Multipurpose wafer jig
By designing a multi-purpose wafer fixture, using an XY axis motion mechanism and an R axis rotary tabletop, combined with a link mechanism and a cylinder fixture, the limitations of multi-directional movement and complex movement requirements in the prior art are solved, and efficient and flexible wafer processing is achieved.
Patent Information
- Application Number
- CN202510439329.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-09
- Publication Date
- 2025-05-27
AI Technical Summary
Existing wafer fixtures have limitations on multi-directional movement and complex movement requirements, and are costly and complex in maintenance, making it difficult to meet multi-purpose needs.
A multi-purpose wafer fixture is designed, using an XY axis moving mechanism and an R axis rotary tabletop, combining a connecting rod mechanism and a cylinder fixture to achieve three-direction clamping and complex movement.
It realizes flexible movement and clamping of wafers in the X, Y and R axes directions, reducing the complexity and cost of mechanical structure, while improving reliability and applicability.
Smart Images

Figure CN120048789A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of wafer fixtures, and in particular to a multi-purpose wafer fixture. Background Art
[0002] Wafer fixtures are mainly used in semiconductor, electronics, biology and other fields. In the field of semiconductor manufacturing, it is an important tool for wafer processing and testing. For example, during the photolithography process, vacuum adsorption or mechanical clamping is used to ensure stable exposure of the wafer and improve the accuracy of photolithography; during etching, wafer displacement is prevented from affecting the etching effect; during the detection process, the wafer is fixed to ensure accurate test results. In the field of electronic manufacturing, the wafer is fixed during chip packaging for cutting and wire bonding operations, and electronic components can be fixed during circuit board manufacturing to improve welding accuracy and efficiency. In addition, in the biomedical field, biochips or microfluidic chips can be fixed for biological sample detection and analysis; in the optical field, optical lenses or components can be fixed for processing and testing. Simple clamping cannot ensure the stability of the wafer, so a multi-purpose wafer fixture is needed.
[0003] The technology closest to the present invention is the UVW alignment platform technology. In terms of movement mode, it belongs to a three-axis parallel motion mechanism, which can realize linear motion of the X and Y axes and rotational motion of the θ axis. It can flexibly move and rotate to a certain extent in the plane to meet the needs of complex motion. In terms of structural design, a modular structure is adopted, which consists of an upper table, a lower bottom surface and 4 sets of modules in the middle. The modules are usually guided by cross roller guides and cross roller bearings, and are matched with 3 drive modules and 1 driven module. The side drive module saves space and makes the structure compact. In terms of control accuracy, high-precision control can be achieved to ensure processing accuracy and quality. Its control algorithm is relatively complex, which can support a variety of complex movements and achieve precise control through the inverse solution mode. The effects achieved by this structure have the following defects: high cost, high-precision components and complex control algorithms increase manufacturing costs, limiting its application in cost-sensitive scenarios; after long-term use or vibration shock, components wear quickly, resulting in reduced accuracy, and the recalibration process is complicated, requiring professional equipment and technicians to operate, increasing maintenance costs and time; the range of motion is limited, and it may not be able to meet the requirements in scenarios requiring a larger stroke, and operations beyond the design range will affect accuracy or even damage the equipment; the load capacity is limited, and the emphasis on high precision leads to the structural design sacrificing load capacity, and the accuracy and stability will deteriorate when handling heavier loads; due to the high requirements for accuracy, the movement speed is relatively slow, which may become a bottleneck in some scenarios with high requirements for production efficiency; when integrated with other automated production equipment, compatibility issues may be encountered, and its complex control signals and interface requirements make system integration more difficult; the software control system is not flexible enough when facing special alignment modes or irregular workpiece shapes, making it difficult to achieve precise alignment operations; it has high requirements for the working environment, and harsh environments may affect precision components, resulting in reduced accuracy or failures. Summary of the invention
[0004] Technical issues solved
[0005] In view of the deficiencies in the prior art, the present invention provides a multi-purpose wafer fixture, which solves the problem that the wafer structure can only be simply clamped in one direction and solves the problem that the wafer structure is difficult to move in multiple directions.
