Automated Simulation Method, Device and Medium Applied to Semiconductor Simulation Software

Abstract

The automated simulation method, device and medium provided by this application for semiconductor simulation software. When it detects that an experimental user triggers a simulation request, the platform can call the EBL BEAMER simulation robot to interact with the experimental user, and obtain the process parameters required for this simulation during the interaction process. Then, after the EBL BEAMER simulation robot obtains and executes the corresponding simulation process according to the process parameters, it outputs the simulation results. This process uses a robot to replace the execution of complex and hard-to-remember operation steps, saving the energy of scientific researchers, and can automatically and continuously execute multiple repetitive processes, automatically modify parameter variables, thereby eliminating the waiting time of scientific researchers for simulation calculations, saving machine time and scientific research costs. In addition, the automated simulation method of this application can also be combined with virtual simulation teaching of semiconductor equipment to realize full-process digital teaching of software and hardware, revolutionizing the traditional teaching mode.

Description

Technical Field

[0001] This application relates to the technical field of semiconductor electron beam lithography simulation, and particularly to an automated simulation method, device, and medium applied to semiconductor simulation software. Background Art

[0002] Currently, there are many software involved in the electron beam lithography process for manufacturing micro-nano devices. Some are software for operating equipment provided by equipment manufacturers, and some are simulation software, such as BEAMER, FDTD, Trace pro, MATLAB, etc. Among them, BEAMER software is a professional software for format conversion and simulation correction dedicated to electron beam exposure equipment. It is also accompanied by TRACER and LAB software. TRACER is used to simulate the electron motion trajectory and calculate the electron loss energy density distribution. The exported LPSF file is used to simulate the distribution of the electron energy absorbed by the photoresist at different thicknesses in the BEAMER software, while LAB can simulate the morphology (2D / 3D) of the photoresist structure after development. In addition, the BEAMER software also has a unique proximity effect correction function, which can make the dose reasonably distributed and make the pattern morphology after exposure more perfect.

[0003] However, the operation of this software is very complex and has a high operation threshold. Users need to have certain knowledge in the fields of optics, quantum mechanics, and statistics, have experience in using electron beam lithography machines and drawing software, and have a deep understanding and practice of all functions of the software before they can be proficient and flexible in using it. Usually, the learning cycle is long, and the basic training generally takes about a week to understand the basic functions of the software. Actual use usually requires long-term experience accumulation to be proficient in using some functions. If you want to be proficient in using the various functions of this software, you need to grope and combine experimental situations to use it freely, which requires a lot of energy from scientific research personnel; and the simulation calculation time is relatively long, and scientific research personnel need to wait for a process to complete before they can enter the next process; in addition, for such complex professional software, there are many process parameter settings and simulation method selections, and relevant parameters need to be adjusted in combination with actual experimental results. If no empirical values are provided and appropriate exposure doses and pattern correction parameters are groped, it will take a long time and multiple failures, which means that a large amount of electron beam lithography equipment machine time needs to be consumed to verify and grope the reliability of the simulation results. However, electron beam lithography equipment is a high-precision semiconductor equipment, and its machine time fee is extremely expensive, thus greatly increasing the scientific research cost. Summary of the Invention

[0004] The purpose of this application aims to at least solve one of the above technical defects, especially the technical defect that when conducting semiconductor simulation experiments in the prior art, manual simulation operations are carried out, which not only consume energy but also increase the scientific research cost.

[0005] The present application provides an automated simulation method applied to semiconductor simulation software, and the method includes:

[0006] When it is detected that an experimental user triggers a simulation request, an EBL BEAMER simulation robot is called to interact with the experimental user, and process parameters required for the current simulation are obtained during the interaction;

[0007] After the EBL BEAMER simulation robot obtains and executes a corresponding simulation process according to the process parameters, a simulation result is output.

[0008] Optionally, the calling of the EBL BEAMER simulation robot to interact with the experimental user and obtaining the process parameters required for the current simulation during the interaction includes:

[0009] Calling the EBL BEAMER simulation robot to display the available simulation processes to the experimental user, and obtaining the process name corresponding to the simulation process selected by the experimental user in the available simulation processes;

[0010] After calling the EBL BEAMER simulation robot to send a parameter setting reminder corresponding to the process name to the experimental user, the process parameters input by the experimental user are received.

[0011] Optionally, the outputting of the simulation result after the EBL BEAMER simulation robot obtains and executes a corresponding simulation process according to the process parameters includes:

[0012] After the EBL BEAMER simulation robot determines the software type and simulation process docked for the current simulation according to the process parameters, the simulation process is executed according to the process parameters and the software type.

[0013] Optionally, when the process parameters are simplified process parameters, the execution of the simulation process by the EBL BEAMER simulation robot according to the process parameters and the software type includes:

[0014] The EBL BEAMER simulation robot docks with the TRACER software, and after simulating the electron motion trajectory and the electron loss energy density distribution in the TRACER software according to the process parameters, an LPSF file is exported;

[0015] The EBL BEAMER simulation robot docks with the BEAMER software, and after importing the LPSF file and performing simulation in the BEAMER software according to the process parameters, a layout format recognizable by a semiconductor machine is exported, and the distribution of the absorption of electron energy by photoresist molecules at different thicknesses is simulated.

[0016] Optionally, when the process parameters are those of the challenge version, the EBL BEAMER simulation robot executes the simulation process according to the process parameters and the software type, including:

[0017] The EBL BEAMER simulation robot docks with the TRACER software, and after simulating the electron motion trajectory and the electron loss energy density distribution in the TRACER software according to the process parameters, exports the LPSF file;

[0018] The EBL BEAMER simulation robot docks with the BEAMER software, and after importing the LPSF file and simulating in the BEAMER software according to the process parameters, exports the layout format recognizable by the semiconductor machine, and simulates the distribution of the absorbed electron energy of the photoresist molecules at different thicknesses;

[0019] The EBL BEAMER simulation robot docks with the LAB software, and simulates the developed photoresist morphology in the LAB software according to the process parameters.

