Transport system, precursor cartridge, and semiconductor device

Abstract

The embodiment of the invention provides a conveying system, a precursor box and semiconductor equipment. The delivery system comprises: a vaporization device for vaporizing a precursor; the precursor pipeline comprises a precursor pipe, a first precursor two-way valve, a second precursor two-way valve, a first three-way valve and a second three-way valve, the precursor pipe is connected with the vaporization device, and the first precursor two-way valve, the first three-way valve, the second three-way valve and the second precursor two-way valve are sequentially arranged on the precursor pipe; the first precursor two-way valve is located between the vaporization device and the first three-way valve, and the precursor pipe is used for conveying a precursor; the cleaning pipeline is connected with the first three-way valve, and the first three-way valve is used for controlling on-off of fluid between the precursor pipeline and the cleaning pipeline; the bypass flow pipeline is connected with the second three-way valve, and the second three-way valve is used for controlling on-off of fluid between the precursor pipeline and the bypass flow pipeline.

Description

Technical Field

[0001] The present application relates to the technical field of semiconductor equipment, and in particular to a conveying system, a precursor box and semiconductor equipment. Background Art

[0002] The precursor box is a module used in semiconductor equipment to store and transport liquid or solid precursors. When the precursor is transported from the vaporization device to the outside in gaseous form, it is necessary to design a reasonable flow channel for the gaseous precursor to reduce its residue in the transmission pipeline and avoid particulate matter problems. Generally, the precursor flow pipeline is purged by introducing a carrier gas (or clean gas) to remove the residual precursor in the precursor pipeline. However, frequent purging will have a certain impact on the production efficiency of the equipment. Generally, a two-way valve is used to isolate different gas pipelines at the carrier gas feed and bypass nodes. A gas-trapped distance will be generated between the two-way valve and the pipeline node. During the precursor transportation process, due to the low gas flow rate in the trapped gas section, vortices and precursor residues are easily formed, which increases the frequency of the above-mentioned purging process and reduces production efficiency. Summary of the invention

[0003] The embodiments of the present application provide a conveying system, a precursor box and a semiconductor device that can reduce the air entrapment distance to improve production efficiency.

[0004] In a first aspect, an embodiment of the present application provides a delivery system, comprising:

[0005] a vaporization device for storing precursors;

[0006] A precursor pipeline, comprising a precursor tube, a first precursor two-way valve, a second precursor two-way valve, a first three-way valve and a second three-way valve, wherein the precursor tube is connected to the vaporization device, the first precursor two-way valve, the first three-way valve, the second three-way valve and the second precursor two-way valve are sequentially arranged on the precursor tube, the first precursor two-way valve is located between the vaporization device and the first three-way valve, and the precursor tube is used to transport the precursor;

[0007] A cleaning pipeline, connected to the first three-way valve, the first three-way valve is used to control the on-off of the fluid between the precursor pipeline and the cleaning pipeline;

[0008] The bypass pipeline is connected to the second three-way valve, and the second three-way valve is used to control the on-off of the fluid between the precursor pipeline and the bypass pipeline.

[0009] Since the cleaning pipeline and the precursor pipeline are directly connected through the first three-way valve, the length of the trapped gas section between the cleaning pipeline and the precursor pipeline is greatly shortened, the possibility of vortex generation is reduced, the residual amount of the precursor is reduced, thereby reducing the frequency of the purging process and improving the production efficiency of the semiconductor device.

[0010] Since the bypass pipeline and the precursor pipeline are directly connected through the second three-way valve, the length of the trapped gas section between the bypass pipeline and the precursor pipeline is greatly shortened, the possibility of vortex generation is reduced, the residual amount of the mixed gas is reduced, thereby reducing the frequency of the purging process and improving the production efficiency of the semiconductor device.

[0011] According to the first aspect, in a possible implementation manner, when the first precursor two-way valve and the second precursor two-way valve are opened, the fluid communication between the precursor pipeline and the cleaning pipeline is cut off through the first three-way valve, and the fluid communication between the precursor pipeline and the bypass pipeline is cut off through the second three-way valve.

[0012] According to the first aspect, in a possible implementation manner, the conveying system further includes a backfill pipeline connected to the vaporization device. A third three-way valve and a fourth three-way valve are provided on the backfill pipeline. The third three-way valve is connected to the cleaning pipeline, and the third three-way valve is used to control the on-off of the fluid between the backfill pipeline and the cleaning pipeline; the fourth three-way valve is connected to the bypass pipeline, and the fourth three-way valve is used to control the on-off of the fluid between the bypass pipeline and the backfill pipeline.

[0013] The backfill pipeline is used to supplement the precursor to the vaporization device. The carrier gas can be fed into the backfill pipeline from the cleaning pipeline and then discharged from the bypass pipeline to achieve full-link purging and cleaning.

[0014] Since the cleaning pipeline and the backfill pipeline are directly connected through the fourth three-way valve, the length of the trapped liquid section between the cleaning pipeline and the backfill pipeline is greatly shortened, the possibility of vortex generation is reduced, the residual amount of the precursor is reduced, thereby reducing the frequency of the purging process and improving the production efficiency of the semiconductor device.

