A calculation method, system, device and medium for the angle of magnetorheological polishing

By constructing and optimizing the magnetorheological polishing angle population, the limitations of magnetorheological polishing technology in CPP processing are solved, and efficient and accurate optical parts processing is achieved to meet the high-precision needs of inertial constrained fusion devices.

CN119989588BActive Publication Date: 2025-07-25NAT UNIV OF DEFENSE TECH
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Patent Information

Application Number
CN202510480449.0
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2025-04-17
Publication Date
2025-07-25
Estimated Expiration
2045-04-17

AI Technical Summary

Technical Problem

When existing magnetorheological polishing technology processes continuous phase components with multi-scale phase structures, a single removal function is difficult to match the multi-scale phase distribution characteristics of CPP surface, resulting in slow convergence speed of low-frequency errors, which restricts processing efficiency and accuracy.

Method used

By constructing the polishing angle population of magnetorheological removal function, calculate the residual surface shape error and practice ability spectrum of polishing angle processing elements, perform cross-variation and cyclic iteration, and optimize the polishing angle to improve the shape-tearing ability.

Benefits of technology

It significantly improves the shape modification ability of magnetorheological polishing technology, enhances the processing accuracy and efficiency of optical parts, and meets the high-precision manufacturing requirements of CPP by inertial constrained fusion devices.

✦ Generated by Eureka AI based on patent content.

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Abstract

The present application discloses a method, system, device and medium for calculating the magnetorheological polishing angle. This method constructs a polishing angle population of the magnetorheological removal function, and the polishing angle population includes multiple randomly generated polishing angles; calculates the residual surface shape error and the dressing ability spectrum of the magnetorheological removal function for machining the component to be machined according to each polishing angle in the polishing angle population; based on the residual surface shape error and the dressing ability spectrum of each polishing angle, performs crossover and mutation on the polishing angle population to obtain the next-generation population, and performs cyclic iteration until the preset iteration condition is satisfied to obtain the optimal polishing angle; for each polishing angle in the polishing angle population during the iteration, executes: calculating the residual surface shape error corresponding to the component to be machined by the magnetorheological removal function according to the polishing angle, and obtaining the root mean square of the residual surface shape error corresponding to the polishing angle according to the residual surface shape error, and the dressing ability of the magnetorheological polishing technology can be improved by adjusting the polishing angle of the removal function.
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Description

Technical Field

[0001] This application relates to the technical field of precision manufacturing of optical elements, and in particular, to a method, system, device and medium for calculating the magnetorheological polishing angle. Background Art

[0002] Due to its continuous and smooth phase characteristics, the continuous phase plate (CPP) in diffractive optical elements can suppress high-order diffraction effects and improve the laser damage threshold, and has now become the core device for wavefront modulation and beam shaping in high-power laser systems. Especially in typical application scenarios such as inertial confinement fusion (ICF), the CPP needs to achieve a flat-top distribution, steep boundary and sidelobe-free suppression characteristics of the laser focal spot with nanometer-level surface form accuracy.

[0003] In the prior art, when the magnetorheological finishing (MRF) technology processes the CPP with multi-scale phase structures, a single removal function is difficult to match the multi-scale phase distribution characteristics of the CPP surface, resulting in a slow convergence rate of low-frequency errors and severely restricting the processing efficiency. Therefore, the shaping ability of the single removal function in the magnetorheological finishing technology restricts the improvement of the manufacturing accuracy and efficiency of continuous phase elements, and has become the main bottleneck in the current CPP process optimization. Summary of the Invention

[0004] The following is an overview of the subject matter described in detail in this document. This overview is not intended to limit the scope of protection of the claims.

[0005] The main purpose of the embodiments of the present disclosure is to propose a method, system, device and storage medium for calculating the magnetorheological polishing angle, which can improve the shaping ability of the magnetorheological finishing technology by adjusting the polishing angle of the removal function and improve the processing accuracy of optical parts.

[0006] The first aspect of the embodiments of this application provides a method for calculating the magnetorheological polishing angle for a central controller, and the method includes:

[0007] Construct a polishing angle population of the magnetorheological removal function, where the polishing angle population includes a plurality of randomly generated polishing angles, and the magnetorheological removal function is obtained by processing a component to be processed using the magnetorheological finishing technology;

[0008] Calculate the residual surface form error and the shaping ability spectrum of the magnetorheological removal function for processing the component to be processed according to each polishing angle in the polishing angle population;

[0009] Based on the residual surface form error and the dressing ability spectrum corresponding to each of the polishing angles, perform crossover and mutation on the polishing angle population to obtain the next generation population, and perform cyclic iteration until a preset iteration condition is satisfied to obtain the optimal polishing angle;

[0010] For each of the polishing angles in the polishing angle population during iteration, perform the following: calculate the residual surface form error of the to-be-machined component machined according to the polishing angle by the magnetorheological removal function, and obtain the root mean square of the residual surface form error corresponding to the polishing angle according to the residual surface form error.

[0011] In some embodiments of the present application, calculating the residual surface form error of the to-be-machined component machined according to each polishing angle in the polishing angle population by the magnetorheological removal function includes:

[0012] Obtain the initial surface form after machining the to-be-machined component by the magnetorheological removal function according to the polishing angle;

[0013] Calculate the residual surface form error according to the initial surface form and the preset ideal surface form.

[0014] In some embodiments of the present application, calculating the residual surface form error and the dressing ability spectrum of the to-be-machined component machined according to each polishing angle in the polishing angle population by the magnetorheological removal function includes:

[0015] Obtain the first removal function after rotating the polishing angle by the magnetorheological removal function;

[0016] Perform two-dimensional Fourier transform on the first removal function to obtain the corresponding frequency spectrum;

[0017] Intercept the band amplitude of the frequency spectrum within a preset spatial frequency range to obtain the dressing ability spectrum of the first removal function.

[0018] In some embodiments of the present application, performing crossover and mutation on the polishing angle population based on the residual surface form error and the dressing ability spectrum corresponding to each of the polishing angles to obtain the next generation population includes:

[0019] Calculate the root mean square of the corresponding residual surface form error according to the residual surface form error corresponding to each polishing angle;

[0020] Determine the excellent individuals in the polishing angle population according to the root mean square of the residual surface form error and the dressing ability spectrum;

[0021] Perform crossover and mutation on the polishing angle population according to the excellent individuals to obtain the next generation population.

[0022] In some embodiments of the present application, the preset iteration condition includes: the current iteration number is greater than or equal to the preset maximum iteration number, or the root mean square of the residual surface shape error corresponding to the magnetorheological removal function for the polishing angle is less than or equal to the preset minimum threshold.

[0023] In some embodiments of the present application, the calculation formula for the residual surface shape error includes:

[0024] ;

[0025] ;

[0026] ;

[0027] Wherein, is the preset ideal surface shape, is the dwell time of magnetorheological polishing, represents the removal function when the magnetorheological polishing angle is , is the removal matrix of the removal function, is the residual surface shape error.