[0006] Technical Solution
[0007] To achieve the above objectives, the present invention is implemented through the following technical solutions: a multi-purpose wafer fixture, comprising a base, an XY-axis motion mechanism is arranged on the upper end of the base, an R-axis rotating table is arranged on the upper end of the XY-axis motion mechanism, an R-axis guide seat is fixedly connected to the upper end of the R-axis rotating table, a plurality of first clamp seats and a second clamp seat are respectively fixedly connected to the upper end of the R-axis rotating table, the second clamp seat is arranged directly opposite the R-axis guide seat, the first clamp seat and the second clamp seat both include a pressure claw and a top claw, and two supporting claws are symmetrically installed on both sides of the second clamp seat, the pressure claw, the top claw and the supporting claw are connected by a connecting rod mechanism, and a wafer structure is arranged between the pressure claw, the top claw and the supporting claw.
[0008] Preferably, the XY-axis motion mechanism includes an X-axis motion mechanism body and a Y-axis motion mechanism body, the Y-axis motion mechanism body includes a base, a Y-axis guide rail, a Y-axis motion platform and a Y-axis drive disk, the base of the Y-axis motion mechanism body is fixedly connected to the base, and the X-axis motion mechanism body includes an X-axis guide rail, an X-axis motion platform and an X-axis drive disk.
[0009] Preferably, the Y-axis motion platform and the X-axis motion platform are both provided with a first grating ruler, and the base and the Y-axis motion platform are both fixedly connected with a first grating reading head.
[0010] Preferably, the base, X-axis motion platform, Y-axis motion platform, pedestal and R-axis rotating table are all hollow structures, and the X-axis driving disk and the Y-axis driving disk are respectively arranged on the outside of the X-axis motion platform and the Y-axis motion platform.
[0011] Preferably, a connecting frame is provided on one side of the X-axis driving disk and the Y-axis driving disk, a first photoelectric sensor is provided on the connecting frame, and first sensing baffles are correspondingly provided on the X-axis motion platform and the Y-axis motion platform, and the first sensing baffles cooperate with the first photoelectric sensor.
[0012] Preferably, a rotating mechanism is provided at the lower end of the R-axis rotating table, and the rotating mechanism includes a stator, a mover, and a fixed plate. The stator is mounted on the fixed plate and fixedly connected to the XY-axis motion mechanism, and the mover is fixedly connected to the R-axis rotating table.
[0013] Preferably, a second grating reading head and a second photoelectric sensor are fixedly provided on the fixed plate, and a second grating scale and a second induction baffle are correspondingly provided on the mover.
[0014] Preferably, the upper ends of the first clamp seat and the second clamp seat are slidably connected to a fixed frame, the other end of the fixed frame is provided with a cylinder, the connecting rod mechanism includes a first rotor connected to the pressure claw, a second rotor connected to the pressure claw and the top claw, a connecting block connecting the pressure claw and the top claw, and a third rotor and a fourth rotor connected to the leaning claw; a fixed block is also provided on the fixed frame, the first rotor and the fourth rotor are arranged on the fixed block, the output end of the cylinder is connected to the movable block, and the second rotor and the third rotor are arranged on the movable block.
[0015] Preferably, a limiting rod is fixedly provided on the fixing frame, and a strip-shaped through hole is correspondingly provided on the movable block.
