Metal coil polishing method

Through the three-stage polishing process and the use of micron-level agglomerated diamond abrasives, the problem of insufficient surface treatment technology of domestic 3J21 nickel-cobalt alloy is solved, efficient mirror treatment is achieved, service life and sealing is improved, and it is suitable for multiple industries.

CN120155854AInactive Publication Date: 2025-06-17SHAANXI CUCKOO XIANJUE METAL MATERIALS CO LTD
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Patent Information

Application Number
CN202510583803.2
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-05-07
Publication Date
2025-06-17
Estimated Expiration
Not applicable · inactive patent

AI Technical Summary

Technical Problem

The domestically produced 3J21 nickel-cobalt alloy has insufficient surface treatment technology, resulting in a service life of only 50% of the same imported materials.

Method used

The three-stage polishing process is adopted, and the metal foil is coarse, medium and fine-polished using abrasives of 38-75μm, 1.2-1.8μm and 0.1-0.5μm particle sizes, and combined with the unwinding device and the polishing die head device to form a 12K-level mirror.

Benefits of technology

It greatly improves the service life of 3J21 nickel-cobalt alloy, reduces gas resistance and friction, improves sealing, and has a low cost. It is suitable for semiconductor, photovoltaic, aerospace and other industries.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention belongs to the field of metal material treatment, and particularly discloses a metal coil polishing method which comprises the following steps: S1, using an unwinding device to stably unwind a to-be-polished metal foil stored on a winding drum; s2, a grinding material with the particle size of 38-75 microns is adopted for conducting rough polishing on the metal foil; s3, performing medium polishing on the metal foil by adopting an agglomerated diamond abrasive with the particle size of 1.2-1.8 mu m; s4, finely polishing the metal foil by adopting an agglomerated diamond abrasive material with the particle size of 0.1-0.5 mu m; s5, a cleaning solution with the pH value being 6.5-7.5 is used for conducting double-face ultrasonic cleaning on the polished metal foil, and after cleaning, nitrogen purging and infrared radiation are adopted to enable the metal foil to be completely dried; according to the method, efficient mirror surface treatment of the 3J21 nickel-cobalt alloy is achieved through the three-stage polishing technology in combination with the micron-sized agglomerated diamond abrasive, and the service life of the 3J21 nickel-cobalt alloy is greatly prolonged.
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Description

Technical Field

[0001] The present invention belongs to the field of metal material treatment, and particularly relates to a method for polishing metal strip coils. Background Art

[0002] As a non-magnetic superalloy, 3J21 nickel-cobalt alloy is widely used in diaphragm valves, precision instruments and other fields. However, the surface treatment technology of domestic 3J21 alloy is insufficient. After domestic production, it is a common metal surface, that is, the cold-rolled bright surface. Since it is not a mirror surface effect, there are defects such as micro-cracks and unevenness on its cold-rolled bright surface, resulting in a service life that is only 50% of imported similar materials (such as American Elgiloy alloy). For example, for the metal diaphragm used in diaphragm valves, the normal service life of American elgiloy (non-magnetic superalloy) is 300 times, while that of domestic 3J21 nickel-cobalt alloy with a common metal surface is 150 times, and the normal service life is only 50% of American elgiloy (non-magnetic superalloy). Summary of the Invention

[0003] The purpose of the present invention is to provide a method for polishing metal strip coils to solve the problems of insufficient surface treatment technology and limited service life of 3J21 nickel-cobalt alloy mentioned in the above background art.