[0028] In some embodiments of the present application, the calculation formula for obtaining the modification ability spectrum of the first removal function by intercepting the frequency band amplitude of the spectrum within a preset spatial frequency range includes:

[0029] ;

[0030] ;

[0031] ;

[0032] Wherein, is the removal function when the magnetorheological polishing angle is , is the dwell time of magnetorheological polishing, is the frequency amplitude after two-dimensional Fourier transform, represents the modification ability when the polishing angle of the removal function is , is the amplitude of.

[0033] To achieve the above object, a second aspect of the embodiments of the present invention provides a calculation system for the magnetorheological polishing angle, and the system includes:

[0034] A construction module for constructing a polishing angle population of a magnetorheological removal function, the polishing angle population including a plurality of randomly generated polishing angles, and the magnetorheological removal function being obtained by processing a component to be processed using a magnetorheological polishing technique;

[0035] A calculation module for calculating the residual surface shape error and the correction ability spectrum of processing the component to be processed according to each polishing angle in the polishing angle population by the magnetorheological removal function;

[0036] An iteration module for cross-mutating the polishing angle population based on the residual surface shape error and the correction ability spectrum of each polishing angle to obtain a next-generation population, and performing cyclic iteration until a preset iteration condition is met to obtain an optimal polishing angle;

[0037] For each polishing angle in the polishing angle population during iteration, execute: calculate the residual surface shape error corresponding to processing the component to be processed by the magnetorheological removal function according to the polishing angle, and obtain the root mean square of the residual surface shape error of the corresponding polishing angle according to the residual surface shape error.

[0038] To achieve the above object, a third aspect of the embodiments of the present invention provides an electronic device, including: at least one control processor and a memory for communicatively connecting with the at least one control processor; the memory stores instructions executable by the at least one control processor, and the instructions are executed by the at least one control processor to enable the at least one control processor to execute the above-mentioned method for calculating a magnetorheological polishing angle.

[0039] To achieve the above object, a fourth aspect of the embodiments of the present invention provides a computer-readable storage medium, the computer-readable storage medium stores computer-executable instructions, and the computer-executable instructions are used to cause a computer to execute the above-mentioned method for calculating a magnetorheological polishing angle.

[0040] The embodiments of the present application provide a method for calculating a magnetorheological polishing angle. By constructing a polishing angle population of a magnetorheological removal function, the polishing angle population includes a plurality of randomly generated polishing angles; calculating the residual surface shape error and the correction ability spectrum of processing a component to be processed according to each polishing angle in the polishing angle population by the magnetorheological removal function; cross-mutating the polishing angle population based on the residual surface shape error and the correction ability spectrum of each polishing angle to obtain a next-generation population, and performing cyclic iteration until a preset iteration condition is met to obtain an optimal polishing angle; for each polishing angle in the polishing angle population during iteration, execute: calculate the residual surface shape error corresponding to processing the component to be processed by the magnetorheological removal function according to the polishing angle, and obtain the root mean square of the residual surface shape error of the corresponding polishing angle according to the residual surface shape error, it is possible to improve the correction ability of the magnetorheological polishing technique by adjusting the polishing angle of the removal function.

[0041] It can be understood that the beneficial effects of the second to fourth aspects compared with the related art are the same as those of the first aspect compared with the related art. For the relevant descriptions, reference can be made to the relevant descriptions in the first aspect, and details will not be repeated here. BRIEF DESCRIPTION OF THE DRAWINGS

[0042] The above and / or additional aspects and advantages of the present application will become apparent and be readily understood from the following description of the embodiments in conjunction with the accompanying drawings, where:

[0043] Figure 1 is a schematic flow chart of a method for calculating the magnetorheological polishing angle provided by an embodiment of the present application;

[0044] Figure 2 is a schematic diagram of the magnetorheological removal function provided by an embodiment of the present application;

[0045] Figure 3 is a schematic diagram of the magnetorheological spiral structure provided by an embodiment of the present application;

[0046] Figure 4 is a schematic diagram of the modification ability of the removal function at different polishing angles provided by an embodiment of the present application;

[0047] Figure 5 is a schematic diagram of magnetorheological spiral machining provided by an embodiment of the present application;

[0048] Figure 6 is a schematic diagram of the structure of a magnetorheological polishing angle calculation and training system provided by an embodiment of the present application;

[0049] Figure 7 is a schematic diagram of the hardware structure of an electronic device provided by an embodiment of the present application. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0050] Embodiments of the present application will be described in detail below. Examples of the embodiments are shown in the accompanying drawings, where the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary only for explaining the present application and should not be construed as limiting the present application.

[0051] In the description of the present application, if the first, second, etc. are described, it is only for the purpose of distinguishing technical features and should not be construed as indicating or implying relative importance or implicitly indicating the quantity of the indicated technical features or implicitly indicating the sequence of the indicated technical features.

[0052] In the description of this application, it should be understood that with regard to the orientation description, such as the orientation or positional relationship indicated by "upper", "lower", etc., it is based on the orientation or positional relationship shown in the drawings. This is only for the convenience of describing this application and simplifying the description, rather than indicating or implying that the device or component referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation to this application.

[0053] In the description of this application, it should be noted that unless otherwise clearly defined, terms such as "set", "installed", "connected", etc. should be understood in a broad sense. Those skilled in the art can reasonably determine the specific meanings of the above terms in this application in combination with the specific content of the technical solution.

[0054] As a typical representative of diffractive optical elements, the continuous phase plate (CPP) is characterized by a continuous phase profile structure distributed on its surface. Different from the scattering loss and intensity modulation problems caused by discrete steps in traditional stepped phase elements, the CPP can effectively suppress high-order diffraction effects through a smooth phase structure, significantly improving the laser damage threshold of the element, and showing unique technical advantages in the fields of laser beam shaping, wavefront compensation, and optical field modulation. By precisely controlling the phase distribution of the incident wavefront, the CPP can convert it into an output wavefront with a specific energy distribution (such as flat-top, Gaussian, or super-Gaussian distribution). In inertial confinement fusion (ICF) devices, to achieve uniform irradiation of the target pellet, it is required that the light intensity distribution of the laser focal spot has the characteristics of flat-topping, steep edges, and no side lobes, which poses extremely high requirements on the manufacturing accuracy of the CPP. In recent years, with the development of ICF devices towards higher power and shorter pulses, the design parameters of the CPP show a trend of spatial period miniaturization (millimeter level) and modulation depth doubling (from several micrometers to dozens of micrometers), which poses great challenges to the accuracy and adaptability of the manufacturing process.

[0055] Magnetorheological Finishing (MRF) has become the mainstream processing method for CPP in ICF devices due to its advantages such as high determinacy (material removal accuracy reaching the sub-nanometer level) and small subsurface damage, and a mature process flow has been formed. However, with the continuous improvement of the performance requirements of the ICF system for CPP, the limitations of traditional MRF technology have gradually emerged. Currently, MRF usually uses a single-size removal function for iterative processing to achieve the surface shape correction of CPP components. However, the CPP surface has complex phase distribution characteristics, and it is difficult for a single removal function to match the multi-scale phase distribution characteristics of the CPP surface, resulting in a slow convergence rate of low-frequency errors and severely restricting the processing efficiency. In summary, the shaping ability of the single removal function of magnetorheological finishing technology restricts the improvement of the manufacturing accuracy and efficiency of continuous phase components, becoming the main bottleneck in the current CPP process optimization.

