Titanium alloy clad plate and production process thereof

Abstract

The application relates to the technical field of composite materials, in particular to a titanium alloy composite plate and a production process thereof. The titanium alloy composite plate comprises a TC4 titanium alloy base plate, and a composite layer is formed on the surface of the TC4 titanium alloy base plate to increase the wear resistance of the surface of the TC4 titanium alloy base plate. The production process of the titanium alloy composite plate comprises the following steps: pretreatment: cleaning the surface of the TC4 titanium alloy base plate; deposition: placing the pretreated TC4 titanium alloy base plate on a support in a reaction chamber and adjusting the position of the TC4 titanium alloy base plate; controlling the deposition time to generate a solid thin film; post-treatment: closing the heating system in the reaction chamber and introducing inert gas to assist cooling to room temperature. The application can significantly reduce the wear of the TC4 titanium alloy base plate during use, prolong the service life, reduce the maintenance cost and improve the adaptability of the industrial field. Different deposition modification structures are formed to improve different properties of the TC4 titanium alloy.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of composite materials, and particularly relates to a titanium alloy composite plate and a production process thereof. BACKGROUND

[0002] Titanium and titanium alloy become emerging structural and functional materials due to high specific strength, excellent corrosion resistance and good high-temperature performance, and are widely used in the fields of aerospace, navigation, petroleum and chemical industry, light industry, metallurgy, automobile, building and medical treatment. However, the hardness and wear resistance of titanium alloy are relatively low, the hardness of pure titanium is only 150-200 Hv, and the hardness of titanium alloy is usually not more than 350 Hv, which limits the application of titanium alloy in many high-wear and high-load working conditions. In order to overcome this limitation, alloying or surface modification technology is usually used to improve the hardness and wear resistance of titanium alloy to meet the needs in actual production. Traditional gas deposition can form a wear-resistant and high-temperature-resistant layer on the surface of the titanium alloy plate, but the traditional deposition method often has problems such as uneven gas mixing, inconsistent deposition thickness and large airflow fluctuation. Specifically, in the traditional deposition process, the high temperature and high pressure in the reaction chamber have a reverse impact on the gas flow conveying structure outside, which finally affects the uniformity of the deposition on the surface of the titanium alloy plate.

[0003] In the prior art, a Chinese patent application file with the application publication number CN119351972A discloses a gas deposition device and a working method thereof, which comprises: a reaction chamber, a tray for supporting a substrate is arranged in the reaction chamber; a gas supply mechanism connected to the gas inlet of the reaction chamber, and the output end of the gas supply mechanism is located above the tray; a driving mechanism located below the reaction chamber and magnetically attracted to the tray; the driving mechanism drives the tray to reciprocate in the horizontal direction to deposit and coat the substrate. In the deposition process, the above technical solution is adopted, the gas supply mechanism comprises a nozzle, the nozzle is located in the reaction chamber, the gas outlet side of the nozzle is provided with a baffle, and the baffle is used to adjust the opening degree of the gas outlet of the nozzle. The nozzle can only adjust the size of the airflow, but cannot improve the phenomenon of reverse airflow. SUMMARY

[0004] In view of the above problems, the application provides a titanium alloy composite plate and a production process thereof, which solves the technical problems that the hardness and wear resistance of titanium alloy are relatively low, and the surface deposition uniformity is poor when the surface of the titanium alloy plate is modified by gas deposition.

[0005] To achieve the above purpose, the technical scheme adopted by the application is as follows: a titanium alloy composite plate and a production process thereof.

[0006] The titanium alloy composite plate comprises a TC4 titanium alloy substrate, and a composite layer is formed on the surface of the TC4 titanium alloy substrate to increase the wear resistance of the surface of the TC4 titanium alloy substrate.

[0007] By increasing the composite layer with wear resistance, the wear of the TC4 titanium alloy substrate during reuse can be significantly reduced, the service life is prolonged, the maintenance cost is reduced, and the applicable industrial field is improved.

[0008] Further, the composite layer is formed by compounding one of carbon, tungsten or molybdenum.