[0015] Since the bypass pipeline and the backfill pipeline are directly connected through the third three-way valve, the length of the trapped liquid section between the bypass pipeline and the backfill pipeline is greatly shortened, the possibility of vortex generation is reduced, the residual amount of the mixture is reduced, thereby reducing the frequency of the purging process and improving the production efficiency of the semiconductor device.

[0016] According to the first aspect, in a possible implementation, the backfill pipeline further includes a backfill pipe, a first backfill two-way valve and a second backfill two-way valve, the first backfill two-way valve, the fourth three-way valve, the third three-way valve and the second backfill two-way valve are all arranged on the backfill pipe, and the second backfill two-way valve is located between the vaporization device and the third three-way valve. By opening and closing the first backfill two-way valve and the second backfill two-way valve, the on-off of the fluid in the backfill pipeline is controlled, which is convenient for use.

[0017] According to the first aspect, in a possible implementation, the conveying system also includes a liquid level sensor provided in the vaporization device, and the liquid level sensor is used to sense the liquid level of the precursor in the vaporization device; when the liquid level sensed by the liquid level sensor is lower than a first preset value, the first backfill two-way valve and the second backfill two-way valve are both opened; when the liquid level sensed by the liquid level sensor is higher than a second preset value, the first backfill two-way valve and the second backfill two-way valve are both closed.

[0018] The liquid level in the vaporization device is monitored by a liquid level sensor. When liquid replenishment is required, the first backfill two-way valve and the second backfill two-way valve are controlled to open to replenish the liquid in the vaporization device, thereby improving the automation of the conveying system.

[0019] According to the first aspect, in a possible implementation, the vaporization device includes a precursor inlet and an inlet manual valve, the inlet manual valve is connected to the precursor inlet, and the inlet manual valve is connected to the backfill pipeline.

[0020] According to the first aspect, in a possible implementation, the precursor pipeline also includes a pressure switch provided on the precursor tube, and the pressure switch is located between the second precursor two-way valve and the second three-way valve. When the pressure detected by the pressure switch is greater than a preset pressure value, all two-way valves and three-way valves of the conveying system are closed.

[0021] When the pressure exceeds the preset pressure value, the precursor in the precursor tube is cut off, which is beneficial to improving the safety and reliability of the conveying system, the precursor box and the semiconductor equipment.

[0022] According to the first aspect, in a possible implementation, the precursor pipeline further includes a flow controller disposed on the precursor tube for controlling the precursor flow. The flow controller can also monitor the deviation between the actual flow and the set flow in real time, and trigger an abnormal flow alarm if the monitoring threshold is exceeded.

[0023] According to the first aspect, in a possible implementation, the cleaning pipeline also includes a cleaning pipe, a cleaning two-way valve and a one-way valve, the cleaning two-way valve and the one-way valve are both arranged on the cleaning pipe, and the one-way valve is located between the first three-way valve and the cleaning two-way valve.

[0024] The one-way valve is used to allow the carrier gas to flow from the carrier gas source in the cleaning pipe to the direction of the first three-way valve or the backfill pipeline, preventing the residual gas in the trapped gas pipeline from flowing back to the upstream of the cleaning pipeline.

[0025] According to the first aspect, in a possible implementation, the vaporization device includes a precursor outlet, an outlet hand valve, a precursor inlet and an inlet hand valve, the outlet hand valve is connected to the precursor outlet, the outlet hand valve is connected to the cleaning pipe, the inlet hand valve is connected to the precursor inlet, and the inlet hand valve is connected to the backfill pipeline.

[0026] The outlet manual valve can be manually operated by the user, making it convenient for the user to manually open or close the precursor outlet.

[0027] The inlet manual valve can be manually operated by the user, making it convenient for the user to manually open or close the precursor inlet.

[0028] In a second aspect, an embodiment of the present application provides a precursor box, which includes a shell and a conveying system according to the first aspect, and the conveying system is arranged on the shell.

[0029] The precursor box can be a module, which is convenient for assembling the precursor box on the semiconductor device. The cleaning pipeline and the precursor pipeline are directly connected through the first three-way valve, which is conducive to shortening the pipeline length and miniaturizing the precursor box compared to the method of setting a two-way valve and a pipeline.

[0030] In a third aspect, an embodiment of the present application further provides a semiconductor device, comprising a processing chamber and a precursor box according to the second aspect, wherein the precursor tube is connected to the processing chamber.

[0031] According to the third aspect, in a possible implementation manner, the semiconductor device further includes an extraction component, and the bypass flow line is connected to the extraction component.

[0032] The extraction component is used to provide power for extracting the cleaned mixture or mixed gas, thereby improving the cleaning efficiency of the semiconductor equipment.

[0033] According to the third aspect, in a possible implementation manner, the extraction component is connected to the processing chamber.

[0034] The extraction component is connected to the processing chamber and is used for extracting gas in the processing chamber.

[0035] According to the third aspect, in a possible implementation, the semiconductor device further includes a carrier gas source, the carrier gas source is connected to the cleaning pipeline, and the carrier gas source is connected to the processing chamber via a carrier gas control valve.

[0036] When the carrier gas control valve is closed, the fluid between the carrier gas source and the processing chamber is disconnected. When the delivery system delivers the precursor to the processing chamber, the carrier gas source is in fluid communication with the processing chamber, and the carrier gas source delivers the carrier gas to the processing chamber, so as to increase the rate at which the precursor enters the processing chamber and improve the response efficiency of the precursor box.

