second exposure, respectively, that is, the first mark 201 and the second mark 202 exist in the actual product (display substrate). In this embodiment, in order to ensure the accuracy of the exposure area, a corresponding first mark pattern and a second mark pattern are designed on the mask plate, and the first mark is formed on the display substrate according to the first mark pattern during the first exposure, and the second mark pattern is nested with the first mark during the second exposure. When the two meet the preset nesting relationship, it means that the mask plate is accurately aligned during the second exposure.

[0063] Continue to refer Fig. 9 Optionally, the projection of the second mark 202 on the plane where the display substrate 20 is located is a ring-shaped closed figure, and the projection of the first mark 201 on the plane where the display substrate is located is within the closed figure.

[0064] In this embodiment, the second mark 202 is designed as a closed figure that completely surrounds the first mark 201, that is, during the second exposure, the second mark figure on the mask is designed to surround the first mark 201. In specific implementation, optionally, the center of the first mark 201 coincides with the center of the closed figure, that is, each edge of the first mark 201 is designed to be the same distance from the edge of the second mark 202 to ensure more precise alignment.

[0065] Continue to refer Fig. 9 Optionally, the projection shape of the first mark 201 on the plane where the display substrate 20 is located is a block, and the projection shape of the second mark 202 on the plane where the display substrate 20 is located is a ring. Optionally, the outer contour of the block is a rectangle, and the outer contour and inner contour of the closed figure form a U-shaped shape.

[0066] It should be noted that Fig. 9 The projection shape of the first mark 201 on the plane where the display substrate is located and the outer contour and inner contour of the second mark 202 are all squares, which is only for reference. In other embodiments, they can be designed as other shapes, such as circles, triangles, pentagons, hexagons, etc., and can be designed according to actual conditions during specific implementation.

[0067] In addition to designing the second mark to completely surround the first mark, in other embodiments, the second mark can also be designed to partially surround the first mark. The following are several embodiments of the shapes of the first mark and the second mark. Fig.10 A schematic diagram of the shapes of a first mark and a second mark provided in an embodiment of the present invention, with reference to Fig.10 Optionally, the first mark 201 is on the display substrate ( Fig.10The projection shape of the second mark 202 on the plane where the display substrate is located is a concave shape, and the block is located in the notch of the concave shape.

[0068] For example, the block shape is a square in this embodiment, which is not a limitation of the embodiment of the present invention. In specific implementation, the concave notch is not limited to the upward direction, and other directions can also be selected, as long as the mask can be accurately aligned during exposure.

[0069] Fig.11 Another schematic diagram of the shape of the first mark and the second mark provided in an embodiment of the present invention, referring to Fig.11 Optionally, the first mark 201 is on the display substrate ( Fig.11 The projection shape of the plane where the second mark 202 is located (not shown) is a first concave shape, and the projection shape of the second mark 202 on the plane where the display substrate is located is a second concave shape. The outer contour size of the first concave shape is smaller than the inner contour size of the second concave shape, and the first concave shape is located in the notch of the second concave shape.

[0070] In this embodiment, the first mark 201 and the second mark 202 have the same shape, but the size of the first mark 201 is smaller than the size of the second mark 202 to achieve nesting of the two. Fig.11 The same notch direction of the first concave shape and the second concave shape is only for illustration. In other embodiments, the notch directions of the first concave shape and the second concave shape can be designed according to actual conditions, as long as the two are nested.

[0071] Fig.12 A schematic diagram of the shapes of another first mark and a second mark provided in an embodiment of the present invention, referring to Fig.12 Optionally, the outer contour shape of the first mark 201 is the same as the outer contour shape of the second mark 202 , and the outer contour size of the first mark 201 is smaller than the outer contour size of the second mark 202 .

[0072] For example, Fig.12 In the example, the outer contour size of the first mark 201 and the outer contour of the second mark 202 are both circular, which is not a limitation of the embodiment of the present invention. The inner contour of the second mark 202 is schematically shown as a square. In other embodiments, it can also be designed as a circle, similar to Fig. 9 Embodiment of the invention.

[0073] Fig.13 A schematic diagram of the shapes of another first mark and a second mark provided in an embodiment of the present invention, referring to Fig.13 Optionally, the first mark 201 is on the display substrate ( Fig.13The projection shape of the first mark 201 on the plane where the display substrate is located (not shown) is the same as the projection shape of the second mark 202 on the plane where the display substrate is located, and the projection size of the first mark 201 on the plane where the display substrate is located is smaller than the projection size of the second mark 202 on the plane where the display substrate is located.