[0009] In the above technical solution, when carbon is selected, titanium carbide is formed on the surface of the TC4 titanium alloy substrate, which significantly improves the hardness and wear resistance.

[0010] When tungsten is selected, tungsten-titanium alloy is formed on the surface of the TC4 titanium alloy substrate, which enhances the wear resistance and high-temperature resistance.

[0011] When molybdenum is selected, molybdenum-titanium alloy is formed on the surface of the TC4 titanium alloy substrate, which improves the wear resistance and corrosion resistance.

[0012] The production process of the above titanium alloy composite plate comprises the following steps:

[0013] S1, pretreatment: cleaning the surface of the TC4 titanium alloy substrate with a solvent to remove oil stains and organic matter, then removing the surface oxide layer and then drying;

[0014] S2, deposition: placing the TC4 titanium alloy substrate pretreated in S1 on the support in the reaction chamber, and adjusting the position of the TC4 titanium alloy substrate;

[0015] Start the vacuum system, and draw the reaction chamber to the required vacuum degree and remove impurity gas;

[0016] Start the heating system in the reaction chamber, and heat the TC4 titanium alloy substrate to the deposition temperature;

[0017] Proportionally introduce reaction gas and carrier gas;

[0018] According to the thickness of the required film, control the deposition time to generate a solid film;

[0019] S3, post-treatment: turn off the heating system in the reaction chamber, and introduce inert gas to assist cooling to room temperature.

[0020] Further, in S2, the required vacuum degree in the reaction chamber is 10 -3 to 10 -6 Torr.

[0021] Further, in S2, the temperature of the deposition is 300-1000℃.

[0022] Further, in S2, the reaction gas and the carrier gas are premixed in the injector before being introduced into the reaction chamber.

[0023] With the above technical solution, the carrier gas enters through the end gas inlet, and the reaction gas enters through the side gas inlet. The carrier gas has a certain ejector effect on the reaction gas, which can reduce the fluctuation of gas flow and ensure the accurate control of the proportion of the reaction gas and the carrier gas. On the other hand, the reaction gas and the carrier gas are premixed in the injector, which can make them uniform at the molecular level. This uniform mixed gas can be more uniformly distributed on the surface of the TC4 titanium alloy substrate in the subsequent process after entering the reaction chamber, thereby ensuring uniform deposition in the reaction chamber. Uniform film thickness helps to improve the overall performance and appearance quality of the titanium alloy composite plate.

[0024] In addition, the gas premixed in the injector will continue to pass through the flow interrupter. The flow interrupter can assist the gas mixing to be more uniform on the one hand, and has the effect of changing the direction of the gas flow on the other hand, avoiding the reverse impact of the high temperature and high pressure gas in the reaction chamber on the external gas flow conveying structure. Overall, it affects the uniformity of the gas flow conveying and ultimately affects the deposition effect.

[0025] Further, the flow interrupter comprises a core body, a spiral through groove is formed in the side wall of the core body, a cylindrical sleeve is provided outside the core body through interference fit, one end of the cylindrical sleeve is connected with the injector through a flange, and the other end of the cylindrical sleeve extends into the reaction chamber.

[0026] Further, the spiral angle of the spiral through groove is greater than 360°.

[0027] With the above technical solution, the spiral through groove makes the gas flow spirally when passing through the core body, prolongs the flow path, and promotes the sufficient mixing of the reaction gas and the carrier gas. The spiral angle is greater than 360°, which ensures that the gas completes at least one spiral motion in the core body, further improving the mixing uniformity. In addition, the spiral flow makes the gas flow through the injector more stable, reducing the turbulence and fluctuation of the gas flow, and the stable gas flow helps to uniformly deposit on the surface of the TC4 titanium alloy substrate, improving the deposition quality and performance. In addition, the spiral through groove has the effect of changing the direction of the gas flow, avoiding the reverse impact of the high temperature and high pressure gas in the reaction chamber on the external gas flow conveying structure, and ensuring the stability and uniformity of the gas flow conveying.

