Vacuum pulse laser processing system and method for enhancing light beam quality

Abstract

The invention relates to the technical field of laser processing, and discloses a vacuum pulse laser processing system and method for enhancing light beam quality. The method comprises the following steps: carrying out spatial filtering on a light beam of pulse laser in a vacuum environment by adopting a spatial filter; a wavefront detection unit of a wavefront sensor is adopted to detect wavefront information of the spatially filtered light beam in real time; obtaining the dynamic aperture size of a diaphragm in the spatial filter according to the wavefront information; judging whether the dynamic aperture size meets a preset standard, and if not, adjusting the aperture size and / or angle of the diaphragm until the dynamic aperture size meets the preset standard; wherein the preset standard is that the dynamic aperture size should be within a preset interval range between the minimum aperture size and the maximum aperture size. According to the invention, high-precision wavefront detection and automatic adjustment functions can be realized, high-efficiency and reliable light beam quality control is realized, and the method is suitable for high-precision optical and laser technology application.

Description

Technical Field

[0001] The present invention relates to the field of laser technology, and in particular to a vacuum pulse laser processing system and method for enhancing beam quality. Background Art

[0002] In recent years, the improvement of beam quality has become particularly important in the field of laser technology, especially in the process of pulsed laser processing in a vacuum environment. However, existing technical solutions still have some problems in practical applications. For example, the beam quality improvement devices currently on the market usually use traditional mechanical or optical means, which have a slow response speed and are difficult to achieve precise control in the face of complex working conditions. This leads to problems such as low efficiency and inconvenient operation in some scenarios.

[0003] In order to improve performance, some manufacturers try to improve the level of automation by adding advanced control algorithms. Such improvements often face problems such as high algorithm complexity and high consumption of computing resources, which increases the overall system cost and makes maintenance difficult.

[0004] The Chinese patent with publication number CN110501826A discloses a method for improving beam quality based on phase carrier wave, which solves the contradiction between the blocking hole size and the filtering size in the spatial filter by setting a reflective phase-type spatial light modulator in the optical path and loading a rectangular phase carrier wave with a suitable spatial frequency. Although this method can effectively improve the near-field beam quality, its stability is poor in a vacuum environment and its adaptability to environmental changes is insufficient. In addition, this method relies on a high-precision spatial light modulator, which is costly and complex to maintain.

[0005] The Chinese patent with publication number CN114300939A discloses a high-beam-quality VCSEL structure and preparation method, which improves the laser beam quality by introducing a photonic crystal structure and an ion-injection current suppression zone into the epitaxial structure of the VCSEL chip. This design performs well in improving the beam quality, but in a vacuum environment, its structure is highly complex and has high requirements for materials. In addition, this method is difficult to achieve real-time monitoring and dynamic adjustment, and cannot meet the application requirements in a high-dynamic environment.

[0006] The above problems show that the traditional beam quality improvement devices currently on the market can hardly effectively cope with the new requirements for precise control and rapid response of pulsed laser processing in a vacuum environment. Summary of the invention

[0007] The purpose of the present invention is to provide a vacuum pulse laser processing system and method for enhancing beam quality, which realizes high-precision beam quality control based on the dynamic adjustment of the aperture size of the aperture in the spatial filter, meets the requirements of modern optics and laser technology for high stability and high resolution, and solves the problems of complex debugging in a vacuum environment, low system integration, limited resolution improvement and poor adaptability in the prior art.

[0008] To achieve the above object, the present invention provides the following technical solutions: According to one aspect of the present invention, a vacuum pulse laser processing method for enhancing beam quality is provided, comprising the following steps: In a vacuum environment, a pulsed laser beam is spatially filtered using a spatial filter; a wavefront detection unit of a wavefront sensor is used to detect the wavefront information of the beam after spatial filtering in real time; the dynamic aperture size of the diaphragm in the spatial filter is obtained according to the wavefront information; it is determined whether the dynamic aperture size meets a preset standard, and if not, the aperture size and / or angle of the diaphragm is adjusted until the dynamic aperture size meets the preset standard; wherein the preset standard is that the dynamic aperture size should be within a preset range between a minimum aperture size and a maximum aperture size.