[0037] According to the third aspect, in a possible implementation, the semiconductor device further includes a valve seat, the valve seat is connected to the processing chamber, the carrier gas source is connected to the valve seat via the carrier gas control valve, and the second precursor two-way valve is connected to the valve seat.

[0038] The carrier gas source, the precursor box and the processing chamber are connected together through the valve seat, which facilitates the connection between the pipelines of various parts of the semiconductor equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] Figure 1 It is a schematic structural diagram of a semiconductor device provided in one embodiment of the present application.

[0040] Description of reference numerals:

[0041] 11-vaporization device; 13-precursor pipeline; 15-cleaning pipeline; 16-backfill pipeline; 18-bypass pipeline; 19-liquid level sensor;

[0042] 100-semiconductor equipment; 101-precursor box; 103-processing chamber; 105-carrier gas source; 106-liquid replenishing source; 107-valve seat; 108-carrier gas control valve; 109-extraction component; 110-controller; 112-precursor outlet; 114-precursor inlet; 116-outlet manual valve; 118-inlet manual valve; 119-gaseous carrier gas inlet; 120-carrier gas manual valve; 131-precursor Tube; 132-first forerunner two-way valve; 133-first three-way valve; 134-flow controller; 135-second three-way valve; 136-pressure switch; 137-second forerunner two-way valve; 151-cleaning tube; 153-cleaning two-way valve; 155-check valve; 161-backfilling tube; 163-first backfilling two-way valve; 165-third three-way valve; 167-fourth three-way valve; 169-second backfilling two-way valve;

[0043] 1011-shell; 1013-conveying system. DETAILED DESCRIPTION

[0044] See also Figure 1 , Figure 11 is a schematic diagram of the structure of a semiconductor device provided in one embodiment of the present application. The semiconductor device 100 may be a chemical vapor deposition (CVD) device or an atomic layer deposition (ALD) device. Chemical vapor deposition (CVD) and atomic layer deposition (ALD) are technologies for forming materials on a substrate by reacting gaseous chemicals near the surface of the substrate.

[0045] The semiconductor device 100 includes a precursor box 101, a processing chamber 103, a carrier gas source 105, a liquid replenishing source 106, a valve seat 107, a carrier gas control valve 108, an extraction component 109 and a controller 110. The precursor box 101 includes a housing 1011 and a conveying system 1013, and the conveying system 1013 is installed in the housing 1011.

[0046] The delivery system 1013 is connected to the valve seat 107, and the valve seat 107 is connected to the processing chamber 103. The delivery system 1013 is used to provide a precursor to the processing chamber 103. For example, the precursor can be any suitable precursor used in a deposition process or a similar process. Exemplarily, the precursor may include dichlorosilane (DCS), trichlorosilane (TCS), carbon tetrachloride (CCl4) or the like. In the present embodiment, the delivery system 1013 is used to provide a gaseous precursor to the processing chamber 103.

[0047] The carrier gas source 105 is connected to the delivery system 1013, and the carrier gas source 105 is used to provide carrier gas to the delivery system 1013. The carrier gas can be any inert gas, such as nitrogen, argon, helium, xenon, etc. The carrier gas source 105 is connected to the valve seat 107 via a carrier gas control valve 108. The carrier gas control valve 108 is used to control the on-off of the fluid between the carrier gas source 105 and the valve seat 107. "On-off" in this application includes the connection of the fluid and the cutting off of the connection of the fluid. When the carrier gas control valve 108 is opened, the carrier gas source 105 is connected to the fluid of the processing chamber 103. When the carrier gas control valve 108 is closed, the fluid communication between the carrier gas source 105 and the processing chamber 103 is cut off. When the delivery system 1013 delivers the precursor to the processing chamber 103, the carrier gas control valve 108 is opened, the carrier gas source 105 is fluidically connected to the valve seat 107, and the carrier gas source 105 delivers the carrier gas to the processing chamber 103, so as to increase the rate at which the gaseous precursor delivered by the precursor box 101 enters the processing chamber 103, thereby improving the response efficiency of the precursor box 101.

[0048] The replenishing liquid source 106 is connected to the delivery system 1013 to provide the liquid precursor to the delivery system 1013. The extraction component 109 is connected to the delivery system 1013 to extract the cleaned mixture or mixed gas. The extraction component 109 is connected to the processing chamber 103 to extract the gas in the processing chamber 103. The extraction component 109 can be a device such as a pump that can extract fluid.

[0049] The controller 110 can directly (such as Figure 1 1013) is coupled to the processing chamber 103 and / or a support system such as a delivery system 1013, or alternatively, the controller 110 can be coupled to the processing chamber 103 and / or a support system such as a delivery system 1013 via a computer (or controller) connected to the processing chamber 103 and / or the support system. The controller 110 can be one of any form of general-purpose computer processors that can be used in industrial settings for controlling various chambers and sub-processors. The controller 110 includes a central processing unit (CPU), a memory, and support circuits. The memory or storage of the central processing unit (CPU) can be one or more readily available memories, such as random access memory (RAM), read-only memory (ROM), a floppy disk, a hard disk, or any other form of local or remote digital storage. The memory can store programs to be executed by the processing chamber 103 and / or various support systems such as the delivery system 1013. Exemplary programs may include methods for delivering precursors to the processing chamber 103 as described below. The support circuits are coupled to the central processing unit for supporting the processor in a conventional manner. These circuits include caches, power supplies, clock circuits, input / output circuits and subsystems, and the like.

