Mushroom residue fermentation and culture medium proportioning and mixing equipment

By designing automated mushroom residue fermentation and cultivation matrix ratio mixing equipment, the dispersion mechanism and diversion mechanism are used to achieve efficient mixing of mushroom residue, grass and sawdust, solving the problems of low mixing efficiency and high operating strength in the prior art, and achieving large and efficient production.

CN120037804AInactive Publication Date: 2025-05-27ZHEJIANG TAISHENG AGRI SCI & TECH CO LTD
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Patent Information

Application Number
CN202510220039.2
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-02-26
Publication Date
2025-05-27
Estimated Expiration
Not applicable · inactive patent

AI Technical Summary

Technical Problem

The existing mixing method of mushroom slag, grass charcoal and sawdust brings greater operational strength to the operators, and the efficiency is reduced, making it difficult to achieve large and efficient production.

Method used

A mushroom residue fermentation and cultivation matrix ratio mixing equipment was designed. Through an automated dispersion mechanism and diversion mechanism, the mushroom residue was mixed with grass and sawdust, and the mixture was achieved by alternating screening, removing the stirring structure and improving the mixing efficiency.

Benefits of technology

It reduces the operating strength of the operators and improves the mixing efficiency, so that the mixing of mushroom slag, grass charcoal and sawdust can be scaled up, so that the materials can be effectively mixed and large particles can be discharged, avoiding affecting the dispersion effect.

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Abstract

The invention discloses mushroom residue fermentation and culture medium proportioning and mixing equipment, and relates to the technical field of mushroom residue treatment equipment. The two material storage bins are symmetrically arranged on the supporting assembly; the dispersing mechanism is arranged on the supporting assembly, and the dispersing mechanism is provided with a plurality of dispersing parts which are linearly distributed; the two flow dividing mechanisms are symmetrically arranged on the supporting assembly, one ends of the two flow dividing mechanisms are located on the lower sides of the two material storage bins correspondingly, and the other ends of the two flow dividing mechanisms extend and are fixed to the dispersing mechanism, so that materials discharged from the two material storage bins are divided into the corresponding dispersing parts; therefore, the two materials are mixed through the dispersing mechanism. According to the mushroom residue mixing device, mushroom residues, turf and saw dust can be automatically mixed, the working intensity of workers is reduced, the mixing efficiency is improved, and large-scale mixing of the mushroom residues, the turf and the saw dust is achieved.
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Description

Technical Field

[0001] The present invention relates to the technical field of mushroom residue treatment equipment, and particularly relates to a mushroom residue fermentation and cultivation substrate proportioning and mixing equipment. Background Art

[0002] Mushroom residue fermentation and cultivation substrate refers to the use of waste materials (fungus bran) after edible mushroom cultivation through fermentation treatment as cultivation substrate for plant cultivation. Mushroom residue is the residue after edible mushroom cultivation, including components such as edible mushroom mycelium residues and crude fiber after enzymatic hydrolysis by edible mushrooms. After these waste materials are fermented, they can be used as an organic substrate for plant cultivation. During the fermentation process, the soluble substances in the mushroom residue are absorbed by beneficial bacteria and then absorbed and utilized by plants, thereby providing nutrients for plants. This utilization method not only realizes the resource utilization of waste but also promotes the sustainable development of agriculture.

[0003] In addition, the cultivated substrate after mushroom residue fermentation can also be mixed with other raw materials such as crop straws, peat, sawdust, livestock and poultry manure, etc. After fermentation or high-temperature treatment, a full-nutrient cultivation substrate is formed. This substrate has a good buffering effect and can improve the physical and chemical properties of the cultivation substrate. In order to further improve the quality of the substrate, inorganic substances such as river sand, cinder, vermiculite, and perlite can be added to form an organic-inorganic type cultivation substrate to meet the growth needs of different plants.

[0004] Currently, when mixing mushroom residue with peat, sawdust, etc., generally, manual repeated turning is used to achieve the effect of stirring and mixing. This mixing method brings a relatively large operation intensity to the operators, and the efficiency is reduced, making it difficult to produce in large quantities and efficiently. Summary of the Invention

[0005] The purpose of the present invention is to provide a mushroom residue fermentation and cultivation substrate proportioning and mixing equipment, which solves the problems that the existing mixing method of mushroom residue with peat and sawdust brings a relatively large operation intensity to the operators, reduces the efficiency, and makes it difficult to produce in large quantities and efficiently.