[0020] Optionally, the method further includes:

[0021] During the process of the EBL BEAMER simulation robot executing the simulation process, interact with the experimental user according to the requirements of the simulation process or the user requirements, and continue or cancel the execution of the simulation process according to the interaction result.

[0022] Optionally, when the simulation result is the developed photoresist morphology, the method further includes:

[0023] The EBL BEAMER simulation robot calculates a complete morphology schematic diagram of the photoresist or a complete morphology schematic diagram of the device according to the photoresist morphology, and provides reasonable suggestions for exposure parameter setting and layout correction to the experimental user according to the morphology schematic diagram and the expert experience in the database.

[0024] The present application also provides an automated simulation device applied to semiconductor simulation software, including:

[0025] A simulation process determination module, configured to, when detecting that an experimental user triggers a simulation request, call the EBL BEAMER simulation robot to interact with the experimental user, and obtain the process parameters required for this simulation during the interaction process;

[0026] A simulation process execution module, configured to output a simulation result after the EBL BEAMER simulation robot obtains and executes the corresponding simulation process according to the process parameters.

[0027] The present application also provides a computer-readable storage medium, in which computer-readable instructions are stored. When the computer-readable instructions are executed by one or more processors, the one or more processors are caused to execute the steps of the automated simulation method applied to semiconductor simulation software as described in any one of the above embodiments.

[0028] The present application also provides a computer device, including: one or more processors, and a memory;

[0029] The memory stores computer-readable instructions. When the computer-readable instructions are executed by the one or more processors, the steps of the automated simulation method applied to semiconductor simulation software as described in any one of the above embodiments are executed.

[0030] It can be seen from the above technical solutions that the embodiments of the present application have the following advantages:

[0031] For the automated simulation method, device and medium applied to semiconductor simulation software provided by the present application, when it is detected that an experimental user triggers a simulation request, the platform can call the EBL BEAMER simulation robot to interact with the experimental user, and obtain the process parameters required for this simulation during the interaction process. Then, after the EBL BEAMER simulation robot obtains and executes the corresponding simulation process according to the process parameters, a simulation result is output. This process replaces the complex and difficult-to-remember operation steps with the EBL BEAMER simulation robot, thereby saving the energy of scientific researchers, and can automatically and continuously execute multiple repeated processes and automatically modify parameter variables, thus eliminating the waiting time of scientific researchers for simulation calculation and saving machine time and scientific research costs.

[0032] Specifically, this application applies the automated design of the electron beam lithography simulation robot process to the electron beam lithography process for manufacturing micro-nano devices, upgrading the experiment from the "manual operation + experience-driven" mode to the new paradigm of "automation + intelligence". Its design includes: 1) Using RPA to replace manual operations for complex and difficult-to-remember software basic operations, such as importing files, exporting and viewing results, format conversion, parameter setting, step execution, process flow design, curve drawing, etc.; 2) For operations that require technical experience and flexible design to execute, the open operation permissions can be distributed to advanced users through the setting of the simulation process, such as appropriate beam current selection, inspection of graphic topography dimensions, custom mark design, etc.; 3) Provide basic process parameter data reference and historical data query functions, and have 3D simulation result analysis and professional process suggestion functions. For example, when the 3D structure shows an overexposed state, it will remind the user to reduce the exposure dose, etc.; 4) Adopt the form of AI dialogue, divided into a simple version and a challenge version, and users can choose a suitable robot to replace the operation according to their preferences and needs; 5) It can be combined with virtual simulation teaching of semiconductor equipment to realize full-process digital teaching of software and hardware, and transform the traditional teaching mode. BRIEF DESCRIPTION OF THE DRAWINGS

[0033] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments of the present application. For those of ordinary skill in the art, without creative efforts, other drawings can be obtained based on these drawings.

[0034] Figure 1 It is a schematic flowchart of an automated simulation method applied to a semiconductor simulation software provided by an embodiment of the present application;

[0035] Figure 2 It is a first interactive page display diagram of the EBL BEAMER simulation robot provided by an embodiment of the present application interacting with an experimental user;

[0036] Figure 3 It is a second interactive page display diagram of the EBL BEAMER simulation robot provided by an embodiment of the present application interacting with an experimental user;

[0037] Figure 4 It is one of the page display diagrams when simulating the 3D topography of the exposure of a pattern on a photoresist in the LAB provided by an embodiment of the present application;

[0038] Figure 5 It is another page display diagram when simulating the 3D topography of the exposure of a pattern on a photoresist in the LAB provided by an embodiment of the present application;

[0039] Figure 6 It is the distribution diagram of the energy absorbed by the photoresist displayed in the LAB provided by the embodiment of the present application;

[0040] Figure 7 It is the structural schematic diagram of an automated simulation device applied to semiconductor simulation software provided by the embodiment of the present application;

[0041] Figure 8 It is the internal structural schematic diagram of a computer device provided by the embodiment of the present application. Specific embodiments

[0042] Next, the technical solutions in the embodiments of the present application will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present application.

[0043] In one embodiment, as Figure 1 shown, Figure 1 It is the flowchart of an automated simulation method applied to semiconductor simulation software provided by the embodiment of the present application; The present application provides an automated simulation method applied to semiconductor simulation software, and the method may include:

[0044] S110: When it is detected that an experimental user triggers a simulation request, call the EBL BEAMER simulation robot to interact with the experimental user, and obtain the process parameters required for this simulation during the interaction process.