[0050] The delivery system 1013 includes a vaporizer 11, a precursor pipeline 13, a cleaning pipeline 15, a backfill pipeline 16, a bypass pipeline 18 and a liquid level sensor 19. The precursor pipeline 13 is connected to the vaporizer 11, and is used to transport the gaseous precursor in the vaporizer 11 to the processing chamber 103. The cleaning pipeline 15 is connected to the carrier gas source 105, and is used to input the carrier gas to the precursor pipeline 13. The backfill pipeline 16 is used to be connected to the liquid replenishment source 106, and is used to input the liquid precursor to the vaporizer 11. The bypass pipeline 18 is connected to the precursor pipeline 13 and the backfill pipeline 16, and is used to discharge the cleaned mixed gas or mixture. The bypass pipeline 18 is connected to the extraction component 109, and the extraction component 109 can provide power for the discharge of fluids such as mixed gas or mixture to improve the discharge efficiency. The liquid level sensor 19 is disposed in the vaporizer 11 , and is used to sense the liquid level in the vaporizer 11 and provide feedback to the controller 110 .

[0051] The vaporization device 11 is used to vaporize the precursor. The vaporization device 11 includes a precursor outlet 112, a precursor inlet 114, an outlet hand valve 116 and an inlet hand valve 118. The precursor outlet 112 is used to output the gaseous precursor from the vaporization device 11. The precursor inlet 114 is used to input the liquid precursor into the vaporization device 11. The outlet hand valve 116 is connected to the precursor outlet 112 and is used to control the on-off of the fluid in the precursor outlet 112. The outlet hand valve 116 can be manually operated by the user, so that the user can manually open or close the precursor outlet 112. The inlet hand valve 118 can be manually operated by the user, so that the user can manually open or close the precursor inlet 114.

[0052] In the present embodiment, the vaporization device can be a steel cylinder, and the outer surface of the steel cylinder can be coated with a heating element, which can be a heating tube or the like. The heating element is used to evaporate and gasify the liquid precursor in the vaporization device 11. The vaporization amount of the gaseous precursor can be achieved by controlling the temperature of the heating element. In other embodiments, the vaporization device 11 can also be a vaporizer or other container. The vaporizer is a vaporization device applied to low saturated vapor pressure precursors, and can be provided with a carrier gas inlet, a precursor inlet, and a gaseous precursor outlet. The vaporization amount of the gaseous precursor can be controlled by a front-stage liquid mass flowmeter, and the gaseous carrier gas flow rate can be controlled by a front-stage gas mass flowmeter.

[0053] In some embodiments of the present application, a gaseous carrier gas inlet 119 may be further provided on the vaporization device 11, and a carrier gas manual valve 120 is provided on the gaseous carrier gas inlet 119, and the carrier gas manual valve 120 is connected to the carrier gas source 105 through a pipeline. The carrier gas manual valve 120 is used to control the fluid connection between the carrier gas source 105 and the gaseous carrier gas inlet 119. By inputting the carrier gas into the vaporization device 11, the vaporization effect or the foaming effect of the precursor can be improved.

[0054] The precursor pipeline 13 is connected to the outlet hand valve 116, and is used to transport the gaseous precursor output from the precursor outlet 112 to the processing chamber 103. The precursor pipeline 13 includes a precursor tube 131, a first precursor two-way valve 132, a first three-way valve 133, a flow controller 134, a second three-way valve 135, a pressure switch 136 and a second precursor two-way valve 137. The first precursor two-way valve 132, the first three-way valve 133, the flow controller 134, the second three-way valve 135, the pressure switch 136 and the second precursor two-way valve 137 are sequentially arranged on the precursor tube 131. The first precursor two-way valve 132 is located between the outlet hand valve 116 and the first three-way valve 133.

[0055] The first precursor two-way valve 132 and the second precursor two-way valve 137 are used to control the on-off of the fluid in the precursor tube 131. The first precursor two-way valve 132 and the second three-way valve 135 are both pneumatic stop valves.

[0056] The first three-way valve 133 is used to be connected to the cleaning pipeline 15. The first three-way valve 133 is used to control the on-off of the fluid between the precursor pipeline 13 and the cleaning pipeline 15. The first three-way valve 133 is normally open on the precursor tube 131. The connection side between the first three-way valve 133 and the cleaning pipeline 15 can be opened and closed. By controlling the first three-way valve 133, the on-off of the fluid between the precursor pipeline 13 and the cleaning pipeline 15 is achieved. When the connection side between the first three-way valve 133 and the cleaning pipeline 15 is opened, the fluid between the precursor pipeline 13 and the cleaning pipeline 15 circulates, and the carrier gas can be fed into the cleaning pipeline 15 through the cleaning pipeline 15 and the first three-way valve 133.