[0006] The present invention solves the above technical problems through the following technical solutions. The present invention includes:

[0007] Support assembly;

[0008] Two material storage bins, and the two material storage bins are symmetrically arranged on the support assembly;

[0009] Dispersion mechanism, the dispersion mechanism is arranged on the support assembly, and the dispersion mechanism has a plurality of dispersion parts linearly distributed;

[0010] Two shunting mechanisms, the two shunting mechanisms are symmetrically arranged on the support assembly, and one ends of the two shunting mechanisms are respectively located below the two material storage bins, and the other ends extend and are fixed to the dispersing mechanism, so as to realize shunting the materials discharged from the two material storage bins into the corresponding dispersing parts, so as to realize mixing the two materials through the dispersing mechanism.

[0011] Preferably, the support assembly includes two symmetrically arranged support frames, the bottoms of the two support frames are both provided with support plates, and the two material storage bins are respectively fixed on the two support frames. Two cross bars are fixed between the two support frames, and the dispersing mechanism is arranged on the two cross bars.

[0012] Preferably, the dispersing mechanism includes two guiding optical axes fixed between the two cross bars. Sliding sleeves are slidably installed on the two guiding optical axes. Transverse side plates are fixed to the two sliding sleeves. A dispersing net is fixed to the bottoms of the two transverse side plates. A plurality of uniformly distributed longitudinal side plates are fixed between the two transverse side plates, and the plurality of longitudinal side plates are arranged in an axial array along the guiding optical axis. Dispersing parts are formed between adjacent two longitudinal side plates. An electric push rod is fixed to one of the cross bars, and the telescopic end of the electric push rod is fixed to the adjacent longitudinal side plate. By reciprocating the electric push rod, the plurality of dispersing parts are reciprocally moved to sieve and disperse the two materials to realize mixing.

[0013] Preferably, the shunting mechanism includes a material receiving plate. The material receiving plate is fixed to the corresponding sliding sleeve through a vertical rod. The upper half of the material receiving plate corresponds to the material storage bin. A plurality of shunting channels are fixed to the lower side of the material receiving plate. Material discharge grooves are arranged at the bottoms of the shunting channels along the length direction thereof, and an avoidance gap is provided between adjacent two shunting channels. The plurality of shunting channels of one of the shunting mechanisms respectively penetrate through the plurality of avoidance gaps of the other shunting mechanism, that is, the plurality of shunting channels of the two shunting mechanisms are arranged at intervals one by one, and the plurality of shunting channels respectively correspond to the plurality of dispersing parts one by one. Two symmetrically arranged isolation plates are fixed to the lower side of the shunting channels.

[0014] Preferably, an adjusting opening member is arranged at the material discharge groove. The adjusting opening member includes long inner grooves opened on both sides of the material discharge groove. Long plates and long elastic bladders are slidably installed in the two long inner grooves, and the long elastic bladders are located inside the long plates. The long plates are connected to an external air pump through air pipes. By expanding or contracting the long elastic bladders, the length of the long plates extending out of the long inner grooves is controlled to adjust the size of the material discharge grooves.

[0015] Preferably, a cleaning mechanism is provided on the material receiving plate. The cleaning mechanism includes a long through hole opened in the material receiving plate. A flipping bottom plate is rotatably installed in the long through hole through a rotating shaft, and the rotating shaft is located below the flipping bottom plate. A plurality of uniformly distributed blocking rods are fixed to the lower side of the upper surface of the flipping bottom plate. A motor is fixed to the outside of the material receiving plate, and the telescopic end of the motor is fixed to the rotating shaft.

[0016] Preferably, a receiving plate is fixed on the support assembly. A receiving box is placed on the receiving plate, and the receiving box corresponds to the flipping bottom plate. A handle is provided on the outside of the receiving box.

