Stainless steel tray
By forming a multi-layer structure of metal Cr layer, CrC layer and Cr/Ag/DLC layer on the stainless steel pallet, the serious bacterial contamination on the surface of the existing stainless steel bearing disc is solved, and the good sterilization and wear resistance of the pallet is achieved, reducing the need for regular disinfection.
Patent Information
- Application Number
- CN202311628605.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2023-11-30
- Publication Date
- 2025-05-30
AI Technical Summary
The surface of stainless steel bearing disks used in the existing medical industry is more bacterial, which is seriously polluted, and the traditional regular disinfection method is inefficient, which wastes time and cannot thoroughly clean up the bacteria produced during use.
Magneto-controlled sputtering ion plating technology is used to form metal Cr layer, CrC layer and Cr/Ag/DLC layer on the stainless steel pallet in sequence to form a multi-layer structure, so that the pallet has good sterilization properties.
The multi-layer structure is formed on the surface of the stainless steel pallet, which significantly improves its sterilization performance in actual use, reduces the dependence on regular disinfection, and extends the service life of the pallet.
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Figure CN120060796A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the field of coating technology, and particularly to a stainless steel tray. Background Art
[0002] Currently, the carrier trays used in the existing medical industry are mostly made of stainless steel materials, and there are many bacteria on their surfaces, with relatively serious pollution. The traditional solution is to perform regular disinfection treatment on the carrier trays. However, this method is inefficient, time-consuming, not thoroughly cleaned, and requires a large amount of consumables, especially it cannot clean the bacteria generated at any time during use. Summary of the Invention
[0003] An embodiment of the present invention provides a stainless steel tray to address the deficiencies in the prior art, including a stainless steel tray body, a bonding layer, a transition layer, and a first composite layer;
[0004] The bonding layer is a metal Cr layer, and its forming step includes: using a Cr target as the target, and depositing it on the stainless steel tray body by magnetron sputtering ion plating;
[0005] The transition layer is a CrC layer, and its forming step includes: using a Cr target and a planar C target as the targets, and depositing it on the bonding layer by magnetron sputtering ion plating;
[0006] The first composite layer is a Cr / Ag / DLC layer, and its forming step includes: using a Cr target, an Ag target, and a C target as the targets, and depositing it on the transition layer by magnetron sputtering ion plating.
[0007] As a preferred solution, the thickness of the bonding layer is 2 - 4 μm.
[0008] As a preferred solution, the thickness of the transition layer is 4 - 6 μm.
[0009] As a preferred solution, the thickness of the first composite layer is 15 - 20 μm.
[0010] As a preferred solution, in the forming step of the bonding layer, evacuate to a vacuum degree above 1.0×10 -3 Pa, then introduce argon gas, control the gas pressure at 0.5 - 2.0 pa, the Cr target current is 1.5 A, the bias voltage is 100 - 120 V, and the bias voltage frequency is 180 - 200 kHz.
[0011] As a preferred solution, the forming step of the transition layer specifically includes:
[0012] After the bonding layer is prepared, keep the vacuum degree unchanged, control the column arc current of the column arc Cr target at 1.5 A and the bias voltage at 120 - 150 V, turn on the control power supply of the planar C target, and adjust the power of the planar C target to 20 KW to form the transition layer on the bonding layer.
[0013] As a preferred solution, in the formation step of the first composite layer, evacuate to a vacuum degree above 1.2×10 -3 Pa, then introduce nitrogen, control the air pressure at 0.5 - 1.0 pa, and co-sputter using the Cr target, Ag target, and C target. The Cr target current is 2.0 A, the Ag target current is 1.0 A, the C target current is 2.5 A, the bias voltage is 120 - 160 V, and the bias voltage frequency is 150 kHz.
[0014] As a preferred solution, the stainless steel tray further includes an Ag layer and a second composite layer, and the first composite layer is the same as the second composite layer; the Ag layer is connected between the first composite layer and the second composite layer.