[0016] Beneficial Effects
[0017] The present invention provides a multi-purpose wafer fixture having the following beneficial effects:
[0018] 1. A plurality of first clamp seats and second clamp seats are evenly and fixedly connected to the upper end of the R-axis rotating table. The first clamp seat and the second clamp seat both include a cylinder, a pressure claw, and a top claw. There are also supporting claws on both sides of the second clamp seat. The first rotor is fixedly connected inside the pressure claw, and the second rotor is fixedly connected inside the top claw. One side of the output end of the cylinder is fixedly connected to the movable block, so that it can clamp and fix the wafer in three directions. The pressure claw, the top claw and the supporting claw are connected by a connecting rod mechanism, so that they work together according to a certain rule to realize wafer lifting, positioning and clamping. The connecting rod mechanism simplifies the mechanical structure, reduces costs, and improves reliability.
[0019] 2. The XY-axis motion mechanism includes an X-axis motion mechanism body and a Y-axis motion mechanism body. The Y-axis motion mechanism body includes a base, a Y-axis guide rail, a Y-axis motion platform and a Y-axis drive disk. The X-axis motion mechanism body includes an X-axis guide rail, an X-axis motion platform and an X-axis drive disk. The XY-axis motion mechanism is provided with an X-axis drive disk and a Y-axis drive disk on both sides. Guide rails are provided on one side of the X-axis drive disk and the Y-axis drive disk. A connecting frame is slidably connected to the guide rails, so that it can move the upper wafer structure in the X-axis, Y-axis and R-axis directions. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] Figure 1 A perspective view of the present invention;
[0021] Figure 2 It is a schematic diagram of the structure of the X-axis driving disk and the Y-axis driving disk of the present invention;
[0022] Figure 3 It is a structural schematic diagram of the first clamp seat of the present invention;
[0023] Figure 4 It is a front view of the present invention;
[0024] Figure 5 It is a structural schematic diagram of the first grating ruler and the first grating reading head of the present invention;
[0025] Figure 6 A top view of the present invention;
[0026] Figure 7 For the present invention Figure 2 The enlarged view of point A in the middle;
[0027] Figure 8 For the present invention Figure 2 The enlarged view of point B in the middle;
[0028] Fig. 9 For the present invention Figure 2 Enlarged view of point C in the middle.
[0029] Among them, 1. base; 2. X-axis drive disk; 3. Y-axis drive disk; 301. connecting frame; 302. first grating ruler; 3021. first grating reading head; 4. R-axis rotating table; 401. R-axis guide seat; 402. XY-axis motion mechanism; 403. wafer structure; 5. first fixture seat; 501. fixing frame; 5011. connecting block; 502. pressing claw; 5021. first rotor; 503. top claw; 5031. second rotor; 5032. movable block; 504. cylinder; 6. rotating mechanism; 601. stator; 602. moving sub; 603, fixed plate; 7, first photoelectric sensor; 8, first induction baffle; 9, second fixture seat; 901, claw; 902, third rotor; 903, fourth rotor; 904, fixed block; 10, X-axis motion mechanism body; 101, X-axis guide rail; 102, X-axis motion platform; 11, Y-axis motion mechanism body; 111, base; 112, Y-axis guide rail; 113, Y-axis motion platform; 12, limit rod; 13, second grating ruler; 14, second grating reading head; 15, second photoelectric sensor; 16, second induction baffle. DETAILED DESCRIPTION
[0030] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.
[0031] Example:
[0032] like Figure 1-9As shown, an embodiment of the present invention provides a multi-purpose wafer fixture, including a base 1, an XY-axis motion mechanism 402 is arranged on the upper end of the base 1, an R-axis rotating table 4 is arranged on the upper end of the XY-axis motion mechanism 402, an R-axis rotating table 4 is fixedly connected to the upper end of the R-axis guide seat 401, a plurality of first clamp seats 5 and a second clamp seat 9 are respectively fixedly connected to the upper end of the R-axis rotating table 4, the second clamp seat 9 is arranged directly opposite to the R-axis guide seat 401, the first clamp seat 5 and the second clamp seat 9 both include a pressure claw 502 and a top claw 503, two supporting claws 901 are symmetrically installed on both sides of the second clamp seat 9, the supporting claws 901 can clamp the wafer structure 403, the pressure claw 502, the top claw 503 and the supporting claw 901 are connected by a connecting rod mechanism, and the wafer structure 403 is arranged between the pressure claw 502 and the top claw 503 and the supporting claw 901.