[0009] According to an embodiment of the present invention, the wavefront information includes slope data obtained by a wavefront detection unit detecting in real time the spatially filtered light beam.

[0010] According to one embodiment of the present invention, the detection accuracy of the wavefront detection unit is less than or equal to λ / 20, where λ is the wavelength of the pulse laser.

[0011] According to one embodiment of the present invention, the wavefront information includes slope data obtained by a wavefront detection unit detecting a light beam after spatial filtering in real time; and obtaining the dynamic aperture size of the aperture in the spatial filter according to the wavefront information includes the following steps: The least square method is used to obtain the Zernike coefficient vector from the slope data; the high-order phase difference is extracted from the Zernike coefficient vector; the high-order mode energy is obtained according to the high-order phase difference; and the dynamic aperture size of the aperture in the spatial filtering is obtained based on the high-order mode energy.

[0012] According to an embodiment of the present invention, the high-order mode energy is obtained according to the high-order phase difference by multiplying the square of each high-order phase difference by the corresponding weight factor and then accumulating and summing them.

[0013] According to an embodiment of the present invention, obtaining the dynamic aperture size of the aperture in the spatial filter based on the high-order mode energy specifically includes: Get the base scale factor , reference laser power and the laser power at the current time t , and obtain the proportionality coefficient for: ; Get the energy of higher order modes With saturation threshold , and the energy response function is obtained for: ; Get the initial aperture size , the dynamic aperture size is obtained as: ; in, ,in is the minimum aperture size, The maximum aperture size is obtained by multiplying the square of each high-order phase difference by the corresponding weight factor and then summing them up to obtain the high-order mode energy. .

[0014] According to one embodiment of the present invention, the diaphragm is placed on an adjustment seat, and the aperture size of the diaphragm is adjusted by an aperture size adjustment motor installed on the adjustment seat, and the angle of the diaphragm is adjusted by an angle adjustment motor installed on the adjustment seat.

[0015] On the other hand, the present invention also provides a vacuum pulse laser processing system for enhancing beam quality, the system comprising: A vacuum device 6 and a laser source 1, a spatial filter 2, a wavefront sensor 3, an automatic adjustment device 4, and a data processing unit 5 installed inside the vacuum device 6; the laser source 1 is connected to the spatial filter 2 through a collimating lens group 12, the wavefront sensor 3 is electrically connected to the data processing unit 5, and the automatic adjustment device 4 is electrically connected to the data processing unit 5 and installed on the spatial filter 2; The spatial filter 2 comprises an input collimator 21, an output collimator 22, an aperture 23 and an adjustment seat 24. The aperture 23 is installed between the input collimator 21 and the output collimator 22. The adjustment seat 24 is installed on both sides of the aperture 23 to adjust the aperture size and angle of the aperture 23. The aperture 23 performs spatial filtering on the pulse laser beam emitted by the laser source 1. The wavefront sensor 3 includes a wavefront detection unit 31 and a signal transmission unit 32, wherein the wavefront detection unit 31 is used to detect the wavefront information of the laser beam, and the signal transmission unit 32 is used to transmit the detected wavefront information to the data processing unit 5; The data processing unit 5 obtains the dynamic aperture size of the filtered aperture according to the wavefront information; determines whether the dynamic aperture size meets the preset standard, and if not, controls the automatic adjustment device 4 to adjust the aperture size and / or angle of the aperture until the dynamic aperture size meets the preset standard; wherein the preset standard is: the dynamic aperture size should be within a preset minimum aperture size and maximum aperture size range.