[0028] Further, the reaction chamber is provided with a gas distribution member in communication with the cylindrical sleeve, the gas distribution member comprises a main pipe, the main pipe is provided with uniformly distributed distribution pipes at a side away from the cylindrical sleeve, the bottom surface of the distribution pipe is provided with gas outlet grooves, the size of the gas outlet grooves gradually decreases from one end close to the cylindrical sleeve to the other end, and the distance between adjacent gas outlet grooves gradually decreases from one end close to the cylindrical sleeve to the other end.

[0029] With the above technical scheme, when the gas flows, the flow rate gradually decreases with the increase of the conveying distance due to the frictional resistance and pressure loss, if the diameter of the gas outlet groove remains unchanged, the gas outlet flow rate away from the main pipe will be significantly reduced, resulting in uneven gas distribution.

[0030] Further, the support comprises arrayed columns, the bottom end of the column is fixed to the bottom surface in the reaction chamber through a flange, the bottom end of the column is provided with a U-shaped yoke, and a roller is rotatably arranged on the U-shaped yoke.

[0031] With the above technical scheme, the TC4 titanium alloy substrate can be placed in the reaction chamber by the action of the roller.

[0032] Compared with the prior art, the present application has the following beneficial effects:

[0033] 1、By increasing the wear-resistant composite layer, the wear of the TC4 titanium alloy substrate during use can be significantly reduced, the service life is prolonged, the maintenance cost is reduced, and the applicable industrial field is improved.

[0034] 2. In this invention, the carrier gas enters through the end inlet via the injector, while the reactant gas enters through the side inlet. The carrier gas has a certain entraining effect on the reactant gas, which reduces gas flow fluctuations and ensures precise control of the ratio of reactant gas to carrier gas. Furthermore, the reactant gas and carrier gas are pre-mixed in the injector, achieving molecular-level homogenization. This homogenized gas mixture, upon entering the reaction chamber, can be more evenly distributed on the surface of the TC4 titanium alloy substrate in subsequent processes, thus ensuring uniform deposition within the reaction chamber. Uniform film thickness contributes to improved overall performance and appearance quality of the titanium alloy composite plate.

[0035] 3. In this invention, the flow interceptor, on the one hand, assists in more uniform gas mixing, and on the other hand, serves to redirect the airflow, preventing high temperatures and pressures within the reaction chamber from causing a reverse impact on the external airflow transport structure. This avoids affecting the overall uniformity of airflow transport and ultimately the deposition effect.

[0036] 4. In this invention, the gas distribution component adopts a gradual design. At the end closer to the main pipe, the outlet groove diameter is larger to accommodate higher gas flow velocities and prevent gas accumulation. At the end farther from the main pipe, the outlet groove diameter gradually decreases to increase gas flow resistance, thereby maintaining the stability of the outlet gas velocity. This ensures that the gas flow velocity is relatively uniform throughout the reaction chamber, preventing excessively high or low gas velocities in localized areas. Furthermore, the gradual change in the density of the outlet grooves ensures a uniform distribution of gas output throughout the reaction chamber, preventing excessively high or low gas concentrations in localized areas. Attached Figure Description

[0037] Figure 1 This is a schematic diagram of the vapor deposition structure in this invention;

[0038] Figure 2 This is a schematic diagram of the structure of the air distribution component, the flow interceptor, and the injector in this invention.

[0039] Figure 3 This is a cross-sectional view of the flow cutter in this invention;

[0040] Figure 4 This is a schematic diagram of the core structure in this invention;

[0041] Figure 5 This is a partial cross-sectional view of the vapor deposition structure in this invention;

[0042] Figure 6 This is a side view of the composite layer formed on the TC4 titanium alloy substrate in this invention.

[0043] In the figure: 1, TC4 titanium alloy substrate; 2, composite layer; 3, vapor deposition structure; 31, reaction chamber; 32, air distribution member; 321, main pipeline; 322, uniform distribution pipe; 323, air outlet slot; 33, support; 331, column; 332, U-shaped fork; 333, supporting roller; 4, injector; 5, flow stopper; 51, core; 511, spiral through slot; 52, cylindrical sleeve. DETAILED DESCRIPTION

[0044] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.

