Heating body resistance temperature coefficient determination method and atomization device

Abstract

The invention relates to a heating element resistance temperature coefficient determination method and an atomization device.Firstly, a heating element in an atomizer is heated to a heat balance state, after heating is stopped for waiting time, the first resistance value of the heating element is obtained, and then the second resistance value of the heating element is obtained; and finally, determining the resistance temperature coefficient of the heating body according to the first resistance value, the first temperature determined according to the heating waiting time, the second resistance value and the equilibrium state temperature. Therefore, when the resistance temperature coefficient of each atomizer is determined, the initial environment interference can be reduced by using the first heating, and the resistance temperature coefficient of the heating body is dynamically measured based on the heated parameters, so that the accuracy of the measured resistance temperature coefficient is improved; therefore, the accuracy of temperature control of the atomization device by using the measured resistance temperature coefficient is higher, and the working reliability of the atomization device is improved.

Description

Technical Field

[0001] The present application relates to the technical field of atomizing devices, and particularly to a method for determining the temperature coefficient of resistance of a heating element and an atomizing device. Background Art

[0002] An atomizing device mainly heats an atomizing matrix by energizing a heating element to raise the temperature of the heating element, so as to atomize the atomizing matrix to generate an aerosol for use. The core component in the atomizing device is the heating element. Controlling the temperature of the heating element for heating the atomizing matrix is a key factor affecting the quality of the aerosol.

[0003] However, to accurately control the temperature of the heating element, it is necessary to determine the TCR (Temperature Coefficient of Resistance) of the heating element. The currently adopted method for determining TCR is to conduct a TCR sampling test on the heating element in advance and use the average value obtained from the sampling test as the final TCR value. However, the number of tests in the sampling test is small, and the test result is a statistical mean. Due to the limitations of the manufacturing process and method, it is difficult to ensure the consistency of the TCR of the current heating element, with a large deviation. Moreover, with the accumulation of heating time and the influence of carbon deposition, the TCR will further change. This results in inaccurate temperature control using the TCR obtained from sampling, affecting the working reliability of the atomizing device. Summary of the Invention

[0004] Based on this, in view of the above technical problems, it is necessary to provide a method, device, atomizing device, computer device, storage medium, and computer program product for determining the temperature coefficient of resistance of a heating element that can improve the working reliability of the atomizing device.

[0005] In a first aspect, the present application provides a method for determining the temperature coefficient of resistance of a heating element, the method comprising:

[0006] Heating the heating element in the atomizer to a thermal equilibrium state;

[0007] After stopping heating and waiting for a period of time, obtaining a first resistance value of the heating element;

[0008] Obtaining a second resistance value of the heating element; the second resistance value is the resistance value corresponding to the heating element after reaching the thermal equilibrium state;

[0009] Determining the temperature coefficient of resistance of the heating element according to the first resistance value, the first temperature, the second resistance value, and the equilibrium state temperature; the first temperature is determined according to the heating waiting time.

[0010] In one of the embodiments, the method for determining the first temperature includes:

[0011] Determine the boiling point temperature of the atomization matrix in the atomizer;

[0012] Determine the first temperature according to the heating waiting time and the boiling point temperature.

[0013] In one embodiment, the determining the first temperature according to the heating waiting time and the boiling point temperature includes:

[0014] Determine the temperature drop according to the heating waiting time;

[0015] Determine the first temperature according to the temperature drop and the boiling point temperature.

[0016] In one embodiment, the determining the boiling point temperature of the atomization matrix in the atomizer includes:

[0017] After the atomizer is connected, obtain the type of the atomization matrix in the atomizer;

[0018] Determine the boiling point temperature of the atomization matrix according to the type of the atomization matrix.

[0019] In one embodiment, before heating the heating element in the atomizer to the thermal equilibrium state, the method further includes:

[0020] Receive a detection start signal; the detection start signal indicates that the atomizer has been connected.

[0021] In one embodiment, the obtaining the second resistance value of the heating element includes:

[0022] Heat the heating element to the thermal equilibrium state, and obtain the second resistance value and the equilibrium state temperature of the heating element.

[0023] In one embodiment, the heating the heating element in the atomizer to the thermal equilibrium state includes:

[0024] Heat the heating element in the atomizer to the thermal equilibrium state at a first preset power, and the first preset power is less than the standard power.

[0025] In one embodiment, the obtaining the second resistance value of the heating element includes:

[0026] Obtain multiple resistance values of the heating element;

[0027] Take the average value of the multiple resistance values as the second resistance value.