[0056] Based on this, the embodiments of this application provide a method, system, electronic device, and medium for calculating the magnetorheological polishing angle, aiming to determine the spiral polishing angle, improve the shaping ability of magnetorheological finishing technology with a rotating removal function, realize the matching of the processing points of complex curved surface structures and the spiral angle, and thus significantly improve the processing accuracy of optical parts.

[0057] The method, system, electronic device, and medium for calculating the magnetorheological polishing angle provided by the embodiments of this application are specifically described through the following embodiments. First, the method for calculating the magnetorheological polishing angle in the embodiments of this application is described.

[0058] The embodiments of this application can acquire and process relevant data based on artificial intelligence technology. Among them, Artificial Intelligence (AI) is a theory, method, technology, and application system that uses a digital computer or a machine controlled by a digital computer to simulate, extend, and expand human intelligence, perceive the environment, acquire knowledge, and use knowledge to obtain the best results.

[0059] Artificial intelligence basic technologies generally include technologies such as sensors, dedicated artificial intelligence chips, cloud computing, distributed storage, big data processing technology, operation / interaction systems, and mechatronics. Artificial intelligence software technologies mainly include several major directions such as computer vision technology, robotics technology, biometric technology, speech processing technology, natural language processing technology, and machine learning / deep learning.

[0060] The calculation method of the magnetorheological polishing angle provided by the embodiments of the present application relates to the technical field of precision manufacturing of optical elements. The calculation method of the magnetorheological polishing angle provided by the embodiments of the present application can be applied to a terminal, can also be applied to a server, or can be software running on a terminal or a server. In some embodiments, the terminal can be a smart phone, a tablet computer, a laptop computer, a desktop computer, etc.; the server can be configured as an independent physical server, can also be configured as a server cluster or a distributed system composed of multiple physical servers, or can also be configured as a cloud server providing basic cloud computing services such as cloud services, cloud databases, cloud computing, cloud functions, cloud storage, network services, cloud communications, middleware services, domain name services, security services, CDN, and big data and artificial intelligence platforms; the software can be an application that implements the calculation method of the magnetorheological polishing angle, etc., but is not limited to the above forms.

[0061] The present application can be used in many general or specific computer system environments or configurations. For example: personal computers, server computers, handheld or portable devices, tablet devices, multi-processor systems, microprocessor-based systems, set-top boxes, programmable consumer electronic devices, network PCs, minicomputers, mainframe computers, distributed computing environments including any of the above systems or devices, and so on. The present application can be described in the general context of computer-executable instructions executed by a computer, such as program modules. Generally, program modules include routines, programs, objects, components, data structures, etc. that perform specific tasks or implement specific abstract data types. The present application can also be practiced in a distributed computing environment where tasks are performed by remote processing devices connected through a communication network. In a distributed computing environment, program modules can be located in local and remote computer storage media including storage devices.

[0062] Therefore, referring to Figure 1 , the embodiments of the present application provide a calculation method of the magnetorheological polishing angle. This method is applied to a central controller. The controller can be a server, can be an electronic device, or can be a mobile terminal, etc., which is not specifically limited here. The method includes the following steps S110 to S130.

[0063] Step S110: Construct a polishing angle population of the magnetorheological removal function. The polishing angle population includes multiple randomly generated polishing angles. The magnetorheological removal function is formed by the contact between the magnetorheological polishing ribbon and the element to be processed.

[0064] In this step, the magnetorheological finishing technology is used to process the optical element. First, the surface shape error needs to be calculated based on the actual surface shape and the preset ideal surface shape of the optical element. Then, the part to be processed (the element to be processed) for magnetorheological finishing is determined according to the surface shape error. When the element to be processed is machined by magnetorheological finishing, each machining point corresponds to a magnetorheological removal function, where the magnetorheological removal function is formed by the contact between the magnetorheological finishing ribbon and the element to be processed.

[0065] Specifically, the magnetorheological removal function is formed by the contact between the finishing ribbon used in the magnetorheological finishing technology and the element to be processed. It describes the ability of the finishing tool to remove the surface material of the element to be processed at a specific position and is affected by multiple process parameters, such as the speed of the polishing wheel, the depth of penetration, the viscosity and flow rate of the polishing fluid, etc. Among them, the polishing angle of the removal function is a key factor in adjusting the dressing ability.

[0066] Furthermore, the polishing angle is generated while the magnetorheological polishing wheel rotates for machining and also rotates spirally in the radial direction. Preferably, it is the angle of the polishing wheel relative to the surface of the element to be processed. Different polishing angles have different material removal characteristics (peak material removal rate, material volume removal rate, full width at half maximum, etc.). It can be seen that changing the polishing angle will affect the contact process between the finishing ribbon and the element to be processed. Therefore, by adjusting the polishing angle, the surface shape characteristics of the continuous phase element can be adapted, and the dressing ability of the removal function can be improved.

[0067] Furthermore, multiple polishing angles for magnetorheological finishing are randomly generated to construct a polishing angle population for magnetorheological finishing, providing data support for selecting the optimal machining polishing angle in the subsequent iteration process.

[0068] In some embodiments, as Figure 2 shown, the dressing abilities of the inverted D-shaped removal functions of magnetorheological finishing have significant differences at different polishing angles.

[0069] Step S120: Calculate the magnetorheological removal function. According to each polishing angle in the polishing angle population, calculate the residual surface shape error and the dressing ability spectrum of the element to be processed.

[0070] In this step, the magnetorheological finishing technology is used to process the element to be processed respectively according to each polishing angle in the polishing angle population, obtain the initial surface shape of the element to be processed at different polishing angles, and then calculate the difference between the initial surface shape corresponding to each polishing angle and the preset ideal surface shape to obtain the residual surface shape error.

[0071] Specifically, the residual surface form error refers to the difference between the preset ideal surface form and the surface form of the processed component. The residual surface form error of an optical component represents the deviation degree between the processed component surface and the ideal surface, and is an important indicator for describing the machining accuracy of the optical component. During the magnetorheological polishing process, each processing point on the polishing path has its specific residual surface form error value, and these values reflect the material removal amount that needs to be corrected on the surface at that point. Therefore, the size of the component residual surface form error directly determines the imaging quality and performance of the optical system.

[0072] Furthermore, after obtaining the initial surface form of the component to be processed, the residual surface form error of the component to be processed is obtained by calculating the difference between the preset ideal surface form and the initial surface form.

[0073] In some embodiments, the residual surface form error of the component refers to the shape deviation error between the tested optical surface and the theoretical surface in the normal direction.

[0074] In some embodiments, as Figure 3 shown, in the structural schematic diagram of processing a component to be processed by magnetorheological polishing technology, it includes the component to be processed (a part of the area in the optical component that needs to be processed), a polishing wheel for processing, a polishing ribbon, a magnet, and a nozzle.