[0045] As shown in Figures 1-6 Embodiment 1.

[0046] A titanium alloy composite plate comprises a TC4 titanium alloy substrate 1, and a composite layer 2 is arranged on the surface of the TC4 titanium alloy substrate 1 to increase the wear resistance of the surface of the TC4 titanium alloy substrate 1.

[0047] The composite layer 2 is a composite structure layer formed by combining carbon.

[0048] The specific deposition and compounding process is: CH4→C+2H2; CH4+Ti→TiC+2H2.

[0049] The production process of the titanium alloy composite plate comprises the following steps:

[0050] S1, pretreatment: the surface of the TC4 titanium alloy substrate 1 is cleaned with a solvent to remove oil stains and organic matter, and then the surface oxide layer is removed and then dried;

[0051] S2, deposition: the TC4 titanium alloy substrate 1 pretreated in S1 is placed on the support 33 in the reaction chamber 31, and the position of the TC4 titanium alloy substrate 1 is adjusted;

[0052] Start the vacuum system, and draw the reaction chamber 31 to the required vacuum degree and remove impurity gas. Specifically, the required vacuum degree in the reaction chamber 31 is 10 -3 to 10 -6 Torr.

[0053] Start the heating system in the reaction chamber 31, and heat the TC4 titanium alloy substrate 1 to the deposition temperature, which is 800℃ to 1000℃.

[0054] The reaction gas and carrier gas are proportionally introduced. The ratio of methane to carrier gas is 1:20, and the carrier gas is hydrogen.

[0055] According to the thickness of the required film, the deposition time is controlled for 30-60 min to generate a solid film composite layer.

[0056] S3, post-processing: turn off the heating system in the reaction chamber 31, and introduce inert gas to assist cooling to room temperature.

[0057] In this embodiment, in S2, when the reaction gas and carrier gas are proportionally introduced, the reaction gas and carrier gas are first pre-mixed by the injector 4, and then connected to the reaction chamber 31 through the flow restrictor 5.

[0058] The flow restrictor 5 includes a core 51, a helical through groove 511 is formed on the side wall of the core 51, and a cylindrical sleeve 52 is provided on the outside of the core 51 by interference fit. One end of the cylindrical sleeve 52 is connected to the injector 4 through a flange, and the other end of the cylindrical sleeve 52 extends into the reaction chamber 31.

[0059] The helical angle of the helical through groove 511 is greater than 360°.

[0060] The helical through groove 511 causes the gas flow to spiral when passing through the core 51, prolongs the flow path, and promotes the thorough mixing of the reaction gas and carrier gas. The helical angle is greater than 360°, which ensures that the gas completes at least one spiral motion in the core 51, further improving the uniformity of the mixture. In addition, the spiral flow makes the gas flow through the injector 4 more stable, reduces the turbulence and fluctuations of the gas flow, and the stable gas flow helps to uniformly deposit on the surface of the TC4 titanium alloy substrate 1, improves the deposition quality and performance. In addition, the gas flow redirection effect of the helical through groove 511 avoids the reverse impact of high-temperature and high-pressure gas in the reaction chamber 31 on the external gas flow delivery structure, ensuring the stability and uniformity of the gas flow delivery.

[0061] The reaction chamber 31 is provided with a gas distribution member 32 communicated with the cylindrical sleeve 52, the gas distribution member 32 includes a main pipe 321, the side of the main pipe 321 away from the cylindrical sleeve 52 is provided with a plurality of uniform distribution pipes 322 arranged at intervals, the bottom surface of the uniform distribution pipe 322 is provided with a gas outlet groove 323, the specification of the gas outlet groove 323 gradually decreases from one end close to the cylindrical sleeve 52 to the other end, and the spacing between adjacent gas outlet grooves 323 gradually decreases from one end close to the cylindrical sleeve 52 to the other end.