[0028] In one embodiment, the determining the resistance temperature coefficient of the heating element according to the first resistance value, the first temperature, the second resistance value and the equilibrium state temperature includes:

[0029] Determine the resistance temperature coefficient of the heating element according to the formula TCR = (R1–R0) / (R0×(T1-T0));

[0030] Wherein, TCR represents the resistance temperature coefficient of the heating element, R1 represents the second resistance value, and T1 represents the equilibrium temperature; R0 represents the first resistance value, and T0 represents the first temperature.

[0031] In a second aspect, the present application also provides an atomizing device, which includes a processor, a memory, and an atomizer. A heating element is arranged in the atomizer. The memory stores a computer program, and when the processor executes the computer program, the following steps are implemented:

[0032] Heat the heating element in the atomizer to the thermal equilibrium state;

[0033] After stopping heating and waiting for a period of time, obtain the first resistance value of the heating element;

[0034] Obtain the second resistance value of the heating element; the second resistance value is the resistance value corresponding to the heating element after reaching the thermal equilibrium state;

[0035] Determine the resistance temperature coefficient of the heating element according to the first resistance value, the first temperature, the second resistance value, and the equilibrium temperature; the first temperature is determined according to the heating waiting time.

[0036] In the above method for determining the resistance temperature coefficient of the heating element and the atomizing device, first, the heating element in the atomizer is heated to the thermal equilibrium state. After stopping heating and waiting for a period of time, the first resistance value of the heating element is obtained. Then, the second resistance value of the heating element is obtained. Finally, the resistance temperature coefficient of the heating element is determined according to the first resistance value, the first temperature determined according to the heating waiting time, the second resistance value, and the equilibrium temperature. Thus, when determining the resistance temperature coefficient of each atomizer, the initial environmental interference can be reduced by the first heating. Based on the parameters after heating, the resistance temperature coefficient of the heating element is dynamically measured, improving the accuracy of the measured resistance temperature coefficient. Therefore, the accuracy of temperature control of the atomizing device using the measured resistance temperature coefficient is higher, and the working reliability of the atomizing device is improved. Description of the Drawings

[0037] Figure 1 It is a schematic flowchart of a method for determining the resistance temperature coefficient of a heating element in an embodiment;

[0038] Figure 2 It is a schematic flowchart of a method for determining the first temperature in an embodiment;

[0039] Figure 3 It is a schematic flowchart of the step of determining the first temperature according to the heating waiting time and the boiling point temperature in an embodiment;

[0040] Figure 4 It is a schematic flow chart of the steps for determining the boiling point temperature of the atomization matrix in the atomizer in one embodiment;

[0041] Figure 5 It is a schematic flow chart of the method for determining the temperature coefficient of resistance of the heating element in another embodiment;

[0042] Figure 6 It is a schematic flow chart of the method for determining the equilibrium temperature in one embodiment;

[0043] Figure 7 It is a schematic flow chart of the steps for obtaining the second resistance value of the heating element in one embodiment;

[0044] Figure 8 It is a detailed schematic flow chart of the method for determining the temperature coefficient of resistance of the heating element in one embodiment. Specific embodiments

[0045] In order to make the purpose, technical solutions and advantages of the present application clearer, the present application will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and are not used to limit the present application.

[0046] The method for determining the temperature coefficient of resistance of the heating element provided by the embodiment of the present application is used to determine the temperature coefficient of resistance of the heating element, specifically for measuring the temperature coefficient of resistance of the heating element in the atomizer. The heating element is used to heat the atomization matrix to atomize the atomization matrix and generate an aerosol. The heating element can be a heating wire or a heating tube, etc., and the specific form is not limited. The type of the heating element is also not limited. For example, it can be a ceramic heating element. The temperature coefficient of resistance refers to the relative change in the resistance value when the temperature changes by 1°C with the room temperature as the reference value. It is generally divided into PTC (Positive Temperature Coefficient), NTC (Negative Temperature Coefficient) and critical temperature coefficient. The room temperature is generally normal temperature, for example, 25°C, or any other value within 24°C - 26°C.

[0047] The method for determining the temperature coefficient of resistance of the heating element can be executed by a processor. The processor can be a controller set in the atomization device body, or other terminals or servers that have established a communication connection with the atomization device and can perform data interaction with the atomization device. Among them, the terminal can be, but is not limited to, various personal computers, laptop computers, smart phones, tablet computers, Internet of Things devices and portable wearable devices. The portable wearable device can be a smart watch, a smart bracelet, a head-mounted device, etc. The server can be realized by an independent server or a server cluster composed of multiple servers.

[0048] In an exemplary embodiment, as Figure 1 shown, a method for determining the resistance temperature coefficient of a heating element is provided. Taking the method applied to a controller disposed in the main body of an atomizing device as an example, it includes the following steps 104 to 110. Among them:

[0049] Step 104, heat the heating element in the atomizer to a thermal equilibrium state.