[0004] To achieve the above purpose, the present invention provides the following technical solutions:

[0005] A method for polishing metal strip coils, comprising:

[0006] S1. Use an unwinding device to smoothly unwind the metal foil to be polished stored on the reel and convey it to the subsequent polishing process;

[0007] S2. Coarsely polish the metal foil with abrasive grains of 38-75 μm particle size, apply a pressure of 0.2-0.5 MPa, and a linear velocity of 10-15 m / min to remove the surface damage layer, so that the surface roughness Ra of the metal foil ≤ 50 nm;

[0008] S3. Medium-polish the metal foil with agglomerated diamond abrasive grains of 1.2-1.8 μm particle size, apply a pressure of 0.1-0.3 MPa, and a linear velocity of 20-30 m / min to further flatten the surface, so that the surface roughness Ra of the metal foil ≤ 20 nm;

[0009] S4. Finish-polish the metal foil with agglomerated diamond abrasive grains of 0.1-0.5 μm particle size, apply a pressure of 0.05-0.1 MPa, and a linear velocity of 30-40 m / min to make the surface roughness Ra of the metal foil ≤ 3 nm, forming a 12K-level mirror surface;

[0010] S5. Use a cleaning solution with a pH value of 6.5 - 7.5 to ultrasonically clean both sides of the polished metal foil, and after cleaning, use nitrogen purging and infrared radiation to completely dry the metal foil.

[0011] Preferably, the unwinding device includes a detection head, a support member, and a positioning member;

[0012] The detection head includes an eddy current sensor for measuring the thickness of the metal foil to be polished.

[0013] The support member is used to support the detection head to move closer to or away from the metal foil to be polished.

[0014] The positioning member is used to move synchronously with the detection head and make the radial distance from the detection head to the surface of the reel roller fixed.

[0015] Preferably, the metal foil to be polished is one of a nickel-based alloy foil with a thickness of 0.01 mm - 0.2 mm, a cobalt-based alloy foil with a thickness of 0.01 mm - 0.2 mm, and a stainless steel foil with a thickness of 0.01 mm - 0.2 mm.

[0016] Preferably, during rough polishing, medium polishing, and fine polishing, the metal foil is polished by a polishing die head device. The polishing die head device includes 72 - 120 laterally linearly moving die heads. The surface of the die heads is coated with a diamond-like carbon coating with a thickness of 1 - 3 μm, the rotational speed of the die heads is 500 - 800 rpm, and the adjustable range of the die head spacing is 5 - 15 mm.

[0017] Preferably, the cleaning time for ultrasonically cleaning both sides of the polished metal foil is 3 - 5 minutes, the temperature is 40 - 50 °C, the temperature for nitrogen purging and infrared radiation is 60 - 80 °C, and the time is 2 - 4 minutes.

[0018] Preferably, after the metal foil is completely dried in step S5, the thickness of the metal foil is measured by an eddy current sensor to determine whether the polishing is uniform, and the parts of the metal foil that are not polished thoroughly are cut, and the foil width that meets the requirements is retained.

[0019] Preferably, after measuring the thickness of the metal foil by an eddy current sensor, the metal foil is laminated and an intermediate backing paper is inserted by a laminating machine, then the tension is removed using a tension machine, and finally, it is wound up as a whole.

[0020] Preferably, in step S2, the abrasive is an alumina sanding belt, the alumina content in the alumina sanding belt is ≥ 95%, and the binder is phenolic resin.

[0021] Compared with the prior art, the beneficial effects of the present invention are:

[0022] The present invention realizes the high-efficiency mirror surface treatment of 3J21 nickel-cobalt alloy through a three-stage polishing process in combination with micron-level agglomerated diamond abrasives. The surface roughness Ra ≤ 3 nm, which not only greatly improves the service life of 3J21 nickel-cobalt alloy, but also reduces gas resistance and friction, improves sealing performance, and has a relatively low cost. It is applicable to industries such as semiconductors, photovoltaics, aerospace, petrochemicals, etc., achieving energy conservation and consumption reduction. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following will briefly introduce the drawings required for the description of the embodiments. Obviously, the following drawings are only some embodiments of the present invention. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings. Among them:

[0024] Figure 1 It is a block diagram of the method steps of the present invention. DETAILED DESCRIPTION OF THE EMBODIMENTS

[0025] In order to make the above objects, features, and advantages of the present invention more obvious and understandable, the following will make a detailed description of the specific embodiments of the present invention in conjunction with the drawings of the specification.