[0057] The second three-way valve 135 is used to be connected to the bypass line 18. The second three-way valve 135 is used to control the on-off of the fluid between the precursor line 13 and the bypass line 18. The second three-way valve 135 is used to be connected to the bypass line 18. The second three-way valve 135 is used to control the on-off of the fluid between the precursor line 13 and the bypass line 18. The second three-way valve 135 is normally open on the precursor tube 131. The connection side between the second three-way valve 135 and the bypass line 18 can be opened and closed. By controlling the second three-way valve 135, the on-off of the fluid between the precursor line 13 and the bypass line 18 is achieved. When the connection side between the second three-way valve 135 and the bypass line 18 is opened, the precursor line 13 is fluidly connected to the bypass line 18, and the fluid in the precursor line 13 flows out to the bypass line 18 through the second three-way valve 135.

[0058] The carrier gas can be fed into the precursor pipeline 13 through the first three-way valve 133 of the cleaning pipeline 15 to purge the precursor pipeline 13. The cleaned mixed gas flows out from the second three-way valve 135 to the bypass pipeline 18. The mixed gas includes a carrier gas and a gaseous precursor. The mixed gas entering the bypass pipeline 18 can be discharged from the bypass pipeline 18. In other words, the first three-way valve 133 can be regarded as the feed point of the carrier gas in the precursor pipeline 13, and the second three-way valve 135 can be regarded as the discharge point of the cleaned mixed gas in the precursor pipeline 13. The feed and outflow points of the carrier gas are respectively set downstream of the first precursor two-way valve 132 and upstream of the second precursor two-way valve 137, so as to achieve the maximum cleaning of the precursor pipeline 13.

[0059] The carrier gas can be fed into the precursor pipeline 13 through the first three-way valve 133 of the cleaning pipeline 15 , and then enter the processing chamber 103 through the precursor pipeline 13 .

[0060] In conventional technology, two-way valves are generally used to isolate different gas pipelines at the carrier gas feed and bypass nodes. A gas trap section will be generated between the two-way valve and the pipeline node. During the precursor delivery process, due to the low gas flow rate in the gas trap section, eddies and precursor residues are easily formed, and there is a risk of condensation, which increases the frequency of the above-mentioned purge process and reduces production efficiency.

[0061] Since the cleaning pipeline 15 and the precursor pipeline 13 are directly connected via the first three-way valve 133, there is no need to set up an additional pipeline for isolation, which greatly shortens the length of the gas trapping section between the cleaning pipeline 15 and the precursor pipeline 13, reduces the risk of condensation, reduces the possibility of vortex generation, reduces the residual amount of precursor, and reduces the possibility of residual gas reacting with the precursor to generate particulate matter, thereby reducing the frequency of the purge process and improving the production efficiency of the semiconductor equipment 100.

[0062] Since the bypass line 18 and the precursor line 13 are directly connected via the second three-way valve 135, there is no need to set up an additional pipeline for isolation, which greatly shortens the length of the gas trapping section between the bypass line 18 and the precursor line 13, reduces the possibility of vortex generation, reduces the residual amount of mixed gas, and reduces the possibility of residual gas reacting with the precursor to generate particulate matter, thereby reducing the frequency of the purge process and improving the production efficiency of the semiconductor equipment 100.

[0063] The flow controller 134 is used to control the flow of the precursor in the precursor tube 131. The flow controller 134 can be a device such as a mass flow controller. The flow controller 134 can also monitor the deviation between the actual flow and the set flow in real time, and trigger an abnormal flow alarm if the monitoring threshold is exceeded.

[0064] The pressure switch 136 is used to monitor the pressure in the precursor tube 131. When the pressure detected by the pressure switch 136 is greater than the preset pressure value, the controller 110 controls all two-way valves and three-way valves of the conveying system 1013 to be closed, which is beneficial to improving the safety and reliability of the conveying system 1013, the precursor box 101 and the semiconductor equipment 100.

[0065] The cleaning pipeline 15 includes a cleaning pipe 151, a cleaning two-way valve 153 and a one-way valve 155. The cleaning pipe 151 is connected to the carrier gas source 105, the cleaning pipe 151 is connected to the first three-way valve 133, and the cleaning pipe 151 is connected to the backfill pipeline 16. The cleaning two-way valve 153 is used to control the on-off of the carrier gas in the cleaning pipe 151. The one-way valve 155 is used to allow the carrier gas to flow from the carrier gas source 105 in the cleaning pipe 151 to the direction of the first three-way valve 133 or the backfill pipeline 16, so as to prevent the residual gas in the trapped gas pipeline from flowing back to the upstream of the cleaning pipeline 15.

[0066] The backfill pipeline 16 includes a backfill pipe 161, a first backfill two-way valve 163, a third three-way valve 165, a fourth three-way valve 167 and a second backfill two-way valve 169. The backfill pipe 161 is connected between the fluid replenishment source 106 and the inlet manual valve 118. The first backfill two-way valve 163, the third three-way valve 165, the second backfill two-way valve 169 and the fourth three-way valve 167 are sequentially arranged on the backfill pipe 161. The third three-way valve 165 is located between the first backfill two-way valve 163 and the second backfill two-way valve 169. The fourth three-way valve 167 is located between the second backfill two-way valve 169 and the inlet manual valve 118. The first backfill two-way valve 163 and the second backfill two-way valve 169 are used to control the fluid in the backfill pipe 161.