[0050] After the atomizing device is connected to the atomizer, the heating element in the atomizer is heated to heat the atomizing matrix in the atomizer.

[0051] After heating the heating element, the resistance value of the heating element will rise to a thermal equilibrium state. At this time, since the temperature of the heating element reaches the boiling point of the atomizing matrix, the atomizing matrix is atomized, taking away heat and maintaining the supply-demand balance. That is, for the heating element, the heat brought by the heating power is equivalent to the heat taken away by atomization + the heat to maintain its own temperature at the boiling point (other energy consumptions, such as heat radiation, can be ignored because they are too small). At this time, it can be considered that the temperature of the heating element is approximately the boiling point temperature of the atomizing matrix.

[0052] Step 106, after stopping heating and waiting for a period of time, obtain the first resistance value of the heating element.

[0053] After heating the heating element to a thermal equilibrium state, stop heating the heating element. After waiting for the heating waiting time, then obtain the first resistance value of the heating element. The first temperature is determined according to the heating waiting time. It can be understood that the first temperature is the temperature of the heating element after stopping heating and waiting for the time. After the heating element is heated to reach the thermal equilibrium state and heating stops, the heating element will dissipate heat by itself and the temperature will gradually decrease. The decreased temperature is related to the heating waiting time. The longer the heating waiting time, the more the temperature decreases. The shorter the heating waiting time, the less the temperature decreases.

[0054] After stopping heating and waiting for the time, obtain the first resistance value of the heating element. Among them, the first resistance value of the heating element can be detected by a resistance detection circuit and a processor. Specifically, the resistance detection circuit includes a reference resistance connected in series with the heating element. The processor is connected to both ends of the series circuit. After stopping heating and waiting for the time and when the resistance value of the heating element needs to be detected, the processor samples the voltage signal at both ends of the series circuit. Through the resistance value of the reference resistance and the voltage difference at both ends of the series circuit, the resistance value of the heating element can be calculated as the first resistance value.

[0055] The first temperature of the heating element can be calculated by the processor according to the preset stored data, specifically determined according to the heating waiting time, or can be obtained by a temperature detection circuit. The temperature detection circuit sends the detected first temperature to the processor.

[0056] When the atomizer is connected to the atomization device, the temperature of the heating element is uncertain and may be affected by the ambient temperature or the temperature of the atomizer itself. Therefore, in this step, after the atomizer is connected, the atomizer is heated for the first time, and after heating to the equilibrium state, a preset heating waiting time is cooled. The first temperature and the first resistance obtained thereby are not affected by the ambient temperature or the initial state of the atomizer, and can make the obtained first temperature and first resistance more accurate.

[0057] Step 108, obtain the second resistance of the heating element.

[0058] Among them, the second resistance is the resistance corresponding to the heating element reaching the thermal equilibrium state. After stopping the heating waiting time, the heating element can be continuously heated until the heating element is heated to the thermal equilibrium state again. After the heating element reaches the thermal equilibrium state, the resistance of the heating element can basically be equivalent to the resistance after the heating element reaches the boiling point temperature of the atomization matrix. After the heating element reaches the thermal equilibrium state, the processor takes the detected resistance as the second resistance.

[0059] The second resistance of the heating element can be detected by a resistance detection circuit and a processor. Specifically, the resistance detection circuit includes a reference resistance connected in series with the heating element. The processor is connected to both ends of the series circuit. When the heating element needs to be detected for resistance while heating the heating element to the thermal equilibrium state, the processor samples the voltage signal at both ends of the series circuit. Through the resistance of the reference resistance and the pressure difference at both ends of the series circuit, the resistance of the heating element can be calculated and used as the second resistance.

[0060] Step 108 may include: heating the heating element to the thermal equilibrium state, obtaining the second resistance of the heating element and the equilibrium state temperature.

[0061] After stopping the heating waiting time, the heating element can be continuously heated until the heating element is heated to the thermal equilibrium state again. The equilibrium state temperature of the heating element is the temperature after the heating element reaches the thermal equilibrium state, which can be obtained by the processor according to the preset stored data, or can be obtained by a temperature detection circuit. The temperature detection circuit sends the detected equilibrium state temperature to the processor.

[0062] After the heating element reaches the thermal equilibrium state, since the temperature of the heating element reaches the boiling point of the atomization matrix, the atomization matrix is atomized, taking away heat and maintaining a supply-demand balance. That is, for the heating element, the heat generated by the heating power is equivalent to the heat taken away by atomization + the heat to maintain its own temperature at the boiling point (other energy consumptions, such as heat radiation, can be ignored because they are too small). At this time, it can be considered that the temperature of the heating element is approximately the boiling point temperature (theoretically a little higher, otherwise heat transfer cannot occur). Therefore, the boiling point temperature of the atomization matrix can be used as the equilibrium state temperature of the heating element.