[0016] According to one embodiment of the present invention, the automatic adjustment device 4 includes an aperture size adjustment motor 41, an angle adjustment motor 42, an aperture size sensor 43 and an angle sensor 44, and the aperture size adjustment motor 41 and the angle adjustment motor 42 are respectively installed on the adjustment seat 24; the aperture size of the diaphragm is adjusted by the aperture size adjustment motor installed on the adjustment seat, and the angle of the diaphragm is adjusted by the angle adjustment motor installed on the adjustment seat; the aperture size sensor 43 and the angle sensor 44 are respectively installed on both sides of the diaphragm 23, for real-time monitoring of the aperture size and angle of the diaphragm 23.

[0017] According to one embodiment of the present invention, the wavefront information includes slope data obtained by a wavefront detection unit detecting the light beam after spatial filtering in real time; the data processing unit 5 obtains the dynamic aperture size of the aperture after spatial filtering according to the wavefront information, including: obtaining the Zernike coefficient vector from the slope data using the least squares method; extracting high-order phase differences from the Zernike coefficient vector; obtaining high-order mode energy according to the high-order phase differences; and obtaining the dynamic aperture size of the light beam after spatial filtering based on the high-order mode energy.

[0018] Compared with the prior art, the beneficial effects of the present invention are: 1. High degree of automation. The automatic adjustment device can automatically adjust the aperture size and / or angle of the diaphragm when the wavefront information does not meet the preset standard, so that the beam quality is always in the best state, significantly improving the stability and reliability of the beam quality.

[0019] 2. High beam quality accuracy. The high-precision wavefront detection unit and data processing unit can monitor and process wavefront information in real time, ensuring high-precision beam quality control in a vacuum environment and improving the intelligence level of the system.

[0020] 3. High integration. The compact integrated design makes the entire system highly integrated and compact in a vacuum environment, which is convenient for deployment and maintenance in a compact vacuum environment and improves the adaptability and flexibility of the system. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The drawings described herein are used to provide a further understanding of the present invention and constitute a part of the present invention. The exemplary embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation of the present invention. In the drawings: Figure 1 is a flow chart of a vacuum pulsed laser processing method for enhancing beam quality according to an exemplary embodiment.

[0022] Figure 2 It is a schematic diagram of the overall structure of a vacuum pulse laser processing system for enhancing beam quality according to an exemplary embodiment.

[0023] Figure 3 is a schematic diagram of the interior of a vacuum device of an exemplary embodiment.

[0024] Figure 4 is a schematic structural diagram of a laser source of an exemplary embodiment.

[0025] Figure 5 An exemplary embodiment Figure 3 A magnified schematic diagram of center A.

[0026] Figure 6 is a schematic structural diagram of a wavefront sensor of an exemplary embodiment.

[0027] Figure 7 is a schematic structural diagram of a data processing unit of an exemplary embodiment.

[0028] Figure 8 is a schematic structural diagram of a vacuum device of an exemplary embodiment.

[0029] Fig. 9 is a flowchart of a vacuum pulsed laser processing system with enhanced beam quality according to an exemplary embodiment.

[0030] Reference numerals: 1-laser source; 11-pulse laser generator; 12-collimating lens group; 2-spatial filter; 21-input collimator; 22-output collimator; 23-aperture; 24-adjustment seat; 3-wavefront sensor; 31-wavefront detection unit; 32-signal transmission unit; 4-automatic adjustment device; 41-aperture size adjustment motor; 42-angle adjustment motor; 43-aperture size sensor; 44-angle sensor; 5-data processing unit; 51-central processing unit; 52-data storage device; 53-signal transceiver; A-magnification area; 6-vacuum device; 61-vacuum chamber; 62-vacuum pump; 63-vacuum detector. DETAILED DESCRIPTION

[0031] In order to clearly describe the technical solutions of the embodiments of the present invention, in the embodiments of the present invention, words such as "first" and "second" are used to distinguish the same items or similar items with basically the same functions and effects. For example, the first threshold and the second threshold are only used to distinguish different thresholds, and their order is not limited. Those skilled in the art can understand that words such as "first" and "second" do not limit the quantity and execution order, and words such as "first" and "second" do not necessarily limit them to be different.