[0017] Preferably, a flow dividing member is provided on the material receiving plate between the cleaning mechanism and the flow dividing channel. The flow dividing member includes a plurality of inclined blocking blocks fixed to the material receiving plate, and the plurality of inclined blocking blocks are distributed in a conical shape. There is a flow dividing groove between adjacent two inclined blocking blocks, and the widths of the plurality of flow dividing grooves gradually increase from inside to outside in sequence.

[0018] Preferably, a receiving hopper fixed to the support assembly is provided below the dispersing mechanism to collect the materials dispersed by the dispersing mechanism. The length of the receiving hopper is greater than the moving stroke of the sliding sleeve.

[0019] Preferably, a long conical part is provided below the material storage bin, and the whole section of the long conical part is arranged in the material storage bin. An electronic valve is provided below the long conical part.

[0020] Compared with the prior art, the beneficial effects of the present invention are as follows:

[0021] 1. The present invention can mix mushroom residue with peat and sawdust automatically, reducing the labor intensity of operators and improving the mixing efficiency, making the mixing of mushroom residue with peat and sawdust large-scale.

[0022] 2. Compared with the traditional mixing device, the mixing method of the present invention proposes a brand-new mixing method, removing the stirring structure and instead using the mutual alternating screening of two materials, so that the two materials are stacked alternately with each other to achieve the mixing effect.

[0023] 3. The present invention can block large-particle materials or sundries in the materials and discharge and collect them, avoiding the large accumulation of large-particle materials or sundries in the dispersing part and affecting the dispersion of the dispersing part. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 is a three-dimensional structural schematic diagram of the present invention;

[0025] Figure 2 is a front view structural schematic diagram of the present invention;

[0026] Figure 3 is Figure 1 the three-dimensional structure schematic diagram of the shunt mechanism in

[0027] Figure 4 is Figure 3 the sectional structure schematic diagram of the shunt channel in

[0028] Figure 5 is Figure 1 the three-dimensional structure schematic diagram of the dispersion mechanism in

[0029] Figure 6 is the schematic diagram of the first dispersion mechanism for dispersing materials;

[0030] Figure 7 is the schematic diagram of the second dispersion mechanism for dispersing materials.

[0031] The numbers in the figure indicate:

[0032] 1 - material storage bin; 2 - shunt mechanism; 21 - material receiving plate; 22 - shunt channel; 23 - inclined baffle; 24 - shunt groove; 25 - material discharge groove; 261 - long plate; 262 - long elastic bladder; 27 - isolation plate; 3 - dispersion mechanism; 31 - electric push rod; 32 - guiding optical axis; 33 - sliding sleeve; 34 - lateral side plate; 35 - dispersion net; 36 - longitudinal side plate; 4 - cleaning mechanism; 41 - flipping bottom plate; 42 - retaining rod; 43 - motor; 44 - receiving box; 45 - receiving plate; 5 - receiving hopper; 6 - support assembly. Specific embodiments

[0033] The following further elaborates on the above and additional technical features and advantages of the present invention in conjunction with the accompanying drawings.

[0034] Embodiment 1

[0035] This embodiment provides a technical solution: a mushroom residue fermentation and cultivation substrate proportioning and mixing device, as Figure 1 shown in Figure 2 and

[0036] shown in Figure 1 and Figure 2As shown, the support assembly 6 includes two symmetrically arranged support frames. The bottom of each of the two support frames is provided with a support plate to ensure the stability of the support frames. Two material storage bins 1 are respectively fixed on the two support frames. Two cross bars are fixed between the two support frames. The dispersion mechanism 3 is arranged on the two cross bars. The heights of the two material storage bins 1 and the dispersion mechanism 3 are set according to needs. The dispersion mechanism 3 is located between the two material storage bins 1.

[0037] As Figure 1 shown Figure 2 As shown, the two material storage bins 1 are symmetrically arranged on the two support frames of the support assembly 6. A long conical part is arranged on the lower side of the material storage bin 1, and the whole section of the long conical part is arranged inside the material storage bin 1, that is, the materials in the material storage bin 1 are discharged linearly. Thus, when the materials fall onto the diversion mechanism 2, they will not be too concentrated and accumulate. At the same time, the conical setting can enable the materials in the material storage bin 1 to be smoothly discharged downward. An electronic valve is arranged on the lower side of the long conical part. The setting of the electronic valve can electronically control the discharge of materials from the material storage bin 1.