[0045] In this step, if an experimental user wants to conduct a simulation experiment, they can log in to the corresponding automated simulation platform. A process editor is set in this platform, which is used to design and edit automated processes. Generally, it supports visual process design through component dragging, and also supports programming design through scripting languages such as Python. The specific design can be carried out according to the actual situation and is not limited here. When the developer designs the corresponding simulation process, it can be saved locally or on the server, and when the experimental user triggers a simulation request, the corresponding simulation process is called and executed locally or on the server according to the specific request content.

[0046] Moreover, a control center is also set in this automated simulation platform. The control center generally includes functions such as user management, role control, task scheduling, operation analysis, business analysis, security control, version control, and audit tracking, and supports a centralized deployment architecture, supports containerized deployment, uses national cryptographic algorithms for encryption, supports a multi-tenant architecture and tenant management, supports the ARM architecture, and at the same time supports the management of multiple types of robots.

[0047] In addition, the automated simulation platform further includes a robot runner, which is used to support the automatic execution of processes. Robots can generally be divided into three types, namely, front-end robots (also known as attended robots or user robots), back-end robots (also known as unattended robots or shared robots), and process discovery robots. The EBL BEAMER simulation robot in this application is a front-end robot. The EBL BEAMER simulation robot can interact with experimental users before and during the simulation experiment, and perform subsequent experimental operations according to the interaction results, thereby effectively improving the scientific research quality and equipment utilization rate.

[0048] Specifically, when the experimental user in this application needs to conduct a semiconductor simulation experiment, they can log in to the automated simulation platform. When the automated simulation platform in this application detects that the experimental user triggers a simulation request, it can call the EBL BEAMER simulation robot to interact with the experimental user, and obtain the process parameters required for this simulation during the interaction process. The process parameters here include, but are not limited to, parameter settings in different software, such as GDS file settings, sample settings, parameter settings, etc., which can be specifically set according to the actual application scenario and are not limited here; further, the process parameters of this application can include simple version process parameters and challenge version process parameters. Among them, the simple version process parameters only implement basic functions, such as implementing simple size correction and dose correction, converting the layout format into a gpf format recognizable by EBL, etc., while the challenge version process parameters are more, thereby providing users with more flexible and comprehensive software functions, but users need to have certain experience.

[0049] It can be understood that although the simulation process of the challenge version is an automated operation, compared with the simple version, the number of steps increases and experience judgment is required. If the layout does not need to be strictly corrected, the simple version can be used; if high-precision and high-topography requirements graphics need to be prepared or simulation data results need to be obtained, etc., then the challenge version needs to be used. This process can select the corresponding simulation process through the EBL BEAMER simulation robot, and set the challenge version process parameters according to the robot's prompts to conduct the simulation experiment, thereby improving the user experience while improving the accuracy and reliability of the simulation results.

[0050] S120: After the EBL BEAMER simulation robot obtains and executes the corresponding simulation process according to the process parameters, the simulation results are output.

[0051] In this step, after calling the EBL BEAMER simulation robot to interact with the experimental user through S110 and obtaining the process parameters and input parameter methods required for this simulation during the interaction process, the present application can also obtain and execute the corresponding simulation process according to the process parameters and input parameter methods through the EBL BEAMER simulation robot, and then output the simulation results.

[0052] Specifically, when the EBL BEAMER simulation robot obtains the process parameters required for this simulation, it can determine the corresponding simulation process according to the process parameters, and call and execute the simulation process through the local or the server. During this process, the EBL BEAMER simulation robot can also obtain process parameters according to experimental requirements, and can also adjust the simulation process according to user requirements.

[0053] For example, when the experimental user selects the process parameters of the challenge version, the experimental user is more dependent on and has higher requirements for the simulation results. Therefore, all software functions will be opened to the experimental user. However, users who use the challenge version may not be familiar with the software or have rich EBL-related knowledge. If all are manually intervened, the users will not be able to operate. At this time, prompts and selections can be configured for each function module. The prompt is to explain the functions that this module can achieve, and provide cases or basic parameters as a reference; the selection is to choose autonomous operation or robot-assisted operation. If robot-assisted operation is selected, then except for the necessary steps of human intervention, the rest are completed automatically according to the usage experience entered by the developer, but only the basic results can be viewed. If you want to customize the use or analysis, then you can choose autonomous operation, which can be specifically selected according to the actual situation and is not limited here.

[0054] In addition, since software operation is a key part of semiconductor experiments, similar to semiconductor equipment training, there are problems such as complex and difficult-to-remember operations, easy omission of steps leading to experimental failures, etc., and virtual simulation scenarios can solve these problems. Virtual simulation has the advantages of being able to learn online anytime and anywhere, good user experience, and deepening memory through interaction and Q&A with the robot. For example, after the user enters the EBL room in the virtual space, before using the equipment, it can be prompted to first complete the layout format conversion, click on the computer screen outside the room to enter the RPA operation interface of BEAMER, and the dialog box prompts to enter the experimental parameters and then perform the simulation, and then operate step by step according to the designed automated process.

[0055] In addition to being applied to training scenarios, the automated simulation method of this application can also be applied to the assessment process. The advantage of using a virtual simulation system for training is that all knowledge and experience are pre-injected into the system, so it can be viewed at any time, which is extremely user-friendly for beginners. Through this user-friendly learning mode, beginners can practice repeatedly until they can pass the exam. The advantage of taking an exam in a virtual system is that there will be prompts and historical records for the wrong places, which is convenient for review and consolidation exercises to deepen the impression.