[0015] Compared with the prior art, the beneficial effects of the embodiments of the present invention are as follows: The embodiments of the present invention provide a stainless steel tray, which includes a stainless steel tray body, a bonding layer, a transition layer, and a first composite layer. Among them, the bonding layer is a metal Cr layer, which is deposited on the stainless steel tray body by magnetron sputtering ion plating using a Cr target as the target; the transition layer is a CrC layer, which is deposited on the bonding layer by magnetron sputtering ion plating using a Cr target and a planar C target as the targets; the first composite layer is a Cr / Ag / DLC layer, which is deposited on the transition layer by magnetron sputtering ion plating using a Cr target, an Ag target, and a C target as the targets. In this way, a bonding layer composed of a metal Cr layer, a transition layer composed of a CrC layer, and a first composite layer composed of a Cr / Ag / DLC layer are sequentially formed on the stainless steel tray body, so that the stainless steel tray has good sterilization performance during actual use. BRIEF DESCRIPTION OF THE DRAWINGS
[0016] Figure 1 is a schematic structural diagram of the stainless steel tray in the embodiment of the present invention. DETAILED DESCRIPTION OF THE EMBODIMENTS
[0017] Next, the technical solutions in the embodiments of the present invention will be clearly and completely described in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without making creative efforts belong to the scope of protection of the present invention.
[0018] Please refer to Figure 1 , which is a schematic structural diagram of the stainless steel tray in the embodiment of the present invention.
[0019] The stainless-steel tray in the embodiment of the present invention includes a stainless-steel tray body, a bonding layer, a transition layer, and a first composite layer;
[0020] The bonding layer is a metal Cr layer, and its forming step includes: using a Cr target as the target and depositing it on the stainless-steel tray body by magnetron sputtering ion plating;
[0021] The transition layer is a CrC layer, and its forming step includes: using a Cr target and a planar C target as the targets and depositing it on the bonding layer by magnetron sputtering ion plating;
[0022] The first composite layer is a Cr / Ag / DLC layer, and its forming step includes: using a Cr target, an Ag target, and a C target as the targets and depositing it on the transition layer by magnetron sputtering ion plating.
[0023] In the embodiment of the present invention, the stainless-steel tray includes a stainless-steel tray body, a bonding layer, a transition layer, and a first composite layer. Among them, the bonding layer is a metal Cr layer, which uses a Cr target as the target and is deposited on the stainless-steel tray body by magnetron sputtering ion plating; the transition layer is a CrC layer, which uses a Cr target and a planar C target as the targets and is deposited on the bonding layer by magnetron sputtering ion plating; the first composite layer is a Cr / Ag / DLC layer, which uses a Cr target, an Ag target, and a C target as the targets and is deposited on the transition layer by magnetron sputtering ion plating. In this way, a bonding layer composed of a metal Cr layer, a transition layer composed of a CrC layer, and a first composite layer composed of a Cr / Ag / DLC layer are sequentially formed on the stainless-steel tray body, so that the stainless-steel tray has good sterilization performance during actual use.
[0024] In an alternative embodiment, the thickness of the bonding layer is 2 - 4 μm, for example, it can be 2 μm, 2.1 μm, 2.2 μm, 2.3 μm, 2.4 μm, 2.5 μm, 2.6 μm, 2.7 μm, 2.8 μm, 2.9 μm, 3 μm, 3.1 μm, 3.2 μm, 3.3 μm, 3.4 μm, 3.5 μm, 3.6 μm, 3.7 μm, 3.8 μm, 3.9 μm, 4 μm, etc. Of course, the thickness of the bonding layer can also be set according to actual use requirements, and no more details will be elaborated here. The bonding layer can be firmly connected to the stainless-steel tray body, so that the subsequent transition layer and the first composite layer can be firmly arranged on the stainless-steel tray body.
[0025] In an alternative embodiment, the thickness of the transition layer is 4 - 6 μm, for example, it can be 4 μm, 4.1 μm, 4.2 μm, 4.3 μm, 4.4 μm, 4.5 μm, 4.6 μm, 4.7 μm, 4.8 μm, 4.9 μm, 5 μm, 5.1 μm, 5.2 μm, 5.3 μm, 5.4 μm, 5.5 μm, 5.6 μm, 5.7 μm, 5.8 μm, 5.9 μm, 6 μm, etc. Of course, the thickness of the transition layer can also be set according to actual usage requirements and will not be elaborated further here. The transition layer is disposed between the bonding layer and the first composite layer to firmly connect the bonding layer and the first composite layer together.