[0075] Specifically, after processing the component to be processed by adjusting the polishing angle of the magnetorheological removal function, the shape information of the surface of the component to be processed is obtained by using a high-precision measuring device, such as an interferometer, a profiler, or a three-dimensional scanner, etc., to obtain the initial surface form of the surface of the component to be processed. Then, according to the initial surface form and the predefined ideal surface form, the difference between the actual height value and the ideal height value after processing at the corresponding polishing angle is calculated, that is, the residual surface form error.

[0076] In some embodiments, the full-aperture surface form error of the component to be processed is measured by using a white light interferometer, and then based on the surface form error characteristics, the spiral processing angle is adjusted to improve the shaping ability.

[0077] Furthermore, for a non-rotationally symmetric magnetorheological polishing removal function, as Figure 4 shown, after rotating the polishing angles of 0°, 5°, 10°, and 15° and performing a Fourier transform on the magnetorheological polishing removal function to convert it into a spectral form (the removal function cannot eliminate the frequency bands below the dashed line in the figure), it can be clearly seen that there are differences in the shaping ability of the magnetorheological removal function at different polishing angles.

[0078] Therefore, the magnetorheological removal function at different spiral angles will exhibit different shaping abilities, and will change with the angle of spiral rotation. Moreover, different rotation angles can expand the correction range of low-frequency errors to different degrees, thereby enhancing the shaping ability of the magnetorheological removal function.

[0079] Further, as Figure 5 shown, represents the polishing angles of all the machining points on the first transverse path, including the th machining point, the th machining point, and the th machining point, etc. represents the polishing angles of all the machining points on the second transverse path, including the th machining point, the th machining point, and the th machining point, etc. During the whole process of magnetorheological finishing of the element to be machined, along with the machining path of spiral machining, there are multiple machining points with different polishing angles. Each machining point corresponds to a polishing angle, and the removal effects produced by different polishing angles are also different.

[0080] Specifically, the removal function describes the ability of the polishing tool to remove the surface material of the element to be machined at a specific position, which is affected by multiple process parameters, such as the speed of the polishing wheel, the depth of penetration, the viscosity and flow rate of the polishing fluid, etc. Among them, the polishing angle of the removal function is a key factor for adjusting the dressing ability. Therefore, by adjusting the polishing angle of the removal function corresponding to each machining point, the enhancement of the surface shape correction ability in different directions can be achieved.

[0081] In some embodiments, in step S120, calculating the magnetorheological removal function according to each polishing angle in the polishing angle population, the residual surface shape error of the element to be machined includes the following steps S210 to S220:

[0082] Step S210: Obtain the initial surface shape of the element to be machined after machining according to the polishing angle of the magnetorheological removal function;

[0083] Step S220: Calculate the residual surface shape error according to the initial surface shape and the preset ideal surface shape

[0084] In this embodiment, the removal function describes the distribution of the ability of the magnetorheological finishing technology to remove the surface material of the element to be machined under specific conditions (such as a specific polishing angle). When rotating different polishing angles, since the polishing angle affects the contact mode and position between the magnetorheological polishing ribbon and the element to be machined, changing the position and degree of material removal, the removal function will also change accordingly.

[0085] Therefore, it is necessary to select the optimal polishing angle to adjust the removal function according to the residual surface shape error of the component to be processed. The correction ability spectrum is a transformation or analysis method of the removal function, which is used to more intuitively represent the material removal ability under different frequency components. It can help understand the performance of the removal function at different spatial frequencies, that is, which frequency components are more likely to be removed or retained.

[0086] Specifically, during magnetorheological polishing, the polishing angle is an important parameter, which affects the way of contact between the magnetorheological fluid and the workpiece surface and the material removal mode. Different polishing angles will result in different removal function characteristics. According to the selected polishing angle, the corresponding magnetorheological removal function is obtained. The removal function describes the removal characteristics of the magnetorheological fluid on the workpiece surface material under specific conditions (such as indentation depth, polishing angle, etc.). These characteristics include but are not limited to the full width at half maximum, removal rate, and the ability to process the smallest spatial periodic structure.

[0087] After processing the component to be processed according to each polishing angle, measure the actual surface shape data of the component to be processed. Usually, precision measurement equipment such as an interferometer is used to obtain this information.

[0088] Compare the measured actual surface shape data with the preset ideal surface shape, and the difference between the two is the residual surface shape error. Among them, the preset ideal surface shape refers to the target surface shape determined in advance according to the preset ideal surface shape, that is, the best surface shape state that is expected to be achieved. For a continuous phase element (CPP), this may involve specific energy distribution requirements, such as flat-topping, steep edges, and no sidelobe characteristics.

[0089] In some embodiments, when calculating the magnetorheological removal function in step S120, according to each polishing angle in the polishing angle population, the residual surface shape error and the correction ability spectrum of the component to be processed include the following steps S310 to S330:

[0090] Step S310: Obtain the first removal function after rotating the polishing angle of the magnetorheological removal function;

[0091] Step S320: Perform a two-dimensional Fourier transform on the first removal function to obtain the corresponding spectrum;

[0092] Step S330: Intercept the band amplitude of the spectrum within the preset spatial frequency range to obtain the correction ability spectrum of the first removal function.

[0093] In this embodiment, first, a first removal function after the removal function is rotated and polished is obtained. In the magnetorheological polishing technology, the removal function describes the ability distribution of the polishing tool to remove the surface material of the element to be processed, and the removal function usually depends on the position and direction of the polishing wheel. Therefore, by adjusting the direction of the removal function to match the angular change of the polishing wheel relative to the element to be processed during the actual processing, the first removal function corresponding to the polishing angle can be obtained.

[0094] Further, the first removal function is transformed from the spatial domain to the frequency domain through Fourier transform analysis. By analyzing the components of the first removal function at different frequencies, it can be decomposed into different frequency components, and then a spectrogram representing the amplitude of the first removal function at different frequencies is obtained, which shows the intensity of each frequency component in the first removal function.

[0095] Further, the band amplitude of the spectrum within the preset spatial frequency range is intercepted to obtain the modification ability of the first removal function, that is, the ability spectrum of the first removal function to modify the surface of the element to be processed within a specific frequency range, which reflects the effectiveness and action mode of the removal function at these frequencies, and provides a judgment basis for evaluating and optimizing the polishing angle to ensure the best processing effect.

[0096] Specifically, the modification ability is a transformation or analysis method of the removal function, which is used to more intuitively represent the material removal ability under different frequency components. It can help understand the performance of the removal function at different spatial frequencies, that is, which frequency components are more likely to be removed or retained.

[0097] In some embodiments, the band amplitude of the spectrum within the preset spatial frequency range is intercepted to obtain the modification ability spectrum of the first removal function, including:

[0098] ;

[0099] ;

[0100] ;

[0101] Among them, is the removal function when the magnetorheological polishing angle is , is the dwell time of the magnetorheological polishing, is the frequency amplitude after two-dimensional Fourier transform, represents the modification ability of the removal function when the polishing angle is , is the amplitude of.