[0038] As Figure 1 shown Figure 5 As shown, the dispersion mechanism 3 includes two guiding optical axes 32 fixed between the two cross bars. Two sliding sleeves 33 are slidably mounted on the two guiding optical axes 32. Two transverse side plates 34 are fixed to the two sliding sleeves 33 respectively. A dispersion net 35 is fixed to the bottom of the two transverse side plates 34. The mesh number of the dispersion net 35 is set according to the needs of the corresponding materials. A plurality of uniformly distributed longitudinal side plates 36 are fixed between the two transverse side plates 34, and the plurality of longitudinal side plates 36 are arranged in an axial array along the guiding optical axes 32. The number of the longitudinal side plates 36 is set according to needs. A dispersion part is formed between two adjacent longitudinal side plates 36. An electric push rod 31 is fixed to one of the cross bars. The telescopic end of the electric push rod 31 is fixed to the adjacent longitudinal side plate 36. By reciprocating the electric push rod 31, the plurality of dispersion parts move reciprocally to sieve and disperse the two materials to achieve mixing.

[0039] As Figure 1 shown Figure 2 As shown, the receiving hopper 5 is located below the dispersion mechanism 3 and fixed to the support assembly 6. The materials dispersed by the dispersion mechanism 3 are concentrated. A storage box is placed below the receiving hopper 5, and the mixed materials can be collected. Alternatively, a conveyor belt can be arranged below the receiving hopper 5 to convey the mixed materials to the corresponding position for subsequent processing. The length of the receiving hopper 5 is greater than the moving stroke of the sliding sleeve 33. This setting can prevent the materials from leaking outside the receiving hopper 5.

[0040] As Figure 1 shown Figure 2As shown, two shunt mechanisms 2 are symmetrically arranged on the support assembly 6, and one end of each of the two shunt mechanisms 2 is located below the two material storage bins 1 respectively, and the other end extends and is fixed to the sliding sleeve 33 of the dispersion mechanism 3, so as to realize shunting the materials discharged from the two material storage bins 1 into the corresponding dispersion parts, so as to realize mixing the two materials through the dispersion mechanism 3.

[0041] During use, the two materials to be mixed (such as mushroom residue and peat or mushroom residue and sawdust) are respectively put into the two material storage bins 1. The electronic valves of the material storage bins 1 accurately control the discharge amount of the discharged materials of the corresponding material storage bins 1 according to the mixing ratio of the two materials, so as to ensure that the two materials can be mixed according to the set ratio. The two materials will be shunted by the two shunt mechanisms 2 into multiple dispersion parts of the dispersion mechanism 3. The dispersion parts disperse the two materials respectively and drop downward. The two materials will be mixed with each other during the dropping process and finally collected through the receiving hopper 5.

[0042] Embodiment 2

[0043] This embodiment is further optimized on the basis of Embodiment 1. The same parts as the foregoing technical solutions will not be described herein again. For example Figure 1 、 Figure 3 、 Figure 4 and Figure 5 As shown, in order to better implement the present invention, the following setting method is particularly adopted: In this embodiment, the shunt mechanism 2 includes a material receiving plate 21. Both sides of the material receiving plate 21 have shielding parts that turn upward to prevent materials from falling from both sides. The material receiving plate 21 is fixed to the corresponding sliding sleeve 33 through a vertical rod. The shunt mechanism 2 moves synchronously with the sliding sleeve 33. The upper half of the material receiving plate 21 corresponds to the material storage bin 1. A plurality of shunt channels 22 are fixed to the lower side of the material receiving plate 21. A material discharge slot 25 is provided at the bottom of the shunt channel 22 along its length direction. The bottom of the shunt channel 22 is inclined to facilitate the materials to slide into the material discharge slot 25 by themselves; there is an avoidance gap between two adjacent shunt channels 22. A plurality of shunt channels 22 of one shunt mechanism 2 are respectively inserted into a plurality of avoidance gaps of the other shunt mechanism 2, that is, a plurality of shunt channels 22 of the two shunt mechanisms 2 are arranged at intervals one by one. A plurality of shunt channels 22 respectively correspond to a plurality of dispersion parts one by one, that is, the materials in each shunt channel 22 will fall into the corresponding dispersion part. The two materials are respectively arranged at intervals one by one. Two symmetrically arranged isolation plates 27 are fixed to the lower side of the shunt channel 22. The setting of the isolation plates 27 can prevent the materials in two adjacent shunt channels 22 from being confused with each other and prevent the materials in the shunt channel 22 from falling outside the dispersion mechanism 3.