[0074] In this embodiment, the first mark 201 and the second mark 202 are designed to have the same shape, but the size of the first mark 201 is smaller than the size of the second mark 202, so as to achieve alignment during exposure. Fig.13 Optionally, the outer contour and inner contour of the projection of the first mark 201 on the plane where the display substrate is located form a Chinese umbilical cord shape, and the outer contour and inner contour of the projection of the second mark 202 on the plane where the display substrate is located form a Chinese umbilical cord shape. In other embodiments, the first mark 201 and the second mark 202 may both be circular rings, or the shapes of the first mark 201 and the second mark 202 may be different, for example, the first mark 201 is designed to be a circular ring, and the second mark 202 is designed to be a Chinese umbilical cord shape, or the first mark 201 is designed to be a Chinese umbilical cord shape, and the second mark 202 is designed to be a circular ring, and the embodiment of the present invention is not limited to this.

[0075] In another embodiment, in order to facilitate detection, the alignment mark can be designed as a scale design with a ruler. For example, Fig.14 A schematic diagram of the shapes of another first mark and a second mark provided in an embodiment of the present invention, referring to Fig.14 Optionally, the first mark 201 is on the display substrate ( Fig.14 The projection of the plane where the first mark 201 and the second mark 202 are located is a first ruler shape, and the projection of the second mark 202 on the plane where the display substrate is located is a second ruler shape. By setting the first mark 201 and the second mark 202 to be ruler shapes, it is beneficial to intuitively display the error when the mask is aligned according to the ruler, which is beneficial to improve the alignment efficiency. Optionally, the size of the first ruler shape and the second ruler shape are the same, and the size of the specific ruler can be designed according to actual conditions.

[0076] Based on the mask provided in the above embodiment, an embodiment of the present invention further provides an exposure method. Fig.15 A schematic diagram of an exposure method according to an embodiment of the present invention is provided. Fig.15 , the exposure method comprises:

[0077] S110, providing a substrate.

[0078] The substrate may be used to form an array substrate or a color film substrate of a display panel, and the substrate may be a glass substrate.

[0079] S120, aligning a first exposure region of the mask with a first to-be-exposed region of the substrate.

[0080] For example, Fig.16 A schematic diagram of a structure before the first exposure provided by an embodiment of the present invention, referring to Fig.16 Before the first exposure, the first exposure area 11 of the mask 10 is aligned with the first area to be exposed 210 of the substrate (i.e., the display substrate 20 in the aforementioned embodiment), that is, the first exposure area 11 covers the first area to be exposed 210. This is a preparation step for the first exposure.

[0081] S130 , performing a first exposure to form a first mark on the substrate.

[0082] After the first exposure, the first graphic mark forms a first mark 201 on the substrate. Fig.16 FIG. 2 schematically shows that the shape of the first mark 201 is a square.

[0083] S140, moving the mask plate so that the second graphic mark and the first mark are nested, so that the second exposure area of ​​the mask plate corresponds to the second area to be exposed on the substrate.

[0084] refer to Figure 8 Since the size of the exposure area of ​​the mask is smaller than the size of the to-be-exposed area of ​​the substrate, before the second exposure, the mask 10 is moved so that the second graphic mark S2 and the first mark 201 are nested to achieve accurate alignment of the mask and improve the yield.

[0085] S150 , performing a second exposure to form a second mark on the substrate.

[0086] The first area to be exposed and the second area to be exposed are arranged adjacent to each other, and the first mark and the second mark are arranged in a nested manner.

[0087] refer to Figure 8 After the second exposure, a first mark 201 and a second mark 202 which are nested are formed on the substrate.

[0088] In the above embodiments, a mask template is set to include at least two exposure areas, and the same mask template is used to achieve multiple exposures. In other embodiments, the mask template can be set to a combination of at least two sub-masks, wherein one sub-mask template is set with a first marking pattern, and the other sub-mask template is set with a second marking pattern. Different sub-masks are used for each exposure to achieve the same technical effect.

[0089] An embodiment of the present invention also provides a mask template for preparing a display substrate using a multiple exposure method, the mask template includes at least two sub-mask templates, the at least two sub-mask templates include a first sub-mask template and a second sub-mask template, the first sub-mask template includes a first area, the first area includes a first marking pattern, the second sub-mask template includes a second area, and the second area includes a second marking pattern; during the first exposure, the first sub-mask template corresponds to the display substrate, the exposure light irradiates the first sub-mask template, and a first mark corresponding to the first mark pattern is formed on the display substrate; during the second exposure, the second sub-mask template corresponds to the display substrate, and the second mark pattern is nested with the first mark.