[0062] When the gas flows, the flow rate gradually decreases with the increase of the conveying distance due to the frictional resistance and pressure loss. If the diameter of the gas outlet groove remains unchanged, the gas outlet flow rate far away from the main pipeline will be significantly reduced, resulting in uneven gas distribution. In the above scheme, a gradual change scheme is adopted. Near one end of the main pipeline 321, the diameter of the gas outlet groove 323 is larger, which is suitable for a higher gas flow rate to avoid gas accumulation. Far away from one end of the main pipeline 321, the diameter of the gas outlet groove 323 gradually decreases, which increases the gas outflow resistance, thereby maintaining the stability of the gas outlet flow rate. It is ensured that the flow rate of the gas in the entire reaction chamber 31 tends to be uniform, avoiding excessively high or low gas flow rate in local areas. In addition, by gradually changing the density of the gas outlet groove 323, it is ensured that the gas outlet amount in the entire reaction chamber 31 is uniformly distributed, avoiding excessively high or low gas concentration in local areas.

[0063] The bracket 33 includes an array of columns 331. The bottom end of the column 331 is fixed to the bottom surface in the reaction chamber 31 through a flange. The bottom end of the column 331 is provided with a U-shaped fork ear 332. The U-shaped fork ear 332 is rotatably provided with a roller 333.

[0064] Through the action of the roller 333, it is convenient to assist the TC4 titanium alloy substrate 1 to be placed in the reaction chamber 31 by pushing. Specifically, the door plate at one end of the reaction chamber 31 is opened, and the TC4 titanium alloy substrate 1 is pushed and placed.

[0065] Embodiment 2

[0066] The difference between this embodiment and embodiment 1 is that the composite layer 2 is a composite structure layer formed by combining tungsten.

[0067] The specific reaction mechanism is: WF6+3H2→W+6HF; Ti+W→Ti-W.

[0068] In the process of depositing the composite, the production process of the titanium alloy composite plate includes the following steps:

[0069] S1, pretreatment: the surface of the TC4 titanium alloy substrate 1 is cleaned with a solvent to remove oil stains and organic matter, and then the surface oxide layer is removed and then dried;

[0070] S2, deposition: the TC4 titanium alloy substrate 1 pretreated in S1 is placed on the bracket 33 in the reaction chamber 31, and the position of the TC4 titanium alloy substrate 1 is adjusted;

[0071] Start the vacuum system, and draw the reaction chamber 31 to the required vacuum degree and remove impurity gas. Specifically, the required vacuum degree in the reaction chamber 31 is 10 -3 to 10 -6 Torr.

[0072] Start the heating system in the reaction chamber 31, heat the TC4 titanium alloy substrate 1 to the deposition temperature, and the deposition temperature is 300-600℃.

[0073] The reaction gas and carrier gas are introduced in proportion. The ratio of methane to carrier gas is 1:30, and the carrier gas is hydrogen.

[0074] According to the thickness of the required film, control the deposition time for 30-60min to generate a solid film composite layer.

[0075] S3, post-processing: turn off the heating system in the reaction chamber 31, and introduce inert gas to assist cooling to room temperature.

[0076] Example 3

[0077] The difference between this embodiment and Example 1 is that the composite layer 2 is a composite structure layer formed by combining molybdenum.

[0078] The reaction mechanism is MoCl5+5 / 2H2→Mo+5HCl; Ti+Mo→Ti-Mo.

[0079] The specific deposition composite process of the above-mentioned titanium alloy composite plate production process includes the following steps:

[0080] S1, pretreatment: clean the surface of the TC4 titanium alloy substrate 1 with a solvent to remove oil and organic matter, and then remove the surface oxide layer and then dry;

[0081] S2, deposition: place the TC4 titanium alloy substrate 1 pretreated in S1 on the support 33 in the reaction chamber 31, and adjust the position of the TC4 titanium alloy substrate 1;

[0082] Start the vacuum system, and remove impurity gas by drawing the reaction chamber 31 to the required vacuum degree. Specifically, the required vacuum degree in the reaction chamber 31 is 10 -3 to 10 -6 Torr.