[0032] It should be noted that, in the present invention, words such as "exemplary" or "for example" are used to indicate examples, illustrations or descriptions. Any embodiment or design described as "exemplary" or "for example" in the present invention should not be interpreted as being more preferred or more advantageous than other embodiments or designs. Specifically, the use of words such as "exemplary" or "for example" is intended to present related concepts in a specific way.

[0033] In the present invention, "at least one" means one or more, and "plurality" means two or more. "And / or" describes the association relationship of associated objects, indicating that three relationships may exist. For example, A and / or B can mean: A exists alone, A and B exist at the same time, and B exists alone, where A and B can be singular or plural. The character " / " generally indicates that the associated objects before and after are in an "or" relationship. The following at least one item (items) or similar expressions thereof refer to any combination of these items, including any combination of single items (items) or plural items (items). For example, at least one item (items) of a, b or c can mean: a, b, c, the combination of a and b, the combination of a and c, the combination of b and c, or the combination of a, b and c, where a, b, c can be single or multiple.

[0034] like Figure 1 As shown, a flow chart of a vacuum pulse laser processing method for enhancing beam quality is provided, and the method comprises the following steps: Step S1: In a vacuum environment, a pulse laser beam is spatially filtered using a spatial filter; Step S2: using a wavefront detection unit of a wavefront sensor to detect the wavefront information of the spatially filtered light beam in real time; Step S3: obtaining the dynamic aperture size of the aperture in the spatial filter according to the wavefront information; Step S4: Determine whether the dynamic aperture size meets the preset standard. If not, adjust the aperture size and / or angle of the diaphragm until the dynamic aperture size meets the preset standard. The preset standard is that the dynamic aperture size should be within a preset range between a minimum aperture size and a maximum aperture size.

[0035] The wavefront information includes slope data obtained by a wavefront detection unit detecting the beam after spatial filtering in real time. The detection accuracy of the wavefront detection unit is less than or equal to λ / 20, where λ is the wavelength of the pulsed laser. The dynamic aperture size of the diaphragm after spatial filtering is obtained according to the wavefront information, including the following steps: The least square method is used to obtain the Zernike coefficient vector from the slope data; the high-order phase difference is extracted from the Zernike coefficient vector; the high-order mode energy is obtained according to the high-order phase difference; and the dynamic aperture size of the aperture after spatial filtering is obtained based on the high-order mode energy.

[0036] The high-order mode energy is obtained according to the high-order phase difference , is obtained by multiplying the square of each high-order phase difference by the corresponding weight factor and then accumulating and summing them. The dynamic aperture size of the light beam after spatial filtering based on the high-order mode energy specifically includes: obtaining the basic proportional coefficient , reference laser power and the laser power at the current time t , and obtain the proportionality coefficient for: ; Get the energy of higher order modes With saturation threshold , and the energy response function is obtained for: ; Get the initial aperture size , and get the dynamic aperture size for: ; in, ,in is the minimum aperture size, is the maximum aperture size.

[0037] The diaphragm is placed on an adjustment seat, and the aperture size of the diaphragm is adjusted by an aperture size adjustment motor installed on the adjustment seat, and the angle of the diaphragm is adjusted by an angle adjustment motor installed on the adjustment seat.

[0038] like Figure 2 and Figure 3As shown, a vacuum pulse laser processing system for enhancing beam quality based on a spatial filter includes a laser source 1, a spatial filter 2, a wavefront sensor 3, an automatic adjustment device 4, a data processing unit 5 and a vacuum device 6. The laser source, the spatial filter, the wavefront sensor, the automatic adjustment device and the data processing unit are all installed in the vacuum device 6. The laser source is connected to the spatial filter through a collimating lens group, the wavefront sensor is electrically connected to the data processing unit, and the automatic adjustment device is electrically connected to the data processing unit and installed on the spatial filter.