[0067] When the liquid level sensed by the liquid level sensor 19 is lower than the first preset value, the controller 110 controls the first backfill two-way valve 163 and the second backfill two-way valve 169 to open, thereby automatically replenishing the vaporizer 11. When the liquid level sensed by the liquid level sensor 19 is higher than the second preset value, the controller 110 controls the first backfill two-way valve 163 and the second backfill two-way valve 169 to close, thereby stopping replenishing the vaporizer 11.

[0068] The liquid level in the vaporization device 11 is monitored by the liquid level sensor 19. When liquid replenishment is needed, the first backfill two-way valve 163 and the second backfill two-way valve 169 are controlled to open to replenish the liquid in the vaporization device 11, thereby improving the automation of the conveying system 1013.

[0069] The third three-way valve 165 is connected to the bypass pipeline 18, and the third three-way valve 165 is used to control the on-off of the fluid between the backfill pipe 161 and the bypass pipeline 18. The third three-way valve 165 is normally open on the backfill pipe 161. The connection side between the third three-way valve 165 and the bypass pipeline 18 can be opened and closed. The on-off of the fluid between the backfill pipeline 16 and the bypass pipeline 18 is controlled by controlling the third three-way valve. When the connection side between the third three-way valve 165 and the bypass pipeline 18 is opened, the fluid between the backfill pipeline 16 and the bypass pipeline 18 is connected, and the fluid can flow out to the bypass pipeline 18 through the backfill pipeline 16 and the third three-way valve 165.

[0070] The fourth three-way valve 167 is connected to the cleaning pipe 151, and the fourth three-way valve 167 is used to control the on-off of the fluid between the backfill pipe 161 and the cleaning pipeline 15. The fourth three-way valve 167 is normally open on the backfill pipe 161. The connection side between the fourth three-way valve 167 and the cleaning pipeline 15 can be opened and closed. By controlling the fourth three-way valve 167, the on-off of the fluid between the backfill pipeline 16 and the cleaning pipeline 15 is controlled. When the connection side between the fourth three-way valve 167 and the cleaning pipeline 15 is opened, the backfill pipeline 16 and the cleaning pipeline 15 are fluidically connected, and the carrier gas can be fed into the backfill pipeline 16 through the cleaning pipeline 15 and the fourth three-way valve 167 to purge the backfill pipeline 16.

[0071] The carrier gas is fed from the cleaning line 15 into the backfill line 16 through the fourth three-way valve 167 to clean and purge the backfill line 16. The mixture of the cleaned backfill line 16 flows out from the third three-way valve 165 to the bypass line 18. The mixture includes a carrier gas and a liquid precursor. The mixture entering the bypass line 18 can be discharged from the bypass line 18. In other words, the fourth three-way valve 167 can be regarded as the feeding point of the carrier gas in the backfill line 16, and the third three-way valve 165 can be regarded as the discharge point of the cleaned mixture in the backfill line 16. The carrier gas feeding and outflow points are respectively set downstream of the first backfill two-way valve 163 and upstream of the second backfill two-way valve 169 to clean the backfill line 16 to the greatest extent.

[0072] Since the cleaning pipeline 15 and the backfill pipeline 16 are directly connected through the fourth three-way valve 167, there is no need to set up an additional pipeline for isolation, which greatly shortens the length of the liquid trapped section between the cleaning pipeline 15 and the backfill pipeline 16, reduces the possibility of vortex generation, reduces the residual amount of precursor, thereby reducing the frequency of the purge process and improving the production efficiency of the semiconductor equipment 100.

[0073] Since the bypass line 18 and the backfill line 16 are directly connected through the third three-way valve 165, the length of the liquid trapped section between the bypass line 18 and the backfill line 16 is greatly shortened, the possibility of vortex generation is reduced, and the residual amount of the mixture is reduced, thereby reducing the frequency of the purge process and improving the production efficiency of the semiconductor equipment 100.

[0074] By controlling the various valves in the delivery system 1013, the fluid can have different flow paths in the delivery system 1013 to achieve the delivery of gaseous precursors to the processing chamber 103, replacement or maintenance of parts (such as valves) in the delivery system 1013, replenishment of liquid, purging and cleaning of the vaporization device 11, etc. Figure 1 Schematically illustrates four possible implementations of the flow path of the fluid in the delivery system 1013 , and the present application does not limit the flow path of the fluid in the delivery system 1013 .

[0075] For example, in one possible implementation, when the precursor box 101 needs to provide a gaseous precursor to the processing chamber 103, the first precursor two-way valve 132 and the second precursor two-way valve 137 are controlled to be opened, the first three-way valve 133 is controlled to disconnect the fluid between the precursor pipeline 13 and the cleaning pipeline 15, the second three-way valve 135 is controlled to disconnect the fluid between the precursor pipeline 13 and the bypass pipeline 18, the first backfill two-way valve 163 and the second backfill two-way valve 169 are controlled to be closed, the third three-way valve 165 is controlled to disconnect the fluid between the backfill pipeline 16 and the bypass pipeline 18, the connecting side between the fourth three-way valve 167 and the cleaning pipeline 15 is controlled to be closed, and the gaseous precursor in the vaporization device 11 is transported to the processing chamber 103 by the precursor pipeline 13. When the precursor pipeline 13 delivers the gaseous precursor to the processing chamber 103, the carrier gas control valve 108 can be opened, and the carrier gas source 105 delivers the carrier gas to the processing chamber 103 to increase the rate of the gaseous precursor. It can be understood that when the precursor pipeline 13 delivers the gaseous precursor to the processing chamber 103, the carrier gas control valve 108 can also be closed.

