Composition for manicure base sheet, manicure base sheet and manicure sheet

Abstract

The invention provides a composition for a manicure film, the manicure film and a manicure film. The composition is prepared from the following components in parts by weight: 20 to 50 parts of copolymer, 40 to 70 parts of polymethyl methacrylate, 1 to 5 parts of methyl methacrylate and 3 to 7 parts of additive, wherein the copolymer is a combination of an acrylonitrile-butadiene-styrene copolymer and a styrene-acrylonitrile copolymer. By controlling the parts by weight of all the components in the composition of the manicure negative film to be within the range, the prepared manicure negative film not only has high transparency and good mechanical performance, but also can keep high retention rate and curing integrity when pressure-sensitive adhesive, solvent type glue and UV glue are used, and the manicure negative film has the advantages of being simple in preparation process, low in cost and good in application prospect. Therefore, the wearing comfort and matching performance are improved.

Description

Technical Field

[0001] The present invention relates to the technical field of nail pieces, and in particular, to a composition for a nail base film, a nail base film, and a nail piece. Background Art

[0002] Currently, nail pieces are mainly injection-molded from acrylonitrile-butadiene-styrene terpolymer (ABS) resin. The surface treatment method used in the production process is to form the required pattern or partial pattern on the surface of the nail piece by means of film, plate making, and pad printing. This method can achieve the product effect of mass production and can match pressure-sensitive adhesives and solvent-based glues for wearing. However, for the nail pieces prepared by this method, when matching UV glue for wearing, due to the limited transparency of the ABS resin, when customers use UV glue to wear the nail pieces, there will be defects such as low retention rate of the nail pieces or incomplete curing of the UV glue. In addition, the nail pieces in the prior art have the problem of low wear resistance. In view of the above problems, it is necessary to develop a nail piece with high transparency and good wear resistance, which can match any glue for wearing to meet the diverse wearing needs of customers. Summary of the Invention

[0003] The main object of the present invention is to provide a composition for a nail base film, a nail base film, and a nail piece, so as to solve the problems of low transparency and poor wear resistance of nail pieces in the prior art.

[0004] To achieve the above object, according to one aspect of the present invention, there is provided a composition for a nail base film. By weight, the composition includes: 20-50 parts of a copolymer, 40-70 parts of polymethyl methacrylate, 1-5 parts of methyl methacrylate, and 3-7 parts of an additive; wherein, the copolymer is a combination of acrylonitrile-butadiene-styrene copolymer and styrene-acrylonitrile copolymer.

[0005] Further, by weight, the above composition includes: 20-45 parts of a copolymer, 45-70 parts of polymethyl methacrylate, 3-5 parts of methyl methacrylate, and 4-6 parts of an additive.

[0006] Further, the ratio of the total mass of the acrylonitrile-butadiene-styrene copolymer and the styrene-acrylonitrile copolymer, the mass of the polymethyl methacrylate, and the mass of the methyl methacrylate is (30-40):(50-60):5.

[0007] Further, the mass ratio of the acrylonitrile-butadiene-styrene copolymer to the styrene-acrylonitrile copolymer is 1:(1-2); and / or, the weight-average molecular weight of the acrylonitrile-butadiene-styrene copolymer is 500-800 g / mol; and / or, the weight-average molecular weight of the styrene-acrylonitrile copolymer is 500-800 g / mol; and / or, the mass ratio of acrylonitrile, butadiene and styrene in the acrylonitrile-butadiene-styrene copolymer is (20-30):(5-20):(50-60); and / or, the mass ratio of styrene to acrylonitrile in the styrene-acrylonitrile copolymer is (60-70):(30-40).

[0008] Further, the transparency of the above-mentioned polymethyl methacrylate is 70%-80%; and / or, the weight-average molecular weight of the polymethyl methacrylate is 100-500 g / mol.

[0009] Further, the above-mentioned additive is selected from any one or more of a dispersant, a UV stabilizer, an adhesion promoter and a toughening agent.