[0090] The mask template provided by the embodiment of the present invention, during the first exposure, sets the exposure area of ​​the first sub-mask template to correspond to the first area to be exposed of the display substrate, and the exposure light irradiates the exposure area of ​​the first sub-mask template to form a corresponding exposure pattern in the first area to be exposed, and forms a first mark corresponding to the first mark pattern on the display substrate; during the second exposure, sets the second sub-mask template so that the second mark pattern is nested with the first mark to achieve precise alignment of the exposure area of ​​the second sub-mask template with the second area to be exposed of the display substrate, thereby solving the problem that the product size exceeds the size of the mask template and cannot meet the single mask template exposure molding requirements due to the limitation of the mask template, and the monitoring design of the splicing area is realized by designing the first mark pattern and the second mark pattern, thereby improving the accuracy of splicing, improving product performance, and enhancing product competitiveness.

[0091] For example, taking the mask plate including a first sub-mask plate and a second sub-mask plate as an example, Fig.17 A schematic diagram of a mask structure provided by an embodiment of the present invention, referring to Fig.17 The mask plate 10 includes a first sub-mask plate 110 and a second sub-mask plate 120, the first sub-mask plate 110 includes a first area A, the first area A includes a first marking pattern S1, the second sub-mask plate 120 includes a second area B, and the second area B includes a second marking pattern S2; during the first exposure, the first sub-mask plate 110 corresponds to the display substrate, the exposure light irradiates the first sub-mask plate 110, and a first mark corresponding to the first marking pattern S1 is formed on the display substrate; during the second exposure, the second sub-mask plate 120 corresponds to the display substrate, and the second marking pattern S2 is nested with the first mark. Fig.18 A schematic diagram of another structure of the second exposure provided by an embodiment of the present invention, Fig.19 A schematic diagram of another structure of a display substrate after the second exposure provided by an embodiment of the present invention, referring to Fig.18, a first mark 201 corresponding to the first mark pattern during the first exposure is formed on the display substrate 20, and during the second exposure, the second mark pattern S2 of the second sub-mask plate 120 is nested with the first mark 201. Before exposure, by checking the relative position relationship between the second mark pattern S2 and the first mark 201, it can be confirmed whether the second sub-mask plate 120 is accurately aligned. Fig.18 and Fig.19 Optionally, during the second exposure, the exposure light irradiates the second sub-mask 120 , and a second mark 202 nested in the first mark 201 is formed on the display substrate 20 .

[0092] It can be understood that, in a specific implementation, positive photoresist or negative photoresist can be used for exposure. When positive photoresist is used, the photoresist in the opaque area of ​​the mask that is not exposed is retained, and the marking pattern is the same as the corresponding mark. The embodiments of the present invention all take the marking pattern of the mask and the corresponding mark of the display substrate as an example. In other embodiments, negative photoresist can be used, and the photoresist in the opaque area of ​​the mask that is not exposed is removed. At this time, the marking pattern is complementary to the corresponding mark.

[0093] Continue to refer Fig.17 Optionally, the first sub-mask 110 includes a first exposure region 11, and the first exposure region 11 includes a plurality of first exposure patterns ( Fig.17 ), the second sub-mask 120 includes a second exposure region 12, and the second exposure region 120 includes a plurality of second exposure patterns ( Fig.17 not shown).

[0094] The first exposure area 11 and the second exposure area 12 both correspond to the display area of ​​the display substrate during exposure, and are provided with a plurality of exposure patterns corresponding to the display area structure. Optionally, the first exposure pattern and the second exposure pattern are the same or different. The shape and number of the specific exposure patterns can be designed according to the structure of the actual display substrate, and the embodiment of the present invention is not limited thereto.

[0095] Continue to refer Fig.17 Optionally, the first mark graphic S1 is located at an edge area of ​​the first exposure area 11 , and the second mark graphic S2 is located at an edge area of ​​the second exposure area 12 .

[0096] It can be understood that the exposure patterns in the first exposure area 11 and the second exposure area 12 both correspond to the structure of the display area of ​​the display substrate, and the marking pattern of the mask plate and the corresponding mark formed are used to realize the alignment of the mask plate during exposure, and have no effect on the display. Therefore, the first marking pattern S1 is designed to be located in the edge area of ​​the first exposure area 11, and the corresponding first mark is located in the non-display area of ​​the display substrate. The second marking pattern S2 is located in the edge area of ​​the second exposure area 12, and the corresponding second mark is located in the non-display area of ​​the display substrate. The first mark and the second mark are nested.

