Automatic vacuumizing control method of powder spreading device for electron beam melting based on PLC (Programmable Logic Controller)

Abstract

The invention discloses an automatic vacuumizing control method for a powder spreading device for electron beam melting based on a PLC (Programmable Logic Controller) main controller, which belongs to the technical field of electron beam 3D (Three-Dimensional) printing equipment and comprises the following steps: S1, after receiving an instruction, the working PLC main controller outputs an instruction for controlling a mechanical pump to start and transmits the instruction to a contactor; s2, the working contactor opens a mechanical pump power supply, and then the mechanical pump is started; s3, after the mechanical pump is started, the working PLC main controller issues an instruction of opening the baffle valve I to control the power supply of the baffle valve I to be switched on, so that the baffle valve I is opened; according to the control method, the mechanical pump, the first baffle valve, the vacuum gauge, the second baffle valve and the molecular pump can be controlled to work through the PLC main controller, the control method is easy to operate, operation of all vacuum components can be automatically controlled only through the PLC main controller, operation is convenient and fast, and the powder spreading device for electron beam melting can automatically conduct vacuumizing operation.

Description

Technical Field

[0001] The present invention belongs to the technical field of electron beam 3D printing equipment, and in particular relates to an automatic vacuum control method for an electron beam melting powder spreading device based on a PLC main controller. Background Art

[0002] When the electron beam 3D printing equipment is working, the molded parts need to be placed in a vacuum environment. The vacuum pumping of the equipment's vacuum chamber is completed by the coordinated operation of multiple equipment components, and a certain sequential logic is required to control the operation of each vacuum pumping component. Therefore, an automatic vacuum pumping control method for an electron beam melting powder laying device based on a PLC main controller is needed to solve the above problems. Summary of the invention

[0003] The object of the present invention is to provide an automatic vacuum control method for a powder spreading device of electron beam melting based on a PLC main controller, so as to solve the problems raised in the above-mentioned background technology.

[0004] To achieve the above object, the present invention provides the following technical solution: an automatic vacuum control method for a powder spreading device for electron beam melting based on a PLC main controller, comprising the following steps:

[0005] S1, after receiving the instruction, the working PLC main controller outputs the instruction to control the start of the mechanical pump and transmits it to the contactor;

[0006] S2, the working contactor turns on the power supply of the mechanical pump, thereby turning on the mechanical pump;

[0007] S3. When the mechanical pump is turned on, the working PLC main controller sends an instruction to open the flapper valve 1, controls the power supply of the flapper valve 1 to be turned on, and then opens the flapper valve 1;

[0008] S4, vacuum gauge detects the vacuum degree of the vacuum chamber;

[0009] S5. When the vacuum degree of the vacuum chamber reaches the starting pressure of the molecular pump, the working PLC main controller issues an instruction to open the second flapper valve, controls the power supply of the second flapper valve to be turned on, and then opens the second flapper valve;

[0010] S6, the working PLC main controller will automatically send the output control molecular pump instruction to the contactor;

[0011] S7, the working contactor turns on the power supply of the molecular pump, thereby starting the molecular pump;

[0012] S8. When the vacuum degree of the vacuum chamber reaches the working vacuum, the vacuuming process is completed.

[0013] As a preferred solution, the mechanical pump is connected to baffle valve 1, and the baffle valve 1 is connected to the vacuum chamber.

[0014] As a preferred solution, the vacuum chamber is connected to a vacuum gauge.

[0015] By setting a vacuum gauge, the vacuum gauge is used to detect the vacuum degree of the vacuum chamber.

[0016] As a preferred solution, the vacuum chamber is connected to the second baffle valve, and the second baffle valve is connected to the molecular pump.

[0017] As a preferred solution, pin 1 of the PLC main controller is connected to the A1 end of the contactor K1, and two pins 2 of the PLC main controller are respectively connected to the A1 end of the contactor K2 and the x1 end of the baffle valve Y8.

[0018] By setting contactor K1 and contactor K2, contactor K1 and contactor K2 are used to execute the instructions issued by the PLC main controller to start each pump.

[0019] As a preferred solution, the A2 ends of K1 and K2 and the x2 end of the baffle valve Y8 are connected to end 1 of F3, end 2 of F3 is connected to the neutral line, pin N of the PLC main controller is connected to end 1 of F3, pin L of the PLC main controller is connected to end 1 of F3, and end 2 of F3 is connected to L1 and end 1 of F1.

[0020] By setting K1 and K2, since K1 and K2 are set as air switches, the air switches protect the circuit.