[0076] For example, in a possible implementation, when the precursor pipeline 13 needs to be purged and cleaned, the carrier gas control valve 108 is closed, the first precursor two-way valve 132 and the second precursor two-way valve 137 on the first precursor pipeline 13 are closed, the first three-way valve 133 is controlled to make the precursor pipeline 13 and the cleaning pipeline 15 fluidly connected, the second three-way valve 135 is controlled to make the precursor pipeline 13 and the bypass pipeline 18 fluidly connected, the first backfill two-way valve 163 and the second backfill two-way valve 169 on the backfill pipeline 16 are closed, the third three-way valve 165 is controlled to make the backfill pipeline 16 and the bypass pipeline 18 fluidly disconnected, and the fourth three-way valve 167 is controlled to make the backfill pipeline 16 and the cleaning pipeline 15 fluidly disconnected. The carrier gas is fed into the precursor pipeline 13 through the first three-way valve 133 of the cleaning pipeline 15 to purge the precursor pipeline 13. The cleaned mixed gas flows out from the second three-way valve 135 to the bypass pipeline 18 .

[0077] For example, in a possible implementation, when the vaporization device 11 needs to be replenished, the carrier gas control valve 108 is closed, the first precursor two-way valve 132 and the second precursor two-way valve 137 on the first precursor pipeline 13 are closed, the first three-way valve 133 is controlled to disconnect the fluid between the precursor pipeline 13 and the cleaning pipeline 15, the second three-way valve 135 is controlled to disconnect the fluid between the precursor pipeline 13 and the bypass pipeline 18, the first backfill two-way valve 163 and the second backfill two-way valve 169 on the backfill pipeline 16 are opened, the third three-way valve 165 is controlled to disconnect the fluid between the backfill pipeline 16 and the bypass pipeline 18, and the fourth three-way valve 167 is controlled to disconnect the fluid between the backfill pipeline and the cleaning pipeline 15. The liquid precursor in the replenishment source 106 is transported to the vaporization device 11 through the backfill pipeline 16.

[0078] For example, in one possible implementation, when the backfill line 16 needs to be purged and cleaned, the outlet manual valve 116 is closed, the inlet manual valve 118 is closed, the carrier gas control valve 108 is closed, the first three-way valve 133 is controlled to disconnect the fluid between the precursor line 13 and the cleaning line 15, the second three-way valve 135 is controlled to disconnect the fluid between the precursor line 13 and the bypass line 18, the first backfill two-way valve 163 and the second backfill two-way valve 169 on the backfill line 16 are closed, the third three-way valve 165 is controlled to connect the fluid between the backfill line 16 and the bypass line 18, and the fourth three-way valve 167 connects the fluid between the backfill line and the cleaning line 15.

[0079] For example, in a possible implementation, the carrier gas control valve 108 is closed, the first precursor two-way valve 132 and the second precursor two-way valve 137 on the first precursor pipeline 13 are opened, the first three-way valve 133 is controlled to make the precursor pipeline 13 and the cleaning pipeline 15 fluidly connected, the second three-way valve 135 is controlled to make the fluid between the precursor pipeline 13 and the bypass pipeline 18 disconnected, the first backfill two-way valve 163 and the second backfill two-way valve 169 on the backfill pipeline 16 are closed, the third three-way valve 165 is controlled to make the fluid between the backfill pipeline 16 and the bypass pipeline 18 disconnected, and the fourth three-way valve 167 is controlled to make the fluid between the backfill pipeline 16 and the cleaning pipeline 15 disconnected. The carrier gas is fed into the precursor pipeline 13 through the first three-way valve 133 of the cleaning pipeline 15 and flows into the processing chamber 103, and can finally be discharged from the processing chamber 103. In this way, the processing chamber 103 can also be cleaned and purged.

[0080] For example, in one possible implementation, the first three-way valve 133 is controlled to disconnect the fluid of the precursor pipeline 13 from the cleaning pipeline 15, the second three-way valve 135 is controlled to disconnect the fluid between the precursor pipeline 13 and the bypass pipeline 18, the first backfill two-way valve 163 on the backfill pipeline 16 can be closed, the second backfill two-way valve 169 is opened, the inlet manual valve 118 is closed, the third three-way valve 165 is controlled to connect the fluid between the backfill pipeline 16 and the bypass pipeline 18, and the fourth three-way valve 167 is controlled to disconnect the fluid between the backfill pipeline 16 and the cleaning pipeline 15. Before the fluid is replenished, the backfill pipeline 16 can be evacuated and cleaned by the extraction component 109.

[0081] It should be understood that expressions such as "including" and "may include" that may be used in the present application indicate the existence of the disclosed functions, operations, or constituent elements, and do not limit one or more additional functions, operations, and constituent elements. In the present application, terms such as "including" and / or "having" may be interpreted as indicating specific characteristics, numbers, operations, constituent elements, components, or combinations thereof, but may not be interpreted as excluding the existence or possibility of adding one or more other characteristics, numbers, operations, constituent elements, components, or combinations thereof.