[0097] Continue to refer Fig.19 Optionally, a projection of the first mark 201 on the plane where the display substrate 20 is located does not overlap with a projection of the second mark 202 on the plane where the display substrate 20 is located, and the second mark 202 at least partially surrounds the first mark 201 .

[0098] Among them, the first mark 201 and the second mark 202 are formed during the first exposure and the second exposure, respectively, that is, the first mark 201 and the second mark 202 exist in the actual product (display substrate). In this embodiment, in order to ensure the accuracy of the exposure area, corresponding first mark patterns and second mark patterns are designed on the first sub-mask template and the second sub-mask template, respectively. During the first exposure, the first mark is formed on the display substrate according to the first mark pattern, and during the second exposure, the second mark pattern is nested with the first mark. When the two meet the preset nesting relationship, it means that the second sub-mask template is accurately aligned during the second exposure.

[0099] Continue to refer Fig.19 Optionally, the projection of the second mark 202 on the plane where the display substrate 20 is located is a circular closed figure, and the projection of the first mark 201 on the plane where the display substrate 20 is located is within the closed figure.

[0100] In this embodiment, the second mark 202 is designed as a closed figure that completely surrounds the first mark 201, that is, during the second exposure, the second mark figure on the second sub-mask is designed to surround the first mark 201. In specific implementation, optionally, the center of the first mark 201 coincides with the center of the closed figure, that is, each edge of the first mark 201 is designed to be the same distance away from the edge of the second mark 202 to ensure more precise alignment.

[0101] Continue to refer Fig.19 Optionally, the projection shape of the first mark 201 on the plane where the display substrate 20 is located is a block, and the projection shape of the second mark 202 on the plane where the display substrate 20 is located is a ring. Optionally, the outer contour of the block is a rectangle, and the outer contour and inner contour of the closed figure form a U-shaped shape.

[0102] It should be noted that Fig.19The projection shape of the first mark 201 on the plane where the display substrate is located and the outer contour and inner contour of the second mark 202 are all squares, which is only for reference. In other embodiments, they can be designed as other shapes, such as circles, triangles, pentagons, hexagons, etc., and can be designed according to actual conditions during specific implementation.

[0103] In addition to designing the second mark to completely surround the first mark, in other embodiments, the second mark can also be designed to partially surround the first mark. The following are several embodiments of the shapes of the first mark and the second mark. Fig.10 Optionally, the projection shape of the first mark 201 on the plane where the display substrate 20 is located is a block, and the projection shape of the second mark 202 on the plane where the display substrate 20 is located is a concave shape, and the block is located in the notch of the concave shape.

[0104] For example, the block shape is a square in this embodiment, which is not a limitation of the embodiment of the present invention. In specific implementation, the concave notch is not limited to the upward direction, and other directions can also be selected, as long as the mask can be accurately aligned during exposure.

[0105] Continue to refer Fig.11 Optionally, the projection shape of the first mark 201 on the plane where the display substrate 20 is located is a first concave shape, and the projection shape of the second mark 202 on the plane where the display substrate 20 is located is a second concave shape. The outer contour size of the first concave shape is smaller than the inner contour size of the second concave shape, and the first concave shape is located in the notch of the second concave shape.

[0106] In this embodiment, the first mark 201 and the second mark 202 have the same shape, but the size of the first mark 201 is smaller than the size of the second mark 202 to achieve nesting of the two. Fig.11 The same notch direction of the first concave shape and the second concave shape is only for illustration. In other embodiments, the notch directions of the first concave shape and the second concave shape can be designed according to actual conditions, as long as the two are nested.

[0107] Continue to refer Fig.12 Optionally, the outer contour shape of the first mark 201 is the same as the outer contour shape of the second mark 202 , and the outer contour size of the first mark 201 is smaller than the outer contour size of the second mark 202 .

[0108] For example, Fig.12 In the example, the outer contour size of the first mark 201 and the outer contour of the second mark 202 are both circular, which is not a limitation of the embodiment of the present invention. The inner contour of the second mark 202 is schematically shown as a square. In other embodiments, it can also be designed as a circle, similar to Fig.16 Embodiment of the invention.