[0010] Further, the weight parts of the above-mentioned dispersant are 0.2-0.5 parts; and / or, the weight parts of the UV stabilizer are 0.8-1.0 parts, preferably 0.9-1.0 parts; and / or, the weight parts of the adhesion promoter are 2.0-3.0 parts; and / or, the weight parts of the toughening agent are 0.5-1.7 parts.

[0011] According to another aspect of the present invention, a nail art negative film is provided, which is obtained by granulating and injection molding the aforementioned composition in sequence.

[0012] Further, the light transmittance of the above-mentioned nail art negative film is 40-50%.

[0013] According to yet another aspect of the present invention, a nail art piece is provided, which contains the aforementioned nail art negative film.

[0014] Applying the technical solution of the present application, the addition of polymethyl methacrylate helps to improve the transparency of the nail art negative film. Controlling the addition amount of polymethyl methacrylate to be higher than that of acrylonitrile-butadiene-styrene copolymer and styrene-acrylonitrile copolymer helps to make the nail art negative film have higher transparency, so as to be able to match the wearing of UV glue, enhancing the aesthetics and diversity. The addition of acrylonitrile-butadiene-styrene copolymer and styrene-acrylonitrile copolymer helps to provide good toughness and impact resistance for the nail art negative film, making the nail art piece not easy to break during use and improving its durability. The addition of methyl methacrylate helps to further enhance the mechanical strength of the nail art negative film, making it more solid during wearing and daily use. The addition of additives such as dispersants, UV stabilizers, adhesion promoters and toughening agents helps to improve the mixing uniformity, UV stability, ink adhesion and overall toughness of the nail art negative film, thus helping to improve the durability of the nail art piece under different environments and conditions. By controlling the weight parts of each component in the composition of the nail art negative film within the above range, it helps to make the prepared nail art negative film not only have high transparency and good mechanical properties, but also ensure high retention rate and curing integrity when using pressure-sensitive adhesives, solvent-based glues and UV glues, thereby improving the wearing comfort and matching. Detailed Embodiments

[0015] It should be noted that, without conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the embodiments.

[0016] As analyzed in the background art of the present application, there are problems of low transparency and poor wear resistance in nail art pieces in the prior art. To solve this problem, the present application provides a composition for a nail art negative film, a nail art negative film and a nail art piece.

[0017] In a typical embodiment of the present application, a composition for a nail art negative film is provided. Calculated by weight parts, the composition includes: 20-50 parts of copolymer, 40-70 parts of polymethyl methacrylate, 1-5 parts of methyl methacrylate and 3-7 parts of additives, wherein the copolymer is a combination of acrylonitrile-butadiene-styrene copolymer and styrene-acrylonitrile copolymer.

[0018] The addition of polymethyl methacrylate helps to improve the transparency of the nail base film. Controlling the addition amount of polymethyl methacrylate to be higher than that of acrylonitrile-butadiene-styrene copolymer and styrene-acrylonitrile copolymer helps to make the nail base film have higher transparency, so as to be able to match the wearing of UV glue and enhance the aesthetics and diversity. The addition of acrylonitrile-butadiene-styrene copolymer and styrene-acrylonitrile copolymer helps to provide good toughness and impact resistance for the nail base film, making the nail piece not easy to break during use and improving its durability. The addition of methyl methacrylate helps to further enhance the mechanical strength of the nail base film, making it more solid during wearing and daily use. The addition of additives such as dispersants, UV stabilizers, adhesion promoters and toughening agents helps to improve the mixing uniformity, UV stability, ink adhesion and overall toughness of the nail base film, thus helping to improve the durability of the nail piece under different environments and conditions. By controlling the weight parts of each component in the composition of the nail base film within the above range, it helps to make the prepared nail base film not only have high transparency and good mechanical properties, but also ensure high retention rate and curing integrity when using pressure-sensitive adhesives, solvent-based glues and UV glues, thereby enhancing the wearing comfort and matching performance.