[0063] Step 110: Determine the resistance temperature coefficient of the heating element based on the first resistance value, the first temperature, the second resistance value, and the equilibrium temperature.

[0064] After obtaining the first resistance value, the first temperature, the second resistance value, and the equilibrium temperature, the resistance temperature coefficient of the heating element can be calculated in combination with the definition of the resistance temperature coefficient.

[0065] Specifically, in one embodiment, the resistance temperature coefficient of the heating element can be determined according to the formula TCR = (R1–R0) / (R0×(T1 - T0)); where R1 represents the resistance value of the heating element at a certain moment, which can be the resistance value after the heating element reaches the thermal equilibrium state in this embodiment, that is, the second resistance value; T1 represents the temperature corresponding to this moment, which is the equilibrium temperature in this embodiment; R0 represents the first resistance value, and T0 represents the first temperature.

[0066] The above method for determining the resistance temperature coefficient of the heating element first heats the heating element in the atomizer to the thermal equilibrium state, waits for a period of time after stopping heating, obtains the first resistance value of the heating element, then obtains the second resistance value of the heating element, and finally determines the resistance temperature coefficient of the heating element based on the first resistance value, the first temperature determined according to the heating waiting time, the second resistance value, and the equilibrium temperature. Thus, when determining the resistance temperature coefficient of each atomizer, the initial environmental interference can be reduced by the first heating, and based on the parameters after heating, the resistance temperature coefficient of the heating element can be dynamically measured, improving the accuracy of the measured resistance temperature coefficient. Therefore, the temperature control accuracy of the atomization device using the measured resistance temperature coefficient is higher, and the working reliability of the atomization device is improved.

[0067] In one embodiment, before step 104, the method for determining the resistance temperature coefficient of the heating element further includes step 102.

[0068] Step 102: Receive a detection start signal.

[0069] Among them, the atomizer includes a chip that stores relevant information such as the atomization matrix, and also includes a circuit board, a heating element, and a container for holding the atomization matrix. The atomization matrix can be stored in the container, and the heating element can be a heating wire. The heating element heats the atomization matrix, causing the temperature of the atomization matrix to rise and atomize, generating an aerosol.

[0070] After the atomizer is connected to the atomization device, the processor will receive a detection start signal. The detection start signal indicates that the atomizer has been connected and the subsequent steps for measuring the resistance temperature coefficient of the heating element can be started. The atomizer can be connected to the atomization device by inserting it. After successful insertion, a detection start signal is generated. Or the atomization device is regarded as receiving the detection start signal and determining that the atomizer has been connected by recognizing a key trigger signal or a vibration signal, etc. Further, the processor can determine whether the atomizer is connected based on whether the detection start signal is received. For example, after the atomizer is plugged in or unplugged, the level of a certain IO pin of the processor will change between high and low. The processor can detect the plugging and unplugging of the atomizer based on the different levels of this pin. Correspondingly, the detection start signal at this time is a high-level signal or a low-level signal.

[0071] After the processor receives the detection start signal, it determines that the atomizer has been successfully connected. After the atomizer is successfully connected, the processor can communicate with the atomizer to obtain relevant parameters inside the atomizer for subsequent use.

[0072] In one embodiment, as Figure 2 shown, the method for determining the first temperature includes step 202 and step 204.

[0073] Step 202, determine the boiling point temperature of the atomization matrix inside the atomizer.

[0074] After the atomizer is connected to the atomization device, the processor inside the atomization device can communicate with the atomizer to obtain relevant parameters inside the atomizer for subsequent use. For example, in this embodiment, the atomization device can obtain data such as the boiling point temperature of the atomization matrix. Among them, the boiling point temperature of the atomization matrix may be stored in the chip of the atomizer. The processor exchanges data with the chip to obtain the boiling point temperature of the atomization matrix.

[0075] Step 204, determine the first temperature according to the heating waiting time and the boiling point temperature.

[0076] The boiling point temperature corresponds to the temperature of the heating element after the heating element is first heated to the thermal equilibrium state. After the heating element is first heated to the thermal equilibrium state and then the heating is stopped, when the stop duration reaches the heating waiting time, the corresponding temperature is the first temperature. During the period when the heating is stopped, the heating element will dissipate heat and cool down by itself. The temperature before cooling is the boiling point temperature, and the temperature after cooling is the first temperature. And the temperature drop is related to the heating waiting time. The longer the heating waiting time, the more the temperature drops. The shorter the heating waiting time, the less the temperature drops. Therefore, after obtaining the heating waiting time and the boiling point temperature, the first temperature can be determined. The heating waiting time is the heat dissipation time.