[0033] The XY-axis motion mechanism 402 includes an X-axis motion mechanism body 10 and a Y-axis motion mechanism body 11. The Y-axis motion mechanism body 11 includes a base 111, a Y-axis guide rail 112, a Y-axis motion platform 113 and a Y-axis driving disk 3. The base 111 of the Y-axis motion mechanism body 11 is fixedly connected to the base 1. The Y-axis driving disk 3 can drive the Y-axis motion platform 113 to move along the direction of the Y-axis guide rail 112. The X-axis motion mechanism body 10 includes an X-axis guide rail 101, an X-axis motion platform 102 and an X-axis driving disk 2. The X-axis driving disk 2 can drive the X-axis motion platform 102 to move along the direction of the X-axis guide rail 101.
[0034] A first grating ruler 302 is provided on both the Y-axis motion platform 113 and the X-axis motion platform 102, and a first grating reading head 3021 is fixedly connected to the base 111 and the Y-axis motion platform 113. The first grating ruler 302 cooperates with the first grating reading head 3021 for measurement and is used to obtain displacement data of the X-axis motion platform 102 and the Y-axis motion platform 113.
[0035] The base 1, the X-axis motion platform 102, the Y-axis motion platform 113, the pedestal 111 and the R-axis rotating table 4 are all hollow structures, and the X-axis driving disk 2 and the Y-axis driving disk 3 are respectively arranged on the outside of the X-axis motion platform 102 and the Y-axis motion platform 113.
[0036] A connecting frame 301 is provided on one side of the X-axis driving disk 2 and the Y-axis driving disk 3, and a first photoelectric sensor 7 is provided on the connecting frame 301. First sensing baffles 8 are correspondingly provided on the X-axis motion platform 102 and the Y-axis motion platform 113. The first sensing baffles 8 are inductively matched with the first photoelectric sensor 7, and the first sensing baffles 8 are inductively matched with the first photoelectric sensor 7 to detect the motion positions of the X-axis motion platform 102 and the Y-axis motion platform 113.
[0037] A rotating mechanism 6 is arranged at the lower end of the R-axis rotating table 4, and the rotating mechanism 6 includes a stator 601, a mover 602, and a fixed plate 603. The stator 601 is mounted on the fixed plate 603 and fixedly connected to the XY-axis motion mechanism 402. The mover 602 is fixedly connected to the R-axis rotating table 4. The rotating mechanism 6 is a prior art mechanism. The R-axis rotating table 4 also includes a supporting table. The supporting table is a hollow structure. A plurality of air holes are arranged at the contact position between the supporting table and the wafer to be inspected. The air holes are connected to the vacuum suction component for adsorbing and fixing the wafer to be inspected.
[0038] A second grating reading head 14 and a second photoelectric sensor 15 are fixedly provided on the fixed plate 603 , and a second grating scale 13 and a second induction baffle 16 are correspondingly provided on the mover 602 .
[0039] The upper ends of the first clamp seat 5 and the second clamp seat 9 are slidably connected to a fixing frame 501, and the other end of the fixing frame 501 is provided with a cylinder 504. The connecting rod mechanism includes a first rotor 5021 connected to the pressure claw 502, a second rotor 5031 connected to the pressure claw 502 and the top claw 503, a connecting block 5011 connected to the pressure claw 502 and the top claw 503, and a third rotor 902 and a fourth rotor 903 connected to the support claw 901. The pressure claw 502 can move downward to press the wafer structure 403 through the connecting block 5011. The fixing frame 501 A fixed block 904 is also provided on it, the first rotor 5021 and the fourth rotor 903 are arranged on the fixed block 904, the output end of the cylinder 504 is connected to the movable block 5032, the second rotor 5031 and the third rotor 902 are arranged on the movable block 5032, the second rotor 5031 enables the top claw 503 to rotate, the top claw 503 and the pressure claw 502 are fixedly connected by the connecting block 5011, so that the pressure claw 502 rotates around the first rotor 5021, and the cylinder 504 is a prior art structure, which can push the movable block 5032 on one side to swing.