[0044] During use, the two material storage bins 1 discharge different materials respectively, which slide down through the material receiving plate 21 into a plurality of diversion channels 22, and fall into a plurality of dispersion parts of the dispersion mechanism 3 through the material discharge groove 25. The two materials in the plurality of dispersion parts are arranged at intervals one by one. When the electric push rod 31 reciprocates telescopically, the materials in the plurality of dispersion parts are sieved and fall downward through the dispersion net 35 to achieve dispersion. During the falling process of the two materials, due to the reciprocating displacement of the dispersion parts, the falling positions of the two materials will also be adjusted accordingly, that is, the falling paths of the materials present a wavy shape, as Figure 6 and Figure 7 shown. When the two materials fall into the receiving hopper 5, the mixing of the two materials is achieved.

[0045] When the displacement of the electric push rod 31 is the width of a single dispersion part, as Figure 6 shown, when the displacement of the electric push rod 31 is the width of two dispersion parts, as Figure 7 shown, it can be seen that the reciprocating contraction displacement of the electric push rod 31 is proportional to the mixing degree of the two materials.

[0046] When the materials in the dispersion part are not easily discharged or do not reach the expected effect, a vibrator can be added to the longitudinal side plate 36 or the dispersion net 35 to drive the dispersion net 35 to vibrate, thereby increasing the dispersion effect of the dispersion mechanism 3 and enabling the materials in the dispersion part to be quickly discharged.

[0047] An adjusting opening member is provided at the material discharge groove 25 to adjust the width of the material discharge groove 25 and control the amount of discharged materials. The adjusting opening member includes elongated inner grooves opened on both sides of the material discharge groove 25, and the elongated inner grooves are arranged along the entire section of the material discharge groove 25. In both of the two elongated inner grooves, there are slidably arranged elongated plates 261 and elongated elastic capsules 262, and the elongated elastic capsules 262 are located inside the elongated plates 261. The elongated plates 261 are fixed to the elongated elastic capsules 262, and the elongated plates 261 are connected to an external air pump through air pipes.

[0048] During use, compressed air is injected into the elongated elastic capsules 262 through the air pump. The elongated elastic capsules 262 expand and will push the elongated plates 261 outward, thereby narrowing the gap between the two elongated plates 261. On the contrary, when the air in the elongated elastic capsules 262 is discharged through the air pump, the elongated elastic capsules 262 contract, and the elongated plates 261 will enter the elongated inner grooves, expanding the gap between the two elongated plates 261.

[0049] Embodiment 3

[0050] This embodiment is further optimized on the basis of Embodiment 2. The same parts as the foregoing technical solutions will not be elaborated here. As Figure 1 and Figure 3As shown in the figure, to better implement the present invention, the following setting method is specifically adopted: In this embodiment, a cleaning mechanism 4 is provided on the material receiving plate 21. The cleaning mechanism 4 includes a long through hole opened in the material receiving plate 21. The shape of the long through hole is a structure that is narrow at the bottom and wide at the top. A flipping bottom plate 41 is rotatably installed in the long through hole through a rotating shaft, and the rotating shaft is located below the flipping bottom plate 41, that is, the flipping bottom plate 41 can be flipped with its lower end position through the rotating shaft. A plurality of uniformly distributed blocking rods 42 are fixed on the lower side of the upper surface of the flipping bottom plate 41. Adjacent two blocking rods 42 can block large-particle materials or sundries. A motor 43 is fixed on the outside of the material receiving plate 21, and the telescopic end of the motor 43 is fixed to the rotating shaft.

[0051] A receiving plate 45 is fixed on the support assembly 6, and a receiving box 44 is placed on the receiving plate 45, and the receiving box 44 corresponds to the flipping bottom plate 41. When the flipping bottom plate 41 flips downward, the materials or sundries on the flipping bottom plate 41 can fall into the receiving box 44 for collection. A handle is provided on the outside of the receiving box 44, and the setting of the handle enables the receiving box 44 to be conveniently removed.