[0019] In order to further improve the mutual synergistic effect between each component, so as to prepare a nail base film with higher transparency, stronger wear resistance and high comfort, in an embodiment of the present application, by weight, preferably the above composition includes: 20-45 parts of copolymer, 45-70 parts of polymethyl methacrylate, 3-5 parts of methyl methacrylate and 4-6 parts of additives.

[0020] In an embodiment of the present application, the mass ratio of the total mass of the acrylonitrile-butadiene-styrene copolymer and the styrene-acrylonitrile copolymer, the mass of the polymethyl methacrylate and the mass of the methyl methacrylate is (30-40):(50-60):5, specifically it can be 30:60:5, 32:58:5, 34:56:5, 36:54:5, 38:52:5, 40:50:5 and the range values between any two ratios.

[0021] Methyl methacrylate can not only improve the mechanical strength of the nail base film, but also interact with acrylonitrile-butadiene-styrene copolymer and styrene-acrylonitrile copolymer in the copolymer system to further improve the wear resistance and durability of the material. Controlling the mass ratio of the total mass of acrylonitrile-butadiene-styrene copolymer and styrene-acrylonitrile copolymer, the mass of polymethyl methacrylate and the mass of methyl methacrylate within the above range helps to improve the mutual synergistic effect between each component, thus helping to prepare a nail base film with higher transparency, wear resistance and chemical resistance.

[0022] In an embodiment of the present application, the mass ratio of the acrylonitrile-butadiene-styrene copolymer to the styrene-acrylonitrile copolymer is 1:(1 - 2), preferably 1:1.3 - 1.7, and specifically can be 1:1.3, 1:1.4, 1:1.5, 1:1.6, 1:1.7, and the range values between any two ratios; and / or, the weight-average molecular weight of the acrylonitrile-butadiene-styrene copolymer is 500 - 800 g / mol, specifically can be 500 g / mol, 600 g / mol, 700 g / mol, 800 g / mol, and the range values between any two values; and / or, the weight-average molecular weight of the styrene-acrylonitrile copolymer is 500 - 800 g / mol, specifically can be 500 g / mol, 600 g / mol, 700 g / mol, 800 g / mol, and the range values between any two values; and / or, the mass ratio of acrylonitrile, butadiene, and styrene in the acrylonitrile-butadiene-styrene copolymer is (20 - 30):(5 - 20):(50 - 60), preferably (23 - 27):(7 - 13):(53 - 57); and / or, the mass ratio of styrene to acrylonitrile in the styrene-acrylonitrile copolymer is (60 - 70):(30 - 40), preferably (63 - 67):(32 - 37).

[0023] The acrylonitrile-butadiene-styrene copolymer has excellent toughness, impact resistance, and processing properties, and the styrene-acrylonitrile copolymer has high rigidity, chemical resistance, and thermal stability. Controlling the mass ratio of the acrylonitrile-butadiene-styrene copolymer to the styrene-acrylonitrile copolymer within the above range helps the nail art negative film to be neither easily broken when worn nor maintain good shape stability and anti-deformation ability. A higher molecular weight means an increase in the viscosity of the material and a decrease in fluidity during processing, while a lower molecular weight may lead to a decrease in the mechanical properties of the material. Controlling the weight-average molecular weight of the acrylonitrile-butadiene-styrene copolymer and the styrene-acrylonitrile copolymer within the above range helps the material to have good fluidity during processing and sufficient mechanical strength, making the nail art negative film easy to form during the granulation and injection molding processes, and at the same time making the finished product have sufficient toughness and strength. By controlling the mass ratio of acrylonitrile, butadiene, and styrene in the acrylonitrile-butadiene-styrene copolymer within the above range, it helps to further improve the toughness, impact resistance, and processing properties of the acrylonitrile-butadiene-styrene copolymer. By controlling the mass ratio of styrene to acrylonitrile in the styrene-acrylonitrile copolymer within the above range, it helps to further improve the rigidity, chemical resistance, and thermal stability of the styrene-acrylonitrile copolymer.