[0021] As a preferred solution, the L1 phase is connected to end 1 of F1, ends 3 and 5 of F1 are connected to L2 phase and L3 respectively, ends 2, 4 and 6 of F1 are connected to ends 1, 3 and 5 of K1 respectively, and ends 2, 4 and 6 of K1 are connected to U1 phase, V1 phase and W1 of the mechanical pump respectively.

[0022] As a preferred solution, the L1 phase, L2 phase and L3 phase are respectively connected to the 1, 3 and 5 ends of F2, the 2, 4 and 6 ends of F2 are respectively connected to the 1, 3 and 5 ends of K2, and the 2, 4 and 6 ends of K2 are respectively connected to the U1 phase, V1 phase and W1 of the mechanical pump.

[0023] Compared with the prior art, the present invention has the following beneficial effects:

[0024] The present invention, by setting a PLC main controller, a baffle valve one, a vacuum gauge, a baffle valve two and a molecular pump, can control the operation of the mechanical pump, the baffle valve one, the vacuum gauge, the baffle valve two and the molecular pump through the PLC main controller. The control method is simple to operate, and the operation of each vacuum component can be automatically controlled through the PLC main controller. The operation is convenient, so that the powder spreading device for electron beam melting can automatically perform a vacuum operation. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 It is a vacuum system diagram of the present invention;

[0026] Figure 2 It is a circuit control diagram of the present invention. DETAILED DESCRIPTION

[0027] The present invention will be further described below in conjunction with the embodiments.

[0028] The following examples are used to illustrate the present invention, but they cannot be used to limit the scope of protection of the present invention. The conditions in the examples can be further adjusted according to specific conditions. Simple improvements to the method of the present invention under the premise of the concept of the present invention belong to the scope of protection claimed in the present invention.

[0029] See also Figure 1-2 The present invention provides an automatic vacuum control method for a powder spreading device of electron beam melting based on a PLC main controller, comprising the following steps:

[0030] S1, after receiving the instruction, the working PLC main controller outputs the instruction to control the start of the mechanical pump and transmits it to the contactor;

[0031] S2, the working contactor turns on the power supply of the mechanical pump, thereby turning on the mechanical pump;

[0032] S3. When the mechanical pump is turned on, the working PLC main controller sends an instruction to open the flapper valve 1, controls the power supply of the flapper valve 1 to be turned on, and then opens the flapper valve 1;

[0033] S4, vacuum gauge detects the vacuum degree of the vacuum chamber;

[0034] S5. When the vacuum degree of the vacuum chamber reaches the starting pressure of the molecular pump, the working PLC main controller issues an instruction to open the second flapper valve, controls the power supply of the second flapper valve to be turned on, and then opens the second flapper valve;

[0035] S6, the working PLC main controller will automatically send the output control molecular pump instruction to the contactor;

[0036] S7, the working contactor turns on the power supply of the molecular pump, thereby starting the molecular pump;

[0037] S8. When the vacuum degree of the vacuum chamber reaches the working vacuum, the vacuuming process is completed.

[0038] The mechanical pump is connected to the baffle valve 1, the baffle valve 1 is connected to the vacuum chamber, the vacuum chamber is connected to the vacuum gauge, and the vacuum gauge is used to detect the vacuum degree of the vacuum chamber by setting the vacuum gauge;

[0039] The vacuum chamber is connected to the second baffle valve, the second baffle valve is connected to the molecular pump, the pin 1 of the PLC main controller is connected to the A1 end of the contactor K1, and the contactor K1 and the contactor K2 are arranged to execute the instructions issued by the PLC main controller to start each pump;

[0040] The two pins 2 of the PLC main controller are connected to the A1 end of the contactor K2 and the x1 end of the baffle valve Y8 respectively, the A2 ends of K1 and K2 and the x2 end of the baffle valve Y8 are all connected to the 1 end of F3, the 2 ends of F3 are connected to the neutral line, the pin N of the PLC main controller is connected to the 1 end of F3, the pin L of the PLC main controller is connected to the 1 end of F3, the 2 ends of F3 are connected to the L1 phase and the 1 end of F1, the L1 phase is connected to the 1 end of F1, and the 3 ends and 5 ends of F1 are connected to the L2 phase and L3 respectively. The 2nd, 4th and 6th ends of F1 are connected to the 1st, 3rd and 5th ends of K1 respectively, the 2nd, 4th and 6th ends of K1 are connected to the U1 phase, V1 phase and W1 phase of the mechanical pump respectively, the L1 phase, L2 phase and L3 phase are connected to the 1st, 3rd and 5th ends of F2 respectively, the 2nd, 4th and 6th ends of F2 are connected to the 1st, 3rd and 5th ends of K2 respectively, the 2nd, 4th and 6th ends of K2 are connected to the U1 phase, V1 phase and W1 phase of the mechanical pump respectively, by setting K1 and K2, because K1 and K2 are set as air switches, the air switches play a protective role for the circuit.