[0056] In the above embodiment, when it is detected that the experimental user triggers a simulation request, the platform can call the EBL BEAMER simulation robot to interact with the experimental user, and obtain the process parameters required for this simulation during the interaction process. Then, after the EBL BEAMER simulation robot obtains and executes the corresponding simulation process according to the process parameters, it outputs the simulation result. This process replaces the complex and difficult-to-remember operation steps with the EBL BEAMER simulation robot, thereby saving the energy of scientific research personnel, and can automatically and continuously execute multiple repeated processes and automatically modify parameter variables, thus eliminating the waiting time of scientific research personnel for simulation calculations and saving machine time and scientific research costs.

[0057] Specifically, this application applies the automated design of the electron beam lithography simulation robot process to the electron beam lithography process for manufacturing micro-nano devices, upgrading the experiment from the "manual operation + experience-driven" to the new paradigm of "automation + intelligence". Its design includes: 1) Using RPA to replace manual operations for complex and difficult-to-remember software basic operations, such as importing files, exporting and viewing results, format conversion, parameter setting, step execution, process flow design, curve drawing, etc.; 2) For operations that require technical experience and flexible design to execute, the open operation permissions can be issued to advanced users through the setting of process parameters, such as appropriate beam current selection, inspection of graphic topography dimensions, custom mark design, etc.; 3) Provide basic process parameter data reference and historical data query functions, and have 3D simulation result analysis and professional process suggestion functions, such as when the 3D structure shows an overexposed state, it will remind the user to reduce the exposure dose, etc.; 4) Adopt the form of AI dialogue, divided into a simple version and a challenge version, and users can choose a suitable robot to replace the operation according to their preferences and needs; 5) It can be combined with semiconductor equipment virtual simulation teaching to achieve full-process digital teaching of software and hardware, transforming the traditional teaching mode.

[0058] In one embodiment, the step of calling the EBL BEAMER simulation robot to interact with the experimental user and obtaining the process parameters required for this simulation in S110 may include:

[0059] S111: Call the EBL BEAMER simulation robot to display the runnable simulation process to the experimental user, and obtain the process name corresponding to the simulation process selected by the experimental user in the runnable simulation process.

[0060] S112: After calling the EBL BEAMER simulation robot to send a parameter setting reminder corresponding to the process name to the experimental user, receive the process parameters input by the experimental user.

[0061] In this embodiment, during the process of calling the EBL BEAMER simulation robot to interact with the experimental user, a runnable simulation process can be displayed to the experimental user. The experimental user can select the process name corresponding to the appropriate simulation process according to their own needs. In this way, after the EBL BEAMER simulation robot receives this process name, it can send a parameter setting reminder corresponding to the process name to the experimental user. At this time, the experimental user can configure and submit the process parameters according to the prompt of the EBL BEAMER simulation robot and their own needs, so that the EBL BEAMER simulation robot can automatically execute the simulation process according to the process parameters.

[0062] In a specific implementation manner, as Figure 2 、 3 shown, Figure 2 is the display diagram of the first interaction page for the EBL BEAMER simulation robot provided by the embodiment of the present application to interact with the experimental user, Figure 3 is the display diagram of the second interaction page for the EBL BEAMER simulation robot provided by the embodiment of the present application to interact with the experimental user; Figure 2 In, the EBL BEAMER simulation robot can display runnable simulation processes to the experimental user, such as the Tracer and Beamer creation processes. When the experimental user selects this process, the robot can pop up a dialog box as Figure 3 shown to remind the experimental user of the process parameters that need to be set. The experimental user can input the corresponding process parameters according to the step-by-step reminder of the robot. Of course, the experimental user can also enter the experimental process to be run and all the process parameters involved in the simulation in advance through the form of the robot interaction dialog box. During this process, the robot will provide explanations to guide the user to fill in the parameters correctly. When the robot receives all the process parameters required for this simulation process input by the experimental user, it can start running the simulation process.

[0063] In one embodiment, after the EBL BEAMER simulation robot obtains and executes the corresponding simulation process according to the process parameters in S120 and outputs the simulation result, it may include:

[0064] S121: After the EBL BEAMER simulation robot determines the software type and simulation process docked for this simulation according to the process parameters, execute the simulation process according to the process parameters and the software type.

[0065] In this embodiment, after the EBL BEAMER simulation robot receives the process parameters input by the experimental user, it can execute the corresponding simulation process.

[0066] Specifically, in this application, the EBL BEAMER simulation robot can determine the software type and simulation process docked for this simulation according to the process name selected by the experimental user when inputting the process parameters. For example, when the process parameters selected by the experimental user are simple version process parameters, the software types docked for this simulation can include TRACER software and BEAMER software, while when the process parameters selected by the experimental user are challenging version process parameters, the software types docked for this simulation can include TRACER software, BEAMER software and LAB software. The specific software types can be set according to the simulation type and are not limited here.

[0067] In addition, since the simulation processes corresponding to different software types are different, and when different process parameters are selected in this application, the corresponding simulation processes are also different. Therefore, when the EBL BEAMER simulation robot receives the process parameters input by the experimental user, it can determine the software type and simulation process to be docked according to the process parameters, and execute the simulation process according to the process parameters and software type input by the experimental user.

[0068] In one embodiment, when the process parameters are simple version process parameters, S121 in which the EBL BEAMER simulation robot executes the simulation process according to the process parameters and the software type may include:

[0069] S1211: The EBL BEAMER simulation robot docks with the TRACER software, and after simulating the electron motion trajectory and electron loss energy density distribution in the TRACER software according to the process parameters, exports the LPSF file.

[0070] S1212: The EBL BEAMER simulation robot docks with the BEAMER software, and after importing the LPSF file and simulating in the BEAMER software according to the process parameters, exports the layout format recognizable by the semiconductor machine, and simulates the distribution of the absorbed electron energy of the photoresist molecules at different thicknesses.