[0109] Continue to refer Fig.13 Optionally, the projection shape of the first mark 201 on the plane where the display substrate 20 is located is the same as the projection shape of the second mark 202 on the plane where the display substrate 20 is located, and the projection size of the first mark 201 on the plane of the display substrate is smaller than the projection size of the second mark 202 on the plane where the display substrate 20 is located.

[0110] In this embodiment, the first mark 201 and the second mark 202 are designed to have the same shape, but the size of the first mark 201 is smaller than the size of the second mark 202, so as to achieve alignment during exposure. Fig.13 Optionally, the outer contour and inner contour of the projection of the first mark 201 on the plane where the display substrate 20 is located form a Chinese umbilical cord shape, and the outer contour and inner contour of the projection of the second mark 202 on the plane where the display substrate 20 is located form a Chinese umbilical cord shape. In other embodiments, the first mark 201 and the second mark 202 may both be circular rings, or the shapes of the first mark 201 and the second mark 202 may be different, for example, the first mark 201 is designed as a circular ring, and the second mark 202 is designed as a Chinese umbilical cord shape, or the first mark 201 is designed as a Chinese umbilical cord shape, and the second mark 202 is designed as a circular ring, which is not limited in this embodiment of the present invention.

[0111] In another embodiment, in order to facilitate detection, the alignment mark can be designed as a scale design with a ruler, and continue to refer to Fig.14 Optionally, the first mark 201 is on the display substrate ( Fig.14 The projection of the plane where the first mark 201 and the second mark 202 are located is a first ruler shape, and the projection of the second mark 202 on the plane where the display substrate is located is a second ruler shape. By setting the first mark 201 and the second mark 202 to be ruler shapes, it is beneficial to intuitively display the error when the mask is aligned according to the ruler, which is beneficial to improve the alignment efficiency. Optionally, the size of the first ruler shape and the second ruler shape are the same, and the size of the specific ruler can be designed according to actual conditions.

[0112] Based on the mask plate including the first sub-mask plate and the second sub-mask plate in the above embodiment, an embodiment of the present invention further provides an exposure method, Fig. 20 A schematic diagram of another exposure method provided by an embodiment of the present invention, referring to Fig. 20 , the exposure method comprises:

[0113] S210, providing a substrate.

[0114] The substrate may be used to form an array substrate or a color film substrate of a display panel, and the substrate may be a glass substrate.

[0115] S220 , aligning the first sub-mask with the first to-be-exposed area of ​​the substrate.

[0116] For example, Fig.21 Another structural diagram before the first exposure provided by an embodiment of the present invention, referring to Fig.21 Before the first exposure, the first exposure area 11 of the first sub-mask 110 is aligned with the first area to be exposed 210 of the substrate (i.e., the display substrate 20 in the aforementioned embodiment), that is, the first exposure area 11 covers the first area to be exposed 210. This is a preparation step for the first exposure.

[0117] S230 , performing a first exposure, wherein the exposure light irradiates the first sub-mask to form a first mark on the substrate.

[0118] After the first exposure, the first graphic mark forms a first mark 201 on the substrate. Fig.21 FIG. 2 schematically shows that the shape of the first mark 201 is a square.

[0119] S240, nesting the second graphic mark of the second sub-mask plate with the first mark, so that the second sub-mask plate corresponds to the second area to be exposed on the substrate.

[0120] refer to Fig.18 Since the size of the exposure area of ​​the first sub-mask is smaller than the size of the to-be-exposed area of ​​the substrate, before the second exposure, the second mask 120 is set so that the second graphic mark S2 and the first mark 201 are nested to achieve precise alignment of the mask and improve the yield.

[0121] S250 , performing a second exposure, wherein the exposure light irradiates the second sub-mask to form a second mark on the substrate.

[0122] The first area to be exposed and the second area to be exposed are arranged adjacent to each other, and the first mark and the second mark are arranged in a nested manner.

[0123] refer to Fig.19 After the second exposure, a first mark 201 and a second mark 202 which are nested are formed on the substrate.

[0124] Fig. 22 A schematic diagram of a display panel according to an embodiment of the present invention is provided. Fig. 22 The display panel 200 includes a display substrate 20 and a first mark 201 and a second mark 202 located on at least one side of the display substrate 20. The first mark 201 and the second mark 202 are nested and formed by exposure using the mask provided in the above embodiment.