[0052] During operation, the flipping bottom plate 41 is flipped to be flush with the material receiving plate 21 through the motor 43. The materials discharged from the material storage bin 1 smoothly roll downward through the flipping bottom plate 41, and the plurality of blocking rods 42 will block large-particle materials or sundries. Until a certain amount of large-particle materials or sundries accumulates, the material storage bin 1 stops discharging materials, and the motor 43 is operated to make the flipping bottom plate 41 flip downward, so that the large-particle materials or sundries on the flipping bottom plate 41 fall into the receiving box 44 for collection, and then the motor 43 is operated to make the flipping bottom plate 41 flip back to its original position.

[0053] Embodiment Four

[0054] This embodiment is further optimized on the basis of the above embodiment. The same parts as the foregoing technical solutions will not be described in detail here. As Figure 3 shown in the figure, to better implement the present invention, the following setting method is specifically adopted: A shunting member is provided on the material receiving plate 21 between the cleaning mechanism 4 and the shunting channel 22 in this embodiment, which can shunt the materials passing through the cleaning mechanism 4 to ensure that when the materials flow into a plurality of shunting channels 22, they can be as uniform as possible.

[0055] The flow divider includes a plurality of inclined stoppers 23 fixed on the material receiving plate 21, and the plurality of inclined stoppers 23 are distributed in a conical shape. There is a flow dividing groove 24 between two adjacent inclined stoppers 23. With such a conical arrangement, the material can roll outward. The widths of the plurality of flow dividing grooves 24 gradually increase from inside to outside. Since the discharging position of the material storage bin 1 is at the middle position of the material receiving plate 21, the material will concentrate at the middle position of the material receiving plate 21. The width of the flow dividing groove 24 closer to the middle position is smaller. Although the discharge amount of the material is small, the discharging time of the material is the longest, thereby achieving as much balance as possible in the amount of material received by each flow dividing channel 22.

[0056] The above are only the preferred embodiments of the present invention, which are illustrative rather than restrictive to the present invention. Those skilled in the art understand that many changes, modifications, and even equivalents can be made within the spirit and scope defined by the claims of the present invention, but all will fall within the protection scope of the present invention.

Claims

1. A mushroom residue fermentation and cultivation substrate ratio mixing device, characterized in that: include: Support assembly (6); Two material storage bins (1), the two material storage bins (1) being symmetrically arranged on the support assembly (6); A dispersion mechanism (3), the dispersion mechanism (3) being arranged on the support assembly (6), the dispersion mechanism (3) having a plurality of dispersion parts distributed in a straight line; Two diverter mechanisms (2), the two diverter mechanisms (2) are symmetrically arranged on the support assembly (6), and one end of the two diverter mechanisms (2) is respectively located at the lower side of the two material storage bins (1), and the other end is extended and fixed to the dispersion mechanism (3), so as to realize the diversion of the materials discharged from the two material storage bins (1) to the corresponding dispersion parts, so as to realize the mixing of the two materials through the dispersion mechanism (3).

2. The mushroom residue fermentation and cultivation substrate ratio mixing equipment according to claim 1, characterized in that: The support assembly (6) comprises two symmetrically arranged support frames, the bottoms of the two support frames are each provided with a support plate, and the two material storage bins (1) are respectively fixed on the two support frames, two cross bars are fixed between the two support frames, and the dispersion mechanism (3) is arranged on the two cross bars.

3. The mushroom residue fermentation and cultivation substrate ratio mixing equipment as claimed in claim 2, characterized in that: The dispersion mechanism (3) comprises two guide light shafts (32) fixed between two cross bars, the two guide light shafts (32) are both slidably mounted with sliding sleeves (33), the two sliding sleeves (33) are both fixed with transverse side plates (34), the bottoms of the two transverse side plates (34) are fixed with dispersion nets (35), a plurality of evenly distributed longitudinal side plates (36) are fixed between the two transverse side plates (34), and the plurality of longitudinal side plates (36) are arranged in an axial array along the guide light shaft (32), and a dispersion part is formed between two adjacent longitudinal side plates (36), one of the cross bars is fixed with an electric push rod (31), the telescopic end of the electric push rod (31) is fixed to the adjacent longitudinal side plate (36), and the electric push rod (31) is reciprocated to realize the reciprocating movement of the plurality of dispersion parts, so that the two materials are screened and dispersed, and mixed.