[0077] In this embodiment, when determining the first temperature, by determining the boiling point temperature of the atomization matrix in the atomizer, the first temperature is determined according to the heating waiting time and the boiling point temperature. The first temperature can be obtained by using the existing hardware structure, omitting the setting of the temperature detection device, which is beneficial to reducing the volume and weight of the atomization device and facilitating the lightweight of the atomization device.

[0078] In one embodiment, as Figure 3 shown, step 204 includes step 302 and step 304.

[0079] Step 302, determining the decreasing temperature according to the heating waiting time.

[0080] The inventor found through experiments that there is a relatively fixed corresponding relationship between the heating waiting time and the decreasing temperature in the absence of external interference (such as suction air flow). Therefore, after determining the heating waiting time, the decreasing temperature corresponding to the heating waiting time can be obtained.

[0081] For different types of heating elements, multiple data of heating waiting time and decreasing temperature can be obtained through experimental tests, and then the corresponding relationship between the heating waiting time and the decreasing temperature is obtained by fitting. After obtaining the corresponding relationship between the heating waiting time and the decreasing temperature, it can be stored in advance and directly called later. Further, the corresponding relationships between the heating waiting time and the decreasing temperature for different types of heating elements can be bound and stored, so as to facilitate the subsequent calling of the corresponding relationship between the heating waiting time and the decreasing temperature according to the type of the heating element.

[0082] Step 304, determining the first temperature according to the decreasing temperature and the boiling point temperature.

[0083] After obtaining the decreasing temperature, the first temperature can be obtained in combination with the boiling point temperature. For example, the first temperature is the difference between the boiling point temperature and the decreasing temperature.

[0084] In this embodiment, the decreasing temperature is determined according to the heating waiting time, and the first temperature is determined according to the decreasing temperature and the boiling point temperature. The temperature is determined by using the decreasing temperature corresponding to the heating waiting time and the boiling point temperature, and the process is simple and no additional hardware structure is required.

[0085] In one embodiment, as Figure 4 shown, step 202 includes step 402 and step 404.

[0086] Step 402, after the atomizer is connected, obtaining the type of the atomization matrix in the atomizer.

[0087] The processor communicates with the atomizer to obtain the type of atomization matrix in the atomizer. Among them, the type of atomization matrix may be stored in the chip of the atomizer. The processor interacts with the chip to obtain the type of atomization matrix.

[0088] Step 404: Determine the boiling point temperature of the atomization matrix according to the type of atomization matrix.

[0089] After obtaining the type of atomization matrix, the processor can match the corresponding boiling point temperature according to the pre-stored correspondence between the type of atomization matrix and the boiling point.

[0090] In this embodiment, after the atomizer is connected, the type of atomization matrix in the atomizer is obtained, and the boiling point temperature of the atomization matrix is determined according to the type of atomization matrix, so as to realize determining the boiling point value according to the type of atomization matrix. The boiling point value of the atomization matrix does not need to be stored in the atomizer, which reduces the storage load of the atomizer.

[0091] In one embodiment, as Figure 5 shown, step 104 includes step 504.

[0092] Step 504: Heat the heating element in the atomizer to the thermal equilibrium state with a first preset power.

[0093] Among them, the first preset power is less than the standard power. The standard power can be the power when the atomizer is normally atomizing. The first preset power being less than the standard power is used to indicate that the first preset power is relatively small. The value of the first preset power is not unique. For example, it can be 1.5W.

[0094] In this embodiment, when heating the heating element in the atomizer to the thermal equilibrium state, the heating element in the atomizer can be heated to the thermal equilibrium state with a relatively small first preset power. On the premise of ensuring that the heating element can be heated to the thermal equilibrium state, the adverse effects caused by too rapid temperature rise of the atomizer can also be reduced.

[0095] In one embodiment, in the steps of heating the heating element to the thermal equilibrium state and obtaining the second resistance value and the equilibrium state temperature of the heating element, heating the heating element to the thermal equilibrium state includes: continuing to heat the heating element to the thermal equilibrium state with a second preset power.

[0096] Among them, the second preset power is less than the standard power. The standard power can be the power when the atomizer is normally atomizing. The second preset power being less than the standard power is used to indicate that the second preset power is relatively small.

[0097] In this embodiment, when heating the heating element in the atomizer to the thermal equilibrium state for the second time, the heating element in the atomizer can be heated to the thermal equilibrium state with a relatively small second preset power. On the premise of ensuring that the heating element can be heated to the thermal equilibrium state, the adverse effects caused by too rapid temperature rise of the atomizer can also be reduced.