[0083] Start the heating system in the reaction chamber 31, heat the TC4 titanium alloy substrate 1 to the deposition temperature, and the deposition temperature is 500-800℃.

[0084] The reaction gas and carrier gas are introduced in proportion. The ratio of methane to carrier gas is 1:20, and the carrier gas is hydrogen.

[0085] According to the thickness of the required film, control the deposition time for 30-60min to generate a solid film composite layer.

[0086] S3, post-processing: turn off the heating system in the reaction chamber 31, and introduce inert gas to assist cooling to room temperature.

[0087] The summary is shown in the following table:

[0088]

[0089] By increasing the composite composite layer with wear resistance, the wear of the TC4 titanium alloy substrate during reuse can be significantly reduced, the service life is prolonged, the maintenance cost is reduced, and the adapted industrial field is improved.

[0090] Although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art can modify the technical solutions recorded in the foregoing embodiments, or make equivalent replacements for part of the technical features, any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the present application shall be included in the protection scope of the present application.

Claims

1. A titanium alloy composite plate, characterized in that, Includes a TC4 titanium alloy substrate (1), on the surface of which a composite layer (2) is formed to increase the wear resistance of the TC4 titanium alloy substrate (1). The composite layer (2) is formed by a composite of carbon, tungsten or molybdenum; The manufacturing process of the titanium alloy composite plate includes the following steps: S1. Pretreatment: Clean the surface of the TC4 titanium alloy substrate (1) with solvent to remove oil and organic matter, then remove the oxide layer on the surface and then dry it. S2, Deposition: Place the pretreated TC4 titanium alloy substrate (1) from S1 onto the support (33) in the reaction chamber (31) and adjust the position of the TC4 titanium alloy substrate (1). Start the vacuum system to evacuate the reaction chamber (31) to the required vacuum level and remove impurity gases; Start the heating system in the reaction chamber (31) to heat the TC4 titanium alloy substrate (1) to the deposition temperature; introduce the reaction gas and carrier gas in proportion; The deposition time is controlled according to the required film thickness to generate a solid film; S3. Post-processing: Turn off the heating system in the reaction chamber (31) and introduce inert gas to assist in cooling to room temperature; In S2, when the reaction gas and carrier gas are introduced in proportion, the reaction gas and carrier gas are first premixed by the injector (4), and then connected to the reaction chamber (31) by the cut-off device (5). The interceptor (5) includes a core (51), a spiral groove (511) is provided on the side wall of the core (51), and a cylindrical sleeve (52) is provided outside the core (51) by interference fit. One end of the cylindrical sleeve (52) is connected to the injector (4) by a flange, and the other end of the cylindrical sleeve (52) extends into the reaction chamber (31). Wherein, the spiral angle of the spiral through groove (511) is greater than 360°; The reaction chamber (31) is provided with a gas distribution component (32) communicating with the cylindrical sleeve (52). The gas distribution component (32) includes a main pipe (321). On the side of the main pipe (321) away from the cylindrical sleeve (52), there are spaced uniformly distributed pipes (322). The bottom surface of the uniformly distributed pipes (322) is provided with gas outlet grooves (323). The size of the gas outlet grooves (323) gradually decreases from one end near the cylindrical sleeve (52) to the other end. The distance between adjacent gas outlet grooves (323) gradually decreases from one end near the cylindrical sleeve (52) to the other end.

2. The titanium alloy composite plate according to claim 1, characterized in that, In S2, the required vacuum level in the reaction chamber (31) is 10. -3 Up to 10 -6 Torr.

3. The titanium alloy composite plate according to claim 1, characterized in that, In S2, the deposition temperature is between 300°C and 1000°C.

4. The titanium alloy composite plate according to claim 1, characterized in that, The support (33) includes columns (331) arranged in an array. The bottom end of the column (331) is fixed to the bottom surface of the reaction chamber (31) by a flange. The bottom end of the column (331) is provided with a U-shaped fork lug (332), and a roller (333) is rotatably mounted on the U-shaped fork lug (332).

Images