[0102] Step S130: Based on the residual surface form error and the dressing ability spectrum for each polishing angle, perform crossover and mutation on the polishing angle population to obtain the next-generation population, and perform iterative loops until the preset iteration conditions are met to obtain the optimal polishing angle. For each polishing angle in the polishing angle population during the iteration, execute the following: Calculate the residual surface form error of the component to be processed according to the polishing angle by the magnetorheological finishing function, and obtain the root mean square of the residual surface form error corresponding to the polishing angle based on the residual surface form error.

[0103] In this step, calculate the corresponding root mean square of the residual surface form error according to the residual surface form error and the dressing ability spectrum for each polishing angle. Furthermore, based on the root mean square of the residual surface form error and the dressing ability spectrum for each polishing angle, perform crossover and mutation on the polishing angle population to obtain the next-generation population, and perform iterative loops until the preset iteration conditions are met to obtain the optimal polishing angle.

[0104] Specifically, according to the dressing ability spectrum for each polishing angle, combined with the residual surface form error corresponding to the magnetorheological finishing function, select the finishing function during the population iteration to determine the excellent individuals. For each polishing angle, evaluate the polishing effect at this polishing angle by combining its corresponding dressing ability spectrum and residual surface form error. Preferably, based on the dressing ability spectrum for each polishing angle, select the optimal polishing angle according to the surface form error characteristics (such as the minimum spatial period, modulation depth, etc.) of the component to be processed to adjust the finishing function.

[0105] Furthermore, determine whether the excellent individuals of the current population meet the preset iteration conditions. If not, perform crossover and mutation on the magnetorheological finishing population to obtain the next-generation population, and perform iterative loops until the preset iteration conditions are met to obtain the optimal individual, that is, the optimal polishing angle, where the preset iteration conditions include: the current iteration number is greater than or equal to the preset maximum iteration number, or the root mean square of the residual surface form error corresponding to the magnetorheological finishing function for the polishing angle is less than or equal to the preset minimum threshold.

[0106] In some embodiments, first, according to the dressing ability spectrum for each polishing angle of the current polishing angle population and the residual surface form error of the component, select a more appropriate finishing function, determine its corresponding polishing angle, and use it to construct the initial population for genetic calculation to optimize the polishing angle.

[0107] Furthermore, by simulating the surface shape after polishing, finally calculate the root mean square value of the residual surface form error as the standard for evaluating the quality of the current polishing angle, so as to systematically evaluate the influence of different spiral polishing angles on the final processing, provide a scientific basis for optimizing the magnetorheological finishing process parameters, which not only helps to improve the processing accuracy, but also enhances the stability and controllability of the process.

[0108] Specifically, the surface shape difference between the etched surface shape of the component simulation result and the pre-set ideal surface shape at each polishing angle is calculated to obtain the residual surface shape error, and then the root mean square of the corresponding residual error is calculated based on the residual surface shape error, so as to determine the optimal polishing angle according to the root mean square of the residual error, realize more precise control of the magnetorheological polishing process, and thus improve the processing accuracy and efficiency.

[0109] In some embodiments, the magnetorheological removal function of any machining point on the path of the magnetorheological polishing element is defined as , where represents the abscissa of the magnetorheological polishing machining point in the plane coordinate system, represents the ordinate of the magnetorheological polishing machining point in the plane coordinate system. When the spiral rotation angle is , the magnetorheological removal function of the magnetorheological polishing machining point becomes:

[0110] ;

[0111] Furthermore, the surface shape of the magnetorheological polishing machining point can be expressed as:

[0112] ;

[0113] Among them, the material removal of the magnetorheological machining satisfies the two-dimensional convolution of the removal function and the dwell time , that is:

[0114] ;

[0115] Furthermore, the modification ability of the removal function can be expressed as:

[0116] ;

[0117] Among them,

[0118] ;

[0119] is the two-dimensional Fourier transform of the removal function , is the frequency amplitude after two-dimensional Fourier transform.

[0120] In some embodiments, two individuals are randomly selected from the current polishing angle population, and part of the gene information is exchanged in a certain way (such as single-point crossover, multi-point crossover, or uniform crossover) to generate new individuals. Minor adjustments are made to some of the polishing angles in the newly generated individuals to increase the population diversity and avoid falling into local optimal solutions. Through the above crossover and mutation operations, a new polishing angle population is generated, and then it is determined whether there are excellent individuals that meet the conditions in the current polishing angle population according to the preset iteration conditions to determine whether to continue the loop iteration.

[0121] Furthermore, if there are excellent individuals that meet the conditions in the current polishing angle population, the iteration ends to obtain the optimal individual, that is, the optimal polishing angle. Otherwise, the crossover and mutation operations are repeated. Each iteration generates a new generation of population based on the results of the previous generation. For each polishing angle in the current population, during the actual or simulated magnetorheological polishing process, after adjusting the removal function corresponding to the polishing angle, the root mean square of the residual surface shape error of the surface of the component to be processed is calculated to evaluate the performance of each generation of population and re-determine its iteration result.

[0122] In some embodiments, the smaller the root mean square value of the residual surface shape error, the higher the fitness, which can effectively find the optimal polishing angle in a complex optimization space and improve the effect of magnetorheological polishing.

[0123] In some embodiments, a removal vector is defined which represents the material removal ability of the removal function at all surface shape error control points when the removal function is located at the magnetorheological polishing processing point . Then the removal efficiency at any surface shape error control point is:

[0124] ;

[0125] where represents the removal functions at different polishing angles at different positions.

[0126] Furthermore, when the surface shape error control point is located outside the removal function, a removal matrix is defined as:

[0127] ;

[0128] Furthermore, the material removal amount of the surface shape error is the sum of the products of the unit material removal amount of each surface shape error control point and the dwell time. Therefore, the process of solving the dwell time becomes the inverse problem of solving the following large sparse matrix equation set, that is:

[0129] ;

[0130] Further, the theoretical residual machining error of magnetorheological spiral polishing is shown in the following formula:

[0131] ;

[0132] Wherein, is the preset ideal surface shape, is the dwell time, is the removal matrix, is the residual surface shape error.

[0133] Further, the calculation formula for the residual surface shape error corresponding to any polishing angle is:

[0134] ;

[0135] ;

[0136] ;

[0137] Wherein, is the preset ideal surface shape, is the dwell time of magnetorheological polishing, represents the removal function when the magnetorheological polishing angle is , is the removal matrix of the removal function, is the residual surface shape error.

[0138] In some embodiments, in step S130, based on the residual surface shape error and the cultivation ability spectrum of each polishing angle, the polishing angle population is cross-mutated to obtain the next generation population, including the following steps S410 to step S430:

[0139] Step S410, calculate the root mean square of the corresponding residual surface shape error according to the residual surface shape error of each polishing angle;

[0140] Step S420, determine the excellent individuals in the polishing angle population according to the root mean square of the residual surface shape error and the cultivation ability spectrum;

[0141] Step S430, cross-mutate the polishing angle population according to the excellent individuals to obtain the next generation population.