[0098] Further, in one embodiment, the second preset power is equal to the first preset power. The first preset power is the power for heating the heating element to the thermal equilibrium state for the first time, and the second preset power is the power for heating the heating element to the thermal equilibrium state for the second time. During the two heating processes of the heating element, sampling the same power can make the temperature rise rates in the two heating processes basically the same, reducing the error of the obtained detection data.

[0099] In one embodiment, as Figure 6 shown, the method for determining the equilibrium state temperature includes step 602 and step 604.

[0100] Step 602, determine the boiling point temperature of the atomization matrix in the atomizer.

[0101] After the atomizer is connected to the atomization device, the processor in the atomization device can communicate with the atomizer to obtain relevant parameters in the atomizer for subsequent use. For example, in this embodiment, the atomization device can obtain data such as the boiling point temperature of the atomization matrix. Among them, the boiling point temperature of the atomization matrix may be stored in the chip of the atomizer, and the processor interacts with the chip to obtain the boiling point temperature of the atomization matrix.

[0102] Step 604, determine the equilibrium state temperature according to the boiling point temperature.

[0103] After the heating element reaches the thermal equilibrium state, the temperature of the heating element is approximately equal to the boiling point temperature of the atomization matrix. Therefore, the boiling point temperature of the atomization matrix can be used as the equilibrium state temperature of the heating element.

[0104] In this embodiment, when determining the equilibrium state temperature, first determine the boiling point temperature of the atomization matrix in the atomizer, and then determine the equilibrium state temperature according to the boiling point temperature. The equilibrium state temperature can be obtained by using the existing hardware structure without adding a new temperature detection device, which is beneficial to reducing the volume and weight of the atomization device.

[0105] In one embodiment, as Figure 7 shown, step 108 includes step 708 and step 710.

[0106] Step 708, obtain multiple resistance values of the heating element.

[0107] Step 710, use the average value of the multiple resistance values as the second resistance value.

[0108] After the heating element is heated to the thermal equilibrium state for the second time, the resistance value of the heating element changes within a small range. At this time, obtain multiple resistance values of the heating element at the thermal equilibrium state, and then use the average value of the multiple resistance values as the second resistance value. The specific number of resistance values is not limited. Generally, the more the number, the more accurate the calculated second resistance value.

[0109] In this embodiment, the heating element is heated to a thermal equilibrium state, and multiple resistance values of the heating element are obtained. The average value of the multiple resistance values is used as the second resistance value, which can reduce the influence of measurement errors and improve the accuracy of the second resistance value, thereby facilitating the improvement of the accuracy of the resistance temperature coefficient obtained based on the second resistance value.

[0110] It should be understood that although the steps in the flowcharts involved in the above-described embodiments are sequentially shown in the direction of the arrows, these steps are not necessarily executed in the order indicated by the arrows. Unless otherwise clearly stated in this article, the execution of these steps has no strict order limit, and these steps can be executed in other orders. Moreover, at least a part of the steps in the flowcharts involved in the above-described embodiments may include multiple steps or multiple stages. These steps or stages are not necessarily executed at the same time, but can be executed at different times. The execution order of these steps or stages is not necessarily sequential, but can be executed alternately or alternately with at least a part of other steps or steps in other steps.

[0111] To better understand the above embodiments, the following will be explained in detail with a specific embodiment. In one embodiment, as Figure 8 shown, the method for determining the resistance temperature coefficient of the heating element includes: after detecting the insertion of the atomizer, the atomizer is heated for the first time. The first heating is performed at a given power P0 (the first preset power) for a heating duration of t0 until thermal equilibrium is reached. Then, the heating is stopped and the waiting time t1 is waited. After the heating waiting time has passed, the R value at this time is collected and recorded as R0 (the first resistance), and the temperature is T0 (the first temperature). After that, the heating element is heated for the second time. The second heating is performed at a given power P2 (the second preset power) for a heating duration of t2 until thermal equilibrium is reached. Then, the R value at this time is collected and recorded as R1 (the second resistance), and the temperature is T1 (the equilibrium state temperature). Finally, according to the TCR calculation formula: TCR = (R1 – R0) / (R0×(T1 - T0)), the approximate TCR value is calculated.