[0026] In this embodiment, the first composite layer is a Cr / Ag / DLC layer, specifically referring to a layer formed by doping Cr, Ag, and DLC. In an alternative embodiment, the thickness of the first composite layer is 15 - 20 μm, for example, it can be 15 μm, 15.3 μm, 15.6 μm, 15.8 μm, 16 μm, 16.2 μm, 16.5 μm, 16.8 μm, 17 μm, 17.3 μm, 17.5 μm, 17.8 μm, 18 μm, 18.2 μm, 18.5 μm, 18.8 μm, 19 μm, 19.2 μm, 19.5 μm, 19.8 μm, 20 μm, etc. Of course, the thickness of the first composite layer can also be set according to actual usage requirements and will not be elaborated further here. The first composite layer contains Ag, and Ag has excellent bactericidal properties, enabling the stainless - steel tray to have bactericidal properties. Especially when the stainless - steel tray is used in a medical environment, it can conveniently clean the bacteria generated during use at any time, avoiding frequent dedicated regular disinfection treatments. In addition, the first composite layer formed by co - sputtering of Ag, Cr, and DLC targets also has good wear - resistant properties, which can extend the service life of the stainless - steel tray.
[0027] In an alternative embodiment, in the step of forming the bonding layer, the vacuum is pumped to a vacuum degree above 1.0×10 -3 Pa, and then argon (with a purity of 99.99% for example) is introduced, the air pressure is controlled at 0.5 - 2.0 pa, the Cr target current is 1.5 A, the bias voltage is 100 - 120 V, and the bias voltage frequency is 180 - 200 kHz.
[0028] The bonding layer formed in this embodiment has good adhesion and good toughness, ensuring that the bonding layer is firmly connected between the stainless - steel tray and the transition layer.
[0029] In an alternative embodiment, the step of forming the transition layer specifically includes:
[0030] After the formation of the bonding layer, while keeping the vacuum degree unchanged, control the column arc current of the column arc Cr target to be 1.5 A and the bias voltage to be 120 - 150 V, turn on the control power supply of the planar C target, and adjust the power of the planar C target to 20 KW to form the transition layer on the bonding layer.
[0031] The transition layer formed in this embodiment ensures the connection reliability between the bonding layer and the first composite layer.
[0032] In an alternative embodiment, in the formation step of the first composite layer, evacuate to a vacuum degree above 1.2×10 -3 Pa, then introduce nitrogen (with a purity of 99.99% for example), control the air pressure to be 0.5 - 1.0 pa, and co-sputter using a Cr target, an Ag target, and a C target. The Cr target current is 2.0 A, the Ag target current is 1.0 A, the C target current is 2.5 A, the bias voltage is 120 - 160 V, and the bias voltage frequency is 150 kHz.
[0033] In this embodiment, co-sputtering is performed using a Cr target, an Ag target, and a C target, and the Cr target current is controlled to be 2.0 A, the Ag target current is controlled to be 1.0 A, and the C target current is controlled to be 2.5 A. That is, the C target current is slightly higher than the Cr target current, and the Cr target current is slightly higher than the Ag target current, so that the DLC deposition rate is higher than that of Cr, and the deposition rate of Cr is higher than that of Ag. In the Cr / Ag / DLC first composite layer formed in this way, the content of DLC is greater than the content of Cr, and the content of Cr is greater than the content of Ag, ensuring that the first composite layer has good bactericidal performance and wear resistance. In addition, the Cr in the first composite layer makes the surface of the stainless steel tray have good corrosion resistance, and the DLC layer in the first composite layer makes the surface of the stainless steel tray have good wear resistance. In this way, Ag can be gradually released to the surface of the stainless steel tray during use, avoiding the complete consumption of Ag in a short time, and thus being able to extend the bactericidal ability of the stainless steel tray.
[0034] In an alternative embodiment, the stainless steel tray further includes an Ag layer and a second composite layer. The first composite layer is the same as the second composite layer, that is, the second composite layer is also a Cr / Ag / DLC layer, and its formation step is the same as that of the first composite layer; the Ag layer is connected between the first composite layer and the second composite layer.