[0071] In this embodiment, when the process parameters are the simplified version of the process parameters, it indicates that the experimental user only needs to perform basic operations. At this time, the EBL BEAMER simulation robot can be docked with the TRACER software, and after simulating the electron motion trajectory and the electron loss energy density distribution in the TRACER software according to the process parameters, the LPSF file can be exported. Then, after importing the LPSF file into the BEAMER software and performing simulation, the layout format recognizable by the semiconductor machine can be exported, and the distribution of the absorbed electron energy of the photoresist molecules at different thicknesses can be simulated.

[0072] In a specific implementation manner, as Figure 3 shown, after the EBL BEAMER simulation robot of the present application is docked with the TRACER software, the EBL BEAMER simulation robot can perform the following steps in the TRACER software according to the pre-input layer parameters:

[0073] (1) Pre-set key parameters such as the substrate, photoresist, and electron beam energy, and guide the user to enter them;

[0074] (2) Automatically create a new simulation and check Save Trajectories to File to save the electron movement trajectory;

[0075] (3) Prompt whether to start. After the user confirms, click Simulate to start the simulation;

[0076] (4) Automatically save the LPSF file under the penultimate thickness layer for subsequent automatic retrieval.

[0077] Next, after the EBL BEAMER simulation robot of the present application is docked with the BEAMER software, the EBL BEAMER simulation robot can perform the following steps in the BEAMER software according to the pre-input file name of Import and the value of bias:

[0078] (1) Pre-set parameters such as the file name of Import (import), the layer of Extract (extract), the size of Bias (reduction), the LPSF file to be retrieved by PEC (dose correction), and the file name of Export (export), and guide the user to enter them;

[0079] (2) Automatically retrieve the file, the standard process flow set by the administrator, and after setting all the parameters, start the simulation and export the layout format recognizable by the semiconductor machine, and simulate the distribution of the absorbed electron energy of the photoresist molecules at different thicknesses.

[0080] In one embodiment, when the process parameters are the process parameters of the challenge version, in S122, the EBL BEAMER simulation robot executes the simulation process according to the process parameters and the software type, which may include:

[0081] S1223: The EBL BEAMER simulation robot docks with the TRACER software, and after simulating the electron motion trajectory and the electron loss energy density distribution in the TRACER software according to the process parameters, exports the LPSF file.

[0082] S1224: The EBL BEAMER simulation robot docks with the BEAMER software, and after importing the LPSF file and simulating in the BEAMER software according to the process parameters, exports the layout format recognizable by the semiconductor machine, and simulates the distribution of the absorbed electron energy of the photoresist molecules at different thicknesses;

[0083] S1225: The EBL BEAMER simulation robot docks with the LAB software, and simulates the photoresist morphology after development in the LAB software according to the process parameters.

[0084] In this embodiment, when the process parameters selected by the experimental user are the process parameters of the challenge version, it indicates that the experimental user wants to prepare patterns with high precision and high morphology requirements or obtain simulation data results. At this time, the present application can add the input step of the process parameters and the corresponding simulation process on the basis of the simulation process corresponding to the simple version of the process parameters. For example, after setting the process parameters of the BEAMER software, the present application can continue to set the process parameters of the LAB software. In this way, after the EBL BEAMER simulation robot simulates the distribution of the absorbed electron energy of the photoresist molecules at different thicknesses, the present application can also dock the EBL BEAMER simulation robot with the LAB software and simulate the photoresist morphology after development in the LAB software according to the process parameters. This process requires the experimental user to enter more parameter information and provides more room for free selection compared to the simple version, and can implement more process correction functions.

[0085] For example, as Figure 4 shown, Figure 4 is a page display diagram of simulating the 3D morphology of the exposure of a pattern on a photoresist in the LAB provided by an embodiment of the present application; Figure 4 In, when simulating the 3D morphology of the exposure of a pattern on a photoresist in the LAB, in order to save time, a small part of the repeating structure is selected for simulation in the area, and the effect can be seen. At this time, manual intervention is required to select the simulation area. Therefore, this step is open to the user in the challenge version.

[0086] For example, as Figure 5As shown Figure 5 Another page display diagram when simulating the 3D topography of a pattern exposed on a photoresist in the LAB provided by the embodiment of the present application; Figure 5 In, when simulating the 3D topography of a pattern exposed on a photoresist in the LAB, the more types of parameters are available for selection, the closer it is to the actual situation. Even for some materials, the parameters can be manually entered into the software's material library and then selected. Take Figure 5 the step of selecting materials in as an example. In the simple version, only a few basic photoresists are provided for selection. For users with rich experience in EBL, who are familiar with the performance of various photoresists and need to use the simulation results in the LAB to guide experiments and conduct detailed experimental explorations, they can use the challenging version with rich materials.

[0087] Furthermore, as Figure 6 shown Figure 6 A distribution diagram of the energy absorbed by the photoresist displayed in the LAB provided by the embodiment of the present application; Figure 6 The distribution diagram shown in can be used to analyze the relationship between energy and the developed topography. Some operations are required in this analysis process, such as view conversion, selecting the intersection position, setting the viewing range, etc. These are easier to understand and apply for those who have certain experience in using simulation software. Therefore, in the process of setting process parameters in the challenging version, this step can be an optional item, and by replacing the conventional method of viewing and analyzing pictures with RPA, simple results can be automatically analyzed and a prompt for the analysis results can be popped up. For users with particularly rich relevant knowledge and experience, if they want to analyze more useful information, they can also independently select the options in each module to try.

[0088] In one embodiment, the method may further include:

[0089] S130: During the process of the EBL BEAMER simulation robot executing the simulation process, interact with the experimental user according to the requirements of the simulation process or the user's requirements, and continue or cancel the execution of the simulation process according to the interaction result.