[0026] In the following description, many specific details are set forth in order to fully understand the present invention. However, the present invention can also be implemented in other ways different from those described herein. Those skilled in the art can make similar extensions without departing from the connotation of the present invention. Therefore, the present invention is not limited by the specific embodiments disclosed below.

[0027] Secondly, the so-called "one embodiment" or "embodiment" herein refers to a specific feature, structure, or characteristic that can be included in at least one implementation manner of the present invention. The "in one embodiment" that appears in different places in this specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment that is mutually exclusive with other embodiments.

[0028] As shown in the Figure 1 accompanying drawings:

[0029] Embodiment 1: This embodiment provides a method for polishing a metal strip, including:

[0030] S1. Use an unwinding device to smoothly unwind the metal foil to be polished stored on the reel and transport it to the subsequent polishing process;

[0031] The unwinding device includes a detection head, a support member, and a positioning member;

[0032] The detection head includes an eddy current sensor for measuring the thickness of the metal foil to be polished;

[0033] The support is used to support the detection head for moving closer to or farther away from the metal foil to be polished;

[0034] The positioning part is used to move synchronously with the detection head and keep the radial distance from the detection head to the surface of the reel roller fixed.

[0035] Ensure that there is no deviation when the foil is unwound, and the abnormal thickness section is automatically marked and removed.

[0036] S2. Coarsely polish the metal foil with abrasives of 38 - 75μm particle size, apply a pressure of 0.2 - 0.5MPa, and a linear velocity of 10 - 15m / min to remove the surface damage layer and make the surface roughness Ra of the metal foil ≤50nm;

[0037] Coarsely polish with abrasives of larger particle size. The machining allowance for coarse polishing is larger, which can remove more materials, effectively remove the damage layer generated by wire cutting, repair the surface profile, reduce TTV, Bow, and Warp. The removal rate is stable and can reach a removal rate of 0.8 - 1.2um / min.

[0038] Remove the wire cutting damage layer (such as oxide scale, microcracks) and repair the surface profile (TTV≤5μm, Bow≤0.1mm / m).

[0039] S3. Medium - polish the metal foil with agglomerated diamond abrasives of 1.2 - 1.8μm particle size, apply a pressure of 0.1 - 0.3MPa, and a linear velocity of 20 - 30m / min to further flatten the surface and make the surface roughness Ra of the metal foil ≤20nm;

[0040] Medium - polish with abrasives of medium particle size. The machining allowance for medium polishing is relatively smaller than that for coarse polishing. The surface of the metal foil after medium polishing is relatively smooth. The removal rate is stable at 0.8 - 1.2um / min, and the surface roughness is about 20nm.

[0041] Further flatten the surface, eliminate the residual scratches after coarse polishing, and improve the reflection uniformity.

[0042] S4. Finish - polish the metal foil with agglomerated diamond abrasives of 0.1 - 0.5μm particle size, apply a pressure of 0.05 - 0.1MPa, and a linear velocity of 30 - 40m / min to make the surface roughness Ra of the metal foil ≤3nm and form a 12K - level mirror surface;

[0043] Finish - polish with very fine micron - sized abrasives, which can make the metal foil obtain a high - gloss and high - precision mirror effect, make the surface of the metal foil reach extremely high flatness and smoothness. The machining allowance for finish polishing is extremely small, mainly for fine trimming and polishing of the surface of the metal foil. The surface after finish polishing is as smooth as a mirror, almost without defects and roughness.

[0044] Achieve nanoscale surface finishing, eliminate microscopic defects, and form a scratch-free mirror surface.

[0045] S5. Use a cleaning solution with a pH value of 6.5 - 7.5 to ultrasonically clean both sides of the polished metal foil, and after cleaning, use nitrogen purging and infrared radiation to completely dry the metal foil.