[0142] In this embodiment, for each polishing angle, the residual surface shape error is calculated according to the difference between the actually measured surface shape of the component and the preset ideal surface shape, and then based on the corresponding residual surface shape error distribution, the root mean square (RMS) of the residual surface shape error is calculated.

[0143] Furthermore, based on the root mean square (RMS) of the residual surface form error and the correction ability spectrum at each polishing angle, the best-performing individual (i.e., the polishing angle configuration with the lowest RMS value) is selected from the current population to perform crossover and mutation on the polishing angle population according to the excellent individual, resulting in the next generation population.

[0144] Specifically, by randomly selecting two excellent individuals, exchanging some of their characteristics (such as different polishing angles or indentation depth settings), generating new individuals, and applying small random changes to the newly generated individuals (such as fine-tuning a certain polishing angle), more possibilities can be explored within the search space, increasing the diversity of the population, preventing premature convergence to local optimal solutions, and then forming the next generation population until the preset termination conditions are met (such as reaching a predetermined number of iterations or finding a sufficiently low RMS of the residual surface form error).

[0145] Furthermore, by evaluating the processing effect under each polishing angle configuration (i.e., calculating the RMS of the residual surface form error), and accordingly selecting excellent individuals for genetic operations (crossover and mutation), the polishing angle parameters are gradually optimized, aiming to reduce the residual surface form error and improve the processing accuracy of the continuous phase element (CPP), so as to not only ensure the effective evaluation and selection of the optimal polishing angle during the iterative optimization process, but also provide effective technical support for achieving high-quality optical element manufacturing, improve the controllability and flexibility of the processing process, achieve the best magnetorheological polishing effect, and significantly improve the quality of the surface of the workpiece.

[0146] In some embodiments, several initial polishing angles are first defined, their variation ranges and constraint conditions are determined, and the initial population (angles) of the genetic algorithm is established. Then, based on the linear equation method, the RMS of the surface form error after magnetorheological polishing is calculated by substituting the initial population.

[0147] Furthermore, the RMS of the residual surface form of the workpiece to be processed is calculated. If the current iteration number gen is greater than or equal to the maximum iteration number max_gen, or when the residual error accuracy tor of the workpiece to be processed is less than or equal to the minimum threshold min_tor, the genetic iteration is terminated. Otherwise, genetic excellent individuals are selected according to the RMS of the residual surface form, crossover and mutation operations are performed on the population, the iteration number is increased, and the steps "Based on the linear equation method, substitute the initial population to calculate the RMS of the surface form error after magnetorheological polishing, and calculate the residual surface form (obtained by subtracting the preset ideal surface form from the surface form error)" are returned to continue the iterative calculation. Finally, the optimal polishing angle combination is obtained, and the shaping ability is improved by adjusting the polishing angle of the removal function to adapt to the complex surface form distribution of the continuous phase element surface, achieving higher processing accuracy.

[0148] In some embodiments, by constructing a polishing angle population of a magnetorheological removal function, the polishing angle population includes a plurality of randomly generated polishing angles, and the magnetorheological removal function is formed by the contact between the magnetorheological polishing ribbon and the element to be processed; calculating the residual surface shape error and the correction ability spectrum of the element to be processed according to each polishing angle in the polishing angle population by the magnetorheological removal function; based on the residual surface shape error and the correction ability spectrum of each polishing angle, performing crossover mutation on the polishing angle population to obtain the next generation population, and performing cyclic iteration until a preset iteration condition is satisfied to obtain the optimal polishing angle; for each polishing angle in the polishing angle population during iteration, perform: calculating the residual surface shape error of the element to be processed corresponding to the polishing angle by the magnetorheological removal function, and obtaining the root mean square of the residual surface shape error of the corresponding polishing angle according to the residual surface shape error, and the correction ability of the magnetorheological polishing technology can be improved by adjusting the polishing angle of the removal function.

[0149] As Figure 6 shown, some embodiments of the present application provide a calculation system for the magnetorheological polishing angle. The system includes a construction module 610, a calculation module 620, and an iteration module 630. Specifically:

[0150] The construction module 610 is used to construct a polishing angle population of a magnetorheological removal function. The polishing angle population includes a plurality of randomly generated polishing angles, and the magnetorheological removal function is formed by the contact between the magnetorheological polishing ribbon and the element to be processed;

[0151] The calculation module 620 is used to calculate the residual surface shape error and the correction ability spectrum of the element to be processed according to each polishing angle in the polishing angle population by the magnetorheological removal function;

[0152] The iteration module 630 is used to perform crossover mutation on the polishing angle population based on the residual surface shape error and the correction ability spectrum of each polishing angle to obtain the next generation population, and perform cyclic iteration until a preset iteration condition is satisfied to obtain the optimal polishing angle;

[0153] For each polishing angle in the polishing angle population during iteration, perform: calculating the residual surface shape error of the element to be processed corresponding to the polishing angle by the magnetorheological removal function, and obtaining the root mean square of the residual surface shape error of the corresponding polishing angle according to the residual surface shape error.

[0154] In some embodiments, the calculation module 620 may include: obtaining the initial surface shape of the element to be processed by the magnetorheological removal function according to the polishing angle.

[0155] In some embodiments, the calculation module 620 may include: calculating the residual surface shape error according to the initial surface shape and the preset ideal surface shape.

[0156] In some embodiments, the calculation module 620 may include: obtaining a first removal function after the magnetorheological removal function rotates by an angle.

[0157] In some embodiments, the calculation module 620 may include: performing a two-dimensional Fourier transform on the first removal function to obtain a corresponding spectrum.

[0158] In some embodiments, the calculation module 620 may include: intercepting the amplitude of the frequency band within a preset spatial frequency range of the spectrum to obtain the cultivation ability spectrum of the first removal function.

[0159] In some embodiments, the iteration module 630 may include: calculating the root mean square of the residual surface shape error corresponding to each polishing angle according to the residual surface shape error.

[0160] In some embodiments, the iteration module 630 may include: determining excellent individuals in the polishing angle population according to the root mean square of the residual surface shape error and the cultivation ability spectrum.

[0161] In some embodiments, the iteration module 630 may include: performing crossover and mutation on the polishing angle population according to the excellent individuals to obtain the next generation population.

[0162] In some embodiments, the iteration module 630 may include: the current iteration number is greater than or equal to a preset maximum iteration number, or the root mean square of the residual surface shape error corresponding to the polishing angle of the magnetorheological removal function is less than or equal to a preset minimum threshold.

[0163] In some embodiments, the iteration module 630 may include:

[0164] ;

[0165] ;

[0166] ;

[0167] Wherein, is the preset ideal surface shape, is the dwell time of magnetorheological polishing, represents that the magnetorheological polishing angle is when the removal function, is the removal matrix of the removal function, is the residual surface shape error.