[0040] A limiting rod 12 is fixedly provided on the fixing frame 501 , and a strip-shaped through hole is correspondingly provided on the movable block 5032 . The limiting rod 12 is arranged in the strip-shaped through hole to limit the movable range of the movable block 5032 .
[0041] Working principle: Figure 1As shown, two first clamp seats 5 and one second clamp seat 9 are evenly and fixedly connected to the upper end of the R-axis rotating table 4. The first clamp seat 5 and the second clamp seat 9 both include a cylinder 504, a pressure claw 502, and a top claw 503. The second clamp seat 9 is also provided with support claws 901 on both sides. When the wafer is fed, the output end of the cylinder 504 is in an extended state, at which time the top claw 503 is in a lifted state, the pressure claw 502 is in a lifted state, and the support claw 901 is in a flat state, and the wafer structure 403 is placed on the R-axis rotating table 4, above the top claw 503, and then the output end of the cylinder 504 begins to retract, at which time the support claw 901 horizontally pushes the wafer structure 403 to the R-axis guide seat 401, and driven by the connecting rod mechanism, the top claw 503 synchronously descends, and the pressure claw 502 is pressed down synchronously until the wafer structure 403 is blocked by the R-axis guide seat 401, and the three pressure claws 502 completely press the wafer structure 403, so that it can clamp and fix the wafer structure 403 in three directions, and the X-axis driving disk 2 and the Y-axis driving disk 3 are respectively arranged on both sides of the XY-axis motion mechanism 402, The X-axis guide rail 101 and the Y-axis guide rail 112 are arranged on one side of the axis driving disk 2 and the Y-axis driving disk 3, so that the upper wafer structure 403 can be moved in the X-axis, Y-axis and R-axis directions, and can achieve better results: large travel range, 360-degree unlimited rotation, and a travel to platform thickness ratio of about 2:1. Compared with the UVW platform, it has the advantages of larger travel range, higher travel accuracy, wider rotation angle range and higher angle accuracy, and can meet the needs of higher-end wafer processing; the structural design is more stable and reliable, which can effectively reduce vibration and deformation, and remain stable under high-speed movement and frequent start and stop; the multi-axis collaborative working ability is stronger, the control system is more advanced, and it can realize complex motion trajectories and operations, improve efficiency and flexibility; it can adapt to more wafers of different sizes and shapes, such as Ri ng Wafer / Frame Wafer / Base Wafer, with higher versatility and flexibility; the platform has a high torque output drive system and good precision retention ability, and has a stronger load capacity than the UVW platform; it has better compatibility, adopts standardized interfaces and communication protocols, and can be seamlessly connected with a variety of devices; the operation interface is more intelligent, simple and intuitive, easy to operate, and has rich fault diagnosis and alarm functions; the structure is easy to maintain, the parts are easy to disassemble and replace, and there are remote monitoring and diagnosis functions to reduce downtime.
[0042] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.
Claims
1. A multi-purpose wafer fixture, comprising a base (1), characterized in that: The upper end of the base (1) is provided with an XY axis motion mechanism (402), the upper end of the XY axis motion mechanism (402) is provided with an R axis rotating table (4), the upper end of the R axis rotating table (4) is fixedly connected with an R axis guide seat (401), the upper end of the R axis rotating table (4) is respectively fixedly connected with a plurality of first clamp seats (5) and a second clamp seat (9), the second clamp seat (9) is arranged directly opposite to the R axis guide seat (401), the first clamp seat (5) and the second clamp seat (9) both include a pressure claw (502) and a top claw (503), two supporting claws (901) are symmetrically installed on both sides of the second clamp seat (9), the pressure claw (502), the top claw (503) and the supporting claw (901) are connected by a connecting rod mechanism, and a wafer structure (403) is arranged between the pressure claw (502), the top claw (503) and the supporting claw (901).