[0024] In one embodiment of the present application, the transparency of the above-mentioned polymethyl methacrylate is 70% to 80%; and / or, the weight-average molecular weight of the polymethyl methacrylate is 100 to 500 g / mol, specifically, it can be 100 g / mol, 200 g / mol, 300 g / mol, 400 g / mol, 500 g / mol, and the range values between any two values.

[0025] Controlling the transparency of the polymethyl methacrylate within the above range helps to enhance the aesthetics and practicality of the nail art negative. The high-transparency polymethyl methacrylate helps the ultraviolet light to fully penetrate the nail art negative when using UV glue for wearing, promoting the curing of the UV glue and improving the retention rate of the nail art piece. The lower molecular weight can improve the fluidity and processability of the material, while the higher molecular weight can improve the mechanical strength and wear resistance of the material. By controlling the weight-average molecular weight of the polymethyl methacrylate within the above range, it helps the material to have good fluidity and formability during the injection molding and pelletizing processes. At the same time, the appropriate molecular weight also helps to provide sufficient strength and wear resistance for the nail art negative to cope with the friction and impact during wearing, and extend the service life of the nail art piece.

[0026] In one embodiment of the present application, the above-mentioned additive is selected from any one or more of a dispersant, a UV stabilizer, an adhesion promoter, and a toughening agent.

[0027] The presence of the dispersant helps to improve the processing fluidity, promote the compatibility between acrylonitrile-butadiene-styrene copolymer, styrene-acrylonitrile copolymer, and polymethyl methacrylate, and improve the dispersion uniformity among the components, thereby helping to improve the production efficiency and yield of the nail art negative. The addition of the UV stabilizer helps to improve the long-term stability and weather resistance of the nail art negative. Especially when used outdoors or under UV light sources, it helps to maintain its bright color and transparency and extend the service life of the nail art piece. The presence of the adhesion promoter helps the pattern and color to firmly adhere to the nail art negative, reducing the phenomenon of pattern peeling or wear during use, and thus helping to enhance the aesthetics and durability of the nail art piece. The addition of the toughening agent helps the nail art negative to better adapt to the bending and twisting of the nail, maintain its integrity, and provide a more comfortable and safer wearing experience.

[0028] In one embodiment of the present application, the weight parts of the above-mentioned dispersant are 0.2 to 0.5 parts; and / or, the weight parts of the UV stabilizer are 0.8 to 1.0 parts, preferably 0.9 to 1.0 parts; and / or, the weight parts of the adhesion promoter are 2.0 to 3.0 parts; and / or, the weight parts of the toughening agent are 0.5 to 1.7 parts.

[0029] By controlling the weight parts of the dispersant, UV stabilizer, adhesion promoter and toughening agent within the above ranges, it helps to improve the comprehensive performance of the nail base film, and further enhances the beauty, durability and processing adaptability of the nail base film.

[0030] The dispersant, UV stabilizer, adhesion promoter and toughening agent of the present application can be of common types on the market, including but not limited to, the dispersant is ethylene bisstearamide, purchased from BASF SE, brand: 4010; the UV stabilizer is a hindered amine light stabilizer, purchased from BASF SE, brand: TINUVIN770DF; the adhesion promoter is a modified polyester compound, purchased from Dongguan Yuanya New Materials Co., Ltd., brand: Y-102UV; the toughening agent is an acrylic acid methyl ester silicone copolymer, purchased from LG of South Korea, brand: EM538.

[0031] In an embodiment of the present application, the above composition includes: 40 parts of copolymer, 50 parts of polymethyl methacrylate, 5 parts of methyl methacrylate, 0.3 part of dispersant, 1.0 part of UV stabilizer, 3.0 parts of adhesion promoter and 0.7 part of toughening agent. Among them, the copolymer is a combination of acrylonitrile-butadiene-styrene copolymer and styrene-acrylonitrile copolymer. The mass ratio of acrylonitrile-butadiene-styrene copolymer to styrene-acrylonitrile copolymer is 1:1.5. The weight average molecular weight of acrylonitrile-butadiene-styrene copolymer is 700 g / mol, and the weight average molecular weight of styrene-acrylonitrile copolymer is 500 g / mol. The mass ratio of acrylonitrile, butadiene and styrene in acrylonitrile-butadiene-styrene copolymer is 25:10:55. The mass ratio of styrene to acrylonitrile in styrene-acrylonitrile copolymer is 65:35. The transparency of polymethyl methacrylate is 80%, and the weight average molecular weight of polymethyl methacrylate is 400 g / mol.