[0125] The display panel provided by the embodiment of the present invention realizes precise alignment of the mask during multiple exposures by setting a first marking pattern and a second marking pattern on the mask, thereby solving the problem that the product size exceeds the size of the mask and cannot meet the requirements of single mask exposure molding due to mask limitations. In addition, the monitoring design of the splicing area is realized by designing the first marking pattern and the second marking pattern, thereby improving the accuracy of splicing, improving product performance, and enhancing product competitiveness.

[0126] Continue to refer Fig. 22 Optionally, the display panel 200 includes a display area 220 and a border area 230 , and the first mark 201 and the second mark 202 are located in the border area 230 .

[0127] Among them, the first mark 201 and the second mark 202 are set for accurate alignment of the mask during exposure. After exposure, the mark pattern on the mask forms a corresponding mark on the display panel, which has no effect on the display function. Therefore, the first mark 201 and the second mark 202 are set in the border area 230. In addition, it should be noted that the positions of the first mark 201 and the second mark 202 need to avoid structures such as the driving circuit in the border area 230 to avoid affecting the setting of the driving circuit.

[0128] Fig.23 A schematic diagram of another display panel provided by an embodiment of the present invention, referring to Fig.23 Optionally, the display area 220 includes at least two sub-display areas ( Fig.23 Taking two sub-display areas as an example, which is not a limitation of the embodiments of the present invention, one sub-display area corresponds to one exposure, and at least two sub-display areas include a first sub-display area 221 and a second sub-display area 222 arranged along a first direction y, the first sub-display area 221 and the second sub-display area 222 include a stitching area 223 extending along a second direction z, and the first direction y intersects with the second direction z; the first mark 201 includes a first sub-mark 2011 and a second sub-mark 2012 arranged along the second direction y, the second mark 202 includes a third sub-mark 2021 and a fourth sub-mark 2022 arranged along the second direction y, the first sub-mark 2011 and the third sub-mark 2021 are located at a first end of the stitching area 223, and the second sub-mark 2012 and the fourth sub-mark 2022 are located at a second end of the stitching area 223.

[0129] By designing corresponding marks at both ends of the splicing area 223, that is, marking patterns are set on both sides of the exposure area of ​​the mask, the alignment accuracy of the mask can be improved to avoid tilting of the mask during alignment. Fig.23 Optionally, the projection of the first mark 201 on the plane where the display substrate is located is block-shaped, and the projection of the second mark 202 on the plane where the display substrate is located is ring-shaped. The outer contour of the block is a rectangle, and the outer contour and inner contour of the ring form a U-shape.

[0130] For example, in one embodiment, the first mark 201 is a square with a size of 25μm×25μm, and a forbidden area of ​​150μm×150μm, and the second mark 202 is a U-shaped with an outer contour of 85μm, an inner contour of 45μm, and a forbidden area of ​​150μm×150μm. The first mark 201 and the second mark 202 can be located in the metal layer of the array substrate or in the black matrix layer of the color filter substrate, which is determined by the film layer to be exposed during the specific implementation. In other embodiments, the first mark and the second mark can be selected in other shapes, and the specific details can refer to the above embodiments.

[0131] Fig.24 A schematic diagram of the structure of a display device provided by an embodiment of the present invention. Fig.24 The display device 100 includes any one of the display panels 200 provided in the embodiments of the present invention. The display device 100 may be a mobile phone, a computer, or a vehicle-mounted display device.

[0132] Note that the above are only preferred embodiments of the present invention and the technical principles used. Those skilled in the art will understand that the present invention is not limited to the specific embodiments herein, and that various obvious changes, readjustments, combinations and substitutions can be made by those skilled in the art without departing from the scope of protection of the present invention. Therefore, although the present invention has been described in more detail through the above embodiments, the present invention is not limited to the above embodiments, and may include more other equivalent embodiments without departing from the concept of the present invention, and the scope of the present invention is determined by the scope of the appended claims.

Claims

1. A mask for preparing a display substrate by a multiple exposure method, characterized in that: The mask plate includes at least two exposure areas, the at least two exposure areas include a first exposure area and a second exposure area, the first exposure area includes a first mark pattern located at a first edge of the mask plate, the second exposure area includes a second mark pattern located at a second edge of the mask plate, and the first edge and the second edge are arranged opposite to each other; During the first exposure, the exposure light irradiates the first exposure area, and a first mark corresponding to the first mark pattern is formed on the display substrate; During the second exposure, the mask is moved so that the second mark pattern is nested with the first mark.

2. The mask according to claim 1, characterized in that: During the second exposure, the exposure light irradiates the second exposure area, and a second mark embedded in the first mark is formed on the display substrate.