[0112] It should be noted that in the above method, the first heating power P0 and the second heating power P2 can be adjusted according to the situation, and a relatively low power, such as 1.5W, can be appropriately adopted. The first heating duration t0 and the second heating duration t2, that is, the time to reach thermal equilibrium during heating, are related to the type of heating element and the heating power, and are basically fixed values, which can be obtained through experimental tests in advance. Generally, it does not exceed 2s at the slowest. The heating waiting time t1 is a fixed value, such as 1s. The temperature T1 at thermal equilibrium is related to the heating power and the type of heating element, and is basically relatively fixed, and can be measured in advance. After the first heating reaches thermal equilibrium, it will stop for a preset fixed time t1. At this time, the heating element will dissipate heat by itself, and the temperature will slowly decrease. According to the actual measurement, in the absence of external interference (such as suction airflow), the trend of temperature decrease is basically fixed and consistent, that is, there is a relatively fixed relationship between the temperature decrease trend and time. Therefore, when t1 is fixed, before the start of the second heating, the temperature T0 is a relatively fixed value, and it can also be obtained by measuring in advance. The reason for designing two-stage heating is mainly that the initial temperature when the atomizer is connected is uncertain, affected by the temperature when the atomizer arrives during insertion and the ambient temperature. After the first heating, the obtained first temperature is an accurate temperature value excluding external interference. Therefore, the temperature before the second heating can be considered to be basically stable (as confirmed by actual measurement).

[0113] Through the above method, after inserting the atomizer, a relatively accurate TCR of the currently used heating element can be calculated, which helps to improve the accuracy and stability of the dry-burning prevention or temperature control technology.

[0114] As a verification, an experiment was carried out with a certain heating element as the test object as follows:

[0115] Taking a certain heating element (the average TCR in oil bath is 597) as an example, the atomizer was randomly inserted 5 times, and the TCR self-test was carried out according to the method of the present application. Some of the parameters are set as follows:

[0116] The first heating time t0 is 1s, and the heating power P0 is 1.5W. After the first heating is completed, the waiting time t1 is 1s. The second heating time t2 is 1s, and the heating power P2 is 1.5W. The changes in the first resistance and the second resistance were recorded each time the atomizer was inserted, and the results are shown in Table 1.

[0117] Table 1

[0118]

[0119] According to the test data, it can be obtained that:

[0120] For the second heating, since after the first heating reaches temperature equilibrium and waits for the heating waiting time t1 for self-cooling, the initial temperatures during the second heating will be relatively consistent. Therefore, the first resistance value R0 will be relatively stable.

[0121] Table 2

[0122]

[0123] Through experiments, it can be pre-tested that when the heating element is at a power of 1.5W and wet-burned for 1s, the heat balance temperature T1 reached is approximately 150°C. After standing for a fixed time t1 (1s), the temperature T0 is approximately 86°C. According to the TCR calculation formula TCR = 1000000ⅹ(R1 - R0) / (R0ⅹ(T1 - T0)), the self-tested TCR value can be calculated. The calculation results of the self-tested TCR are shown in Table 2.

[0124] According to the calculation results, the self-tested TCR stability is relatively high for 5 times of inserting the atomizer, with an error within ±5%. Compared with directly using the average TCR, the anti-dry burning and temperature control accuracy are improved.

[0125] The method for determining the resistance temperature coefficient of the heating element provided by this application can achieve a method for relatively accurately self-testing TCR on the existing atomization device without increasing costs. For each actually used heating element, the approximate TCR can be self-tested, which is applied to and helps improve the anti-dry burning technology and temperature control technology.

[0126] In one embodiment, an atomizing device is provided, which includes a processor, a memory, and an atomizer. A heating element is disposed in the atomizer. The memory stores a computer program, and when the processor executes the computer program, the steps of the above method embodiments are implemented. The atomizing device includes a processor, a memory, an input / output interface, a communication interface, a display unit, and an input device. Among them, the processor, the memory, and the input / output interface are connected through a system bus, and the communication interface, the display unit, and the input device are connected to the system bus through the input / output interface. Among them, the processor is used to provide computing and control capabilities. The memory includes a non-volatile storage medium and an internal memory. The non-volatile storage medium stores an operating system and a computer program. The internal memory provides an environment for the operation of the operating system and the computer program in the non-volatile storage medium. The input / output interface of the atomizing device is used for the processor to exchange information with external devices. The communication interface of the atomizing device is used to communicate with an external terminal in a wired or wireless manner, and the wireless manner can be implemented through WIFI, a mobile cellular network, NFC (Near Field Communication), or other technologies. When the computer program is executed by the processor, a method for measuring the temperature coefficient of the resistance of a heating element is implemented. The display unit of the atomizing device is used to form a visually visible picture, which can be a display screen, a projection device, or a virtual reality imaging device. The display screen can be a liquid crystal display screen or an electronic ink display screen. The input device of the atomizing device can be a touch layer covering the display screen, or a button, a trackball, or a touchpad provided on the outer shell of the atomizing device, or an external keyboard, touchpad, or mouse, etc.

[0127] In one embodiment, a computer-readable storage medium is provided, on which a computer program is stored, and when the computer program is executed by a processor, the steps in the above method embodiments are implemented.