4. The mushroom residue fermentation and cultivation substrate ratio mixing equipment as claimed in claim 3, characterized in that: The diversion mechanism (2) comprises a material receiving plate (21), the material receiving plate (21) is fixed to a corresponding sliding sleeve (33) through a vertical rod, the upper half of the material receiving plate (21) corresponds to the material storage bin (1), a plurality of diversion channels (22) are fixed on the lower side of the material receiving plate (21), a material discharge groove (25) is provided at the bottom of the diversion channel (22) along its length direction, and an avoidance gap is provided between two adjacent diversion channels (22), the plurality of diversion channels (22) of one of the diversion mechanisms (2) are respectively inserted into the plurality of avoidance gaps of the other diversion mechanism (2), that is, the plurality of diversion channels (22) of the two diversion mechanisms (2) are arranged one by one, and the plurality of diversion channels (22) correspond one by one to the plurality of dispersion parts, respectively, and two symmetrically arranged isolation plates (27) are fixed on the lower side of the diversion channel (22).

5. The mushroom residue fermentation and cultivation substrate ratio mixing equipment as claimed in claim 4, characterized in that: The material discharge groove (25) is provided with an adjustment opening member, the adjustment opening member comprises elongated inner grooves opened on both sides of the material discharge groove (25), a slidably arranged elongated plate (261) and an elongated elastic bag (262) are installed in the two elongated inner grooves, and the elongated elastic bag (262) is located on the inner side of the elongated plate (261), the elongated plate (261) is connected to an external air pump through an air pipe, and the length of the elongated plate (261) extending out of the elongated inner groove is controlled by the expansion or contraction of the elongated elastic bag (262) to adjust the size of the material discharge groove (25).

6. The mushroom residue fermentation and cultivation substrate proportioning and mixing equipment as claimed in claim 4, characterized in that: A cleaning mechanism (4) is provided on the material receiving plate (21), and the cleaning mechanism (4) comprises an elongated through hole opened on the material receiving plate (21), a flip base plate (41) is rotatably installed in the elongated through hole via a rotating shaft, and the rotating shaft is located on the lower side of the flip base plate (41), a plurality of evenly distributed blocking rods (42) are fixed on the lower side of the upper surface of the flip base plate (41), and a motor (43) is fixed on the outer side of the material receiving plate (21), and the telescopic end of the motor (43) is fixed to the rotating shaft.

7. The mushroom residue fermentation and cultivation substrate proportioning and mixing equipment as claimed in claim 6, characterized in that: A receiving plate (45) is fixed on the support assembly (6), a receiving box (44) is placed on the receiving plate (45), and the receiving box (44) corresponds to the flip bottom plate (41), and a handle is provided on the outer side of the receiving box (44).

8. The mushroom residue fermentation and cultivation substrate proportioning and mixing equipment as claimed in claim 6, characterized in that: A diverter is provided on the material receiving plate (21) between the cleaning mechanism (4) and the diverter channel (22), the diverter comprising a plurality of inclined blocks (23) fixed on the material receiving plate (21), the plurality of inclined blocks (23) being distributed in a cone shape, a diverter groove (24) being provided between two adjacent inclined blocks (23), and the widths of the plurality of diverter grooves (24) gradually increasing from the inside to the outside.

9. The mushroom residue fermentation and cultivation substrate proportioning and mixing equipment as claimed in claim 3, characterized in that: A material receiving hopper (5) fixed to the supporting assembly (6) is provided below the dispersing mechanism (3) to collect the materials dispersed by the dispersing mechanism (3); the length of the material receiving hopper (5) is greater than the moving stroke of the sliding sleeve (33).

10. The mushroom residue fermentation and cultivation substrate proportioning and mixing equipment according to claim 1, characterized in that: A long cone portion is arranged at the lower side of the material storage bin (1), and the entire long cone portion is arranged at the material storage bin (1), and an electronic valve is arranged at the lower side of the long cone portion.