[0039] like Figure 4 As shown, the laser source 1 includes a pulse laser generator 11 and a collimating lens group 12. The pulse laser generator is used to generate pulse laser light, and the collimating lens group is used to collimate the pulse laser light and transmit it to the spatial filter. The wavelength range of the pulse laser generator is 1064nm or 532nm, the focal length of the collimating lens group is 100mm, and the numerical aperture is less than or equal to 0.1.

[0040] against Figure 3 The A area shown in Figure 5 The figure shows an enlarged schematic diagram of area A. The spatial filter 2 comprises an input collimator 21, an output collimator 22, an aperture 23 and an adjustment seat 24. The aperture is installed between the input collimator and the output collimator. The aperture 23 performs spatial filtering on the pulsed laser beam emitted by the laser source 1. The adjustment seat is installed on both sides of the aperture to adjust the aperture size and angle of the aperture. The mode field diameters of the input collimator and the output collimator are 6μm and 8μm respectively, and the aperture size adjustment range is 2μm-500μm.

[0041] The automatic adjustment device 4 includes a position aperture adjustment motor 41, an angle adjustment motor 42, an aperture sensor 43 and an angle sensor 44. The aperture adjustment motor and the angle adjustment motor are respectively mounted on the adjustment seat, and the aperture sensor and the angle sensor are respectively mounted on both sides of the aperture to monitor the aperture size and angle of the aperture in real time. The adjustment range of the aperture adjustment motor is 2μm-500μm, and the resolution is less than 1μm. The maximum rotation angle of the angle adjustment motor is ±10°, and the resolution is less than 0.01°. The detection accuracy of the aperture sensor is ±1μm, and the detection accuracy of the angle sensor is ±0.01°.

[0042] like Figure 6As shown, the wavefront sensor 3 includes a wavefront detection unit 31 and a signal transmission unit 32. The wavefront detection unit is used to detect the wavefront information of the laser beam, and the signal transmission unit is used to transmit the detected wavefront information to the data processing unit 5. The detection accuracy of the wavefront detection unit is less than or equal to λ / 20, where λ is the laser wavelength; the transmission rate of the signal transmission unit is greater than or equal to 100Mbps, and the transmission distance is greater than or equal to 100m.

[0043] like Figure 7 As shown, the data processing unit 5 includes a central processing unit 51, a data storage device 52 and a signal transceiver 53. The central processing unit is connected to the data storage device via a data bus, and is used to store and process data detected by the wavefront sensor, and judge the wavefront information according to a preset algorithm and logic and issue corresponding instructions; the signal transceiver is connected to the central processing unit, and is used to receive and send instruction signals; the processing speed of the central processing unit is 3GHz, the capacity of the data storage device is 128GB, and the transmission rate of the signal transceiver is 1Gbps.

[0044] The data processing unit 5 obtains the dynamic aperture size of the diaphragm in the spatial filter according to the wavefront information; determines whether the dynamic aperture size meets the preset standard, and if not, controls the automatic adjustment device 4 to adjust the aperture size and / or angle of the diaphragm until the dynamic aperture size meets the preset standard; wherein the preset standard is: the dynamic aperture size should be within a preset minimum aperture size and maximum aperture size range.

[0045] The specific method of realizing automatic adjustment of the dynamic aperture size of the light beam includes the following steps: Step 501: Wavefront feature extraction: Input the slope data obtained by the wavefront detection unit 31, and use the least squares method to obtain the Zernike coefficient vector from the slope data ,in is the low-order aberration, is the higher-order aberration; Step 502: High-order mode energy evaluation: for high-order aberrations , the higher-order mode energy ,in is the weight factor, , is the radial order of the kth Zernike term; Step 503: Dynamic adjustment of aperture size according to high-order mode energy The dynamic aperture diameter can be obtained ,in, , and are the minimum and maximum sizes of the aperture, respectively. is the initial pore diameter, is the proportionality coefficient, , is the basic proportionality factor, is the reference laser power, is the laser power; is the energy response function, , is the saturation threshold to avoid the aperture being too small when the high-order energy is extremely high.