[0035] In this embodiment, by setting a three-layer sandwich structure of the first composite layer, the Ag layer, and the second composite layer, during use, the Ag layer can slowly diffuse into the first composite layer and the second composite layer, avoiding the complete consumption of Ag in a short time, and thus further extending the bactericidal performance of the stainless steel tray.
[0036] Compared with the prior art, the beneficial effects of the embodiments of the present invention are as follows: The embodiments of the present invention provide a stainless steel tray, which includes a stainless steel tray body, a bonding layer, a transition layer, and a first composite layer. Among them, the bonding layer is a metal Cr layer, which is deposited on the stainless steel tray body by magnetron sputtering ion plating with a Cr target as the target; the transition layer is a CrC layer, which is deposited on the bonding layer by magnetron sputtering ion plating with a Cr target and a planar C target as the targets; the first composite layer is a Cr / Ag / DLC layer, which is deposited on the transition layer by magnetron sputtering ion plating with a Cr target, an Ag target, and a C target as the targets. In this way, a bonding layer composed of a metal Cr layer, a transition layer composed of a CrC layer, and a first composite layer composed of a Cr / Ag / DLC layer are sequentially formed on the stainless steel tray body, so that the stainless steel tray has good sterilization performance during actual use.
[0037] The above are only the preferred embodiments of the present invention. It should be noted that for those of ordinary skill in the art, without departing from the technical principle of the present invention, several improvements and replacements can be made, and these improvements and replacements should also be regarded as the protection scope of the present invention.
Claims
1. A stainless steel tray, characterized in that, it comprises a stainless steel tray body, a bonding layer, a transition layer and a first composite layer; the bonding layer is a metal Cr layer, and its forming step includes: using a Cr target as the target, and depositing it on the stainless steel tray body by magnetron sputtering ion plating; the transition layer is a CrC layer, and its forming step includes: using a Cr target and a planar C target as the targets, and depositing it on the bonding layer by magnetron sputtering ion plating; the first composite layer is a Cr / Ag / DLC layer, and its forming step includes: using a Cr target, an Ag target and a C target as the targets, and depositing it on the transition layer by magnetron sputtering ion plating.
2. The stainless steel tray according to claim 1, characterized in that, the thickness of the bonding layer is 2 - 4 μm.
3. The stainless steel tray according to claim 1, characterized in that, the thickness of the transition layer is 4 - 6 μm.
4. The stainless steel tray according to claim 1, characterized in that, the thickness of the first composite layer is 15 - 20 μm.
5. The stainless steel tray according to claim 1, characterized in that, In the step of forming the bonding layer, evacuate to a vacuum degree of more than 1.0×10 -3 Pa, then introduce argon gas, control the air pressure at 0.5 - 2.0 Pa, the Cr target current is 1.5 A, the bias voltage is 100 - 120 V, and the bias voltage frequency is 180 - 200 kHz.
6. The stainless steel tray according to claim 1, characterized in that, the forming step of the transition layer specifically includes: after the bonding layer is prepared, keeping the vacuum degree unchanged, controlling the column arc current of the column arc Cr target to be 1.5 A and the bias voltage to be 120 - 150 V, turning on the control power supply of the planar C target, and adjusting the power of the planar C target to 20 KW to form the transition layer on the bonding layer.
7. The stainless steel tray according to claim 1, characterized in that, In the formation step of the first composite layer, evacuate to a vacuum degree of more than 1.2×10 -3 Pa, and then introduce nitrogen gas with the air pressure controlled at 0.5 - 1.0 Pa. Co-sputter using a Cr target, an Ag target, and a C target. The current of the Cr target is 2.0 A, the current of the Ag target is 1.0 A, the current of the C target is 2.5 A, the bias voltage is 120 - 160 V, and the bias voltage frequency is 150 kHz.
8. The stainless steel tray according to any one of claims 1 - 7, characterized in that, the stainless steel tray further comprises an Ag layer and a second composite layer, and the first composite layer is the same as the second composite layer; the Ag layer is connected between the first composite layer and the second composite layer.