[0032] In one embodiment of the present application, the above composition comprises: 30 parts of a copolymer, 60 parts of polymethyl methacrylate, 5 parts of methyl methacrylate, 0.2 parts of a dispersant, 1.0 part of a UV stabilizer, 3.0 parts of an adhesion promoter, and 0.8 part of a toughening agent. Among them, the copolymer is a combination of acrylonitrile-butadiene-styrene copolymer and styrene-acrylonitrile copolymer. The mass ratio of acrylonitrile-butadiene-styrene copolymer to styrene-acrylonitrile copolymer is 1:1.5. The weight-average molecular weight of acrylonitrile-butadiene-styrene copolymer is 700 g / mol, and the weight-average molecular weight of styrene-acrylonitrile copolymer is 500 g / mol. The mass ratio of acrylonitrile, butadiene, and styrene in acrylonitrile-butadiene-styrene copolymer is 25:10:55. The mass ratio of styrene to acrylonitrile in styrene-acrylonitrile copolymer is 65:35. The transparency of polymethyl methacrylate is 80%, and the weight-average molecular weight of polymethyl methacrylate is 400 g / mol.

[0033] In another typical embodiment of the present application, a nail art negative film is provided, which is obtained by granulating and then injection-molding the aforementioned composition in sequence.

[0034] Since the above nail art negative film is obtained by granulating and then injection-molding the composition of the present application, the nail art negative film not only has high transparency and good mechanical properties, but also can maintain a high retention rate and curing integrity when using any type of glue (including pressure-sensitive glue, solvent-based glue, and UV glue).

[0035] In one embodiment of the present application, the light transmittance of the above nail art negative film is 40-50%.

[0036] The nail art negative film with the above light transmittance helps to improve the wide wearing range of nail art pieces, and is particularly suitable for wearing with ultraviolet light-curing glue.

[0037] In yet another typical embodiment of the present application, a nail art piece is provided, which contains the aforementioned nail art negative film.

[0038] The above nail art piece has high transparency, strong wear resistance, good ink adhesion, and a wide wearing range, and is particularly suitable for wearing with ultraviolet light-curing glue.

[0039] In one embodiment of the present application, the nail art negative film is subjected to pattern transfer, and finally a primer layer is sprayed on the transfer layer to obtain a nail art piece.

[0040] The beneficial effects of the present application will be further described below in conjunction with embodiments.

[0041] Examples 1-5, Comparative Examples 1-3

[0042] By weight parts, mix a mixture of acrylonitrile-butadiene-styrene copolymer and styrene-acrylonitrile copolymer, polymethyl methacrylate, methyl methacrylate and additives according to the weight parts in Table 1, and then carry out pelletizing and injection molding in sequence. Among them, the mass ratio of acrylonitrile-butadiene-styrene copolymer to styrene-acrylonitrile copolymer is 1:1.5, the weight-average molecular weight of acrylonitrile-butadiene-styrene copolymer is 700 g / mol, the weight-average molecular weight of styrene-acrylonitrile copolymer is 500 g / mol, the mass ratio of acrylonitrile, butadiene and styrene in acrylonitrile-butadiene-styrene copolymer is 25:10:55, the mass ratio of styrene to acrylonitrile in styrene-acrylonitrile copolymer is 65:35, the transparency of polymethyl methacrylate is 80%, and the weight-average molecular weight of polymethyl methacrylate is 400 g / mol, to obtain a nail art negative film.