[0090] In this embodiment, during the process of the EBL BEAMER simulation robot executing the simulation process, it can also interact with the experimental user according to the requirements of the simulation process or the user's requirements, and continue or cancel the execution of the simulation process according to the interaction result.

[0091] For example, during the operation of the experimental process, for some parameters that require manual calculation and judgment, the robot blocks the process execution. At this time, the robot can pop up a process parameter setting dialog box. The user fills in the corresponding parameters according to their own needs, clicks Save and Run or Skip to continue the process. For example: after completing a round of Beamer operations, if the user wants to try other parameters of Bias (size correction), they can update the parameters and run the above process again through the robot. Specifically, assume that in this application, the experimental user selected +0.01um for Bias in the previous simulation, and this simulation can be changed to Bias +0.02um. At this time, only need to re-enter other variables in the dialog box after the process ends or during the process to re-conduct the simulation experiment.

[0092] In addition, the robot client will also prompt the links that require manual operation confirmation through the dialog box. And during the manual operation, the mouse is only allowed to move within the interface area that needs to be operated, and the mouse cannot move to other areas. For example, when the user needs to view the layout information, they can select different views for viewing according to their needs, such as by layer, by dose, etc., and the user can choose independently during this process. And when the entry of a certain parameter may cause bugs, it can also be solved by the intervention of the administrator.

[0093] In one embodiment, when the simulation result is the morphology of the developed photoresist, the method may further include:

[0094] The EBL BEAMER simulation robot calculates a complete morphology schematic diagram of the photoresist or a complete morphology schematic diagram of the device according to the photoresist morphology, and provides reasonable suggestions for exposure parameter setting and layout correction to the experimental user according to the morphology schematic diagram and the expert experience in the database.

[0095] In this embodiment, when the simulation result is the morphology of the developed photoresist, since the simulation area is usually a small part of the pattern, the EBL BEAMER simulation robot in this application can use AI technology and combine the simulated pattern morphology to calculate a complete morphology schematic diagram of the photoresist, so as to provide a more intuitive morphology schematic diagram for the user. This process can also combine the expert experience in the database to provide reasonable suggestions for exposure parameter setting and layout correction.

[0096] In addition, this application can also combine the actual calculation results with the simulation graphics database, use AI technology to form a complete morphology schematic diagram of the device, and this schematic diagram contains the morphology information of the substrate layer and the photoresist layer. Then, the EBL BEAMER simulation robot can provide reasonable suggestions for exposure parameter setting and layout correction according to the morphology schematic diagram and the expert experience in the database.

[0097] Furthermore, this application can also be combined with the process flow information in the user's experimental electronic record book to provide the user with reasonable suggestions for the previous and next processes. For example: ① If the parameters of the user's previous glue coating are recorded in the electronic record book and it is determined that the glue is applied too thickly, then in the exposure step, conventional dose exposure cannot be used, but the dose needs to be increased, or the next step can be to bombard with plasma for a few seconds to solve the above problem; ② If the simulated photoresist morphology is in an under-exposed state, it may cause unevenness at the bottom during the next etching step. At this time, the robot can suggest increasing the exposure dose or extending the development time, etc.

[0098] It can be understood that at the current stage, the amount of data used by users is small, and the empirical suggestions given are limited. Subsequently, this application can inject more model information and process suggestion information on this basis and form a data analysis report. This report can be provided to the tutor to understand the research dynamics of students and review the authenticity of research results. It can also be combined with the intelligent system developed by NFF to combine personnel information and process information, so as to accurately provide reasonable suggestions for users, such as process steps, experimental time planning, and so on.

[0099] As can be seen from the above description, the automated simulation method of this application applied to semiconductor simulation software has made significant progress in many aspects, specifically as follows:

[0100] 1) Reduce the learning cost and accurately operate the simulation: Replace the complex and difficult-to-remember operation steps with RPA to execute manually, saving the energy of scientific research personnel, eliminating the need to spend time and effort learning and practicing, and not having to worry about simulation failures caused by misoperations;

[0101] 2) Improve scientific research efficiency and compress complex operations from hours to minutes: Eliminate the time for waiting for simulation calculations. Multiple sets of experimental parameters can be set using AI, automatically and continuously execute multiple repeated processes, and automatically modify parameter variables without waiting to manually modify the parameters after one process is calculated;

[0102] 3) Intelligent parameter optimization, reducing / replacing manual trial and error: Combine RPA with the AI knowledge base, inject in advance the experience and suggestions of experts, manufacturers, and experienced operators, and continuously update experimental data to provide reliable process suggestions and support for users, greatly shortening the time for exploring process parameters, saving machine time and scientific research costs. AI can optimize multiple objectives simultaneously (such as performance, cost, time) to find the best combination point of multiple objectives;

[0103] 4) Intelligent data analysis and prediction, providing data insights and suggestions: The data can be traced back and analyzed, eliminating the need for researchers to spend energy memorizing. Historical data can be retrieved, and data analysis can be performed from multiple aspects such as parameters entered by users, designed processes, questions asked, and simulation results to obtain valuable information and generate a visual analysis report, which is equivalent to the user's experimental electronic record book. This function can also help users analyze experiments and accelerate the process development, thus providing a more reliable basis and guidance for experiments.

[0104] 5) Flexible human-machine collaboration: Relevant parameter settings are carried out in the form of AI dialogue. This process is simple to operate and user-friendly for beginners. More experience and knowledge can be obtained by asking questions. After users accumulate rich experience, they can also try the challenge version, which opens more practical functions, thereby helping to improve the authenticity and reliability of simulation results.