[0128] In one embodiment, a computer program product is provided, including a computer program, and when the computer program is executed by a processor, the steps in the above method embodiments are implemented.

[0129] Those of ordinary skill in the art can understand that all or part of the processes in the methods of the above embodiments can be completed by instructing relevant hardware through a computer program. The computer program can be stored in a non-volatile computer-readable storage medium. When the computer program is executed, it can include the processes of the embodiments of the above methods. Among them, any reference to a memory, database, or other medium used in the embodiments provided in the present application can include at least one of non-volatile and volatile memories. Non-volatile memories can include read-only memory (ROM), magnetic tapes, floppy disks, flash memories, optical memories, high-density embedded non-volatile memories, resistive random access memories (ReRAM), magnetoresistive random access memories (MRAM), ferroelectric random access memories (FRAM), phase change memories (PCM), graphene memories, etc. Volatile memories can include random access memory (RAM) or external cache memories, etc. By way of illustration and not limitation, RAM can be in various forms, such as static random access memory (SRAM) or dynamic random access memory (DRAM), etc. The databases involved in the embodiments provided in the present application can include at least one of relational databases and non-relational databases. Non-relational databases can include distributed databases based on blockchain, etc., without limitation. The processors involved in the embodiments provided in the present application can be general-purpose processors, central processing units, graphics processing units, digital signal processors, programmable logics, data processing logics based on quantum computing, etc., without limitation.

[0130] The technical features of the above embodiments can be combined arbitrarily. For the sake of brevity of description, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, it should be considered as the scope described in this specification.

[0131] The above-described embodiments only represent several implementation manners of the present application. The description is relatively specific and detailed, but it should not be construed as a limitation on the patent scope of the present application. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present application, several modifications and improvements can be made, and these all belong to the protection scope of the present application. Therefore, the protection scope of the present application should be subject to the appended claims.

Claims

1. A method for determining the resistance temperature coefficient of a heating element, characterized in that, the method includes: heating the heating element in the atomizer to a thermal equilibrium state; after stopping heating and waiting for a period of time, obtaining a first resistance value of the heating element; obtaining a second resistance value of the heating element; the second resistance value is the resistance value corresponding to the heating element after reaching the thermal equilibrium state; determining the resistance temperature coefficient of the heating element according to the first resistance value, the first temperature, the second resistance value and the equilibrium state temperature; the first temperature is determined according to the heating waiting time.

2. The method according to claim 1, characterized in that, the method for determining the first temperature includes: determining the boiling point temperature of the atomization matrix in the atomizer; determining the first temperature according to the heating waiting time and the boiling point temperature.

3. The method according to claim 2, characterized in that, the determining the first temperature according to the heating waiting time and the boiling point temperature includes: determining a temperature drop according to the heating waiting time; the corresponding relationship between the heating waiting time and the temperature drop is pre-stored; determining the first temperature according to the temperature drop and the boiling point temperature.

4. The method according to claim 2, characterized in that, the determining the boiling point temperature of the atomization matrix in the atomizer includes: after the atomizer is connected, obtaining the type of the atomization matrix in the atomizer; determining the boiling point temperature of the atomization matrix according to the type of the atomization matrix.

5. The method according to claim 1, characterized in that, before heating the heating element in the atomizer to the thermal equilibrium state, the method further includes: receiving a detection start signal; the detection start signal indicates that the atomizer has been connected.

6. The method according to claim 1, characterized in that, the obtaining the second resistance value of the heating element includes: heating the heating element to the thermal equilibrium state, and obtaining the second resistance value and the equilibrium state temperature of the heating element.

7. The method according to claim 1, characterized in that, the heating the heating element in the atomizer to the thermal equilibrium state includes: heating the heating element in the atomizer to the thermal equilibrium state at a first preset power, and the first preset power is less than the standard power.

8. The method according to claim 1, characterized in that, the obtaining the second resistance value of the heating element includes: obtaining a plurality of resistance values of the heating element; taking the average value of the plurality of resistance values as the second resistance value.

9. The method according to claim 1, characterized in that, the determining the resistance temperature coefficient of the heating element according to the first resistance value, the first temperature, the second resistance value and the equilibrium state temperature includes: determining the resistance temperature coefficient of the heating element according to the formula TCR = (R1–R0) / (R0×(T1-T0)); wherein, TCR represents the resistance temperature coefficient of the heating element, R1 represents the second resistance value, T1 represents the equilibrium state temperature; R0 represents the first resistance value, and T0 represents the first temperature.

10. An atomization device, characterized in that, The atomization device includes a processor, a memory, and an atomizer. A heating element is provided in the atomizer. The memory stores a computer program. When the processor executes the computer program, the steps of the method according to any one of claims 1 to 9 are implemented.

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