[0046] like Figure 8 As shown, the vacuum device 6 includes a vacuum chamber 61, a vacuum pump 62 and a vacuum detector 63. The vacuum chamber is used to accommodate the laser source 1, the spatial filter 2, the wavefront sensor 3, the automatic adjustment device 4 and the data processing unit 5. The vacuum pump 62 is used for vacuuming, and the vacuum detector 63 is used for detecting the vacuum degree. The vacuum pump 62 has a vacuuming rate of 100 L / s, and the detection accuracy of the vacuum detector 63 is 10^-6 Pa.

[0047] like Fig. 9 As shown, the workflow of the vacuum pulsed laser processing system with enhanced beam quality includes the following steps: a. The pulsed laser generated by the laser source 1 is collimated by the collimating lens group 12 and then transmitted to the spatial filter 2; b. The aperture 23 performs spatial filtering on the light beam to remove stray light and low-quality light beams in the light beam; c. The filtered light beam is transmitted to the wavefront sensor 3, the wavefront detection unit 31 detects the wavefront information of the light beam in real time, and transmits the detection data to the data processing unit 5 via the signal transmission unit 32; d. The central processor 51 of the data processing unit 5 determines the wavefront information according to the preset algorithm and logic, and when it is detected that the wavefront information does not meet the preset standard, it sends an instruction to the automatic adjustment device 4 through the signal transceiver 53; e aperture size adjustment motor 41 and angle adjustment motor 42 according to the command to adjust the aperture size and / or angle of the diaphragm 23; f aperture size sensor 43 real-time monitoring of the aperture size of the diaphragm 23, the angle sensor 44 real-time monitoring of the angle of the diaphragm 23, and the data is fed back to the data processing unit 5; g. The central processor 51 sends instructions to the automatic adjustment device 4 through the signal transceiver 53 according to the feedback data to achieve automatic adjustment of the aperture 23; h. When the wavefront information meets the preset standard, the central processing unit 51 issues an instruction to stop the adjustment of the automatic adjustment device 4 to complete the optimization of the beam quality.

[0048] In a specific embodiment, it is assumed that a pulsed laser with high stability and high beam quality is required in a high-precision optical experiment. The experimental environment is a vacuum environment, and the beam quality is required to be in the best state. First, the laser source 1, the spatial filter 2, the wavefront sensor 3, the automatic adjustment device 4 and the data processing unit 5 are installed in the vacuum device 6, and the vacuum chamber 61 is evacuated to the required vacuum degree by the vacuum pump 62. Then the pulse laser generator 11 is started to generate a pulsed laser, and the laser is collimated by the collimating lens group 12 and transmitted to the spatial filter 2. The aperture 23 performs spatial filtering on the light beam to remove stray light and low-quality light beams. The filtered light beam is transmitted to the wavefront sensor 3, and the wavefront detection unit 31 detects the wavefront information of the light beam in real time, and transmits the detection data to the data processing unit 5 through the signal transmission unit 32. The central processing unit 51 judges the wavefront information according to the preset algorithm and logic. When it is detected that the wavefront information does not meet the preset standard, it sends instructions to the automatic adjustment device 4 through the signal transceiver 53. The aperture size adjustment motor 41 and the angle adjustment motor 42 adjust the aperture size and angle of the aperture 23 according to the instructions. The aperture size sensor 43 and the angle sensor 44 monitor the aperture size and angle of the aperture 23 in real time, and feed the data back to the data processing unit 5. The central processor 51 sends instructions to the automatic adjustment device 4 through the signal transceiver 53 according to the feedback data to realize automatic adjustment of the aperture 23. When the wavefront information meets the preset standard, the central processor 51 issues an instruction to stop the adjustment of the automatic adjustment device 4 to complete the optimization of the beam quality.