[0043] Table 1

[0044]

[0045] In Table 1 above, the dispersant is ethylene bisstearamide, purchased from BASF SE, brand: 4010; the UV stabilizer is a hindered amine light stabilizer, purchased from BASF SE, brand: TINUVIN770DF; the adhesion promoter is a modified polyester compound, purchased from Dongguan Yuanya New Materials Co., Ltd., brand: Y-102UV; the toughening agent is an acrylate methyl silicone copolymer, purchased from LG of South Korea, brand: EM538.

[0046] Example 6

[0047] The difference from Example 3 is that the weight parts of the combination of acrylonitrile-butadiene-styrene copolymer and styrene-acrylonitrile copolymer are 45 parts, and the weight parts of polymethyl methacrylate are 45 parts, and finally a nail art negative film is obtained.

[0048] Example 7

[0049] The difference from Example 3 is that the mass ratio of acrylonitrile-butadiene-styrene copolymer to styrene-acrylonitrile copolymer is 1:1.7, and finally a nail art negative film is obtained.

[0050] Example 8

[0051] The difference from Example 3 is that the mass ratio of acrylonitrile-butadiene-styrene copolymer to styrene-acrylonitrile copolymer is 1:1, and finally a nail art negative film is obtained.

[0052] Example 9

[0053] The difference from Example 3 is that the mass ratio of acrylonitrile-butadiene-styrene copolymer to styrene-acrylonitrile copolymer is 1:0.5, and a nail art negative is finally obtained.

[0054] Example 10

[0055] The difference from Example 3 is that the mass ratio of acrylonitrile, butadiene and styrene in the acrylonitrile-butadiene-styrene copolymer is 27:7:57, and a nail art negative is finally obtained.

[0056] Example 11

[0057] The difference from Example 3 is that the mass ratio of acrylonitrile, butadiene and styrene in the acrylonitrile-butadiene-styrene copolymer is 20:20:50, and a nail art negative is finally obtained.

[0058] Example 12

[0059] The difference from Example 3 is that the mass ratio of acrylonitrile, butadiene and styrene in the acrylonitrile-butadiene-styrene copolymer is 10:30:40, and a nail art negative is finally obtained.

[0060] Example 13

[0061] The difference from Example 3 is that the mass ratio of styrene to acrylonitrile in the styrene-acrylonitrile copolymer is 67:32, and a nail art negative is finally obtained.

[0062] Example 14

[0063] The difference from Example 3 is that the mass ratio of styrene to acrylonitrile in the styrene-acrylonitrile copolymer is 70:30, and a nail art negative is finally obtained.

[0064] Example 15

[0065] The difference from Example 3 is that the mass ratio of styrene to acrylonitrile in the styrene-acrylonitrile copolymer is 75:25, and a nail art negative is finally obtained.

[0066] Example 16

[0067] The difference from Example 3 is that the transparency of polymethyl methacrylate is 70%, and the weight-average molecular weight of polymethyl methacrylate is 500 g / mol, and a nail art negative is finally obtained.

[0068] Wear resistance test

[0069] The nail art negatives prepared in the examples and comparative examples were worn by 20 people for 5 days to observe the wear situation. The wear resistance level was divided into five levels from 1 to 5. The wear length above 0.5 mm was level 1, 0.4 - 0.5 mm was level 2, 0.3 - 0.4 mm was level 3, 0.2 - 0.3 mm was level 4, and 0.1 - 0.2 mm was level 5. When checking the wearing results, it needed to be accurately measured with a magnifying glass.

[0070] The transmittance and wear resistance of the nail art negatives prepared in the examples and comparative examples were tested, and the test results are shown in Table 2.