3. The mask according to claim 2, characterized in that: The projection of the first mark on the plane where the display substrate is located does not overlap with the projection of the second mark on the plane where the display substrate is located, and the second mark at least partially surrounds the first mark.

4. The mask according to claim 3, characterized in that: The projection shape of the first mark on the plane where the display substrate is located is a block shape, and the projection shape of the second mark on the plane where the display substrate is located is a concave shape, and the block shape is located in a notch of the concave shape.

5. The mask according to claim 3, characterized in that: The projection shape of the first mark on the plane where the display substrate is located is a first concave shape, and the projection shape of the second mark on the plane where the display substrate is located is a second concave shape. The outer contour size of the first concave shape is smaller than the inner contour size of the second concave shape, and the first concave shape is located in the notch of the second concave shape.

6. The mask according to claim 3, characterized in that: The projection of the second mark on the plane where the display substrate is located is a ring-shaped closed figure, and the projection of the first mark on the plane where the display substrate is located is within the closed figure.

7. The mask according to claim 6, characterized in that: The center of the first mark coincides with the center of the closed figure.

8. The mask according to claim 7, characterized in that: The projection shape of the first mark on the plane where the display substrate is located is a block, and the projection shape of the second mark on the plane where the display substrate is located is a ring.

9. The mask according to claim 8, characterized in that: The outer contour of the block is a rectangle, and the outer contour and inner contour of the closed figure form a U-shaped shape.

10. The mask according to claim 6, characterized in that: The projection shape of the first mark on the plane where the display substrate is located is the same as the projection shape of the second mark on the plane where the display substrate is located, and the projection size of the first mark on the plane where the display substrate is located is smaller than the projection size of the second mark on the plane where the display substrate is located.

11. The mask according to claim 10, characterized in that: The outer contour and inner contour of the projection of the first mark on the plane where the display substrate is located form a U-shape, and the outer contour and inner contour of the projection of the second mark on the plane where the display substrate is located form a U-shape.

12. The mask according to claim 2, characterized in that: The projection of the first mark on the plane where the display substrate is located is a first ruler shape, and the projection of the second mark on the plane where the display substrate is located is a second ruler shape.

13. The mask according to claim 12, characterized in that: The first scale shape and the second scale shape have the same size.

14. The mask according to claim 1, characterized in that: The first exposure region includes a first graphic area including a plurality of first exposure graphics, and the second exposure region includes a second graphic area including a plurality of second exposure graphics.

15. The mask according to claim 14, characterized in that: The first exposure pattern and the second exposure pattern are the same or different.

16. The mask according to claim 14, characterized in that: The first mark pattern is located in an edge area outside the first graphic area, and the second mark pattern is located in an edge area outside the second graphic area.

17. An exposure method, characterized in that: Applicable to the mask according to any one of claims 1 to 16, the exposure method comprising: providing a substrate; Aligning a first exposure region of the mask with a first to-be-exposed region of the substrate; performing a first exposure to form a first mark on the substrate; Moving the mask plate so that the second graphic mark and the first mark are nested and arranged, so that the second exposure area of ​​the mask plate corresponds to the second area to be exposed of the substrate; performing a second exposure to form a second mark on the substrate; The first area to be exposed and the second area to be exposed are arranged adjacent to each other, and the first mark and the second mark are arranged nested.

18. A mask plate for preparing a display substrate by a multiple exposure method, characterized in that: The mask includes at least two sub-masks, the at least two sub-masks include a first sub-mask and a second sub-mask, the first sub-mask includes a first area, the first area includes a first marking pattern, the second sub-mask includes a second area, the second area includes a second marking pattern; During the first exposure, the first sub-mask corresponds to the display substrate, and the exposure light irradiates the first sub-mask, so that a first mark corresponding to the first mark pattern is formed on the display substrate; During the second exposure, the second sub-mask corresponds to the display substrate, and the second mark pattern is nested with the first mark.

19. The mask according to claim 18, characterized in that: During the second exposure, the exposure light irradiates the second sub-mask, and a second mark embedded in the first mark is formed on the display substrate.

20. The mask according to claim 19, characterized in that: The projection of the first mark on the plane where the display substrate is located does not overlap with the projection of the second mark on the plane where the display substrate is located, and the second mark at least partially surrounds the first mark.

21. The mask according to claim 20, characterized in that: The projection shape of the first mark on the plane where the display substrate is located is a block shape, and the projection shape of the second mark on the plane where the display substrate is located is a concave shape, and the block shape is located in a notch of the concave shape.