[0049] In the present invention, the automatic adjustment device can automatically adjust the aperture size and / or angle of the diaphragm when the wavefront information does not meet the preset standard, so that the beam quality is always in the best state, which significantly improves the stability and reliability of the beam quality. The high-precision wavefront detection unit and data processing unit can monitor and process the wavefront information in real time, ensuring high-precision beam quality control in a vacuum environment, and improving the intelligence level of the system. The compact integrated design makes the entire system have a high degree of integration and compactness in a vacuum environment, which is convenient for deployment and maintenance in a compact vacuum environment, and improves the adaptability and flexibility of the system.

[0050] Although the present invention is described herein in conjunction with various embodiments, in the process of implementing the claimed invention, those skilled in the art may understand and implement other variations of the disclosed embodiments by viewing the drawings, the disclosure, and the drawings, etc. In the specification, the word "comprising" does not exclude other components or steps, and "one" or "an" does not exclude multiple situations. A single processor or other unit can implement several functions listed in the specification. Certain measures are recorded in different embodiments, but this does not mean that these measures cannot be combined to produce good results.

[0051] Although the present invention has been described in conjunction with specific features and embodiments thereof, it is apparent that various modifications and combinations may be made thereto without departing from the spirit and scope of the present invention. Accordingly, this specification and the accompanying drawings are merely exemplary illustrations of the present invention and are deemed to cover any and all modifications, variations, combinations or equivalents within the scope of the present invention. Obviously, those skilled in the art may make various modifications and variations to the present invention without departing from the spirit and scope of the present invention. Thus, the present invention is intended to include such modifications and variations if they fall within the scope of the present invention and its equivalents.

Claims

1. A vacuum pulse laser processing method for enhancing beam quality, characterized in that: The following steps are involved: In a vacuum environment, a pulsed laser beam is spatially filtered using a spatial filter; A wavefront detection unit of a wavefront sensor is used to detect the wavefront information of the light beam after spatial filtering in real time; Obtaining the dynamic aperture size of the aperture in the spatial filter according to the wavefront information; Determine whether the dynamic aperture size meets the preset standard. If not, adjust the aperture size and / or angle of the diaphragm until the dynamic aperture size meets the preset standard. The preset standard is that the dynamic aperture size should be within a preset range between a minimum aperture size and a maximum aperture size.

2. The vacuum pulse laser processing method for enhancing beam quality according to claim 1, characterized in that: The wavefront information includes slope data obtained by a wavefront detection unit detecting the spatially filtered light beam in real time.

3. The vacuum pulse laser processing method for enhancing beam quality according to claim 1, characterized in that: The detection accuracy of the wavefront detection unit is less than or equal to λ / 20, where λ is the wavelength of the pulse laser.

4. The vacuum pulse laser processing method for enhancing beam quality according to claim 1, characterized in that: The wavefront information includes slope data obtained by a wavefront detection unit detecting the spatially filtered light beam in real time; The method of obtaining the dynamic aperture size of the aperture in the spatial filter according to the wavefront information comprises the following steps: The least squares method was used to obtain the Zernike coefficient vector from the slope data; Extracting high-order phase differences from the Zernike coefficient vector; Obtaining high-order mode energy according to the high-order phase difference; The dynamic aperture size of the aperture in the spatial filter is obtained based on the high-order mode energy.

5. The vacuum pulse laser processing method for enhancing beam quality according to claim 4, characterized in that: The high-order mode energy is obtained according to the high-order phase difference, which is obtained by multiplying the square of each high-order phase difference by the corresponding weight factor and then accumulating and summing them.