[0168] In some embodiments, the iteration module 630 may include:

[0169] ;

[0170] ;

[0171] ;

[0172] Wherein, is the removal function when the magnetorheological polishing angle is ; is the dwell time of magnetorheological polishing, is the frequency amplitude after two-dimensional Fourier transform, represents the modification ability when the polishing angle of the removal function is ; is the amplitude of

[0173] It should be noted that the calculation system of the magnetorheological polishing angle provided in this embodiment and the above-mentioned calculation method of the magnetorheological polishing angle are based on the same inventive concept. Therefore, the relevant content of the above-mentioned calculation method of the magnetorheological polishing angle also applies to the content of the calculation system of the magnetorheological polishing angle. Therefore, it will not be elaborated here.

[0174] For this purpose, the system constructs a population of polishing angles of the magnetorheological removal function, where the population of polishing angles includes a plurality of randomly generated polishing angles; calculates the residual surface shape error and the modification ability spectrum of the element to be processed according to each polishing angle in the population of polishing angles of the magnetorheological removal function; based on the residual surface shape error and the modification ability spectrum of each polishing angle, performs crossover and mutation on the population of polishing angles to obtain the next generation population, and performs iterative cycling until the preset iteration condition is met to obtain the optimal polishing angle; for each polishing angle in the population of polishing angles during the iteration, executes: calculates the residual surface shape error corresponding to the element to be processed according to the polishing angle of the magnetorheological removal function, and obtains the root mean square of the residual surface shape error corresponding to the polishing angle according to the residual surface shape error. In this way, it is possible to improve the modification ability of the magnetorheological polishing technology by adjusting the polishing angle of the removal function.

[0175] This application embodiment also provides an electronic device, which includes a memory and a processor. The memory stores a computer program, and when the processor executes the computer program, the above-mentioned calculation method of the magnetorheological polishing angle is implemented.

[0176] As Figure 7 , Figure 7 is the schematic hardware structure diagram of the electronic device provided in this application embodiment. The electronic device includes:

[0177] At least one battery;

[0178] At least one memory;

[0179] At least one processor;

[0180] At least one program;

[0181] The program is stored in the memory, and the processor executes at least one program to implement the calculation method of a magnetorheological polishing angle described above in the present disclosure.

[0182] The electronic device can be any intelligent terminal including a mobile phone, a tablet computer, a personal digital assistant (PDA), an in-vehicle computer, etc.

[0183] The electronic device of the embodiment of the present application will be introduced in detail below.

[0184] The processor 1600 can be implemented by using a general-purpose central processing unit (CPU), a microprocessor, an application-specific integrated circuit (ASIC), or one or more integrated circuits, etc., and is used to execute relevant programs to implement the technical solutions provided by the embodiments of the present disclosure;

[0185] The memory 1700 can be implemented in the form of a read-only memory (ROM), a static storage device, a dynamic storage device, or a random access memory (RAM), etc. The memory 1700 can store an operating system and other application programs. When implementing the technical solutions provided by the embodiments of this specification through software or firmware, the relevant program codes are stored in the memory 1700 and are called by the processor 1600 to execute the calculation method of a magnetorheological polishing angle in the embodiments of the present disclosure.

[0186] The input / output interface 1800 is used to implement information input and output;

[0187] The communication interface 1900 is used to implement communication interaction between this device and other devices, and can implement communication through a wired method (such as USB, network cable, etc.) or through a wireless method (such as mobile network, WIFI, Bluetooth, etc.);

[0188] The bus 2000 transmits information between the various components of the device (such as the processor 1600, the memory 1700, the input / output interface 1800, and the communication interface 1900);

[0189] Among them, the processor 1600, the memory 1700, the input / output interface 1800, and the communication interface 1900 are communicatively connected to each other inside the device through the bus 2000.

[0190] An embodiment of the present disclosure also provides a storage medium, which is a computer-readable storage medium storing computer-executable instructions for causing a computer to execute the above-described method for calculating a magnetorheological polishing angle.

[0191] As a non-transitory computer-readable storage medium, a memory can be used to store a non-transitory software program and non-transitory computer-executable programs. In addition, the memory can include high-speed random access memory and can also include non-transitory memory, such as at least one magnetic disk storage device, a flash memory device, or other non-transitory solid-state storage devices. In some embodiments, the memory may optionally include a memory remotely disposed relative to the processor, and these remote memories can be connected to the processor through a network. Examples of the above networks include, but are not limited to, the Internet, an intranet, a local area network, a mobile communication network, and combinations thereof.

[0192] The embodiments described in the embodiments of the present disclosure are for more clearly illustrating the technical solutions of the embodiments of the present disclosure and do not constitute a limitation on the technical solutions provided by the embodiments of the present disclosure. Those skilled in the art will know that with the evolution of technology and the emergence of new application scenarios, the technical solutions provided by the embodiments of the present disclosure are equally applicable to similar technical problems.

[0193] Those skilled in the art can understand that the technical solutions shown in the figures do not constitute a limitation on the embodiments of the present disclosure, and may include more or fewer steps than those shown in the figures, or combine certain steps, or different steps.

[0194] The device embodiments described above are merely illustrative. The units described as separate components may or may not be physically separated, that is, they may be located in one place or distributed to multiple network units. Some or all of the modules can be selected according to actual needs to achieve the purpose of the solution of this embodiment.

[0195] Those of ordinary skill in the art can understand that all or some of the steps in the above-disclosed methods, and the functional modules / units in the systems and devices, can be implemented as software, firmware, hardware, and appropriate combinations thereof.

[0196] In the description of this application and the above-mentioned accompanying drawings, terms such as "first", "second", "third", "fourth", etc. (if any) are used to distinguish similar objects and do not necessarily describe a specific order or sequence. It should be understood that the data used in this way can be interchanged under appropriate circumstances so that the embodiments of this application described here can be implemented in an order different from those illustrated or described here. In addition, the terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusion. For example, a process, method, system, product, or device that includes a series of steps or units does not necessarily have to be limited to those steps or units clearly listed, but may include other steps or units not clearly listed or inherent to these processes, methods, products, or devices.

[0197] It should be understood that in this application, "at least one (item)" means one or more, and "a plurality" means two or more. "And / or" is used to describe the association relationship of associated objects and indicates that three relationships can exist. For example, "A and / or B" can mean: only A exists, only B exists, and both A and B exist simultaneously. Among them, A and B can be singular or plural. The character " / " generally indicates that the associated objects before and after are in an "or" relationship. "At least one (one) of the following" or its similar expression refers to any combination of these items, including any combination of single items (ones) or plural items (ones). For example, at least one (one) of a, b, or c can mean: a, b, c, "a and b", "a and c", "b and c", or "a and b and c", where a, b, c can be single or multiple.

[0198] In several embodiments provided by this application, it should be understood that the disclosed devices and methods can be implemented in other ways. For example, the device embodiments described above are only illustrative. For example, the division of units is only a logical function division. In actual implementation, there can be other division methods. For example, multiple units or components can be combined or integrated into another system, or some features can be ignored or not executed. Another point is that the displayed or discussed coupling or direct coupling or communication connection between each other can be through some interfaces. The indirect coupling or communication connection of devices or units can be in electrical, mechanical, or other forms.

[0199] The units described as separate components may or may not be physically separated, and the components displayed as units may or may not be physical units, that is, they can be located in one place or distributed to multiple network units. Some or all of the units can be selected according to actual needs to achieve the purpose of the solution of this embodiment.