22. The mask according to claim 20, characterized in that: The projection shape of the first mark on the plane where the display substrate is located is a first concave shape, and the projection shape of the second mark on the plane where the display substrate is located is a second concave shape. The outer contour size of the first concave shape is smaller than the inner contour size of the second concave shape, and the first concave shape is located in the notch of the second concave shape.

23. The mask according to claim 20, characterized in that: The projection of the second mark on the plane where the display substrate is located is a ring-shaped closed figure, and the projection of the first mark on the plane where the display substrate is located is within the closed figure.

24. The mask according to claim 23, characterized in that: The center of the first mark coincides with the center of the closed figure.

25. The mask according to claim 24, characterized in that: The projection shape of the first mark on the plane where the display substrate is located is a block, and the projection shape of the second mark on the plane where the display substrate is located is a ring.

26. The mask according to claim 25, characterized in that: The outer contour of the block is a rectangle, and the outer contour and inner contour of the closed figure form a U-shaped shape.

27. The mask according to claim 24, characterized in that: The projection shape of the first mark on the plane where the display substrate is located is the same as the projection shape of the second mark on the plane where the display substrate is located, and the projection size of the first mark on the plane where the display substrate is located is smaller than the projection size of the second mark on the plane where the display substrate is located.

28. The mask according to claim 27, characterized in that: The outer contour and inner contour of the projection of the first mark on the plane where the display substrate is located form a U-shape, and the outer contour and inner contour of the projection of the second mark on the plane where the display substrate is located form a U-shape.

29. The mask according to claim 18, characterized in that: The projection of the first mark on the plane where the display substrate is located is a first ruler shape, and the projection of the second mark on the plane where the display substrate is located is a second ruler shape.

30. The mask according to claim 29, characterized in that: The first scale shape and the second scale shape have the same size.

31. The mask according to claim 18, characterized in that: The first sub-mask includes a first exposure region including a plurality of first exposure patterns, and the second sub-mask includes a second exposure region including a plurality of second exposure patterns.

32. The mask according to claim 31, characterized in that: The first exposure pattern and the second exposure pattern are the same or different.

33. The mask according to claim 31, characterized in that: The first mark pattern is located in an edge area of ​​the first exposure area, and the second mark pattern is located in an edge area of ​​the second exposure area.

34. An exposure method, characterized in that: Applicable to the mask according to any one of claims 18 to 33, the exposure method comprising: providing a substrate; Aligning the first sub-mask with the first to-be-exposed area of ​​the substrate; Performing a first exposure, wherein the exposure light irradiates the first sub-mask to form a first mark on the substrate; Nesting a second graphic mark of a second sub-mask plate with the first mark so that the second sub-mask plate corresponds to a second area to be exposed on the substrate; performing a second exposure, wherein the exposure light irradiates the second sub-mask to form a second mark on the substrate; The first area to be exposed and the second area to be exposed are arranged adjacent to each other, and the first mark and the second mark are arranged nested.

35. A display panel, characterized in that: It comprises a display substrate and a first mark and a second mark located on at least one side of the display substrate, wherein the first mark and the second mark are nested and formed by exposure using the mask template described in any one of claims 1 to 16 or 18 to 33.

36. The display panel according to claim 35, characterized in that: The display panel includes a display area and a frame area, and the first mark and the second mark are located in the frame area.

37. The display panel according to claim 36, characterized in that: The display area includes at least two sub-display areas, one of the sub-display areas corresponds to one exposure, the at least two sub-display areas include a first sub-display area and a second sub-display area arranged along a first direction, the first sub-display area and the second sub-display area include a splicing area extending along a second direction, and the first direction intersects the second direction; The first mark includes a first sub-mark and a second sub-mark arranged along the second direction, the second mark includes a third sub-mark and a fourth sub-mark arranged along the second direction, the first sub-mark and the third sub-mark are located at a first end of the splicing area, and the second sub-mark and the fourth sub-mark are located at a second end of the splicing area.

38. The display panel according to claim 35, characterized in that: The projection of the first mark on the plane where the display substrate is located is block-shaped, and the projection of the second mark on the plane where the display substrate is located is ring-shaped.

39. The display panel according to claim 38, characterized in that: The outer contour of the block is a rectangle, and the outer contour and inner contour of the ring form a U-shape.

40. A display device, characterized in that: Comprising the display panel described in any one of claims 35 to 39.

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