[0046] Automatically rotate and clean using a semiconductor silicon wafer cleaning machine so that the upper and lower surfaces of the foil can be thoroughly cleaned. After cleaning, it is automatically dried, and there is no manual contact throughout the process to prevent contamination of the mirror effect.

[0047] Specifically, the metal foil to be polished is a nickel-based alloy foil with a thickness of 0.01 mm - 0.2 mm, specifically a 3J21 alloy diaphragm.

[0048] Specifically, during rough polishing, medium polishing, and fine polishing, the metal foil is polished through a polishing die head device. The polishing die head device includes 72 - 120 laterally linearly moving die heads. The surface of the die heads is coated with a diamond-like carbon coating with a thickness of 1 - 3 μm, the rotational speed of the die heads is 500 - 800 rpm, and the adjustable range of the die head spacing is 5 - 15 mm.

[0049] Specifically, the cleaning time for ultrasonically cleaning both sides of the polished metal foil is 3 - 5 minutes, the temperature is 40 - 50 °C, the temperature of nitrogen purging and infrared radiation is 60 - 80 °C, and the time is 2 - 4 minutes.

[0050] Specifically, after the metal foil is completely dried in step S5, the thickness of the metal foil is measured by an eddy current sensor to determine whether the polishing is uniform, and the parts of the metal foil that are not thoroughly polished are cut, and the width of the foil that meets the requirements is retained.

[0051] Specifically, after measuring the thickness of the metal foil by an eddy current sensor, the metal foil is laminated and lined with an intermediate paper by a laminating machine, then the tension is removed using a tension machine, and finally it is wound up as a whole.

[0052] The purpose of lamination is to protect the mirror effect, and it can be peeled off when used later. After lamination, the foil is packaged and packed with an intermediate paper to prevent surface scratches and bruises during transportation.

[0053] Specifically, in step S2, the abrasive is an alumina abrasive belt. The alumina abrasive belt is composed of alumina and a binder. The alumina content in the alumina abrasive belt is ≥ 95%, and the binder is phenolic resin.

[0054] As can be seen from the above, the mirror polishing effect is divided into four grades: 6K, 8K, 10K, and 12K. K refers to the mirror reflection grade. Among them, 6K has a certain brightness on the surface, and the mirror effect is not considered. 8K has a clear surface and can reflect objects and people. It can be used for automotive decorative strips, home decorations, signs, nameplates, etc. 10K has a high-definition effect and can be comparable to a mirror. It can be used for mirrors, vanity mirrors, ceilings, mobile phone logos, etc. 12K has a very clear surface, without grinding marks and scratches, and no defects.

[0055] After the diaphragm valve is treated with the 3J21 alloy diaphragm by this process, the service life is increased from 150 times to 300 times, which is on par with the American Elgiloy alloy.

[0056] The surface friction coefficient is reduced by 40%, and the gas tightness is improved by 30%.

[0057] Importantly, it should be noted that the construction and arrangement of the present application shown in multiple different exemplary embodiments are merely illustrative. Although only a few embodiments are described in detail in this disclosure, those who refer to this disclosure should easily understand that many modifications are possible without substantially departing from the novel teachings and advantages of the subject matter described in this application (for example, the dimensions, scales, structures, shapes and proportions of various elements, as well as parameter values (such as temperature, pressure, etc.), installation arrangements, use of materials, color, orientation changes, etc.). For example, an element shown as integrally formed may be composed of multiple parts or elements, the position of the element may be inverted or otherwise changed, and the nature, number or position of discrete elements may be changed or altered. Therefore, all such modifications are intended to be included within the scope of the present invention. The order or sequence of any process or method steps may be changed or reordered according to alternative embodiments. In the claims, any "means-plus-function" clause is intended to cover the structure that performs the recited function herein, and not only structural equivalents but also equivalent structures. Other substitutions, modifications, changes and omissions may be made in the design, operating conditions and arrangement of the exemplary embodiments without departing from the scope of the present invention. Therefore, the present invention is not limited to a specific embodiment, but extends to various modifications that still fall within the scope of the appended claims.