[0105] 6) Personalized teaching / training: It can be combined with virtual simulation teaching of semiconductor equipment to achieve full-process digital teaching of software and hardware, revolutionizing the traditional teaching mode. Use RPA + AI and software simulation to create a personalized experimental teaching environment, and automatically adjust the difficulty and order of experimental teaching content according to the learning progress and knowledge mastery of each user.

[0106] 7) 7×24-hour execution: RPA can operate the software strictly according to preset steps for 7×24 hours without manual operation, supporting night or distributed simulation tasks, thereby greatly improving simulation efficiency.

[0107] 8) Cross-platform collaboration: Multiple software systems, such as Tracer and LAB, etc., can be serially integrated to achieve data sharing and task collaboration.

[0108] 9) Cross-domain collaboration: RPA+AI can help researchers cross disciplinary boundaries and integrate knowledge and technologies in different fields. For example, in a scientific research project with multi-field cooperation, RPA can timely transmit the latest experimental data, break data silos, and ensure that all parties can analyze and make decisions based on the latest data.

[0109] 10) Multimodal interaction: RPA can combine multiple interaction methods such as AR, voice, and gestures to guide users to complete complex operations.

[0110] 11) Establish a prediction model and optimize experimental design: Extract data (parameters, results, experimental conditions) from historical simulation data to construct a knowledge graph and a prediction model. For example, when a new experiment is launched, AI recommends relevant parameter settings or warns of potential conflicts. The optimal parameter combination of various factors can also be determined through optimization algorithms, providing new perspectives and directions to improve the efficiency and effectiveness of experiments.

[0111] The automated simulation device applied to semiconductor simulation software provided by the embodiments of the present application will be described below. The automated simulation device applied to semiconductor simulation software described below can be correspondingly referred to the automated simulation method applied to semiconductor simulation software described above.

[0112] In one embodiment, as Figure 7 shown, Figure 7 is a schematic structural diagram of an automated simulation device applied to semiconductor simulation software provided by an embodiment of the present application; The present application also provides an automated simulation device applied to semiconductor simulation software, including a simulation process determination module 210 and a simulation process execution module 220, specifically including the following:

[0113] The simulation process determination module 210 is configured to, when detecting that an experimental user triggers a simulation request, call the EBL BEAMER simulation robot to interact with the experimental user, and obtain the process parameters required for this simulation during the interaction process.

[0114] The simulation process execution module 220 is configured to, after obtaining and executing the corresponding simulation process according to the process parameters through the EBL BEAMER simulation robot, output the simulation result.

[0115] In the above embodiment, when detecting that an experimental user triggers a simulation request, the platform can call the EBL BEAMER simulation robot to interact with the experimental user, and obtain the process parameters required for this simulation during the interaction process. Then, after obtaining and executing the corresponding simulation process according to the process parameters through the EBL BEAMER simulation robot, the simulation result is output. This process uses the EBL BEAMER simulation robot to replace the execution of complex and difficult-to-remember operation steps, thereby saving the energy of scientific research personnel, and can automatically and continuously execute multiple repeated processes, automatically modify parameter variables, thus eliminating the waiting time of scientific research personnel for simulation calculation, and saving machine time and scientific research costs.

[0116] Specifically, this application applies the automated design of the electron beam lithography simulation robot process to the electron beam lithography process for manufacturing micro-nano devices, upgrading the experiment from a "manual operation + experience-driven" paradigm to a new "automation + intelligence" paradigm. Its design includes: 1) Using RPA to replace manual operations for complex and difficult-to-remember software basic operations, such as importing files, exporting and viewing results, format conversion, parameter setting, step execution, process flow design, curve drawing, etc.; 2) For operations that require technical experience and flexible design to execute, the open operation permissions can be issued to advanced users through the setting of process parameters, such as appropriate beam current selection, inspection of graphic topography dimensions, custom mark design, etc.; 3) Provide basic process parameter data reference and historical data query functions, with 3D simulation result analysis and professional process advice functions, such as when the 3D structure shows an overexposed state, it will remind the user to reduce the exposure dose, etc.; 4) Adopt the form of AI dialogue, divided into a simple version and a challenge version, and users can choose a suitable robot to replace the operation according to their preferences and needs; 5) It can be combined with virtual simulation teaching of semiconductor equipment to realize full-process digital teaching of software and hardware, transforming the traditional teaching mode.

[0117] In one embodiment, this application also provides a computer-readable storage medium, in which computer-readable instructions are stored. When the computer-readable instructions are executed by one or more processors, the one or more processors are caused to execute the steps of the automated simulation method applied to semiconductor simulation software as described in any one of the above embodiments.

[0118] In one embodiment, this application also provides a computer device, including: one or more processors, and a memory.

[0119] The memory stores computer-readable instructions, and when the computer-readable instructions are executed by the one or more processors, the steps of the automated simulation method applied to semiconductor simulation software as described in any one of the above embodiments are executed.

[0120] Schematically, as Figure 8 shown, Figure 8 is a schematic internal structure diagram of a computer device provided by an embodiment of this application. This computer device 300 can be provided as a server. Referring to Figure 8, the computer device 300 includes a processing component 302, which further includes one or more processors, and memory resources represented by a memory 301 for storing instructions executable by the processing component 302, such as application programs. The application programs stored in the memory 301 may include one or more modules each corresponding to a set of instructions. In addition, the processing component 302 is configured to execute instructions to perform the automated simulation method applied to semiconductor simulation software in any of the above embodiments.

[0121] The computer device 300 may further include a power component 303 configured to perform power management of the computer device 300, a wired or wireless network interface 304 configured to connect the computer device 300 to a network, and an input / output (I / O) interface 305. The computer device 300 may operate based on an operating system stored in the memory 301, such as Windows Server TM, Mac OS XTM, Unix TM, Linux TM, Free BSDTM or the like.