[0200] In addition, in each embodiment of the present application, the functional units can be integrated into one processing unit, or each unit can exist physically alone, or two or more units can be integrated into one unit. The above-mentioned integrated unit can be implemented in the form of hardware or in the form of a software functional unit.

[0201] If the integrated unit is implemented in the form of a software functional unit and sold or used as an independent product, it can be stored in a computer-readable storage medium. Based on such an understanding, the technical solution of the present application, in essence, or the part that contributes to the prior art, or all or part of the technical solution, can be embodied in the form of a software product. The computer software product is stored in a storage medium and includes multiple instructions for causing an electronic device (which can be a personal computer, a server, or a network device, etc.) to execute all or part of the steps of the methods in the various embodiments of the present application. The aforementioned storage medium includes: USB flash drives, mobile hard disks, read-only memories (ROMs), random access memories (RAMs), magnetic disks, or optical discs, and other various media that can store programs.

[0202] The above is a specific description of the preferred implementation of the embodiments of the present application, but the embodiments of the present application are not limited to the above-mentioned implementation manners. Those skilled in the art can also make various equivalent deformations or substitutions without departing from the spirit of the embodiments of the present application, and these equivalent deformations or substitutions are all included within the scope defined by the claims of the embodiments of the present application.

[0203] The above has described the embodiments of the present application in detail with reference to the drawings, but the present application is not limited to the above embodiments. Various changes can be made without departing from the purpose of the present application within the knowledge scope of ordinary technical personnel in the technical field to which the present application pertains.

Claims

1. A calculation method for the magnetorheological polishing angle, characterized in that, The method includes: Constructing a polishing angle population of a magnetorheological removal function, where the polishing angle population includes a plurality of randomly generated polishing angles, and the magnetorheological removal function is formed by the contact between the magnetorheological polishing ribbon and the element to be processed; Calculating the residual surface shape error and the dressing ability spectrum of processing the element to be processed according to each polishing angle in the polishing angle population by the magnetorheological removal function; Based on the residual surface shape error and the dressing ability spectrum of each polishing angle, performing crossover and mutation on the polishing angle population to obtain the next generation population, and performing iterative loop until a preset iteration condition is met to obtain the optimal polishing angle; For each polishing angle in the polishing angle population during iteration, perform: calculating the residual surface shape error corresponding to processing the element to be processed by the magnetorheological removal function according to the polishing angle, and obtaining the root mean square of the residual surface shape error of the corresponding polishing angle according to the residual surface shape error; The calculating the residual surface shape error and the dressing ability spectrum of processing the element to be processed according to each polishing angle in the polishing angle population by the magnetorheological removal function includes: Obtaining a first removal function after rotating the polishing angle of the magnetorheological removal function; Performing two-dimensional Fourier transform on the first removal function to obtain the corresponding frequency spectrum; Intercepting the band amplitude of the frequency spectrum within a preset spatial frequency range to obtain the dressing ability spectrum of the first removal function.

2. The calculation method of the magnetorheological polishing angle according to claim 1, wherein The calculating the residual surface shape error of processing the element to be processed according to each polishing angle in the polishing angle population by the magnetorheological removal function includes: Obtaining the initial surface shape after processing the element to be processed by the magnetorheological removal function according to the polishing angle; Calculating the residual surface shape error according to the initial surface shape and a preset ideal surface shape.

3. The calculation method of the magnetorheological polishing angle according to claim 1, wherein The performing crossover and mutation on the polishing angle population based on the residual surface shape error and the dressing ability spectrum of each polishing angle to obtain the next generation population includes: Calculating the root mean square of the corresponding residual surface shape error according to the residual surface shape error of each polishing angle; Determining the excellent individuals in the polishing angle population according to the root mean square of the residual surface shape error and the dressing ability spectrum; Performing crossover and mutation on the polishing angle population according to the excellent individuals to obtain the next generation population.

4. The calculation method of the magnetorheological polishing angle according to claim 3, wherein The preset iteration condition includes: the current iteration number is greater than or equal to a preset maximum iteration number, or the root mean square of the residual surface shape error of the magnetorheological removal function corresponding to the polishing angle is less than or equal to a preset minimum threshold.

5. The calculation method of the magnetorheological polishing angle according to claim 2, characterized in that, The calculation formula of the residual surface shape error includes: ; ; ; Among them, is the preset ideal surface shape, is the dwell time of magnetorheological polishing, indicates that the magnetorheological polishing angle is the removal function at this time, is the removal matrix of the removal function, is the residual surface shape error.

6. The calculation method of the magnetorheological polishing angle according to claim 1, characterized in that The calculation formula of intercepting the band amplitude of the frequency spectrum within a preset spatial frequency range to obtain the dressing ability spectrum of the first removal function includes: ; ; ; Among them, is the removal function when the magnetorheological polishing angle is , is the dwell time of magnetorheological polishing, is the frequency amplitude after two-dimensional Fourier transform, represents the shaping ability when the polishing angle of the removal function is , is the amplitude of.

7. A calculation system for the magnetorheological polishing angle, characterized in that, The system includes: A construction module, configured to construct a polishing angle population of a magnetorheological removal function, where the polishing angle population includes a plurality of randomly generated polishing angles, and the magnetorheological removal function is formed by the contact between the magnetorheological polishing ribbon and the element to be processed; A calculation module, configured to calculate the residual surface shape error and the dressing ability spectrum of processing the element to be processed according to each polishing angle in the polishing angle population by the magnetorheological removal function; An iterative module, configured to perform crossover and mutation on the polishing angle population based on the residual surface shape error and the dressing ability spectrum of each polishing angle, obtain the next generation population, and perform iterative loops until a preset iteration condition is met, so as to obtain the optimal polishing angle; For each polishing angle in the polishing angle population during iteration, execute: calculate the residual surface shape error corresponding to the machining of the element to be machined by the magnetorheological removal function according to the polishing angle, and obtain the root mean square of the residual surface shape error corresponding to the polishing angle according to the residual surface shape error; The calculation of the residual surface shape error and the dressing ability spectrum of the element to be machined by the magnetorheological removal function according to each polishing angle in the polishing angle population includes: Obtain a first removal function after rotating the polishing angle of the magnetorheological removal function; Perform two-dimensional Fourier transform on the first removal function to obtain a corresponding frequency spectrum; Intercept the band amplitude of the frequency spectrum within a preset spatial frequency range to obtain the dressing ability spectrum of the first removal function.

8. An electronic device, characterized in that, It includes at least one control processor and a memory for communicatingly connecting with the at least one control processor; the memory stores instructions executable by the at least one control processor, and the instructions are executed by the at least one control processor, so that the at least one control processor can execute a method for calculating a magnetorheological polishing angle according to any one of claims 1 to 6.

9. A computer-readable storage medium, characterized in that, The computer-readable storage medium stores computer-executable instructions, and the computer-executable instructions are used to cause a computer to execute a method for calculating a magnetorheological polishing angle according to any one of claims 1 to 6.

Citation Information

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