[0058] In addition, in order to provide a concise description of the exemplary embodiments, not all features of the actual embodiments may be described (i.e., those features that are not relevant to the currently considered best mode of implementing the present invention, or those features that are not relevant to the implementation of the present invention).

[0059] It should be understood that, during the development of any actual implementation, such as in any engineering or design project, numerous specific implementation decisions can be made. Such development efforts may be complex and time-consuming, but for those of ordinary skill in the art who benefit from this disclosure, without undue experimentation, such development efforts will be routine work in design, manufacturing, and production.

[0060] It should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and not to limit them. Although the present invention has been described in detail with reference to the preferred embodiments, those of ordinary skill in the art should understand that the technical solutions of the present invention can be modified or equivalently replaced without departing from the spirit and scope of the technical solutions of the present invention, and they should all be covered within the scope of the claims of the present invention.

Claims

1. A metal strip polishing method, characterized in that: include: S1. Use an unwinding device to smoothly unwind the metal foil to be polished stored on the roll and transport it to the subsequent polishing process; S2. Roughly polish the metal foil using abrasive with a particle size of 38-75 μm, applying a pressure of 0.2-0.5 MPa and a linear speed of 10-15 m / min; S3, using agglomerated diamond abrasive with a particle size of 1.2-1.8 μm to perform medium polishing on the metal foil, applying a pressure of 0.1-0.3 MPa and a linear speed of 20-30 m / min; S4, using agglomerated diamond abrasive with a particle size of 0.1-0.5 μm to finely polish the metal foil, applying a pressure of 0.05-0.1 MPa and a linear speed of 30-40 m / min; S5. Use a cleaning solution with a pH value of 6.5-7.5 to ultrasonically clean the polished metal foil on both sides. After cleaning, use nitrogen purging and infrared radiation to completely dry the metal foil.

2. A metal strip polishing method according to claim 1, characterized in that: The unwinding device comprises a detection head, a support member and a positioning member; The detection head includes an eddy current sensor for measuring the thickness of the metal foil to be polished; The support member is used to support the detection head to move closer to or away from the metal foil to be polished; The positioning member is used to move synchronously with the detection head and to fix the radial distance from the detection head to the surface of the winding drum roller.

3. A metal strip polishing method according to claim 1, characterized in that: The metal foil to be polished is one of a 0.01mm-0.2mm thick nickel-based alloy foil, a 0.01mm-0.2mm thick cobalt-based alloy foil and a 0.01mm-0.2mm thick stainless steel foil.

4. A metal strip polishing method according to claim 1, characterized in that: The metal foil is polished by a polishing die device in the rough polishing, medium polishing and fine polishing. The polishing die device includes 72-120 dies that move laterally linearly. The surface of the die is coated with a diamond-like coating with a thickness of 1-3 μm. The die rotation speed is 500-800 rpm, and the die spacing can be adjusted in the range of 5-15 mm.

5. A metal strip polishing method according to claim 1, characterized in that: The cleaning time of the double-sided ultrasonic cleaning of the polished metal foil is 3-5 minutes, the temperature is 40-50° C., the nitrogen purge and infrared radiation temperature is 60-80° C., and the time is 2-4 minutes.

6. A metal strip polishing method according to claim 1, characterized in that: After the metal foil is completely dried in step S5, the thickness of the metal foil is measured by an eddy current sensor to determine whether it is polished evenly, and the part of the metal foil that is not completely polished is cut.

7. A metal strip polishing method according to claim 6, characterized in that: After the thickness of the metal foil is measured by the eddy current sensor, the metal foil is laminated by a laminating machine and interposed with a liner, and then the tension is removed by a tension machine, and finally the whole is rolled up.

8. A metal strip polishing method according to claim 1, characterized in that: In step S2, the abrasive is an aluminum oxide sand belt, the aluminum oxide content in the aluminum oxide sand belt is ≥95%, and the binder is phenolic resin.