[0071] Table 2

[0072]

[0073]

[0074] From the above description, it can be seen that the above embodiments of the present invention achieve the following technical effects:

[0075] The addition of polymethyl methacrylate helps to improve the transparency of the nail art negative. Controlling the addition amount of polymethyl methacrylate to be higher than acrylonitrile - butadiene - styrene copolymer and styrene - acrylonitrile copolymer helps to make the nail art negative have a high transparency, so as to be able to match the UV glue for wearing and enhance the aesthetics and diversity. The addition of acrylonitrile - butadiene - styrene copolymer and styrene - acrylonitrile copolymer helps to provide good toughness and impact resistance for the nail art negative, making the nail art piece not easy to break during use and improving its durability. The addition of methyl methacrylate helps to further enhance the mechanical strength of the nail art negative, making it more solid during wearing and daily use. The addition of additives such as dispersant, UV stabilizer, adhesion promoter and toughening agent helps to improve the mixing uniformity, UV stability, ink adhesion and overall toughness of the nail art negative, thus helping to improve the durability of the nail art piece under different environments and conditions. By controlling the weight parts of each component in the composition of the nail art negative within the above range, it helps to make the prepared nail art negative not only have high transparency and good mechanical properties, but also ensure that when using pressure - sensitive adhesive, solvent - based glue and UV glue, it can maintain a high retention rate and curing integrity, thereby improving the wearing comfort and matching.

[0076] The above are only the preferred embodiments of the present invention and are not used to limit the present invention. For those skilled in the art, the present invention can have various changes and modifications. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims

1. A composition for nail art film, characterized in that: In parts by weight, the composition comprises: 20 to 50 parts of a copolymer; 40-70 parts of polymethyl methacrylate; 1 to 5 parts of methyl methacrylate; and 3 to 7 parts of additives; wherein the copolymer is a combination of acrylonitrile-butadiene-styrene copolymer and styrene-acrylonitrile copolymer.

2. The composition according to claim 1, characterized in that In parts by weight, the composition comprises: 20 to 45 parts of the copolymer; 45 to 70 parts of the polymethyl methacrylate; 3 to 5 parts of the methyl methacrylate; and 4 to 6 parts of the additive.

3. The composition according to claim 1, characterized in that The ratio of the total mass of the acrylonitrile-butadiene-styrene copolymer and the styrene-acrylonitrile copolymer, the mass of the polymethyl methacrylate and the mass of the methyl methacrylate is (30-40):(50-60):

5.

4. The composition according to any one of claims 1 to 3, characterized in that The mass ratio of the acrylonitrile-butadiene-styrene copolymer to the styrene-acrylonitrile copolymer is 1:(1-2); and / or the weight average molecular weight of the acrylonitrile-butadiene-styrene copolymer is 500-800 g / mol; and / or the weight average molecular weight of the styrene-acrylonitrile copolymer is 500-800 g / mol; and / or the mass ratio of acrylonitrile, butadiene and styrene in the acrylonitrile-butadiene-styrene copolymer is (20-30):(5-20):(50-60); and / or the mass ratio of styrene to acrylonitrile in the styrene-acrylonitrile copolymer is (60-70):(30-40).

5. The composition according to any one of claims 1 to 4, characterized in that The transparency of the polymethyl methacrylate is 70% to 80%; and / or the weight average molecular weight of the polymethyl methacrylate is 100 to 500 g / mol.

6. The composition according to any one of claims 1 to 5, characterized in that The additive is selected from any one or more of a dispersant, a UV stabilizer, an adhesion promoter and a toughening agent.

7. The composition according to claim 6, characterized in that The weight portion of the dispersant is 0.2 to 0.5 parts; and / or, the weight portion of the UV stabilizer is 0.8 to 1.0 parts, preferably 0.9 to 1.0 parts; and / or, the weight portion of the adhesion promoter is 2.0 to 3.0 parts; and / or, the weight portion of the toughening agent is 0.5 to 1.7 parts.

8. A nail art film, characterized in that: The nail art base film is obtained by mixing the composition according to any one of claims 1 to 7, followed by pelletizing and injection molding.

9. The nail art film according to claim 8, characterized in that: The light transmittance of the nail art base film is 40-50%.

10. A nail art piece, characterized in that: The nail art sheet contains the nail art base sheet according to claim 9.

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