2. The multi-purpose wafer fixture according to claim 1, characterized in that: The XY-axis motion mechanism (402) comprises an X-axis motion mechanism body (10) and a Y-axis motion mechanism body (11); the Y-axis motion mechanism body (11) comprises a base (111), a Y-axis guide rail (112), a Y-axis motion platform (113) and a Y-axis drive disk (3); the base (111) of the Y-axis motion mechanism body (11) is fixedly connected to the base (1); and the X-axis motion mechanism body (10) comprises an X-axis guide rail (101), an X-axis motion platform (102) and an X-axis drive disk (2).
3. The multi-purpose wafer fixture according to claim 2, characterized in that: The Y-axis motion platform (113) and the X-axis motion platform (102) are both provided with a first grating ruler (302), and the base (111) and the Y-axis motion platform (113) are both fixedly connected with a first grating reading head (3021).
4. A multi-purpose wafer fixture according to claim 2 or 3, characterized in that: The base (1), the X-axis motion platform (102), the Y-axis motion platform (113), the pedestal (111) and the R-axis rotating table (4) are all hollow structures, and the X-axis driving disk (2) and the Y-axis driving disk (3) are respectively arranged on the outside of the X-axis motion platform (102) and the Y-axis motion platform (113).
5. The multi-purpose wafer fixture according to claim 4, characterized in that: A connecting frame (301) is provided on one side of the X-axis driving disk (2) and the Y-axis driving disk (3), a first photoelectric sensor (7) is provided on the connecting frame (301), and a first sensing baffle (8) is provided on the X-axis motion platform (102) and the Y-axis motion platform (113) respectively, the first sensing baffle (8) and the first photoelectric sensor (7) are inductively matched.
6. The multi-purpose wafer fixture according to claim 1, characterized in that: A rotating mechanism (6) is provided at the lower end of the R-axis rotating table (4), and the rotating mechanism (6) comprises a stator (601), a mover (602), and a fixed plate (603); the stator (601) is mounted on the fixed plate (603) and fixedly connected to the XY-axis motion mechanism (402); and the mover (602) is fixedly connected to the R-axis rotating table (4).
7. The multi-purpose wafer fixture according to claim 6, characterized in that: A second grating reading head (14) and a second photoelectric sensor (15) are fixedly provided on the fixed plate (603), and a second grating ruler (13) and a second sensing baffle (16) are correspondingly provided on the mover (602).
8. The multi-purpose wafer fixture according to claim 1, characterized in that: The upper ends of the first clamp seat (5) and the second clamp seat (9) are slidably connected to a fixed frame (501), the other end of the fixed frame (501) is provided with a cylinder (504), the connecting rod mechanism comprises a first rotor (5021) connected to the pressure claw (502), a second rotor (5031) connected to the pressure claw (502) and the top claw (503), a connecting block (5011) connected to the pressure claw (502) and the top claw (503), and a third rotor (902) and a fourth rotor (903) connected to the leaning claw (901); the fixed frame (501) is also provided with a fixed block (904), the first rotor (5021) and the fourth rotor (903) are arranged on the fixed block (904), the output end of the cylinder (504) is connected to the movable block (5032), and the second rotor (5031) and the third rotor (902) are arranged on the movable block (5032).
9. The multi-purpose wafer fixture according to claim 8, characterized in that: A limiting rod (12) is fixedly provided on the fixed frame (501), and a strip-shaped through hole is correspondingly provided on the movable block (5032).