[0041] The working principle and use process of the present invention are as follows: when the external upper control system sends an automatic vacuum pumping instruction to the PLC main controller, the working PLC main controller outputs an instruction to control the start of the mechanical pump after receiving the instruction and transmits it to the contactor, and then the working contactor turns on the power of the mechanical pump, thereby starting the mechanical pump; when the mechanical pump is turned on, the working PLC main controller sends an instruction to open the baffle valve one, controls the power of the baffle valve one to be turned on, and then opens the baffle valve one; the vacuum gauge detects the vacuum degree of the vacuum chamber; when the vacuum degree of the vacuum chamber reaches the starting pressure of the molecular pump, the working PLC main controller sends an instruction to open the baffle valve two, controls the power of the baffle valve two to be turned on, and then opens the baffle valve two; the working PLC main controller automatically sends an output instruction to control the molecular pump and transmits it to the contactor, and then the working contactor turns on the power of the molecular pump, thereby starting the molecular pump; at this time, the vacuum pumping process is completed by waiting for the vacuum degree to reach the working vacuum.

[0042] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. An automatic vacuum control method for a powder spreading device for electron beam melting based on a PLC main controller, characterized in that: The following steps are involved: S1, after receiving the instruction, the working PLC main controller outputs the instruction to control the start of the mechanical pump and transmits it to the contactor; S2, the working contactor turns on the power supply of the mechanical pump, thereby turning on the mechanical pump; S3. When the mechanical pump is turned on, the working PLC main controller sends an instruction to open the flapper valve 1, controls the power supply of the flapper valve 1 to be turned on, and then opens the flapper valve 1; S4, vacuum gauge detects the vacuum degree of the vacuum chamber; S5. When the vacuum degree of the vacuum chamber reaches the starting pressure of the molecular pump, the working PLC main controller issues an instruction to open the second flapper valve, controls the power supply of the second flapper valve to be turned on, and then opens the second flapper valve; S6, the working PLC main controller will automatically send the output control molecular pump instruction to the contactor; S7, the working contactor turns on the power supply of the molecular pump, thereby starting the molecular pump; S8. When the vacuum degree of the vacuum chamber reaches the working vacuum, the vacuuming process is completed.

2. According to the method of automatic vacuum control of the powder spreading device of electron beam melting based on the PLC main controller of claim 1, it is characterized by: The mechanical pump is connected to the baffle valve 1, and the baffle valve 1 is connected to the vacuum chamber.

3. According to the method of automatic vacuum control of the powder spreading device of electron beam melting based on the PLC main controller of claim 1, it is characterized by: The vacuum chamber is connected to a vacuum gauge.

4. The automatic vacuum control method for a powder spreading device for electron beam melting based on a PLC main controller according to claim 1 is characterized in that: The vacuum chamber is connected to the second baffle valve, and the second baffle valve is connected to the molecular pump.

5. The automatic vacuum control method for a powder spreading device for electron beam melting based on a PLC main controller according to claim 1 is characterized in that: Pin 1 of the PLC main controller is connected to the A1 end of the contactor K1, and two pins 2 of the PLC main controller are connected to the A1 end of the contactor K2 and the x1 end of the baffle valve Y8 respectively.

6. The automatic vacuum control method for the powder spreading device of electron beam melting based on the PLC main controller according to claim 1 is characterized in that: The A2 ends of K1 and K2 and the x2 end of the baffle valve Y8 are connected to end 1 of F3, end 2 of F3 is connected to the neutral line, pin N of the PLC main controller is connected to end 1 of F3, pin L of the PLC main controller is connected to end 1 of F3, and end 2 of F3 is connected to L1 and end 1 of F1.

7. The method for automatically vacuuming a powder spreading device for electron beam melting based on a PLC main controller according to claim 1 is characterized in that: The L1 phase is connected to the 1 end of F1, the 3 ends and 5 ends of F1 are connected to the L2 phase and L3 respectively, the 2, 4 and 6 ends of F1 are connected to the 1, 3 and 5 ends of K1 respectively, and the 2, 4 and 6 ends of K1 are connected to the U1 phase, V1 phase and W1 of the mechanical pump respectively.

8. The automatic vacuum control method for a powder spreading device for electron beam melting based on a PLC main controller according to claim 1 is characterized in that: The L1 phase, L2 phase and L3 phase are respectively connected to the 1, 3 and 5 ends of F2, the 2, 4 and 6 ends of F2 are respectively connected to the 1, 3 and 5 ends of K2, and the 2, 4 and 6 ends of K2 are respectively connected to the U1 phase, V1 phase and W1 of the mechanical pump.

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