6. The vacuum pulse laser processing method for enhancing beam quality according to claim 4, characterized in that: The step of obtaining the dynamic aperture size of the aperture in the spatial filter based on the high-order mode energy specifically includes: Get the base scale factor , reference laser power and the laser power at the current time t , and obtain the proportionality coefficient for: ； Get the energy of higher order modes With saturation threshold , and the energy response function is obtained for: ； Get the initial aperture size , and get the dynamic aperture size for: ； in, , is the minimum aperture size, The maximum aperture size is obtained by multiplying the square of each high-order phase difference by the corresponding weight factor and then summing them up to obtain the high-order mode energy. .

7. The vacuum pulse laser processing method for enhancing beam quality according to claim 1, characterized in that: The aperture in the spatial filtering is placed on an adjustment seat, and the aperture size of the aperture is adjusted by an aperture size adjustment motor installed on the adjustment seat, and the angle of the aperture is adjusted by an angle adjustment motor installed on the adjustment seat.

8. A vacuum pulse laser processing system with enhanced beam quality, characterized in that: The system comprises: a vacuum device (6), and a laser source (1), a spatial filter (2), a wavefront sensor (3), an automatic adjustment device (4), and a data processing unit (5) installed inside the vacuum device (6); the laser source (1) and the spatial filter (2) are connected via a collimating lens group (12), the wavefront sensor (3) and the data processing unit (5) are electrically connected, and the automatic adjustment device (4) and the data processing unit (5) are electrically connected and installed on the spatial filter (2); The spatial filter (2) comprises an input collimator (21), an output collimator (22), an aperture (23) and an adjustment seat (24); the aperture (23) is installed between the input collimator (21) and the output collimator (22); the adjustment seat (24) is installed on both sides of the aperture (23) and is used to adjust the aperture size and angle of the aperture (23); the aperture (23) performs spatial filtering on the pulsed laser beam emitted by the laser source (1); The wavefront sensor (3) comprises a wavefront detection unit (31) and a signal transmission unit (32), wherein the wavefront detection unit (31) is used to detect wavefront information of the laser beam, and the signal transmission unit (32) is used to transmit the detected wavefront information to the data processing unit (5); The data processing unit (5) obtains the dynamic aperture size of the diaphragm in the spatial filter according to the wavefront information; determines whether the dynamic aperture size meets a preset standard, and if not, controls the automatic adjustment device (4) to adjust the aperture size and / or angle of the diaphragm until the dynamic aperture size meets the preset standard; wherein the preset standard is that the dynamic aperture size should be within a preset minimum aperture size and maximum aperture size interval.

9. The vacuum pulse laser processing system with enhanced beam quality according to claim 8, characterized in that: The automatic adjustment device (4) comprises an aperture size adjustment motor (41), an angle adjustment motor (42), an aperture size sensor (43) and an angle sensor (44); the aperture size adjustment motor (41) and the angle adjustment motor (42) are respectively mounted on an adjustment seat (24); the aperture size of the diaphragm is adjusted by the aperture size adjustment motor mounted on the adjustment seat, and the angle of the diaphragm is adjusted by the angle adjustment motor mounted on the adjustment seat; the aperture size sensor (43) and the angle sensor (44) are respectively mounted on both sides of the diaphragm (23) for real-time monitoring of the aperture size and angle of the diaphragm (23).

10. The vacuum pulse laser processing system with enhanced beam quality according to claim 8, characterized in that: The wavefront information includes slope data obtained by a wavefront detection unit detecting the spatially filtered light beam in real time; The data processing unit (5) obtains the dynamic aperture size of the aperture in the spatial filter according to the wavefront information, including: The least squares method was used to obtain the Zernike coefficient vector from the slope data; Extracting high-order phase differences from the Zernike coefficient vector; Obtaining high-order mode energy according to the high-order phase difference; The dynamic aperture size of the aperture in the spatial filter is obtained based on the high-order mode energy.

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