[0122] Those skilled in the art can understand that Figure 8 the structure shown in

[0123] is only a block diagram of some structures related to the solution of this application, and does not constitute a limitation on the computer device to which the solution of this application is applied. A specific computer device may include more or fewer components than those shown in the figure, or combine certain components, or have a different component arrangement.

[0124] Each embodiment in this specification is described in a progressive manner. The key point of each embodiment is to illustrate the differences from other embodiments. The various embodiments can be combined as needed, and the same or similar parts can be referred to each other.

[0125] The foregoing description of the disclosed embodiments enables those skilled in the art to practice or use the present application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the present application. Thus, the present application is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. An automated simulation method applied to semiconductor simulation software, characterized in that: The method comprises: When it is detected that the experimental user triggers a simulation request, the EBL BEAMER simulation robot is called to interact with the experimental user, and the process parameters required for this simulation are obtained during the interaction; After the EBL BEAMER simulation robot acquires and executes the corresponding simulation process according to the process parameters, the simulation result is output; The calling of the EBL BEAMER simulation robot to interact with the experimental user and obtain the process parameters required for this simulation during the interaction process includes: Invoke the EBL BEAMER simulation robot to display the executable simulation process to the experimental user, and obtain the process name corresponding to the simulation process selected by the experimental user from the executable simulation processes; After invoking the EBL BEAMER simulation robot to send a parameter setting reminder corresponding to the process name to the experimental user, receiving the process parameters input by the experimental user; After the EBL BEAMER simulation robot acquires and executes the corresponding simulation process according to the process parameters, the simulation result is output, including: After the EBL BEAMER simulation robot determines the software type and simulation process connected to this simulation according to the process parameters, the simulation process is executed according to the process parameters and the software type.

2. The automated simulation method for semiconductor simulation software according to claim 1, characterized in that: When the process parameters are simplified process parameters, the simulation process is executed by the EBL BEAMER simulation robot according to the process parameters and the software type, including: The EBL BEAMER simulation robot is connected to the TRACER software, and after simulating the electron motion trajectory and the electron loss energy density distribution in the TRACER software according to the process parameters, an LPSF file is exported; The EBL BEAMER simulation robot is connected to the BEAMER software, and the LPSF file is imported into the BEAMER software according to the process parameters and simulated, and then the layout format recognizable by the semiconductor machine is exported, and the distribution of the electron energy absorbed by the photoresist molecules under different thicknesses is simulated.

3. The automated simulation method for semiconductor simulation software according to claim 1, characterized in that: When the process parameters are the process parameters of the challenge version, the simulation process is executed by the EBL BEAMER simulation robot according to the process parameters and the software type, including: The EBL BEAMER simulation robot is connected to the TRACER software, and after simulating the electron motion trajectory and the electron loss energy density distribution in the TRACER software according to the process parameters, an LPSF file is exported; The EBL BEAMER simulation robot is connected to the BEAMER software, and the LPSF file is imported into the BEAMER software according to the process parameters and simulated, and then a layout format recognizable by a semiconductor machine is exported, and the distribution of electron energy absorbed by photoresist molecules under different thicknesses is simulated; The EBL BEAMER simulation robot is connected to the LAB software, and the photoresist morphology after development is simulated in the LAB software according to the process parameters.

4. The automated simulation method applied to semiconductor simulation software according to claim 1, characterized in that: The method further comprises: During the process of the EBL BEAMER simulation robot executing the simulation process, the robot interacts with the experimental user according to the requirements of the simulation process or the user's requirements, and continues or cancels the execution of the simulation process according to the interaction result.

5. The automated simulation method applied to semiconductor simulation software according to any one of claims 1 to 4, characterized in that: When the simulation result is a photoresist morphology after development, the method further includes: The EBL BEAMER simulation robot calculates a complete photoresist morphology diagram or a complete device morphology diagram based on the photoresist morphology, and provides reasonable suggestions for exposure parameter settings and layout corrections to the experimental user based on the morphology diagram and expert experience in the database.

6. An automated simulation device for semiconductor simulation software, characterized in that: include: The simulation process determination module is used to call the EBL BEAMER simulation robot to interact with the experimental user when it is detected that the experimental user triggers a simulation request, and obtain the process parameters required for this simulation during the interaction process; A simulation process execution module, configured to obtain and execute a corresponding simulation process according to the process parameters through the EBL BEAMER simulation robot, and output a simulation result; The simulation process determination module calls the EBL BEAMER simulation robot to interact with the experimental user and obtains the process parameters required for this simulation during the interaction, including: Invoke the EBL BEAMER simulation robot to display the executable simulation process to the experimental user, and obtain the process name corresponding to the simulation process selected by the experimental user from the executable simulation processes; After invoking the EBL BEAMER simulation robot to send a parameter setting reminder corresponding to the process name to the experimental user, receiving the process parameters input by the experimental user; The simulation process execution module includes: After the EBL BEAMER simulation robot determines the software type and simulation process connected to this simulation according to the process parameters, the simulation process is executed according to the process parameters and the software type.

7. A computer-readable storage medium, characterized in that: The computer-readable storage medium stores computer-readable instructions, and when the computer-readable instructions are executed by one or more processors, the one or more processors execute the steps of the automated simulation method applied to semiconductor simulation software as described in any one of claims 1 to 5.

8. A computer device, characterized in that: include: one or more processors, and memory; The memory stores computer-readable instructions, and when the computer-readable instructions are executed by the one or more processors, the steps of the automated simulation method applied to semiconductor simulation software as claimed in any one of claims 1 to 5 are performed.

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