[0082] In addition, in the present application, the expression "and / or" includes any and all combinations of the associated listed words. For example, the expression "A and / or B" may include A, may include B, or may include both A and B.

[0083] In the present application, expressions including ordinal numbers such as "first" and "second" may modify various elements. However, such elements are not limited by the above expressions. For example, the above expressions do not limit the order and / or importance of the elements. The above expressions are only used to distinguish one element from other elements. For example, a first user device and a second user device indicate different user devices, although the first user device and the second user device are both user devices. Similarly, without departing from the scope of the present application, a first element may be referred to as a second element, and similarly, a second element may also be referred to as a first element.

[0084] When a component is referred to as being "connected" or "accessed" to another component, it should be understood that the component is not only directly connected to or accessed to the other component, but also another component may exist between the component and the other component. On the other hand, when a component is referred to as being "directly connected" or "directly accessed" to another component, it should be understood that there is no component between them.

[0085] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any person skilled in the art who is familiar with the present technical field can easily think of changes or substitutions within the technical scope disclosed in the present application, which should be included in the protection scope of the present application. Therefore, the protection scope of the present application should be based on the protection scope of the claims.

Claims

1. A conveying system, characterized in that: include: A vaporization device, used for vaporizing a precursor; A precursor pipeline, comprising a precursor tube, a first precursor two-way valve, a second precursor two-way valve, a first three-way valve and a second three-way valve, wherein the precursor tube is connected to the vaporization device, the first precursor two-way valve, the first three-way valve, the second three-way valve and the second precursor two-way valve are sequentially arranged on the precursor tube, the first precursor two-way valve is located between the vaporization device and the first three-way valve, and the precursor tube is used to transport the precursor; A cleaning pipeline, connected to the first three-way valve, the first three-way valve is used to control the on-off of the fluid between the precursor pipeline and the cleaning pipeline; The bypass pipeline is connected to the second three-way valve, and the second three-way valve is used to control the on-off of the fluid between the precursor pipeline and the bypass pipeline.

2. The conveying system according to claim 1, characterized in that When the first precursor two-way valve and the second precursor two-way valve are opened, the first three-way valve cuts off the fluid connection between the precursor pipeline and the cleaning pipeline, and the second three-way valve cuts off the fluid connection between the precursor pipeline and the bypass pipeline.

3. The conveying system according to claim 1, characterized in that The delivery system also includes a backfill pipeline connected to the vaporization device, and a third three-way valve and a fourth three-way valve are provided on the backfill pipeline. The third three-way valve is connected to the cleaning pipeline, and the third three-way valve is used to control the on-off of the fluid between the backfill pipeline and the cleaning pipeline; The fourth three-way valve is connected to the bypass pipeline, and the fourth three-way valve is used to control the flow of fluid between the bypass pipeline and the backfill pipeline.

4. The conveying system according to claim 3, characterized in that: The backfill pipeline also includes a backfill pipe, a first backfill two-way valve and a second backfill two-way valve. The first backfill two-way valve, the fourth three-way valve, the third three-way valve and the second backfill two-way valve are all arranged on the backfill pipe, and the second backfill two-way valve is located between the vaporization device and the third three-way valve.

5. The conveying system according to claim 4, characterized in that: The delivery system further comprises a liquid level sensor disposed in the vaporization device, the liquid level sensor being used to sense the liquid level of the precursor in the vaporization device; When the liquid level sensed by the liquid level sensor is lower than a first preset value, both the first backfill two-way valve and the second backfill two-way valve are opened; When the liquid level sensed by the liquid level sensor is higher than a second preset value, both the first backfill two-way valve and the second backfill two-way valve are closed.

6. The conveying system according to any one of claims 1 to 5, characterized in that: The precursor pipeline also includes a pressure switch arranged on the precursor tube, and the pressure switch is located between the second precursor two-way valve and the second three-way valve. When the pressure detected by the pressure switch is greater than a preset pressure value, all two-way valves and three-way valves of the conveying system are closed.

7. The conveying system according to any one of claims 1 to 5, characterized in that: The precursor pipeline also includes a flow controller arranged on the precursor tube, which is used to control the flow of the precursor.

8. The conveying system according to any one of claims 1 to 7, characterized in that: The cleaning pipeline also includes a cleaning pipe, a cleaning two-way valve and a one-way valve. The cleaning two-way valve and the one-way valve are both arranged on the cleaning pipe, and the one-way valve is located between the first three-way valve and the cleaning two-way valve.

9. A precursor box, characterized in that: The precursor box comprises a shell and a conveying system according to any one of claims 1 to 8, wherein the conveying system is arranged on the shell.

10. A semiconductor device, characterized in that: The semiconductor device includes a process chamber and a precursor box according to claim 9, and the precursor tube is connected to the process chamber.

11. The semiconductor device according to claim 10, characterized in that The semiconductor device further comprises an extraction component, and a bypass pipeline of the semiconductor device is connected to the extraction component.

12. The semiconductor device according to claim 11, characterized in that The extraction component is connected to the processing chamber.

13. The semiconductor device according to claim 10, wherein: The semiconductor device further comprises a carrier gas source, wherein the carrier gas source is connected to a cleaning pipeline of the semiconductor device, and the carrier gas source is connected to the processing chamber via a carrier gas control valve.

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